WO2023010941A1 - 基站及水箱 - Google Patents

基站及水箱 Download PDF

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Publication number
WO2023010941A1
WO2023010941A1 PCT/CN2022/092806 CN2022092806W WO2023010941A1 WO 2023010941 A1 WO2023010941 A1 WO 2023010941A1 CN 2022092806 W CN2022092806 W CN 2022092806W WO 2023010941 A1 WO2023010941 A1 WO 2023010941A1
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WO
WIPO (PCT)
Prior art keywords
sewage
water
water tank
base station
chamber
Prior art date
Application number
PCT/CN2022/092806
Other languages
English (en)
French (fr)
Inventor
许楚锐
段明
方振康
丁亚飞
佘坤桓
覃万龙
Original Assignee
云鲸智能科技（东莞）有限公司
云鲸智能(深圳)有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 云鲸智能科技（东莞）有限公司, 云鲸智能(深圳)有限公司 filed Critical 云鲸智能科技（东莞）有限公司
Priority to CN202290000056.5U priority Critical patent/CN219557168U/zh
Priority to KR1020247001995A priority patent/KR20240042600A/ko
Priority to EP22851660.5A priority patent/EP4190218A1/en
Publication of WO2023010941A1 publication Critical patent/WO2023010941A1/zh
Priority to US18/171,388 priority patent/US20230277030A1/en

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Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40—Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4091—Storing or parking devices, arrangements therefor; Means allowing transport of the machine when it is not being used
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40—Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4027—Filtering or separating contaminants or debris
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/29—Floor-scrubbing machines characterised by means for taking-up dirty liquid
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40—Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/408—Means for supplying cleaning or surface treating agents
    • A47L11/4083—Liquid supply reservoirs; Preparation of the agents, e.g. mixing devices
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00—Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40—Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/408—Means for supplying cleaning or surface treating agents
    • A47L11/4088—Supply pumps; Spraying devices; Supply conduits
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00—Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02—Docking stations; Docking operations
    • A47L2201/024—Emptying dust or waste liquid containers
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00—Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02—Docking stations; Docking operations
    • A47L2201/026—Refilling cleaning liquid containers
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00—Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02—Docking stations; Docking operations
    • A47L2201/028—Refurbishing floor engaging tools, e.g. cleaning of beating brushes
    • B08B1/165—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
    • B08B2203/027—Pump details
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B40/00—Technologies aiming at improving the efficiency of home appliances, e.g. induction cooking or efficient technologies for refrigerators, freezers or dish washers

Definitions

  • the present application relates to the technical field of cleaning robots, in particular to a base station and a water tank.
  • the base station used to automatically clean the parts to be cleaned by the cleaning robot has gradually become an inseparable supporting equipment.
  • the base station generally includes a clean water tank and a dirty water tank that can be taken out, and the clean water tank and the dirty water tank are respectively connected with the cleaning system of the base station to provide clean water for the cleaning system or receive sewage discharged from the cleaning system.
  • Clean water tanks and dirty water tanks require users to manually add clean water or pour out sewage. For some users, this will not make them feel troublesome, and they will even experience the fun of doing it by themselves. However, for other users, this will It is a burden that will affect its user experience.
  • the purpose of the present application is to provide a base station that can improve user experience.
  • Another object of the present application is to provide a water tank, which can realize automatic loading and unloading when installed on the base station body of the base station, which brings convenience to users.
  • Another object of the present application is to provide a base station, which can realize automatic loading and unloading, and brings convenience to users.
  • the present application provides a base station for cleaning the cleaning robot, the base station includes:
  • the main body of the base station a cleaning system is formed on the main body of the base station, and the cleaning system receives clean water to clean the parts to be cleaned of the cleaning robot and discharges the sewage generated by cleaning;
  • the first waterway system includes a first water tank, the first water tank is removably installed on the main body of the base station, the first water tank is configured to manually add clean water and/or remove sewage,
  • the first water tank is formed with a first chamber, and when the first water tank is installed on the main body of the base station, the first chamber communicates with the cleaning system to provide clean water for the cleaning system and/or receive the Sewage from cleaning systems;
  • the second waterway system includes a waterway channel formed on the base station, and the waterway channel is used to receive and deliver clean water delivered by an external waterway from the outside of the base station and provide it to the cleaning system and /or used to receive the sewage used by the cleaning system and discharge it to the outside of the base station;
  • Either or both of the first waterway system and the second waterway system provide clean water for the cleaning system and/or receive sewage generated by the cleaning system.
  • the base station provided by this application includes a first waterway system, the first waterway system includes a first water tank that can be taken out, and the base station can use the first water tank to provide clean water for the cleaning system and/or receive sewage generated by the cleaning system; at the same time, the base station of this application It also includes a second waterway system.
  • the second waterway system can use its waterway channel to communicate with the outside of the base station for water delivery so that the second waterway system can provide clean water for the cleaning system and/or receive sewage generated by the cleaning system.
  • the base station of the present application can use conventional water tanks to provide clean water for the cleaning system and/or receive sewage discharged from the cleaning system, and can also use the second waterway system for automatic water supply and/or automatic water discharge, which can be done without the need for users to manually join Cleaning water or removing sewage can solve the burden of some users. Therefore, the base station of the present application can meet the personalized needs of different users and the different needs of the same user, and can effectively improve user experience.
  • the present application also provides a base station for cleaning the cleaning robot, the base station includes:
  • the main body of the base station, the main body of the base station is provided with a cleaning system and a water tank accommodation space, and the cleaning system includes a cleaning area and a water delivery channel communicating with the cleaning area;
  • a first waterway system the first waterway system includes a first water tank, the first water tank is provided with a first chamber and a first channel communicating with the first chamber;
  • a second waterway system includes a second water tank, the second water tank is provided with a second chamber and a second passage and a third passage respectively communicated with the second chamber;
  • the first water tank and the second water tank are optionally installed in the water tank accommodating space;
  • the first channel is connected to the water delivery channel to communicate with the first chamber and the cleaning area;
  • the second channel is connected to the water delivery channel to communicate with the second chamber and the cleaning area, and the third channel is used to connect to the external waterway.
  • the base station of this application can not only use the first water tank to provide clean water for the cleaning system and/or receive the sewage discharged from the cleaning system, but also use the second water tank to realize automatic water supply and/or automatic water launch of the base station, without the need for users to add clean water by themselves Or remove sewage, which can solve the burden of some users. Therefore, the base station of the present application can meet the personalized needs of different users and the different needs of the same user, and can effectively improve user experience.
  • the application provides a water tank for communicating with the cleaning system on the main body of the base station, the water tank is provided with a clean water chamber, a sewage chamber, a clean water input channel, and a clean water output channel , a sewage input channel and a sewage output channel;
  • the clean water chamber receives clean water transported from the outside of the base station through the clean water input channel, and communicates with the cleaning system on the main body of the base station through the clean water output channel to supply to the The cleaning system transports clean water;
  • the sewage chamber communicates with the cleaning system on the main body of the base station through the sewage input channel to receive the sewage generated by the cleaning system, and discharges the sewage to the base station through the sewage output channel. outside the base station.
  • the clean water chamber can use the clean water input channel to input clean water from the waterway outside the base station, and the sewage chamber can discharge sewage to the outside of the base station through the sewage output channel, thereby realizing automatic cleaning of the base station.
  • the user does not need to manually replenish clear water and pour out sewage, which brings convenience to the user.
  • the present application still uses the clean water chamber and the sewage chamber for temporary water storage while realizing the automatic water supply function, which effectively guarantees the water supply reliability of the base station of the present application, and is also conducive to improving the convenience of use.
  • the present application provides a base station for cleaning the cleaning parts of the cleaning robot, the base station includes a base station main body and the water tank as described above, the base station main body is provided with a cleaning system, the The clean water output channel and the sewage input channel of the water tank are respectively communicated with the cleaning system to deliver clean water to the cleaning system and receive sewage generated by the cleaning system.
  • the clean water chamber can use the clean water input channel to input clean water from the waterway outside the base station, and the sewage chamber can discharge the sewage to the outside of the base station through the sewage output channel, thereby realizing the automatic loading and unloading of the base station.
  • the sewage chamber can discharge the sewage to the outside of the base station through the sewage output channel, thereby realizing the automatic loading and unloading of the base station.
  • the present application still uses the clean water chamber and the sewage chamber for temporary water storage while realizing the automatic water supply function, which effectively guarantees the water supply reliability of the base station of the present application, and is also conducive to improving the convenience of use.
  • the present application also provides a base station for cleaning the cleaning parts of the cleaning robot, the base station is provided with a cleaning system, and the base station is provided with a clean water input channel and a sewage output channel,
  • the clean water input channel is used to receive clean water transported from the outside of the base station and provide it to the cleaning system, and the sewage output channel is used to discharge the sewage generated by the cleaning system out of the base station.
  • the clean water input channel can be used to input clean water from the waterway outside the base station for use in the cleaning system, and the sewage generated by the cleaning system can be discharged to the outside of the base station through the sewage output channel, thereby realizing automatic cleaning of the base station and automatic sewage disposal
  • the purpose is to eliminate the need for users to manually replenish clear water and pour out sewage, which brings convenience to users.
  • the present application also provides a base station for cleaning a cleaning robot, the base station comprising:
  • the main body of the base station a cleaning system is formed on the main body of the base station, and the cleaning system receives clean water to clean the parts to be cleaned of the cleaning robot and discharge the sewage generated by cleaning;
  • a waterway system the waterway system is used to connect the cleaning system to deliver clean water to the cleaning system and receive sewage discharged from the cleaning system.
  • the base station of this application uses the cleaning system to receive clean water to clean the parts to be cleaned of the cleaning robot and discharge the sewage generated by cleaning, and uses the water system to deliver clean water to the cleaning system and receive the sewage discharged from the cleaning system, so that the cleaning robot can be cleaned manually without the need for users , which is conducive to improving the user experience.
  • Fig. 1a shows a schematic three-dimensional structural diagram of a base station according to an embodiment of the present application, in which a first water tank is installed.
  • Fig. 1b shows a cross-sectional view of a base station according to an embodiment of the present application, in which a first water tank is installed.
  • Fig. 1c shows the first structural schematic diagram of the first water tank provided by the embodiment of the present application.
  • Fig. 1d shows the second structural schematic diagram of the first water tank provided by the embodiment of the present application.
  • Fig. 1e shows a schematic structural diagram of the sewage tank of the first water tank provided by the embodiment of the present application.
  • Fig. 1f shows a schematic structural diagram of the clean water tank of the first water tank provided by the embodiment of the present application.
  • Fig. 1g shows a schematic structural diagram of a base station equipped with a first water tank provided by an embodiment of the present application.
  • Fig. 1h shows a schematic structural diagram of a base station provided with a first water tank according to an embodiment of the present application.
  • FIG. 2 shows another schematic structural view of a base station according to an embodiment of the present application, in which a second water tank is installed.
  • FIG. 3 shows a schematic perspective view of a base station bracket and a second water tank according to an embodiment of the present application.
  • FIG. 4 shows a schematic perspective view of a base station bracket according to an embodiment of the present application.
  • Fig. 5 shows a schematic three-dimensional structural view of the second water tank and the adapter seat according to the embodiment of the present application.
  • Fig. 6 shows a schematic diagram of the exploded structure of the second water tank of the embodiment of the present application.
  • Fig. 7a shows the first schematic cross-sectional structure of the second water tank according to the embodiment of the present application.
  • Fig. 7b shows the second schematic cross-sectional structure of the second water tank according to the embodiment of the present application.
  • Fig. 8a shows a schematic diagram of a cleaning area with cleaning ribs of a base station according to an embodiment of the present application.
  • Fig. 8b shows a schematic diagram of the cleaning area of the base station according to the embodiment of the present application after cleaning ribs are removed.
  • Fig. 9a and Fig. 9b show schematic diagrams of the second waterway system and cleaning system according to the embodiment of the present application.
  • Fig. 9c shows a schematic diagram of the water supply of the second waterway system and the cleaning system of the embodiment of the present application.
  • Fig. 9d shows a schematic diagram of drainage of the second waterway system and the cleaning system of the embodiment of the present application.
  • Fig. 9e shows a schematic diagram of supplying clean water of the first waterway system and the cleaning system of the embodiment of the present application.
  • Fig. 9f shows a schematic diagram of the collected sewage of the first waterway system and the cleaning system according to the embodiment of the present application.
  • Fig. 9g shows a schematic diagram of a state in which a base station is connected to an external water pipe according to an embodiment of the present application.
  • Fig. 10 shows a schematic diagram of detecting a first water tank by using a first magnetic member and a Hall sensor according to an embodiment of the present application.
  • FIG. 11 shows a schematic diagram of detecting a second water tank by using a second magnetic member and a Hall sensor according to an embodiment of the present application.
  • Fig. 12 shows a schematic diagram of the base station according to the embodiment of the present application embodying the relationship between the storage space of the water tank, the space for placing accessories, the partition door and the second water tank.
  • Fig. 13 to Fig. 24 respectively show the structural schematic diagrams of the base stations compatible with manual water filling and automatic water filling in different embodiments.
  • Fig. 13a and Fig. 13b respectively show schematic diagrams of different usage states of the embodiment where the first sewage tank and the second sewage tank are alternatively placed at the same position of the main body of the base station.
  • Fig. 14a to Fig. 14c respectively show the schematic diagrams of different usage states of the embodiment where the first sewage tank and the second sewage tank are placed in different positions of the main body of the base station at the same time.
  • Fig. 15a and Fig. 15b respectively show schematic diagrams of different usage states of the embodiment in which the first sewage tank is removably placed in the second sewage chamber formed on the main body of the base station.
  • Fig. 16a and Fig. 16b respectively show schematic diagrams of different usage states of the embodiment where the first sewage tank is placed in a position different from that of the second sewage chamber on the main body of the base station.
  • Fig. 17a and Fig. 17b respectively show schematic diagrams of different usage states of an embodiment in which the manual drainage system includes a first sewage tank and the automatic drainage system is directly connected to the outside world and the cleaning system through a water channel.
  • Fig. 18a and Fig. 18b respectively show schematic diagrams of different usage states of the embodiment where the first sewage tank and the second water tank are alternatively placed at the same position of the main body of the base station.
  • Fig. 19a to Fig. 19c respectively show the schematic diagrams of different usage states of the embodiments where the first sewage tank and the second water tank are placed one or both at different positions of the main body of the base station.
  • Fig. 20a to Fig. 20c respectively show schematic diagrams of different usage states of the embodiment where the first water tank and the second sewage tank are placed at different positions of the main body of the base station.
  • Fig. 21a and Fig. 21b respectively show schematic diagrams of different usage states of the embodiment where the first water tank is placed on the main body of the base station at a position different from that of the second sewage chamber.
  • Fig. 22a and Fig. 22b respectively show schematic diagrams of different usage states of an embodiment in which the manual drainage system includes the first sewage chamber formed in the first water tank and the automatic drainage system is directly connected to the outside world and the cleaning system through the water channel.
  • Fig. 23a and Fig. 23b respectively show schematic diagrams of different usage states of the embodiment where the first water tank and the second water tank are alternatively placed at the same position of the main body of the base station.
  • Fig. 24a to Fig. 24c respectively show the schematic diagrams of different usage states of the embodiment where the first water tank and the second water tank are placed in different positions of the main body of the base station at the same time or at the same time.
  • Fig. 25 to Fig. 36 respectively show the structural schematic diagrams of the base stations compatible with manual water filling and automatic water filling in different embodiments.
  • Fig. 25a and Fig. 25b respectively show schematic diagrams of different usage states of the embodiment where the first clean water tank and the second clean water tank are alternatively placed at the same position of the main body of the base station.
  • Fig. 26a to Fig. 26c respectively show the schematic diagrams of different usage states of the embodiments where the first clean water tank and the second clean water tank are placed either or both at different positions of the main body of the base station.
  • Fig. 27a and Fig. 27b respectively show schematic diagrams of different usage states of the embodiment in which the first clean water tank is removably placed in the second clean water chamber formed on the main body of the base station.
  • Fig. 28a and Fig. 28b respectively show schematic diagrams of different usage states of the embodiment where the first clean water tank is placed on the main body of the base station in a position different from that of the second clean water chamber.
  • Fig. 29a and Fig. 29b respectively show schematic diagrams of different usage states of the embodiment in which the manual water supply system includes the first fresh water tank and the automatic water supply system is directly connected to the outside world and the cleaning system through the water channel.
  • Fig. 30a and Fig. 30b respectively show schematic diagrams of different usage states of the embodiment where the first clean water tank and the second water tank are alternatively placed at the same position of the main body of the base station.
  • Fig. 31a to Fig. 31c respectively show the schematic diagrams of different usage states of the embodiments where the first clean water tank and the second water tank are placed either or both at different positions of the main body of the base station.
  • Fig. 32a to Fig. 32c respectively show schematic diagrams of different usage states of the embodiment in which the first water tank and the second clean water tank are placed at different positions of the main body of the base station.
  • Fig. 33a and Fig. 33b respectively show schematic diagrams of different usage states of the embodiment in which the first water tank is placed in a position different from that of the second clean water chamber of the main body of the base station.
  • Fig. 34a and Fig. 34b respectively show schematic diagrams of different usage states of the embodiment in which the manual water supply system includes the first clean water chamber formed in the first water tank and the automatic water supply system is directly connected to the outside world and the cleaning system through the water channel.
  • Fig. 35a and Fig. 35b respectively show schematic diagrams of different usage states of the embodiment where the first water tank and the second water tank are alternatively placed at the same position of the main body of the base station.
  • Fig. 36a to Fig. 36c respectively show the schematic diagrams of different usage states of the embodiments in which the first water tank and the second water tank are placed one or both at different positions of the main body of the base station.
  • Fig. 37 shows a schematic diagram of an exploded structure of the first check valve structure and the second check valve structure of the embodiment of the present application.
  • Fig. 38 shows a schematic perspective view of the structure of the second box body and the adapter seat according to the embodiment of the present application.
  • Fig. 39 shows a schematic perspective view of the three-dimensional structure of the clean water transfer pipe body, the clean water connecting pipe and the check valve according to the embodiment of the present application.
  • Fig. 40 shows a schematic diagram of the three-dimensional structure of the sewage transfer pipe body, the sewage connecting pipe and the valve body according to the embodiment of the present application.
  • Fig. 41 to Fig. 44 show the schematic block diagrams of the water connection relationship between the clean water system and the clean water input channel and the sewage output channel according to the embodiment of the present application.
  • Fig. 45a shows a cross-sectional view of a base station according to an embodiment of the present application.
  • Figure 45b shows an enlarged view of A in Figure 45a.
  • Fig. 46a shows a longitudinal sectional view at the adapter base of the base station according to the embodiment of the present application.
  • Figure 46b shows an enlarged view of B in Figure 46a.
  • the base station 100 includes a base station main body 8 , a first waterway system 110 and a second waterway system 120 . in:
  • a cleaning system 9 is formed on the main body 8 of the base station, and the cleaning system 9 receives clean water to clean the parts to be cleaned of the cleaning robot (not shown in the figure) and discharge the sewage generated by cleaning.
  • the to-be-cleaned parts of the cleaning robot include but not limited to mopping parts, and in some other embodiments, the to-be-cleaned parts of the cleaning robot may also include driving wheels, casings and the like.
  • the specific structural form of the cleaning system 9 is not an improvement point of the present application, and it will not be described in detail here. It can be in various forms that those skilled in the art can think of, as long as it can receive the first waterway system 110 or the second waterway system 120. The clear water and the sewage generated can be discharged to the first waterway system 110 or the second waterway system 120 .
  • the first waterway system 110 includes a first water tank 1, which is removably installed on the main body 8 of the base station, and the first water tank 1 is configured to manually add clean water and/or remove sewage.
  • the first water tank 1 is a conventional water tank (cannot be automatically filled and/or automatically launched when in use), which requires the user to manually add clean water to it or remove sewage therein. Before or after use. As shown in Figure 1, it shows a kind of conventional first water tank 1, and this first water tank 1 is provided with the opening C that can cover, can add clean water or remove sewage through this opening C, usually this first water tank After a water tank 1 is taken out from the main body 8 of the base station, clean water is added and/or sewage is poured out.
  • the first water tank 1 is formed with a first chamber 11 (as shown in Figure 10).
  • the first chamber 11 communicates with the cleaning system 9 to provide the cleaning system 9 with clean water and /or receive the sewage produced by the cleaning system 9 .
  • the present application is not limited to a specific structural form, as long as the first chamber 11 can communicate with the cleaning system 9 .
  • the first water tank 1 is provided with a first interface 111
  • the cleaning system 9 includes a second interface 81 arranged on the base station main body 8, when the first water tank 1 is installed in the base station When the main body 8 is on, the first interface 111 of the first water tank 1 is docked with the second interface 81 of the base station main body 8 to realize the communication between the first chamber 11 and the cleaning system 9 .
  • the base station main body 8 includes a base station support 80 , and the second interface 81 is formed on the base station support 80 .
  • the first interface 111 of the first water tank 1 can be docked with the second interface 81 of the base station main body 8 in different ways, for example, the second interface 81 can be inserted into the first interface 111, or the first The interface 111 is inserted into the second interface 81 .
  • the second port 81 can pass through the first port 111 into the first chamber 11. In this way, clean water or sewage will not directly flow through the first port 111, that is, the water will not will contact the inner wall of the first interface 111 , but only contact the inner wall of the second interface 81 .
  • the first water tank 1 may also be provided with through holes, pipes, etc. communicating with the first chamber 11 to communicate with the cleaning system 9, and structures such as valve bodies may also be provided at the interface or pipes, Exemplarily, the on-off of the waterway system can be controlled through the valve body; and so on. This application is not limited to this.
  • the first water tank 1 is provided with a first channel communicating with the first chamber 11 .
  • the first channel is connected to the water delivery channel to communicate with the first chamber 11 and the cleaning area 91 .
  • the water delivery channel of the base station main body 8 may include a clear water delivery channel 82; the first chamber 11 includes a first clear water chamber 11a, and the first channel includes a first clear water channel; when the first water tank 1 is installed in When the base station body 8 is on, the first clean water channel is connected to the clean water delivery channel 82 to communicate with the first clean water chamber 11a and the cleaning area, and then the first clean water chamber 11a can deliver the clean water required for cleaning to the cleaning area.
  • the cleaning area 91 may be provided with a water spray hole 911 , and the clean water in the water tank may flow to the water spray hole 911 through the clean water delivery channel 82 , and finally be sprayed from the water spray hole 911 to the cleaning area 91 .
  • the water delivery channel of the base station main body 8 may include a sewage delivery channel 93; the first chamber 11 includes a first sewage chamber 11b, and the first channel includes a first sewage channel; when the first water tank 1 is installed in When the base station main body 8 is on, the first sewage channel is connected to the sewage conveying channel 93 to communicate with the first sewage chamber 11b and the cleaning area, and then the first sewage chamber 11b can receive the sewage discharged from the cleaning area 91 .
  • the cleaning area 91 can be provided with cleaning ribs 92, and when the cleaning robot is self-cleaning on the base station 100, the cleaning ribs 92 of the cleaning area 91 can be cleaned with the object to be cleaned (such as mopping) of the cleaning robot. pieces) keep in contact while scraping off the dirt on the piece to be cleaned.
  • the specific structural form of the cleaning area 91 is described below.
  • the sewage generated after cleaning can be discharged through the drainage hole 912, and the sewage discharged from the drainage hole 912 can be transported to the first sewage chamber 11b through the sewage conveying channel 83.
  • the first channel can have different implementation forms, for example, the above-mentioned interfaces, through holes, pipelines, etc. can be used; the water delivery channel can also have different implementation forms; It only needs to connect the water channel to realize the communication between the first chamber 11 and the cleaning system 9 .
  • the first water tank 1 may include a first clean water tank 1a and a first dirty water tank 1b which are independent from each other, and the first clean water tank 1a forms a first clean water chamber for storing clean water 11a, the first sewage tank 1b forms a first sewage chamber 11b for storing sewage.
  • a first water tank 1 can also be used to simultaneously form a first clean water chamber 11a for storing clean water and a first sewage chamber 11b for storing sewage.
  • the base station may also only include the first water tank 1 capable of providing clean water or receiving sewage.
  • the second waterway system includes a waterway channel 3, the waterway channel 3 is used to communicate with the external waterway, so that the clean water of the external waterway (such as a water pipe) can pass through the waterway channel 3 and the cleaning on the base station main body 8
  • the system is connected so that the clean water from the external waterway can be sent to the cleaning system.
  • the sewage generated by the cleaning system of the base station main body 8 can be discharged to an external waterway (such as a drainage pipe, which can be connected to a sewer) through the waterway channel 3 .
  • an external waterway such as a drainage pipe, which can be connected to a sewer
  • the base station 100 can be connected to a tap water source (not shown in the figure) through an external water pipe 101 , and can be connected to a sewer through an external sewage pipe 102 .
  • the water channel 3 is used to receive and deliver clean water from an external water channel (such as a water pipe) outside the base station to provide to the cleaning system 9 . And/or, the water channel 3 is used to receive the sewage generated by the cleaning system 9 and discharge it to the outside of the base station.
  • using the second waterway system can only be able to carry out water supply (clean water supply), also can only be able to carry out water supply (sewage sewage), also can be able to carry out water supply and sewage at the same time, of course, also can It may be possible to choose between upper water, lower water, simultaneous upper and lower water, etc., as long as the second waterway system can be used to realize the communication between the cleaning system 9 and the outside of the base station for water delivery.
  • the external clean water in order to realize that the external clean water can be delivered to the base station 100, the external clean water can be directly flowed to the base station 100 under the action of external water pressure, or the external clean water can be delivered to the base station 100 by a power device (such as a pump body).
  • a power device such as a pump body
  • a power device can be used to pump the sewage to the outside.
  • the second waterway system further includes a second chamber 41
  • the second chamber 41 is used to receive and store the clean water input by the waterway channel 3 and provide the clean water to the cleaning system 9
  • the second chamber 41 is used to receive and store the sewage generated by the cleaning system 9 and output the sewage to the water channel 3 .
  • the second chamber 41 can still be used for temporary storage of clean water and/or sewage, which effectively protects the The use reliability of the base station is also conducive to improving the convenience of use.
  • the second waterway system includes a second water tank 4, the second chamber 41 can be formed in the second water tank 4, and the second water tank 4 is removably installed on the main body 8 of the base station; the waterway At least part of the channel 3 is formed in the second water tank 4 ; when the second water tank 4 is installed on the main body 8 of the base station, the second chamber 41 communicates with the cleaning system 9 . Since the second chamber 41 is formed on the second water tank 4, it is necessary to set a channel on the second water tank 4 that can communicate with the second chamber 41. Specifically, the water channel 3 can be integrally arranged on the second water tank 4.
