WO2023148265A1 - Vorrichtung zur erzeugung einer plasma-aktivierten flüssigkeit, gerät und verfahren zur reinigung und/oder sterilisation - Google Patents
Vorrichtung zur erzeugung einer plasma-aktivierten flüssigkeit, gerät und verfahren zur reinigung und/oder sterilisation Download PDFInfo
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- WO2023148265A1 WO2023148265A1 PCT/EP2023/052558 EP2023052558W WO2023148265A1 WO 2023148265 A1 WO2023148265 A1 WO 2023148265A1 EP 2023052558 W EP2023052558 W EP 2023052558W WO 2023148265 A1 WO2023148265 A1 WO 2023148265A1
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- liquid
- flat electrode
- gas
- discharge space
- activated
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/247—Generating plasma using discharges in liquid media
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/722—Oxidation by peroxides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
- C02F2001/46152—Electrodes characterised by the shape or form
- C02F2001/46157—Perforated or foraminous electrodes
- C02F2001/46161—Porous electrodes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/38—Gas flow rate
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2307/00—Location of water treatment or water treatment device
- C02F2307/12—Location of water treatment or water treatment device as part of household appliances such as dishwashers, laundry washing machines or vacuum cleaners
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/20—Treatment of liquids
Definitions
- the present invention relates to a device for generating a plasma-activated liquid, a device that has such a device, and methods for cleaning and/or sterilization.
- PAW plasma-activated water
- a device for generating a plasma-activated liquid which has a first flat electrode and a second flat electrode, the first flat electrode and the second flat electrode being separated from one another by a discharge space.
- the device also has a voltage source which is designed to apply a voltage between the first flat electrode and the second flat electrode, so that an electrical discharge is ignited in the discharge space between the first flat electrode and the second flat electrode.
- the device has a liquid supply, which is designed to supply a liquid to the discharge space in such a way that the liquid forms a liquid film in the discharge space, which is exposed to the electrical discharge when the electrical discharge is ignited in the discharge space.
- the liquid film can be formed on one of the flat electrodes or on a body arranged in the discharge space.
- a thin cohesive layer of the liquid that wets the surface is referred to here as a liquid film.
- a liquid film may differ in its flow properties from a bulky liquid.
- a liquid can be called a liquid film if the thickness of the liquid is less than 1 mm.
- species are activated in a gas in the discharge space, for example ozone, NOx and/or peroxides. These activated species can be delivered to the liquid film, thereby plasma activating the liquid in the liquid film.
- a liquid film is particularly suitable for use in a device for generating a plasma-activated liquid, since the liquid film has a very large surface area, which is exposed to the electrical discharge in the discharge space, compared to a voluminous liquid.
- discharge-induced plasma chemistry and energy transfer to the liquid film take place over a large surface area of the liquid film.
- an exchange of activated species that are generated in the gas by the electrical discharge can occur at an interface between the liquid film and a gas. Since the liquid film has a large surface area, the exchange of the activated species can take place at a high exchange rate. A high exchange rate between the activated species is synonymous with a high efficiency of the device.
- the use of the liquid film enables a plasma to produce activated liquid with a high concentration of activated species. Due to the low thickness of the liquid film, a di f fusion-limited exchange rate within the liquid is high and a new equilibrium of active species can quickly be established in the liquid.
- a liquid film in a device for producing a plasma-activated liquid in which the liquid of the liquid film is plasma-activated makes it possible to construct a simple device with a less complex structure.
- the liquid can be metered in a simple manner by appropriately adjusting the liquid supply and, if necessary, a liquid discharge.
- the gas used can be metered by setting a flow rate of a gas supply and a gas discharge. A mixing ratio of liquid and gas in the discharge space can thus be controlled in a targeted manner.
- the initial stoichiometry in the plasma-activated gas and liquid is easily controlled by a simple and robust dosing system.
- An electrode can be referred to as "flat" if it is designed to initiate the electrical discharge at its surface.
- a flat electrode can have a substantially two-dimensional surface to which a voltage can be applied.
- the flat electrode can be planar and can accordingly be arranged essentially in one plane.
- the flat electrode can also have a surface which is not planar but forms a surface of a three-dimensional body, for example a surface of a cylinder Liquid film can be formed.
- the liquid film preferably has a thickness of 0.2 mm or less, preferably 0.1 mm or less.
- the thickness of the liquid film can be between 50 nm and 0.2 mm, preferably between 100 nm and 0.1 mm.
