WO2023021986A1 - Composition photosensible, substrat de filtres colorés, capteur d'empreintes et dispositif d'affichage - Google Patents
Composition photosensible, substrat de filtres colorés, capteur d'empreintes et dispositif d'affichage Download PDFInfo
- Publication number
- WO2023021986A1 WO2023021986A1 PCT/JP2022/029742 JP2022029742W WO2023021986A1 WO 2023021986 A1 WO2023021986 A1 WO 2023021986A1 JP 2022029742 W JP2022029742 W JP 2022029742W WO 2023021986 A1 WO2023021986 A1 WO 2023021986A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photosensitive composition
- mass
- alkali
- tricyclodecanyl
- skeleton
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 121
- 239000000758 substrate Substances 0.000 title claims abstract description 90
- 229920005989 resin Polymers 0.000 claims abstract description 71
- 239000011347 resin Substances 0.000 claims abstract description 71
- 239000007787 solid Substances 0.000 claims abstract description 54
- 150000001875 compounds Chemical class 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 33
- 238000004040 coloring Methods 0.000 claims abstract description 23
- 230000008859 change Effects 0.000 claims abstract description 20
- 239000003960 organic solvent Substances 0.000 claims abstract description 20
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 16
- 239000003999 initiator Substances 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 abstract description 24
- 238000000576 coating method Methods 0.000 abstract description 24
- 239000010408 film Substances 0.000 description 49
- 239000000243 solution Substances 0.000 description 27
- 239000000975 dye Substances 0.000 description 25
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 24
- 239000002253 acid Substances 0.000 description 23
- -1 acrylate phthalate anhydride Chemical class 0.000 description 23
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 20
- 239000000049 pigment Substances 0.000 description 19
- 230000014759 maintenance of location Effects 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 17
- 239000004973 liquid crystal related substance Substances 0.000 description 16
- 239000002270 dispersing agent Substances 0.000 description 14
- 239000011521 glass Substances 0.000 description 13
- 239000003086 colorant Substances 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 10
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 229920000178 Acrylic resin Polymers 0.000 description 8
- 239000004925 Acrylic resin Substances 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 239000003112 inhibitor Substances 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000012860 organic pigment Substances 0.000 description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- SJEYSFABYSGQBG-UHFFFAOYSA-M Patent blue Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C(=CC(=CC=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 SJEYSFABYSGQBG-UHFFFAOYSA-M 0.000 description 3
- 239000004962 Polyamide-imide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000980 acid dye Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000000981 basic dye Substances 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 125000001246 bromo group Chemical group Br* 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000000982 direct dye Substances 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 239000001023 inorganic pigment Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000003504 photosensitizing agent Substances 0.000 description 3
- 229920002312 polyamide-imide Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- YLLIGHVCTUPGEH-UHFFFAOYSA-M potassium;ethanol;hydroxide Chemical compound [OH-].[K+].CCO YLLIGHVCTUPGEH-UHFFFAOYSA-M 0.000 description 3
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical class C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 2
- 238000005084 2D-nuclear magnetic resonance Methods 0.000 description 2
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 2
- MXLMTQWGSQIYOW-UHFFFAOYSA-N 3-methyl-2-butanol Chemical compound CC(C)C(C)O MXLMTQWGSQIYOW-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 2
- 150000008062 acetophenones Chemical class 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- CUFNKYGDVFVPHO-UHFFFAOYSA-N azulene Chemical compound C1=CC=CC2=CC=CC2=C1 CUFNKYGDVFVPHO-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 150000008366 benzophenones Chemical class 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000003919 heteronuclear multiple bond coherence Methods 0.000 description 2
- 238000003929 heteronuclear multiple quantum coherence Methods 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 150000002500 ions Chemical group 0.000 description 2
- XAOGXQMKWQFZEM-UHFFFAOYSA-N isoamyl propanoate Chemical compound CCC(=O)OCCC(C)C XAOGXQMKWQFZEM-UHFFFAOYSA-N 0.000 description 2
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 238000000816 matrix-assisted laser desorption--ionisation Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000002953 preparative HPLC Methods 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 2
- JIAFOCJABIEPNM-BYPYZUCNSA-N (2s)-2-(3-sulfanylpropanoylamino)propanoic acid Chemical compound OC(=O)[C@H](C)NC(=O)CCS JIAFOCJABIEPNM-BYPYZUCNSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- PAEWNKLGPBBWNM-UHFFFAOYSA-N 1,3,5-tris[2-(3-sulfanylbutoxy)ethyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC(S)CCOCCN1C(=O)N(CCOCCC(C)S)C(=O)N(CCOCCC(C)S)C1=O PAEWNKLGPBBWNM-UHFFFAOYSA-N 0.000 description 1
- OXFSTTJBVAAALW-UHFFFAOYSA-N 1,3-dihydroimidazole-2-thione Chemical compound SC1=NC=CN1 OXFSTTJBVAAALW-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 description 1
- FETFXNFGOYOOSP-UHFFFAOYSA-N 1-sulfanylpropan-2-ol Chemical compound CC(O)CS FETFXNFGOYOOSP-UHFFFAOYSA-N 0.000 description 1
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 1
- BGJQNPIOBWKQAW-UHFFFAOYSA-N 1-tert-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)(C)C BGJQNPIOBWKQAW-UHFFFAOYSA-N 0.000 description 1
- IMQFZQVZKBIPCQ-UHFFFAOYSA-N 2,2-bis(3-sulfanylpropanoyloxymethyl)butyl 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(CC)(COC(=O)CCS)COC(=O)CCS IMQFZQVZKBIPCQ-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- KPYPNTLKDIYIKB-UHFFFAOYSA-N 2,3-dichloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(Cl)C(Cl)=C2 KPYPNTLKDIYIKB-UHFFFAOYSA-N 0.000 description 1
- CLDZVCMRASJQFO-UHFFFAOYSA-N 2,5-bis(2,4,4-trimethylpentan-2-yl)benzene-1,4-diol Chemical compound CC(C)(C)CC(C)(C)C1=CC(O)=C(C(C)(C)CC(C)(C)C)C=C1O CLDZVCMRASJQFO-UHFFFAOYSA-N 0.000 description 1
- ZHUWKKIRCLKYNJ-UHFFFAOYSA-N 2,5-bis(2-methylpentan-2-yl)benzene-1,4-diol Chemical compound CCCC(C)(C)C1=CC(O)=C(C(C)(C)CCC)C=C1O ZHUWKKIRCLKYNJ-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- QRHHZFRCJDAUNA-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound C1=CC(OC)=CC=C1C1=NC(C(Cl)(Cl)Cl)=NC(C(Cl)(Cl)Cl)=N1 QRHHZFRCJDAUNA-UHFFFAOYSA-N 0.000 description 1
- RUVCUGBDGGLOMZ-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptan-3-yl)ethylsilane Chemical compound C1C(CC[SiH3])CCC2OC21 RUVCUGBDGGLOMZ-UHFFFAOYSA-N 0.000 description 1
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 description 1
- HQLKZWRSOHTERR-UHFFFAOYSA-N 2-Ethylbutyl acetate Chemical compound CCC(CC)COC(C)=O HQLKZWRSOHTERR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- QZABVGGYTYCKKN-UHFFFAOYSA-N 2-[1-(2-hydroxyethyl)imidazol-2-yl]acetic acid Chemical compound OCCN1C=CN=C1CC(O)=O QZABVGGYTYCKKN-UHFFFAOYSA-N 0.000 description 1
