JP4962256B2 - Excimer lamp light irradiation device - Google Patents

Description

  The present invention relates to an excimer lamp light irradiation device, and more particularly, to an excimer lamp light irradiation device used for a cleaning process in a semiconductor device manufacturing process, a liquid crystal substrate manufacturing process, and the like.

  In recent years, a processing object is processed by the action of the vacuum ultraviolet light and ozone generated by the vacuum ultraviolet light by irradiating the processing object made of metal, glass and other materials with vacuum ultraviolet rays having a wavelength of 200 nm or less. Technology, for example, cleaning treatment technology to remove organic contaminants adhering to the irradiated surface of the object to be processed, or oxide film formation processing technology to form an ultra-thin oxide film on the irradiated surface of the object to be processed Has been put to practical use.

As such an irradiation source of vacuum ultraviolet rays, excimer lamps that generate excimer molecules such as xenon by using excimer discharge and thereby emit vacuum ultraviolet rays are widely used.
In excimer lamps, many attempts have been made and various proposals have been made so that higher-intensity vacuum ultraviolet rays can be emitted with high efficiency (see, for example, Patent Document 1).

  As a certain type of excimer lamp, as shown in FIG. 20 and FIG. 21, Patent Document 1 is made of silica glass that transmits vacuum ultraviolet rays, and includes a cylindrical outer tube 31 and an outer tube 31. A cylindrical inner tube 32 having an outer diameter smaller than the inner diameter of the outer tube 31 disposed along the tube axis, and the outer tube 31 and the inner tube 32 are welded at both ends to form a side wall portion. Thus, it has been proposed that a discharge vessel 30 having a double tube structure in which an annular discharge space S is formed between the outer tube 31 and the inner tube 32 is formed. In this excimer lamp, an electrode (outer electrode) 34 is provided on the outer peripheral surface 31 A of the outer tube 31 of the discharge vessel 30, and an electrode (inner electrode) 35 is provided on the inner peripheral surface 32 A of the inner tube 32. The UV reflecting film 41 is formed on the inner surface thereof (specifically, the inner peripheral surface 31B of the outer tube 31 and the outer peripheral surface 32B of the inner tube 32), and this UV reflecting film 41 is not formed. An aperture 25 for emitting vacuum ultraviolet rays generated in the discharge vessel 30 depending on the region is formed.

  In the excimer lamp having such a configuration, since the ultraviolet reflecting film is provided on the inner surface of the discharge vessel, the vacuum ultraviolet rays generated in the discharge vessel pass through the tube wall of the discharge vessel when emitted from the aperture portion. Besides being transmitted, it is only reflected by the UV reflecting film and does not enter the tube wall of the discharge vessel. Therefore, the vacuum ultraviolet ray is attenuated by passing through the silica glass (discharge vessel tube wall). Can be suppressed. Further, since it is possible to prevent ultraviolet rays from being incident on the silica glass (discharge vessel tube wall) in the region where the ultraviolet reflective film of the discharge vessel is formed, damage due to ultraviolet distortion generated in the discharge vessel is small. Thus, the occurrence of cracks due to the ultraviolet distortion can be suppressed.

  However, when such an excimer lamp is turned on, peeling occurs at the end of the ultraviolet reflecting film, that is, the end forming the boundary with the aperture. Then, since the section from which the ultraviolet reflecting film is peeled off is collected in the discharge vessel, when the section is collected in the aperture section, vacuum ultraviolet rays are blocked in the aperture section, and the vacuum emitted from the aperture section. There is a problem that the amount of ultraviolet rays is reduced.

JP 2002-93377 A

  The present invention is based on the circumstances as described above, and the inventors have repeatedly studied so that, in an excimer lamp in a lighting state, an ultraviolet reflection film irradiated with vacuum ultraviolet rays generated in a discharge vessel, and the ultraviolet reflection film As a result of the temperature difference between the part of the discharge vessel where the UV irradiation film is formed and the vacuum UV irradiation is not caused by the action of the film, peeling occurs at the end of the UV reflection film. The object of the present invention is to provide an excimer lamp light irradiation apparatus that can obtain a long service life and maintain a sufficient amount of ultraviolet radiation.

The excimer lamp light irradiation device of the present invention includes a discharge vessel made of silica glass having a discharge space, and is provided with a pair of electrodes in a state where the silica glass forming the discharge vessel is interposed. An excimer lamp light irradiation apparatus comprising an excimer lamp that generates excimer discharge in a space,
In the excimer lamp, an ultraviolet reflection film made of silica particles is formed on the inner surface of the discharge vessel, and an aperture portion formed of a region where the ultraviolet reflection film of the discharge vessel is not formed is formed. And
In a lamp house comprising a housing having an opening, together with an excimer lamp arranged so that the aperture part faces the opening, a boundary between the aperture part of the ultraviolet reflecting film in the discharge vessel of the excimer lamp is formed. A heating means or a heat retaining means for warming a portion where the end portion is located from the outer surface side is provided.

  In the excimer lamp light irradiation device of the present invention, it is preferable that the ultraviolet reflecting film is composed of silica particles and alumina particles.

  In the excimer lamp light irradiation device of the present invention, a plurality of excimer lamps are arranged in parallel in the lamp house, and face the side of the lamp house of the excimer lamp arranged at both ends of the plurality of excimer lamps. It is preferable that a heating means or a heat retaining means is provided so as to warm a portion of the discharge vessel where the end of the ultraviolet reflecting film is located.

  In the excimer lamp light irradiation device of the present invention, the heating means may be a reflecting plate having a reflecting surface extending in the tube axis direction of the excimer lamp.

  In the excimer lamp light irradiation device of the present invention, the heating means may be a heat storage member.

  In the excimer lamp light irradiation device of the present invention, the heating means may be an energizing heater.

  In the excimer lamp light irradiation device of the present invention, the heat retaining means may be a heat retaining film provided on the outer surface of the portion where the end of the ultraviolet reflecting film in the discharge vessel is located.

  In the excimer lamp light irradiation device of the present invention, in the discharge vessel constituting the excimer lamp, the temperature of the reflective film forming part where the ultraviolet reflective film is formed and the ultraviolet reflective film adjacent to the reflective film forming part are formed. It is preferable that the difference from the temperature of the aperture portion adjacent to the reflective film that is not applied is 55 ° C. or less.

