ZA200207916B - Direct condensation. - Google Patents
Direct condensation. Download PDFInfo
- Publication number
- ZA200207916B ZA200207916B ZA200207916A ZA200207916A ZA200207916B ZA 200207916 B ZA200207916 B ZA 200207916B ZA 200207916 A ZA200207916 A ZA 200207916A ZA 200207916 A ZA200207916 A ZA 200207916A ZA 200207916 B ZA200207916 B ZA 200207916B
- Authority
- ZA
- South Africa
- Prior art keywords
- gas
- process according
- reactor
- dichloroethane
- oxygen
- Prior art date
Links
- 238000009833 condensation Methods 0.000 title claims description 3
- 230000005494 condensation Effects 0.000 title claims description 3
- 239000007789 gas Substances 0.000 claims description 59
- 238000000034 method Methods 0.000 claims description 55
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 20
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 17
- 238000010791 quenching Methods 0.000 claims description 17
- 239000001301 oxygen Substances 0.000 claims description 16
- 229910052760 oxygen Inorganic materials 0.000 claims description 16
- 239000012495 reaction gas Substances 0.000 claims description 16
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 15
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 15
- 238000001914 filtration Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 230000000171 quenching effect Effects 0.000 claims description 13
- 238000004821 distillation Methods 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000008346 aqueous phase Substances 0.000 claims description 9
- 238000012856 packing Methods 0.000 claims description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 150000004827 dibenzo-1,4-dioxins Chemical class 0.000 claims description 5
- 150000002240 furans Chemical class 0.000 claims description 5
- 239000007858 starting material Substances 0.000 claims description 5
- 230000018044 dehydration Effects 0.000 claims description 4
- 238000006297 dehydration reaction Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000000498 cooling water Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 2
- 239000007770 graphite material Substances 0.000 claims description 2
- 239000012071 phase Substances 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 description 28
- 238000006243 chemical reaction Methods 0.000 description 21
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 11
- 239000012634 fragment Substances 0.000 description 11
- 239000000047 product Substances 0.000 description 7
- OGBQILNBLMPPDP-UHFFFAOYSA-N 2,3,4,7,8-Pentachlorodibenzofuran Chemical compound O1C2=C(Cl)C(Cl)=C(Cl)C=C2C2=C1C=C(Cl)C(Cl)=C2 OGBQILNBLMPPDP-UHFFFAOYSA-N 0.000 description 5
- 239000005977 Ethylene Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 4
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 238000003795 desorption Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000002918 waste heat Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- -1 fuller's earth Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 239000004063 acid-resistant material Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- RNFNDJAIBTYOQL-UHFFFAOYSA-N chloral hydrate Chemical compound OC(O)C(Cl)(Cl)Cl RNFNDJAIBTYOQL-UHFFFAOYSA-N 0.000 description 1
- 229960002327 chloral hydrate Drugs 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- HFFLGKNGCAIQMO-UHFFFAOYSA-N trichloroacetaldehyde Chemical compound ClC(Cl)(Cl)C=O HFFLGKNGCAIQMO-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/093—Preparation of halogenated hydrocarbons by replacement by halogens
- C07C17/15—Preparation of halogenated hydrocarbons by replacement by halogens with oxygen as auxiliary reagent, e.g. oxychlorination
- C07C17/152—Preparation of halogenated hydrocarbons by replacement by halogens with oxygen as auxiliary reagent, e.g. oxychlorination of hydrocarbons