  • the water channel 3 on the second water tank 4 can be directly used to communicate with the external water channel.
  • the water channel 3 can also be partially arranged on the second water tank 4 and partly arranged on the base station main body 8.
  • the second water tank 4 is installed on the base station main body 8
  • the second water tank The components of the waterway channel 3 on 4 are connected with the components of the waterway channel 3 on the base station main body 8 to form an integral waterway channel 3 . Since the second chamber 41 is formed in the second water tank 4, it is convenient to take it out for cleaning and other operations.
  • the cleaning system 9 includes a cleaning area 91 and a water delivery channel 93 communicating with the cleaning area 91 .
  • the second water tank 4 is provided with a second channel and a third channel (ie, the water channel 3 ) communicating with the second chamber 41 .
  • the second channel is connected to the water delivery channel to communicate with the second chamber 41 and the cleaning area, and the third channel is used to communicate with the external waterway.
  • the water delivery channel 93 includes a clear water delivery channel 93a; the second chamber 41 includes a second clear water chamber 41a, the second channel 43 includes a second clear water channel 43a, and the third channel includes The third clear water channel 3a; when the second water tank 4 is installed on the base station main body 8, the second clear water channel 43a connects the clear water delivery channel 93a to communicate with the second clear water chamber 41a and the cleaning area 91, and then the second clear water chamber 41a can deliver the clean water required for cleaning to the cleaning area 91 (shown by the dotted arrow in FIG. 9c is the clean water flow path), and the third clean water channel 3a is used to communicate with the external waterway to receive the clean water delivered by the external water source and transport it to the second clean water chamber 41a.
  • the water delivery channel 93 includes a sewage delivery channel 93b; the second chamber 41 includes a second sewage chamber 41b, the second channel 43 includes a second sewage channel 43b, and the third channel includes The third sewage channel 3b; when the second water tank 4 is installed on the base station main body 8, the second sewage channel 43b is connected to the sewage conveying channel 93b to communicate with the second sewage chamber 41b and the cleaning area, and then the second sewage chamber 41b It can receive the sewage discharged from the cleaning area 91 (the dotted arrow in Fig. 9d shows the sewage flow path), and the third sewage channel 3b is used to connect the external waterway to output the sewage in the second sewage chamber 41b to the external waterway.
  • the second channel 43 can have different forms of realization, for example, can adopt the form of interface, through hole, pipeline, etc.; the water delivery channel can also have different forms of realization; It only needs to connect the channel to realize the communication between the second chamber 41 and the cleaning system 9 .
  • the third channel 3 can also have different implementation forms, as long as it can be directly or indirectly connected to the external waterway.
  • the third sewage channel 3b may be provided with a first power device 34, and the first power device 34 is used to provide transmission power to output the water in the second sewage chamber 41b to an external waterway.
  • the first power unit 34 may include, but is not limited to, a pump.
  • the base station when the base station includes a first water tank 1 and a second water tank 4 that are installed on the main body 8 of the base station, the first water tank 1 and the second water tank 4 use the first channel and the second channel respectively
  • the water delivery channel of cleaning system 9 is connected.
  • the water delivery channel is provided with a second power unit 36; when the first water tank 1 or the second water tank 4 is installed on the main body 8 of the base station, the second power unit 36 is used to provide power for transporting the first water tank 1 Either the clean water in the second water tank 4 is sent to the cleaning area, or the sewage in the cleaning area is sent to the first water tank 1 or the second water tank 4 .
  • a second clean water chamber 41a for storing clean water and a second sewage chamber 41b for storing sewage are formed in the second water tank 4; that is to say, the same water tank has both
  • the function of storing clean water also has the function of storing sewage.
  • the second water tank 4 may also include a second clean water tank and a second dirty water tank independent of each other, and the second clean water tank is formed with a second water tank for storing clean water.
  • the clean water chamber and the second sewage tank form a second sewage chamber for storing sewage.
  • the base station can also only include a second clean water tank or only a second dirty water tank.
  • the second water tank 4 is provided with a third interface 42 communicating with the second chamber 11.
  • the third interface 42 is docked with the second interface 81 of the cleaning system 9 to realize the communication between the second chamber 41 and the cleaning system 9 .
  • the third interface 42 on the second water tank 4 can be docked with the second interface 81 on the base station main body 8 in different ways, for example, the third interface 42 can be inserted into the second interface 81, or, The second interface 81 is inserted into the third interface 42 .
  • the second interface 81 can pass through the third interface 42 into the second chamber 41, in this way, clean water or sewage will not directly flow through the third interface 42 at this time, that is, The water will not contact the inner wall of the third interface 42 , but only contact the inner wall of the second interface 81 .
  • the second water tank 4 may also include structures such as through holes, pipes and/or valve bodies arranged on the second water tank 4 to facilitate the communication between the second chamber 41 and the cleaning system 8. The body controls the on-off of the waterway system; and so on. The present application does not limit this, as long as the second chamber 41 can communicate with the cleaning system 9 on the main body 8 of the base station.
  • the second water tank 4 includes a detachable first tank body 45 and a second tank body 46, the second chamber 41 is formed in the first tank body 45, and the water channel 3 is simultaneously Formed in the first box body 45 and the second box body 46, when the first box body 45 and the second box body 46 are butted together, the water channel 3 is located in the component part of the first box body 45 and in the second box body 46 components are interconnected.
  • the water channel 3 includes a fourth interface 31 arranged in the first box body 45, a fifth interface 32 and a delivery pipeline 33 arranged in the second box body 46, and the fourth interface 31 communicates with the second chamber 41 , the fifth interface 32 is located at one end of the delivery pipeline 33, and the other end of the delivery pipeline 33 is used to connect to an external waterway.
  • the fourth interface 31 and the fifth The interface 32 is connected to communicate with the second chamber 41 and the delivery pipeline 33 .
  • the fourth interface 31 includes a first check valve structure 310
  • the fifth interface 32 includes a second check valve structure 320
  • the first check valve structure 310 and the second check valve structure 320 are configured to: when When the first box body 45 is docked with the second box body 46 , they are docked and mutually pushed to the open state, and when the first box body 45 and the second box body 46 are separated, they are automatically reset to the closed state.
  • the corresponding port of the waterway channel 3 can be connected to a detachable adapter seat 70, of course, the adapter seat 70 can also be regarded as a component of the second water tank 4 .
  • the second water tank 4 is installed on the base station main body 8 first, and then the adapter base 70 is connected to the second water tank 4 .
  • the second box body 46 in this example can be regarded as a component of the base station main body 8 , and the first box body 45 is the second water tank 4 at this time.
  • the first water tank 1 and the second water tank 4 are configured to be alternatively installed at the same position on the main body 8 of the base station.
  • the second water tank 4 or the first water tank 1 that does not have the function of automatic water loading and unloading is installed on the main body 8 of the base station, and is conducive to the reuse of the main body 8 of the base station, without the need to configure a base station for each water tank, which is conducive to saving manufacturing costs.
  • a water tank accommodating space 82 may be provided on the base station main body 8 , specifically formed on the base station bracket 80 .
  • the water tank accommodating space 82 includes the water tank occupied by the first water tank 1 and/or the second water tank 4
  • the installation space 84 and the accessory placement space 83 not occupied by the first water tank and/or the second water tank 4 for example, the cleaning parts of the cleaning robot can be placed in the accessory placement space 83 .
  • the base station can be equipped with an additional accessory placement function, so that the user can quickly find the accessory when using the accessory.
  • the water tank accommodation space 82 is provided with a partition door M that separates the accessory placement space 83 from the water tank installation space 84, and the partition door M is swingably connected to the opposite end of the opening end of the accessory placement space 83.
  • the partition door M To the main body 8 of the base station; when installed in the water tank accommodating space 82, the first water tank 1 and/or the second water tank 4 are spaced from the partition door M to allow the partition door M to swing toward the first water tank 1 and/or the second water tank 4 .
  • the partition door M it is possible to prevent the accessories placed in the accessory placement space 83 from sliding to the installation position of the first water tank 1 and/or the second water tank 4, thereby affecting the first water tank 1 and/or the second water tank 4.
  • the first water tank 1 and the second water tank 4 are alternatively installed in the water tank accommodating space 82, and specifically can be installed in the water tank installation space 84.
  • the distance between the partition door M and the partition door M is relatively small or there is no gap. At this time, the opening of the partition door M will be restricted. After the first water tank 1 is taken out, the partition door M can be opened at a larger angle to further open the accessory storage space 83. Thereby it is convenient to take and place accessories; when the second water tank 4 is installed in the water tank accommodating space 82, the distance between it and the partition door M is relatively large. Opens further for easy access to accessories.
  • the cleaning system 9 includes a water delivery channel 93 .
  • the first water tank 1 is formed with a first chamber 11 and a first passage 12 communicating with the first chamber 11.
  • the first passage 12 is connected with the water delivery passage to It communicates with the first chamber 11 and the cleaning system 9 .
  • the second water tank 4 is formed with a second chamber 41 and a second passage communicating with the second chamber 41.
  • the second passage is connected with the water delivery passage to communicate with the second water tank 4.
  • the water delivery channel 93 includes a clean water delivery channel 93a; the first chamber 11 includes a first clean water chamber 11a, and the first channel 12 includes a first clean water channel 12a.
  • the first water tank 1 When being located on the base station main body 8, the first clear water channel 12a is connected to the clear water delivery channel 93a to communicate with the first clear water chamber 11a and the cleaning area 91, and then the first clear water chamber 11a can deliver the required clear water for cleaning to the cleaning area 91 ( The dotted arrow in Fig. 9e shows the clear water flow path).
  • the water delivery channel 93 includes a sewage delivery channel 93b; the first chamber 11 includes a first sewage chamber 11b, and the first channel 12 includes a first sewage channel 12b.
  • the first sewage channel 12b When installed on the main body of the base station 8, the first sewage channel 12b is connected to the sewage conveying channel 93b to communicate with the first sewage chamber 11b and the cleaning area 91, and then the sewage generated in the cleaning area 91 can be transported to the first sewage chamber 11b (the dotted arrow in Fig. 9f shows the clear water flow path).
  • the water delivery channel 93 includes a clear water delivery channel 93a; the second chamber 41 includes a second clear water chamber 41a, the second channel 43 includes a second clear water channel 43a, and the third channel 3 Including the third clean water channel 3a; when the second water tank 4 is installed on the base station main body 8, the second clean water channel 43a is connected to the clean water delivery channel 93a to communicate with the second clean water chamber 41a and the cleaning area 91, and then the second clean water chamber
  • the chamber 41a can deliver clean water required for cleaning to the cleaning area 91 (the dotted arrow in FIG. 9c shows the flow path of clean water).
  • the water delivery channel 93 includes a sewage delivery channel 93b; the second chamber 41 includes a second sewage chamber 41b, the second channel 43 includes a second sewage channel 43b, and the third channel 3 Including the third sewage channel 3b; when the second water tank 4 is installed on the base station main body 8, the second sewage channel 43b is connected to the sewage conveying channel 93b to communicate with the second sewage chamber 41b and the cleaning area, and then the second sewage chamber 41b can receive the sewage discharged from the cleaning area 91 (the dotted arrow in Fig. 9d shows the sewage flow path).
  • the second water tank 4 is provided with the third channel 3 communicating with the second chamber 41;
  • Installation port when the second water tank 4 is installed in the water tank accommodating space 82, the third channel corresponds to the installation port and uses the installation port to connect with the external waterway, so as to receive the clean water from the external water source and transport it to the second chamber 41, or discharge Sewage in the second chamber 41.
  • the setting of the installation port facilitates the connection of the second water tank 4 with the external waterway.
  • an adapter seat 70 is detachably assembled at the installation port, and the adapter seat 70 is used to connect with the third passage, and then the third passage can be connected to an external waterway by means of the adapter seat 70 .
  • the first water tank 1 includes a first clean water tank 1a and a first dirty water tank 1b
  • the second water tank 4 is provided with a second clean water chamber 41a for storing clean water and a second sewage chamber 41b for storing sewage
  • first water tank 1 and the second water tank 4 can also be installed at different positions on the main body 8 of the base station simultaneously or alternatively.
  • first water tank 1 and the second water tank 4 are alternatively installed at the same position of the base station main body 8 , or are installed at different positions on the base station main body 8 at the same time or alternatively.
  • the following is an example of installing the first water tank 1 and the second water tank 4 at the same position of the main body 8 of the base station:
  • One of the first clean water tank 1a and the second clean water tank is installed at the same position of the base station main body 8;
  • One of the first sewage tank 1b and the second sewage tank is installed at the same position of the base station main body 8;
  • One of the first clean water tank 1a and the second clean water tank is installed at the same position of the base station main body 8 and one of the first dirty water tank 1b and the second dirty water tank is installed at the same position of the base station main body 8;
  • the first water tank 1 includes a first clean water chamber 11a for storing clean water and a first sewage chamber 11b for storing sewage
  • the second water tank 4 includes a second clean water chamber 41a for storing clean water and a second clean water chamber 41a for storing sewage.
  • the second sewage chamber 41b, the first water tank 1 and the second water tank 4 are installed at the same position of the main body 8 of the base station;
  • the first water tank 1 includes a first clean water chamber 11a for storing clean water and a first sewage chamber 11b for storing sewage, and the first water tank 1 is placed on the base station main body 8; or, the second clean water tank and/or the second The waste water tank is placed at the same position on the base station main body 8;
  • the second water tank 4 includes a second clean water chamber 41a for storing clean water and a second sewage chamber 41b for storing sewage, and the second water tank 4 is placed on the base station main body 8; or, the first clean water tank 1a and/or the second water tank 1a A sewage tank 1b is placed at the same position of the main body 8 of the base station.
  • the second chamber 41 does not necessarily need to be formed on the water tank, it can also be formed on the main body 8 of the base station.
  • the first chamber 11 that realizes different functions can be formed on the first water tank 1 and the base station main body 8 respectively, and it is not excluded that a second chamber that realizes the same function is simultaneously provided on the first water tank 1 and the base station main body 8 Room 41.
  • the first water tank 1 can be installed in the second chamber 41, and can also be installed in a position different from the second chamber 41 on the base station main body 8, which will not be described here. limit.
  • the cleaning system 9 includes a clean water delivery channel;
  • the second waterway system includes a clean water chamber j and a clean water input channel communicated with the clean water chamber j, and the clean water chamber j and the clean water input channel are arranged on The main body of the base station 8;
  • the clean water chamber j communicates with the clean water conveying channel to provide clean water to the cleaning system 9;
  • the clean water input channel is used to connect to an external waterway to transport clean water from an external water source to the clean water chamber j.
  • the clean water chamber j and the clean water input channel arranged on the main body 8 of the base station can be used to realize automatic water filling of the base station.
  • the clean water chamber j can accommodate a clean water tank h; the clean water tank h is provided with a clean water chamber h1 and a clean water channel connected with the clean water chamber h1; when the clean water tank h is accommodated in the clean water chamber j, the clean water channel and the clean water delivery channel Connect to connect the clean water chamber h1 and the cleaning system 9.
  • the base station can not only use the conventional water tank to provide clean water for the cleaning system 9, but also use the clean water chamber j and the clean water input channel on the main body 8 of the base station to realize the automatic water supply of the base station, achieving a compatible effect.
  • the cleaning system 9 includes a sewage delivery channel;
  • the second waterway system includes a sewage cavity c and a sewage output channel connected to the sewage cavity c, and the sewage cavity c and the sewage output channel are arranged on the main body 8 of the base station;
  • the sewage cavity c communicates with the sewage conveying channel to receive the sewage discharged from the cleaning system 9;
  • the sewage output channel is used to connect the external waterway to discharge the sewage in the sewage cavity c.
  • the sewage chamber c can accommodate a sewage tank a; the sewage tank a is provided with a sewage chamber a1 and a sewage channel connected with the sewage chamber a1; when the sewage tank a is accommodated in the sewage chamber c, the sewage channel and the sewage conveying channel Connect to communicate with the sewage chamber a1 and the cleaning system 9.
  • the base station can not only use the conventional water tank to receive the sewage discharged from the cleaning system 9, but also use the sewage cavity c and the sewage output channel on the main body 8 of the base station to realize the automatic launching of the base station, achieving a compatible effect.
  • the second waterway system is not limited to the above embodiment including the second chamber 41 .
  • the second waterway system can be connected to the cleaning system 9 by using the waterway channel 3 , so that there is no need to set the second chamber 41 for temporarily storing clean water and/or sewage.
  • the water channel 3 includes a clean water input channel, which is arranged on the main body of the base station 8; In this way, there is no need to set the second clean water chamber 41a for temporarily storing clean water.
  • the waterway channel 3 includes a sewage output channel, which is set on the main body of the base station 8; the sewage output channel communicates with the cleaning system 9 and is used to connect to an external waterway to discharge the sewage generated by the cleaning system 9 . In this way, there is no need to set up the second sewage chamber 41b for temporarily storing sewage.
  • the second waterway system includes both the automatic water supply system and the automatic water launching system, one of them can adopt the scheme including the second chamber 41, and the other can adopt the scheme not including the second chamber 41; or,
  • the second waterway system can adopt solutions including the second chamber 41 and not including the second chamber 41 at the same time, for example, the waterway channel 3 is connected to the cleaning system 9 on the one hand and connected to the second chamber 41 on the other hand.
  • the above-mentioned waterway channel 3 is not limited to the specific form in the above example, according to different embodiments, whether it is only formed on the base station main body 8, or only formed on the second water tank 4, or formed at the same time On the second water tank 4 and the main body 8 of the base station, or in other cases, there can be various methods, as long as the purpose of making clean water input from the waterway outside the base station or sewage discharged to the outside of the base station can be achieved.
  • the waterway channel 3 may only include a through hole or an interface formed on the second water tank 4 or the base station main body 8, and the through hole or interface makes the external waterway communicate with the second chamber 41 (for example, the port of the external waterway can pass through the The through hole or the interface directly penetrates into the second chamber 41, and at this moment, the liquid does not directly flow through the through hole or the interface; certainly, the port of the external waterway can also be connected with the through hole or the interface in other ways); or the water channel 3 may include structures such as pipes arranged on the second water tank 4 and/or base station main body 8; or, the waterway channel 3 may also include structures such as check valves or joints arranged in through holes, interfaces or pipes and communicate with External plumbing connections; etc.
  • a pump 34 is provided on the waterway channel 3 , and the pump 34 is used to receive clean water from the external waterway for the second chamber 41 or discharge the sewage in the second chamber 41 to the outside. Provide transmission power.
  • the pump 34 may have different installation methods, and may be installed on the second water tank 4 or on the base station main body 8 .
  • the pump 34 is arranged on the delivery pipeline 33 on the second tank body 46 of the second water tank 4 .
  • the pump 34 may be a different type of pump 34, such as a vane pump.
  • first waterway system and the second waterway system may be connected to the same position of the cleaning system 9 or may be connected to different positions of the cleaning system 9 , which is not limited in the present application.
  • the first waterway system and the second waterway system provide clean water for the cleaning system 9 and/or receive the cleaning system either or simultaneously 9 Sewage generated (that is, it can at least cover the following situations: choose one upper water, choose one lower water, choose one upper water and lower water, simultaneously upper water, simultaneous lower water, and simultaneous upper and higher water;
  • the corresponding launching or launching into the water may use the first waterway system or the second waterway system).
  • the first waterway system and the second waterway system provide clean water and/or receive sewage, one is selected.
  • the first waterway system may include a manual water supply system and a manual water supply system or one of a manual water supply system and a manual water supply system;
  • the second waterway system may include an automatic water supply system and an automatic water supply system or One of an automatic water filling system and an automatic water launching system is included.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic launching system includes a second sewage chamber b1 formed in the second sewage tank b for receiving the sewage transported by the cleaning system 9, and the second sewage chamber b1 communicates with the outside world through the water channel;
  • One of the first dirty water tank a and the second dirty water tank b is placed at the same position on the main body of the base station.
  • first sewage tank a and the second sewage tank b are placed at the same position of the main body of the base station, while achieving compatibility with manual launching and automatic launching, it is possible to avoid additional or excessive occupancy of the space of the main body of the base station.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic launching system includes a second sewage chamber b1 formed in the second sewage tank b for receiving the sewage transported by the cleaning system 9, and the second sewage chamber b1 communicates with the outside world through the water channel;
  • the first dirty water tank a and the second dirty water tank b can be placed in different positions of the main body of the base station at one or the same time; when they are placed at the same time, they can be set to launch simultaneously or choose one to launch according to the situation.
  • the first sewage tank a when the first sewage tank a is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first sewage tank a is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or, when the second sewage tank b is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the second sewage tank b is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9 on and off.
  • first sewage tank a and the second sewage tank b are placed in different positions of the main body of the base station, it can be configured so that the first sewage tank a and the second sewage tank b are always placed on the main body of the base station (except for the case where it needs to be taken out) There is no need to store the first waste water tank a or the second waste water tank b, and it can also be set to launch both simultaneously, select one of them, or switch between simultaneously launching and selecting one according to the situation.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic launching system includes a second sewage chamber c formed on the main body of the base station for receiving sewage transported by the cleaning system 9, and the second sewage chamber c communicates with the outside world through a water channel;
  • the first sewage tank a is removably placed in the second sewage chamber c, and one of the manual launching system and the automatic launching system is selected for launching.
  • the first sewage tank a is removably placed in the second sewage chamber c, while achieving compatibility with manual launching and automatic launching, additional or excessive occupancy of the main body space of the base station can be avoided.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic launching system includes a second sewage chamber c formed on the main body of the base station for receiving sewage transported by the cleaning system 9, and the second sewage chamber c communicates with the outside world through a water channel;
  • the first sewage tank a is placed in a position different from the second sewage chamber c on the main body of the base station;
  • the first waste water tank a When the first waste water tank a is placed on the main body of the base station, it can be set as the manual launching system and the automatic launching system for launching simultaneously or alternatively for launching according to the situation;
  • the first sewage tank a may not be placed on the main body of the base station.
  • the first sewage tank a when the first sewage tank a is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first sewage tank a is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or the second sewage chamber c may always be in communication with the cleaning system 9 , or may be in communication with the cleaning system 9 in a controlled on-off manner.
  • first sewage tank a and the second sewage chamber c are arranged in different positions of the main body of the base station, it can be configured so that the first sewage tank a is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to specially adjust the second sewage tank a A waste water tank a is stored. It can also be set to launch both simultaneously, choose one to launch or switch between launching at the same time and choosing to launch according to the situation.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic drainage system is directly connected to the outside world and the cleaning system 9 through the water channel d, that is, the second sewage chamber is not included;
  • the first waste water tank a When the first waste water tank a is placed on the main body of the base station, it can be set as the manual launching system and the automatic launching system for launching simultaneously or alternatively for launching according to the situation;
  • the first sewage tank a may not be placed on the main body of the base station.
  • the first sewage tank a when the first sewage tank a is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first sewage tank a is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or the water channel d can be controlled to communicate with the cleaning system 9 on and off.
  • the automatic launching system is directly connected to the outside world and the cleaning system 9 through the water channel d, while achieving compatibility with manual launching and automatic launching, it can avoid additional or excessive occupation of the main body space of the base station.
  • it can be configured so that the first sewage tank a is always placed on the main body of the base station (except when it needs to be taken out), and there is no need for the first sewage tank a to be specially stored.
  • it can also be set so that the automatic launching system and the manual launching system can be launched at the same time, one can be selected for launching, or switching between simultaneous launching and manual launching can be performed.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic sewer system includes a second sewage chamber e1 formed in the second water tank e for receiving the sewage delivered by the cleaning system 9.
  • the second sewage chamber e1 communicates with the outside world through the water channel.
  • the second water tank e also includes an automatic upper
  • the second clean water chamber e2 which is part of the water system, communicates with the outside world through the water channel;
  • One of the first sewage tank a and the second water tank e is placed at the same position of the main body of the base station.
  • water supply and discharge can be performed through the automatic water supply system and the automatic water supply system respectively; of course, other situations are not excluded, such as water supply can also be performed through a manual water supply system.
  • first sewage tank a and the second water tank e are placed at the same position of the main body of the base station, while achieving compatibility with manual launching and automatic launching, additional or excessive occupation of the space of the main body of the base station can be avoided.
  • the manual launching system includes a first sewage chamber a1 formed in the first sewage tank a for receiving the sewage transported by the cleaning system 9;
  • the automatic sewer system includes a second sewage chamber e1 formed in the second water tank e for receiving the sewage delivered by the cleaning system 9.
  • the second sewage chamber b1 communicates with the outside world through the water channel.
  • the second water tank e also includes an automatic upper
  • the second clean water chamber e2 which is part of the water system, communicates with the outside world through the water channel;
  • the first sewage tank a and the second water tank e can be placed in different positions of the main body of the base station at one or the same time; when they are placed at the same time, they can be set to be launched simultaneously or alternatively according to the situation.
  • the first sewage tank a when the first sewage tank a is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first sewage tank a is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or, when the second water tank e is placed on the main body of the base station, the second sewage chamber e1 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner. When the second water tank e is placed on the main body of the base station, the second clean water chamber e2 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • first sewage tank a and the second water tank e are placed in different positions of the main body of the base station, it can be configured so that the first sewage tank a and the second water tank e are always placed on the main body of the base station (except when they need to be taken out), without
  • the first waste water tank a or the second water tank e is specially stored, and it can also be set to launch both at the same time, choose one to launch or switch between simultaneous launching and alternative water launching according to the situation.
  • the manual sewer system includes a first sewage chamber f1 formed in the first water tank f for receiving the sewage delivered by the cleaning system 9 , and the first water tank f also includes a chamber f1 for providing clean water for the cleaning system 9 .
  • the first clean water chamber f2, the first clean water chamber f2 is an integral part of the manual water supply system;
  • the automatic launching system includes a second sewage chamber b1 formed in the second sewage tank b for receiving the sewage transported by the cleaning system 9, and the second sewage chamber b1 communicates with the outside world through the water channel;
  • the first water tank f and the second sewage tank b are placed in different positions of the main body of the base station;
  • the second waste water tank b When the second waste water tank b is placed on the main body of the base station, it can be set to use the manual drainage system and the automatic drainage system at the same time or alternatively according to the situation;
  • the second sewage tank b may not be placed on the main body of the base station.
