Classifications

• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
  • A61K8/00—Cosmetics or similar toiletry preparations
  • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
  • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
  • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
  • A61K8/00—Cosmetics or similar toiletry preparations
  • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
  • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
  • A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
  • A61K8/35—Ketones, e.g. benzophenone
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
  • A61K8/00—Cosmetics or similar toiletry preparations
  • A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
  • A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
  • A61K8/49—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing heterocyclic compounds
• • A—HUMAN NECESSITIES
  • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
  • A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
  • A61Q3/00—Manicure or pedicure preparations
  • A61Q3/04—Nail coating removers

Definitions

• the present invention relates to a nail-coating remover for removing nail polish such as nail enamel and gel nails.
• nail polish removers contain organic solvents such as acetone and ethyl acetate for the reason that they have good nail polish peelability (light removal properties) (Patent Document 1, Patent Reference 2).
• these compounds often cause damage to the nail and periungual skin. In addition, it has a strong odor and is not liked by consumers.
• a nail polish remover with a low concentration of an organic solvent such as acetone has been proposed (Patent Document 3).
• so-called acetone-free nail polish removers that do not contain acetone have also been proposed.
• a nail polish remover containing carbonic acid ester and fatty alcohol as main components has been developed (Patent Document 4).
• the problem to be solved by the present invention is to provide a nail polish remover that does not substantially contain acetone and exhibits sufficient peeling and removability of the nail polish.
• the present inventors have made intensive studies in view of such circumstances, and have found that a composition containing a specific low-molecular-weight diether and/or a specific cyclic ether as a main component can provide excellent nail beauty even if it does not substantially contain acetone.
• the present inventors have found that the material has peeling and removing properties (light removal properties), and have completed the present invention.
• the present invention relates to the following.
• the content of acetone is regulated to 30% by mass or less, and (A) at least one low molecular weight diether selected from the group consisting of methylal, ethylal and monoglyme, and/or (B) from the group consisting of 1,3-dioxolane, 1,4-dioxane, tetrahydrofuran and tetrahydrofurfuryl alcohol
• a nail polish remover containing at least one selected cyclic ether is regulated to 30% by mass or less, and (A) at least one low molecular weight diether selected from the group consisting of methylal, ethylal and monoglyme, and/or (B) from the group consisting of 1,3-dioxolane, 1,4-dioxane, tetrahydrofuran and tetrahydrofurfuryl alcohol
• a nail polish remover containing at least one selected cyclic ether.
• ⁇ 2> (A1) at least one low molecular weight diether selected from the group consisting of methylal and monoglyme, and/or (B1) at least one selected from the group consisting of 1,3-dioxolane and 1,4-dioxane
• the nail polish remover according to ⁇ 1> above which contains a cyclic ether.
• ⁇ 4> The nail polish remover according to any one of ⁇ 1> to ⁇ 3> above, further containing ethanol.
• ⁇ 5> The above ⁇ 1> to ⁇ 4, further comprising at least one thermoplastic resin selected from the group consisting of polyvinyl butyral, polyvinylpyrrolidone, alkyl cellulose, and partially saponified polyvinyl alcohol having a degree of saponification of 1 to 50 mol%.
• ⁇ 6> The nail polish remover according to ⁇ 5> above, which contains at least one thermoplastic resin selected from the group consisting of polyvinyl butyral and polyvinylpyrrolidone.
• ⁇ 7> The nail polish remover according to any one of the above ⁇ 1> to ⁇ 6>, further containing fumed silica.
• the nail polish remover of the present invention does not substantially contain acetone, and therefore avoids damage to the skin and offensive odors caused by acetone, while exhibiting sufficient nail polish removal properties.
• this embodiment is an example for explaining the present invention, and are not intended to limit the present invention to the following contents.
• the present invention can be appropriately modified and implemented within the scope of the gist thereof.
• the description of "XX to YY” means “XX or more and YY or less”.
• nail remover refers to a nail remover capable of removing at least one of non-photocurable nail cosmetics such as nail enamels and photocurable nail cosmetics such as soft gel nails. It means a remover that can remove both nail polishes preferably. However, in gel nails, the main purpose is to remove the base coat.
• the main constituents of the nail polish remover of the present invention are (A) low molecular weight diethers and/or (B) cyclic ethers.
• (A) Low molecular weight diether is at least one low molecular weight diether selected from the group consisting of methylal, ethylal and monoglyme.
• (B) The cyclic ether is at least one cyclic ether selected from the group consisting of 1,3-dioxolane, 1,4-dioxane, tetrahydrofuran and tetrahydrofurfuryl alcohol.
