AT376844B - Halbleiterbauteil - Google Patents
HalbleiterbauteilInfo
- Publication number
- AT376844B AT376844B AT1083973A AT1083973A AT376844B AT 376844 B AT376844 B AT 376844B AT 1083973 A AT1083973 A AT 1083973A AT 1083973 A AT1083973 A AT 1083973A AT 376844 B AT376844 B AT 376844B
- Authority
- AT
- Austria
- Prior art keywords
- semiconductor component
- semiconductor
- component
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/60—Impurity distributions or concentrations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/133—Emitter regions of BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/141—Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/141—Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
- H10D62/148—Cathode regions of thyristors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0112—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/611—Combinations of BJTs and one or more of diodes, resistors or capacitors
- H10D84/613—Combinations of vertical BJTs and one or more of diodes, resistors or capacitors
- H10D84/617—Combinations of vertical BJTs and only diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/67—Complementary BJTs
- H10D84/673—Vertical complementary BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48000550A JPS5147583B2 (enEXAMPLES) | 1972-12-29 | 1972-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ATA1083973A ATA1083973A (de) | 1984-05-15 |
| AT376844B true AT376844B (de) | 1985-01-10 |
Family
ID=11476818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT1083973A AT376844B (de) | 1972-12-29 | 1973-12-27 | Halbleiterbauteil |
Country Status (15)
| Country | Link |
|---|---|
| JP (1) | JPS5147583B2 (enEXAMPLES) |
| AT (1) | AT376844B (enEXAMPLES) |
| BE (1) | BE809216A (enEXAMPLES) |
| BR (1) | BR7310275D0 (enEXAMPLES) |
| CA (1) | CA993568A (enEXAMPLES) |
| CH (1) | CH577750A5 (enEXAMPLES) |
| DE (1) | DE2364752A1 (enEXAMPLES) |
| DK (1) | DK140036C (enEXAMPLES) |
| ES (1) | ES421881A1 (enEXAMPLES) |
| FR (1) | FR2212645B1 (enEXAMPLES) |
| GB (1) | GB1460037A (enEXAMPLES) |
| IT (1) | IT1002384B (enEXAMPLES) |
| NL (1) | NL7317815A (enEXAMPLES) |
| NO (1) | NO140844C (enEXAMPLES) |
| SE (1) | SE398940B (enEXAMPLES) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5914897B2 (ja) * | 1975-02-08 | 1984-04-06 | ソニー株式会社 | 半導体装置 |
| AT377645B (de) * | 1972-12-29 | 1985-04-10 | Sony Corp | Halbleiterbauteil |
| JPS5754969B2 (enEXAMPLES) * | 1974-04-04 | 1982-11-20 | ||
| JPS5753672B2 (enEXAMPLES) * | 1974-04-10 | 1982-11-13 | ||
| JPS57658B2 (enEXAMPLES) * | 1974-04-16 | 1982-01-07 | ||
| JPS5714064B2 (enEXAMPLES) * | 1974-04-25 | 1982-03-20 | ||
| JPS5648983B2 (enEXAMPLES) * | 1974-05-10 | 1981-11-19 | ||
| JPS5718710B2 (enEXAMPLES) * | 1974-05-10 | 1982-04-17 | ||
| JPS5426789Y2 (enEXAMPLES) * | 1974-07-23 | 1979-09-03 | ||
| US4178190A (en) | 1975-06-30 | 1979-12-11 | Rca Corporation | Method of making a bipolar transistor with high-low emitter impurity concentration |
| IT1061510B (it) * | 1975-06-30 | 1983-04-30 | Rca Corp | Transistore bipolare presentante un emettitore con una elevata bassa concentrazione di impurezze e metodo di fabbricazione dello stesso |
| JPS52100978A (en) * | 1976-02-20 | 1977-08-24 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device |
| JPS5565460A (en) * | 1978-11-09 | 1980-05-16 | Ibm | Method of manufacturing semiconductor device improved in current gain |