  • the first sewage chamber f1 when the first water tank f is placed on the main body of the base station, the first sewage chamber f1 is in communication with the cleaning system 9, or when the first water tank f is placed on the main body of the base station, the first sewage chamber f1 can be The on-off control is connected with the cleaning system 9; and/or, when the second sewage tank b is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or the second sewage tank b can be controlled on-off when placed on the main body of the base station Connected with cleaning system 9.
  • the first clean water chamber f2 When the first water tank f is placed on the main body of the base station, the first clean water chamber f2 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • the first water tank f and the second sewage tank b are placed in different positions of the main body of the base station, according to different situations, it can be configured so that the first water tank f and/or the second sewage tank b are always placed on the main body of the base station (except for taking out Except the situation), there is no need to store the second waste water tank b specially.
  • it can also be set so that the automatic launching system and the manual launching system can be launched at the same time, one can be selected for launching, or switching between simultaneous launching and manual launching can be performed.
  • the manual sewer system includes the first sewage chamber f1 for receiving the sewage delivered by the cleaning system 9 formed in the first water tank f;
  • the first clean water chamber f2, the first clean water chamber f2 is an integral part of the manual water supply system;
  • the automatic launching system includes a second sewage chamber c formed on the main body of the base station for receiving sewage transported by the cleaning system 9, and the second sewage chamber c communicates with the outside world through a water channel;
  • the first water tank f is placed on the main body of the base station at a position different from that of the second sewage chamber c;
  • the first water tank f When the first water tank f is placed on the main body of the base station, it can be set as the manual launching system and the automatic launching system to launch water at the same time or choose one to launch water according to the situation;
  • the first water tank f may not be placed on the main body of the base station.
  • the first sewage chamber f1 when the first water tank f is placed on the main body of the base station, the first sewage chamber f1 is in communication with the cleaning system 9, or when the first water tank f is placed on the main body of the base station, the first sewage chamber f1 can be and/or, the second sewage chamber c may always be in communication with the cleaning system 9 , or may be in communication with the cleaning system 9 in a controlled on-off manner.
  • the first clean water chamber f2 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • the manual launching system and the automatic launching system can exist at the same time on the main body of the base station, it can be set that the automatic launching system and the manual launching system can be launched at the same time, choose one for launching or switch between simultaneous launching and manual launching according to the situation.
  • the first water tank f and the second sewage chamber c are arranged in different positions of the main body of the base station, it can be configured so that the first water tank f is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to specialize the first water tank f to collect.
  • the manual sewer system includes the first sewage chamber f1 for receiving the sewage delivered by the cleaning system 9 formed in the first water tank f;
  • the first clean water chamber f2, the first clean water chamber f2 is an integral part of the manual water supply system;
  • the automatic drainage system is directly connected to the outside world and the cleaning system 9 through the water channel d;
  • the first water tank f can be placed on the main body of the base station.
  • the manual launching system and the automatic launching system can be set to launch simultaneously or choose one to launch according to the situation;
  • the first water tank f may not be placed on the main body of the base station.
  • the first sewage chamber f1 when the first water tank f is placed on the main body of the base station, the first sewage chamber f1 is in communication with the cleaning system 9, or when the first water tank f is placed on the main body of the base station, the first sewage chamber f1 can be It is controlled to communicate with the cleaning system 9; and/or the water channel d is controlled to communicate with the cleaning system 9.
  • the first clean water chamber f2 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • the automatic launching system is directly connected to the outside world and the cleaning system 9 through the water channel d, while achieving compatibility with manual launching and automatic launching, it can avoid additional or excessive occupation of the main body space of the base station.
  • it can be configured so that the first water tank f is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to specially store the first water tank f.
  • it can also be set so that the automatic launching system and the manual launching system can be launched at the same time, one can be selected for launching, or switching between simultaneous launching and manual launching can be performed.
  • the manual sewer system includes the first sewage chamber f1 for receiving the sewage delivered by the cleaning system 9 formed in the first water tank f;
  • the first clean water chamber f2, the first clean water chamber f2 is an integral part of the manual water supply system;
  • the automatic sewer system includes a second sewage chamber e1 formed in the second water tank e for receiving the sewage delivered by the cleaning system 9.
  • the second sewage chamber e1 communicates with the outside world through the water channel.
  • the second water tank e also includes an automatic upper
  • the second clean water chamber e2 which is part of the water system, communicates with the outside world through the water channel;
  • One of the first water tank f and the second water tank e is placed on the same position of the main body of the base station.
  • first water tank f and the second water tank e are placed at the same position of the main body of the base station, while achieving compatibility with manual and automatic water loading and unloading, additional or excessive occupation of the space of the main body of the base station can be avoided.
  • the manual sewer system includes the first sewage chamber f1 for receiving the sewage delivered by the cleaning system 9 formed in the first water tank f;
  • the first clean water chamber f2, the first clean water chamber f2 is an integral part of the manual water supply system;
  • the automatic sewer system includes a second sewage chamber e1 formed in the second water tank e for receiving the sewage delivered by the cleaning system 9.
  • the second sewage chamber e1 communicates with the outside world through the water channel.
  • the second water tank e also includes an automatic upper
  • the second clean water chamber e2 which is part of the water system, communicates with the outside world through the water channel;
  • One or both of the first water tank f and the second water tank e are placed in different positions of the main body of the base station.
  • the automatic launching system may include more than one subsystem at the same time.
  • the way for the second sewage chamber to receive the sewage can also include the way that the water channel is directly connected to the cleaning system 9 and the outside of the base station.
  • the cleaning system 9 may only use manual water feeding, or only automatic water feeding (multiple methods may exist), or be compatible with manual water feeding and automatic water feeding. Water (choose one or add water at the same time).
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9;
  • the automatic water supply system includes a second clean water chamber i1 formed in the second clean water tank i for providing clean water for the cleaning system 9, and the second clean water chamber i1 communicates with the outside world through a water channel;
  • One of the first clean water tank h and the second clean water tank i is placed at the same position on the main body of the base station.
  • first clean water tank h and the second clean water tank i are placed at the same position of the main body of the base station, while achieving compatibility with manual water filling and automatic water filling, additional or excessive occupation of the space of the main body of the base station can be avoided.
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9;
  • the automatic water supply system includes a second clean water chamber i1 formed in the second clean water tank i for providing clean water for the cleaning system 9, and the second clean water chamber i1 communicates with the outside world through a water channel;
  • One of the first clean water tank h and the second clean water tank i may be placed in different positions of the main body of the base station; when placed at the same time, it can be set to perform water filling at the same time or choose one of them according to the situation.
  • the first clean water tank h when the first clean water tank h is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first clean water tank h is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or, when the second clean water tank i is placed on the main body of the base station, it is in communication with the cleaning system 9, or when the second clean water tank i is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9 on and off.
  • first clean water tank h and the second clean water tank i are placed in different positions of the main body of the base station, it can be configured so that the first clean water tank h and the second clean water tank i are always placed on the main body of the base station (except when it needs to be taken out) , there is no need to store the first clean water tank h or the second clean water tank i, and it can also be set to perform both water filling at the same time, choose one of them, or switch between simultaneous water filling and one of the water filling according to the situation. .
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9;
  • the automatic water supply system includes a second clean water chamber j formed on the main body of the base station to provide clean water for the cleaning system 9, and the second clean water chamber j communicates with the outside world through a water channel;
  • the first clean water tank h is removably placed in the second clean water chamber j, and one of the manual water supply system and the automatic water supply system is selected for water supply.
  • the first clean water tank h is removably placed in the second clean water chamber j, while achieving compatibility with manual water filling and automatic water filling, additional or excessive occupancy of the main body space of the base station can be avoided.
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9 ;
  • the automatic water supply system includes a second clean water chamber j formed on the main body of the base station to provide clean water for the cleaning system 9, and the second clean water chamber j communicates with the outside world through a water channel;
  • the first clean water tank h is placed on the main body of the base station at a position different from that of the second clean water chamber j;
  • the first clean water tank h When the first clean water tank h is placed on the main body of the base station, it can be set as the manual water supply system and the automatic water supply system to perform water supply at the same time or choose one to perform water supply according to the situation;
  • the first clean water tank h may not be placed on the main body of the base station.
  • the first clean water tank h when the first clean water tank h is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first clean water tank h is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or the second clean water chamber j may always be in communication with the cleaning system 9 , or may be in communication with the cleaning system 9 in a controlled on-off manner.
  • first clean water tank h and the second clean water chamber j are arranged in different positions of the main body of the base station, it can be configured so that the first clean water tank h is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to specifically adjust the second clean water tank h.
  • One clear water tank h is stored. It can also be set according to the situation that both of them perform water feeding at the same time, choose one of them to perform water feeding, or switch between simultaneous water feeding and one of them.
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9;
  • the automatic water supply system is directly connected to the outside world and the cleaning system 9 through the water channel d, that is, the second clean water chamber is not included;
  • the first clean water tank h When the first clean water tank h is placed on the main body of the base station, it can be set as the manual water supply system and the automatic water supply system to perform water supply at the same time or choose one to perform water supply according to the situation;
  • the first clean water tank h may not be placed on the main body of the base station.
  • the first clean water tank h when the first clean water tank h is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first clean water tank h is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or the water channel d can be controlled to communicate with the cleaning system 9 on and off.
  • the automatic water supply system is directly connected to the outside world and the cleaning system 9 through the water channel d, while achieving compatibility with manual water supply and automatic water supply, it can avoid additional or excessive occupation of the main body space of the base station.
  • it can be configured so that the first clean water tank h is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to specially store the first clean water tank h.
  • it can also be set that the automatic water supply system and the manual water supply system perform water supply at the same time, choose one to perform water supply, or switch between simultaneous water supply and manual water supply system.
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9 ;
  • the automatic water supply system includes a second clean water chamber e2 formed in the second water tank e for providing clean water for the cleaning system 9.
  • the second clean water chamber e2 communicates with the outside world through a water channel.
  • the second water tank e also includes a The second sewage chamber e1 of the system component, the second sewage chamber e1 communicates with the outside world through the water channel;
  • One of the first clean water tank h and the second water tank e is placed at the same position on the main body of the base station.
  • water filling and launching can be performed through an automatic water supply system and an automatic launching system respectively; of course, other situations are not excluded, such as launching can also be performed through a manual launching system.
  • first fresh water tank h and the second water tank e are placed at the same position of the main body of the base station, while achieving compatibility with manual water filling and automatic water filling, additional or excessive occupation of the space of the main body of the base station can be avoided.
  • the manual water supply system includes a first clean water chamber h1 formed in the first clean water tank h to provide clean water for the cleaning system 9 ;
  • the automatic water supply system includes a second clean water chamber e2 formed in the second water tank e for providing clean water for the cleaning system 9.
  • the second clean water chamber e2 communicates with the outside world through a water channel.
  • the second water tank e also includes a The second sewage chamber e1 of the system component, the second sewage chamber e1 communicates with the outside world through water channels;
  • the first fresh water tank h and the second water tank e can be placed in different positions of the main body of the base station at one or the same time; when they are placed at the same time, they can be set to be watered at the same time or one of them can be selected according to the situation.
  • the first clean water tank h when the first clean water tank h is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or when the first clean water tank h is placed on the main body of the base station, it can be controlled to communicate with the cleaning system 9; And/or, when the second water tank e is placed on the main body of the base station, the second clean water chamber e2 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner. When the second water tank e is placed on the main body of the base station, the second sewage chamber e1 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • first clean water tank h and the second water tank e are placed in different positions of the main body of the base station, it can be configured so that the first clean water tank h and the second water tank e are always placed on the main body of the base station (except when they need to be taken out), without
  • the first fresh water tank h or the second water tank e is specially stored, and it can also be set to perform both water filling at the same time, select one for water filling, or switch between simultaneous water filling and one of the water filling according to the situation.
  • the manual water supply system includes a first clean water chamber f2 formed in the first water tank f for providing clean water for the cleaning system 9, and the first water tank f also includes a chamber for receiving the cleaning system 9.
  • the first sewage chamber f1 of the sewage, the first sewage chamber f1 is an integral part of the manual drainage system;
  • the automatic water supply system includes a second clean water chamber i1 formed in the second clean water tank i for providing clean water for the cleaning system 9, and the second clean water chamber i1 communicates with the outside world through a water channel;
  • the first water tank f and the second fresh water tank i are placed in different positions of the main body of the base station;
  • the second fresh water tank i is placed on the main body of the base station, and can be set to be used by the manual water supply system and the automatic water supply system at the same time or alternatively according to the situation;
  • the second clean water tank i may not be placed on the main body of the base station.
  • the first clean water chamber f2 when the first water tank f is placed on the main body of the base station, the first clean water chamber f2 is in communication with the cleaning system 9, or when the first water tank f is placed on the main body of the base station, the first clean water chamber f2 can be Control the on-off connection with the cleaning system 9; and/or, when the second clean water tank i is placed on the main body of the base station, it is kept in communication with the cleaning system 9, or the second clean water tank i can be controlled on-off when it is placed on the main body of the base station Connected with cleaning system 9.
  • the first sewage chamber f1 When the first water tank f is placed on the main body of the base station, the first sewage chamber f1 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • the second clean water tank i and/or the first water tank f can always be placed on the main body of the base station (except when it needs to be taken out Outside), there is no need to store the second clean water tank i or the first water tank f that is not placed.
  • the automatic water supply system and the manual water supply system perform water supply at the same time, choose one to perform water supply, or switch between simultaneous water supply and manual water supply system.
  • the manual water supply system includes a first clean water chamber f2 formed in the first water tank f for providing clean water for the cleaning system 9, and the first water tank f also includes a chamber for receiving the delivery of the cleaning system 9.
  • the first sewage chamber f1 of the sewage, the first sewage chamber f1 is an integral part of the manual drainage system;
  • the automatic water supply system includes a second clean water chamber j formed on the main body of the base station to provide clean water for the cleaning system 9, and the second clean water chamber j communicates with the outside world through a water channel;
  • the first water tank f is placed on the main body of the base station at a position different from that of the second clean water chamber j;
  • the first water tank f When the first water tank f is placed on the main body of the base station, it can be set as the manual water supply system and the automatic water supply system to perform water supply at the same time or choose one to perform water supply according to the situation;
  • the first water tank f may not be placed on the main body of the base station.
  • the first clean water chamber f2 when the first water tank f is placed on the main body of the base station, the first clean water chamber f2 is in communication with the cleaning system 9, or when the first water tank f is placed on the main body of the base station, the first clean water chamber f2 can be and/or, the second clean water chamber j may always be in communication with the cleaning system 9 , or may be in communication with the cleaning system 9 in a controlled on-off manner.
  • the first sewage chamber f1 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • the manual water supply system and the automatic water supply system can exist at the same time on the main body of the base station, it can be set that the automatic water supply system and the manual water supply system perform water supply at the same time, choose one to perform water supply, or simultaneously perform water supply and select one. Switch between water. Since the first water tank f and the second clean water chamber j are arranged in different positions of the main body of the base station, it can be configured so that the first water tank f is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to modify the first water tank f Make special collections.
  • the manual water supply system includes a first clean water chamber f2 formed in the first water tank f for providing clean water for the cleaning system 9, and the first water tank f also includes a chamber for receiving the delivery of the cleaning system 9
  • the first sewage chamber f1 of the sewage, the first sewage chamber f1 is an integral part of the manual drainage system;
  • the automatic water supply system is directly connected to the outside world and the cleaning system 9 through the water channel d;
  • the first water tank f When the first water tank f is placed on the main body of the base station, it can be set as the manual water supply system and the automatic water supply system to perform water supply at the same time or choose one to perform water supply according to the situation;
  • the first water tank f may not be placed on the main body of the base station.
  • the first clean water chamber f2 when the first water tank f is placed on the main body of the base station, the first clean water chamber f2 is in communication with the cleaning system 9, or when the first water tank f is placed on the main body of the base station, the first clean water chamber f2 can be It is controlled to communicate with the cleaning system 9; and/or the water channel d is controlled to communicate with the cleaning system 9.
  • the first sewage chamber f1 When the first water tank f is placed on the main body of the base station, the first sewage chamber f1 is kept in communication with the cleaning system 9 or communicated with the cleaning system 9 in a controllable on-off manner.
  • the automatic water supply system is directly connected to the outside world and the cleaning system 9 through the water channel d, while achieving compatibility with manual water supply and automatic water supply, it can avoid additional or excessive occupation of the main body space of the base station.
  • it can be configured so that the first water tank f is always placed on the main body of the base station (except when it needs to be taken out), and there is no need to store the first water tank f specially.
  • it can also be set that the automatic water supply system and the manual water supply system perform water supply at the same time, choose one to perform water supply, or switch between simultaneous water supply and manual water supply system.
  • the manual water supply system includes a first clean water chamber f2 formed in the first water tank f for providing clean water for the cleaning system 9, and the first water tank f also includes a chamber for receiving the cleaning system 9.
  • the first sewage chamber f1 of the sewage, the first sewage chamber f1 is an integral part of the manual drainage system;
  • the automatic water supply system includes a second clean water chamber e2 formed in the second water tank e for providing clean water for the cleaning system 9.
  • the second clean water chamber e2 communicates with the outside world through a water channel.
  • the second water tank e also includes a The second sewage chamber e1 of the system component, the second sewage chamber e1 communicates with the outside world through water channels;
  • One of the first water tank f and the second water tank e is placed on the same position of the main body of the base station.
  • first water tank f and the second water tank e are placed at the same position of the main body of the base station, while achieving compatibility with manual and automatic water loading and unloading, additional or excessive occupation of the space of the main body of the base station can be avoided.
  • the manual water supply system includes a first clean water chamber f2 formed in the first water tank f for providing clean water for the cleaning system 9, and the first water tank f also includes a chamber for receiving the cleaning system 9.
  • the first sewage chamber f1 of the sewage, the first sewage chamber f1 is an integral part of the manual drainage system;
  • the automatic water supply system includes a second clean water chamber e2 formed in the second water tank e for providing clean water for the cleaning system 9.
  • the second clean water chamber e2 communicates with the outside world through a water channel.
  • the second water tank e also includes a The second sewage chamber e1 of the system component, the second sewage chamber e1 communicates with the outside world through water channels;
  • One or both of the first water tank f and the second water tank e are placed in different positions of the main body of the base station.
  • the automatic water supply system may include more than one subsystem at the same time.
  • the automatic water supply system may include more than one subsystem at the same time.
  • It not only includes the method of using the second clean water chamber to provide clean water, but also includes the method of directly connecting the water channel to the cleaning system 9 and the outside of the base station.
  • the base station is compatible with manual water loading and automatic water loading, the sewage generated by the cleaning system 9 can only be manually launched, or can only be automatically launched (multiple ways can exist), or can be compatible with manual water and automatic water ( choose one or both to enter the water).
  • the base station can include the following usage modes:
  • the first clean water chamber 11a and the first sewage chamber 11b respectively provide clean water for the cleaning system 9 and receive sewage generated by the cleaning system 9;
  • the first clean water chamber 11a provides clean water for the cleaning system 9, and the automatic drainage system receives the sewage generated by the cleaning system 9;
  • the automatic water supply system provides clean water for the cleaning system 9, and the first sewage chamber 11b receives the sewage generated by the cleaning system 9;
  • the automatic water supply system provides clear water for the cleaning system 9 , and the automatic launching system receives the sewage produced by the cleaning system 9 .
  • the base station of the present application can realize the selective use of multiple modes, and can further meet the needs of different users and the different needs of the same user in different usage environments.
  • a first magnetic member 61 is provided on the first water tank 1
  • a second magnetic member 62 is provided on the second water tank 4
  • a Hall sensor 63 is provided on the main body of the base station 8
  • the first water tank 1 and the second water tank 4 are alternatively installed at the same position on the main body 8 of the base station; when the first water tank 1 is installed on the main body 8 of the base station, the first magnetic pole of the first magnetic member 61 faces the Hall sensor 63, the Hall sensor 63 generates a first electrical signal according to the sensed magnetic field; when the second water tank 4 is installed on the base station main body 8, the second magnetic pole of the second magnetic member 62 faces the Hall sensor 63, and the Hall sensor 63 according to The induced magnetic field generates a second electrical signal different from the first electrical signal; the polarity of the second magnetic pole is opposite to that of the first magnetic pole.
  • the Hall sensor 63 can generate significantly different first electrical signals and second electrical signals according to the different magnetic fields sensed, thereby facilitating fast and accurate identification of whether the first water tank 1 or the second water tank 4 is installed, There is no need to provide Hall sensors 63 for the two types of water tanks, which is beneficial to cost reduction.
  • the means for identifying the type of the water tank are not limited to the above-mentioned specific technical means.
  • the first marker and the second marker can be provided on the first waterway system and the second waterway system respectively, and the identification mark can be provided on the base station body.
  • the sensor can determine whether the first waterway system or the second waterway system is connected to the cleaning system by identifying whether the sensor recognizes the first marker or the second marker.
  • the first marker and the second marker are identification codes
  • the identification sensor is a code reader
  • the first marker and the The second marking member is a magnetic member
  • the identification sensor is a Hall sensor, and so on.
  • the base station main body 8 is provided with a sensor; the first water tank 1 is provided with a first signal part, and the second water tank 4 is provided with a second signal part; the first signal part is different from the second signal part, or the first signal
  • the signals sent by the part and the second signal part are different; when the first water tank 1 is installed in the water tank accommodating space 82, the sensor detects the first signal part or the signal sent by the first signal part and generates the first detection signal; when the second water tank 1 4 installed in the water tank accommodating space 82, the sensor detects the second signal element or the signal sent by the second signal element and generates a second detection signal; the first detection signal is different from the second detection signal.
  • the present application can accurately identify whether the first water tank 1 or the second water tank 2 is installed in the water tank accommodation space 82 , and then can perform corresponding configurations.
  • the present application discloses a base station for cleaning the cleaning parts of a cleaning robot (not shown) when it drives into the base station, wherein the cleaning parts include but not Limited to: mopping parts, roller brushes.
  • the mopping member can be arranged on the host of the cleaning robot in a rotating and moving manner, or can be fixed on the host of the cleaning robot.
  • the base station can include a base station main body 8 and a cleaning system 9.
  • the base station is provided with a clean water input channel 30a and a sewage output channel 30b.
  • the clean water input channel 30a is used to receive clean water delivered from the outside of the base station by an external waterway and provide it to the cleaning system 9.
  • the sewage output channel 30b is used to discharge the sewage generated by the cleaning system 9 out of the base station.
  • clean water can be input from the waterway outside the base station by using the clean water input channel 30a for use by the cleaning system 9, and the sewage generated by the cleaning system 9 can be discharged to the outside of the base station through the sewage output channel 30b, thereby realizing automatic cleaning of the base station.
  • the purpose of automatically discharging sewage does not require users to manually replenish clean water and pour out sewage, which brings convenience to users.
  • any of the following first to third situations may be combined with any of the following fourth to sixth situations:
  • the clean water input channel 30a transports the clean water to the cleaning system 9, and there is no need to set the second clean water chamber 41a.
  • the base station is provided with a second clean water chamber 41a
  • the second clean water chamber 41a communicates with the cleaning system 9 to provide clean water to the cleaning system 9
  • the second clean water chamber 41a communicates with the clean water input channel 30a to receive the clean water input channel 30a clean water transported from outside the base station; wherein, the second clean water chamber 41a can be formed on the base station main body of the base station or on a special water tank.
  • the second clean water chamber 41a is the base station
  • the cleaning system 9 on the main body supplies water.
  • the clear water input channel 30a can only be arranged on the water tank, or can be arranged on the water tank and the main body of the base station at the same time.
  • the first and second cases are integrated on the base station, that is, the clean water input channel includes a first clean water branch and a second clean water branch, the first clean water branch is connected to the clean water chamber, and the second clean water branch is connected to Clean the system.
  • the first clean water branch is connected to the clean water chamber
  • the second clean water branch is connected to Clean the system.
  • the sewage generated by the cleaning system 9 is transported to the sewage output channel 30b for discharge without passing through the second sewage chamber 41b.
  • the base station is provided with a second sewage chamber 41b, the second sewage chamber 41b communicates with the cleaning system 9 to receive the sewage produced by the cleaning system 9, and the second sewage chamber 41b communicates with the sewage output channel 30b to allow the sewage to pass through
  • the sewage output channel 30b is discharged from the base station; wherein, the second sewage chamber 41b can be formed on the main body of the base station or on a special water tank. When the water tank is installed on the main body of the base station, the second sewage chamber 41b can receive the cleaning system 9
  • the sewage output channel 30b can be set only on the water tank, or can be set on the water tank and the main body of the base station at the same time.
  • the sixth, fourth and fifth cases are integrated on the base station, that is, the sewage output channel includes a first sewage branch road and a second sewage branch road, the first sewage branch road is connected to the sewage chamber, and the second sewage branch road is connected to the sewage chamber. Clean the system. In this way, when the cleaning system discharges sewage, it can be selected according to the situation, for example, choose one to use, and use it at the same time, or use the first clean water branch to supplement the clean water in the clean water chamber while receiving the sewage by the second sewage branch. Utilize the clean water chamber for water supply, etc.
  • the second clean water chamber 41a can be surrounded by multiple walls of the base station body, and similarly, the second sewage chamber 41b can be surrounded by multiple walls of the base station body. become.
  • both the second clean water chamber 41a and the second dirty water chamber 41b are formed on the water tank, they may share the same water tank, or may be formed on separate water tanks. This application is not limited to this.
  • the second clean water chamber 41a is formed on the base station main body or does not include the second clean water chamber 41a
  • the second clean water chamber 41a is formed on the base station main body or does not include the second clean water chamber 41a
  • the second clean water chamber 41a is formed on the base station main body or does not include the second clean water chamber 41a
  • the water tank or is Formed on the water tank and the main body of the base station at the same time, or in other cases, there can be various methods, as long as the purpose of making clean water input from the waterway outside the base station can be achieved, whether it is input to the second clean water chamber 41a, or Direct input to the cleaning system 9.
  • the clean water input channel 30a may be formed only on the main body of the base station, or only on the water tank, or both on the water tank and the main body of the base station, or in other cases. Clean water can be input into the second clean water chamber 41a first and then into the cleaning system 9, or can be directly input into the cleaning system 9, as long as the purpose of making the clean water input to the cleaning system 9 from the water channel outside the base station can be achieved.
  • the fresh water input channel 30a may only include a through hole or an interface formed on the water tank or the main body of the base station, which communicates the external water circuit with the second clean water chamber 41a (for example, the port of the external water circuit can pass through the through hole Or the interface directly penetrates into the second clean water chamber 41a, and now the liquid will not directly flow through the through hole or the interface; certainly, the port of the external waterway can also be connected with the through hole or the interface in other ways); or the clean water input channel 30a may include structures such as pipes arranged on the water tank and/or the main body of the base station; or, the fresh water input channel 30a may also include structures such as check valves or joints arranged in through holes, interfaces or pipes, and connect with external pipelines through it. connect; etc.