- NQXNYVAALXGLQT-UHFFFAOYSA-N 2-[4-[9-[4-(2-hydroxyethoxy)phenyl]fluoren-9-yl]phenoxy]ethanol Chemical compound C1=CC(OCCO)=CC=C1C1(C=2C=CC(OCCO)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 NQXNYVAALXGLQT-UHFFFAOYSA-N 0.000 description 1
- UGIJCMNGQCUTPI-UHFFFAOYSA-N 2-aminoethyl prop-2-enoate Chemical compound NCCOC(=O)C=C UGIJCMNGQCUTPI-UHFFFAOYSA-N 0.000 description 1
- GWIAAIUASRVOIA-UHFFFAOYSA-N 2-aminonaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(N)=CC=C21 GWIAAIUASRVOIA-UHFFFAOYSA-N 0.000 description 1
- YQZHOBBQNFBTJE-UHFFFAOYSA-N 2-chloro-3-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(Cl)=C2 YQZHOBBQNFBTJE-UHFFFAOYSA-N 0.000 description 1
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- WOYWLLHHWAMFCB-UHFFFAOYSA-N 2-ethylhexyl acetate Chemical compound CCCCC(CC)COC(C)=O WOYWLLHHWAMFCB-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- RXZZSDCLSLACNC-UHFFFAOYSA-N 2-iodoethanesulfonic acid Chemical compound OS(=O)(=O)CCI RXZZSDCLSLACNC-UHFFFAOYSA-N 0.000 description 1
- QSECPQCFCWVBKM-UHFFFAOYSA-N 2-iodoethanol Chemical compound OCCI QSECPQCFCWVBKM-UHFFFAOYSA-N 0.000 description 1
- KZLYQYPURWXOEW-UHFFFAOYSA-N 2-iodopropanoic acid Chemical compound CC(I)C(O)=O KZLYQYPURWXOEW-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- 229940006193 2-mercaptoethanesulfonic acid Drugs 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 1
- NTZCFGZBDDCNHI-UHFFFAOYSA-N 2-phenylanthracene-9,10-dione Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 NTZCFGZBDDCNHI-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- WYKHFQKONWMWQM-UHFFFAOYSA-N 2-sulfanylidene-1h-pyridine-3-carboxylic acid Chemical compound OC(=O)C1=CC=CN=C1S WYKHFQKONWMWQM-UHFFFAOYSA-N 0.000 description 1
- VMKYTRPNOVFCGZ-UHFFFAOYSA-N 2-sulfanylphenol Chemical compound OC1=CC=CC=C1S VMKYTRPNOVFCGZ-UHFFFAOYSA-N 0.000 description 1
- GQISFOQRBXOSTM-UHFFFAOYSA-N 3-(2-sulfanylethylamino)propanoic acid Chemical compound OC(=O)CCNCCS GQISFOQRBXOSTM-UHFFFAOYSA-N 0.000 description 1
- MJQWABQELVFQJL-UHFFFAOYSA-N 3-Mercapto-2-butanol Chemical compound CC(O)C(C)S MJQWABQELVFQJL-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- MARYDOMJDFATPK-UHFFFAOYSA-N 3-hydroxy-1h-pyridine-2-thione Chemical compound OC1=CC=CN=C1S MARYDOMJDFATPK-UHFFFAOYSA-N 0.000 description 1
- WLTPHPWPIJQBCE-UHFFFAOYSA-N 3-iodopropane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCI WLTPHPWPIJQBCE-UHFFFAOYSA-N 0.000 description 1
- OBDVFOBWBHMJDG-UHFFFAOYSA-N 3-mercapto-1-propanesulfonic acid Chemical compound OS(=O)(=O)CCCS OBDVFOBWBHMJDG-UHFFFAOYSA-N 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- RQPNXPWEGVCPCX-UHFFFAOYSA-N 3-sulfanylbutanoic acid Chemical compound CC(S)CC(O)=O RQPNXPWEGVCPCX-UHFFFAOYSA-N 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- LABQKWYHWCYABU-UHFFFAOYSA-N 4-(3-sulfanylbutanoyloxy)butyl 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCCCCOC(=O)CC(C)S LABQKWYHWCYABU-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- BVFUUJNISLPELF-UHFFFAOYSA-N 4-oxo-4-(2-sulfanylethylamino)butanoic acid Chemical compound OC(=O)CCC(=O)NCCS BVFUUJNISLPELF-UHFFFAOYSA-N 0.000 description 1
- ISOQNEPBGIJCLU-UHFFFAOYSA-N 4-sulfanylbutane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCCS ISOQNEPBGIJCLU-UHFFFAOYSA-N 0.000 description 1
- RCGDVGLQQHGPAU-UHFFFAOYSA-N 7-methyloctan-4-yl acetate Chemical compound CCCC(OC(C)=O)CCC(C)C RCGDVGLQQHGPAU-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 101000876606 Homo sapiens Putative uncharacterized protein encoded by ERC2-IT1 Proteins 0.000 description 1
- 101000614399 Homo sapiens Serine/threonine-protein phosphatase 2A regulatory subunit B'' subunit beta Proteins 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 102100035223 Putative uncharacterized protein encoded by ERC2-IT1 Human genes 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 102100040471 Serine/threonine-protein phosphatase 2A regulatory subunit B'' subunit beta Human genes 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- YTGJWQPHMWSCST-UHFFFAOYSA-N Tiopronin Chemical compound CC(S)C(=O)NCC(O)=O YTGJWQPHMWSCST-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 101100463786 Zea mays PG14 gene Proteins 0.000 description 1
- SEEVRZDUPHZSOX-UHFFFAOYSA-N [1-[9-ethyl-6-(2-methylbenzoyl)carbazol-3-yl]ethylideneamino] acetate Chemical compound C=1C=C2N(CC)C3=CC=C(C(C)=NOC(C)=O)C=C3C2=CC=1C(=O)C1=CC=CC=C1C SEEVRZDUPHZSOX-UHFFFAOYSA-N 0.000 description 1
- JOBBTVPTPXRUBP-UHFFFAOYSA-N [3-(3-sulfanylpropanoyloxy)-2,2-bis(3-sulfanylpropanoyloxymethyl)propyl] 3-sulfanylpropanoate Chemical compound SCCC(=O)OCC(COC(=O)CCS)(COC(=O)CCS)COC(=O)CCS JOBBTVPTPXRUBP-UHFFFAOYSA-N 0.000 description 1
- ARNIZPSLPHFDED-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 ARNIZPSLPHFDED-UHFFFAOYSA-N 0.000 description 1
- LOCXTTRLSIDGPS-UHFFFAOYSA-N [[1-oxo-1-(4-phenylsulfanylphenyl)octan-2-ylidene]amino] benzoate Chemical compound C=1C=C(SC=2C=CC=CC=2)C=CC=1C(=O)C(CCCCCC)=NOC(=O)C1=CC=CC=C1 LOCXTTRLSIDGPS-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000005358 alkali aluminosilicate glass Substances 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- BTBJBAZGXNKLQC-UHFFFAOYSA-N ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 1
- 229940063953 ammonium lauryl sulfate Drugs 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- LHMRXAIRPKSGDE-UHFFFAOYSA-N benzo[a]anthracene-7,12-dione Chemical compound C1=CC2=CC=CC=C2C2=C1C(=O)C1=CC=CC=C1C2=O LHMRXAIRPKSGDE-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000001045 blue dye Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- ZNEWHQLOPFWXOF-UHFFFAOYSA-N coenzyme M Chemical compound OS(=O)(=O)CCS ZNEWHQLOPFWXOF-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- KOMDZQSPRDYARS-UHFFFAOYSA-N cyclopenta-1,3-diene titanium Chemical compound [Ti].C1C=CC=C1.C1C=CC=C1 KOMDZQSPRDYARS-UHFFFAOYSA-N 0.000 description 1
- UFULAYFCSOUIOV-UHFFFAOYSA-N cysteamine Chemical compound NCCS UFULAYFCSOUIOV-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000001002 diarylmethane dye Substances 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 description 1
- SYELZBGXAIXKHU-UHFFFAOYSA-N dodecyldimethylamine N-oxide Chemical compound CCCCCCCCCCCC[N+](C)(C)[O-] SYELZBGXAIXKHU-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 239000000040 green colorant Substances 0.000 description 1
- 239000001046 green dye Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- JDNTWHVOXJZDSN-UHFFFAOYSA-N iodoacetic acid Chemical compound OC(=O)CI JDNTWHVOXJZDSN-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229960003151 mercaptamine Drugs 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- 239000000983 mordant dye Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000001047 purple dye Substances 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000001062 red colorant Substances 0.000 description 1
- 239000001044 red dye Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000001587 sorbitan monostearate Substances 0.000 description 1
- 229940035048 sorbitan monostearate Drugs 0.000 description 1
- 235000011076 sorbitan monostearate Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012916 structural analysis Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001060 yellow colorant Substances 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Definitions
- the present invention relates to a photosensitive composition, a color filter substrate, a fingerprint sensor and a display device.