| JPS5946103B2 (ja) * | 1980-03-10 | 1984-11-10 | 日本電信電話株式会社 | トランジスタ |
Citations (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2822310A (en) * | 1955-04-21 | 1958-02-04 | Philips Corp | Semi-conductor device |
| DE1221363B (de) * | 1964-04-25 | 1966-07-21 | Telefunken Patent | Verfahren zum Verringern des Bahnwiderstands von Halbleiterbauelementen |
| DE1278023B (de) * | 1964-02-20 | 1968-09-19 | Westinghouse Electric Corp | Halbleiterschaltelement und Verfahren zu seiner Herstellung |
| DE1297237B (de) * | 1964-09-18 | 1969-06-12 | Itt Ind Gmbh Deutsche | Flaechentransistor und Verfahren zu seiner Herstellung |
| GB1160429A (en) * | 1965-10-14 | 1969-08-06 | Philco Ford Corp | Improvements in and relating to Semiconductive Devices. |
| US3469117A (en) * | 1966-01-08 | 1969-09-23 | Nippon Telegraph & Telephone | Electric circuit employing semiconductor devices |
| DE1917013A1 (de) * | 1968-04-11 | 1969-10-23 | Westinghouse Electric Corp | Halbleitervierschichttriode |
| CH484519A (de) * | 1967-08-11 | 1970-01-15 | Westinghouse Electric Corp | Steuerbares Halbleiterbauelement |
| US3500141A (en) * | 1964-10-13 | 1970-03-10 | Ibm | Transistor structure |
| US3512056A (en) * | 1967-04-25 | 1970-05-12 | Westinghouse Electric Corp | Double epitaxial layer high power,high speed transistor |
| DE1614383A1 (de) * | 1966-12-01 | 1970-05-27 | Rca Corp | Halbleiterbauelement und Verfahren zu seiner Herstellung |
| US3544863A (en) * | 1968-10-29 | 1970-12-01 | Motorola Inc | Monolithic integrated circuit substructure with epitaxial decoupling capacitance |
| DE2048737A1 (de) * | 1969-11-10 | 1971-05-13 | Ibm | Verfahren zur Herstellung integrierter Transistoren |
| US3591430A (en) * | 1968-11-14 | 1971-07-06 | Philco Ford Corp | Method for fabricating bipolar planar transistor having reduced minority carrier fringing |
| DE1764765A1 (de) * | 1967-08-03 | 1971-07-08 | Rca Corp | Halbleiter-Bauelement |
| DE2014173B2 (de) * | 1969-03-28 | 1972-04-06 | Hitachi, Ltd , Tokio | Verfahren zum herstellen einer vielzahl von halbleiteranordnungen, insbesondere leistungstransistoren |
| DE2060854A1 (de) * | 1970-12-10 | 1972-08-17 | Siemens Ag | Halbleiterbauelement mit drei Zonen abwechselnden Leitfaehigkeitstyps und Anordnung zu seiner Ansteuerung |
| FR2130399A1 (enEXAMPLES) * | 1971-03-20 | 1972-11-03 | Philips Nv | |
| DE2320563A1 (de) * | 1972-04-20 | 1973-10-25 | Sony Corp | Vierschichttriode |
-
1972
- 1972-12-29 JP JP48000550A patent/JPS5147583B2/ja not_active Expired
-
1973
- 1973-12-20 GB GB5909373A patent/GB1460037A/en not_active Expired
- 1973-12-21 DK DK701973A patent/DK140036C/da not_active IP Right Cessation
- 1973-12-27 IT IT32324/73A patent/IT1002384B/it active
- 1973-12-27 DE DE2364752A patent/DE2364752A1/de not_active Ceased
- 1973-12-27 AT AT1083973A patent/AT376844B/de not_active IP Right Cessation
- 1973-12-27 CH CH1814173A patent/CH577750A5/de not_active IP Right Cessation
- 1973-12-28 CA CA189,167A patent/CA993568A/en not_active Expired
- 1973-12-28 ES ES421881A patent/ES421881A1/es not_active Expired
- 1973-12-28 SE SE7317518A patent/SE398940B/xx unknown
- 1973-12-28 FR FR7347090A patent/FR2212645B1/fr not_active Expired
- 1973-12-28 BE BE2053325A patent/BE809216A/xx not_active IP Right Cessation
- 1973-12-28 NL NL7317815A patent/NL7317815A/xx unknown
- 1973-12-28 NO NO4980/73A patent/NO140844C/no unknown
