ATE122735T1 - ELECTRODE FOR ELECTROLYTIC PROCESS AND METHOD FOR PRODUCING THE ELECTRODE. - Google Patents

ELECTRODE FOR ELECTROLYTIC PROCESS AND METHOD FOR PRODUCING THE ELECTRODE.

Info

Publication number
ATE122735T1
ATE122735T1 AT90810492T AT90810492T ATE122735T1 AT E122735 T1 ATE122735 T1 AT E122735T1 AT 90810492 T AT90810492 T AT 90810492T AT 90810492 T AT90810492 T AT 90810492T AT E122735 T1 ATE122735 T1 AT E122735T1
Authority
AT
Austria
Prior art keywords
metal
electrode
grain boundaries
subsequently applied
etched
Prior art date
Application number
AT90810492T
Other languages
German (de)
Inventor
Kenneth L Hardee
Lynne M Ernes
Richard C Carlson
Original Assignee
Eltech Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23476784&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE122735(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Eltech Systems Corp filed Critical Eltech Systems Corp
Application granted granted Critical
Publication of ATE122735T1 publication Critical patent/ATE122735T1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/26—Acidic compositions for etching refractory metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemically Coating (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Secondary Cells (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)

Abstract

A metal surface is now described having enhanced adhesion of subsequently applied coatings. The substrate metal of the article, such as a valve metal as represented by titanium, is provided with a highly desirable surface characteristic for subsequent coating application. This can be initiated by selection of a metal of desirable metallurgy and heat history, including prior heat treatment to provide surface grain boundaries which may be most readily etched. In subsequent etching operation, the surface is made to exhibit well defined, three dimensional grains with deep grain boundaries. Subsequently applied coatings, by penetrating into the etched intergranular valleys, are desirably locked onto the metal substrate surface and provide enhanced lifetime even in rugged commercial environments.
AT90810492T 1989-06-30 1990-06-28 ELECTRODE FOR ELECTROLYTIC PROCESS AND METHOD FOR PRODUCING THE ELECTRODE. ATE122735T1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37442989A 1989-06-30 1989-06-30

Publications (1)

Publication Number Publication Date
ATE122735T1 true ATE122735T1 (en) 1995-06-15

Family

ID=23476784

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90810492T ATE122735T1 (en) 1989-06-30 1990-06-28 ELECTRODE FOR ELECTROLYTIC PROCESS AND METHOD FOR PRODUCING THE ELECTRODE.

Country Status (12)

Country Link
EP (1) EP0407349B1 (en)
JP (1) JP2721739B2 (en)
KR (1) KR100196661B1 (en)
AT (1) ATE122735T1 (en)
AU (1) AU632591B2 (en)
BR (1) BR9003037A (en)
CA (1) CA2018670A1 (en)
DE (1) DE69019424T2 (en)
ES (1) ES2071803T3 (en)
GR (1) GR3017014T3 (en)
NO (1) NO902922L (en)
TW (1) TW214570B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5314601A (en) * 1989-06-30 1994-05-24 Eltech Systems Corporation Electrodes of improved service life
US5324407A (en) * 1989-06-30 1994-06-28 Eltech Systems Corporation Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell
TW197475B (en) * 1990-12-26 1993-01-01 Eltech Systems Corp
DE4323117C1 (en) * 1993-07-10 1995-03-09 Ptg Plasma Oberflaechentech Process for coating household and kitchen equipment and household and kitchen equipment
EP0839216B1 (en) * 1995-11-08 2000-03-08 Fissler Gmbh Process for producing a non-stick coating and objects provided with such a coating
IT1317969B1 (en) 2000-06-09 2003-07-21 Nora Elettrodi De ELECTRODE CHARACTERIZED BY A HIGH ADHESION OF A SURFACE CATALYTIC LAYER.
ITMI20020535A1 (en) * 2002-03-14 2003-09-15 De Nora Elettrodi Spa OXYGEN DEVELOPMENT ANODE AND ITS SUBSTRATE
FI118159B (en) 2005-10-21 2007-07-31 Outotec Oyj Method for forming an electrocatalytic surface of an electrode and electrode
WO2013191140A1 (en) 2012-06-18 2013-12-27 旭化成株式会社 Bipolar alkaline water electrolysis unit and electrolytic cell
CN104769162B (en) 2012-10-31 2017-08-11 大曹株式会社 Zero pole span salt electrolysis groove anode, salt electrolysis groove and the salt electrolysis method using the salt electrolysis groove
JP6234754B2 (en) * 2013-09-18 2017-11-22 株式会社神戸製鋼所 Electrode metal plate and electrode
JP6361437B2 (en) * 2014-10-07 2018-07-25 新日鐵住金株式会社 Production method of pure titanium plate
CN113521384B (en) * 2021-07-05 2022-05-10 湖南湘投金天钛金属股份有限公司 Titanium-based material and preparation method and application thereof
US20230092781A1 (en) * 2021-09-20 2023-03-23 Apple Inc. Porous oxide for improved titanium-polymer bonding
CN113755902B (en) * 2021-09-30 2023-04-07 宁波创致超纯新材料有限公司 Titanium anode plate and preparation method and application thereof
DE102021132015B3 (en) 2021-12-06 2023-03-30 Canon Production Printing Holding B.V. Device for printing a recording medium

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE28820E (en) * 1965-05-12 1976-05-18 Chemnor Corporation Method of making an electrode having a coating containing a platinum metal oxide thereon
US4068025A (en) * 1971-03-22 1978-01-10 Brown, Boveri & Company Limited Method of applying a protective coating to a body
US4318770A (en) * 1980-08-13 1982-03-09 General Motors Corporation Surface etching before electroding zirconia exhaust gas oxygen sensors
DE3270207D1 (en) * 1981-04-06 1986-05-07 Eltech Systems Corp Recoating of electrodes
DE3424329A1 (en) * 1984-07-02 1986-01-09 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING TITANIUM STRUCTURES
FR2567913B1 (en) * 1984-07-18 1989-11-10 Commissariat Energie Atomique PROCESS FOR PREPARING THE SURFACE OF URANIUM OR ALLOY URANIUM-BASED PARTS
US4678546A (en) * 1985-03-27 1987-07-07 North China Research Institute Of Electro-Optics Process for providing lithium tantalum oxide coated tantalum articles with improved wear resistance
JPS62161975A (en) * 1986-10-01 1987-07-17 ペルメレック電極株式会社 Electrode used in electrolytic cell and its production
JPS644491A (en) * 1987-06-26 1989-01-09 Kobe Steel Ltd Pretreatment of anodization of valve metal

Also Published As

Publication number Publication date
EP0407349A3 (en) 1992-02-05
EP0407349B1 (en) 1995-05-17
GR3017014T3 (en) 1995-11-30
BR9003037A (en) 1991-08-20
NO902922D0 (en) 1990-06-29
DE69019424T2 (en) 1995-09-14
DE69019424D1 (en) 1995-06-22
NO902922L (en) 1991-01-02
EP0407349A2 (en) 1991-01-09
AU5804190A (en) 1991-01-03
JP2721739B2 (en) 1998-03-04
TW214570B (en) 1993-10-11
KR910001096A (en) 1991-01-30
AU632591B2 (en) 1993-01-07
CA2018670A1 (en) 1990-12-31
JPH0347999A (en) 1991-02-28
ES2071803T3 (en) 1995-07-01
KR100196661B1 (en) 1999-06-15

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee