WO2023026678A1 - 治具基板およびティーチング方法 - Google Patents
治具基板およびティーチング方法 Download PDFInfo
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/03—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring coordinates of points
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
- G01B21/045—Correction of measurements
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
Definitions
- the EFEM 15 is arranged facing the VTM 11a.
- the EFEM 15 is a rectangular parallelepiped, equipped with an FFU (Fan Filter Unit), and is an atmospheric transfer chamber maintained in an atmospheric pressure atmosphere.
- Two LLMs 14 are connected to one side surface along the longitudinal direction of the EFEM 15 .
- Four load ports (LP: Load Port) 16 are connected to the other longitudinal side of the EFEM 15 .
- a FOUP (Front-Opening Unified Pod) (not shown), which is a container that accommodates a plurality of wafers, is mounted on the LP 16 .
- An aligner 17 and an MTB (Mapping temporary buffer) 18 are connected to one lateral side of the EFEM 15 .
- a robot arm 150 is also arranged in the EFEM 15 .
- the substrate processing system 1 has a control device 100 .
- the control device 100 is, for example, a computer, and includes a CPU (Central Processing Unit), RAM (Random Access Memory), ROM (Read Only Memory), auxiliary storage device, and the like.
- the CPU operates based on programs stored in the ROM or auxiliary storage device, and controls the operation of each component of the substrate processing system 1 .
- FIG. 6 is a cross-sectional view showing an example of detecting the center of the fork.
- FIG. 7 is a top view showing an example of detecting the center of the fork.
- the fork 120 or the fork 151 is moved to the mounting table 140 as indicated by an arrow 121. and the jig wafer 200 to the touch position.
- FIG. 9 is a diagram showing an example of the orientation of the prism and a captured image.
- the prism 203a2 is rotated from the x-axis of the jig wafer 200, so the captured image 220 is also rotated.
- the captured image 220 captures the mark 122 and includes two circular points of the mark 122 .
- the information processing device 300 performs circular edge detection to calculate the point-to-point distance 122a between the center coordinates of the two points. Note that the point-to-point distance can be similarly calculated for the marks 152 as well.
- the operator makes advance preparations such as mechanical adjustments such as horizontal adjustment and height adjustment, setting of the FOUP storing the jig wafer 200, and selection of teaching points (step S1).
- advance preparations such as mechanical adjustments such as horizontal adjustment and height adjustment, setting of the FOUP storing the jig wafer 200, and selection of teaching points (step S1).
- mechanical adjustments such as horizontal adjustment and height adjustment
- setting of the FOUP storing the jig wafer 200 setting of the FOUP storing the jig wafer 200
- selection of teaching points step S1
- FIG. 25 is a flowchart showing an example of LP teaching processing.
- FIG. 26 is a diagram showing an example of tentative determination of the Z position for the slots of the FOUP.
- FIG. 27 is a diagram showing an example of imaging by a jig wafer in a slot. 28 is a diagram showing an example of the positional relationship between the jig wafer and the forks in FIG. 27.
- FIG. 25 is a flowchart showing an example of LP teaching processing.
- FIG. 26 is a diagram showing an example of tentative determination of the Z position for the slots of the FOUP.
- FIG. 27 is a diagram showing an example of imaging by a jig wafer in a slot.
- 28 is a diagram showing an example of the positional relationship between the jig wafer and the forks in FIG. 27.
- the information processing device 300 When the information processing device 300 receives from the control device 100 that the fork 151 has moved to the imaging position, it instructs the jig wafer 200 to perform imaging. As shown in FIG. 28, jig wafer 200 captures images of marks 152 on forks 151 with its own first cameras 202a and 202b. At this time, the notch 206 of the jig wafer 200 is on the root side of the fork 151 . The jig wafer 200 transmits the captured image data to the information processing device 300 (step S224). The information processing device 300 calculates the amount of deviation of the XYZ axes based on the received imaging data, and transmits it to the control device 100 (step S225).
