ES2034949T1 - Agentes de revestimiento reticulables por radiacion y su utilizacion. - Google Patents

Agentes de revestimiento reticulables por radiacion y su utilizacion.

Info

Publication number
ES2034949T1
ES2034949T1 ES199292103439T ES92103439T ES2034949T1 ES 2034949 T1 ES2034949 T1 ES 2034949T1 ES 199292103439 T ES199292103439 T ES 199292103439T ES 92103439 T ES92103439 T ES 92103439T ES 2034949 T1 ES2034949 T1 ES 2034949T1
Authority
ES
Spain
Prior art keywords
radiation
reacting
epoxide
groups
coating agents
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES199292103439T
Other languages
English (en)
Other versions
ES2034949T3 (es
Inventor
Ulrich Grundke
Klaus-Peter Liebetanz
Achim Dr. Hansen
Jurgen Dr. Zehrfeld
Rainer Scharre
Werner Peters
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lackwerke Peters GmbH and Co KG
Ruetgers Germany GmbH
Original Assignee
Lackwerke Peters GmbH and Co KG
Ruetgerswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lackwerke Peters GmbH and Co KG, Ruetgerswerke AG filed Critical Lackwerke Peters GmbH and Co KG
Publication of ES2034949T1 publication Critical patent/ES2034949T1/es
Application granted granted Critical
Publication of ES2034949T3 publication Critical patent/ES2034949T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/58—Epoxy resins
    • C08G18/581—Reaction products of epoxy resins with less than equivalent amounts of compounds containing active hydrogen added before or during the reaction with the isocyanate component
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10—Epoxy resins modified by unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D155/00—Coating compositions based on homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C09D123/00 - C09D153/00
    • C09D155/005—Homopolymers or copolymers obtained by polymerisation of macromolecular compounds terminated by a carbon-to-carbon double bond
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

LOS MEDIOS DE RECUBRIMIENTO RETICULABLES MEDIANTE IRRADIACION CONTIENEN COMO COMPONENTES AGLUTINANTES UN ESTER OLEFINICO NO SATURADO DE UNA RESINA NOVOLACA EPOXIDO Y UN AGLUTINANTE QUE SE OBTIENE MEDIANTE LA TRASFORMACION DE UN COMPUESTO EPOXIDO CON MAS DE 1 GRUPO EPOXIDO POR MOLECULA CON UNO O VARIOS ACIDOS ORGANICOS EN UNA RELACION MOLAR DE LOS GRUPOS EPOXIDOS CON LOS GRUPOS CARBOXILICOS DE 1:0,5 A 0,9 Y TRANSFORMACION CONSIGUIENTE DEL PRODUCTO DE REACCION CON UNO O VARIOS ESTERES NO SATURADOS DE ISOCIANATOCARBAMATO, QUE SE OBTIENE MEDIANTE LA TRASFORMACION DE COMPUESTOS CON AL MENOS DOS GRUPOS DE ISOCIANATO CON ESTERES DE ACIDO ACRILICO, METACRILICO O CIANOACRILICO QUE CONTIENEN GRUPOS HIDROXILOS.
ES92103439T 1991-05-24 1992-02-28 Agentes de revestimiento reticulables por radiaciones y su utilizacion. Expired - Lifetime ES2034949T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4116957A DE4116957A1 (de) 1991-05-24 1991-05-24 Durch strahlung vernetzbare beschichtungsmittel und ihre verwendung

Publications (2)

Publication Number Publication Date
ES2034949T1 true ES2034949T1 (es) 1993-04-16
ES2034949T3 ES2034949T3 (es) 1997-12-16

Family

ID=6432325

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92103439T Expired - Lifetime ES2034949T3 (es) 1991-05-24 1992-02-28 Agentes de revestimiento reticulables por radiaciones y su utilizacion.