In the excimer lamp light irradiation device of the present invention, an ultraviolet reflection film made of silica particles is provided on the inner surface of the discharge vessel of the excimer lamp, and the ultraviolet reflection film of the discharge vessel is formed on the portion. Since ultraviolet rays are not incident, generation of cracks due to ultraviolet distortion can be suppressed, and the service life of the excimer lamp is extended. Further, since the ultraviolet rays generated in the discharge vessel do not enter the tube wall of the discharge vessel where the ultraviolet reflecting film is formed, the ultraviolet ray passes through the discharge vessel tube wall. Thus, it is possible to suppress the attenuation. In addition, since this excimer lamp light irradiation device is provided with a heating means or a heat retaining means for heating the portion of the discharge vessel where the end portion forming the boundary with the aperture portion of the ultraviolet reflecting film is located. The temperature of the portion of the discharge vessel where the end of the UV reflecting film is located and the end of the UV reflecting film heated by the UV irradiation are not irradiated by the UV reflecting film. The difference in temperature can be reduced, and as a result, the end of the ultraviolet reflecting film can be prevented from peeling off due to the temperature difference between the ultraviolet reflecting film and the discharge vessel. It is possible to prevent the emitted ultraviolet rays from being blocked by part of the aperture portion being blocked by the peeling of the film.
Therefore, according to the excimer lamp light irradiation device of the present invention, a long service life can be obtained and a sufficient amount of ultraviolet radiation can be maintained.

  Hereinafter, the excimer lamp light irradiation device of the present invention will be described in detail.

FIG. 1 is a schematic diagram for explaining an example of the configuration of an excimer lamp light irradiation apparatus according to the present invention. FIG. 2 is a cross-sectional view of the excimer lamp light irradiation apparatus in FIG. FIG. 3 is an explanatory cross-sectional view showing a cross section perpendicular to the tube axis of the excimer lamp provided in FIG. 3, and FIG. 3 is an explanatory view showing a configuration of the excimer lamp provided in the excimer lamp light irradiation device of FIG. 4 is an explanatory cross-sectional view showing a cross section perpendicular to the tube axis of the excimer lamp of FIG. For convenience of explanation, FIG. 1 does not show a reflecting plate provided in the lamp house, and shows a state in which one side plate of the lamp house is removed.
This excimer lamp light irradiating device has a configuration in which an excimer lamp 20 is fixedly mounted by a support member 16 at each of both ends in an aluminum lamp house 10 consisting of a rectangular box-shaped housing as a whole. It is what has.
The lamp house 10 includes a bottom plate 11A and a side plate 11B connected to the bottom plate 11A. The lamp house 10 has an upper opening (upward in FIG. 1). For example, synthetic quartz glass is used to close the opening. A light emission window 14 made of a material that transmits vacuum ultraviolet rays is provided. A closed space is formed inside the lamp house 10, and an inert gas composed of at least one selected from nitrogen gas, helium gas, argon gas, neon gas, krypton gas, and xenon gas is enclosed therein. .
Here, since this excimer lamp light irradiation device has a property that the vacuum ultraviolet ray is attenuated by being absorbed by oxygen, the oxygen concentration in the lamp house 10 is set to a predetermined concentration, whereby the workpiece is processed. Can be reliably irradiated with vacuum ultraviolet rays.

The excimer lamp 20 is a double tube type excimer lamp, and is made of silica glass having good vacuum ultraviolet ray transparency such as synthetic quartz glass. The excimer lamp 20 includes a cylindrical outer tube 31 and the outer tube 31. A cylindrical inner tube 32 having an outer diameter smaller than the inner diameter of the outer tube 31 disposed along the cylinder axis, and the outer tube 31 and the inner tube 32 are welded at both ends to form side walls. A discharge vessel 30 having a double tube structure in which an annular discharge space S is formed between the outer tube 31 and the inner tube 32 is formed. The outer tube 31 of the discharge vessel 30 is provided with one net-like electrode (hereinafter also referred to as “outer electrode”) 34 made of a conductive material such as a wire net, in close contact with the outer peripheral surface 31A. In addition, the inner tube 32 is provided with the other electrode (hereinafter also referred to as “inner electrode”) 35 made of, for example, a metal plate, in close contact with the inner peripheral surface 32A. A pair of electrodes composed of the outer electrode 34 and the inner electrode 35 are provided with a silica glass (tube wall of the discharge vessel 30) forming the discharge vessel 30 interposed therebetween.
A discharge gas that forms excimer molecules by excimer discharge, such as xenon gas, a mixed gas of argon gas and chlorine gas, is enclosed in the discharge space S of the discharge vessel 30.
In the example of this figure, the inner electrode 35 is arranged to extend between clearances of about 20 mm provided at both ends of the inner tube 32, and the outer electrode 34 is made of a conductive material wire (eg, A metal wire) is seamlessly knitted in a cylindrical shape, and the discharge vessel 30 is inserted into the mesh to be attached to the outer peripheral surface 31A of the outer tube 31 of the discharge vessel 30. The inner electrode 35 and the outer electrode 34 are connected to a power supply device 22 composed of a high frequency power source. Further, in order to prevent electric leakage, the outer electrode 34 exposed outside the excimer lamp 20 is used as a ground electrode, and the inner electrode 35 arranged inside is used as a high voltage supply electrode.

  In the excimer lamp 20, an ultraviolet reflection film 41 having a thickness of, for example, 10 to 100 μm is formed on the inner surface of the discharge vessel 30, and the ultraviolet reflection film 41 is formed on the inner surface of the discharge vessel 30. In the discharge space S, an aperture portion 25 for emitting vacuum ultraviolet rays generated by excimer discharge to the outside is formed by the region that is not formed. In the example of this figure, the ultraviolet reflecting film 41 is in a region on the bottom plate 11A side (the lower side in FIG. 2, the upper side in FIG. 3) of the lamp house 10 on the inner peripheral surface 31B of the outer tube 31 of the discharge vessel 30. The excimer lamp 20 is closely provided so as to extend in the tube axis direction, and a cross section perpendicular to the tube axis direction of the excimer lamp 20 has a U shape. The excimer lamp 20 is disposed so that the aperture portion 25 faces the light irradiation window 14 provided in the lamp house 10.

