WO2023174186A1 - Manufacturing method for packaging structure, and packaging structure - Google Patents

Manufacturing method for packaging structure, and packaging structure Download PDF

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Publication number
WO2023174186A1
WO2023174186A1 PCT/CN2023/080944 CN2023080944W WO2023174186A1 WO 2023174186 A1 WO2023174186 A1 WO 2023174186A1 CN 2023080944 W CN2023080944 W CN 2023080944W WO 2023174186 A1 WO2023174186 A1 WO 2023174186A1
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WO
WIPO (PCT)
Prior art keywords
semiconductor chip
coupling area
light coupling
packaging structure
protection ring
Prior art date
Application number
PCT/CN2023/080944
Other languages
French (fr)
Chinese (zh)
Inventor
王宏杰
孟怀宇
沈亦晨
Original Assignee
上海曦智科技有限公司
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Filing date
Publication date
Application filed by 上海曦智科技有限公司 filed Critical 上海曦智科技有限公司
Publication of WO2023174186A1 publication Critical patent/WO2023174186A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N

Definitions

  • the present application relates to the field of semiconductor packaging, and more specifically, to a manufacturing method and packaging structure of a packaging structure.
  • packaging structures with high integration density are becoming more and more important.
  • 3D packaging structures can be used to stack chips on top of each other.
  • the electrical chip (Electronic Integrated Circuit Chip, EIC, Electronic integrated chip) and the optical chip (Photonic Integrated Circuit Chip, PIC, Photonic integrated chip) among the existing silicon photonic chips adopt different wafer generation processes and adopt the chip level.
  • Interconnection (such as wire bonding or flip-chip interconnection) is used to realize the connection between the electrical chip (EIC) and the optical chip (PIC) to form a three-dimensional interconnection structure.
  • optical chip In the three-dimensional packaging of optical chips (PIC) and electrical chips (EIC), in order to avoid warping caused by thinning the optical chip (PIC), which may lead to misalignment or failure of the connection points between the optical chip (PIC) and the electrical chip (EIC), Or in order to make the packaging of the optical chip (PIC) and the electrical chip (EIC) have higher strength, it is usually necessary to form a plastic sealing layer on the surface of the optical chip (PIC).
  • the optical chip (PIC) has a fiber coupling interface for input light. Directly molding the surface of the optical chip (PIC) will cause damage to the fiber coupling interface, resulting in a significant increase in the insertion loss of the fiber coupling interface and affecting the optoelectronic chip. actual use.
  • Embodiments of the present application provide a manufacturing method and packaging structure of a packaging structure to solve the problem of using plastic packaging materials to fix photonic integrated circuit chips-electronic integrated circuit chips to improve packaging strength and avoid warping of the photonic integrated circuit chips.
  • the optical fiber coupling interface interface on the photonic integrated circuit chip forms a protection to prevent the optical coupling interface interface on the photonic integrated circuit chip from being contaminated by organic matter in the plastic sealing layer.
  • Embodiments of the present application provide a method for manufacturing a packaging structure and a packaging structure.
  • embodiments of the present application provide a method for manufacturing a packaging structure, including: providing a semiconductor wafer, the semiconductor wafer including a plurality of first semiconductor chips, each of the first semiconductor chips having an opposite first surface and A second surface, a light coupling area and a non-light coupling area surrounding the light coupling area are provided on the first surface, and an light coupling interface is provided in the light coupling area; for each of the first semiconductor chips, Provide at least one second semiconductor chip and a light coupling area protection ring corresponding to the first semiconductor chip, and fix the at least one second semiconductor chip and the light coupling area protection ring to all parts of the first semiconductor chip respectively.
  • the light coupling area protective ring surrounds the light coupling area; a plastic encapsulation layer is produced, and the plastic encapsulation layer covers the at least one second semiconductor chip and the The light coupling area protection ring is away from the outer surface of the light coupling area and the plastic sealing layer does not cover the area other than the light coupling area protection ring.
  • the light coupling region protection ring in a direction perpendicular to the first surface, is away from a top surface of the first surface and the at least one second semiconductor chip is away from a top surface of the first surface.
  • the top surface is flush.
  • the manufacturing of the plastic packaging layer includes: providing a plastic packaging mold, the plastic packaging mold having a plurality of U-shaped cavities corresponding to the plurality of first semiconductor chips, and in each of the cavities A gel-like plastic sealing material is provided in a preset area of the body; the plastic sealing mold provided with the gel-like plastic sealing material is inverted and pressed on the first surface of the semiconductor wafer to form the plastic sealing layer.
  • the preparation of the plastic sealing layer further includes: when the plastic sealing mold is inverted and pressed onto the semiconductor wafer, the top surface of the light coupling area protection ring away from the first surface and The bottom of the cavity fits.
  • the preparation of the plastic sealing layer further includes: before setting the gel-like plastic sealing material Before, a glue-repellent layer is provided at the bottom of each cavity, and the glue-like plastic sealing material is provided in the preset area of the glue-repellent layer.
  • the preparation of the plastic sealing layer further includes: when the plastic sealing mold is inverted and pressed onto the semiconductor wafer, the top surface of the light coupling area protection ring away from the first surface and The glue-repellent layer is attached.
  • the molding mold is removed.
  • the semiconductor wafer is cut to obtain a plurality of separate chip packaging components.
  • Each of the chip packaging components includes a first semiconductor chip, a corresponding at least one first semiconductor chip, and a first semiconductor chip. 2.
  • each of the chip packaging components is mounted on a corresponding packaging substrate; and a light guide structure or a laser chip is mounted on the first semiconductor on the optical coupling interface of the chip.
  • a plurality of conductive channels are made in each first semiconductor chip, and both sides of each conductive channel are exposed from both sides of the first semiconductor chip.
  • first conductive bumps are formed on the exposed one side surface of each conductive channel.
  • the side surface of each first semiconductor chip close to the first conductive bump is connected to a first conductive bump.
  • the two carrier substrates are temporarily bonded; and, second conductive bumps are formed on the exposed other side surface of each conductive channel of each first semiconductor chip.
  • the first semiconductor chip is placed close to the second conductive bump.
  • One side surface of the bump is temporarily bonded to the first carrier substrate; and the second carrier substrate is debonded.
  • the first semiconductor chip is a photonic integrated circuit chip
  • the second semiconductor chip is an electronic integrated circuit chip.
  • the light coupling area protection ring is a hollow tubular structure or a hollow cup-shaped structure with a top cover.
  • the light coupling region protection ring includes at least one of metal, ceramic, and silicon.
  • embodiments of the present application further provide a packaging structure, including: a first semiconductor chip, the first semiconductor chip having an opposite first surface and a second surface, and an optical coupling region is provided on the first surface. and a non-optical coupling area surrounding the optical coupling area, an optical coupling interface is provided in the optical coupling area; at least one second semiconductor chip and an optical coupling area protection ring, the at least one second semiconductor chip and the optical coupling area Coupling area protection rings are respectively fixed on the non-light coupling areas of the first surface, wherein the light coupling area protection rings surround the light coupling area; a plastic sealing layer covers the at least one The second semiconductor chip and the light coupling area protection ring are away from the outer surface of the light coupling area and the plastic sealing layer does not cover the area occupied by the light coupling area protection ring.
  • the top surface of the light coupling area protection ring away from the first surface is flush with the top surface of the plastic sealing layer away from the first surface.
  • the top surface of the at least one second semiconductor chip away from the first surface is exposed outside the plastic encapsulation layer, and in a direction perpendicular to the first surface, the light coupling region A top surface of the protective ring away from the first surface is flush with a top surface of the at least one second semiconductor chip away from the first surface.
  • the light coupling area protection ring is a hollow tubular structure or a cup-shaped structure with a hollow structure and a top cover.
  • the light coupling region protection ring includes at least one of metal, ceramic, and silicon.
  • the light coupling area protection ring when the light coupling area protection ring has a cup-shaped structure, its hollow structure and the top cover are bonded through an adhesive layer.
  • the manufacturing method and packaging structure of the packaging structure according to the embodiment of the present invention can prevent the upper surface of the optical coupling area from being covered by the plastic sealing layer, protect the optical coupling interface in the optical coupling area from being contaminated by organic matter in the plastic sealing layer, and at the same time ensure The surface of the optical coupling area is pure, which is conducive to the subsequent optical coupling interface and the fiber array. Maintain high coupling efficiency.
  • FIG. 1 is a flow chart of a method for manufacturing a packaging structure according to an embodiment of the present invention.
  • 2A-2C are schematic diagrams of the manufacturing process of a packaging structure manufacturing method according to an embodiment of the present invention.
  • FIG. 3 is a schematic plan view of a first semiconductor chip provided according to an embodiment of the present invention.
  • FIG. 4 is a schematic top structural view of a packaging structure with a semiconductor chip provided according to an embodiment of the present invention.
  • 5A-5B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to an embodiment of the present invention.
  • 6A-6B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to another embodiment of the present invention.
  • Figures 7-8 illustrate the manufacturing process of a method for manufacturing a packaging structure according to an embodiment of the present invention. Schematic diagram.
  • FIG. 9 is a schematic diagram of a chip-scale packaging structure according to an embodiment of the present invention.
  • FIG. 10 is a schematic diagram of the connection between a chip-scale packaging structure and a packaging substrate according to an embodiment of the present invention.
  • 11A-11C are schematic diagrams of the manufacturing process of a method for manufacturing a packaging structure according to another embodiment of the present invention.
  • connection should be understood in a broad sense.
  • connection or integral connection; it can be mechanical connection, electrical connection or mutual communication; it can be direct connection, or indirect connection through an intermediary, it can be internal connection of two elements or interaction of two elements relation.
  • the meaning of chip in this article may include bare chips.
  • embodiments of the present invention propose a packaging structure with an optical interconnection interface
  • the manufacturing method adopts the method of stacking the electrical chip and the optical chip and then plastic packaging, which ensures the reliability of the package interconnection and at the same time realizes the protection of the optical fiber coupling interface.
  • FIG. 1 is a flow chart of a method for manufacturing a packaging structure according to an embodiment of the present invention.
  • the manufacturing method of the packaging structure includes:
  • the semiconductor wafer includes a plurality of first semiconductor chips, each The first semiconductor chip has an opposite first surface and a second surface. A light coupling area and a non-light coupling area surrounding the light coupling area are provided on the first surface. A light coupling area is provided in the light coupling area. coupling interface;
  • each first semiconductor chip For each first semiconductor chip, provide at least one second semiconductor chip and a light coupling area protection ring corresponding to the first semiconductor chip, and connect the at least one second semiconductor chip and the light coupling area Protective rings are respectively fixed on the non-light coupling areas of the first surface of the first semiconductor chip, wherein the light coupling area protection rings surround the light coupling areas;
  • the plastic encapsulation layer covers the at least one second semiconductor chip and the optical coupling area protection ring away from the outer surface of the optical coupling area.
  • the plastic encapsulation layer does not cover the optical coupling area protection ring. The area occupied by the ring.
  • FIGS. 2A-2C are schematic diagrams of the manufacturing process of a packaging structure manufacturing method according to an embodiment of the present invention.
  • FIG. 3 is a schematic plan view of a first semiconductor chip provided according to an embodiment of the present invention.
  • FIG. 4 is a schematic top view of a packaging structure with a semiconductor chip according to an embodiment of the present invention. The embodiment of the present invention will be described in detail below with reference to FIGS. 2A-2C, 3 and 4.
  • the first semiconductor chip 102 is an optical chip (photonic integrated circuit chip, PIC), where the optical chip uses photons as information carriers to process information and transmit data.
  • PIC photonic integrated circuit chip
  • the second semiconductor chip 103 is an electrical chip (electronic integrated circuit chip, EIC), wherein the electrical chip uses electrons as the information carrier to process information and transmit data
  • EIC electronic integrated circuit chip
  • silicon-based electrical chips, germanium-based electrical chips or compound semiconductor electrical chips the integration of optical chips and electrical chips can be achieved by stacking the first semiconductor chip 102 and the second semiconductor chip 103 .
  • a first carrier substrate 200 and a semiconductor wafer 100 having a plurality of first semiconductor chips 102 located on the first carrier substrate 200 are provided.
  • Each of the first semiconductor chips 102 is The chip 102 has an opposite first surface 102a and a second surface 102b, and the second surface 102b is temporarily bonded to the first carrier substrate 200 through a bonding glue 201.
  • a light coupling region 1024 and a non-light coupling region 1025 surrounding the light coupling region 1024 are provided on the first surface 102 a of the first semiconductor chip 102 .
  • the light coupling region 1024 An optical coupling interface 104 is provided inside, and the light provided by the external light source can pass through the optical fiber array. (Fiber Array, FA) is input into the optical coupling interface 104, for example, coupled into the first semiconductor chip 102 through a grating coupler in the optical coupling interface 104. It should be noted that in other embodiments, other optical interconnection interfaces or devices for transmitting optical signals may also be provided in the optical coupling interface 104 accordingly.
  • each first semiconductor chip 102 at least one second semiconductor chip 103 corresponding to the first semiconductor chip 102 and the optical coupling region protection ring 400 are provided, and The at least one second semiconductor chip 103 and the light coupling area protection ring 400 are respectively fixed on the non-light coupling area 1025 of the first surface 102a of the first semiconductor chip 102, for example, welding or other methods may be used.
