WO2023037853A1 - ペロブスカイト太陽電池 - Google Patents

ペロブスカイト太陽電池 Download PDF

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Publication number
WO2023037853A1
WO2023037853A1 PCT/JP2022/031500 JP2022031500W WO2023037853A1 WO 2023037853 A1 WO2023037853 A1 WO 2023037853A1 JP 2022031500 W JP2022031500 W JP 2022031500W WO 2023037853 A1 WO2023037853 A1 WO 2023037853A1
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Prior art keywords
solar cell
layer
cell element
adhesive layer
edge
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PCT/JP2022/031500
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English (en)
French (fr)
Japanese (ja)
Inventor
梨絵 徳田
豪 高濱
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Enecoat Technologies Co ltd
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Enecoat Technologies Co ltd
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Priority to EP22867175.6A priority Critical patent/EP4401528A4/en
Priority to US18/579,372 priority patent/US20240349524A1/en
Priority to AU2022344664A priority patent/AU2022344664A1/en
Priority to CN202280050067.9A priority patent/CN118140609A/zh
Publication of WO2023037853A1 publication Critical patent/WO2023037853A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/88—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/50—Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/40—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising a p-i-n structure, e.g. having a perovskite absorber between p-type and n-type charge transport layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/50—Photovoltaic [PV] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
    • H10K39/10—Organic photovoltaic [PV] modules; Arrays of single organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Definitions

  • This invention relates to perovskite solar cells.
  • WO2018/052032 describes a structure for sealing the entire side surface of an organic insulating layer covering the entire perovskite solar cell.
  • the organic insulating layer is sealed with a barrier layer.
  • the problem of water entering from the interface between the barrier layer and the transparent electrode has not been solved.
  • One of the purposes of this invention is to provide a highly durable perovskite solar cell.
  • the solar cell described in this specification includes a support, a solar cell element provided on the support, an adhesive layer covering the solar cell element, a sealant layer covering the adhesive layer, and a sealing a sealing portion provided at an edge region of the agent layer and covering the edge region.
  • the solar cell element includes, in this order, an electrode, a photoelectric conversion layer containing a perovskite compound, and a backside electrode.
  • the distance (d1) between the edge of the solar cell element and the edge of the adhesive layer is 0.5 mm or more and 2 cm or less.
  • the distance (d2) between the edge of the adhesive layer and the edge of the sealant layer is 0.2 mm or more and 1 cm or less.
  • the distance (d3) between the edge of the sealant layer and the edge of the sealing portion is 0.5 mm or more and 1.5 cm or less.
  • the above solar cell has an opaque sealing part.
  • perovskite solar cells that can prevent water from entering and have high durability.
  • FIG. 1 is a conceptual diagram showing an example of a cross-sectional view of the solar cell of the present invention.
  • FIG. 2 is a conceptual diagram showing an example of a top view of the solar cell of the present invention.
  • FIG. 3 is a conceptual diagram showing an example of a cross-sectional view of the solar cell of the present invention.
  • FIG. 4 is a conceptual diagram showing an example of a cross-sectional view of the solar cell of the present invention.
  • FIG. 5 is a conceptual diagram showing an example of the structure of a perovskite solar cell element (normal type).
  • FIG. 6 is a conceptual diagram showing an example of the structure of a perovskite solar cell element (reverse type).
  • FIG. 1 is a conceptual diagram showing an example of a cross-sectional view of the solar cell of the present invention.
  • FIG. 2 is a conceptual diagram showing an example of a top view of the solar cell of the present invention.
  • FIG. 3 is a conceptual diagram showing an example of a cross-section
  • FIG. 7 is a conceptual diagram showing a cross-sectional view of a solar cell of an experimental example.
  • FIG. 8 is a conceptual diagram showing a top view of the solar cell of the experimental example.
  • FIG. 9 is a conceptual diagram showing an example of a cross-sectional view of a solar cell in an experimental example.
  • FIG. 10 is a conceptual diagram showing an example of a cross-sectional view of a solar cell in an experimental example.
  • the first invention relates to solar cells. 1, 3, and 4 are cross-sectional views of the solar cell, and FIG. 2 is a conceptual diagram showing the top view of the solar cell shown in FIG.
  • the solar cells 1, 2, and 3 include first supports 11, 21, and 31, (perovskite) solar cell elements 12, 22, and 32, and an adhesive layer 13. , 23, 33, sealant layers (body portions) 14, 24, 34 covering the entire adhesive layers, and sealing portions 15, 25, 35.
  • first supports 11, 21, and 31, (perovskite) solar cell elements 12, 22, and 32 and an adhesive layer 13. , 23, 33, sealant layers (body portions) 14, 24, 34 covering the entire adhesive layers, and sealing portions 15, 25, 35.
  • substrates for organic solar cells and organic EL devices can be appropriately used.
  • substrates include glass, plastic plates, plastic films, and inorganic crystals.
  • Substrates having at least one film selected from a metal film, a semiconductor film, a conductive film and an insulating film formed on part or all of these surfaces can also be suitably used.
  • the support is a flexible substrate.
  • a solar cell device means a device having a function of receiving light such as sunlight to generate electricity.
