ZA91487B - Method of bonding a diamond film to a substrate - Google Patents

Method of bonding a diamond film to a substrate

Info

Publication number
ZA91487B
ZA91487B ZA91487A ZA91487A ZA91487B ZA 91487 B ZA91487 B ZA 91487B ZA 91487 A ZA91487 A ZA 91487A ZA 91487 A ZA91487 A ZA 91487A ZA 91487 B ZA91487 B ZA 91487B
Authority
ZA
South Africa
Prior art keywords
substrate
diamond film
bonding
metal layer
cvd diamond
Prior art date
Application number
ZA91487A
Other languages
English (en)
Inventor
Ricardo Simon Sussmann
Simon Sussmann Ricardo
Original Assignee
De Beers Ind Diamond
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Beers Ind Diamond filed Critical De Beers Ind Diamond
Publication of ZA91487B publication Critical patent/ZA91487B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
ZA91487A 1990-01-26 1991-01-23 Method of bonding a diamond film to a substrate ZA91487B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB909001833A GB9001833D0 (en) 1990-01-26 1990-01-26 Method of bonding a diamond film to a substrate

Publications (1)

Publication Number Publication Date
ZA91487B true ZA91487B (en) 1991-11-27

Family

ID=10669965

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA91487A ZA91487B (en) 1990-01-26 1991-01-23 Method of bonding a diamond film to a substrate

Country Status (5)

Country Link
EP (1) EP0440384B1 (fr)
AT (1) ATE122404T1 (fr)
DE (1) DE69109503T2 (fr)
GB (1) GB9001833D0 (fr)
ZA (1) ZA91487B (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2076086A1 (fr) * 1991-09-27 1993-03-28 Randall J. Kehl Methode d'obtention de couches epaisses et adherentes de revetement diamante faisant appel a un grillage metallique fin d'interface
EP0589641A3 (en) * 1992-09-24 1995-09-27 Gen Electric Method of producing wear resistant articles
JPH0948694A (ja) * 1995-08-04 1997-02-18 Kobe Steel Ltd 単結晶ダイヤモンド膜の形成方法
JP3728467B2 (ja) * 1995-08-04 2005-12-21 株式会社神戸製鋼所 単結晶ダイヤモンド膜の形成方法
WO2003006218A1 (fr) * 2001-07-11 2003-01-23 Koninklijke Philips Electronics N.V. Element tranchant pouvu d'une pointe a profil double
US7419702B2 (en) * 2004-03-31 2008-09-02 Tokyo Electron Limited Method for processing a substrate
EP1802947A1 (fr) 2004-10-01 2007-07-04 BAE Systems PLC Radiateur à haute émissivité
CH698809B1 (de) 2006-04-20 2009-10-30 Capital Formation Inc Abdeckung für raue Umgebungen und Sensoren, die diese Abdeckung aufweisen.
WO2015023356A1 (fr) * 2013-08-12 2015-02-19 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Liaison de film mince de diamant à faible pression de vapeur à haute température

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE453474B (sv) * 1984-06-27 1988-02-08 Santrade Ltd Kompoundkropp belagd med skikt av polykristallin diamant
JPS622133A (ja) * 1985-06-28 1987-01-08 Shin Etsu Chem Co Ltd ミクロト−ム用ダイヤモンドコ−テイング刃およびその製造方法
JPH01153228A (ja) * 1987-12-10 1989-06-15 Asahi Daiyamondo Kogyo Kk 気相合成ダイヤモンド工具の製造法

Also Published As

Publication number Publication date
ATE122404T1 (de) 1995-05-15
EP0440384B1 (fr) 1995-05-10
GB9001833D0 (en) 1990-03-28
EP0440384A1 (fr) 1991-08-07
DE69109503D1 (de) 1995-06-14
DE69109503T2 (de) 1995-11-09

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