WO2023106132A1 - Heat reflection plate - Google Patents

Heat reflection plate Download PDF

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Publication number
WO2023106132A1
WO2023106132A1 PCT/JP2022/043587 JP2022043587W WO2023106132A1 WO 2023106132 A1 WO2023106132 A1 WO 2023106132A1 JP 2022043587 W JP2022043587 W JP 2022043587W WO 2023106132 A1 WO2023106132 A1 WO 2023106132A1
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WIPO (PCT)
Prior art keywords
plate
reflector
exterior
heat
film
Prior art date
Application number
PCT/JP2022/043587
Other languages
French (fr)
Japanese (ja)
Inventor
智弘 丸子
好裕 石黒
尊信 松村
裕也 大川
Original Assignee
株式会社フルヤ金属
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Application filed by 株式会社フルヤ金属 filed Critical 株式会社フルヤ金属
Priority to CN202280080770.4A priority Critical patent/CN118355477A/en
Priority to KR1020247017730A priority patent/KR20240091098A/en
Publication of WO2023106132A1 publication Critical patent/WO2023106132A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185—Joining of semiconductor bodies for junction formation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28158—Making the insulator
    • H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
    • H01L21/28194—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering

Definitions

  • the present disclosure can be used, for example, in the field of semiconductors and electronic components as a heat reflector for various heat treatment apparatuses for heat-treating wafers, substrates, etc. at low to high temperatures, shorten the time required for one heating/cooling cycle, and More particularly, it relates to a heat reflecting plate capable of saving energy in a heat treatment apparatus and suppressing contamination due to its high reflectance.
  • heat treatment is performed to impart various properties to semiconductor wafers.
  • a semiconductor wafer is housed in a furnace core tube made of high-purity quartz, and a heat treatment operation is performed by controlling the atmosphere in the furnace core tube.
  • a heat insulator (lid body) is placed between the inside of the furnace and the hearth so as to block the opening of the furnace. ) is provided.
  • a heat insulator that closes the opening of the heat treatment chamber and has quartz plates that are stacked apart from each other and exposed to the heat treatment chamber.
  • a gold thin film is formed inside the quartz plate, and the gold thin film is characterized by being formed by gold vapor deposition (see, for example, Patent Document 1).
  • a mixture of platinum (Pt) and an oxide (such as SiO or PbO) is added to a mixture of platinum (Pt) and an oxide (such as SiO or PbO) to form a paste on a quartz plate having a hole for passing a quartz tube through the center and a hole for passing a quartz rod.
  • an oxide such as SiO or PbO
  • a heat shield plate is formed of a reflective film and a transparent quartz layer covering the surface of the reflective film.
  • One method of forming this heat shield plate is to use a pair of circular transparent quartz plates for forming a transparent quartz layer, provide a reflective film on one side of one of the transparent quartz plates, and then place the reflective film on one side of the transparent quartz plate.
  • JP-A-2001-102319 JP-A-9-148315 JP-A-11-97360 JP 2019-217530 A Japanese Patent No. 4172806 Japanese Patent No. 6032667
  • Patent Document 1 the presence of a heat insulator to prevent metal contamination delays the heating and cooling response of the furnace body, and as a result, the heat treatment cycle takes time.
  • the quartz plates must be welded at their outer peripheries to prevent metal contamination. It is necessary to make it small.
  • Patent Document 1 where this is not done, in a heat treatment process having a temperature rise profile, temperature retention profile, and temperature drop profile up to the heat treatment temperature, the response of heating and cooling is delayed, causing a deviation from each desired profile, In addition, there is a problem that the time required for one heat treatment cycle is prolonged, resulting in a decrease in production efficiency.
  • Patent Literature 2 a quartz tube is provided in the center to provide a heater conduction part for use as both a reflector and a heater, but due to this structure, there are places where the radiant heat cannot be completely shielded. For higher energy saving, it is necessary to increase the reflective area ratio, to make the quartz used as the reflector and the exterior thinner, and to lower the heat capacity.
  • Patent Document 3 a method of sandwiching between quartz plates and welding is adopted, but since it is affected by heat, there is a problem that the film will peel off when it is performed with a thin film, so it is necessary to reduce the welding width. is also difficult. Furthermore, it is difficult to weld while maintaining a vacuum inside, and there is an unavoidable risk of damage to the thin film due to an increase in internal pressure during high-temperature use. Also, in the method of pouring transparent quartz, if it is applied to a metal thin film, thermal and physical damage cannot be avoided, and it is difficult to make the transparent quartz thin.
  • the heat shield plate delays the response of heating and cooling in the heat treatment process, causes a deviation from each desired profile, and prolongs the time required for one heat treatment cycle, resulting in As a result, there was a problem of causing a decrease in production efficiency.
  • the present disclosure can ensure a larger reflection area ratio than the conventional method, has a small heat capacity, can save energy, has a high reflectance, suppresses contamination in the furnace, and has a heat with good thermal response.
  • the object is to provide a reflector.
  • the heat reflecting plate according to the present invention comprises a plate-shaped exterior, a plate-shaped exterior arranged inside the plate-shaped exterior so that the outer circumference is completely covered by the plate-shaped exterior, and one side of the plate-shaped exterior. and a reflector that reflects infrared rays incident on a surface, wherein the reflector is a thin film, a plate or a foil, and the heat reflector is a plate-like exterior and a reflector at 1 mm 2 .
  • the total heat capacity in the thickness direction is 0.0004 to 0.0080 (J/K).
  • the surface layer including at least the reflecting surface of the reflector is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, It is preferably made of an alloy containing at least one of them.
  • the material of the plate-like exterior is silica or silicon.
  • the plate-shaped exterior is a joint portion in which a first exterior plate and a second exterior plate are arranged to face each other, and peripheral edge portions are annularly joined continuously along the peripheral edge. It is preferable to have a structure of a laminated plate having Since the plate-shaped exterior and the reflector can be made thinner, the heat capacity can be reduced.
  • the structure of the laminated plate is provided between the facing surfaces of the first exterior plate and the second exterior plate, and It is preferable that at least one side of the exterior plate has a cavity sealed by a joint portion between the peripheral edge portions, and the reflector is arranged in the cavity. Since the reflector is in the cavity, which is a closed space, stress in the peeling direction caused by the reflector is not applied to the joints between the peripheral edge portions, and contamination in the furnace due to breakage of the reflector can be suppressed. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
  • the heat reflector according to the present invention has the cavity at least on the side of the first exterior plate, and has a thin film formed as the reflector on the surface of the first exterior plate in the cavity, wherein the thin film is and a reflective film as a surface layer including the reflective surface in this order from the surface side of the cavity of the first exterior plate, wherein the reflective film includes Ta, Mo, and Ti.
  • the reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, an alloy containing at least one selected from the group consisting of Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu; It is preferable that the reflective film has a composition different from that of the reflective film.
  • the reflector is formed on the surface inside the cavity of the first armor plate, the stress in the peeling direction due to the reflector is not applied to the joint between the peripheral edge portions, and the damage of the reflector causes the inside of the furnace to be contaminated. can be suppressed. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
  • the first armor plate is flat, has the cavity on the second armor plate side, and has the thin film formed as the reflector on the surface of the first armor plate.
  • the thin film is a laminated film having, in order from the surface side of the first exterior plate, a base film and a reflective film as a surface layer including the reflective surface, and the base film is composed of Ta, Mo, An alloy consisting of Ti, Zr, Nb, Cr, W, Co or Ni, or containing at least one selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni and the reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt , Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, and and the reflective film preferably have different compositions. Since the
  • the reflector is a plate or foil, and has Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing at least one of them. Since the plate or foil serving as the reflector is housed in the cavity, corrosion of the plate or foil is less likely to occur. Furthermore, stress in the peeling direction due to the plate or foil is less likely to be applied to the joints between the peripheral edges.
  • the pressure inside the cavity is reduced below atmospheric pressure.
  • An increase in the internal pressure of the cavity during heat treatment can be suppressed, and contamination in the furnace can be further suppressed.
  • the first exterior plate has a bank portion provided in the peripheral edge portion and a concave portion that is surrounded by the bank portion and forms the cavity
  • the second The exterior plate is flat
  • the first exterior plate is flat
  • the second exterior plate is surrounded by a bank portion provided at the peripheral portion and the bank portion. It is preferable to have a concave portion forming the cavity.
  • the heat reflecting plate has at least one strut portion erected between the facing surfaces of the structure of the laminated plate within the cavity.
  • the joint strength of the laminated plate structure can be increased by the strut portion.
  • the heat reflecting plate according to the present invention includes a form in which the supporting column has a columnar shape or a cylindrical shape.
  • the supporting column has a columnar shape or a cylindrical shape.
  • the heat reflecting plate has a plurality of the strut portions, the strut portions are cylindrical, and the respective strut portions share a part of the cylindrical wall in a three-dimensional space. It is preferred to have a filling structure. By adopting a three-dimensional space-filling structure, the area of the reflector can be increased while increasing the bonding strength, and the strength of the reflector itself can be increased.
  • the three-dimensional space-filling structure includes a honeycomb structure, a rectangular lattice structure, a square lattice structure, or a diamond lattice structure.
  • the opposing surfaces of the first exterior plate and the second exterior plate are flat surfaces, and the reflector is located on the first exterior plate on the side of the second exterior plate.
  • the base film is made of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or Ta, Mo, Ti, Zr, Nb , Cr, W, Co and Ni
  • the reflective film comprises Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or an alloy containing at least one selected from the group consisting of Cu, and the underlying film and the reflective film preferably have different compositions. Interference fringes caused by partial contact between the reflector and the second exterior plate can be further suppressed.
  • the heat reflector according to the present invention has the cavity at least on the side of the first exterior plate, and has a thin film formed as the reflector on the surface of the first exterior plate in the cavity, wherein the thin film is , Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re , Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50% by mass or more.
  • the thin film formed as the reflector may be a single layer film.
  • the first armor plate is flat, has the cavity on the second armor plate side, and has the thin film formed as the reflector on the surface of the first armor plate.
  • the thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt,
  • An alloy film containing 50% by mass or more of Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is preferable.
  • the thin film formed as the reflector may be a single layer film.
  • the opposing surfaces of the first exterior plate and the second exterior plate are flat surfaces, and the reflector is located on the first exterior plate on the side of the second exterior plate.
  • An alloy film containing 50% by mass or more of Cu is preferable.
  • the thin film formed as the reflector may be a single layer film.
  • the cavity is provided on the first exterior plate side and the second exterior plate side, and the thin film formed as the reflector is formed on the surface of the first exterior plate within the cavity.
  • the thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt , Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50 mass % or more.
  • the thin film formed as the reflector may be a single layer film.
  • the thickness of the reflector is preferably 0.01 ⁇ m or more and 5 mm or less. It is possible to reduce the heat capacity of the heat reflecting plate while maintaining the efficiency of reflection of radiant heat by the reflector.
  • the joints between the peripheral edges are surface-activated joints. Radiant heat can be reflected into the furnace more by shortening the joint width compared to the general welding method. Also, the thin film, which is a reflector, is less susceptible to thermal and physical damage due to the bonding process. In addition, the joint strength at the joint is increased, the life of the heat reflector is increased, and the corrosion resistance is enhanced, thereby suppressing contamination in the furnace.
  • the present disclosure it is possible to secure a larger reflection area ratio than the conventional method, have a small heat capacity, can save energy, have a high reflectance, suppress contamination in the furnace, and have a thermal responsiveness.
  • a good heat reflector can be provided.
  • FIG. 1 is a schematic plan view showing an example of a heat reflecting plate according to this embodiment;
  • FIG. 1 is a schematic diagram showing a first example of an AA cross section;
  • FIG. 4 is a schematic diagram showing a second example of an AA cross section;
  • FIG. 10 is a schematic diagram showing a third example of an AA cross section;
  • FIG. 11 is a schematic diagram showing a fourth example of the AA cross section;
  • FIG. 11 is a schematic diagram showing a fifth example of the AA cross section;
  • FIG. 11 is a schematic diagram showing a sixth example of the AA cross section;
  • FIG. 11 is a schematic diagram showing a seventh example of the AA cross section;
  • FIG. 10 is a diagram showing an example of a form in which a support section has a honeycomb structure;
  • FIG. 10 is a diagram showing an example of a form in which a support section has a honeycomb structure;
  • FIG. 10 is a diagram showing an example of a form in which
  • FIG. 11 is a schematic diagram showing an eighth example of the AA cross section;
  • FIG. 11 is a schematic diagram showing a ninth example of the AA cross section;
  • FIG. 10 is a schematic diagram showing a tenth example of the AA cross section;
  • FIG. 11 is a schematic diagram showing an eleventh example of an AA cross section;
  • FIG. 12 is a schematic diagram showing a twelfth example of an AA cross section;
  • FIG. 13 is a schematic diagram showing a thirteenth example of the AA cross section;
  • 4 is a graph showing the reflectance of the reflector of Example 1.
  • FIG. 4 is a graph showing the relationship between the wavelength of blackbody radiation emitted by a substance at 1000° C. and the amount of radiation.
  • 10 is a graph showing the reflectance of the reflector of Example 5.
  • FIG. 10 is a graph showing the reflectance of the reflector of Example 6.
  • FIG. 20 is a schematic diagram showing a 14th example of the AA cross section; 4 is
  • FIG. 1 A heat reflector according to the present embodiment will be described with reference to FIGS. 1 and 2.
  • FIG. The heat reflecting plate 100 according to the present embodiment includes a plate-shaped exterior 1, and is arranged inside the plate-shaped exterior 1 so that the outer circumference is completely covered by the plate-shaped exterior 1, and one side of the plate-shaped exterior 1 and a reflector 5 that reflects infrared rays incident on the surface of the .
  • the direction toward the paper surface is the incident direction of infrared rays.
  • FIG. 2 the direction from top to bottom is the incident direction of infrared rays.
  • the reflector 5 is a thin film, and the surface layer including at least the reflecting surface of the reflector 5 is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au. , Ag or Cu, or at least selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing any one of them.
  • FIG. 2 shows a mode in which the reflector 5 is a laminated film, and a reflective film 4 as a surface layer including a reflective surface is formed on the base film 3 . At this time, it is preferable that the reflector 5 has a reflective surface on the entire surface surrounded by the periphery of the reflector without providing through holes or irregularities.
  • the total heat capacity in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 is 0.0004 to 0.0080 (J/K), preferably 0.0023 to 0.0023. It is 0.0070 (J/K), more preferably 0.0030 to 0.0060 (J/K).
  • the heat capacity in the thickness direction of the plate-shaped exterior and the reflector at 1 mm 2 is the heat capacity of the heat reflection plate 100 having the reflector 5 and the plate-shaped exterior 1 that completely covers the outer periphery of the reflector 5, and the infrared incident surface equivalent to the value divided by the area of 1 and 2.
  • the incident surface has a surface area as shown in FIG. For example, there is a region where the reflector 5 is visible and a region where the joint 2 between the peripheral edge portions is visible. Refers to the entire area. If the total heat capacity in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 is less than 0.0004 (J / K), damage due to insufficient thickness of the plate-shaped exterior, or due to insufficient thickness of the reflector Reflection performance may decrease due to the transmission of infrared rays. Also, the time required for one heat treatment cycle is prolonged, resulting in a decrease in production efficiency.
  • the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 must satisfy the above range.
  • the ratio of the area of the reflector to the plate-shaped exterior in the in-plane direction is large, and the reflectance of the reflective material used for the reflector is more preferred.
  • the heat reflector is designed according to the size of the furnace body and substrate to be used. It is preferable to In addition, it is preferable to make the thickness of the heat reflector as thin as possible, for example, 1 to 3.4 mm, preferably 1 to 3 mm.
  • the reflector it is preferable to provide the reflector so as to have an area as close as possible to the in-plane area of the disk shape or polygonal shape, for example, 80% or more in terms of reflection area ratio.
  • a metal material or an alloy material having a high reflectance for example, a reflectance of 80% or more, as the metal material or alloy material used for the reflector.
  • the "in-plane direction" means a plate surface including the reflecting surface of the heat reflecting plate.
  • the plate-shaped exterior 1 has a joint portion in which a first exterior plate 1a and a second exterior plate 1b are arranged to face each other and the peripheral edges are continuously joined along the peripheral edges in an annular shape. It is preferable to have a structure of a laminated plate having.
  • the first exterior plate 1a and the second exterior plate 1b form a structure of a laminated plate by a joint portion 2 between peripheral edge portions. As shown in FIG. 1 , the joint portion 2 between the peripheral edge portions is annularly continuous along the peripheral edge of the plate-like exterior 1 .
  • the joint 2 between the peripheral edges can be viewed as a boundary between the first and second exterior plates 1a and 1b by seeing through the second exterior plate 1b, and is illustrated as a gray area.
  • the thickness of the plate-shaped outer casing can be reduced, so that the heat capacity can be reduced.
  • the shape of the plate-shaped exterior 1 when the reflector 5 is viewed from the front is, for example, circular, elliptical, rectangular or square, preferably circular.
  • the outer plate surface of the silica plate 1 when the reflector 5 is viewed from the front is preferably a flat surface without any through-holes or irregularities.
  • the circular diameter is, for example, 5-50 cm.
  • the annular width of the joint 2 between the peripheral edges is, for example, 0.5 to 20 mm.
  • the thickness of the plate-shaped exterior 1 is preferably 1 to 3.4 mm, more preferably 1 to 3 mm.
  • the thickness of the first exterior plate 1a is preferably 0.1 to 1.7 mm, more preferably 0.5 to 1.5 mm.
  • the thickness of the second exterior plate 1b is preferably 0.1 to 1.7 mm, more preferably 0.5 to 1.5 mm.
  • the reflection area ratio of the reflector 5 to the plate surface of the plate-shaped exterior 1 when the reflector 5 is viewed from the front is preferably 80% or more, more preferably 87% or more, and 90% or more. is more preferred.
  • the material of the plate-shaped exterior 1 is preferably silica or silicon.
  • Silica is preferable in terms of material strength and ability to transmit infrared rays without absorbing them, and silicon is preferable in terms of low heat capacity.
  • Silica includes forms that are crystalline silica or amorphous silica.
  • the impurity concentration of the plate-like exterior 1 is 100 ppm or less, preferably 90 ppm or less. Note that this embodiment includes a mode in which the material of the plate-shaped exterior 1 is silicon, and a mode in which the surface of silicon is oxidized to form silica.
  • the structure of the laminated plate is provided between the facing surfaces of the first exterior plate 1a and the second exterior plate 1b, and between the first exterior plate 1a side and the second exterior plate 1b side.
  • at least one has a cavity 12 sealed by a joint 2 between the peripheral edges, and the reflector 5 is arranged in the cavity 12 .
  • the cavity 12 may be provided on the first exterior plate 1a side, provided on both sides of the first exterior plate 1a side and the second exterior plate 1b side, or provided on the second exterior plate 1b side.
  • the cavity 12 has shown the form provided in the 1st exterior plate 1a side.
  • a recess is provided on one surface of the first exterior plate 1a, and the second exterior plate 1b is a flat plate without recesses.
  • the cavity 12 is provided on the side of the first exterior plate 1a.
  • the cavity 12 is provided only on the first exterior plate 1a side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b, and is sealed by the joint 2 between the peripheral edges. Since the reflector 5 is in the cavity 12, which is a closed space, stress in the peeling direction caused by the reflector is not applied to the joint between the peripheral edge portions, and contamination in the furnace due to breakage of the reflector can be suppressed. can. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
  • FIG. 3 shows a form in which the cavity 12 is provided over both sides of the first exterior plate 1a side and the second exterior plate 1b side.
  • a recess is provided on one surface of the first exterior plate 1a
  • a recess is provided on one surface of the second exterior plate 1b. and the laminated plate structure of the second exterior plate 1b.
  • the cavity 12 is provided on both the first exterior plate 1a side and the second exterior plate 1b side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b.
  • FIG. 4 shows a form in which the cavity 12 is provided on the side of the second exterior plate 1b.
  • the first exterior plate 1a is a flat plate without recesses
  • the second exterior plate 1b is provided with recesses on one surface thereof.
  • the cavity 12 is provided on the side of the second exterior plate 1b.
  • the cavity 12 is provided only on the second exterior plate 1b side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b.
  • the height of the cavity 12 (length in the vertical direction in FIG. 2) is preferably 0.1 ⁇ m to 5 mm, more preferably 0.1 ⁇ m to 1 mm.
  • the cavity 12 has a configuration in which a recess is provided only on the side of the first exterior plate 1a, a configuration in which recesses are provided in both the side of the first exterior plate 1a and the side of the second exterior plate 1b, and a configuration in which a recess is provided only on the side of the second exterior plate 1b.
  • a bank portion 11 is formed in the peripheral edge portion of the first exterior plate 1a and/or the peripheral edge portion of the second exterior plate 1b by the recess. In the form of FIG.
  • the top surface of the embankment portion 11 formed on the first exterior plate 1a is joined to the flat plate portion of the second exterior plate 1b arranged facing each other to form the joint portion 2 between the peripheral edge portions. be done.
