ATE101268T1 - Pruefsystem fuer caissons und rammpfaehle. - Google Patents

Pruefsystem fuer caissons und rammpfaehle.

Info

Publication number
ATE101268T1
ATE101268T1 AT89200860T AT89200860T ATE101268T1 AT E101268 T1 ATE101268 T1 AT E101268T1 AT 89200860 T AT89200860 T AT 89200860T AT 89200860 T AT89200860 T AT 89200860T AT E101268 T1 ATE101268 T1 AT E101268T1
Authority
AT
Austria
Prior art keywords
foundation element
inertial mass
foundation
force
caissons
Prior art date
Application number
AT89200860T
Other languages
English (en)
Inventor
Patrick Bermingham
Original Assignee
Berminghammer Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Berminghammer Corp Ltd filed Critical Berminghammer Corp Ltd
Application granted granted Critical
Publication of ATE101268T1 publication Critical patent/ATE101268T1/de

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M5/00Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings
    • G01M5/0041Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings by determining deflection or stress
    • G01M5/005Investigating the elasticity of structures, e.g. deflection of bridges or air-craft wings by determining deflection or stress by means of external apparatus, e.g. test benches or portable test systems
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Investigating Strength Of Materials By Application Of Mechanical Stress (AREA)
  • Investigation Of Foundation Soil And Reinforcement Of Foundation Soil By Compacting Or Drainage (AREA)
  • Testing Of Devices, Machine Parts, Or Other Structures Thereof (AREA)
  • Revetment (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
AT89200860T 1988-04-07 1989-04-05 Pruefsystem fuer caissons und rammpfaehle. ATE101268T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CA000563495A CA1296925C (en) 1988-04-07 1988-04-07 Test system for caissons and piles
EP89200860A EP0336519B1 (de) 1988-04-07 1989-04-05 Prüfsystem für Caissons und Rammpfähle

Publications (1)

Publication Number Publication Date
ATE101268T1 true ATE101268T1 (de) 1994-02-15

Family

ID=4137786

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89200860T ATE101268T1 (de) 1988-04-07 1989-04-05 Pruefsystem fuer caissons und rammpfaehle.

Country Status (7)

Country Link
US (1) US4845996A (de)
EP (1) EP0336519B1 (de)
JP (1) JPH0670602B2 (de)
AT (1) ATE101268T1 (de)
CA (1) CA1296925C (de)
DE (1) DE68912806T2 (de)
ES (1) ES2050779T3 (de)

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US6349590B1 (en) * 1997-09-15 2002-02-26 Yee Kong Wai Method and apparatus for estimating load bearing capacity of piles
US6129487A (en) * 1998-07-30 2000-10-10 Bermingham Construction Limited Underwater pile driving tool
US7192681B2 (en) 2001-07-05 2007-03-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4448705B2 (ja) 2004-02-05 2010-04-14 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
WO2006015278A2 (en) * 2004-07-30 2006-02-09 Loadtest, Inc. Method and apparatus for automatic load testing using bi-directional testing
JP4602714B2 (ja) 2004-08-19 2010-12-22 株式会社ティラド 熱交換器
JP4469692B2 (ja) 2004-09-14 2010-05-26 富士フイルム株式会社 感光性組成物、該感光性組成物に用いられる化合物及び該感光性組成物を用いたパターン形成方法
JP4474256B2 (ja) 2004-09-30 2010-06-02 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
TWI530759B (zh) 2005-01-24 2016-04-21 富士軟片股份有限公司 適用於浸漬曝光之正型光阻組成物及使用它之圖案形成方法
JP4452632B2 (ja) 2005-01-24 2010-04-21 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
JP4562537B2 (ja) 2005-01-28 2010-10-13 富士フイルム株式会社 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法
US8741537B2 (en) 2005-03-04 2014-06-03 Fujifilm Corporation Positive resist composition and pattern-forming method using the same
US7960087B2 (en) 2005-03-11 2011-06-14 Fujifilm Corporation Positive photosensitive composition and pattern-forming method using the same
JP4579019B2 (ja) 2005-03-17 2010-11-10 富士フイルム株式会社 ポジ型レジスト組成物及び該レジスト組成物を用いたパターン形成方法
EP1720072B1 (de) 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Zusammensetzungen und Verfahren für Immersionslithografie
JP4724465B2 (ja) 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
JP4861767B2 (ja) 2005-07-26 2012-01-25 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP4695941B2 (ja) 2005-08-19 2011-06-08 富士フイルム株式会社 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
TWI403843B (zh) 2005-09-13 2013-08-01 Fujifilm Corp 正型光阻組成物及使用它之圖案形成方法
EP1795960B1 (de) 2005-12-09 2019-06-05 Fujifilm Corporation Positive Resistzusammensetzung, Verfahren zur Musterbildung unter Verwendung der positiven Resistzusammensetzung, Verwendung der positiven Resistzusammensetzung
JP4911456B2 (ja) 2006-11-21 2012-04-04 富士フイルム株式会社 ポジ型感光性組成物、該ポジ型感光性組成物に用いられる高分子化合物、該高分子化合物の製造方法及びポジ型感光性組成物を用いたパターン形成方法
JP4554665B2 (ja) 2006-12-25 2010-09-29 富士フイルム株式会社 パターン形成方法、該パターン形成方法に用いられる多重現像用ポジ型レジスト組成物、該パターン形成方法に用いられるネガ現像用現像液及び該パターン形成方法に用いられるネガ現像用リンス液
EP1962139A1 (de) 2007-02-23 2008-08-27 FUJIFILM Corporation Negative Resistzusammensetzung und Verfahren zur Strukturformung damit
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EP1975714A1 (de) 2007-03-28 2008-10-01 FUJIFILM Corporation Positive Resistzusammensetzung und Verfahren zur Strukturformung
EP1980911A3 (de) 2007-04-13 2009-06-24 FUJIFILM Corporation Strukturformungsverfahren, in dem Strukturformungsverfahren zu verwendende Harzzusammensetzung, in dem Strukturformungsverfahren zu verwendende negative Entwicklungslösung und in dem Strukturformungsverfahren zu verwendende Spüllösung
WO2008129964A1 (ja) 2007-04-13 2008-10-30 Fujifilm Corporation パターン形成方法、該パターン形成方法に用いられるレジスト組成物、現像液及びリンス液
JP4617337B2 (ja) 2007-06-12 2011-01-26 富士フイルム株式会社 パターン形成方法
JP2008311474A (ja) 2007-06-15 2008-12-25 Fujifilm Corp パターン形成方法
US8088550B2 (en) 2007-07-30 2012-01-03 Fujifilm Corporation Positive resist composition and pattern forming method
JP5066405B2 (ja) 2007-08-02 2012-11-07 富士フイルム株式会社 電子線、x線又はeuv用レジスト組成物及び該組成物を用いたパターン形成方法
JP5103316B2 (ja) 2007-08-03 2012-12-19 富士フイルム株式会社 新規なスルホニウム化合物を含有するポジ型レジスト組成物、該ポジ型レジスト組成物を用いたパターン形成方法及び新規なスルホニウム化合物
JP5449675B2 (ja) 2007-09-21 2014-03-19 富士フイルム株式会社 感光性組成物、該感光性組成物を用いたパターン形成方法及び該感光性組成物に用いられる化合物
JP5150296B2 (ja) 2008-02-13 2013-02-20 富士フイルム株式会社 電子線、x線またはeuv用ポジ型レジスト組成物及びこれを用いたパターン形成方法
US9046773B2 (en) 2008-03-26 2015-06-02 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
JP5244711B2 (ja) 2008-06-30 2013-07-24 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP5997873B2 (ja) 2008-06-30 2016-09-28 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
JP5746818B2 (ja) 2008-07-09 2015-07-08 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
RU2512672C2 (ru) 2008-11-21 2014-04-10 Хадар МАГАЛИ Отбойный механизм
WO2010067898A2 (en) 2008-12-12 2010-06-17 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition
WO2010067905A2 (en) 2008-12-12 2010-06-17 Fujifilm Corporation Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
JP5377172B2 (ja) 2009-03-31 2013-12-25 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法
CA2732380C (en) * 2010-02-22 2016-10-04 Ben Kasprick Method and apparatus for load testing a pile
US20120076996A1 (en) 2010-09-28 2012-03-29 Fujifilm Corporation Resist composition, resist film therefrom and method of forming pattern therewith
CN105525635B (zh) * 2016-01-18 2017-09-15 交通运输部公路科学研究所 用于桩基轴向承载力检测的加载装置
CN106049562B (zh) * 2016-07-18 2018-02-16 昆山市建设工程质量检测中心 一种用于桩基高应变检测的落锤高度调节装置
EP3885378A4 (de) 2018-11-22 2022-01-19 FUJIFILM Corporation Gegenüber aktinischen strahlen empfindliche oder strahlungsempfindliche harzzusammensetzung, resistfilm, strukturformungsverfahren und herstellungsverfahren für elektronische vorrichtung
CN112525711B (zh) * 2020-11-26 2023-08-22 中国电建集团成都勘测设计研究院有限公司 双向深部土体力学参数原位测试装置及测试结构

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FR92879E (fr) * 1966-09-23 1969-01-10 Louis Francois Procédé et appareil pour la mesure du module de déformation d'un matériau et des contraintes dans ce matériau.
GB1206396A (en) * 1966-10-28 1970-09-23 Wykeham Farrance Engineering L Improvements relating to geological sample testing apparatus
US3535919A (en) * 1968-12-02 1970-10-27 John P Budlong Dynamic determination of pile load capacity
DE2139735C3 (de) * 1971-08-07 1974-02-21 Rheinmetall Gmbh, 4000 Duesseldorf Einrichtung zum Simulieren der Schußbeanspruchung von Geschützrohren
US3798962A (en) * 1972-04-19 1974-03-26 Atomic Energy Commission Method for predicting movements of structural members emplaced in the earth
DE2439782B1 (de) * 1974-08-20 1975-10-30 Fa. Franz Gloetzl, 7501 Forchheim Kraflmeßgerät für Anker im Bauwesen
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US4379401A (en) * 1981-08-28 1983-04-12 The United States Of America As Represented By The Secretary Of The Army System for measuring plate deformation produced by explosive shock waves, and motion-sensing accelerometer transducer used therein
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Also Published As

Publication number Publication date
EP0336519A2 (de) 1989-10-11
US4845996A (en) 1989-07-11
EP0336519B1 (de) 1994-02-02
DE68912806D1 (de) 1994-03-17
JPH0670602B2 (ja) 1994-09-07
ES2050779T3 (es) 1994-06-01
CA1296925C (en) 1992-03-10
EP0336519A3 (de) 1991-07-03
JPH0228531A (ja) 1990-01-30
DE68912806T2 (de) 1994-08-11

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Legal Events

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UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee