JPS5836671B2 - Surface treatment method - Google Patents
Surface treatment methodInfo
- Publication number
- JPS5836671B2 JPS5836671B2 JP6632376A JP6632376A JPS5836671B2 JP S5836671 B2 JPS5836671 B2 JP S5836671B2 JP 6632376 A JP6632376 A JP 6632376A JP 6632376 A JP6632376 A JP 6632376A JP S5836671 B2 JPS5836671 B2 JP S5836671B2
- Authority
- JP
- Japan
- Prior art keywords
- titanium nitride
- film
- alloy
- treatment method
- surface treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
本発明は金属又は合金の表面に硬質でしかも装飾的価値
の高い有色被膜を形成する表面処理方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a surface treatment method for forming a hard colored coating of high decorative value on the surface of a metal or alloy.
金属又は合金の表面に窒化チタン被膜のような硬質でし
かも黄色被膜を形或することは公知であり、通常スパッ
タリングやイオンプレーテイング等の方法で行なわれて
来た。It is well known to form a hard yellow coating such as a titanium nitride coating on the surface of a metal or alloy, and this has generally been done by methods such as sputtering and ion plating.
スパッタリング法では、金属又は合金を真空槽内に保持
し、一度10−5〜1 0−6Torrの真空に排気後
、窒素を含むガスを導入し圧力を10−2〜10−3T
orrに調整し、一方の電極をチタン(ターゲットとい
う)で構威した電極構戊内で高周波放電を行ない、金属
又は合金上へ窒化チタン被膜を形或する。In the sputtering method, the metal or alloy is held in a vacuum chamber and once evacuated to a vacuum of 10-5 to 10-6 Torr, nitrogen-containing gas is introduced to increase the pressure to 10-2 to 10-3 Torr.
A titanium nitride film is formed on the metal or alloy by performing high-frequency discharge within an electrode structure in which one electrode is made of titanium (referred to as a target).
窒化チタン被膜はターゲットからスパツタしたチタンと
雰囲気の窒素ガスが反応して基板上に被膜として生成す
るのであるが、チタンと窒素の成分比によって被膜の硬
度、結晶構造、色調が大巾に異る。A titanium nitride film is formed on a substrate by the reaction of titanium spattered from a target with nitrogen gas in the atmosphere, but the hardness, crystal structure, and color tone of the film vary widely depending on the composition ratio of titanium and nitrogen. .
又投入電力や、ターゲット面積にターゲットと基板間距
離等のスパッタリング条件によってもこれら被膜の特性
は大巾に異る。Furthermore, the characteristics of these films vary widely depending on sputtering conditions such as input power, target area, and distance between the target and the substrate.
一方チタンと窒素ガス゛の反応をプラズマ内で一定に制
御することや、スパッタリング条件を一定に保つことは
非常に困難であり、そのためえられる被膜は色調、結晶
構造等の膜特性が大巾に異る。On the other hand, it is very difficult to control the reaction between titanium and nitrogen gas in the plasma and to keep the sputtering conditions constant, so the resulting films vary widely in film properties such as color tone and crystal structure. Ru.
特に被膜形威においては基板と膜の密着性がよいことが
第一の要件であるが、このようにして従来形戒された膜
は膜の内部ストレスが高く数1000λ程度の膜厚で容
易に剥離することが多かった。Particularly in film formation, the first requirement is good adhesion between the substrate and the film, but the conventional film has high internal stress and easily deteriorates with a film thickness of several thousand λ. It often peeled off.
