ES2057122T3 - Dispositivos sensibles a la radiacion. - Google Patents
Dispositivos sensibles a la radiacion.Info
- Publication number
- ES2057122T3 ES2057122T3 ES89305352T ES89305352T ES2057122T3 ES 2057122 T3 ES2057122 T3 ES 2057122T3 ES 89305352 T ES89305352 T ES 89305352T ES 89305352 T ES89305352 T ES 89305352T ES 2057122 T3 ES2057122 T3 ES 2057122T3
- Authority
- ES
- Spain
- Prior art keywords
- plate
- radiation sensitive
- protective layer
- sensitive devices
- ligaments
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/02—Engraving; Heads therefor
- B41C1/04—Engraving; Heads therefor using heads controlled by an electric information signal
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
- B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
- B05B5/0255—Discharge apparatus, e.g. electrostatic spray guns spraying and depositing by electrostatic forces only
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/151—Matting or other surface reflectivity altering material
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Elimination Of Static Electricity (AREA)
- Measurement Of Radiation (AREA)
- Printing Plates And Materials Therefor (AREA)
- Permanent Magnet Type Synchronous Machine (AREA)
Abstract
SE PROPORCIONA UNA PLACA SENSIBLE A LA RADIACION CON UNA CAPA DE PROTECCION DISCONTINUA PARA MEJORAR EL RETROCESO DE LA CAIDA DE VACIO. LA CAPA DE PROTECCION SE PRODUCE DISOLVIENDO EL MATERIAL PARA FORMAR LA CAPA DE PROTECCION EN UN DISOLVENTE, PARA FORMAR UNA DISOLUCION QUE TIENE UNA CONDUCTIVIDAD DE 103-109 PSM-1. LA DISOLUCION SE DIRIGE LUEGO A LA PLACA AL TIEMPO QUE SE APLICA UN POTENCIAL DE 5 KV POR LO MENOS ENTRE LA DISOLUCION Y LA PLACA. EL POTENCIAL ES LA UNICA FUENTE DISRUPTIVA EN EL LIQUIDO Y ARRASTRA EL LIQUIDO A LOS LIGAMENTOS Y ROMPE LOS LIGAMENTOS PARA FORMAR GOTAS DE TAMAÑO PRACTICAMENTE IGUAL, QUE SE DEPOSITAN LUEGO EN LA PLACA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB888813154A GB8813154D0 (en) | 1988-06-03 | 1988-06-03 | Improvements in/relating to radiation sensitive devices |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2057122T3 true ES2057122T3 (es) | 1994-10-16 |
Family
ID=10638008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES89305352T Expired - Lifetime ES2057122T3 (es) | 1988-06-03 | 1989-05-26 | Dispositivos sensibles a la radiacion. |
Country Status (19)
Country | Link |
---|---|
US (1) | US5006442A (es) |
EP (1) | EP0344985B1 (es) |
JP (1) | JP2761241B2 (es) |
KR (1) | KR910000359A (es) |
AR (1) | AR245830A1 (es) |
AT (1) | ATE110176T1 (es) |
AU (1) | AU620404B2 (es) |
BR (1) | BR8902562A (es) |
CA (1) | CA1332214C (es) |
DE (1) | DE68917528T2 (es) |
DK (1) | DK272489A (es) |
ES (1) | ES2057122T3 (es) |
FI (1) | FI892676A (es) |
GB (1) | GB8813154D0 (es) |
HU (1) | HUH3517A (es) |
NO (1) | NO892262L (es) |
NZ (1) | NZ229371A (es) |
ZA (1) | ZA894146B (es) |
ZW (1) | ZW7389A1 (es) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8926281D0 (en) * | 1989-11-21 | 1990-01-10 | Du Pont | Improvements in or relating to radiation sensitive devices |
JP2630487B2 (ja) * | 1990-06-14 | 1997-07-16 | 富士写真フイルム株式会社 | 感光性印刷版の製造方法 |
JP2622769B2 (ja) * | 1990-04-19 | 1997-06-18 | 富士写真フイルム株式会社 | 感光性印刷版の製造方法 |
JPH0446341A (ja) * | 1990-06-14 | 1992-02-17 | Fuji Photo Film Co Ltd | 感光性印刷版の製造方法 |
JPH0446343A (ja) * | 1990-06-14 | 1992-02-17 | Fuji Photo Film Co Ltd | 感光性印刷版及びその製造方法 |
DE4126836A1 (de) * | 1991-08-14 | 1993-02-18 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche |
IT1252016B (it) * | 1991-11-28 | 1995-05-27 | Lastra Spa | Metodo ed apparecchiatura per la mattatura di lastre da stampa fotosensibili |
