ATE196550T1 - Strahlhomogenisierer - Google Patents

Strahlhomogenisierer

Info

Publication number
ATE196550T1
ATE196550T1 AT97952596T AT97952596T ATE196550T1 AT E196550 T1 ATE196550 T1 AT E196550T1 AT 97952596 T AT97952596 T AT 97952596T AT 97952596 T AT97952596 T AT 97952596T AT E196550 T1 ATE196550 T1 AT E196550T1
Authority
AT
Austria
Prior art keywords
output plane
homogenizer
hologram
input beam
output
Prior art date
Application number
AT97952596T
Other languages
German (de)
English (en)
Inventor
Alan D Kathman
Michael R Feldman
Original Assignee
Digital Optics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Digital Optics Corp filed Critical Digital Optics Corp
Application granted granted Critical
Publication of ATE196550T1 publication Critical patent/ATE196550T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G02B19/0057—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode in the form of a laser diode array, e.g. laser diode bar
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2286—Particular reconstruction light ; Beam properties
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
    • H04B10/50—Transmitters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0236—Form or shape of the hologram when not registered to the substrate, e.g. trimming the hologram to alphanumerical shape
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
    • G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
    • G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
    • G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/35—Transverse intensity distribution of the light beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Signal Processing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surgical Instruments (AREA)
  • Recrystallisation Techniques (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT97952596T 1996-12-20 1997-12-19 Strahlhomogenisierer ATE196550T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/770,524 US5850300A (en) 1994-02-28 1996-12-20 Diffractive beam homogenizer having free-form fringes
PCT/US1997/023715 WO1998028650A1 (en) 1996-12-20 1997-12-19 Beam homogenizer

Publications (1)

Publication Number Publication Date
ATE196550T1 true ATE196550T1 (de) 2000-10-15

Family

ID=25088849

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97952596T ATE196550T1 (de) 1996-12-20 1997-12-19 Strahlhomogenisierer

Country Status (8)

Country Link
US (6) US5850300A (enExample)
EP (1) EP0946894B1 (enExample)
JP (3) JP4787944B2 (enExample)
KR (1) KR100486997B1 (enExample)
AT (1) ATE196550T1 (enExample)
AU (1) AU5617098A (enExample)
DE (1) DE69703165T2 (enExample)
WO (1) WO1998028650A1 (enExample)