  • the sewage output channel 30b is only formed on the main body of the base station (the second sewage chamber 41b is formed on the main body of the base station or does not include the second sewage chamber 41b), or is only formed on the water tank, or Whether it is formed on the water tank and the main body of the base station at the same time, there can be various methods, as long as the purpose of discharging the sewage generated by the cleaning system 9 to the outside of the base station can be achieved, whether it is receiving the sewage directly output by the cleaning system 9 or receiving the first
  • the second sewage chamber 41b outputs the sewage.
  • the sewage output channel 30b may be formed only on the main body of the base station, or only on the water tank, or formed on both the water tank and the main body of the base station, or in other cases. Whether it is to receive the sewage directly output from the cleaning system 9 or receive the sewage output from the second sewage chamber 41b, as long as the purpose of discharging the sewage generated by the cleaning system 9 to the outside of the base station can be achieved.
  • the first pump that is, the second power unit 36
  • the sewage output channel 30b is provided with a second pump 34 to provide power for sewage discharge, especially when the sewage needs to be discharged to the sewage output channel 30b through the second sewage chamber 41b.
  • the sewage output channel 30 b is provided with a valve body 705 , and the valve body 705 is located on the downstream side of the second pump 34 .
  • the valve body 705 has a first state and a second state.
  • valve body 705 When the valve body 705 is in the first state, the second sewage chamber 41b is ventilated and communicated with the outside world, and the valve body 705 restricts the outflow of sewage; when the second pump 34 is turned on, the valve body 705 Open to the second state under water pressure, sewage can be discharged from the valve body 705 .
  • valve body 705 is located on the downstream side of the second pump 34 means that along the direction defined by the sewage flow path of the sewage output channel 30 b, the sewage first passes through the second pump 34 and then passes through the valve body 705 .
  • valve body 705 When the air pressure on the downstream side of the valve body 705 is greater than the air pressure on the upstream side, the valve body 705 can change from the first state to the third state. When the valve body 705 is in the third state, it is closed (that is, neither air nor water).
  • the upstream side of the valve body refers to the side where the sewage flows first in the direction defined by the sewage flow path
  • the downstream side of the valve body refers to the side where the sewage flows backward in the direction defined by the sewage flow path. over the side.
  • the above-mentioned first pump and/or the second pump can be connected with the controller (not shown) on the main body of the base station, so as to control its operation by the controller.
  • the controller not shown
  • the above-mentioned first pump and/or the second pump are running, power supply is required , it can also be connected to a power module (not shown) on the main body of the base station, so that the power module can be used to provide the pump with the power required for operation.
  • the base station disclosed in the embodiment of the present application comprises a base station main body and an automatic water tank (i.e. the second water tank 4 as mentioned above), the base station main body is provided with a cleaning system 9, and the water tank is installed on on the main body of the base station.
  • the water tank is provided with a second clean water chamber 41a, a second sewage chamber 41b, a clean water input channel 30a, a clean water output channel (i.e. the second clear water channel), a sewage input channel (i.e.
  • the second clean water chamber 41a receives the clean water delivered by the external waterway from the outside of the base station through the clean water input channel 30a, communicates with the cleaning system 9 on the main body of the base station through the clean water output channel to deliver clean water to the cleaning system 9, and the second sewage chamber 41b
  • the sewage input channel communicates with the cleaning system 9 on the main body of the base station to receive the sewage generated by the cleaning system 9, and discharges the sewage to the outside of the base station through the sewage output channel 30b.
  • the second clean water chamber 41a can use the clean water input channel 30a to input clean water from the waterway outside the base station, and the second sewage chamber 41b can discharge the sewage to the outside of the base station through the sewage output channel 30b, thereby realizing the automatic operation of the base station.
  • the purpose of upper clean water and automatic sewage discharge does not require users to manually replenish clean water and pour out sewage, which brings convenience to users.
  • the present application still uses the second clean water chamber 41a and the second sewage chamber 41b for temporary water storage while realizing the function of automatic water up and down, which effectively guarantees the water supply reliability of the base station of the present application, and is also conducive to improving the use of water. convenience.
  • the clean water output channel and the sewage input channel various implementation methods are also possible, as long as they can play the role of connecting to the cleaning system 9 .
  • the clear water output channel includes the clear water interface 42a arranged on the water tank
  • the cleaning system 9 includes the clear water interface 81a arranged on the main body of the base station.
  • the clean water interfaces 42a and 81a of the two are butted together to realize the communication between the clean water output channel and the cleaning system 9 .
  • the sewage input channel includes a sewage interface 42b arranged on the water tank, and the cleaning system 9 includes a sewage interface 81b arranged on the main body of the base station.
  • the sewage interfaces 42b and 81b of the two are docked to realize sewage input.
  • the channel communicates with the cleaning system 9. It can be understood that there can be different ways of connecting the clean water interfaces 42a, 81a and the sewage interfaces 42b, 81b. Exemplarily, the clean water interface 81a on the main body of the base station is inserted into the second water connection 42a on the water tank.
  • the clean water output channel and the sewage input channel may also include structures such as pipes arranged on the water tank; and so on. This application is not limited to this.
  • the water tank may be provided with an air hole 49 connecting the second sewage chamber 41b with the outside world (as shown in Fig. 7a and Fig. 7b).
  • a negative pressure pump (not shown) can be provided at the air hole 49 to vacuumize the second sewage chamber 41b.
  • the sewage from the cleaning system 9 can flow into the first Two sewage chambers 41b.
  • a valve body 705 (as shown in Figure 40) can be provided on the sewage output channel 30b.
  • the valve body 705 In the first state, the valve body 705 is slightly opened (for example, slightly opened) to communicate with the outside world and Restrict the outflow of sewage.
  • the negative pressure pump vacuumizes, the valve body 705 can be closed under the action of the negative pressure pump, so that the second sewage chamber 41b can be pumped to a negative pressure state.
  • valve body 705 When the pressure from the sewage reaches a certain level Afterwards, the valve body 705 is opened (for example, expanded) to allow sewage to be discharged. It should be noted that when the second sewage chamber 41b is evacuated, if there is sewage in the channel between the valve body 705 and the second sewage chamber 41b, the valve body 705 may not close and remain connected to the outside world and restrict the outflow of sewage status. Or the valve body 705 may not have a closed state. Specifically, when the sewage output channel 30b is provided with the second pump 34 , it is preferable to arrange the valve body 705 downstream of the second pump 34 .
  • valve body 705 has a small gap or small hole. Due to the existence of the small gap or small hole, the valve body 705 can ventilate normally, but cannot allow liquid to flow out.
  • the maximum slit width or maximum pore diameter of the slit or small hole may be 0.2 mm to 0.8 mm, and in the embodiment of the present application, the maximum slit width or maximum pore diameter of the slit or small hole may be 0.5 mm.
  • those skilled in the art can design according to actual needs, as long as the above effects can be achieved.
  • the valve body 705 has a slightly open and stretchable channel 706 under normal conditions.
  • the channel 706 can shrink and close accordingly due to its own stretchable characteristics, so that the second sewage chamber can 41b is pumped to a vacuum or negative pressure state, and due to the stretchable characteristics of the channel 706, when the sewage pressure increases to a certain extent, the channel 706 is opened (greater than normal) to discharge the sewage.
  • the valve body 705 may not only be limited to a duckbill valve, but only needs to have a retractable channel.
  • valve body 705 is normally closed (not slightly open)
  • the pipe section between the second pump 34 and the valve body 705 cannot flow into the air section due to negative pressure, so the second pump 34 After opening, the pipe section between the second pump 34 and the valve body 705 needs to reach a certain hydraulic strength to make the valve body 705 open, so that the sewage is discharged from the valve body 705.
  • valve body 705 can communicate with the second sewage chamber 41b and the outside air (for example, the valve body 705 can be in a slightly open state under normal conditions), and when there is sewage in the second sewage chamber 41b, it will flow to the position of the valve body 705 , and because the water tension exists, the sewage will not flow out, so the sewage can directly flow out from the valve body 705 after the second pump 34 is turned on.
  • valve body 705 in the first state (normal state), is not limited to be in a slightly open state, as long as it can communicate with the outside world and restrict the outflow of sewage.
  • valve body 705 is not limited to be used with a negative pressure pump.
  • the second sewage chamber 41b when the second sewage chamber 41b is formed on a special sewage tank or the main body of the base station, it can also use structures such as air holes, valve bodies, and pumps to perform vacuuming operations.
  • the main body of the base station includes a base station bracket 80, and the clean water interface 81a and the sewage interface 81b of the cleaning system 9 are formed on the base station bracket 80, and the base station bracket 80 also includes There is an interface 84 through which the air supply hole 49 communicates with the outside world.
  • the water tank provided by the embodiment of the present application further includes a first control valve 50, which is used to close or open the clean water input channel 30a according to the water level in the second clean water chamber 41a. So that the water tank can automatically replenish water to the second clean water chamber 41a according to the water level in the second clean water chamber 41a, and when the water level is too high, automatically cut off the replenishment channel to prevent the water level of the second clean water chamber 41a from being too high , or water overflow occurs.
  • a first control valve 50 which is used to close or open the clean water input channel 30a according to the water level in the second clean water chamber 41a. So that the water tank can automatically replenish water to the second clean water chamber 41a according to the water level in the second clean water chamber 41a, and when the water level is too high, automatically cut off the replenishment channel to prevent the water level of the second clean water chamber 41a from being too high , or water overflow occurs.
  • the first control valve 50 may be a ball float valve configured to close or open the clean water input channel 30a according to the water level in the second clean water chamber 41a. Specifically, when the water level in the second clean water chamber 41a is low, the clean water input channel 30a can normally enter water, and the float valve will not interfere with the clean water input channel 30a. Movement occurs under the action. When the water level of the second clean water chamber 41a reaches a certain height, the float valve moves to the state of blocking the clean water input channel 30a. At this time, the clean water in the clean water input channel 30a can no longer enter the second clean water chamber. 41a, so as to prevent the water level from being too high.
  • the outlet end of the clear water input passage 30a is fixedly provided with a valve body structure 35, and the float valve includes a float 51 and a valve core structure 52.
  • a connecting body 53 is connected between the floating ball 51 and the valve core structure 52 , and the connecting body 53 is hinged on the valve body structure 35 or other structures at a position between the floating ball 51 and the valve core structure 52 .
  • the float valve can be replaced by other devices.
  • other liquid level detection devices are arranged in the second clean water chamber 41a, and the first control valve and the liquid level detection device The device is electrically connected, and the first control valve is used to close or open the clean water input channel according to the water level in the clean water chamber detected by the liquid level detection device.
  • the liquid level detection device may include but not limited to at least one of the following: a photoelectric liquid level detection device, a capacitive liquid level detection device, a static pressure liquid level detection device, and the like.
  • the clean water input channel 30a may be provided with a first pump (first), and the first pump is configured to provide power to the second clean water chamber 41a to receive clean water from an external water circuit;
  • the setting facilitates the smooth input of clean water to the second clean water chamber 41a through the clean water input channel 30a on the water tank.