  • the solar cell element preferably has a shape in which a perovskite layer (light absorption layer/photoelectric conversion layer) is sandwiched between an electron transport layer and a hole transport layer.
  • the perovskite layer is preferably a perovskite layer made of an organic-inorganic hybrid compound.
  • FIG. 5 a regular structure in which an electron transport layer 46, a perovskite layer 47, a hole transport layer 48, and a backside electrode 49 are formed from the transparent electrode 40 side may be used.
  • any reverse type structure in which a hole transport layer 58, a perovskite layer 57, an electron transport layer 56, and a back electrode 59 are formed from the transparent electrode 50 side may be used.
  • the electrode is preferably a transparent electrode in order to transmit light.
  • the transparent electrode is a layer that serves as a support for the electron transport layer and also has the function of extracting electrons from the perovskite layer (light absorption layer/photoelectric conversion layer). Electrodes are formed on supports 11 , 21 , 31 .
  • the transparent electrode is formed of a conductor, and specific examples thereof include a tin-doped indium oxide (ITO) film, an impurity-doped indium oxide (In 2 O 3 ) film, an impurity-doped zinc oxide (ZnO) film, and a fluorine-doped film.
  • ITO tin-doped indium oxide
  • In 2 O 3 impurity-doped indium oxide
  • ZnO impurity-doped zinc oxide
  • a tin dioxide (FTO) film, a laminated film formed by laminating these films, gold, silver, copper, aluminum, tungsten, titanium, chromium, nickel, cobalt, and the like can be used. These may be used singly or as a mixture of two or more, and may be a single layer or a laminate. These films may, for example, function as diffusion barrier layers.
  • the thickness of these electrodes is not particularly limited, and it is usually preferable to adjust the sheet resistance to 5 to 15 ⁇ / ⁇ (per unit area).
  • the electrodes can be obtained by a known film forming method depending on the material to be formed. Further, these electrodes may be formed in a film shape or in a lattice shape such as a mesh shape.
  • a known method is used for forming the electrode on the support, and vacuum film formation such as vacuum deposition or sputtering is preferred.
  • a patterned transparent electrode may be used, and examples thereof include a method of immersion in a laser or an etching solution, and a method of patterning using a mask during vacuum film formation. In the present invention, any method may be used. It doesn't matter if there is.
  • Electron-transporting layers 46 and 56 are preferably electron-transporting semiconductors such as titanium, tin, zinc, iron, tungsten, zirconium, indium, cerium, yttrium, aluminum, magnesium, vanadium, oxides of niobium, cadmium, zinc, and lead. , silver, antimony, bismuth sulfide, cadmium, lead selenide, cadmium telluride, etc. Among these, oxides are particularly preferred. Among them, zinc oxide, tin oxide and titanium oxide are particularly preferred.
  • the electron transport layer may be a single layer or multiple layers, and in the case of multiple layers, it may have a porous shape in which semiconductor fine particles having different particle diameters are coated in multiple layers.
  • the particle size of the semiconductor fine particles is preferably 3 to 100 nm, more preferably 5 to 70 nm.
  • the film thickness is preferably 5-1000 nm, more preferably 10-500 nm.
  • the electron transport layer There are no particular restrictions on the method of forming the electron transport layer. Either vacuum film formation such as sputtering or ion plating or wet film formation such as sol-gel may be used.
  • the hole transport layers 48 and 58 are layers having a function of transporting charges.
  • a conductor, a semiconductor, an organic hole transport material, or the like can be used for the hole transport layer.
  • the material can function as a hole transport material that accepts holes from the perovskite layer (light absorbing layer) and transports the holes.
  • the conductors and semiconductors include compound semiconductors containing monovalent copper such as CuI, CuInSe 2 and CuS ; compounds containing metals. Among them, a semiconductor containing monovalent copper is preferable, and CuI is more preferable, from the viewpoint of receiving only holes more efficiently and obtaining higher hole mobility.
  • organic hole transport materials include polythiophene derivatives such as poly-3-hexylthiophene (P3HT) and polyethylenedioxythiophene (PEDOT); fluorene derivatives such as -p-methoxyphenylamine)-9,9′-spirobifluorene (Spiro-OMeTAD); carbazole derivatives such as polyvinylcarbazole; poly[bis(4-phenyl)(2,4,6-trimethylphenyl ) amine] (PTAA) and other triphenylamine derivatives; diphenylamine derivatives; polysilane derivatives; and polyaniline derivatives.
  • polythiophene derivatives such as poly-3-hexylthiophene (P3HT) and polyethylenedioxythiophene (PEDOT); fluorene derivatives such as -p-methoxyphenylamine)-9,9′-spirobifluorene (Spiro-OMeTAD); carbazole derivatives such as poly
  • triphenylamine derivatives, fluorene derivatives, and the like are preferable, and PTAA, Spiro-OMeTAD, and the like are more preferable, from the viewpoint of receiving only holes more efficiently and obtaining higher hole mobility.
  • Lithium bis(trifluoromethylsulfonyl)imide LiTFSI
  • silver bis(trifluoromethylsulfonyl)imide silver bis(trifluoromethylsulfonyl)imide, trifluoromethylsulfonyloxysilver , NOSbF6, SbCl5, SbF5, tris(2-(1H-pyrazol-1-yl)-4-tert-butylpyridine) cobalt (III) tri[bis(trifluoromethane)sulfonimide] and other oxidizing agents.