- liquid film having a thickness of less than 50 nm openings are easy to form in the film and the liquid film may not cover one of the planar electrodes or other body continuously, which may result in uneven electric discharge. Uneven discharge could damage the device or shorten the life of the device. This is preferably avoided by a liquid film with a thickness of at least 50 nm.
- the surface area to volume ratio of the liquid film is sufficiently large to allow exchange of active species at the interface of the liquid Liquid films and the gas in the discharge space takes place with high ef fi ciency. Due to the small thickness of the liquid film of 0.2 mm or less, a diffusion-limited exchange rate within the liquid can be high and a new equilibrium of active species can quickly be established in the liquid.
- the liquid film has a thickness in the preferred range of 100 nm to 0.1 mm, the formation of openings in the liquid film is impossible even on poorly wettable substrates and the efficiency of the plasma activation is very high.
- the first flat electrode can have a dielectric layer that faces the discharge space.
- the second flat electrode can have a dielectric layer that faces the discharge space. If at least one of the two flat electrodes has a dielectric layer, the electrical discharge is ignited as a dielectric barrier discharge.
- the dielectric layer can cover that flat electrode on which the liquid film is arranged. As a result, direct contact of the liquid film with a conductive contact surface of the flat electrode can be avoided. Alternatively or additionally, the dielectric layer can cover one of the flat electrodes on which no liquid film is arranged. The dielectric layer can optimize the burning behavior during electrical discharge.
- the dielectric layer of the first flat electrode and/or the dielectric layer of the second flat electrode can be porous and/or rough. Porous and rough layers are characterized by good wettability with a liquid. In particular, the liquid film can be produced on the dielectric layer. The porous or rough property of the layer ensures that the liquid film remains on the layer in order to be activated with plasma.
- the roughness or porosity of the layer ensures that the electrode has good wettability and facilitates homogeneous dosing of the liquid and the distribution of the liquid to form a continuous liquid film. Due to the good wetting properties of a rough and/or porous electrode, a defined separation of liquid phase and gas phase can always be ensured.
- the porous layer can have small cavities.
- a layer may be considered porous herein if the void volume of the layer is at least 5% of the total volume of the layer, preferably 10% of the total volume, more preferably 20% of the total volume.
- a layer is considered rough if the surface of the layer is uneven. Accordingly, the surface of the layer can have microscopic depressions and microscopic elevations that increase the surface area of the layer and facilitate the formation of the liquid film.
- the liquid feed can be designed to feed the liquid into the discharge space in such a way that the liquid forms the liquid film on a surface of the first flat electrode that faces the discharge space.
- this Surface of the first flat electrode formed by the dielectric layer Preferably this Surface of the first flat electrode formed by the dielectric layer.
- the first flat electrode can have a transport layer of a porous material.
- the transport layer can form the surface of the first flat electrode that faces the discharge space.
- the porous material of the transport layer can be dielectric.
- the liquid can both move within the transport layer and form the liquid film on the surface of the transport layer.
- the transport layer has a high porosity, so that the liquid can be moved within the transport layer by capillary forces.
- the liquid supply is preferably designed to supply a liquid to the transport layer, so that the liquid is moved through the transport layer and forms the liquid film on the surface of the transport layer.
- the use of such a liquid supply which does not apply the liquid directly to the surface of the first electrode, but instead introduces it into the transport layer, enables the liquid to be dosed particularly precisely. Liquid can be continuously replenished via the liquid supply, so that a liquid film with a constant thickness remains on the surface of the transport layer.
- a porous body In the discharge space, a porous body can be arranged, from the first flat electrode and from the second flat electrode is each separated by a gap.
- the liquid supply can be designed to produce the liquid film on a surface of the porous body. Accordingly, no porous film is generated on the electrodes themselves.
- the liquid film in the gap between the first electrode and the body and a liquid film in the gap between the second electrode and the body can each be plasma-activated.
- a porous body can be arranged in the discharge space, which is separated from the first flat electrode and from the second flat electrode by a gap, with the liquid supply being designed to separate the liquid film on a surface of the to generate porous body facing the first electrode, and to generate another liquid film on a surface of the porous body, which faces the second electrode, wherein no liquid film is generated on the first electrode and the second electrode.
- the porous body may be located in a gap between the first and second electrodes.
- the device can have a reaction chamber in which the discharge space is arranged.