The ultraviolet reflecting film 41 is made of a laminate of particles having an ultraviolet scattering ability (hereinafter also referred to as “ultraviolet scattering particles”), and specifically, high binding properties to the discharge vessel 30 can be obtained. In addition, since the ultraviolet reflective film 41 itself has high vacuum ultraviolet reflectivity, silica particles are used as a constituent material. Moreover, it is preferable that it consists of a silica particle and an alumina particle. In general, the excimer lamp 20 is known to generate plasma with excimer discharge. In addition to the silica particles, alumina particles having a higher melting point than the silica particles are used to form the ultraviolet reflective film 41. By mixing as ultraviolet scattering particles as a material, it is possible to suppress a decrease in the reflectance of the ultraviolet reflecting film 41. Further, even when exposed to the heat of the plasma, the alumina particles are not melted by the heat of the plasma, so that the silica particles and the alumina particles adjacent to each other are bonded to each other in the ultraviolet reflection film 41. Is prevented and the grain boundaries are maintained.
Here, the vacuum ultraviolet reflectivity of the ultraviolet reflecting film 41 is obtained by laminating ultraviolet scattering particles and utilizing the characteristics of the ultraviolet scattering particles to cause scattering reflection.
That is, when the vacuum ultraviolet rays reach the ultraviolet scattering particles, a part thereof is reflected by the surface of the particles, and the other part is refracted and incident on the inside of the particles. A part of the vacuum ultraviolet light incident on the inside of this particle is absorbed but most of it is transmitted, and is refracted when it is emitted from the inside again. By repeatedly causing such refraction by laminating the ultraviolet scattering particles, the vacuum ultraviolet rays incident on the ultraviolet reflecting film 41 made of the laminated body of ultraviolet scattering particles are scattered in the direction opposite to the incident direction, This becomes reflected light.
In the ultraviolet reflecting film 41, as described above, since scattering and reflection are caused by transmitting vacuum ultraviolet rays into the ultraviolet scattering particles, for example, titanium, zirconium and compounds thereof are formed on the ultraviolet reflecting film 41. In some cases, materials having ultraviolet absorbing ability such as these are contained as impurities, but these materials are not used as constituent materials.

  When the ultraviolet reflective film 41 is composed of silica particles and alumina particles, the content ratio of silica particles in the ultraviolet reflective film 41 is 30 to 99 mass%, and the content ratio of alumina particles is 1 to 70 mass%. % Is preferred. Further, the content ratio of the alumina particles is more preferably 5 to 70% by mass, and particularly preferably 10 to 70% by mass.

The silica particles constituting the ultraviolet reflecting film 41 are preferably the same as the silica glass that is the material of the discharge vessel 30.
By making the material of the silica particles the same as the material of the discharge vessel 30, the linear expansion coefficient of the silica particles and the linear expansion rate of the discharge vessel 30 become equal, so that the ultraviolet reflection film 41 is highly bonded to the discharge vessel 30. Therefore, peeling of the ultraviolet reflective film 41 from the discharge vessel 30 can be suppressed.

The silica particles are preferably silica glass powdered fine particles, and the center diameter of the particles is preferably 0.1 to 10 μm, particularly preferably 0.3 to 3 μm.
Here, silica crystals can be used as the silica particles, but in this case, the discharge vessel 30 may be easily cracked.

Such silica particles can be produced by a solid phase method, a liquid phase method, and a gas phase method, but in order to obtain submicron or micron-sized particles suitable as a constituent material of the ultraviolet reflective film 41, the silica particles A phase method is preferred, and a chemical vapor deposition method (CVD) is preferred from the viewpoint of production cost.
Specifically, it can be synthesized, for example, by reacting raw material silicon chloride with oxygen at a reaction temperature of 900 to 1000 ° C. In this synthesis step, the particle size of the particles obtained is adjusted by adjusting the raw material concentration, the pressure condition, and the reaction temperature.

The alumina particles constituting the ultraviolet reflecting film 41 preferably have a particle central diameter of 0.1 to 3 μm, particularly preferably 0.3 to 1 μm.
The alumina particles are particles in a crystalline state because alumina has a characteristic of being easily crystallized. In addition, the alumina particles have a property of having a higher refractive index and melting point than silica particles, and in the ultraviolet reflection film 41 using the alumina particles having such properties as a constituent material together with the silica particles, Excellent vacuum ultraviolet reflectivity and excimer discharge resistance can be obtained.

Such alumina particles can be produced by a solid phase method, a liquid phase method, and a gas phase method, but in order to obtain submicron or micron-sized particles suitable as a constituent material of the ultraviolet reflective film 41, an air particle is used. A phase method is preferred, and a chemical vapor deposition method (CVD) is preferred from the viewpoint of production cost.
Specifically, it can be synthesized, for example, by reacting raw material aluminum chloride and oxygen at a reaction temperature of 1000 to 1200 ° C. In this synthesis step, the particle size of the particles obtained is adjusted by adjusting the raw material concentration, the pressure condition, and the reaction temperature.

The ultraviolet reflecting film 41 can be formed by, for example, a flow-down method.
Specifically, a reflective film forming solution is obtained by adding silica particles and, if necessary, other ultraviolet scattering particles to a viscous solvent composed of water and PEO (polyoxyethylene) resin, and this reflective film forming solution Is cast to a region where the ultraviolet reflecting film 41 is to be formed on the inner surface of the discharge vessel forming tube for forming the discharge vessel 30, and a thin film is formed in the region. Then, the obtained thin film is dried and baked to evaporate the viscous solution, thereby forming an ultraviolet reflecting film 41 made of silica particles and ultraviolet scattering particles as required.

In the excimer lamp light irradiation device, the end 42A that forms the boundary between the excimer lamp 20 and the aperture portion 25 of the ultraviolet reflecting film 41 in the discharge vessel 30 of the excimer lamp 20 in the lamp house 10. , 42B (hereinafter also referred to as “reflection film end portion corresponding portion”) is provided with means for heating from the outer surface side (hereinafter also referred to as “external heating means”).
Here, the end portions 42 </ b> A and 42 </ b> B that form a boundary with the aperture portion 25 of the ultraviolet reflection film 41 are end portions of the ultraviolet reflection film 41 in a cross section perpendicular to the tube axis of the excimer lamp 20.