Country Status (7)

Country Link
US (1) US5436279A (es)
EP (1) EP0514630B1 (es)
JP (1) JP3168065B2 (es)
AT (1) ATE156178T1 (es)
DE (2) DE4116957A1 (es)
ES (1) ES2034949T3 (es)
GR (1) GR920300133T1 (es)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4240504C2 (de) * 1992-12-02 2003-04-30 Cis Inst Fuer Mikrosensorik Gg Verfahren zur Herstellung von Leitbahnstrukturen über Grabengebieten von Substraten
DE4240506A1 (de) * 1992-12-02 1994-12-15 Ct Fuer Intelligente Sensorik Verfahren zur Herstellung von Leitbahnen über Grabengebiete von integrierten Halbleiterschaltungen, wobei zur Strukturierung Lötstoppresist eingesetzt wird
US5489621A (en) * 1993-05-12 1996-02-06 Fuji Photo Film Co., Ltd. Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor
TW290583B (es) * 1993-10-14 1996-11-11 Alpha Metals Ltd
JPH101523A (ja) 1996-06-14 1998-01-06 Japan Synthetic Rubber Co Ltd 放射線硬化性樹脂組成物
US5910706A (en) * 1996-12-18 1999-06-08 Ultra Silicon Technology (Uk) Limited Laterally transmitting thin film electroluminescent device
US6479706B1 (en) 1997-02-04 2002-11-12 Albemarle Corporation Aminobenzophenones and photopolymerizable compositions including the same
DE19810549A1 (de) 1998-03-11 1999-09-16 Delo Industrieklebstoffe Gmbh Polymerisierbare fluorhaltige Zubereitung, ihre Verwendung und Verfahren zur Herstellung ausgehärteter Polymermassen aus dieser Zubereitung
SE9803670L (sv) * 1998-10-26 2000-04-27 Ericsson Telefon Ab L M Förfarande vid framställning av kretskort
EP1072659B1 (en) * 1999-07-28 2004-10-13 Armstrong World Industries, Inc. Composition and process for providing a gloss controlled, abrasion resistant coating on surface covering products
US6805917B1 (en) * 1999-12-06 2004-10-19 Roy C. Krohn UV curable compositions for producing decorative metallic coatings
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
KR100538655B1 (ko) * 2001-07-19 2005-12-23 주식회사 동진쎄미켐 감광성 수지 조성물
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
KR101115598B1 (ko) * 2004-04-14 2012-03-14 나믹스 코포레이션 에폭시 수지 조성물
CN101395193B (zh) * 2006-03-03 2014-03-12 茵迪斯佩克化学公司 间苯二酚树脂封闭的异氰酸酯及其应用
US7794531B2 (en) * 2007-01-08 2010-09-14 Enthone Inc. Organic solderability preservative comprising high boiling temperature alcohol
JP2010248297A (ja) * 2009-04-10 2010-11-04 Taiyo Ink Mfg Ltd 光硬化性樹脂及び光硬化性樹脂組成物
KR20200099686A (ko) * 2019-02-15 2020-08-25 엘지이노텍 주식회사 회로기판

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3958996A (en) * 1973-05-07 1976-05-25 E. I. Du Pont De Nemours And Company Photopolymerizable paste composition
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
JPS5774369A (en) * 1980-10-28 1982-05-10 Mitsui Petrochem Ind Ltd Coating composition
EP0075537B2 (de) * 1981-09-17 1991-03-20 Ciba-Geigy Ag Verfahren zum Beschichten gedruckter Schaltungen
DE3508450A1 (de) * 1985-03-09 1986-09-11 Rütgerswerke AG, 6000 Frankfurt Durch strahlung vernetzbare bindemittel und ihre verwendung
US4618658A (en) * 1985-05-16 1986-10-21 The Dow Chemical Company Polymer modified epoxy resin compositions
JPH0224657A (ja) * 1988-07-13 1990-01-26 Hitachi Chem Co Ltd 感光性樹脂組成物
DE4025687A1 (de) * 1990-08-14 1992-02-20 Ruetgerswerke Ag Durch strahlung vernetzbare bindemittelgemische

Also Published As

Publication number Publication date
EP0514630A1 (de) 1992-11-25
ES2034949T3 (es) 1997-12-16
GR920300133T1 (en) 1993-03-16
EP0514630B1 (de) 1997-07-30
DE59208740D1 (de) 1997-09-04
ATE156178T1 (de) 1997-08-15
JP3168065B2 (ja) 2001-05-21
US5436279A (en) 1995-07-25
DE4116957A1 (de) 1992-11-26
JPH05194877A (ja) 1993-08-03

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