  • the top surfaces of the bank portions 11 of the first exterior plate 1a and the second exterior plate 1b are joined to form a joint portion 2 between the peripheral edge portions.
  • the top surface of the bank portion 11 formed on the second exterior plate 1b is joined to the flat plate portion of the first exterior plate 1a arranged facing each other, and the joint portion 2 between the peripheral edge portions is formed.
  • the recess can be formed by, for example, an etching method.
  • the first exterior plate 1a has a bank portion 11 provided at the peripheral portion and a concave portion which is surrounded by the bank portion 11 and forms a cavity 12. It is preferable that the second exterior plate 1b has a flat plate shape. By providing the concave portion only in the first exterior plate 1a, the cavity 12 can be provided in the plate-like exterior with a simple structure.
  • Heat reflecting plates having such a configuration include the heat reflecting plates 103, 106, 109, and 112 illustrated in FIGS. 5, 8, 12, and 15 in addition to FIG.
  • the first exterior plate 1a is flat plate-shaped
  • the second exterior plate 1b has a bank portion 11 and a bank portion 11 provided on the peripheral portion. and a recess defining the cavity 12 by being surrounded by .
  • the cavity 12 can be provided in the plate-like exterior with a simple structure.
  • FIG. 4 there are heat reflecting plates 105, 108 and 111 illustrated in FIGS.
  • the heat reflecting plates 100 and 101 have the cavity 12 at least on the side of the first exterior plate 1a, and the surface inside the cavity 12 of the first exterior plate 1a has It has a thin film formed as a reflector 5, and the thin film has, in order from the surface side in the cavity 12 of the first exterior plate 1a, a base film 3 and a reflective film 4 as a surface layer including a reflective surface.
  • the underlayer 3 consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni.
  • the reflective film 4 is made of an alloy containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au , Ag or Cu, or at least selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or at least selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferable that the base film 3 and the reflective film 4 are made of an alloy containing any one of them and have different compositions.
  • the reflector is formed on the surface inside the cavity of the first armor plate, the stress in the peeling direction due to the reflector is not applied to the joint between the peripheral edge portions, and the damage of the reflector causes the inside of the furnace to be contaminated. can be suppressed. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
  • the reflector 5 is a thin film and the thin film is a laminated film
  • the surface layer of the reflector 5 including at least the reflective surface corresponds to the reflective film 4 .
  • the reflector 5, which is a laminated film is formed on the surface inside the cavity 12 of the first exterior plate 1a, that is, on the bottom surface of the recess.
  • the reflector 5, which is a laminated film, preferably has an area of 50 to 100%, more preferably 80 to 100%, of the total area of the bottom surface of the recess.
  • the film thickness of the reflector 5 is preferably 10 to 1500 nm, more preferably 20 to 400 nm.
  • the underlayer 3 consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. It is preferably made of an alloy containing at least one of the following. Such a metal or alloy has a high melting point and excellent adhesion to the plate-like exterior.
  • the base film 3 is preferably a thin film obtained by, for example, sputtering film, coating film, CVD, vapor deposition, or the like.
  • the alloy containing at least one selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni is an alloy containing one of these elements in the largest mass.
  • the film thickness of the base film 3 is preferably 5 to 500 nm, more preferably 10 to 100 nm.
  • the base film 3 improves adhesion of the reflective film 4 .
  • the reflective film 4 is preferably deposited on the surface of the base film 3.
  • the reflective film 4 is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, It is preferably made of an alloy containing at least one selected from the group consisting of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag and Cu.
  • Such metals or alloys have high melting points and high infrared reflectance. Also, it has little reactivity with the underlying film.
  • the reflective film 4 is preferably a thin film obtained by, for example, sputtering film, coating film, CVD, vapor deposition, or the like.
  • alloys containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu An alloy containing any one of these elements in the largest mass is preferable, and more preferably Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge
  • the film thickness of the reflective film 4 is preferably 5 to 1000 nm, more preferably 10 to 300 nm.
  • Suitable combinations of the base film 3 and the reflective film 4 in the laminated film include a Ta film/Ir film, a Ta film/Pt film, and a Mo film/Ir film.
  • the film thickness of the laminated film is preferably 10 to 1500 nm, more preferably 20 to 400 nm.
  • the thickness of the reflector 5 may be equal to the height of the cavity 12, that is, the reflective film 4 may be in contact with the surface of the second exterior plate 1b. Interference fringes generated by partial contact between the reflective film 4 and the second exterior plate are reduced.
  • the base film 3 is preferably deposited on the surface (bottom surface of the recess) of the cavity 12 of the first exterior plate 1 a , and the reflective film 4 is preferably deposited on the surface of the base film 3 .
  • the reflective film 4 is in contact with the surface of the second exterior plate 1b, it is preferably not formed on the surface of the second exterior plate 1b, that is, not deposited.
  • the first exterior plate 1a is a flat plate
  • the cavity 12 is provided on the side of the second exterior plate 1b
  • the cavity 12 is provided on the surface of the first exterior plate 1a.
  • It has a thin film formed as a reflector 5, and the thin film is a laminated film having a base film 3 and a reflective film 4 as a surface layer including a reflective surface in order from the surface side of the first exterior plate 1a
  • the underlayer 3 consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni.
  • the reflective film 4 is made of an alloy containing at least one of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu or at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing
  • the form shown in FIG. 4 is different from the form shown in FIG. 2 or 3 in that the first armor plate 1a is a flat plate and has a cavity 12 on the side of the second armor plate 1b, but the rest is the same. . Since the thin film as a reflector is formed on the flat first exterior plate 1a, the heat reflector can be manufactured with excellent productivity.
  • the thickness of the reflector 5 may be equal to the height of the cavity 12, that is, the reflecting film 4 may be in contact with the surface of the second exterior plate 1b (bottom surface of the recess). . Interference fringes generated by partial contact between the reflective film 4 and the second exterior plate are reduced.
  • the base film 3 is preferably deposited on the surface of the first exterior plate 1 a
  • the reflective film 4 is preferably deposited on the surface of the base film 3 .
  • the form shown in FIG. 7 is different from the form shown in FIG. 5 or 6 in that the first exterior plate 1a is a flat plate and has the cavity 12 on the side of the second exterior plate 1b, but the others are the same. . Since the thin film as a reflector is formed on the flat first exterior plate 1a, the heat reflector can be manufactured with excellent productivity.
  • each of the heat reflectors 106 to 111 has at least one post standing between the opposing surfaces of the laminate structure in the cavity 12. It is preferable to have a portion 6.
  • the struts 6 can increase the joint strength of the structure of the laminated plate.
  • the support pillar 6 extends from the bottom surface of the recess of the first exterior plate 1a, and the top surface of the support 6 is joined to the surface of the flat plate-like second exterior plate 1b. There is a form.
  • the embankment portion 11 is formed by forming the concave portion only in the first exterior plate 1a by etching.
  • the post portion 6 can be formed as a non-etching portion.
  • the support 6 extends from the bottom surface of the recess of the first exterior plate 1a, extends from the bottom of the recess of the second exterior plate 1b, and extends from the top of the support 6. There is a form in which the surfaces are joined together.
  • the first exterior plate 1a and the second exterior plate 1b are etched.
  • the bank portion 11 is formed by forming the concave portion, and at this time, it can be formed by making the post portion 6 a non-etching portion in the same manner as making the bank portion 11 a non-etching portion.
  • the support part 6 extends from the bottom surface of the recess of the second exterior plate 1b, and the top surface of the support part 6 is joined to the surface of the flat first exterior plate 1a.
  • a joint portion 7 indicates a joint portion between the support portion 6 and the first exterior plate 1a or the second exterior plate 1b, or a joint portion between the support portions 6. As shown in FIG.
  • the reflector 5 is the same as the heat reflecting plates 100 to 105 shown in FIGS. At this time, the reflector 5 formed on the outside of the column 6 is not provided with a through hole or unevenness, and the entire surface surrounded by the inner circumference and the peripheral edge of the reflector outside the column 6 is A reflective surface is preferred.
  • the struts 6 may be columnar or tubular.
  • the shape of the cross section of the main axis of the strut 6 is preferably circular, elliptical, or polygonal with more than triangular shape. Polygons that are triangular or larger are preferably squares or regular hexagons.
  • the heat reflecting plate has a plurality of support sections 6, each support section 6 is cylindrical, and each support section 6 shares a part of the cylindrical wall with each other in a three-dimensional space. It is preferred to have a filling structure.
  • Three-dimensional space-filling structures include forms that are honeycomb structures, rectangular lattice structures, square lattice structures or diamond lattice structures.
  • FIG. 9 shows a heat reflecting plate 100 having a honeycomb-structured support.
  • the honeycomb structure is a structure in which hexagonal cylinders are arranged without gaps, preferably regular hexagonal cylinders are arranged without gaps.
  • the rectangular lattice structure is a structure in which square cylinders with rectangular cross sections are arranged without gaps.
  • the square lattice structure is a structure in which rectangular cylinders with a square cross section are arranged without gaps.
  • the rhombus lattice structure is a structure in which square cylinders with a rhombus cross section are arranged without gaps.
  • the tubular shape of the column portion 6 is formed without providing a through hole or unevenness in the formed reflector 5 . It is preferable that the entire surface surrounded by the periphery of the reflector inside is a reflective surface.
  • the opposing surfaces of the first exterior plate 1a and the second exterior plate 1b are flat surfaces, and the reflector 5 is formed on the surface of the second exterior plate 1b. It is a thin film formed in a region inside the annular joint 2 between the peripheral edges of the surface of the first exterior plate 1a on the side, and the thin film is a base film and a base film in order from the surface side of the first exterior plate 1a. and a reflective film as a surface layer including a reflective surface.
  • the reflective film is made of an alloy containing at least one selected from the group consisting of Ti, Zr, Nb, Cr, W, Co and Ni, and the reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge , Au, Ag, or Cu, and the base film and the reflective film preferably have different compositions.
  • FIG. 20 illustration of a mode in which the reflector 5 is a laminated film is omitted.
  • the base film is preferably deposited on the surface of the first exterior plate, and the reflective film is preferably deposited on the surface of the base film.
  • the reflective film is in contact with the surface of the second armor plate, it is preferably not formed on the surface of the second armor plate, that is, not deposited.
  • the film thickness of the laminated film is preferably 10 to 500 nm.
  • the heat reflector according to this embodiment has a cavity at least on the side of the first exterior plate, and has a thin film formed as a reflector on the surface of the first exterior plate in the cavity, and the thin film comprises Ir, Pt, A film made of Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, An alloy film containing 50% by mass or more of Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is preferable.
  • the heat reflecting plate according to the present embodiment has a laminated film of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, and Co.
  • the cavity 12 is provided on both the first exterior plate 1a side and the second exterior plate 1b side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b.
  • the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
  • the first armor plate is a flat plate, has a cavity on the second armor plate side, and has a thin film formed as a reflector on the surface of the first armor plate, and the thin film is , Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re , Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50% by mass or more.
  • the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
  • the opposing surfaces of the first exterior plate and the second exterior plate are flat surfaces, and the reflector is the peripheral edge of the surface of the first exterior plate on the side of the second exterior plate.
  • the thin film includes Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, A film made of Au, Ag or Cu, or 50% by mass or more of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably an alloy film containing A film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, When an alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is used, even if the thin film formed as the reflector is a single layer film, good.
  • the reflector 5 is Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or A film made of Cu or an alloy film containing 50% by mass or more of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu It has a permuted structure.
  • the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
  • the heat reflecting plate according to the present embodiment has cavities on the side of the first exterior plate and the side of the second exterior plate, and has a thin film formed as a reflector on the surface in the cavity of the first exterior plate. , Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re , Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50% by mass or more.
  • the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
  • the alloy film containing 50% by mass or more of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu contains Ir,
  • the content of Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu is preferably 50% by mass or more, but 60% by mass. % or more, more preferably 70% by mass or more.
  • the alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu should be formed with the same film thickness as the reflector 5 which is a laminated film. is preferable, and the area ratio of the thin film formed on the bottom surface of the concave portion is preferably formed in the same range as that of the reflector 5 which is a laminated film.
  • the joints 2 between the peripheral edge portions are preferably surface-activated joints.
  • the joint 7 including the strut 6 is preferably a surface-activated joint. Since bonding can be performed at relatively low temperatures, it is possible to bond without thermal or physical damage to the reflective film. As a result, the heat reflector has a longer service life, corrosion resistance is improved, and contamination inside the furnace is suppressed.
  • a surface-activated joint refers to a portion in which at least one of the joints is brought into a surface-activated state, and then the joints are pressed together to integrate the surface texture at the atomic level. . It is more preferable to apply pressure to join the joining sites together after both of the joining sites are in a surface-activated state.
  • Surface activated junctions include cold activated junctions and plasma activated junctions.
  • the room-temperature-activated junction includes, for example, a junction bonded by surface activation using a high-speed atomic beam, a junction bonded by forming a nano-adhesion layer using an active metal such as Si and activating the surface, and ion bonding.
  • Some joints are surface activated using beams.
  • Plasma activated joints include, for example, joints that are surface-activated and bonded using oxygen plasma, and joints that are surface-activated and bonded using nitrogen plasma.
  • joint 2 between the peripheral edges By making the joint 2 between the peripheral edges a surface-activated joint, leakage at the joint can be reduced. For example, by keeping the inside of the cavity vacuum, damage to the plate-like exterior due to an increase in internal pressure at high temperatures can be prevented. can be done. See, for example, US Pat.
  • the pressure inside the cavity 12 is preferably reduced below atmospheric pressure. More preferably, the pressure inside the cavity 12 is 10 ⁇ 2 Pa or less. An increase in the internal pressure of the cavity 12 during heat treatment can be suppressed, and contamination in the furnace can be further suppressed. Also, deterioration of the reflective film at high temperatures can be suppressed.
  • the reflector 8 is a plate, and Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, It is preferably made of an alloy containing at least one selected from the group consisting of.
  • alloys containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu An alloy containing any one of these elements in the largest mass is preferable, and more preferably Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge An alloy containing 50% by mass or more of , Au, Ag or Cu, more preferably an alloy containing 60% by mass or more, and most preferably an alloy containing 70% by mass or more. system alloy or Pt--Ru system alloy. Since the plate as a reflector is accommodated in the cavity 12, corrosion of the plate is unlikely to occur.
  • the plate reflector 8 preferably has an area of 50 to 100%, more preferably 80 to 100%, of the total area of the bottom surface of the recess. Even in the form in which the reflector is a plate, the heat reflector 112 preferably has a total heat capacity of 0.0004 to 0.0080 (J/K) in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 . is 0.0023 to 0.0070 (J/K), more preferably 0.0030 to 0.0060 (J/K).
  • the reflector is a foil
  • the reflector is Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag. or Cu, or at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu
  • alloys containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu An alloy containing any one of these elements in the largest mass is preferable, and more preferably Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge An alloy containing 50% by mass or more of , Au, Ag or Cu, more preferably an alloy containing 60% by mass or more, and most preferably an alloy containing 70% by mass or more. system alloy or Pt--Ru system alloy.
  • the reflector which is a foil, preferably has an area of 50 to 100%, more preferably 80 to 100%, of the total area of the bottom surface of the recess. Even in a mode in which the reflector is a foil, the heat reflector 112 preferably has a total heat capacity of 0.0004 to 0.0080 (J/K) in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 . is 0.0023 to 0.0070 (J/K), more preferably 0.0030 to 0.0060 (J/K).
  • the thickness of the reflector is preferably 0.01 ⁇ m to 5 mm, more preferably 0.02 ⁇ m to 2 mm.
  • the heat capacity of the heat reflecting plate can be reduced while maintaining the high reflection efficiency of the reflector.
  • the thickness of the reflector is less than 0.01 ⁇ m, it becomes difficult to maintain the reflection efficiency, and when it exceeds 5 mm, the heat quantity of the reflector may become too large.
  • the film thickness of the laminated film is preferably 10 nm or more and 1500 nm or less, more preferably 20 nm or more and 400 nm or less.
  • the plate thickness is preferably 0.5 mm or more and 5.0 mm or less, more preferably 0.5 mm or more and 2.0 mm or less.
  • the thickness of the foil is preferably 3 ⁇ m or more and 2.0 mm or less, more preferably 8 ⁇ m or more and 1.0 mm or less.
  • the value obtained by subtracting the thickness of the reflector from the height of the cavity is 200 ⁇ m or less. is preferred, and 100 ⁇ m or less is more preferred. If the gap in the height direction in the cavity exceeds 200 ⁇ m, the deformation of the plate-shaped exterior due to atmospheric pressure increases, resulting in increased stress applied near the joint, which may cause cracks in the joint.
  • the incident direction of infrared rays is from top to bottom.
  • the incident direction of the infrared rays may be from top to bottom or from bottom to top.
  • the heat insulator is necessary for keeping the temperature of the substrate to be heated, but the heat insulator for the heat reflecting plate according to the present embodiment is not necessarily required. Without the heat insulator, the heat reflecting plate according to the present embodiment can achieve desired profiles without delaying the heating/cooling response in the heat treatment process having a temperature rising profile, a temperature holding profile, and a temperature dropping profile up to the heat treatment temperature. Also, the time required for one heat treatment cycle is not prolonged, and as a result, the production efficiency is not lowered.
  • Example 1 (Embodiment in which the reflector is a laminated film)
  • a heat reflector shown in FIG. 2 is produced. First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a portion of 10 mm width from the outer periphery of the first armor plate was left as a joint portion with the second armor plate, and the remaining portion was etched to form a concave portion for a cavity with a depth of 1 ⁇ m.
  • a 50 nm Ta base film was formed on the bottom surface of the concave portion of the first exterior plate by sputtering, and a 150 nm Ir reflective film was formed on the base film by sputtering to form a reflector.
  • the reflectance of the reflector was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corp., model: UV-3100PC).
  • FIG. 16 shows the measured reflectance results. The measurement was performed by directing light for measurement onto the surface of the reflector.
  • the relationship between the wavelength of black body radiation emitted by the substance at 1000° C. and the amount of radiation was calculated using (Equation 1). Calculation results are shown in FIG.
  • a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • a heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate.
  • the total thickness of the heat reflecting plate in Example 1 was 2.4000 mm, and the reflection area ratio was 93.33%.
  • the total heat capacity in the thickness direction of the plate-thickness exterior and the reflector at 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 1 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
  • Example 2 (Embodiment in which the reflector is a laminated film)
  • two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively.
  • a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate.
  • a 50 nm thick Ta film was formed as a base film on the masked surface of the first exterior plate by a sputtering method, and a 150 nm thick Ir film was formed as a reflective film on the base film by a sputtering method to form a reflector. Then the masking was removed.
  • the reflector was the same as the reflector of Example 1 and had the same reflection properties as shown in FIG.
  • a high-speed atomic beam is applied to the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • a heat reflecting plate was produced by irradiating the joint portion for surface activation and pressing the second armor plate against the first armor plate.
  • the total thickness of the heat reflecting plate in Example 2 was 2.4002 mm, and the reflection area ratio was 96.67%.
  • the total heat capacity in the thickness direction of the plate-thickness exterior and the reflector at 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 2 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
  • Example 3 (Embodiment in which the reflector is a laminated film)
  • two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively.
  • a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate.
  • a 50-nm Ta film was formed as a base film on the masked surface of the first exterior plate by a sputtering method, and a 150-nm film of Ir was formed as a reflective film on the base film by a sputtering method to form a reflector. Then the masking was removed.
  • the reflector was the same as the reflector of Example 1 and had the same reflection properties as shown in FIG.
  • oxygen plasma is brought into contact with the joint portion of the first armor plate to activate the surface, thereby activating the surface of the first armor plate.
  • a heat reflector was produced by pressing the second armor plate against the plate.
  • the total thickness of the heat reflecting plate in Example 3 was 2.4002 mm, and the reflection area ratio was 96.67%.
  • the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 3 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
  • Example 4 (A form in which the reflector is a laminated film and has a honeycomb-shaped strut part)
  • a heat reflector shown in FIG. 12 is produced.
  • two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively.
  • a 10 mm width portion was masked from the outer periphery of the first exterior plate, and thereafter, a regular hexagonal honeycomb having a width of 10 mm (one side length was 5.77 mm) and a wall pillar thickness of 0.3 mm was masked.
  • etching was performed to provide recesses for cavities with a depth of 1 ⁇ m.
  • a 50 nm Ta base film was formed by sputtering on the bottom surface of the concave portion of the masked first exterior plate, and a 150 nm Ir reflective film was formed on the base film by sputtering to form a reflector. .
  • the masking was removed.
  • the reflector of this embodiment has a honeycomb structure with respect to the reflector of the first embodiment.
  • the reflectance shown in FIG. 16 indicates the value of the form in which the entire surface is a reflective film.
  • the reflectance characteristic of this embodiment is considered to have a reflectance obtained by multiplying the reflectance shown in FIG. 16 by 0.9434.
  • a fast atom beam is applied to the joint portion 2 of the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • the pillars were irradiated to activate the surface, and the second armor plate was pressed against the first armor plate to bond them together, thereby producing a heat reflector.