This external heating means is a heating means for heating the portion corresponding to the end portion of the reflection film from the outer surface side, and has a reflection surface 52 extending in the tube axis direction of the excimer lamp 20, and the entire length of the excimer lamp 20. It consists of the reflecting plate 51 which has the same total length. According to this reflecting plate 51, light emitted from the excimer lamp 20 (specifically, mainly infrared light, which is transmitted through the aperture portion 25, or through the ultraviolet reflecting film 41 and the tube wall of the discharge vessel 30). The portion corresponding to the end of the reflection film of the discharge vessel 30 is warmed from the outer surface side by radiant heat.
In the example of this figure, two reflecting plates 51 for individually heating the corresponding portions of the reflecting film ends corresponding to the both ends 42A and 42B of the ultraviolet reflecting film 41 are fixed and mounted by the support member 51A. Has been. Each of these two reflectors 51 has a shape in which a cross section perpendicular to the tube axis direction of the excimer lamp 20 is curved along the outer tube 31 of the discharge vessel 30, and the side tube wall of the outer tube 31 is formed. The excimer lamp 20 is disposed so as to face the end portions 42A and 42B.

  As the material of the reflector 51, for example, a metal such as stainless steel can be used.

In the excimer lamp light irradiation device having the above configuration, a high-frequency voltage controlled to an appropriate size is applied between the outer electrode 34 and the inner electrode 35 of the excimer lamp 20 by the power supply device 22. The discharge vessel 30 functions as a dielectric, excimer discharge occurs in the discharge space S, and excimer molecules derived from the discharge gas are formed by the excimer discharge, and the mesh of the outer electrode 34 in the aperture portion 25 of the excimer lamp 20 is formed. Vacuum ultraviolet rays are emitted from between the two, and the vacuum ultraviolet rays are emitted from the opening of the lamp house 10 through the light irradiation window 14.
Here, in the excimer lamp 20, when xenon gas is used as the discharge gas, vacuum ultraviolet light having a peak at a wavelength of 172 nm is obtained, and when a mixed gas of argon gas and chlorine gas is used, the wavelength A vacuum ultraviolet ray having a peak at 175 nm is obtained.

  Thus, in the excimer lamp 20, since the ultraviolet reflecting film 41 is provided on the inner surface of the discharge vessel 30 (the inner peripheral surface 31B of the outer tube 31), the vacuum ultraviolet rays generated in the discharge vessel 30 are reflected. In the film forming part, since it is only reflected by the ultraviolet reflecting film 41 and does not enter the tube wall of the discharge vessel 30, vacuum ultraviolet rays are transmitted through silica glass (tube wall of the discharge vessel 30). And attenuation is suppressed. Further, since ultraviolet rays are not incident on the silica glass (tube wall of the discharge vessel 30) constituting the reflective film forming portion of the discharge vessel 30, damage due to ultraviolet ray distortion in the discharge vessel 30 is reduced, and this ultraviolet ray distortion It is possible to suppress the occurrence of cracks due to the above.

Furthermore, since the heating means comprising the reflection plate 51 is provided as the external heating means, the reflection plate 51 heats and warms the portion corresponding to the end of the reflection film in the excimer lamp 20 by radiant heat. Even though the film edge corresponding portion is not irradiated with vacuum ultraviolet rays due to the action of the ultraviolet reflection film 41, the reflection film end corresponding portion and the vacuum ultraviolet rays generated in the discharge vessel 30 are irradiated. It is possible to reduce the temperature difference from the ultraviolet reflective film 41 that is heated. As a result, in the lit excimer lamp 20, the difference in linear expansion between the reflection film end corresponding portion of the discharge vessel 30 and the ultraviolet reflection film 41 can be reduced, so that the ends 42A and 42B of the ultraviolet reflection film 41 Further, it is possible to prevent peeling from the discharge vessel 30 due to a temperature difference between the ultraviolet reflecting film 41 and the discharge vessel 30.
Here, even in the case where the adhesiveness is lowered due to the temperature difference generated between the ultraviolet reflecting film 41 and the discharge vessel 30 in the central portion of the ultraviolet reflecting film 41 not facing the reflecting plate 51. In the peripheral portion, sufficient adhesion is obtained by the action of the external heating means made of the reflecting plate 51, so that the ultraviolet reflecting film 41 does not peel off.

Specifically, in the excimer lamp light irradiation device, the temperature of the reflective film forming portion of the discharge vessel 30 of the excimer lamp 20 and the reflective film adjacent aperture adjacent to the reflective film forming portion and not formed with the ultraviolet reflective film 41. The difference from the temperature of the part is preferably 55 ° C. or less, as will be apparent from experimental examples described later.
Here, in this specification, the temperature difference between the reflection film forming portion and the reflection film adjacent aperture portion in the discharge vessel 30 is defined by measuring the temperature of the ultraviolet reflection film 41 disposed in the discharge vessel 30. Therefore, the temperature of the aperture adjacent to the reflective film irradiated with the vacuum ultraviolet rays generated in the discharge vessel 30 under the same conditions as the ultraviolet reflective film 41 can be easily measured. This is because it was used to check the temperature of the film 41, and the temperature difference between the ultraviolet reflective film 41 and the discharge vessel 30 is confirmed based on the difference in temperature between the reflective film forming part and the reflective film adjacent aperture part.
Further, the temperature of the reflection film forming portion and the temperature of the reflection film adjacent aperture portion can be measured by, for example, a radiation thermometer (pyrometer).

As described above, according to the excimer lamp light irradiation device of the present invention, in the discharge vessel 30 of the excimer lamp 20, vacuum ultraviolet rays are not incident on the reflective film forming portion where the ultraviolet reflective film 41 is formed. Since the generation of cracks due to ultraviolet distortion can be suppressed, a long life can be obtained.
Further, since the vacuum ultraviolet rays generated in the discharge vessel 30 do not enter the tube wall of the reflection film forming portion in the discharge vessel 30, the vacuum ultraviolet rays pass through the tube wall (silica glass) of the discharge vessel 30. The attenuation due to the fact is suppressed. In addition, the end portions 42A and 42B of the ultraviolet reflection film 41 are peeled off from the discharge vessel 30 due to the temperature difference between the end portions 42A and 42B of the ultraviolet reflection layer 41 and the ultraviolet ray end portion corresponding portion of the discharge vessel 30. As a result, it is possible to prevent the vacuum ultraviolet rays emitted from being blocked by part of the aperture 25 being blocked by the peeling off of the ultraviolet reflection film 41. Therefore, a sufficient amount of vacuum ultraviolet radiation can be maintained.

