ZA200706853B - Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist - Google Patents
Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresistInfo
- Publication number
- ZA200706853B ZA200706853B ZA200706853A ZA200706853A ZA200706853B ZA 200706853 B ZA200706853 B ZA 200706853B ZA 200706853 A ZA200706853 A ZA 200706853A ZA 200706853 A ZA200706853 A ZA 200706853A ZA 200706853 B ZA200706853 B ZA 200706853B
- Authority
- ZA
- South Africa
- Prior art keywords
- photoresist
- etch
- compositions
- post
- removal
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title 2
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
- H01L21/02071—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/08—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US67853405P | 2005-05-06 | 2005-05-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200706853B true ZA200706853B (en) | 2008-09-25 |
Family
ID=36809154
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200706853A ZA200706853B (en) | 2005-05-06 | 2007-08-16 | Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7754668B2 (enExample) |
| EP (1) | EP1883863B1 (enExample) |
| JP (1) | JP2008541426A (enExample) |
| KR (1) | KR20080005408A (enExample) |
| CN (1) | CN101171551B (enExample) |
| BR (1) | BRPI0611377A2 (enExample) |
| CA (1) | CA2606849A1 (enExample) |
| IL (1) | IL187121A (enExample) |
| MY (1) | MY144723A (enExample) |
| NO (1) | NO20075670L (enExample) |
| TW (1) | TWI425323B (enExample) |
| WO (1) | WO2006121580A2 (enExample) |
| ZA (1) | ZA200706853B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2912151B1 (fr) * | 2007-02-05 | 2009-05-08 | Arkema France | Formulation de dimethylsulfoxyde en melange avec un additif permettant d'abaisser le point de cristallisation de ce dernier, et applications de ce melange |
| US20090148335A1 (en) * | 2007-02-28 | 2009-06-11 | Adair Richard E | Process for surface treatment of metals |
| US20110056516A1 (en) * | 2007-02-28 | 2011-03-10 | Adair Richard E | Process for surface treatment of metals |
| CN101373342B (zh) * | 2008-10-23 | 2011-03-02 | 江阴江化微电子材料股份有限公司 | 一种酸性剥离液及其制备方法 |
| US20110253171A1 (en) * | 2010-04-15 | 2011-10-20 | John Moore | Chemical Composition and Methods for Removing Epoxy-Based Photoimageable Coatings Utilized In Microelectronic Fabrication |
| US8921295B2 (en) | 2010-07-23 | 2014-12-30 | American Sterilizer Company | Biodegradable concentrated neutral detergent composition |
| EP3480288A1 (en) * | 2017-11-07 | 2019-05-08 | Henkel AG & Co. KGaA | Fluoride based cleaning composition |
| US20220243150A1 (en) * | 2019-06-19 | 2022-08-04 | Versum Materials Us, Llc | Cleaning Composition For Semiconductor Substrates |
| JP7692323B2 (ja) | 2021-09-24 | 2025-06-13 | 富士フイルム株式会社 | 薬液、処理方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3138557A (en) | 1961-09-05 | 1964-06-23 | Purex Corp Ltd | Composition and process for removal of coatings base on epoxy resins |
| TW416987B (en) | 1996-06-05 | 2001-01-01 | Wako Pure Chem Ind Ltd | A composition for cleaning the semiconductor substrate surface |
| JPH1055993A (ja) | 1996-08-09 | 1998-02-24 | Hitachi Ltd | 半導体素子製造用洗浄液及びそれを用いた半導体素子の製造方法 |
| JP3975301B2 (ja) * | 1997-08-22 | 2007-09-12 | 三菱瓦斯化学株式会社 | 半導体素子製造用洗浄液及びこれを用いた半導体素子 の製造方法 |
| JP2000208467A (ja) * | 1999-01-14 | 2000-07-28 | Mitsubishi Gas Chem Co Inc | 半導体基板洗浄液およびそれを用いた半導体基板の洗浄方法 |
| JP4224652B2 (ja) | 1999-03-08 | 2009-02-18 | 三菱瓦斯化学株式会社 | レジスト剥離液およびそれを用いたレジストの剥離方法 |
| JP2000284506A (ja) * | 1999-03-31 | 2000-10-13 | Sharp Corp | フォトレジスト剥離剤組成物および剥離方法 |
| US6562726B1 (en) * | 1999-06-29 | 2003-05-13 | Micron Technology, Inc. | Acid blend for removing etch residue |
| US6486108B1 (en) | 2000-05-31 | 2002-11-26 | Micron Technology, Inc. | Cleaning composition useful in semiconductor integrated circuit fabrication |
| JP2002113431A (ja) * | 2000-10-10 | 2002-04-16 | Tokyo Electron Ltd | 洗浄方法 |
| MY143399A (en) | 2001-07-09 | 2011-05-13 | Avantor Performance Mat Inc | Microelectronic cleaning compositons containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning |
| US6916772B2 (en) | 2001-07-13 | 2005-07-12 | Ekc Technology, Inc. | Sulfoxide pyrolid(in)one alkanolamine cleaner composition |
| JP2003177556A (ja) * | 2001-12-12 | 2003-06-27 | Sharp Corp | フォトレジスト剥離剤組成物および剥離方法 |
| RS50930B (sr) * | 2002-06-07 | 2010-08-31 | Avantor Performance Materials Inc. | Kompozicije za mikroelektronsko čišćenje koje sadrže oksidatore i organske rastvarače |