  • the total thickness of the heat reflecting plate in Example 4 was 2.4000 mm, and the reflection area ratio was 88.05%.
  • the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 4 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
  • Example 5 (Embodiment in which the reflector is a Pt foil) A heat reflecting plate shown in FIG. 15 is produced. First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 7 mm width from the outer periphery of the first armor plate was left as a joining portion with the second armor plate, and the rest was cut to form a recess for a cavity with a depth of 0.2 mm. Next, a Pt foil having an outer circumference of 284 mm and a thickness of 100 ⁇ m was placed on the bottom surface of the concave portion of the first armor plate to form a reflector.
  • the reflectance of the reflector was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corp., model: UV-3100PC). The measured reflectance is shown in FIG. The measurement was performed by directing light for measurement onto the surface of the reflector. As a result of FIG. 18, it was confirmed that the reflector in this example had a reflectance of 80% or more at a wavelength of 2000 nm or more at 1000°C.
  • a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • the surface was activated by irradiation, and the second armor plate was pressed against the first armor plate to bond them together, thereby producing a heat reflector.
  • the total thickness of the heat reflecting plate in Example 5 was 2.4000 mm, and the reflection area ratio was 95.33%.
  • the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0056 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 5 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 39.0. A 13% reduction was achieved.
  • Example 6 (Embodiment in which the reflector is a Mo film)
  • two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively.
  • a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate.
  • a 200 nm film of Mo was formed as a reflector on the masked surface of the first exterior plate by a sputtering method. Then the masking was removed.
  • FIG. 19 shows the measured reflectance results.
  • the measurement was performed by directing light for measurement onto the surface of the reflector.
  • the reflector of this example had a reflectance of 80% or more at a wavelength of 2000 nm or more.
  • a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • a heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate. At this time, the total thickness of the heat reflecting plate in Example 6 was 2.4002 mm, and the reflection area ratio was 96.67%. After manufacturing the heat reflector, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 6 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
  • Example 7 (Embodiment in which the reflector is a Mo film and the thickness of the quartz plate is 1.7 mm)
  • two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.7 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively.
  • a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate.
  • a 200 nm film of Mo was formed as a reflector on the masked surface of the first exterior plate by a sputtering method. Then the masking was removed.
  • the reflector was the same as the reflector of Example 6 and had the same reflection properties as shown in FIG.
  • a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • a heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate.
  • the total thickness of the heat reflecting plate in Example 7 was 3.4002 mm, and the reflection area ratio was 96.67%.
  • the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0079 (J/K).
  • the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity. A 13% reduction was achieved.
  • Example 8 (Embodiment in which the reflector is a Mo film and the thickness of the quartz plate is 0.5 mm)
  • two plate-like exterior plates having an outer circumference of 100 mm and a thickness of 0.5 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively.
  • a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate.
  • a 200 nm film of Mo was formed as a reflector on the masked surface of the first exterior plate by a sputtering method. Then the masking was removed.
  • the reflector was the same as the reflector of Example 6 and had the same reflection properties as shown in FIG.
  • a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 ⁇ 2 Pa or less.
  • a heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate.
  • the total thickness of the heat reflecting plate in Example 8 was 1.0002 mm, and the reflection area ratio was 90.00%.
  • the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0023 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 8 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 75.5. 00% reduction.
  • Heat reflector 1 Plate-like exterior 1a First exterior plate 1b Second exterior plate 2 Joint between peripheral edges 3 Underlying film 4 Reflective film 5 Reflector 6 Support 7 Joint including support 8 Reflector 11 Bank 12 Cavity

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Abstract

The purpose of the present disclosure is to provide a heat reflection plate which has good thermal responsiveness and high reflectance, while being suppressed in the possibility of contaminating a furnace, and which has a low heat capacity and is capable of saving energy. A heat reflection plate 100 according to the present disclosure comprises: a plate-like outer covering 1; and a reflector 5 which is arranged inside the plate-like outer covering 1 such that the outer periphery thereof is completely covered by the plate-like outer covering 1, and which reflects infrared light that is incident on one surface of the plate-like outer covering 1. The reflector 5 is composed of a thin film, plate or foil. With respect to this heat reflection plate 100, the sum of the heat capacities of the plate-like outer covering and the reflector per 1 mm2 in the thickness direction is 0.0004 to 0.0080 (J/K).

Description

熱反射板heat reflector
　本開示は、例えば、半導体・電子部品の分野で、ウエハ、基板等を低温から高温で熱処理する種々の熱処理装置の熱反射板として利用でき、加熱・冷却の１サイクルに要する時間が短く、かつ、高反射率を有することから熱処理装置の省エネルギー化が可能であり、また、汚染を抑制することが可能な熱反射板に関する。 INDUSTRIAL APPLICABILITY The present disclosure can be used, for example, in the field of semiconductors and electronic components as a heat reflector for various heat treatment apparatuses for heat-treating wafers, substrates, etc. at low to high temperatures, shorten the time required for one heating/cooling cycle, and More particularly, it relates to a heat reflecting plate capable of saving energy in a heat treatment apparatus and suppressing contamination due to its high reflectance.
　半導体ウエハの製造または処理工程においては、半導体ウエハに各種の性質を付与するため熱処理作業が行われている。例えば、半導体ウエハを高純度石英製の炉芯管に収納し、炉芯管内の雰囲気を制御して、熱処理作業が行われる。この熱処理工程に使用される熱処理装置では、炉内の高温維持と炉床部への熱放散を防止するため、炉内と炉床との間に炉開口部を塞ぐように保温体（蓋体）が設けられている。 In the process of manufacturing or processing semiconductor wafers, heat treatment is performed to impart various properties to semiconductor wafers. For example, a semiconductor wafer is housed in a furnace core tube made of high-purity quartz, and a heat treatment operation is performed by controlling the atmosphere in the furnace core tube. In the heat treatment apparatus used in this heat treatment process, in order to maintain the high temperature inside the furnace and prevent heat dissipation to the hearth, a heat insulator (lid body) is placed between the inside of the furnace and the hearth so as to block the opening of the furnace. ) is provided.
　このような保温体としては、熱処理室の開口部を閉塞し、互いに離間して積層され、かつ熱処理室に露出する石英板を有する保温体があり、石英板は表面が平滑で気泡がなく、石英板の内部に金薄膜が形成されていて、金薄膜は、金蒸着により形成されたという特徴がある（例えば、特許文献１を参照。）。 As such a heat insulator, there is a heat insulator that closes the opening of the heat treatment chamber and has quartz plates that are stacked apart from each other and exposed to the heat treatment chamber. A gold thin film is formed inside the quartz plate, and the gold thin film is characterized by being formed by gold vapor deposition (see, for example, Patent Document 1).
　また、石英管を中心に通すための孔及び石英ロッドを通すための孔を有する石英板の上に、白金（Ｐｔ）及び酸化物（ＳｉＯやＰｂＯなど）の混合物に有機物を加えてペースト状にしたものをスクリーン印刷により塗布し、これを焼き固めることにより抵抗発熱体よりなる例えば厚さ５～１０ミクロンの反射面を形成する技術の開示がある（例えば、特許文献２を参照。）。 Alternatively, a mixture of platinum (Pt) and an oxide (such as SiO or PbO) is added to a mixture of platinum (Pt) and an oxide (such as SiO or PbO) to form a paste on a quartz plate having a hole for passing a quartz tube through the center and a hole for passing a quartz rod. There is a disclosure of a technique for forming a 5 to 10-micron-thick reflective surface made of a resistance heating element by applying the coated material by screen printing and baking it (see, for example, Patent Document 2).
　縦型熱処理炉の断熱構造体が、複数本の支柱と、これら支柱に上下方向に所定間隔で設けられた複数枚の反射性を有する遮熱板とから構成されている技術の開示がある（例えば、特許文献３を参照。）。特許文献３によれば、遮熱板は、反射膜と、この反射膜の表面を被覆する透明石英層とから形成されている。この遮熱板を形成する一つの方法としては、透明石英層を形成する円形の一対の透明石英板を用い、その一方の透明石英板の片方の面に反射膜を設け、この反射膜をもう一方の透明石英板との間で挟み込み、両透明石英板の周縁部を溶接して密封および一体化する方法がある。 There is a disclosure of a technique in which the heat insulating structure of a vertical heat treatment furnace is composed of multiple pillars and a plurality of reflective heat shield plates provided on these pillars at predetermined intervals in the vertical direction ( See, for example, Patent Document 3.). According to Patent Document 3, a heat shield plate is formed of a reflective film and a transparent quartz layer covering the surface of the reflective film. One method of forming this heat shield plate is to use a pair of circular transparent quartz plates for forming a transparent quartz layer, provide a reflective film on one side of one of the transparent quartz plates, and then place the reflective film on one side of the transparent quartz plate. There is a method of sandwiching between one transparent quartz plate and welding the peripheral edge portions of both transparent quartz plates to seal and integrate them.
特開２００１‐１０２３１９号公報JP-A-2001-102319 特開平９‐１４８３１５号公報JP-A-9-148315 特開平１１‐９７３６０号公報JP-A-11-97360 特開２０１９‐２１７５３０号公報JP 2019-217530 A 特許４１７２８０６号公報Japanese Patent No. 4172806 特許６０３２６６７号公報Japanese Patent No. 6032667
　特許文献１では、金属汚染防止の保温体があることで、炉体の加熱・冷却の応答を遅らせてしまい、結果、熱処理サイクルに時間を要してしまう。また、石英板は金属汚染防止のために外周を溶接する必要があり、高い反射率を保持させるためには石英板面積に占める金属膜面積を多くとるために、石英板同士の接合幅を極力小さくすることが必要である。これが行われていない特許文献１では、熱処理温度までの昇温プロファイル、温度保持プロファイル、降温プロファイルを有する熱処理工程において、加熱・冷却の応答を遅らせ、所望の各プロファイルに対してズレを生じさせ、また、熱処理１サイクルに要する時間を長引かせ、結果として生産効率の低下を生じさせるという問題があった。 In Patent Document 1, the presence of a heat insulator to prevent metal contamination delays the heating and cooling response of the furnace body, and as a result, the heat treatment cycle takes time. In addition, the quartz plates must be welded at their outer peripheries to prevent metal contamination. It is necessary to make it small. In Patent Document 1, where this is not done, in a heat treatment process having a temperature rise profile, temperature retention profile, and temperature drop profile up to the heat treatment temperature, the response of heating and cooling is delayed, causing a deviation from each desired profile, In addition, there is a problem that the time required for one heat treatment cycle is prolonged, resulting in a decrease in production efficiency.
　特許文献２では、反射板兼ヒーターとしての利用のため、中央に石英管でヒーター導通箇所を設けているが、当構造によって一部輻射熱を遮蔽しきれない箇所が発生する。より高い省エネルギー化のためには、反射面積率を多く取り、尚且つ反射板及び外装となる石英をより薄くし、熱容量を下げる必要がある。 In Patent Literature 2, a quartz tube is provided in the center to provide a heater conduction part for use as both a reflector and a heater, but due to this structure, there are places where the radiant heat cannot be completely shielded. For higher energy saving, it is necessary to increase the reflective area ratio, to make the quartz used as the reflector and the exterior thinner, and to lower the heat capacity.
　特許文献３では、石英板で挟み込み、溶接を行う手法がとられているが、熱の影響を受けるため、薄膜で実施する際には膜が剥がれてしまう問題があり、溶接幅を小さくすることも困難である。さらに内部を真空に保ちながら溶接することは難しく、高温使用時の内圧上昇によって薄膜が破損するリスクは避けられない。また透明石英を流し込み作製する手法においても、金属薄膜に実施する場合は熱的、物理的ダメージを避けることはできず、透明石英を薄く作ることも困難である。また、特許文献３においても、遮熱板は、熱処理工程において、加熱・冷却の応答を遅らせ、所望の各プロファイルに対してズレを生じさせ、また、熱処理１サイクルに要する時間を長引かせ、結果として生産効率の低下を生じさせるという問題があった。 In Patent Document 3, a method of sandwiching between quartz plates and welding is adopted, but since it is affected by heat, there is a problem that the film will peel off when it is performed with a thin film, so it is necessary to reduce the welding width. is also difficult. Furthermore, it is difficult to weld while maintaining a vacuum inside, and there is an unavoidable risk of damage to the thin film due to an increase in internal pressure during high-temperature use. Also, in the method of pouring transparent quartz, if it is applied to a metal thin film, thermal and physical damage cannot be avoided, and it is difficult to make the transparent quartz thin. Also, in Patent Document 3, the heat shield plate delays the response of heating and cooling in the heat treatment process, causes a deviation from each desired profile, and prolongs the time required for one heat treatment cycle, resulting in As a result, there was a problem of causing a decrease in production efficiency.
　本開示は、従来手法よりも反射面積率をより多く確保することができ、熱容量が小さく省エネルギー化が可能で、高反射率を有し、炉内の汚染が抑制され、熱応答性の良い熱反射板を提供することを目的とする。 The present disclosure can ensure a larger reflection area ratio than the conventional method, has a small heat capacity, can save energy, has a high reflectance, suppresses contamination in the furnace, and has a heat with good thermal response. The object is to provide a reflector.
　本発明者らは、鋭意検討した結果、熱反射板の１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量を所定範囲にすることによって上記課題が解決されることを見出し、本発明を完成させた。すなわち、本発明に係る熱反射板は、板状外装と、該板状外装の内部に配置されて該板状外装によって外周囲が完全に覆われてなり、かつ、該板状外装の一方の表面に入射した赤外線を反射する反射体と、を有する熱反射板であって、前記反射体は、薄膜、板又は箔であり、前記熱反射板は、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が０．０００４～０．００８０（Ｊ／Ｋ）であることを特徴とする。 As a result of intensive studies, the inventors of the present invention found that the above problem can be solved by setting the heat capacity of the plate-like exterior and the reflector in the thickness direction of 1 mm 2 of the heat reflector within a predetermined range, and have completed the present invention. completed. That is, the heat reflecting plate according to the present invention comprises a plate-shaped exterior, a plate-shaped exterior arranged inside the plate-shaped exterior so that the outer circumference is completely covered by the plate-shaped exterior, and one side of the plate-shaped exterior. and a reflector that reflects infrared rays incident on a surface, wherein the reflector is a thin film, a plate or a foil, and the heat reflector is a plate-like exterior and a reflector at 1 mm 2 . The total heat capacity in the thickness direction is 0.0004 to 0.0080 (J/K).
　本発明に係る熱反射板では、前記反射体の少なくとも反射面を含む表面層は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。 In the heat reflector according to the present invention, the surface layer including at least the reflecting surface of the reflector is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing at least one of them.
　本発明に係る熱反射板では、前記板状外装の材質はシリカ又はシリコンであることが好ましい。 In the heat reflector according to the present invention, it is preferable that the material of the plate-like exterior is silica or silicon.
　本発明に係る熱反射板では、前記板状外装は、第１外装板と第２外装板とが対向して配置されて周縁部同士が周縁に沿って環状に連続して接合された接合部を有する合わせ板の構造を有することが好ましい。板状外装及び反射体を薄くできるので、熱容量を小さくすることができる。 In the heat reflecting plate according to the present invention, the plate-shaped exterior is a joint portion in which a first exterior plate and a second exterior plate are arranged to face each other, and peripheral edge portions are annularly joined continuously along the peripheral edge. It is preferable to have a structure of a laminated plate having Since the plate-shaped exterior and the reflector can be made thinner, the heat capacity can be reduced.
　本発明に係る熱反射板では、前記合わせ板の構造は、前記第１外装板及び前記第２外装板の対向し合う面の間に設けられ、かつ、前記第１外装板側及び前記第２外装板側の少なくとも一方に前記周縁部同士の接合部によって密閉されているキャビティを有し、該キャビティ内に前記反射体が配置されていることが好ましい。反射体が密閉空間であるキャビティ内にあるため、周縁部同士の接合部に、反射体に起因する剥がす方向の応力がかかりにくく、反射体の破損による炉内の汚染を抑制することができる。さらに板状外装と反射体の熱膨張差による破損を回避できる。 In the heat reflector according to the present invention, the structure of the laminated plate is provided between the facing surfaces of the first exterior plate and the second exterior plate, and It is preferable that at least one side of the exterior plate has a cavity sealed by a joint portion between the peripheral edge portions, and the reflector is arranged in the cavity. Since the reflector is in the cavity, which is a closed space, stress in the peeling direction caused by the reflector is not applied to the joints between the peripheral edge portions, and contamination in the furnace due to breakage of the reflector can be suppressed. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
　本発明に係る熱反射板では、前記キャビティを少なくとも前記第１外装板側に有し、前記第１外装板の前記キャビティ内の表面上に前記反射体として形成した薄膜を有し、該薄膜は、前記第１外装板の前記キャビティ内の表面側から順に、下地膜と、前記反射面を含む表面層としての反射膜と、を有する積層膜であり、前記下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、前記反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、前記下地膜と前記反射膜とが異なる組成を有していることが好ましい。第１外装板のキャビティ内の表面上に反射体を形成しているため、周縁部同士の接合部に、反射体に起因する剥がす方向の応力がかかりにくく、反射体の破損による炉内の汚染を抑制することができる。さらに板状外装と反射体の熱膨張差による破損を回避できる。 The heat reflector according to the present invention has the cavity at least on the side of the first exterior plate, and has a thin film formed as the reflector on the surface of the first exterior plate in the cavity, wherein the thin film is and a reflective film as a surface layer including the reflective surface in this order from the surface side of the cavity of the first exterior plate, wherein the reflective film includes Ta, Mo, and Ti. , Zr, Nb, Cr, W, Co or Ni, or an alloy containing at least one selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni and the reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, an alloy containing at least one selected from the group consisting of Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu; It is preferable that the reflective film has a composition different from that of the reflective film. Since the reflector is formed on the surface inside the cavity of the first armor plate, the stress in the peeling direction due to the reflector is not applied to the joint between the peripheral edge portions, and the damage of the reflector causes the inside of the furnace to be contaminated. can be suppressed. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
　本発明に係る熱反射板では、前記第１外装板が平板であり、前記キャビティを前記第２外装板側に有し、前記第１外装板の表面上に前記反射体として形成した薄膜を有し、該薄膜は、前記第１外装板の表面側から順に、下地膜と、前記反射面を含む表面層としての反射膜と、を有する積層膜であり、前記下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、前記反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、前記下地膜と前記反射膜とが異なる組成を有していることが好ましい。平板である第１外装板に反射体としての薄膜を形成するため、生産性に優れた熱反射板とすることができる。 In the heat reflector according to the present invention, the first armor plate is flat, has the cavity on the second armor plate side, and has the thin film formed as the reflector on the surface of the first armor plate. and the thin film is a laminated film having, in order from the surface side of the first exterior plate, a base film and a reflective film as a surface layer including the reflective surface, and the base film is composed of Ta, Mo, An alloy consisting of Ti, Zr, Nb, Cr, W, Co or Ni, or containing at least one selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni and the reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt , Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, and and the reflective film preferably have different compositions. Since the thin film as a reflector is formed on the first armor plate, which is a flat plate, the heat reflector can be produced with excellent productivity.
　本発明に係る熱反射板では、前記反射体が、板又は箔であり、かつ、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。キャビティ内に反射体としての板又は箔が収容された状態となっており、板又は箔の腐食が生じにくい。さらに、周縁部同士の接合部に、板又は箔に起因する剥がす方向の応力がかかりにくい。 In the heat reflector according to the present invention, the reflector is a plate or foil, and has Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing at least one of them. Since the plate or foil serving as the reflector is housed in the cavity, corrosion of the plate or foil is less likely to occur. Furthermore, stress in the peeling direction due to the plate or foil is less likely to be applied to the joints between the peripheral edges.
　本発明に係る熱反射板では、前記キャビティ内の圧力は、大気圧未満の減圧となっていることが好ましい。熱処理時にキャビティの内圧が高まることを抑制することができ、炉内の汚染をより抑制することができる。 In the heat reflector according to the present invention, it is preferable that the pressure inside the cavity is reduced below atmospheric pressure. An increase in the internal pressure of the cavity during heat treatment can be suppressed, and contamination in the furnace can be further suppressed.
　本発明に係る熱反射板では、（１）前記第１外装板は、前記周縁部に設けられた土手部と該土手部で取り囲まれて前記キャビティを構成する凹部とを有し、前記第２外装板は、平板状であるか、又は、（２）前記第１外装板は、平板状であり、前記第２外装板は、前記周縁部に設けられた土手部と該土手部で取り囲まれて前記キャビティを構成する凹部とを有することが好ましい。第１外装板に凹部を設けることで、板状外装内にキャビティを簡易な構造で設けることができる。あるいは、第２外装板に凹部を設けることで、板状外装内にキャビティを簡易な構造で設けることができる。 In the heat reflecting plate according to the present invention, (1) the first exterior plate has a bank portion provided in the peripheral edge portion and a concave portion that is surrounded by the bank portion and forms the cavity, and the second The exterior plate is flat, or (2) the first exterior plate is flat, and the second exterior plate is surrounded by a bank portion provided at the peripheral portion and the bank portion. It is preferable to have a concave portion forming the cavity. By providing the concave portion in the first exterior plate, the cavity can be provided in the plate-like exterior with a simple structure. Alternatively, by providing a concave portion in the second exterior plate, it is possible to provide a cavity in the plate-like exterior with a simple structure.