• the main constituents of the nail polish remover of the present invention are preferably (A1) at least one low molecular weight diether selected from the group consisting of methylal and monoglyme and/or (B1) 1,3-dioxolane and 1, It is at least one cyclic ether selected from the group consisting of 4-dioxane, more preferably methylal (low molecular weight diether) and/or 1,3-dioxolane (cyclic ether).
• nail polish removers e.g. methylal and/or cyclic ethers (eg, 1,3-dioxolane) have not heretofore been known as components of nail polish removers (nail polish removers). Having a major component is a novel nail polish remover (nail polish remover composition).
• the main component is at least 5% by weight, preferably 7% by weight or more, and more preferably 7% by weight or more, based on the total weight of the composition. It is preferably 10% by mass or more, typically 15% by mass or more. Furthermore, it is preferably 20% by mass or more, more preferably 30% by mass or more, still more preferably 50% by mass or more, even more preferably 60% by mass or more, and 70% by mass or more. More preferably, it is 75% by mass or more. Although the upper limit is not particularly limited, 100% by mass (total amount) may be composed of main constituents consisting of the above low-molecular-weight diether and cyclic ether.
• the main component consisting of a low-molecular-weight diether and a cyclic ether is at least 5% by weight, preferably 7% by weight, based on the total weight of the composition. % or more, more preferably 10 mass % or more, typically 15 mass % or more. Furthermore, it is preferably 30% by mass or more, more preferably 40% by mass or more, still more preferably 50% by mass or more, even more preferably 60% by mass or more, and 70% by mass or more. is even more preferable.
• the upper limit is not particularly limited, it is preferably 95% by mass or less, more preferably 90% by mass or less, and even more preferably 85% by mass or less in consideration of adding a thickener.
• the specific low-molecular-weight diethers and cyclic ethers that are the main constituents of the present invention are ethers and are generally less irritating than ketone compounds. Therefore, it is understood that ethers, which are the main constituents of the present invention, are less damaging to the skin than acetone, which is a ketone.
• the nail polish remover of the present invention is substantially free of acetone.
• the term “substantially” has a meaning that may be included within the scope of the effects of the present invention.
• the nail polish remover of the present invention can contain a predetermined amount of acetone from the standpoint of releasability, but it is regulated to 30% by mass or less, preferably 20% by mass or less, more preferably 10% by mass. below, more preferably 5% by mass or less, and typically 1% by mass or less.
• the lower limit is preferably not contained at all (0% by mass).
• the nail polish remover of the present invention preferably does not substantially contain ethyl acetate.
• 30% by mass or less more preferably 20% by mass or less, still more preferably 10% by mass or less, still more preferably 5% by mass or less, typically 1% by mass regulated by:
• the lower limit is preferably not contained at all (0% by mass).
• the nail polish remover of the present invention preferably contains a lower monohydric alcohol as an auxiliary solvent in order to improve peeling stability and moisturizing properties.
• a monohydric alcohol having 1 to 4 carbon atoms is preferred.
• Specific examples include methanol, ethanol, N-propanol, isopropanol, n-butanol, isobutanol and the like. Among these, methanol and ethanol are preferred, and ethanol is more preferred.
• the content of the co-solvent is not particularly limited, but is preferably 3% by mass or more, more preferably 5% by mass or more, and preferably 10% by mass or more in terms of mass ratio to the total mass of the composition. More preferred.
• the upper limit is preferably 40% by mass or less, more preferably 30% by mass or less, and even more preferably 25% by mass or less, in consideration of other components.
• the nail polish remover of the present invention can be used according to conventional methods. For example, there is a method of impregnating absorbent cotton or the like with a liquid stripping solution containing the above-mentioned main components, applying the stripping solution, wrapping it with aluminum foil, and allowing it to stand for a predetermined time to strip the stripping solution.
• the remover if necessary, it is also possible to apply directly to the nails from the storage container without using these accessories. That is, it is necessary to give the remover a predetermined viscosity in order to efficiently apply the remover to the nail without dripping when the remover is directly applied to the nail.
• at least one thickener such as an organic thickener or an inorganic thickener may be added to a liquid nail polish remover to form a gel nail polish remover.
• Organic thickeners include A) synthetic polymers: vinyl-based thickeners (polyvinyl alcohol, polyvinylpyrrolidone, polyvinyl butyral, polyacrylic acid, polyacrylamide and derivatives), B) semi-synthetic polymers: 1) cellulose-based thickeners. agent (preferably alkylcellulose: methylcellulose, ethylcellulose, hydroxypropylcellulose, hydroxypropylmethylcellulose, carboxymethylcellulose, etc.) (hydroxycellulose), 2) starch-based thickener (carboxymethylstarch, etc.), C) natural polymer thickener Sticky agent: thermoplastic resins such as plant-based and microbial-based polysaccharides and plant-based polysaccharides.