- the reaction chamber can have a liquid outlet which is designed to dispense the plasma-activated liquid.
- the liquid withdrawal can be a valve, for example. Fluid withdrawal may allow in a controlled manner plasma-activated liquid from the
- the device can have a liquid reservoir that contains the liquid.
- the liquid feed can be designed to remove the liquid from the liquid reservoir and feed it to the discharge space, with the device having a liquid return channel which is designed to return the liquid from the reaction chamber to the liquid reservoir.
- the liquid can thus be used in a circuit and activated multiple times.
- plasma-activated liquid can be collected in the liquid reservoir.
- the place of production and the place of application can be different. It does not have to be used immediately after production, but storage and later use of the activated liquid are possible. Plasma-activated liquids retain their antibacterial activity over a period of several months.
- the device can have a gas reservoir, with a gas supply being designed to remove a gas from the gas reservoir and supply it to the reaction chamber.
- the device can be designed to activate the gas in the discharge space during the electrical discharge.
- the gas can be circulated between the gas reservoir and the reaction chamber and can be activated several times in the process. Activated gas can be accumulated in the gas reservoir in this way.
- the reaction chamber can have a gas outlet which is designed to release the activated gas.
- the activated gas can be used for cleaning or sterilization, for example.
- the device can have a recirculation channel that is designed to return the activated gas from the reaction chamber to the gas reservoir.
- the liquid reservoir and the gas reservoir can be connected to one another and an outlet of the recirculation channel can be arranged in the liquid reservoir, so that activated gas discharged at the outlet of the recirculation channel flows through the liquid in the liquid reservoir.
- the activated gas can be released in the form of bubbles.
- the activated gas can release at least part of its active species to the liquid, which is thus enriched with the active species.
- the first flat electrode and the second flat electrode can be planar or cylindrically symmetrical. If the first or the second flat electrode is cylindrically symmetrical, then the respective electrode forms a surface of a cylinder. This can be an inner or an outer surface of a hollow cylinder. a
- the liquid can only be moved in the device using free convection.
- the device can do without active pumping elements and only move the liquid by capillary forces and gravitation.
- the device can thus operate in an energy-efficient manner. If the liquid film is produced on the first flat electrode or on the second flat electrode, the liquid film can cool the respective electrode. Overheating of the discharge space can thus be avoided.
- the liquid could be cooled by means of a cooling mechanism before being fed into the discharge space.
- a further aspect relates to a device which has the device described above for generating a plasma-activated liquid.
- the appliance can be a household appliance, for example a floor care appliance, a cleaning robot, a coffee machine, a dishwasher or a dryer. Alternatively, it can also be other devices, for example a device for water treatment or a medical device used in biomedicine.
- a plasma-activated liquid and/or a plasma-activated gas can be generated with the device described above, with the liquid and/or the gas being used for cleaning and/or sterilization.
- FIG. 1 shows a first exemplary embodiment of a device for generating a plasma-activated liquid.
- FIG. 2 shows a second exemplary embodiment of the device.
- FIG. 3 shows a third exemplary embodiment of the device.
- FIG. 4 shows a fourth exemplary embodiment of the device.
- FIG. 5 shows a fifth exemplary embodiment of the device.
- FIG. 1 shows a first exemplary embodiment of a device for generating a plasma-activated liquid.
- the device has a first flat electrode 1 and a second flat electrode 2 .
- the two flat electrodes are separated from one another by a discharge space 3 .
- the device also has a voltage source 4 which is connected to the first flat electrode 1 and to the second flat electrode 2 .
- the voltage source 4 is designed to apply a voltage between the two flat electrodes 1 , 2 .
- the voltage can be an AC voltage or a pulsed voltage. If the voltage source 4 applies a voltage between the two flat electrodes 1, 2, an electric field is created in the discharge space 3 between the two flat electrodes 1, 2, the field strength of which is sufficient to ignite an electric discharge.
- the device has a liquid supply 5 which supplies a liquid to the discharge space 3 .
- the liquid can be water or another process liquid, for example. In the exemplary embodiment shown in FIG. 1, the liquid is applied from the liquid supply 5 to a first end of a surface 6 of the first flat electrode 1 .
- the liquid flows along the surface 6 of the first flat electrode 1 and forms a liquid film 7 on the surface 6 of the first flat electrode 1 .
- the device At a second end of the surface 6 of the first flat electrode 1 , which is opposite the first end, the device has a liquid outlet 8 .
