ZA93264B - Method and apparatus for nickel electro-plating - Google Patents

Method and apparatus for nickel electro-plating

Info

Publication number
ZA93264B
ZA93264B ZA93264A ZA93264A ZA93264B ZA 93264 B ZA93264 B ZA 93264B ZA 93264 A ZA93264 A ZA 93264A ZA 93264 A ZA93264 A ZA 93264A ZA 93264 B ZA93264 B ZA 93264B
Authority
ZA
South Africa
Prior art keywords
plating
nickel electro
electro
nickel
Prior art date
Application number
ZA93264A
Other languages
English (en)
Inventor
Beatrice Sala
Laurent Guerin
Bernard Michaut
Original Assignee
Framatone And I R S I D Snc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Framatone And I R S I D Snc filed Critical Framatone And I R S I D Snc
Publication of ZA93264B publication Critical patent/ZA93264B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002—Cell separation, e.g. membranes, diaphragms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
ZA93264A 1992-01-16 1993-01-15 Method and apparatus for nickel electro-plating ZA93264B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9200407A FR2686352B1 (fr) 1992-01-16 1992-01-16 Appareil et procede de revetement electrolytique de nickel.

Publications (1)

Publication Number Publication Date
ZA93264B true ZA93264B (en) 1994-07-15

Family

ID=9425680

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA93264A ZA93264B (en) 1992-01-16 1993-01-15 Method and apparatus for nickel electro-plating

Country Status (5)

Country Link
US (1) US5403460A (xx)
EP (1) EP0552097B1 (xx)
DE (1) DE69317315T2 (xx)
FR (1) FR2686352B1 (xx)
ZA (1) ZA93264B (xx)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19834353C2 (de) * 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
DE19848467C5 (de) * 1998-10-21 2006-04-27 Walter Hillebrand Gmbh & Co. Kg Galvanotechnik Alkalisches Zink-Nickelbad
US6482298B1 (en) * 2000-09-27 2002-11-19 International Business Machines Corporation Apparatus for electroplating alloy films
EP2450474A1 (en) * 2001-08-01 2012-05-09 JX Nippon Mining & Metals Corporation High purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said sputtering target
US7195702B2 (en) * 2003-06-06 2007-03-27 Taskem, Inc. Tin alloy electroplating system
US7063628B2 (en) * 2004-03-23 2006-06-20 Callaway Golf Company Plated magnesium golf club head
US7087268B2 (en) * 2004-03-30 2006-08-08 Callaway Golf Company Method of plating a golf club head
US20060096867A1 (en) * 2004-11-10 2006-05-11 George Bokisa Tin alloy electroplating system
US7311615B2 (en) * 2005-07-01 2007-12-25 Charles Hsu Golf club head with ceramic layer
US20110226613A1 (en) 2010-03-19 2011-09-22 Robert Rash Electrolyte loop with pressure regulation for separated anode chamber of electroplating system
US8980068B2 (en) 2010-08-18 2015-03-17 Allen R. Hayes Nickel pH adjustment method and apparatus
US9404194B2 (en) 2010-12-01 2016-08-02 Novellus Systems, Inc. Electroplating apparatus and process for wafer level packaging
US8425751B1 (en) 2011-02-03 2013-04-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Systems and methods for the electrodeposition of a nickel-cobalt alloy
US9534308B2 (en) 2012-06-05 2017-01-03 Novellus Systems, Inc. Protecting anodes from passivation in alloy plating systems
US10465307B2 (en) 2015-11-19 2019-11-05 Fabric8Labs, Inc. Apparatus for electrochemical additive manufacturing
CN111630211B (zh) 2017-11-01 2024-05-24 朗姆研究公司 控制在电化学镀敷设备上的镀敷电解液浓度
US10914000B1 (en) 2019-08-23 2021-02-09 Fabric8Labs, Inc. Method for manufacturing a printhead of an electrochemical additive manufacturing system
US11512404B2 (en) 2019-08-23 2022-11-29 Fabric8Labs, Inc. Matrix-controlled printhead for an electrochemical additive manufacturing system
US11680330B2 (en) 2021-07-22 2023-06-20 Fabric8Labs, Inc. Electrochemical-deposition apparatuses and associated methods of electroplating a target electrode
US11795561B2 (en) 2021-08-02 2023-10-24 Fabric8Labs, Inc. Electrochemical-deposition system, apparatus, and method using optically-controlled deposition electrodes
US11920251B2 (en) 2021-09-04 2024-03-05 Fabric8Labs, Inc. Systems and methods for electrochemical additive manufacturing of parts using multi-purpose build plate
US11970783B2 (en) 2021-09-23 2024-04-30 Fabric8Labs, Inc. Systems and methods for manufacturing electrical components using electrochemical deposition
US11745432B2 (en) 2021-12-13 2023-09-05 Fabric8Labs, Inc. Using target maps for current density control in electrochemical-additive manufacturing systems
US12104264B2 (en) 2021-12-17 2024-10-01 Fabric8Labs, Inc. Systems and methods for electrochemical additive manufacturing of parts using capacitive sensing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE925264C (de) * 1952-11-15 1955-03-17 Hesse & Co Dr Verfahren zum Vernickeln ohne Nickelanoden
JPS563692A (en) * 1979-06-23 1981-01-14 Kooken:Kk Method and apparatus for high speed plating
US4902388A (en) * 1989-07-03 1990-02-20 United Technologies Corporation Method for electroplating nickel onto titanium alloys
JPH03120390A (ja) * 1989-09-29 1991-05-22 Toshiba Corp 低応力ニッケルめっき浴
JP2764337B2 (ja) * 1990-05-10 1998-06-11 新日本製鐵株式会社 Ｎｉ又はＮｉ―Ｚｎ合金又はＮｉ―Ｚｎ―Ｃｏ合金メッキ方法

Also Published As

Publication number Publication date
EP0552097B1 (fr) 1998-03-11
US5403460A (en) 1995-04-04
DE69317315T2 (de) 1998-10-15
EP0552097A1 (fr) 1993-07-21
FR2686352A1 (fr) 1993-07-23
DE69317315D1 (de) 1998-04-16
FR2686352B1 (fr) 1995-06-16

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