- Liquid crystal display devices are used in various applications such as televisions, laptop computers, personal digital assistants, smartphones, digital cameras, etc., taking advantage of their characteristics such as lightness, thinness, and low power consumption. Liquid crystal display devices are required to have three to six optimum colors depending on the application, and color filter substrates are used to provide various color performances.
- a color filter substrate is generally manufactured by applying a photosensitive composition to the substrate with a slit coater when forming colored pixels, drying, and then exposing, developing, and baking the composition.
- a photosensitive composition is known as photosensitive compositions for color filters (see, for example, Patent Documents 1 and 2). These photosensitive compositions are applied onto a substrate and then exposed and developed using a photolithography mask to form a pattern into a desired shape.
- a pattern with a desired shape can be formed at a desired position by adjusting the positional relationship between the substrate and the photolithography mask.
- an alignment mark previously formed on the substrate with a colored composition or the like is used as a reference.
- the above-mentioned photosensitive composition has low shape retention on the substrate, so even if the alignment mark is observed from above the substrate using a camera, , there was a problem that the position could not be specified.
- An object of the present invention is to provide a photosensitive composition that is excellent in shape retention with respect to uneven portions of a base substrate, and that changes in processing characteristics is small even when left to stand after coating.
- the present invention provides a photosensitive composition containing an alkali-soluble resin having a tricyclodecanyl skeleton, a radically polymerizable compound, a photopolymerization initiator, a coloring material and an organic solvent, wherein the alkali
- the soluble resin accounts for 20% by mass or more and 40% by mass or less in the solid content, and is contained in the total mass Tg of the solid content excluding the coloring material of the photosensitive composition and the solid content of the photosensitive composition
- the photosensitive composition satisfies a ratio T/M of the number of moles M of carboxyl groups of 1,300 or more and 1,600 or less.
- the photosensitive composition of the present invention it is possible to provide a photosensitive composition that is excellent in shape retention with respect to uneven portions of a base substrate, and that changes in processing characteristics are small even when left to stand after coating.
- FIG. 2 is a cross-sectional view when a film made of a photosensitive composition is formed on a glass substrate having a pattern in the shape retention evaluation described in Examples, and shows the height H and the width L of the portion that runs over the pattern. is.
- the photosensitive composition of the present invention is a photosensitive composition containing an alkali-soluble resin having a tricyclodecanyl skeleton, a radically polymerizable compound, a photopolymerization initiator, a coloring material and an organic solvent,
- the proportion of the alkali-soluble resin having a nil skeleton is 20% by mass or more and 40% by mass or less in the solid content, and the total mass Tg of the solid content excluding the coloring material of the photosensitive composition and the color of the photosensitive composition
- the photosensitive composition satisfies a ratio T/M of 1,300 to 1,600 in terms of the number of moles M of carboxyl groups contained in the solid content excluding the material.
- the photosensitive composition of the present invention is excellent in shape retention with respect to uneven portions of an underlying substrate, and can suppress changes in processing characteristics even when left to stand after coating.
- the photosensitive composition of the present invention is excellent in shape retention, when the photosensitive composition is applied onto a substrate including alignment marks, the film formed on the alignment marks maintains a raised shape. Therefore, even if the alignment mark is observed from above the substrate using a camera, the position can be specified.
- the photosensitive composition of the present invention contains an alkali-soluble resin having a tricyclodecanyl skeleton.
- an alkali-soluble resin having a tricyclodecanyl skeleton By containing an alkali-soluble resin having a tricyclodecanyl skeleton, it is excellent in workability and shape retention with respect to the irregularities of the base substrate, and can suppress changes in workability even when left to stand after coating.
- alkali-soluble resins having a tricyclodecanyl skeleton examples include acrylic resins, epoxy resins, polyimide resins, urethane resins, urea resins, polyvinyl alcohol resins, melamine resins, polyamide resins, polyamideimide resins, polyester resins, and polyolefin resins. etc. You may contain 2 or more types of these. From the viewpoint of stability, acrylic resin is preferably used.
- ethylenically unsaturated compounds having a tricyclodecanyl skeleton include, for example, tricyclodecanyl (meth)acrylate and tricyclodecanedimethanol di(meth)acrylate. Copolymers are preferred.
- unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinylacetic acid, and acid anhydrides thereof. You may use 2 or more types of these.
- the weight ratio of the unit having a tricyclodecanyl skeleton contained in the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 2% by mass or more and 30% by mass or less in the alkali-soluble resin having a tricyclodecanyl skeleton. .
- the weight ratio of the unit having a tricyclodecanyl skeleton is preferably 30% by mass or less, more preferably 20% by mass, in the alkali-soluble resin having a tricyclodecanyl skeleton, from the viewpoint of shape retention with respect to the irregularities of the underlying substrate. Below, more preferably 15% by mass or less, still more preferably 12% by mass or less.
- the weight ratio of the unit having a tricyclodecanyl skeleton contained in the alkali-soluble resin having a tricyclodecanyl skeleton is It is preferably 1% by mass or more, more preferably 2% by mass or more, and even more preferably 5% by mass or more.
- the weight ratio of the unit having a tricyclodecanyl skeleton contained in the alkali-soluble resin is preferably 5% by mass or more, more preferably 9% by mass or more, in the alkali-soluble resin. is.
- the weight ratio of the unit having a tricyclodecanyl skeleton can be determined by calculating the weight of each structural unit from the molar ratio of each structural unit in the alkali-soluble resin having a tricyclodecanyl skeleton. Moreover, in the photosensitive composition, the weight ratio of the unit having a tricyclodecanyl skeleton contained in the alkali-soluble resin having a tricyclodecanyl skeleton can be calculated by the following method. First, each component contained in the photosensitive composition of the present invention is isolated and purified by methods such as preparative GPC, preparative HPLC, and column purification, and the structure of an alkali-soluble resin having a tricyclodecanyl skeleton is obtained.
- the alkali-soluble resin having a tricyclodecanyl skeleton can be specifically identified by 1 H-NMR, 13 C-NMR, two-dimensional NMR such as HMBC and HMQC, and the like. , can be calculated by calculating the weight ratio of the tricyclodecanyl skeleton in the total alkali-soluble resin.
- the alkali-soluble resin having a tricyclodecanyl skeleton may be a resin obtained by copolymerizing another ethylenically unsaturated compound.
- ethylenically unsaturated compounds include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, ( sec-butyl meth)acrylate, iso-butyl (meth)acrylate, tert-butyl (meth)acrylate, n-pentyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, benzyl (meth)acrylate, etc.
- unsaturated carboxylic acid alkyl esters styrene, p-methylstyrene, o-methylstyrene, m-methylstyrene, aromatic vinyl compounds such as ⁇ -methylstyrene, unsaturated carboxylic acid aminoalkyl esters such as aminoethyl acrylate, glycidyl Unsaturated carboxylic acid glycidyl esters such as acrylates and glycidyl methacrylate, carboxylic acid vinyl esters such as vinyl acetate and vinyl propionate, vinyl cyanide compounds such as acrylonitrile, methacrylonitrile and ⁇ -chloroacrylonitrile, 1,3-butadiene, isoprene and macromonomers such as polystyrene, polymethyl acrylate, polymethyl methacrylate, polybutyl acrylate, polybutyl methacrylate, and polysilicone having (meth)acryloyl groups at their terminals.
- the alkali-soluble resin having a tricyclodecanyl skeleton preferably has an ethylenically unsaturated group in the side chain.
- ethylenically unsaturated groups include vinyl groups, allyl groups, acrylic groups, and methacrylic groups.
- acrylic resin having an ethylenically unsaturated group in the side chain include "Cychromer” (registered trademark) P (Daisel Chemical Industries, Ltd.), alkali-soluble cardo resin, and the like.