- the liquid can be removed from the first flat electrode 1 at the liquid removal point 8 .
- the liquid flows through the discharge space 3 as a liquid film 7 between the liquid supply 5 and the liquid removal 8 . In the discharge space 3, the liquid is exposed to the electrical discharge and thereby plasma-activated.
- the first flat electrode 1 has a conductive contact surface 1a and a dielectric layer 1b.
- the conductive contact surface la can be a metal surface.
- the conductive contact surface la is connected to the voltage source 4, it being possible for the voltage source 4 to apply an electrical potential to the conductive contact surface la.
- the dielectric layer 1b covers the conductive one
- the liquid film 7 forms on the surface 6 of the dielectric layer.
- the dielectric layer 1b acts as a barrier, so that the electrical discharge is ignited as a dielectric barrier discharge (DBD).
- DBD dielectric barrier discharge
- the dielectric layer 1b is preferably rough and/or porous.
- a rough and/or porous layer is characterized by good wettability with the liquid.
- the rough and/or porous design of the dielectric layer 1b ensures that the liquid film 7 can be formed on the dielectric layer and the dielectric layer remains wetted with the liquid.
- the second flat electrode 2 has a conductive contact surface 2 a which is connected to the voltage source 4 .
- the conductive contact surface 2a of the second flat electrode 2 is not covered by a dielectric layer.
- the device also has a gas inlet 9 and a gas outlet 10 .
- a gas is introduced from the gas supply 9 into the discharge space 3 and drawn off from the discharge space 3 by the gas extraction 10 .
- a flow direction of the gas from the gas supply to the gas withdrawal can be opposite to a flow direction of the liquid from the liquid supply 5 to the liquid withdrawal 8 .
- the gas can be air or another process gas.
- the electrical discharge in the discharge space 3 causes chemical species, e.g. B. Ozone, NOx or peroxides generated .
- the boundary surface of the liquid film 7 is in contact with the gas and takes off species generated from a gas phase of the gas at the interface.
- the gas is enriched with the species generated by the electrical discharge and can also absorb vapor, for example water vapor, through exchange with the liquid film.
- the liquid of the liquid film 7 enriched with the chemical species thus becomes a plasma-activated liquid.
- the gas is also enriched with the chemical species and with water vapor and is therefore also plasma-activated.
- the device thus produces a plasma-activated liquid and a plasma-activated gas.
- FIG. 2 shows a second exemplary embodiment of the device for generating the plasma-activated liquid.
- the first flat electrode 1 has a conductive contact surface 1a, a fluid distributor 11 and a porous transport layer 12, which are stacked one on top of the other, the porous transport layer 12 forming the surface 6 of the first flat electrode 1, which forms the discharge space 3 faces .
- the fluid distributor 11 is connected to the liquid supply 5 .
- the liquid supply 5 supplies the liquid to the fluid distributor 11 which is used to supply the liquid to the porous transport layer 12 .
- the fluid distributor 11 can be a volume that is filled with liquid from the liquid supply 5 .
- the fluid distributor 11 can thus be a vessel.
- the fluid distributor 11 can be a structured volume which has, for example, a meandering or channel-shaped distributor structure.
- the porous transport structure 12 sucks the liquid out of the fluid manifold 11 by capillary forces.
- the liquid is moved through the transport layer 12 by capillary forces and spread out to form a liquid film 7 on the surface of the porous transport layer 12 .
- the liquid can be constantly replenished via the fluid distributor 11 .
- the liquid film 7 on the surface 6 of the porous transport structure is exposed to the electrical discharge in the discharge space 2 .
- the liquid film 7 is plasma-activated, as described in connection with the first exemplary embodiment.
- the second flat electrode 2 is coated with a dielectric layer 2b.
- the dielectric layer 2 b forms a dielectric barrier with respect to the discharge space 3 , so that the electrical discharge is ignited as a dielectric barrier discharge.
- the liquid in the liquid film 7 formed on the surface 6 of the first flat electrode 1 is activated by the dielectric barrier discharge and can be removed as activated liquid at the liquid outlet.
- the liquid can, in particular, reach the liquid outlet 8 from the surface of the first flat electrode 1 as a result of the gravitational force.
- the liquid in the fluid distributor 11 is located between the conductive contact surface la of the first flat electrode 1 and the second flat electrode.