Families Citing this family (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
US20040114035A1 (en) * 1998-03-24 2004-06-17 Timothy White Focusing panel illumination method and apparatus
JP2003529784A (ja) * 1998-04-24 2003-10-07 ディジタル・オプティックス・コーポレイション 散乱イメージャおよび関連方法
US6898216B1 (en) * 1999-06-30 2005-05-24 Lambda Physik Ag Reduction of laser speckle in photolithography by controlled disruption of spatial coherence of laser beam
US6072631A (en) * 1998-07-09 2000-06-06 3M Innovative Properties Company Diffractive homogenizer with compensation for spatial coherence
US6259562B1 (en) * 1998-08-25 2001-07-10 Physical Optics Corporation Device including an optical element with an integral surface diffuser
US6166389A (en) * 1998-08-25 2000-12-26 Physical Optics Corporation Apparatus having a light source and a sol-gel monolithic diffuser
US6266476B1 (en) * 1998-08-25 2001-07-24 Physical Optics Corporation Optical element having an integral surface diffuser
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
JP2001174615A (ja) * 1999-04-15 2001-06-29 Nikon Corp 回折光学素子、該素子の製造方法、該素子を備える照明装置、投影露光装置、露光方法、及び光ホモジナイザー、該光ホモジナイザーの製造方法
AU762603B2 (en) 1999-06-01 2003-06-26 De La Rue International Limited Security device
US6313948B1 (en) * 1999-08-02 2001-11-06 James I. Hanna Optical beam shaper
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
US6671035B2 (en) 1999-09-29 2003-12-30 Asml Netherlands B.V. Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
TW546550B (en) * 1999-12-13 2003-08-11 Asml Netherlands Bv An illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
DE10062579A1 (de) * 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
US6714328B2 (en) * 2000-01-07 2004-03-30 Honeywell International Inc. Volume holographic diffusers
US6421148B2 (en) * 2000-01-07 2002-07-16 Honeywell International Inc. Volume holographic diffusers
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
KR100811017B1 (ko) * 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
DE60114820T2 (de) * 2000-06-15 2006-09-14 3M Innovative Properties Co., St. Paul Mikroherstellungsverfahren für organische optische bauteile
KR100810547B1 (ko) * 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 캡슐화 광학 부재의 제작방법, 광학소자 및 이의 커플링 방법
US7166409B2 (en) * 2000-06-15 2007-01-23 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
KR100795759B1 (ko) * 2000-06-15 2008-01-21 쓰리엠 이노베이티브 프로퍼티즈 캄파니 미세유체 물품의 제조 방법
DE60139624D1 (de) * 2000-06-15 2009-10-01 3M Innovative Properties Co Erzeugung eines mehrfarbenbildes mittels eines multiphoton photochemischen verfahren
US6731432B1 (en) 2000-06-16 2004-05-04 Mem Optical, Inc. Off-axis diffractive beam shapers and splitters for reducing sensitivity to manufacturing tolerances
US7142741B2 (en) * 2000-10-25 2006-11-28 Iruvis Limited Laser cutting method and apparatus for optical fibres or waveguides
JP2005502095A (ja) * 2000-11-07 2005-01-20 ホログラフイツク・イメージング・エル・エル・シー 改良型３次元ディスプレイ
WO2002039389A1 (en) * 2000-11-07 2002-05-16 Holographic Imaging Llc Computer generated hologram display system
US6568846B1 (en) * 2000-11-15 2003-05-27 The United States Of America As Represented By The Secretary Of The Army Pulsed laser heating simulation of thermal damage on coated surface
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
KR100433585B1 (ko) * 2001-02-28 2004-05-31 한국전자통신연구원 비접촉식 결합형 이진 위상 홀로그램 및 그 구현 방법
JP2002287023A (ja) * 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US7199929B2 (en) * 2001-04-27 2007-04-03 Asml Holdings N.V. Methods for optical beam shaping and diffusing
US7295356B2 (en) * 2001-06-08 2007-11-13 Inphase Technologies, Inc. Method for improved holographic recording using beam apodization
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
DE10132988B4 (de) 2001-07-06 2005-07-28 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
EP1407310A1 (en) * 2001-07-16 2004-04-14 OY ICS Intelligent Control Systems Ltd. Diffractive shaping of the intensity distribution of a spatially partially coherent light beam
DE10136611C1 (de) * 2001-07-23 2002-11-21 Jenoptik Laserdiode Gmbh Optische Anordnung zur Formung und Homogenisierung eines von einer Laserdiodenanordnung ausgehenden Laserstrahls
US6744502B2 (en) * 2001-09-28 2004-06-01 Pe Corporation (Ny) Shaped illumination geometry and intensity using a diffractive optical element
US20030067774A1 (en) * 2001-10-04 2003-04-10 Nanovia, L.P. Illumination systems and methods employing diffractive holographic optical elements