- the information processing device 300 When the information processing device 300 receives from the control device 100 that the fork 151 has moved to the imaging position, it instructs the jig wafer 200 to perform imaging. As shown in FIG. 32, jig wafer 200 captures images of marks 152 on forks 151 with its own first cameras 202a and 202b. At this time, the notch 206 of the jig wafer 200 is on the root side of the fork 151 . Further, the teeth of the fork 151 and the rotary stage 17a are positioned so as not to interfere with each other. The jig wafer 200 transmits the captured image data to the information processing device 300 (step S248).
- FIG. 34 and 35 are flowcharts showing an example of the LLM teaching process for the EFEM robot.
- FIG. 36 is a diagram illustrating an example of probe mapping for LLM dogs.
- FIG. 37 is a diagram showing an example of imaging by a jig wafer above the mounting table of the LLM.
- 38 is a diagram showing an example of the positional relationship between the jig wafer and the mounting table in FIG. 37.
- the information processing device 300 instructs the robot arm 150 via the control device 100 to place the jig wafer 200 from the FOUP onto the aligner 17 .
- the robot arm 150 acquires the jig wafer 200 from the FOUP with the fork 151 (step S264).
- the robot arm 150 moves to the aligner 17 and places the jig wafer 200 on the fork 151 on the rotary stage 17a of the aligner 17 (step S265).
- the controller 100 rotates the rotary stage 17a of the aligner 17 to orient the notch 206 of the jig wafer 200 toward the base of the fork 151 (step S266).
- the robot arm 150 acquires the jig wafer 200 placed on the rotating stage 17a of the aligner 17 with the fork 151 and moves it to the LLM 14 to be taught (step S267). As shown in FIG. 37, the robot arm 150 moves the jig wafer 200 mounted on the fork 151 to an imaging position above the mounting table 140 of the LLM 14 . At this time, the height 261 from the upper surface of the mounting table 140 to the lower surface of the jig wafer 200 is adjusted to a predetermined value. Further, the jig wafer 200 confirms that the fork 151 is stationary based on the data from the motion sensor 212, and then transmits information to the information processing device 300 indicating that the movement to the imaging position has been completed. good too.
- the information processing device 300 When the information processing device 300 receives from the control device 100 that the fork 151 has moved to the imaging position, it instructs the jig wafer 200 to perform imaging. As shown in FIG. 41, jig wafer 200 captures images of marks 152 of fork 151 positioned between mounting table 140 and jig wafer 200 with first cameras 202a and 202b of jig wafer 200, respectively. At this time, the notch 206 of the jig wafer 200 is on the root side of the fork 151 . The jig wafer 200 transmits the captured image data to the information processing device 300 (step S275).
- the information processing device 300 executes teaching processing for the vacuum transfer robot #1 in the vacuum transfer chamber (VTM) 11a (step S3).
- VTM vacuum transfer chamber
- FIG. 42 is a flow chart showing an example of the teaching process for the vacuum transfer robot #1.
- the control device 100 checks whether the received deviation amount is within a preset allowable range (step S320). As a result of confirming the amount of deviation, the control device 100 determines whether or not adjustment is necessary (step S321). When the control device 100 determines that adjustment is necessary (step S321: Yes), it adjusts the position of the fork 120 based on the amount of deviation (step S322), and proceeds to step S323. That is, the control device 100 corrects the transfer position data of the forks 120 in the LLM 14 . On the other hand, when the control device 100 determines that the adjustment is not necessary (step S321: No), the process proceeds to step S323 without performing the adjustment.
