WO2022249707A1 - 電子銃、電子線適用装置、および、電子ビームの射出方法 - Google Patents
電子銃、電子線適用装置、および、電子ビームの射出方法 Download PDFInfo
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- WO2022249707A1 WO2022249707A1 PCT/JP2022/014226 JP2022014226W WO2022249707A1 WO 2022249707 A1 WO2022249707 A1 WO 2022249707A1 JP 2022014226 W JP2022014226 W JP 2022014226W WO 2022249707 A1 WO2022249707 A1 WO 2022249707A1
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
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- H01J37/06—Electron sources; Electron guns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
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- H01J1/34—Photo-emissive cathodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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- H—ELECTRICITY
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Definitions
- the disclosure in this application relates to an electron gun, an electron beam application device, and an electron beam emission method.
- Patent Literature 1 discloses an electron microscope apparatus using a photocathode that emits an electron beam by applying excitation light from a light source.
- Patent Document 2 discloses a sample inspection apparatus.
- the sample inspection device described in Patent Document 2 is known to adjust the amount of pulsed light depending on the situation such as the sample being easily damaged by heat.
- Patent Document 3 discloses an electron beam shielding member capable of shielding a part of an electron beam, and a photocathode for an electron beam emitted from a photocathode using a measurement electron beam shielded by the electron beam shielding member. It is disclosed that the intensity of the electron beam emitted from the photocathode is adjusted by a measuring unit that measures the intensity change accompanying the deterioration of the photocathode and a control unit.
- the electron beam application apparatus applies a desired intensity (hereinafter sometimes referred to as "electron beam parameters") to an object to be irradiated with an electron beam (hereinafter sometimes referred to as "irradiation target"). Electron beam irradiation may be required.
- electron beam parameters hereinafter sometimes referred to as "electron beam parameters”
- irradiation target an electron beam
- electron beam irradiation may be required.
- electron guns in addition to electron guns using photocathode, electron guns using hot cathodes and field emitters are also known. For this reason, it is conceivable that an electron gun using a photocathode may be newly mounted in a partner device that has been equipped with an electron gun using a hot cathode or a field emitter.
- Patent Document 2 is an invention as an electron beam application apparatus.
- Patent Document 3 relates to feedback control that adjusts the intensity of the electron beam as the photocathode deteriorates, using the electron beam for measurement shielded by a shielding member. Therefore, the invention described in Patent Document 3 also has a problem that an electron beam having desired electron beam parameters cannot be applied to a desired portion of an irradiation target.
- an electron gun and an irradiation method that can be set so that an electron beam having desired electron beam parameters can be applied to a desired portion of an irradiation target using only the components included in the electron gun are not known.
- the electron gun has the following features: or (2) setting the emission time of the electron beam and setting the electron beam parameters of the emitted electron beam in association with the emission time. rice field.
- An object of the present invention is to provide an application device and a method of emitting an electron beam.
- This application relates to an electron gun, an electron beam application device, and an electron beam emission method described below.
- a light source a photocathode that generates electrons that can be emitted in response to light received from the light source; an anode capable of forming an electric field with the photocathode, extracting the emissible electrons by the formed electric field, and forming an electron beam; a control unit; An electron gun comprising The control unit setting the number of times the electron beam is emitted, and setting an electron beam parameter for each emitted electron beam; or, setting an emission time of the electron beam, and setting electron beam parameters of the emitted electron beam in association with the emission time; electron gun.
- the control unit sets the number of times the electron beam is emitted, and sets an electron beam parameter for each emitted electron beam;
- the electron beam parameters are Including at least one selected from the intensity of the electron beam, the magnitude of the acceleration energy of the electron beam, the size of the electron beam, the shape of the electron beam, the emission time of the electron beam and the emittance of the electron beam, The electron gun according to (1) above.
- the number of times of injection is 2 or more;
- the controller controls at least one electron beam parameter to be different from one selected from the other electron beam parameters when the electron beam is emitted a set number of times.
- the control unit sets the emission time of the electron beam, and sets electron beam parameters of the emitted electron beam in association with the emission time;
- the electron beam parameters are Including at least one selected from the intensity of the electron beam, the magnitude of the acceleration energy of the electron beam, the size of the electron beam, the shape of the electron beam and the emittance of the electron beam, The electron gun according to (1) above.
- the controller performs control so that the time for emitting the electron beam with different electron beam parameters is included when the electron beam is emitted for the set emission time.
- the electron gun according to (4) above.
- excitation light from a light source is applied to two or more different locations of the photocathode so that two or more electron beams are extracted from the photocathode;
- the electron gun according to any one of (1) to (5) above.