- the double bond equivalent of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 500 or more, more preferably 800 or more, and still more preferably 1,000 or more, from the viewpoint of the stability and workability of the film after coating. be.
- the double bond equivalent of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 3,000 or less, more preferably 2,000 or less, from the viewpoint of shape retention, workability, and reliability with respect to the irregularities of the underlying substrate. 000 or less, more preferably 1,500 or less.
- the weight-average molecular weight of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 9,000 or more and 200,000 or less.
- the weight-average molecular weight of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 3,000 or more, more preferably 9,000 or more, from the viewpoint of the strength of the cured film.
- it is preferably 10,000 or more, more preferably 20,000 or more, and even more preferably 30,000 or more.
- the weight average molecular weight of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 200,000 or less. It is more preferably 100,000 or less, still more preferably 40,000 or less. From the viewpoint of clogging of the discharge port of the discharge device, the weight average molecular weight of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 40,000 or less, more preferably 35,000 or less.
- the weight average molecular weight of the alkali-soluble resin referred to here refers to a standard polystyrene equivalent value measured by gel permeation chromatography.
- the content of the alkali-soluble resin having a tricyclodecanyl skeleton contained in the photosensitive composition of the present invention is 20% by mass or more and 40% by mass or less in the solid content. If the content of the alkali-soluble resin having a tricyclodecanyl skeleton is less than 20% by mass in the solid content, the shape retainability of the underlying substrate with respect to the irregularities deteriorates.
- the content of the alkali-soluble resin having a tricyclodecanyl skeleton is more preferably 22% by mass or more, and even more preferably 25% by mass or more.
- the content of the alkali-soluble resin having a tricyclodecanyl skeleton is more than 40% by mass in the solid content, the stability of the coated film deteriorates.
- the content of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 35% by mass or less, more preferably 30% by mass or less, in the solid content.
- the content of the alkali-soluble resin having a tricyclodecanyl skeleton is preferably 35% by mass or less, more preferably 32% by mass or less in the solid content.
- the photosensitive composition of the invention contains a radically polymerizable compound.
- the term "radical polymerizable compound” as used herein refers to a compound that reacts by radical polymerization, and refers to a compound having a weight average molecular weight of 1,000 or less.
- the radically polymerizable compound is preferably a compound having an unsaturated hydrocarbon group. Examples of unsaturated hydrocarbon groups include (meth)acryloyl groups, vinyl groups, and maleimide groups. You may have 2 or more types of these.
- radically polymerizable compounds include dipentaerythritol penta(meth)acrylate, tetratrimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, penta(meth)acryloyloxy Dipentaerythritol monosuccinic acid ester, ethylene oxide-modified or propylene oxide-modified products such as dipentaerythritol hexa(meth)acrylate, styrene derivatives, polyfunctional maleimide compounds, poly(meth)acrylate carbamate, 1,6-hexane adipic acid Oligomers such as diol (meth)acrylate, propylene oxide (meth)acrylate phthalate anhydride, diethylene glycol (meth)acrylate trimellitate, rosin-modified epoxy di(meth)acrylate, and alky
- the content of the radically polymerizable compound in the photosensitive composition of the present invention is preferably 40% by mass or more in the solid content from the viewpoint of patterning properties.
- the content of the radical polymerizable compound is preferably 90% by mass or less, and 70% by mass in the solid content. The following are more preferable, and 60% by mass or less is even more preferable.
- the photosensitive composition of the invention contains a photopolymerization initiator.
- a photopolymerization initiator refers to a compound that decomposes and/or reacts with light (including ultraviolet rays or electron beams) to generate radicals.
- photopolymerization initiators include oxime ester compounds, benzophenone compounds, acetophenone compounds, oxanthone compounds, anthraquinone compounds, imidazole compounds, benzothiazole compounds, benzoxazole compounds, carbazole compounds, and triazine compounds. compounds, phosphorus-based compounds, titanocene-based compounds, and the like.
- examples of oxime ester compounds include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(O-benzoyloxime), ethanone, 1-[9-ethyl -6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(O-acetyloxime), ethanone, 1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxy benzoyl)-9H-carbazol-3-yl]-,1-(O-acetyloxime), ethanone, 1-[9-ethyl-6- ⁇ 2-methyl-4-(2,2-dimethyl-1,3 -dioxolanyl)methoxybenzoyl ⁇ -9H-carbazol-3-yl]-,1-(O-acetyloxime), 1,2-octanedione, 1-[4-(phenylthio)-2-(O-benz
- benzophenone compounds include benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone and the like.
- acetophenone compounds include 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, ⁇ -hydroxyisobutylphenone, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-[ 4-(methylthio)phenyl]-2-morpholino-1-propane, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone, 2-(dimethylamino)-2-[(4- methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone, 2-methyl-1-[4-(methylthio)phenyl
- anthraquinone compounds include t-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 9,10-phenoquinone, nanthraquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone and the like.
- imidazole compounds include 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer.
- Benzothiazole compounds include, for example, 2-mercaptobenzothiazole.
- benzoxazole compounds include 2-mercaptobenzoxazole.
- triazine-based compounds include 4-(p-methoxyphenyl)-2,6-di-(trichloromethyl)-s-triazine. You may contain 2 or more types of these.
- the content of the photopolymerization initiator is preferably 1% by mass or more, more preferably 2% by mass or more, more preferably 5% by mass of the solid content excluding the coloring material of the photosensitive composition, from the viewpoint of sensitivity, patterning properties, and processability. % or more is more preferable.
- the content of the photopolymerization initiator is preferably 30% by mass or less, preferably 20% by mass or less, in the solid content of the photosensitive composition excluding the coloring material, from the viewpoint of sensitivity, patterning properties, processability, and heat resistance. More preferably, 15% by mass or less is even more preferable.
- the photosensitive composition of the invention contains a coloring material.
- the coloring material include organic pigments, inorganic pigments, dyes, and the like, and two or more of these may be contained. Among these, organic pigments and dyes are preferable from the viewpoint of further improving the transmittance.
- red colorant for example, C.I. I. Pigment Red (hereinafter "PR") 9, PR48, PR97, PR122, PR123, PR144, PR149, PR166, PR168, PR177, PR179, PR180, PR192, PR209, PR215, PR216, PR217, PR220, PR223, PR224, PR226 , PR227, PR228, PR240, PR254, and diketopyrrolopyrrole colorants having a bromine group.
- PR C.I. I. Pigment Red
- diketopyrrolopyrrole colorants having a bromine group are preferable, and from the viewpoints of brightness, vividness, and prevention of color mixing, a diketopyrrolopyrrole colorant having a bromine group is used. is preferred.
- yellow colorants include organic pigments, inorganic pigments, and dyes.
- PY Pigment Yellow
- You may contain 2 or more types of these. From the viewpoint of color purity, light transmittance and contrast, PY129, PY139, PY150 and PY185 are preferred, and PY150 and PY185 are more preferred.
- green colorants include organic pigments, inorganic pigments, and dyes.
- C.I. I. Pigment Orange (hereinafter referred to as "PO") 13, PO31, PO36, PO38, PO40, PO42, PO43, PO51, PO55, PO59, PO61, PO64, PO65, PO71 and the like.
- PB 15 C.I. I. Pigment Blue
- PV C.I. I. Pigment Violet
- PV30 C.I. I. Pigment Violet
- PV32 C.I. I. Pigment Violet
- PV37 C.I. I. Pigment Violet
- PV50 C.I. I. Pigment Violet
- Dyes include, for example, oil-soluble dyes, acid dyes, direct dyes, basic dyes, and acid mordant dyes.
- the dye may be made into a lake, or a salt-forming compound of a dye and a nitrogen-containing compound may be used.
- red, green, blue, purple or yellow dyes include direct dyes, acid dyes and basic dyes. Specific examples of these dyes include azo dyes, benzoquinone dyes, naphthoquinone dyes, anthraquinone dyes, xanthene dyes, cyanine dyes, squarylium dyes, croconium dyes, merocyanine dyes, stilbene dyes, Examples include diarylmethane dyes, triarylmethane dyes, fluorane dyes, spiropyran dyes, phthalocyanine dyes, indigo dyes, fulgide dyes, nickel complex dyes, and azulene dyes.