  • the optical coupling area protection ring 400 surrounds the optical coupling area 1024.
  • the embodiment of the present invention illustrates that one second semiconductor chip 103 is formed above the first semiconductor chip 102.
  • the plastic sealing layer and the like include organic materials, organic matter contacting the optical coupling area 1024 will cause organic matter residues, which will affect the coupling efficiency of the optical coupling interface 104 , resulting in serious light loss and affecting the operation of the first semiconductor chip 102 .
  • embodiments of the present invention fabricate an optical coupling area protection ring 400 surrounding the optical coupling area 1024 around the optical coupling area 1024.
  • the light coupling area protection ring 400 is a hollow tubular structure or a hollow cup-shaped structure with a top cover.
  • the light coupling area protection ring 400 can be Let the upper surface of the light coupling region not be covered by the plastic sealing layer, so that the plastic sealing layer only covers the at least one second semiconductor chip 103 and the outer surface of the light coupling region protection ring 400 away from the light coupling region 1024 and covers everything except
  • the non-optical coupling area 1025 outside the area occupied by the optical coupling area protection ring 400 not only protects the optical coupling interface 104 in the optical coupling area 1024 from being contaminated by organic matter in the plastic layer, but also ensures the surface of the optical coupling area 1024 Pure, which helps the subsequent optical coupling interface 104 maintain a higher coupling efficiency with the optical fiber array.
  • the optical coupling area protection ring 400 has a hollow cup-shaped structure with a top cover
  • the top cover needs to be removed to expose the light coupling area 1024, so as to facilitate subsequent input of light from an external light source into the first semiconductor chip 102 through the light coupling interface 104.
  • the coupling area protection ring 400 has a cup-shaped structure
  • its hollow structure and the top cover are bonded through an adhesive layer.
  • the adhesive layer can be removed by illumination, heating, etc., so that the optical coupling can be better protected.
  • area 1024, and the optical coupling area 1024 can be subsequently packaged conveniently. If the light coupling area protection ring 400 has a hollow tubular structure, the light coupling area 1024 can be directly exposed.
  • the optical coupling area protection ring 400 includes at least one of metal, ceramic, and silicon.
  • the optical coupling area protection ring 400 is made of a material with a thermal expansion coefficient and stiffness similar to those of the first semiconductor chip 102, such as ceramics or silicon.
  • the light coupling area protection ring 400 is fixed on the non-light coupling area 1025 of the first surface 102a of the first semiconductor chip 102 by substrate bonding or colloid bonding.
  • the light coupling area protection ring 400 is away from the top surface of the first surface 102a and the at least one second semiconductor chip 103 is away from the first surface.
  • the top surface of 102a is flush.
  • 5A-5B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to an embodiment of the present invention.
  • the production of the plastic packaging layer includes: providing a plastic packaging mold 800 , the plastic packaging mold 800 has a plurality of first semiconductor chips 102 corresponding to each other in a one-to-one manner.
  • a gel-like plastic sealing material 1061 such as plastic sealant, etc., is provided at a preset area in each cavity 801; then, the plastic mold mold provided with the gel-like plastic sealing material 1061 is 800 is inverted and pressed on the side surface of the semiconductor wafer 100 facing away from the first carrier substrate 200 to form the plastic sealing layer 106 .
  • the preset area refers to placing plastic glue in the area outside the corresponding light coupling area protection ring 400 and light coupling area 1024 of each cavity 801, and using the plastic glue to prevent random fluid movement.
  • the characteristics of gravity drop can ensure that the plastic sealant is evenly filled into the gaps that need to be filled during the process of inverting and pressing the plastic mold 800 provided with the plastic sealant, and can also ensure that the optical coupling area 1024 The plastic sealant will not fall out, thereby protecting the optical coupling interface 104 in the optical coupling area 1024 from being contaminated by the plastic sealant. Subsequently, by heating and solidifying the plastic sealant, you can obtain A 3D chip stack packaging structure in which the optical coupling area 1024 is not covered by the plastic encapsulation layer 106 .
  • the inner wall of the U-shaped cavity is smooth.
  • the internal structure of the U-shaped cavity can be designed according to the shape of the plastic sealing layer to be formed. This embodiment of the present invention is not limited here.
  • the top surface of the optical coupling area protection ring 400 away from the first surface 102 a is in contact with the cavity.
  • the bottom of 801 is attached, so that after the glue-like molding material 1061 is cured to form the molding layer 106, the light coupling area protection ring 400 is moved away from the The top surface of the first surface 102a is flush with the top surface of the plastic sealing layer 106 away from the first surface 102a.
  • the top surface of the optical coupling area protection ring 400 away from the first surface 102a is flush with the top surface of the at least one second semiconductor chip 103 away from the first surface 102a.
  • the top surface of the at least one second semiconductor chip 103 away from the first surface 102a can be exposed outside the molding layer 106 , which is not only beneficial to the volume of the packaging structure Being smaller is also beneficial to the heat dissipation of the at least one second semiconductor chip 103 .
  • it also saves the subsequent thinning process of the plastic encapsulation layer 106 to expose the top surface of the at least one second semiconductor chip 103 away from the first surface 102a, which is beneficial to the simplification of the manufacturing process and the manufacturing cost. of reduction.
  • 6A-6B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to another embodiment of the present invention.
  • the preparation of the plastic sealing layer further includes: before disposing the gel-like plastic sealing material 1061, at the bottom of each cavity 801 A glue-repellent layer 901 is provided, and the glue-like plastic sealing material 1061 is provided at the preset area of the glue-repellent layer 901 .
  • the preset area refers to the area outside the corresponding light coupling area protection ring 400 and light coupling area 1024 of each cavity 801 in which the plastic sealant is disposed.
  • the material of the glue-repellent layer 901 is Teflon, etc.
  • the glue-repellent layer 901 has glue-repellent properties, that is, it has repellency to colloids. In this way, the pre-position of the glue-repellent layer 901 Where the gel-like plastic sealing material 1061 is provided in an area
  • the plastic sealing mold 800 provided with plastic sealant is inverted and pressed, the plastic sealant will not adhere to the surface of the rubber-repellent layer 901 and the side wall near the bottom of the cavity 801, and it will also facilitate plastic sealing. After solidification, the glue is separated from the plastic sealing mold 800 .
  • FIGS. 7-8 are schematic diagrams of the manufacturing process of a method for manufacturing a packaging structure according to an embodiment of the present invention.
  • FIG. 9 is a schematic diagram of a chip-scale packaging structure according to an embodiment of the present invention.
  • FIG. 10 is a schematic diagram of the connection between a chip-scale packaging structure and a packaging substrate according to an embodiment of the present invention.
  • the method of manufacturing the packaging structure further includes: removing the plastic mold 800 after forming the plastic layer 106 .
  • the method of manufacturing the packaging structure further includes: debonding the first carrier substrate 200 after removing the plastic mold 800 .
  • each chip package component 1000 has a first semiconductor chip 102 , corresponding at least one second semiconductor chip 103 , an optical coupling area protection ring 400 and a plastic encapsulation layer 106 .
  • the surface strength of the semiconductor wafer 100 is improved. Therefore, even when the semiconductor wafer 100 is front-cut, the semiconductor wafer 100 is less likely to be chipped due to cutting. risk of fragmentation.
  • each of the chip packaging components 1000 is mounted on the corresponding packaging substrate 700 .
  • the second conductive bump 1023 on the chip package assembly 1000 having at least one second conductive bump 1023 is bonded to an electrical connection point (not shown) on the packaging substrate 700 .
  • additional discrete devices such as capacitors, resistors, and inductors can be mounted or integrated on the packaging substrate 700 .
  • the light guide structure 600 or the laser chip is mounted to the optical coupling interface. 104 on.
  • the light guide structure 600 is a fiber array (Fiber Array, FA).
  • the light guide structure 600 can be a prism, which guides the laser beam to the optical coupling interface 104 through a laser integration method. Specifically, the laser beam emitted by the laser chip passes through the lens and is incident on the prism, and the prism will The laser beam is coupled into the first semiconductor chip 102 through the optical coupling interface 104 .
  • the laser chip can be installed directly above the optical coupling interface 104 so that the laser beam emitted by the laser chip is aimed at the optical coupling interface 104 and the laser beam can be directly coupled to the first semiconductor chip 102 .
  • Installing the laser chip above the optical coupling interface 104 can greatly simplify the device structure and improve the integration level.
  • 11A-11C are schematic diagrams of the manufacturing process of a method for manufacturing a packaging structure according to another embodiment of the present invention.
  • the manufacturing method of the packaging structure provided by the embodiment of the present invention further includes: fixing the at least one second semiconductor chip 103 and the optical coupling area protection ring 400 to the corresponding first Before forming on the non-light coupling area 1025 of the first surface 102a of the semiconductor chip 102, a plurality of conductive channels 1021 are made in each first semiconductor chip 102, and both sides of each conductive channel 1021 are They are respectively exposed from both sides of the first semiconductor chip 102 .
  • the conductive channel 1021 can be formed by connecting multiple sections of conductive layers and manufactured separately in multiple processes.
  • the first semiconductor chip 102 is a silicon-based optical chip
  • a plurality of conductive vias are made in the substrate in the first semiconductor chip 102, and the conductive vias may be manufactured using "through silicon vias" (through silicon vias).
  • through silicon vias through silicon vias.
  • TSV Through Silicon Via
  • TSV is a high-density packaging technology that is gradually replacing the current relatively mature wire bonding technology and is considered a fourth-generation packaging technology.
  • TSV technology realizes the vertical electrical interconnection of through silicon holes by filling them with conductive materials such as copper, tungsten, and polysilicon.
  • the TSV process can include deep silicon etching to form microvias or blind vias, deposition of insulating layers/barrier layers/seed layers, deep hole filling, chemical mechanical polishing, thinning, and redistribution lead preparation and other process technologies in optical chips.
  • Process methods for forming conductive vias include but are not limited to laser etching, deep reactive ion etching, etc. After forming the conductive vias, processes such as deep hole filling are used to fill the conductive material (eg, metal). The present invention will not be described in detail here.
  • a first conductive channel is formed on the exposed side surface of each conductive channel 1021 .
  • the first conductive bumps 1022 are, for example, pads (metal bumps) or solder balls.
  • First conductive bumps 1022 are made on the exposed surface of each conductive channel 1021 to achieve The conductive channel 1021 is electrically connected to an external electrical connection point.
  • the first surface 102 a of the first semiconductor chip 102 having at least one first conductive bump 1022 is temporarily bonded to the second carrier substrate 300 through the bonding glue 301 .
  • each of the conductive channels 1021 of the first semiconductor chip 102 Second conductive bumps 1023 are formed on the exposed other side surface.
  • the third conductive bump 1023 will be provided with at least one second conductive bump 1023 .
  • the second surface 102b of a semiconductor chip 102 is temporarily bonded to the first carrier substrate 200 through the bonding glue 201, and the second carrier substrate 300 is debonded, thereby obtaining the first carrier substrate 200 as shown in FIG. 2A and a structure composed of a semiconductor wafer 100 including a plurality of first semiconductor chips.
  • a plurality of third conductive bumps 1032 are made on one side of the second semiconductor chip 103 , wherein the plurality of third conductive bumps 1032 are connected to each of the The first conductive bumps 1022 on the conductive channel 1021 correspond one to one.
  • Each third conductive bump 1032 is bonded to the corresponding first conductive bump 1022 to fixedly connect the second semiconductor chip 103 and the first semiconductor chip 102 together.
  • the second semiconductor chip 103 is soldered to the first semiconductor chip 102 using flip-chip soldering.
  • Each third conductive bump 1032 is bonded to the corresponding first conductive bump 1022 by thermal compression bonding (TCB), reflow soldering, or laser bonding. Or metal direct bonding, etc. If the second semiconductor chip 103 has metal solder balls or metal bumps, an underfill process is also required. It should be understood that according to actual needs, multiple second semiconductor chips 103 can also be connected to the same first semiconductor chip 102.
  • the one-to-one correspondence between the plurality of third conductive bumps 1032 and the first conductive bumps 1022 on each of the conductive channels 1021 is for the purpose of one-to-one correspondence when the electrical signal terminals are connected, and is not completely It is limited to a one-to-one correspondence between the upper and lower projection positions. It should be understood that when the plurality of third conductive bumps 1032 also correspond to the first conductive bumps 1022 and lower projection positions on each of the conductive channels 1021, the first semiconductor chip 102 and the second semiconductor chip 103 Up and down vertically mutually The required connection distance is the shortest.
  • a packaging structure is also provided.
  • the packaging structure provided by the embodiment of the present invention includes: a first semiconductor chip 102, at least one second semiconductor chip 103, an optical coupling area protection ring 400, and a plastic sealing layer 106.
  • the first semiconductor chip 102 has an opposite first surface 102a and a second surface 102b.
  • a light coupling region 1024 and a non-light coupling region 1025 surrounding the light coupling region 1024 are provided on the first surface 102a.
  • An optical coupling interface 104 is provided in the coupling area 1024; the at least one second semiconductor chip 103 and the optical coupling area protection ring 400 are respectively fixed on the non-optical coupling area 1025 of the first surface 102a; wherein, The light coupling area protection ring 400 surrounds the light coupling area 1024; the plastic encapsulation layer 106 covers the at least one second semiconductor chip 103 and the light coupling area protection ring 400 is away from the outside of the light coupling area 1024. surface and does not cover the area occupied by the light coupling area protection ring 400 .