- An electron beam application apparatus including the electron gun according to any one of (1) to (6) above, Electron beam application equipment free electron laser accelerator, electronic microscope, electron beam holography device, electron beam lithography equipment, electron beam diffractometer, electron beam inspection equipment, electron beam metal additive manufacturing equipment, electron beam lithography equipment, electron beam processing equipment, electron beam curing device, electron beam sterilizer, electron beam sterilizer, plasma generator, Atomic element generator, spin-polarized electron beam generator, a cathodoluminescence device, or is a reverse photoelectron spectroscopy device, Electron beam application equipment.
- a method of emitting an electron beam The electron beam a light source; a photocathode that generates electrons that can be emitted in response to light received from the light source; an anode capable of forming an electric field with the photocathode, extracting the emissible electrons by the formed electric field, and forming an electron beam; a control unit; emitted from an electron gun containing The control unit setting the number of times the electron beam is emitted, and setting an electron beam parameter for each emitted electron beam; or, setting the emission time of the electron beam, and setting the electron beam parameters of the emitted electron beam in association with the emission time;
- the injection method is Excitation light from the light source is applied to the photocathode, and electrons that can be emitted by the photocathode generated in response to the excitation light are extracted by an electric field formed between the photocathode and the anode.
- the control unit In the electron beam injection step, control is performed so that the emitted electron beam has the set electron beam parameters; injection method.
- the controller sets the number of times the electron beam is emitted, and sets an electron beam parameter for each emitted electron beam;
- the electron beam parameters are Including at least one selected from the intensity of the electron beam, the magnitude of the acceleration energy of the electron beam, the size of the electron beam, the shape of the electron beam, the emission time of the electron beam and the emittance of the electron beam,
- the injection method according to (8) above.
- the number of injections is 2 or more;
- the controller controls at least one electron beam parameter to be different from one selected from the other electron beam parameters when the electron beam is emitted a set number of times.
- the control unit sets the emission time of the electron beam, and sets electron beam parameters of the emitted electron beam in association with the emission time,
- the electron beam parameters are Including at least one selected from the intensity of the electron beam, the magnitude of the acceleration energy of the electron beam, the size of the electron beam, the shape of the electron beam and the emittance of the electron beam,
- the control unit performs control so as to include the time for emitting electron beams with different electron beam parameters when the electron beam is emitted for the set emission time.
- the electron gun disclosed in this application can be set so that an electron beam having desired electron beam parameters can be applied to a desired portion of an irradiation target.
- FIG. 1 is a diagram schematically showing an electron gun 1A according to the first embodiment and a counterpart device E equipped with the electron gun 1A.
- FIG. 2 is a diagram showing an outline of the control section 5 of the electron gun 1A.
- FIG. 3 is a diagram schematically showing control of the electron beam parameters set by the controller 5.
- FIG. 4 is an enlarged view of the photocathode 3 portion of the electron gun 1B according to the second embodiment.
- FIG. 5 is a diagram schematically showing an electron gun 1C according to the third embodiment and a counterpart device E equipped with the electron gun 1C.
- FIG. 6 is a diagram schematically showing an electron gun 1D according to the fourth embodiment and a counterpart device E equipped with the electron gun 1D.
- FIG. 7A is a photograph substituting for a drawing, which is an SEM photograph taken in Example 3.
- FIG. 7B is a photograph substituting for a drawing, which is an SEM photograph taken in Example 4.
- FIG. 7A is a photograph substituting for a drawing
- FIG. 1 is a diagram schematically showing an electron gun 1A according to the first embodiment and a counterpart device E equipped with the electron gun 1A.
- FIG. 2 is a diagram showing an outline of the control section 5 of the electron gun 1A.
- FIG. 3 is a diagram schematically showing control of the electron beam parameters set by the controller 5. As shown in FIG.
- the electron gun 1A includes at least a light source 2, a photocathode 3, an anode 4, and a controller 5. Electron gun 1A may optionally include a power supply 6 for generating an electric field between photocathode 3 and anode 4 . Also, in the example shown in FIG. 1 , the electron beam application device is an SEM and the counterpart device E includes an electron beam deflection device 10 . The electron beam deflector 10 is used to scan the sample S with the electron beam B emitted by the electron gun 1A. It should be noted that the example shown in FIG. Although illustration is omitted, the mating apparatus E may be provided with known structural members according to the type of the electron beam application apparatus.
- the light source 2 is not particularly limited as long as it can emit the electron beam B by irradiating the photocathode 3 with the excitation light L.
- the light source 2 may be, for example, a high output (watt class), high frequency (several hundred MHz), ultrashort pulse laser light source, relatively inexpensive laser diode, LED, or the like.
- the excitation light L to be irradiated may be either pulsed light or continuous light, and may be appropriately adjusted according to the purpose.
- the light source 2 is arranged outside the vacuum chamber CB, and the excitation light L is applied to the first surface (the surface on the anode 4 side) of the photocathode 3 .
- the light source 2 may be arranged within the vacuum chamber CB.
- the excitation light L may be applied to the second surface of the photocathode 3 (the surface opposite to the anode 4).
- the photocathode 3 generates electrons that can be emitted in response to receiving the excitation light L emitted from the light source 2 .