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Abstract
Description
図1は、本開示の一実施形態における基板処理システムの一例を示す横断平面図である。図1に示す基板処理システム1は、枚葉でウエハ(例えば、半導体ウエハ。)にプラズマ処理等の各種処理を施すことが可能な基板処理システムである。
図2は、本開示の一実施形態における基板処理システムのティーチング時の構成の一例を示す図である。図2に示すように、基板処理システム1の搬送機構をティーチングする場合には、治具ウエハ200と、情報処理装置300とを基板処理システム1の制御装置100に接続する。
続いて、治具ウエハ200について説明する。なお、以下の説明では、VTM11a,11b、PM13、LLM14およびEFEM15といったモジュールを基準とした座標をXYZ軸で表し、治具ウエハ200を基準とした座標をxy軸で表す。
次に、本実施形態の基板処理システム1のティーチング時の動作について説明する。図17は、本実施形態におけるティーチング処理の一例を示すフローチャートである。なお、以下の説明において、基板処理システム1の各構成要素の動作は、制御装置100によって制御され、ティーチングは、情報処理装置300によって制御される。また、本実施形態におけるティーチング処理は、大気圧、室温環境で実行する。
上記した実施形態では、治具ウエハ200の第1のカメラ202および第2のカメラ204は、プリズム203a,205aを介して、治具ウエハ200の下方向を撮像するように配置したが、これに限定されない。例えば、プリズムまたは鏡を組み合わせて、上下方向を撮像可能としてもよく、この場合について、図55を用いて説明する。図55は、変形例における治具ウエハと撮像画像の一例を示す図である。
5 ロボット制御装置
10 処理システム本体
11a,11b 真空搬送室(VTM)
12a,12b,150 ロボットアーム
13 プロセスモジュール(PM)
14 ロードロックモジュール(LLM)
15 EFEM
16 ロードポート(LP)
17 アライナ
17a 回転ステージ
18a,130,140 載置台
19 パス
20 ドグ
100 制御装置
120,151 フォーク
122,152 マーク
131,141 リフトピン
190 パスステージ
200 治具ウエハ
202 第1のカメラ
203a,205a プリズム
204 第2のカメラ
210 制御部
211 通信部
212 モーションセンサ
213 バッテリ
223 穴
232 エッジ
300 情報処理装置
Claims (18)
- 搬送機構のティーチング方法に用いる治具基板であって、
前記搬送機構のフォークの位置を検出するための第1の画像データを撮像する第1のカメラと、
基板を載置する載置台の位置を検出するための第2の画像データを撮像する第2のカメラと、
を有する治具基板。 - 前記第1のカメラは、検出した前記フォークの位置に基づいて、前記載置台に載置された前記基板に対する前記フォークの位置を調整するための前記第1の画像データを撮像する、
請求項1に記載の治具基板。 - 前記第1の画像データは、前記フォークに設けられた位置検出用のマークを含む、
請求項2に記載の治具基板。 - 前記第1のカメラは、前記載置台に載置された前記治具基板を、前記載置台から持ち上げるリフトピンで持ち上げた状態で、前記治具基板と前記載置台との間に位置する前記フォークの前記マークを含む前記第1の画像データを撮像する、
請求項3に記載の治具基板。 - 前記第1のカメラは、前記フォークのZ軸方向の位置を調整するための前記第1の画像データを撮像する、
請求項2~4のいずれか1つに記載の治具基板。 - 前記第2のカメラは、検出した前記載置台の位置に基づいて、前記載置台に対する前記フォークの位置を調整するための前記第2の画像データを撮像する、
請求項1~5のいずれか1つに記載の治具基板。 - 前記第2の画像データは、前記載置台の位置を検出するための前記載置台の端部を含む、
請求項6に記載の治具基板。 - 前記第2のカメラは、前記フォークのX軸およびY軸方向の位置を調整するための前記第2の画像データを撮像する、
請求項6または7に記載の治具基板。 - 前記第1のカメラおよび前記第2のカメラは、それぞれ複数個である、
請求項1~8のいずれか1つに記載の治具基板。 - さらに、前記第1の画像データまたは前記第2の画像データを撮像する際に、前記治具基板の静止状態を検出するモーションセンサを有する、
請求項1~9のいずれか1つに記載の治具基板。 - 搬送機構のティーチング方法であって、
支持体に支持された治具基板の下部に、前記搬送機構のフォークを移動する工程と、
前記治具基板に設けられた第1のカメラで、前記フォークに設けられた位置検出用のマークを含む第1の画像データを撮像する工程と、
前記第1の画像データに基づいて、前記フォークの移動先の位置を決定する工程と、
決定した前記フォークの移動先の位置に基づいて、前記フォークの搬送位置データを補正する工程と、
を有するティーチング方法。 - 前記決定する工程は、前記マークに基づいて、前記フォークの移動先のX軸およびY軸方向の位置を決定する、
請求項11に記載のティーチング方法。 - 前記決定する工程は、前記マークに基づいて、前記フォークの移動先のZ軸方向の位置を決定する、
