WO2025218445A1 - 一种科研型湿法刻蚀全自动化系统及机台 - Google Patents

一种科研型湿法刻蚀全自动化系统及机台

Info

Publication number
WO2025218445A1
WO2025218445A1 PCT/CN2025/084053 CN2025084053W WO2025218445A1 WO 2025218445 A1 WO2025218445 A1 WO 2025218445A1 CN 2025084053 W CN2025084053 W CN 2025084053W WO 2025218445 A1 WO2025218445 A1 WO 2025218445A1
Authority
WO
WIPO (PCT)
Prior art keywords
module
liquid
scientific research
etching
liquid medicine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/CN2025/084053
Other languages
English (en)
French (fr)
Inventor
徐巍
李艺杰
曾祥军
李季
王呢娜
冯雪蒙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hong Kong University Of Science And Technology Guangzhou
Original Assignee
Hong Kong University Of Science And Technology Guangzhou
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hong Kong University Of Science And Technology Guangzhou filed Critical Hong Kong University Of Science And Technology Guangzhou
Publication of WO2025218445A1 publication Critical patent/WO2025218445A1/zh
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00—Manipulators not otherwise provided for
    • B25J11/0095—Manipulators transporting wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00—Program-controlled manipulators
    • B25J9/16—Program controls
    • B25J9/1694—Program controls characterised by use of sensors other than normal servo-feedback from position, speed or acceleration sensors, perception control, multi-sensor controlled systems, sensor fusion
    • B25J9/1697—Vision controlled systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0424—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0426—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0612—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3202—Mechanical details, e.g. rollers or belts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3218—Conveying cassettes, containers or carriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3302—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7602—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a robot blade or gripped by a gripper for conveyance

