AR245830A1 - Mejoras en o relacionadas con dispositivos sensibles a la radiacion. - Google Patents

Mejoras en o relacionadas con dispositivos sensibles a la radiacion.

Info

Publication number
AR245830A1
AR245830A1 AR89314080A AR31408089A AR245830A1 AR 245830 A1 AR245830 A1 AR 245830A1 AR 89314080 A AR89314080 A AR 89314080A AR 31408089 A AR31408089 A AR 31408089A AR 245830 A1 AR245830 A1 AR 245830A1
Authority
AR
Argentina
Prior art keywords
radiation
sensitive
liquid
stratum
substrate
Prior art date
Application number
AR89314080A
Other languages
English (en)
Original Assignee
Vickers Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Plc filed Critical Vickers Plc
Application granted granted Critical
Publication of AR245830A1 publication Critical patent/AR245830A1/es

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/0255—Discharge apparatus, e.g. electrostatic spray guns spraying and depositing by electrostatic forces only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Elimination Of Static Electricity (AREA)
  • Measurement Of Radiation (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Permanent Magnet Type Synchronous Machine (AREA)

Abstract

UN METODO PARA PRODUCIR UN DISPOSITIVO SENSIBLE A RADIACION MEDIANTE LA PROVISION DE UN SUBSTRATO QUE PORTA UN ESTRATO SENSIBLE A RADIACION Y LA APLICACION SOBRE LA SUPERFICIE DEL ESTRATO SENSIBLE A RADIACION DE UN ESTRATO DE RECUBRIMIENTO DISCONTINUO, EL CUAL ES APLICADO DISOLVIENDO EL MATERIAL QUE HA DE FORMAR EL ESTRATO DISCONTINUO, EN UN SOLVENTE PARA PRODUCIR UN LIQUIDO QUE TIENE UNA CONDUCTIVIDAD DE DESDE 1.000 HASTA 1.000.000.000 1/PSM, Y DIRIGIENDO DICHO LIQUIDO HACIA EL ESTRATO SENSIBLE A RADIACION AL TIEMPO QUE SE APLICA O INDUCE EN DICHO LIQUIDO UN POTENCIAL DE POR LO MENOS 5 KV RESPECTO DEL SUBSTRATO DE MANERA QUE EL LIQUIDO FORMA UNO O MAS LIGAMENTOS QUE SE ROMPEN EN GOTAS QUE SON DEPOSITADAS SOBRE EL ESTRATO SENSIBLE A RADIACION, SIENDO DICHO POTENCIAL LAUNICA FUERZA DISRUPTIVA QUE ACTUA SOBRE DICHO LIQUIDO.
AR89314080A 1988-06-03 1989-06-05 Mejoras en o relacionadas con dispositivos sensibles a la radiacion. AR245830A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB888813154A GB8813154D0 (en) 1988-06-03 1988-06-03 Improvements in/relating to radiation sensitive devices

Publications (1)

Publication Number Publication Date
AR245830A1 true AR245830A1 (es) 1994-02-28

Family

ID=10638008

Family Applications (1)

Application Number Title Priority Date Filing Date
AR89314080A AR245830A1 (es) 1988-06-03 1989-06-05 Mejoras en o relacionadas con dispositivos sensibles a la radiacion.

Country Status (19)

