ZA98474B - Photoactivatable nitrogen-containing bases based on alpha-amino ketones - Google Patents

Photoactivatable nitrogen-containing bases based on alpha-amino ketones

Info

Publication number
ZA98474B
ZA98474B ZA98474A ZA98474A ZA98474B ZA 98474 B ZA98474 B ZA 98474B ZA 98474 A ZA98474 A ZA 98474A ZA 98474 A ZA98474 A ZA 98474A ZA 98474 B ZA98474 B ZA 98474B
Authority
ZA
South Africa
Prior art keywords
alpha
containing bases
amino ketones
bases based
photoactivatable
Prior art date
Application number
ZA98474A
Other languages
English (en)
Inventor
Veronique Hall-Goulle
Sean Colm Turner
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of ZA98474B publication Critical patent/ZA98474B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L91/00Compositions of oils, fats or waxes; Compositions of derivatives thereof
    • C08L91/06Waxes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/17Amines; Quaternary ammonium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3462Six-membered rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerization Catalysts (AREA)
  • Indole Compounds (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Polyamides (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
ZA98474A 1997-01-22 1998-01-21 Photoactivatable nitrogen-containing bases based on alpha-amino ketones ZA98474B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH13397 1997-01-22

Publications (1)

Publication Number Publication Date
ZA98474B true ZA98474B (en) 1998-07-22

Family

ID=4180006

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA98474A ZA98474B (en) 1997-01-22 1998-01-21 Photoactivatable nitrogen-containing bases based on alpha-amino ketones

Country Status (14)

Country Link
US (3) US20010027253A1 (de)
EP (1) EP0971924B1 (de)
JP (1) JP4246268B2 (de)
KR (1) KR100505529B1 (de)
CN (1) CN1138777C (de)
AU (1) AU719308B2 (de)
BR (1) BR9807502B1 (de)
CA (1) CA2276613C (de)
DE (1) DE69807322T2 (de)
DK (1) DK0971924T3 (de)
ES (1) ES2181162T3 (de)
TW (1) TW432031B (de)
WO (1) WO1998032756A1 (de)
ZA (1) ZA98474B (de)