Although the excimer lamp light irradiation device of the present invention has been specifically described above, the present invention is not limited to the above examples, and various modifications can be made.
For example, the external heating means only needs to be able to heat the reflective film end corresponding portion of the discharge vessel from the outer surface side, and may be composed of the following members (1) to (3). .
Among these members (1) to (3), the members (1) and (2) are heating means for heating the reflection film end corresponding portion from the outer surface side, (3) This member is a heat retaining means that is provided on the outer surface of the reflection film end corresponding portion and warms the heat by keeping the reflection film end corresponding portion.

(1) For example, using a light (mainly infrared rays) emitted from an excimer lamp, the portion corresponding to the end of the reflective film end of the discharge vessel is heated from the outer surface side by heat ray radiation. A heat storage member (2) which is heated by heating, for example, an electric heater such as a halogen lamp, and a heat generating member (3) which is heated by heating the portion corresponding to the reflection film end of the discharge vessel from the outer surface side by generating heat A heat insulating member that is made of a particle sintered body and is provided directly on the outer surface of the region to be heated, that is, the portion corresponding to the reflective film end of the discharge vessel, and warms by maintaining the temperature corresponding to the reflective film end

FIG. 5 is an explanatory diagram showing an example of the configuration of an excimer lamp light irradiation device provided with a heat storage member as an external heating means.
In this excimer lamp light irradiation device, a heat storage member is provided as an external heating means, and a plurality (four in the illustrated example) of excimer lamps 20 are arranged in parallel in the lamp house 10. Other than that, it has the same configuration as the excimer lamp light irradiation device of FIG.
In the example of this figure, the heat storage member has a surface 54 that is anodized, extends in the tube axis direction of the excimer lamp 20, and has a total length similar to the full length of the excimer lamp 20. 53. And two heat storage plate-like bodies 53 for individually heating each of the portions corresponding to the side of the side plate 11B of the lamp house 10 related to the excimer lamps located at both ends of the plurality of excimer lamps 20 are supported. It is fixed and attached by the member 53A. These two heat storage plate-like bodies 53 are inclined with respect to the bottom plate 11A of the lamp house 10, and each of the two ends is arranged so that the surface 54 faces the end portions 42A and 42B through the tube wall of the outer tube 31. The excimer lamp 20 is disposed opposite to the excimer lamp 20.
In addition, the description regarding the structure by which the some excimer lamp 20 is arrange | positioned in the lamp house 10 is mentioned later.

FIG. 6 is an explanatory diagram showing an example of the configuration of an excimer lamp light irradiation device provided with a heat generating member as external heating means.
This excimer lamp light irradiation device has the same configuration as the excimer lamp light irradiation device of FIG. 1 except that a heating member made of a halogen lamp 55 is provided as an external heating means.
In the example of this figure, two halogen lamps (rated power consumption 100w) 55 are provided for individually heating the corresponding portions of the reflecting film end corresponding to each of both ends 42A and 42B of the ultraviolet reflecting film 41. ing. Each of these halogen lamps 55 extends in the tube axis direction of the excimer lamp 20, has the same overall length as that of the excimer lamp 20, and faces the end portions 42 </ b> A and 42 </ b> B through the tube wall of the outer tube 31. Thus, the excimer lamp 20 is disposed so as to face the excimer lamp 20 with a separation distance of 25 mm, for example.

FIG. 7 is an explanatory view showing an example of the configuration of an excimer lamp light irradiation device provided with a heat retaining member as an external heating means.
This excimer lamp light irradiation device is the same as the excimer lamp light irradiation device of FIG. 1 except that a heat retaining member is provided as an external heating means and an oval tube type is used as the excimer lamp. It has the structure of.
In the example of this figure, the heat retaining member is composed of a silica particle sintered body, and is composed of a heat retaining film-like body 57 in which an air layer is formed. The heat retaining film-like body 57 is capable of obtaining heat retaining performance by a heat insulating action by the air layer. The heat insulating film-like body 57 having such a configuration is arranged so that the reflection film end corresponding part corresponding to each of both ends 42A and 42B of the ultraviolet reflection film 41 is individually heated. It is provided directly on the surface.
The oval tube type excimer lamp 60 will be described later.

Further, the excimer lamp light irradiation device may have a configuration in which a plurality of excimer lamps are arranged in parallel in the lamp house 10 as shown in FIG.
In this excimer lamp light irradiation device, as an external heating means, a side surface portion (reflection of the discharge vessel 30) facing the side plate 11B of the lamp house 10 of the excimer lamp 20 disposed at both ends of the plurality of excimer lamps 20. Two heat storage plate-like bodies 53 are provided for individually warming the outer surface of the membrane edge corresponding portion. When a plurality of excimer lamps 20 are arranged close to each other, side surfaces facing the other excimer lamps 20 are emitted from the excimer lamps 20 by the adjacent excimer lamps 20 (specifically, In this case, the portion corresponding to the end of the reflection film of the discharge vessel 30 is sufficiently heated, so that an external heating means is provided between the excimer lamps. There is no need. On the other hand, the distance between the excimer lamps 20 is large, that is, the distance between the excimer lamps 20 adjacent to each other is large, and depending on the light emitted from one excimer lamp 20 adjacent to each other, the side portion of the other excimer lamp 20 In the case where heating is not possible, it is preferable to provide an external heating means 58 between the excimer lamps 20 as shown in FIG. In FIG. 8, as the external heating means 58, a flat stainless steel plate whose surface is black anodized (black anodized) is provided.

Further, as shown in FIGS. 9 to 11, the excimer lamp includes a hollow long discharge vessel 70 hermetically sealed at both ends, and a discharge space S formed inside the discharge vessel 70 has, for example, An oval tube type in which a discharge gas such as xenon gas, a mixed gas of argon gas and chlorine gas is enclosed, and a pair of grid electrodes 74 and 75 are arranged opposite to each other on the outer surface. It may be a thing.
In this excimer lamp 60, the grid electrodes 74 and 75 are formed on the outer surfaces of the pair of long side plates 71A and 71B of the discharge vessel 70 by, for example, paste coating or print printing. The electrode 74 is a ground electrode, and the other grid electrode 75 is a high voltage supply electrode, and is connected to the power supply device 22 composed of a high frequency power source. Further, in the discharge vessel 70, inner surfaces of constituent plates (specifically, the long side plates 71B, 73A, 73B and the short side plate 72) other than the long side plate 71A on which one grid electrode 74 is formed. Further, an ultraviolet reflecting film 41 is formed, and an aperture portion 64 is formed in the long side face plate 71A.

