ZA848695B - Photosensitive composition and process for the production of negative relief copies - Google Patents
Photosensitive composition and process for the production of negative relief copiesInfo
- Publication number
- ZA848695B ZA848695B ZA848695A ZA848695A ZA848695B ZA 848695 B ZA848695 B ZA 848695B ZA 848695 A ZA848695 A ZA 848695A ZA 848695 A ZA848695 A ZA 848695A ZA 848695 B ZA848695 B ZA 848695B
- Authority
- ZA
- South Africa
- Prior art keywords
- production
- photosensitive composition
- negative relief
- relief copies
- copies
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT23634/83A IT1169682B (it) | 1983-11-08 | 1983-11-08 | Composizione per fotoriproduzioni |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA848695B true ZA848695B (en) | 1985-09-25 |
Family
ID=11208748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA848695A ZA848695B (en) | 1983-11-08 | 1984-11-07 | Photosensitive composition and process for the production of negative relief copies |
Country Status (7)
Country | Link |
---|---|
US (1) | US4696891A (fr) |
EP (1) | EP0141400B1 (fr) |
JP (1) | JPS60173545A (fr) |
CA (1) | CA1267317A (fr) |
DE (1) | DE3482934D1 (fr) |
IT (1) | IT1169682B (fr) |
ZA (1) | ZA848695B (fr) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3437687A1 (de) * | 1984-10-15 | 1986-04-17 | Hoechst Ag, 6230 Frankfurt | Verfahren zum herstellen negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
GB2171530B (en) * | 1985-02-27 | 1989-06-28 | Imtec Products Inc | Method of producing reversed photoresist images by vapour diffusion |
JPS62160441A (ja) * | 1986-01-09 | 1987-07-16 | Hitachi Chem Co Ltd | ホトレジスト用感光性組成物 |
GB8708747D0 (en) * | 1987-04-11 | 1987-05-20 | Ciba Geigy Ag | Formation of image |
JPS6435545A (en) * | 1987-07-31 | 1989-02-06 | Japan Synthetic Rubber Co Ltd | Resist composition used for processing with charged particle beam |
JPH02502312A (ja) * | 1987-12-10 | 1990-07-26 | マクダーミツド インコーポレーテツド | 像反転性乾燥フィルムホトレジスト |
JPH01210944A (ja) * | 1988-02-18 | 1989-08-24 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
US5019488A (en) * | 1988-09-29 | 1991-05-28 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
EP0412457A1 (fr) * | 1989-08-08 | 1991-02-13 | Tosoh Corporation | Inhibiteur de solubilisation et composition à réserve positive |
DE3940911A1 (de) * | 1989-12-12 | 1991-06-13 | Hoechst Ag | Verfahren zur herstellung negativer kopien |
DE4004719A1 (de) * | 1990-02-15 | 1991-08-22 | Hoechst Ag | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
DE4013575C2 (de) * | 1990-04-27 | 1994-08-11 | Basf Ag | Verfahren zur Herstellung negativer Reliefkopien |
US5145763A (en) * | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
EP0593734B1 (fr) * | 1992-05-12 | 1997-12-03 | Eastman Kodak Company | Additifs pour solution aqueuse de stabilisation photographique |
DE4306069A1 (de) * | 1993-03-01 | 1994-09-08 | Basf Ag | Strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen mit verbessertem Kontrast |
ATE420767T1 (de) * | 2000-11-30 | 2009-01-15 | Fujifilm Corp | Lithographische druckplattenvorläufer |
JP3917422B2 (ja) * | 2001-07-26 | 2007-05-23 | 富士フイルム株式会社 | 画像形成材料 |
US20040067435A1 (en) * | 2002-09-17 | 2004-04-08 | Fuji Photo Film Co., Ltd. | Image forming material |
US7160667B2 (en) * | 2003-01-24 | 2007-01-09 | Fuji Photo Film Co., Ltd. | Image forming material |
US7544462B2 (en) * | 2007-02-22 | 2009-06-09 | Eastman Kodak Company | Radiation-sensitive composition and elements with basic development enhancers |
US7399576B1 (en) * | 2007-02-28 | 2008-07-15 | Eastman Kodak Company | Positive-working radiation-sensitive composition and elements |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL78723C (fr) * | 1949-07-23 | |||
DE938233C (de) * | 1953-03-11 | 1956-01-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
US3046114A (en) * | 1955-03-01 | 1962-07-24 | Azoplate Corp | Diazo compounds and printing plates manufactured therefrom |
NL129161C (fr) * | 1959-01-14 | |||
NL247405A (fr) * | 1959-01-15 | |||
NL129162C (fr) * | 1959-01-17 | |||
NL130248C (fr) * | 1959-01-21 | |||
DE1114705C2 (de) * | 1959-04-16 | 1962-04-12 | Kalle Ag | Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen |
NL7007827A (fr) * | 1970-05-29 | 1971-12-01 | ||
US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
DE2529054C2 (de) * | 1975-06-30 | 1982-04-29 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes |
JPS569740A (en) * | 1979-07-05 | 1981-01-31 | Fuji Photo Film Co Ltd | Image forming method |
GB2082339B (en) * | 1980-08-05 | 1985-06-12 | Horsell Graphic Ind Ltd | Lithographic printing plates and method for processing |
JPS57150844A (en) * | 1981-03-13 | 1982-09-17 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
US4546066A (en) * | 1983-09-27 | 1985-10-08 | International Business Machines Corporation | Method for forming narrow images on semiconductor substrates |
-
1983
- 1983-11-08 IT IT23634/83A patent/IT1169682B/it active
-
1984
- 1984-10-30 EP EP84113094A patent/EP0141400B1/fr not_active Expired - Lifetime
- 1984-10-30 DE DE8484113094T patent/DE3482934D1/de not_active Expired - Fee Related
- 1984-11-05 CA CA000467032A patent/CA1267317A/fr not_active Expired - Fee Related
- 1984-11-07 ZA ZA848695A patent/ZA848695B/xx unknown
- 1984-11-07 JP JP59233423A patent/JPS60173545A/ja active Granted
-
1986
- 1986-08-01 US US06/892,893 patent/US4696891A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0141400A2 (fr) | 1985-05-15 |
US4696891A (en) | 1987-09-29 |
EP0141400A3 (en) | 1987-05-06 |
JPH0431381B2 (fr) | 1992-05-26 |
CA1267317A (fr) | 1990-04-03 |
IT8323634A0 (it) | 1983-11-08 |
EP0141400B1 (fr) | 1990-08-08 |
IT1169682B (it) | 1987-06-03 |
JPS60173545A (ja) | 1985-09-06 |
DE3482934D1 (de) | 1990-09-13 |
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