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EP1243632A1 (de) * 2001-03-19 2002-09-25 Ciba SC Holding AG Thermisch härtbare Lackzusammensetzung
JP4105859B2 (ja) * 2001-10-15 2008-06-25 Juki株式会社 ミシン
CN1571788B (zh) * 2001-10-17 2012-08-01 西巴特殊化学品控股有限公司 光活化性氮碱
US6897264B2 (en) * 2001-12-21 2005-05-24 Dainippon Ink And Chemicals, Inc. Curable mixtures
US7048648B2 (en) * 2003-09-05 2006-05-23 Callaway Golf Company Putter-type golf club head with an insert
US7344451B2 (en) * 2004-09-30 2008-03-18 Callaway Golf Company Putter-type club head
US7147569B2 (en) * 2004-10-29 2006-12-12 Callaway Golf Company Putter-type club head
US20060118998A1 (en) * 2004-12-07 2006-06-08 Kenneth Meacham Putter-type club head with an insert and method of manufacturing
US7198834B2 (en) * 2005-03-22 2007-04-03 Hewlett-Packard Development Company, L.P. Imaging media including interference layer for generating human-readable marking on optical media
US7270944B2 (en) * 2005-03-29 2007-09-18 Hewlett-Packard Development Company, L.P. Compositions, systems, and methods for imaging
JP4589809B2 (ja) * 2005-06-06 2010-12-01 パナソニック株式会社 バリア膜形成用材料及びそれを用いたパターン形成方法
US20070065749A1 (en) * 2005-09-21 2007-03-22 Vladek Kasperchik Radiation-markable coatings for printing and imaging
US20070065623A1 (en) * 2005-09-21 2007-03-22 Vladek Kasperchik Laser-imageable coating based on exothermic decomposition
US20070086308A1 (en) * 2005-10-13 2007-04-19 Gore Makarand P Systems and methods for imaging
KR101433684B1 (ko) * 2006-07-17 2014-08-25 시바 홀딩 인크 결합방법
MX2009010309A (es) 2007-04-03 2009-10-16 Basf Se Bases nitrogenadas fotoactivables.
WO2012003160A1 (en) 2010-06-30 2012-01-05 3M Innovative Properties Company Curable composition comprising dual reactive silane functionality
WO2012003108A1 (en) 2010-06-30 2012-01-05 3M Innovative Properties Company Curable polysiloxane coating composition
WO2012003153A1 (en) 2010-06-30 2012-01-05 3M Innovative Properties Company Curable-on-demand polysiloxane coating composition
CN101974112B (zh) * 2010-11-16 2012-05-30 南通新昱化工有限公司 大分子双官能团胺基酮光引发剂及其制备方法
EP2797998A1 (de) 2011-12-29 2014-11-05 3M Innovative Properties Company Härtbare polysiloxanzusammensetzung
CN104093785B (zh) 2011-12-29 2016-08-24 3M创新有限公司 可固化聚硅氧烷组合物和由其制得的压敏粘合剂
EP2838935A1 (de) 2011-12-29 2015-02-25 3M Innovative Properties Company Härtbare polysiloxanbeschichtungszusammensetzung
EP2797985B1 (de) 2011-12-29 2015-09-23 3M Innovative Properties Company Bei bedarf härtbare polysiloxanbeschichtungszusammensetzung
JP6073081B2 (ja) * 2012-07-12 2017-02-01 スリーエム イノベイティブ プロパティズ カンパニー 透明粘着シート
WO2015008709A1 (ja) 2013-07-18 2015-01-22 セメダイン株式会社 光硬化性組成物
KR20170001752A (ko) * 2013-08-09 2017-01-04 다이요 홀딩스 가부시키가이샤 감광성 수지 조성물, 그의 릴리프 패턴막, 릴리프 패턴막의 제조 방법, 릴리프 패턴막을 포함하는 전자 부품 또는 광학 제품, 및 감광성 수지 조성물을 포함하는 접착제
US9718999B2 (en) 2013-12-13 2017-08-01 Cemedine Co., Ltd Photocurable composition having adhesive properties
CN103980181B (zh) * 2014-05-30 2016-01-20 山西大学 含有1-甲基-2-苯基吲哚骨架的三芳基锍盐及其制备方法
WO2016034963A1 (en) * 2014-09-04 2016-03-10 Basf Se Polycyclic photoinitiators
MX2017013601A (es) 2015-04-29 2018-07-06 Bsn Medical Gmbh Un proceso de etapas multiples para la produccion de no.
WO2016176537A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Method of making a polymer network from a polythiol and a polyepoxide
CN107708647B (zh) 2015-04-29 2021-02-19 Bsn医疗有限公司 医疗洗浴设备
MX2018016347A (es) 2016-06-30 2019-04-22 Elementis Specialties Inc Composiciones reticulables de revestimiento formuladas con iniciador latente de carbamato.
EP3535341A1 (de) 2016-11-03 2019-09-11 3M Innovative Properties Company Polythiol-dichtungszusammensetzungen
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
WO2018106531A1 (en) 2016-12-05 2018-06-14 Arkema Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
US11920058B2 (en) 2018-01-26 2024-03-05 Allnex Netherlands B.V. Powder coating composition
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

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Publication number Priority date Publication date Assignee Title
CA1067079A (en) * 1976-07-22 1979-11-27 Yamanouchi Pharmaceutical Co. Nitrogen-containing heterobicyclic compounds
HU176942B (hu) * 1979-05-11 1981-06-28 Chinoin Gyogyszer Es Vegyeszet Sposob poluchenija 2,3- i 3,4-dvuzamehhjonnykh tetragidro-pirrolo!1,2-a!-pirimidinov
ZA852044B (en) * 1984-03-29 1985-11-27 Akzo Nv Liquid coating composition curable at ambient temperature
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
DE4419315A1 (de) * 1994-06-01 1995-12-07 Merckle Gmbh Heteropyrrolizinverbindungen und deren Anwendung in der Pharmazie

Also Published As

Publication number Publication date
AU5987398A (en) 1998-08-18
KR100505529B1 (ko) 2005-08-04
CN1244198A (zh) 2000-02-09
WO1998032756A1 (en) 1998-07-30
US20010027253A1 (en) 2001-10-04
US6277986B1 (en) 2001-08-21
JP2001512421A (ja) 2001-08-21
DE69807322D1 (de) 2002-09-26
US20020077503A1 (en) 2002-06-20
BR9807502B1 (pt) 2008-11-18
KR20000070399A (ko) 2000-11-25
TW432031B (en) 2001-05-01
CA2276613C (en) 2008-02-05
EP0971924B1 (de) 2002-08-21
CA2276613A1 (en) 1998-07-30
DK0971924T3 (da) 2002-12-16
ES2181162T3 (es) 2003-02-16
DE69807322T2 (de) 2003-04-17
JP4246268B2 (ja) 2009-04-02
CN1138777C (zh) 2004-02-18
BR9807502A (pt) 2000-03-21
US6410628B1 (en) 2002-06-25
AU719308B2 (en) 2000-05-04
EP0971924A1 (de) 2000-01-19

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