• A) Synthetic polymer To give an example of a vinyl-based thickener, polyvinylpyrrolidone (Daiichi Kogyo Seiyaku Co., Ltd. “Pittscol” (product numbers: K-90, K-50, K-30)) , (Ashland Co., Ltd. (product numbers: K-120, K-90, K-60, K-30)); -1, BH-3)); partial saponification (for example, saponification degree 1 to 50 mol%) polyvinyl alcohol (“JMR-150L” manufactured by Nippon Vinyl Acetate and Poval Co., Ltd., saponification degree: 23 mol%), etc. mentioned.
• cellulose thickeners include alkyl cellulose, ethyl cellulose (EC, "STD200” manufactured by Dow Chemical Co.); hydroxypropyl cellulose ("Celny H” manufactured by Nippon Soda Co., Ltd.) ”, “Cerny M”, “Cerny L”); Hydroxypropyl methylcellulose (manufactured by Shin-Etsu Chemical Co., Ltd. “Metolose” (product numbers: 60SH-10000, 65SH-4000, 65SH-15000, 95SH-100000)), (Daido "Sangerose” manufactured by Kasei Kogyo Co., Ltd. (product numbers: 60M, 60L, 90L)) and the like.
• starch-based thickeners include hydroxypropyl guar gum manufactured by Sansho Co., Ltd., and the like.
• A) synthetic polymers vinyl thickeners (polyvinyl alcohol, polyvinylpyrrolidone, polyvinyl butyral, polyacrylic acid, polyacrylamide and derivatives),
• B) semi-synthetic polymers A cellulose-based thickener (methylcellulose, ethylcellulose, hydroxycellulose, hydroxypropylcellulose, hydroxypropylmethylcellulose, carboxymethylcellulose, cationized cellulose, hydrophobized cellulose, etc.) is selected, more preferably
• A) synthetic polymer: vinyl-based thickener Viscous agents polyvinyl alcohol, polyvinylpyrrolidone, polyvinyl butyral
• thermoplastic resins such as vinyl thickeners (polyvinylpyrrolidone, polyvinyl butyral).
• the nail polish remover of the present invention may contain at least one thermoplastic resin selected from the group consisting of polyvinyl butyral, polyvinylpyrrolidone, alkyl cellulose and partially saponified polyvinyl alcohol having a degree of saponification of 1 to 50 mol %. More preferably, it contains at least one thermoplastic resin selected from the group consisting of polyvinyl butyral and polyvinylpyrrolidone.
• the organic thickener is preferably used in a mass ratio of 0.1 to 35% by mass, more preferably 0.5 to 35% by mass, and still more preferably 1 to 25% by mass relative to the total mass of the composition. can be done.
• the inorganic thickener used in the present invention is selected from bentonite, fumed silica and the like.
• ammonium salt-modified bentonite ("Esben” series manufactured by Hojun Co., Ltd. (product number: NZ, NTO)
• fumed silica manufactured by Nippon Aerosil Co., Ltd.
• AEROSIL "AEROSIL” series (product numbers: 130, 200, 380 (above, hydrophilic silica), product numbers: R812, R974, R976 (above, hydrophobic silica))
• These inorganic thickeners are preferably in the range of 0.05 to 10% by mass, more preferably 0.5 to 7% by mass, and still more preferably 1 to 5% by mass, relative to the total mass of the composition. can be used.
• fumed silica manufactured by Nippon Aerosil Co., Ltd. "AEROSIL” series (product numbers: 130, 200, 380 (above, hydrophilic silica), product numbers: R812, R974, R976 (above, hydrophobic silica))
• AEROSIL AEROSIL series
• the nail polish remover (remover) of the present invention can contain a surfactant within the range described below.
• the content of the surfactant is preferably 0.1 to 5% by mass, more preferably 0.2 to 2.5% by mass, and still more preferably 0.5 to 1% by mass, relative to the total mass of the composition. % range of surfactants.
• Surfactants used in the present invention include nonionic surfactants, anionic surfactants, cationic surfactants and amphoteric surfactants, and surfactants commonly used in cosmetics are used. It is possible. Nonionic surfactants are preferred.
• KF6011 PEG/PPG20/22 butyl ether dimethicone
• KF6012 PEG11 methyl ether dimethicone
• KF6013 PEG-9 dimethicone
• KF6043 PEG10 dimethicone manufactured by Shin-Etsu Chemical Co., Ltd.
