ATE181968T1 - Verfahren zur herstellung von siliziumkarbid- filmen unter verwendung von einzelnen siliziumorganischen verbindungen - Google Patents

Verfahren zur herstellung von siliziumkarbid- filmen unter verwendung von einzelnen siliziumorganischen verbindungen

Info

Publication number
ATE181968T1
ATE181968T1 AT94927851T AT94927851T ATE181968T1 AT E181968 T1 ATE181968 T1 AT E181968T1 AT 94927851 T AT94927851 T AT 94927851T AT 94927851 T AT94927851 T AT 94927851T AT E181968 T1 ATE181968 T1 AT E181968T1
Authority
AT
Austria
Prior art keywords
carbide film
silicon carbide
individual organic
silicon
producing
Prior art date
Application number
AT94927851T
Other languages
English (en)
Inventor
Yunsoo Kim
Jin-Hyo Boo
Kyu-Sang Yu
Il Nam Jung
Seung Ho Yeon
Original Assignee
Korea Res Inst Chem Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Res Inst Chem Tech filed Critical Korea Res Inst Chem Tech
Application granted granted Critical
Publication of ATE181968T1 publication Critical patent/ATE181968T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT94927851T 1993-10-11 1994-09-27 Verfahren zur herstellung von siliziumkarbid- filmen unter verwendung von einzelnen siliziumorganischen verbindungen ATE181968T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019930021027A KR960012710B1 (ko) 1993-10-11 1993-10-11 단일 유기규소 화합물을 이용한 탄화규소 막의 제조

Publications (1)

Publication Number Publication Date
ATE181968T1 true ATE181968T1 (de) 1999-07-15

Family

ID=19365620

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94927851T ATE181968T1 (de) 1993-10-11 1994-09-27 Verfahren zur herstellung von siliziumkarbid- filmen unter verwendung von einzelnen siliziumorganischen verbindungen

Country Status (7)

Country Link
EP (1) EP0723600B1 (de)
JP (1) JPH09503822A (de)
KR (1) KR960012710B1 (de)
AT (1) ATE181968T1 (de)
DE (1) DE69419425T2 (de)
ES (1) ES2134955T3 (de)
WO (1) WO1995010638A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1123991A3 (de) 2000-02-08 2002-11-13 Asm Japan K.K. Materialen mit niedrieger Dielektrizitätskonstante und Verfahren
US6905981B1 (en) 2000-11-24 2005-06-14 Asm Japan K.K. Low-k dielectric materials and processes
US20060008661A1 (en) * 2003-08-01 2006-01-12 Wijesundara Muthu B Manufacturable low-temperature silicon carbide deposition technology
WO2006134206A2 (en) * 2005-06-13 2006-12-21 Silecs Oy Functionalized silane monomers with bridging hydrocarbon group and siloxane polymers of the same
US8440571B2 (en) 2010-11-03 2013-05-14 Applied Materials, Inc. Methods for deposition of silicon carbide and silicon carbonitride films
US8575033B2 (en) 2011-09-13 2013-11-05 Applied Materials, Inc. Carbosilane precursors for low temperature film deposition
TW201319299A (zh) 2011-09-13 2013-05-16 Applied Materials Inc 用於低溫電漿輔助沉積的活化矽前驅物
US9701540B2 (en) 2011-10-07 2017-07-11 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Apparatus and method for the condensed phase production of trisilylamine
US9446958B2 (en) 2011-10-07 2016-09-20 L'Air Liquide Societe Anonyme L'Etude Et L'Exploitation Des Procedes Georges Claude Apparatus and method for the condensed phase production of trisilylamine
RU2481654C1 (ru) * 2012-04-11 2013-05-10 Федеральное государственное бюджетное учреждение "Национальный исследовательский центр "Курчатовский институт" Тепловыделяющий элемент для ядерных водо-водяных реакторов и способ его изготовления
US8987494B2 (en) 2012-04-11 2015-03-24 Gelest Technologies, Inc. Low molecular weight carbosilanes, precursors thereof, and methods of preparation
US8859797B1 (en) 2012-04-27 2014-10-14 Air Liquide Electronics U.S. Lp Synthesis methods for carbosilanes
US9073952B1 (en) 2012-04-27 2015-07-07 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Synthesis method for carbosilanes
US9243324B2 (en) * 2012-07-30 2016-01-26 Air Products And Chemicals, Inc. Methods of forming non-oxygen containing silicon-based films
US9879340B2 (en) 2014-11-03 2018-01-30 Versum Materials Us, Llc Silicon-based films and methods of forming the same
EP4222293A1 (de) * 2020-09-30 2023-08-09 Gelest, Inc. Siliziumkarbid-dünnschichten und dampfabscheidungsverfahren dafür

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8500645A (nl) * 1985-03-07 1986-10-01 Philips Nv Werkwijze voor het afzetten van een laag, die in hoofdzaak uit siliciumcarbide bestaat op een substraat.
GB8629496D0 (en) * 1986-12-10 1987-01-21 British Petroleum Co Plc Silicon carbide
US4923716A (en) 1988-09-26 1990-05-08 Hughes Aircraft Company Chemical vapor desposition of silicon carbide
US5053255A (en) 1990-07-13 1991-10-01 Olin Corporation Chemical vapor deposition (CVD) process for the thermally depositing silicon carbide films onto a substrate

Also Published As

Publication number Publication date
KR960012710B1 (ko) 1996-09-24
JPH09503822A (ja) 1997-04-15
EP0723600A1 (de) 1996-07-31
KR950011327A (ko) 1995-05-15
WO1995010638A1 (en) 1995-04-20
DE69419425T2 (de) 1999-10-28
EP0723600B1 (de) 1999-07-07
DE69419425D1 (de) 1999-08-12
ES2134955T3 (es) 1999-10-16

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Legal Events

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UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee