ATE143703T1 - Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metall - Google Patents
Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metallInfo
- Publication number
- ATE143703T1 ATE143703T1 AT90401820T AT90401820T ATE143703T1 AT E143703 T1 ATE143703 T1 AT E143703T1 AT 90401820 T AT90401820 T AT 90401820T AT 90401820 T AT90401820 T AT 90401820T AT E143703 T1 ATE143703 T1 AT E143703T1
- Authority
- AT
- Austria
- Prior art keywords
- refractory metal
- mandrel
- enclosure
- material containing
- molded body
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/42—Silicides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
- C23C16/14—Deposition of only one other metal element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/4998—Combined manufacture including applying or shaping of fluent material
- Y10T29/49982—Coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP90401820A EP0463266B1 (de) | 1990-06-26 | 1990-06-26 | Verfahren zum Herstellen selbsttragender Formkörper aus feuerfestem Metall |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE143703T1 true ATE143703T1 (de) | 1996-10-15 |
Family
ID=8205732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT90401820T ATE143703T1 (de) | 1990-06-26 | 1990-06-26 | Verfahren zum herstellen selbsttragender formkörper aus feuerfestem metall |
Country Status (5)
Country | Link |
---|---|
US (1) | US5230847A (de) |
EP (1) | EP0463266B1 (de) |
JP (1) | JP3119896B2 (de) |
AT (1) | ATE143703T1 (de) |
DE (1) | DE69028771T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0486927A1 (de) * | 1990-11-20 | 1992-05-27 | Air Products And Chemicals, Inc. | Abscheidung von Wolframschichten aus Mischungen von Wolframhexafluorid, Organohydrosilanen und Wasserstoff |
DE4334818A1 (de) * | 1993-03-10 | 1994-09-15 | Sintec Keramik Gmbh | Verfahren zur Herstellung von hochreinen, spannungsfreien interfraktionären Metallbeschichtungen oder Formkörper |
JPH07118851A (ja) * | 1993-10-26 | 1995-05-09 | Tokyo Tungsten Co Ltd | 高融点金属箔およびその製造方法 |
US5773104A (en) * | 1996-11-13 | 1998-06-30 | Plasma Processes, Inc. | High temperature and highly corrosive resistant sample containment cartridge |
US5937323A (en) * | 1997-06-03 | 1999-08-10 | Applied Materials, Inc. | Sequencing of the recipe steps for the optimal low-k HDP-CVD processing |
JP2001098357A (ja) * | 1999-09-28 | 2001-04-10 | Citizen Watch Co Ltd | タングステン膜とその製造方法ならびに薄膜ヒーターとその製造方法 |
US6827796B2 (en) * | 2000-11-02 | 2004-12-07 | Composite Tool Company, Inc. | High strength alloys and methods for making same |
DE10153541B4 (de) * | 2001-10-30 | 2008-05-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Blutgefäßadapter |
DE10153542B4 (de) * | 2001-10-30 | 2006-11-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung von Adaptern für Blutgefäße |
JP2004296558A (ja) * | 2003-03-26 | 2004-10-21 | Osaka Prefecture | 絶縁層埋め込み型単結晶炭化シリコン基板の製造方法及びその製造装置 |
EP2502964A1 (de) | 2011-03-24 | 2012-09-26 | Molda AG | Verfahren zur Herstellung von Kollagen |
US20160258053A1 (en) * | 2015-03-03 | 2016-09-08 | Joseph Robert Pickens | Machine and Process for building 3-Dimensional Metal and Composite Structures by Using Carbonyl and Other Gases |
EP4208583A1 (de) | 2020-09-03 | 2023-07-12 | TCM-Research Ltd. | Verfahren und systeme zur chemischen additivdampfabscheidung |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3072983A (en) * | 1960-05-31 | 1963-01-15 | Brenner Abner | Vapor deposition of tungsten |
US4202080A (en) * | 1977-02-14 | 1980-05-13 | U.T.I.-Spectrotherm Corporation | Mass spectrometer filter |
JPS60145376A (ja) * | 1983-12-30 | 1985-07-31 | Fujitsu Ltd | タングステンシリサイド膜の成長方法 |
US4851295A (en) * | 1984-03-16 | 1989-07-25 | Genus, Inc. | Low resistivity tungsten silicon composite film |
US4756927A (en) * | 1986-05-29 | 1988-07-12 | Massachusetts Institute Of Technology | Method and apparatus for refractory metal deposition |
US4849260A (en) * | 1986-06-30 | 1989-07-18 | Nihon Sinku Gijutsu Kabushiki Kaisha | Method for selectively depositing metal on a substrate |
JPH0772351B2 (ja) * | 1986-12-01 | 1995-08-02 | 株式会社日立製作所 | 金属薄膜選択成長方法 |
JPS63286574A (ja) * | 1987-05-18 | 1988-11-24 | Nisshin Steel Co Ltd | Cvd法によるタングステンの蒸着法 |
US5055246A (en) * | 1991-01-22 | 1991-10-08 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method of forming high purity metal silicides targets for sputtering |
-
1990
- 1990-06-26 AT AT90401820T patent/ATE143703T1/de not_active IP Right Cessation
- 1990-06-26 DE DE69028771T patent/DE69028771T2/de not_active Expired - Fee Related
- 1990-06-26 EP EP90401820A patent/EP0463266B1/de not_active Expired - Lifetime
-
1991
- 1991-06-21 JP JP03150630A patent/JP3119896B2/ja not_active Expired - Fee Related
- 1991-06-21 US US07/718,984 patent/US5230847A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5230847A (en) | 1993-07-27 |
DE69028771D1 (de) | 1996-11-07 |
EP0463266A1 (de) | 1992-01-02 |
JP3119896B2 (ja) | 2000-12-25 |
EP0463266B1 (de) | 1996-10-02 |
JPH04231471A (ja) | 1992-08-20 |
DE69028771T2 (de) | 1997-02-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
REN | Ceased due to non-payment of the annual fee |