  • the light coupling area protection ring 400 is away from the top surface of the first surface 102a and the plastic sealing layer 106 is away from the top surface of the first surface 102a. Flush.
  • the top surface of the at least one second semiconductor chip 103 away from the first surface 102a is exposed outside the plastic encapsulation layer 106, and in a direction perpendicular to the first surface 102a, the light coupling
  • the top surface of the area protection ring 400 away from the first surface 102a is flush with the top surface of the at least one second semiconductor chip 103 away from the first surface 102a.
  • the optical coupling area protection ring 400 is a hollow tubular structure or a hollow cup-shaped structure with a top cover.
  • the optical coupling area protection ring 400 includes at least one of metal, ceramic, and silicon.
  • the optical coupling area protection ring 400 is made of a material with a thermal expansion coefficient and stiffness similar to those of the first semiconductor chip 102, such as ceramics or silicon.
  • the light coupling area protection ring 400 is fixed on the non-light coupling area 1025 of the first surface 102a of the first semiconductor chip 102 by substrate bonding or colloid bonding.
  • the manufacturing method and packaging structure of the packaging structure include: providing a semiconductor wafer, the semiconductor wafer includes a plurality of first semiconductor chips, and a plurality of first semiconductor chips on the semiconductor wafer.
  • the semiconductor chip forms an integral structure, and for each first semiconductor chip, an optical coupling area protection ring surrounding the optical coupling area is made on the non-optical coupling area of the first semiconductor chip, so that the non-optical coupling area of the first semiconductor chip
  • a plastic sealing layer on the optical coupling area make sure that the upper surface of the optical coupling area is not covered by the plastic sealing layer.
  • optical coupling interface in the optical coupling area not only protects the optical coupling interface in the optical coupling area from being contaminated by organic matter in the plastic sealing layer, but also ensures that the surface of the optical coupling area is pure and has This is conducive to the subsequent optical coupling interface being able to maintain a high coupling efficiency with the optical fiber array.

Abstract

Disclosed are a manufacturing method for a packaging structure, and a packaging structure. The method comprises: providing a semiconductor die, the semiconductor die comprising a plurality of first semiconductor chips, and the plurality of first semiconductor chips on the semiconductor die forming an integral structure; and for each of the first semiconductor chips, manufacturing, on a non-optical coupling area of the first semiconductor chip, an optical coupling area protection ring surrounding an optical coupling area, so that when a plastic packaging layer is manufactured on the non-optical coupling area of the first semiconductor chip, the upper surface of the optical coupling area is not covered by the plastic packaging layer, an optical coupling interface in the optical coupling area is protected from being contaminated by an organic matter in the plastic packaging layer, and the surface purity of the optical coupling area is ensured, thereby facilitating the optical coupling interface maintaining high coupling efficiency with an optical fiber array in the subsequent process.

Description

封装结构的制作方法及封装结构Manufacturing method and packaging structure of packaging structure
本申请要求于2022年03月18日提交中国专利局、申请号为202210272769.3、发明名称为“封装结构的制作方法及封装结构”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to the Chinese patent application submitted to the China Patent Office on March 18, 2022, with the application number 202210272769.3 and the invention title "Method for making a packaging structure and packaging structure", the entire content of which is incorporated into this application by reference. middle.
技术领域Technical field
本申请涉及半导体封装领域,更为具体而言,涉及一种封装结构的制作方法及封装结构。The present application relates to the field of semiconductor packaging, and more specifically, to a manufacturing method and packaging structure of a packaging structure.
背景技术Background technique
随着半导体技术的日益发展,具有高的集成密度的封装结构越来越重要。例如,采用3D封装结构可以实现芯片与芯片之间的相互堆叠。With the increasing development of semiconductor technology, packaging structures with high integration density are becoming more and more important. For example, 3D packaging structures can be used to stack chips on top of each other.
目前现有的硅光芯片中的电芯片(电子集成电路芯片,EIC,Electronic integrated chip)和光芯片(光子集成电路芯片,PIC,Photonic integrated chip)由于采用不同的晶圆生成工艺制程,采用芯片级别的互连(例如打线或倒装的互连方式)来实现电芯片(EIC)与光芯片(PIC)之间的连接,形成三维互连结构。Currently, the electrical chip (Electronic Integrated Circuit Chip, EIC, Electronic integrated chip) and the optical chip (Photonic Integrated Circuit Chip, PIC, Photonic integrated chip) among the existing silicon photonic chips adopt different wafer generation processes and adopt the chip level. Interconnection (such as wire bonding or flip-chip interconnection) is used to realize the connection between the electrical chip (EIC) and the optical chip (PIC) to form a three-dimensional interconnection structure.
在光芯片(PIC)和电芯片(EIC)的三维封装中,为了避免打薄光芯片(PIC)时造成翘曲从而导致光芯片(PIC)和电芯片(EIC)的连接点错位或失效,或者为了使光芯片(PIC)和电芯片(EIC)的封装具有较高的强度,通常需要在光芯片(PIC)表面形成塑封层。然而,光芯片(PIC)具有用于输入光的光纤耦合接口,直接对光芯片(PIC)的表面进行塑封会导致光纤耦合界面的损坏,从而导致光纤耦合接口的插入损耗大幅增加并影响光电芯片的实际使用。In the three-dimensional packaging of optical chips (PIC) and electrical chips (EIC), in order to avoid warping caused by thinning the optical chip (PIC), which may lead to misalignment or failure of the connection points between the optical chip (PIC) and the electrical chip (EIC), Or in order to make the packaging of the optical chip (PIC) and the electrical chip (EIC) have higher strength, it is usually necessary to form a plastic sealing layer on the surface of the optical chip (PIC). However, the optical chip (PIC) has a fiber coupling interface for input light. Directly molding the surface of the optical chip (PIC) will cause damage to the fiber coupling interface, resulting in a significant increase in the insertion loss of the fiber coupling interface and affecting the optoelectronic chip. actual use.
而传统的无塑封的3D光电芯片则存在多层芯片堆叠过程中翘曲过大、良率低以及无法应用于大尺寸光子集成电路芯片和电子集成电路芯片之间的堆叠,同时也不利于实现具有“硅通孔”(Through Silicon Via,TSV)结构的超薄光子集成电路芯片的贴装。However, traditional 3D optoelectronic chips without plastic packaging suffer from excessive warpage during the multi-layer chip stacking process, low yield, and cannot be applied to the stacking between large-size photonic integrated circuit chips and electronic integrated circuit chips. It is also not conducive to implementation. Mounting of ultra-thin photonic integrated circuit chips with "Through Silicon Via" (TSV) structure.
技术问题 technical problem
本申请实施例提供一种封装结构的制作方法及封装结构,用以解决在使用塑封材料固定光子集成电路芯片-电子集成电路芯片以提高封装强度和避免光子集成电路芯片翘曲的同时,还对光子集成电路芯片上的光纤耦合接口界面形成保护,防止光子集成电路芯片上的光耦合接口界面被塑封层中的有机物污染的问题。Embodiments of the present application provide a manufacturing method and packaging structure of a packaging structure to solve the problem of using plastic packaging materials to fix photonic integrated circuit chips-electronic integrated circuit chips to improve packaging strength and avoid warping of the photonic integrated circuit chips. The optical fiber coupling interface interface on the photonic integrated circuit chip forms a protection to prevent the optical coupling interface interface on the photonic integrated circuit chip from being contaminated by organic matter in the plastic sealing layer.
技术解决方案Technical solutions
本申请实施例提供了一种封装结构的制作方法及封装结构。Embodiments of the present application provide a method for manufacturing a packaging structure and a packaging structure.
第一方面,本申请实施例提供一种封装结构的制作方法,包括:提供半导体晶片,所述半导体晶片包括多个第一半导体芯片,每个所述第一半导体芯片具有相对的第一表面和第二表面,所述第一表面上设置有光耦合区以及围绕所述光耦合区的非光耦合区,所述光耦合区内设置有光耦合接口;针对每个所述第一半导体芯片,提供与该第一半导体芯片对应的至少一个第二半导体芯片以及光耦合区保护环,并将所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在该第一半导体芯片的所述第一表面的所述非光耦合区上,其中,所述光耦合区保护环环绕所述光耦合区;制作塑封层,所述塑封层包覆所述至少一个第二半导体芯片和所述光耦合区保护环远离所述光耦合区的外侧表面并且所述塑封层不覆盖除所述光耦合区保护环所占区域。In a first aspect, embodiments of the present application provide a method for manufacturing a packaging structure, including: providing a semiconductor wafer, the semiconductor wafer including a plurality of first semiconductor chips, each of the first semiconductor chips having an opposite first surface and A second surface, a light coupling area and a non-light coupling area surrounding the light coupling area are provided on the first surface, and an light coupling interface is provided in the light coupling area; for each of the first semiconductor chips, Provide at least one second semiconductor chip and a light coupling area protection ring corresponding to the first semiconductor chip, and fix the at least one second semiconductor chip and the light coupling area protection ring to all parts of the first semiconductor chip respectively. on the non-light coupling area of the first surface, wherein the light coupling area protective ring surrounds the light coupling area; a plastic encapsulation layer is produced, and the plastic encapsulation layer covers the at least one second semiconductor chip and the The light coupling area protection ring is away from the outer surface of the light coupling area and the plastic sealing layer does not cover the area other than the light coupling area protection ring.
在一些实施方式中,在垂直于所述第一表面的方向上,所述光耦合区保护环远离所述第一表面的顶面与所述至少一个第二半导体芯片远离所述第一表面的顶面齐平。In some embodiments, in a direction perpendicular to the first surface, the light coupling region protection ring is away from a top surface of the first surface and the at least one second semiconductor chip is away from a top surface of the first surface. The top surface is flush.
在一些实施方式中,所述制作塑封层包括:提供一塑封模具,所述塑封模具上具有与所述多个第一半导体芯片一一对应的多个U形腔体,在每个所述腔体内的预设区域处设置胶状塑封材料;将设置有所述胶状塑封材料的所述塑封模具倒置并压合在所述半导体晶片的所述第一表面上,以形成所述塑封层。In some embodiments, the manufacturing of the plastic packaging layer includes: providing a plastic packaging mold, the plastic packaging mold having a plurality of U-shaped cavities corresponding to the plurality of first semiconductor chips, and in each of the cavities A gel-like plastic sealing material is provided in a preset area of the body; the plastic sealing mold provided with the gel-like plastic sealing material is inverted and pressed on the first surface of the semiconductor wafer to form the plastic sealing layer.
在一些实施方式中,所述制作塑封层还包括:在将所述塑封模具倒置并压合在所述半导体晶片上时,所述光耦合区保护环的远离所述第一表面的顶面与所述腔体的底部贴合。In some embodiments, the preparation of the plastic sealing layer further includes: when the plastic sealing mold is inverted and pressed onto the semiconductor wafer, the top surface of the light coupling area protection ring away from the first surface and The bottom of the cavity fits.
在一些实施方式中,所述制作塑封层还包括:在设置所述胶状塑封材料之 前,在每个所述腔体的底部设置疏胶层,并在所述疏胶层的所述预设区域处设置所述胶状塑封材料。In some embodiments, the preparation of the plastic sealing layer further includes: before setting the gel-like plastic sealing material Before, a glue-repellent layer is provided at the bottom of each cavity, and the glue-like plastic sealing material is provided in the preset area of the glue-repellent layer.
在一些实施方式中,所述制作塑封层还包括:在将所述塑封模具倒置并压合在所述半导体晶片上时,所述光耦合区保护环的远离所述第一表面的顶面与所述疏胶层贴合。In some embodiments, the preparation of the plastic sealing layer further includes: when the plastic sealing mold is inverted and pressed onto the semiconductor wafer, the top surface of the light coupling area protection ring away from the first surface and The glue-repellent layer is attached.
在一些实施方式中,在形成所述塑封层之后,去除所述塑封模具。In some embodiments, after forming the molding layer, the molding mold is removed.
在一些实施方式中,在去除所述塑封模具之后,对所述半导体晶片进行切割以得到多个分离的芯片封装组件,每个所述芯片封装组件包括一个第一半导体芯片、对应的至少一个第二半导体芯片、光耦合区保护环以及塑封层。In some embodiments, after removing the plastic mold, the semiconductor wafer is cut to obtain a plurality of separate chip packaging components. Each of the chip packaging components includes a first semiconductor chip, a corresponding at least one first semiconductor chip, and a first semiconductor chip. 2. Semiconductor chip, optical coupling area protection ring and plastic sealing layer.
在一些实施方式中,在得到多个分离的所述芯片封装组件之后,将每个所述芯片封装组件安装至对应的封装基板上;以及将导光结构或者激光器芯片安装至所述第一半导体芯片的所述光耦合接口上。In some embodiments, after obtaining a plurality of separate chip packaging components, each of the chip packaging components is mounted on a corresponding packaging substrate; and a light guide structure or a laser chip is mounted on the first semiconductor on the optical coupling interface of the chip.