Country Link
US (1) US5006442A (es)
EP (1) EP0344985B1 (es)
JP (1) JP2761241B2 (es)
KR (1) KR910000359A (es)
AR (1) AR245830A1 (es)
AT (1) ATE110176T1 (es)
AU (1) AU620404B2 (es)
BR (1) BR8902562A (es)
CA (1) CA1332214C (es)
DE (1) DE68917528T2 (es)
DK (1) DK272489A (es)
ES (1) ES2057122T3 (es)
FI (1) FI892676A (es)
GB (1) GB8813154D0 (es)
HU (1) HUH3517A (es)
NO (1) NO892262L (es)
NZ (1) NZ229371A (es)
ZA (1) ZA894146B (es)
ZW (1) ZW7389A1 (es)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8926281D0 (en) * 1989-11-21 1990-01-10 Du Pont Improvements in or relating to radiation sensitive devices
JP2630487B2 (ja) * 1990-06-14 1997-07-16 富士写真フイルム株式会社 感光性印刷版の製造方法
JP2622769B2 (ja) * 1990-04-19 1997-06-18 富士写真フイルム株式会社 感光性印刷版の製造方法
JPH0446343A (ja) * 1990-06-14 1992-02-17 Fuji Photo Film Co Ltd 感光性印刷版及びその製造方法
JPH0446341A (ja) * 1990-06-14 1992-02-17 Fuji Photo Film Co Ltd 感光性印刷版の製造方法
DE4126836A1 (de) * 1991-08-14 1993-02-18 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche
IT1252016B (it) * 1991-11-28 1995-05-27 Lastra Spa Metodo ed apparecchiatura per la mattatura di lastre da stampa fotosensibili
DE4228344C2 (de) * 1992-08-26 1999-06-10 Inst Chemo U Biosensorik E V Verfahren zur Photoresistbeschichtung von mikromechanisch dreidimensional strukturierten Bauteilen in der Mikrostrukturtechnik sowie Vorrichtung zur Durchführung des Verfahrens
DE4335425A1 (de) * 1993-10-18 1995-04-20 Hoechst Ag Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial
DE19533021A1 (de) * 1995-09-07 1997-03-13 Hoechst Ag Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung
JPH10171124A (ja) * 1996-12-11 1998-06-26 Konica Corp 感光性印刷版の製造方法
US6174651B1 (en) * 1999-01-14 2001-01-16 Steag Rtp Systems, Inc. Method for depositing atomized materials onto a substrate utilizing light exposure for heating
US6500494B2 (en) 2000-12-29 2002-12-31 Kodak Polychrome Graphics Llc Spray coating matting method for printing plate precursors
JP5080177B2 (ja) * 2007-09-03 2012-11-21 日本電波工業株式会社 レジスト塗布装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58137469A (ja) * 1982-02-10 1983-08-15 Fuji Photo Film Co Ltd 記録材料のマツト化方法
JPS59219751A (ja) * 1983-05-27 1984-12-11 Fuji Photo Film Co Ltd 記録材料のマツト化方法
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
DE3523176A1 (de) * 1985-06-28 1987-01-08 Hoechst Ag Strahlungsempfindliche beschichtungsloesung und verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger
GB8529958D0 (en) * 1985-12-05 1986-01-15 Vickers Plc Radiation sensitive devices

Also Published As

Publication number Publication date
ZW7389A1 (en) 1989-12-20
CA1332214C (en) 1994-10-04
NZ229371A (en) 1991-07-26
ATE110176T1 (de) 1994-09-15
JP2761241B2 (ja) 1998-06-04
EP0344985A2 (en) 1989-12-06
ES2057122T3 (es) 1994-10-16
FI892676A0 (fi) 1989-06-01
BR8902562A (pt) 1990-03-20
NO892262D0 (no) 1989-06-02
FI892676A (fi) 1989-12-04
JPH0243554A (ja) 1990-02-14
EP0344985B1 (en) 1994-08-17
KR910000359A (ko) 1991-01-29
DE68917528D1 (de) 1994-09-22
DK272489D0 (da) 1989-06-02
US5006442A (en) 1991-04-09
EP0344985A3 (en) 1990-04-04
AU3591889A (en) 1989-12-07
NO892262L (no) 1989-12-04
ZA894146B (en) 1990-03-28
DK272489A (da) 1989-12-04
AU620404B2 (en) 1992-02-20
GB8813154D0 (en) 1988-07-06
HUH3517A (en) 1991-01-28
DE68917528T2 (de) 1994-12-22

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