  • a second pump 34 may be provided on the sewage output channel 30b, and the second pump 34 is configured to provide transport power for discharging sewage from the second sewage chamber 41b; the setting of the second pump 34 is beneficial to the second sewage chamber 41b
  • the sewage inside is smoothly discharged to the outside of the base station through the sewage output channel 30b on the water tank.
  • the sewage output channel 30b is provided with a second pump 34, while the clean water input channel 30a is not provided with a pump.
  • the water tank includes a water tank main body 4 (ie, the above-mentioned second water tank 4) and an adapter 70 detachably connected to the water tank main body 4, and the water tank passes through the adapter 70 receives clean water delivered from the outside of the base station and discharges sewage to the outside of the base station; the second clean water chamber 41a, the second sewage chamber 41b, the clean water output channel and the sewage input channel are arranged on the water tank main body 4, and the clean water input channel 30a and the sewage output
  • the channel 30b is formed on the water tank main body 4 and the adapter seat 70 (that is, the clear water input channel 30a includes the third clear water channel 3a formed on the water tank main body 4 and the channel on the adapter seat 70, and the sewage output channel 30b includes the channel formed on the water tank main body 4
  • the adapter seat 70 With the setting of the adapter seat 70, it is convenient for the clean water input channel 30a to connect to the external waterway and the sewage output channel 30b to discharge sewage to the outside of the base station. It should be noted that the connection of the water tank to an external water source through the adapter 70 is only optional, and the water tank may not include the adapter 70 . In addition, it is not ruled out that the main body of the base station is provided with extensions of the clean water input channel 30a and the sewage output channel 30b. The extension section is used to receive clean water outside the base station and discharge sewage to the outside of the base station.
  • the adapter seat 70 includes a seat body 701 and a clean water transfer pipe body 702 and a sewage transfer pipe body 703 that are arranged on the seat body 701 and are components of the clean water input channel 30a and the sewage output channel 30b respectively; the clean water transfer pipe body 702 passes through
  • the clean water connection pipe L is connected to the component part of the clean water input channel 30a on the water tank main body 4, and the sewage transfer pipe body 703 is connected to the component part of the sewage output channel 30b on the water tank main body 4 through the sewage connection pipe M; the clean water transfer pipe body 702 and One end connected to the clean water connecting pipe L is provided with a check valve 704.
  • the check valve 704 is configured to be in a closed state under normal conditions, and is pushed to switch to an open state when the clean water connecting pipe L is inserted into the clean water transfer pipe body 702 .
  • the check valve 704 is configured to be in a closed state under normal conditions, and is pushed to switch to an open state when the clean water connecting pipe L is inserted into the clean water transfer pipe body 702 .
  • the sewage transfer pipe body 703 is provided with a valve body 705, so that it does not need to be arranged on the water tank main body 4, which is beneficial to the structural layout of the water tank main body.
  • the water tank comprises a detachable first box body 45 and a second box body 46; a second clean water chamber 41a, a second sewage chamber 41b, a clean water output channel and a sewage
  • the input channel is arranged on the first box body 45;
  • the clear water input channel 30a includes a first interface 31a arranged on the first box body 45 and a clear water input pipeline 33a and a second interface 32a arranged on the second box body 46, the first The interface 31a communicates with the second clean water chamber 41a, and the second interface 32a is arranged at the water outlet end of the clean water input pipeline 33a;
  • the sewage output channel 30b includes a third interface 31b arranged on the first box body 45 and a third interface arranged on the second box body
  • the detachable design of the first box body 45 and the second box body 46 it is convenient to arrange the main structures such as the composition pipes of the clean water input channel 30a and the sewage output channel 30b on the second box body 46, and it is convenient to form
  • the first box body 45 with the second clean water chamber 41a and the second sewage chamber 41b is taken out for cleaning and other operations, while the second box body 46 does not need to be taken out, and it can maintain the connection with the relevant waterway structure, etc., avoiding the need to take it out every time
  • the above split water tank is only an optional mode, and the water tank is not limited to the above split design.
  • the first interface 31a may include a first check valve structure 310a
  • the second interface 32a may include a second check valve structure 320a
  • the first check valve structure 310a and The second check valve structure 320a is configured such that when the first tank body 45 is docked to the second tank body 46, the first check valve structure 310a and the second check valve structure 320a are docked and mutually pushed to an open state, when When the first box body 45 is separated from the second box body 46, the first check valve structure 310a and the second check valve structure 320a automatically return to the closed state.
  • the third interface 31b may include a third check valve structure 430, when the first box body 45 is docked to the second box body 46, the third check valve structure 310b is docked with the fourth interface 32b and the third check valve structure 310b Pushed to the open state, when the first box body 45 is separated from the second box body 46, the third check valve structure 310b automatically resets to the closed state.
  • the design of the two-way check valve between the first port 31a and the second port 32a when the first box body 45 and the second box body 46 are separated, it is possible to basically prevent clean water from flowing out; with the third check valve
  • the design of the structure 310b can basically prevent sewage from flowing out when the first box body 45 is separated from the second box body 46 .
  • the fourth interface 32b may include a fourth check valve structure 320b, and the third check valve structure 430 and the fourth check valve structure 320b are configured to: when the first box body 45 is docked with the second box body 46 , the third check valve structure 430 and the fourth check valve structure 320b butt and push each other to the open state, when the first box body 45 is separated from the second box body 46, the third check valve structure 430 and the fourth check valve structure The return valve structure 320b automatically resets to the closed state.
  • the first check valve structure 310a includes a valve body 311, a valve core 312 and an elastic member 313. Between 312.
  • the second check valve structure 320 a includes a valve body 321 , a valve core 322 and an elastic member 323 .
  • the valve core 322 is movably mounted on the valve body 321
  • the elastic member 323 is disposed between the valve body 321 and the valve core 322 .
  • valve core 312 blocks the passage on the valve body 311, and the valve core 322 blocks the passage on the valve body 321; when the first box body 45 is docked to the second box body 46, the valve core 312 and the spool 322 to push each other to open the passages on the two valve bodies 311, 321, thereby realizing the communication between the clean water input passage 30a and the second clean water chamber 41a.
  • the movement of 322 is compressed to store elastic potential energy; when the first box body 45 is separated from the second box body 46, under the action of the elastic members 313,323, the two valve cores 312,322 are automatically reset to close the valve body 311,
  • the passage on the 321 is convenient for clear water to flow out.
  • first interface 31a and the second interface 32a are not limited to the above specific manner.
  • the first box body 45 is placed on the second box body 46 , but it is not limited thereto.
  • the first box body 45 may also be placed on one side of the second box body 46 .
  • a first pump that provides power for conveying clean water may be provided on the clean water input pipeline 33a.
  • a second pump 34 that provides power for sewage discharge may be provided on the sewage output pipeline 33b.
  • the sewage output pipeline 33b is provided with an impeller pump as the second pump 34
  • the clean water input pipeline 33a is not provided with a pump for delivering clean water.
  • the base station includes a base station bracket 80 , and a water tank accommodating space 82 for accommodating a water tank is formed on the base station bracket 80 .
  • two through holes 85 are provided on the base station bracket 80.
  • the components on the top and the components of the sewage output channel 30b on the water tank main body 4 correspond to the two through holes 85 to connect with the adapter seat 70 by using the clean water connection pipe L and the sewage connection pipe M.

Landscapes

  • Sewage (AREA)

Abstract

一种基站及水箱，基站包括基站主体、第一水箱和第二水路系统，基站主体上形成有清洗系统；第一水箱可取出地装设在基站主体，第一水箱利用手动加入清水和/或去除污水，第一水箱形成有第一腔室，第一腔室通过与清洗系统连通；第二水路系统包括形成在基站上的水路通道，水路通道用于接收并输送外部水路从基站外部输送来的清水以提供给清洗系统和/或用于接收清洗系统使用过的污水并排出至基站外部；第一腔室和第二水路系统择一或同时为清洗系统提供清水和/或接收清洗系统产生的污水。本申请能够有效提升用户的使用体验。

Description

基站及水箱 技术领域
本申请涉及清洁机器人清洗技术领域，尤其涉及一种基站及水箱。
背景技术
当前，清洁机器人越来越多的走进人们的生活中。为了便捷用户的使用，用于对清洁机器人的待清洗件进行自动清洗的基站逐渐成为不可分割的配套设备。基站一般包括可取出的清水箱和污水箱，清水箱和污水箱分别与基站的清洗系统连通以为清洗系统提供清水或者接收清洗系统排出的污水。清水箱和污水箱需要用户手动操作加入清水或者倒出污水，对于一些用户来讲，这并不会使其觉得麻烦，甚至会体会到自己动手的乐趣，然而对于另一些用户来讲，这会是一种负担，会影响到其使用体验。
申请内容
本申请的目的在于提供一种基站，能够提升用户的使用体验。
本申请的另一目的在于提供一种水箱，在安装至基站的基站本体上时，能够实现自动上下水，给用户带来了方便。
本申请的又一目的在于提供一种基站，能够实现自动上下水，给用户带来了方便。
为了实现上述目的，本申请提供了一种基站，用于对清洁机器人进行清洗，所述基站包括：
基站主体，所述基站主体上形成有清洗系统，所述清洗系统接收清水对清洁机器人的待清洗件进行清洗以及排出清洗产生的污水；
第一水路系统，所述第一水路系统包括第一水箱，所述第一水箱可取出地装设在所述基站主体，所述第一水箱被配置为利用手动加入清水和/或去除污水，所述第一水箱形成有第一腔室，当所述第一水箱装设在基站主体时，所述第一腔室与所述清洗系统连通以为所述清洗系统提供清水和/或接收所述清洗系统产生的污水；
第二水路系统，所述第二水路系统包括形成在所述基站上的水路通道，所述水路通道用于接收并输送外部水路从所述基站外部输送来的清水并提供给所述清洗系统和/或用于接收所述清洗系统使用过的污水并排出至所述基站外部；
所述第一水路系统和所述第二水路系统择一或同时为所述清洗系统提供清 水和/或接收所述清洗系统产生的污水。
本申请所提供的基站包括第一水路系统，第一水路系统包括可取出的第一水箱，基站可以利用第一水箱为清洗系统提供清水和/或接收清洗系统产生的污水；同时，本申请基站还包括第二水路系统，第二水路系统能够利用其水路通道与基站外界连通以进行水的输送进而使得第二水路系统能够为清洗系统提供清水和/或接收清洗系统产生的污水。也就是说，本申请基站既可以使用常规水箱来为清洗系统提供清水和/或接收清洗系统排出的污水，也可以利用第二水路系统自动上水和/或自动下水，可以无需用户亲自动手加入清水或者去除污水，能够解决某些用户的负担。因此，本申请基站能够满足不同用户的个性化需求和同一用户的不同需求，能够有效提升用户的使用体验。
为了实现上述目的，本申请还提供了一种基站，用于对清洁机器人进行清洗，所述基站包括：
基站主体，所述基站主体上设有清洗系统和水箱容纳空间，所述清洗系统包括清洗区和与所述清洗区连通的输水通道；
第一水路系统，所述第一水路系统包括第一水箱，所述第一水箱设有第一腔室和与所述第一腔室连通的第一通道；
第二水路系统，所述第二水路系统包括第二水箱，所述第二水箱设有第二腔室和分别与所述第二腔室连通的第二通道和第三通道；
所述第一水箱和所述第二水箱可选择地装设在所述水箱容纳空间；
当所述第一水箱装设在所述水箱容纳空间，所述第一通道连接所述输水通道，以连通所述第一腔室和所述清洗区；
当所述第二水箱装设在所述水箱容纳空间，所述第二通道连接所述输水通道，以连通所述第二腔室和所述清洗区，所述第三通道用于连接外部水路。
本申请基站既可以使用第一水箱来为清洗系统提供清水和/或接收清洗系统排出的污水，也可以利用第二水箱实现基站的自动上水和/或自动下水，可以无需用户亲自动手加入清水或者去除污水，能够解决某些用户的负担。因此，本申请基站能够满足不同用户的个性化需求和同一用户的不同需求，能够有效提升用户的使用体验。
为了实现上述另一目的，本申请提供了一种水箱，用于与在基站的基站主体上的清洗系统连通，所述水箱上设有清水腔室、污水腔室、清水输入通道、清水输出通道、污水输入通道和污水输出通道；所述清水腔室通过所述清水输 入通道接收从所述基站外部输送的清水，通过所述清水输出通道与所述基站主体上的清洗系统连通以向所述清洗系统输送清水；所述污水腔室通过所述污水输入通道与所述基站主体上的清洗系统连通以接收所述清洗系统所产生的污水，通过所述污水输出通道将所述污水排出至所述基站外部。
本申请水箱安装在基站主体进行使用时，清水腔室可以利用清水输入通道从基站外部的水路输入清水，污水腔室可以通过污水输出通道将污水排出至基站外部，进而实现基站自动上清水和自动下污水的目的，无需用户手动补充清水和倒出污水，给用户的使用带来了方便。而且，本申请在实现自动上下水功能的同时，仍然利用清水腔室和污水腔室进行临时储水，有效保障了本申请基站的供水可靠性，同时也有利于提高使用的便利性。
为了实现上述又一目的，本申请提供了一种基站，用于对清洁机器人的清洁件进行清洗，所述基站包括基站主体和如上所述的水箱，所述基站主体上设有清洗系统，所述水箱的清水输出通道和污水输入通道分别与所述清洗系统连通以输送清水给所述清洗系统以及接收所述清洗系统产生的污水。
本申请所提供的基站在使用时，清水腔室可以利用清水输入通道从基站外部的水路输入清水，污水腔室可以通过污水输出通道将污水排出至基站外部，进而实现基站自动上清水和自动下污水的目的，无需用户手动补充清水和倒出污水，给用户的使用带来了方便。而且，本申请在实现自动上下水功能的同时，仍然利用清水腔室和污水腔室进行临时储水，有效保障了本申请基站的供水可靠性，同时也有利于提高使用的便利性。
为了实现上述又一目的，本申请还提供了一种基站，用于对清洁机器人的清洁件进行清洗，所述基站上设有清洗系统，所述基站上设有清水输入通道和污水输出通道，所述清水输入通道用于接收从所述基站外部输送的清水并提供给所述清洗系统，所述污水输出通道用于将所述清洗系统产生的污水排出所述基站。
本申请基站在使用时，可以利用清水输入通道从基站外部的水路输入清水供清洗系统使用，清洗系统产生的污水可以通过污水输出通道排出至基站外部，进而实现基站自动上清水和自动下污水的目的，无需用户手动补充清水和倒出污水，给用户的使用带来了方便。
本申请还提供了一种基站，用于对清洁机器人进行清洗，所述基站包括：
基站主体，所述基站主体上形成有清洗系统，所述清洗系统接收清水对清 洁机器人的待清洗件进行清洗以及排出清洗产生的污水；
水路系统，所述水路系统用于连接所述清洗系统以输送清水至所述清洗系统以及接收所述清洗系统排出的污水。
本申请基站利用清洗系统接收清水对清洁机器人的待清洗件进行清洗以及排出清洗产生的污水，利用水路系统输送清水至清洗系统以及接收清洗系统排出的污水，进而可以无需用户手动对清洁机器人进行清洗，有利于提升用户的使用体验。
附图说明
图1a显示了本申请实施例基站的立体结构示意图，其中装设有第一水箱。
图1b显示了本申请实施例基站的剖视图，其中装设有第一水箱。
图1c显示了本申请实施例所提供的第一水箱的结构示意图一。
图1d显示了本申请实施例所提供的第一水箱的结构示意图二。
图1e显示了本申请实施例提供的第一水箱的污水箱的结构示意图。
图1f显示了本申请实施例实施例提供的第一水箱的清水箱的结构示意图。
图1g显示了本申请实施例提供的装设有第一水箱的基站的结构简图。
图1h显示了本申请实施例提供的装设有第一水箱的基站的结构简图。
图2显示了本申请实施例基站的另一立体结构示意图，其中装设有第二水箱。
图3显示了本申请实施例基站支架和第二水箱的立体结构示意图。
图4显示了本申请实施例基站支架的立体结构示意图。
图5显示了本申请实施例第二水箱和转接座的立体结构示意图。
图6显示了本申请实施例第二水箱的分解结构示意图。
图7a显示了本申请实施例第二水箱的剖面结构示意图一。
图7b显示了本申请实施例第二水箱的剖面结构示意图二。
图8a显示了本申请实施例的基站的带有清洗肋的清洗区的示意图。
图8b显示了本申请实施例的基站去除清洗肋后的清洗区的示意图。
图9a和图9b显示了本申请实施例第二水路系统和清洗系统的示意图。
图9c显示了本申请实施例的第二水路系统和清洗系统的供水示意图。
图9d显示了本申请实施例的第二水路系统和清洗系统的排水示意图。
图9e显示了本申请实施例的第一水路系统和清洗系统的提供清水的示意图。
[根据细则91更正 07.06.2022]　
图9f显示了本申请实施例的第一水路系统和清洗系统的收集污水的示意图。
[根据细则91更正 07.06.2022]　
图9g显示了本申请实施例提供的基站与外部水管连接的状态示意图。
图10显示了本申请实施例利用第一磁性件和霍尔传感器检测第一水箱的示意图。
图11显示了本申请实施例利用第二磁性件和霍尔传感器检测第二水箱的示意图。
图12显示了本申请实施例基站体现水箱容纳空间、配件放置空间、隔断门以及第二水箱相互关系的示意图。
图13至图24分别显示了不同实施例中基站兼容手动上水和自动上水的结构示意图。
其中：
图13a和图13b分别显示了第一污水箱和第二污水箱择一放置在基站主体的相同位置的实施例的不同使用状态示意图。
图14a至图14c分别显示了第一污水箱和第二污水箱择一或同时放置在基站主体的不同位置的实施例的不同使用状态示意图。
图15a和图15b分别显示了第一污水箱可取出地放置在形成在基站主体上的第二污水腔室的实施例的不同使用状态示意图。
图16a和图16b分别显示了第一污水箱放置在基站主体的不同于第二污水腔室的位置的实施例的不同使用状态示意图。
图17a和图17b分别显示了手动下水系统包括第一污水箱以及自动下水系统通过水路通道直接连通外界与清洗系统的实施例的不同使用状态示意图。
图18a和图18b分别显示了第一污水箱和第二水箱择一放置在基站主体的相同位置的实施例的不同使用状态示意图。
图19a至图19c分别显示了第一污水箱和第二水箱择一或同时放置在基站主体的不同位置的实施例的不同使用状态示意图。
图20a至图20c分别显示了第一水箱和第二污水箱放置在基站主体的不同位置的实施例的不同使用状态示意图。
图21a和图21b分别显示了第一水箱放置在基站主体的不同于第二污水腔室的位置的实施例的不同使用状态示意图。
图22a和图22b分别显示了手动下水系统包括形成在第一水箱的第一污水腔室以及自动下水系统通过水路通道直接连通外界与清洗系统的实施例的不同使用状态示意图。
图23a和图23b分别显示了第一水箱和第二水箱择一放置在基站主体的相同位置的实施例的不同使用状态示意图。
图24a至图24c分别显示了第一水箱和第二水箱择一或同时放置在基站主体的不同位置的实施例的不同使用状态示意图。
图25至图36分别显示了不同实施例中基站兼容手动上水和自动上水的结构示意图。
其中：
图25a和图25b分别显示了第一清水箱和第二清水箱择一放置在基站主体的相同位置的实施例的不同使用状态示意图。
图26a至图26c分别显示了第一清水箱和第二清水箱择一或同时放置在基站主体的不同位置的实施例的不同使用状态示意图。
图27a和图27b分别显示了第一清水箱可取出地放置在形成在基站主体上的第二清水腔室的实施例的不同使用状态示意图。
图28a和图28b分别显示了第一清水箱放置在基站主体的不同于第二清水腔室的位置的实施例的不同使用状态示意图。