在一些实施方式中,在将所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在对应的第一半导体芯片的所述第一表面的所述非光耦合区上之前,在每个所述第一半导体芯片内制作多个导电通道,并将每个所述导电通道的两侧表面分别从所述第一半导体芯片的两侧表面露出。In some embodiments, before fixing the at least one second semiconductor chip and the light coupling area guard ring on the non-light coupling area of the first surface of the corresponding first semiconductor chip, A plurality of conductive channels are made in each first semiconductor chip, and both sides of each conductive channel are exposed from both sides of the first semiconductor chip.
在一些实施方式中,在将每个所述导电通道的两侧表面从所述第一半导体芯片的表面露出之后,在每个所述导电通道露出的一侧表面上制作第一导电凸点。In some embodiments, after exposing both side surfaces of each conductive channel from the surface of the first semiconductor chip, first conductive bumps are formed on the exposed one side surface of each conductive channel.
在一些实施方式中,在每个所述导电通道露出的一侧表面上制作第一导电凸点之后,将每个所述第一半导体芯片靠近所述第一导电凸点的一侧表面与第二承载基板进行临时键合;以及,在每个所述第一半导体芯片的每个所述导电通道露出的另一侧表面上制作第二导电凸点。In some embodiments, after forming a first conductive bump on the exposed side surface of each conductive channel, the side surface of each first semiconductor chip close to the first conductive bump is connected to a first conductive bump. The two carrier substrates are temporarily bonded; and, second conductive bumps are formed on the exposed other side surface of each conductive channel of each first semiconductor chip.
在一些实施方式中,在每个所述第一半导体芯片的每个所述导电通道露出的另一侧表面上制作第二导电凸点之后,将所述第一半导体芯片靠近所述第二导电凸点的一侧表面与第一承载基板进行临时键合;以及,将所述第二承载基板解键合。In some embodiments, after forming a second conductive bump on the exposed other side surface of each conductive channel of each first semiconductor chip, the first semiconductor chip is placed close to the second conductive bump. One side surface of the bump is temporarily bonded to the first carrier substrate; and the second carrier substrate is debonded.
所述第一半导体芯片是光子集成电路芯片,所述第二半导体芯片是电子集成电路芯片。 The first semiconductor chip is a photonic integrated circuit chip, and the second semiconductor chip is an electronic integrated circuit chip.
在一些实施方式中,所述光耦合区保护环是空心的管状结构或者是具有空心并带顶盖的杯状结构。In some embodiments, the light coupling area protection ring is a hollow tubular structure or a hollow cup-shaped structure with a top cover.
在一些实施方式中,所述光耦合区保护环包括金属、陶瓷、硅中的至少一种。In some embodiments, the light coupling region protection ring includes at least one of metal, ceramic, and silicon.
第二方面,本申请实施例还提供一种封装结构,包括:第一半导体芯片,所述第一半导体芯片具有相对的第一表面和第二表面,在所述第一表面设置有光耦合区以及围绕所述光耦合区的非光耦合区,所述光耦合区内设置有光耦合接口;至少一个第二半导体芯片以及光耦合区保护环,所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在所述第一表面的所述非光耦合区上,其中,所述光耦合区保护环环绕所述光耦合区;塑封层,所述塑封层包覆所述至少一个第二半导体芯片和所述光耦合区保护环远离所述光耦合区的外侧表面并且所述塑封层不覆盖所述光耦合区保护环所占区域。In a second aspect, embodiments of the present application further provide a packaging structure, including: a first semiconductor chip, the first semiconductor chip having an opposite first surface and a second surface, and an optical coupling region is provided on the first surface. and a non-optical coupling area surrounding the optical coupling area, an optical coupling interface is provided in the optical coupling area; at least one second semiconductor chip and an optical coupling area protection ring, the at least one second semiconductor chip and the optical coupling area Coupling area protection rings are respectively fixed on the non-light coupling areas of the first surface, wherein the light coupling area protection rings surround the light coupling area; a plastic sealing layer covers the at least one The second semiconductor chip and the light coupling area protection ring are away from the outer surface of the light coupling area and the plastic sealing layer does not cover the area occupied by the light coupling area protection ring.
在一些实施方式中,在垂直于所述第一表面的方向上,所述光耦合区保护环远离所述第一表面的顶面与所述塑封层远离所述第一表面的顶面齐平。In some embodiments, in a direction perpendicular to the first surface, the top surface of the light coupling area protection ring away from the first surface is flush with the top surface of the plastic sealing layer away from the first surface. .
在一些实施方式中,所述至少一个第二半导体芯片远离所述第一表面的顶面露出在所述塑封层之外,并且在垂直于所述第一表面的方向上,所述光耦合区保护环远离所述第一表面的顶面与所述至少一个第二半导体芯片远离所述第一表面的顶面齐平。In some embodiments, the top surface of the at least one second semiconductor chip away from the first surface is exposed outside the plastic encapsulation layer, and in a direction perpendicular to the first surface, the light coupling region A top surface of the protective ring away from the first surface is flush with a top surface of the at least one second semiconductor chip away from the first surface.
在一些实施方式中,所述光耦合区保护环是空心的管状结构或者是具有空心结构并带顶盖的杯状结构。In some embodiments, the light coupling area protection ring is a hollow tubular structure or a cup-shaped structure with a hollow structure and a top cover.
在一些实施方式中,所述光耦合区保护环包括金属、陶瓷、硅中的至少一种。In some embodiments, the light coupling region protection ring includes at least one of metal, ceramic, and silicon.
在一些实施方式中,当所述光耦合区保护环为杯状结构时,其空心结构与顶盖通过粘接层粘接。In some embodiments, when the light coupling area protection ring has a cup-shaped structure, its hollow structure and the top cover are bonded through an adhesive layer.
有益效果beneficial effects
本发明实施例的封装结构的制作方法及封装结构,能够令光耦合区的上表面不被塑封层覆盖,保护光耦合区内光耦合接口不被塑封层中的有机物污染的同时,还保证了光耦合区的表面纯净,有利于后续光耦合接口能够与光纤阵列 维持较高的耦合效率。The manufacturing method and packaging structure of the packaging structure according to the embodiment of the present invention can prevent the upper surface of the optical coupling area from being covered by the plastic sealing layer, protect the optical coupling interface in the optical coupling area from being contaminated by organic matter in the plastic sealing layer, and at the same time ensure The surface of the optical coupling area is pure, which is conducive to the subsequent optical coupling interface and the fiber array. Maintain high coupling efficiency.
本发明实施方式的各个方面、特征、优点等将在下文结合附图进行具体描述。根据以下结合附图的具体描述,本发明的上述方面、特征、优点等将会变得更加清楚。Various aspects, features, advantages, etc. of the embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The above aspects, features, advantages, etc. of the present invention will become clearer from the following detailed description in conjunction with the accompanying drawings.
参照后文的说明和附图,详细公开了本发明的特定实施例,指明了本发明的原理可以被采用的方式。应该理解,本发明的实施例在范围上并不因而受到限制。在所附权利要求的精神和条款的范围内,本发明的实施例包括许多改变、修改和等同。Reference is made to the following description and to the accompanying drawings, specific embodiments of the invention are disclosed in detail and illustrate the manner in which the principles of the invention may be employed. It should be understood that embodiments of the invention are not thereby limited in scope. Embodiments of the present invention include numerous alterations, modifications and equivalents within the spirit and scope of the appended claims.
针对一种实施例描述和/或示出的特征可以以相同或类似的方式在一个或更多个其它实施例中使用,与其它实施例中的特征相组合,或替代其它实施例中的特征。Features described and/or illustrated with respect to one embodiment may be used in the same or similar manner in one or more other embodiments, combined with features in the other embodiments, or in place of features in the other embodiments .
应该强调,术语“包括/包含”在本文使用时指特征、整件、步骤或组件的存在,但并不排除一个或更多个其它特征、整件、步骤或组件的存在或附加。It should be emphasized that the term "comprising" when used herein refers to the presence of features, integers, steps or components but does not exclude the presence or addition of one or more other features, integers, steps or components.
附图说明Description of the drawings
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application. For those skilled in the art, other drawings can also be obtained based on these drawings without exerting creative efforts.
图1是根据本发明实施例的封装结构的制作方法的流程图。FIG. 1 is a flow chart of a method for manufacturing a packaging structure according to an embodiment of the present invention.
图2A-图2C是根据本发明实施例提供的封装结构的制作方法的制作工序示意图。2A-2C are schematic diagrams of the manufacturing process of a packaging structure manufacturing method according to an embodiment of the present invention.
图3是根据本发明实施例提供的第一半导体芯片的平面结构示意图。FIG. 3 is a schematic plan view of a first semiconductor chip provided according to an embodiment of the present invention.
图4是根据本发明实施例提供的具有半导体晶片的封装结构的俯视结构示意图。FIG. 4 is a schematic top structural view of a packaging structure with a semiconductor chip provided according to an embodiment of the present invention.
图5A-图5B是根据本发明一实施例提供的制作塑封层的制作工序示意图。5A-5B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to an embodiment of the present invention.
图6A-图6B是根据本发明又一实施例提供的制作塑封层的制作工序示意图。6A-6B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to another embodiment of the present invention.
图7-图8是根据本发明一实施例提供的封装结构的制作方法的制作工序 示意图。Figures 7-8 illustrate the manufacturing process of a method for manufacturing a packaging structure according to an embodiment of the present invention. Schematic diagram.
图9是根据本发明一实施例提供的芯片级封装结构的示意图。FIG. 9 is a schematic diagram of a chip-scale packaging structure according to an embodiment of the present invention.
图10是根据本发明一实施例提供的芯片级封装结构与封装基板的连接示意图。FIG. 10 is a schematic diagram of the connection between a chip-scale packaging structure and a packaging substrate according to an embodiment of the present invention.
图11A-图11C是根据本发明又一实施例提供的封装结构的制作方法的制作工序示意图。11A-11C are schematic diagrams of the manufacturing process of a method for manufacturing a packaging structure according to another embodiment of the present invention.
本发明的实施方式Embodiments of the invention
上述说明仅是本发明技术方案的概述,为了能够更清楚了解本发明的技术手段,而可依照说明书的内容予以实施,并且为了让本发明的上述和其他目的、特征和优点能够更明显易懂,以下特举较佳实施例,并配合附图,详细说明如下。The above description is only an overview of the technical solution of the present invention. In order to have a clearer understanding of the technical means of the present invention, it can be implemented according to the content of the description, and in order to make the above and other objects, features and advantages of the present invention more obvious and understandable. , the following is a detailed description of the preferred embodiments, together with the accompanying drawings.
在本发明的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。本文中芯片的含义可以包括裸芯片。在涉及方法步骤时,本文图示的先后顺序代表了一种示例性的方案,但不表示对先后顺序的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。In the description of the present invention, it should be noted that, unless otherwise clearly stated and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense. For example, it can be a fixed connection or a detachable connection. Connection, or integral connection; it can be mechanical connection, electrical connection or mutual communication; it can be direct connection, or indirect connection through an intermediary, it can be internal connection of two elements or interaction of two elements relation. The meaning of chip in this article may include bare chips. When it comes to method steps, the sequence illustrated in this article represents an exemplary solution, but does not represent a limitation on the sequence. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
针对现有的光电芯片封装方式存在无法进行塑封、封装互连的可靠性较差、封装面积较大以及性能较差等问题,本发明实施例提出了一种带有光互连接口的封装结构的制作方法,并且采用将电芯片与光芯片堆叠后进行塑封,保证了封装互连的可靠性,同时又实现了光纤耦合接口的保护。In view of the problems that existing optoelectronic chip packaging methods cannot perform plastic packaging, poor reliability of packaging interconnection, large packaging area, and poor performance, embodiments of the present invention propose a packaging structure with an optical interconnection interface The manufacturing method adopts the method of stacking the electrical chip and the optical chip and then plastic packaging, which ensures the reliability of the package interconnection and at the same time realizes the protection of the optical fiber coupling interface.
为使本发明的目的、特征和优点能够更加明显易懂,下面结合附图和具体实施方式对本发明作进一步详细的说明。In order to make the purpose, features and advantages of the present invention more obvious and easy to understand, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments.
图1是根据本发明实施例的封装结构的制作方法的流程图。所述封装结构的制作方法包括:FIG. 1 is a flow chart of a method for manufacturing a packaging structure according to an embodiment of the present invention. The manufacturing method of the packaging structure includes:
S101,提供半导体晶片,所述半导体晶片包括多个第一半导体芯片,每个 所述第一半导体芯片具有相对的第一表面和第二表面,所述第一表面上设置有光耦合区以及围绕所述光耦合区的非光耦合区,所述光耦合区内设置有光耦合接口;S101, provide a semiconductor wafer, the semiconductor wafer includes a plurality of first semiconductor chips, each The first semiconductor chip has an opposite first surface and a second surface. A light coupling area and a non-light coupling area surrounding the light coupling area are provided on the first surface. A light coupling area is provided in the light coupling area. coupling interface;
S102,针对每个所述第一半导体芯片,提供与该第一半导体芯片对应的至少一个第二半导体芯片以及光耦合区保护环,并将所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在该第一半导体芯片的所述第一表面的所述非光耦合区上,其中,所述光耦合区保护环环绕所述光耦合区;S102. For each first semiconductor chip, provide at least one second semiconductor chip and a light coupling area protection ring corresponding to the first semiconductor chip, and connect the at least one second semiconductor chip and the light coupling area Protective rings are respectively fixed on the non-light coupling areas of the first surface of the first semiconductor chip, wherein the light coupling area protection rings surround the light coupling areas;
S103,制作塑封层,所述塑封层包覆所述至少一个第二半导体芯片和所述光耦合区保护环远离所述光耦合区的外侧表面并且所述塑封层不覆盖所述光耦合区保护环所占区域。S103. Make a plastic encapsulation layer. The plastic encapsulation layer covers the at least one second semiconductor chip and the optical coupling area protection ring away from the outer surface of the optical coupling area. The plastic encapsulation layer does not cover the optical coupling area protection ring. The area occupied by the ring.