In this excimer lamp 60, a high-frequency voltage controlled to an appropriate size is applied between the grid electrodes 74 and 75 by the power supply device 22 so that the discharge vessel 70 functions as a dielectric and the discharge space S An excimer discharge is generated in the inside, and excimer molecules derived from the discharge gas are formed by the excimer discharge, and vacuum ultraviolet rays are emitted through the lattice-like mesh of the lattice-like electrode 74 in the aperture portion 64 of the excimer lamp 60. The
Here, in the excimer lamp 60, when xenon gas is used as the discharge gas, vacuum ultraviolet light having a peak at a wavelength of 172 nm is obtained, and when a mixed gas of argon gas and chlorine gas is used, the wavelength A vacuum ultraviolet ray having a peak at 175 nm is obtained.

  In the excimer lamp light irradiation apparatus provided with such an excimer lamp 60, the object to be processed is easily attenuated by absorption of vacuum ultraviolet rays by oxygen, so that the excimer lamp is passed through the light irradiation window provided in the lamp house. It will be arranged at a distance of about 3 mm from 60. Therefore, in the excimer lamp 60, it is preferable that the grid-like electrode 74, which is a ground electrode, is disposed so as to face the light irradiation window in order to prevent leakage of an object to be processed that is disposed in close proximity. . In such a case, as shown in the drawing, the ultraviolet reflecting film 41 is formed on the long side face plate 71A so that the aperture part 64 is formed on the long side face plate 71A on which the grid electrode 74 is provided. It is formed on the inner surface relating to the other constituent surface.

  Hereinafter, experimental examples performed for confirming the effects of the present invention will be described.

[Experimental Example 1]
As shown in FIG. 12, an excimer having the same configuration as that of the excimer lamp light irradiating apparatus shown in FIG. 1 except that an excimer lamp 20 is provided in the lamp house 10 and no reflector 51 is provided. A lamp light irradiation device (hereinafter, also referred to as “experimental device (1)”) and an external heating means having the configuration shown in FIG. Excimer lamp light irradiation device (hereinafter, also referred to as “experimental device (2)”) having the same configuration as that of the experimental device (1) was prepared.

In the experimental apparatus (1) and the experimental apparatus (2), the lamp house 10 is made of aluminum and is provided with a light emission window 14 made of synthetic quartz glass. The one filled with xenon gas was used.
The excimer lamp 20 includes an outer tube 31 having an inner diameter of 38 mm and an inner tube 32 having an inner diameter of 26 mm. The excimer lamp 20 includes a discharge vessel 30 made of silica glass having a total length of 200 mm, an outer electrode 34 made of stainless steel, and an aluminum tube. An inner electrode 35 is provided, and the discharge space S is filled with 300 Torr xenon gas as a discharge gas. The inner peripheral surface 31B of the outer tube 31 of the excimer lamp 20 is composed of 80% by mass of silica particles having a particle size distribution of 0.5 to 5 μm and 20% by mass of alumina particles having a particle size distribution of 0.5 to 1 μm. An ultraviolet reflecting film 41 having a thickness of 50 μm is formed.
The excimer lamp 20 is provided at a distance of 35 mm from the light emission window 14 so that the aperture 25 faces the light emission window 14 in the lamp house 10.

In the experimental apparatus (2), a stainless steel plate having a total length of 200 mm was used as the reflecting plate 51.
The reflection plate 51 was disposed so that the distance from the excimer lamp 20 was 25 mm.

The excimer lamp 20 is turned on under the condition of 1 W per 1 cm ³ for each of the experimental device (1) and the experimental device (2) thus produced, and the ultraviolet reflection film in the discharge vessel 30 0.5 hours after the start of lighting. The temperature A of the reflective film forming part where 41 is formed and the temperature B of the reflective film adjacent aperture part adjacent to the reflective film forming part where the ultraviolet reflective film 41 is not formed are made by Japan Sensor Co., Ltd. Using a radiation thermometer (pyrometer), the radiation intensity of light was observed, and the measured value was measured by temperature conversion. Further, the presence or absence of peeling of the end portions 42A and 42B of the ultraviolet reflecting film 41 was visually confirmed. The results are shown in Table 1.
Table 1 also shows the difference between the temperature A and the temperature B calculated based on the measured temperature A and temperature B.
Here, in the experimental device (1) and the experimental device (2), as the temperature A and the temperature B, the discharge vessel is the least susceptible to the influence of the surrounding environment, and a stable temperature measurement value is obtained. The temperature in the vicinity of one end portion 42A of the ultraviolet reflecting film 41 (specifically, the separation distance of 5 mm from the end portion 42A) at the central portion in the tube axis direction of 30 was measured. In the experimental apparatus (2), when measuring the temperature A, a hole 51B was formed in one reflector 51, and the radiation intensity of light was observed from the hole 51B.

[Experimental example 2]
As shown in FIG. 14, a plurality of (three in the example of FIG. 14) excimer lamps 20 are arranged in parallel at a spacing of 40 mm in the lamp house 10, and a heat storage plate-like body 53 is provided. Excimer lamp light irradiation device having the same configuration as the excimer lamp light irradiation device according to FIG. 5 (hereinafter also referred to as “experimental device (3)”), as shown in FIG. Except that two heat storage members composed of a block 59 in which 59A is black anodized are provided as external heating means between each of the excimer lamps 20 located at both ends and the side plate 11B of the lamp house. An excimer lamp light irradiation device (hereinafter also referred to as “experimental device (4)”) having the same configuration as the experimental device (3) was produced.

In the experimental apparatus (3) and the experimental apparatus (4), lamp houses 10 and excimer lamps 20 having the same configuration as the experimental apparatus (1) according to Experimental Example 1 were used.
Further, in the experimental apparatus (4), the block 59 is made of stainless steel, extends in the tube axis direction of the excimer lamp 20, has the same overall length as the excimer lamp 20, and the tube of the excimer lamp 20 A cross section perpendicular to the axial direction is a right-angled isosceles triangle.
The block 59 has a black alumite-treated surface 59A inclined with respect to the bottom plate 11A of the lamp house 10, and the surface 59A is opposed to the end portions 42A and 42B through the tube wall of the outer tube 31, The separation distance between the surface 59A and the excimer lamp 20 was 25 mm.