图29a和图29b分别显示了手动上水系统包括第一清水箱以及自动上水系统通过水路通道直接连通外界与清洗系统的实施例的不同使用状态示意图。
图30a和图30b分别显示了第一清水箱和第二水箱择一放置在基站主体的相同位置的实施例的不同使用状态示意图。
图31a至图31c分别显示了第一清水箱和第二水箱择一或同时放置在基站主体的不同位置的实施例的不同使用状态示意图。
图32a至图32c分别显示了第一水箱和第二清水箱放置在基站主体的不同位置的实施例的不同使用状态示意图。
图33a和图33b分别显示了第一水箱放置在基站主体的不同于第二清水腔室的位置的实施例的不同使用状态示意图。
图34a和图34b分别显示了手动上水系统包括形成在第一水箱的第一清水腔室以及自动上水系统通过水路通道直接连通外界与清洗系统的实施例的不同使用状态示意图。
图35a和图35b分别显示了第一水箱和第二水箱择一放置在基站主体的相同位置的实施例的不同使用状态示意图。
图36a至图36c分别显示了第一水箱和第二水箱择一或同时放置在基站主体 的不同位置的实施例的不同使用状态示意图。
图37显示了本申请实施例第一止回阀结构和第二止回阀结构的分解结构示意图。
图38显示了本申请实施例第二箱体和转接座等结构的立体结构示意图。
图39显示了本申请实施例清水转接管体、清水连接管以及止回阀的立体结构示意图。
图40显示了本申请实施例污水转接管体、污水连接管以及阀体的立体结构示意图。
图41至图44显示了本申请实施例清水系统与清水输入通道和污水输出通道之间水路连接关系的示意框图。
图45a显示了本申请实施例的基站的横剖视图。
图45b显示了图45a中的A处放大图。
图46a显示了本申请实施例的基站的转接座处的纵剖图。
图46b显示了图46a中的B处放大图。
具体实施方式
为了详细说明本申请的技术内容、构造特征、实现的效果，以下结合实施方式并配合附图详予说明。
请参阅图1至图11，本申请实施例公开了一种基站，用于对清洁机器人的待清洗件进行清洗，待清洗件可以是清洁机器人的清洁件(如拖擦件)、轮子、甚至机体，等等，本申请对此不作限制。基站100包括基站主体8、第一水路系统110以及第二水路系统120。其中：
基站主体8上形成有清洗系统9，清洗系统9接收清水以对清洁机器人(图未示)的待清洗件进行清洗以及排出清洗产生的污水。其中，清洁机器人的待清洗件包括但不限于拖擦件，在其他一些实施例中，清洁机器人的待清洁件还可包括驱动轮，机壳等。关于清洗系统9的具体结构形式并非本申请改进点，这里不再详述，其可以是本领域技术人员能够想到的各种形式，只要是能够接收第一水路系统110或者第二水路系统120提供的清水以及能够将产生的污水排出至第一水路系统110或者第二水路系统120即可。
第一水路系统110包括第一水箱1，第一水箱1可取出地装设在基站主体8，第一水箱1被配置为利用手动加入清水和/或去除污水。换句话说，第一水箱1在使用方式上为常规水箱(无法在使用时自动上水和/或自动下水)，其需要用户 动手往其中加清水或者去除其中的污水，通常来讲需要在使用之前或者使用之后进行。如图1所示，其显示了一种常规的第一水箱1，该第一水箱1设有可盖住的敞口C，可以通过该敞口C加入清水或者去除污水，通常会将该第一水箱1从基站主体8上取出后再进行加入清水和/或倒出污水的操作。
需要说明的是，本申请实施例中所描述的“自动上水”是指无需用户干预，外部水可以进入水箱，“自动下水”是指无需用户干预，水箱内的水可自动排出。当然，可以通过动力装置提供使外部水进入水箱的动力，以及使水箱内的水排出的动力。
第一水箱1形成有第一腔室11(如图10所示)，当第一水箱1装设在基站主体8上时，第一腔室11与清洗系统9连通以为清洗系统9提供清水和/或接收清洗系统9产生的污水。
对于第一水箱1的第一腔室11如何与清洗系统9连通，本申请并不局限于具体结构形式，只要能够使第一腔室11与清洗系统9连通即可。请结合图1b和图4，在具体的示例中，第一水箱1上设有第一接口111，清洗系统9包括设置在基站主体8的第二接口81，当第一水箱1装设在基站主体8上时，第一水箱1的第一接口111和基站主体8的第二接口81对接以能够实现第一腔室11与清洗系统9的连通。具体地，基站主体8包括基站支架80，第二接口81形成在基站支架80上。可以理解的是，第一水箱1的第一接口111和基站主体8的第二接口81对接的方式可以有不同的方式，例如，第二接口81可以插入第一接口111中，或者，第一接口111插入第二接口81中。在一个具体的实施例中，第二接口81可以由第一接口111穿入第一腔室11，在该种方式下，清水或者污水并不会直接流经第一接口111，即，水不会接触到第一接口111的内壁面，而仅与第二接口81的内壁面接触。在其他一些实施例中，第一水箱1上还可以设置有与第一腔室11连通的通孔、管道等以与清洗系统9连通，还可以在接口或管道处设置有阀体等结构，示例性的，可通过阀体控制水路系统的通断；等等。本申请对此不作限制。
另外，对于清洗系统9的具体结构，具体地，如图8b所示，清洗系统9可以包括设于基站主体8上的清洗区91和与清洗区91连通的输水通道(图中未示出)。第一水箱1上设有与第一腔室11连通的第一通道。当第一水箱1装设在基站主体8上时，第一通道连接输水通道，以连通第一腔室11和清洗区91。
在一些实施例中，基站主体8的输水通道可以包括清水输送通道82；第一 腔室11包括第一清水腔室11a，第一通道包括第一清水通道；当第一水箱1装设在基站主体8上时，第一清水通道连接清水输送通道82，以连通第一清水腔室11a和清洗区，进而第一清水腔室11a能够向清洗区输送清洗所需清水。示例性的，清洗区91可以设有喷水孔911，水箱内的清水可经清水输送通道82流向喷水孔911，最终从喷水孔911喷出至清洗区91。
在一些实施例中，基站主体8的输水通道可以包括污水输送通道93；第一腔室11包括第一污水腔室11b，第一通道包括第一污水通道；当第一水箱1装设在基站主体8上时，第一污水通道连接污水输送通道93，以连通第一污水腔室11b和清洗区，进而第一污水腔室11b能够接收所述清洗区91排出的污水。示例性的，如图8a所示，清洗区91可以设有清洗肋92，在清洁机器人在基站100上自清洁时，清洗区91的清洗肋92可以与清洁机器人的待清洁件(例如拖擦件)保持接触，而刮除待清洁件上的脏污。下面对于清洗区91的具体结构形态进行描述，在一些实施例中，如图8b所示，清洗区91可以设有排水孔912，基站对清洁机器人执行清洁任务(例如对清洁机器人的拖擦件进行清洁后)后所产生的污水可由排水孔912排出，排水孔912所排出的污水可经污水输送通道83输送至第一污水腔室11b。
可以理解的是，第一通道可以有不同的实现形式，比如，可以采用上述的接口、通孔、管道等形式；输水通道同样可以有不同的实现形式；只要是借由第一通道与输水通道的连接能够实现第一腔室11与清洗系统9的连通即可。
请参阅图1和图10，在该示例中，第一水箱1可包括相互独立的第一清水箱1a和第一污水箱1b，第一清水箱1a形成有用于储存清水的第一清水腔室11a，第一污水箱1b形成有用于储存污水的第一污水腔室11b。当然，也可以利用一个第一水箱1同时形成有用于储存清水的第一清水腔室11a和用于储存污水的第一污水腔室11b。另外，基站也可以只包括能够提供清水或者接收污水的第一水箱1。
请结合图9a和图9d，第二水路系统包括水路通道3，水路通道3用于与外部水路连通，以使外部水路(例如自来水管)的清水能够通过水路通道3与基站主体8上的清洗系统连通，进而使得外部水路的清水能够输送至清洗系统。和/或，基站主体8的清洗系统所产生的污水能够通过水路通道3排向至外部水路(例如排水管道，排水管道可连通至下水道)。示例性的，如图9所示，基站100可通过外部输水管101与自来水水源端(图中未示出)连接，以及，可通过 外部排污管102连通至下水道。水路通道3用于接收并输送从基站外部的外部水路(例如自来水管)输送来的清水以提供给清洗系统9。和/或，水路通道3用于接收清洗系统9所产生的污水并排出至基站外部。由此，在不同的实施例中，利用第二水路系统可以只是能够进行上水(供清水)，也可以只是能够进行下水(排污水)，也可以能够同时进行上水和下水，当然，还可以能够在上水、下水、同时上下水之间进行选择等，只要是能够利用第二水路系统实现清洗系统9与基站外界连通以能够进行水的输送即可。另外，在一些实施例中，为实现外部清水能够输送至基站100，可在外部水压作用下直接流向基站100，或者利用动力装置(例如泵体)将外部清水输送至基站100。而为实现将基站100内的污水自动排出至外界，可利用动力装置(例如泵体)将污水泵向外界。在利用第二水路系统进行供水和/或排水时，可以无需用户亲自动手向水箱内加入清水或者手动去除水箱内污水，由此，能够解决某些用户的负担。
请参阅图7和图8d，在一些实施例中，第二水路系统还包括第二腔室41，第二腔室41用于接收并储存水路通道3输入的清水以及将清水提供给清洗系统9，和/或，第二腔室41用于接收并储存清洗系统9产生的污水以及将污水输出至水路通道3。借由第二腔室41的设置，在利用第二水路系统实现自动上水和/或下水的同时，仍然可以利用第二腔室41进行清水和/或污水的临时储存，有效保障了本申请基站的使用可靠性，同时也有利于提升使用的便利性。
请参阅图2、图7和图8c，第二水路系统包括第二水箱4，第二腔室41可形成在第二水箱4，第二水箱4可取出地装设在基站主体8上；水路通道3的至少部分形成在第二水箱4；当第二水箱4装设在基站主体8上时，第二腔室41与清洗系统9连通。由于第二腔室41形成在第二水箱4上，因此需要在第二水箱4上设置可以与第二腔室41连通的通道，具体可以将水路通道3整体设置在第二水箱4上，当第二水箱4装设在基站主体8上时，可直接利用第二水箱4上的水路通道3与外部水路连通。当然，在其他一些实施例中，也可以98将水路通道3部分设置在第二水箱4上，部分设置在基站主体8上，当第二水箱4装设在基站主体8上时，第二水箱4上的水路通道3的组成部分与基站主体8上的水路通道3的组成部分对接以形成整体的水路通道3。由于第二腔室41形成在第二水箱4，因此便于取出进行清洗等作业。
具体地，清洗系统9包括清洗区91和与清洗区91连通的输水通道93。第二水箱4上设有与第二腔室41连通的第二通道和第三通道(即水路通道3)。当 第二水箱4装设在基站主体8上时，第二通道连接输水通道，以连通第二腔室41和清洗区，第三通道用于连通外部水路。
在一些实施例中，如图9c所示，输水通道93包括清水输送通道93a；第二腔室41包括第二清水腔室41a，第二通道43包括第二清水通道43a，第三通道包括第三清水通道3a；当第二水箱4装设在基站主体8上时，第二清水通道43a连接清水输送通道93a，以连通第二清水腔室41a和清洗区91，进而第二清水腔室41a能够向清洗区91输送清洗所需清水(图9c中虚线箭头所示为清水流动路径)，第三清水通道3a用于连通外部水路以接收外界水源输送的清水并输送至第二清水腔室41a。
在一些实施例中，如图9d所示，输水通道93包括污水输送通道93b；第二腔室41包括第二污水腔室41b，第二通道43包括第二污水通道43b，第三通道包括第三污水通道3b；当第二水箱4装设在基站主体8上时，第二污水通道43b连接污水输送通道93b，以连通第二污水腔室41b和清洗区，进而第二污水腔室41b能够接收清洗区91排出的污水(图9d中虚线箭头所示为污水流动路径)，第三污水通道3b用于连接外部水路以将第二污水腔室41b内的污水输出至外部水路。
可以理解的是，第二通道43可以有不同的实现形式，比如，可以采用接口、通孔、管道等形式；输水通道同样可以有不同的实现形式；只要是借由第二通道与输水通道的连接能够实现第二腔室41与清洗系统9的连通即可。第三通道3同样可以有不同的实现形式，只要能够直接或间接与外部水路连接即可。
具体地，第三污水通道3b可以设有第一动力装置34，第一动力装置34用于提供输送动力，以将第二污水腔室41b内的水输出至外部水路。第一动力装置34可以包括但不限于为泵。
如图1b所示，当基站包括有择一装设在基站主体8上的第一水箱1和第二水箱4时，第一水箱1和第二水箱4分别利用第一通道和第二通道与清洗系统9的输水通道连接。具体地，输水通道设有第二动力装置36；当第一水箱1或第二水箱4装设于基站主体8上时，第二动力装置36用于提供输送动力，以将第一水箱1或第二水箱4中的清水输送至清洗区，或者将清洗区的污水输送至第一水箱1或第二水箱4内。请参阅图7a和图7b，具体地，第二水箱4内形成有用于储存清水的第二清水腔室41a和用于储存污水的第二污水腔室41b；也就是说，同一个水箱既具有储存清水的功能，又具有储存污水的功能。当然，为了 能够同时或者择一实现自动上水和自动下水的功能，第二水箱4也可以包括相互独立的第二清水箱和第二污水箱，第二清水箱形成有用于储存清水的第二清水腔室，第二污水箱形成有用于储存污水的第二污水腔室。基站也可以只是包括一个第二清水箱或者只是包括一个第二污水箱。
请参阅图3、图4、图7a和图7b，在该示例中，第二水箱4上设有与第二腔室11连通的第三接口42，当第二水箱4装设在基站主体8上时，第三接口42和清洗系统9的第二接口81对接以能够实现第二腔室41与清洗系统9的连通。可以理解的是，第二水箱4上的第三接口42和基站主体8上的第二接口81对接的方式可以有不同的方式，例如，第三接口42可插入第二接口81中，或者，第二接口81插入第三接口42中。在一个具体的实施例中，第二接口81可以由第三接口42穿入第二腔室41，在该种方式下，此时清水或者污水并不会直接流经第三接口42，即，水不会接触到第三接口42的内壁面，而仅与第二接口81的内壁面接触。另外，第二水箱4还可以包括设置在第二水箱4上的通孔、管道和/或阀体等结构以便于第二腔室41与清洗系统8的连通，，示例性的，可通过阀体控制水路系统的通断；等等。本申请对此不作限制，只要能够起到使第二腔室41与基站主体8上的清洗系统9连通的作用即可。
请结合图6和图7，在该示例中，第二水箱4包括可分离的第一箱体45和第二箱体46，第二腔室41形成在第一箱体45，水路通道3同时形成在第一箱体45和第二箱体46，当第一箱体45和第二箱体46对接为一体时，水路通道3位于第一箱体45的组成部分和位于第二箱体46的组成部分相互连接。
具体地，水路通道3包括设置在第一箱体45的第四接口31以及设置在第二箱体46内的第五接口32和输送管路33，第四接口31与第二腔室41连通，第五接口32位于输送管路33的一端，输送管路33的另一端用于连接外部水路，当第一箱体45和第二箱体46对接为一体时，第四接口31与第五接口32连接以连通第二腔室41与输送管路33。
更具体地，第四接口31包括第一止回阀结构310，第五接口32包括第二止回阀结构320，第一止回阀结构310和第二止回阀结构320被配置为：当第一箱体45对接至第二箱体46时对接且相互推动至打开状态，当第一箱体45与第二箱体46分开时自动复位至关闭状态。
请结合图3和图5，为了方便与外部水路连通，水路通道3的对应端口可以连接一可分离的转接座70，当然，该转接座70也可以视为第二水箱4的组成部 分。在该示例中，第二水箱4首先安装在基站主体8上，然后再将转接座70连接至第二水箱4。
另外，可以将该示例中的第二箱体46视为基站主体8的组成部分，此时第一箱体45即为第二水箱4。
请参阅图1至图4，第一水箱1和第二水箱4被配置为择一地装设在基站主体8上的相同位置。通过把第一水箱1和第二水箱4择一设置在基站主体8上的相同位置，有利于在在基站尺寸和水箱容量之间取得平衡，且用户可以根据需要，可将具备自动上下水功能的第二水箱4或不具备自动上下水功能的第一水箱1安装于基站主体8上，且有利于基站主体8的复用，无需每个水箱分别配置一个基站，有利于节省制造成本。
为了便于装设第一水箱1和第二水箱4，可以在基站主体8上设有水箱容纳空间82，具体形成在基站支架80上。
如图3和图4所示，当第一水箱1和/或第二水箱4装设在水箱容纳空间82时，水箱容纳空间82包括被第一水箱1和/或第二水箱4占据的水箱装设空间84和未被第一水箱和/或第二水箱4占据的配件放置空间83，比如，可以将清洁机器人的清洁件放置在配件放置空间83。通过该设置，能够使基站具备额外的配件放置功能，便于用户在使用配件时快速找到配件。
请结合图12，具体地，水箱容纳空间82设有将配件放置空间83与水箱装设空间84隔开的隔断门M，隔断门M与配件放置空间83的开口端相反的一端可摆动地连接至基站主体8；当装设在水箱容纳空间82时，第一水箱1和/或第二水箱4与隔断门M相间隔以允许隔断门M朝向第一水箱1和/或第二水箱4摆动。借由隔断门M的设置，能够避免放置在配件放置空间83的配件滑移至第一水箱1和/或第二水箱4的装设位置，而影响到的第一水箱1和/或第二水箱4的装设；另外，也能够避免第一水箱1和/或第二水箱4与配件之间发生相互碰触；而且，借由隔断门M的可摆动设计，便于使配件放置空间83进一步敞开以便于取放配件。
在具体的示例中，第一水箱1和第二水箱4择一地装设在水箱容纳空间82，具体可以装设于水箱装设空间84，当第一水箱1装设在水箱容纳空间82时与隔断门M之间的间隔相对较小或者没有间隔，此时会限制隔断门M的打开，在第一水箱1取出后，隔断门M才能打开较大角度以使配件放置空间83进一步敞开，从而方便配件的取放；当第二水箱4装设在水箱容纳空间82时与隔断门M之间 的间隔相对较大，此时隔断门M可以朝向第二水箱3打开以使配件放置空间83进一步敞开，从而方便配件的取放。
具体地，清洗系统9包括输水通道93。第一水箱1形成有第一腔室11和与第一腔室11连通的第一通道12，当第一水箱1装设在水箱容纳空间82时，第一通道12与输水通道连接，以连通第一腔室11和清洗系统9。第二水箱4形成有第二腔室41和与第二腔室41连通的第二通道，当第二水箱4装设在水箱容纳空间82时，第二通道与输水通道连接，以连通第二腔室41和清洗系统9。
更具体的，如图9e所示，输水通道93包括清水输送通道93a；第一腔室11包括第一清水腔室11a，第一通道12包括第一清水通道12a，当第一水箱1装设在基站主体8上时，第一清水通道12a连接清水输送通道93a，以连通第一清水腔室11a和清洗区91，进而第一清水腔室11a能够向清洗区91输送清洗所需清水(图9e中虚线箭头所示为清水流动路径)。
在一些实施例中，如图9f所示，输水通道93包括污水输送通道93b；第一腔室11包括第一污水腔室11b，第一通道12包括第一污水通道12b，当第一水箱1装设在基站主体8上时，第一污水通道12b连接污水输送通道93b，以连通第一污水腔室11b和清洗区91，进而清洗区91所产生的污水能够输送至第一污水腔室11b(图9f中虚线箭头所示为清水流动路径)。
在一些实施例中，如图9c所示，输水通道93包括清水输送通道93a；第二腔室41包括第二清水腔室41a，第二通道43包括第二清水通道43a，第三通道3包括第三清水通道3a；当第二水箱4装设在基站主体8上时，第二清水通道43a连接清水输送通道93a，以连通第二清水腔室41a和清洗区91，进而第二清水腔室41a能够向清洗区91输送清洗所需清水(图9c中虚线箭头所示为清水流动路径)。
在一些实施例中，如图9d所示，输水通道93包括污水输送通道93b；第二腔室41包括第二污水腔室41b，第二通道43包括第二污水通道43b，第三通道3包括第三污水通道3b；当第二水箱4装设在基站主体8上时，第二污水通道43b连接污水输送通道93b，以连通第二污水腔室41b和清洗区，进而第二污水腔室41b能够接收清洗区91排出的污水(图9d中虚线箭头所示为污水流动路径)。
请结合图3至图5，以及图9c和图9d，具体地，第二水箱4设有与第二腔室41连通的第三通道3；基站主体8上设有与水箱容纳空间82连通的安装口， 当第二水箱4装设在水箱容纳空间82，第三通道与安装口对应并利用安装口与外部水路连接，以接收外界水源的清水并输送至第二腔室41，或者，排出第二腔室41内的污水。借由安装口的设置，便于第二水箱4与外部水路连接。
进一步地，安装口处可分离地装配有转接座70，转接座70用于与第三通道连接，进而可以利用转接座70的转接使所述第三通道与外部水路连接。
具体地，第一水箱1包括第一清水箱1a和第一污水箱1b，第二水箱4内同时设有用于储存清水的第二清水腔室41a和用于储存污水的第二污水腔室41b，在使用时，可以选择将第一清水箱1a和第一污水箱1b同时放置在水箱容纳空间82，或者选择将第二水箱4放置在水箱容纳空间82以进行自动上下水。
需要注意的是，以上“相同位置”并非指占用完全一致的位置，而是在择一放置在基站主体8上时，第一水箱1和第二水箱4占用的位置会有重合。
当然，第一水箱1和第二水箱4也可同时或择一地装设在基站主体8上的不同位置。
可以理解的是，第一水箱1和第二水箱4择一装设在基站主体8的相同位置，或者，同时或择一装设在基站主体8上的不同位置皆有多种不同可能。下面以第一水箱1和第二水箱4择一装设在基站主体8的相同位置举例说明：
第一清水箱1a和第二清水箱择一装设在基站主体8的相同位置；
第一污水箱1b和第二污水箱择一装设在基站主体8的相同位置；
第一清水箱1a和第二清水箱择一装设在基站主体8的相同位置以及第一污水箱1b和第二污水箱择一装设在基站主体8的相同位置；
第一水箱1包括用于储存清水的第一清水腔室11a和用于储存污水的第一污水腔室11b，第二水箱4包括用于储存清水的第二清水腔室41a和用于储存污水的第二污水腔室41b，第一水箱1和第二水箱4择一装设在基站主体8的相同位置；
第一水箱1包括用于储存清水的第一清水腔室11a和用于储存污水的第一污水腔室11b，第一水箱1放置在基站主体8；或者，第二清水箱和/或第二污水箱放置在基站主体8上的相同位置；
第二水箱4包括用于储存清水的第二清水腔室41a和用于储存污水的第二污水腔室41b，第二水箱4放置在基站主体8；或者，第一清水箱1a和/或第一污水箱1b放置在基站主体8的相同位置。
需要注意的是，第二腔室41并非一定需要形成在水箱，其也可以形成在基 站主体8上。其中，可以将实现不同功能的第一腔室11分别形成在第一水箱1和基站主体8上，也不排除在第一水箱1上和基站主体8上同时设有实现同一功能的第二腔室41。
当第二腔室41形成在基站主体8上时，第一水箱1可以装设在第二腔室41，也可以装设在基站主体8上不同于第二腔室41的位置，在此不作限制。
请参阅图27a和图27b，在一些实施例中，清洗系统9包括清水输送通道；第二水路系统包括清水腔j和与清水腔j连通的清水输入通道，清水腔j和清水输入通道设置在基站主体8；清水腔j与清水输送通道连通，以向清洗系统9提供清水；清水输入通道用于连接外部水路，以将外界水源的清水输送至清水腔j。这样无需设置专门的水箱，可以利用设置在基站主体8上的清水腔j和清水输入通道实现基站的自动上水。
进一步地，清水腔j可容纳一清水箱h；清水箱h设有清水腔室h1和与清水腔室h1连通的清水通道；当清水箱h容纳于清水腔j时，清水通道与清水输送通道连接，以连通清水腔室h1和清洗系统9。这样就使得基站既可以利用常规的水箱为清洗系统9提供清水，也可利用基站主体8上的清水腔j和清水输入通道实现基站的自动上水，实现了兼容效果。
请参阅图15，具体地，清洗系统9包括污水输送通道；第二水路系统包括污水腔c和与污水腔c连通的污水输出通道，污水腔c和污水输出通道设置在基站主体8；污水腔c与污水输送通道连通，以接收清洗系统9排出的污水；污水输出通道用于连接外部水路，以排出污水腔c内的污水。这样无需设置专门的水箱，可以利用设置在基站主体8上的污水腔c和污水输出通道实现基站的自动下水。
进一步地，污水腔c可容纳一污水箱a；污水箱a设有污水腔室a1和与污水腔室a1连通的污水通道；当污水箱a容纳于污水腔c时，污水通道与污水输送通道连接，以连通污水腔室a1和清洗系统9。这样就使得基站既可以利用常规的水箱接收清洗系统9排出的污水，也可利用基站主体8上的污水腔c和污水输出通道实现基站的自动下水，实现了兼容效果。
当然，第二水路系统并不局限于以上包括第二腔室41的实施方式。比如，在其他实施例中，第二水路系统可以利用水路通道3连接至清洗系统9，这样无需设置进行临时储存清水和/或污水的第二腔室41。
具体地，水路通道3包括清水输入通道，清水输入通道设置在基站主体8； 清水输入通道与清洗系统9连通，且用于连接外部水路，以接收外界水源的清水并输送至清洗系统9。这样无需设置进行临时储存清水的第二清水腔室41a。
具体地，水路通道3包括污水输出通道，污水输出通道设置在基站主体8；污水输出通道与清洗系统9连通，且用于连接外部水路，以排出清洗系统9产生的污水。这样无需设置进行临时储存污水的第二污水腔室41b。
另外，当第二水路系统同时包括有自动上水系统和自动下水系统时，可以其中一者采用包括第二腔室41的方案，另一者采用不包括第二腔室41的方案；或者，第二水路系统可以同时采用包括第二腔室41和不包括第二腔室41的方案，比如，水路通道3一方面连接至清洗系统9，另一方面也连接至第二腔室41。
关于以上提到的水路通道3并不限于上述示例中的具体形式，根据不同的实施例，无论是只形成在基站主体8上，还是只形成在第二水箱4上，或者是同时形成在第二水箱4和基站主体8上，又或者是其他情况，都可以有各种方式，只要能够达成使清水从基站外部的水路输入或者使污水排出至基站外部的目的即可。比如，水路通道3可以仅仅包括形成在第二水箱4或基站主体8上的通孔或接口，该通孔或接口使外部水路与第二腔室41连通(例如，外部水路的端口可以经由该通孔或接口直接穿入第二腔室41，此时液体并不会直接流过该通孔或接口；当然，外部水路的端口也可以其他方式与该通孔或者接口连接)；或者水路通道3可以包括设置在第二水箱4和/或基站主体8上的管道等结构；又或者，水路通道3还可以包括设置在通孔、接口或者管道的止回阀或接头等结构并通过其与外部管路连接；等等。
请参阅图7，在一些实施例中，水路通道3上设有泵34，泵34用于给第二腔室41接收外部水路输送来的清水或者给第二腔室41内的污水向外排出提供输送动力。根据水路通道3的不同实施方式，泵34有可以有不同的设置方式，可以是设置在第二水箱4上，也可以设置基站主体8上。在具体的示例中，泵34设置在第二水箱4的第二箱体46上的输送管路33上。另外，泵34可以是不同类型的泵34，比如，叶轮泵。
需要注意的是，在不同的实施例中，第一水路系统与第二水路系统可以连接至清洗系统9的同一位置，也可以连接至清洗系统9的不同位置，本申请对此不作限制。
为了使基站具有兼容自动上水和手动上水，和/或兼容自动下水和手动下水 的效果，第一水路系统和第二水路系统择一或同时为清洗系统9提供清水和/或接收清洗系统9产生的污水(即至少可以涵盖如下情况：择一上水、择一下水、择一上水和下水、同时上水、同时下水、同时上下水；在择一上水、择一下水、同时上水或同时下水时，对应的下水或上水既可能是利用第一水路系统，也可能是利用第二水路系统)。一般情况下，第一水路系统和第二水路系统提供清水和/或接收污水时是择一进行的。当然，基站上同时存在第二水路系统和第一水路系统的情况下(对应的第一水箱1没有被取出)，也不排除同时为清洗系统9提供清水和/或接收清洗系统9产生的污水的情况。
关于具有兼容效果的基站，在具体使用时如何进行上下水，可以根据以上讲到的第一水路系统的各种情况和第二水路系统的各种情况进行各种可能的组合。
根据不同的实施例，第一水路系统可以包括手动上水系统和手动下水系统或者包括手动上水系统和手动下水系统中的一者；第二水路系统可以包括自动上水系统和自动下水系统或者包括自动上水系统和自动下水系统中的一者。只要能够实现择一或同时为清洗系统提供清水(兼容手动上水和自动上水)；和/或，择一或同时接收清洗系统产生的污水(兼容手动下水和自动下水)，即可。
不考虑上水是否可以兼容，仅就兼容手动下水和自动下水而言，根据不同的实施例至少可以存在如下实现方式：
(1)请参阅图13，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统包括形成在第二污水箱b的用于接收清洗系统9输送的污水的第二污水腔室b1，第二污水腔室b1通过水路通道与外界连通；
第一污水箱a和第二污水箱b择一放置在基站主体的相同位置。
由于第一污水箱a和第二污水箱b择一放置在基站主体的相同位置，在实现兼容手动下水和自动下水的同时，能够避免对基站主体空间的额外或过多占用。
(2)请参阅图14，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统包括形成在第二污水箱b的用于接收清洗系统9输送的污水的第二污水腔室b1，第二污水腔室b1通过水路通道与外界连通；
第一污水箱a和第二污水箱b择一或同时放置在基站主体的不同位置；当 同时放置时，可以根据情况设置为同时进行下水或者择一进行下水。
根据不同情况，可以设置为：第一污水箱a放置在基站主体上时即与清洗系统9保持连通，或者第一污水箱a放置在基站主体上时可控制通断地与清洗系统9连通；和/或，第二污水箱b放置在基站主体上时即与清洗系统9保持连通，或者第二污水箱b放置在基站主体上时可控制通断地与清洗系统9连通。
由于第一污水箱a和第二污水箱b放置在基站主体的不同位置，可以配置为使第一污水箱a和第二污水箱b总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一污水箱a或第二污水箱b进行收藏，也能够根据情况设置为两者同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。
(3)请参阅图15，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统包括形成在基站主体的用于接收清洗系统9输送的污水的第二污水腔室c，第二污水腔室c通过水路通道与外界连通；
第一污水箱a可取出地放置在第二污水腔室c，手动下水系统和自动下水系统择一进行下水。
由于第一污水箱a可取出地放置在第二污水腔室c，在实现兼容手动下水和自动下水的同时，能够避免对基站主体空间的额外或过多占用。
(4)请参阅图16，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统包括形成在基站主体的用于接收清洗系统9输送的污水的第二污水腔室c，第二污水腔室c通过水路通道与外界连通；
第一污水箱a放置在基站主体的不同于第二污水腔室c的位置；
第一污水箱a放置在基站主体上时，可以根据情况设置为手动下水系统和自动下水系统同时进行下水或者择一进行下水；
在使用自动下水系统下水时，第一污水箱a也可不放置在基站主体。
根据不同情况，可以设置为：第一污水箱a放置在基站主体上时即与清洗系统9保持连通，或者第一污水箱a放置在基站主体上时可控制通断地与清洗系统9连通；和/或第二污水腔室c可以一直与清洗系统9保持连通，也可以能够控制通断地与清洗系统9连通。
由于第一污水箱a和第二污水腔室c设置在基站主体的不同位置，可以配置 为使第一污水箱a总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一污水箱a进行收藏。也能够根据情况设置为两者同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。
(5)请参阅图17，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统通过水路通道d直接连通外界与清洗系统9，即不包括第二污水腔室；
第一污水箱a放置在基站主体上时，可以根据情况设置为手动下水系统和自动下水系统同时进行下水或者择一进行下水；
在使用自动下水系统下水时，第一污水箱a也可不放置在基站主体。
根据不同情况，可以设置为：第一污水箱a放置在基站主体上时即与清洗系统9保持连通，或者第一污水箱a放置在基站主体上时可控制通断地与清洗系统9连通；和/或水路通道d可控制通断地与清洗系统9连通。
由于自动下水系统通过水路通道d直接连通外界与清洗系统9，在实现兼容手动下水和自动下水的同时，能够避免对基站主体空间的额外或过多占用。另外，根据不同情况，可以配置为使第一污水箱a总是放置在基站主体上(除了需要取出的情况外)，无需第一污水箱a进行专门收藏。此外，也能够根据情况设置为自动下水系统和手动下水系统同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。
(6)请参阅图18，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统包括形成在第二水箱e的用于接收清洗系统9输送的污水的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通，第二水箱e还包括作为自动上水系统组成部分的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通；
第一污水箱a和第二水箱e择一放置在基站主体的相同位置。
当第二水箱e放置在基站主体上时，上水和下水可分别通过自动上水系统和自动下水系统进行；当然，也不排除其他情况，比如上水还可以通过手动上水系统进行。
由于第一污水箱a和第二水箱e择一放置在基站主体的相同位置，在实现兼容手动下水和自动下水的同时，能够避免对基站主体空间的额外或过多占用。
(7)请参阅图19，手动下水系统包括形成在第一污水箱a的用于接收清洗系统9输送的污水的第一污水腔室a1；
自动下水系统包括形成在第二水箱e的用于接收清洗系统9输送的污水的第二污水腔室e1，第二污水腔室b1通过水路通道与外界连通，第二水箱e还包括作为自动上水系统组成部分的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通；
第一污水箱a和第二水箱e择一或同时放置在基站主体的不同位置；当同时放置时，可以根据情况设置为同时进行下水或者择一进行下水。
根据不同情况，可以设置为：第一污水箱a放置在基站主体上时即与清洗系统9保持连通，或者第一污水箱a放置在基站主体上时可控制通断地与清洗系统9连通；和/或，第二水箱e放置在基站主体上时，第二污水腔室e1即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。在第二水箱e放置在基站主体上时，第二清水腔室e2即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于第一污水箱a和第二水箱e放置在基站主体的不同位置，可以配置为使第一污水箱a和第二水箱e总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一污水箱a或第二水箱e进行收藏，也能够根据情况设置为两者同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。