Definitions

  • the present application relates to the field of semiconductor cleaning and etching technology, and in particular to a scientific research-type organic wet process station.
  • the equipment is large in size, which will occupy the clean room space of the scientific research site and waste resources;
  • the purpose of this application is to provide a fully automated scientific research wet etching system and machine to meet the scientific research needs of universities and improve scientific research efficiency and process stability.
  • the present application provides a fully automated scientific wet etching system, including a machine system, an etching system, a feeding system, a robot system, and a control system;
  • the machine system is used to provide a miniaturized machine room including installation space and working space;
  • the etching system includes a plurality of liquid medicine modules arranged in an arc in the miniaturized machine chamber;
  • the liquid medicine module includes a liquid medicine tank and a liquid supply mechanism
  • the liquid supply mechanism is used to supply liquid to the liquid tank according to a preset liquid supply strategy and control the etching environment in the liquid tank;
  • the feeding system is used to transport the workpiece into the working space and close the working space after the transport is completed;
  • the robot system includes a robot module and a vision module communicatively connected to the robot module;
  • the robot module is configured at the top of the working space, and is used to grab the workpiece according to the image information fed back by the vision module and place the workpiece into the chemical solution tank to complete etching according to a preset etching strategy;
  • the control system is in communication with the machine system, the feeding system, the robot system and the etching system, and is used to realize automated etching operations according to user instructions.
  • the robot module is further configured to grab a cleaning tool and perform a cleaning action based on the image information fed back by the vision module.
  • the robot module is also capable of performing at least one of a telescopic motion, a rotational motion, and a shaking motion.
  • timing system further comprising a timing system
  • the timing system is used to obtain the operating time information of the machine system, the feeding system, and the robot system and feed back the operating time information to the control system so that the control system can control the machine system, the feeding system, the robot system, and the etching system according to a preset time strategy.
  • it also includes a human-computer interaction system and a monitoring system;
  • the human-computer interaction system is communicatively connected with the control system
  • the monitoring system is used to respectively obtain operating data of the machine system, the robot system, the etching system, and the feeding system, and to issue an alarm when the operating data exceeds a threshold;
  • the monitoring system is also used to perform real-time monitoring of the machine system, the robot system, the etching system and the feeding system according to a preset monitoring strategy.
  • the liquid supply mechanism includes a liquid supply module and an etching environment module;
  • the liquid supply module is used to supply the liquid medicine in the small-capacity liquid medicine tank to the liquid medicine tank;
  • the etching environment module includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spray module and a circulating filtration module;
  • the liquid medicine tank is provided with an overflow recovery module.
  • the present application also discloses a scientific research wet etching fully automated machine, comprising a machine body and a scientific research wet etching fully automated system;
  • the scientific research wet etching fully automated system is configured on the machine body, including a machine system, an etching system, a feeding system, a robot system and a control system;
  • the machine system is used to provide a miniaturized machine room including installation space and working space;
  • the etching system includes a plurality of liquid medicine modules arranged in an arc in the miniaturized machine chamber;
  • the liquid medicine module includes a liquid medicine tank and a liquid supply mechanism
  • the liquid supply mechanism is used to supply liquid to the liquid tank according to a preset liquid supply strategy and control the etching environment in the liquid tank;
  • the feeding system is used to transport the workpiece into the working space and close the working space after the transport is completed;
  • the robot system includes a robot module and a vision module communicatively connected to the robot module;
  • the robot module is configured at the top of the working space, and is used to grab the workpiece according to the image information fed back by the vision module and place the workpiece into the chemical solution tank to complete etching according to a preset etching strategy;
  • the control system is in communication with the machine system, the feeding system, the robot system and the etching system, and is used to realize automated etching operations according to user instructions.
  • the robot module is further configured to grab a cleaning tool and perform a cleaning action based on the image information fed back by the vision module.
  • the robot module is also capable of performing at least one of a telescopic motion, a rotational motion, and a shaking motion.
  • timing system further comprising a timing system
  • the timing system is used to obtain the operating time information of the machine system, the feeding system, and the robot system and feed back the information to the control system so that the control system can control the machine system, the feeding system, the robot system, and the etching system according to a preset time strategy.
  • it also includes a human-computer interaction system and a monitoring system;
  • the human-computer interaction system is communicatively connected with the control system
  • the monitoring system is used to respectively obtain operating data of the machine system, the robot system, the etching system, and the feeding system, and to issue an alarm when the operating data exceeds a threshold;
  • the monitoring system is also used to perform real-time monitoring of the machine system, the robot system, the etching system and the feeding system according to a preset monitoring strategy.
  • the liquid supply mechanism includes a liquid supply module and an etching environment module;
  • the liquid supply module is used to supply the liquid medicine in the small-capacity liquid medicine tank to the liquid medicine tank;
  • the etching environment module includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spray module and a circulating filtration module;
  • the liquid medicine tank is provided with an overflow recovery module.
  • the robotic module is a collaborative robot.
  • the miniaturized machine chamber is provided in the machine body
  • a supporting partition is provided in the miniaturized machine room
  • the supporting partition divides the miniaturized machine room into an upper chamber and a lower chamber
  • the upper chamber forms a working space.
  • a plurality of said liquid medicine modules are circumferentially arranged in said lower chamber;
  • the supporting partition is provided with a first avoidance opening which is connected to the liquid medicine tanks in each of the liquid medicine modules in a one-to-one correspondence.
  • an electric control room and a raw liquid room for storing a small-capacity liquid medicine tank are provided in the space below the miniaturized machine room in the machine body.
  • the machine system further includes a fan filter unit
  • the machine body is provided with an exhaust port and an air supply port connected to the upper chamber;
  • the fan filter unit is installed on the machine body and connected to the air supply port.
  • a spray cleaning device is further installed on the machine body;
  • the spray cleaning device includes a spray assembly and a spray moving device
  • the spray moving device is installed in the upper chamber and connected to the spray assembly to drive the spray assembly to move;
  • the support partition is provided with a plurality of first drainage holes
  • the lower chamber is provided with a main drainage pipe communicating with the outside of the machine body.
  • a water collecting portion is provided in the middle of the supporting partition
  • the water collecting portion is provided with a second drainage hole.
  • a support cylinder connected to the support partition is provided in the middle of the lower chamber
  • a control chamber is provided in the support cylinder
  • the second drainage hole is connected to the control chamber
  • a branch drainage pipe connected to the second drainage hole is provided in the control chamber;
  • One end of the branch drain pipe away from the second drain hole extends out of the supporting cylinder.
  • it further includes a basket stand for holding workpieces
  • the end of the robot module is connected to a flower basket clamping mechanism for grabbing the flower basket stand.
  • the turnbuckle clamp mechanism includes a clamping drive assembly and two clamping jaw members;
  • the clamping drive assembly is connected to the two clamping jaws and is used to drive the two clamping jaws to open and close so as to clamp the flower basket stand;
  • the clamping drive assembly is sheathed with an explosion-proof and corrosion-resistant protective cover.
  • the flower basket stand includes two fixing plates
  • the two fixing plates are arranged in parallel and spaced apart, and are fixedly connected by a plurality of connecting rods;
  • a holding cavity for holding workpieces is formed between each of the connecting rods and the two fixing plates;
  • a handle block is fixedly connected at the top position between the two fixing plates;
  • Guide slots are provided on both sides of the handle block
  • the clamping surfaces of the two clamping jaws are provided with positioning protrusions that are clamped into the guide slots;
  • each clamping claw is provided with a limiting flange which can contact and abut against the bottom of the handle block.
  • the flower basket stand includes a bottom plate and two fixing plates;
  • the two fixing plates are arranged in parallel and spaced apart on the top of the fixing plate;
  • a handle block is fixedly connected at the top position between the two fixing plates;
  • Guide slots are provided on both sides of the handle block
  • the clamping surfaces of the two clamping jaws are provided with positioning protrusions that are clamped into the guide slots;
  • each of the clamping jaws is provided with a limiting flange that can contact and abut against the bottom of the handle block;
  • a plurality of limiting rods are fixed on the bottom plate between the two fixing plates;
  • a holding cavity for holding workpieces is formed between the adjacent limiting rods and the bottom plate.
  • positioning blocks are fixed on the opposite sides of the two fixing plates;
  • a pressing block for pressing a workpiece is movably inserted between the two positioning blocks.
  • the liquid supply mechanism includes a liquid supply device and a liquid discharge device for forming a liquid supply module
  • the liquid delivery device includes a liquid pump tube and a liquid medicine pump;
  • One end of the pump liquid pipe is connected to the medicine liquid tank, and the other end is connected to the small-capacity medicine liquid tank;
  • the liquid medicine pump is installed on the pump pipe and is used to pump the liquid medicine in the small-capacity liquid medicine tank into the liquid medicine tank according to a preset liquid supply strategy;
  • the drainage device includes a drainage pipe and a drainage valve
  • the drainage pipe is connected to the medicine tank;
  • the drain valve is connected to the drain pipe and is used to control the flow of the drain pipe according to a preset liquid supply strategy
  • the liquid medicine tank is provided with a liquid level sensor for detecting the liquid level of the liquid medicine.
  • the liquid medicine tank is provided with a liquid medicine chamber and an overflow chamber for forming an overflow module
  • the liquid medicine chamber is used to accommodate the liquid medicine supplied by the liquid supply mechanism and for the workpiece to be placed therein;
  • the overflow chamber is used to receive the liquid medicine overflowing from the liquid medicine chamber;
  • the pump pipe and the discharge pipe are connected to the liquid medicine chamber.
  • the liquid medicine tank includes an inner tank body
  • the top opening of the inner tank forms an immersion inlet
  • the internal space of the inner tank forms the liquid medicine chamber
  • a connecting flange is provided on the outer peripheral surface of the inner tank body
  • the edge of the top surface of the connecting flange is connected to the side wall;
  • the overflow chamber is formed between the side wall, the top surface of the connecting flange and the outer peripheral surface of the inner tank body.
  • the liquid supply mechanism further comprises a heating device for forming a heating module
  • the heating device is used to heat the liquid medicine in the liquid medicine chamber according to a preset liquid supply strategy.
  • the medicine liquid tank further includes an outer tank body
  • the bottom of the inner tank body extends into the outer tank body, and the connecting flange is connected to the outer tank body, so that a heating chamber is enclosed by the connecting flange, the outer tank body and the inner tank body;
  • the outer tank body is provided with a medium input pipe and a medium output pipe communicating with the heating chamber;
  • the heating device is installed in the heating chamber and is used for heating the heat conduction heater in the heating chamber.
  • the liquid supply mechanism further comprises a circulation device for forming a circulation filtration module or a circulation spraying device for forming a spraying module;
  • the circulation device is used to extract the liquid medicine in the liquid medicine chamber according to a preset liquid supply strategy and return it to the liquid medicine chamber after filtering;
  • the circulating spraying device is used to extract the liquid medicine in the liquid medicine chamber according to a preset liquid supply strategy, and return it to the liquid medicine chamber in a spraying manner after filtering.
  • the etching system further comprises a cleaning device for forming a cleaning module
  • the cleaning device is used to clean the workpiece in the liquid medicine chamber.
  • the liquid supply mechanism further comprises a bubbling device for forming a bubbling module
  • the bubbling device is used to bubble the liquid medicine in the liquid medicine chamber according to a preset liquid supply strategy.
  • the etching system further comprises an etching switch cover device
  • the etching switch cover device is used to control the opening and closing of the immersion inlet of the liquid medicine chamber.
  • the feeding system includes a conveying device, a first feeding switch cover device;
  • the conveying device is used to convey the workpiece from the preparation position outside the machine body to the loading position in the miniaturized machine room;
  • the machine body is provided with a loading port connected to the miniaturized machine chamber and for the conveyed workpiece to pass through;
  • the first feeding switch cover device is used to control the opening and closing of the feeding port.
  • the feeding system further comprises a second feeding switch cover device
  • the conveying device is installed in the lower chamber and includes a first feeding mechanism and a second feeding mechanism;
  • the supporting partition is provided with a second avoidance opening for the workpiece to enter the upper chamber
  • the first feeding mechanism is used to transport the workpiece from the preparation position to the transfer position in the lower chamber;
  • the second feeding mechanism is used to transport the workpiece from the transfer position to the loading position in the upper chamber
  • the second feeding switch cover device is used to control the opening and closing of the second avoidance opening.
  • the liquid medicine module and the robot module are integrated and configured in the working space of a miniaturized machine room.
  • the robot module is assembled on the top, while multiple liquid medicine modules are arranged in an arc shape. This optimizes the overall arrangement structure, realizes a miniaturized design, reduces the clean room space occupied in scientific research sites, and reduces installation and maintenance costs.
  • the etching system that can independently supply liquid and control the etching environment is integrated into the machine system. Compared with the enterprise-level centralized liquid supply design, it can effectively achieve size reduction, realize miniaturization design, and be compatible with small-size workpiece experiments, thereby reducing liquid consumption and the use of expensive chemicals, greatly saving scientific research costs, and having richer functions.
  • the robot module is combined with a feeding system that can automatically transport materials and an etching system that can automatically provide liquid medicine to achieve overall automated control, completely replacing manual operation. This allows precise control of process parameters, ensures process stability, and greatly improves scientific research efficiency. Furthermore, there is no need for manual access to tools and consumables, and no need for manual contact with hazardous chemicals, effectively protecting the health and safety of personnel.
  • FIG1 is a perspective view of a fully automated wet etching machine for scientific research provided in this application;
  • FIG2 is a cross-sectional view of a fully automated wet etching machine for scientific research provided in this application;
  • FIG3 is a first partial schematic diagram of a fully automated scientific wet etching machine provided in this application.
  • FIG4 is a second partial schematic diagram of a scientific research-type fully automated wet etching machine provided in this application.
  • FIG5 is a first partial cross-sectional view of a scientific research-type fully automated wet etching machine provided in this application;
  • FIG6 is a perspective view of the coordination between the clamping mechanism and the basket frame of a fully automated wet etching machine for scientific research provided in this application;
  • FIG7 is an exploded diagram of the coordination between the clamping mechanism and the basket frame of a fully automated wet etching machine for scientific research provided in this application;
  • FIG8 is a perspective view of a liquid medicine tank with a heating device design of a fully automated wet etching machine for scientific research provided in this application;
  • FIG9 is a cross-sectional view of a liquid medicine tank with a heating device design of a fully automated wet etching machine for scientific research provided in this application;
  • FIG10 is a perspective view of a liquid tank with a heating device design without a tank cover of a fully automated scientific wet etching machine provided in this application;
  • FIG11 is a perspective view of a liquid tank without a heating device and without a tank cover of a fully automated scientific wet etching machine provided in this application;
  • FIG12 is a cross-sectional view of a liquid tank without a heating device design of a fully automated wet etching machine for scientific research provided in this application;
  • FIG13 is a schematic diagram of a partial structure of a fully automated scientific wet etching machine with a conveying device provided in this application;
  • FIG14 is a schematic structural diagram of a conveying device of a fully automated wet etching machine for scientific research provided in this application;
  • FIG15 is a system block diagram of a fully automated wet etching system for scientific research provided by the present application.
  • Control system 2. Robot system; 21. Robot module; 22. Vision module; 3. Etching system; 31. Chemical solution module; 32. Liquid supply mechanism; 33. Liquid supply module; 34. Etching environment module 4. Feeding system; 5. Human-computer interaction system; 6. Timing system; 7. Monitoring system; 8. Machine system; 9. Cleaning system; 100, machine body; 101, supporting partition; 102, first avoidance; 103, first drainage hole; 104, water collection part; 105. Second drain hole; 106. Fan filter unit; 107. Explosion-proof lighting device; 108. Spray movement device; 109. Spray assembly; 110. Support cylinder; 111. Electric control cantilever; 112. Air pressure gauge; 113. Temperature gauge; 114. Raw liquid chamber; 115.
  • the terms “installed,” “connected,” and “connected” should be understood in a broad sense. For example, they can refer to fixed connections, replaceable connections, or integral connections. They can also refer to mechanical connections or electrical connections. They can also refer to direct connections or indirect connections through an intermediate medium. They can also refer to internal connections between two components. For those skilled in the art, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.
  • It includes a machine system 8, an etching system 3, a feeding system 4, a robot system 2 and a control system 1.
  • the machine system 8 is used to provide a miniaturized machine room including an installation space and an operating space. It should be noted that “miniaturized machine room” is a specific term and does not limit how small the machine room can be.
  • the etching system 3 includes a plurality of liquid medicine modules 31 arranged in an arc manner in the miniaturized machine room; the liquid medicine module 31 includes a liquid medicine tank 301 and a liquid supply mechanism 32; the liquid supply mechanism 32 is used to supply liquid to the liquid medicine tank 301 according to a preset liquid supply strategy and control the etching environment in the liquid medicine tank 301.
  • the conventional single-row parallel arrangement is improved to an arc arrangement, and more preferably a circular arrangement is adopted, which can save space and make the operation trajectory of the robot module 21 more flexible.
  • the feeding system 4 is used to realize automatic transportation of workpieces.
  • the robot system 2 includes a robot module 21 and a vision module 22 that is communicatively connected to the robot module 21; the robot module 21 is configured at the top of the working space, and is used to grab the workpiece according to the image information fed back by the vision module 22 and place the workpiece into the liquid tank 301 according to a preset etching strategy to complete etching.
  • the control system 1 is in communication with the machine system 8 , the feeding system 4 , the robot system 2 and the etching system 3 , and is used to implement automated etching operations according to user instructions.
  • the liquid medicine module 31 and the robot module 21 are integrated and configured in the workspace of a miniaturized machine room.
  • the robot module 21 is assembled from the top, while the multiple liquid medicine modules 31 are arranged in an arc. This optimizes the overall layout structure and achieves a miniaturized design, reducing the cleanroom space occupied by scientific research sites and lowering installation and maintenance costs. (Maintaining Class 100 cleanliness and equipment environment requirements in cleanrooms requires numerous measures (such as circulating air, temperature control, micro-vibration protection, and ultrapure water), which results in high operating and maintenance costs. Therefore, saving cleanroom space can significantly reduce installation and maintenance costs.)
  • the etching system 3 that can independently supply liquid and control the etching environment is integrated into the machine system 8. Compared with the enterprise-level centralized liquid supply design, it can effectively achieve size reduction and miniaturization design, and is compatible with small-size workpiece experiments (such as 1cm-2cm small workpieces), thereby reducing the consumption of liquid medicine and the use of expensive chemicals, greatly saving scientific research costs, and having richer functions.
  • the robot module 21 is further configured to grab a cleaning tool and perform a cleaning action based on the image information fed back by the vision module 22. It is understood that:
  • Robot module 21 is designed to perform cleaning operations. Specifically, vision module 22 captures images of the interior of the machine room and identifies the locations of dirt within the images. Robot module 21 then grabs cleaning tools and cleans the affected areas. By adding visual recognition capabilities to robot module 21, it can perform targeted cleaning operations within the work area. Combined with vision module 22, robot module 21 not only performs cleaning tasks but also supports extended functions such as work surface organization, in conjunction with 6S management, improving work efficiency.
  • a dedicated cleaning system 9 may be provided to perform cleaning operations.
  • the cleaning system 9 may include at least one of a purge cleaning device and a spray cleaning device.
  • the robot module 21 is designed to be able to perform the following actions: grabbing a workpiece for sampling, placing the workpiece into the liquid tank 301 (setting out), and moving the workpiece (transferring).
  • the robot module 21 is also capable of performing at least one of a telescopic action, a rotation action, and a shaking action. It is understood that:
  • the robot module 21 has a telescopic function, that is, it is equipped with a telescopic mechanism or module that can perform telescopic actions, so that the overall telescopic length can be adjusted as needed, thereby making the robot module 21 have a wider coverage range to adapt to different work scenarios and operation requirements.
  • Robot module 21 has a shaking function, that is, it is equipped with a shaking mechanism or module that can perform a shaking action. This allows robot module 21 to simulate the shaking of a human hand to implement etching strategies such as shaking and vibrating the workpiece or material, thereby meeting specific process requirements. Specifically, robot module 21 can shake the solution tank 301 or the workpiece at a set frequency and amplitude within a specified time to promote mixing or reaction.
  • Robot module 21 has a rotation function, that is, it is equipped with a rotation mechanism or module that can perform a rotational action, implementing an etching strategy operation that rotates the workpiece in the solution tank 301 to complete a specific process step or task. Specifically, robot module 21 can rotate the solution tank 301 or the workpiece at a set speed and direction within a specified time to achieve stirring and mixing.
  • a timing system 6 is further included; the timing system 6 is used to obtain operating time information of the tool system 8, the feeding system 4, and the robot system 2, and to provide feedback to the control system 1, so that the control system 1 can control the tool system 8, the feeding system 4, the robot system 2, and the etching system 3 according to a preset time strategy.
  • the timing system 6 enables the robot module 21 and the liquid supply mechanism 32 to perform operations at preset time intervals, such as timed addition of liquid or timed sampling, to achieve stable control of process parameters and time.
  • it also includes a human-computer interaction system 5 and a monitoring system 7;
  • the human-computer interaction system 5 is communicatively connected with the control system 1 to enable human-computer interaction between the operator and each system module; for example, it is convenient for the operator to issue various execution instructions to each system module to control the execution actions, functions, etc. of each system module, or to obtain various operating data of each system module.
  • the monitoring system 7 is used to respectively obtain the operating data of the machine system 8, the robot system 2, the etching system 3 and the feeding system 4, and to issue an alarm when the operating data exceeds a threshold; the monitoring system 7 is also used to perform real-time monitoring of the machine system 8, the robot system 2, the etching system 3 and the feeding system 4 according to a preset monitoring strategy.
  • the liquid supply mechanism 32 includes a liquid supply module 33 and an etching environment module 34 .
  • the liquid supply module 33 is used to supply the liquid medicine in the small-capacity liquid medicine tank 600 to the liquid medicine tank 301, and has liquid supply, liquid distribution, and liquid level control functions.
  • small-capacity liquid medicine tank is a specific term and does not limit the size of the tank.
  • the miniaturized design achieved by the overall structural optimization of this application naturally also requires the size of the connected small-capacity liquid medicine tank 600.
  • the use of a small-capacity and small-volume liquid medicine tank further saves liquid medicine.
  • the etching environment module 34 includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spray module, and a circulating filtration module; it can be understood that:
  • the chemical bath 301 has heating, bubbling, ultrasonic vibration, cleaning, spraying, and circulating filtration functions.
  • Etching environment control based on these functions can, for example, create an etching environment by heating to a preset temperature while circulating, filtering, and spraying, bubbling while circulating, bubbling while ultrasonically vibrating, or spraying while feeding liquid and bubbling simultaneously.
  • This strategy can be implemented by the liquid supply mechanism 32 in cooperation with the human-computer interaction system 5, the timing system 6, and the like.
  • the liquid medicine tank 301 is provided with an overflow recovery module to provide an overflow function.
  • the above-designed fully automated scientific research wet etching system has the advantages of intelligence and miniaturization. It can be flexibly applied to various scientific research scenarios, improving scientific research efficiency, saving scientific research resources, ensuring the safety of personnel and equipment, and also has very good commercial value and economic benefits.
  • the embodiment of the present application also discloses a scientific research type wet etching fully automated machine, which is constructed based on the scientific research type wet etching fully automated system designed above.
  • an embodiment of a fully automated wet etching machine for scientific research includes:
  • It includes a machine body 100 and a fully automated scientific wet etching system.
  • the fully automated scientific wet etching system is configured on a machine body, including a machine system 8, an etching system 3, a feeding system 4, a robot system 2, and a control system 1.
  • the machine system 8 is used to provide a miniaturized machine room including installation space and operation space.
  • the etching system 3 includes a plurality of liquid modules 31 arranged in an arc manner in a miniaturized machine room; the liquid module 31 includes a liquid tank 301 and a liquid supply mechanism 32; the liquid supply mechanism 32 is used to supply liquid to the liquid tank 301 according to a preset liquid supply strategy and control the etching environment in the liquid tank 301.
  • the feeding system 4 is used to transport the workpiece 500 into the working space and close the working space after the transport is completed.
  • the robot system 2 includes a robot module 21 and a vision module 22 that is communicatively connected to the robot module 21; the robot module 21 is configured at the top of the working space, and is used to grab the workpiece based on the image information fed back by the vision module 22 and place the workpiece into the solution tank 301 according to the preset etching strategy to complete the etching.
  • the control system 1 is in communication with the machine system 8 , the feeding system 4 , the robot system 2 and the etching system 3 , and is used to realize automated etching operations according to user instructions.
  • the automated liquid supply mechanism 32 is used to create an etching environment in the liquid tank according to the preset liquid supply strategy.
  • the automated robot module 21 is then used to flexibly simulate manual operation to complete etching according to the preset etching strategy, thereby achieving flexible process changes to meet flexible and changeable scientific research scenarios.
  • the bottom of the machine body 100 is equipped with a pulley device and a fixing device, along with an anti-corrosion base, which allows for height adjustment and locking. It can be fixed to the ground to prevent shaking and vibration caused by the operation of the robot module 21.
  • a pulley device and a fixing device along with an anti-corrosion base, which allows for height adjustment and locking. It can be fixed to the ground to prevent shaking and vibration caused by the operation of the robot module 21.
  • different machine bodies 100 can be used for different processes.
  • Each machine body 100 has a reserved, removable etching system 3 to enhance operational flexibility.
  • Example 1 of a scientific research-type wet etching fully automated machine provided in the embodiments of the present application.
  • Example 2 of a scientific research-type wet etching fully automated machine provided in the embodiments of the present application. Please refer to Figures 1 to 15 for details.
  • the robot module 21 is designed to be able to perform the following actions: grabbing a workpiece for sampling; placing a workpiece into the liquid tank 301 for sampling; and moving and transporting the workpiece; and can also perform at least one of a telescopic action, a rotational action, and a shaking action. It is understood that:
  • the robot module 21 has a telescopic function, that is, it is equipped with a telescopic mechanism or module that can perform telescopic actions, so that the overall telescopic length can be adjusted as needed, thereby making the robot module 21 have a wider coverage range to adapt to different work scenarios and operation requirements.
  • Robot module 21 has a shaking function, that is, it is equipped with a shaking mechanism or module that can perform a shaking action. This allows robot module 21 to simulate the shaking of a human hand to implement etching strategies such as shaking and vibrating the workpiece or material, thereby meeting specific process requirements. Specifically, robot module 21 can shake the solution tank 301 or the workpiece at a set frequency and amplitude within a specified time to promote mixing or reaction.
  • Robot module 21 has a rotation function, that is, it is equipped with a rotation mechanism or module that can perform a rotational action, implementing an etching strategy operation that rotates the workpiece in the solution tank 301 to complete a specific process step or task. Specifically, robot module 21 can rotate the solution tank 301 or the workpiece at a set speed and direction within a specified time to achieve stirring and mixing.
  • robot module 21 Because the operating environment of robot module 21 involves flammable and explosive hazardous materials such as acids, alkalis, and organic substances, the robot module 21 must be sufficiently explosion-proof and corrosion-resistant. To enhance safety and explosion-proof design, explosion-proof materials and devices can be used in the structure and electrical system of robot module 21 to ensure that fires or explosions will not occur in flammable and explosive environments. To enhance corrosion resistance, corrosion-resistant materials or special coatings can be used on the outer shell and key components of robot module 21 to prevent damage from corrosive substances such as acids and alkalis.
  • the robot module 21 of the present application is designed to have the functions of grabbing the workpiece 500 (sampling), placing the workpiece 500 into the liquid tank 301 (layout), and moving the workpiece 500 (transfer). There are two ways to design sampling and laying out:
  • the first method is to take samples by extracting the basket 205 containing the workpieces 500.
  • the basket 205 is adaptively designed according to the size of the workpieces 500 to be tested, so as to meet the requirements of holding small-sized workpieces 500.
  • the second method involves directly grabbing the workpiece 500 from the fixture for sampling.
  • This method has the following features: 1. It utilizes a two-sided gripping mechanism to ensure no impact on the workpiece 500 surface, and can securely and flexibly grip 1-2 cm square pieces. 2. It controls force with an accuracy of 0.01 N to prevent breakage. 3. It enables both placement and transfer of samples.
  • the robot module 21 is automatically controlled by the control system 1 to control the positioning accuracy and transmission speed of the layout, effectively solve process problems such as glue coating uniformity, temperature change, corrosion time control, etc., and improve process stability.
  • the robot module 21 can also be designed with a cleaning function to clean the working area inside the machine body 100:
  • the robot module 21 grabs the cleaning tool and cleans the upper chamber according to a preset cleaning trajectory. Specifically, it can grab the cleaning tool with dust-free paper/cloth to simulate the wiping action of human hands for cleaning.
  • the robot module 21 can be configured with the ability to suck the cleaning tool.
  • Vision Module 22 captures images of the interior of the machine room and identifies the locations of dirt within the images. Robot Module 21 then grabs cleaning tools and cleans the affected areas. By adding visual recognition capabilities to Robot Module 21, Robot Module 21 can perform targeted cleaning operations within the work area. This combination of Robot Module 21 and Vision Module 22 not only performs cleaning tasks but also supports extended functions such as work surface organization, in conjunction with 6S management, improving work efficiency.
  • the setting of the vision module also makes the interconnection between the robot module 21 and the feeding system 4 and the etching system 3 more accurate, realizes highly intelligent operation, and improves production efficiency and precision.
  • the robot module 21 in the cleaning control mode 1 or 2 can also be an independently added robot module dedicated to cleaning, realizing a dual robot module design.
  • a timing system 6 is further included.
  • the timing system 6 is used to obtain the operating time of the robot module 21 and control the operation of the robot module 21 according to a preset operating time strategy. It is understood that the timing system 6 enables the robot module 21 and the liquid supply mechanism to operate at preset time intervals, such as timed addition of liquid medicine or timed sampling, thereby achieving stable control of process parameters and time.
  • a dedicated cleaning system 9 can be added.
  • the cleaning system 9 is arranged on the machine body 100 and is used to clean the inside of the machine room.
  • the cleaning system 9 includes at least one of a purge cleaning device and a spray cleaning device, and specifically implements, for example, nitrogen purge cleaning, spray cleaning, etc.
  • it also includes a human-computer interaction system 5 and a monitoring system 7;
  • the human-computer interaction system 5 is communicatively connected with the control system 1 to enable human-computer interaction between the operator and each system module; for example, it is convenient for the operator to issue various execution instructions to each system module to control the execution actions, functions, etc. of each system module, or to obtain various operating data of each system module.
  • the human-machine interaction system 5 of the present application includes an electric control cantilever 111 fixed on a machine body 100 , and/or a remote control terminal, etc.
  • the monitoring system 7 is used to respectively obtain the operating data of the machine system 8, the robot system 2, the etching system 3 and the feeding system 4, and to issue an alarm when the operating data exceeds a threshold; the monitoring system 7 is also used to perform real-time monitoring of the machine system 8, the robot system 2, the etching system 3 and the feeding system 4 according to a preset monitoring strategy.
  • the monitoring system 7 is composed of various sensors, such as a temperature sensor for detecting the temperature of the liquid in the liquid tank 301, a level sensor for detecting the amount of liquid in the liquid tank 301, and an air pressure sensor for detecting the air pressure in the working area of the machine room. As shown in Figure 1, a wind pressure gauge 112 and a temperature gauge 113 can be configured on the front of the machine body 100.
  • the liquid supply mechanism 32 includes a liquid supply module 33 and an etching environment module 34 .
  • the liquid supply module 33 is used to supply the liquid medicine in the small-capacity liquid medicine tank 600 to the liquid medicine tank 301, and has liquid supply, liquid distribution, and liquid level control functions.
  • small-capacity liquid medicine tank is a specific term and does not limit the size of the tank.
  • the miniaturized design achieved by the overall structural optimization of this application naturally requires that the connected small-capacity liquid medicine tank 600 is also small in size.
  • the use of a small-capacity, small-volume liquid medicine tank further saves liquid medicine.
  • the etching environment module 34 includes at least one of a heating module, a bubbling module, an ultrasonic vibration module, a cleaning module, a spray module, and a circulating filtration module; it can be understood that:
  • the chemical bath 301 has heating, bubbling, ultrasonic vibration, cleaning, spraying, and circulating filtration functions.
  • Etching environment control based on these functions can, for example, create an etching environment by heating to a preset temperature while circulating, filtering, and spraying, bubbling while circulating, bubbling while ultrasonically vibrating, or spraying while feeding liquid and bubbling simultaneously.
  • This strategy can be implemented by the liquid supply mechanism 32 in cooperation with the human-computer interaction system 5, the timing system 6, and the like.
  • the liquid medicine tank 301 is provided with an overflow recovery module to provide an overflow function.
  • the robot module 21 recognizes the size and position of the workpiece 500 through the vision module 22 , it moves to the corresponding position and grabs the workpiece 500 , and then places the workpiece 500 into the corresponding liquid medicine tank 301 .
  • the robot module 21 can shake or rotate the workpiece 500 in the liquid medicine tank 301 at preset intervals under the control of the timing system 6, and detect the fragmentation through feedback from the vision module 22 or other sensor modules.
  • This application can interconnect the robot module 21 with the automation function module on the machine body 100 to achieve human-machine interconnection and high intelligence. Specifically, the following functions can be achieved:
  • the robot module 21 interacts with personnel in real-time, exchanging data and transmitting commands. Personnel can monitor the operating status of the robot module 21 and the machine body 100 through a monitoring system 7 comprised of a computer or mobile device, and view experimental data and results in real time.
  • the robot module 21 can communicate with personnel and conduct operations through a human-machine interaction system 5 comprised of voice or touchscreen interfaces.
  • the robot module 21 can be responsible for various operations, such as sampling, adding liquid, stirring, heating, etc. Equipped with sensors and a vision module 22, the robot module 21 can monitor and identify the experimental environment and the status of the workpiece 500, thereby automatically adjusting and making decisions.
  • the robot module 21 can automatically analyze experimental data and make corresponding decisions based on pre-set processes and algorithms. For example, it can automatically adjust reaction conditions and dosage based on real-time parameters such as temperature and drug concentration to achieve the optimal reaction effect.
  • the robot module 21 can monitor the operating status of the entire wet bench through the monitoring system 7, promptly detecting and reporting potential faults. When a fault occurs, the robot module 21 can automatically stop operation and provide a preliminary analysis of the cause of the fault and recommended repair methods.
  • the robot module 21 is a multi-axis collaborative robot, specifically a six-axis collaborative robot.
  • Traditional modular robots or industrial robots although they have a strong load capacity and a large operating range, are not flexible and intelligent enough in terms of movement, running trajectory, operating logic and function compared with collaborative robots, and cannot adapt to flexible and changeable scientific research scenarios.
  • Industrial robot modules are usually pre-programmed with motion trajectories, and the movements and operating logic are relatively fixed, and can only complete predetermined simple repetitive tasks.
  • Collaborative robots perceive the surrounding environment in real time through sensors through human-computer interaction, and make autonomous decisions and adjust movement trajectories and movements according to task changes and actual conditions. They have higher flexibility and adaptability and can accomplish more complex tasks. For this reason, the robot module 21 of this application is designed as a collaborative robot.
  • the preset etching strategy can be summarized as a strategy for the time/state change of the workpiece 500 in the created etching environment, for example:
  • Immersion time strategy can be continuous immersion within a certain time range, or immersion at certain time intervals. This strategy can be implemented by the robot module 21 in cooperation with the telescopic mechanism and the timing system 6.
  • the static state strategy can be a specific state change within a certain time range.
  • the workpiece 500 is shaken at a set frequency or rotated at a set speed at regular intervals during the static process.
  • This strategy can be implemented by the robot module 21 with the cooperation of the timing system 6, the shaking mechanism, and the rotating mechanism.
  • control strategy is not limited to the above, and those skilled in the art can change the control strategy according to actual process requirements without limitation.
  • a supporting partition 101 is provided in the miniaturized machine chamber, and the supporting partition 101 divides the miniaturized machine chamber into an upper chamber and a lower chamber.
  • the robot module 21 is installed on the top of the upper chamber. This design is beautiful and saves space.
  • the supporting partition 101 is provided with first escape openings 102 that are connected to each of the drug solution tanks 301 in a one-to-one correspondence.
  • liquid medicine tanks 301 can be reduced, thereby reducing the size of the equipment, making it more convenient for users to use, and improving equipment utilization. Based on the design of reducing the equipment size, the capacity of the liquid medicine tank 301 can be reduced, which can greatly save the amount of liquid medicine used compared to an enterprise-level wet bench design.
  • an electrical control room 115 and a raw liquid room 114 for storing a small-capacity liquid medicine tank 600 as shown in FIG2 may be provided in the space below the miniaturized machine room within the machine body 100.
  • the controller of the robot module 21, the controller of the conveying device 402, and the controller of the etching system 3 are all centrally installed in the electrical control room 115, and all electrical appliances and circuits that may come into contact with liquid medicine mist are subjected to PFA anti-corrosion isolation treatment.
  • the machine system 8 further includes a fan filter unit 106 /FFU, and the fan filter unit 106 is equipped with a high-efficiency filtering device.
  • the fan filter unit 106 can be split into two units and arranged at intervals.
  • the machine body 100 is provided with an exhaust port and an air supply port connected to the upper chamber.
  • the fan filter unit 106 is installed on the machine body 100 and connected to the air supply port. The fan filter unit 106 is used to ensure that the control quality of the operating area of the robot module 21 meets the cleanliness level 100 requirements.
  • a nitrogen gun and a pure water gun are respectively provided on the left and right sides of the front of the upper chamber.
  • the water gun is designed to drip running water, which is convenient for cleaning the fragile workpiece 500.
  • an automatic fire extinguishing system is also designed: the automatic fire extinguishing system is equipped with sensors such as smoke sensors, temperature sensors, and open flame sensors, and the automatic fire extinguishing system is designed to have the ability to work under power outages.
  • the machine system 8 further includes an explosion-proof lighting device 107 .
  • the explosion-proof lighting device 107 is installed on the machine body 100 and is used to illuminate the upper chamber.
  • the machine body 100 is provided with an observation window 117 for observing the upper chamber, so as to facilitate observation of the operation of the robot module 21.
  • the machine body 100 is provided with an automatic upper and lower safety door, and the automatic upper and lower safety door is equipped with an incorrect operation alarm device to ensure personnel safety.
  • a spray cleaning device is designed as an example, as shown in Figure 4, which specifically includes a spray assembly 109 and a spray moving device 108; the spray moving device 108 is installed in the upper chamber and is connected to the spray assembly 109, which is used to drive the spray assembly 109 to move.
  • the spray moving device 108 can be two sets, specifically linear displacement modules, symmetrically arranged at the edge positions of the support partition 101 on both sides, and their respective driving ends are respectively connected to the spray assembly 109, driving the spray assembly 109 to reciprocate above the support partition 101.
  • the spray assembly 109 is a spray pipe with a plurality of nozzles arrayed thereon, which cleans the work surface on the support partition 101 by spraying water.
  • a plurality of first drainage holes 103 are provided on the support partition 101, and a main drainage pipe connected to the outside of the machine body 100 is provided in the lower chamber. The dirty water discharged into the lower chamber through the first drainage holes 103 is then discharged from the machine body 100 through the main drainage pipe.
  • a water collecting portion 104 is provided in the middle of the support baffle 101 to collect the accumulated water and then drain it through a second drainage hole 105 provided in the water collecting portion 104.
  • the support baffle 101 can be designed to have a certain slope from all sides toward the center, or to have a certain slope at a single position, to achieve a better collection and drainage effect, without limitation.
  • a support cylinder 110 connected to the support partition 101 is provided in the middle of the lower chamber, and an independent control chamber is provided in the support cylinder 110.
  • the support cylinder 110 of this design can also support and reinforce the support partition 101.
  • the second drainage hole 105 is designed to be connected to the control chamber.
  • a branch drainage pipe connected to the second drainage hole 105 is provided in the control chamber.
  • the branch drainage pipe extends out of the support cylinder 110 at one end away from the second drainage hole 105, and can specifically extend directly out of the machine body 100.
  • a flower basket clamping mechanism 204 for grasping the flower basket rack 205 is connected to the end of the robot module 21 .
  • a flower basket rack 205 for holding the workpiece 500 is also included, and the flower basket clamping mechanism 204 is used to grasp/release the flower basket rack 205 .
  • the design of the flower basket clamp mechanism 204 specifically includes a clamping drive assembly 201 and two clamping members 202 .
  • the clamping drive assembly 201 is connected to the two clamping members 202 to drive the two clamping members 202 to open and close to clamp the flower basket stand 205 .
  • the present application provides an explosion-proof and corrosion-resistant protective cover 203 on the outside of the clamping drive assembly 201 .
  • the basket rack 205 of the present application is designed for the storage needs of small-sized workpieces 500, and the design specifications are suitable for, for example, 4/6 inch workpieces 500 and 1 cm-2 cm square loose piece workpieces 500.
  • the flower basket stand 205 specifically includes two fixing plates 206 .
  • the two fixed plates 206 are arranged in parallel and spaced apart, and are fixedly connected by multiple connecting rods 207.
  • Each connecting rod 207 and the two fixed plates 206 form a holding cavity for holding the workpiece 500; the workpiece 500 can enter from the two fixed plates 206 and then be placed in the enclosed holding cavity, and be fixed by utilizing the limiting function of the fixed plates 206 and the connecting rods 207.
  • the bottom of the clamping claw member 202 is provided with a limiting flange 213 that can contact and abut the bottom of the handle block 210.
  • the limiting flange 213 can support and clamp the handle block 210 to prevent it from falling.
  • the flower basket stand 205 includes a bottom plate and two fixing plates 206 as shown in FIG. 6 and FIG. 7 .
  • Two fixed plates 206 are arranged parallel and spaced apart on top of each other.
  • a handle block 210 is fixedly connected to the top between the two fixed plates 206.
  • Guide slots 211 are provided on both sides of the handle block 210.
  • the clamping surfaces of the two clamping jaws 202 are provided with positioning protrusions 212 that engage with the guide slots 211.
  • the bottoms of the clamping jaws 202 are each provided with a limiting flange 213 that contacts and abuts the bottom of the handle block 210.
  • a plurality of limiting rods are fixed to the base plate between the two fixed plates 206. Adjacent limiting rods and the base plate define a receiving cavity for the workpiece 500.
  • This design differs from the aforementioned 4/6-inch design in the formation of the base plate and the receiving cavity. Persons skilled in the art can modify the design as needed without limitation.
  • positioning blocks 209 are fixed on the opposite side surfaces of the two fixed plates 206.
  • the positioning block 209 structure can be L-shaped, and a pressure block 208 for pressing the workpiece 500 is movably inserted between the two positioning blocks 209.
  • Notches are provided on both sides of the pressure block 208 for the vertical block portion of the positioning block 209 to movably pass through, and the horizontal block portion of the positioning block 209 can play a limiting role to prevent the installed pressure block 208 from sliding down out of the positioning block 209.
  • the pressure block 208 is movable and adjustable, and can be flexibly adjusted according to the size of the workpiece 500 placed, so as to achieve the effect of pressing workpieces 500 of various sizes, prevent the workpiece 500 from floating up and falling when immersed in the liquid medicine, and ensure the stability and safety of small-sized workpieces 500 in the flower basket rack 205.
  • the positioning block 209 can be designed to be adjustable in the upper and lower mounting positions, which can make the application range of the pressing block 208 wider.
  • both the connecting rod 207 and the limiting rod are provided with a slot 214 for the workpiece 500 to be inserted into.
  • the liquid supply mechanism 32 is designed to include a liquid delivery device and a liquid discharge device for forming a liquid supply module 33 .
  • the liquid delivery device includes a liquid pump tube and a liquid medicine pump.
  • the pump tube is connected to the drug tank 301, and the other end is connected to the small-capacity drug tank 600.
  • the drug tube is designed as a small bottle.
  • the drug pump is installed on the pump tube and is used to pump the drug liquid in the small-capacity drug tank 600 into the drug tank 301 according to a preset liquid supply strategy.
  • the drug pump directly pumps the drug liquid from the small-capacity drug tank 600 into the drug tank 301.
  • Each small-capacity drug tank 600 corresponds to a pump tube, and each pump tube corresponds to a drug pump.
  • a small-capacity drug tank 600 can supply liquid to multiple drug tanks 301.
  • the drain device includes a drain pipe and a drain valve 310 , and the drain pipe is connected to the medicine tank 301 .
  • the drain valve 310 is connected to the drain pipe and is used to control the flow of the drain pipe according to a preset liquid supply strategy
  • the liquid tank 301 is provided with a liquid level sensor for detecting the liquid level of the liquid. This design can realize dynamic changes in the liquid level and adjust the liquid level according to the etching requirements of different workpieces.
  • the above-mentioned liquid medicine pump can specifically be a pneumatic diaphragm pump, which is a small flow pump.
  • the pumping time can be greatly shortened and the residual waste of liquid medicine in the pipeline can be reduced.
  • a centralized liquid supply port can be reserved for use in batch preparation.
  • each chemical tank 301 corresponds to multiple small-capacity chemical tanks 600 containing different chemical solutions, enabling direct mixing within the chemical tank 301.
  • a separate mixing tank can be added.
  • the small-capacity chemical tanks 600 are designed as small-capacity bottles, further conserving chemical solutions through their small capacity and volume.
  • the liquid medicine tank 301 is designed to include a liquid medicine chamber 305 and an overflow chamber 306 for forming an overflow module.
  • the liquid medicine chamber 305 is used to accommodate the liquid medicine supplied by the liquid supply mechanism 32 and to allow the workpiece 500 to be placed therein, while the overflow chamber 306 is used to receive the liquid medicine overflowing from the liquid medicine chamber 305 .
  • the overflow chamber 306 is provided with an overflow recovery port 307.
  • the liquid chamber 305 is provided with a liquid inlet 308 connected to a pump liquid pipe, and a liquid outlet 309 connected to a liquid discharge pipe.
  • the liquid discharge valve 310 may be a quick discharge valve.
  • the aforementioned liquid level sensor for detecting the liquid level is disposed within the liquid chamber 305. This liquid level sensor enables automatic liquid level control, saving liquid and protecting equipment safety. Before placing a flower basket 205 containing workpieces 500 of varying sizes, the liquid level can be set to different heights based on the size of the workpieces 500 and the flower basket 205. The liquid level in the liquid chamber 305 is then monitored in real time by the liquid level sensor and fed back to the control system 1.
  • the control system 1 controls the amount of liquid pumped or the degree of opening and closing of the liquid discharge valve 310 to maintain the liquid level within the set range, achieving precise and stable liquid level control.
  • the drug solution tank 301 specifically includes an inner tank body 302 .
  • the liquid supply mechanism 32 further includes a heating device 312 for forming a heating module.
  • the heating device 312 is used to heat the liquid in the liquid chamber 305 according to a preset liquid supply strategy. Not all liquid tanks 301 are necessarily equipped with the heating device 312.
  • the heating device 312 can be flexibly configured as needed. For example, if the liquid in some liquid tanks 301 does not require heating during the experiment, the heating device 312 may not be configured.
  • the heating device 312 can be designed for direct heating or water bath heating.
  • the water bath heating design is safer.
  • the liquid medicine tank 301 further includes an outer tank body.
  • the bottom of the inner tank body 302 extends into the outer tank body, and the connecting flange 303 is connected to the outer tank body, so that a heating chamber 311 is formed between the connecting flange 303, the outer tank body and the inner tank body 302.
  • the outer tank body is provided with a medium input pipe and a medium output pipe connected to the heating chamber 311.
  • the heating device 312 is installed in the heating chamber 311 and is used to heat the heat conduction heating in the heating chamber 311.
  • the heat conduction medium can be conventional water or heat conduction oil, and there is no specific limitation.
  • the heating device 312 can be an electric heating tube or an electric heating wire.
  • a temperature sensor can be set in the heating chamber 311 to detect the temperature of the heat conduction medium and feed it back to the control system 1, so that the control system 1 can accurately control the heating temperature of the liquid chamber 305 by controlling the power of the heating device 312.
  • the liquid supply mechanism 32 further includes a circulation device for forming a circulation filtration module or a circulation spraying device for forming a spraying module.
  • the circulation device is used to extract the liquid medicine in the liquid medicine chamber 305 according to a preset liquid supply strategy and return it to the liquid medicine chamber 305 after filtration.
  • the circulation spraying device is used to extract the liquid medicine in the liquid medicine chamber 305 according to a preset liquid supply strategy and return it to the liquid medicine chamber 305 in a spraying manner after filtration.
  • the circulation device can specifically include a circulation pump, a circulation delivery pipe, and a filter device.
  • the input end of the circulation pump is connected to the filter and is connected to one side of the liquid medicine chamber 305 through the circulation delivery pipe.
  • the output end of the circulation pump is connected to the other side of the liquid medicine chamber 305 through the circulation delivery pipe.
  • the circulating spray device is different from the circulating device in that it performs reflux in the form of spraying.
  • the circulating spray device may specifically include a circulating pump, a circulating delivery pipe, a spray head and a filtering device.
  • one end of the pump liquid pipe can also be connected to the nozzle to realize the spray function, that is, the liquid is fed in a spraying manner.
  • the liquid supply mechanism 32 further includes a bubbling device for forming a bubbling module, and the bubbling device is used to bubble the liquid medicine in the liquid medicine chamber 305 according to a preset liquid supply strategy to achieve the bubbling function of the liquid medicine tank 301.
  • the etching system 3 further includes a cleaning device 315, which is used to clean the workpiece 500 in the chemical solution chamber 305.
  • the cleaning device 315 can be designed as two, specifically a spray pipe design.
  • the two cleaning devices 315 can be symmetrically installed on the chemical solution tank 301 as shown in Figure 10 and arranged toward the chemical solution chamber 305.
  • One of the cleaning devices 315 can be connected to a nitrogen tank via a sprayer, while the other cleaning device 315 can be connected to a pure water tank via a sprayer.
  • the etching system 3 further includes an etching switch cover device, which is used to control the opening and closing of the immersion inlet of the liquid medicine chamber 305.
  • the etching switch cover device is designed to include an etching end cover 313 and a switch driver 314.
  • One side of the etching end cover 313 is hinged to one side of the inner tank body 302 via a rotating shaft, and the switch driver 314 is installed on the liquid medicine tank 301 and connected to the rotating shaft, and is used to drive the rotating shaft to rotate, thereby controlling the opening and closing of the etching end cover 313.
  • the design of the etching switch cover device can improve data accuracy and ensure personnel safety.
  • the design of the automatically controlled etching switch cover device can improve operational efficiency and reduce the direct contact between operators and harmful substances.
  • the etching switch cover device can be interconnected with the control system 1.
  • the control system 1 For example, when the monitoring system 7 detects an abnormality in the equipment, the etching switch cover device is controlled to close the liquid tank 301.
  • the switch driver 314 can be designed as a pneumatic telescopic cylinder, which drives the rotating shaft to rotate through a connecting rod mechanism. According to process and safety requirements, the timing and frequency of automatically opening and closing the etching end cover 313 can be set, thereby improving the reliability, efficiency and safety of scientific research experiments.
  • the liquid supply mechanism 32 further includes an ultrasonic instrument for vibrating the liquid chamber 305 according to a preset liquid supply strategy.
  • the etching system 3 listed in this application has the functions of spraying, circulating filtration spraying, heating, circulating filtration, automatic liquid preparation, vibration, bubbling, overflow, etc., which can be configured on the corresponding liquid tank 301 according to process requirements.
  • the 301 chemical tank for acetone/IPA/EKC can be equipped with spraying, circulating filtration spraying, heating, and circulating filtration functions, and the tank structure material can be SUS316L; taking the design of the 301 chemical tank for DIW as an example, it can be equipped with circulating filtration spraying, bubbling, overflow, and quick discharge, and the tank structure material can be NPP.
  • the preset liquid supply strategy it can specifically be an etching environment + liquid supply strategy, for example:
  • the liquid supply strategy can be a liquid supply quantity control strategy or a liquid distribution control strategy.
  • the etching environment strategy can be to create a circulation filtration spray while heating at a preset temperature, or to bubbling while circulating filtration, or to perform ultrasonic vibration while bubbling, or to bubbling while liquid is injected and sprayed, etc.
  • the execution of this strategy can be realized by the liquid supply mechanism 32 with the cooperation of the human-computer interaction system 5, the timing system 6, etc.
  • the feeding system 4 is designed to include a conveying device 402 and a first feeding switch cover device 401 .
  • the conveying device 402 is used to transport the workpiece 500 from the preparation position outside the machine body 100 to the loading position in the machine room; as shown in Figure 1, the preparation position outside the machine body 100 is provided with a loading platform 116 for placing the workpiece 500 to be tested or the flower basket rack 205 containing the workpiece 500.
  • the machine body 100 is provided with a loading port that connects to the machine chamber and allows the workpiece 500 to pass through.
  • a first feed opening and closing device 401 is used to control the opening and closing of the loading port.
  • the first feed opening and closing device 401 includes a baffle 404 and a plate driver 403.
  • the baffle 404 can be slidably mounted on the machine body 100 to block the loading port.
  • the plate driver 403 can be a telescopic cylinder connected to the baffle 404, driving the baffle 404 to move telescopically to achieve opening and closing control.
  • the loading port is opened before loading and closed after loading is completed.
  • the feeding system 4 further includes a second feeding switch cover device.
  • the conveying device 402 can be specifically installed in the lower chamber.
  • the lower chamber can also be designed with an independent installation chamber for installing the conveying device 402.
  • the conveying device 402 includes a first feeding mechanism 405 and a second feeding mechanism 406 .
  • a second escape opening is provided on the supporting partition 101 for the workpiece 500 to enter the upper chamber, and the second escape opening is connected to the installation chamber.
  • the first feeding mechanism 405 is used to transport the workpiece 500 from the preparation position to the transfer position in the lower chamber
  • the second feeding mechanism 406 is used to transport the workpiece 500 from the transfer position to the loading position in the upper chamber.
  • the first feeding mechanism 405 can be a horizontal displacement mechanism
  • the second feeding mechanism 406 can be a vertical displacement mechanism.
  • the driving end of the first feeding mechanism 405 is connected to a first support 407, which is provided with a positioning groove for fixing the flower basket 205.
  • the positioning groove is also provided with an escape notch 408.
  • the driving end of the second feeding mechanism 406 is connected to a second support 409, which can pass through the escape notch 408 to lift the flower basket 205 from the first support 407 for further transportation to the loading position.
  • the second feed opening and closing cover device is used to control the opening and closing of the second avoidance opening.
  • the design and composition of the second feed opening and closing cover device can refer to the design and composition of the first feed opening and closing cover, and the details are not repeated here.
  • the fully automated design can accurately control the amount of liquid medicine used, reduce the amount of reagents used, reduce scientific research costs, and improve resource utilization efficiency. It can also automatically monitor and adjust experimental conditions, reduce the risk of experimental failure, and reduce the waste of experimental consumables, thereby reducing resource waste.
  • the equipment is optimized and miniaturized, compatible with small-size workpiece experiments, which not only reduces floor space and saves installation and maintenance costs, but also greatly reduces liquid medicine consumption, saving scientific research costs.
  • This fully automated machine has a wide range of applications, filling the gap in existing technology for wet-process equipment and processes in the scientific research field. It can be used in various university laboratories and research institutions to meet scientific research needs, and will have a positive and far-reaching impact on the development of semiconductor research. Moreover, the intelligent and automated nature of this fully automated machine will attract user demand and is expected to achieve significant success in the market. In addition, the commissioning of this fully automated machine will promote the development of related industrial chains, promote the upgrading and innovation of related technologies and equipment, and provide a significant boost to economic progress.

Landscapes

  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Mechanical Engineering (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

本申请公开了一种科研型湿法刻蚀全自动化系统及机台，涉及半导体清洗刻蚀技术领域，其中系统包括机台系统、刻蚀系统、送料系统、机器人系统以及控制系统；机台系统用于提供小型化机室；刻蚀系统包括以弧线排布方式配置于小型化机室中的多个药液模块；药液模块包括药液槽以及用于按照预设供液策略给药液槽供液并控制药液槽中的刻蚀环境的供液机构；送料系统用于实现工件自动化运送；机器人系统包括机器人模块以及与机器人模块通信连接的视觉模块；机器人模块配置于作业空间顶部，用于根据视觉模块反馈的图像信息抓取工件并按预设刻蚀策略将工件置入药液槽中完成刻蚀。实现了智能小型化设计，满足灵活多变的科研场景，提高科研效率，节约科研资源。

Description

一种科研型湿法刻蚀全自动化系统及机台 技术领域
本申请涉及半导体清洗刻蚀技术领域，尤其涉及一种科研型的有机湿法台。
背景技术
半导体微纳米器件制造工艺中，需要用到湿法台进行晶圆表面清洗和酸碱刻蚀，但在科研领域中，目前没有可以用于科研使用的全自动湿法台设备。传统企业级的湿法台虽自动化程度高，但仅适合批量生产，其存在以下问题：
1、设备尺寸大，会占用科研场所的洁净室空间，浪费资源；
2、采用集中供液及大药液槽设计，药液消耗量大，极大增加科研成本；
3、只适用于大尺寸半导体(4/6/8/12寸晶圆)，不能兼容小尺寸半导体(1cm-2cm晶圆)；
4、为按照工业生产的标准工艺流程进行设计的，不能满足灵活多变的科研场景。
为此，目前高校针对半导体的科研方式还是手动操作方式为主，通过人工取用和配置化学试剂，由于湿法刻蚀工序涉及众多危险化学试剂，一旦防护不当或操作不规范，易发生危险，危及科研人员生命和健康安全，且多数实验场景需要人工操作小型设备辅助，操作不便利，整体存在工艺不稳定和效率低的弊端。
综上，现有技术在对于如何提升科研效率和工艺稳定性的研究上仍然是空白，这严重制约了半导体科研的发展，为此，亟需提供一种解决方案以解决上述问题。
发明内容
有鉴于此，本申请的目的是提供一种科研型湿法刻蚀全自动化系统及机台，满足高校科研使用，提升科研效率和工艺稳定性。
为达到上述技术目的，本申请提供了一种科研型湿法刻蚀全自动化系统，包括机台系统、刻蚀系统、送料系统、机器人系统以及控制系统；
所述机台系统用于提供包括安装空间及作业空间的小型化机室；
所述刻蚀系统包括以弧线排布方式配置于所述小型化机室中的多个药液模块；
所述药液模块包括药液槽以及供液机构；
所述供液机构用于按照预设供液策略给所述药液槽供液并控制所述药液槽中的刻蚀环境；
所述送料系统用于将工件输送至所述作业空间中，并在完成输送后封闭所述作业空间；
所述机器人系统包括机器人模块以及与所述机器人模块通信连接的视觉模块；
所述机器人模块配置于所述作业空间顶部，用于根据所述视觉模块反馈的图像信息抓取工件并按预设刻蚀策略将所述工件置入所述药液槽中完成刻蚀；
所述控制系统与所述机台系统、所述送料系统、所述机器人系统和所述刻蚀系统通信连接，用于根据用户指令实现自动化刻蚀作业。
在一个更具体的实施例中，所述机器人模块还用于根据所述视觉模块反馈的图像信息抓取清洁工具执行清洁动作。
在一个更具体的实施例中，所述机器人模块还能够执行伸缩动作、旋转动作以及抖动动作中的至少一种。
在一个更具体的实施例中，还包括计时系统；
所述计时系统用于获取所述机台系统、所述送料系统、所述机器人系统的运行时间信息并反馈所述控制系统，以使得所述控制系统能够按照预设时间策略对所述机台系统、送料系统、机器人系统和所述刻蚀系统进行控制。
在一个更具体的实施例中，还包括人机交互系统以及监控系统；
所述人机交互系统与所述控制系统通讯连接；
所述监控系统用于分别获取所述机台系统、所述机器人系统、所述刻蚀系统以及所述送料系统的运行数据，并在所述运行数据超出阈值时发出警报；
所述监控系统还用于根据预设监控策略对机台系统、所述机器人系统、所述刻蚀系统以及所述送料系统进行实时监控。
在一个更具体的实施例中，所述供液机构包括供液模块以及刻蚀环境模块；
所述供液模块用于将小容量药液罐中的药液供给所述药液槽；
所述刻蚀环境模块包括加热模块、鼓泡模块、超声振动模块、清洗模块、喷淋模块以及循环过滤模块中的至少一种；
所述药液槽设有溢流回收模块。
本申请还公开了一种科研型湿法刻蚀全自动化机台，包括机台本体以及科研型湿法刻蚀全自动化系统；
所述科研型湿法刻蚀全自动化系统配置于所述机台本体上，包括机台系统、刻蚀系统、送料系统、机器人系统以及控制系统；
所述机台系统用于提供包括安装空间及作业空间的小型化机室；
所述刻蚀系统包括以弧线排布方式配置于所述小型化机室中的多个药液模块；
所述药液模块包括药液槽以及供液机构；
所述供液机构用于按照预设供液策略给所述药液槽供液并控制所述药液槽中的刻蚀环境；
所述送料系统用于将工件输送至所述作业空间中，并在完成输送后封闭所述作业空间；
所述机器人系统包括机器人模块以及与所述机器人模块通信连接的视觉模块；
所述机器人模块配置于所述作业空间顶部，用于根据所述视觉模块反馈的图像信息抓取工件并按预设刻蚀策略将所述工件置入所述药液槽中完成刻蚀；
所述控制系统与所述机台系统、所述送料系统、所述机器人系统和所述刻蚀系统通信连接，用于根据用户指令实现自动化刻蚀作业。
在一个更具体的实施例中，所述机器人模块还用于根据所述视觉模块反馈的图像信息抓取清洁工具执行清洁动作。
在一个更具体的实施例中，所述机器人模块还能够执行伸缩动作、旋转动作以及抖动动作中的至少一种。
在一个更具体的实施例中，还包括计时系统；
所述计时系统用于获取所述机台系统、所述送料系统、所述机器人系统的运行时间信息并反馈所述控制系统，以使得所述控制系统能够按照预设时间策略对所述机台系统、送料系统、所述机器人系统和所述刻蚀系统进行控制。
在一个更具体的实施例中，还包括人机交互系统以及监控系统；
所述人机交互系统与所述控制系统通讯连接；
所述监控系统用于分别获取所述机台系统、所述机器人系统、所述刻蚀系统以及所述送料系统的运行数据，并在所述运行数据超出阈值时发出警报；
所述监控系统还用于根据预设监控策略对机台系统、所述机器人系统、所述刻蚀系统以及所述送料系统进行实时监控。
在一个更具体的实施例中，所述供液机构包括供液模块以及刻蚀环境模块；
所述供液模块用于将小容量药液罐中的药液供给所述药液槽；
所述刻蚀环境模块包括加热模块、鼓泡模块、超声振动模块、清洗模块、喷淋模块以及循环过滤模块中的至少一种；
所述药液槽设有溢流回收模块。
在一个更具体的实施例中，所述机器人模块为协作机器人。
在一个更具体的实施例中，所述小型化机室设于所述机台本体中；
所述小型化机室中设有支撑隔板；
所述支撑隔板将所述小型化机室隔成上腔室以及下腔室；
所述上腔室形成作业空间。
在一个更具体的实施例中，多个所述药液模块圆周布置于所述下腔室中；
所述支撑隔板上设有一一对应连通各个所述药液模块中的药液槽的第一避让口。
在一个更具体的实施例中，所述机台本体内于所述小型化机室下方的空间设有电控室以及用于存放小容量药液罐的原液室。
在一个更具体的实施例中，所述机台系统还包括风机过滤机组；
所述机台本体上设有连通所述上腔室的排风口以及送风口；
所述风机过滤机组安装于所述机台本体上，且与所述送风口连接。
在一个更具体的实施例中，所述机台本体上还安装有喷淋清洁装置；
所述喷淋清洁装置包括喷淋组件以及喷淋移动装置；
所述喷淋移动装置安装于所述上腔室中，且与所述喷淋组件连接，用于带动所述喷淋组件移动；
所述支撑隔板上开设有多个第一排水孔；
所述下腔室设有连通所述机台本体外的主排水管。
在一个更具体的实施例中，所述支撑隔板中部设有聚水部；
所述聚水部上设有第二排水孔。
在一个更具体的实施例中，所述下腔室中部设有连接所述支撑隔板的支撑筒体；
所述支撑筒体内设有布控腔室；
所述第二排水孔连通所述布控腔室；
所述布控腔室内设有连接所述第二排水孔的支排水管；
所述支排水管远离所述第二排水孔的一端延伸出所述支撑筒体。
在一个更具体的实施例中，还包括用于盛放工件的花篮架；
所述机器人模块末端连接有用于抓取所述花篮架的花篮夹爪机构。
在一个更具体的实施例中，所述花篮夹爪机构包括夹持驱动组件以及两个夹爪件；
所述夹持驱动组件与两个所述夹爪件连接，用于驱动两个所述夹爪件张开闭合，以对所述花篮架进行抓夹；
所述夹持驱动组件外套装有防爆防腐的保护罩。
在一个更具体的实施例中，所述花篮架包括两个固定板；
两个所述固定板平行间隔设置，且之间通过多个连接杆固定连接；
各个所述连接杆以及两个固定板之间围成盛放工件的盛放腔；
两个所述固定板之间顶部位置固定连接有提手块；
所述提手块上的两侧面上均设有导向卡槽；
两个所述夹爪件的夹持面上设有卡入所述导向卡槽的定位凸起；
所述夹爪件的底部均设有可与所述提手块底部接触相抵的限位凸缘。
在一个更具体的实施例中，所述花篮架包括底板以及两个固定板；
两个所述固定板平行间隔设置在所述固定板顶部；
两个所述固定板之间顶部位置固定连接有提手块；
所述提手块的两侧面上均设有导向卡槽；
两个所述夹爪件的夹持面上设有卡入所述导向卡槽的定位凸起；
所述夹爪件的底部均设有可与所述提手块底部接触相抵的限位凸缘；
所述底板上于两个所述固定板之间固定有多个限位杆；
相邻所述限位杆与底板之间围成盛放工件的盛放腔。
在一个更具体的实施例中，两个所述固定板相向的一侧面上均固定有定位块；
两个所述定位块之间活动插装有用于压抵工件的压块。
在一个更具体的实施例中，所述供液机构包括用于形成供液模块的送液装置以及排液装置；
所述送液装置包括泵液管以及药液泵；
所述泵液管一端连接至所述药液槽，另一端连接至小容量药液罐；
所述药液泵安装于所述泵液管上，用于将所述小容量药液罐中的药液按照预设供液策略泵入所述药液槽；
所述排液装置包括排液管以及排液阀；
所述排液管连接至所述药液槽；
所述排液阀与所述排液管连接，用于按照预设供液策略控制所述排液管的流量；
所述药液槽中配置有用于检测药液液位的液位传感器。
在一个更具体的实施例中，所述药液槽设有药液室以及用于形成溢流模块的溢流室；
所述药液室用于容置所述供液机构供给的药液，并供所述工件置入；
所述溢流室用于接收所述药液室溢出的药液；
所述泵液管以及所述排液管连接所述药液室。
在一个更具体的实施例中，所述药液槽包括内槽体；
所述内槽体顶部开口形成浸入口；
所述内槽体内部空间形成所述药液室；
所述内槽体外周面上环设有连接凸缘；
所述连接凸缘顶面边缘连接有侧围；
所述侧围与所述连接凸缘顶面以及所述内槽体外周面之间围成所述溢流室。
在一个更具体的实施例中，所述供液机构还包括用于形成加热模块的加热装置；
所述加热装置用于按照预设供液策略对所述药液室中的药液进行加热。
在一个更具体的实施例中，所述药液槽还包括外槽体；
所述内槽体底部伸入所述外槽体中，且所述连接凸缘与所述外槽体连接，以使得所述连接凸缘、所述外槽体以及所述内槽体之间围成加热腔室；
所述外槽体上设有连通所述加热腔室的介质输入管以及介质输出管；
所述加热装置安装于所述加热腔室中，用于对所述加热腔室中的导热加热进行加热。
在一个更具体的实施例中，所述供液机构还包括用于形成循环过滤模块的循环装置或用于形成喷淋模块的循环喷淋装置；
所述循环装置用于按照预设供液策略将所述药液室中的药液抽出，并在经过过滤后回送至所述药液室中；
所述循环喷淋装置用于按预设供液策略将所述药液室中的药液抽出，并在经过过滤后以喷淋方式回送至所述药液室中。
在一个更具体的实施例中，所述刻蚀系统还包括用于形成清洗模块的清洗装置；
所述清洗装置用于对所述药液室中的所述工件进行清洗。
在一个更具体的实施例中，所述供液机构还包括用于形成鼓泡模块的鼓泡装置；
所述鼓泡装置用于按照预设供液策略对所述药液室中的药液进行鼓泡。
在一个更具体的实施例中，所述刻蚀系统还包括刻蚀开关盖装置；
所述刻蚀开关盖装置用于控制所述药液室的浸入口的开启与闭合。
在一个更具体的实施例中，所述送料系统包括输送装置、第一送料开关盖装置；
所述输送装置用于将所述工件从所述机台本体外的备料位置输送至所述小型化机室中的上料位置；
所述机台本体上设有连通所述小型化机室且供输送的工件通过的上料口；
所述第一送料开关盖装置用于控制所述上料口的开启与闭合。
在一个更具体的实施例中，所述送料系统还包括第二送料开关盖装置；
所述输送装置安装于所述下腔室，包括第一送料机构以及第二送料机构；
所述支撑隔板上设有供所述工件进入所述上腔室的第二避让口；
所述第一送料机构用于将所述工件从所述备料位置输送至所述下腔室中的中转位置；
所述第二送料机构用于将所述工件从所述中转位置输送至所述上腔室中的上料位置；
所述第二送料开关盖装置用于控制所述第二避让口的开启与闭合。
从上述技术方案可以看出，本申请所设计的科研型湿法刻蚀全自动化系统的实施方式中具有如下有益效果：
1、利用自动化设计的供液机构按照预设供液策略给药液槽供液并控制刻蚀环境，再利用自动化设计的机器人模块搭配视觉模块灵活模拟人手操作以按照预设刻蚀策略完成刻蚀，从而实现工艺可灵活变化，满足灵活多变的科研场景。
2、实现整体全自动化控制，完全替代人工操作，精准控制工艺参数，保障工艺稳定性，极大提高科研效率，而且，无需人工取用工具和耗材，无需人工接触危险化学品，有效保障人员健康和安全。
3、将药液模块与机器人模块集成配置于小型化机室的作业空间中，且机器人模块采用顶部装配方式，而多个药液模块采用弧线排布方式，整体优化了排布结构，实现了小型化设计，减少科研场所的洁净室空间占用，降低安装维护成本。
4、将能够独立供液并控制刻蚀环境的刻蚀系统集成于机台系统，相比于企业级集中供液设计，有效实现尺寸缩减，实现小型化设计，兼容小尺寸工件实验，进而降低药液消耗量，减少昂贵化学品的用量，极大节约科研成本，并且功能更加丰富。
5、该科研型湿法刻蚀全自动化系统的设计填补了现有技术在科研领域中针对于科研湿法设备/工艺研究的空白，极大提升了科研效率以及工艺稳定性，对半导体科研的发展产生积极且深远的影响，为科研领域作出了重大的技术贡献，也为推动经济发展提供了巨大的助力。
从以上技术方案可以看出，本申请所设计的科研型湿法刻蚀全自动化机台的实施方式中具有如下有益效果：
1、利用自动化设计的供液机构按照预设供液策略给药液槽供液并控制刻蚀环境，再利用自动化设计的机器人模块灵活模拟人手操作以按照预设刻蚀策略完成刻蚀，从而实现工艺可灵活变化，满足灵活多变的科研场景。
2、通过机器人模块搭配可自动输送物料的送料系统以及可自动提供药液的刻蚀系统，实现整体自动化控制，完全替代人工操作，精准控制工艺参数，保障工艺稳定性，极大提高科研效率，而且，无需人工取用工具和耗材，无需人工接触危险化学品，有效保障人员健康和安全。
3、将各个系统模块集成至机台本体，优化整体结构，缩小设备尺寸，实现小型化设计，减少科研场所的洁净室空间占用，降低安装维护成本。
4、设计能够独立供液并控制刻蚀环境的刻蚀系统并集成于机台本体，相比于企业级集中供液设计，有效实现尺寸缩减，实现小型化设计，兼容小尺寸工件实验，进而降低药液消耗量，减少昂贵化学品的用量，极大节约科研成本，并且使机台功能更加丰富。
5、该科研型湿法刻蚀全自动化机台的设计填补了现有技术在科研领域中针对于科研湿法设备/工艺研究的空白，极大提升了科研效率以及工艺稳定性，对半导体科研的发展产生积极且深远的影响，为科研领域作出了重大的技术贡献，也为推动经济发展提供了巨大的助力。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其它的附图。
图1为本申请中提供的一种科研型湿法刻蚀全自动化机台的立体图；
图2为本申请中提供的一种科研型湿法刻蚀全自动化机台的剖视图；
图3为本申请中提供的一种科研型湿法刻蚀全自动化机台的第一局部示意图；
图4为本申请中提供的一种科研型湿法刻蚀全自动化机台的第二局部示意图；
图5为本申请中提供的一种科研型湿法刻蚀全自动化机台的第一局部剖视图；
图6为本申请中提供的一种科研型湿法刻蚀全自动化机台的夹爪机构与花篮架的配合立体图；
图7为本申请中提供的一种科研型湿法刻蚀全自动化机台的夹爪机构与花篮架的配合爆炸示意图；
图8为本申请中提供的一种科研型湿法刻蚀全自动化机台的带有加热装置设计的药液槽的立体图；
图9为本申请中提供的一种科研型湿法刻蚀全自动化机台的带有加热装置设计的药液槽的剖视图；
图10为本申请中提供的一种科研型湿法刻蚀全自动化机台的带有加热装置设计的药液槽不带有槽盖的立体图；
图11为本申请中提供的一种科研型湿法刻蚀全自动化机台的不带有加热装置设计的药液槽不带有槽盖的立体图；
图12为本申请中提供的一种科研型湿法刻蚀全自动化机台的不带有加热装置设计的药液槽的剖视图；
图13为本申请中提供的一种科研型湿法刻蚀全自动化机台带有输送装置的局部结构示意图；
图14为本申请中提供的一种科研型湿法刻蚀全自动化机台的输送装置的结构示意图；
图15为本申请提供的一种科研型湿法刻蚀全自动化系统的系统框图；
图中：
1、控制系统；
2、机器人系统；21、机器人模块；22、视觉模块；
3、刻蚀系统；31、药液模块；32、供液机构；33、供液模块；34、刻蚀环境模块
4、送料系统；5、人机交互系统；6、计时系统；7、监控系统；8、机台系统；9、清洁系
统；
100、机台本体；101、支撑隔板；102、第一避让口；103、第一排水孔；104、聚水部；
105、第二排水孔；106、风机过滤机组；107、防爆照明装置；108、喷淋移动装置；109、喷淋组件；110、支撑筒体；111、电控悬臂；112、风压表；113、温度表；114、原液室；115、电控室；116、载料台；117、观察视窗；
201、夹持驱动组件；202、夹爪件；203、保护罩；204、夹爪机构；205、花篮架；206、
固定板；207、连接杆；208、压块；209、定位块；210、提手块；211、导向卡槽；212、定位凸起；213、限位凸缘；214、插槽；
301、药液槽；302、内槽体；303、连接凸缘；304、侧围；305、药液室；306、溢流室；
307、溢流回收口；308、进液口；309、排液口；310、排液阀；311、加热腔室；312、加热装置；313、刻蚀端盖；314、开关驱动器；315、清洗装置；
401、第一送料开关盖装置；402、输送装置；403、板驱动器；404、挡板；405、第一送
料机构；406、第二送料机构；407、第一托件；408、避让槽口；409、第二托件；
500、工件；
600、小容量药液罐。
具体实施方式
下面将结合附图对本申请实施例的技术方案进行清楚、完整地描述，显然，所描述的实施例是本申请实施例一部分实施例，而不是全部的实施例。基于本申请实施例中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本申请实施例保护的范围。
在本申请实施例的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请实施例和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请实施例的限制。此外，术语“第一”、“第二”、“第三”仅用于描述目的，而不能理解为指示或暗示相对重要性。
在本申请实施例的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可更换连接，或一体地连接，可以是机械连接，也可以是电连接，可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本申请实施例中的具体含义。
本申请人经过研究发现：
企业级的全自动湿法台存在以下不足：
1、不能适应灵活多变的科研场景，操作逻辑较为固定，只能完成预定的简单重复作业任务。
2、为针对批量生产型花篮(4/6/8/12寸，25片)设计，不能兼容小尺寸晶圆。
3、药液用量大，造成浪费、存在更换不便和存储安全等问题。科研中，化学药液使用量较少(约几十至几百毫升)，价格昂贵(几百～几万元/升)，存储条件严格。企业级全自动湿法台为企业批量生产设计(如太阳能电池厂等)，药液消耗量大。采用集中供液方式，储液罐存储量大(20L-1000L)，槽体容量大(20-50L)，需要定期更换(工厂通常1天-2周)，耗费人力物力。尽管可以通过降低更换药液频率，来适当节省药液量，但是长期不更换也会导致洁净度下降、试剂挥发、储存不安全等问题。尤其高温药液一般采用即混即用的方式。另外，CDS供液需要经过长长的管路，管路会有药液残留，长期不清理，会影响供液质量。即使从缓存槽泵入清洗槽也存在一定的温度损失、浓度损失等等。科研中，通常使用小容量药液桶(几百毫升至几升)，人员取用方便，不用定期更换。全自动湿法台药液用量大，需要专业人员(具有相关资质)定期更换。高校实验室通常不会配备相关人员，而市面上的湿法台厂商一般也不提供更换药液的服务。
手动科研操作方式存在以下不足：
1、需要小型设备辅助，操作不便利。通常需要用水浴锅、超声波清洗机等，进行加热或振荡。手动操作多，浪费科研人员精力。
2、工艺控制不精准，科研效率低。温度、液体浓度、转速等，通过简易装置控制，不够精准，造成重复率低，影响科研效率。
为了较好解决上述问题，本申请实施例公开了一种科研型湿法刻蚀全自动化系统，如图15所示：
包括机台系统8、刻蚀系统3、送料系统4、机器人系统2以及控制系统1。
所述机台系统8用于提供包括安装空间及作业空间的小型化机室，需说明的是，“小型化机室”为一特定名词，并非限定机室有多小。
所述刻蚀系统3包括以弧线排布方式配置于所述小型化机室中的多个药液模块31；所述药液模块31包括药液槽301以及供液机构32；所述供液机构32用于按照预设供液策略给所述药液槽301供液并控制所述药液槽301中的刻蚀环境。
针对药液模块31来说，其将常规的单排并列式排布方式改进为弧线排布方式，更优选地采用圆周排布方式，能够节约空间，也使得机器人模块21的运行轨迹更加灵活。
所述送料系统4用于实现工件自动化运送。
所述机器人系统2包括机器人模块21以及与所述机器人模块21通信连接的视觉模块22；所述机器人模块21配置于所述作业空间顶部，用于根据所述视觉模块22反馈的图像信息抓取工件并按预设刻蚀策略将所述工件置入所述药液槽301中完成刻蚀。
所述控制系统1与所述机台系统8、送料系统4、机器人系统2和刻蚀系统3通信连接，用于根据用户指令实现自动化刻蚀作业。
本申请所设计的科研型湿法刻蚀全自动化系统的实施方式中具有如下有益效果：
1、利用自动化设计的供液机构32按照预设供液策略给药液槽301供液并控制刻蚀环境，再利用自动化设计的机器人模块21搭配视觉模块22灵活模拟人手操作以按照预设刻蚀策略完成刻蚀，从而实现工艺可灵活变化，满足灵活多变的科研场景。
2、实现整体全自动化控制，完全替代人工操作，精准控制工艺参数，保障工艺稳定性，极大提高科研效率，而且，无需人工取用工具和耗材，无需人工接触危险化学品，有效保障人员健康和安全。
3、将药液模块31与机器人模块21集成配置于小型化机室的作业空间中，且机器人模块21采用顶部装配方式，而多个药液模块31采用弧线排布方式，整体优化了排布结构，实现了小型化设计，减少科研场所的洁净室空间占用，降低安装维护成本。(洁净室中为了维持百级洁净度和设备环境要求，需要采用许多手段(循环风、温控、防微震、超纯水等等)，运营维护成本高，因此，节约洁净室空间占用，能够很好降低安装与维护成本)。
4、将能够独立供液并控制刻蚀环境的刻蚀系统3集成于机台系统8，相比于企业级集中供液设计，有效实现尺寸缩减，实现小型化设计，兼容小尺寸工件实验(例如1cm-2cm小片工件)，进而降低药液消耗量，减少昂贵化学品的用量，极大节约科研成本，并且功能更加丰富。
5、该科研型湿法刻蚀全自动化系统的设计填补了现有技术在科研领域中针对于科研湿法设备/工艺研究的空白，极大提升了科研效率以及工艺稳定性，对半导体科研的发展产生积极且深远的影响，为科研领域作出了重大的技术贡献，也为推动经济发展提供了巨大的助力。
在一个更具体的实施例中，所述机器人模块21还用于根据所述视觉模块22反馈的图像信息抓取清洁工具执行清洁动作。可以理解的是：
机器人模块21被设计为能够执行清洁动作，具体地，视觉模块22获取机室内部的图像，并识别图像中的脏污位置；机器人模块21抓取清洁工具，并对脏污位置进行清洁。通过给机器人模块21增加视觉识别功能，实现机器人模块21对工作区域进行针对性地清洁操作。机器人模块21结合视觉模块22不仅可以实现清洁工作，还可以配合6s管理，进行工作台面的整理等延伸功能，提高工作效率。
若机器人模块21不配置清洁功能，则可以增加设置一个专用的清洁系统9，用于执行清洁动作，清洁系统9可以包括吹扫清洁装置以及喷淋清洁装置中的至少一种。
在一个更具体的实施例中，所述机器人模块21被设计为能够执行抓取工件取样)、将工件置入药液槽301中(放样)和带动工件移动(传送)动作外，还能够执行伸缩动作、旋转动作以及抖动动作中的至少一种。可以理解的是：
1、机器人模块21具有伸缩功能，也即配置有伸缩机构或模块，能够执行伸缩动作，从而可以根据需要调节整体伸缩长度，进而使得机器人模块21覆盖范围更广，以适应不同工作场景和操作需求。
2、机器人模块21具有抖动功能，也即配置有抖动机构或模块，能够执行抖动动作，使得机器人模块21可以模拟人手抖动的动作，以实现对工件或材料的晃动、振动等刻蚀策略操作，从而达到特定的工艺要求。具体地，机器人模块21可在指定时间内，以设定的频率和幅度抖动药液槽301或工件，以促进混合或反应。
3、机器人模块21具有旋转功能，也即配置有旋转机构或模块，能够执行旋转动作，实现带动工件在药液槽301中旋转的刻蚀策略操作，以完成特定的工艺步骤或任务。具体地，机器人模块21可在指定时间内，以设定的速度和方向旋转药液槽301或工件，以实现搅拌和混合。
在一个更具体的实施例中，还包括计时系统6；所述计时系统6用于获取所述机台系统8、所述送料系统4、所述机器人系统2的运行时间信息并反馈所述控制系统1，以使得所述控制系统1能够按照预设时间策略对所述机台系统8、送料系统4、机器人系统2和刻蚀系统3进行控制。例如，通过计时系统6使得机器人模块21/供液机构32等可以按照预设的时间间隔进行动作操作，例如定时加入药液或定时取样等，以实现对工艺参数和时间的稳定控制。
在一个更具体的实施例中，还包括人机交互系统5以及监控系统7；
所述人机交互系统5与所述控制系统1通讯连接，实现操作人员与各个系统模块进行人机交互；例如方便操作人员给各个系统模块发出各类执行指令，以控制各个系统模块的执行动作、功能等，或获取各个系统模块的各项运行数据。
所述监控系统7用于分别获取所述机台系统8、所述机器人系统2、所述刻蚀系统3以及所述送料系统4的运行数据，并在所述运行数据超出阈值时发出警报；所述监控系统7还用于根据预设监控策略对机台系统8、所述机器人系统2、所述刻蚀系统3以及所述送料系统4进行实时监控。
在一个更具体的实施例中，所述供液机构32包括供液模块33以及刻蚀环境模块34。
所述供液模块33用于将小容量药液罐600中的药液供给所述药液槽301，具有供液功能、配液功能及液位控制功能。需说明的是，“小容量药液罐”为一特定名词，并非限定药罐有多小。当然，本申请通过整体结构优化，实现的小型化设计，其连接的小容量药液罐600尺寸自然也是小型的，选用小容量小体积的药液罐，进一步节省药液量。
所述刻蚀环境模块34包括加热模块、鼓泡模块、超声振动模块、清洗模块、喷淋模块以及循环过滤模块中的至少一种；可以理解的是：
该药液槽301在刻蚀环境模块34的控制下，具备加热功能、鼓泡功能、超声波振动功能、清洗功能、喷淋功能以及循环过滤功能等。基于这些功能实现的刻蚀环境控制，例如可以是营造循环过滤喷淋的同时进行预设温度的加热，或循环过滤的同时进行鼓泡，或鼓泡的同时进行超声振动，或进液喷淋的同时鼓泡等刻蚀环境，这一策略执行可以是供液机构32在人机交互系统5、计时系统6等的配合下实现。
所述药液槽301设有溢流回收模块，以具备溢流功能。
上述所设计的科研型湿法刻蚀全自动化系统，具有智能化与小型化优点，能够灵活应用于各类科研场景中，提升了科研效率、节约了科研资源，也保障了人员和设备安全，还具有非常好的商业价值和经济效益。
本申请实施例还公开了一种科研型湿法刻蚀全自动化机台，为基于上述设计的科研型湿法刻蚀全自动化系统所构建。
请参阅图1、图2以及图15，本申请实施例中提供的一种科研型湿法刻蚀全自动化机台的一个实施例包括：
包括机台本体100以及科研型湿法刻蚀全自动化系统。
科研型湿法刻蚀全自动化系统配置于机台本体上，包括机台系统8、刻蚀系统3、送料系统4、机器人系统2以及控制系统1。
机台系统8用于提供包括安装空间及作业空间的小型化机室。
刻蚀系统3包括以弧线排布方式配置于小型化机室中的多个药液模块31；药液模块31包括药液槽301以及供液机构32；供液机构32用于按照预设供液策略给药液槽301供液并控制药液槽301中的刻蚀环境。
送料系统4用于将工件500输送至作业空间中，并在完成输送后封闭作业空间。
机器人系统2包括机器人模块21以及与机器人模块21通信连接的视觉模块22；机器人模块21配置于作业空间顶部，用于根据视觉模块22反馈的图像信息抓取工件并按预设刻蚀策略将工件置入药液槽301中完成刻蚀。
控制系统1与机台系统8、送料系统4、机器人系统2和刻蚀系统3通信连接，用于根据用户指令实现自动化刻蚀作业。
本实施例中设计的科研型湿法刻蚀全自动化机台或者机台与其中模块的结合，具备以下全部或部分有益效果：
1、利用自动化设计的供液机构32按照预设供液策略在药液槽中实现刻蚀环境的营造，再利用自动化设计的机器人模块21灵活模拟人手操作以按照预设刻蚀策略完成刻蚀，从而实现工艺可灵活变化，满足灵活多变的科研场景。
2、通过机器人模块21搭配可自动输送物料的送料系统4以及可自动提供药液的刻蚀系统3，能够实现整体自动化控制，完全替代人工操作，精准控制工艺参数，保障工艺稳定性，极大提高科研效率，而且，无需人工取用工具和耗材，无需人工接触危险化学品，有效保障人员健康和安全。
3、再者，根据科研常用工艺，将各个系统模块集成至机台本体100，优化整体结构，缩小设备尺寸，实现小型化设计，避免占用科研所宝贵的洁净室空间，同时也方便灵活调整摆放位置，避免人员使用冲突，为了实现灵活移动，机台本体100底部配置有滑轮装置及固定装置并加防腐座，可高低调整及锁定，可与地面固定锁紧，避免因机器人模块21工作产生的晃动及抖动。多机台本体100使用时，可以分不同机台本体100进行不同的工艺，每个机台本体100预留一个可拆换的刻蚀系统3，以提升使用灵活性。
4、设计能够独立供液并控制刻蚀环境的刻蚀系统3并集成于机台本体100，相比于企业级集中供液设计，有效实现尺寸缩减，实现小型化设计，兼容小尺寸工件实验，进而降低药液消耗量，减少昂贵化学品的用量，极大节约科研成本，并且使机台本体100功能更加丰富。
5、该科研型湿法刻蚀全自动化机台的设计填补了现有技术在科研领域中针对于科研湿法设备/工艺研究的空白，极大提升了科研效率以及工艺稳定性，对半导体科研的发展产生积极且深远的影响，为科研领域作出了重大的技术贡献，也为推动经济发展提供了巨大的助力。
以上为本申请实施例提供的一种科研型湿法刻蚀全自动化机台的实施例一，以下为本申请实施例提供的一种科研型湿法刻蚀全自动化机台的实施例二，具体请参阅图1至图15。
基于上述科研型湿法刻蚀全自动化机台实施例一的方案：
在一个更具体的实施例中，所述机器人模块21被设计为能够执行抓取工件取样)、将工件置入药液槽301中放样)和带动工件移动传送)动作外，还能够执行伸缩动作、旋转动作以及抖动动作中的至少一种。可以理解的是：
1、机器人模块21具有伸缩功能，也即配置有伸缩机构或模块，能够执行伸缩动作，从而可以根据需要调节整体伸缩长度，进而使得机器人模块21覆盖范围更广，以适应不同工作场景和操作需求。
2、机器人模块21具有抖动功能，也即配置有抖动机构或模块，能够执行抖动动作，使得机器人模块21可以模拟人手抖动的动作，以实现对工件或材料的晃动、振动等刻蚀策略操作，从而达到特定的工艺要求。具体地，机器人模块21可在指定时间内，以设定的频率和幅度抖动药液槽301或工件，以促进混合或反应。
3、机器人模块21具有旋转功能，也即配置有旋转机构或模块，能够执行旋转动作，实现带动工件在药液槽301中旋转的刻蚀策略操作，以完成特定的工艺步骤或任务。具体地，机器人模块21可在指定时间内，以设定的速度和方向旋转药液槽301或工件，以实现搅拌和混合。
由于机器人模块21所在操作环境涉及酸碱有机等易燃易爆危险品，为此，机器人模块21的防爆防腐设计应当足够好，以安全防爆设计加强设计来说，可以在机器人模块21结构和电气系统中采用防爆材料和防爆装置，确保在易燃易爆环境不会引发火灾或爆炸事故。以防腐蚀性能加强设计来说，在机器人模块21的外壳和关键部件上采用耐腐蚀材料或进行特殊涂层处理，以防止酸碱等腐蚀性物质对机器人模块21造成损害。
本申请该机器人模块21设计具有抓取工件500(取样)、将工件500置入药液槽301中(放样)和带动工件500移动(传送)功能，其中取样和放样设计有两种方式：
第一种方式：通过提取盛放有工件500的花篮架205以进行取样。花篮架205根据要实验的工件500尺寸进行适应性设计，以满足对小尺寸工件500的盛放。
第二种方式：直接从工装上抓取工件500以进行取样。该方式具有以下特点，采用两侧式夹取方式，确保不影响工件500表面，并能够稳固、灵活地夹取1cm-2cm方形片。2、控制力度的精度为0.01N，以确保不易碎片。3、实现取放和传送样品的功能。
这两种取样方式均可以满足不同场景下的取样需求，特别对于小尺寸晶圆等工件500的处理能力也进一步得到了提升。
机器人模块21为通过控制系统1实现自动控制，实现对放样的定位精度和传送速度进行控制，有效解决涂胶均匀度、温度变化、腐蚀时间控制等工艺问题，提高工艺稳定性。
机器人模块21还可以设计具有清洁功能，实现对机台本体100内部的工作区域进行清洁：
清洁控制方式一：机器人模块21抓取清洁工具并根据预设清洁轨迹对上腔室进行清洁，具体地，其能够抓取带有无尘纸/布的清洁工具模拟人手擦拭动作以进行清洁，该机器人模块21可以是配置有吸取清洁工具的能力。
清洁控制方式二：利用视觉模块22，视觉模块22获取机室内部的图像，并识别图像中的脏污位置；机器人模块21抓取清洁工具，并对脏污位置进行清洁。通过给机器人模块21增加视觉识别功能，实现机器人模块21对工作区域进行针对性地清洁操作。机器人模块21结合视觉模块22不仅可以实现清洁工作，还可以配合6s管理，进行工作台面的整理等延伸功能，提高工作效率。
视觉模块的设置，也使得机器人模块21与送料系统4以及刻蚀系统3之间的互联更加准确，实现操作高度智能化，以提升生产效率和精度。
清洁控制方式一二中的机器人模块21也可以是独立增加的专用于清洁的机器人模块，实现双机器人模块设计。
在一个更具体的实施例中，还包括计时系统6，计时系统6用于获取机器人模块21的运行时间，并根据预设运行时间策略控制机器人模块21运行。可以理解的是，通过计时系统6使得机器人模块21/供液机构等可以按照预设的时间间隔进行操作，例如定时加入药液或定时取样等，以实现对工艺参数和时间的稳定控制。
在一个更具体的实施例中，若机器人模块21不配置清洁功能，则可以增加设置一个专用的清洁系统9，清洁系统9设置于机台本体100上，用于对机室内部进行清洁，清洁系统9包括吹扫清洁装置以及喷淋清洁装置中的至少一种，具体实现例如氮气吹扫清洁、喷淋式清洁等。
在一个更具体的实施例中，还包括人机交互系统5以及监控系统7；
所述人机交互系统5与所述控制系统1通讯连接，实现操作人员与各个系统模块进行人机交互；例如方便操作人员给各个系统模块发出各类执行指令，以控制各个系统模块的执行动作、功能等，或获取各个系统模块的各项运行数据。
如图1所示，本申请的人机交互系统5包括固定在机台本体100上的电控悬臂111，和/或远程控制终端等。
所述监控系统7用于分别获取所述机台系统8、所述机器人系统2、所述刻蚀系统3以及所述送料系统4的运行数据，并在所述运行数据超出阈值时发出警报；所述监控系统7还用于根据预设监控策略对机台系统8、所述机器人系统2、所述刻蚀系统3以及所述送料系统4进行实时监控。
监控系统7由各类传感器等组成，例如用于检测药液槽301药液温度的温度传感器、用于检测药液槽301药液量的液位传感器、用于检测机室内的工作区域气压的气压传感器等，如图1所示，机台本体100正面可以配置风压表112以及温度表113。
在一个更具体的实施例中，所述供液机构32包括供液模块33以及刻蚀环境模块34。
所述供液模块33用于将小容量药液罐600中的药液供给所述药液槽301，具有供液功能、配液功能及液位控制功能。需说明的是，“小容量药液罐”为一特定名词，并非限定药罐有多小。当然，本申请通过整体结构优化，实现的小型化设计，其连接的小容量药液罐600尺寸自然也是小型的，选用小容量小体积小的药液罐，进一步节省药液量。
所述刻蚀环境模块34包括加热模块、鼓泡模块、超声振动模块、清洗模块、喷淋模块以及循环过滤模块中的至少一种；可以理解的是：
该药液槽301在刻蚀环境模块34的控制下，具备加热功能、鼓泡功能、超声波振动功能、清洗功能、喷淋功能以及循环过滤功能等。基于这些功能实现的刻蚀环境控制，例如可以是营造循环过滤喷淋的同时进行预设温度的加热，或循环过滤的同时进行鼓泡，或鼓泡的同时进行超声振动，或进液喷淋的同时鼓泡等刻蚀环境，这一策略执行可以是供液机构32在人机交互系统5、计时系统6等的配合下实现。
所述药液槽301设有溢流回收模块，以具备溢流功能。
基于上述方案本申请的自动化科研场景可以实现：
1、机器人模块21在通过视觉模块22识别到工件500的尺寸和位置后，移动至对应位置并对工件500进行抓取，再将工件500进入对应的药液槽301中。
2、工件500浸于药液槽301中时，机器人模块21在计时系统6的控制下可以在预设间隔时间抖动或旋转位于药液槽301中的工件500，并通过视觉模块22或其他传感器模块的反馈来检测碎片情况。
本申请能够将机器人模块21与机台本体100上自动化功能模块进行互联，实现人机互联和高度智能化，具体可以实现下述功能：
1、人机互联：机器人模块21与人员进行实时数据交互和指令传递。人员可以通过电脑或移动设备组成的监控系统7来监控机器人模块21、机台本体100的运行状态，实时查看实验数据和结果。机器人模块21可以通过语音或触摸屏界面等组成的人机交互系统5来与人员进行对话或操作。
2、自动化操作：机器人模块21可以负责各项操作，如取样、加液、搅拌、加热等。通过配备传感器和视觉模块22，机器人模块21可以对实验环境和工件500状态进行监测和识别，从而自动调整和决策。
3、智能决策：机器人模块21可以基于预设的流程和算法，自动分析实验数据并做出相应决策。例如，可以根据实时的温度和药液浓度等参数，自动调整反应条件和加药量，以实现最佳的反应效果。
4、自动故障诊断与维护：机器人模块21可以通过监控系统7监测整个湿法台的运行状态，及时发现并报告潜在故障。在故障发生时，机器人模块21可以自动停止操作，并提供故障原因的初步分析和建议的维修方法。
在一个更具体的实施例中，如图2所示，机器人模块21为多轴协作机器人，具体可以是六轴协作机器人。传统模组机器人或工业机器人，尽管负载能力强、作业范围大，但是与协作机器人相比，在动作、运行轨迹、操作逻辑和功能方面，不够灵活和智能化，不能适应灵活多变的科研场景。工业机器人模块通常预先编程好运动轨迹，动作和操作逻辑较为固定，只能完成预定的简单重复任务。而协作机器人通过人机交互的方式，通过传感器实时感知周围环境，根据任务变化和实际情况，自主决策和调整运动轨迹和动作，具有更高的灵活性和适应性，能够实现更加复杂的任务，为此，本申请机器人模块21设计为协作机器人。
针对预设刻蚀策略来说，其具体可以总结为一种对工件500在营造的刻蚀环境中的时间/状态变化策略，例如：
1、浸置时间策略，可以是一定的时间范围内进行连续浸置，或以一定时间间隔进行浸置，这一策略执行可以是机器人模块21在伸缩机构以及计时系统6等的配合下实现。
2、静置状态策略，可以是一定的时间范围内进行特定状态变化，例如静置过程中每隔一段时间对工件500进行设定频率的抖动或设定速度的转动，这一策略执行可以是机器人模块21在计时系统6、抖动机构以及旋转机构等的配合下实现。
当然，不局限于上述的控制策略，本领域技术人员可以根据实际工艺需要进行变化控制策略，不做限制。
在一个更具体的实施例中，如图3以及图4所示，小型化机室内设有支撑隔板101，支撑隔板101将小型化机室隔成上腔室以及下腔室。
机器人模块21安装于上腔室顶部，该设计美观且节约空间。
在一个更具体的实施例中，药液槽301为多个，且圆周布置于下腔室中，将常规的单排并列式排布方式改进为圆周排布方式，能够节约空间，也使得机器人模块21的运行轨迹更加灵活。
支撑隔板101上设有一一对应连通各个药液槽301的第一避让口102。
本申请该设计布局下，相比于企业级湿法台设计能够缩减一定数量药液槽301，实现设备尺寸减小，方便用户使用，同时提高设备利用率。设备尺寸减小的设计基础上，也即能够实现药液槽301容量的减小，相比于企业级湿法台设计来说，能够极大地节省药液的使用量。
在一个更具体的实施例中，针对机台本体100布局设计来说，还可以在机台本体100内于小型化机室下方的空间设有电控室115以及用于存放如图2所示的小容量药液罐600的原液室114，机器人模块21的控制器、输送装置402的控制器、刻蚀系统3的控制器均集中安装在电控室115，所有可能与药液雾气接触的电器及线路均进行PFA防腐隔绝处理。
在一个更具体的实施例中，如图3所示，机台系统8还包括风机过滤机组106/FFU，风机过滤机组106上配置有高效过滤装置。
以机器人模块21布置在上腔室顶部为例，为了避让机器人模块21的安装，腾出更多空间，风机过滤机组106可以拆分设计为两台，并呈间隔设置。
机台本体100上设有连通上腔室的排风口以及送风口，风机过滤机组106安装于机台本体100上，且与送风口连接，利用风机过滤机组106来确保机器人模块21操作区域的控制质量符合洁净度百级要求。
在一个更具体的实施例中，在上腔室前部左右两侧还分别设置有氮气枪和纯水枪，水枪滴漏活水设计，方便清洗脆弱工件500。
在一个更具体的实施例中，还设计有自动灭火系统：该自动灭火系统具备烟感、温感、明火感应等感应器，自动灭火系统被设计为具备断电下工作的能力。
在一个更具体的实施例中，如图1所示，机台系统8还包括防爆照明装置107，防爆照明装置107安装于机台本体100上，用于给上腔室进行照明。
机台本体100上设有用于观察上腔室的观察视窗117，以方便对机器人模块21操作情况进行观察。同时机台本体100上设置有自动上下安全门，且自动上下安全门配置有误操作报警装置，以保障人员安全。
在一个更具体的实施例中，以设计有喷淋清洁装置为例，如图4所示，具体包括喷淋组件109以及喷淋移动装置108；喷淋移动装置108安装于上腔室中，且与喷淋组件109连接，用于带动喷淋组件109移动。喷淋移动装置108可以为两套，具体为线性位移模组，对称设置在支撑隔板101的两侧边缘位置，各自的驱动端再分别与喷淋组件109连接，带动喷淋组件109在支撑隔板101上方往复运动。该喷淋组件109为喷淋管，其上阵列有多个喷嘴，通过喷淋洒水的方式对支撑隔板101上的工作台面进行清洗。
为了方便排水，支撑隔板101上开设有多个第一排水孔103，下腔室设有连通机台本体100外的主排水管，经第一排水孔103排入下腔室的脏污水再通过主排水管排出机台本体100。
在一个更具体的实施例中，如图4所示，为了避免支撑隔板101上面积水，在支撑隔板101中部设有聚水部104，用于将积水进行汇聚，再通过聚水部104上设有的第二排水孔105排出。支撑隔板101整体可以设计成从四周向中心具有一定倾斜坡度，或整体向一个位置进行一定坡度设计，以实现更好地汇聚排水效果，具体不做限制。
在一个更具体的实施例中，如图5所示，为了避免经第一排水孔103漏下的水对一些电控器件、控制元件或线路管路等造成影响，在下腔室中部设有连接支撑隔板101的支撑筒体110，支撑筒体110内设有独立的布控腔室，而且，该设计的支撑筒体110也能够对支撑隔板101起到支撑加固作用。
本申请中，第二排水孔105为连通布控腔室的设计，为避免经第二排水孔105漏下的水影响到布控腔室内部的部件，在布控腔室内设有连接第二排水孔105的支排水管，支排水管远离第二排水孔105的一端延伸出支撑筒体110，具体可以直接延伸出机台本体100外。
在一个更具体的实施例中，如图6所示，为了实现对工件500的抓取，机器人模块21末端连接有用于抓取花篮架205的花篮夹爪机构204，为此，还包括用于盛放工件500的花篮架205，利用花篮夹爪机构204对花篮架205进行抓取/释放。
针对花篮夹爪机构204设计来说，具体包括夹持驱动组件201以及两个夹爪件202，夹持驱动组件201与两个夹爪件202连接，用于驱动两个夹爪件202张开闭合，以对花篮架205进行抓夹。
为了实现较好的防爆防腐效果，本申请在夹持驱动组件201外套装有防爆防腐的保护罩203。
在一个更具体的实施例中，如图6以及图7所示，本申请的花篮架205为针对小尺寸工件500盛放需求进行设计的，设计规格为适用于例如：4/6寸工件500及1cm-2cm方形散片工件500。
以适用4/6寸工件500设计为例：
花篮架205具体包括两个固定板206。
两个固定板206平行间隔设置，且之间通过多个连接杆207固定连接，各个连接杆207以及两个固定板206之间围成盛放工件500的盛放腔；工件500可以从两个固定板206进入，再置于围成的盛放腔，利用固定板206与连接杆207的限位作用实现固定。
为了方便夹爪件202的抓持，两个固定板206之间顶部位置固定连接有提手块210，提手块210上的两侧面上均设有导向卡槽211，两个夹爪件202的夹持面上设有卡入导向卡槽211的定位凸起212，利用定位凸起212与导向卡槽211之间的定位配合，实现夹爪件202与提手块210之间的可靠连接。
同时，夹爪件202的底部均设有可与提手块210底部接触相抵的限位凸缘213，限位凸缘213能够托卡住提手块210，避免掉落。
在一个更具体的实施例中，以适用1cm-2cm方形散片工件500设计为例：
花篮架205包括底板以及如图6以及图7所示的两个固定板206。
两个固定板206平行间隔设置在固定板206顶部，两个固定板206之间顶部位置固定连接有提手块210，提手块210的两侧面上均设有导向卡槽211。两个夹爪件202的夹持面上设有卡入导向卡槽211的定位凸起212，夹爪件202的底部均设有可与提手块210底部接触相抵的限位凸缘213。
底板上于两个固定板206之间固定有多个限位杆，相邻限位杆与底板之间围成盛放工件500的盛放腔。这一设计方案与上述适用4/6寸的设计方案之间的区别在于底板以及盛放腔的形成，本领域技术人员可以根据需要进行变化设计，不做限制。
在一个更具体的实施例中，如图6以及图7所示，上述两种花篮架205设计方案中，两个固定板206相向的一侧面上均固定有定位块209，定位块209结构可以呈L型，两个定位块209之间活动插装有用于压抵工件500的压块208，压块208的两侧分别设有可供定位块209的竖向块部活动穿过的豁口，而定位块209的水平块部则可以起到限位作用，避免安装的压块208向下滑出定位块209，该设计下，压块208上下活动可调，可以随着盛放的工件500尺寸进行灵活调节，实现对多种尺寸的工件500压抵的作用，避免工件500在浸入药液中发生浮起掉落情况，以确保小尺寸工件500在花篮架205内的稳定性和安全性。定位块209可以设计为上下安装位置可调的，这样可以使得压块208的适用范围更广。
在一个更具体的实施例中，为了更好定位固定工件500，如图7所示，连接杆207以及限位杆上均设有供工件500卡入的插槽214。
在一个更具体的实施例中，针对供液机构32设计来说，包括用于形成供液模块33的送液装置以及排液装置。
送液装置包括泵液管以及药液泵。
泵液管一端连接至药液槽301，另一端连接至小容量药液罐600，药液管为小瓶设计；药液泵安装于泵液管上，用于将小容量药液罐600中的药液按照预设供液策略泵入药液槽301，通过药液泵直接将小容量药液罐600中的药液泵入药液槽301。一个小容量药液罐600对应一根泵液管，每根泵液管对应一个药液泵，一个小容量药液罐600可以给多个药液槽301进行供液。
排液装置包括排液管以及排液阀310，排液管连接至药液槽301。
排液阀310与排液管连接，用于按照预设供液策略控制排液管的流量；
药液槽301中配置有用于检测药液液位的液位传感器，该设计下可以实现液位动态变化，根据不同工件的刻蚀需求调整液位。
上述药液泵具体可以是气动隔膜泵，为一种小流量泵，通过将药液直接泵入药液槽301中，可以极大地缩短泵液时间，减少药液在管路中的残留浪费。
在设计中，可以预留集中供液口，以便于在批量制备时使用。
根据工艺需求，每个药液槽301对应多个具有不同药液的小容量药液罐600，实现直接在药液槽301内混液操作，对于混液有剧烈反应的，则可以单独增加混液槽，通过对药液泵的参数设置，可以精准控制溶液配比和用量，实现自动配液功能。小容量药液罐600为小容量瓶设计，通过小容量、小体积设计，进一步节省药液量。
在一个更具体的实施例中，如图9以及图12所示，针对药液槽301设计来说，其设有药液室305以及用于形成溢流模块的溢流室306。
药液室305用于容置供液机构32供给的药液，并供工件500置入，而溢流室306用于接收药液室305溢出的药液。
溢流室306设有溢流回收口307，药液室305设有连接泵液管的进液口308，以及连接排液管的排液口309，该排液阀310可以是快排阀。药液室305内布置上述提到的用于检测液位的液位传感器，基于该液位传感器能够实现自动控制液位，节省药液量和保护设备安全。当放入盛放有不同尺寸的工件500的花篮架205前，可以工件500尺寸、花篮架205尺寸设置不同高度的液位，然后通过液位传感器实时监测药液室305内的液位并反馈给控制系统1，控制系统1控制药液泵的泵入量或控制排液阀310的开闭程度，以保持液位在设定范围内，实现液位的精准和稳定控制。
在一个更具体的实施例中，如图8至图11所示，药液槽301具体包括内槽体302。
内槽体302顶部开口形成浸入口，内槽体302内部空间形成药液室305，且底部设有用于定位花篮架205的定位结构。
内槽体302外周面上环设有连接凸缘303，连接凸缘303顶面边缘连接有侧围304，侧围304与连接凸缘303顶面以及内槽体302外周面之间围成溢流室306。内槽体302、连接凸缘303、侧围304之间采用焊接方式进行连接固定，而具体制备材料则根据盛放的药液不同而适应性选择匹配的材料。本申请该设计的药液槽301结构，为兼容4/6寸工件500及1cm-2cm小片工件500的1.3L及130mL小容量药液槽301，可以极大地节省药液的使用量。
在一个更具体的实施例中，如图9所示，供液机构32还包括用于形成加热模块的加热装置312，加热装置312用于按照预设供液策略对药液室305中的药液进行加热。不一定所有的药液槽301均配备加热装置312，具体可以根据需要进行灵活配置，例如部分药液槽301中的药液实验无需加热，则可以不用配置加热装置312。
在一个更具体的实施例中，加热装置312可以直接加热或水浴加热设计，对于易燃易爆的有机药液来说，水浴加热设计更安全，如图9所示，药液槽301还包括外槽体。
内槽体302底部伸入外槽体中，且连接凸缘303与外槽体连接，以使得连接凸缘303、外槽体以及内槽体302之间围成加热腔室311，外槽体上设有连通加热腔室311的介质输入管以及介质输出管，加热装置312安装于加热腔室311中，用于对加热腔室311中的导热加热进行加热。导热介质可以是常规水，或导热油，具体不做限制。加热装置312可以是电加热管或电加热丝，在加热腔室311中可以设置温度传感器，用于检测导热介质的温度并反馈给控制系统1，从而控制系统1能够通过控制加热装置312的功率来准确控制对药液室305的加热温度。
在一个更具体的实施例中，供液机构32还包括用于形成循环过滤模块的循环装置或用于形成喷淋模块的循环喷淋装置，循环装置用于按照预设供液策略将药液室305中的药液抽出，并在经过过滤后回送至药液室305中。循环喷淋装置用于按预设供液策略将药液室305中的药液抽出，并在经过过滤后以喷淋方式回送至药液室305中。
通过增加设置循环装置，实现药液的循环，进而使得药液室305中的药液处于流动状态，更充分接触工件500，提升清洗蚀刻效果。循环装置具体可以包括循环泵、循环输送管以及过滤装置，循环泵的输入端连接过滤器并通过循环输送管连接药液室305一侧，循环泵的输出端通过循环输送管连接药液室305另一侧。
而循环喷淋装置相比循环装置来说其回流方式上有区别，以喷淋的方式进行回流，为此循环喷淋装置具体可以包括循环泵、循环输送管、喷淋头以及过滤装置。
当然，针对喷淋设计来说，其也可以是由泵液管的一端连接喷头以实现喷淋功能，也即是以喷淋的方式实现进液。
在一个更具体的实施例中，供液机构32还包括用于形成鼓泡模块的鼓泡装置，鼓泡装置用于按照预设供液策略对药液室305中的药液进行鼓泡，以实现药液槽301的鼓泡功能。
在一个更具体的实施例中，刻蚀系统3还包括清洗装置315，清洗装置315用于对药液室305中的工件500进行清洗。清洗装置315可以设计为两个，具体可以是喷淋管设计，两个清洗装置315可以如图10所示对称安装在药液槽301上，且朝向药液室305设置，其中的一个清洗装置315可以通过喷淋器连接氮气罐，而另一个清洗装置315可以通过喷淋器连接纯水罐。
在一个更具体的实施例中，如图8所示，刻蚀系统3还包括刻蚀开关盖装置，刻蚀开关盖装置用于控制药液室305的浸入口的开启与闭合，该刻蚀开关盖装置设计为包括刻蚀端盖313以开关驱动器314，刻蚀端盖313一边通过转动轴与内槽体302的一边铰接，而开关驱动器314安装于药液槽301上且与转动轴连接，用于带动转动轴转动，进而控制刻蚀端盖313的开启与闭合。刻蚀开关盖装置的设计，能够提升数据准确性，保障人员安全。
自动控制的刻蚀开关盖装置设计，可以提升操作效率，减少操作人员与有害物质的直接接触，同时刻蚀开关盖装置可以与控制系统1互联，例如当监控系统7监控到设备存在异常时，控制刻蚀开关盖装置关闭药液槽301，开关驱动器314可以为气动伸缩缸设计，通过连杆机构带动转动轴转动，根据工艺和安全需要，可以设定自动开关刻蚀端盖313的时机和频率，进而提升科研实验的可靠性、效率和安全性。
在一个更具体的实施例中，供液机构32还包括超声波仪器，用于按照预设供液策略使得药液室305发生振动。
本申请所列举出来的刻蚀系统3具有的喷淋、循环过滤喷淋、加热、循环过滤、自动配液、振动、鼓泡、溢流等功能，可以根据工艺需求，在对应的药液槽301上进行配置。
例如以丙酮/IPA/EKC等药液槽301设计为例，可以配置喷淋、循环过滤喷淋、加热、循环过滤功能，槽结构材质可以是SUS316L；以DIW药液槽301设计为例，可以配置循环过滤喷淋、鼓泡、溢流、快排，槽结构材质可以是NPP。
针对预设供液策略来说，其具体可以为一种刻蚀环境+供液策略，例如：
供液策略可以是供液量控制、配液控制策略。
刻蚀环境策略可以是营造循环过滤喷淋的同时进行预设温度的加热，或循环过滤的同时进行鼓泡，或鼓泡的同时进行超声振动，或进液喷淋的同时鼓泡等刻蚀环境变化策略，这一策略执行可以是供液机构32在人机交互系统5、计时系统6等的配合下实现。
在一个更具体的实施例中，如图13所示，针对送料系统4设计来说，包括输送装置402、第一送料开关盖装置401。
输送装置402用于将工件500从机台本体100外的备料位置输送至机室中的上料位置；如图1所示，机台本体100外的备料位置设有载料台116，用于放置待实验的工件500或盛放有工件500的花篮架205。
机台本体100上设有连通机室且供输送的工件500通过的上料口，第一送料开关盖装置401用于控制上料口的开启与闭合。第一送料开关盖装置401包括挡板404以及板驱动器403；挡板404可以滑动安装在机台本体100上，用于对上料口进行遮挡，板驱动器403可以是伸缩气缸，与挡板404连接，带动挡板404伸缩运动，以实现开启与闭合控制，上料前，开启上料口，完成上料后关闭上料口。
在一个更具体的实施例中，如图14所示，以前述支撑隔板101设计方式为例，送料系统4还包括第二送料开关盖装置。
输送装置402具体可以安装于下腔室，为了避免安装于下腔室时被经第一排水孔103漏下的水影响，下腔室还可以设计一个独立的安装腔室，用于安装输送装置402。
输送装置402包括第一送料机构405以及第二送料机构406。
支撑隔板101上设有供工件500进入上腔室的第二避让口，第二避让口连通该安装腔室。
第一送料机构405用于将工件500从备料位置输送至下腔室中的中转位置，第二送料机构406用于将工件500从中转位置输送至上腔室中的上料位置。第一送料机构405可以为水平位移机构，而第二送料机构406可以是竖直位移机构，第一送料机构405的驱动端连接有第一托件407，第一托件407上设有用于固定花篮架205的定位凹槽，于定位凹槽位置还设有避让槽口408，第二送料机构406的驱动端连接有第二托件409，第二托件409可穿过避让槽口408以从第一托件407托起花篮架205，以继续输送至上料位置。
第二送料开关盖装置用于控制第二避让口的开启与闭合，第二送料开关盖装置的设计组成可以参考第一送料开关盖的设计组成，具体不做赘述。在将工件500送达上料位置且机器人模块21抓取完工件500后，第二送料开关盖装置即可切换为关闭第二避让口的状态。
再次总结下本申请所设计的科研型湿法刻蚀全自动化机台所具有的有益效果：
1、能够提升科研效率。全自动化设计可以大幅减少实验时间，提供更加准确和稳定的实验结果，增强了科研成果的可信度，加快了科研进展，提高了科研效率，推动科学知识的形成和创新。
2、能够节约科研资源。全自动化设计可以精确控制药液用量，减少试剂的用量，降低了科研成本，提高了资源利用效率，还能够自动监测和调节实验条件，减少实验失败的风险，减少实验耗材的浪费，从而减少资源浪费；同时，设备优化并小型化设计，兼容小尺寸工件实验，不仅减少占地空间，节约安装维护费用，也极大降低药液消耗量，节约科研成本。
3、能够保障人员和设备安全。通过自动化流程和精确的控制系统1实现远程操作，减少人员与危险药液接触的机会，降低了操作风险，保障人员和设备的安全。
4、具有商业价值和经济效益。该全自动化机台应用范围广泛，填补了现有技术在科研领域中针对于科研湿法设备/工艺研究的空白，可用于各类高校实验室以及科研机构，满足科研需求，对半导体科研的发展产生积极且深远的影响。而且该全自动化机台的智能化和自动化将吸引用户的需求，有望在市场上取得重大成功。此外，该全自动化机台的投入使用还将促进相关产业链的发展，推动相关技术和设备的升级和创新，从而为推动经济进步提供了巨大的助力。
以上对本申请所提供的一种科研型湿法刻蚀全自动化系统及机台进行了详细介绍，对于本领域的一般技术人员，依据本申请实施例的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本申请的限制。

Claims (36)

  1. 一种科研型湿法刻蚀全自动化系统，其特征在于，包括机台系统(8)、刻蚀系统(3)、送料系统(4)、机器人系统(2)以及控制系统(1)；
    所述机台系统(8)用于提供包括安装空间及作业空间的小型化机室；
    所述刻蚀系统(3)包括以弧线排布方式配置于所述小型化机室中的多个药液模块(31)；
    所述药液模块(31)包括药液槽(301)以及供液机构(32)；
    所述供液机构(32)用于按照预设供液策略给所述药液槽(301)供液并控制所述药液槽(301)中的刻蚀环境；
    所述送料系统(4)用于将工件(500)输送至所述作业空间中，并在完成输送后封闭所述作业空间；
    所述机器人系统(2)包括机器人模块(21)以及与所述机器人模块(21)通信连接的视觉模块(22)；
    所述机器人模块(21)配置于所述作业空间顶部，用于根据所述视觉模块(22)反馈的图像信息抓取工件并按预设刻蚀策略将所述工件(500)置入所述药液槽(301)中完成刻蚀；
    所述控制系统(1)与所述机台系统(8)、所述送料系统(4)、所述机器人系统(2)和所述刻蚀系统(3)通信连接，用于根据用户指令实现自动化刻蚀作业。
  2. 根据权利要求1所述的科研型湿法刻蚀全自动化系统，其特征在于，所述机器人模块(21)还用于根据所述视觉模块(22)反馈的图像信息抓取清洁工具执行清洁动作。
  3. 根据权利要求1所述的科研型湿法刻蚀全自动化系统，其特征在于，所述机器人模块(21)还能够执行伸缩动作、旋转动作以及抖动动作中的至少一种。
  4. 根据权利要求1所述的科研型湿法刻蚀全自动化系统，其特征在于，还包括计时系统(6)；
    所述计时系统(6)用于获取所述机台系统(8)、所述送料系统(4)、所述机器人系统(2)的运行时间信息并反馈所述控制系统(1)，以使得所述控制系统(1)能够按照预设时间策略对所述机台系统(8)、送料系统(4)、机器人系统(2)和所述刻蚀系统(3)进行控制。
  5. 根据权利要求1所述的科研型湿法刻蚀全自动化系统，其特征在于，还包括人机交互系统(5)以及监控系统(7)；
    所述人机交互系统(5)与所述控制系统(1)通讯连接；
    所述监控系统(7)用于分别获取所述机台系统(8)、所述机器人系统(2)、所述刻蚀系统(3)以及所述送料系统(4)的运行数据，并在所述运行数据超出阈值时发出警报；
    所述监控系统(7)还用于根据预设监控策略对机台系统(8)、所述机器人系统(2)、所述刻蚀系统(3)以及所述送料系统(4)进行实时监控。
  6. 根据权利要求1所述的科研型湿法刻蚀全自动化系统，其特征在于，所述供液机构(32)包括供液模块(33)以及刻蚀环境模块(34)；
    所述供液模块(33)用于将小容量药液罐(600)中的药液供给所述药液槽(301)；
    所述刻蚀环境模块(34)包括加热模块、鼓泡模块、超声振动模块、清洗模块、喷淋模块以及循环过滤模块中的至少一种；
    所述药液槽(301)设有溢流回收模块。
  7. 一种科研型湿法刻蚀全自动化机台，其特征在于，包括机台本体(100)以及科研型湿法刻蚀全自动化系统；
    所述科研型湿法刻蚀全自动化系统配置于所述机台本体上，包括机台系统(8)、刻蚀系统(3)、送料系统(4)、机器人系统(2)以及控制系统(1)；
    所述机台系统(8)用于提供包括安装空间及作业空间的小型化机室；
    所述刻蚀系统(3)包括以弧线排布方式配置于所述小型化机室中的多个药液模块(31)；
    所述药液模块(31)包括药液槽(301)以及供液机构(32)；
    所述供液机构(32)用于按照预设供液策略给所述药液槽(301)供液并控制所述药液槽(301)中的刻蚀环境；
    所述送料系统(4)用于将工件(500)输送至所述作业空间中，并在完成输送后封闭所述作业空间；
    所述机器人系统(2)包括机器人模块(21)以及与所述机器人模块(21)通信连接的视觉模块(22)；
    所述机器人模块(21)配置于所述作业空间顶部，用于根据所述视觉模块(22)反馈的图像信息抓取工件(500)并按预设刻蚀策略将所述工件置入所述药液槽(301)中完成刻蚀；
    所述控制系统(1)与所述机台系统(8)、所述送料系统(4)、所述机器人系统(2)和所述刻蚀系统(3)通信连接，用于根据用户指令实现自动化刻蚀作业。
  8. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，所述机器人模块(21)还用于根据所述视觉模块(22)反馈的图像信息抓取清洁工具执行清洁动作。
  9. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，所述机器人模块(21)还能够执行伸缩动作、旋转动作以及抖动动作中的至少一种。
  10. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，还包括计时系统(6)；
    所述计时系统(6)用于获取所述机台系统(8)、所述送料系统(4)、所述机器人系统(2)的运行时间信息并反馈所述控制系统(1)，以使得所述控制系统(1)能够按照预设时间策略对所述机台系统(8)、送料系统(4)、所述机器人系统(2)和所述刻蚀系统(3)进行控制。
  11. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，还包括人机交互系统(5)以及监控系统(7)；
    所述人机交互系统(5)与所述控制系统(1)通讯连接；
    所述监控系统(7)用于分别获取所述机台系统(8)、所述机器人系统(2)、所述刻蚀系统(3)以及所述送料系统(4)的运行数据，并在所述运行数据超出阈值时发出警报；
    所述监控系统(7)还用于根据预设监控策略对机台系统(8)、所述机器人系统(2)、所述刻蚀系统(3)以及所述送料系统(4)进行实时监控。
  12. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，所述供液机构(32)包括供液模块(33)以及刻蚀环境模块(34)；
    所述供液模块(33)用于将小容量药液罐(600)中的药液供给所述药液槽(301)；
    所述刻蚀环境模块(34)包括加热模块、鼓泡模块、超声振动模块、清洗模块、喷淋模块以及循环过滤模块中的至少一种；
    所述药液槽(301)设有溢流回收模块。
  13. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，所述机器人模块(21)为协作机器人。
  14. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，所述小型化机室设于所述机台本体(100)中；
    所述小型化机室中设有支撑隔板(101)；
    所述支撑隔板(101)将所述小型化机室隔成上腔室以及下腔室；
    所述上腔室形成作业空间。
  15. 根据权利要求14所述的科研型湿法刻蚀全自动化机台，其特征在于，多个所述药液模块(31)圆周布置于所述下腔室中；
    所述支撑隔板(101)上设有一一对应连通各个所述药液模块(31)中的药液槽(301)的第一避让口(102)。
  16. 根据权利要求14所述的科研型湿法刻蚀全自动化机台，其特征在于，所述机台本体(100)内于所述小型化机室下方的空间设有电控室(115)以及用于存放小容量药液罐(600)的原液室(114)。
  17. 根据权利要求14所述的科研型湿法刻蚀全自动化机台，其特征在于，所述机台系统(8)还包括风机过滤机组(106)；
    所述机台本体(100)上设有连通所述上腔室的排风口以及送风口；
    所述风机过滤机组(106)安装于所述机台本体(100)上，且与所述送风口连接。
  18. 根据权利要求14所述的科研型湿法刻蚀全自动化机台，其特征在于，所述机台本体(100)上还安装有喷淋清洁装置；
    所述喷淋清洁装置包括喷淋组件(109)以及喷淋移动装置(108)；
    所述喷淋移动装置(108)安装于所述上腔室中，且与所述喷淋组件(109)连接，用于带动所述喷淋组件(109)移动；
    所述支撑隔板(101)上开设有多个第一排水孔(103)；
    所述下腔室设有连通所述机台本体(100)外的主排水管。
  19. 根据权利要求18所述的科研型湿法刻蚀全自动化机台，其特征在于，所述支撑隔板(101)中部设有聚水部(104)；
    所述聚水部(104)上设有第二排水孔(105)。
  20. 根据权利要求19所述的科研型湿法刻蚀全自动化机台，其特征在于，所述下腔室中部设有连接所述支撑隔板(101)的支撑筒体(110)；
    所述支撑筒体(110)内设有布控腔室；
    所述第二排水孔(105)连通所述布控腔室；
    所述布控腔室内设有连接所述第二排水孔(105)的支排水管；
    所述支排水管远离所述第二排水孔(105)的一端延伸出所述支撑筒体(110)。
  21. 根据权利要求7所述的科研型湿法刻蚀全自动化机台，其特征在于，还包括用于盛放工件(500)的花篮架(205)；
    所述机器人模块(21)末端连接有用于抓取所述花篮架(205)的花篮夹爪机构(204)。
  22. 根据权利要求21所述的科研型湿法刻蚀全自动化机台，其特征在于，所述花篮夹爪机构(204)包括夹持驱动组件(201)以及两个夹爪件(202)；
    所述夹持驱动组件(201)与两个所述夹爪件(202)连接，用于驱动两个所述夹爪件(202)张开闭合，以对所述花篮架(205)进行抓夹；
    所述夹持驱动组件(201)外套装有防爆防腐的保护罩(203)。
  23. 根据权利要求22所述的科研型湿法刻蚀全自动化机台，其特征在于，所述花篮架(205)包括两个固定板(206)；
    两个所述固定板(206)平行间隔设置，且之间通过多个连接杆(207)固定连接；
    各个所述连接杆(207)以及两个固定板(206)之间围成盛放工件(500)的盛放腔；
    两个所述固定板(206)之间顶部位置固定连接有提手块(210)；
    所述提手块(210)上的两侧面上均设有导向卡槽(211)；
    两个所述夹爪件(202)的夹持面上设有卡入所述导向卡槽(211)的定位凸起(212)；
    所述夹爪件(202)的底部均设有可与所述提手块(210)底部接触相抵的限位凸缘(213)。
  24. 根据权利要求22所述的科研型湿法刻蚀全自动化机台，其特征在于，所述花篮架(205)包括底板以及两个固定板(206)；
    两个所述固定板(206)平行间隔设置在所述固定板(206)顶部；
    两个所述固定板(206)之间顶部位置固定连接有提手块(210)；
    所述提手块(210)的两侧面上均设有导向卡槽(211)；
    两个所述夹爪件(202)的夹持面上设有卡入所述导向卡槽(211)的定位凸起(212)；
    所述夹爪件(202)的底部均设有可与所述提手块(210)底部接触相抵的限位凸缘(213)；
    所述底板上于两个所述固定板(206)之间固定有多个限位杆；
    相邻所述限位杆与底板之间围成盛放工件(500)的盛放腔。
  25. 根据权利要求23或24所述的科研型湿法刻蚀全自动化机台，其特征在于，两个所述固定板(206)相向的一侧面上均固定有定位块(209)；
    两个所述定位块(209)之间活动插装有用于压抵工件(500)的压块(208)。
  26. 根据权利要求12所述的科研型湿法刻蚀全自动化机台，其特征在于，所述供液机构(32)包括用于形成供液模块(33)的送液装置以及排液装置；
    所述送液装置包括泵液管以及药液泵；
    所述泵液管一端连接至所述药液槽(301)，另一端连接至小容量药液罐(600)；
    所述药液泵安装于所述泵液管上，用于将所述小容量药液罐(600)中的药液按照预设供液策略泵入所述药液槽(301)；
    所述排液装置包括排液管以及排液阀(310)；
    所述排液管连接至所述药液槽(301)；
    所述排液阀(310)与所述排液管连接，用于按照预设供液策略控制所述排液管的流量；
    所述药液槽(301)中配置有用于检测药液液位的液位传感器。
  27. 根据权利要求26所述的科研型湿法刻蚀全自动化机台，其特征在于，所述药液槽(301)设有药液室(305)以及用于形成溢流模块的溢流室(306)；
    所述药液室(305)用于容置所述供液机构(32)供给的药液，并供所述工件(500)置入；
    所述溢流室(306)用于接收所述药液室(305)溢出的药液；
    所述泵液管以及所述排液管连接所述药液室(305)。
  28. 根据权利要求27所述的科研型湿法刻蚀全自动化机台，其特征在于，所述药液槽(301)包括内槽体(302)；
    所述内槽体(302)顶部开口形成浸入口；
    所述内槽体(302)内部空间形成所述药液室(305)；
    所述内槽体(302)外周面上环设有连接凸缘(303)；
    所述连接凸缘(303)顶面边缘连接有侧围(304)；
    所述侧围(304)与所述连接凸缘(303)顶面以及所述内槽体(302)外周面之间围成所述溢流室(306)。
  29. 根据权利要求28所述的科研型湿法刻蚀全自动化机台，其特征在于，所述供液机构(32)还包括用于形成加热模块的加热装置(312)；
    所述加热装置(312)用于按照预设供液策略对所述药液室(305)中的药液进行加热。
  30. 根据权利要求29所述的科研型湿法刻蚀全自动化机台，其特征在于，所述药液槽(301)还包括外槽体；
    所述内槽体(302)底部伸入所述外槽体中，且所述连接凸缘(303)与所述外槽体连接，以使得所述连接凸缘(303)、所述外槽体以及所述内槽体(302)之间围成加热腔室(311)；
    所述外槽体上设有连通所述加热腔室(311)的介质输入管以及介质输出管；
    所述加热装置(312)安装于所述加热腔室(311)中，用于对所述加热腔室(311)中的导热加热进行加热。
  31. 根据权利要求27所述的科研型湿法刻蚀全自动化机台，其特征在于，所述供液机构(32)还包括用于形成循环过滤模块的循环装置或用于形成喷淋模块的循环喷淋装置；
    所述循环装置用于按照预设供液策略将所述药液室(305)中的药液抽出，并在经过过滤后回送至所述药液室(305)中；
    所述循环喷淋装置用于按预设供液策略将所述药液室(305)中的药液抽出，并在经过过滤后以喷淋方式回送至所述药液室(305)中。
  32. 根据权利要求27所述的科研型湿法刻蚀全自动化机台，其特征在于，所述刻蚀系统(3)还包括用于形成清洗模块的清洗装置(315)；
    所述清洗装置(315)用于对所述药液室(305)中的所述工件(500)进行清洗。
  33. 根据权利要求27所述的科研型湿法刻蚀全自动化机台，其特征在于，所述供液机构(32)还包括用于形成鼓泡模块的鼓泡装置；
    所述鼓泡装置用于按照预设供液策略对所述药液室(305)中的药液进行鼓泡。
  34. 根据权利要求27所述的科研型湿法刻蚀全自动化机台，其特征在于，所述刻蚀系统(3)还包括刻蚀开关盖装置；
    所述刻蚀开关盖装置用于控制所述药液室(305)的浸入口的开启与闭合。
  35. 根据权利要求17所述的科研型湿法刻蚀全自动化机台，其特征在于，所述送料系统(4)包括输送装置(402)、第一送料开关盖装置(401)；
    所述输送装置(402)用于将所述工件(500)从所述机台本体(100)外的备料位置输送至所述小型化机室中的上料位置；
    所述机台本体(100)上设有连通所述小型化机室且供输送的工件(500)通过的上料口；
    所述第一送料开关盖装置(401)用于控制所述上料口的开启与闭合。
  36. 根据权利要求35所述的科研型湿法刻蚀全自动化机台，其特征在于，所述送料系统(4)还包括第二送料开关盖装置；
    所述输送装置(402)安装于所述下腔室，包括第一送料机构(405)以及第二送料机构(406)；
    所述支撑隔板(101)上设有供所述工件(500)进入所述上腔室的第二避让口；
    所述第一送料机构(405)用于将所述工件(500)从所述备料位置输送至所述下腔室中的中转位置；
    所述第二送料机构(406)用于将所述工件(500)从所述中转位置输送至所述上腔室中的上料位置；
    所述第二送料开关盖装置用于控制所述第二避让口的开启与闭合。
PCT/CN2025/084053 2024-04-16 2025-03-21 一种科研型湿法刻蚀全自动化系统及机台 Pending WO2025218445A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202410452002.8A CN118053795B (zh) 2024-04-16 2024-04-16 一种科研型湿法刻蚀全自动化系统及机台
CN202410452002.8 2024-04-16

Publications (1)

Publication Number Publication Date
WO2025218445A1 true WO2025218445A1 (zh) 2025-10-23

Family

ID=91050468

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2025/084053 Pending WO2025218445A1 (zh) 2024-04-16 2025-03-21 一种科研型湿法刻蚀全自动化系统及机台

Country Status (6)

Country Link
US (1) US12482676B2 (zh)
EP (1) EP4636814A3 (zh)
JP (1) JP7754559B1 (zh)
CN (1) CN118053795B (zh)
IL (1) IL320253B2 (zh)
WO (1) WO2025218445A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118053795B (zh) * 2024-04-16 2024-07-12 香港科技大学(广州) 一种科研型湿法刻蚀全自动化系统及机台
CN118311832B (zh) * 2024-06-11 2024-09-27 香港科技大学(广州) 一种科研用全自动涂胶烘烤设备
CN118818924A (zh) * 2024-09-12 2024-10-22 香港科技大学(广州) 科研用全自动显影组件、显影装置以及显影机台
CN118824908B (zh) 2024-09-19 2024-12-27 香港科技大学(广州) 科研用黑灯湿法实验室
CN120935950B (zh) * 2025-07-24 2026-02-17 赣州金顺科技有限公司 一种多方位梯度定位的汽车多层pcb板蚀刻系统

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030194877A1 (en) * 2002-04-16 2003-10-16 Applied Materials, Inc. Integrated etch, rinse and dry, and anneal method and system
KR20060075086A (ko) * 2004-12-28 2006-07-04 동부일렉트로닉스 주식회사 습식 세정 시스템
JP2011009247A (ja) * 2009-06-23 2011-01-13 Sharp Corp 太陽電池の製造方法及び湿式エッチング装置
CN109935543A (zh) * 2017-12-18 2019-06-25 上海微电子装备（集团）股份有限公司 片盒自动运输设备及运输方法
CN115206833A (zh) * 2021-04-01 2022-10-18 东京毅力科创株式会社 基片液处理装置和基片液处理方法
CN118053795A (zh) * 2024-04-16 2024-05-17 香港科技大学(广州) 一种科研型湿法刻蚀全自动化系统及机台

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5887602A (en) * 1995-07-31 1999-03-30 Tokyo Electron Limited Cleaning machine and method of controlling the same
US6514355B1 (en) * 1999-02-08 2003-02-04 International Business Machines Corporation Method and apparatus for recovery of semiconductor wafers from a chemical tank
JP4033689B2 (ja) * 2002-03-01 2008-01-16 東京エレクトロン株式会社 液処理装置および液処理方法
US7039499B1 (en) * 2002-08-02 2006-05-02 Seminet Inc. Robotic storage buffer system for substrate carrier pods
JP2007294606A (ja) * 2006-04-24 2007-11-08 Etsujo Kagi Kofun Yugenkoshi パネルのエッチング製作プロセスの方法及びその装置
JP4308865B2 (ja) * 2007-03-30 2009-08-05 Ｏｋｉセミコンダクタ株式会社 半導体素子の製造方法、及び半導体素子の製造装置
KR101095192B1 (ko) * 2011-02-11 2011-12-16 강은광 습식 장치의 불순물 감지 시스템 및 방법
JP6095295B2 (ja) 2012-08-17 2017-03-15 株式会社プレテック スピンテーブルを用いた洗浄装置
JP6100486B2 (ja) 2012-08-17 2017-03-22 株式会社プレテック 浸漬式の洗浄装置
CN105225981A (zh) * 2014-05-30 2016-01-06 盛美半导体设备（上海）有限公司 一种半导体基板的刻蚀装置和方法
JP2016111053A (ja) 2014-12-02 2016-06-20 国立研究開発法人産業技術総合研究所 シリンジを用いた処理液供給装置およびウェット処理装置
CN108470693B (zh) * 2018-03-15 2019-03-01 福建省福联集成电路有限公司 一种蚀刻装置控制方法和系统
JP7202138B2 (ja) * 2018-10-22 2023-01-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7412990B2 (ja) * 2019-12-04 2024-01-15 東京エレクトロン株式会社 基板処理装置、および基板処理方法
CN112928046A (zh) * 2021-01-22 2021-06-08 徐州中辉光伏科技有限公司 一种太阳能光伏晶片蚀刻装置
CN214313143U (zh) * 2021-02-08 2021-09-28 淄博绿能芯创电子科技有限公司 多功能酸洗台装置
JP7696766B2 (ja) * 2021-06-21 2025-06-23 キオクシア株式会社 基板処理装置、基板処理方法および半導体装置の製造方法
JP7785333B2 (ja) 2022-02-24 2025-12-15 国立研究開発法人産業技術総合研究所 ウェットプロセス装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030194877A1 (en) * 2002-04-16 2003-10-16 Applied Materials, Inc. Integrated etch, rinse and dry, and anneal method and system
KR20060075086A (ko) * 2004-12-28 2006-07-04 동부일렉트로닉스 주식회사 습식 세정 시스템
JP2011009247A (ja) * 2009-06-23 2011-01-13 Sharp Corp 太陽電池の製造方法及び湿式エッチング装置
CN109935543A (zh) * 2017-12-18 2019-06-25 上海微电子装备（集团）股份有限公司 片盒自动运输设备及运输方法
CN115206833A (zh) * 2021-04-01 2022-10-18 东京毅力科创株式会社 基片液处理装置和基片液处理方法
CN118053795A (zh) * 2024-04-16 2024-05-17 香港科技大学(广州) 一种科研型湿法刻蚀全自动化系统及机台

Also Published As

Publication number Publication date
IL320253B1 (en) 2025-06-01
US12482676B2 (en) 2025-11-25
EP4636814A2 (en) 2025-10-22
JP2025162980A (ja) 2025-10-28
IL320253A (zh) 2025-05-01
CN118053795A (zh) 2024-05-17
US20250323067A1 (en) 2025-10-16
IL320253B2 (en) 2025-10-01
CN118053795B (zh) 2024-07-12
JP7754559B1 (ja) 2025-10-15
EP4636814A3 (en) 2026-02-18

Similar Documents

Publication Publication Date Title
WO2025218445A1 (zh) 一种科研型湿法刻蚀全自动化系统及机台
CN105965161B (zh) 一种锂电池注液口的自动化密封焊接设备
CN110993524B (zh) 一种基板后处理装置和方法
CN210628335U (zh) 硅片清洗设备
EP4715869A1 (en) Wet-processing dark laboratory for scientific research
CN211100448U (zh) 一种硅片清洗设备
CN218251870U (zh) 清洗装置
CN115494803A (zh) 一种全流程集成化药品研发工作站
CN105797799B (zh) 一种自动化化学实验装置
CN119709388A (zh) 智能化微生物检测前处理工作站
CN207238691U (zh) 一种批量清洁玻璃容器的设备
CN223637532U (zh) 试剂添加装置
CN221612437U (zh) 一种盐块取样装置
CN111189820B (zh) 适用于比色法检测的机器人自动操作平台
CN118512946B (zh) 一种离心管自动化综合处理装置
CN211134764U (zh) 一种步进通过式铁钳自动清洗机
CN221063708U (zh) 一种半导体多晶硅生产用石英隔热环全自动清洗设备
CN119819641A (zh) 一种fpc清洗设备及其操作方法
CN119901568A (zh) 一种icp前处理消解系统设备
CN219016836U (zh) 一种全流程集成化药品研发工作站
CN216585598U (zh) 一种碳纤维表面改性装置
CN210628258U (zh) 硅片清洗设备
CN216297333U (zh) 样品瓶清洗装置
CN115722475B (zh) 清洗细胞培养板的设备
CN222883508U (zh) 一种试剂放置组件、湿法机台与自动换液系统

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 25789314

Country of ref document: EP

Kind code of ref document: A1