For each of the experimental apparatus (3) and the experimental apparatus (4) thus produced, an excimer lamp (hereinafter, also referred to as “central lamp”) 20 disposed in the center under the same experimental conditions as in Experimental Example 1. The temperature A of the reflective film forming portion and the temperature B of the aperture adjacent to the reflective film according to each of the excimer lamps 20 (hereinafter also referred to as “end lamps”) 20 arranged at one end are The measurement was performed with a company-made radiation thermometer (pyrometer), and the presence or absence of peeling of the end portions 42A and 42B of the ultraviolet reflecting film 41 was visually confirmed. The results are shown in Table 2.
Table 2 also shows the difference between the temperature A and the temperature B calculated based on the measured temperature A and temperature B.
Here, in the experimental apparatus (4), when measuring the temperature A of the end lamp, a hole 59B was formed in one block 59, and the radiation intensity of light was observed from the hole 59B.

[Experimental Example 3]
As shown in FIG. 16, an excimer lamp 60 is arranged in the lamp house 10, and the configuration similar to that of the excimer lamp light irradiation apparatus according to FIG. 7 is provided except that the heat retaining film 57 is not provided. An excimer lamp light irradiation device (hereinafter, also referred to as “experimental device (5)”), and a heat insulating member having the structure shown in FIG. An excimer lamp light irradiation device (hereinafter also referred to as “experimental device (6)”) having the same configuration as the experimental device (5) except that it was provided as an external heating means was produced.

In the experimental apparatus (5) and the experimental apparatus (6), the lamp house 10 having the same configuration as that of the experimental apparatus (1) according to Experimental Example 1 was used.
The excimer lamp 60 has a total length of 200 mm, the short side plate 72 has a length in the short direction of 34 mm, a length in the short direction of 14 mm, and a discharge vessel 70 made of synthetic silica glass having a thickness of 2 mm. And grid electrodes 74 and 75 made of gold paste are provided, and the discharge space S is filled with 300 Torr xenon gas as a discharge gas. On the inner surface of the excimer lamp 60 other than the long side face plate 71A where the grid-like electrode 74 is formed as a ground electrode, 80% by mass of silica particles having a particle size distribution of 0.5 to 5 μm and a particle size distribution are present. An ultraviolet reflecting film 41 having a thickness of 50 μm and formed of 20% by mass of alumina particles having a thickness of 0.5 to 1 μm is formed.
The excimer lamp 60 is provided at a position where the distance from the light emission window 14 is 35 mm so that the aperture 64 faces the light emission window 14 in the lamp house 10.
In the experimental apparatus (6), a silica particle sintered body is provided on the entire outer surface of the pair of long side plates 73A and 73B as the heat retaining film 57.

About the produced experimental apparatus (5), the temperature A of the reflective film forming part and the temperature B of the reflective film adjacent aperture part were measured under the same experimental conditions as in Experimental Example 1, and a radiation thermometer manufactured by Japan Sensor Co., Ltd. (Pyrometer) and the presence or absence of peeling of the end portions 42A and 42B of the ultraviolet reflecting film 41 was confirmed by visual observation. For the experimental device (6) thus produced, the temperature A of the reflective film forming portion and the temperature B of the reflective film adjacent aperture portion were measured using a thermocouple under the same experimental conditions as in Experimental Example 1. The presence or absence of peeling of the end portions 42A and 42B of the ultraviolet reflecting film 41 was visually confirmed. The results are shown in Table 3.
Table 3 also shows the difference between the temperature A and the temperature B calculated based on the measured temperature A and temperature B.
Here, in the experimental device (6), the measurement of the temperature A and the temperature B is shielded from light by the heat retaining film 57, and therefore a radiation thermometer (pyrometer) cannot be used. The part corresponding to the measurement target portion of one of the heat retaining film-like bodies 54 was shaved and a thermocouple was disposed on the outer surface of the discharge vessel 70. Moreover, since the temperature rises when the thermocouple comes into contact with air, the arranged thermocouple was covered with a film having the same quality as the heat retaining film-like body 57.

[Experimental Example 4]
As shown in FIG. 18, an excimer lamp light irradiation device (hereinafter referred to as a configuration) in which a plurality of (three in the example of FIG. 18) excimer lamps 60 are arranged in parallel at a spacing of 30 mm in the lamp house 10. , Also referred to as “experimental device (7)”), and as shown in FIG. 19, two heat storage members made of a heat storage plate-like body 53 whose surface 54 is black anodized are used as external heating means. Excimer lamp light irradiation device (hereinafter referred to as “experimental device”) having the same configuration as that of the experimental device (7) except that it is provided between each of the excimer lamps 60 located on the side wall 11B and the side plate 11B of the lamp house. (Also referred to as (8) ").

In the experimental apparatus (7) and the experimental apparatus (8), lamp houses 10 and excimer lamps 60 having the same configuration as the experimental apparatus (5) according to Experimental Example 3 were used.
In the experimental apparatus (8), the heat storage plate-like body 53 is made of stainless steel and extends in the tube axis direction of the excimer lamp 60 and has a flat plate shape having the same overall length as the excimer lamp 60. Using.
The heat storage plate-like body 53 is fixed and mounted by a support member 53A, the surface 54 that is black anodized is inclined with respect to the bottom plate 11A of the lamp house 10, and the surface 54 is the discharge vessel 30. While facing the end portions 42A and 42B through the tube wall, the separation distance between the surface 54 and the excimer lamp 60 was set to 25 mm.

About each of the produced experimental apparatus (7) and experimental apparatus (8), it is arrange | positioned on the excimer lamp (center lamp | ramp) 60 arrange | positioned in the center and one edge part on the experimental conditions similar to Experimental example 1. FIG. The temperature A of the reflecting film forming part and the temperature B of the reflecting film adjacent aperture part related to each of the excimer lamps (end lamps) 60 are measured by a radiation thermometer (pyrometer) manufactured by Japan Sensor Co., Ltd. The presence or absence of peeling of the end portion of the ultraviolet reflecting film 41 was visually confirmed. The results are shown in Table 4.
Table 4 also shows the difference between the temperature A and the temperature B calculated based on the measured temperature A and temperature B.
Here, in the experimental device (8), when measuring the temperature A of the end lamp, a hole 53B was formed in the heat storage plate 53, and the radiation intensity of light was observed from the hole 53B.