  • the hole transport layer may also contain basic compounds such as t-butylpyridine (TBP), 2-picoline, 2,6-lutidine and the like. The contents of the oxidizing agent and the basic compound can be conventionally used amounts.
  • the film thickness of the hole transport layer is preferably 50 to 800 nm, more preferably 100 to 600 nm, from the viewpoint of receiving only holes more efficiently and obtaining higher hole mobility.
  • a method for forming the hole transport layer is not particularly limited, and can be carried out according to a known method. For example, wet film formation such as dipping, spraying, spin coating, and blade coating, and vacuum film formation such as sputtering may be used.
  • Perovskite layer (light absorption layer/photoelectric conversion layer) 47, 57 The perovskite layers (light absorption layer/photoelectric conversion layer) 47 and 57 are layers that perform photoelectric conversion by absorbing light and moving excited electrons and holes.
  • the perovskite compound in the present invention is preferably a composite material of an organic compound and an inorganic compound.
  • the perovskite compound preferably has a layered perovskite structure in which layers of metal halide and layers of organic cation molecules are alternately laminated, and is represented by the following general formula (1).
  • X is a halogen atom
  • Y is an alkylamine compound
  • M is at least one metal ion selected from lead, tin, indium, antimony, and bismuth
  • ⁇ : ⁇ : ⁇ The ratio is 3:1:1 and ⁇ and ⁇ represent integers greater than one.
  • X can include halogen atoms such as chlorine, bromine and iodine, and these can be used singly or as a mixture.
  • Y can include alkylamine compounds such as methylamine, ethylamine, n-butylamine and formamidine.
  • the flatness of the perovskite layer is preferably 50 nm or less (-25 nm to +25 nm) in the horizontal direction of the surface measured by a scanning electron microscope, and the height difference is 40 nm or less ( ⁇ 20 nm to +20 nm). This makes it easier to balance the light absorption efficiency and the exciton diffusion length, and further improves the absorption efficiency of the light reflected by the electrode.
  • An example of the method for forming a perovskite layer is a one-step deposition in which a solution in which metal halides and alkylamine halides are dissolved or dispersed in a solvent is coated on the electron-transporting layer or hole-transporting layer and dried.
  • method, or a two-step deposition in which a solvent in which metal halides are dissolved or dispersed is coated on the electron-transporting layer or hole-transporting layer, dried, and then immersed in a solution of halogenated alkylamines in a solvent. law, etc.
  • the one-step precipitation method it is possible to add a solvent that does not dissolve the perovskite compound before the complete coating to promote crystallization at once.
  • a solution in which a halogenated amine compound is dissolved may be applied on the perovskite layer.
  • the halogenated amine compound used at this time include phenylethylamine bromide, phenylethylamine iodide, n-hexyltrimethylamine bromide, n-octadecylamine iodide, and 5-ammonium iodide valeric acid. They may be used singly or in combination of two or more.
  • Back electrodes 49, 59 Examples of the back electrodes 49 and 59 include metals such as platinum, gold, silver, copper, aluminum, rhodium, nickel, cobalt, iron, palladium, and indium; carbon-based compounds such as graphite, graphene, and carbon nanotubes; Conductive metal oxides such as doped zinc oxide (IZO) and antimony-doped tin oxide (ATO), or conductive polymers such as polythiophene or polyaniline, may be used alone or in combination of two or more. do not have.
  • the back electrode may be a transparent electrode.
  • the film thickness of the back electrode is not particularly limited, and may be a single film of the above-mentioned materials, or a mixed or laminated film of two or more of them.
  • the back electrode can be formed on the hole transport layer by coating, lamination, vacuum deposition, CVD, bonding, or the like depending on the type of material used and the type of the hole transport layer.
  • the adhesive layer is a layer covering the solar cell element.
  • the adhesive layer may cover the entire solar cell element or may cover a portion of the solar cell element.
  • the adhesive layer is a layer that is placed between the support and the sealant layer (body portion).
  • the adhesive layer is used for adhering the support and the encapsulant layer, as well as adhering the support-like solar cell element and the encapsulant layer.
  • the adhesive layer covers the entire solar cell element, it also has a function of sealing the solar cell element.
  • the material of the adhesive is not particularly limited and can be appropriately selected according to the purpose. For example, cured products of acrylic resins and epoxy resins can be used.
  • Any known material can be used as the cured acrylic resin, as long as it is a cured monomer or oligomer having an acrylic group in the molecule. Any known material can be used as long as it is a cured monomer or oligomer having a group.
  • Epoxy resins include water-dispersed, solvent-free, solid, heat-curing, curing agent mixed, and ultraviolet-curing types. Among these, heat-curing and ultraviolet-curing types are preferred, and ultraviolet-curing types are more preferred. preferable. It should be noted that it is possible to perform heating even in the case of an ultraviolet curing type, and it is preferable to perform heating even after ultraviolet curing.
  • Specific examples of epoxy resins include bisphenol A type, bisphenol F type, novolac type, cycloaliphatic type, long-chain aliphatic type, glycidylamine type, glycidyl ether type, glycidyl ester type, and the like. may be used together, or two or more of them may be used in combination.