KR100431587B1 (ko) * 2002-05-08 2004-05-17 한국원자력연구소 분리-재결합 방식의 레이저빔 균질화 장치 및 방법
US6859326B2 (en) * 2002-09-20 2005-02-22 Corning Incorporated Random microlens array for optical beam shaping and homogenization
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
JP3794406B2 (ja) 2003-01-21 2006-07-05 セイコーエプソン株式会社 液滴吐出装置、印刷装置、印刷方法および電気光学装置
US6842223B2 (en) 2003-04-11 2005-01-11 Nikon Precision Inc. Enhanced illuminator for use in photolithographic systems
AU2003281995A1 (en) * 2003-04-11 2004-11-01 Carl Zeiss Smt Ag Diffuser, wavefront source, wavefront sensor and projection lighting facility
US7174077B1 (en) 2003-07-30 2007-02-06 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Fiber coupled laser diodes with even illumination pattern
WO2005078522A2 (en) * 2004-02-17 2005-08-25 Carl Zeiss Smt Ag Illumination system for a microlithographic projection exposure apparatus
US7158909B2 (en) * 2004-03-31 2007-01-02 Balboa Instruments, Inc. Method and system for testing spas
KR100565076B1 (ko) * 2004-08-05 2006-03-30 삼성전자주식회사 레이저 반점을 제거한 조명계 및 이를 채용한 프로젝션시스템
CN101793989B (zh) * 2004-08-31 2013-10-16 数字光学东方公司 单块的偏振受控角漫射器及有关方法
JP4244889B2 (ja) * 2004-09-01 2009-03-25 ソニー株式会社 反射型スクリーン用光拡散フィルム及びその製造方法、反射型スクリーン用スクリーン
CN101907622A (zh) * 2004-11-24 2010-12-08 巴特尔纪念研究所 用于检测稀有细胞的方法和装置
EP1669815B1 (en) * 2004-12-10 2019-02-20 Essilor International Method for printing a binary hologram on a manufactured product, and optical lens with a binary hologram printed thereon
US7180669B2 (en) * 2004-12-17 2007-02-20 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Method and system for generating substantially uniform speckle patterns
US20080259460A1 (en) * 2005-05-27 2008-10-23 Edmund Optics, Inc. Light-pipe integrator with mask for uniform irradiance
JP4821204B2 (ja) * 2005-07-22 2011-11-24 セイコーエプソン株式会社 照明装置及び画像表示装置、並びにプロジェクタ
US7411735B2 (en) * 2005-12-06 2008-08-12 3M Innovative Property Company Illumination system incorporating collimated light source
US20170285351A9 (en) * 2005-12-28 2017-10-05 Islam A. Salama Laser via drilling apparatus and methods
DE102006012034A1 (de) * 2006-03-14 2007-09-20 Carl Zeiss Smt Ag Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
US20080062242A1 (en) * 2006-09-12 2008-03-13 Hewlett-Packard Development Company, L.P. Optical print head with non-Gaussian irradiance
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
SG10201602750RA (en) * 2007-10-16 2016-05-30 Nikon Corp Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
US20090251751A1 (en) * 2008-04-02 2009-10-08 Kurt Kuhlmann Optical Imaging System
DE102009005844B4 (de) * 2009-01-21 2018-11-22 Jenoptik Optical Systems Gmbh Anordnung zur Umwandlung gaussförmiger Laserstrahlung
JP5852300B2 (ja) * 2009-12-02 2016-02-03 オリンパス株式会社 光検出装置、顕微鏡および内視鏡
JP5366019B2 (ja) 2010-08-02 2013-12-11 株式会社ニコン 伝送光学系、照明光学系、露光装置、およびデバイス製造方法
WO2012018017A1 (ja) * 2010-08-06 2012-02-09 旭硝子株式会社 回折光学素子及び計測装置
JP4788839B2 (ja) * 2010-12-01 2011-10-05 セイコーエプソン株式会社 照明装置及び画像表示装置、並びにプロジェクタ
KR101798063B1 (ko) 2010-12-14 2017-11-15 삼성전자주식회사 조명 광학계 및 이를 포함하는 3차원 영상 획득 장치
DE102012010093A1 (de) * 2012-05-23 2013-11-28 Carl Zeiss Smt Gmbh Facettenspiegel
JP6041093B2 (ja) * 2012-07-06 2016-12-07 大日本印刷株式会社 ホログラム再生装置、ホログラム再生方法、投射型映像表示装置
EP2720072A1 (en) 2012-10-12 2014-04-16 Vision Engineering Limited Optical instrument with diffractive element
JP6070274B2 (ja) * 2013-02-28 2017-02-01 旭硝子株式会社 拡散素子、照明光学系および計測装置
US9291825B2 (en) 2013-03-22 2016-03-22 Applied Materials Israel, Ltd. Calibratable beam shaping system and method
KR102127968B1 (ko) * 2013-12-10 2020-06-29 엘지이노텍 주식회사 조명장치
US9626459B2 (en) 2014-01-24 2017-04-18 International Business Machines Corporation Detecting hotspots using machine learning on diffraction patterns
US10012544B2 (en) 2016-11-29 2018-07-03 Cymer, Llc Homogenization of light beam for spectral feature metrology
JP7342354B2 (ja) * 2017-12-04 2023-09-12 大日本印刷株式会社 光照射装置
JP2021513099A (ja) * 2018-01-21 2021-05-20 フサオ イシイ ホログラフィック光学素子の構造及び製造方法
JP7341645B2 (ja) * 2018-09-21 2023-09-11 デクセリアルズ株式会社 光学体の製造方法
US12092836B2 (en) 2018-10-26 2024-09-17 Viavi Solutions Inc. Optical element and optical system
KR102140603B1 (ko) * 2019-02-28 2020-08-03 주식회사 아큐레이저 레이저 빔의 빔 분포를 조절시키는 광학시스템
KR102798253B1 (ko) 2020-02-25 2025-04-18 가부시키가이샤 니콘 광학 지연 시스템
CN111522144B (zh) * 2020-05-15 2022-08-23 珠海迈时光电科技有限公司 激光分束器
US11435670B1 (en) 2021-02-26 2022-09-06 Taiwan Semiconductor Manufacturing Co., Ltd. Multi-component kernels for vector optical image simulation
WO2024105851A1 (ja) 2022-11-17 2024-05-23 株式会社ニコン 加工システム