　本発明に係る熱反射板では、前記熱反射板は、前記キャビティ内で前記合わせ板の構造の対向する面同士の間を立設する少なくとも１本の支柱部を有することが好ましい。支柱部によって合わせ板構造の接合強度を高めることができる。 In the heat reflecting plate according to the present invention, it is preferable that the heat reflecting plate has at least one strut portion erected between the facing surfaces of the structure of the laminated plate within the cavity. The joint strength of the laminated plate structure can be increased by the strut portion.
　本発明に係る熱反射板では、前記支柱部が、柱状又は筒状である形態を含む。柱状又は筒状とすることで、接合強度を高めつつ、反射体の面積を広くとることが出来る。 The heat reflecting plate according to the present invention includes a form in which the supporting column has a columnar shape or a cylindrical shape. By using a columnar shape or a cylindrical shape, it is possible to increase the area of the reflector while increasing the bonding strength.
　本発明に係る熱反射板では、前記熱反射板は、前記支柱部を複数有し、該支柱部は筒状であり、かつ、各支柱部は互いに筒壁の一部を共有した３次元空間充填構造を有することが好ましい。３次元空間充填構造とすることで接合強度を高めつつ、反射体の面積を広くとることが出来、さらに反射板そのものの強度を高めることができる。 In the heat reflecting plate according to the present invention, the heat reflecting plate has a plurality of the strut portions, the strut portions are cylindrical, and the respective strut portions share a part of the cylindrical wall in a three-dimensional space. It is preferred to have a filling structure. By adopting a three-dimensional space-filling structure, the area of the reflector can be increased while increasing the bonding strength, and the strength of the reflector itself can be increased.
　本発明に係る熱反射板では、前記３次元空間充填構造は、ハニカム構造、矩形格子構造、方形格子構造又はひし形格子構造である形態を包含する。 In the heat reflector according to the present invention, the three-dimensional space-filling structure includes a honeycomb structure, a rectangular lattice structure, a square lattice structure, or a diamond lattice structure.
　本発明に係る熱反射板では、前記第１外装板及び前記第２外装板の対向し合う面は互いに平坦面であり、前記反射体は、前記第２外装板側の前記第１外装板の表面のうち前記周縁部同士の環状の接合部の内側の領域に形成された薄膜であり、該薄膜は、前記第１外装板の表面側から順に、下地膜と、前記反射面を含む表面層としての反射膜と、を有する積層膜であり、前記下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、前記反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、前記下地膜と前記反射膜とが異なる組成を有していることが好ましい。反射体と第２外装板の部分接触により生じる干渉縞をより抑制することができる。 In the heat reflector according to the present invention, the opposing surfaces of the first exterior plate and the second exterior plate are flat surfaces, and the reflector is located on the first exterior plate on the side of the second exterior plate. A thin film formed in a region inside the annular joining portion between the peripheral edge portions of the surface, wherein the thin film comprises, in order from the surface side of the first exterior plate, a base film and a surface layer including the reflective surface. and a reflective film as a laminated film, wherein the base film is made of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or Ta, Mo, Ti, Zr, Nb , Cr, W, Co and Ni, and the reflective film comprises Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or an alloy containing at least one selected from the group consisting of Cu, and the underlying film and the reflective film preferably have different compositions. Interference fringes caused by partial contact between the reflector and the second exterior plate can be further suppressed.
　本発明に係る熱反射板では、前記キャビティを少なくとも前記第１外装板側に有し、前記第１外装板の前記キャビティ内の表面上に前記反射体として形成した薄膜を有し、該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。これらの金属膜又はこれらの金属を５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。 The heat reflector according to the present invention has the cavity at least on the side of the first exterior plate, and has a thin film formed as the reflector on the surface of the first exterior plate in the cavity, wherein the thin film is , Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re , Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50% by mass or more. When these metal films or alloy films containing 50 mass % or more of these metals are used, the thin film formed as the reflector may be a single layer film.
　本発明に係る熱反射板では、前記第１外装板が平板であり、前記キャビティを前記第２外装板側に有し、前記第１外装板の表面上に前記反射体として形成した薄膜を有し、該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。これらの金属膜又はこれらの金属を５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。 In the heat reflector according to the present invention, the first armor plate is flat, has the cavity on the second armor plate side, and has the thin film formed as the reflector on the surface of the first armor plate. and the thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, An alloy film containing 50% by mass or more of Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is preferable. When these metal films or alloy films containing 50 mass % or more of these metals are used, the thin film formed as the reflector may be a single layer film.
　本発明に係る熱反射板では、前記第１外装板及び前記第２外装板の対向し合う面は互いに平坦面であり、前記反射体は、前記第２外装板側の前記第１外装板の表面のうち前記周縁部同士の環状の接合部の内側の領域に形成された薄膜であり、該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。これらの金属膜又はこれらの金属を５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。 In the heat reflector according to the present invention, the opposing surfaces of the first exterior plate and the second exterior plate are flat surfaces, and the reflector is located on the first exterior plate on the side of the second exterior plate. A thin film formed in a region inside the annular joint portion between the peripheral portions of the surface, the thin film comprising Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, A film made of Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or An alloy film containing 50% by mass or more of Cu is preferable. When these metal films or alloy films containing 50 mass % or more of these metals are used, the thin film formed as the reflector may be a single layer film.
　本発明に係る熱反射板では、前記キャビティを前記第１外装板側及び前記第２外装板側に有し、前記第１外装板の前記キャビティ内の表面上に前記反射体として形成した薄膜を有し、該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。これらの金属膜又はこれらの金属を５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。 In the heat reflector according to the present invention, the cavity is provided on the first exterior plate side and the second exterior plate side, and the thin film formed as the reflector is formed on the surface of the first exterior plate within the cavity. the thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt , Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50 mass % or more. When these metal films or alloy films containing 50 mass % or more of these metals are used, the thin film formed as the reflector may be a single layer film.
　本発明に係る熱反射板では、前記反射体の厚さは、０．０１μｍ以上５ｍｍ以下であることが好ましい。反射体による輻射熱の反射効率を保持しつつ、熱反射板の熱容量を小さくすることができる。 In the heat reflector according to the present invention, the thickness of the reflector is preferably 0.01 μm or more and 5 mm or less. It is possible to reduce the heat capacity of the heat reflecting plate while maintaining the efficiency of reflection of radiant heat by the reflector.
　本発明に係る熱反射板では、前記周縁部同士の接合部は、表面活性化接合部であることが好ましい。一般的な溶接手法よりも接合幅を短くすることで、より輻射熱を炉内へ反射させることができる。また、反射体である薄膜が接合プロセスによる熱的、物理的ダメージを受けにくい。また、接合部における接合強度が高められており、熱反射板はより長寿命となり、また耐食性が高まり、炉内の汚染が抑制される。 In the heat reflector according to the present invention, it is preferable that the joints between the peripheral edges are surface-activated joints. Radiant heat can be reflected into the furnace more by shortening the joint width compared to the general welding method. Also, the thin film, which is a reflector, is less susceptible to thermal and physical damage due to the bonding process. In addition, the joint strength at the joint is increased, the life of the heat reflector is increased, and the corrosion resistance is enhanced, thereby suppressing contamination in the furnace.
　本開示によれば、従来手法よりも反射面積率をより多く確保することができ、熱容量が小さく省エネルギー化が可能で、高反射率を有し、炉内の汚染が抑制され、熱応答性の良い熱反射板を提供することができる。 According to the present disclosure, it is possible to secure a larger reflection area ratio than the conventional method, have a small heat capacity, can save energy, have a high reflectance, suppress contamination in the furnace, and have a thermal responsiveness. A good heat reflector can be provided.
本実施形態に係る熱反射板の一例を示す平面概略図である。1 is a schematic plan view showing an example of a heat reflecting plate according to this embodiment; FIG. Ａ－Ａ断面の第１例を示す概略図である。1 is a schematic diagram showing a first example of an AA cross section; FIG. Ａ－Ａ断面の第２例を示す概略図である。FIG. 4 is a schematic diagram showing a second example of an AA cross section; Ａ－Ａ断面の第３例を示す概略図である。FIG. 10 is a schematic diagram showing a third example of an AA cross section; Ａ－Ａ断面の第４例を示す概略図である。FIG. 11 is a schematic diagram showing a fourth example of the AA cross section; Ａ－Ａ断面の第５例を示す概略図である。FIG. 11 is a schematic diagram showing a fifth example of the AA cross section; Ａ－Ａ断面の第６例を示す概略図である。FIG. 11 is a schematic diagram showing a sixth example of the AA cross section; Ａ－Ａ断面の第７例を示す概略図である。FIG. 11 is a schematic diagram showing a seventh example of the AA cross section; 支柱部がハニカム構造を有する形態の例を示す図である。FIG. 10 is a diagram showing an example of a form in which a support section has a honeycomb structure; Ａ－Ａ断面の第８例を示す概略図である。FIG. 11 is a schematic diagram showing an eighth example of the AA cross section; Ａ－Ａ断面の第９例を示す概略図である。FIG. 11 is a schematic diagram showing a ninth example of the AA cross section; Ａ－Ａ断面の第１０例を示す概略図である。FIG. 10 is a schematic diagram showing a tenth example of the AA cross section; Ａ－Ａ断面の第１１例を示す概略図である。FIG. 11 is a schematic diagram showing an eleventh example of an AA cross section; Ａ－Ａ断面の第１２例を示す概略図である。FIG. 12 is a schematic diagram showing a twelfth example of an AA cross section; Ａ－Ａ断面の第１３例を示す概略図である。FIG. 13 is a schematic diagram showing a thirteenth example of the AA cross section; 実施例１の反射体の反射率を示すグラフである。4 is a graph showing the reflectance of the reflector of Example 1. FIG. １０００℃における物質が放射する黒体放射の波長と放射量との関係を示すグラフである。4 is a graph showing the relationship between the wavelength of blackbody radiation emitted by a substance at 1000° C. and the amount of radiation. 実施例５の反射体の反射率を示すグラフである。10 is a graph showing the reflectance of the reflector of Example 5. FIG. 実施例６の反射体の反射率を示すグラフである。10 is a graph showing the reflectance of the reflector of Example 6. FIG. Ａ－Ａ断面の第１４例を示す概略図である。FIG. 20 is a schematic diagram showing a 14th example of the AA cross section; 比較例１の不透明石英の反射率を示すグラフである。4 is a graph showing the reflectance of opaque quartz of Comparative Example 1. FIG.
　以降、本発明について実施形態を示して詳細に説明するが本発明はこれらの記載に限定して解釈されない。本発明の効果を奏する限り、実施形態は種々の変形をしてもよい。 Hereinafter, the present invention will be described in detail by showing embodiments, but the present invention is not interpreted as being limited to these descriptions. Various modifications may be made to the embodiments as long as the effects of the present invention are achieved.
（反射体が薄膜である形態）
　図１及び図２を参照して、本実施形態に係る熱反射板について説明する。本実施形態に係る熱反射板１００は、板状外装１と、板状外装１の内部に配置されて板状外装１によって外周囲が完全に覆われてなり、かつ、板状外装１の一方の表面に入射した赤外線を反射する反射体５と、を有する。図１においては、紙面に向かう方向が赤外線の入射方向である。図２においては、上から下に向かう方向が赤外線の入射方向である。反射体５は薄膜であり、反射体５の少なくとも反射面を含む表面層は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。図２では、反射体５が積層膜である形態が示されており、下地膜３の上に反射面を含む表面層としての反射膜４が形成されている。このとき、反射体５は貫通孔や凹凸などを設けずに該反射体の周縁に囲まれる全面が反射面であることが好ましい。 (Mode in which the reflector is a thin film)
A heat reflector according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. The heat reflecting plate 100 according to the present embodiment includes a plate-shaped exterior 1, and is arranged inside the plate-shaped exterior 1 so that the outer circumference is completely covered by the plate-shaped exterior 1, and one side of the plate-shaped exterior 1 and a reflector 5 that reflects infrared rays incident on the surface of the . In FIG. 1, the direction toward the paper surface is the incident direction of infrared rays. In FIG. 2, the direction from top to bottom is the incident direction of infrared rays. The reflector 5 is a thin film, and the surface layer including at least the reflecting surface of the reflector 5 is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au. , Ag or Cu, or at least selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing any one of them. FIG. 2 shows a mode in which the reflector 5 is a laminated film, and a reflective film 4 as a surface layer including a reflective surface is formed on the base film 3 . At this time, it is preferable that the reflector 5 has a reflective surface on the entire surface surrounded by the periphery of the reflector without providing through holes or irregularities.
　本実施形態に係る熱反射板１００は、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が０．０００４～０．００８０（Ｊ／Ｋ）であり、好ましくは０．００２３～０．００７０（Ｊ／Ｋ）であり、より好ましくは０．００３０～０．００６０（Ｊ／Ｋ）である。１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量は、反射体５と反射体５の外周囲を完全に覆う板状外装１とを有する熱反射板１００の熱容量を、赤外線の入射面の面積で除した値に相当する。赤外線の入射面の面積とは、図１及び図２を例として説明すると、図１では熱反射板１００における赤外線の入射面の全体が示されているが、入射面には、図２によれば、反射体５が見える領域と周縁部同士の接合部２が見える領域とがあるところ、これら両方を含む領域の面積、すなわち、反射体５を正面に見た板状外装１の板面の面積全体を指す。１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が０．０００４（Ｊ／Ｋ）未満であると、板状外装の厚みの不足による破損、または、反射体の厚みの不足による赤外線の透過が発生することで反射性能が低下する可能性があり、０．００８０（Ｊ／Ｋ）を超えると、熱容量の合計が大きすぎて熱処理工程において、加熱・冷却の応答を遅らせ、所望の各プロファイルに対してズレを生じさせ、また、熱処理１サイクルに要する時間を長引かせ、結果として生産効率の低下を生じさせる。 In the heat reflecting plate 100 according to the present embodiment, the total heat capacity in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 is 0.0004 to 0.0080 (J/K), preferably 0.0023 to 0.0023. It is 0.0070 (J/K), more preferably 0.0030 to 0.0060 (J/K). The heat capacity in the thickness direction of the plate-shaped exterior and the reflector at 1 mm 2 is the heat capacity of the heat reflection plate 100 having the reflector 5 and the plate-shaped exterior 1 that completely covers the outer periphery of the reflector 5, and the infrared incident surface equivalent to the value divided by the area of 1 and 2. FIG. 1 shows the entire infrared incident surface of the heat reflecting plate 100, but the incident surface has a surface area as shown in FIG. For example, there is a region where the reflector 5 is visible and a region where the joint 2 between the peripheral edge portions is visible. Refers to the entire area. If the total heat capacity in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 is less than 0.0004 (J / K), damage due to insufficient thickness of the plate-shaped exterior, or due to insufficient thickness of the reflector Reflection performance may decrease due to the transmission of infrared rays. Also, the time required for one heat treatment cycle is prolonged, resulting in a decrease in production efficiency.
　なお、本実施形態における熱反射板は、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が上記範囲を満たすことが必要である。この範囲を満たすことに加えて炉体の熱応答性をさらに良好にするために、面内方向における板状外装に対する反射体の面積の割合が大きいこと及び反射体に用いられる反射材料の反射率が高いことがより好ましい。例えば、使用する炉体及び基板の大きさに合わせて熱反射板を設計するが、熱反射板の大きさは、直径が５０ｍｍ以上の円板形状もしくは一辺が５０ｍｍ以上の多角形状における板状外装とすることが好ましい。加えて熱反射板の厚さを、例えば、１～３．４ｍｍ、好ましくは１～３ｍｍとなるべく薄くすることが好ましい。加えて前記円板形状もしくは多角形状の面内方向の面積になるべく近い面積、例えば、反射面積率でいえば８０％以上となるように反射体を設けることが好ましい。加えて反射体に用いられる金属材料又は合金材料は、高い反射率、例えば８０％以上の反射率を持つ金属材料又は合金材料を選定することが好ましい。ここで、「面内方向」の面とは、熱反射板の反射面を含む板面のことをさす。 In addition, in the heat reflector in this embodiment, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 must satisfy the above range. In addition to satisfying this range, in order to further improve the thermal response of the furnace body, the ratio of the area of the reflector to the plate-shaped exterior in the in-plane direction is large, and the reflectance of the reflective material used for the reflector is more preferred. For example, the heat reflector is designed according to the size of the furnace body and substrate to be used. It is preferable to In addition, it is preferable to make the thickness of the heat reflector as thin as possible, for example, 1 to 3.4 mm, preferably 1 to 3 mm. In addition, it is preferable to provide the reflector so as to have an area as close as possible to the in-plane area of the disk shape or polygonal shape, for example, 80% or more in terms of reflection area ratio. In addition, it is preferable to select a metal material or an alloy material having a high reflectance, for example, a reflectance of 80% or more, as the metal material or alloy material used for the reflector. Here, the "in-plane direction" means a plate surface including the reflecting surface of the heat reflecting plate.
　熱反射板１００では、板状外装１は、第１外装板１ａと第２外装板１ｂとが対向して配置されて周縁部同士が周縁に沿って環状に連続して接合された接合部を有する合わせ板の構造を有することが好ましい。図２において、第１外装板１ａと第２外装板１ｂとは、周縁部同士の接合部２によって、合わせ板の構造を形成している。周縁部同士の接合部２は、図１に示すように、板状外装１の周縁に沿って環状に連続している。図１では、周縁部同士の接合部２は、第２外装板１ｂを透視して第１外装板１ａと第２外装板１ｂとの境界部としてみることができ、グレーの領域として図示した。合わせ板の構造とすることで、板状外装を薄くできるので、熱容量を小さくすることができる。 In the heat reflecting plate 100, the plate-shaped exterior 1 has a joint portion in which a first exterior plate 1a and a second exterior plate 1b are arranged to face each other and the peripheral edges are continuously joined along the peripheral edges in an annular shape. It is preferable to have a structure of a laminated plate having. In FIG. 2, the first exterior plate 1a and the second exterior plate 1b form a structure of a laminated plate by a joint portion 2 between peripheral edge portions. As shown in FIG. 1 , the joint portion 2 between the peripheral edge portions is annularly continuous along the peripheral edge of the plate-like exterior 1 . In FIG. 1, the joint 2 between the peripheral edges can be viewed as a boundary between the first and second exterior plates 1a and 1b by seeing through the second exterior plate 1b, and is illustrated as a gray area. By adopting a laminated plate structure, the thickness of the plate-shaped outer casing can be reduced, so that the heat capacity can be reduced.
　反射体５を正面に見た板状外装１の形状は、例えば、円形、楕円形、長方形又は正方形であり、円形が好ましい。また、反射体５を正面に見たシリカ板１の外側板面は、貫通孔や凹凸などを設けずに平坦面であることが好ましい。円形の直径は、例えば、５～５０ｃｍである。周縁部同士の接合部２の環状形状の幅は、例えば０．５～２０ｍｍである。板状外装１の肉厚は１～３．４ｍｍであることが好ましく、１～３ｍｍであることがより好ましい。第１外装板１ａの肉厚は０．１～１．７ｍｍであることが好ましく、０．５～１．５ｍｍであることがより好ましい。第２外装板１ｂの肉厚は０．１～１．７ｍｍであることが好ましく、０．５～１．５ｍｍであることがより好ましい。反射体５を正面に見た板状外装１の板面に対する反射体５の反射面積率は、８０％以上であることが好ましく、８７％以上であることがより好ましく、９０％以上であることがさらに好ましい。 The shape of the plate-shaped exterior 1 when the reflector 5 is viewed from the front is, for example, circular, elliptical, rectangular or square, preferably circular. Moreover, the outer plate surface of the silica plate 1 when the reflector 5 is viewed from the front is preferably a flat surface without any through-holes or irregularities. The circular diameter is, for example, 5-50 cm. The annular width of the joint 2 between the peripheral edges is, for example, 0.5 to 20 mm. The thickness of the plate-shaped exterior 1 is preferably 1 to 3.4 mm, more preferably 1 to 3 mm. The thickness of the first exterior plate 1a is preferably 0.1 to 1.7 mm, more preferably 0.5 to 1.5 mm. The thickness of the second exterior plate 1b is preferably 0.1 to 1.7 mm, more preferably 0.5 to 1.5 mm. The reflection area ratio of the reflector 5 to the plate surface of the plate-shaped exterior 1 when the reflector 5 is viewed from the front is preferably 80% or more, more preferably 87% or more, and 90% or more. is more preferred.