- the liquid in the fluid distributor 11 is thus in a current path in the event of an electrical discharge. So that the electrical discharge is not negatively influenced by the liquid, it is necessary for the liquid to have a certain conductivity.
- FIG. 3 shows a third exemplary embodiment of the device.
- the third exemplary embodiment is a modification of the second exemplary embodiment in which the position of the first flat electrode has been changed.
- the first flat electrode is arranged between the fluid distributor 11 and the transport layer 12 .
- the first flat electrode has openings through which the liquid passes from the fluid distributor 11 to the porous transport layer 12 .
- the liquid in the fluid distributor 11 is not arranged in the current path in the event of an electrical discharge. Accordingly, in the third embodiment, there is no limitation on the liquid that can be used.
- FIG. 4 shows a device for generating a plasma-activated liquid according to a fourth exemplary embodiment.
- the fourth exemplary embodiment differs from the previous exemplary embodiment in that the liquid and the gas are each circulated. Another difference of the fourth embodiment from the first to third The exemplary embodiment consists in that the liquid film 7 is not formed on a surface of one of the two flat electrodes 1, 2, but on a porous body 13, which is arranged in the discharge space 3 and which is separated by a gap 14 from the first flat electrode 1 and is separated from the second flat electrode 2 .
- the liquid film 7 could be formed on the porous body 13 in the discharge space 3 without the gas and/or the liquid being circulated.
- the gas and/or the liquid could be circulated and the liquid film 7 could be formed on a surface of one of the two flat electrodes 1 , 2 .
- the device shown in FIG. 4 has a reaction chamber 15 .
- the first and the second flat electrodes 1 , 2 are arranged in the reaction chamber 15 .
- the discharge space 3 between the two electrodes 1 , 2 is also arranged in the reaction chamber 15 .
- the porous body 13 is arranged in the discharge space 3 .
- the liquid supply 5 applies the liquid to the porous body 13 .
- the liquid can be dripped onto the porous body 13 , for example.
- the liquid supply 5 could have a hose whose outlet either rests against the porous body 13 or is enclosed by the porous body 13 .
- the liquid is moved through the porous body 13 and along the surface of the porous body 13 by capillary forces and forms the liquid film 7 on the surface of the porous body 13 .
- the electrical discharge is now ignited in the gap 14 between the first flat electrode 1 and the porous body 13 and in the gap 14 between the second flat electrode 2 and the porous body 13 .
- chemical species e.g. B. Ozone, NOx or peroxides generated .
- chemical species and water vapor are exchanged.
- the liquid film is activated with the chemical species.
- the gas is also enriched with the chemical species as well as with water vapor.
- the liquid film 7 flows along the surface of the porous body 13 and, due to gravity, drips into a collection container 16 arranged under the porous body 13, in which plasma-activated liquid is collected.
- the reaction chamber 15 is gas and liquid-tight in order to avoid the uncontrolled escape of plasma-activated gas, in particular ozone.
- the reaction chamber 15 has the inlets and outlets for gas and liquid described below.
- the reaction chamber 15 has the liquid outlet 8 via which the plasma-activated liquid can be removed from the collection container 16 .
- the removed liquid can be further used for a desired purpose, for example cleaning, sterilization, activation, etc.
- the reaction chamber 15 has the gas extraction 10 via which the activated gas can be extracted from the reaction chamber 15 . Also activated Gas can be used for cleaning, sterilization, activation or similar purposes.
- the device shown in FIG. 4 also has a liquid reservoir 17 and a gas reservoir 18 .
- the gas reservoir 18 and the liquid reservoir 17 can be connected to one another and, for example, can be formed in a single container.
- the device has a liquid return channel 19 via which plasma-activated liquid can be removed from the collection container 15 and fed to the liquid reservoir 17 .
- the liquid can accordingly be moved in a circuit, the liquid first being removed from the liquid reservoir 17 by the liquid feed 5 and being fed to the porous body 13 .
- the liquid reaches the collection container 15 and is then either removed at the liquid removal point 8 and used or fed to the liquid reservoir 17 via the liquid return channel 19 . In this way, plasma-activated liquid can be accumulated in the liquid reservoir 17 .
- Gas can be removed from the reaction chamber 15 via a recirculation channel 20 and fed to the gas reservoir 18 .
- An outlet 21 of the recirculation channel 20 can be arranged in the liquid reservoir 17 .