  • Epoxy resin compositions that are already commercially available can be used in the present invention.
  • epoxy resin compositions that have been developed and marketed for use in solar cells and organic EL devices, and can be used particularly effectively in the present invention.
  • Commercially available epoxy resin compositions include, for example, TB3118, TB3114, TB3124, TB3125F (manufactured by Three Bond Co., Ltd.), World Rock 5910, World Rock 5920, World Rock 8723 (manufactured by Kyoritsu Chemical Sangyo Co., Ltd.), WB90US (P) ( manufactured by MORESCO Corporation) and the like.
  • the curing agent is not particularly limited and can be appropriately selected depending on the intended purpose. Examples thereof include amine-based, acid anhydride-based, polyamide-based and other curing agents.
  • Amine curing agents include aliphatic polyamines such as diethylenetriamine and triethylenetetramine, and aromatic polyamines such as metaphenylenediamine, diaminodiphenylmethane, and diaminodiphenylsulfone.
  • Acid anhydride curing agents include phthalic anhydride.
  • curing agents include imidazoles and polymercaptans. These may be used alone or in combination of two or more.
  • the additive is not particularly limited and can be appropriately selected according to the purpose. , plasticizers, coloring agents, flame retardant aids, antioxidants, organic solvents, and the like. Among these, fillers, gap agents, curing accelerators, polymerization initiators, and desiccants (hygroscopic agents) are preferred, and fillers and polymerization initiators are more preferred.
  • a filler as an additive, it suppresses the infiltration of moisture and oxygen, further reduces volume shrinkage during curing, reduces outgassing during curing or heating, improves mechanical strength, and thermal conductivity and the control of fluidity can be obtained. Therefore, including a filler as an additive is very effective in maintaining stable output in various environments. Additives may be added to the sealant layer or the sealing portion.
  • the output characteristics and durability of the solar cell element not only the effects of intruding moisture and oxygen but also the effects of outgassing generated during curing or heating of the sealing member cannot be ignored.
  • the effect of outgassing generated during heating has a large effect on output characteristics in high-temperature environment storage.
  • fillers, gap agents, and drying agents in the adhesive layer, the sealant layer, and the sealing part these themselves can suppress the infiltration of moisture and oxygen, and the amount of adhesive and sealant used can be reduced, it is possible to obtain the effect of reducing outgassing.
  • Incorporating a filler, a gap agent, or a desiccant into the adhesive layer, the sealant layer, and the sealing portion is effective not only during curing but also during storage of the solar cell element in a high-temperature environment.
  • the filler is not particularly limited and can be appropriately selected depending on the purpose. Examples include crystalline or amorphous silica, silicate minerals such as talc, alumina, aluminum nitride, silicon nitride, calcium silicate, Examples include inorganic fillers such as calcium carbonate. Among these, hydrotalcite is particularly preferred. Moreover, these may be used alone or in combination of two or more.
  • the average primary particle size of the filler is preferably 0.1 ⁇ m or more and 10 ⁇ m or less, more preferably 1 ⁇ m or more and 5 ⁇ m or less.
  • the average primary particle size of the filler is within the above preferable range, the effect of suppressing the penetration of moisture and oxygen can be sufficiently obtained, the viscosity becomes appropriate, and the adhesion to the substrate and defoaming properties are improved. It is also effective for controlling the width of the sealing portion and for workability.
  • the content of the filler is preferably 10 parts by mass or more and 90 parts by mass or less, more preferably 20 parts by mass or more and 70 parts by mass or less with respect to the entire adhesive layer (100 parts by mass).
  • the content of the filler is within the above preferable range, the effect of suppressing penetration of moisture and oxygen is sufficiently obtained, the viscosity becomes appropriate, and the adhesion and workability become good.
  • Gap agents are also called gap control agents or spacer agents.
  • the gap material As an additive, it becomes possible to control the gap of the sealing portion. For example, when an adhesive layer is applied on the first substrate or the first electrode, and the second substrate is placed on top of it for sealing, the adhesive layer or the sealing material layer does not absorb the gap agent. By mixing, the gap of the sealing portion is made uniform in size of the gap agent, so that the gap of the sealing portion can be easily controlled.
  • the gap agent is not particularly limited as long as it is granular, has a uniform particle size, and has high solvent resistance and heat resistance, and can be appropriately selected according to the purpose. As the gap agent, one having a high affinity with the epoxy resin and having a spherical particle shape is preferable.
  • the particle diameter of the gap agent can be selected according to the gap of the sealing portion to be set, but is preferably 1 ⁇ m or more and 100 ⁇ m or less, more preferably 5 ⁇ m or more and 50 ⁇ m or less.
  • the polymerization initiator is not particularly limited as long as it initiates polymerization using heat or light, and can be appropriately selected according to the purpose. Examples include thermal polymerization initiators and photopolymerization initiators. be done. Thermal polymerization initiators are compounds that generate active species such as radicals and cations by heating, and azo compounds such as 2,2'-azobisbutyronitrile (AIBN) and benzoyl peroxide (BPO) Examples include peroxides. A benzenesulfonic acid ester, an alkylsulfonium salt, or the like is used as the thermal cationic polymerization initiator.