• SH3771M PEG9 dimethicone
• SS2802 PEG10 methyl ether dimethicone
• the nail polish remover of the present invention may contain water in an amount of preferably 10% by weight or less, more preferably 7% by weight or less, typically 5% by weight or less, based on the total weight of the composition. . Although there is no particular lower limit, it is preferable not to include it at all.
• the nail polish remover of the present invention may further contain polyols, carbonate esters, carboxylate esters, etc. in order to improve evaporation inhibition, moisturizing properties and stability.
• polyols such as ethylene glycol, propylene glycol, neopentyl glycol and glycerin
• carbonate esters such as dimethyl carbonate, ethylene carbonate, propylene carbonate and butylene carbonate, methyl acetate, ethyl acetate, methyl lactate, ethyl lactate
• Examples thereof include carboxylic acid esters such as dibasic acid ester (DBE).
• the nail polish remover (remover) of the present invention may contain other organic solvents in an amount of preferably 10% by weight or less, more preferably 7% by weight or less, typically 5% by weight or less.
• the nail polish remover of the present invention may contain colorants selected from the group consisting of soluble dyes, synthetic dyes, natural dyes, pigments, pearl oysters.
• examples of statutory colorants for cosmetics include Blue No. 2, Blue No. 205, Blue No. 404, Red No. 218, Red No. 230, Red No. 201, and Yellow No. 4.
• examples of natural pigments include red radish pigments and chlorella powder preparations.
• a thermochromic dye thermochromic
• thermochromic pigment / thermosensitive powder for cosmetics / 31 degree thermosensitive pigment for nail polish “2019 thermochromic pigment / thermosensitive powder for cosmetics / 31 degree thermosensitive pigment for nail polish”
• Thermolock manufactured by Matsui Pigment Chemical Industry Co., Ltd.
• Thermal Color Recording Material General Co., Ltd. Laboratory
• the nail polish remover of the present invention may preferably contain a colorant in an amount of 10% by weight or less, more preferably 7% by weight or less, typically 5% by weight or less.
• nail polish remover The form of the nail polish remover (remover) of the present invention may be liquid or gel.
• the nail polish remover of the present invention can effectively remove especially the base coat portion of photocurable nail cosmetics such as soft gel nails.
• non-photocurable nail cosmetics such as nail enamel can also be effectively removed.
• Test/evaluation method 1 Preparation of Gel Sample A circle of ⁇ 10 mm was drawn on a pig's hoof, and about 40 mg of the base gel was evenly applied within the circle. At this time, "SHINYGEL Professional”"powerbase” (bis-HEMA copolymer) manufactured by World Beauty Works Co., Ltd. was used as the base, and "SHINYGEL 127 Pure Red” was used as the color. The applied gel was irradiated with an LED and cured. After that, the color gel was scraped (to 90%) with a file to expose the base surface.
• SHINYGEL Professional bis-HEMA copolymer manufactured by World Beauty Works Co., Ltd.
• SHINYGEL 127 Pure Red was used as the color.
• the applied gel was irradiated with an LED and cured. After that, the color gel was scraped (to 90%) with a file to expose the base surface.
• Peelability liquid nail polish remover and thickener-containing nail polish remover 2-1 above. and 2-2.
• the peelability explained in 1 was evaluated in the following 7 stages. Specifically, the state of the cured gel after peeling treatment was observed, and the ratio of the region (area) where the cured gel (coating film) was peeled off was distinguished and evaluated.
• THF tetrahydrofuran
• THFA tetrahydrofurfuryl alcohol
• PVB polyvinyl butyral
• PVA polyvinyl alcohol
• HPC manufactured by Japan Vinyl Poval Co., Ltd.
• Hydroxypropyl cellulose “NISSO HPC”
• HPMC hydroxypropyl methylcellulose
• PVP K-90 polyvinylpyrrolidone: "Pittscol K-90 ”, Daiichi Kogyo Seiyaku Co., Ltd.
• PVP K-120 polyvinylpyrrolidone: Ashland Japan Co., Ltd.
• fumed silica 1 hydrophobic fumed silica: “AEROSIL R974”, Japan Aerosil Co., Ltd.
• fumed silica 2 hydrophilic fumed silica
• the nail polish remover of the present invention contains a specific low-molecular-weight diether or a specific cyclic ether, does not substantially contain acetone, and is liquid. Even if it is in the form of a gel (containing a thickener), it avoids damage to the skin and offensive odor caused by acetone, and at the same time exhibits practically sufficient detachability of the nail polish. In addition, it was confirmed that some gel nail polish removers exhibit even better applicability and film-forming properties.

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• 2021
  • 2021-07-08 JP JP2021575404A patent/JP7144891B1/ja active Active
  • 2021-07-08 WO PCT/JP2021/025711 patent/WO2023281678A1/ja not_active Ceased

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