(8)请参阅图20，手动下水系统包括形成在第一水箱f的用于接收清洗系统9输送的污水的第一污水腔室f1，第一水箱f还包括用于为清洗系统9提供清水的第一清水腔室f2，第一清水腔室f2为手动上水系统的组成部分；
自动下水系统包括形成在第二污水箱b的用于接收清洗系统9输送的污水的第二污水腔室b1，第二污水腔室b1通过水路通道与外界连通；
第一水箱f和第二污水箱b放置在基站主体的不同位置；
第二污水箱b放置在基站主体上时，可以根据情况设置为手动下水系统和自动下水系统同时使用或者择一使用；
在使用手动下水系统下水时，第二污水箱b也可不放置在基站主体。
根据不同情况，可以设置为：第一水箱f放置在基站主体上时第一污水腔室f1即与清洗系统9保持连通，或者第一水箱f放置在基站主体上时第一污水腔室f1可控制通断地与清洗系统9连通；和/或，第二污水箱b放置在基站主体上时即与清洗系统9保持连通，或者第二污水箱b放置在基站主体上时可控制通断 地与清洗系统9连通。在第一水箱f放置在基站主体上时第一清水腔室f2即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于第一水箱f和第二污水箱b放置在基站主体的不同位置，根据不同情况，可以配置为使第一水箱f和/或第二污水箱b总是放置在基站主体上(除了需要取出的情况外)，无需专门对第二污水箱b进行收藏。此外，也能够根据情况设置为自动下水系统和手动下水系统同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。
(9)请参阅图21，手动下水系统包括形成在第一水箱f的用于接收清洗系统9输送的污水的第一污水腔室f1；第一水箱f还包括用于为清洗系统9提供清水的第一清水腔室f2，第一清水腔室f2为手动上水系统的组成部分；
自动下水系统包括形成在基站主体的用于接收清洗系统9输送的污水的第二污水腔室c，第二污水腔室c通过水路通道与外界连通；
第一水箱f放置在基站主体的不同于第二污水腔室c的位置；
第一水箱f放置在基站主体上时，可以根据情况设置为手动下水系统和自动下水系统同时进行下水或者择一进行下水；
在使用自动下水系统下水时，第一水箱f也可能不放置在基站主体。
根据不同情况，可以设置为：第一水箱f放置在基站主体上时第一污水腔室f1即与清洗系统9保持连通，或者第一水箱f放置在基站主体上时第一污水腔室f1可控制通断地与清洗系统9连通；和/或，第二污水腔室c可以一直与清洗系统9保持连通，也可以能够控制通断地与清洗系统9连通。在第一水箱f放置在基站主体上时第一清水腔室f2即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于基站主体上能够同时存在手动下水系统和自动下水系统，可以根据情况设置为自动下水系统和手动下水系统同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。由于第一水箱f和第二污水腔室c设置在基站主体的不同位置，可以配置为使第一水箱f总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一水箱f进行收藏。
(10)请参阅图22，手动下水系统包括形成在第一水箱f的用于接收清洗系统9输送的污水的第一污水腔室f1；第一水箱f还包括用于为清洗系统9提供清水的第一清水腔室f2，第一清水腔室f2为手动上水系统的组成部分；
自动下水系统通过水路通道d直接连通外界与清洗系统9；
第一水箱f可放置在基站主体上，此时可以根据情况设置为手动下水系统和自动下水系统同时进行下水或者择一进行下水；
在使用自动下水系统下水时，第一水箱f也可能不放置在基站主体。
根据不同情况，可以设置为：第一水箱f放置在基站主体上时第一污水腔室f1即与清洗系统9保持连通，或者第一水箱f放置在基站主体上时第一污水腔室f1可控制通断地与清洗系统9连通；和/或水路通道d可控制通断地与清洗系统9连通。第一水箱f放置在基站主体上时，第一清水腔室f2即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于自动下水系统通过水路通道d直接连通外界与清洗系统9，在实现兼容手动下水和自动下水的同时，能够避免对基站主体空间的额外或过多占用。另外，根据不同情况，可以配置为使第一水箱f总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一水箱f进行收藏。此外，也能够根据情况设置为自动下水系统和手动下水系统同时进行下水、择一进行下水或者在同时下水和择一下水之间进行切换。
(11)请参阅图23，手动下水系统包括形成在第一水箱f的用于接收清洗系统9输送的污水的第一污水腔室f1；第一水箱f还包括用于为清洗系统9提供清水的第一清水腔室f2，第一清水腔室f2为手动上水系统的组成部分；
自动下水系统包括形成在第二水箱e的用于接收清洗系统9输送的污水的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通，第二水箱e还包括作为自动上水系统组成部分的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通；
第一水箱f和第二水箱e择一放置在基站主体的相同位置。
由于第一水箱f和第二水箱e择一放置在基站主体的相同位置，在实现兼容手动上下水和自动上下水的同时，能够避免对基站主体空间的额外或过多占用。
(12)请参阅图24，手动下水系统包括形成在第一水箱f的用于接收清洗系统9输送的污水的第一污水腔室f1；第一水箱f还包括用于为清洗系统9提供清水的第一清水腔室f2，第一清水腔室f2为手动上水系统的组成部分；
自动下水系统包括形成在第二水箱e的用于接收清洗系统9输送的污水的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通，第二水箱e还包括作为自动上水系统组成部分的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通；
第一水箱f和第二水箱e择一或同时放置在基站主体的不同位置。
可以理解的是，以上基站兼容手动下水和自动下水的实现方式只是举例，并非穷举，还可以存在其他各种实现方式，比如，自动下水系统可以同时包括不止一个子系统，例如，既包括采用第二污水腔室接收污水的方式，也可以同时包括水路通道直接连通清洗系统9和基站外界的方式。另外，在基站兼容手动下水和自动下水的情况下，为清洗系统9提供清水可以只是采用手动上水，或者只是采用自动上水(可以存在多种方式)，或者能够兼容手动上水和自动上水(择一或同时上水)。
不考虑下水是否可以兼容，仅就兼容手动上水和自动上水而言，根据不同的实施例至少可以存在如下实现方式：
(1)请参阅图25，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统包括形成在第二清水箱i的用于为清洗系统9提供清水的第二清水腔室i1，第二清水腔室i1通过水路通道与外界连通；
第一清水箱h和第二清水箱i择一放置在基站主体的相同位置。
由于第一清水箱h和第二清水箱i择一放置在基站主体的相同位置，在实现兼容手动上水和自动上水的同时，能够避免对基站主体空间的额外或过多占用。
(2)请参阅图26，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统包括形成在第二清水箱i的用于为清洗系统9提供清水的第二清水腔室i1，第二清水腔室i1通过水路通道与外界连通；
第一清水箱h和第二清水箱i择一或同时放置在基站主体的不同位置；当同时放置时，可以根据情况设置为同时进行上水或者择一进行上水。
根据不同情况，可以设置为：第一清水箱h放置在基站主体上时即与清洗系统9保持连通，或者第一清水箱h放置在基站主体上时可控制通断地与清洗系统9连通；和/或，第二清水箱i放置在基站主体上时即与清洗系统9保持连通，或者第二清水箱i放置在基站主体上时可控制通断地与清洗系统9连通。
由于第一清水箱h和第二清水箱i放置在基站主体的不同位置，可以配置为使第一清水箱h和第二清水箱i总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一清水箱h或第二清水箱i进行收藏，也能够根据情况设置为两者同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。
(3)请参阅图27，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统包括形成在基站主体的用于为清洗系统9提供清水的第二清水腔室j，第二清水腔室j通过水路通道与外界连通；
第一清水箱h可取出地放置在第二清水腔室j，手动上水系统和自动上水系统择一进行上水。
由于第一清水箱h可取出地放置在第二清水腔室j，在实现兼容手动上水和自动上水的同时，能够避免对基站主体空间的额外或过多占用。
(4)请参阅图28，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统包括形成在基站主体的用于为清洗系统9提供清水的第二清水腔室j，第二清水腔室j通过水路通道与外界连通；
第一清水箱h放置在基站主体的不同于第二清水腔室j的位置；
第一清水箱h放置在基站主体上时，可以根据情况设置为手动上水系统和自动上水系统同时进行上水或者择一进行上水；
在使用自动上水系统上水时，第一清水箱h也可不放置在基站主体。
根据不同情况，可以设置为：第一清水箱h放置在基站主体上时即与清洗系统9保持连通，或者第一清水箱h放置在基站主体上时可控制通断地与清洗系统9连通；和/或第二清水腔室j可以一直与清洗系统9保持连通，也可以能够控制通断地与清洗系统9连通。
由于第一清水箱h和第二清水腔室j设置在基站主体的不同位置，可以配置为使第一清水箱h总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一清水箱h进行收藏。也能够根据情况设置为两者同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。
(5)请参阅图29，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统通过水路通道d直接连通外界与清洗系统9，即不包括第二清水腔室；
第一清水箱h放置在基站主体上时，可以根据情况设置为手动上水系统和自动上水系统同时进行上水或者择一进行上水；
在使用自动上水系统上水时，第一清水箱h也可不放置在基站主体。
根据不同情况，可以设置为：第一清水箱h放置在基站主体上时即与清洗系统9保持连通，或者第一清水箱h放置在基站主体上时可控制通断地与清洗系统9连通；和/或水路通道d可控制通断地与清洗系统9连通。
由于自动上水系统通过水路通道d直接连通外界与清洗系统9，在实现兼容手动上水和自动上水的同时，能够避免对基站主体空间的额外或过多占用。另外，根据不同情况，可以配置为使第一清水箱h总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一清水箱h进行收藏。此外，也能够根据情况设置为自动上水系统和手动上水系统同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。
(6)请参阅图30，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统包括形成在第二水箱e的用于为清洗系统9提供清水的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通，第二水箱e还包括作为自动下水系统组成部分的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通；
第一清水箱h和第二水箱e择一放置在基站主体的相同位置。
当第二水箱e放置在基站主体上时，上水和下水可分别通过自动上水系统和自动下水系统进行；当然，也不排除其他情况，比如下水还可以通过手动下水系统进行。
由于第一清水箱h和第二水箱e择一放置在基站主体的相同位置，在实现兼容手动上水和自动上水的同时，能够避免对基站主体空间的额外或过多占用。
(7)请参阅图31，手动上水系统包括形成在第一清水箱h的为清洗系统9提供清水的第一清水腔室h1；
自动上水系统包括形成在第二水箱e的用于为清洗系统9提供清水的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通，第二水箱e还包括作为自动下水系统组成部分的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通；
第一清水箱h和第二水箱e择一或同时放置在基站主体的不同位置；当同时放置时，可以根据情况设置为同时进行上水或者择一进行上水。
根据不同情况，可以设置为：第一清水箱h放置在基站主体上时即与清洗系统9保持连通，或者第一清水箱h放置在基站主体上时可控制通断地与清洗 系统9连通；和/或，第二水箱e放置在基站主体上时，第二清水腔室e2即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。在第二水箱e放置在基站主体上时，第二污水腔室e1即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于第一清水箱h和第二水箱e放置在基站主体的不同位置，可以配置为使第一清水箱h和第二水箱e总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一清水箱h或第二水箱e进行收藏，也能够根据情况设置为两者同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。
(8)请参阅图32，手动上水系统包括形成在第一水箱f的用于为清洗系统9提供清水的第一清水腔室f2，第一水箱f还包括用于接收清洗系统9输送的污水的第一污水腔室f1，第一污水腔室f1为手动下水系统的组成部分；
自动上水系统包括形成在第二清水箱i的用于为清洗系统9提供清水的第二清水腔室i1，第二清水腔室i1通过水路通道与外界连通；
第一水箱f和第二清水箱i放置在基站主体的不同位置；
第二清水箱i放置在基站主体上，可以根据情况设置为手动上水系统和自动上水系统同时使用或者择一使用；
在使用手动上水系统上水时，第二清水箱i也可不放置在基站主体。
根据不同情况，可以设置为：第一水箱f放置在基站主体上时第一清水腔室f2即与清洗系统9保持连通，或者第一水箱f放置在基站主体上时第一清水腔室f2可控制通断地与清洗系统9连通；和/或，第二清水箱i放置在基站主体上时即与清洗系统9保持连通，或者第二清水箱i放置在基站主体上时可控制通断地与清洗系统9连通。在第一水箱f放置在基站主体上时第一污水腔室f1即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于第一水箱f和第二清水箱i放置在基站主体的不同位置，根据不同情况，可以使第二清水箱i和/或第一水箱f总是放置在基站主体上(除了需要取出的情况外)，无需专门对没有放置的第二清水箱i或第一水箱f进行收藏。此外，也能够根据情况设置为自动上水系统和手动上水系统同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。
(9)请参阅图33，手动上水系统包括形成在第一水箱f的用于为清洗系统9提供清水的第一清水腔室f2，第一水箱f还包括用于接收清洗系统9输送的污水的第一污水腔室f1，第一污水腔室f1为手动下水系统的组成部分；
自动上水系统包括形成在基站主体的用于为清洗系统9提供清水的第二清水腔室j，第二清水腔室j通过水路通道与外界连通；
第一水箱f放置在基站主体的不同于第二清水腔室j的位置；
第一水箱f放置在基站主体上时，可以根据情况设置为手动上水系统和自动上水系统同时进行上水或者择一进行上水；
在使用自动上水系统上水时，第一水箱f也可能不放置在基站主体。
根据不同情况，可以设置为：第一水箱f放置在基站主体上时第一清水腔室f2即与清洗系统9保持连通，或者第一水箱f放置在基站主体上时第一清水腔室f2可控制通断地与清洗系统9连通；和/或，第二清水腔室j可以一直与清洗系统9保持连通，也可以能够控制通断地与清洗系统9连通。在第一水箱f放置在基站主体上时第一污水腔室f1即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于基站主体上能够同时存在手动上水系统和自动上水系统，可以根据情况设置为自动上水系统和手动上水系统同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。由于第一水箱f和第二清水腔室j设置在基站主体的不同位置，可以配置为使第一水箱f总是放置在基站主体上(除了需要取出的情况外)，无需对第一水箱f进行专门收藏。
(10)请参阅图34，手动上水系统包括形成在第一水箱f的用于为清洗系统9提供清水的第一清水腔室f2，第一水箱f还包括用于接收清洗系统9输送的污水的第一污水腔室f1，第一污水腔室f1为手动下水系统的组成部分；
自动上水系统通过水路通道d直接连通外界与清洗系统9；
第一水箱f放置在基站主体上时，可以根据情况设置为手动上水系统和自动上水系统同时进行上水或者择一进行上水；
在使用自动上水系统上水时，第一水箱f也可能不放置在基站主体。
根据不同情况，可以设置为：第一水箱f放置在基站主体上时第一清水腔室f2即与清洗系统9保持连通，或者第一水箱f放置在基站主体上时第一清水腔室f2可控制通断地与清洗系统9连通；和/或水路通道d可控制通断地与清洗系统9连通。第一水箱f放置在基站主体上时，第一污水腔室f1即与清洗系统9保持连通或者可控制通断地与清洗系统9连通。
由于自动上水系统通过水路通道d直接连通外界与清洗系统9，在实现兼容手动上水和自动上水的同时，能够避免对基站主体空间的额外或过多占用。另 外，根据不同情况，可以配置为使第一水箱f总是放置在基站主体上(除了需要取出的情况外)，无需专门对第一水箱f进行收藏。此外，也能够根据情况设置为自动上水系统和手动上水系统同时进行上水、择一进行上水或者在同时上水和择一上水之间进行切换。
(11)请参阅图35，手动上水系统包括形成在第一水箱f的用于为清洗系统9提供清水的第一清水腔室f2，第一水箱f还包括用于接收清洗系统9输送的污水的第一污水腔室f1，第一污水腔室f1为手动下水系统的组成部分；
自动上水系统包括形成在第二水箱e的用于为清洗系统9提供清水的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通，第二水箱e还包括作为自动下水系统组成部分的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通；
第一水箱f和第二水箱e择一放置在基站主体的相同位置。
由于第一水箱f和第二水箱e择一放置在基站主体的相同位置，在实现兼容手动上下水和自动上下水的同时，能够避免对基站主体空间的额外或过多占用。
(12)请参阅图36，手动上水系统包括形成在第一水箱f的用于为清洗系统9提供清水的第一清水腔室f2，第一水箱f还包括用于接收清洗系统9输送的污水的第一污水腔室f1，第一污水腔室f1为手动下水系统的组成部分；
自动上水系统包括形成在第二水箱e的用于为清洗系统9提供清水的第二清水腔室e2，第二清水腔室e2通过水路通道与外界连通，第二水箱e还包括作为自动下水系统组成部分的第二污水腔室e1，第二污水腔室e1通过水路通道与外界连通；
第一水箱f和第二水箱e择一或同时放置在基站主体的不同位置。
可以理解的是，以上基站兼容手动上水和自动上水的实现方式只是举例，并非穷举，还可以存在其他各种实现方式，比如，自动上水系统可以同时包括不止一个子系统，例如，既包括采用第二清水腔室提供清水的方式，也可以同时包括水路通道直接连通清洗系统9和基站外界的方式。另外，在基站兼容手动上水和自动上水的情况下，清洗系统9产生的污水可以只是采用手动下水，或者只是采用自动下水(可以存在多种方式)，或者能够兼容手动下水和自动下水(择一或同时下水)。
当第一水箱1内同时设有用于储存清水的第一清水腔室11a和用于储存污水的第一污水腔室11b，或者第一水箱1包括相互独立的第一清水箱1a和第一污 水箱1b，以及第二水路系统包括自动上水系统和自动下水系统时，基站可以包括以下使用模式：
第一清水腔室11a和第一污水腔室11b分别为清洗系统9提供清水和接收清洗系统9产生的污水；
第一清水腔室11a为清洗系统9提供清水，自动下水系统接收清洗系统9产生的污水；
自动上水系统为清洗系统9提供清水，第一污水腔室11b接收清洗系统9产生的污水；
自动上水系统为清洗系统9提供清水，自动下水系统接收清洗系统9产生的污水。
通过以上技术手段，本申请基站能够实现多种模式的选择使用，能够进一步满足不同用户的需要和同一用户在不同使用环境下的不同需要。
请参阅图10和图11，在一些实施例中，第一水箱1上设有第一磁性件61，第二水箱4上设有第二磁性件62，基站主体8上设有霍尔传感器63；第一水箱1和第二水箱4择一地装设在基站主体8上的相同位置；第一水箱1装设至基站主体8上时，第一磁性件61的第一磁极朝向霍尔传感器63，霍尔传感器63根据感应到的磁场产生第一电信号；第二水箱4装设在基站主体8上时，第二磁性件62的第二磁极朝向霍尔传感器63，霍尔传感器63根据感应到的磁场产生与第一电信号不同的第二电信号；第二磁极与第一磁极的极性相反。由于在第一水箱1和第二水箱4分别装设在基站主体8上时，第一磁性件61的第一磁极和第二磁性件62的第二磁极均朝向霍尔传感器63且极性相反，因此霍尔传感器63能够根据感应到的不同的磁场产生明显不同的第一电信号和第二电信号，从而有利于快速准确地识别出装设的是第一水箱1还是第二水箱4，无需为两种水箱各自配备霍尔传感器63，有利于成本的降低。
当然，对于第一水箱1和第二水箱2择一装设在基站主体8上的相同位置时，识别水箱类型的手段并不限制于上述具体技术手段。
另外，对于本申请的第一水路系统和第二水路系统而言，可以分别在第一水路系统和第二水路系统上设有第一标记件和第二标记件，在基站主体上设有识别传感器，可以利用识别传感器识别到的是第一标记件还是第二标记件来判断接入清洗系统的是第一水路系统还是第二水路系统。对于第一标记件、第二标记件和识别传感器的形式，本申请不作具体限制，比如，第一标记件和第二 标记件是识别码，识别传感器为读码器，或者第一标记件和第二标记件是磁性件，识别传感器是霍尔传感器，等等。
具体地，基站主体8设有传感器；第一水箱1上设有第一信号件，第二水箱4上设有第二信号件；第一信号件与第二信号件不同，或者，第一信号件和第二信号件发出的信号不同；当第一水箱1装设在水箱容纳空间82，传感器检测到第一信号件或者第一信号件发出的信号并生成第一检测信号；当第二水箱4装设在水箱容纳空间82，传感器检测到第二信号件或者第二信号件发出的信号并生成第二检测信号；第一检测信号与第二检测信号不同。借由上述技术手段，本申请可以准确识别装设在水箱容纳空间82的是第一水箱1还是第二水箱2，进而可以进行相应的配置。
请参阅图1至图7以及图37至图44，本申请公开了一种基站，用于在清洁机器人(图未示)驶入基站时对其清洁件进行清洗，其中，清洁件包括但不限于：拖擦件、滚刷。其中，拖擦件可以以转动、移动的方式设于清洁机器人的主机上，也可以固定于清洁机器人主机上。基站可以包括基站主体8以及清洗系统9，基站上设有清水输入通道30a和污水输出通道30b，清水输入通道30a用于接收外部水路从基站外部输送的清水并提供给清洗系统9，污水输出通道30b用于将清洗系统9产生的污水排出基站。
本申请基站在使用时，可以利用清水输入通道30a从基站外部的水路输入清水供清洗系统9使用，清洗系统9产生的污水可以通过污水输出通道30b排出至基站外部，进而实现基站自动上清水和自动下污水的目的，无需用户手动补充清水和倒出污水，给用户的使用带来了方便。
请结合图7以及图41至图44，关于基站上是否设有第二清水腔室41a和/或第二污水腔室41b，以及如何设置，可以有各种不同的方式，只要由清水输入通道30a输入的清水最终能够提供给清洗系统9使用，以及清洗系统9产生的污水最终能够由污水输出通道30b排出至基站外部即可，本申请对此不作限制。比如可以将以下第一种至第三种情况的任一者与以下第四种至第六种情况的任一者进行组合：
第一，清水输入通道30a将清水输送至清洗系统9，不需设置第二清水腔室41a。
第二，基站上设有第二清水腔室41a，第二清水腔室41a与清洗系统9连通以向清洗系统9提供清水，第二清水腔室41a与清水输入通道30a连通以接收清 水输入通道30a从基站外部输送的清水；其中，第二清水腔室41a既可以形成在基站的基站主体上，也可以形成在专门的水箱上，水箱安装在基站主体上时第二清水腔室41a为基站主体上的清洗系统9供水，此时清水输入通道30a可以只是设置在水箱上，也可同时设置在水箱和基站主体上。
第三，第一和第二种情况集成在基站上，即清水输入通道包括第一清水支路和第二清水支路，第一清水支路连通至清水腔室，第二清水支路连通至清洗系统。这样，在为清洗系统提供清水时，可以根据情况进行选择，例如，择一使用，同时使用，或者在利用第二清水支路供水的同时利用第一清水支路补充清水腔室内的清水但不利用清水腔室供水，等等。
第四，清洗系统9产生的污水输送至污水输出通道30b进行排出，不经过第二污水腔室41b。
第五，基站上设有第二污水腔室41b，第二污水腔室41b与清洗系统9连通以接收清洗系统9产生的污水，第二污水腔室41b与污水输出通道30b连通以使污水通过污水输出通道30b排出基站；其中，第二污水腔室41b既可以形成在基站主体上，也可以形成在专门的水箱上，水箱安装在基站主体上时第二污水腔室41b可以接收清洗系统9产生的污水，此时污水输出通道30b可以只是设置在水箱上，也可同时设置在水箱和基站主体上。
第六，第四和第五种情况集成在基站上，即污水输出通道包括第一污水支路和第二污水支路，第一污水支路连通至污水腔室，第二污水支路连通至清洗系统。这样，在清洗系统排出污水时，可以根据情况进行选择，例如，择一使用，同时使用，或者在利用第二污水支路接收污水的同时利用第一清水支路补充清水腔室内的清水但不利用清水腔室供水，等等。
需要说明的是，在一些实施例中，第二清水腔室41a可以由基站主体的多个壁面围设而成，同样的，第二污水腔室41b可以由基站主体的多个壁面围设而成。
需要注意的是，当第二清水腔室41a和第二污水腔室41b均形成在水箱上时，可以共用同一水箱，也可以是形成在各自独立的水箱上。本申请对此不作限制。
根据不同的实施例，清水输入通道30a无论是只形成在基站主体上(第二清水腔室41a形成在基站主体上或者不包括第二清水腔室41a)，还是只形成在水箱上，或者是同时形成在水箱和基站主体上，又或者是其他情况，都可以有 各种方式，只要能够达成使清水从基站外部的水路输入的目的即可，无论是输入至第二清水腔室41a，还是直接输入至清洗系统9。也就是说：根据不同的实施例，清水输入通道30a可以仅形成于基站主体上，也可以仅形成于水箱上，或者同时形成在水箱和基站主体上，又或者是其他情况。清水可以先输入第二清水腔室41a再输入清洗系统9，也可以直接输入至清洗系统9，只要能够达成使清水从基站外部的水路输入至清洗系统9的目的即可。
另外，清水输入通道30a可以仅仅包括形成在水箱或基站主体上的通孔或接口，该通孔或接口使外部水路与第二清水腔室41a连通(例如，外部水路的端口可以经由该通孔或接口直接穿入第二清水腔室41a，此时液体并不会直接流过该通孔或接口；当然，外部水路的端口也可以其他方式与该通孔或者接口连接)；或者清水输入通道30a可以包括设置在水箱和/或基站主体上的管道等结构；又或者，清水输入通道30a还可以包括设置在通孔、接口或者管道的止回阀或接头等结构并通过其与外部管路连接；等等。
根据不同的实施例，污水输出通道30b无论是只形成在基站主体上(第二污水腔室41b形成在基站主体上或者不包括第二污水腔室41b)，还是只形成在水箱上，又或者是同时形成在水箱和基站主体上，都可以有各种方式，只要能够达成使清洗系统9产生的污水排出至基站外部的目的即可，无论是接收清洗系统9直接输出的污水，还是接收第二污水腔室41b输出的污水。也就是说：污水输出通道30b可以仅形成在基站主体上，也可以仅形成于水箱上，或者同时形成在水箱和基站主体上，又或者其他情况。无论是接收清洗系统9直接输出的污水，还是接收第二污水腔室41b输出的污水，只要能够达成使清洗系统9产生的污水排出至基站外部的目的即可。
具体可参考上述关于清水输入通道30a的举例描述。当然，基于污水输出通道30b和清水输入通道30a的作用不同，可以分别进行针对性的设置。
此外，为了实现清水输入通道30a的进水，可以在清水输入通道30a上设置为清水输送提供动力的第一泵(即，第二动力装置36)；同样为了污水输出通道30b的排水，可以在污水输出通道30b上设置为污水排出提供动力的第二泵34，特别是污水是需经由第二污水腔室41b排至污水输出通道30b时。具体地，如图40、图45a～图46b所示，污水输出通道30b上设有阀体705，阀体705位于第二泵34的下游侧。阀体705具有第一状态和第二状态，阀体705处于第一状态时，第二污水腔室41b与外界通气连通，且阀体705限制污水流出；当第二 泵34开启，阀体705在水压下打开至第二状态，污水可由阀体705排出。
需要说明的是，阀体705位于第二泵34的下游侧是指，沿污水输出通道30b的污水流通路径所限定的方向上，污水先经过第二泵34，再经过阀体705。
阀体705的下游侧气压大于上游侧气压时，阀体705能够从第一状态变化为第三状态，阀体705处于第三状态时闭合(即，既不通气也不通水)。
需要说明的是，阀体的上游侧是指在污水流通路径所限定的方向上，污水先流过的一侧，阀体的下游侧是指在污水流通路径所限定的方向上，污水后流过的一侧。
上述的第一泵和/或第二泵可以与基站主体上的控制器(图未示)连接，以利用控制器控制其运行，当上述第一泵和/或第二泵运行时需要电力供应时，也可以与基站主体上的电源模块(图未示)连接，从而利用该电源模块为泵提供运行所需电力。
请参阅图1至图7和图44，本申请实施例公开的基站包括基站主体和自动上下水水箱(即如上所述的第二水箱4)，基站主体上设有清洗系统9，水箱安装在基站主体上。水箱上设有第二清水腔室41a、第二污水腔室41b、清水输入通道30a、清水输出通道(即上述第二清水通道)、污水输入通道(即上述第二污水通道)和污水输出通道30b，第二清水腔室41a通过清水输入通道30a接收外部水路从基站外部输送的清水，通过清水输出通道与基站主体上的清洗系统9连通以向清洗系统9输送清水，第二污水腔室41b通过污水输入通道与基站主体上的清洗系统9连通以接收清洗系统9所产生的污水，通过污水输出通道30b将污水排出至基站外部。
本申请基站在使用时，第二清水腔室41a可以利用清水输入通道30a从基站外部的水路输入清水，第二污水腔室41b可以通过污水输出通道30b将污水排出至基站外部，进而实现基站自动上清水和自动下污水的目的，无需用户手动补充清水和倒出污水，给用户的使用带来了方便。而且，本申请在实现自动上下水功能的同时，仍然利用第二清水腔室41a和第二污水腔室41b进行临时储水，有效保障了本申请基站的供水可靠性，同时也有利于提高使用的便利性。
对于清水输出通道和污水输入通道而言，同样可以各种不同的实现方式，只要是能够起到连通清洗系统9的作用即可。在图1、图2和图7显示的示例中，清水输出通道包括设置在水箱上的清水接口42a，清洗系统9包括设置在基站主体的清水接口81a，当水箱装设在基站主体上时，两者的清水接口42a、81a对 接以实现清水输出通道与清洗系统9的连通。污水输入通道包括设置在水箱上的污水接口42b，清洗系统9包括设置在基站主体上的污水接口81b，当水箱装设在基站主体上时，两者的污水接口42b、81b对接以实现污水输入通道与清洗系统9的连通。可以理解的是，清水接口42a、81a对接的方式和污水接口42b、81b对接的方式均可以有不同的方式，示例性的，基站主体上的清水接口81a由水箱上的清水接口42a穿入第二清水腔室41a，基站主体上的污水接口81b由水箱上的污水接口42b穿入第二污水腔室41b的方式，此时清水并不会直接流经作为清水输出通道的水箱上的清水接口42a，污水也不会直接流经作为污水输入通道的水箱上的污水接口42b。另外，清水输出通道、污水输入通道还可以包括设置在水箱上的管道等结构；等等。本申请对此不作限制。
另外，为了污水能够顺利从清洗系统9进入第二污水腔室41b，水箱上可以设置有连通第二污水腔室41b与外界的气孔49(如图7a和图7b所示)。
具体地，气孔49处可以设置负压泵(图未示)，以对第二污水腔室41b进行抽真空，当第二污水腔室41b处于负压状态下，清洗系统9的污水可以流入第二污水腔室41b。为了配合负压泵抽真空，可以在污水输出通道30b上设有阀体705(如图40所示)，在第一状态下，该阀体705微开(比如，微张)以连通外界且限制污水流出，在负压泵抽真空时，该阀体705可在负压泵的作用下闭合，以使第二污水腔室41b能够被抽至负压状态，在来自污水的压力达到一定程度后，该阀体705打开(比如，张大)以使污水排出。需要注意的是，在第二污水腔室41b抽真空时，如果阀体705与第二污水腔室41b之间的通道存在污水，阀体705可能不会闭合而维持在连通外界且限制污水流出的状态。或者阀体705可以不存在闭合状态。具体地，当污水输出通道30b上设有第二泵34时，优选将该阀体705设置在第二泵34的下游。
需要说明的是，“微开”是指阀体705具有较小缝隙或小孔，由于该小缝隙或小孔的存在，使得该阀体705在常态下能够通气，但是无法供液体流出。该缝隙或小孔的最大缝隙宽度或最大孔径可以为0.2mm～0.8mm，在本申请实施例中该缝隙或小孔的最大缝隙宽度或最大孔径可以为0.5mm。当然，在其他一些实施例中，本领域技术人员可以根据实际需求进行设计，只要能达到上述效果即可。