  • thermal polymerization initiators are compounds that generate active species such as radicals and cations by heating, and azo compounds such as 2,2'-azobisbutyronitrile (AIBN) and benzoyl peroxide (BPO) Examples include peroxides. A benzenesulfonic acid ester, an alkylsulfonium salt, or the like is used as the
  • a photocationic polymerization initiator is preferably used in the case of an epoxy resin.
  • a photocationic polymerization initiator is mixed with an epoxy resin and irradiated with light, the photocationic polymerization initiator decomposes to generate acid, which causes the epoxy resin to polymerize and the curing reaction proceeds.
  • Photocationic polymerization initiators have effects such as little volume shrinkage during curing, no oxygen inhibition, and high storage stability.
  • photocationic polymerization initiators include aromatic diazonium salts, aromatic iodonium salts, aromatic sulfonium salts, metacelone compounds, and silanol/aluminum complexes.
  • a photoacid generator having a function of generating an acid upon irradiation with light can also be used.
  • the photoacid generator acts as an acid that initiates cationic polymerization, and includes ionic sulfonium salt-based and iodonium salt-based onium salts composed of a cationic part and an anionic part. These may be used alone or in combination of two or more.
  • the amount of the polymerization initiator added may vary depending on the material used, but is preferably 0.5 parts by mass or more and 10 parts by mass or less, and 1 part by mass or more and 5 parts by mass with respect to the entire sealing member (100 parts by mass). Part or less is more preferable.
  • the amount of addition is within the above preferred range, curing proceeds appropriately, the amount of uncured material remaining can be reduced, and excessive outgassing can be prevented.
  • a desiccant (also called a moisture absorber) is a material that has the function of physically or chemically absorbing moisture. can be reduced.
  • the desiccant is not particularly limited and can be appropriately selected depending on the purpose. Examples include inorganic water-absorbing materials such as silica gel, molecular sieves, and zeolites. Among these, zeolite is preferable because it absorbs a large amount of moisture. These may be used alone or in combination of two or more.
  • Curing accelerators are materials that increase the curing rate and are mainly used in thermosetting epoxy resins.
  • the curing accelerator is not particularly limited and can be appropriately selected depending on the purpose.
  • tertiary amines or tertiary amine salts such as diazabicyclo(4,3,0)-nonene-5
  • imidazoles such as 1-cyanoethyl-2-ethyl-4-methylimidazole and 2-ethyl-4-methylimidazole
  • Phosphines such as triphenylphosphine and tetraphenylphosphonium/tetraphenylborate
  • phosphonium salts are included. These may be used alone or in combination of two or more.
  • the coupling agent is not particularly limited as long as it is a material that has the effect of increasing the molecular bond strength, and can be appropriately selected according to the purpose.
  • Examples thereof include silane coupling agents. Specifically, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, N-phenyl- ⁇ -aminopropyltrimethoxysilane, N-(2-aminoethyl)3-aminopropylmethyldimethoxysilane, N-(2-aminoethyl)3-aminopropylmethyltrimethoxysilane, 3-aminopropyltrimethoxysilane Silane cups such as ethoxysilane, 3-mercaptopropyltrimethoxysilane, vinyltri
  • a sheet adhesive can be used in the present invention.
  • the sheet adhesive is a sheet on which a resin layer is formed in advance, and the sheet can be made of glass or a film having a high gas barrier property. Alternatively, the sheet may be formed only of resin. It is also possible to stick a sheet-like adhesive onto the sealing film. It is also possible to form a structure in which a hollow portion is provided on the sealing film and then bond it to the device.
  • the distance (d1) between the edge of the solar cell element and the edge of the adhesive layer is preferably 0.5 mm or more and 2 cm or less.
  • the edge of the solar cell element means the outer part of the solar cell element. For example, if the solar cell element is square, the edges of the square constitute the ends of the solar cell element.
  • the edge of the adhesive layer means the outermost edge of the adhesive layer.
  • d1 means the closest distance between the edge of the solar cell element and the end of the adhesive layer (the edge on the side opposite to the solar cell element).
  • d1 is preferably 1 mm or more, preferably 2 mm or more. However, d1 may be appropriately adjusted according to the size of the solar cell element. When the solar cell element is a square and the length of the long side is l, d1 may be 0.01 l or more and 0.5 l or less, or 0.05 l or more and 0.2 l or less. may be
  • the encapsulant layer (body portion) is formed to cover the adhesive layer and means a layer for preventing water or the like from entering the solar cell element. In this specification, it is described as a sealant layer or a main body part in order to distinguish it from the sealing part.
  • the encapsulant layer preferably covers the solar cell element and the adhesive layer.
  • the sealant layer is arranged to face the support so as to sandwich the solar cell element including the photoelectric conversion layer and the electrodes.
  • the sealant layer may be composed of a sealant film.
  • the shape, structure, size and type (material) of the sealant layer are not particularly limited and can be appropriately selected according to the purpose.
  • the sealant layer may be thin or film-like.
  • the material that constitutes the sealant layer may be the same as that of the adhesive layer.
  • Another example of the material for the sealant layer is the one in which a barrier layer is formed on the surface of the resin base material to prevent the passage of moisture and oxygen, and the barrier layer is formed on one or both sides of the base material.