- the outlet 21 of the recirculation channel 20 have a bubble pattern which ensures that the recirculated gas rises through the liquid in the form of bubbles. At least part of the active species from the recirculated gas goes into solution and enriches the liquid in the liquid reservoir 17 .
- the gas is circulated.
- the gas is initially in the gas reservoir 18 and is removed from it by the gas supply 9 and fed to the discharge space 3 .
- the gas is activated by the electrical discharge.
- the gas is then either removed at the gas extraction point 10 or returned from the discharge space 3 to the gas reservoir 18 via the recirculation channel 10 .
- the liquid circuit and the gas circuit can be controlled by means of elements whose functioning is controlled by differential pressures, in particular by means of pumps, valves and throttles.
- the gas reservoir 18 and the liquid reservoir 17 can each be equipped with a replenishment mechanism 17a, 18a. New, fresh liquid can be supplied to the liquid reservoir via the replenishment mechanism 17a. New, fresh gas can be supplied to the gas reservoir 18 via the replenishment mechanism 18a. In this way, the withdrawal of liquid via the liquid withdrawal 8 and the withdrawal of gas via the gas withdrawal 10 can be compensated.
- the chemical composition of the circulating liquids and gases can be adjusted via the replenishment mechanisms 17a, 18a.
- a quantitative ratio between fresh, non-activated gas and activated gas can be adjusted in the desired manner.
- a quantity ratio between fresh, non-activated liquid and activated liquid can also be set.
- a pump can also be arranged in the container, which ensures that the liquid circulates in the liquid reservoir 17 .
- FIG. 5 shows a cross section through a device according to a fifth exemplary embodiment.
- the flat electrodes 1, 2 are each essentially two-dimensional surfaces that extend in one plane.
- the first planar electrode 1 and the second planar electrode 2 are each curved into a cylindrical shape.
- the first flat electrode 1 forms an inner cylinder and the second flat electrode forms an outer cylinder, the two cylinders being arranged concentrically to one another.
- the outer cylinder encloses the inner cylinder.
- the discharge space 3 is arranged in a cavity between the cylinder formed by the first flat electrode 1 and the cylinder formed by the second flat electrode 2 .
- the discharge space 3 is ring-shaped or sleeve-shaped.
- the fifth exemplary embodiment is based on the first exemplary embodiment.
- the liquid film 7 is formed on the surface of the dielectric layer 1b facing the discharge space 3, as explained in connection with the first embodiment. Because the Both flat electrodes 1, 2 are each curved into three-dimensional cylinders, the area available for the liquid film is increased and a larger quantity of a plasma-activated liquid can be generated.
- the second flat electrode 2 can form the inner cylinder and the first flat electrode 1 can form the outer cylinder.
- first flat electrode 1 and the second flat electrode 2 can also each be curved into a cylindrical shape in the second, the third and the fourth exemplary embodiment.
- first flat electrode 1 can form the inner cylinder and the second flat electrode 2 can form the outer cylinder.
- first flat electrode 1 can form the outer cylinder and the second flat electrode 2 the inner cylinder.
- the porous body 13 is annular in this alternative embodiment.
- the ring-shaped porous body 13 is arranged in the ring-shaped discharge space 3 between the first flat electrode 1, which forms a cylinder, and the second flat electrode 2, which also forms a cylinder.
- the plasma-activated liquid generated with the device according to one of the exemplary embodiments shown here can be used for various applications.
- the liquid can be stored in a container and used as a regenerative cleaning agent.
- the liquid retains its beneficial properties for cleaning and sterilization for several months.
- the liquid can be put in a spray bottle and sprayed for use.
- a sponge can be soaked with the liquid and the liquid can be applied over the sponge to an area to be treated.
- the liquid can be used in a dispenser or in a rag.
- the liquid can be used in a dry or humid chamber for the cleaning, care or sterilization of objects, for example in a dishwashing detergent, for the sterilization of a mouth and nose protector or braces.
- the device can be integrated into a large number of household appliances in which the plasma-activated liquid can be used for cleaning, sterilization or activation.
- the device can be used in a floor care device, a cleaning robot or a coffee machine for cleaning or descaling.