图2A-图2C是根据本发明一实施例提供的封装结构的制作方法的制作工序示意图。图3是根据本发明实施例提供的第一半导体芯片的平面结构示意图。图4是根据本发明一实施例提供的具有半导体晶片的封装结构的俯视结构示意图。以下将结合图2A-图2C、图3以及图4对本发明实施例进行详细说明。2A-2C are schematic diagrams of the manufacturing process of a packaging structure manufacturing method according to an embodiment of the present invention. FIG. 3 is a schematic plan view of a first semiconductor chip provided according to an embodiment of the present invention. FIG. 4 is a schematic top view of a packaging structure with a semiconductor chip according to an embodiment of the present invention. The embodiment of the present invention will be described in detail below with reference to FIGS. 2A-2C, 3 and 4.
在本发明实施例中,示例性地,所述第一半导体芯片102是光芯片(光子集成电路芯片,PIC),其中,所述光芯片是用光子为信息载体进行信息的处理与数据的传送,其可以是基于硅的光芯片,所述第二半导体芯片103是电芯片(电子集成电路芯片,EIC),其中,所述电芯片是用电子为信息载体进行信息的处理与数据的传送,例如基于硅的电芯片、基于锗的电芯片或者化合物半导体电芯片,通过将所述第一半导体芯片102和所述第二半导体芯片103进行堆叠可实现光芯片和电芯片的集成。In the embodiment of the present invention, for example, the first semiconductor chip 102 is an optical chip (photonic integrated circuit chip, PIC), where the optical chip uses photons as information carriers to process information and transmit data. , which may be a silicon-based optical chip, and the second semiconductor chip 103 is an electrical chip (electronic integrated circuit chip, EIC), wherein the electrical chip uses electrons as the information carrier to process information and transmit data, For example, silicon-based electrical chips, germanium-based electrical chips or compound semiconductor electrical chips, the integration of optical chips and electrical chips can be achieved by stacking the first semiconductor chip 102 and the second semiconductor chip 103 .
示例性地,请参阅图2A所示,首先提供第一承载基板200以及位于所述第一承载基板200之上的具有多个第一半导体芯片102的半导体晶片100,每个所述第一半导体芯片102具有相对的第一表面102a和第二表面102b,所述第二表面102b通过键合胶201与所述第一承载基板200临时键合。Illustratively, please refer to FIG. 2A . First, a first carrier substrate 200 and a semiconductor wafer 100 having a plurality of first semiconductor chips 102 located on the first carrier substrate 200 are provided. Each of the first semiconductor chips 102 is The chip 102 has an opposite first surface 102a and a second surface 102b, and the second surface 102b is temporarily bonded to the first carrier substrate 200 through a bonding glue 201.
示例性地,如图3所示,所述第一半导体芯片102的第一表面102a上设置有光耦合区1024以及围绕所述光耦合区1024的非光耦合区1025,所述光耦合区1024内设置有光耦合接口104,外部光源提供的光可以通过光纤阵列 (Fiber Array,FA)输入到光耦合接口104中,例如通过与光耦合接口104内的光栅耦合器耦合进第一半导体芯片102。需要说明的是,在其他实施例中,也可以在光耦合接口104内相应的设置其他用于传输光信号的光互连接口或者器件。Exemplarily, as shown in FIG. 3 , a light coupling region 1024 and a non-light coupling region 1025 surrounding the light coupling region 1024 are provided on the first surface 102 a of the first semiconductor chip 102 . The light coupling region 1024 An optical coupling interface 104 is provided inside, and the light provided by the external light source can pass through the optical fiber array. (Fiber Array, FA) is input into the optical coupling interface 104, for example, coupled into the first semiconductor chip 102 through a grating coupler in the optical coupling interface 104. It should be noted that in other embodiments, other optical interconnection interfaces or devices for transmitting optical signals may also be provided in the optical coupling interface 104 accordingly.
结合2B-图2C、以及图4所示,针对每个所述第一半导体芯片102,提供与该第一半导体芯片102对应的至少一个第二半导体芯片103以及光耦合区保护环400,并将所述至少一个第二半导体芯片103以及所述光耦合区保护环400分别固定在该第一半导体芯片102的所述第一表面102a的所述非光耦合区1025上,例如可以采用焊接或者其他方式进行固定;其中,所述光耦合区保护环400环绕所述光耦合区1024。As shown in FIG. 2B to FIG. 2C and FIG. 4 , for each first semiconductor chip 102 , at least one second semiconductor chip 103 corresponding to the first semiconductor chip 102 and the optical coupling region protection ring 400 are provided, and The at least one second semiconductor chip 103 and the light coupling area protection ring 400 are respectively fixed on the non-light coupling area 1025 of the first surface 102a of the first semiconductor chip 102, for example, welding or other methods may be used. The optical coupling area protection ring 400 surrounds the optical coupling area 1024.
需要说明的是,本发明实施例中示意了在所述第一半导体芯片102上方形成一个所述第二半导体芯片103,在实际使用中,可以是多于一个的所述第二半导体芯片103,例如2个、3个、4个或者更多,可以根据实际需要灵活选择。It should be noted that the embodiment of the present invention illustrates that one second semiconductor chip 103 is formed above the first semiconductor chip 102. In actual use, there may be more than one second semiconductor chip 103. For example, 2, 3, 4 or more, you can choose flexibly according to actual needs.
由于塑封层等包括有机物材料,有机物接触光耦合区1024会导致有机物残留,有机物残留会影响光耦合接口104的耦合效率,导致光损耗严重,影响第一半导体芯片102的运行。为了形成对光耦合区1024内的光耦合接口104的保护,本发明的实施例在所述光耦合区1024的周边制作环绕所述光耦合区1024的光耦合区保护环400。示例性地,所述光耦合区保护环400是空心的管状结构或者是具有空心并带顶盖的杯状结构,后续在制作塑封层时,由于所述光耦合区保护环400的存在,可令光耦合区的上表面不被塑封层覆盖,使得塑封层仅包覆所述至少一个第二半导体芯片103和所述光耦合区保护环400远离所述光耦合区1024的外侧表面并覆盖除所述光耦合区保护环400所占区域之外的非光耦合区1025,保护光耦合区1024内光耦合接口104不被塑封层中的有机物污染的同时,还保证了光耦合区1024的表面纯净,有利于后续光耦合接口104能够与光纤阵列维持较高的耦合效率。此外,由于所述光耦合区保护环400的存在,还避免了传统塑封工艺中,由于塑封层覆盖在光耦合区1024的上方,后期还需要对塑封层进行激光开孔处理以露出所述光耦合区1024。Since the plastic sealing layer and the like include organic materials, organic matter contacting the optical coupling area 1024 will cause organic matter residues, which will affect the coupling efficiency of the optical coupling interface 104 , resulting in serious light loss and affecting the operation of the first semiconductor chip 102 . In order to protect the optical coupling interface 104 in the optical coupling area 1024, embodiments of the present invention fabricate an optical coupling area protection ring 400 surrounding the optical coupling area 1024 around the optical coupling area 1024. For example, the light coupling area protection ring 400 is a hollow tubular structure or a hollow cup-shaped structure with a top cover. When the plastic sealing layer is subsequently made, due to the existence of the light coupling area protection ring 400, the light coupling area protection ring 400 can be Let the upper surface of the light coupling region not be covered by the plastic sealing layer, so that the plastic sealing layer only covers the at least one second semiconductor chip 103 and the outer surface of the light coupling region protection ring 400 away from the light coupling region 1024 and covers everything except The non-optical coupling area 1025 outside the area occupied by the optical coupling area protection ring 400 not only protects the optical coupling interface 104 in the optical coupling area 1024 from being contaminated by organic matter in the plastic layer, but also ensures the surface of the optical coupling area 1024 Pure, which helps the subsequent optical coupling interface 104 maintain a higher coupling efficiency with the optical fiber array. In addition, due to the existence of the optical coupling area protection ring 400, it is also avoided that in the traditional plastic packaging process, because the plastic layer covers the top of the optical coupling area 1024, the plastic layer needs to be laser-opened in the later stage to expose the light. Coupling region 1024.
应理解,假若所述光耦合区保护环400是具有空心并带顶盖的杯状结构 时,在制作塑封层完成之后,还需对其顶盖进行去除,以露出光耦合区1024,从而方便后续将外部光源的光通过光耦合接口104输入到第一半导体芯片102中。当所述耦合区保护环400为杯状结构时,其空心结构与顶盖通过粘接层粘结,该粘接层可通过光照、加热等方式去除,如此,既能更好地保护光耦合区1024,又可以方便地对光耦合区1024进行后续封装。假若所述光耦合区保护环400是具有空心的管状结构时,则直接可露出光耦合区1024。It should be understood that if the optical coupling area protection ring 400 has a hollow cup-shaped structure with a top cover, At this time, after the production of the plastic sealing layer is completed, the top cover needs to be removed to expose the light coupling area 1024, so as to facilitate subsequent input of light from an external light source into the first semiconductor chip 102 through the light coupling interface 104. When the coupling area protection ring 400 has a cup-shaped structure, its hollow structure and the top cover are bonded through an adhesive layer. The adhesive layer can be removed by illumination, heating, etc., so that the optical coupling can be better protected. area 1024, and the optical coupling area 1024 can be subsequently packaged conveniently. If the light coupling area protection ring 400 has a hollow tubular structure, the light coupling area 1024 can be directly exposed.
可选地,所述光耦合区保护环400包括金属、陶瓷、硅中的至少一种。优选地,所述光耦合区保护环400选用与第一半导体芯片102的热膨胀系数以及刚度相近的材料,例如陶瓷或者硅等。所述光耦合区保护环400采用基板键合的方式或者胶体粘接的方式固定在所述第一半导体芯片102的第一表面102a的非光耦合区上1025。Optionally, the optical coupling area protection ring 400 includes at least one of metal, ceramic, and silicon. Preferably, the optical coupling area protection ring 400 is made of a material with a thermal expansion coefficient and stiffness similar to those of the first semiconductor chip 102, such as ceramics or silicon. The light coupling area protection ring 400 is fixed on the non-light coupling area 1025 of the first surface 102a of the first semiconductor chip 102 by substrate bonding or colloid bonding.
可选地,对至少一个第二半导体芯片103以及光耦合区保护环400固定的先后顺序可以不做限制。Optionally, there may be no limit on the order in which the at least one second semiconductor chip 103 and the optical coupling region guard ring 400 are fixed.
进一步地,在垂直于所述第一表面102a的方向上,所述光耦合区保护环400远离所述第一表面102a的顶面与所述至少一个第二半导体芯片103远离所述第一表面102a的顶面齐平。Further, in a direction perpendicular to the first surface 102a, the light coupling area protection ring 400 is away from the top surface of the first surface 102a and the at least one second semiconductor chip 103 is away from the first surface. The top surface of 102a is flush.
图5A-图5B是根据本发明一实施例提供的制作塑封层的制作工序示意图。5A-5B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to an embodiment of the present invention.
如图5A所示,在本发明一实施例中,所述制作塑封层包括:提供一塑封模具800,所述塑封模具800上具有与所述多个第一半导体芯片102一一对应的多个U形腔体801,在每个所述腔体801内的预设区域处设置胶状塑封材料1061,例如,塑封胶等;然后,将设置有所述胶状塑封材料1061的所述塑封模具800倒置并压合在所述半导体晶片100背离所述第一承载基板200的一侧表面上,以形成所述塑封层106。As shown in FIG. 5A , in one embodiment of the present invention, the production of the plastic packaging layer includes: providing a plastic packaging mold 800 , the plastic packaging mold 800 has a plurality of first semiconductor chips 102 corresponding to each other in a one-to-one manner. In the U-shaped cavity 801, a gel-like plastic sealing material 1061, such as plastic sealant, etc., is provided at a preset area in each cavity 801; then, the plastic mold mold provided with the gel-like plastic sealing material 1061 is 800 is inverted and pressed on the side surface of the semiconductor wafer 100 facing away from the first carrier substrate 200 to form the plastic sealing layer 106 .