又、他の方法としてはイオンプレーテイングによる窒化
チタン被膜の形威が知られているが、これは真空槽内を
一度10−5〜1 0−6Torrの真空に排気後、窒
素ガスを導入し圧力10−2〜1 0 −’ Torr
に調整し、電子ビーム蒸発源からチタンを蒸発させ、直
流高圧や高周波電力によってプラズマを発生し、窒素ガ
ス及びチタンをイオン化し、活性にして反応させ、基板
上へ窒化チタン被膜を形或するものである。Another known method is to form a titanium nitride film by ion plating, but this method involves first evacuating the vacuum chamber to a vacuum of 10-5 to 10-6 Torr and then introducing nitrogen gas. Pressure 10-2 to 10-' Torr
titanium is evaporated from an electron beam evaporation source, plasma is generated by direct current high pressure or high frequency power, nitrogen gas and titanium are ionized, activated and reacted, and a titanium nitride film is formed on the substrate. It is.
この場合にも、窒素ガス分圧を一定にし、しかも放電プ
ラズマ内でチタンと窒素ガスの反応を一定に制御するこ
とは困難であるため安定した色調で一定の特性をもった
被膜を形或することは不可能であった。In this case as well, it is difficult to keep the nitrogen gas partial pressure constant and to control the reaction between titanium and nitrogen gas in the discharge plasma to a constant level, so it is necessary to form a film with a stable color tone and constant characteristics. That was impossible.
又、えられた被膜はスパッタリングでえられたものと同
様に内部ストレスによる剥離が甚しく実用には供するこ
とができなかった。In addition, the resulting film, like that obtained by sputtering, was severely peeled off due to internal stress and could not be put to practical use.
本発明はこれらの被膜特性の欠点を除去し、装飾的価値
の高い密着性のすぐれた硬質被膜を提供することを目的
とする。The object of the present invention is to eliminate these drawbacks in coating properties and provide a hard coating with high decorative value and excellent adhesion.
上記目的を達戒するための本発明の要旨とするところは
、金属又は合金の表面に硬質で有色の窒化チタン被膜を
形成した後、酸素を含む雰囲気中で熱処理を行ない窒化
チタンの表層部を硬化せしめ、又被膜の内部ストレスを
除去すると同時に被膜形成時のわずかな製作条件のズレ
による膜の不均一性を無くし、一定の色調と一定の特性
を被膜に付与することである。The gist of the present invention to achieve the above object is to form a hard, colored titanium nitride film on the surface of a metal or alloy, and then heat treat it in an oxygen-containing atmosphere to remove the surface layer of the titanium nitride. The objective is to harden the film, remove the internal stress of the film, eliminate the non-uniformity of the film due to slight deviations in manufacturing conditions during film formation, and give the film a certain color tone and certain characteristics.
以下実施例に基いて詳細に説明する。A detailed explanation will be given below based on examples.
ステンレス製の腕時計ケースにスパッタリング又はイオ
ンプレーテイングによって窒化チタン被膜を約3〜5μ
の厚さに形或する。Apply a titanium nitride coating of approximately 3 to 5 μm on a stainless steel watch case by sputtering or ion plating.
Shaped to a thickness of
次に電気炉に入れ、空気中で300゜C1時間の熱処理
を行なう。Next, it is placed in an electric furnace and heat treated at 300°C for 1 hour in air.
窒化チタン被膜形成後の膜は、わずかな膜生成条件の違
いによって時計ケースの各部又はケース個々に異った色
調を有し、吸湿性雰囲気で容易に剥離しやすい不安定な
特性をもっているが、熱処理後の被膜は金に類似の金色
を有し、各部又はケース個々を比較しても点調の差を認
め難い。After the titanium nitride film is formed, each part of the watch case or the case itself has a different color tone due to slight differences in the film formation conditions, and it has unstable characteristics that easily peels off in a hygroscopic atmosphere. The coating after heat treatment has a golden color similar to gold, and it is difficult to discern any difference in tone even when comparing each part or case individually.
又被膜の密着性の改善が著しく、吸湿性雰囲気のみなら
ず、−40℃〜常温〜+80℃の連続10回熱サイクル
試験でも何ら剥離を示すことがなかった。Further, the adhesion of the film was significantly improved, and no peeling was observed not only in a hygroscopic atmosphere but also in 10 consecutive thermal cycle tests from -40°C to room temperature to +80°C.