| ES2310677T3 (es) | 2002-10-22 | 2009-01-16 | Ekc Technology, Inc. | Composiciones acuosas a base de acido fosforico para la limpieza de dispositivos semiconductores. |
| JP4085262B2 (ja) * | 2003-01-09 | 2008-05-14 | 三菱瓦斯化学株式会社 | レジスト剥離剤 |
| EP1638138A1 (en) * | 2003-06-04 | 2006-03-22 | Kao Corporation | Removing agent composition and removing/cleaning method using same |
-
2006
- 2006-04-18 KR KR1020077025627A patent/KR20080005408A/ko not_active Ceased
- 2006-04-18 EP EP06750494.4A patent/EP1883863B1/en not_active Not-in-force
- 2006-04-18 WO PCT/US2006/014466 patent/WO2006121580A2/en not_active Ceased
- 2006-04-18 US US11/911,346 patent/US7754668B2/en not_active Expired - Fee Related
- 2006-04-18 JP JP2008510018A patent/JP2008541426A/ja active Pending
- 2006-04-18 BR BRPI0611377-0A patent/BRPI0611377A2/pt not_active IP Right Cessation
- 2006-04-18 CA CA002606849A patent/CA2606849A1/en not_active Abandoned
- 2006-04-18 CN CN2006800155059A patent/CN101171551B/zh active Active
- 2006-05-03 MY MYPI20062030A patent/MY144723A/en unknown
- 2006-05-03 TW TW095115752A patent/TWI425323B/zh active
-
2007
- 2007-08-16 ZA ZA200706853A patent/ZA200706853B/xx unknown
- 2007-11-01 IL IL187121A patent/IL187121A/en not_active IP Right Cessation
- 2007-11-06 NO NO20075670A patent/NO20075670L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006121580A3 (en) | 2007-02-15 |
| TW200702942A (en) | 2007-01-16 |
| KR20080005408A (ko) | 2008-01-11 |
| US20080261846A1 (en) | 2008-10-23 |
| EP1883863A2 (en) | 2008-02-06 |
| CN101171551A (zh) | 2008-04-30 |
| EP1883863B1 (en) | 2014-01-22 |
| TWI425323B (zh) | 2014-02-01 |
| WO2006121580A2 (en) | 2006-11-16 |
| CA2606849A1 (en) | 2006-11-16 |
| BRPI0611377A2 (pt) | 2010-08-31 |
| US7754668B2 (en) | 2010-07-13 |
| NO20075670L (no) | 2007-11-06 |
| IL187121A (en) | 2013-06-27 |
| JP2008541426A (ja) | 2008-11-20 |
| MY144723A (en) | 2011-10-31 |
| CN101171551B (zh) | 2012-12-26 |
| IL187121A0 (en) | 2008-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IL187121A0 (en) | Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist | |
| EP2082024A4 (en) | COMPOSITIONS AND METHODS FOR REMOVING A PHOTORESISTANT AGENT FOR RECYCLING A SILICON GALETTE | |
| SG10201508243UA (en) | Oxidizing aqueous cleaner for the removal of post-etch residues | |
| EP2041776A4 (en) | CLEANING FORMULATION FOR REMOVING RESIDUE ON SURFACES | |
| SG131868A1 (en) | Aqueous cleaning composition for removing residues and method using same | |
| IL192278A0 (en) | Composition for removing residue from wiring board and cleaning method | |
| SG119361A1 (en) | Composition for removing photoresist and/or etching residue from a substrate and use thereof | |
| SG2013081419A (en) | Dynamic multi-purpose composition for the removal of photoresists and method for its use | |
| IL176584A0 (en) | Photoresist compositions and processes of use | |
| EP1899480A4 (en) | COMPOSITIONS AND METHODS FOR THE TREATMENT OF INFLAMMATORY CONDITIONS | |
| TWI349965B (en) | Method of removing photoresist from semiconductor wafer | |
| IL186400A0 (en) | Compositions and methods for the inhibition of dishevelled proteins | |
| GB2446077B (en) | Methods and compositions for selectively removing potassium ion from the gastrointestinal tract of a mammal | |
| TWI319253B (en) | Protecting circuits and methods from electrostatic discharge | |
| IL178187A0 (en) | Aqueous solution for removing post-etch residue | |
| ZA200800448B (en) | Methods and compositions for the prevention and treatment of inflammatory disease | |
| EP1918983A4 (en) | STAGE EQUIPMENT AND EXPOSURE DEVICE | |
| EG24544A (en) | Multi-pople circuit breaker and apparatus for preventing deformation of driving shaft thereof | |
| TWI365513B (en) | Electrical components for microelectronic devices and methods of forming the same | |
| TWI320516B (en) | Photoresist residue remover composition | |
| TWI341445B (en) | Photoresist remover composition for removing modified photoresist of semiconductor device | |
| IL186376A0 (en) | Bone cement compositions and the like comprising an rnaiii-inhibiting peptide | |
| GB2437889B (en) | Methods and compositions for dielectric materials | |
| EP1847878A4 (en) | LIGHT-SENSITIVE COMPOSITION FOR REMOVING LIQUIDS | |
| EP1929050A4 (en) | COMPOSITIONS AND METHODS FOR DETECTING VIRUSES THEREWITH |