ATE209262T1 - Verfahren zum beschichten von substraten - Google Patents

Verfahren zum beschichten von substraten

Info

Publication number
ATE209262T1
ATE209262T1 AT95911413T AT95911413T ATE209262T1 AT E209262 T1 ATE209262 T1 AT E209262T1 AT 95911413 T AT95911413 T AT 95911413T AT 95911413 T AT95911413 T AT 95911413T AT E209262 T1 ATE209262 T1 AT E209262T1
Authority
AT
Austria
Prior art keywords
pct
magnetrons
sec
allows
deposited
Prior art date
Application number
AT95911413T
Other languages
English (en)
Inventor
Norman Henry White
Allen Robert Waugh
Alaric Graham Spencer
John Michael Walls
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10752161&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE209262(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed filed Critical
Application granted granted Critical
Publication of ATE209262T1 publication Critical patent/ATE209262T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Coating Apparatus (AREA)
  • Optical Integrated Circuits (AREA)
  • Liquid Crystal (AREA)
AT95911413T 1994-03-19 1995-03-17 Verfahren zum beschichten von substraten ATE209262T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9405442A GB9405442D0 (en) 1994-03-19 1994-03-19 Apparatus for coating substrates
PCT/GB1995/000580 WO1995025827A2 (en) 1994-03-19 1995-03-17 Apparatus for coating substrates

Publications (1)

Publication Number Publication Date
ATE209262T1 true ATE209262T1 (de) 2001-12-15

Family

ID=10752161

Family Applications (2)

Application Number Title Priority Date Filing Date
AT95911413T ATE209262T1 (de) 1994-03-19 1995-03-17 Verfahren zum beschichten von substraten
AT95911438T ATE175451T1 (de) 1994-03-19 1995-03-20 Vorrichtung zum beschichten von substraten

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT95911438T ATE175451T1 (de) 1994-03-19 1995-03-20 Vorrichtung zum beschichten von substraten

Country Status (7)

Country Link
US (2) US6090248A (de)
EP (2) EP0699245B1 (de)
AT (2) ATE209262T1 (de)
AU (2) AU1898995A (de)
DE (2) DE69524009T2 (de)
GB (1) GB9405442D0 (de)
WO (2) WO1995025827A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19609804C1 (de) * 1996-03-13 1997-07-31 Bosch Gmbh Robert Einrichtung, ihre Verwendung und ihr Betrieb zum Vakuumbeschichten von Schüttgut
DE19738234C1 (de) * 1997-09-02 1998-10-22 Fraunhofer Ges Forschung Einrichtung zum Aufstäuben von Hartstoffschichten
DE19834314A1 (de) * 1998-07-30 2000-02-03 Leybold Systems Gmbh Verfahren zum Aufbringen einer Kratzschutzschicht und eines Entspiegelungsschichtsystems und Vorrichtung zu seiner Durchführung
US6527866B1 (en) * 2000-02-09 2003-03-04 Conductus, Inc. Apparatus and method for deposition of thin films
US6429097B1 (en) * 2000-05-22 2002-08-06 Sharp Laboratories Of America, Inc. Method to sputter silicon films
EP1275751A1 (de) * 2001-07-13 2003-01-15 Satis Vacuum Industries Vertriebs - AG Verfahren und Vorrichtung zur Herstellung eines optisch wirksamen Schichtsystems
DE10311466B4 (de) * 2003-03-15 2005-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum reaktiven Magnetron-Sputtern
US20050092599A1 (en) * 2003-10-07 2005-05-05 Norm Boling Apparatus and process for high rate deposition of rutile titanium dioxide
US20050100665A1 (en) * 2003-11-06 2005-05-12 General Electric Company Method for applying an optical coating to a surface of an article
US20060236931A1 (en) * 2005-04-25 2006-10-26 Varian Semiconductor Equipment Associates, Inc. Tilted Plasma Doping
US20070173925A1 (en) * 2006-01-25 2007-07-26 Cornova, Inc. Flexible expandable stent
US20080215132A1 (en) * 2006-08-28 2008-09-04 Cornova, Inc. Implantable devices having textured surfaces and methods of forming the same
US7892598B1 (en) * 2006-12-19 2011-02-22 Intelli-Plac LLC Method of providing a reusable labeling surface for receiving a removable element on the surface of an object
KR20090126863A (ko) * 2008-06-05 2009-12-09 삼성전자주식회사 광학적 기능성을 갖는 다층 봉지 박막의 형성방법 및 그에 의해 제조된 다층 봉지 박막
DE102008062332A1 (de) * 2008-12-15 2010-06-17 Gühring Ohg Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten
EP2718959B1 (de) 2011-06-07 2018-10-31 Vision Ease LP Verbesserungen bei der auftragung von beschichtungsmaterialien
JP5713872B2 (ja) * 2011-10-28 2015-05-07 株式会社神戸製鋼所 成膜装置及び成膜方法
CN103160792B (zh) * 2011-12-12 2017-02-08 许聪波 镀膜装置
WO2019219255A1 (en) * 2018-05-17 2019-11-21 Evatec Ag Method of treating a substrate and vacuum deposition apparatus
US12331400B2 (en) * 2022-11-07 2025-06-17 Creating Nano Technologies, Inc. Surface treatment apparatus

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU52106A1 (de) * 1966-10-05 1968-05-07
US3641973A (en) * 1970-11-25 1972-02-15 Air Reduction Vacuum coating apparatus
JPS6039162A (ja) * 1983-08-10 1985-02-28 Anelva Corp 薄膜処理真空装置
GB8413776D0 (en) * 1984-05-30 1984-07-04 Dowty Electronics Ltd Sputtering process
US4724296A (en) * 1986-02-28 1988-02-09 Morley John R Plasma generator
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
DE68926577T2 (de) * 1988-03-30 1996-10-02 Rohm Co Ltd Einrichtung zur Molekularstrahlepitaxie
GB9006073D0 (en) * 1990-03-17 1990-05-16 D G Teer Coating Services Limi Magnetron sputter ion plating
GB9101106D0 (en) * 1991-01-18 1991-02-27 Cray Microcoat Ltd Ion vapour deposition apparatus and method
DE4106770C2 (de) * 1991-03-04 1996-10-17 Leybold Ag Verrichtung zum reaktiven Beschichten eines Substrats
EP0502385B1 (de) * 1991-03-05 1995-06-21 Balzers Aktiengesellschaft Verfahren zur Herstellung einer doppelseitigen Beschichtung von optischen Werkstücken
US5415757A (en) * 1991-11-26 1995-05-16 Leybold Aktiengesellschaft Apparatus for coating a substrate with electrically nonconductive coatings

Also Published As

Publication number Publication date
US6090247A (en) 2000-07-18
EP0699246A1 (de) 1996-03-06
DE69507095D1 (de) 1999-02-18
DE69524009T2 (de) 2002-07-11
EP0699245B1 (de) 2001-11-21
US6090248A (en) 2000-07-18
AU1900995A (en) 1995-10-09
WO1995025828A1 (en) 1995-09-28
DE69507095T2 (de) 1999-07-15
WO1995025827A2 (en) 1995-09-28
WO1995025827A3 (en) 1995-10-12
EP0699246B1 (de) 1999-01-07
AU1898995A (en) 1995-10-09
ATE175451T1 (de) 1999-01-15
GB9405442D0 (en) 1994-05-04
DE69524009D1 (de) 2002-01-03
EP0699245A1 (de) 1996-03-06

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Legal Events

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