  • the material of the resin substrate is not particularly limited, but for example, polyolefin resins such as homopolymers or copolymers such as ethylene, propylene and butene; amorphous polyolefin resins such as cyclic polyolefin; Polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN); polyamide resins such as nylon 6, nylon 66, nylon 12 and copolymerized nylon; ethylene-vinyl acetate copolymer partial hydrolyzate (EVOH) , polyimide resins, polyetherimide resins, polysulfone resins, polyether sulfone resins, polyether ether ketone resins, polycarbonate resins, polyvinyl butyral resins, polyarylate resins, fluorine resins, acrylic resins, A decomposable resin and the like are included.
  • polyolefin resins such as homopolymers or copolymers such as ethylene, propylene
  • polyester resins are preferred, and polyethylene terephthalate (PET) and polyethylene naphthalate (PEN) are particularly preferred.
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • the resin base material may be made of one kind of resin material, or may be made of two or more kinds of resin materials.
  • the resin base material may contain other materials such as inorganic fillers in order to improve the durability of the solar cell module.
  • the inorganic filler is not particularly limited, but examples include silica, mica, talc, clay, bentonite, montmorillonite, kaolinite, wollastonite, calcium carbonate, titanium oxide, alumina, barium sulfate, potassium titanate, glass fiber, etc. is mentioned.
  • one type of inorganic filler may be mixed in the resin base material, or two or more types may be used.
  • the barrier layer is mainly composed of metal oxides, metals, mixtures of polymers and metal alkoxides, and examples thereof include aluminum oxide, silicon oxide, and aluminum.
  • Metal alkoxides include tetraethoxysilane, triisopropoxyaluminum, 3-glycidoxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-isocyanate Propyltriethoxysilane and the like can be mentioned.
  • the barrier layer may be transparent or opaque. Moreover, the barrier layer may be a single layer formed by combining the above materials, or may be a layered structure of a plurality of layers. Known methods can be used to form the barrier layer, and coating methods such as vacuum film formation such as sputtering, dipping, roll coating, screen printing, spraying, and gravure printing can be used. can.
  • the thickness of the sealing agent layer main body may be within the range generally used in this technology. For example, it can be appropriately set within the range of 0.05 to 1 mm.
  • the sealant layer preferably covers the entire adhesive layer. Furthermore, the sealant layer is preferably made larger than the adhesive layer in order to prevent water and oxygen from entering.
  • the distance (d2) between the edge of the adhesive layer and the edge of the sealant layer is preferably 0.2 mm or more and 1 cm or less.
  • the ends of the adhesive layer are as previously described.
  • the edge of the encapsulant layer means the outermost edge of the encapsulant layer.
  • the distance between the edge of the adhesive layer and the edge of the sealant layer means the distance that minimizes the distance between the edge of the adhesive layer and the edge of the sealant layer.
  • d2 is preferably 0.5 mm or more, more preferably 1 mm or more.
  • the upper limit varies depending on the size and application of the solar cell, but if it is too large, the solar cell (device) itself will be too large, and the parts other than the solar cell element will be too large and wasteful. is preferred, 5 mm or less is preferred, and 4 mm or less is more preferred.
  • the sealing portions 15, 25, and 35 are portions provided in the end regions of the sealant layer to cover the end regions.
  • the edge region of the encapsulant layer means the outer peripheral portion of the encapsulant layer.
  • the sealing portion is a portion provided to more firmly shield the outer peripheral portion of the sealant layer from water and oxygen.
  • the encapsulant is constructed separately from the encapsulant layer.
  • the material of the sealant the same material as the sealant layer may be used, or the same material as the adhesive may be used.
  • the shape of the sealing portion is not particularly limited. An example of the shape of the sealing portion is that which is installed so as to cover the contact point between the end portion of the sealing agent layer and the support.
  • a known method such as coating can be used depending on the material.
  • the sealing portion overlaps and protrudes from the upper portion of the sealing agent layer, and the sealing portion may be as large as possible in order to prevent moisture and oxygen from entering.
  • the width of the sealing portion (the distance from the center of the solar cell element toward the outside) is preferably 2 mm or more, more preferably 3 mm or more. Also, it may be 3 cm or less, 2 cm or less, 1.5 cm or less, or 5 mm or less.
  • the distance (d3) between the end of the sealant layer and the end of the sealing portion is preferably 0.5 mm or more and 1.5 cm or less.
  • the ends of the sealant layer are as previously described.
  • the end portion of the sealing portion means an edge portion of the sealing portion on the outer side (the side opposite to the solar cell element side).
  • the distance between the edge of the sealing agent layer and the edge of the sealing portion means the closest distance between the edge of the sealing agent layer and the edge of the sealing portion.
  • d3 is preferably 1 mm or more, more preferably 1.5 mm or more, so as to prevent moisture and oxygen from entering, and to adhere tightly to the sealant body and prevent peeling.
  • the solar cell (device) becomes too large, or if the portion other than the solar cell element becomes too large, it may cause waste. .
  • the sealing portion opaque, because it is easy to distinguish from the sealing agent layer (main body portion).
  • the method of making opaque in this way is not particularly limited, but includes a method of containing a filler that can be used in the adhesive layer or the sealant layer (main body), or a known pigment or dye. be done.
  • the cross-sectional shape of the sealing portion is rounded.