　板状外装１の材質はシリカ又はシリコンであることが好ましい。材料強度、また赤外線を吸収せずに透過できる点でシリカが好ましく、熱容量が小さい点でシリコンが好ましい。シリカは、結晶性シリカ又は非晶質シリカである形態を包含する。板状外装１の不純物濃度は、１００ｐｐｍ以下、好ましくは９０ｐｐｍ以下である。なお、本実施形態は、板状外装１の材質がシリコンである形態において、シリコンの表面が酸化されてシリカになっている形態を包含する。 The material of the plate-shaped exterior 1 is preferably silica or silicon. Silica is preferable in terms of material strength and ability to transmit infrared rays without absorbing them, and silicon is preferable in terms of low heat capacity. Silica includes forms that are crystalline silica or amorphous silica. The impurity concentration of the plate-like exterior 1 is 100 ppm or less, preferably 90 ppm or less. Note that this embodiment includes a mode in which the material of the plate-shaped exterior 1 is silicon, and a mode in which the surface of silicon is oxidized to form silica.
　熱反射板１００では、合わせ板の構造は、第１外装板１ａ及び第２外装板１ｂの対向し合う面の間に設けられ、かつ、第１外装板１ａ側及び第２外装板１ｂ側の少なくとも一方に周縁部同士の接合部２によって密閉されているキャビティ１２を有し、キャビティ１２内に反射体５が配置されていることが好ましい。キャビティ１２は、第１外装板１ａ側に設けられた形態、第１外装板１ａ側及び第２外装板１ｂ側の両側に設けられた形態及び第２外装板１ｂ側に設けられた形態がある。図２ではキャビティ１２が、第１外装板１ａ側に設けられた形態を示している。この形態では、第１外装板１ａの一方の表面に凹部が設けられており、第２外装板１ｂは凹部がない平板であり、第１外装板１ａ及び第２外装板１ｂの合わせ板の構造とすることで、キャビティ１２は、第１外装板１ａ側に設けられる。その結果、キャビティ１２は、第１外装板１ａ及び第２外装板１ｂの対向し合う面の第１外装板１ａ側のみに設けられ、かつ、周縁部同士の接合部２によって密閉されている。反射体５が密閉空間であるキャビティ１２内にあるため、周縁部同士の接合部に、反射体に起因する剥がす方向の応力がかかりにくく、反射体の破損による炉内の汚染を抑制することができる。さらに板状外装と反射体の熱膨張差による破損を回避できる。 In the heat reflecting plate 100, the structure of the laminated plate is provided between the facing surfaces of the first exterior plate 1a and the second exterior plate 1b, and between the first exterior plate 1a side and the second exterior plate 1b side. Preferably, at least one has a cavity 12 sealed by a joint 2 between the peripheral edges, and the reflector 5 is arranged in the cavity 12 . The cavity 12 may be provided on the first exterior plate 1a side, provided on both sides of the first exterior plate 1a side and the second exterior plate 1b side, or provided on the second exterior plate 1b side. . In FIG. 2, the cavity 12 has shown the form provided in the 1st exterior plate 1a side. In this embodiment, a recess is provided on one surface of the first exterior plate 1a, and the second exterior plate 1b is a flat plate without recesses. By doing so, the cavity 12 is provided on the side of the first exterior plate 1a. As a result, the cavity 12 is provided only on the first exterior plate 1a side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b, and is sealed by the joint 2 between the peripheral edges. Since the reflector 5 is in the cavity 12, which is a closed space, stress in the peeling direction caused by the reflector is not applied to the joint between the peripheral edge portions, and contamination in the furnace due to breakage of the reflector can be suppressed. can. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector.
　図３では、キャビティ１２が、第１外装板１ａ側及び第２外装板１ｂ側の両側にわたって設けられた形態を示している。この形態では、第１外装板１ａの一方の表面に凹部が設けられており、第２外装板１ｂの一方の表面に凹部が設けられており、凹部同士が合わさるように、第１外装板１ａ及び第２外装板１ｂの合わせ板の構造とする。その結果、キャビティ１２は、第１外装板１ａ及び第２外装板１ｂの対向し合う面の第１外装板１ａ側及び第２外装板１ｂ側の両方に設けられる。 FIG. 3 shows a form in which the cavity 12 is provided over both sides of the first exterior plate 1a side and the second exterior plate 1b side. In this embodiment, a recess is provided on one surface of the first exterior plate 1a, and a recess is provided on one surface of the second exterior plate 1b. and the laminated plate structure of the second exterior plate 1b. As a result, the cavity 12 is provided on both the first exterior plate 1a side and the second exterior plate 1b side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b.
　図４では、キャビティ１２が、第２外装板１ｂ側に設けられた形態を示している。この形態では、第１外装板１ａは凹部がない平板であり、第２外装板１ｂの一方の表面に凹部が設けられており、第１外装板１ａ及び第２外装板１ｂの合わせ板の構造とすることで、キャビティ１２は、第２外装板１ｂ側に設けられる。その結果、キャビティ１２は、第１外装板１ａ及び第２外装板１ｂの対向し合う面の第２外装板１ｂ側のみに設けられる。 FIG. 4 shows a form in which the cavity 12 is provided on the side of the second exterior plate 1b. In this embodiment, the first exterior plate 1a is a flat plate without recesses, and the second exterior plate 1b is provided with recesses on one surface thereof. By doing so, the cavity 12 is provided on the side of the second exterior plate 1b. As a result, the cavity 12 is provided only on the second exterior plate 1b side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b.
　キャビティ１２の高さ（図２では、上下方向の長さ）は、０．１μｍ～５ｍｍであることが好ましく、０．１μｍ～１ｍｍであることがより好ましい。キャビティ１２は、第１外装板１ａ側にのみ凹部を設ける形態、第１外装板１ａ側及び第２外装板１ｂ側の両方に凹部を設ける形態及び第２外装板１ｂ側にのみ凹部を設ける形態の３態様があるが、いずれの形態でも、凹部によって、第１外装板１ａの周縁部及び／又は第２外装板１ｂの周縁部に土手部１１が形成される。図２の形態では、第１外装板１ａに形成された土手部１１の天面は、向い合せに配置される第２外装板１ｂの平板部分と接合され、周縁部同士の接合部２が形成される。図３の形態では、第１外装板１ａと第２外装板１ｂの土手部１１の天面同士が接合され、周縁部同士の接合部２が形成される。また、図４の形態では、第２外装板１ｂに形成された土手部１１の天面は、向い合せに配置される第１外装板１ａの平板部分と接合され、周縁部同士の接合部２が形成される。凹部は、例えばエッチング法などによって形成することができる。 The height of the cavity 12 (length in the vertical direction in FIG. 2) is preferably 0.1 μm to 5 mm, more preferably 0.1 μm to 1 mm. The cavity 12 has a configuration in which a recess is provided only on the side of the first exterior plate 1a, a configuration in which recesses are provided in both the side of the first exterior plate 1a and the side of the second exterior plate 1b, and a configuration in which a recess is provided only on the side of the second exterior plate 1b. In any of the three modes, a bank portion 11 is formed in the peripheral edge portion of the first exterior plate 1a and/or the peripheral edge portion of the second exterior plate 1b by the recess. In the form of FIG. 2, the top surface of the embankment portion 11 formed on the first exterior plate 1a is joined to the flat plate portion of the second exterior plate 1b arranged facing each other to form the joint portion 2 between the peripheral edge portions. be done. In the embodiment shown in FIG. 3, the top surfaces of the bank portions 11 of the first exterior plate 1a and the second exterior plate 1b are joined to form a joint portion 2 between the peripheral edge portions. 4, the top surface of the bank portion 11 formed on the second exterior plate 1b is joined to the flat plate portion of the first exterior plate 1a arranged facing each other, and the joint portion 2 between the peripheral edge portions is formed. The recess can be formed by, for example, an etching method.
　本実施形態に係る熱反射板１００では、図２に示すように、第１外装板１ａは、周縁部に設けられた土手部１１と土手部１１で取り囲まれてキャビティ１２を構成する凹部とを有し、第２外装板１ｂは、平板状であることが好ましい。第１外装板１ａのみに凹部を設けることで、板状外装内にキャビティ１２を簡易な構造で設けることができる。このような形態を有する熱反射板は、図２の他、図５、図８、図１２又は図１５に例示された熱反射板１０３，１０６，１０９，１１２がある。 In the heat reflecting plate 100 according to the present embodiment, as shown in FIG. 2, the first exterior plate 1a has a bank portion 11 provided at the peripheral portion and a concave portion which is surrounded by the bank portion 11 and forms a cavity 12. It is preferable that the second exterior plate 1b has a flat plate shape. By providing the concave portion only in the first exterior plate 1a, the cavity 12 can be provided in the plate-like exterior with a simple structure. Heat reflecting plates having such a configuration include the heat reflecting plates 103, 106, 109, and 112 illustrated in FIGS. 5, 8, 12, and 15 in addition to FIG.
　本実施形態に係る熱反射板１０２では、図４に示すように、第１外装板１ａは、平板状であり、第２外装板１ｂは、周縁部に設けられた土手部１１と土手部１１で取り囲まれてキャビティ１２を構成する凹部とを有することが好ましい。第２外装板１ｂのみに凹部を設けることで、板状外装内にキャビティ１２を簡易な構造で設けることができる。このような形態を有する熱反射板は、図４の他、図７、図１１又は図１４に例示された熱反射板１０５，１０８，１１１がある。 In the heat reflecting plate 102 according to the present embodiment, as shown in FIG. 4, the first exterior plate 1a is flat plate-shaped, and the second exterior plate 1b has a bank portion 11 and a bank portion 11 provided on the peripheral portion. and a recess defining the cavity 12 by being surrounded by . By providing the concave portion only in the second exterior plate 1b, the cavity 12 can be provided in the plate-like exterior with a simple structure. Besides FIG. 4, there are heat reflecting plates 105, 108 and 111 illustrated in FIGS.
　図２又は図３に示すように、本実施形態に係る熱反射板１００，１０１では、キャビティ１２を少なくとも第１外装板１ａ側に有し、第１外装板１ａのキャビティ１２内の表面上に反射体５として形成した薄膜を有し、薄膜は、第１外装板１ａのキャビティ１２内の表面側から順に、下地膜３と、反射面を含む表面層としての反射膜４と、を有する積層膜であり、下地膜３は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、反射膜４は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、下地膜３と反射膜４とが異なる組成を有していることが好ましい。第１外装板のキャビティ内の表面上に反射体を形成しているため、周縁部同士の接合部に、反射体に起因する剥がす方向の応力がかかりにくく、反射体の破損による炉内の汚染を抑制することができる。さらに板状外装と反射体の熱膨張差による破損を回避できる。反射体５が薄膜であり、薄膜が積層膜である場合は、反射体５の少なくとも反射面を含む表面層は、反射膜４に対応する。積層膜である反射体５は、第１外装板１ａのキャビティ１２内の表面、すなわち、凹部の底面に形成されている。積層膜である反射体５は、凹部の底面の全面積に対して５０～１００％の面積で形成されていることが好ましく、８０～１００％の面積で形成されていることがより好ましい。反射体５の膜厚は、１０～１５００ｎｍであることが好ましく、２０～４００ｎｍであることがより好ましい。 As shown in FIG. 2 or 3, the heat reflecting plates 100 and 101 according to this embodiment have the cavity 12 at least on the side of the first exterior plate 1a, and the surface inside the cavity 12 of the first exterior plate 1a has It has a thin film formed as a reflector 5, and the thin film has, in order from the surface side in the cavity 12 of the first exterior plate 1a, a base film 3 and a reflective film 4 as a surface layer including a reflective surface. and the underlayer 3 consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. The reflective film 4 is made of an alloy containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au , Ag or Cu, or at least selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferable that the base film 3 and the reflective film 4 are made of an alloy containing any one of them and have different compositions. Since the reflector is formed on the surface inside the cavity of the first armor plate, the stress in the peeling direction due to the reflector is not applied to the joint between the peripheral edge portions, and the damage of the reflector causes the inside of the furnace to be contaminated. can be suppressed. Furthermore, it is possible to avoid damage due to the difference in thermal expansion between the plate-like exterior and the reflector. When the reflector 5 is a thin film and the thin film is a laminated film, the surface layer of the reflector 5 including at least the reflective surface corresponds to the reflective film 4 . The reflector 5, which is a laminated film, is formed on the surface inside the cavity 12 of the first exterior plate 1a, that is, on the bottom surface of the recess. The reflector 5, which is a laminated film, preferably has an area of 50 to 100%, more preferably 80 to 100%, of the total area of the bottom surface of the recess. The film thickness of the reflector 5 is preferably 10 to 1500 nm, more preferably 20 to 400 nm.
　下地膜３は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。このような金属又は合金は、融点が高く、かつ、板状外装との密着性に優れている。下地膜３は、例えば、スパッタ膜、塗布膜、ＣＶＤ、蒸着等で得られる薄膜であることが好ましい。Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金としては、これらの元素のいずれか一種を最多質量にて含む合金であることが好ましく、より好ましくはＴａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉを５０質量％以上含有する合金、さらに好ましくは６０質量％以上含有する合金、最も好ましくは７０質量％以上含有する合金であり、例えば、Ｔａ‐Ｍｏ系合金、Ｔａ‐Ｃｒ系合金又はＣｒ‐Ｃｏ系合金である。下地膜３の膜厚は、５～５００ｎｍであることが好ましく、１０～１００ｎｍであることがより好ましい。下地膜３は反射膜４の密着性を向上させる。 The underlayer 3 consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. It is preferably made of an alloy containing at least one of the following. Such a metal or alloy has a high melting point and excellent adhesion to the plate-like exterior. The base film 3 is preferably a thin film obtained by, for example, sputtering film, coating film, CVD, vapor deposition, or the like. The alloy containing at least one selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni is an alloy containing one of these elements in the largest mass. An alloy containing 50% by mass or more of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, more preferably an alloy containing 60% by mass or more, most preferably 70% by mass It is an alloy containing the above, and is, for example, a Ta--Mo alloy, a Ta--Cr alloy or a Cr--Co alloy. The film thickness of the base film 3 is preferably 5 to 500 nm, more preferably 10 to 100 nm. The base film 3 improves adhesion of the reflective film 4 .
　反射膜４は下地膜３の表面に堆積していることが好ましい。反射膜４は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。このような金属又は合金は、融点が高く、かつ、赤外線の反射率が高い。また下地膜との反応性が少ない。反射膜４は、例えば、スパッタ膜、塗布膜、ＣＶＤ、蒸着等で得られる薄膜であることが好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金としては、これらの元素のいずれか一種を最多質量にて含む合金であることが好ましく、より好ましくはＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含有する合金、さらに好ましくは６０質量％以上含有する合金、最も好ましくは７０質量％以上含有する合金であり、例えば、Ｉｒ‐Ｐｔ系合金、Ｉｒ‐Ｒｈ系合金又はＰｔ‐Ｒｕ系合金である。反射膜４の膜厚は、５～１０００ｎｍであることが好ましく、１０～３００ｎｍであることがより好ましい。 The reflective film 4 is preferably deposited on the surface of the base film 3. The reflective film 4 is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, It is preferably made of an alloy containing at least one selected from the group consisting of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag and Cu. Such metals or alloys have high melting points and high infrared reflectance. Also, it has little reactivity with the underlying film. The reflective film 4 is preferably a thin film obtained by, for example, sputtering film, coating film, CVD, vapor deposition, or the like. As alloys containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu, An alloy containing any one of these elements in the largest mass is preferable, and more preferably Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge An alloy containing 50% by mass or more of , Au, Ag or Cu, more preferably an alloy containing 60% by mass or more, and most preferably an alloy containing 70% by mass or more. system alloy or Pt--Ru system alloy. The film thickness of the reflective film 4 is preferably 5 to 1000 nm, more preferably 10 to 300 nm.
　積層膜としたときの下地膜３と反射膜４の好適な組み合わせとしては、下地膜３／反射膜４は、Ｔａ膜／Ｉｒ膜、Ｔａ膜／Ｐｔ膜、Ｍｏ膜／Ｉｒ膜などである。積層膜の膜厚は、１０～１５００ｎｍであることが好ましく、２０～４００ｎｍであることがより好ましい。 Suitable combinations of the base film 3 and the reflective film 4 in the laminated film include a Ta film/Ir film, a Ta film/Pt film, and a Mo film/Ir film. The film thickness of the laminated film is preferably 10 to 1500 nm, more preferably 20 to 400 nm.
　図５又は図６に示すように、反射体５の厚さがキャビティ１２の高さと等しい、すなわち、反射膜４が第２外装板１ｂの表面に接触している形態であってもよい。反射膜４と第２外装板が部分的に接触することで発生する干渉縞が低減される。下地膜３は、第１外装板１ａのキャビティ１２内の表面（凹部の底面）に堆積していることが好ましく、反射膜４は下地膜３の表面に堆積していることが好ましい。反射膜４は第２外装板１ｂの表面に接触しているが、第２外装板１ｂの表面に形成されていない、すなわち堆積したものではないことが好ましい。 As shown in FIG. 5 or 6, the thickness of the reflector 5 may be equal to the height of the cavity 12, that is, the reflective film 4 may be in contact with the surface of the second exterior plate 1b. Interference fringes generated by partial contact between the reflective film 4 and the second exterior plate are reduced. The base film 3 is preferably deposited on the surface (bottom surface of the recess) of the cavity 12 of the first exterior plate 1 a , and the reflective film 4 is preferably deposited on the surface of the base film 3 . Although the reflective film 4 is in contact with the surface of the second exterior plate 1b, it is preferably not formed on the surface of the second exterior plate 1b, that is, not deposited.
　図４に示すように、本実施形態に係る熱反射板１０２では、第１外装板１ａが平板であり、キャビティ１２を第２外装板１ｂ側に有し、第１外装板１ａの表面上に反射体５として形成した薄膜を有し、薄膜は、第１外装板１ａの表面側から順に、下地膜３と、反射面を含む表面層としての反射膜４と、を有する積層膜であり、下地膜３は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、反射膜４は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。図４に示した形態は、第１外装板１ａが平板であり、キャビティ１２を第２外装板１ｂ側に有する点が、図２又は図３に示した形態と異なるが、他は同様である。平板である第１外装板１ａに反射体としての薄膜を形成するため、生産性に優れた熱反射板とすることができる。 As shown in FIG. 4, in the heat reflecting plate 102 according to this embodiment, the first exterior plate 1a is a flat plate, the cavity 12 is provided on the side of the second exterior plate 1b, and the cavity 12 is provided on the surface of the first exterior plate 1a. It has a thin film formed as a reflector 5, and the thin film is a laminated film having a base film 3 and a reflective film 4 as a surface layer including a reflective surface in order from the surface side of the first exterior plate 1a, The underlayer 3 consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. The reflective film 4 is made of an alloy containing at least one of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu or at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing The form shown in FIG. 4 is different from the form shown in FIG. 2 or 3 in that the first armor plate 1a is a flat plate and has a cavity 12 on the side of the second armor plate 1b, but the rest is the same. . Since the thin film as a reflector is formed on the flat first exterior plate 1a, the heat reflector can be manufactured with excellent productivity.
　図７に示すように、反射体５の厚さがキャビティ１２の高さと等しい、すなわち、反射膜４が第２外装板１ｂの表面（凹部の底面）に接触している形態であってもよい。反射膜４と第２外装板が部分的に接触することで発生する干渉縞が低減される。下地膜３は、第１外装板１ａの表面に堆積していることが好ましく、反射膜４は下地膜３の表面に堆積していることが好ましい。図７に示した形態は、第１外装板１ａが平板であり、キャビティ１２を第２外装板１ｂ側に有する点が、図５又は図６に示した形態と異なるが、他は同様である。平板である第１外装板１ａに反射体としての薄膜を形成するため、生産性に優れた熱反射板とすることができる。 As shown in FIG. 7, the thickness of the reflector 5 may be equal to the height of the cavity 12, that is, the reflecting film 4 may be in contact with the surface of the second exterior plate 1b (bottom surface of the recess). . Interference fringes generated by partial contact between the reflective film 4 and the second exterior plate are reduced. The base film 3 is preferably deposited on the surface of the first exterior plate 1 a , and the reflective film 4 is preferably deposited on the surface of the base film 3 . The form shown in FIG. 7 is different from the form shown in FIG. 5 or 6 in that the first exterior plate 1a is a flat plate and has the cavity 12 on the side of the second exterior plate 1b, but the others are the same. . Since the thin film as a reflector is formed on the flat first exterior plate 1a, the heat reflector can be manufactured with excellent productivity.