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4170396A (en) * 1975-04-14 1979-10-09 Siemens Aktiengesellschaft Optical component element
US4455061A (en) * 1980-07-31 1984-06-19 The Regents Of The University Of Minnesota Multi-faceted holographic optical element and methods of making and using same
US4410237A (en) * 1980-09-26 1983-10-18 Massachusetts Institute Of Technology Method and apparatus for shaping electromagnetic beams
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
US4682841A (en) * 1981-06-15 1987-07-28 Afian Viktor V Light radiation concentrator and method of making the same
JPH0355501A (ja) * 1989-07-25 1991-03-11 Nippon Sheet Glass Co Ltd レンズアレイ板
US5333077A (en) * 1989-10-31 1994-07-26 Massachusetts Inst Technology Method and apparatus for efficient concentration of light from laser diode arrays
US5075800A (en) * 1989-12-04 1991-12-24 Yeda Research And Development Co. Ltd. Method of optimizing holographic optical elements
US4979791A (en) * 1989-12-08 1990-12-25 Amp Incorporated Laser diode connector assembly
US5117476A (en) * 1990-01-19 1992-05-26 Amp Incorporated Optical transceiver package with insertable subassembly
US5061025A (en) * 1990-04-13 1991-10-29 Eastman Kodak Company Hologon scanner with beam shaping stationary diffraction grating
US5016025A (en) * 1990-05-25 1991-05-14 Wyss John R Automatic secured document meter reading apparatus
EP0479490A3 (en) * 1990-10-02 1992-08-12 Physical Optics Corporation Volume holographic diffuser
US6252647B1 (en) * 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
JP2525962B2 (ja) * 1991-03-20 1996-08-21 富士通株式会社 ホログラフィック光学素子の最適化方法及びホログラムを用いた装置
US5657138A (en) * 1991-10-13 1997-08-12 Lewis; Aaron Generating defined structures on materials using combined optical technologies for transforming the processing beam
US5202775A (en) * 1991-11-04 1993-04-13 University Of North Carolina Radically symmetric hologram and method of fabricating the same
EP0580905A1 (en) * 1992-07-28 1994-02-02 BRITISH TELECOMMUNICATIONS public limited company Optical radiation devices
US5383000A (en) * 1992-11-24 1995-01-17 General Signal Corporation Partial coherence varier for microlithographic system
US5315427A (en) * 1992-12-14 1994-05-24 Xerox Corporation Pair of binary diffraction optics for use in overfilled raster output scanning systems
US5289298A (en) * 1992-12-22 1994-02-22 Hughes Aircraft Company Multiplex grating holographic floodlit center high mounted stoplight
US5320918A (en) * 1992-12-31 1994-06-14 At&T Bell Laboratories Optical lithographical imaging system including optical transmission diffraction devices
US5393634A (en) 1993-05-27 1995-02-28 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Continuous phase and amplitude holographic elements
JPH08512003A (ja) * 1993-07-27 1996-12-17 フィジィカル オプティクス コーポレーション 光源の解体成形装置
US5610733A (en) * 1994-02-28 1997-03-11 Digital Optics Corporation Beam-homogenizer
US5850300A (en) * 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
US5453814A (en) * 1994-04-13 1995-09-26 Nikon Precision Inc. Illumination source and method for microlithography
EP0744644A1 (de) * 1995-05-23 1996-11-27 Christian Körber Vorrichtung zur stereoskopischen Betrachtung
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
US5630661A (en) * 1996-02-06 1997-05-20 Fox; Donald P. Metal arc flashlight
US5861990A (en) * 1996-03-08 1999-01-19 Kaiser Optical Systems Combined optical diffuser and light concentrator
US5896188A (en) * 1996-11-25 1999-04-20 Svg Lithography Systems, Inc. Reduction of pattern noise in scanning lithographic system illuminators
US6002520A (en) 1997-04-25 1999-12-14 Hewlett-Packard Company Illumination system for creating a desired irradiance profile using diffractive optical elements

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JP2001507139A (ja) 2001-05-29
KR100486997B1 (ko) 2005-05-03
DE69703165T2 (de) 2001-05-17
US6025938A (en) 2000-02-15
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US5850300A (en) 1998-12-15
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EP0946894B1 (en) 2000-09-20
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US6847485B2 (en) 2005-01-25
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US6278550B1 (en) 2001-08-21
KR20000069648A (ko) 2000-11-25
DE69703165D1 (de) 2000-10-26
US6396635B2 (en) 2002-05-28
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US6970292B2 (en) 2005-11-29

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