  • the cross-sectional shape of the sealing portion may be a flat shape parallel to the support.
  • the thickness of the sealing portion may be equal to or less than the thickness of the sealing agent layer.
  • a glass substrate with ITO 25 mm ⁇ 24.5 mm, Geomatec was soaked in 2-propanol, acetone, Semico Clean 56 (display cleaning liquid, product name, product of Furuuchi Chemical Co., Ltd.), water, and 2-propanol in that order for 15 minutes each. Ultrasonic cleaning and then plasma treatment were performed.
  • 300 ⁇ L of a water-soluble SnO 2 colloidal solution (15% SnO 2 colloidal solution diluted 1:1 with pure water and passed through a PTFE filter) was dropped onto the substrate and spin-coated (3000 rpm, 20 seconds), and dried by heating at 150° C. for 30 minutes.
  • This substrate was moved to a glove box, and CsI, MABr (methylammonium bromide, CH5N.HBr), PbBr 2 , PbI 2 , FAI (formamidine hydroiodide, CH4N2.HI) was added as a perovskite precursor solution. , and a mixed solvent of DMF and DMSO (volume ratio 10:3) to prepare a solution with a concentration of 1.05M. After filtering this solution using a PTFE filter, apply 190 ⁇ L onto the above substrate on which the electron transport layer is formed, spin coat (1000 rpm for 10 seconds with a slope of 1 second, and 3000 rpm for 20 seconds with a slope of 5 seconds).
  • a one-liquid type epoxy adhesive (Nagase Chemtex UV Resin XNR5516Z-B1) was applied to the outer periphery of this film by screen printing, and cured by UV irradiation to form a sealing portion, as shown in Fig. 1.
  • a solar cell device was fabricated. The width of the sealing portion was 3.3 mm (same width in length and width), d1 was 2.0 mm, d2 was 0.3 mm, and d3 was 1.0 mm.
  • the solar cell characteristics of this solar cell device were measured using a solar simulator (SM-250PV manufactured by Spectroscopy Instruments Co., Ltd., light intensity: 100 mW/cm 2 ).
  • a solar cell device was produced in the same manner as in Example 1, except that the sealing resin was not provided on the outer periphery of the film, and the solar cell characteristics were evaluated. As a result, an open-circuit voltage of 1.10 V, a short-circuit current density of 22.0 mA/cm 2 , a form factor of 0.72, and a conversion efficiency of 17.4% were confirmed. Next, a durability test was performed in a constant temperature and high humidity chamber in the same manner as in Example 1, and when the retention rate after 500 hours was measured, the result was 42%. It was clear that
  • first layer an adhesive layer having the same size as the part where the element was formed on the perovskite solar cell element in Example 1
  • the upper part was covered with a sealant layer (first layer)
  • An adhesive layer was formed so as to cover the entire top again with the same adhesive (second layer), and the upper portion was further covered with the same sealing agent layer as the first layer (second layer).
  • a sealing material was applied to the outer periphery of the second layer and cured in the same manner as in Example 1 to fabricate a solar cell device as shown in FIG.
  • the width of the sealing portion was 3.4 mm (same width in length and width), and d1 was 1.9 mm, d2 was 0.4 mm, and d3 was 1.1 mm.
  • an adhesive layer (first layer) having the same size as the part where the element was formed and an encapsulant layer (first layer) were formed thereon, and was again covered with the same adhesive (second layer), and the upper portion was further covered with the same sealant layer as the first layer (second layer).
  • a sealing material was applied to the outer periphery of the film of the second layer and cured to produce a solar cell device as shown in FIG.
  • the width of the sealing portion was 3.9 mm (same width in length and width), d1 was 2.0 mm, d2 was 0.7 mm, and d3 was 1.2 mm.
  • a solar cell device was produced in the same manner as in Example 2, except that the sealing resin was not provided on the outer periphery of the film, and the solar cell characteristics were evaluated. As a result, an open-circuit voltage of 1.09 V, a short-circuit current density of 22.0 mA/cm 2 , a form factor of 0.72, and a conversion efficiency of 17.3%, which are equivalent to those of Example 2, were confirmed. Next, a durability test was conducted in a constant temperature and high humidity chamber in the same manner as in Example 1, and when the retention rate after 500 hours was measured, the result was 51%. It was clear that [Experimental example 3]
  • a solar cell device was produced in the same manner as in Example 3, except that the sealing resin was not provided on the outer periphery of the film, and the solar cell characteristics were evaluated. As a result, an open-circuit voltage of 1.10 V, a short-circuit current density of 22.0 mA/cm 2 , a form factor of 0.71, and a conversion efficiency of 17.2% were confirmed. Next, a durability test was conducted in a constant temperature and high humidity chamber in the same manner as in Example 1, and when the retention rate after 500 hours was measured, the result was 48%. It was clear that
  • a solar cell was manufactured in the same manner as in Example 1, except that carbon black was mixed in the sealing portion.
  • the sealing part became black, and the sealing part was formed, and it was possible to firmly grasp the state of covering the end of the sealing layer without gaps.
