JPS62161951A - Surface treatment of ornamental parts - Google Patents
Surface treatment of ornamental partsInfo
- Publication number
- JPS62161951A JPS62161951A JP150386A JP150386A JPS62161951A JP S62161951 A JPS62161951 A JP S62161951A JP 150386 A JP150386 A JP 150386A JP 150386 A JP150386 A JP 150386A JP S62161951 A JPS62161951 A JP S62161951A
- Authority
- JP
- Japan
- Prior art keywords
- parts
- titanium
- ion
- ornamental
- ion plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、腕時計等装飾品の表面処理方法に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for surface treatment of decorative items such as wristwatches.
本発明は、チタン製腕時計ケース等装飾品をイオン窒化
処理することにより表面を硬化し。The present invention hardens the surface of a titanium watch case or other decorative item by subjecting it to ion nitriding treatment.
さらにイオンプレーティング処理により表面に窒化チタ
ン膜を形成する処理方法である。This processing method further forms a titanium nitride film on the surface by ion plating.
腕時計のケース用材として従来ステンレス。 Stainless steel has traditionally been used as the material for watch cases.
BS等が使われていたが、近年はチタンも使われるよう
になってきた。チタンは軽量で、耐食性が優れているが
2表面硬度が低く傷がつきやすいという欠点がある。BS etc. were used, but in recent years titanium has also come into use. Titanium is lightweight and has excellent corrosion resistance, but it has the disadvantage of having low surface hardness and being easily scratched.
チタンの表面硬化法は種々行われているが。Various methods have been used to harden the surface of titanium.
その中でも窒化処理が一般的に行われている。Among these, nitriding treatment is commonly performed.
チタンを窒化処理すると、数十μの深さまで硬化するの
で1時計ケース等装飾品として充分な強度が得られる。When titanium is nitrided, it hardens to a depth of several tens of microns, giving it sufficient strength for decorative items such as watch cases.
しかし、窒化ガス中での通常の窒化処理は、800℃以
上の高温で長時間加熱するため、変形する恐れがある。However, normal nitriding treatment in a nitriding gas involves heating at a high temperature of 800° C. or higher for a long time, so there is a risk of deformation.
また9表面は金色となるが、その色調は汚く1色のムラ
も出やすい。In addition, although the surface of 9 is golden, the color tone is dirty and one color is likely to be uneven.
一方、チタン等の表面にイオンプレーティングにより窒
化チタン膜を形成すると美しい色調が得られるが、処理
膜の厚さは通常1μ程度と薄い為、チタンのような柔ら
かい金属上に処理した場合は打こん等がつきやすいとい
うムラ欠点があった。On the other hand, when a titanium nitride film is formed on the surface of titanium etc. by ion plating, a beautiful color tone can be obtained, but the thickness of the treated film is usually as thin as about 1 μm, so when it is applied to a soft metal like titanium, it cannot be plated. It had the disadvantage of being uneven and prone to scratches.
本発明は、チタン上に打こんがつかない程度の厚さの硬
化膜を、あまり高くない温度で短時間で形成し、しかも
表面を美しい色調にしようとするものである。The present invention aims to form a hardened film on titanium with an impregnable thickness in a short time at a moderate temperature, and to give the surface a beautiful color tone.
本発明は、チタンをイオン窒化処理することにより、比
較的低い温度で短時間で数十μの硬化層をつくり、その
上にイオンプレーティングにより窒化チタン層をつくり
、外観も美しく゛仕上げようとするものである。The present invention uses ion nitriding of titanium to create a hardened layer of tens of microns in a short time at a relatively low temperature, and then creates a titanium nitride layer on top of that using ion plating to create a beautiful exterior finish. That is.
処理温度を400〜600℃に限定した理由は、400
℃以下では窒化速度が急速に低下し600℃を越えると
表面状態が悪化するためである。The reason why the processing temperature was limited to 400 to 600°C is that 400°C
This is because the nitriding rate decreases rapidly below 600°C, and the surface condition deteriorates when the temperature exceeds 600°C.