- 1973-12-28 BR BR10275/73A patent/BR7310275D0/pt unknown
Patent Citations (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2822310A (en) * | 1955-04-21 | 1958-02-04 | Philips Corp | Semi-conductor device |
| DE1278023B (de) * | 1964-02-20 | 1968-09-19 | Westinghouse Electric Corp | Halbleiterschaltelement und Verfahren zu seiner Herstellung |
| DE1221363B (de) * | 1964-04-25 | 1966-07-21 | Telefunken Patent | Verfahren zum Verringern des Bahnwiderstands von Halbleiterbauelementen |
| DE1297237B (de) * | 1964-09-18 | 1969-06-12 | Itt Ind Gmbh Deutsche | Flaechentransistor und Verfahren zu seiner Herstellung |
| US3500141A (en) * | 1964-10-13 | 1970-03-10 | Ibm | Transistor structure |
| GB1160429A (en) * | 1965-10-14 | 1969-08-06 | Philco Ford Corp | Improvements in and relating to Semiconductive Devices. |
| DE1564509A1 (de) * | 1965-10-14 | 1970-03-05 | Philco Ford Corp | Transistor |
| US3469117A (en) * | 1966-01-08 | 1969-09-23 | Nippon Telegraph & Telephone | Electric circuit employing semiconductor devices |
| DE1614383A1 (de) * | 1966-12-01 | 1970-05-27 | Rca Corp | Halbleiterbauelement und Verfahren zu seiner Herstellung |
| US3512056A (en) * | 1967-04-25 | 1970-05-12 | Westinghouse Electric Corp | Double epitaxial layer high power,high speed transistor |
| DE1764765A1 (de) * | 1967-08-03 | 1971-07-08 | Rca Corp | Halbleiter-Bauelement |
| CH484519A (de) * | 1967-08-11 | 1970-01-15 | Westinghouse Electric Corp | Steuerbares Halbleiterbauelement |
| DE1917013A1 (de) * | 1968-04-11 | 1969-10-23 | Westinghouse Electric Corp | Halbleitervierschichttriode |
| US3544863A (en) * | 1968-10-29 | 1970-12-01 | Motorola Inc | Monolithic integrated circuit substructure with epitaxial decoupling capacitance |
| US3591430A (en) * | 1968-11-14 | 1971-07-06 | Philco Ford Corp | Method for fabricating bipolar planar transistor having reduced minority carrier fringing |
| DE2014173B2 (de) * | 1969-03-28 | 1972-04-06 | Hitachi, Ltd , Tokio | Verfahren zum herstellen einer vielzahl von halbleiteranordnungen, insbesondere leistungstransistoren |
| DE2048737A1 (de) * | 1969-11-10 | 1971-05-13 | Ibm | Verfahren zur Herstellung integrierter Transistoren |
| DE2060854A1 (de) * | 1970-12-10 | 1972-08-17 | Siemens Ag | Halbleiterbauelement mit drei Zonen abwechselnden Leitfaehigkeitstyps und Anordnung zu seiner Ansteuerung |
| FR2130399A1 (enEXAMPLES) * | 1971-03-20 | 1972-11-03 | Philips Nv | |
| DE2320563A1 (de) * | 1972-04-20 | 1973-10-25 | Sony Corp | Vierschichttriode |
Also Published As
| Publication number | Publication date |
|---|---|
| AU6378973A (en) | 1975-06-19 |
| NO140844C (no) | 1979-11-21 |
| CA993568A (en) | 1976-07-20 |
| DE2364752A1 (de) | 1974-08-01 |
| NL7317815A (enEXAMPLES) | 1974-07-02 |
| DK140036B (da) | 1979-06-05 |
| BR7310275D0 (pt) | 1974-09-24 |
| NO140844B (no) | 1979-08-13 |
| ES421881A1 (es) | 1976-08-01 |
| GB1460037A (en) | 1976-12-31 |
| BE809216A (fr) | 1974-04-16 |
| CH577750A5 (enEXAMPLES) | 1976-07-15 |
| FR2212645B1 (enEXAMPLES) | 1977-08-05 |
| SE398940B (sv) | 1978-01-23 |
| JPS5147583B2 (enEXAMPLES) | 1976-12-15 |
| ATA1083973A (de) | 1984-05-15 |
| FR2212645A1 (enEXAMPLES) | 1974-07-26 |
| JPS4991191A (enEXAMPLES) | 1974-08-30 |
| DK140036C (da) | 1979-12-24 |
| IT1002384B (it) | 1976-05-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ELA | Expired due to lapse of time |