ZA965647B - Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates - Google Patents

Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates

Info

Publication number
ZA965647B
ZA965647B ZA965647A ZA965647A ZA965647B ZA 965647 B ZA965647 B ZA 965647B ZA 965647 A ZA965647 A ZA 965647A ZA 965647 A ZA965647 A ZA 965647A ZA 965647 B ZA965647 B ZA 965647B
Authority
ZA
South Africa
Prior art keywords
mole
chem
formula
amount
present
Prior art date
Application number
ZA965647A
Other languages
English (en)
Inventor
Harald Baumann
Udo Dwars
Celin M Savariar-Hauck
Hans-Joachim Timpe
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of ZA965647B publication Critical patent/ZA965647B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/28—Condensation with aldehydes or ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
ZA965647A 1995-07-07 1996-07-03 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates ZA965647B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19524851A DE19524851C2 (de) 1995-07-07 1995-07-07 Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten

Publications (1)

Publication Number Publication Date
ZA965647B true ZA965647B (en) 1997-06-06

Family

ID=7766308

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA965647A ZA965647B (en) 1995-07-07 1996-07-03 Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates

Country Status (7)

Country Link
US (2) US5700619A (xx)
EP (1) EP0752430B1 (xx)
AT (1) ATE196481T1 (xx)
CA (1) CA2180581A1 (xx)
DE (2) DE19524851C2 (xx)
ES (1) ES2151625T3 (xx)
ZA (1) ZA965647B (xx)

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US6902861B2 (en) * 2003-03-10 2005-06-07 Kodak Polychrome Graphics, Llc Infrared absorbing compounds and their use in photoimageable elements
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EP2937733A4 (en) * 2012-12-19 2016-09-14 Ibf Indústria Brasileira De Filmes S A RADIATION-SENSITIVE COMPOSITION IN ELECTROMAGNETIC SPECTRUM REGIONS FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING THE SAME, USE OF THE SAME, AND IMAGE DEVELOPMENT METHOD
CN104870193B (zh) 2013-01-01 2017-12-22 爱克发印艺公司 (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
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PL3291989T3 (pl) 2015-05-04 2020-01-31 Flint Group Germany Gmbh Płyta do druku tamponowego dająca się grawerować laserem
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
CN106896644B (zh) * 2017-03-27 2020-05-08 青岛蓝帆新材料有限公司 一种感光性树脂组合物及其应用
CN106909024B (zh) * 2017-03-28 2020-03-13 辽宁靖帆新材料有限公司 一种感光性树脂组合物及其应用

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Also Published As

Publication number Publication date
ES2151625T3 (es) 2001-01-01
DE19524851C2 (de) 1998-05-07
EP0752430B1 (en) 2000-09-20
ATE196481T1 (de) 2000-10-15
DE19524851A1 (de) 1997-01-09
US5700619A (en) 1997-12-23
US5985996A (en) 1999-11-16
EP0752430A3 (en) 1998-04-15
DE69610373T2 (de) 2001-05-23
DE69610373D1 (de) 2000-10-26
EP0752430A2 (en) 1997-01-08
CA2180581A1 (en) 1997-01-08

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