ATE228721T1 - Hochleistungsanzeigepixel für elektronische anzeigeeinrichtungen - Google Patents

Hochleistungsanzeigepixel für elektronische anzeigeeinrichtungen

Info

Publication number
ATE228721T1
ATE228721T1 AT98911526T AT98911526T ATE228721T1 AT E228721 T1 ATE228721 T1 AT E228721T1 AT 98911526 T AT98911526 T AT 98911526T AT 98911526 T AT98911526 T AT 98911526T AT E228721 T1 ATE228721 T1 AT E228721T1
Authority
AT
Austria
Prior art keywords
high performance
pixel
electronic displays
access transistor
display pixels
Prior art date
Application number
AT98911526T
Other languages
English (en)
Inventor
Thomas Robert Keyser
Original Assignee
Honeywell Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Int Inc filed Critical Honeywell Int Inc
Application granted granted Critical
Publication of ATE228721T1 publication Critical patent/ATE228721T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6706—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device for preventing leakage current 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6708—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device for preventing the kink effect or the snapback effect, e.g. discharging the minority carriers of the channel region for preventing bipolar effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices

Landscapes

  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thin Film Transistor (AREA)
AT98911526T 1997-03-17 1998-03-09 Hochleistungsanzeigepixel für elektronische anzeigeeinrichtungen ATE228721T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/819,413 US6147362A (en) 1997-03-17 1997-03-17 High performance display pixel for electronics displays
PCT/US1998/004562 WO1998042027A1 (en) 1997-03-17 1998-03-09 High performance display pixel for electronic displays

Publications (1)

Publication Number Publication Date
ATE228721T1 true ATE228721T1 (de) 2002-12-15

Family

ID=25228087

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98911526T ATE228721T1 (de) 1997-03-17 1998-03-09 Hochleistungsanzeigepixel für elektronische anzeigeeinrichtungen

Country Status (7)

Country Link
US (1) US6147362A (de)
EP (1) EP0968533B1 (de)
JP (1) JP2002515139A (de)
AT (1) ATE228721T1 (de)
AU (1) AU6546398A (de)
DE (1) DE69809723T2 (de)
WO (1) WO1998042027A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6639281B2 (en) 2001-04-10 2003-10-28 Sarnoff Corporation Method and apparatus for providing a high-performance active matrix pixel using organic thin-film transistors
US6870209B2 (en) * 2003-01-09 2005-03-22 Dialog Semiconductor Gmbh CMOS pixel with dual gate PMOS
KR100711001B1 (ko) * 2003-12-29 2007-04-24 엘지.필립스 엘시디 주식회사 유기전계발광 소자
US7672558B2 (en) 2004-01-12 2010-03-02 Honeywell International, Inc. Silicon optical device
JP2007001349A (ja) * 2005-06-21 2007-01-11 Inoac Corp 車両用照明装置及び車両用照明装置本体
US7362443B2 (en) 2005-11-17 2008-04-22 Honeywell International Inc. Optical gyro with free space resonator and method for sensing inertial rotation rate
US7463360B2 (en) * 2006-04-18 2008-12-09 Honeywell International Inc. Optical resonator gyro with integrated external cavity beam generator
US7454102B2 (en) 2006-04-26 2008-11-18 Honeywell International Inc. Optical coupling structure
US7535576B2 (en) * 2006-05-15 2009-05-19 Honeywell International, Inc. Integrated optical rotation sensor and method for sensing rotation rate
CN110415662B (zh) * 2019-07-18 2021-01-01 深圳市华星光电技术有限公司 Goa器件及栅极驱动电路

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890632A (en) * 1973-12-03 1975-06-17 Rca Corp Stabilized semiconductor devices and method of making same
US4345265A (en) * 1980-04-14 1982-08-17 Supertex, Inc. MOS Power transistor with improved high-voltage capability
JPH0783119B2 (ja) * 1988-08-25 1995-09-06 日本電気株式会社 電界効果トランジスタ
JP2507567B2 (ja) * 1988-11-25 1996-06-12 三菱電機株式会社 絶縁体基板上の半導体層に形成されたｍｏｓ型電界効果トランジスタ
US5182624A (en) * 1990-08-08 1993-01-26 Minnesota Mining And Manufacturing Company Solid state electromagnetic radiation detector fet array
US5302966A (en) * 1992-06-02 1994-04-12 David Sarnoff Research Center, Inc. Active matrix electroluminescent display and method of operation
US5359219A (en) * 1992-12-04 1994-10-25 Texas Instruments Incorporated Silicon on insulator device comprising improved substrate doping
US5489792A (en) * 1994-04-07 1996-02-06 Regents Of The University Of California Silicon-on-insulator transistors having improved current characteristics and reduced electrostatic discharge susceptibility
US5463279A (en) * 1994-08-19 1995-10-31 Planar Systems, Inc. Active matrix electroluminescent cell design
US5587329A (en) * 1994-08-24 1996-12-24 David Sarnoff Research Center, Inc. Method for fabricating a switching transistor having a capacitive network proximate a drift region

Also Published As

Publication number Publication date
WO1998042027A1 (en) 1998-09-24
JP2002515139A (ja) 2002-05-21
AU6546398A (en) 1998-10-12
EP0968533B1 (de) 2002-11-27
DE69809723T2 (de) 2003-08-21
US6147362A (en) 2000-11-14
DE69809723D1 (de) 2003-01-09
EP0968533A1 (de) 2000-01-05

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