ZA813970B - Light-sensitive copying material and process for the manufacture thereof - Google Patents
Light-sensitive copying material and process for the manufacture thereofInfo
- Publication number
- ZA813970B ZA813970B ZA813970A ZA813970A ZA813970B ZA 813970 B ZA813970 B ZA 813970B ZA 813970 A ZA813970 A ZA 813970A ZA 813970 A ZA813970 A ZA 813970A ZA 813970 B ZA813970 B ZA 813970B
- Authority
- ZA
- South Africa
- Prior art keywords
- light
- copying material
- sensitive copying
- manufacture
- reacting
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 229920001515 polyalkylene glycol Polymers 0.000 abstract 2
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical compound OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Photoreceptors In Electrophotography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19803022362 DE3022362A1 (de) | 1980-06-14 | 1980-06-14 | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA813970B true ZA813970B (en) | 1982-06-30 |
Family
ID=6104625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA813970A ZA813970B (en) | 1980-06-14 | 1981-06-12 | Light-sensitive copying material and process for the manufacture thereof |
Country Status (9)
Country | Link |
---|---|
US (1) | US4487823A (xx) |
EP (1) | EP0042105B1 (xx) |
JP (1) | JPS5740249A (xx) |
AT (1) | ATE21177T1 (xx) |
AU (1) | AU541512B2 (xx) |
BR (1) | BR8103762A (xx) |
CA (1) | CA1170888A (xx) |
DE (2) | DE3022362A1 (xx) |
ZA (1) | ZA813970B (xx) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
JPS59137943A (ja) * | 1983-01-28 | 1984-08-08 | W R Gureesu:Kk | 感光性樹脂組成物 |
JPS59138454A (ja) * | 1983-01-28 | 1984-08-08 | W R Gureesu:Kk | 樹脂版用表面処理剤 |
JPS59155836A (ja) * | 1983-02-24 | 1984-09-05 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
US4661436A (en) * | 1983-06-17 | 1987-04-28 | Petrarch System, Inc. | Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant |
JPS6074621A (ja) * | 1983-09-30 | 1985-04-26 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS60125841A (ja) * | 1983-12-12 | 1985-07-05 | Mitsubishi Chem Ind Ltd | ポジ型フオトレジスト組成物 |
DE3582697D1 (de) * | 1984-06-07 | 1991-06-06 | Hoechst Ag | Positiv arbeitende strahlungsempfindliche beschichtungsloesung. |
DE3421448A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck |
JPS61226745A (ja) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | 半導体集積回路製造用のスピンコート用レジスト組成物 |
JPS61226746A (ja) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | 半導体集積回路製造用のスピンコート用レジスト組成物 |
JPH081517B2 (ja) * | 1985-04-25 | 1996-01-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
JPH0721626B2 (ja) * | 1985-08-10 | 1995-03-08 | 日本合成ゴム株式会社 | 半導体微細加工用レジスト組成物 |
JPH083630B2 (ja) * | 1986-01-23 | 1996-01-17 | 富士写真フイルム株式会社 | 感光性組成物 |
US4845008A (en) * | 1986-02-20 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent |
JPH06105351B2 (ja) * | 1986-03-27 | 1994-12-21 | 富士写真フイルム株式会社 | 感光性組成物 |
JPH0762761B2 (ja) * | 1986-03-28 | 1995-07-05 | 富士写真フイルム株式会社 | 画像形成材料 |
JPH0743501B2 (ja) * | 1986-04-24 | 1995-05-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
US4869982A (en) * | 1987-04-30 | 1989-09-26 | X-Solve, Inc. | Electrophotographic photoreceptor containing a toner release material |
JPH06105350B2 (ja) * | 1987-07-13 | 1994-12-21 | 富士写真フイルム株式会社 | 平版印刷版用感光性組成物 |
US5079122A (en) * | 1990-07-03 | 1992-01-07 | Xerox Corporation | Toner compositions with charge enhancing additives |
JP2828572B2 (ja) * | 1993-02-08 | 1998-11-25 | 信越化学工業株式会社 | ジフェノール酸第三級ブチルエステル誘導体及びそれを含有するポジ型レジスト材料 |
