ATE237702T1 - Plamaverfahren zur herstellung von oberflächenschichten - Google Patents

Plamaverfahren zur herstellung von oberflächenschichten

Info

Publication number
ATE237702T1
ATE237702T1 AT99870102T AT99870102T ATE237702T1 AT E237702 T1 ATE237702 T1 AT E237702T1 AT 99870102 T AT99870102 T AT 99870102T AT 99870102 T AT99870102 T AT 99870102T AT E237702 T1 ATE237702 T1 AT E237702T1
Authority
AT
Austria
Prior art keywords
plama
surface layers
voltage
producing surface
amplitude
Prior art date
Application number
AT99870102T
Other languages
English (en)
Inventor
Erik Dekempeneer
Jan Meneve
Jos Smeets
Original Assignee
Vito
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vito filed Critical Vito
Application granted granted Critical
Publication of ATE237702T1 publication Critical patent/ATE237702T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
AT99870102T 1998-05-20 1999-05-12 Plamaverfahren zur herstellung von oberflächenschichten ATE237702T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9800387A BE1011927A3 (nl) 1998-05-20 1998-05-20 Plasmamethode voor de afzetting van deklagen.

Publications (1)

Publication Number Publication Date
ATE237702T1 true ATE237702T1 (de) 2003-05-15

Family

ID=3891260

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99870102T ATE237702T1 (de) 1998-05-20 1999-05-12 Plamaverfahren zur herstellung von oberflächenschichten

Country Status (4)

Country Link
EP (1) EP0962550B1 (de)
AT (1) ATE237702T1 (de)
BE (1) BE1011927A3 (de)
DE (1) DE69906867T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010044027A1 (en) * 1999-12-30 2001-11-22 Anderson Jerrel Charles Diamond-like carbon coating on glass for added hardness and abrasion resistance
DE10018143C5 (de) † 2000-04-12 2012-09-06 Oerlikon Trading Ag, Trübbach DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems
JP4755262B2 (ja) * 2009-01-28 2011-08-24 株式会社神戸製鋼所 ダイヤモンドライクカーボン膜の製造方法
GB2476004B (en) * 2011-02-23 2011-12-28 Portal Medical Ltd Medicament Dispenser Device
WO2013083637A1 (en) 2011-12-05 2013-06-13 Solvay Sa Use of atmospheric plasma for the surface of inorganic particles and inorganic particles comprising an organic fluorine-containing surface modification

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
DE19513614C1 (de) * 1995-04-10 1996-10-02 Fraunhofer Ges Forschung Verfahren zur Abscheidung von Kohlenstoffschichten, Kohlenstoffschichten auf Substraten und deren Verwendung

Also Published As

Publication number Publication date
DE69906867T2 (de) 2004-04-01
BE1011927A3 (nl) 2000-03-07
EP0962550A1 (de) 1999-12-08
DE69906867D1 (de) 2003-05-22
EP0962550B1 (de) 2003-04-16

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Legal Events

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