　図８、図１０～図１４に示すように、本実施形態に係る熱反射板１０６～１１１は、キャビティ１２内で合わせ板の構造の対向する面同士の間を立設する少なくとも１本の支柱部６を有することが好ましい。支柱部６によって合わせ板の構造の接合強度を高めることができる。支柱部６としては、例えば、図８又は図１２に示すように、第１外装板１ａの凹部の底面から延び、支柱部６の天面が平板状の第２外装板１ｂの表面と接合された形態がある。支柱部６が第１外装板１ａの凹部の底面のみから延びる形態とするためには、例えば、第１外装板１ａのみについてエッチングによって凹部を形成することで土手部１１を形成するが、このとき、土手部１１を非エッチング箇所とするのと同様に支柱部６を非エッチング箇所とすることによって形成することができる。また支柱部６としては、例えば、図１０又は図１３に示すように、第１外装板１ａの凹部の底面から延び、かつ、第２外装板１ｂの凹部の底面から延び、支柱部６の天面同士が接合された形態がある。支柱部６が第１外装板１ａの凹部の底面及び第２外装板１ｂの凹部の底面の両方から延びる形態とするためには、例えば、第１外装板１ａ及び第２外装板１ｂについてエッチングによって凹部を形成することで土手部１１を形成するが、このとき、土手部１１を非エッチング箇所とするのと同様に支柱部６を非エッチング箇所とすることによって形成することができる。さらに支柱部６としては、例えば、図１１又は図１４に示すように、第２外装板１ｂの凹部の底面から延び、支柱部６の天面が平板状の第１外装板１ａの表面と接合された形態がある。支柱部６が第２外装板１ｂの凹部の底面のみから延びる形態とするためには、例えば、第２外装板１ｂのみについてエッチングによって凹部を形成することで土手部１１を形成し、このとき支柱部６を非エッチング箇所とすることによって形成することができる。図中、支柱部６と第１外装板１ａ若しくは第２外装板１ｂとの接合部、又は支柱部６同士の接合部を接合部７で示した。 As shown in FIGS. 8 and 10 to 14, each of the heat reflectors 106 to 111 according to the present embodiment has at least one post standing between the opposing surfaces of the laminate structure in the cavity 12. It is preferable to have a portion 6. The struts 6 can increase the joint strength of the structure of the laminated plate. For example, as shown in FIG. 8 or FIG. 12, the support pillar 6 extends from the bottom surface of the recess of the first exterior plate 1a, and the top surface of the support 6 is joined to the surface of the flat plate-like second exterior plate 1b. There is a form. In order to make the strut portion 6 extend only from the bottom surface of the concave portion of the first exterior plate 1a, for example, the embankment portion 11 is formed by forming the concave portion only in the first exterior plate 1a by etching. In the same way as the embankment portion 11 is a non-etching portion, the post portion 6 can be formed as a non-etching portion. For example, as shown in FIG. 10 or FIG. 13, the support 6 extends from the bottom surface of the recess of the first exterior plate 1a, extends from the bottom of the recess of the second exterior plate 1b, and extends from the top of the support 6. There is a form in which the surfaces are joined together. In order to make the supporting column 6 extend from both the bottom surface of the recess of the first exterior plate 1a and the bottom surface of the recess of the second exterior plate 1b, for example, the first exterior plate 1a and the second exterior plate 1b are etched. The bank portion 11 is formed by forming the concave portion, and at this time, it can be formed by making the post portion 6 a non-etching portion in the same manner as making the bank portion 11 a non-etching portion. Furthermore, as shown in FIG. 11 or FIG. 14, for example, the support part 6 extends from the bottom surface of the recess of the second exterior plate 1b, and the top surface of the support part 6 is joined to the surface of the flat first exterior plate 1a. There is a form that has been In order to make the strut portion 6 extend only from the bottom surface of the recessed portion of the second exterior plate 1b, for example, only the second exterior plate 1b is etched to form a recessed portion to form the bank portion 11. It can be formed by making the portion 6 a non-etching portion. In the drawing, a joint portion 7 indicates a joint portion between the support portion 6 and the first exterior plate 1a or the second exterior plate 1b, or a joint portion between the support portions 6. As shown in FIG.
　図８、図１０～図１４に示した熱反射板１０６～１１１について、反射体５については、図２～図７に示した熱反射板１００～１０５と同様である。このとき、支柱部６の外側に形成された反射体５には貫通孔や凹凸などを設けずに支柱部６の外側にある該反射体の内周及び該反射体の周縁に囲まれる全面が反射面であることが好ましい。 Regarding the heat reflecting plates 106 to 111 shown in FIGS. 8 and 10 to 14, the reflector 5 is the same as the heat reflecting plates 100 to 105 shown in FIGS. At this time, the reflector 5 formed on the outside of the column 6 is not provided with a through hole or unevenness, and the entire surface surrounded by the inner circumference and the peripheral edge of the reflector outside the column 6 is A reflective surface is preferred.
　次に支柱部６の形状について説明する。本実施形態に係る熱反射板１０６～１１１では、支柱部６が、柱状又は筒状である形態を含む。支柱部６の主軸の横断面の形状は、円形、楕円形又は三角形以上の多角形であることが好ましい。三角形以上の多角形では正方形又は正六角形であることが好ましい。さらに、熱反射板は、図９に示すように、支柱部６を複数有し、支柱部６は筒状であり、かつ、各支柱部６は互いに筒壁の一部を共有した３次元空間充填構造を有することが好ましい。３次元空間充填構造とすることで接合強度を高めつつ、反射体の面積を広くとることが出来、さらに反射板そのものの強度を高めることが可能である。３次元空間充填構造は、ハニカム構造、矩形格子構造、方形格子構造又はひし形格子構造である形態を包含する。図９では、ハニカム構造の支柱部を有する熱反射板１００を図示している。ハニカム構造は、六角筒形を隙間なく並べた構造、好ましくは正六角筒形を隙間なく並べた構造である。矩形格子構造は断面長方形の角筒形を隙間なく並べた構造である。方形格子構造は断面正方形の角筒形を隙間なく並べた構造である。ひし形格子構造は断面ひし形の角筒形を隙間なく並べた構造である。ここで、３次元空間充填構造の支柱部６の筒状の内側に反射体５を形成するときは、形成後の反射体５には貫通孔や凹凸などを設けずに支柱部６の筒状の内側にある該反射体の周縁に囲まれる全面が反射面であることが好ましい。 Next, the shape of the strut portion 6 will be described. In the heat reflecting plates 106 to 111 according to this embodiment, the struts 6 may be columnar or tubular. The shape of the cross section of the main axis of the strut 6 is preferably circular, elliptical, or polygonal with more than triangular shape. Polygons that are triangular or larger are preferably squares or regular hexagons. Furthermore, as shown in FIG. 9, the heat reflecting plate has a plurality of support sections 6, each support section 6 is cylindrical, and each support section 6 shares a part of the cylindrical wall with each other in a three-dimensional space. It is preferred to have a filling structure. By adopting a three-dimensional space-filling structure, it is possible to increase the area of the reflector while increasing the bonding strength, and to increase the strength of the reflector itself. Three-dimensional space-filling structures include forms that are honeycomb structures, rectangular lattice structures, square lattice structures or diamond lattice structures. FIG. 9 shows a heat reflecting plate 100 having a honeycomb-structured support. The honeycomb structure is a structure in which hexagonal cylinders are arranged without gaps, preferably regular hexagonal cylinders are arranged without gaps. The rectangular lattice structure is a structure in which square cylinders with rectangular cross sections are arranged without gaps. The square lattice structure is a structure in which rectangular cylinders with a square cross section are arranged without gaps. The rhombus lattice structure is a structure in which square cylinders with a rhombus cross section are arranged without gaps. Here, when the reflector 5 is formed inside the tubular shape of the column portion 6 of the three-dimensional space filling structure, the tubular shape of the column portion 6 is formed without providing a through hole or unevenness in the formed reflector 5 . It is preferable that the entire surface surrounded by the periphery of the reflector inside is a reflective surface.
　本実施形態に係る熱反射板では、図２０に示すように、第１外装板１ａ及び第２外装板１ｂの対向し合う面は互いに平坦面であり、反射体５は、第２外装板１ｂ側の第１外装板１ａの表面のうち周縁部同士の環状の接合部２の内側の領域に形成された薄膜であり、薄膜は、第１外装板１ａの表面側から順に、下地膜と、反射面を含む表面層としての反射膜と、を有する積層膜であり、下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、下地膜と反射膜とが異なる組成を有していることが好ましい。なお、図２０において、反射体５が積層膜である形態の図示は省略した。下地膜は、第１外装板の表面に堆積していることが好ましく、反射膜は下地膜の表面に堆積していることが好ましい。反射膜は第２外装板の表面に接触しているが、第２外装板の表面に形成されていない、すなわち堆積したものではないことが好ましい。このような構造とすることで、生産性に優れた熱反射板とすることができる。また、反射体を第２外装板により密着させることができ、干渉縞をより抑制することができる。積層膜の膜厚は１０～５００ｎｍであることが好ましい。積層膜の膜厚を小さくすることで、キャビティ１２を設けていなくても、第１外装板及び第２外装板の応力変形によって周縁部同士の環状の接合部を設けることができ、積層膜が板状外装内によって外周囲が完全に覆われることが可能となる。反射体５の金属又は合金の選定理由は、図２～図７に示した熱反射板１００～１０５と同様である。 In the heat reflector according to the present embodiment, as shown in FIG. 20, the opposing surfaces of the first exterior plate 1a and the second exterior plate 1b are flat surfaces, and the reflector 5 is formed on the surface of the second exterior plate 1b. It is a thin film formed in a region inside the annular joint 2 between the peripheral edges of the surface of the first exterior plate 1a on the side, and the thin film is a base film and a base film in order from the surface side of the first exterior plate 1a. and a reflective film as a surface layer including a reflective surface. The reflective film is made of an alloy containing at least one selected from the group consisting of Ti, Zr, Nb, Cr, W, Co and Ni, and the reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge , Au, Ag, or Cu, and the base film and the reflective film preferably have different compositions. In FIG. 20, illustration of a mode in which the reflector 5 is a laminated film is omitted. The base film is preferably deposited on the surface of the first exterior plate, and the reflective film is preferably deposited on the surface of the base film. Although the reflective film is in contact with the surface of the second armor plate, it is preferably not formed on the surface of the second armor plate, that is, not deposited. By adopting such a structure, a heat reflecting plate having excellent productivity can be obtained. In addition, the reflector can be brought into close contact with the second exterior plate, and interference fringes can be further suppressed. The film thickness of the laminated film is preferably 10 to 500 nm. By reducing the film thickness of the laminated film, even if the cavity 12 is not provided, an annular joint can be provided between the peripheral portions by stress deformation of the first and second armor plates, and the laminated film can be formed. It is possible to completely cover the outer circumference with the inside of the plate-shaped exterior. The reason for selecting the metal or alloy for the reflector 5 is the same as for the heat reflectors 100 to 105 shown in FIGS.
（反射体として形成した薄膜が所定の金属膜又は所定の金属を含む合金膜である形態１）
　本実施形態に係る熱反射板では、キャビティを少なくとも第１外装板側に有し、第１外装板のキャビティ内の表面上に反射体として形成した薄膜を有し、薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。本実施形態に係る熱反射板は、図２、図５、図８又は図１２において、積層膜である反射体５をＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜に置換した構造を有する。また、図３、図６、図１０又は図１３の板状外装１のように、キャビティ１２が、第１外装板１ａ側及び第２外装板１ｂ側の両側にわたって設けられた形態であってもよい。この形態では、第１外装板１ａの一方の表面に凹部が設けられており、第２外装板１ｂの一方の表面に凹部が設けられており、凹部同士が合わさるように、第１外装板１ａ及び第２外装板１ｂの合わせ板の構造とする。その結果、キャビティ１２は、第１外装板１ａ及び第２外装板１ｂの対向し合う面の第１外装板１ａ側及び第２外装板１ｂ側の両方に設けられる。なお、本実施形態に係る熱反射板の赤外線の入射方向は、上から下に向かう方向又は下から上に向かう方向のいずれでもよい。 (Embodiment 1 in which the thin film formed as a reflector is a predetermined metal film or an alloy film containing a predetermined metal)
The heat reflector according to this embodiment has a cavity at least on the side of the first exterior plate, and has a thin film formed as a reflector on the surface of the first exterior plate in the cavity, and the thin film comprises Ir, Pt, A film made of Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, An alloy film containing 50% by mass or more of Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is preferable. A film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, When an alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is used, even if the thin film formed as the reflector is a single layer film, good. 2, 5, 8 or 12, the heat reflecting plate according to the present embodiment has a laminated film of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, and Co. , Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au , Ag or Cu is substituted with an alloy film containing 50% by mass or more of Ag or Cu. 3, 6, 10 or 13, even if the cavity 12 is provided over both sides of the first exterior plate 1a side and the second exterior plate 1b side. good. In this embodiment, a recess is provided on one surface of the first exterior plate 1a, and a recess is provided on one surface of the second exterior plate 1b. and the laminated plate structure of the second exterior plate 1b. As a result, the cavity 12 is provided on both the first exterior plate 1a side and the second exterior plate 1b side of the facing surfaces of the first exterior plate 1a and the second exterior plate 1b. Incidentally, the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
（反射体として形成した薄膜が所定の金属膜又は所定の金属を含む合金膜である形態２）
　本実施形態に係る熱反射板では、第１外装板が平板であり、キャビティを第２外装板側に有し、第１外装板の表面上に反射体として形成した薄膜を有し、薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。本実施形態に係る熱反射板は、図４、図７、図１１又は図１４において、積層膜である反射体５をＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜に置換した構造を有する。なお、本実施形態に係る熱反射板の赤外線の入射方向は、上から下に向かう方向又は下から上に向かう方向のいずれでもよい。 (Form 2 in which the thin film formed as a reflector is a predetermined metal film or an alloy film containing a predetermined metal)
In the heat reflector according to this embodiment, the first armor plate is a flat plate, has a cavity on the second armor plate side, and has a thin film formed as a reflector on the surface of the first armor plate, and the thin film is , Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re , Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50% by mass or more. A film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, When an alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is used, even if the thin film formed as the reflector is a single layer film, good. 4, 7, 11 or 14, the heat reflecting plate according to the present embodiment uses Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, and Co as the reflector 5 which is a laminated film. , Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au , Ag or Cu is substituted with an alloy film containing 50% by mass or more of Ag or Cu. Incidentally, the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
（反射体として形成した薄膜が所定の金属膜又は所定の金属を含む合金膜である形態３）
　本実施形態に係る熱反射板では、第１外装板及び第２外装板の対向し合う面は互いに平坦面であり、反射体は、第２外装板側の第１外装板の表面のうち周縁部同士の環状の接合部の内側の領域に形成された薄膜であり、薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。本実施形態に係る熱反射板は、図２０において、反射体５をＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜に置換した構造を有する。なお、本実施形態に係る熱反射板の赤外線の入射方向は、上から下に向かう方向又は下から上に向かう方向のいずれでもよい。 (Mode 3 in which the thin film formed as a reflector is a predetermined metal film or an alloy film containing a predetermined metal)
In the heat reflecting plate according to this embodiment, the opposing surfaces of the first exterior plate and the second exterior plate are flat surfaces, and the reflector is the peripheral edge of the surface of the first exterior plate on the side of the second exterior plate. It is a thin film formed in the region inside the annular junction between the parts, and the thin film includes Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, A film made of Au, Ag or Cu, or 50% by mass or more of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably an alloy film containing A film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, When an alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is used, even if the thin film formed as the reflector is a single layer film, good. In the heat reflecting plate according to this embodiment, in FIG. 20, the reflector 5 is Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or A film made of Cu or an alloy film containing 50% by mass or more of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu It has a permuted structure. Incidentally, the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
（反射体として形成した薄膜が所定の金属膜又は所定の金属を含む合金膜である形態４）
　本実施形態に係る熱反射板では、キャビティを第１外装板側及び第２外装板側に有し、第１外装板のキャビティ内の表面上に反射体として形成した薄膜を有し、薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることが好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であるときは、反射体として形成した薄膜が単層膜であってもよい。本実施形態に係る熱反射板は、図３、図６、図１０又は図１３において、積層膜である反射体５をＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜に置換した構造を有する。なお、本実施形態に係る熱反射板の赤外線の入射方向は、上から下に向かう方向又は下から上に向かう方向のいずれでもよい。 (Form 4 in which the thin film formed as a reflector is a predetermined metal film or an alloy film containing a predetermined metal)
The heat reflecting plate according to the present embodiment has cavities on the side of the first exterior plate and the side of the second exterior plate, and has a thin film formed as a reflector on the surface in the cavity of the first exterior plate. , Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re , Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu in an amount of 50% by mass or more. A film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, When an alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu is used, even if the thin film formed as the reflector is a single layer film, good. 3, 6, 10 or 13, the heat reflecting plate according to the present embodiment uses Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, and Co as the reflector 5 which is a laminated film. , Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au , Ag or Cu is substituted with an alloy film containing 50% by mass or more of Ag or Cu. Incidentally, the direction of incidence of infrared rays on the heat reflector according to the present embodiment may be either a direction from top to bottom or a direction from bottom to top.
　形態１～４において、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜においてＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕの含有率は、それぞれ５０質量％以上であることが好ましいが、６０質量％以上であることがより好ましく、７０質量％以上であることがさらに好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜は、積層膜である反射体５と同様の膜厚で形成されることが好ましく、また、凹部の底面への薄膜の形成の面積比率は、積層膜である反射体５と同様の範囲で形成されることが好ましい。 In modes 1 to 4, the alloy film containing 50% by mass or more of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu contains Ir, The content of Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu is preferably 50% by mass or more, but 60% by mass. % or more, more preferably 70% by mass or more. A film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, The alloy film containing 50% by mass or more of Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu should be formed with the same film thickness as the reflector 5 which is a laminated film. is preferable, and the area ratio of the thin film formed on the bottom surface of the concave portion is preferably formed in the same range as that of the reflector 5 which is a laminated film.
　本実施形態に係る熱反射板では、周縁部同士の接合部２は、表面活性化接合部であることが好ましい。さらに支柱部６を含む接合部７は表面活性化接合部であることが好ましい。比較的低温での接合が可能な為、反射膜に熱的、物理的ダメージが無く接合することが可能であり、また、内部を真空に保ったまま接合することで接合部における接合強度が高められており、熱反射板はより長寿命となり、また耐食性が高まり、炉内の汚染が抑制される。表面活性化接合部とは、接合し合う部位の少なくとも一方を表面活性化状態とした後、接合部位同士を、押圧をかけて合わせることにより原子レベルで表面組織を一体化して接合した部位をいう。接合し合う部位の両方を表面活性化状態とした後、接合部位同士を、押圧をかけて合わせることがより好ましい。板状外装同士の接合では、シリコン皮膜を製膜した後、表面活性化状態とし、その後、接合部位同士を、押圧をかけて合わせることとしてもよい。表面活性化接合部には、常温活性化接合部とプラズマ活性化接合部とがある。常温活性化接合部には、例えば、高速原子ビームを用いて表面活性化して接合した接合部、Ｓｉ等の活性金属を用いてナノ密着層を形成して表面活性化して接合した接合部、イオンビームを用いて表面活性化して接合した接合部がある。プラズマ活性化接合部には、例えば、酸素プラズマを用いて表面活性化して接合した接合部、窒素プラズマを用いて表面活性化して接合した接合部がある。周縁部同士の接合部２を表面活性化接合部とすることで、接合部におけるリークを低減でき、例えば、キャビティ内を真空に保つことで高温時の内圧上昇による板状外装の破損を防ぐことができる。表面活性化接合部を形成する方法については、例えば、特許文献４～６を参照できる。 In the heat reflecting plate according to this embodiment, the joints 2 between the peripheral edge portions are preferably surface-activated joints. Further, the joint 7 including the strut 6 is preferably a surface-activated joint. Since bonding can be performed at relatively low temperatures, it is possible to bond without thermal or physical damage to the reflective film. As a result, the heat reflector has a longer service life, corrosion resistance is improved, and contamination inside the furnace is suppressed. A surface-activated joint refers to a portion in which at least one of the joints is brought into a surface-activated state, and then the joints are pressed together to integrate the surface texture at the atomic level. . It is more preferable to apply pressure to join the joining sites together after both of the joining sites are in a surface-activated state. In joining plate-like exteriors, after forming a silicon film, the surface is activated, and then the joining portions are pressed together. Surface activated junctions include cold activated junctions and plasma activated junctions. The room-temperature-activated junction includes, for example, a junction bonded by surface activation using a high-speed atomic beam, a junction bonded by forming a nano-adhesion layer using an active metal such as Si and activating the surface, and ion bonding. Some joints are surface activated using beams. Plasma activated joints include, for example, joints that are surface-activated and bonded using oxygen plasma, and joints that are surface-activated and bonded using nitrogen plasma. By making the joint 2 between the peripheral edges a surface-activated joint, leakage at the joint can be reduced. For example, by keeping the inside of the cavity vacuum, damage to the plate-like exterior due to an increase in internal pressure at high temperatures can be prevented. can be done. See, for example, US Pat.
　本実施形態に係る熱反射板では、キャビティ１２内の圧力は、大気圧未満の減圧となっていることが好ましい。キャビティ１２内の圧力は、１０－２Ｐａ以下であることがより好ましい。熱処理時にキャビティ１２の内圧が高まることを抑制することができ、炉内の汚染をより抑制することができる。また、高温時の反射膜の劣化を抑制できる。 In the heat reflecting plate according to this embodiment, the pressure inside the cavity 12 is preferably reduced below atmospheric pressure. More preferably, the pressure inside the cavity 12 is 10 −2 Pa or less. An increase in the internal pressure of the cavity 12 during heat treatment can be suppressed, and contamination in the furnace can be further suppressed. Also, deterioration of the reflective film at high temperatures can be suppressed.