- the dye may be dissolved in the photosensitive composition or dispersed as particles.
- the basic dye is preferably a salt-forming compound composed of an organic acid such as an organic sulfonic acid or an organic carboxylic acid or a perchloric acid, such as Tobias acid. Naphthalenesulfonic acid or perchloric acid is more preferable.
- salt-forming compounds comprising quaternary ammonium salts, primary to tertiary amines, or sulfonamides are preferred as acid dyes and direct dyes in order to increase resistance to heat, light, acids, alkalis, organic solvents, and the like.
- the content of the coloring material is preferably 10% by mass or more, more preferably 20% by mass or more, based on the solid content of the photosensitive composition, from the viewpoint of clogging the discharge part of the coating device. Further, the content of the coloring material is preferably 40% by mass or less, more preferably 35% by mass or less, and even more preferably 30% by mass or less in the solid content of the photosensitive composition, from the viewpoint of film stability. be.
- the coloring material contained in the photosensitive composition can be identified by laser Raman spectroscopy (Ar + laser (457.9 nm)) or mass spectrometry using a MALDI mass spectrometer or time-of-flight secondary ion mass spectrometer. .
- the content of the coloring material in the photosensitive composition can be quantified by mass spectrometry using a MALDI mass spectrometer or a time-of-flight secondary ion mass spectrometer. From the content of the component, the ratio (% by mass) of the solid content in the photosensitive composition can be determined. In addition, when the mixing ratio of the raw materials of the photosensitive composition is known, the ratio (% by mass) of the solid content in the photosensitive composition can be calculated from the blending amount of the coloring material and the blending amount of other components. can ask.
- the photosensitive composition of the invention contains an organic solvent.
- organic solvents include diethylene glycol monobutyl ether acetate, benzyl acetate, ethyl benzoate, methyl benzoate, diethyl malonate, 2-ethylhexyl acetate, 2-butoxyethyl acetate, ethylene glycol monobutyl ether acetate, diethyl oxalate, ethyl acetoacetate, Cyclohexyl acetate, 3-methoxy-butyl acetate, methyl acetoacetate, ethyl-3-ethoxypropionate, 2-ethylbutyl acetate, isopentyl propionate, propylene glycol monomethyl ether propionate, pentyl acetate, propylene glycol monomethyl ether Acetate, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monoeth
- the ratio of the organic solvent having a boiling point of 150° C. or less is 80% by mass or more, from the viewpoint of shape retention with respect to the irregularities of the underlying substrate.
- the photosensitive composition of the present invention may further contain dispersants, chain transfer agents, photosensitizers, polymerization inhibitors, adhesion improvers, surfactants, cross-linking agents and the like.
- the photosensitive composition of the present invention may contain a dispersant such as a pigment derivative together with the colorant.
- a dispersant such as a pigment derivative together with the colorant.
- dispersants include low-molecular-weight dispersants such as pigment intermediates and derivatives, and high-molecular-weight dispersants.
- pigment derivatives include alkylamine-modified pigment skeletons, carboxylic acid derivatives, and sulfonic acid derivatives, which contribute to appropriate wetting and stabilization of pigments. Preferred are sulfonic acid derivatives of the pigment backbone, which have a pronounced effect on stabilizing fine pigments.
- polymer dispersants examples include polyesters, polyalkylamines, polyallylamines, polyimines, polyamides, polyurethanes, polyacrylates, polyimides, polyamideimides, and copolymers thereof. You may contain 2 or more types of these. Among these polymer dispersants, those having an amine value of 5 to 200 mgKOH/g and an acid value of 1 to 100 mgKOH/g are preferable. Among them, a polymer dispersant having a basic group is preferable, and can improve the storage stability of the pigment dispersion and the photosensitive composition.
- polymer dispersants having a basic group include, for example, "Solsperse” (registered trademark) (manufactured by Avecia), “EFKA” (registered trademark) (manufactured by Efka), and “Ajisper” (registered trademark). ) (manufactured by Ajinomoto Fine-Techno Co., Ltd.) and “BYK” (registered trademark) (manufactured by BYK-Chemie Corporation). You may contain 2 or more types of these.
- Solsperse (registered trademark) 24000 (manufactured by Avecia), "EFKA” (registered trademark) 4300, 4330 (manufactured by Efka), 4340 (manufactured by Efka), "Ajisper” (registered trademark) PB821, PB822 (Ajinomoto Fine Techno Co., Ltd.), "BYK” (registered trademark) 161 to 163, 2000, 2001, 6919, 21116 (manufactured by BYK-Chemie Co., Ltd.) are preferable.
- the total content of the polymer dispersant and the alkali-soluble resin is 10 mass in solid content from the viewpoint of suppressing film thickness unevenness during film formation. % or more is preferable, 20% by mass or more is more preferable, and 30% by mass or more is even more preferable.
- the total content of the polymer dispersant and the alkali-soluble resin is preferably 60% by mass or less, more preferably 50% by mass or less, of the solid content of the photosensitive composition excluding the colorant. .
- the photosensitive composition of the present invention may contain a chain transfer agent together with the photopolymerization initiator, thereby further improving the sensitivity.
- chain transfer agents include thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N-(2-mercaptopropionyl)glycine, and 2-mercaptonicotinic acid.
- the photosensitive composition of the present invention may further contain a photosensitizer, such as a thioxanthone-based sensitizer, an aromatic or aliphatic tertiary amine, and the like.
- a photosensitizer such as a thioxanthone-based sensitizer, an aromatic or aliphatic tertiary amine, and the like.
- thioxanthone-based sensitizers include thioxanthone, 2-chlorothioxanthone, 2,4-diethylthioxanthen-9-one, "KAYACURE” (registered trademark) DETX-S (manufactured by Nippon Kayaku Co., Ltd.), and the like. mentioned. You may contain 2 or more types of these.
- the photosensitive composition of the present invention may further contain a polymerization inhibitor to improve stability.
- Polymerization inhibitors generally exhibit the action of inhibiting or stopping polymerization by radicals generated by heat, light, radical initiators, etc., and are generally used to prevent gelation of thermosetting resins and during polymer production. Used for polymerization termination.
- Examples of polymerization inhibitors include hydroquinone, tert-butylhydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl)hydroquinone, 2,5-bis(1,1-dimethylbutyl)hydroquinone, catechol, tert-butyl catechol and the like. You may contain 2 or more types of these.
- the content of the polymerization inhibitor is preferably 0.0001% by mass or more, more preferably 0.005% by mass or more in the solid content. Moreover, from the viewpoint of the balance between stability and photosensitive properties, the content of the polymerization inhibitor is preferably 1% by mass or less, more preferably 0.5% by mass or less in the solid content.
- the photosensitive composition of the present invention may further contain an adhesion improver to improve the adhesion of the coating film of the photosensitive composition to the substrate.
- Adhesion improvers include, for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, N-(2-amino ethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyl Silane coupling agents such as trimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimeth
- the photosensitive composition of the present invention may further contain a surfactant to improve the coatability of the photosensitive composition and the uniformity of the coating film surface.
- surfactants include anionic surfactants such as ammonium lauryl sulfate and triethanolamine polyoxyethylene alkyl ether sulfate; cationic surfactants such as stearylamine acetate and lauryltrimethylammonium chloride; lauryldimethylamine oxide; Amphoteric surfactants such as carboxymethylhydroxyethylimidazolium betaine, nonionic surfactants such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, and sorbitan monostearate, fluorine-based surfactants, silicon-based surfactants, etc. is mentioned. You may contain 2 or more types of these.
- the content of the surfactant is preferably 0.001 to 10% by mass in the photosensitive composition from the viewpoint of in-plane uniformity of the coating film.
- the total mass T (grams) of the solid content of the photosensitive composition excluding the colorant and the number of moles M of carboxyl groups contained in the solid content of the photosensitive composition excluding the colorant It is important that the ratio T/M is 1300 or more and 1600 or less from the viewpoint of the stability and processability of the film after coating and the shape retention against the irregularities of the underlying substrate. Since the shape retainability is excellent, the display readability of the mark portion is improved.
