AU632591B2 - Metal substrate of improved surface morphology - Google Patents

Metal substrate of improved surface morphology

Info

Publication number
AU632591B2
AU632591B2 AU58041/90A AU5804190A AU632591B2 AU 632591 B2 AU632591 B2 AU 632591B2 AU 58041/90 A AU58041/90 A AU 58041/90A AU 5804190 A AU5804190 A AU 5804190A AU 632591 B2 AU632591 B2 AU 632591B2
Authority
AU
Australia
Prior art keywords
metal
grain boundaries
subsequently applied
metal substrate
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU58041/90A
Other versions
AU5804190A (en
Inventor
Richard C. Carlson
Lynne M. Ernes
Kenneth L. Hardee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eltech Systems Corp
Original Assignee
Eltech Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23476784&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=AU632591(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Eltech Systems Corp filed Critical Eltech Systems Corp
Publication of AU5804190A publication Critical patent/AU5804190A/en
Application granted granted Critical
Publication of AU632591B2 publication Critical patent/AU632591B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/26—Acidic compositions for etching refractory metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemically Coating (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Secondary Cells (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Laminated Bodies (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

A metal surface is now described having enhanced adhesion of subsequently applied coatings. The substrate metal of the article, such as a valve metal as represented by titanium, is provided with a highly desirable surface characteristic for subsequent coating application. This can be initiated by selection of a metal of desirable metallurgy and heat history, including prior heat treatment to provide surface grain boundaries which may be most readily etched. In subsequent etching operation, the surface is made to exhibit well defined, three dimensional grains with deep grain boundaries. Subsequently applied coatings, by penetrating into the etched intergranular valleys, are desirably locked onto the metal substrate surface and provide enhanced lifetime even in rugged commercial environments.
AU58041/90A 1989-06-30 1990-06-29 Metal substrate of improved surface morphology Ceased AU632591B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37442989A 1989-06-30 1989-06-30
US374429 1989-06-30

Publications (2)

Publication Number Publication Date
AU5804190A AU5804190A (en) 1991-01-03
AU632591B2 true AU632591B2 (en) 1993-01-07

Family

ID=23476784

Family Applications (1)

Application Number Title Priority Date Filing Date
AU58041/90A Ceased AU632591B2 (en) 1989-06-30 1990-06-29 Metal substrate of improved surface morphology

Country Status (12)

Country Link
EP (1) EP0407349B1 (en)
JP (1) JP2721739B2 (en)
KR (1) KR100196661B1 (en)
AT (1) ATE122735T1 (en)
AU (1) AU632591B2 (en)
BR (1) BR9003037A (en)
CA (1) CA2018670A1 (en)
DE (1) DE69019424T2 (en)
ES (1) ES2071803T3 (en)
GR (1) GR3017014T3 (en)
NO (1) NO902922L (en)
TW (1) TW214570B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5314601A (en) * 1989-06-30 1994-05-24 Eltech Systems Corporation Electrodes of improved service life
US5324407A (en) * 1989-06-30 1994-06-28 Eltech Systems Corporation Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell
TW197475B (en) * 1990-12-26 1993-01-01 Eltech Systems Corp
DE4323117C1 (en) * 1993-07-10 1995-03-09 Ptg Plasma Oberflaechentech Process for coating household and kitchen equipment and household and kitchen equipment
EP0839216B1 (en) * 1995-11-08 2000-03-08 Fissler Gmbh Process for producing a non-stick coating and objects provided with such a coating
IT1317969B1 (en) 2000-06-09 2003-07-21 Nora Elettrodi De ELECTRODE CHARACTERIZED BY A HIGH ADHESION OF A SURFACE CATALYTIC LAYER.
ITMI20020535A1 (en) * 2002-03-14 2003-09-15 De Nora Elettrodi Spa OXYGEN DEVELOPMENT ANODE AND ITS SUBSTRATE
FI118159B (en) 2005-10-21 2007-07-31 Outotec Oyj Method for forming an electrocatalytic surface of an electrode and electrode
CN104364425B (en) 2012-06-18 2018-01-16 旭化成株式会社 Bipolar system alkaline water electrolytic unit and electrolytic cell
WO2014069360A1 (en) 2012-10-31 2014-05-08 ダイソー株式会社 Positive electrode for zero-gap type brine electrolyzer, brine electrolyzer, and brine electrolyzing method using same
JP6234754B2 (en) * 2013-09-18 2017-11-22 株式会社神戸製鋼所 Electrode metal plate and electrode
JP6361437B2 (en) * 2014-10-07 2018-07-25 新日鐵住金株式会社 Production method of pure titanium plate
CN113521384B (en) * 2021-07-05 2022-05-10 湖南湘投金天钛金属股份有限公司 Titanium-based material and preparation method and application thereof
US20230092781A1 (en) * 2021-09-20 2023-03-23 Apple Inc. Porous oxide for improved titanium-polymer bonding
CN113755902B (en) * 2021-09-30 2023-04-07 宁波创致超纯新材料有限公司 Titanium anode plate and preparation method and application thereof
DE102021132015B3 (en) 2021-12-06 2023-03-30 Canon Production Printing Holding B.V. Device for printing a recording medium