示例性地,所述预设区域是指将塑封胶设置在每个所述腔体801的对应光耦合区保护环400以及光耦合区1024以外的区域,并利用塑封胶不易随意发生流体运动以及重力掉落的特性,在将设置有塑封胶的塑封模具800倒置并压合的过程中,即能够保证塑封胶均匀的填充到所需要填充的缝隙中去,也能够保证所述光耦合区1024内不会掉落塑封胶,进而保护所述光耦合区1024内的光耦合接口104不被塑封胶污染。后续通过对塑封胶进行加热固化,即可得到 光耦合区1024不被塑封层106覆盖的3D芯片堆叠封装结构。For example, the preset area refers to placing plastic glue in the area outside the corresponding light coupling area protection ring 400 and light coupling area 1024 of each cavity 801, and using the plastic glue to prevent random fluid movement. The characteristics of gravity drop can ensure that the plastic sealant is evenly filled into the gaps that need to be filled during the process of inverting and pressing the plastic mold 800 provided with the plastic sealant, and can also ensure that the optical coupling area 1024 The plastic sealant will not fall out, thereby protecting the optical coupling interface 104 in the optical coupling area 1024 from being contaminated by the plastic sealant. Subsequently, by heating and solidifying the plastic sealant, you can obtain A 3D chip stack packaging structure in which the optical coupling area 1024 is not covered by the plastic encapsulation layer 106 .
示例性地,该U形腔体的内壁平滑,例如,可根据即将要形成的塑封层的形状设计该U形腔体的内部构造,本发明实施例在此不做限制。For example, the inner wall of the U-shaped cavity is smooth. For example, the internal structure of the U-shaped cavity can be designed according to the shape of the plastic sealing layer to be formed. This embodiment of the present invention is not limited here.
如图5B所示,在将所述塑封模具800倒置并压合在所述半导体晶片100上时,所述光耦合区保护环400的远离所述第一表面102a的顶面与所述腔体801的底部贴合,从而在所述胶状塑封材料1061在固化形成所述塑封层106之后,使得在垂直于所述第一表面102a的方向上,所述光耦合区保护环400远离所述第一表面102a的顶面与所述塑封层106远离所述第一表面102a的顶面齐平。并且,由于在本发明实施例中,所述光耦合区保护环400远离所述第一表面102a的顶面与所述至少一个第二半导体芯片103远离所述第一表面102a的顶面齐平,因此,在形成所述塑封层之后,还能够使得所述至少一个第二半导体芯片103远离所述第一表面102a的顶面露出在所述塑封层106之外,不仅有利于封装结构的体积变小,还有利于所述至少一个第二半导体芯片103的散热。同时还节省了后续对所述塑封层106进行减薄处理的工艺,以露出所述至少一个第二半导体芯片103远离所述第一表面102a的顶面,有利于制作工艺流程的简化和制造成本的降低。As shown in FIG. 5B , when the plastic mold 800 is inverted and pressed onto the semiconductor wafer 100 , the top surface of the optical coupling area protection ring 400 away from the first surface 102 a is in contact with the cavity. The bottom of 801 is attached, so that after the glue-like molding material 1061 is cured to form the molding layer 106, the light coupling area protection ring 400 is moved away from the The top surface of the first surface 102a is flush with the top surface of the plastic sealing layer 106 away from the first surface 102a. Moreover, in the embodiment of the present invention, the top surface of the optical coupling area protection ring 400 away from the first surface 102a is flush with the top surface of the at least one second semiconductor chip 103 away from the first surface 102a. , therefore, after the molding layer is formed, the top surface of the at least one second semiconductor chip 103 away from the first surface 102a can be exposed outside the molding layer 106 , which is not only beneficial to the volume of the packaging structure Being smaller is also beneficial to the heat dissipation of the at least one second semiconductor chip 103 . At the same time, it also saves the subsequent thinning process of the plastic encapsulation layer 106 to expose the top surface of the at least one second semiconductor chip 103 away from the first surface 102a, which is beneficial to the simplification of the manufacturing process and the manufacturing cost. of reduction.
图6A-图6B是根据本发明又一实施例提供的制作塑封层的制作工序示意图。6A-6B are schematic diagrams of the manufacturing process of making a plastic sealing layer according to another embodiment of the present invention.
如图6A所示,在本发明又一实施例中,相比于图5A,所述制作塑封层还包括:在设置所述胶状塑封材料1061之前,在每个所述腔体801的底部设置疏胶层901,并在所述疏胶层901的所述预设区域处设置所述胶状塑封材料1061。As shown in Figure 6A, in another embodiment of the present invention, compared to Figure 5A, the preparation of the plastic sealing layer further includes: before disposing the gel-like plastic sealing material 1061, at the bottom of each cavity 801 A glue-repellent layer 901 is provided, and the glue-like plastic sealing material 1061 is provided at the preset area of the glue-repellent layer 901 .
如图6B所示,在将所述塑封模具800倒置并压合在所述半导体晶片100上时,所述光耦合区保护环400的远离所述第一表面102a的顶面与所述疏胶层901贴合。As shown in FIG. 6B , when the plastic mold 800 is inverted and pressed onto the semiconductor wafer 100 , the top surface of the light coupling area protection ring 400 away from the first surface 102 a is in contact with the glue-repellent Layer 901 fit.
示例性地,所述预设区域是指将塑封胶设置在每个所述腔体801的对应光耦合区保护环400以及光耦合区1024以外的区域。示例性地,所述疏胶层901的材料为特氟龙等,利用所述疏胶层901具有疏胶的特性,即对胶体具有排斥性,这样在所述疏胶层901的所述预设区域处设置所述胶状塑封材料1061之 后以及在将设置有塑封胶的塑封模具800倒置并压合完成之后,使得塑封胶不会粘附在疏胶层901的表面及靠近所述腔体801底部的侧壁上,同时也便于塑封胶在固化后与塑封模具800之间进行分离。For example, the preset area refers to the area outside the corresponding light coupling area protection ring 400 and light coupling area 1024 of each cavity 801 in which the plastic sealant is disposed. For example, the material of the glue-repellent layer 901 is Teflon, etc. The glue-repellent layer 901 has glue-repellent properties, that is, it has repellency to colloids. In this way, the pre-position of the glue-repellent layer 901 Where the gel-like plastic sealing material 1061 is provided in an area Finally, after the plastic sealing mold 800 provided with plastic sealant is inverted and pressed, the plastic sealant will not adhere to the surface of the rubber-repellent layer 901 and the side wall near the bottom of the cavity 801, and it will also facilitate plastic sealing. After solidification, the glue is separated from the plastic sealing mold 800 .
图7-图8是根据本发明一实施例提供的封装结构的制作方法的制作工序示意图。图9是根据本发明一实施例提供的芯片级封装结构的示意图。图10是根据本发明一实施例提供的芯片级封装结构与封装基板的连接示意图。7-8 are schematic diagrams of the manufacturing process of a method for manufacturing a packaging structure according to an embodiment of the present invention. FIG. 9 is a schematic diagram of a chip-scale packaging structure according to an embodiment of the present invention. FIG. 10 is a schematic diagram of the connection between a chip-scale packaging structure and a packaging substrate according to an embodiment of the present invention.
如图7所示,所述封装结构的制作方法还包括:在形成所述塑封层106之后,去除所述塑封模具800。As shown in FIG. 7 , the method of manufacturing the packaging structure further includes: removing the plastic mold 800 after forming the plastic layer 106 .
如图8所示,所述封装结构的制作方法还包括:在去除所述塑封模具800之后,将所述第一承载基板200解键合。As shown in FIG. 8 , the method of manufacturing the packaging structure further includes: debonding the first carrier substrate 200 after removing the plastic mold 800 .
进一步地,在将所述第一承载基板200解键合之后,对所述半导体晶片100进行正面切割,也即在所述半导体晶片100具有塑封层106的一侧进行切割,以得到多个分离的芯片封装组件1000;结合图9所示,每个所述芯片封装组件1000具有一个第一半导体芯片102、对应的至少一个第二半导体芯片103、光耦合区保护环400以及塑封层106。此时,由于塑封层106的存在,提升了所述半导体晶片100的表面强度,因此,即使是在对所述半导体晶片100进行正面切割时,也不易发生所述半导体晶片100由于切割崩碎所引起的破片风险。Further, after the first carrier substrate 200 is debonded, the semiconductor wafer 100 is front-side cut, that is, the side of the semiconductor wafer 100 with the plastic sealing layer 106 is cut to obtain a plurality of separated chips. Package component 1000; As shown in FIG. 9 , each chip package component 1000 has a first semiconductor chip 102 , corresponding at least one second semiconductor chip 103 , an optical coupling area protection ring 400 and a plastic encapsulation layer 106 . At this time, due to the existence of the plastic sealing layer 106, the surface strength of the semiconductor wafer 100 is improved. Therefore, even when the semiconductor wafer 100 is front-cut, the semiconductor wafer 100 is less likely to be chipped due to cutting. risk of fragmentation.
随后,如图10所示,将每个所述芯片封装组件1000安装至对应的封装基板700上。具体地,将具有至少一个第二导电凸点1023的芯片封装组件1000上的所述第二导电凸点1023与封装基板700上的电连接点(图未标示)接合。根据实际需要还可以额外在封装基板700上贴装或者集成有电容、电阻、电感等分立器件。Subsequently, as shown in FIG. 10 , each of the chip packaging components 1000 is mounted on the corresponding packaging substrate 700 . Specifically, the second conductive bump 1023 on the chip package assembly 1000 having at least one second conductive bump 1023 is bonded to an electrical connection point (not shown) on the packaging substrate 700 . According to actual needs, additional discrete devices such as capacitors, resistors, and inductors can be mounted or integrated on the packaging substrate 700 .
继续参考图10所示,在将至少一个具有第二导电凸点1023的芯片封装组件1000与封装基板700上的电连接点接合后,将导光结构600或者激光器芯片安装至所述光耦合接口104上。Continuing to refer to FIG. 10 , after at least one chip package component 1000 having second conductive bumps 1023 is bonded to electrical connection points on the packaging substrate 700 , the light guide structure 600 or the laser chip is mounted to the optical coupling interface. 104 on.
示例性地,该导光结构600为光纤阵列(Fiber Array,FA)。可选地,该导光结构600可以是棱镜,其通过激光整合的方法将激光束引导到光耦合接口104,具体地,激光器芯片发出的激光束穿过透镜并入射到棱镜,所述棱镜将 所述激光束通过光耦合接口104耦合进入所述第一半导体芯片102。Illustratively, the light guide structure 600 is a fiber array (Fiber Array, FA). Optionally, the light guide structure 600 can be a prism, which guides the laser beam to the optical coupling interface 104 through a laser integration method. Specifically, the laser beam emitted by the laser chip passes through the lens and is incident on the prism, and the prism will The laser beam is coupled into the first semiconductor chip 102 through the optical coupling interface 104 .
可选地,可以将激光器芯片直接安装在光耦合接口104上方,使激光器芯片发出的激光束对准所述光耦合接口104,所述激光束可以直接耦合到所述第一半导体芯片102。将激光器芯片安装在光耦合接口104上方,可以大大简化器件结构,提高集成度。Alternatively, the laser chip can be installed directly above the optical coupling interface 104 so that the laser beam emitted by the laser chip is aimed at the optical coupling interface 104 and the laser beam can be directly coupled to the first semiconductor chip 102 . Installing the laser chip above the optical coupling interface 104 can greatly simplify the device structure and improve the integration level.
图11A-图11C是根据本发明又一实施例提供的封装结构的制作方法的制作工序示意图。11A-11C are schematic diagrams of the manufacturing process of a method for manufacturing a packaging structure according to another embodiment of the present invention.
如图11A-图11C所示,本发明实施例提供的封装结构的制作方法还包括:在将所述至少一个第二半导体芯片103以及所述光耦合区保护环400分别固定在对应的第一半导体芯片102的所述第一表面102a的非光耦合区1025上之前,在每个所述第一半导体芯片102内制作多个导电通道1021,并将每个所述导电通道1021的两侧表面分别从所述第一半导体芯片102的两侧表面露出。导电通道1021可以由多段导电层连接而成,在多个工序中分别制造。As shown in FIGS. 11A to 11C , the manufacturing method of the packaging structure provided by the embodiment of the present invention further includes: fixing the at least one second semiconductor chip 103 and the optical coupling area protection ring 400 to the corresponding first Before forming on the non-light coupling area 1025 of the first surface 102a of the semiconductor chip 102, a plurality of conductive channels 1021 are made in each first semiconductor chip 102, and both sides of each conductive channel 1021 are They are respectively exposed from both sides of the first semiconductor chip 102 . The conductive channel 1021 can be formed by connecting multiple sections of conductive layers and manufactured separately in multiple processes.