（反射体が板である形態）
　本実施形態に係る熱反射板１１２では、図１５に示すように、反射体８が板であり、かつ、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金としては、これらの元素のいずれか一種を最多質量にて含む合金であることが好ましく、より好ましくはＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含有する合金、さらに好ましくは６０質量％以上含有する合金、最も好ましくは７０質量％以上含有する合金であり、例えば、Ｉｒ‐Ｐｔ系合金、Ｉｒ‐Ｒｈ系合金又はＰｔ‐Ｒｕ系合金である。キャビティ１２内に反射体としての板が収容された状態となっており、板の腐食が生じにくい。さらに、周縁部同士の接合部に、板に起因する剥がす方向の応力がかかりにくい。板である反射体８は、凹部の底面の全面積に対して５０～１００％の面積で形成されていることが好ましく、８０～１００％の面積で形成されていることがより好ましい。反射体が板である形態においても、熱反射板１１２は、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が０．０００４～０．００８０（Ｊ／Ｋ）であり、好ましくは０．００２３～０．００７０（Ｊ／Ｋ）であり、より好ましくは０．００３０～０．００６０（Ｊ／Ｋ）である。 (Form in which the reflector is a plate)
In the heat reflecting plate 112 according to this embodiment, as shown in FIG. 15, the reflector 8 is a plate, and Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu It is preferably made of an alloy containing at least one selected from the group consisting of. As alloys containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu, An alloy containing any one of these elements in the largest mass is preferable, and more preferably Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge An alloy containing 50% by mass or more of , Au, Ag or Cu, more preferably an alloy containing 60% by mass or more, and most preferably an alloy containing 70% by mass or more. system alloy or Pt--Ru system alloy. Since the plate as a reflector is accommodated in the cavity 12, corrosion of the plate is unlikely to occur. Furthermore, stress in the peeling direction due to the plate is less likely to be applied to the joints between the peripheral edge portions. The plate reflector 8 preferably has an area of 50 to 100%, more preferably 80 to 100%, of the total area of the bottom surface of the recess. Even in the form in which the reflector is a plate, the heat reflector 112 preferably has a total heat capacity of 0.0004 to 0.0080 (J/K) in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 . is 0.0023 to 0.0070 (J/K), more preferably 0.0030 to 0.0060 (J/K).
（反射体が箔である形態）
　本実施形態に係る熱反射板では、反射体が箔であり、かつ、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることが好ましい（不図示）。Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金としては、これらの元素のいずれか一種を最多質量にて含む合金であることが好ましく、より好ましくはＩｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含有する合金、より好ましくは６０質量％以上含有する合金、最も好ましくは７０質量％以上含有する合金であり、例えば、Ｉｒ‐Ｐｔ系合金、Ｉｒ‐Ｒｈ系合金又はＰｔ‐Ｒｕ系合金である。図１５において、反射体８が板である代わりに箔がキャビティ１２内に収容された状態となっており、箔の腐食が生じにくい。さらに、周縁部同士の接合部に、箔に起因する剥がす方向の応力がかかりにくい。箔である反射体は、凹部の底面の全面積に対して５０～１００％の面積で形成されていることが好ましく、８０～１００％の面積で形成されていることがより好ましい。反射体が箔である形態においても、熱反射板１１２は、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が０．０００４～０．００８０（Ｊ／Ｋ）であり、好ましくは０．００２３～０．００７０（Ｊ／Ｋ）であり、より好ましくは０．００３０～０．００６０（Ｊ／Ｋ）である。 (Form in which the reflector is a foil)
In the heat reflector according to this embodiment, the reflector is a foil, and the reflector is Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag. or Cu, or at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu It is preferably made of an alloy containing one (not shown). As alloys containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, and Cu, An alloy containing any one of these elements in the largest mass is preferable, and more preferably Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge An alloy containing 50% by mass or more of , Au, Ag or Cu, more preferably an alloy containing 60% by mass or more, and most preferably an alloy containing 70% by mass or more. system alloy or Pt--Ru system alloy. In FIG. 15, instead of the reflector 8 being a plate, the foil is accommodated in the cavity 12, and corrosion of the foil is less likely to occur. Furthermore, stress in the peeling direction due to the foil is less likely to be applied to the joints between the peripheral edges. The reflector, which is a foil, preferably has an area of 50 to 100%, more preferably 80 to 100%, of the total area of the bottom surface of the recess. Even in a mode in which the reflector is a foil, the heat reflector 112 preferably has a total heat capacity of 0.0004 to 0.0080 (J/K) in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 . is 0.0023 to 0.0070 (J/K), more preferably 0.0030 to 0.0060 (J/K).
　本実施形態に係る熱反射板では、反射体の厚さは０．０１μｍ～５ｍｍであることが好ましく、０．０２μｍ～２ｍｍであることがより好ましい。反射体による高い反射効率を保持しつつ、熱反射板の熱容量を小さくすることができる。反射体の厚さが０．０１μｍ未満であると反射効率の保持が難しくなり、５ｍｍを超えると反射体の熱量が大きくなりすぎる場合がある。そして、反射体が薄膜である場合、積層膜の膜厚は１０ｎｍ以上１５００ｎｍ以下であることが好ましく、２０ｎｍ以上４００ｎｍ以下であることがより好ましい。反射体が板である場合、板厚は０．５ｍｍ以上５．０ｍｍ以下であることが好ましく、０．５ｍｍ以上２．０ｍｍ以下であることがより好ましい。反射体が箔である場合、箔の厚さは３μｍ以上２．０ｍｍ以下であることが好ましく、８μｍ以上１．０ｍｍ以下であることがより好ましい。 In the heat reflector according to this embodiment, the thickness of the reflector is preferably 0.01 μm to 5 mm, more preferably 0.02 μm to 2 mm. The heat capacity of the heat reflecting plate can be reduced while maintaining the high reflection efficiency of the reflector. When the thickness of the reflector is less than 0.01 μm, it becomes difficult to maintain the reflection efficiency, and when it exceeds 5 mm, the heat quantity of the reflector may become too large. When the reflector is a thin film, the film thickness of the laminated film is preferably 10 nm or more and 1500 nm or less, more preferably 20 nm or more and 400 nm or less. When the reflector is a plate, the plate thickness is preferably 0.5 mm or more and 5.0 mm or less, more preferably 0.5 mm or more and 2.0 mm or less. When the reflector is a foil, the thickness of the foil is preferably 3 μm or more and 2.0 mm or less, more preferably 8 μm or more and 1.0 mm or less.
　本実施形態では、キャビティを有するとき、キャビティの高さ（図２では、上下方向の長さ）から反射体の厚さを差し引いた値、すなわちキャビティ内の高さ方向の隙間が２００μｍ以下であることが好ましく、１００μｍ以下であることがより好ましい。キャビティ内の高さ方向の隙間が２００μｍを超えると、大気圧による板状外装の変形が大きくなり、その結果、接合部付近に掛かる応力が大きくなり、結合部の割れが生じるおそれがある。　 In this embodiment, when the cavity is provided, the value obtained by subtracting the thickness of the reflector from the height of the cavity (length in the vertical direction in FIG. 2), that is, the gap in the height direction in the cavity is 200 μm or less. is preferred, and 100 μm or less is more preferred. If the gap in the height direction in the cavity exceeds 200 μm, the deformation of the plate-shaped exterior due to atmospheric pressure increases, resulting in increased stress applied near the joint, which may cause cracks in the joint.　
　図２～図８、図１０～図１４においては、赤外線の入射方向は上から下に向かう方向である。図１５においては、赤外線の入射方向は上から下に向かう方向又は下から上に向かう方向のいずれでもよい。なお、熱処理装置において、保温体は被加熱基板の温度を保温するために必要ではあるが、本実施形態に係る熱反射板のための保温体は必ずしも必要ではない。保温体がない場合、本実施形態に係る熱反射板は、熱処理温度までの昇温プロファイル、温度保持プロファイル、降温プロファイルを有する熱処理工程において、加熱・冷却の応答を遅らせることなく、所望の各プロファイルに対してズレを生じ難くし、また、熱処理１サイクルに要する時間を長引かせることがなく、結果として生産効率の低下を生じさせない。 　In FIGS. 2 to 8 and 10 to 14, the incident direction of infrared rays is from top to bottom. In FIG. 15, the incident direction of the infrared rays may be from top to bottom or from bottom to top. In the heat treatment apparatus, the heat insulator is necessary for keeping the temperature of the substrate to be heated, but the heat insulator for the heat reflecting plate according to the present embodiment is not necessarily required. Without the heat insulator, the heat reflecting plate according to the present embodiment can achieve desired profiles without delaying the heating/cooling response in the heat treatment process having a temperature rising profile, a temperature holding profile, and a temperature dropping profile up to the heat treatment temperature. Also, the time required for one heat treatment cycle is not prolonged, and as a result, the production efficiency is not lowered.
　以下、実施例を示しながら本発明についてさらに詳細に説明するが、本発明は実施例に限定して解釈されない。 The present invention will be described in more detail below with reference to examples, but the present invention should not be construed as being limited to the examples.
（比較例１）
　まず、外周３００ｍｍ、厚み４．０ｍｍの不透明石英を準備した。次に、紫外可視分光光度計（（株））島津製作所製　型式：ＵＶ－３１００ＰＣ）を用いて不透明石英の反射率を測定した。測定した反射率の結果を図２１示す。１０００℃のときに本比較例における不透明石英では２０００ｎｍ以上の波長において５％以下の反射率を有することが確認できた。このとき、比較例１における熱反射板全体の厚さは４．００００ｍｍ、反射面積率は１００．００％であった。次に、前記不透明石英の１ｍｍ２における板厚外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００９２（Ｊ／Ｋ）であった。 (Comparative example 1)
First, an opaque quartz having an outer circumference of 300 mm and a thickness of 4.0 mm was prepared. Next, the reflectance of the opaque quartz was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corp., model: UV-3100PC). FIG. 21 shows the measured reflectance results. It was confirmed that at 1000° C., the opaque quartz of this comparative example had a reflectance of 5% or less at a wavelength of 2000 nm or more. At this time, the total thickness of the heat reflecting plate in Comparative Example 1 was 4.0000 mm, and the reflection area ratio was 100.00%. Next, the total heat capacity in the thickness direction of the plate thickness armor and the reflector in 1 mm 2 of the opaque quartz was calculated to be 0.0092 (J/K).
（実施例１）
（反射体が積層膜である形態）
　図２に示した熱反射板を作製する。まず、外周３００ｍｍ、厚み１．２ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅１０ｍｍを第２外装板との接合部として残し、それ以外の箇所についてはエッチングを行い、深さ１μｍのキャビティのための凹部を設けた。次に、第１外装板の凹部の底面に下地膜としてＴａをスパッタリング法によって５０ｎｍ成膜し、下地膜の上に反射膜としてＩｒをスパッタリング法によって１５０ｎｍ成膜し、反射体を形成した。次に、紫外可視分光光度計（(株)島津製作所製　型式：ＵＶ－３１００ＰＣ）を用いて反射体の反射率を測定した。測定した反射率の結果を図１６に示す。測定は、反射体の表面に測定のための光を直接当てて行った。また、（数１）を用いて１０００℃における物質が放射する黒体放射の波長と放射量の関係を算出した。算出結果を図１７に示す。
Figure JPOXMLDOC01-appb-M000001
 但し、ｈはプランク定数（６．６２６０７０１５×１０－３４Ｊ・ｓ）、ｋＢはボルツマン定数（１．３８０６４９×１０－２３Ｊ／Ｋ）、ｃは光速度（２９９７９２４５８ｍ／ｓ）、λは波長（ｎｍ）である。図１７の結果、１０００℃において輻射熱を反射することが必要であり、波長が２０００ｎｍ～２６００ｎｍで放射量が多いことが確認できる。また、図１６の結果、１０００℃のときに本実施例における反射体では２０００ｎｍ以上の波長において９０％以上の反射率を有することが確認できた。次に、反射体を形成した第１外装板と平板状の第２外装板を接合するために、真空度１０-２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで熱反射板を作製した。このとき、実施例１における熱反射板全体の厚さは２．４０００ｍｍ、反射面積率は９３．３３％であった。熱反射板を作製後、１ｍｍ２における板厚外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００５５（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例１の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を４０．２２％削減することができた。 (Example 1)
(Embodiment in which the reflector is a laminated film)
A heat reflector shown in FIG. 2 is produced. First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a portion of 10 mm width from the outer periphery of the first armor plate was left as a joint portion with the second armor plate, and the remaining portion was etched to form a concave portion for a cavity with a depth of 1 μm. Next, a 50 nm Ta base film was formed on the bottom surface of the concave portion of the first exterior plate by sputtering, and a 150 nm Ir reflective film was formed on the base film by sputtering to form a reflector. Next, the reflectance of the reflector was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corp., model: UV-3100PC). FIG. 16 shows the measured reflectance results. The measurement was performed by directing light for measurement onto the surface of the reflector. In addition, the relationship between the wavelength of black body radiation emitted by the substance at 1000° C. and the amount of radiation was calculated using (Equation 1). Calculation results are shown in FIG.
Figure JPOXMLDOC01-appb-M000001
 where h is Planck's constant (6.62607015×10 -34 J・s), k B is Boltzmann's constant (1.380649×10 -23 J/K), c is the speed of light (299792458 m/s), and λ is the wavelength. (nm). As a result of FIG. 17, it can be confirmed that it is necessary to reflect radiant heat at 1000° C., and that the amount of radiation is large at wavelengths of 2000 nm to 2600 nm. As a result of FIG. 16, it was confirmed that the reflector in this example had a reflectance of 90% or more at a wavelength of 2000 nm or more at 1000°C. Next, in order to join the first armor plate on which the reflector is formed and the flat second armor plate, a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. A heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate. At this time, the total thickness of the heat reflecting plate in Example 1 was 2.4000 mm, and the reflection area ratio was 93.33%. After manufacturing the heat reflecting plate, the total heat capacity in the thickness direction of the plate-thickness exterior and the reflector at 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 1 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
（実施例２）
（反射体が積層膜である形態）
　まず、外周３００ｍｍ、厚み１．２ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅５ｍｍ分を第２外装板との接合部としてマスキングした。次に、マスキングした第１外装板の面に下地膜としてＴａをスパッタリング法によって５０ｎｍ成膜し、下地膜の上に反射膜としてＩｒをスパッタリング法によって１５０ｎｍ成膜し、反射体を形成した。次に、マスキングを除去した。反射体は実施例１の反射体と同じであり、図１６に示した反射特性と同じ特性を有していた。次に、反射体を形成した平板状の第１外装板と平板状の第２外装板を接合するために、真空度１０-２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで熱反射板を作製した。このとき、実施例２における熱反射板全体の厚さは２．４００２ｍｍ、反射面積率は９６．６７％であった。熱反射板を作製後、１ｍｍ２における板厚外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００５５（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例２の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を４０．２２％削減することができた。 (Example 2)
(Embodiment in which the reflector is a laminated film)
First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate. Next, a 50 nm thick Ta film was formed as a base film on the masked surface of the first exterior plate by a sputtering method, and a 150 nm thick Ir film was formed as a reflective film on the base film by a sputtering method to form a reflector. Then the masking was removed. The reflector was the same as the reflector of Example 1 and had the same reflection properties as shown in FIG. Next, in order to join the flat plate-shaped first armor plate on which the reflector is formed and the flat plate-shaped second armor plate, a high-speed atomic beam is applied to the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. A heat reflecting plate was produced by irradiating the joint portion for surface activation and pressing the second armor plate against the first armor plate. At this time, the total thickness of the heat reflecting plate in Example 2 was 2.4002 mm, and the reflection area ratio was 96.67%. After manufacturing the heat reflecting plate, the total heat capacity in the thickness direction of the plate-thickness exterior and the reflector at 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 2 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
（実施例３）
（反射体が積層膜である形態）
　まず、外周３００ｍｍ、厚み１．２ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅５ｍｍ分を第２外装板との接合部としてマスキングした。次に、マスキングした第１外装板の面に下地膜としてＴａをスパッタリング法によって５０ｎｍ成膜し、前記下地膜の上に反射膜としてＩｒをスパッタリング法によって１５０ｎｍ成膜し、反射体を形成した。次に、マスキングを除去した。反射体は実施例１の反射体と同じであり、図１６に示した反射特性と同じ特性を有していた。次に、反射体を形成した平板状の第１外装板と平板状の第２外装板を接合するために、酸素プラズマを第１外装板の接合部に接触させて表面活性化し、第１外装板に第２外装板を押し付けることで熱反射板を作製した。このとき、実施例３における熱反射板全体の厚さは２．４００２ｍｍ、反射面積率は９６．６７％であった。熱反射板を作製後、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００５５（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例３の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を４０．２２％削減することができた。 (Example 3)
(Embodiment in which the reflector is a laminated film)
First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate. Next, a 50-nm Ta film was formed as a base film on the masked surface of the first exterior plate by a sputtering method, and a 150-nm film of Ir was formed as a reflective film on the base film by a sputtering method to form a reflector. Then the masking was removed. The reflector was the same as the reflector of Example 1 and had the same reflection properties as shown in FIG. Next, in order to join the flat plate-shaped first armor plate on which the reflector is formed and the flat plate-shaped second armor plate, oxygen plasma is brought into contact with the joint portion of the first armor plate to activate the surface, thereby activating the surface of the first armor plate. A heat reflector was produced by pressing the second armor plate against the plate. At this time, the total thickness of the heat reflecting plate in Example 3 was 2.4002 mm, and the reflection area ratio was 96.67%. After manufacturing the heat reflector, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 3 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
（実施例４）
（反射体が積層膜であり、ハニカム形状の支柱部がある形態）
　図１２に示した熱反射板を作製する。まず、外周３００ｍｍ、厚み１．２ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅１０ｍｍ分をマスキングし、その後、それ以外の箇所で、正六角形の幅１０ｍｍ（１辺の長さは５．７７ｍｍ）、壁柱厚み０．３ｍｍのハニカム形状の支柱部に相当する箇所にマスキングをした後、エッチングを行い、深さ１μｍのキャビティのための凹部を設けた。次に、マスキングした第１外装板の凹部の底面に下地膜としてＴａをスパッタリング法によって５０ｎｍ成膜し、下地膜の上に反射膜としてＩｒをスパッタリング法によって１５０ｎｍ成膜し、反射体を形成した。次に、マスキングを除去した。本実施例の反射体は実施例１の反射体に対してハニカム構造を持たせたものである。図１６に示した反射率は、全面が反射膜である形態の値を示しているところ、本実施例のハニカム構造を有する反射膜は、全面に対して反射膜部分の面積比率が９４.３４％であるため、本実施例の反射特性は図１６に示す反射率に対して、０．９４３４を乗じた反射率を有するものと考えられる。次に、反射体を形成した第１外装板と平板状の第２外装板を接合するために、真空度１０-２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部２及び支柱部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで接合し、熱反射板を作製した。このとき、実施例４における熱反射板全体の厚さは２．４０００ｍｍ、反射面積率は８８．０５％であった。熱反射板を作製後、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００５５（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例４の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を４０．２２％削減することができた。 (Example 4)
(A form in which the reflector is a laminated film and has a honeycomb-shaped strut part)
A heat reflector shown in FIG. 12 is produced. First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 10 mm width portion was masked from the outer periphery of the first exterior plate, and thereafter, a regular hexagonal honeycomb having a width of 10 mm (one side length was 5.77 mm) and a wall pillar thickness of 0.3 mm was masked. After masking the portions corresponding to the pillars of the shape, etching was performed to provide recesses for cavities with a depth of 1 μm. Next, a 50 nm Ta base film was formed by sputtering on the bottom surface of the concave portion of the masked first exterior plate, and a 150 nm Ir reflective film was formed on the base film by sputtering to form a reflector. . Then the masking was removed. The reflector of this embodiment has a honeycomb structure with respect to the reflector of the first embodiment. The reflectance shown in FIG. 16 indicates the value of the form in which the entire surface is a reflective film. %, the reflectance characteristic of this embodiment is considered to have a reflectance obtained by multiplying the reflectance shown in FIG. 16 by 0.9434. Next, in order to join the first armor plate on which the reflector is formed and the flat second armor plate, a fast atom beam is applied to the joint portion 2 of the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. Then, the pillars were irradiated to activate the surface, and the second armor plate was pressed against the first armor plate to bond them together, thereby producing a heat reflector. At this time, the total thickness of the heat reflecting plate in Example 4 was 2.4000 mm, and the reflection area ratio was 88.05%. After manufacturing the heat reflector, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 4 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
（実施例５）
（反射体がＰｔ箔である形態）
　図１５に示した熱反射板を作製する。まず、外周３００ｍｍ、厚み１．２ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅７ｍｍを第２外装板との接合部として残し、それ以外の箇所については切削加工を行い、深さ０．２ｍｍのキャビティのための凹部を設けた。次に、第１外装板の凹部の底面に、外周２８４ｍｍ、厚み１００μｍのＰｔ箔を配置し、反射体を形成した。次に、紫外可視分光光度計（(株)島津製作所製　型式：ＵＶ－３１００ＰＣ）を用いて前記反射体の反射率を測定した。測定した反射率を図１８に示す。測定は、反射体の表面に測定のための光を直接当てて行った。図１８の結果、１０００℃のときに本実施例における反射体では２０００ｎｍ以上の波長において８０％以上の反射率を有することが確認できた。次に、反射体を配置した第１外装板と平板状の第２外装板を接合するために、真空度１０-２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで接合し、熱反射板を作製した。このとき、実施例５における熱反射板全体の厚さは２．４０００ｍｍ、反射面積率は９５．３３％であった。熱反射板を作製後、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００５６（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例５の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を３９．１３％削減することができた。 (Example 5)
(Embodiment in which the reflector is a Pt foil)
A heat reflecting plate shown in FIG. 15 is produced. First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 7 mm width from the outer periphery of the first armor plate was left as a joining portion with the second armor plate, and the rest was cut to form a recess for a cavity with a depth of 0.2 mm. Next, a Pt foil having an outer circumference of 284 mm and a thickness of 100 μm was placed on the bottom surface of the concave portion of the first armor plate to form a reflector. Next, the reflectance of the reflector was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corp., model: UV-3100PC). The measured reflectance is shown in FIG. The measurement was performed by directing light for measurement onto the surface of the reflector. As a result of FIG. 18, it was confirmed that the reflector in this example had a reflectance of 80% or more at a wavelength of 2000 nm or more at 1000°C. Next, in order to join the first armor plate on which the reflector is arranged and the flat second armor plate, a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. The surface was activated by irradiation, and the second armor plate was pressed against the first armor plate to bond them together, thereby producing a heat reflector. At this time, the total thickness of the heat reflecting plate in Example 5 was 2.4000 mm, and the reflection area ratio was 95.33%. After manufacturing the heat reflector, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0056 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 5 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 39.0. A 13% reduction was achieved.