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0168706A1 (en) * 1984-07-02 1986-01-22 Siemens Aktiengesellschaft Process for forming titane structures with precise dimensions
EP0175598A1 (en) * 1984-07-18 1986-03-26 Commissariat A L'energie Atomique Process for pretreating uranium or uranium alloy surfaces
EP0196093A1 (en) * 1985-03-27 1986-10-01 Liu Yu Zhong A process for treating an article made of metal selectec from tantalum, niobium and tantalum-niobium alloy

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE28820E (en) * 1965-05-12 1976-05-18 Chemnor Corporation Method of making an electrode having a coating containing a platinum metal oxide thereon
US4068025A (en) * 1971-03-22 1978-01-10 Brown, Boveri & Company Limited Method of applying a protective coating to a body
US4318770A (en) * 1980-08-13 1982-03-09 General Motors Corporation Surface etching before electroding zirconia exhaust gas oxygen sensors
DE3270207D1 (en) * 1981-04-06 1986-05-07 Eltech Systems Corp Recoating of electrodes
JPS62161975A (en) * 1986-10-01 1987-07-17 ペルメレック電極株式会社 Electrode used in electrolytic cell and its production
JPS644491A (en) * 1987-06-26 1989-01-09 Kobe Steel Ltd Pretreatment of anodization of valve metal

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0168706A1 (en) * 1984-07-02 1986-01-22 Siemens Aktiengesellschaft Process for forming titane structures with precise dimensions
EP0175598A1 (en) * 1984-07-18 1986-03-26 Commissariat A L'energie Atomique Process for pretreating uranium or uranium alloy surfaces
EP0196093A1 (en) * 1985-03-27 1986-10-01 Liu Yu Zhong A process for treating an article made of metal selectec from tantalum, niobium and tantalum-niobium alloy

Also Published As

Publication number Publication date
AU5804190A (en) 1991-01-03
NO902922L (en) 1991-01-02
DE69019424T2 (en) 1995-09-14
JP2721739B2 (en) 1998-03-04
ATE122735T1 (en) 1995-06-15
JPH0347999A (en) 1991-02-28
DE69019424D1 (en) 1995-06-22
EP0407349A2 (en) 1991-01-09
KR910001096A (en) 1991-01-30
ES2071803T3 (en) 1995-07-01
BR9003037A (en) 1991-08-20
EP0407349B1 (en) 1995-05-17
CA2018670A1 (en) 1990-12-31
TW214570B (en) 1993-10-11
NO902922D0 (en) 1990-06-29
GR3017014T3 (en) 1995-11-30
EP0407349A3 (en) 1992-02-05
KR100196661B1 (en) 1999-06-15

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Legal Events

Date Code Title Description
MK14 Patent ceased section 143(a) (annual fees not paid) or expired