- solid content refers to all of the components contained in the photosensitive composition, excluding the organic solvent.
- the number of moles M of carboxyl groups contained in the solid content of the photosensitive composition excluding the coloring material can be calculated from the amount of carboxylic acid in each raw material to be blended, and can be specifically measured by the following method. can. First, the photosensitive composition is weighed, and the number of moles of the acid component contained therein is measured by an automatic potential difference measuring device or the like, and the number of moles of the acid component contained in the solid content of the photosensitive composition excluding the coloring material. can be asked for.
- each component is isolated and purified by methods such as preparative GPC, preparative HPLC, and column purification, followed by 1 H-NMR, 13 C-NMR, two-dimensional NMR such as HMBC and HMQC, It can be identified by IR or the like, and the number of moles of the carboxyl group is calculated from the number of moles of the acid component.
- the number of moles of the carboxyl group is calculated from the number of moles of the acid component.
- an acid component is present in a component that is not contained in the solid content such as an organic solvent
- the number of moles of those acid components is subtracted, and the carboxyl contained in the solid content excluding the coloring material of the photosensitive composition is calculated.
- the number of moles M of the group can be calculated.
- T/M is less than 1300, the stability of the film after application deteriorates.
- T/M is preferably 1320 or more, more preferably 1350 or more, and still more preferably 1400 or more. Further, when T/M is larger than 1600, the shape retainability to the irregularities of the base substrate is deteriorated.
- T/M is preferably 1590 or less, more preferably 1580 or less, still more preferably 1550 or less, and even more preferably 1500 or less.
- the viscosity change amount ⁇ per solid content change mass ⁇ W when the solid content concentration is changed from 18% by mass to 25% by mass, that is, ⁇ / ⁇ W is 0.50 or more and 0.70 is preferable from the viewpoint of shape retention with respect to the irregularities of the base substrate and discharge opening clogging property of the discharge device.
- the viscosity change amount ⁇ per solid content change amount ⁇ W can be calculated by the following method.
- the viscosity change amount ⁇ per solid content change amount ⁇ W is ( ⁇ 1- ⁇ 2)/(W1-W2).
- Viscosity refers to a value measured with an E-type viscometer at a temperature of 23°C.
- the viscosity change amount ⁇ per solid content change amount ⁇ W is preferably 0.50 or more, more preferably 0.53 or more, and still more preferably 0.56 or more from the viewpoint of shape retention with respect to the uneven portion of the base substrate. .
- the viscosity change amount ⁇ per solid content change amount ⁇ W is preferably 0.70 or less, more preferably 0.64 or less, and still more preferably 0.60 or less from the viewpoint of the discharge port clogging property of the discharge device. .
- the method for producing the photosensitive resin composition of the present invention is not particularly limited, and it can be produced by a general-purpose method.
- a container such as a flask or a reaction kiln
- the alkali-soluble resin having a tricyclodecanyl skeleton, the radically polymerizable compound, the photopolymerization initiator, a dispersion containing a colorant, and, if necessary, the other additives , and an organic solvent are added and stirred.
- a solution obtained by diluting each component with an organic solvent or a dissolved solution obtained by dissolving each component with an organic solvent may be used.
- the components may be added in any order, and the resulting photosensitive composition may be filtered.
- the color filter substrate of the invention has pixels containing the photocured product of the photosensitive composition of the invention.
- the fingerprint sensor of the present invention has a photocured product of the photosensitive composition of the present invention.
- the color filter substrate and fingerprint sensor of the present invention may have a black matrix, photospacer, overcoat layer, alignment film, polarizing plate, retardation plate, antireflection film, transparent electrode, diffusion plate and the like.
- Examples of the substrate used for the color filter substrate and the fingerprint sensor of the present invention include soda glass, non-alkali glass, borosilicate glass, quartz glass, aluminoborosilicate glass, aluminosilicate glass, alkali aluminosilicate glass, and the surface thereof.
- Inorganic glass plates such as silica-coated soda-lime glass, silicon wafers, organic plastic films and sheets, and the like can be used. You may laminate
- the display device provided with the color filter substrate of the present invention is a reflective display device or a display device having light-emitting elements such as a silicon OLED, the substrate may be opaque.
- the organic plastic film or sheet may be a self-supporting film or a film formed by coating on a substrate such as a glass substrate.
- a coating film the adhesive force between the substrate and the film can be appropriately adjusted by using a laser or the like, and the film can be peeled off.
- organic plastic materials include polypropylene, polyethylene, polystyrene, polyester such as polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyimide, polyamide, polyamideimide, polyethersulfone, polytetrafluoroethylene (PTFE), and the like. Fluorine-containing polymers, polyetheretherketones, polyphenylene ethers, polyarylates, polysulfones, and the like.
- the substrate is preferably a film with a thickness of 5 ⁇ m or more, more preferably 10 ⁇ m or more.
- the substrate is preferably a film having a thickness of 100 ⁇ m or less.
- Pixels include colored pixels such as red and blue, and transparent pixels.
- the material forming the pixel include the photosensitive composition of the present invention, and a colored photosensitive composition containing a binder resin such as an acrylic resin or a polyimide resin and a radically polymerizable compound.
- the film thickness of the pixel is preferably 0.5 ⁇ m or more, more preferably 1.0 ⁇ m or more, and even more preferably 1.4 ⁇ m or more. On the other hand, it is preferably 3.0 ⁇ m or less, more preferably 2.8 ⁇ m or less, from the viewpoint of improving the flatness, pattern workability and reliability of the color filter substrate.
- a colored member having a large size can be formed from a member made of the photosensitive composition of the present invention.
- the black matrix prevents deterioration of contrast and color purity due to light leakage between pixels, and is preferably arranged between pixels or in the frame.
- Materials constituting the black matrix include, for example, a photosensitive composition containing a binder resin such as an acrylic resin or a polyimide resin and a radically polymerizable compound, and a non-photosensitive resin composition colored black.
- the film thickness of the black matrix is not particularly specified, it is preferably 0.5 ⁇ m or more, more preferably 1.0 ⁇ m or more, from the viewpoint of light shielding properties.
- the photospacer formed on the color filter substrate provides a certain gap between it and the opposing substrate, and the gap can be filled with a liquid crystal compound or the like. Therefore, it is possible to omit the step of arranging the spacers when manufacturing the liquid crystal display device.
- the photospacer is preferably fixed at a specific location on the color filter substrate so as to be in contact with the counter substrate when the liquid crystal display device is manufactured.
- Materials constituting the photospacer include, for example, a photosensitive composition containing a binder resin such as an acrylic resin or a polyimide resin and a radically polymerizable compound.
- Examples of the shape of the photospacer include a cylindrical shape, a prismatic shape, a truncated cone shape, a truncated pyramid shape, and the like.
- the diameter and height of the photospacer are not particularly specified, and any one may be used.
- the overcoat layer suppresses the transmission of impurities from the pixels of the color filter substrate and flattens the steps caused by the pixels of the color filter substrate.
- Materials constituting the overcoat layer include, for example, epoxy resins, acrylic epoxy resins, acrylic resins, siloxane resins, polyimide resins, and photosensitive or non-photosensitive materials commercially available as flattening materials.
- Materials constituting the transparent electrode include, for example, metals such as aluminum, chromium, tantalum, titanium, neodymium or molybdenum, Indium-Tin-Oxide (ITO), Indium-Zinc-Oxide (InZnO), and the like.
- metals such as aluminum, chromium, tantalum, titanium, neodymium or molybdenum, Indium-Tin-Oxide (ITO), Indium-Zinc-Oxide (InZnO), and the like.
- a method for manufacturing a color filter substrate or a fingerprint sensor for example, there is a method of forming a pattern of pixels made of a resin composition on a substrate.
- the manufacturing method will be described below taking as an example a color filter substrate having pixels made of the photosensitive composition of the present invention.
- the photosensitive composition of the present invention is applied onto a substrate, patterned by selective exposure and development using a photomask, and baked to form members such as pixels, thereby obtaining a color filter substrate. .