（実施例６）
（反射体がＭｏ膜である形態）
　まず、外周３００ｍｍ、厚み１．２ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅５ｍｍ分を第２外装板との接合部としてマスキングした。次に、マスキングした第１外装板の面に反射体としてＭｏをスパッタリング法によって２００ｎｍ成膜した。次に、マスキングを除去した。次に、紫外可視分光光度計（（株））島津製作所製　型式：ＵＶ－３１００ＰＣ）を用いて反射体の反射率を測定した。測定した反射率の結果を図１９に示す。測定は、反射体の表面に測定のための光を直接当てて行った。また、図１９の結果、１０００℃のときに本実施例における反射体では２０００ｎｍ以上の波長において８０％以上の反射率を有することが確認できた。次に、反射体を形成した第１外装板と平板状の第２外装板を接合するために、真空度１０‐２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで熱反射板を作製した。このとき、実施例６における熱反射板全体の厚さは２．４００２ｍｍ、反射面積率は９６．６７％であった。熱反射板を作製後、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００５５（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例６の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を４０．２２％削減することができた。 (Example 6)
(Embodiment in which the reflector is a Mo film)
First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.2 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate. Next, a 200 nm film of Mo was formed as a reflector on the masked surface of the first exterior plate by a sputtering method. Then the masking was removed. Next, the reflectance of the reflector was measured using an ultraviolet-visible spectrophotometer (manufactured by Shimadzu Corp., model: UV-3100PC). FIG. 19 shows the measured reflectance results. The measurement was performed by directing light for measurement onto the surface of the reflector. As a result of FIG. 19, it was confirmed that at 1000° C., the reflector of this example had a reflectance of 80% or more at a wavelength of 2000 nm or more. Next, in order to join the first armor plate on which the reflector is formed and the flat second armor plate, a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. A heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate. At this time, the total thickness of the heat reflecting plate in Example 6 was 2.4002 mm, and the reflection area ratio was 96.67%. After manufacturing the heat reflector, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0055 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 6 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 40. A 22% reduction was achieved.
（実施例７）
（反射体がＭｏ膜、かつ石英板厚みが１．７ｍｍである形態）
　まず、外周３００ｍｍ、厚み１．７ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅５ｍｍ分を第２外装板との接合部としてマスキングした。次に、マスキングした第１外装板の面に反射体としてＭｏをスパッタリング法によって２００ｎｍ成膜した。次に、マスキングを除去した。反射体は実施例６の反射体と同じであり、図１９に示した反射特性と同じ特性を有していた。次に、反射体を形成した第１外装板と平板状の第２外装板を接合するために、真空度１０‐２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで熱反射板を作製した。このとき、実施例７における熱反射板全体の厚さは３．４００２ｍｍ、反射面積率は９６．６７％であった。熱反射板を作製後、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００７９（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例７の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を１４．１３％削減することができた。 (Example 7)
(Embodiment in which the reflector is a Mo film and the thickness of the quartz plate is 1.7 mm)
First, two plate-like exterior plates having an outer circumference of 300 mm and a thickness of 1.7 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate. Next, a 200 nm film of Mo was formed as a reflector on the masked surface of the first exterior plate by a sputtering method. Then the masking was removed. The reflector was the same as the reflector of Example 6 and had the same reflection properties as shown in FIG. Next, in order to join the first armor plate on which the reflector is formed and the flat second armor plate, a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. A heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate. At this time, the total thickness of the heat reflecting plate in Example 7 was 3.4002 mm, and the reflection area ratio was 96.67%. After manufacturing the heat reflector, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0079 (J/K). The amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity. A 13% reduction was achieved.
（実施例８）
（反射体がＭｏ膜、かつ石英板厚みが０．５ｍｍである形態）
　まず、外周１００ｍｍ、厚み０．５ｍｍの板状外装２枚を準備し、それぞれ第１外装板、第２外装板とした。次に、第１外装板の外周から幅５ｍｍ分を第２外装板との接合部としてマスキングした。次に、マスキングした第１外装板の面に反射体としてＭｏをスパッタリング法によって２００ｎｍ成膜した。次に、マスキングを除去した。反射体は実施例６の反射体と同じであり、図１９に示した反射特性と同じ特性を有していた。次に、反射体を形成した第１外装板と平板状の第２外装板を接合するために、真空度１０‐２Ｐａ以下の真空中で、高速原子ビームを第１外装板の接合部に照射して表面活性化し、第１外装板に第２外装板を押し付けることで熱反射板を作製した。このとき、実施例８における熱反射板全体の厚さは１．０００２ｍｍ、反射面積率は９０．００％であった。熱反射板を作製後、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計を算出したところ、０．００２３（Ｊ／Ｋ）であった。熱反射板を１０００℃まで昇温する際の必要な熱量は熱容量に比例するため、実施例８の熱反射板は、比較例１の不透明石英より熱反射性が高いとともに電力消費量を７５．００％削減することができた。 (Example 8)
(Embodiment in which the reflector is a Mo film and the thickness of the quartz plate is 0.5 mm)
First, two plate-like exterior plates having an outer circumference of 100 mm and a thickness of 0.5 mm were prepared, and used as a first exterior plate and a second exterior plate, respectively. Next, a 5 mm width portion from the outer periphery of the first exterior plate was masked as a joining portion with the second exterior plate. Next, a 200 nm film of Mo was formed as a reflector on the masked surface of the first exterior plate by a sputtering method. Then the masking was removed. The reflector was the same as the reflector of Example 6 and had the same reflection properties as shown in FIG. Next, in order to join the first armor plate on which the reflector is formed and the flat second armor plate, a high-speed atomic beam is applied to the joint portion of the first armor plate in a vacuum with a degree of vacuum of 10 −2 Pa or less. A heat reflector was produced by irradiating to activate the surface and pressing the second armor plate against the first armor plate. At this time, the total thickness of the heat reflecting plate in Example 8 was 1.0002 mm, and the reflection area ratio was 90.00%. After manufacturing the heat reflecting plate, the total heat capacity in the thickness direction of the plate-like exterior and the reflector in 1 mm 2 was calculated to be 0.0023 (J/K). Since the amount of heat required to raise the temperature of the heat reflector to 1000° C. is proportional to the heat capacity, the heat reflector of Example 8 has higher heat reflectivity than the opaque quartz of Comparative Example 1, and the power consumption is 75.5. 00% reduction.
１００～１１２　熱反射板
１　板状外装
１ａ　第１外装板
１ｂ　第２外装板
２　周縁部同士の接合部
３　下地膜
４　反射膜
５　反射体
６　支柱部
７　支柱部を含む接合部
８　反射体
１１　土手部
１２　キャビティ

  100 to 112 Heat reflector 1 Plate-like exterior 1a First exterior plate 1b Second exterior plate 2 Joint between peripheral edges 3 Underlying film 4 Reflective film 5 Reflector 6 Support 7 Joint including support 8 Reflector 11 Bank 12 Cavity

Claims (21)

  1. 　板状外装と、
    　該板状外装の内部に配置されて該板状外装によって外周囲が完全に覆われてなり、かつ、該板状外装の一方の表面に入射した赤外線を反射する反射体と、を有する熱反射板であって、
    　前記反射体は、薄膜、板又は箔であり、
    　前記熱反射板は、１ｍｍ２における板状外装及び反射体の厚さ方向の熱容量の合計が０．０００４～０．００８０（Ｊ／Ｋ）であることを特徴とする熱反射板。     a plate-like exterior;
    a reflector disposed inside the plate-shaped exterior so that the outer periphery is completely covered by the plate-shaped exterior, and which reflects infrared rays incident on one surface of the plate-shaped exterior. a board,
    The reflector is a thin film, plate or foil,
    The heat reflecting plate is characterized in that the sum of the heat capacities in the thickness direction of the plate-shaped exterior and the reflector in 1 mm 2 is 0.0004 to 0.0080 (J/K).
  2. 　前記反射体の少なくとも反射面を含む表面層は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることを特徴とする請求項１に記載の熱反射板。 the surface layer including at least the reflecting surface of the reflector is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu; Or from an alloy containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu The heat reflector according to claim 1, characterized in that:
  3. 　前記板状外装の材質はシリカ又はシリコンであることを特徴とする請求項１に記載の熱反射板。 The heat reflecting plate according to claim 1, wherein the material of the plate-shaped exterior is silica or silicon.
  4. 　前記板状外装は、第１外装板と第２外装板とが対向して配置されて周縁部同士が周縁に沿って環状に連続して接合された接合部を有する合わせ板の構造を有することを特徴とする請求項１に記載の熱反射板。 The plate-shaped exterior has a laminated plate structure having a joint portion in which a first exterior plate and a second exterior plate are arranged to face each other, and the peripheral edge portions are annularly joined continuously along the peripheral edge. The heat reflector according to claim 1, characterized by:
  5. 　前記合わせ板の構造は、前記第１外装板及び前記第２外装板の対向し合う面の間に設けられ、かつ、前記第１外装板側及び前記第２外装板側の少なくとも一方に前記周縁部同士の接合部によって密閉されているキャビティを有し、
    　該キャビティ内に前記反射体が配置されていることを特徴とする請求項４に記載の熱反射板。     The structure of the laminated plate is provided between the facing surfaces of the first exterior plate and the second exterior plate, and the peripheral edge is provided on at least one of the first exterior plate side and the second exterior plate side. having a cavity sealed by a part-to-part joint;
    5. The heat reflector according to claim 4, wherein said reflector is disposed within said cavity.
  6. 　前記キャビティを少なくとも前記第１外装板側に有し、
    　前記第１外装板の前記キャビティ内の表面上に前記反射体として形成した薄膜を有し、
    　該薄膜は、前記第１外装板の前記キャビティ内の表面側から順に、下地膜と、前記反射面を含む表面層としての反射膜と、を有する積層膜であり、
    　前記下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、
    　前記反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、
    　前記下地膜と前記反射膜とが異なる組成を有していることを特徴とする請求項５に記載の熱反射板。     Having the cavity at least on the first exterior plate side,
    having a thin film formed as the reflector on the surface of the first exterior plate in the cavity;
    The thin film is a laminated film having, in order from the surface side in the cavity of the first exterior plate, a base film and a reflective film as a surface layer including the reflective surface,
    The underlayer consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. Made of an alloy containing at least one of the
    The reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, An alloy containing at least one selected from the group consisting of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu,
    6. The heat reflecting plate according to claim 5, wherein said base film and said reflecting film have different compositions.
  7. 　前記第１外装板が平板であり、
    　前記キャビティを前記第２外装板側に有し、
    　前記第１外装板の表面上に前記反射体として形成した薄膜を有し、
    　該薄膜は、前記第１外装板の表面側から順に、下地膜と、前記反射面を含む表面層としての反射膜と、を有する積層膜であり、
    　前記下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、
    　前記反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、
    　前記下地膜と前記反射膜とが異なる組成を有していることを特徴とする請求項５に記載の熱反射板。     The first exterior plate is a flat plate,
    Having the cavity on the second exterior plate side,
    Having a thin film formed as the reflector on the surface of the first exterior plate,
    The thin film is a laminated film having, in order from the surface side of the first exterior plate, a base film and a reflective film as a surface layer including the reflective surface,
    The underlayer consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. Made of an alloy containing at least one of the
    The reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, An alloy containing at least one selected from the group consisting of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu,
    6. The heat reflecting plate according to claim 5, wherein said base film and said reflecting film have different compositions.
  8. 　前記反射体が、板又は箔であり、かつ、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなることを特徴とする請求項５に記載の熱反射板。 said reflector is a plate or foil and consists of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu; Or from an alloy containing at least one selected from the group consisting of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu 6. The heat reflector according to claim 5, characterized by:
  9. 　前記キャビティ内の圧力は、大気圧未満の減圧となっていることを特徴とする請求項５に記載の熱反射板。 The heat reflecting plate according to claim 5, characterized in that the pressure inside the cavity is reduced below atmospheric pressure.
  10. 　（１）前記第１外装板は、前記周縁部に設けられた土手部と該土手部で取り囲まれて前記キャビティを構成する凹部とを有し、前記第２外装板は、平板状であるか、又は、
    　（２）前記第１外装板は、平板状であり、前記第２外装板は、前記周縁部に設けられた土手部と該土手部で取り囲まれて前記キャビティを構成する凹部とを有することを特徴とする請求項５に記載の熱反射板。     (1) The first exterior plate has a bank portion provided in the peripheral edge portion and a concave portion surrounded by the bank portion to form the cavity, and the second exterior plate has a flat plate shape. , or
    (2) The first exterior plate has a flat plate shape, and the second exterior plate has a bank portion provided at the peripheral edge portion and a concave portion surrounded by the bank portion and forming the cavity. 6. The heat reflector according to claim 5.
  11. 　前記熱反射板は、前記キャビティ内で前記合わせ板の構造の対向する面同士の間を立設する少なくとも１本の支柱部を有することを特徴とする請求項５に記載の熱反射板。 6. The heat reflector according to claim 5, wherein the heat reflector has at least one strut standing between opposing surfaces of the structure of the laminated plate within the cavity.
  12. 　前記支柱部が、柱状又は筒状であることを特徴とする請求項１１に記載の熱反射板。 The heat reflecting plate according to claim 11, characterized in that said supporting column has a columnar shape or a cylindrical shape.
  13. 　前記熱反射板は、前記支柱部を複数有し、
    　該支柱部は筒状であり、かつ、各支柱部は互いに筒壁の一部を共有した３次元空間充填構造を有することを特徴とする請求項１２に記載の熱反射板。     The heat reflecting plate has a plurality of the struts,
    13. The heat reflecting plate according to claim 12, wherein the strut portions are cylindrical, and each strut portion has a three-dimensional space-filling structure in which a portion of the cylindrical wall is shared with each other.
  14. 　前記３次元空間充填構造は、ハニカム構造、矩形格子構造、方形格子構造又はひし形格子構造であることを特徴とする請求項１３に記載の熱反射板。 The heat reflector according to claim 13, wherein the three-dimensional space-filling structure is a honeycomb structure, a rectangular lattice structure, a square lattice structure, or a rhombus lattice structure.
  15. 　前記第１外装板及び前記第２外装板の対向し合う面は互いに平坦面であり、
    　前記反射体は、前記第２外装板側の前記第１外装板の表面のうち前記周縁部同士の環状の接合部の内側の領域に形成された薄膜であり、
    　該薄膜は、前記第１外装板の表面側から順に、下地膜と、前記反射面を含む表面層としての反射膜と、を有する積層膜であり、
    　前記下地膜は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ又はＮｉからなるか、又は、Ｔａ、Ｍｏ、Ｔｉ、Ｚｒ、Ｎｂ、Ｃｒ、Ｗ、Ｃｏ及びＮｉからなる群から選ばれる少なくともいずれか１種を含む合金からなり、
    　前記反射膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなるか、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる群から選ばれる少なくともいずれか１種を含む合金からなり、
    　前記下地膜と前記反射膜とが異なる組成を有していることを特徴とする請求項４に記載の熱反射板。     the facing surfaces of the first exterior plate and the second exterior plate are flat surfaces;
    The reflector is a thin film formed on a surface of the first exterior plate on the side of the second exterior plate in a region inside an annular joint portion between the peripheral edge portions,
    The thin film is a laminated film having, in order from the surface side of the first exterior plate, a base film and a reflective film as a surface layer including the reflective surface,
    The underlayer consists of Ta, Mo, Ti, Zr, Nb, Cr, W, Co or Ni, or is selected from the group consisting of Ta, Mo, Ti, Zr, Nb, Cr, W, Co and Ni. Made of an alloy containing at least one of the
    The reflective film is made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, An alloy containing at least one selected from the group consisting of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu,
    5. The heat reflecting plate according to claim 4, wherein said base film and said reflecting film have different compositions.
  16. 　前記キャビティを少なくとも前記第１外装板側に有し、
    　前記第１外装板の前記キャビティ内の表面上に前記反射体として形成した薄膜を有し、
    　該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることを特徴とする請求項５に記載の熱反射板。     Having the cavity at least on the first exterior plate side,
    having a thin film formed as the reflector on the surface of the first exterior plate in the cavity;
    The thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, 6. The heat reflector according to claim 5, which is an alloy film containing 50% by mass or more of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu. board.
  17. 　前記第１外装板が平板であり、
    　前記キャビティを前記第２外装板側に有し、
    　前記第１外装板の表面上に前記反射体として形成した薄膜を有し、
    　該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることを特徴とする請求項５に記載の熱反射板。     The first exterior plate is a flat plate,
    Having the cavity on the second exterior plate side,
    Having a thin film formed as the reflector on the surface of the first exterior plate,
    The thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, 6. The heat reflector according to claim 5, which is an alloy film containing 50% by mass or more of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu. board.
  18. 　前記第１外装板及び前記第２外装板の対向し合う面は互いに平坦面であり、
    　前記反射体は、前記第２外装板側の前記第１外装板の表面のうち前記周縁部同士の環状の接合部の内側の領域に形成された薄膜であり、
    　該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることを特徴とする請求項４に記載の熱反射板。     the facing surfaces of the first exterior plate and the second exterior plate are flat surfaces;
    The reflector is a thin film formed on a surface of the first exterior plate on the side of the second exterior plate in a region inside an annular joint portion between the peripheral edge portions,
    The thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, 5. The heat reflector according to claim 4, which is an alloy film containing 50% by mass or more of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu. board.
  19. 　前記キャビティを前記第１外装板側及び前記第２外装板側に有し、
    　前記第１外装板の前記キャビティ内の表面上に前記反射体として形成した薄膜を有し、
    　該薄膜は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕからなる膜か、又は、Ｉｒ、Ｐｔ、Ｒｈ、Ｒｕ、Ｒｅ、Ｈｆ、Ｍｏ、Ａｌ、Ｍｇ、Ｃｏ、Ｎｉ、Ｆｅ、Ｓｎ、Ｇｅ、Ａｕ、Ａｇ又はＣｕを５０質量％以上含む合金膜であることを特徴とする請求項５に記載の熱反射板。     Having the cavity on the first exterior plate side and the second exterior plate side,
    having a thin film formed as the reflector on the surface of the first exterior plate in the cavity;
    The thin film is a film made of Ir, Pt, Rh, Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag or Cu, or Ir, Pt, Rh, 6. The heat reflector according to claim 5, which is an alloy film containing 50% by mass or more of Ru, Re, Hf, Mo, Al, Mg, Co, Ni, Fe, Sn, Ge, Au, Ag, or Cu. board.
  20. 　前記反射体の厚さは、０．０１μｍ以上５ｍｍ以下であることを特徴とする請求項１に記載の熱反射板。 The heat reflector according to claim 1, wherein the thickness of the reflector is 0.01 µm or more and 5 mm or less.
  21. 　前記周縁部同士の接合部は、表面活性化接合部であることを特徴とする請求項４に記載の熱反射板。 The heat reflector according to claim 4, wherein the joints between the peripheral edge portions are surface-activated joints.
PCT/JP2022/043587 2021-12-09 2022-11-25 Heat reflection plate WO2023106132A1 (en)

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JPH1197448A (en) * 1997-09-18 1999-04-09 Kemitoronikusu:Kk Apparatus and method for heat treatment of semiconductor crystal
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