具体地,当第一半导体芯片102为基于硅的光芯片时,在第一半导体芯片102中的衬底中制作多个导电通孔,该导电通孔在制造时可采用“硅通孔”(Through Silicon Via,TSV)技术,TSV是一项高密度封装技术,正在逐渐取代目前工艺比较成熟的引线键合技术,被认为是第四代封装技术。TSV技术通过铜、钨、多晶硅等导电物质的填充,实现硅通孔的垂直电气互连。硅通孔技术可以通过垂直互连减小互联长度,减小信号延迟,降低电容/电感,实现芯片间的低功耗、高速通信,增加宽带和实现器件集成的小型化。TSV工艺可以包括深硅刻蚀形成微孔或盲孔、绝缘层/阻挡层/种子层的沉积、深孔填充、化学机械抛光、减薄、以及再分布引线制备等工艺技术,在光芯片中形成导电通孔的工艺方法包括但不限于激光刻蚀、深反应离子刻蚀等,在形成导电通孔后再采用例如深孔填充等工艺进行导电材料(例如金属)的填充。本发明在此不再赘述。Specifically, when the first semiconductor chip 102 is a silicon-based optical chip, a plurality of conductive vias are made in the substrate in the first semiconductor chip 102, and the conductive vias may be manufactured using "through silicon vias" (through silicon vias). Through Silicon Via (TSV) technology, TSV is a high-density packaging technology that is gradually replacing the current relatively mature wire bonding technology and is considered a fourth-generation packaging technology. TSV technology realizes the vertical electrical interconnection of through silicon holes by filling them with conductive materials such as copper, tungsten, and polysilicon. Through silicon via technology can reduce interconnect length, reduce signal delay, reduce capacitance/inductance through vertical interconnection, achieve low power consumption and high-speed communication between chips, increase bandwidth and achieve miniaturization of device integration. The TSV process can include deep silicon etching to form microvias or blind vias, deposition of insulating layers/barrier layers/seed layers, deep hole filling, chemical mechanical polishing, thinning, and redistribution lead preparation and other process technologies in optical chips. Process methods for forming conductive vias include but are not limited to laser etching, deep reactive ion etching, etc. After forming the conductive vias, processes such as deep hole filling are used to fill the conductive material (eg, metal). The present invention will not be described in detail here.
如图11A所示,在将每个所述导电通道1021的两侧表面从所述第一半导体芯片102的表面露出之后,在每个所述导电通道1021露出的一侧表面上制作第一导电凸点1022。该第一导电凸点1022例如是焊盘(金属凸块)或焊球等。在每个所述导电通道1021露出的表面上制作第一导电凸点1022,以实现 所述导电通道1021与外部电连接点进行电连接。将具有至少一个第一导电凸点1022的第一半导体芯片102的第一表面102a通过键合胶301与第二承载基板300临时键合。As shown in FIG. 11A , after both side surfaces of each conductive channel 1021 are exposed from the surface of the first semiconductor chip 102 , a first conductive channel is formed on the exposed side surface of each conductive channel 1021 . Bump1022. The first conductive bumps 1022 are, for example, pads (metal bumps) or solder balls. First conductive bumps 1022 are made on the exposed surface of each conductive channel 1021 to achieve The conductive channel 1021 is electrically connected to an external electrical connection point. The first surface 102 a of the first semiconductor chip 102 having at least one first conductive bump 1022 is temporarily bonded to the second carrier substrate 300 through the bonding glue 301 .
如图11B所示,在将具有至少一个第一导电凸点1022的第一半导体芯片102与第二承载基板300临时键合之后,在所述第一半导体芯片102的每个所述导电通道1021露出的另一侧表面上制作第二导电凸点1023。As shown in FIG. 11B , after the first semiconductor chip 102 having at least one first conductive bump 1022 is temporarily bonded to the second carrier substrate 300 , each of the conductive channels 1021 of the first semiconductor chip 102 Second conductive bumps 1023 are formed on the exposed other side surface.
如图11C所示,在所述第一半导体芯片102的每个所述导电通道1021露出的另一侧表面上制作第二导电凸点1023之后,将具有至少一个第二导电凸点1023的第一半导体芯片102的第二表面102b通过键合胶201与第一承载基板200临时键合,以及,将所述第二承载基板300解键合,从而得到如图2A所示的具有第一承载基板200以及包括多个第一半导体芯片的半导体晶片100组成的结构。As shown in FIG. 11C , after the second conductive bumps 1023 are formed on the other side surface of each conductive channel 1021 of the first semiconductor chip 102 where the conductive channels 1021 are exposed, the third conductive bump 1023 will be provided with at least one second conductive bump 1023 . The second surface 102b of a semiconductor chip 102 is temporarily bonded to the first carrier substrate 200 through the bonding glue 201, and the second carrier substrate 300 is debonded, thereby obtaining the first carrier substrate 200 as shown in FIG. 2A and a structure composed of a semiconductor wafer 100 including a plurality of first semiconductor chips.
具体地,结合图2A-图2C所示,在所述第二半导体芯片103的一侧制作多个第三导电凸点1032,其中,所述多个第三导电凸点1032与每个所述导电通道1021上的第一导电凸点1022一一对应。将每个所述第三导电凸点1032与对应的所述第一导电凸点1022相键合,以将所述第二半导体芯片103与所述第一半导体芯片102固定连接在一起。Specifically, as shown in FIGS. 2A-2C , a plurality of third conductive bumps 1032 are made on one side of the second semiconductor chip 103 , wherein the plurality of third conductive bumps 1032 are connected to each of the The first conductive bumps 1022 on the conductive channel 1021 correspond one to one. Each third conductive bump 1032 is bonded to the corresponding first conductive bump 1022 to fixedly connect the second semiconductor chip 103 and the first semiconductor chip 102 together.
本发明实施例中,所述第二半导体芯片103采用倒装焊接的方式焊接到所述第一半导体芯片102上。将每个所述第三导电凸点1032与对应的所述第一导电凸点1022相键合,其键合的方式可以采用热压焊(TCB,Thermal Compress Bonding)、回流焊、激光键合或者金属直接键合等方式。如果所述第二半导体芯片103有金属焊球或者金属凸块等,还需要做底部填充的工艺。应理解,根据实际需要,还可以将多颗第二半导体芯片103连接到同一颗第一半导体芯片102上。In this embodiment of the present invention, the second semiconductor chip 103 is soldered to the first semiconductor chip 102 using flip-chip soldering. Each third conductive bump 1032 is bonded to the corresponding first conductive bump 1022 by thermal compression bonding (TCB), reflow soldering, or laser bonding. Or metal direct bonding, etc. If the second semiconductor chip 103 has metal solder balls or metal bumps, an underfill process is also required. It should be understood that according to actual needs, multiple second semiconductor chips 103 can also be connected to the same first semiconductor chip 102.
需要说明的是,上述所述多个第三导电凸点1032与每个所述导电通道1021上的第一导电凸点1022一一对应是为了电信号端子连接时进行一一对应连接,并非完全限定为上、下投影位置上的一一对应。应理解,当所述多个第三导电凸点1032与每个所述导电通道1021上的第一导电凸点1022、下投影位置也对应时,第一半导体芯片102与所述第二半导体芯片103上、下垂直互 连,所需要的连接距离最短,因此,可以避免所述第一半导体芯片102与所述第二半导体芯片103之间由于连接线过长所引起的阻抗较大,限制了电流的通过能力等问题,从而减少了所述第一半导体芯片102与所述第二半导体芯片103上、下互连的损耗。It should be noted that the one-to-one correspondence between the plurality of third conductive bumps 1032 and the first conductive bumps 1022 on each of the conductive channels 1021 is for the purpose of one-to-one correspondence when the electrical signal terminals are connected, and is not completely It is limited to a one-to-one correspondence between the upper and lower projection positions. It should be understood that when the plurality of third conductive bumps 1032 also correspond to the first conductive bumps 1022 and lower projection positions on each of the conductive channels 1021, the first semiconductor chip 102 and the second semiconductor chip 103 Up and down vertically mutually The required connection distance is the shortest. Therefore, it is possible to avoid problems such as large impedance caused by too long connection lines between the first semiconductor chip 102 and the second semiconductor chip 103, which limits the current passing ability. , thereby reducing the losses in the upper and lower interconnections between the first semiconductor chip 102 and the second semiconductor chip 103 .
根据本发明实施例的另一方面,还提供一种封装结构。According to another aspect of the embodiment of the present invention, a packaging structure is also provided.
继续参考图3、图9所示,在本发明实施例提供的封装结构中,包括:第一半导体芯片102、至少一个第二半导体芯片103以及光耦合区保护环400、和塑封层106,所述第一半导体芯片102具有相对的第一表面102a和第二表面102b,在所述第一表面102a设置有光耦合区1024以及围绕所述光耦合区1024的非光耦合区1025,所述光耦合区1024内设置有光耦合接口104;所述至少一个第二半导体芯片103以及所述光耦合区保护环400分别固定在所述第一表面102a的所述非光耦合区1025上;其中,所述光耦合区保护环400环绕所述光耦合区1024;所述塑封层106包覆所述至少一个第二半导体芯片103和所述光耦合区保护环400远离所述光耦合区1024的外侧表面并且不覆盖所述光耦合区保护环400所占区域。Continuing to refer to Figures 3 and 9, the packaging structure provided by the embodiment of the present invention includes: a first semiconductor chip 102, at least one second semiconductor chip 103, an optical coupling area protection ring 400, and a plastic sealing layer 106. The first semiconductor chip 102 has an opposite first surface 102a and a second surface 102b. A light coupling region 1024 and a non-light coupling region 1025 surrounding the light coupling region 1024 are provided on the first surface 102a. An optical coupling interface 104 is provided in the coupling area 1024; the at least one second semiconductor chip 103 and the optical coupling area protection ring 400 are respectively fixed on the non-optical coupling area 1025 of the first surface 102a; wherein, The light coupling area protection ring 400 surrounds the light coupling area 1024; the plastic encapsulation layer 106 covers the at least one second semiconductor chip 103 and the light coupling area protection ring 400 is away from the outside of the light coupling area 1024. surface and does not cover the area occupied by the light coupling area protection ring 400 .
进一步地,在垂直于所述第一表面102a的方向上,所述光耦合区保护环400远离所述第一表面102a的顶面与所述塑封层106远离所述第一表面102a的顶面齐平。Further, in a direction perpendicular to the first surface 102a, the light coupling area protection ring 400 is away from the top surface of the first surface 102a and the plastic sealing layer 106 is away from the top surface of the first surface 102a. Flush.
进一步地,所述至少一个第二半导体芯片103远离所述第一表面102a的顶面露出在所述塑封层106之外,并且在垂直于所述第一表面102a的方向上,所述光耦合区保护环400远离所述第一表面102a的顶面与所述至少一个第二半导体芯片103远离所述第一表面102a的顶面齐平。Further, the top surface of the at least one second semiconductor chip 103 away from the first surface 102a is exposed outside the plastic encapsulation layer 106, and in a direction perpendicular to the first surface 102a, the light coupling The top surface of the area protection ring 400 away from the first surface 102a is flush with the top surface of the at least one second semiconductor chip 103 away from the first surface 102a.
示例性地,所述光耦合区保护环400是空心的管状结构或者是具有空心并带顶盖的杯状结构。For example, the optical coupling area protection ring 400 is a hollow tubular structure or a hollow cup-shaped structure with a top cover.
可选地,所述光耦合区保护环400包括金属、陶瓷、硅中的至少一种。优选地,所述光耦合区保护环400选用与第一半导体芯片102的热膨胀系数以及刚度相近的材料,例如陶瓷或者硅等。所述光耦合区保护环400采用基板键合的方式或者胶体粘接的方式固定在所述第一半导体芯片102的第一表面102a的非光耦合区上1025。 Optionally, the optical coupling area protection ring 400 includes at least one of metal, ceramic, and silicon. Preferably, the optical coupling area protection ring 400 is made of a material with a thermal expansion coefficient and stiffness similar to those of the first semiconductor chip 102, such as ceramics or silicon. The light coupling area protection ring 400 is fixed on the non-light coupling area 1025 of the first surface 102a of the first semiconductor chip 102 by substrate bonding or colloid bonding.
由上述内容可知,本发明实施例提供的封装结构的制作方法及封装结构,所述方法包括:提供半导体晶片,所述半导体晶片包括多个第一半导体芯片,该半导体晶片上的多个第一半导体芯片构成一个整体结构,针对每个所述第一半导体芯片,在第一半导体芯片的非光耦合区上制作环绕光耦合区的光耦合区保护环,使得在第一半导体芯片的非光耦合区上制作塑封层时,令光耦合区的上表面不被塑封层覆盖,保护光耦合区内光耦合接口不被塑封层中的有机物污染的同时,还保证了光耦合区的表面纯净,有利于后续光耦合接口能够与光纤阵列维持较高的耦合效率。It can be seen from the above that the manufacturing method and packaging structure of the packaging structure provided by the embodiment of the present invention include: providing a semiconductor wafer, the semiconductor wafer includes a plurality of first semiconductor chips, and a plurality of first semiconductor chips on the semiconductor wafer. The semiconductor chip forms an integral structure, and for each first semiconductor chip, an optical coupling area protection ring surrounding the optical coupling area is made on the non-optical coupling area of the first semiconductor chip, so that the non-optical coupling area of the first semiconductor chip When making a plastic sealing layer on the optical coupling area, make sure that the upper surface of the optical coupling area is not covered by the plastic sealing layer. This not only protects the optical coupling interface in the optical coupling area from being contaminated by organic matter in the plastic sealing layer, but also ensures that the surface of the optical coupling area is pure and has This is conducive to the subsequent optical coupling interface being able to maintain a high coupling efficiency with the optical fiber array.
本领技术人员应当理解,以上所公开的仅为本发明的实施方式而已,当然不能以此来限定本发明请求专利保护的权利范围,依本发明实施方式所作的等同变化,仍属本发明之权利要求所涵盖的范围。 Those skilled in the art should understand that what is disclosed above is only the implementation mode of the present invention. Of course, it cannot be used to limit the scope of the patent protection claimed by the present invention. Equivalent changes made according to the implementation mode of the present invention still belong to the rights of the present invention. The scope of the requirements.