  • This invention can be used in fields such as solar cells.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photovoltaic Devices (AREA)
PCT/JP2022/031500 2021-09-07 2022-08-22 ペロブスカイト太陽電池 Ceased WO2023037853A1 (ja)

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EP22867175.6A EP4401528A4 (en) 2021-09-07 2022-08-22 PEROVSKITE SOLAR CELL
US18/579,372 US20240349524A1 (en) 2021-09-07 2022-08-22 Perovskite solar cell
AU2022344664A AU2022344664A1 (en) 2021-09-07 2022-08-22 Perovskite solar cell
CN202280050067.9A CN118140609A (zh) 2021-09-07 2022-08-22 钙钛矿太阳能电池

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024211896A3 (en) * 2023-04-07 2025-04-03 Alliance For Sustainable Energy, Llc Bilayer electrodes for perovskite solar cells
WO2025148538A1 (zh) * 2024-01-08 2025-07-17 西安天交新能源有限公司 一种钙钛矿太阳能电池组件的封装结构及其应用
WO2025197889A1 (ja) * 2024-03-22 2025-09-25 マクセル株式会社 ボタン形電池
WO2025241459A1 (zh) * 2024-05-24 2025-11-27 西安天交新能源有限公司 一种钙钛矿光伏组件及其制备方法和应用

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025062932A1 (ja) * 2023-09-22 2025-03-27 富士フイルム株式会社 太陽電池の製造方法
JP2026003986A (ja) * 2024-06-25 2026-01-14 株式会社アイシン 太陽電池モジュール

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009252361A (ja) * 2008-04-01 2009-10-29 Nippon Hoso Kyokai <Nhk> 保護膜及び保護膜の製造方法
JP2010024364A (ja) * 2008-07-22 2010-02-04 Denki Kagaku Kogyo Kk 樹脂組成物
JP2012190612A (ja) * 2011-03-09 2012-10-04 Sekisui Chem Co Ltd 有機光デバイスの製造方法
JP2015153583A (ja) * 2014-02-13 2015-08-24 パイオニア株式会社 発光装置
WO2018052032A1 (ja) 2016-09-14 2018-03-22 積水化学工業株式会社 フレキシブル太陽電池
WO2019006507A1 (en) * 2017-07-04 2019-01-10 Newsouth Innovations Pty Limited THIN FILM PHOTOVOLTAIC DEVICE AND ITS ENCAPSULATION METHOD

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3287647B2 (ja) * 1992-06-08 2002-06-04 鐘淵化学工業株式会社 太陽電池モジュール
US20090090412A1 (en) * 2005-12-22 2009-04-09 Hermann Calwer Photovoltaic device and method for encapsulating
JP5270987B2 (ja) * 2008-07-15 2013-08-21 株式会社ニチベイ 電動ブラインドのモータ装置
JP2010087339A (ja) * 2008-10-01 2010-04-15 Fujifilm Corp 有機太陽電池素子
WO2010150759A1 (ja) * 2009-06-24 2010-12-29 三菱化学株式会社 有機電子デバイス及びその製造方法
JP5785618B2 (ja) * 2011-08-24 2015-09-30 株式会社フジクラ 電子機器
US8829507B2 (en) * 2012-12-06 2014-09-09 General Electric Company Sealed organic opto-electronic devices and related methods of manufacturing
JP2014192188A (ja) * 2013-03-26 2014-10-06 Rohm Co Ltd 有機薄膜太陽電池およびその製造方法、および電子機器
JP6047525B2 (ja) * 2013-07-31 2016-12-21 富士フイルム株式会社 光電変換素子および太陽電池
KR20170079877A (ko) * 2015-12-31 2017-07-10 주식회사 동진쎄미켐 접착필름의 봉지 기술을 이용한 유기전자소자 및 이의 제조 방법
US20210082634A1 (en) * 2018-02-14 2021-03-18 Lg Electronics Inc. Solar cell module comprising perovskite solar cell and manufacturing method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009252361A (ja) * 2008-04-01 2009-10-29 Nippon Hoso Kyokai <Nhk> 保護膜及び保護膜の製造方法
JP2010024364A (ja) * 2008-07-22 2010-02-04 Denki Kagaku Kogyo Kk 樹脂組成物
JP2012190612A (ja) * 2011-03-09 2012-10-04 Sekisui Chem Co Ltd 有機光デバイスの製造方法
JP2015153583A (ja) * 2014-02-13 2015-08-24 パイオニア株式会社 発光装置
WO2018052032A1 (ja) 2016-09-14 2018-03-22 積水化学工業株式会社 フレキシブル太陽電池
WO2019006507A1 (en) * 2017-07-04 2019-01-10 Newsouth Innovations Pty Limited THIN FILM PHOTOVOLTAIC DEVICE AND ITS ENCAPSULATION METHOD

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP4401528A4

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024211896A3 (en) * 2023-04-07 2025-04-03 Alliance For Sustainable Energy, Llc Bilayer electrodes for perovskite solar cells
WO2025148538A1 (zh) * 2024-01-08 2025-07-17 西安天交新能源有限公司 一种钙钛矿太阳能电池组件的封装结构及其应用
WO2025197889A1 (ja) * 2024-03-22 2025-09-25 マクセル株式会社 ボタン形電池
WO2025241459A1 (zh) * 2024-05-24 2025-11-27 西安天交新能源有限公司 一种钙钛矿光伏组件及其制备方法和应用

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