請求項11または12に記載のティーチング方法。 - さらに、基板を載置する載置台の上部に、前記治具基板を載置した前記フォークを移動する工程と、
前記治具基板に設けられた第2のカメラで、前記載置台の端部、または、前記載置台に設けられたマークを含む第2の画像データを撮像する工程と、
前記第2の画像データに基づいて、前記載置台に対する前記フォークの位置を決定する工程と、
決定した前記載置台に対する前記フォークの位置に基づいて、前記フォークの搬送位置データを補正する工程と、
を有する請求項11~13のいずれか1つに記載のティーチング方法。 - 前記載置台に対する前記フォークの位置を決定する工程は、前記端部または前記マークに基づいて、前記フォークのX軸およびY軸方向の位置を決定する、
請求項14に記載のティーチング方法。 - 前記載置台は、ロードロックモジュールまたはプロセスモジュールの載置台である、
請求項14または15に記載のティーチング方法。 - さらに、前記治具基板を載置した前記フォークを移動する工程の後に、前記治具基板に設けられた前記治具基板の静止状態を検出するモーションセンサのデータに基づいて、前記治具基板の静止状態を判定し、静止状態であると判定した場合、前記第2の画像データの撮像を指示する工程、
を有する請求項14~16のいずれか1つに記載のティーチング方法。 - 前記支持体は、ロードポートに載置された前記基板を収納する容器内のスロット、アライナの回転ステージ、載置台から基板を持ち上げるリフトピン、または、パスのステージである、
請求項11~17のいずれか1つに記載のティーチング方法。
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002307348A (ja) * | 2001-04-13 | 2002-10-23 | Yaskawa Electric Corp | ウェハ搬送用ロボットの教示方法および教示用プレート |
JP2003218186A (ja) * | 2002-01-22 | 2003-07-31 | Tokyo Electron Ltd | 基板搬送装置における基板の受け渡し位置検知方法及びその教示装置 |
JP2004050306A (ja) * | 2002-07-17 | 2004-02-19 | Yaskawa Electric Corp | 搬送用ロボットシステムおよび搬送用ロボットの制御方法 |
JP2008304612A (ja) * | 2007-06-06 | 2008-12-18 | Sharp Corp | 基板搬送装置および基板搬送方法 |
JP2009184069A (ja) * | 2008-02-06 | 2009-08-20 | Tokyo Seimitsu Co Ltd | ウエハ搬送装置及びその調整方法 |
JP2014038929A (ja) * | 2012-08-15 | 2014-02-27 | Disco Abrasive Syst Ltd | インラインシステム |
JP2016025293A (ja) * | 2014-07-24 | 2016-02-08 | 株式会社Screenホールディングス | 基板保持検査方法および基板処理装置 |
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002307348A (ja) * | 2001-04-13 | 2002-10-23 | Yaskawa Electric Corp | ウェハ搬送用ロボットの教示方法および教示用プレート |
JP2003218186A (ja) * | 2002-01-22 | 2003-07-31 | Tokyo Electron Ltd | 基板搬送装置における基板の受け渡し位置検知方法及びその教示装置 |
JP2004050306A (ja) * | 2002-07-17 | 2004-02-19 | Yaskawa Electric Corp | 搬送用ロボットシステムおよび搬送用ロボットの制御方法 |
JP2008304612A (ja) * | 2007-06-06 | 2008-12-18 | Sharp Corp | 基板搬送装置および基板搬送方法 |
JP2009184069A (ja) * | 2008-02-06 | 2009-08-20 | Tokyo Seimitsu Co Ltd | ウエハ搬送装置及びその調整方法 |
JP2014038929A (ja) * | 2012-08-15 | 2014-02-27 | Disco Abrasive Syst Ltd | インラインシステム |
JP2016025293A (ja) * | 2014-07-24 | 2016-02-08 | 株式会社Screenホールディングス | 基板保持検査方法および基板処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20220130651A1 (en) * | 2020-10-23 | 2022-04-28 | Tokyo Electron Limited | Processing system and processing method |
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