通常の窒素雰囲気中で窒化処理は800℃以上の温度で
長時間かかるが、イオン窒化処理を行えば、それより低
い温度で数時間程度の比較的短い時間で20μ以上の厚
さの硬化層が得られる。Nitriding in a normal nitrogen atmosphere takes a long time at a temperature of 800°C or higher, but with ion nitriding, a hardened layer with a thickness of 20μ or more can be created in a relatively short period of several hours at a lower temperature. can get.
以下実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.
純チタン(JI32種)で腕時計ケースを形成し2次の
条件でイオン窒化処理した。A wristwatch case was formed from pure titanium (JI type 32) and subjected to ion nitriding treatment under the following conditions.
Nz流量 Q、51/m1n
Hz流N O,71’/min
炉内圧力 5mmHg
温度 550℃
処理時間 5hr
放電電圧 300■
放電電流 0.8A
この窒化処理により1表面硬度はI(V1200、硬化
深さは30μであった。Nz flow rate Q, 51/m1n Hz flow N O, 71'/min Furnace pressure 5mmHg Temperature 550℃ Treatment time 5hr Discharge voltage 300■ Discharge current 0.8A This nitriding treatment reduces the surface hardness to I (V1200, hardening depth was 30μ.
さらにこの窒化したチタンの表面にイオンプレーティン
グ処理により、窒化チタンの膜を形成する。Furthermore, a titanium nitride film is formed on the surface of this nitrided titanium by ion plating treatment.
真空に排気後窒素ガスを導入して次の条件によりイオン
プレーティ、ングの処理をした。After evacuation, nitrogen gas was introduced and ion plating was performed under the following conditions.
Nz流t 120mj2/min基板バイアス
150V
イオン化電圧 40V(50A)
真空度 4X10−’Torr
EBガン l0KV 300mA処理時間
20分
この処理により、約1μの厚さの窒化チタン膜が形成さ
れた。Nz flow t 120mj2/min substrate bias
150V Ionization voltage 40V (50A) Vacuum degree 4X10-'Torr EB gun 10KV 300mA processing time
By this treatment for 20 minutes, a titanium nitride film with a thickness of about 1 μm was formed.
このようにして、イオン窒化処理を行い、さらにイオン
プレーティング処理したチタンケースは、硬化層が充分
な厚みを持ち、傷つきにくく、また表面も美しい色調に
仕上がった。In this way, the titanium case that was subjected to ion nitriding treatment and further ion plating treatment had a sufficiently thick hardened layer, was resistant to scratches, and had a beautiful surface color.
本発明方法によれば、充分な厚さの硬化層を持ち、しか
も表面色調が美しい装飾部品を容易に得ることができる
。According to the method of the present invention, decorative parts having a sufficiently thick cured layer and beautiful surface color can be easily obtained.
以上that's all
Claims (1)
らにイオンプレーティングにより窒化チタン膜を形成す
ることを特徴とする装飾部品の表面処理方法。A method for surface treatment of decorative parts, characterized by subjecting titanium to ion nitriding treatment at 400 to 600°C, and further forming a titanium nitride film by ion plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP150386A JPS62161951A (en) | 1986-01-08 | 1986-01-08 | Surface treatment of ornamental parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP150386A JPS62161951A (en) | 1986-01-08 | 1986-01-08 | Surface treatment of ornamental parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62161951A true JPS62161951A (en) | 1987-07-17 |
Family
ID=11503272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP150386A Pending JPS62161951A (en) | 1986-01-08 | 1986-01-08 | Surface treatment of ornamental parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62161951A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995033865A1 (en) * | 1994-06-03 | 1995-12-14 | Materials Research Corporation | Low temperature plasma-enhanced formation of integrated circuits |
US5972790A (en) * | 1995-06-09 | 1999-10-26 | Tokyo Electron Limited | Method for forming salicides |
-
1986
- 1986-01-08 JP JP150386A patent/JPS62161951A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995033865A1 (en) * | 1994-06-03 | 1995-12-14 | Materials Research Corporation | Low temperature plasma-enhanced formation of integrated circuits |
US5972790A (en) * | 1995-06-09 | 1999-10-26 | Tokyo Electron Limited | Method for forming salicides |
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