- Methods for applying the photosensitive composition of the present invention onto a substrate include, for example, a spin coater, a bar coater, a blade coater, a roll coater, a die coater, an inkjet printing method, a screen printing method, and a substrate coated with a photosensitive composition.
- a spin coater for example, a spin coater, a bar coater, a blade coater, a roll coater, a die coater, an inkjet printing method, a screen printing method, and a substrate coated with a photosensitive composition.
- Examples include a method of immersion and a method of spraying the photosensitive composition onto the substrate.
- a coating film of the photosensitive composition is formed on the substrate. Drying methods include, for example, air drying, heat drying, and vacuum drying. Two or more of these may be combined. For example, it is preferable to dry under reduced pressure and then heat dry.
- the temperature for heat drying is preferably 80 to 130° C., and the heat drying device is preferably a hot air oven or a hot plate.
- Exposing machines include, for example, proximity exposure machines, mirror projection exposure machines, lens scanning exposure machines, steppers, and the like. From the viewpoint of accuracy, a lens scanning exposure machine is preferred.
- Light sources used for exposure include, for example, ultra-high pressure mercury lamps, chemical lamps, and high pressure mercury lamps.
- alkaline substances used in the alkaline developer include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, ethylamine, n-propylamine and the like.
- examples include primary amines, secondary amines such as diethylamine and di-n-propylamine, tertiary amines such as triethylamine and methyldiethylamine, and organic alkalis such as tetramethylammonium hydroxide.
- the alkaline developer include 0.02 to 1% by mass of potassium hydroxide or tetramethylammonium hydroxide.
- a color filter substrate having pixels patterned is obtained.
- the heat treatment may be performed in air, in a nitrogen atmosphere, or in vacuum.
- the heating temperature is preferably 80 to 250°C.
- the heating time is preferably 5 minutes to 5 hours.
- a hot air oven and a hot plate are preferable as the heat treatment device.
- the heat treatment may be performed continuously or stepwise.
- pixels are sequentially formed by the above method.
- the order of forming each color is not particularly limited, but when forming a pixel containing a dye, it is preferable to form the pixel containing the dye after forming other pixels from the viewpoint of further suppressing color transfer of the coloring material.
- the color filter substrate of the present invention can be used as a constituent element of display devices such as liquid crystal displays, organic EL displays, and electronic paper, and can be used as image display devices. That is, the display device of the present invention has the color filter substrate of the present invention. Furthermore, the display device may have a light source such as an external light source, various films such as a brightness enhancement film and a diffuser plate, and the like.
- a display device refers to a device that displays an image by making a part of the screen visible. Examples of display devices include transmissive liquid crystal displays, transflective liquid crystal displays, reflective liquid crystal displays, organic EL displays, inorganic EL displays, quantum dot displays, and electronic paper. Examples of reflective display devices include devices that display using outdoor light or indoor light, such as wearable terminals, electronic signboards, digital signage, and electronic shelf labels.
- the display device of the present invention is a display device having a fingerprint sensor having a photocured product of the photosensitive composition of the present invention.
- a display device having a fingerprint sensor here means a display device having a fingerprint sensor installed on the image display surface of the image display device and having a function of detecting a fingerprint by placing a finger on the image display portion.
- a known fingerprint sensor can be used as the fingerprint sensor.
- TFT thin film transistor
- TFD thin film diode
- a liquid crystal display device is completed by attaching a backlight and mounting an IC driver and the like.
- a backlight a two-wavelength LED, three-wavelength LED, CCFL, or the like can be used, but the three-wavelength LED is preferable because the color reproduction range of the liquid crystal display device can be expanded and the power consumption can be kept low. .
- Radically polymerizable compound C1 pentaerythritol triacrylate (having no carboxyl group in the structure)
- Photopolymerization initiator D1 "ADEKA Arkles” (registered trademark) NCI831 (manufactured by ADEKA Corporation, having no carboxyl group in the structure.)
- Organic solvent E1 propylene glycol monomethyl ether acetate.
- ⁇ Shape retention evaluation> As shown in FIG. 1, the photosensitive compositions obtained in Examples 1 to 7 and Comparative Examples 1 to 4 were placed on a glass substrate having a pattern shape consisting of a colored composition of 400 ⁇ m in length, 40 ⁇ m in width, and 1.5 ⁇ m in height. The product was applied so as to cover the pattern so that the film thickness at a location 200 ⁇ m away from the pattern end was 2.5 ⁇ m, and dried at 90° C. for 10 minutes to form a film of the photosensitive composition. The height H and the width of the slope L of the portion on the pattern were measured with a laser microscope VK-9710 manufactured by KEYENCE CORPORATION to evaluate the shape retainability. The closer the height H is to 2.5 ⁇ m, and the closer the slope width L is to 0 ⁇ m, the better the shape retention.
- a beaker containing the slurry was connected to a Dyno mill with a tube, and zirconia beads with a diameter of 0.5 mm were used as media to perform dispersion treatment at a peripheral speed of 14 m/s for 8 hours.
- I. Pigment Green 58 dispersion (A1) was prepared. Dispersion (A1) does not have a carboxyl group.
- Production Example 2 (Preparation of Dispersion (A2)) C. I. Pigment Green 58 was replaced with C.I. I. Pigment Yellow 150 (“Chromofine (registered trademark) Yellow 6266EC” manufactured by Dainichiseika Co., Ltd.) was used in the same manner as in Production Example 1 except that 150 g of C.I. I. Pigment Yellow 150 dispersion (A2) was prepared. Dispersion (A2) does not have a carboxyl group.
- the polymerization vessel was replaced with air, 10 g of glycidyl methacrylate, 1.2 g of dimethylbenzylamine and 0.2 g of p-methoxyphenol were added to the obtained reaction solution and stirred at 110° C. for 6 hours. .
- the resulting solution was diluted with PGMEA to obtain an alkali-soluble resin solution (B1) with a solid content of 35% by mass (double bond equivalent of alkali-soluble resin: 1171 g/mol, unit having a tricyclodecanyl skeleton: weight ratio of 9.7 mass %, carboxyl group only as an acid component).
- the acid value of the alkali-soluble resin was measured for a 0.1 mol / L potassium hydroxide ethanol solution, and the acid value was 109.2 (mg KOH / g). Further, when the polystyrene-equivalent weight average molecular weight was calculated using a GPC apparatus, the weight average molecular weight was 31,400.
- the polymerization vessel was replaced with air, 9 g of glycidyl methacrylate, 1.2 g of dimethylbenzylamine and 0.2 g of p-methoxyphenol were added to the obtained reaction solution and stirred at 110° C. for 6 hours. .
- the resulting solution was diluted with PGMEA to obtain an alkali-soluble resin solution (B2) with a solid content of 35% by mass (double bond equivalent of alkali-soluble resin: 1396 g/mol, unit having a tricyclodecanyl skeleton: weight ratio of 17.0% by mass, carboxyl group only as an acid component).
- the acid value of the alkali-soluble resin was measured for a 0.1 mol / L potassium hydroxide ethanol solution, and the acid value was 106.8 (mg KOH / g). Further, when the polystyrene equivalent weight average molecular weight was calculated using a GPC apparatus, the weight average molecular weight was 12,000.
- the polymerization vessel was replaced with air, 13 g of glycidyl methacrylate, 1.2 g of dimethylbenzylamine and 0.2 g of p-methoxyphenol were added to the obtained reaction solution and stirred at 110° C. for 6 hours. .
- the obtained solution was diluted with PGMEA to obtain an alkali-soluble resin solution (B3) with a solid content of 35% by mass (double bond equivalent of alkali-soluble resin: 868 g/mol, unit having a tricyclodecanyl skeleton: weight ratio of 6.3% by mass, carboxyl group only as an acid component).
- the acid value of the alkali-soluble resin was measured for a 0.1 mol / L potassium hydroxide ethanol solution, and the acid value was 157.1 (mg KOH / g). Further, when the polystyrene-equivalent weight average molecular weight was calculated using a GPC apparatus, the weight average molecular weight was 28,900.