Claims (22)

  1. 一种封装结构的制作方法,其特征在于,所述方法包括:A method of manufacturing a packaging structure, characterized in that the method includes:
    提供半导体晶片,所述半导体晶片包括多个第一半导体芯片,每个所述第一半导体芯片具有相对的第一表面和第二表面,所述第一表面上设置有光耦合区以及围绕所述光耦合区的非光耦合区,所述光耦合区内设置有光耦合接口;A semiconductor wafer is provided, the semiconductor wafer includes a plurality of first semiconductor chips, each of the first semiconductor chips has an opposite first surface and a second surface, the first surface is provided with a light coupling region and surrounds the a non-optical coupling area of the optical coupling area, with an optical coupling interface provided in the optical coupling area;
    针对每个所述第一半导体芯片,提供与该第一半导体芯片对应的至少一个第二半导体芯片以及光耦合区保护环,并将所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在该第一半导体芯片的所述第一表面的所述非光耦合区上,其中,所述光耦合区保护环环绕所述光耦合区;For each of the first semiconductor chips, at least one second semiconductor chip and a light coupling area protection ring corresponding to the first semiconductor chip are provided, and the at least one second semiconductor chip and the light coupling area protection ring are respectively fixed on the non-light coupling area of the first surface of the first semiconductor chip, wherein the light coupling area protection ring surrounds the light coupling area;
    制作塑封层,所述塑封层包覆所述至少一个第二半导体芯片和所述光耦合区保护环远离所述光耦合区的外侧表面并且所述塑封层不覆盖所述光耦合区保护环所占区域。Make a plastic sealing layer, the plastic sealing layer covers the at least one second semiconductor chip and the outer surface of the light coupling region protection ring away from the light coupling region, and the plastic sealing layer does not cover the light coupling region protection ring. occupy area.
  2. 如权利要求1所述的封装结构的制作方法,其特征在于,在垂直于所述第一表面的方向上,所述光耦合区保护环远离所述第一表面的顶面与所述至少一个第二半导体芯片远离所述第一表面的顶面齐平。The method of manufacturing a packaging structure according to claim 1, wherein in a direction perpendicular to the first surface, the light coupling area protection ring is away from the top surface of the first surface and the at least one A top surface of the second semiconductor chip away from the first surface is flush.
  3. 如权利要求2所述的封装结构的制作方法,其特征在于,所述制作塑封层包括:The method of manufacturing a packaging structure according to claim 2, wherein the manufacturing of the plastic sealing layer includes:
    提供一塑封模具,所述塑封模具上具有与所述多个第一半导体芯片一一对应的多个U形腔体,A plastic packaging mold is provided, and the plastic packaging mold has a plurality of U-shaped cavities corresponding to the plurality of first semiconductor chips,
    在每个所述腔体内的预设区域处设置胶状塑封材料;Set a gel-like plastic sealing material at a preset area in each cavity;
    将设置有所述胶状塑封材料的所述塑封模具倒置并压合在所述半导体晶片的所述第一表面上,以形成所述塑封层。The plastic mold provided with the glue-like plastic material is inverted and pressed on the first surface of the semiconductor wafer to form the plastic layer.
  4. 如权利要求3所述的封装结构的制作方法,其特征在于,所述制作塑封层还包括:The method of making a packaging structure according to claim 3, wherein said making the plastic sealing layer further includes:
    在将所述塑封模具倒置并压合在所述半导体晶片上时,所述光耦合区保护环的远离所述第一表面的顶面与所述腔体的底部贴合。When the plastic mold is inverted and pressed onto the semiconductor wafer, the top surface of the light coupling area protection ring away from the first surface is in contact with the bottom of the cavity.
  5. 如权利要求3所述的封装结构的制作方法,其特征在于,所述制作塑封层还包括:The method of making a packaging structure according to claim 3, wherein said making the plastic sealing layer further includes:
    在设置所述胶状塑封材料之前,在每个所述腔体的底部设置疏胶层,并在 所述疏胶层的所述预设区域处设置所述胶状塑封材料。Before disposing the gel-like plastic sealing material, a gel-repellent layer is disposed at the bottom of each cavity, and The glue-like plastic sealing material is disposed in the preset area of the glue-repellent layer.
  6. 如权利要求5所述的封装结构的制作方法,其特征在于,所述制作塑封层还包括:The method of manufacturing a packaging structure according to claim 5, wherein said manufacturing the plastic sealing layer further includes:
    在将所述塑封模具倒置并压合在所述半导体晶片上时,所述光耦合区保护环的远离所述第一表面的顶面与所述疏胶层贴合。When the plastic mold is inverted and pressed onto the semiconductor wafer, the top surface of the light coupling area protection ring away from the first surface is attached to the glue-repellent layer.
  7. 如权利要求3所述的封装结构的制作方法,其特征在于,所述方法还包括:The method for manufacturing a packaging structure according to claim 3, wherein the method further includes:
    在形成所述塑封层之后,去除所述塑封模具。After forming the plastic sealing layer, the plastic sealing mold is removed.
  8. 如权利要求7所述的封装结构的制作方法,其特征在于,所述方法还包括:The method of manufacturing a packaging structure according to claim 7, wherein the method further includes:
    在去除所述塑封模具之后,对所述半导体晶片进行切割以得到多个分离的芯片封装组件,每个所述芯片封装组件包括一个第一半导体芯片、对应的至少一个第二半导体芯片、光耦合区保护环以及塑封层。After removing the plastic mold, the semiconductor wafer is cut to obtain a plurality of separate chip packaging components. Each of the chip packaging components includes a first semiconductor chip, a corresponding at least one second semiconductor chip, an optical coupling Protective ring and plastic sealing layer.
  9. 如权利要求8所述的封装结构的制作方法,其特征在于,所述方法还包括:The method for manufacturing a packaging structure according to claim 8, wherein the method further includes:
    在得到多个分离的所述芯片封装组件之后,将每个所述芯片封装组件安装至对应的封装基板上;以及After obtaining a plurality of separate chip packaging components, each of the chip packaging components is mounted on a corresponding packaging substrate; and
    将导光结构或者激光器芯片安装至所述第一半导体芯片的所述光耦合接口上。Mount a light guide structure or a laser chip onto the optical coupling interface of the first semiconductor chip.
  10. 如权利要求1所述的封装结构的制作方法,其特征在于,所述方法还包括:The method of manufacturing a packaging structure according to claim 1, wherein the method further includes:
    在将所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在对应的第一半导体芯片的所述第一表面的所述非光耦合区上之前,在每个所述第一半导体芯片内制作多个导电通道,并将每个所述导电通道的两侧表面分别从所述第一半导体芯片的两侧表面露出。Before fixing the at least one second semiconductor chip and the light-coupling area protective ring on the non-light-coupling area of the first surface of the corresponding first semiconductor chip, each first A plurality of conductive channels are made in the semiconductor chip, and both sides of each conductive channel are exposed from both sides of the first semiconductor chip.
  11. 如权利要求10所述的封装结构的制作方法,其特征在于,所述方法还包括:The method of manufacturing a packaging structure according to claim 10, characterized in that the method further includes:
    在将每个所述导电通道的两侧表面从所述第一半导体芯片的表面露出之后,在每个所述导电通道露出的一侧表面上制作第一导电凸点。 After exposing two side surfaces of each conductive channel from the surface of the first semiconductor chip, first conductive bumps are formed on the exposed one side surface of each conductive channel.
  12. 如权利要求11所述的封装结构的制作方法,其特征在于,所述方法还包括:The method for manufacturing a packaging structure according to claim 11, wherein the method further includes:
    在每个所述导电通道露出的一侧表面上制作第一导电凸点之后,将每个所述第一半导体芯片靠近所述第一导电凸点的一侧表面与第二承载基板进行临时键合;以及,After forming first conductive bumps on the exposed side surface of each conductive channel, temporarily bonding the side surface of each first semiconductor chip close to the first conductive bumps with the second carrier substrate. together; and,
    在每个所述第一半导体芯片的每个所述导电通道露出的另一侧表面上制作第二导电凸点。A second conductive bump is formed on the exposed other side surface of each conductive channel of each first semiconductor chip.
  13. 如权利要求12所述的封装结构的制作方法,其特征在于,所述方法还包括:The method of manufacturing a packaging structure according to claim 12, wherein the method further includes:
    在每个所述第一半导体芯片的每个所述导电通道露出的另一侧表面上制作第二导电凸点之后,将所述第一半导体芯片靠近所述第二导电凸点的一侧表面与第一承载基板进行临时键合;以及,After forming a second conductive bump on the exposed other side surface of each conductive channel of each first semiconductor chip, place the first semiconductor chip close to the side surface of the second conductive bump. Temporarily bonding to the first carrier substrate; and,
    将所述第二承载基板解键合。The second carrier substrate is debonded.
  14. 如权利要求1所述的封装结构的制作方法,其特征在于,The method of manufacturing a packaging structure as claimed in claim 1, characterized in that:
    所述第一半导体芯片是光子集成电路芯片,所述第二半导体芯片是电子集成电路芯片。The first semiconductor chip is a photonic integrated circuit chip, and the second semiconductor chip is an electronic integrated circuit chip.
  15. 如权利要求1所述的封装结构的制作方法,其特征在于,The method of manufacturing a packaging structure as claimed in claim 1, characterized in that:
    所述光耦合区保护环是空心的管状结构或者是具有空心并带顶盖的杯状结构。The optical coupling area protection ring is a hollow tubular structure or a hollow cup-shaped structure with a top cover.
  16. 如权利要求15所述的封装结构的制作方法,其特征在于,The method of manufacturing a packaging structure as claimed in claim 15, characterized in that:
    所述光耦合区保护环包括金属、陶瓷、硅中的任意一种。The light coupling area protection ring includes any one of metal, ceramic, and silicon.
  17. 一种封装结构,其特征在于,包括:A packaging structure, characterized by including:
    第一半导体芯片,所述第一半导体芯片具有相对的第一表面和第二表面,在所述第一表面设置有光耦合区以及围绕所述光耦合区的非光耦合区,所述光耦合区内设置有光耦合接口;A first semiconductor chip, the first semiconductor chip has an opposite first surface and a second surface, a light coupling region and a non-light coupling region surrounding the light coupling region are provided on the first surface, the light coupling region There is an optical coupling interface in the area;
    至少一个第二半导体芯片以及光耦合区保护环,所述至少一个第二半导体芯片以及所述光耦合区保护环分别固定在所述第一表面的所述非光耦合区上,其中,所述光耦合区保护环环绕所述光耦合区;At least one second semiconductor chip and the light coupling area protection ring, the at least one second semiconductor chip and the light coupling area protection ring are respectively fixed on the non-light coupling area of the first surface, wherein, An optical coupling area protective ring surrounds the optical coupling area;
    塑封层,所述塑封层包覆所述至少一个第二半导体芯片和所述光耦合区保 护环远离所述光耦合区的外侧表面并且所述塑封层不覆盖所述光耦合区保护环所占区域。A plastic encapsulation layer covering the at least one second semiconductor chip and the optical coupling area to protect the The guard ring is away from the outer surface of the light coupling area and the plastic sealing layer does not cover the area occupied by the light coupling area guard ring.
  18. 如权利要求17所述的封装结构,其特征在于,The packaging structure according to claim 17, characterized in that:
    在垂直于所述第一表面的方向上,所述光耦合区保护环远离所述第一表面的顶面与所述塑封层远离所述第一表面的顶面齐平。In a direction perpendicular to the first surface, the top surface of the light coupling area protection ring away from the first surface is flush with the top surface of the plastic sealing layer away from the first surface.
  19. 如权利要求17所述的封装结构,其特征在于,The packaging structure according to claim 17, characterized in that:
    所述至少一个第二半导体芯片远离所述第一表面的顶面露出在所述塑封层之外,并且在垂直于所述第一表面的方向上,所述光耦合区保护环远离所述第一表面的顶面与所述至少一个第二半导体芯片远离所述第一表面的顶面齐平。The top surface of the at least one second semiconductor chip away from the first surface is exposed outside the plastic encapsulation layer, and in a direction perpendicular to the first surface, the light coupling area protection ring is away from the first surface. A top surface of one surface is flush with a top surface of the at least one second semiconductor chip away from the first surface.
  20. 如权利要求17所述的封装结构,其特征在于,The packaging structure according to claim 17, characterized in that:
    所述光耦合区保护环是空心的管状结构或者是具有空心结构并带顶盖的杯状结构。The optical coupling area protection ring is a hollow tubular structure or a cup-shaped structure with a hollow structure and a top cover.
  21. 如权利要求20所述的封装结构,其特征在于,The packaging structure according to claim 20, characterized in that:
    所述光耦合区保护环包括金属、陶瓷、硅中的至少一种材料。The light coupling area protection ring includes at least one material selected from metal, ceramic, and silicon.
  22. 如权利要求20所述的封装结构,其特征在于,当所述光耦合区保护环为杯状结构时,其空心结构与顶盖通过粘接层粘接。 The packaging structure of claim 20, wherein when the light coupling area protection ring has a cup-shaped structure, its hollow structure and the top cover are bonded through an adhesive layer.
PCT/CN2023/080944 2022-03-18 2023-03-10 Manufacturing method for packaging structure, and packaging structure WO2023174186A1 (en)

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