优选地，阀体705具有常态下微开且可伸缩的通道706，在进行抽真空时，通道706由于其自身的可伸缩特性而可以相应的产生收缩进而关闭，进而可使 第二污水腔室41b被抽至真空或负压状态，同时由于通道706的可伸缩特性，在污水压力增大一定程度时，通道706打开(大于常态)以使污水排出。具体地，阀体705可以不但限制为鸭嘴阀，只要具有可伸缩的通道即可。
如果阀体705常态下是闭合状态(非微开)，第二泵34未开启时，第二泵34与阀体705间的管段由于负压存在污水无法流入形成空气段，因此第二泵34开启后需第二泵34与阀体705间的管段处达到一定水压强度才能使阀体705打开，从而使污水从阀体705处排出，此过程需较长时间，造成排放污水延时；而本实施例中阀体705可以连通第二污水腔室41b与外界空气(比如阀体705常态下可处于微开状态)，第二污水腔室41b里有污水时会流到阀体705位置，又由于水张力存在污水不会流出，因此第二泵34开启后污水可直接由阀体705处流出。
可以理解的是，在第一状态(常态)下，阀体705并不限制为处于微开状态，只要是能够起到连通外界且限制污水流出的作用即可。另外，阀体705并不限制为配合负压泵使用。
当然，第二污水腔室41b形成在专门的污水箱或者基站主体上时，同样可以利用气孔、阀体、泵等结构进行抽真空作业。
请结合图1、图2和图7a和图7b，在具体的示例中，基站主体包括基站支架80，清洗系统9的清水接口81a、污水接口81b形成在基站支架80上，基站支架80上还设有供气孔49与外界连通的接口84。
请参阅图7a，本申请实施例提供的水箱还包括第一控制阀50，第一控制阀50用于根据第二清水腔室41a内的水位高低关闭或者打开清水输入通道30a。以使得水箱能够自动根据第二清水腔室41a内的水位高低来给第二清水腔室41a自动补水，且当水位过高时，自动切断补水通道，以防止第二清水腔室41a水位过高，或出现溢水的现象。
在一些具体实施例中，第一控制阀50可以为浮球阀，浮球阀被配置为根据第二清水腔室41a内的水位高低关闭或者打开清水输入通道30a。具体地，当第二清水腔室41a中的水位较低时，清水输入通道30a可以正常进水，浮球阀并不会干涉到清水输入通道30a，随着水位的上升，浮球阀在清水的浮力作用下发生运动，当第二清水腔室41a的水位达到一定高度时，浮球阀运动至将清水输入通道30a堵住的状态，此时清水输入通道30a内的清水无法再进入第二清水腔室41a，从而起到防止水位过高的作用。具体地，清水输入通道30a的出口端固设 有阀体结构35，浮球阀包括浮球51和阀芯结构52。浮球51与阀芯结构52之间连接有连接体53，连接体53位于浮球51与阀芯结构52之间的一位置铰接在阀体结构35或者其他结构上。水位升降时，浮球51上下浮动，进而使整个浮球阀50围绕铰接位置上下转动，当水位达到一定高度时，浮球51的上升使阀芯结构52向下堵住阀体结构35上的通路以关闭清水输入通道30a。
在其他一些实施例中，浮球阀可以被其他装置替代，示例性的，在第二清水腔室41a内设有其他液位检测装置(图中未示出)，第一控制阀与液位检测装置电连接，第一控制阀用于根据液位检测装置所检测到清水腔室内的水位高低而关闭或打开清水输入通道。具体而言，液位检测装置可以包括但不限于以下至少一种：光电液位检测装置、电容式液位检测装置、静压式液位检测装置等。
在一些实施例中，清水输入通道30a上可以设有第一泵(第一)，第一泵被配置为给第二清水腔室41a接收外部水路的清水提供输送动力；借由第一泵的设置，有利于清水经由水箱上的清水输入通道30a顺利输入至第二清水腔室41a。污水输出通道30b上可以设有第二泵34，第二泵34被配置为给第二污水腔室41b排出污水提供输送动力；借由第二泵34的设置，有利于第二污水腔室41b内的污水经由水箱上的污水输出通道30b顺利排出至基站外部。
在具体的示例中，污水输出通道30b上设有第二泵34，而清水输入通道30a并未设有泵。
请结合图4和图38至图40，在一些实施例中，水箱包括水箱主体4(即上述第二水箱4)和可拆卸地连接至水箱主体4的转接座70，水箱通过转接座70接收从基站外部输送的清水和向基站外部排出污水；第二清水腔室41a、第二污水腔室41b、清水输出通道和污水输入通道设置在水箱主体4上，清水输入通道30a和污水输出通道30b形成在水箱主体4和转接座70(即清水输入通道30a包括形成在水箱主体4上的第三清水通道3a和转接座70上的通道，污水输出通道30b包括形成在水箱主体4上的第三污水通道3b和转接座70上的通道；当水箱仅包括水箱主体4时，清水输入通道30a和污水输出通道30b即分别为第三清水通道3a和第三污水通道3b)。借由转接座70的设置，便于清水输入通道30a接入外部水路以及污水输出通道30b向基站外部排出污水。应该注意的是，水箱通过转接座70连接至外部水源只是可选方式，水箱也可不包括转接座70。另外，不排除基站主体上设有清水输入通道30a和污水输出通道30b的延长段的情况，当水箱装设在基站主体上时，水箱上的清水输入通道30a和污水 输出通道30b对接至相应的延长段以接收基站外部的清水和将污水排出至基站外部。
具体地，转接座70包括座体701以及设置在座体701且分别作为清水输入通道30a和污水输出通道30b的组成部分的清水转接管体702和污水转接管体703；清水转接管体702通过清水连接管L连接至清水输入通道30a在水箱主体4上的组成部分，污水转接管体703通过污水连接管M连接至污水输出通道30b在水箱主体4上的组成部分；清水转接管体702与清水连接管L连接的一端设有止回阀704，止回阀704被配置为于常态下处于关闭状态，于清水连接管L插接在清水转接管体702内时被推动以转换为打开状态。借由清水连接管L和污水连接管M的设置，便于将水箱主体4装设至基站主体上，当水箱主体4装设完成后，再利用清水连接管L和污水连接管M连接转接座70；另外，借由转接座70上的清水转接管体702设置的止回阀704，可以避免转接座70与清水连接管L分离时，清水转接管体702里面的清水流出。
在该示例中，污水转接管体703中设有阀体705，从而无需设置在水箱主体4上，有利于水箱主体的结构布局。
请参阅图5和图7，在一些实施例中，水箱包括可分离的第一箱体45和第二箱体46；第二清水腔室41a、第二污水腔室41b、清水输出通道和污水输入通道设置在第一箱体45；清水输入通道30a包括设置在第一箱体45的第一接口31a以及设置在第二箱体46内的清水输入管路33a和第二接口32a，第一接口31a与第二清水腔室41a连通，第二接口32a设置在清水输入管路33a的出水端；污水输出通道30b包括设置在第一箱体45的第三接口31b以及设置在第二箱体46内的污水输出管路33b和第四接口32b，第三接口31b与第二污水腔室41b连通，第四接口32b设置在污水输出管路33b的进水端；当第一箱体45对接至第二箱体46时，第一接口31a与第二接口32a对接，第三接口31b与第四接口32b对接。借由第一箱体45和第二箱体46的可分离式设计，既便于将清水输入通道30a和污水输出通道30b的组成管道等主要结构设置在第二箱体46上，又便于将形成有第二清水腔室41a和第二污水腔室41b的第一箱体45取出进行清洗等作业，而第二箱体46无需取出，可以保持与相关水路结构等的连接，避免了每次取出水箱时，需要重新与相关水路结构等建立连接，有利于提供给用户较好的使用体验。当然，上述分体式的水箱仅是可选方式，水箱并不限制为是上述分体式设计。
请结合图6、图7a和图37，具体地，第一接口31a可以包括第一止回阀结构310a，第二接口32a可以包括第二止回阀结构320a，第一止回阀结构310a和第二止回阀结构320a被配置为：当第一箱体45对接至第二箱体46时，第一止回阀结构310a和第二止回阀结构320a对接且相互推动至打开状态，当第一箱体45与第二箱体46分开时，第一止回阀结构310a和第二止回阀结构320a自动复位至关闭状态。第三接口31b可以包括第三止回阀结构430，当第一箱体45对接至第二箱体46时，第三止回阀结构310b和第四接口32b对接且第三止回阀结构310b被推动至打开状态，当第一箱体45与第二箱体46分开时，第三止回阀结构310b自动复位至关闭状态。借由第一接口31a与第二接口32a之间的双向止回阀设计，在将第一箱体45与第二箱体46分离时，能够基本避免有清水流出；借由第三止回阀结构310b的设计，在将第一箱体45与第二箱体46分离时，能够基本避免有污水流出。
进一步地，第四接口32b可以包括第四止回阀结构320b，第三止回阀结构430和第四止回阀结构320b被配置为：当第一箱体45对接至第二箱体46时，第三止回阀结构430和第四止回阀结构320b对接且相互推动至打开状态，当第一箱体45与第二箱体46分开时，第三止回阀结构430和第四止回阀结构320b自动复位至关闭状态。
在具体的示例中，第一止回阀结构310a包括阀体311、阀芯312和弹性件313，阀芯312可活动地穿设在阀体311，弹性件313设置在阀体311与阀芯312之间。第二止回阀结构320a包括阀体321、阀芯322和弹性件323，阀芯322可活动地穿设在阀体321，弹性件323设置在阀体321与阀芯322之间。在无外力时，阀芯312将阀体311上的通路堵住，阀芯322将阀体321上的通路堵住；在第一箱体45对接至第二箱体46上时，阀芯312和阀芯322相互推动以将两阀体311、321上的通路打开，进而实现清水输入通道30a与第二清水腔室41a的连通，与此同时，两弹性件313、323被阀芯312、322的移动所压缩以储存弹性势能；在第一箱体45与第二箱体46分开时，在弹性件313、323的作用下，两阀芯312、322均自动复位以关闭阀体311、321上的通路，从而便于清水流出。
关于第三止回阀结构430和第四止回阀结构320b的具体方式可以参考上述对第一止回阀结构310a和第二止回阀结构320a的描述，这里不再赘述。
可以理解的是，第一接口31a和第二接口32a并不限制为上述具体方式。
在具体的示例中，第一箱体45放置在第二箱体46之上，但并不限制于此，比如第一箱体45也可以放置在第二箱体46的一侧。
具体地，可以在清水输入管路33a上设有为清水输送提供动力的第一泵。可以在污水输出管路33b上设有为污水排出提供动力的第二泵34。
在具体的示例中，污水输出管路33b上设有作为第二泵34的叶轮泵，清水输入管路33a上并没有设置为清水提供输送动力的泵。
请参阅图1、图2和图4，在一些实施例中，基站包括基站支架80，基站支架80上形成有用于容纳水箱的水箱容纳空间82。
在具体的示例中，如图45a和图45b所示，基站支架80上设有两个通孔85，在水箱的水箱主体4装设在水箱容纳空间82时，清水输入通道30a在水箱主体4上的组成部分和污水输出通道30b在水箱主体4上的组成部分分别与两通孔85对应以利用清水连接管L和污水连接管M与转接座70连接。
以上所揭露的仅为本申请的较佳实例而已，其作用是方便本领域的技术人员理解并据以实施，当然不能以此来限定本申请的之权利范围，因此依本申请的申请专利范围所作的等同变化，仍属于本申请的所涵盖的范围。

Claims (56)

  1. 一种基站，用于对清洁机器人进行清洗，其特征在于，所述基站包括：
    基站主体，所述基站主体上形成有清洗系统，所述清洗系统接收清水对清洁机器人的待清洗件进行清洗以及排出清洗产生的污水；
    第一水路系统，所述第一水路系统包括第一水箱，所述第一水箱可取出地装设在所述基站主体，所述第一水箱被配置为利用手动加入清水和/或去除污水，所述第一水箱形成有第一腔室，当所述第一水箱装设在基站主体时，所述第一腔室与所述清洗系统连通以为所述清洗系统提供清水和/或接收所述清洗系统产生的污水；
    第二水路系统，所述第二水路系统包括形成在所述基站上的水路通道，所述水路通道用于接收并输送外部水路从所述基站外部输送来的清水并提供给所述清洗系统和/或用于接收所述清洗系统使用过的污水并排出至所述基站外部；
    所述第一水路系统和所述第二水路系统择一或同时为所述清洗系统提供清水和/或接收所述清洗系统产生的污水。
  2. 根据权利要求1所述的基站，其特征在于，
    所述第一水箱内形成的所述第一腔室包括用于储存清水的第一清水腔室和用于储存污水的第一污水腔室；或者，所述第一水箱包括相互独立的第一清水箱和第一污水箱，所述第一腔室包括形成在所述第一清水箱的用于储存清水的第一清水腔室，和形成在所述第一污水箱的用于储存污水的第一污水腔室；
    所述第二水路系统包括自动上水系统和自动下水系统。
  3. 根据权利要求2所述的基站，其特征在于，所述基站包括以下使用模式：
    所述第一清水腔室和所述第一污水腔室分别为所述清洗系统提供清水和接收所述清洗系统产生的污水；
    所述第一清水腔室为所述清洗系统提供清水，所述自动下水系统接收所述清洗系统产生的污水；
    所述自动上水系统为所述清洗系统提供清水，所述第一污水腔室接收所述清洗系统产生的污水；
    所述自动上水系统为所述清洗系统提供清水，所述自动下水系统接收所述清洗系统产生的污水。
  4. 根据权利要求1所述的基站，其特征在于，
    所述第二水路系统通过所述水路通道连接至所述清洗系统；和/或
    所述第二水路系统还包括与所述水路通道连接的第二腔室，所述第二腔室用于接收并储存所述水路通道输入的清水以及将清水提供给所述清洗系统和/或用于接收并储存所述清洗系统产生的污水以及将污水输出至所述水路通道。
  5. 根据权利要求4所述的基站，其特征在于，
    所述第二腔室形成在所述基站主体上；或者
    所述第二腔室形成在第二水箱，所述第二水箱可取出地装设在所述基站主体上；所述水路通道形成在所述第二水箱，或者所述水路通道形成在所述第二水箱和所述基站主体上；当所述第二水箱装设在所述基站主体上时，所述第二腔室与所述清洗系统连通以为所述清洗系统提供清水和/或接收所述清洗系统产生的污水。
  6. 根据权利要求5所述的基站，其特征在于，所述第二水箱内形成的所述第二腔室包括用于储存清水的第二清水腔室和用于储存污水的第二污水腔室；或者，所述第二水箱包括相互独立的第二清水箱和第二污水箱，所述第二腔室包括形成在所述第二清水箱的用于储存清水的第二清水腔室，和形成在所述第二污水箱的用于储存污水的第二污水腔室。
  7. 根据权利要求5所述的基站，其特征在于，
    当所述第二腔室形成在所述基站主体上时，所述第一水箱被配置为装设在所述第二腔室，或者，被配置为装设在所述基站主体上不同于所述第二腔室的位置；
    当所述第二腔室形成在所述第二水箱时，所述第一水箱和所述第二水箱被配置为择一地装设在所述基站主体上的相同位置，或者被配置为可同时或择一地装设在所述基站主体上的不同位置。
  8. 根据权利要求7所述的基站，其特征在于，所述基站主体上形成有水箱容纳空间，当所述第一水箱和/或所述第二水箱装设在所述水箱容纳空间时，未被所述第一水箱和/或所述第二水箱占据的所述水箱容纳空间形成配件放置空间。
  9. 根据权利要求7所述的基站，其特征在于，所述水箱容纳空间设有将所述配件放置空间与所述第一水箱和/或所述第二水箱隔开的隔断门，所述隔断门与所述配件放置空间的开口端相反的一端可摆动地连接至所述基站主体；当装设在所述水箱容纳空间时，所述第一水箱和/或所述第二水箱与所述隔断门相间隔以允许所述隔断门朝向所述第一水箱和/或所述第二水箱摆动。
  10. 根据权利要求7所述的基站，其特征在于，
    所述第一水箱上设有第一磁性件，所述第二水箱上设有第二磁性件，所述基站主体上设有霍尔传感器；
    所述第一水箱和所述第二水箱择一地装设在所述基站主体上的相同位置；
    所述第一水箱装设至所述基站主体上时，所述第一磁性件的第一磁极朝向所述霍尔传感器，所述霍尔传感器根据感应到的磁场产生第一电信号；
    所述第二水箱装设在所述基站主体上时，所述第二磁性件的第二磁极朝向所述霍尔传感器，所述霍尔传感器根据感应到的磁场产生与所述第一电信号不同的第二电信号；
    所述第二磁极与所述第一磁极的极性相反。
  11. 根据权利要求1所述的基站，其特征在于，
    所述第一水路系统上设有第一标记件，所述第二水路系统上设有第二标记件，所述基站主体上设有识别传感器。
  12. 根据权利要求1所述的基站，其特征在于，
    所述水路通道上设有动力装置，所述动力装置用于为输送清水和/或排出污水提供输送动力。
  13. 一种基站，用于对清洁机器人进行清洗，其特征在于，所述基站包括：
    基站主体，所述基站主体上设有清洗系统和水箱容纳空间，所述清洗系统接收清水对清洁机器人的待清洗件进行清洗以及排出清洗产生的污水，所述清洗系统包括清洗区和与所述清洗区连通的输水通道；
    第一水路系统，所述第一水路系统包括第一水箱，所述第一水箱设有第一腔室和与所述第一腔室连通的第一通道；
    第二水路系统，所述第二水路系统包括第二水箱，所述第二水箱设有第二腔室和分别与所述第二腔室连通的第二通道和第三通道；
    所述第一水箱和所述第二水箱可选择地装设在所述水箱容纳空间；
    当所述第一水箱装设在所述水箱容纳空间，所述第一通道连接所述输水通道，以连通所述第一腔室和所述清洗区；
    当所述第二水箱装设在所述水箱容纳空间，所述第二通道连接所述输水通道，以连通所述第二腔室和所述清洗区，所述第三通道用于连接外部水路。
  14. 根据权利要求13所述的基站，其特征在于，
    所述输水通道包括清水输送通道；
    所述第一腔室包括第一清水腔室，所述第一通道包括第一清水通道；
    当所述第一水箱装设在所述水箱容纳空间，所述第一清水通道连接所述清水输送通道，以连通所述第一清水腔室和所述清洗区；
    所述第二腔室包括第二清水腔室，所述第二通道包括第二清水通道，所述第三通道包括第三清水通道；
    当所述第二水箱装设在所述水箱容纳空间，所述第二清水通道连接所述清水输送通道，以连通所述第二清水腔室和所述清洗区，所述第三清水通道用于连接外部水路以接收外界水源输送的清水并输送至所述第二清水腔室。
  15. 根据权利要求13所述的基站，其特征在于，
    所述输水通道包括污水输送通道；
    所述第一腔室包括第一污水腔室，所述第一通道包括第一污水通道；
    当所述第一水箱装设在所述水箱容纳空间，所述第一污水通道连接所述污水输送通道，以连通所述第一污水腔室和所述清洗区；
    所述第二腔室包括第二污水腔室，所述第二通道包括第二污水通道，所述第三通道包括第三污水通道；
    当所述第二水箱装设在所述水箱容纳空间，所述第二污水通道连接所述污水输送通道，以连通所述第二污水腔室和所述清洗区，所述第三污水通道用于连接外部水路以将所述第二污水腔室内的水输出至外部水路。
  16. 根据权利要求13所述的基站，其特征在于，
    所述输水通道包括清水输送通道和污水输送通道；
    所述第一腔室包括第一清水腔室和第一污水腔室，所述第一通道包括第一清水通道和第一污水通道；
    当所述第一水箱装设在所述水箱容纳空间，所述第一清水通道连接所述清水输送通道，以连通所述第一清水腔室和所述清洗区，所述第一污水通道连接所述污水输送通道，以连通所述第一污水腔室和所述清洗区；
    所述第二腔室包括第二清水腔室和第二污水腔室，所述第二通道包括第二清水通道和第二污水通道，所述第三通道包括第三清水通道和第三污水通道；
    当所述第二水箱装设在所述水箱容纳空间，所述第二清水通道连接所述清水输送通道，以连通所述第二清水腔室和所述清洗区，所述第三清水通道用于连接外部水路以接收外界水源输送的清水并输送至所述第二清水腔室，所述第二污水通道连接所述污水输送通道，以连通所述第二污水腔室和所述清洗区， 所述第三污水通道用于连接外部水路以将所述第二污水腔室内的水输出至外部水路。
  17. 根据权利要求15或16所述的基站，其特征在于，
    所述第三污水通道设有第一动力装置，所述第一动力装置用于提供输送动力，以将所述第二污水腔室内的水输出至外部水路。
  18. 根据权利要求13所述的基站，其特征在于，
    所述第二水路系统还包括转接座，所述转接座安装于基站主体，所述第三通道通过所述转接座与外部水路连接。
  19. 根据权利要求18所述的基站，其特征在于，
    所述基站主体上设有与所述水箱容纳空间连通的安装口，当所述第二水箱装设在所述水箱容纳空间，所述第三通道与所述安装口对应；
    所述转接座可分离地装配于所述安装口处。
  20. 根据权利要求13所述的基站，其特征在于，
    还包括第二动力装置；
    当所述第一水箱或所述第二水箱装设于所述水箱容纳空间，所述第二动力装置用于提供输送动力，以使所述第一水箱或所述第二水箱中的水能够输送至所述清洗区，或者以使所述清洗区的水能够输送至所述第一水箱或所述第二水箱内。
  21. 根据权利要求13所述的基站，其特征在于，
    所述基站主体设有传感器；
    所述第一水箱上设有第一信号件，所述第二水箱上设有第二信号件；
    所述第一信号件与所述第二信号件不同，或者，所述第一信号件和所述第二信号件发出的信号不同；
    当所述第一水箱装设在所述水箱容纳空间，所述传感器检测到所述第一信号件或者所述第一信号件发出的信号并生成第一检测信号；
    当所述第二水箱装设在所述水箱容纳空间，所述传感器检测到所述第二信号件或者所述第二信号件发出的信号并生成第二检测信号；
    所述第一检测信号与所述第二检测信号不同。
  22. 根据权利要求13所述的基站，其特征在于，
    当所述第一水箱或所述第二水箱装设在所述水箱容纳空间时，所述水箱容纳空间的部分空间未被占据，未被所述第一水箱或所述第二水箱占据的所述水 箱容纳空间的部分空间形成配件放置空间。
  23. 根据权利要求22所述的基站，其特征在于，所述水箱容纳空间设有将所述配件放置空间与所述第一水箱或所述第二水箱隔开的隔断门。
  24. 根据权利要求23所述的基站，其特征在于，所述隔断门可活动地连接在所述基站主体；当装设在所述水箱容纳空间时，所述第一水箱或所述第二水箱与所述隔断门相间隔以允许所述隔断门朝向所述第一水箱或所述第二水箱活动。
  25. 一种基站，用于对清洁机器人进行清洗，其特征在于，所述基站包括：
    基站主体，所述基站主体上形成有清洗系统，所述清洗系统接收清水对清洁机器人的待清洗件进行清洗以及排出清洗产生的污水；
    水路系统，所述水路系统用于连接所述清洗系统以输送清水至所述清洗系统以及接收所述清洗系统排出的污水。
  26. 根据权利要求25所述的基站，其特征在于，
    所述清洗系统包括清水输送通道；
    所述水路系统包括第二水箱，所述第二水箱设有第二清水腔室以及分别与所述第二清水腔室连通的第二清水通道和第三清水通道；
    所述第二清水通道用于连接所述清水输送通道，以连通所述第二清水腔室和所述清洗系统；
    所述第二清水通道用于连接外部水路，以接收外界水源的清水并输送至所述第二清水腔室。
  27. 根据权利要求25所述的基站，其特征在于，
    所述水路系统包括清水输入通道，所述清水输入通道设置在所述基站主体；
    所述清水输入通道与所述清洗系统连通，且用于连接外部水路，以接收外界水源的清水并输送至所述清洗系统。
  28. 根据权利要求25所述的基站，其特征在于，
    所述清洗系统包括清水输送通道；
    所述水路系统包括清水腔和与所述清水腔连通的清水输入通道，所述清水腔和所述清水输入通道设置在所述基站主体；
    所述清水腔与所述清水输送通道连通，以向所述清洗系统提供清水；
    所述清水输入通道用于连接外部水路，以将外界水源的清水输送至所述清水腔。
  29. 根据权利要求28所述的基站，其特征在于，
    所述清水腔可容纳一清水箱；
    所述清水箱设有清水腔室和与所述清水腔室连通的清水通道；
    当所述清水箱容纳于所述清水腔时，所述清水通道与所述清水输送通道连接，与连通所述清水腔室和所述清洗系统。
  30. 根据权利要求25所述的基站，其特征在于，
    所述清洗系统包括污水输送通道；
    所述水路系统包括第二水箱，所述第二水箱设有第二污水腔室以及分别与所述第二污水腔室连通的第二污水通道和第三污水通道；
    所述第二污水通道用于连接所述污水输送通道，以连通所述第二污水腔室和所述清洗系统；
    所述第二污水通道用于连接外部水路，以排出所述第二污水腔室内的污水。
  31. 根据权利要求25所述的基站，其特征在于，
    所述水路系统包括污水输出通道，所述污水输出通道设置在所述基站主体；
    所述污水输出通道与所述清洗系统连通，且用于连接外部水路，以排出所述清洗系统产生的污水。
  32. 根据权利要求25所述的基站，其特征在于，
    所述清洗系统包括污水输送通道；
    所述水路系统包括污水腔和与所述污水腔连通的污水输出通道，所述污水腔和所述污水输出通道设置在所述基站主体；
    所述污水腔与所述污水输送通道连通，以接收所述清洗系统排出的污水；
    所述污水输出通道用于连接外部水路，以排出所述污水腔内的污水。
  33. 根据权利要求32所述的基站，其特征在于，
    所述污水腔可容纳一污水箱；
    所述污水箱设有污水腔室和与所述污水腔室连通的污水通道；
    当所述污水箱容纳于所述污水腔时，所述污水通道与所述污水输送通道连接，以连通所述污水腔室和所述清洗系统。
  34. 根据权利要求25所述的基站，其特征在于，
    所述清洗系统包括输水通道；
    所述基站主体形成有水箱容纳空间；
    所述水路系统包括水箱，所述水箱设有储水腔室和与所述储水腔室连通的 连接通道；
    当所述水箱装设在所述水箱容纳空间，所述连接通道与所述输水通道连接，以连通所述储水腔室和所述清洗系统。
  35. 根据权利要求34所述的基站，其特征在于，
    当所述水箱装设在所述水箱容纳空间时，所述水箱容纳空间的部分空间未被占据，未被所述水箱占据的所述水箱容纳空间的部分空间形成配件放置空间。
  36. 根据权利要求35所述的基站，其特征在于，
    所述水箱容纳空间设有将所述配件放置空间与所述水箱隔开的隔断门。
  37. 根据权利要求36所述的基站，其特征在于，
    所述隔断门可活动地连接在所述基站主体；当装设在所述水箱容纳空间时，所述水箱与所述隔断门相间隔以允许所述隔断门朝向所述水箱活动。
  38. 根据权利要求34所述的基站，其特征在于，
    所述水箱设有与所述储水腔室连通的第三通道；
    所述基站主体的一侧设有与所述水箱容纳空间连通的安装口；
    当所述水箱装设在所述水箱容纳空间，所述第三通道与所述安装口对应并利用所述安装口外部水路连接，以接收外界水源的清水并输送至所述储水腔室，或者，排出所述储水腔室内的污水。
  39. 根据权利要求38所述的基站，其特征在于，
    所述水路系统还包括转接座；
    所述转接座可分离地装配于所述安装口处以与所述第三通道连接，进而可以利用所述转接座的转接使所述第三通道与外部水路连接。
  40. 一种水箱，用于与在基站的基站主体上的清洗系统连通，其特征在于，所述水箱上设有清水腔室、污水腔室、清水输入通道、清水输出通道、污水输入通道和污水输出通道；所述清水腔室通过所述清水输入通道接收从所述基站外部输送的清水，通过所述清水输出通道与所述基站主体上的清洗系统连通以向所述清洗系统输送清水；所述污水腔室通过所述污水输入通道与所述基站主体上的清洗系统连通以接收所述清洗系统所产生的污水，通过所述污水输出通道将所述污水排出至所述基站外部。
  41. 根据权利要求40所述的水箱，其特征在于，还包括：第一控制阀；
    所述第一控制阀用于根据所述清水腔室内的水位高低关闭或者打开所述清水输入通道。
  42. 根据权利要求41所述的水箱，其特征在于，所述第一控制阀为浮球阀，所述浮球阀设于所述清水腔室；
    或者，在所述清水腔室内设有液位检测装置，所述第一控制阀与所述液位检测装置电连接，所述第一控制阀用于根据所述液位检测装置所检测到所述清水腔室内的水位高低而关闭或打开所述清水输入通道。
  43. 根据权利要求40所述的水箱，其特征在于，
    所述清水输入通道上设有第一泵，所述第一泵用于给所述清水腔室接收外部水路的清水提供输送动力；和/或
    所述污水输出通道上设有第二泵，所述第二泵用于给所述污水腔室排出污水提供输送动力。
  44. 根据权利要求43所述的水箱，其特征在于，所述污水输出通道上设有阀体，所述阀体位于所述第二泵的下游侧；所述阀体具有第一状态和第二状态，所述阀体处于所述第一状态时，所述污水腔室与外界通气连通，且所述阀体限制污水流出；当所述第二泵开启，所述阀体在水压下打开至所述第二状态，污水可由所述阀体排出。
  45. 根据权利要求44所述的水箱，其特征在于，所述阀体的下游侧气压大于上游侧气压时，所述阀体能够从所述第一状态变化为第三状态，所述阀体处于所述第三状态时闭合。
  46. 根据权利要求45所述的水箱，其特征在于，所述水箱设有连通所述污水腔室与外界的气孔，所述气孔通过负压泵对所述污水腔室进行抽真空；在所述第一状态下，所述阀体微开以连通外界并限制污水流出；所述阀体可在所述负压泵的作用下闭合，以使所述污水腔室能够被抽至负压状态。
  47. 根据权利要求40所述的水箱，其特征在于，
    所述水箱包括水箱主体和可拆卸地连接至所述水箱主体的转接座，所述水箱通过所述转接座接收所述基站外部输送的清水和将所述污水排出至所述基站外部；
    所述清水腔室、所述污水腔室、所述清水输出通道和所述污水输入通道设置在所述水箱主体上，所述清水输入通道和所述污水输出通道形成在所述水箱主体和所述转接座。
  48. 根据权利要求47所述的水箱，其特征在于，
    所述转接座包括座体以及设置在所述座体且分别作为所述清水输入通道和 所述污水输出通道的组成部分的清水转接管体和污水转接管体；
    所述清水转接管体通过清水连接管连接至所述清水输入通道在所述水箱主体上的组成部分，所述污水转接管体通过污水连接管连接至所述污水输出通道在所述水箱主体上的组成部分；
    所述清水转接管体与所述清水连接管连接的一端设有止回阀，所述止回阀被配置为于常态下处于关闭状态，于所述清水连接管插接在所述清水转接管体内时被推动以转换为打开状态。
  49. 根据权利要求40所述的水箱，其特征在于，
    所述水箱包括可分离的第一箱体和第二箱体；
    所述清水腔室、所述污水腔室、所述清水输出通道和所述污水输入通道设置在所述第一箱体；
    所述清水输入通道包括设置在所述第一箱体的第一接口以及设置在所述第二箱体内的清水输入管路和第二接口，所述第一接口与所述清水腔室连通，所述第二接口设置在所述清水输入管路的出水端；
    所述污水输出通道包括设置在所述第一箱体的第三接口以及设置在所述第二箱体内的污水输出管路和第四接口，所述第三接口与所述污水腔室连通，所述第四接口设置在所述污水输出管路的进水端；
    当所述第一箱体对接至所述第二箱体时，所述第一接口与所述第二接口对接，所述第三接口与所述第四接口对接。
  50. 根据权利要求49所述的水箱，其特征在于，
    所述第一接口包括第一止回阀结构，所述第二接口包括第二止回阀结构，所述第一止回阀结构和所述第二止回阀结构被配置为：当所述第一箱体对接至所述第二箱体时，所述第一止回阀结构和所述第二止回阀结构对接且相互推动至打开状态，当所述第一箱体与所述第二箱体分开时，所述第一止回阀结构和所述第二止回阀结构自动复位至关闭状态；和/或
    所述第三接口包括第三止回阀结构，当所述第一箱体对接至所述第二箱体时，所述第三止回阀结构和所述第四接口对接且所述第三止回阀结构被推动至打开状态，当所述第一箱体与所述第二箱体分开时，所述第三止回阀结构自动复位至关闭状态。
  51. 一种基站，用于对清洁机器人的清洁件进行清洗，其特征在于，所述基站包括基站主体和如权利要求40至50任一项所述的水箱，所述基站主体上 设有清洗系统，所述水箱的清水输出通道和污水输入通道分别与所述清洗系统连通以输送清水给所述清洗系统以及接收所述清洗系统产生的污水。
  52. 一种基站，用于对清洁机器人的清洁件进行清洗，所述基站上设有清洗系统，其特征在于，所述基站上设有清水输入通道和污水输出通道，所述清水输入通道用于接收从所述基站外部输送的清水并提供给所述清洗系统，所述污水输出通道用于将所述清洗系统产生的污水排出所述基站。
  53. 根据权利要求52所述的基站，其特征在于，
    所述基站上设有清水腔室，所述清水腔室与所述清洗系统连通以向所述所述清洗系统提供清水，所述清水腔室与所述清水输入通道连通以接收所述清水输入通道从所述基站外部输送的清水；和/或
    所述基站上设有污水腔室，所述污水腔室与所述清洗系统连通以接收所述清洗系统产生的污水，所述污水腔室与所述污水输出通道连通以使污水通过所述污水输出通道排出所述基站。
  54. 根据权利要求53所述的基站，其特征在于，
    所述污水输出通道上设有阀体，所述阀体位于所述第二泵的下游侧；所述阀体具有第一状态和第二状态，所述阀体处于所述第一状态时，所述污水腔室与外界通气连通，且所述阀体限制污水流出；当所述第二泵开启，所述阀体在水压下打开至所述第二状态，污水可由所述阀体排出。
  55. 根据权利要求54所述的基站，其特征在于，
    所述清水输入通道包括第一清水支路和第二清水支路，所述第一清水支路连通至所述清水腔室，所述第二清水支路连通至所述清洗系统；和/或
    所述污水输出通道包括第一污水支路和第二污水支路，所述第一污水支路连通至所述污水腔室，所述第二污水支路连通至所述清洗系统。
  56. 根据权利要求52所述的基站，其特征在于，
    所述清水输入通道上设有第一泵，所述第一泵被配置为给清水输入提供输送动力；和/或
    所述污水输出通道上设有第二泵，所述第二泵被配置为给排出污水提供输送动力。
PCT/CN2022/092806 2021-08-03 2022-05-13 基站及水箱 WO2023010941A1 (zh)

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