ATE102265T1 - Kathodenzerstaeubungsanlage. - Google Patents

Kathodenzerstaeubungsanlage.

Info

Publication number
ATE102265T1
ATE102265T1 AT90109079T AT90109079T ATE102265T1 AT E102265 T1 ATE102265 T1 AT E102265T1 AT 90109079 T AT90109079 T AT 90109079T AT 90109079 T AT90109079 T AT 90109079T AT E102265 T1 ATE102265 T1 AT E102265T1
Authority
AT
Austria
Prior art keywords
receptacle
cathode
sputtering apparatus
samples
cathode sputtering
Prior art date
Application number
AT90109079T
Other languages
German (de)
English (en)
Inventor
Gabriela Hilz
Stefan Walter
Original Assignee
Kernforschungsz Karlsruhe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungsz Karlsruhe filed Critical Kernforschungsz Karlsruhe
Application granted granted Critical
Publication of ATE102265T1 publication Critical patent/ATE102265T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AT90109079T 1989-08-03 1990-05-14 Kathodenzerstaeubungsanlage. ATE102265T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3925711A DE3925711C1 (enExample) 1989-08-03 1989-08-03
EP90109079A EP0411256B1 (de) 1989-08-03 1990-05-14 Kathodenzerstäubungsanlage

Publications (1)

Publication Number Publication Date
ATE102265T1 true ATE102265T1 (de) 1994-03-15

Family

ID=6386449

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90109079T ATE102265T1 (de) 1989-08-03 1990-05-14 Kathodenzerstaeubungsanlage.

Country Status (3)

Country Link
EP (1) EP0411256B1 (enExample)
AT (1) ATE102265T1 (enExample)
DE (1) DE3925711C1 (enExample)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD111409A1 (enExample) * 1974-05-02 1975-02-12

Also Published As

Publication number Publication date
EP0411256B1 (de) 1994-03-02
DE3925711C1 (enExample) 1990-04-19
EP0411256A2 (de) 1991-02-06
EP0411256A3 (en) 1991-10-23

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee