Classifications

• • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
  • F24—HEATING; RANGES; VENTILATING
  • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
  • F24F7/00—Ventilation
  • F24F7/04—Ventilation with ducting systems, e.g. by double walls; with natural circulation
  • F24F7/06—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit

Definitions

• This disclosure relates to clean room facilities.
• Patent Document 1 In the technology described in Patent Document 1, a main air supply duct and a branch air supply duct are installed above the ceiling of the clean room. As a result, many ducts are installed in the limited space above the ceiling, which limits the layout when arranging equipment such as air supply fans and exhaust fans. As such, there is room for improvement in the technology described in Patent Document 1 in terms of ensuring freedom of layout.
• the objective of this disclosure is to provide a clean room facility with a high degree of freedom in layout.
• This disclosure makes it possible to provide a clean room facility with a high degree of freedom in layout.
• FIG. 13 is an explanatory diagram of a clean room facility according to a first modified example of the second embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a second modified example of the second embodiment.
• FIG. 13 is a plan view showing the layout of a clean room facility according to a third modified example of the second embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a fourth modified example of the second embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a third embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a fourth embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a first modified example of the fourth embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a second modified example of the fourth embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a combination of the third and fourth embodiments.
• FIG. 1 is an explanatory diagram of a clean room facility according to a first embodiment.
• FIG. 11 is an explanatory diagram of a clean room facility according to a second embodiment.
• FIG. 13 is an explanatory diagram of a clean room facility according to a third embodiment.
• FIG. 1 is an explanatory diagram of a clean room facility according to a comparative example.
• FIG. 1 is an explanatory diagram of a clean room facility 100 according to the first embodiment.
• the clean room facility 100 is a facility for adjusting the temperature, room pressure, cleanliness, etc. of the clean room R1.
• organic solvents, DNA, RNA, and radioactive materials are handled, and cell culture processing and the production of sterile preparations (vaccines, injections, eye drops, etc.) are carried out.
• the clean room facility 100 includes an air conditioner 10, an air supply duct D1, an air supply damper 2, a first chamber C1, air supply side fan filter units 31 and 32, and a clean room R1.
• the clean room facility 100 also includes an exhaust side fan filter unit 41, a second chamber C2, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6 (first exhaust fan).
• the filter 11 collects dust from the air heading toward the heat exchanger 12 and is provided upstream of the heat exchanger 12 in the air flow direction. Heat exchange takes place between the air that has passed through the filter 11 and the refrigerant that flows through the heat transfer tube (not shown) of the heat exchanger 12.
• a cooling coil may be used as the heat exchanger 12, or a device that can switch between cooling and heating, or a device that cools and dehumidifies before heating, may be used.
• multiple heat exchangers may be provided, or a humidifier (not shown) may be provided separately.
• the fan 13 is a blower that sends the air that has been heat exchanged in the heat exchanger 12 into the first chamber C1 via the air supply duct D1.
• the intake air damper 2 is installed in the intake air duct D1.
• the intake air damper 2 is set to a predetermined opening degree during the trial run of the air conditioner 10, and is maintained at the predetermined opening degree during subsequent air conditioning operation.
• the first chamber C1 is a space provided above the ceiling of the clean room R1. As shown in FIG. 1, the first chamber C1 is formed by a ceiling plate C1a, an upper plate C1b, and side plates C1c and C1d.
• the ceiling plate C1a is a plate that forms the ceiling of the clean room R1 and is provided in the horizontal direction.
• the upper plate C1b is higher in height than the ceiling plate C1a and is provided approximately parallel to the ceiling plate C1a.
• the air supply side fan filter units 31, 32 are devices that supply air from the first chamber C1 to the clean room R1, and are fitted into an opening (not shown) in the ceiling board C1a. As shown in FIG. 1, the air supply side fan filter unit 31 includes an air supply fan 31a and a filter 31b.
• the air supply fan 31a is a blower that supplies air from the first chamber C1 to the clean room R1.
• Filter 31b collects dust from the air flowing from first chamber C1 to clean room R1, and is provided on the blowing side of air supply fan 31a.
• a HEPA High Efficiency Particulate Air Filter
• a ULPA Ultra Low Penetration Air Filter
• the other fan filter unit 32 has a similar configuration.
• the second chamber C2 is a space provided adjacent to the clean room R1.
• the second chamber C2 is formed by side plates C1d and W1, a floor, and a top plate C1b.
• the side plate C1d is a plate that separates the clean room R1 from the second chamber C2.
• the other side plate W1 is a plate that forms the outer surface of the second chamber C2 and is disposed parallel to the side plate C1d.
• These side plates C1d and W1 extend vertically from the floor of the second chamber C2 to the top plate C1b.
• the top plate C1b extends horizontally so as to form the upper surfaces of the first chamber C1 and the second chamber C2.
• FIG. 17 is an explanatory diagram of a clean room facility 100Z according to a comparative example. 17 does not include the first chamber C1 (see FIG. 1), and the downstream end of the air supply duct D1 is connected to the filter unit 37. Also, in the comparative example of FIG 17, the second chamber C2 (see FIG. 1) is not included, and the upstream end of the exhaust duct D2 is connected to the filter unit 44.
• FIG. 2 is an explanatory diagram of a clean room facility 100A according to a first modified example of the first embodiment.
• a damper 9 may be provided on a side plate C1d (first partition plate) that separates the first chamber C1 and the second chamber C2.
• the damper 9 switches between communication between the first chamber C1 and the second chamber C2 and blocking communication.
• a damper 9 for example, a non-leak damper (airtight damper) that has high airtightness in a closed state is used.
• the air supply fan filter units 31, 32 and the exhaust fan filter unit 41 are driven. This allows the sterilizing gas to circulate from the clean room R1 through the second chamber C2 and the first chamber C1 in sequence. As a result, not only can the clean room R1 be sterilized, but also the filters of the air supply fan filter units 31, 32 and the exhaust fan filter unit 41 can be sterilized. Also, since there is no particular need to provide a separate circulator (not shown) for circulating air, costs can be reduced.
• the exhaust duct D2 appears to penetrate the upper plate C3b of the first chamber C3, but in reality, the exhaust duct D2 is appropriately installed so as not to penetrate the upper plate C3b.
• the exhaust duct D2 (see FIG. 3) may be inserted into an opening in the side plate W4 (see FIG. 4A and FIG. 4B) that forms the outer surface of the second chamber C2.
• FIG. 4B is a schematic cross-sectional side view taken along line III-III in FIG. 4A. 4B, the second chamber C4 is provided in the range from the floor surface to the upper plate C3b of the first chamber C3 in the vertical direction. The upper part of the second chamber C4 is adjacent to the first chamber C3 via the side plate W3.
• the number of clean rooms that share the first chamber C3 and the second chamber C4 is not limited to two, and may be three or more. Also, the multiple clean rooms R2 and R3 do not have to be adjacent to each other, and may be separated from each other.
• FIG. 5 is an explanatory diagram of a clean room facility 100C according to the second embodiment.
• the clean room facility 100C includes an air conditioner 10, an air supply duct D1, an air supply damper 2, a first chamber C5, air supply side fan filter units 31 and 32, and a clean room R5.
• the clean room facility 100C also includes an exhaust side filter unit 44, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6.
• air from the air conditioner 10 is supplied to the first chamber C5 via the supply air duct D1. Therefore, even when multiple clean rooms are provided, only one supply air duct D1 is required, reducing the number of ducts provided above the ceiling of the clean rooms and increasing the freedom of layout. Also, since there is no particular need to provide the second chamber C2 (see Figure 1) as in the first embodiment, there is no need to adjust the pressure of the second chamber C2. Therefore, the process of room pressure control can be simplified compared to the first embodiment.
• FIG. 6 is an explanatory diagram of a clean room facility 100D according to a first modified example of the second embodiment.
• a local exhaust unit 8 may be provided in the clean room R5.
• the local exhaust unit 8 is a device for exhausting harmful gases and volatile harmful substances.
• a draft chamber also called a fume hood
• the draft chamber is configured to include a housing, a transparent plate provided in the housing, and an exhaust port for exhausting air from the internal space of the transparent plate. Note that a person can handle a predetermined sample while putting his/her hands in and out of the internal space of the transparent plate.
• the exhaust duct D8 shown in FIG. 6 is an air guide tube for guiding air from the local exhaust unit 8 to the exhaust fan 6. As shown in FIG. 6, the exhaust duct D8 is provided with an exhaust damper 52. The upstream end of the exhaust duct D8 is inserted into the exhaust port of the local exhaust unit 8. The downstream end of the exhaust duct D8 is connected to the downstream side of the exhaust damper 51 in another exhaust duct D2. A specified filter (not shown) may be provided downstream of the local exhaust unit 8.
• FIG. 8 is a plan view showing the layout of a clean room facility 100F according to a third modified example of the second embodiment.
• the air supply duct D11 shown in Fig. 8 is an air guide pipe for guiding air from an air conditioner (not shown) to the first chamber C8. Clean air is supplied from the first chamber C8 to the clean rooms R81 and R82 (first clean rooms).
• the first chamber C8 is provided as a common space in the ceiling of the "first zone" in which the clean rooms R81 and R82 (first clean rooms) exist.
• These clean rooms R81 and R82 may be, for example, a predetermined work room and an auxiliary room adjacent to the work room. It is assumed that the type of solvent or the work content used is common in the clean rooms R81 and R82.
• FIG. 9 is an explanatory diagram of a clean room facility 100G according to a fourth modified example of the second embodiment.
• a duct shaft DS1 is provided adjacent to the clean room R10.
• the duct shaft DS1 is an air guide pipe for guiding the air flowing out from the clean room R10 to the exhaust duct D2, and extends in the vertical direction.
• the lower end of the duct shaft DS1 is higher than the height position of the floor surface of the clean room R10.
• the filter 48 shown in Fig. 9 collects dust from the air flowing from the clean room R10 toward the duct shaft DS1, and is fitted near the lower end of the duct shaft DS1.
• a Saran net filter or a Filedon filter is used as such a filter 48.
• the exhaust duct D2 is connected near the upper end of the duct shaft DS1 (i.e., the downstream end of the air flow).
• the second chamber C21 is a space for allowing the air flowing out from the clean room R11 to rise toward the first chamber C11, and is adjacent to the clean room R11.
• the same is true for the second chamber C22 provided corresponding to the other clean room R12.
• the second chambers C21 and C22 may be provided separately, or may be provided integrally like the second chamber C4 in FIG. 4A, either is acceptable. In this way, the second chambers C21 and C22 are provided adjacent to multiple clean rooms R11 and R12.
• the exhaust side fan filter unit 41 includes an exhaust fan 41a (second exhaust fan) and a filter 41b.
• the exhaust fan 41a is a device that exhausts air from the clean room R11, and is provided in the second chamber C21.
• the filter 41b is a device that collects dust from the air flowing from the clean room R11 to the second chamber C21, and is provided on the suction side of the exhaust fan 41a.
• the other fan filter unit 42 has a similar configuration.
• the fourth embodiment differs from the third embodiment in that the first chamber and the second chamber are separated in a plurality of clean rooms R13, R14 (see FIG. 11).
• the rest of the fourth embodiment is similar to the third embodiment. Therefore, only the parts that are different from the third embodiment will be described, and the description of the overlapping parts will be omitted.
• FIG. 11 is an explanatory diagram of a clean room facility 100K according to the fourth embodiment.
• the clean room facility 100K includes an air conditioner 10, air supply ducts D11, D12, air supply dampers 21, 22, first chambers C13, C14, second chambers C23, C24, and air supply side fan filter units 31 to 33.
• the clean room facility 100 also includes clean rooms R13, R14, exhaust side fan filter units 41, 42, exhaust ducts D21, D22, exhaust dampers 51, 52, and an exhaust fan 6. Note that the types of solvents or work contents used may be different in the clean rooms R13, R14.
• the air supply duct D11 is an air guide pipe that guides the air blown out from the air conditioner 10 to the first chamber C13.
• An air supply damper 21 is installed at a predetermined location of the air supply duct D11.
• the other air supply duct D12 is an air guide pipe that guides the air blown out from the air conditioner 10 to the first chamber C14, and is connected to the air supply duct D11.
• An air supply damper 22 is installed at a predetermined location of the air supply duct D12. Note that the air supply duct D12 does not necessarily have to be installed on the ceiling surface of the first chamber C14, and may be installed on the side wall of the first chamber C14, for example. In this case, fewer ducts are required in the space above the ceiling of the clean room, so the labor and costs required for duct construction can be reduced.
• the first chamber C13 and the second chamber C23 provided to correspond to the clean room R13 are mutually connected.
• the first chamber C14 and the second chamber C24 provided to correspond to the clean room R14 are mutually connected.
• those that correspond to a common clean room form a "common chamber” that is mutually connected.
• the "common chamber” corresponding to the clean room R13 and the “common chamber” corresponding to another clean room R13 are adjacent to each other and are separated by a side panel W30 (third partition panel).
• a specific plate material may be provided to narrow the flow path between the first chamber C13 and the second chamber 23 while communicating between them.
• a specific plate material may be arranged to extend upward from the ceiling plate of the clean room R13.
• a specific plate material may be arranged to extend downward from the upper plate C1b of the clean room R13. This makes it possible to reduce the amount of gaseous solvent circulating while reusing the clean air flowing out of the clean room R13.
• the "common chamber” is partitioned for each of the clean rooms R13 and R14, which use different types of solvents and perform different tasks. This makes it possible to prevent, for example, gaseous solvents used in the clean room R13 from flowing into the other clean room R14. In addition, for example, it is possible to reuse a portion of the clean air flowing out of the clean room R13, thereby reducing the number of ventilation cycles of the clean room R13 per unit time while maintaining the clean room R13 in a clean state (the same applies to the other clean room R14).
• FIG. 12A is an explanatory diagram of a clean room facility 100L according to a first modified example of the fourth embodiment.
• the upstream end of the exhaust duct D22 may be connected near the exhaust side fan filter unit 42.
• the upstream end of the exhaust duct D22 may be connected near the area including the intersection with the rotation axis of the exhaust fan 42a on the side plate W24 forming the outer surface of the second chamber C24.
• the same can be said about the connection position of the upstream end of the other exhaust duct D21.
• most of the air blown out from the exhaust fan 42a is exhausted through the exhaust duct D22.
• FIG. 12B is an explanatory diagram of a clean room facility 100M according to a second modified example of the fourth embodiment. 12B, the upstream end of the exhaust duct D21 may be disposed in the internal space of the second chamber C23. This allows most of the air blown out from the fan filter unit 41 to be exhausted through the exhaust duct D21, thereby reducing the amount of gaseous solvent circulated when returning to the clean room R13.
• the exhaust duct D21 may be disposed so as to penetrate the upper plate C1b of the first chamber C13, or may be disposed so as to penetrate a predetermined side plate (not shown) (the same applies to the other exhaust duct D22).
• the exhaust ducts D21 and D22 may be fixed near their upstream ends with a predetermined fixing member (not shown).
• the exhaust duct D21 may be in contact with the wall surface of the second chamber 23 near its upstream end (the same applies to the other exhaust duct D22).
• FIG. 13 is an explanatory diagram of a clean room facility 100N according to a combination of the third and fourth embodiments.
• the clean room facility 100N shown in Fig. 13 includes a clean room unit U1 having a similar configuration to that of the third embodiment (see Fig. 10) and a clean room unit U2 having a similar configuration to that of the fourth embodiment (see Fig. 11).
• the two clean room units U1 and U2 are separated from each other, but they may be adjacent to each other.
• the first chamber C11 is connected to the second chambers C21 and C22.
• the types of solvents and the work content used are the same in the clean rooms R11 and R12, so there is no particular problem if, for example, the gaseous solvent used in the clean room R11 flows into the clean room R12.
• a "common chamber” (first chamber C13 and second chamber C23) corresponding to clean room R13 and a “common chamber” (first chamber C14 and second chamber C24) corresponding to clean room R14 are separated by a side panel W30.
• the types of solvents and work contents used in clean rooms R13 and R14 may be different.
• the two "common chambers" are separated by the side panel W30, it is possible to prevent, for example, gaseous solvents used in clean room R13 from flowing into clean room R14.
• FIG. 14 is an explanatory diagram of a clean room facility 100P according to the first embodiment.
• the clean room facility 100P includes an air conditioner 10, an air supply duct D1, an air supply damper 2, an air supply side filter unit 37, and a clean room R1.
• the clean room facility 100 also includes an exhaust side fan filter unit 41, a second chamber C2, an exhaust duct D2, an exhaust damper 5, and an exhaust fan 6.
• the downstream end of the air supply duct D1 is connected to a filter unit 37 on the air supply side.
• the filter unit 37 is fitted into an opening in the ceiling board C1a of the clean room R1.
• the filter unit 37 allows air from the air conditioner 10 to be supplied to the clean room R1 via the air supply duct D1.
• the second chamber C2 adjacent to the clean room R1 is provided with a fan filter unit 41 on the exhaust side. Air is sent from the clean room R1 to the exhaust fan 6 via the second chamber C2 and exhaust duct D2 in that order.
• a total exhaust system is used in which all the air in the clean room R1 is exhausted, so even if a gaseous solvent is used in the clean room R1, it is possible to prevent some of the solvent exhausted from the clean room R1 from returning to the clean room R1 or flowing into other rooms.
• FIG. 15 is an explanatory diagram of a clean room facility 100Q according to the second embodiment.
• an air supply fan filter unit 32 is provided above the ceiling of clean room R2.
• an air supply fan filter unit 33 is provided above the ceiling of the other clean room R3.
• the downstream side of air supply duct D1 branches into two, one downstream end of which is connected to a filter unit 38 and the other downstream end of which is connected to another filter unit 39.
• the first chamber C1 is the space above the ceiling of the clean room R1. If multiple clean rooms are provided, the first chamber may be provided as a common space above the ceiling of these multiple clean rooms, or the space above the ceiling may be appropriately partitioned.
• the fan filter units 31 and 32 are driven, air from the air conditioner 10 is supplied to the clean room R1.
• the air in the clean room R1 is exhausted through the filter unit 44 without returning to the air conditioner 10.
• the number of "first clean rooms” (clean rooms R81, R82) provided in the "first zone” and the number of “second clean rooms” (clean rooms R91, R92) provided in the “second zone” are two, but this is not limited to the above. That is, the clean rooms may include at least one "first clean room” and at least one "second clean room".
• a first chamber is provided as a common space in the ceiling of the "first zone", which is the area where at least one "first clean room” exists.
• another first chamber is provided as a common space in the ceiling of the "second zone", which is the area where at least one "second clean room” exists.
• the following control may be performed. That is, even if the air conditioning operation or room pressure control for the clean room R1 (see FIG. 1) is temporarily stopped, the exhaust fan 6 may continue to be driven. That is, the exhaust fan 6 (first exhaust fan) may continue to be driven even while the air conditioner 10, the air supply fans 31a, 32a, and the exhaust fan 41a (second exhaust fan) are stopped. In this case, the exhaust damper 5 is maintained in the open state. This makes it possible to prevent the gaseous solvent gas remaining in the second chamber C2 from flowing into the clean room R1 while the air conditioning operation or the like is stopped. The same can be said about the second to fourth embodiments and the first and second reference embodiments.
• the second chamber C2 (see FIG. 1) is provided in the range from the floor surface to the upper plate C1b in the vertical direction, but this is not limited thereto.
• the height position of the second chamber C2 may be lower than the upper plate C1b.
• the exhaust fan 41a may be omitted from the exhaust side fan filter unit 41 (see FIG. 1). The same is true for the second embodiment and the first and second referential embodiments.
• the pressure in the second chamber C2 (see FIG. 1) is adjusted, but the pressure in the first chamber C1 may be adjusted instead of the second chamber C2.
• at least one of the opening degree of the exhaust damper 5, the rotation speed of the exhaust fan 6, and the rotation speed of the fan 13 of the air conditioner 10 is adjusted so that the pressure detection value of the first chamber C1 approaches a predetermined target value. This suppresses pressure fluctuations in the first chamber C1, making it easier to maintain the pressure in the clean room R1 at the predetermined target value.
• the side plate W30 of the clean room R14 is extended upward to form a "partition plate” that separates the two common chambers, but this is not limited to the above.
• the "partition plate” that separates the two common chambers may be a separate member from the side plate W30.
• the gap at the connection point of the "partition plate” may be sealed with a sealant.
• each embodiment can be appropriately combined.
• the first embodiment and the second embodiment may be combined so that the clean room R1 of the clean room facility 100A (first embodiment) shown in Fig. 1 and the clean room R5 of the clean room facility 100C (second embodiment) shown in Fig. 5 are adjacent to each other.
• air is supplied from the air conditioner 10 to the clean rooms R1 and R5 through the supply air duct D1, and the air is exhausted from the clean rooms R1 and R5 through the exhaust duct D2.
• various combinations are possible, such as a combination of the first embodiment and the third embodiment, a combination of the first embodiment and the fourth embodiment, a combination of the second embodiment and the third embodiment, etc.
• the clean room R1 is used as a positive pressure room, but depending on the application, the clean room R1 may be used as a negative pressure room.
• the same can be said for the second to fourth embodiments and the first and second reference embodiments.
• the clean room facility 100 and the like are described as being used for cell culture processing and pharmaceutical manufacturing, but this is not limited to this.
• each embodiment can be applied to various fields such as the manufacturing of semiconductors, precision machinery, and liquid crystal panels, the food industry, the cosmetics industry, and experiments using radioactive materials.
• each embodiment is described in detail to easily explain the present disclosure, and is not necessarily limited to having all of the configurations described.
• the local exhaust unit 8 shown in FIG. 6 according to the first modification of the second embodiment may be added to the clean room facility 100 according to the first or third embodiment.
• the above-mentioned mechanisms and configurations are those considered necessary for the explanation, and do not necessarily show all mechanisms and configurations of the product.

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Citations (7)

• 2024
  • 2024-01-19 JP JP2024564530A patent/JP7825739B2/ja active Active
  • 2024-01-19 WO PCT/JP2024/001524 patent/WO2025154283A1/ja active Pending
  • 2024-10-11 TW TW113138604A patent/TW202530602A/zh unknown

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