DE4228344C2 (de) * | 1992-08-26 | 1999-06-10 | Inst Chemo U Biosensorik E V | Verfahren zur Photoresistbeschichtung von mikromechanisch dreidimensional strukturierten Bauteilen in der Mikrostrukturtechnik sowie Vorrichtung zur Durchführung des Verfahrens |
DE4335425A1 (de) * | 1993-10-18 | 1995-04-20 | Hoechst Ag | Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial |
DE19533021A1 (de) * | 1995-09-07 | 1997-03-13 | Hoechst Ag | Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung |
JPH10171124A (ja) * | 1996-12-11 | 1998-06-26 | Konica Corp | 感光性印刷版の製造方法 |
US6174651B1 (en) * | 1999-01-14 | 2001-01-16 | Steag Rtp Systems, Inc. | Method for depositing atomized materials onto a substrate utilizing light exposure for heating |
US6500494B2 (en) * | 2000-12-29 | 2002-12-31 | Kodak Polychrome Graphics Llc | Spray coating matting method for printing plate precursors |
JP5080177B2 (ja) * | 2007-09-03 | 2012-11-21 | 日本電波工業株式会社 | レジスト塗布装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58137469A (ja) * | 1982-02-10 | 1983-08-15 | Fuji Photo Film Co Ltd | 記録材料のマツト化方法 |
JPS59219751A (ja) * | 1983-05-27 | 1984-12-11 | Fuji Photo Film Co Ltd | 記録材料のマツト化方法 |
DE3433247A1 (de) * | 1984-09-11 | 1986-03-20 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
DE3523176A1 (de) * | 1985-06-28 | 1987-01-08 | Hoechst Ag | Strahlungsempfindliche beschichtungsloesung und verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger |
GB8529958D0 (en) * | 1985-12-05 | 1986-01-15 | Vickers Plc | Radiation sensitive devices |
-
1988
- 1988-06-03 GB GB888813154A patent/GB8813154D0/en active Pending
-
1989
- 1989-05-26 DE DE68917528T patent/DE68917528T2/de not_active Expired - Fee Related
- 1989-05-26 EP EP89305352A patent/EP0344985B1/en not_active Expired - Lifetime
- 1989-05-26 ES ES89305352T patent/ES2057122T3/es not_active Expired - Lifetime
- 1989-05-26 AT AT89305352T patent/ATE110176T1/de active
- 1989-05-30 CA CA000601143A patent/CA1332214C/en not_active Expired - Fee Related
- 1989-05-31 NZ NZ229371A patent/NZ229371A/en unknown
- 1989-05-31 US US07/359,373 patent/US5006442A/en not_active Expired - Lifetime
- 1989-05-31 ZW ZW73/89A patent/ZW7389A1/xx unknown
- 1989-06-01 AU AU35918/89A patent/AU620404B2/en not_active Ceased
- 1989-06-01 ZA ZA894146A patent/ZA894146B/xx unknown
- 1989-06-01 FI FI892676A patent/FI892676A/fi not_active IP Right Cessation
- 1989-06-02 JP JP1140950A patent/JP2761241B2/ja not_active Expired - Fee Related
- 1989-06-02 HU HU892834A patent/HUH3517A/hu unknown
- 1989-06-02 NO NO89892262A patent/NO892262L/no unknown
- 1989-06-02 BR BR898902562A patent/BR8902562A/pt not_active Application Discontinuation
- 1989-06-02 DK DK272489A patent/DK272489A/da unknown
- 1989-06-02 KR KR1019890007628A patent/KR910000359A/ko not_active Application Discontinuation
- 1989-06-05 AR AR89314080A patent/AR245830A1/es active
Also Published As
Publication number | Publication date |
---|---|
AU620404B2 (en) | 1992-02-20 |
EP0344985B1 (en) | 1994-08-17 |
EP0344985A2 (en) | 1989-12-06 |
DE68917528T2 (de) | 1994-12-22 |
BR8902562A (pt) | 1990-03-20 |
FI892676A (fi) | 1989-12-04 |
HUH3517A (en) | 1991-01-28 |
ZA894146B (en) | 1990-03-28 |
NO892262L (no) | 1989-12-04 |
KR910000359A (ko) | 1991-01-29 |
DE68917528D1 (de) | 1994-09-22 |
CA1332214C (en) | 1994-10-04 |
NZ229371A (en) | 1991-07-26 |
EP0344985A3 (en) | 1990-04-04 |
ZW7389A1 (en) | 1989-12-20 |
DK272489D0 (da) | 1989-06-02 |
NO892262D0 (no) | 1989-06-02 |
AU3591889A (en) | 1989-12-07 |
GB8813154D0 (en) | 1988-07-06 |
JP2761241B2 (ja) | 1998-06-04 |
FI892676A0 (fi) | 1989-06-01 |
AR245830A1 (es) | 1994-02-28 |
JPH0243554A (ja) | 1990-02-14 |
US5006442A (en) | 1991-04-09 |
DK272489A (da) | 1989-12-04 |
ATE110176T1 (de) | 1994-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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