From the results of the above Experimental Examples 1 to 4, when the difference between the temperature A and the temperature B is 30 to 55 ° C., the ultraviolet reflective film does not peel off, while the difference is 65 to 75. When it was at ° C., it became clear that peeling occurred in the ultraviolet reflecting film. As a result, it was confirmed that the ultraviolet irradiation film can be prevented from being peeled off by setting the difference between the temperature A and the temperature B to 55 ° C. or less in the excimer lamp in the lighting state. In addition, the difference between the temperature A and the temperature B is 55 ° C. or less by using an external heating means comprising either a heating means for heating the outer surface of the reflection film end corresponding portion in the excimer lamp and a heat retaining means for keeping the temperature. It was confirmed that it can be.
Further, based on the results of Experimental Example 2 and Experimental Example 4, when a plurality of excimer lamps are used and are arranged close to each other, it is not necessary to provide an external heating means between the excimer lamps. Was confirmed.

It is the schematic for description which shows an example of a structure of the excimer lamp light irradiation apparatus of this invention. It is sectional drawing of the excimer lamp light irradiation apparatus of FIG. 1, Comprising: It is sectional drawing for description which shows a cross section perpendicular | vertical to the tube axis of the excimer lamp with which the said excimer lamp light irradiation apparatus is equipped. It is explanatory drawing which shows the structure of the excimer lamp with which the excimer lamp light irradiation apparatus of FIG. 1 is equipped. FIG. 4 is an explanatory cross-sectional view showing a cross section perpendicular to the tube axis of the excimer lamp of FIG. 3. It is explanatory drawing which shows the other example of a structure of the excimer lamp light irradiation apparatus of this invention, and shows an example of a structure by which the thermal storage member is provided as an external heating means. The It is explanatory drawing which shows the other example of a structure of the excimer lamp light irradiation apparatus of this invention, and shows an example of a structure provided with a heat generating member as an external heating means. FIG. It is explanatory drawing which shows the other example of a structure of the excimer lamp light irradiation apparatus of this invention, and shows an example of a structure by which a heat retention member is provided as an external heating means. It is explanatory drawing which shows the further another example of a structure of the excimer lamp light irradiation apparatus of this invention. It is the schematic for description which shows the other example of a structure of the excimer lamp used for the excimer lamp light irradiation apparatus of this invention. It is sectional drawing for description which shows the cross section of the tube axis direction of the excimer lamp of FIG. It is sectional drawing for description which shows the AA line cross section of the excimer lamp of FIG. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus used in Experimental example 1. FIG. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus provided with the external heating means used in Experimental example 1. FIG. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus used in Experimental example 2. FIG. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus used in Experimental example 2 provided with the external heating means. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus used in Experimental example 3. FIG. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus used in Experimental example 3 provided with the external heating means. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus used in Experimental example 4. It is explanatory drawing which shows the structure of the excimer lamp light irradiation apparatus provided in the example 4 of an experiment in which the external heating means was provided. It is explanatory drawing which shows an example of a structure of an excimer lamp. It is sectional drawing for description which shows the AA line cross section of the excimer lamp of FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Lamphouse 11A Bottom plate 11B Side plate 14 Light emission window 16 Support member 20 Excimer lamp 22 Power supply device 25 Aperture part 30 Discharge vessel 31 Outer tube 31A Outer surface 31B Inner surface 32 Inner tube 32A Inner surface 32B Outer surface 33 Side wall Part 34, 35 Electrode 41 Ultraviolet reflective film 42A, 42B End 51 Reflective plate 51A Support member 51B Hole 52 Reflective surface 53 Heat storage plate 53A Support member 54 Surface 55 Halogen lamp 57 Thermal insulation film 58 External heating means 59 Block 59A Surface 59B Hole 60 Excimer lamp 64 Aperture part 70 Discharge vessel 71A, 71B Long side plate 72 Short side plate 73A, 73B Long side plate 74, 75 Grid electrode

Claims (8)

An excimer lamp having a discharge vessel made of silica glass having a discharge space, and having a pair of electrodes provided in a state where the silica glass forming the discharge vessel is interposed, generates excimer discharge in the discharge space of the discharge vessel An excimer lamp light irradiation device comprising:
In the excimer lamp, an ultraviolet reflection film made of silica particles is formed on the inner surface of the discharge vessel, and an aperture portion formed of a region where the ultraviolet reflection film of the discharge vessel is not formed is formed. And
In a lamp house comprising a housing having an opening, together with an excimer lamp arranged so that the aperture part faces the opening, a boundary between the aperture part of the ultraviolet reflecting film in the discharge vessel of the excimer lamp is formed. An excimer lamp light irradiation device, characterized in that a heating means or a heat retaining means for warming a portion where the end portion is located from the outer surface side is provided.   2. The excimer lamp light irradiation device according to claim 1, wherein the ultraviolet reflecting film comprises silica particles and alumina particles.   A plurality of excimer lamps are arranged in parallel in the lamp house, and the end of the ultraviolet reflecting film in the discharge vessel facing the side of the lamp house of the excimer lamp arranged at both ends of the plurality of excimer lamps The excimer lamp light irradiation device according to claim 1, wherein a heating unit or a heat retaining unit is provided so as to warm the portion to be positioned.   The excimer lamp light irradiation device according to any one of claims 1 to 3, wherein the heating means is a reflecting plate having a reflecting surface extending in a tube axis direction of the excimer lamp.   The excimer lamp light irradiation device according to any one of claims 1 to 3, wherein the heating means is a heat storage member.   The excimer lamp light irradiation device according to any one of claims 1 to 3, wherein the heating means is an energizing heater.   The excimer lamp light according to any one of claims 1 to 3, wherein the heat retaining means is a heat retaining film provided on an outer surface of a portion of the discharge vessel where the end of the ultraviolet reflecting film is located. Irradiation device.   In the discharge vessel constituting the excimer lamp, the temperature of the reflective film forming part where the ultraviolet reflective film is formed and the temperature of the reflective film adjacent aperture part adjacent to the reflective film forming part and where the ultraviolet reflective film is not formed The excimer lamp light irradiation device according to any one of claims 1 to 7, wherein the difference in temperature is 55 ° C or less.

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