JPH0728230A (ja) * | 1993-07-07 | 1995-01-31 | Japan Synthetic Rubber Co Ltd | 感放射線性レジスト組成物 |
US5403437A (en) * | 1993-11-05 | 1995-04-04 | Texas Instruments Incorporated | Fluorosurfactant in photoresist for amorphous "Teflon" patterning |
US6147010A (en) * | 1996-11-14 | 2000-11-14 | Micron Technology, Inc. | Solvent prewet and method to dispense the solvent prewet |
CN102977359B (zh) * | 2012-11-19 | 2014-08-06 | 京东方科技集团股份有限公司 | 含氟聚合物、制备方法及其用途、颜料分散液及制备方法 |
CN111308866B (zh) * | 2020-04-01 | 2023-08-22 | 烟台核晶陶瓷新材料有限公司 | 一种用于坩埚检测的显影溶液及其制备方法和使用方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1215861A (en) * | 1967-02-09 | 1970-12-16 | Minnesota Mining & Mfg | Cleanable stain-resistant fabrics or fibers and polymers therefor |
US3759711A (en) * | 1970-09-16 | 1973-09-18 | Eastman Kodak Co | Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym |
US3790382A (en) * | 1971-04-16 | 1974-02-05 | Minnesota Mining & Mfg | Fluorinated polyamide-diazo resin coating composition |
US3779768A (en) * | 1971-08-26 | 1973-12-18 | Xidex Corp | Fluorocarbon surfactants for vesicular films |
US3868254A (en) * | 1972-11-29 | 1975-02-25 | Gaf Corp | Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants |
GB1436961A (en) * | 1973-01-05 | 1976-05-26 | Ici Ltd | Photographic assemblies |
US4225663A (en) * | 1974-08-26 | 1980-09-30 | Minnesota Mining And Manufacturing Company | Driographic printing plate |
GB1523762A (en) * | 1975-02-25 | 1978-09-06 | Oce Van Der Grinten Nv | Photocopying materials |
DE2805680C2 (de) * | 1977-03-01 | 1982-05-27 | Bexford Ltd., London | Aufzeichnungsmaterialien für das Vesikularverfahren und Verfahren zur Erhöhung der Lichtempfindlichkeit solcher Aufzeichnungsmaterialien |
US4125650A (en) * | 1977-08-08 | 1978-11-14 | International Business Machines Corporation | Resist image hardening process |
JPS54135004A (en) * | 1978-04-10 | 1979-10-19 | Fuji Photo Film Co Ltd | Photosensitive flat printing plate |
US4228232A (en) * | 1979-02-27 | 1980-10-14 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing ethylenically unsaturated oligomers |
US4339525A (en) * | 1979-06-18 | 1982-07-13 | E. I. Du Pont De Nemours And Company | Color proofing system using dot-etchable photopolymerizable elements |
-
1980
- 1980-06-14 DE DE19803022362 patent/DE3022362A1/de not_active Withdrawn
-
1981
- 1981-06-03 CA CA000378919A patent/CA1170888A/en not_active Expired
- 1981-06-03 DE DE8181104260T patent/DE3175028D1/de not_active Expired
- 1981-06-03 EP EP81104260A patent/EP0042105B1/de not_active Expired
- 1981-06-03 AT AT81104260T patent/ATE21177T1/de not_active IP Right Cessation
- 1981-06-11 JP JP56088946A patent/JPS5740249A/ja active Granted
- 1981-06-11 AU AU71627/81A patent/AU541512B2/en not_active Ceased
- 1981-06-12 ZA ZA813970A patent/ZA813970B/xx unknown
- 1981-06-12 BR BR8103762A patent/BR8103762A/pt not_active IP Right Cessation
-
1982
- 1982-10-29 US US06/437,553 patent/US4487823A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS5740249A (en) | 1982-03-05 |
CA1170888A (en) | 1984-07-17 |
US4487823A (en) | 1984-12-11 |
DE3022362A1 (de) | 1981-12-24 |
JPH038532B2 (xx) | 1991-02-06 |
EP0042105A1 (de) | 1981-12-23 |
ATE21177T1 (de) | 1986-08-15 |
DE3175028D1 (en) | 1986-09-04 |
AU7162781A (en) | 1981-12-24 |
AU541512B2 (en) | 1985-01-10 |
EP0042105B1 (de) | 1986-07-30 |
BR8103762A (pt) | 1982-03-02 |
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