窒化チタン被膜の膜厚によって最適熱処理条件は異り、
3μ以下の厚さでは低温、短時間(250℃、30分)
で熱処理は可能であり、膜厚が5μ以上になれば高温、
長時間(450℃、2時間)の熱処理が必要である。The optimal heat treatment conditions vary depending on the thickness of the titanium nitride film.
For thicknesses below 3μ, low temperature and short time (250℃, 30 minutes)
Heat treatment is possible at
A long heat treatment (450°C, 2 hours) is required.
以上実施例としてステンレス基板の場合について述べた
が、黄銅、アルミ合金、鉄合金ニッケル被膜を被覆した
黄銅等金属又は合金のいずれの場合にも適用出来る。Although the case of a stainless steel substrate has been described as an example above, the present invention can be applied to any metal or alloy such as brass, aluminum alloy, iron alloy coated with a nickel film.
又時計ケースについての応用のみならず、色調の制約が
厳しく装飾的要素の含まれる製品に適用することが出来
る。Moreover, it can be applied not only to watch cases, but also to products that have strict color tone restrictions and include decorative elements.
又装飾的要素は少いが被膜の高度の密着性を要求する工
具類への窒化チタン被膜の形或に際してもこの方法は有
効である。This method is also effective in forming titanium nitride coatings on tools that have few decorative elements but require a high degree of adhesion of the coating.
Claims (1)
面処理部材において、該窒化チタン被膜を形或後、酸素
を含む雰囲気中において熱処理を行ない窒化チタンの表
層部と酸化せしめたことを特徴とする表面処理方法。 2 金属又は合金がステンレス、黄銅、ニッケル被覆を
施した黄銅、アルミ合金、鉄合金であることを特徴とす
る特許請求の範囲第1項記載の表面処理方法。 3 窒化チタン被膜を反応性スパッタリング又はイオン
プレーテイングによって形威したことを特徴とする特許
請求の範囲第1項記載の表面処理方法。[Claims] 1. In a surface-treated member in which a titanium nitride film is formed on the surface of a metal or an alloy, after forming the titanium nitride film, heat treatment is performed in an atmosphere containing oxygen to oxidize the surface layer of titanium nitride. A surface treatment method characterized by: 2. The surface treatment method according to claim 1, wherein the metal or alloy is stainless steel, brass, nickel-coated brass, aluminum alloy, or iron alloy. 3. The surface treatment method according to claim 1, wherein the titanium nitride film is formed by reactive sputtering or ion plating.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6632376A JPS5836671B2 (en) | 1976-06-07 | 1976-06-07 | Surface treatment method |
DE2705225A DE2705225C2 (en) | 1976-06-07 | 1977-02-08 | Ornamental part for clocks etc. |
US05/945,292 US4226082A (en) | 1976-06-07 | 1978-09-25 | Ornamental part for watches and method of producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6632376A JPS5836671B2 (en) | 1976-06-07 | 1976-06-07 | Surface treatment method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52149234A JPS52149234A (en) | 1977-12-12 |
JPS5836671B2 true JPS5836671B2 (en) | 1983-08-10 |
Family
ID=13312502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6632376A Expired JPS5836671B2 (en) | 1976-06-07 | 1976-06-07 | Surface treatment method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5836671B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0726194B2 (en) * | 1984-05-08 | 1995-03-22 | 大日本印刷株式会社 | Corrosion resistant thin film and manufacturing method thereof |
DE69026619T2 (en) * | 1990-06-29 | 1996-11-28 | Niigata Engineering Co Ltd | METHOD FOR FORMING A TITANIUM NITRIDE COVER LAYER AND PAN PRODUCED BY THIS METHOD |
JPH07207446A (en) * | 1994-12-28 | 1995-08-08 | Niigata Eng Co Ltd | Forming method of titanium coating film |
-
1976
- 1976-06-07 JP JP6632376A patent/JPS5836671B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS52149234A (en) | 1977-12-12 |
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