- C07C17/156—Preparation of halogenated hydrocarbons by replacement by halogens with oxygen as auxiliary reagent, e.g. oxychlorination of hydrocarbons of unsaturated hydrocarbons
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10107091A DE10107091A1 (de) | 2001-02-13 | 2001-02-13 | Verfahren für die Herstellung von 1,2-Dichlorethan aus der Oxichlorierung |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA200207916B true ZA200207916B (en) | 2003-10-02 |
Family
ID=7674171
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA200207916A ZA200207916B (en) | 2001-02-13 | 2002-10-02 | Direct condensation. |
Country Status (11)
Country | Link |
---|---|
US (1) | US20030176748A1 (de) |
EP (1) | EP1360163A2 (de) |
CN (1) | CN1297525C (de) |
CA (1) | CA2404562A1 (de) |
DE (1) | DE10107091A1 (de) |
HU (1) | HUP0302927A3 (de) |
NO (1) | NO20024877D0 (de) |
PL (1) | PL368224A1 (de) |
RU (1) | RU2233828C2 (de) |
WO (1) | WO2002064534A2 (de) |
ZA (1) | ZA200207916B (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3045458B1 (fr) * | 2015-12-22 | 2018-02-16 | Dover Europe Sarl | Imprimante a jet d'encre a circuit de recuperation de solvant ameliore |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3288868A (en) * | 1963-11-05 | 1966-11-29 | Pittsburgh Plate Glass Co | Oxychlorination process |
DE2819308A1 (de) * | 1978-05-02 | 1979-11-15 | Hoechst Ag | Verfahren zur herstellung von 1,2-dichloraethan |
DE4132030C2 (de) * | 1991-09-26 | 1996-07-11 | Hoechst Ag | Verfahren zur Entfernung des Katalysatorabriebs aus 1,2-Dichlorethan |
JP3747491B2 (ja) * | 1995-04-20 | 2006-02-22 | 東ソー株式会社 | 1,2−ジクロルエタンの製造方法 |
DE19546068A1 (de) * | 1995-12-09 | 1997-06-12 | Hoechst Ag | Verfahren zur Reduzierung des Katalysatorverbrauchs und verunreinigter Katalysatorabfälle bei der Herstellung von 1,2-Dichlorethan |
US5750812A (en) * | 1995-12-28 | 1998-05-12 | The Geon Company | Method for reducing formation of polychlorinated aromatic compounds during air oxychlorination of C1 -C3 Hydrocarbons |
DE19753165B4 (de) * | 1997-12-01 | 2006-10-19 | Vinnolit Monomer Gmbh & Co. Kg | Verfahren zur Herstellung von 1,2-Dichlorethan durch Oxichlorierung |
DE19837957C1 (de) * | 1998-08-21 | 2000-01-05 | Krupp Uhde Gmbh | Verfahren zur Steuerung der Feinstaubpartikelmenge in einem Wirbelschichtreaktor, insbesondere zur Oxichlorierung von Ethylen |
-
2001
- 2001-02-13 DE DE10107091A patent/DE10107091A1/de not_active Withdrawn
-
2002
- 2002-02-13 CA CA002404562A patent/CA2404562A1/en not_active Abandoned
- 2002-02-13 EP EP02704714A patent/EP1360163A2/de not_active Withdrawn
- 2002-02-13 PL PL02368224A patent/PL368224A1/xx unknown
- 2002-02-13 WO PCT/EP2002/001499 patent/WO2002064534A2/de not_active Application Discontinuation
- 2002-02-13 HU HU0302927A patent/HUP0302927A3/hu unknown
- 2002-02-13 RU RU2002129504/04A patent/RU2233828C2/ru not_active IP Right Cessation
- 2002-02-13 CN CNB028002962A patent/CN1297525C/zh not_active Expired - Fee Related
- 2002-02-13 US US10/240,582 patent/US20030176748A1/en not_active Abandoned
- 2002-10-02 ZA ZA200207916A patent/ZA200207916B/en unknown
- 2002-10-09 NO NO20024877A patent/NO20024877D0/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
CN1297525C (zh) | 2007-01-31 |
EP1360163A2 (de) | 2003-11-12 |
RU2233828C2 (ru) | 2004-08-10 |
CN1457331A (zh) | 2003-11-19 |
HUP0302927A2 (hu) | 2003-12-29 |
NO20024877L (no) | 2002-10-09 |
WO2002064534A2 (de) | 2002-08-22 |
PL368224A1 (en) | 2005-03-21 |
WO2002064534A3 (de) | 2002-11-28 |
US20030176748A1 (en) | 2003-09-18 |
NO20024877D0 (no) | 2002-10-09 |
HUP0302927A3 (en) | 2005-10-28 |
DE10107091A1 (de) | 2002-08-29 |
CA2404562A1 (en) | 2002-08-22 |
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