ATE202372T1 - Photoempfindliche harzzusammensetzung - Google Patents

Photoempfindliche harzzusammensetzung

Info

Publication number
ATE202372T1
ATE202372T1 AT96935493T AT96935493T ATE202372T1 AT E202372 T1 ATE202372 T1 AT E202372T1 AT 96935493 T AT96935493 T AT 96935493T AT 96935493 T AT96935493 T AT 96935493T AT E202372 T1 ATE202372 T1 AT E202372T1
Authority
AT
Austria
Prior art keywords
group
epoxy resin
similar
epoxy
resin composition
Prior art date
Application number
AT96935493T
Other languages
English (en)
Inventor
Katsue Nishikawa
Keiichi Kinashi
Reiko Chiba
Youshichi Hagiwara
Original Assignee
Nat Starch Chem Invest
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Starch Chem Invest filed Critical Nat Starch Chem Invest
Application granted granted Critical
Publication of ATE202372T1 publication Critical patent/ATE202372T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/064—Polymers containing more than one epoxy group per molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
AT96935493T 1995-10-30 1996-10-30 Photoempfindliche harzzusammensetzung ATE202372T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28210695A JP3851366B2 (ja) 1995-10-30 1995-10-30 感光性樹脂組成物
PCT/JP1996/003173 WO1997016470A1 (en) 1995-10-30 1996-10-30 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
ATE202372T1 true ATE202372T1 (de) 2001-07-15

Family

ID=17648209

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96935493T ATE202372T1 (de) 1995-10-30 1996-10-30 Photoempfindliche harzzusammensetzung

Country Status (9)

Country Link
EP (1) EP0858472B1 (de)
JP (1) JP3851366B2 (de)
AT (1) ATE202372T1 (de)
AU (1) AU705375B2 (de)
CA (1) CA2234110C (de)
DE (1) DE69613479T2 (de)
MY (1) MY114034A (de)
TW (1) TW407224B (de)
WO (1) WO1997016470A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4152106B2 (ja) * 2000-02-14 2008-09-17 太陽インキ製造株式会社 艶消し皮膜形成用光硬化性・熱硬化性組成物
CN1259349C (zh) * 2000-03-29 2006-06-14 学校法人神奈川大学 活性能量线固化性树脂、其制造方法及光固化性、热固化性树脂组合物
EP1327642A4 (de) * 2000-09-20 2006-07-19 Taiyo Ink Mfg Co Ltd Carboxyliertes photosensitives harz, dieses enthaltende, mit alkali entwickelbare, lichthärtbare/hitzehärtbare zusammensetzung und daraus erhältlicher gehärteter artikel
JP4382978B2 (ja) * 2000-12-04 2009-12-16 学校法人神奈川大学 光硬化性・熱硬化性樹脂組成物
JP4682340B2 (ja) * 2003-07-25 2011-05-11 昭和電工株式会社 感光性樹脂の製造方法
CN102520580A (zh) 2005-08-30 2012-06-27 日立化成工业株式会社 光阻图案的形成方法
JP4865911B2 (ja) 2008-06-09 2012-02-01 互応化学工業株式会社 カルボキシル基含有樹脂を含有する硬化性組成物及びその硬化物並びにカルボキシル基含有樹脂を得る方法
EP2678368B1 (de) 2011-02-23 2015-05-06 AlzChem AG Neue härter für epoxidharze
WO2014020072A2 (de) 2012-08-02 2014-02-06 Alzchem Ag Flüssige härter zur härtung von epoxidharzen (ii)
JP6143090B2 (ja) * 2013-07-01 2017-06-07 日立化成株式会社 感光性樹脂組成物、これを用いた感光性フィルム、永久レジスト及び永久レジストの製造方法
JP6259240B2 (ja) * 2013-09-30 2018-01-10 昭和電工株式会社 感光性樹脂の製造方法及びカラーフィルターの製造方法
KR102361595B1 (ko) * 2015-03-11 2022-02-11 동우 화인켐 주식회사 흑색 감광성 수지 조성물 및 이로부터 제조된 액정표시장치용 블랙 매트릭스 및 컬럼 스페이서
CN104788609B (zh) * 2015-04-23 2017-02-22 济南大学 一种高交联单分散含有环氧基团的聚合物微球及其制备方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0823694B2 (ja) * 1988-08-04 1996-03-06 富士写真フイルム株式会社 液状感光性樹脂組成物
CA2055833C (en) * 1990-11-20 2001-04-24 Katsue Nishikawa Preparation of unsaturated epoxy ester resin and carboxylated unsaturated epoxy ester resin and photosensitive composition comprising the same

Also Published As

Publication number Publication date
EP0858472A1 (de) 1998-08-19
WO1997016470A1 (en) 1997-05-09
JPH09136942A (ja) 1997-05-27
TW407224B (en) 2000-10-01
AU705375B2 (en) 1999-05-20
CA2234110C (en) 2004-01-06
EP0858472B1 (de) 2001-06-20
DE69613479D1 (de) 2001-07-26
JP3851366B2 (ja) 2006-11-29
CA2234110A1 (en) 1997-05-09
DE69613479T2 (de) 2002-04-25
MY114034A (en) 2002-07-31
AU7338396A (en) 1997-05-22

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