JPS6435545A - Resist composition used for processing with charged particle beam - Google Patents

Resist composition used for processing with charged particle beam

Info

Publication number
JPS6435545A
JPS6435545A JP19232687A JP19232687A JPS6435545A JP S6435545 A JPS6435545 A JP S6435545A JP 19232687 A JP19232687 A JP 19232687A JP 19232687 A JP19232687 A JP 19232687A JP S6435545 A JPS6435545 A JP S6435545A
Authority
JP
Japan
Prior art keywords
compd
org
radiation
ionic
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19232687A
Other languages
Japanese (ja)
Inventor
Hiroaki Nemoto
Yoshitsugu Isamoto
Ikuo Nozue
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP19232687A priority Critical patent/JPS6435545A/en
Publication of JPS6435545A publication Critical patent/JPS6435545A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Abstract

PURPOSE:To obtain satisfactory electrical conductivity and to prevent the accumulation of electric charges by blending a radiation-sensitive resin compsn. with at least one of a specified ionic org. compd. and a specified org. compd. having a pi electron system. CONSTITUTION:A radiation-sensitive resin compsn. is blended with at least one of an ionic org. compd. not reactive with a radiation-sensitive compd. in the compsn. and an org. compd. having a pi electron system in which pi electrons are present nonlocally in the range of >=14 atoms. The ionic org. compd. may be a basic dye or a quat. ammonium salt. The org. compd. having the pi electron system may be perylene, pyrene or porphyrin. Satisfactory electrical conductivity is obtd. and the accumulation of electric charges on a resist can be prevented.
JP19232687A 1987-07-31 1987-07-31 Resist composition used for processing with charged particle beam Pending JPS6435545A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19232687A JPS6435545A (en) 1987-07-31 1987-07-31 Resist composition used for processing with charged particle beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19232687A JPS6435545A (en) 1987-07-31 1987-07-31 Resist composition used for processing with charged particle beam

Publications (1)

Publication Number Publication Date
JPS6435545A true JPS6435545A (en) 1989-02-06

Family

ID=16289425

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19232687A Pending JPS6435545A (en) 1987-07-31 1987-07-31 Resist composition used for processing with charged particle beam

Country Status (1)

Country Link
JP (1) JPS6435545A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021857A (en) * 1987-12-18 1990-01-08 Ucb Sa Photosensitive composition
JPH03278082A (en) * 1990-03-27 1991-12-09 Agency Of Ind Science & Technol Photosensitive material for hologram recording
JPH0435578A (en) * 1990-05-31 1992-02-06 Fujitsu Ltd Time filter device
JP2016080998A (en) * 2014-10-22 2016-05-16 日本電信電話株式会社 Ion gel and method for producing ion gel pattern

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856130A (en) * 1971-11-13 1973-08-07
JPS5627139A (en) * 1979-08-09 1981-03-16 Ibm Electronnbeam resist composition
JPS5993441A (en) * 1982-11-19 1984-05-29 Hitachi Ltd Resist
JPS6088942A (en) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS60173545A (en) * 1983-11-08 1985-09-06 ヘキスト　アクチエンゲゼルシヤフト Photosensitive composition and manufacture of negative relief copy
JPS60191261A (en) * 1984-03-13 1985-09-28 Fuji Photo Film Co Ltd Plate making method of photosensitive lithographic plate
JPS62153950A (en) * 1985-12-27 1987-07-08 Japan Synthetic Rubber Co Ltd Positive type radiation sensitive resin composition
JPS62160441A (en) * 1986-01-09 1987-07-16 Hitachi Chem Co Ltd Photosensitive composition for photoresist
JPS62161146A (en) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd Photoresist composition

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4856130A (en) * 1971-11-13 1973-08-07
JPS5627139A (en) * 1979-08-09 1981-03-16 Ibm Electronnbeam resist composition
JPS5993441A (en) * 1982-11-19 1984-05-29 Hitachi Ltd Resist
JPS6088942A (en) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS60173545A (en) * 1983-11-08 1985-09-06 ヘキスト　アクチエンゲゼルシヤフト Photosensitive composition and manufacture of negative relief copy
JPS60191261A (en) * 1984-03-13 1985-09-28 Fuji Photo Film Co Ltd Plate making method of photosensitive lithographic plate
JPS62153950A (en) * 1985-12-27 1987-07-08 Japan Synthetic Rubber Co Ltd Positive type radiation sensitive resin composition
JPS62160441A (en) * 1986-01-09 1987-07-16 Hitachi Chem Co Ltd Photosensitive composition for photoresist
JPS62161146A (en) * 1986-01-10 1987-07-17 Mitsubishi Petrochem Co Ltd Photoresist composition

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021857A (en) * 1987-12-18 1990-01-08 Ucb Sa Photosensitive composition
JPH03278082A (en) * 1990-03-27 1991-12-09 Agency Of Ind Science & Technol Photosensitive material for hologram recording
JPH0435578A (en) * 1990-05-31 1992-02-06 Fujitsu Ltd Time filter device
JP2016080998A (en) * 2014-10-22 2016-05-16 日本電信電話株式会社 Ion gel and method for producing ion gel pattern

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