- the polymerization vessel was replaced with air, 14 g of glycidyl methacrylate, 1.2 g of dimethylbenzylamine and 0.2 g of p-methoxyphenol were added to the obtained reaction solution and stirred at 110° C. for 6 hours. .
- the obtained solution was diluted with PGMEA to obtain an alkali-soluble resin solution (B4) with a solid content of 35% by mass (double bond equivalent of alkali-soluble resin: 867 g/mol, unit having a tricyclodecanyl skeleton: weight ratio of 8.2 mass %, only carboxyl group as an acid component).
- the acid value of the alkali-soluble resin was measured for a 0.1 mol / L potassium hydroxide / ethanol solution, and the acid value was 87.6 (mg KOH / g). Further, when the polystyrene-equivalent weight average molecular weight was calculated using a GPC apparatus, the weight average molecular weight was 32,300.
- the obtained photosensitive composition was evaluated for shape retention by the method described above, the height H of the portion overlaid on the pattern was 1.30 ⁇ m, and the slope width L was 17.3 ⁇ m.
- the change in line width after 48 hours was less than 1 ⁇ m (A evaluation). Further, when the blocking property was evaluated by the above method, no coating unevenness was observed on the substrate (A evaluation). Further, by changing only the blending amount of the organic solvent E1, a photosensitive composition (F1, solid content concentration 18 mass%) and a photosensitive composition of 25 mass% differing only in solid content concentration were prepared, and each viscosity was measured with a viscometer RE-215L manufactured by Toki Sangyo Co., Ltd., and the viscosity change amount ⁇ / ⁇ W per solid content change amount was evaluated when the solid content concentration was changed from 18% by mass to 25% by mass. As a result, it was 0.58.
- the photosensitive composition of the present invention can be suitably used for color filter substrates, fingerprint sensors, display devices equipped with them, decorative ink materials, and the like.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Human Computer Interaction (AREA)
- Multimedia (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
Abstract
L'invention concerne une composition photosensible présentant d'excellentes propriétés de maintien de forme pour des sections inégales d'un substrat de base et, également, peu de variation de propriétés de traitement lorsqu'elle est conservée longtemps après application. La composition photosensible contient une résine soluble dans les alcalis présentant un squelette tricyclodécanyle, un composé polymérisable par voie radicalaire, un photo-initiateur, une matière colorante et un solvant organique. La proportion de résine soluble dans les alcalis présentant le squelette tricyclodécanyle est de 20 à 40 % en masse de la teneur en matière solide. Le rapport T/M entre la masse totale Tg de la teneur en matière solide de la composition photosensible, à l'exclusion de la matière colorante, et le nombre de moles M de groupes carboxyle dans la teneur en matière solide de la composition photosensible, à l'exclusion de la matière colorante, vaut de 1 300 à 1 600.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022547859A JPWO2023021986A1 (fr) | 2021-08-20 | 2022-08-03 | |
KR1020247004142A KR20240044426A (ko) | 2021-08-20 | 2022-08-03 | 감광성 조성물, 컬러 필터 기판, 지문 센서 및 표시 장치 |
CN202280051414.XA CN117716293A (zh) | 2021-08-20 | 2022-08-03 | 感光性组合物、滤色器基板、指纹传感器及显示装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-134670 | 2021-08-20 | ||
JP2021134670 | 2021-08-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2023021986A1 true WO2023021986A1 (fr) | 2023-02-23 |
Family
ID=85240563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2022/029742 WO2023021986A1 (fr) | 2021-08-20 | 2022-08-03 | Composition photosensible, substrat de filtres colorés, capteur d'empreintes et dispositif d'affichage |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2023021986A1 (fr) |
KR (1) | KR20240044426A (fr) |
CN (1) | CN117716293A (fr) |
WO (1) | WO2023021986A1 (fr) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002296775A (ja) * | 2001-03-30 | 2002-10-09 | Dainippon Printing Co Ltd | 感光性樹脂組成物、カラーフィルター、及び、液晶パネル |
JP2016117799A (ja) * | 2014-12-19 | 2016-06-30 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 着色硬化性樹脂組成物 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108700809B (zh) | 2016-03-25 | 2021-10-08 | 东丽株式会社 | 着色树脂组合物、滤色器基板及液晶显示装置 |
JP7275579B2 (ja) | 2017-02-17 | 2023-05-18 | 東レ株式会社 | 着色組成物、それを用いたカラーフィルタ基板および表示装置 |
-
2022
- 2022-08-03 WO PCT/JP2022/029742 patent/WO2023021986A1/fr active Application Filing
- 2022-08-03 KR KR1020247004142A patent/KR20240044426A/ko unknown
- 2022-08-03 JP JP2022547859A patent/JPWO2023021986A1/ja active Pending
- 2022-08-03 CN CN202280051414.XA patent/CN117716293A/zh active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002296775A (ja) * | 2001-03-30 | 2002-10-09 | Dainippon Printing Co Ltd | 感光性樹脂組成物、カラーフィルター、及び、液晶パネル |
JP2016117799A (ja) * | 2014-12-19 | 2016-06-30 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 着色硬化性樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
CN117716293A (zh) | 2024-03-15 |
KR20240044426A (ko) | 2024-04-04 |
JPWO2023021986A1 (fr) | 2023-02-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4821206B2 (ja) | カラーフィルター用感光性着色組成物、およびカラーフィルター | |
JP2007034119A5 (fr) | ||
JP6592236B2 (ja) | 着色剤分散液 | |
TWI454846B (zh) | 綠色像素形成用感放射線性組成物、彩色濾光片及彩色液晶顯示元件 | |
TW201341957A (zh) | 感放射線性著色組合物、彩色濾光片以及顯示元件 | |
TWI710579B (zh) | 著色感光性樹脂組成物、使用其製造的濾色器以及包含濾色器的顯示裝置 | |
JP6031807B2 (ja) | 着色組成物、カラーフィルタ及び表示素子 | |
JP5343260B2 (ja) | 着色感光性樹脂組成物、カラーフィルタ及びこれを備える液晶表示装置 | |
CN110268021B (zh) | 着色组合物、使用了该着色组合物的滤色器基板及显示装置 | |
KR20140104768A (ko) | 착색 감광성 수지 조성물 | |
TWI534534B (zh) | 彩色濾光片用著色組成物、彩色濾光片及顯示元件 | |
JPWO2012023474A1 (ja) | 着色剤、着色組成物、カラーフィルタ及び表示素子 | |
WO2012005203A1 (fr) | Colorant à base de triarylméthane, composition colorante, filtre coloré, et élément d'affichage | |
KR102012523B1 (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치 | |
JP6658217B2 (ja) | カラーフィルタ用感光性組成物、カラーフィルタ基板およびその製造方法、ならびにこれらを用いた表示装置 | |
WO2023021986A1 (fr) | Composition photosensible, substrat de filtres colorés, capteur d'empreintes et dispositif d'affichage | |
JP6996175B2 (ja) | カラーフィルタ用感光性組成物およびそれを用いたカラーフィルタ基板 | |
KR102179956B1 (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치 | |
JP7415697B2 (ja) | 着色組成物、それを用いたカラーフィルタ基板および表示装置 | |
JP2022056852A (ja) | カラーフィルタ、表示装置、電子ペーパーおよび白表示方法ならびに色味調整部材形成用組成物 | |
KR102371728B1 (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조되는 컬러필터 및 상기 컬러필터를 포함하는 표시장치 | |
US20230043562A1 (en) | Colored resin composition | |
JP5838923B2 (ja) | 着色組成物、カラーフィルタ及び表示素子 | |
JP2021117498A (ja) | 着色組成物、それを用いたカラーフィルタ基板およびその製造方法ならびに表示装置 | |
KR20140020502A (ko) | 착색 감광성 수지 조성물, 이를 이용한 컬러 필터 및 액정표시장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ENP | Entry into the national phase |
Ref document number: 2022547859 Country of ref document: JP Kind code of ref document: A |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 22858307 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 202280051414.X Country of ref document: CN |
|
NENP | Non-entry into the national phase |
Ref country code: DE |