- the device could be integrated into a dishwasher, a washing machine or a dryer, so that the advantageous properties of the plasma-activated liquid and the plasma-activated gas can be used.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024546093A JP7830667B2 (ja) | 2022-02-04 | 2023-02-02 | プラズマ活性化液体を生成する装置、洗浄及び/又は殺菌のため機器及び方法 |
| US18/834,803 US20250126701A1 (en) | 2022-02-04 | 2023-02-02 | Apparatus for generating a plasma-activated liquid, apparatus and method for cleaning and/or sterilization |
| CN202380020099.9A CN118679859A (zh) | 2022-02-04 | 2023-02-02 | 用于产生等离子体活化的液体的装置、设备和用于清洁和/或消毒的方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102022102681.7 | 2022-02-04 | ||
| DE102022102681.7A DE102022102681B4 (de) | 2022-02-04 | 2022-02-04 | Vorrichtung zur Erzeugung einer Plasma-aktivierten Flüssigkeit, Gerät und Verfahren zur Reinigung und/oder Sterilisation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2023148265A1 true WO2023148265A1 (de) | 2023-08-10 |
Family
ID=85176050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2023/052558 Ceased WO2023148265A1 (de) | 2022-02-04 | 2023-02-02 | Vorrichtung zur erzeugung einer plasma-aktivierten flüssigkeit, gerät und verfahren zur reinigung und/oder sterilisation |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250126701A1 (de) |
| JP (1) | JP7830667B2 (de) |
| CN (1) | CN118679859A (de) |
| DE (1) | DE102022102681B4 (de) |
| WO (1) | WO2023148265A1 (de) |
Citations (6)
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|---|---|---|---|---|
| US20040076543A1 (en) | 2002-03-18 | 2004-04-22 | Sokolowski Asaf Zeev | System and method for decontamination and sterilization of harmful chemical and biological materials |
| JP2007196121A (ja) * | 2006-01-25 | 2007-08-09 | Univ Nagoya | 水処理方法および水処理装置 |
| JP2012096141A (ja) * | 2010-10-29 | 2012-05-24 | Tokyo Electron Ltd | 水滅菌装置及び水滅菌方法 |
| US20160074829A1 (en) * | 2013-05-24 | 2016-03-17 | Osaka University | Method and apparatus for producing liquid for sterilization use |
| US20180327283A1 (en) * | 2014-12-15 | 2018-11-15 | Technische Universiteit Eindhoven | Plasma Activated Water |
| EP3562276A1 (de) * | 2018-04-23 | 2019-10-30 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung zur plasmagestützten behandlung von flüssigkeiten |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102018121551B4 (de) | 2018-09-04 | 2024-12-19 | PICON GmbH | Verfahren und Anlage zur oxidativen Aufbereitung von Trink-, Brauch- und Abwasser |
-
2022
- 2022-02-04 DE DE102022102681.7A patent/DE102022102681B4/de active Active
-
2023
- 2023-02-02 WO PCT/EP2023/052558 patent/WO2023148265A1/de not_active Ceased
- 2023-02-02 CN CN202380020099.9A patent/CN118679859A/zh active Pending
- 2023-02-02 US US18/834,803 patent/US20250126701A1/en active Pending
- 2023-02-02 JP JP2024546093A patent/JP7830667B2/ja active Active
Patent Citations (6)
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| US20040076543A1 (en) | 2002-03-18 | 2004-04-22 | Sokolowski Asaf Zeev | System and method for decontamination and sterilization of harmful chemical and biological materials |
| JP2007196121A (ja) * | 2006-01-25 | 2007-08-09 | Univ Nagoya | 水処理方法および水処理装置 |
| JP2012096141A (ja) * | 2010-10-29 | 2012-05-24 | Tokyo Electron Ltd | 水滅菌装置及び水滅菌方法 |
| US20160074829A1 (en) * | 2013-05-24 | 2016-03-17 | Osaka University | Method and apparatus for producing liquid for sterilization use |
| US20180327283A1 (en) * | 2014-12-15 | 2018-11-15 | Technische Universiteit Eindhoven | Plasma Activated Water |
| EP3562276A1 (de) * | 2018-04-23 | 2019-10-30 | Leibniz-Institut für Plasmaforschung und Technologie e.V. | Vorrichtung zur plasmagestützten behandlung von flüssigkeiten |
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2025505995A (ja) | 2025-03-05 |
| CN118679859A (zh) | 2024-09-20 |
| DE102022102681B4 (de) | 2023-08-31 |
| US20250126701A1 (en) | 2025-04-17 |
| JP7830667B2 (ja) | 2026-03-16 |
| DE102022102681A1 (de) | 2023-08-10 |
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