- the principle that the photocathode 3 generates electrons that can be emitted in response to receiving the excitation light L is known (see, for example, Japanese Patent No. 5808021).
- the photocathode 3 is formed of a substrate made of quartz glass, sapphire glass, or the like, and a photocathode film (not shown) adhered to the first surface (the surface on the anode 4 side) of the substrate.
- the photocathode material for forming the photocathode film is not particularly limited as long as it can generate electrons that can be emitted by irradiation with excitation light, and materials that require EA surface treatment, materials that do not require EA surface treatment, etc. be done.
- Materials requiring EA surface treatment include, for example, III-V group semiconductor materials and II-VI group semiconductor materials.
- the photocathode 3 can be produced by subjecting the photocathode material to EA surface treatment, and the photocathode 3 can select excitation light in the near-ultraviolet to infrared wavelength region according to the gap energy of the semiconductor.
- electron beam source performance quantitative yield, durability, monochromaticity, time response, spin polarization
- the application of the electron beam can be achieved by selecting the semiconductor material and structure.
- Materials that do not require EA surface treatment include, for example, simple metals such as Cu, Mg, Sm, Tb, and Y, alloys, metal compounds, diamond, WBaO, Cs 2 Te, and the like.
- a photocathode that does not require EA surface treatment may be produced by a known method (see, for example, Japanese Patent No. 3537779). The contents of US Pat. No. 3,537,779 are incorporated herein by reference in their entirety.
- photocathode when describing in the sense of emitting an electron beam, it is described as “photocathode”, and in the sense of the counter electrode of "anode” When describing, it may be described as “cathode”, but as for the reference numeral, 3 is used in both cases of "photocathode” and "cathode”.
- the anode 4 is not particularly limited as long as it can form an electric field with the cathode 3, and the anode 4 generally used in the field of electron guns may be used.
- electron beams B are formed by extracting electrons that are generated in the photocathode 3 by irradiation with the excitation light L and can be emitted.
- FIG. 1 shows an example in which a power source 6 is connected to the cathode 3 in order to form an electric field between the cathode 3 and the anode 4.
- a power source 6 is connected to the cathode 3 in order to form an electric field between the cathode 3 and the anode 4.
- the arrangement of the power supply 6 is not particularly limited.
- FIG. 2 the photocathode 3 receives the pulsed excitation light L, the controller 5 sets the number of times the electron beam B is emitted, and the electron beam parameters (hereinafter simply referred to as "parameters") are set for each emitted electron beam B. may be described.) is shown.
- the counterpart device E generally includes an electron beam deflection device 10 that deflects the electron beam B emitted by the electron gun 1A.
- an electron beam deflection device 10 that deflects the electron beam B emitted by the electron gun 1A.
- FIG. 10 For example, in the example of the SEM shown in FIG. ” may be described.) Scanning above.
- the electron beam B is generally deflected by the electron beam deflector 10 by linearly scanning the irradiation region R to be irradiated. Therefore, the inventors (1) The electron beam necessary for irradiating the irradiation region R based on the size of the irradiation region R, the spot size of the electron beam B in the irradiation region R, the control speed of the electron beam deflection device 10 of the counterpart device E, etc.
- the electron beam deflection device 10 performs the following controls.
- the electron beam B is irradiated toward the right end while being deflected.
- (c) The above (b) is repeated until the last spot (Dm-n) in the irradiation region R is irradiated with the electron beam B.
- the electron beams B emitted from the electron gun 1A in order are planarly developed in the irradiation region R, and the order in which the electron beams B emitted are applied to which part of the irradiation region R. I can understand if it is irradiated. Therefore, for example, when the parameter of the electron beam B irradiated to the irradiation region D1-1 is X, the electron beam B of the parameter X is irradiated to D3-18, and the electron beam B of the parameter Y is irradiated to D3-19 to D3-25. Irradiation of the electron beam B can be set by the constituent members on the electron gun 1A side.
- the electron gun 1A can emit a pulsed electron beam, as shown in FIG. can be finely set on the electron gun 1A side, such as irradiating twice and then irradiating the electron beam B with the parameter Y for a while from the position of D8-11.
- the control unit 5 sets parameters such as X, Y, and Z for each electron beam B to be emitted. In addition to setting , it also includes collectively setting the parameters of the electron beam B emitted a predetermined number of times. As long as each electron beam B is emitted with parameters such as X, Y, Z, etc., the setting method of the controller 5 is not particularly limited.
- the controller 5 selects at least one parameter from the other parameters when the electron beam B is emitted a set number of times (D1-1 to Dm-n). It's controlled differently than the other. In other words, the parameters of all the emitted electron beams D1-1 to Dm-n are controlled so as not to be the same. Alternatively, if the controller 5 can be used to "set electron beam parameters for each emitted electron beam", the parameters of all emitted electron beams D1-1 to Dm-n can be set to be the same. may
- parameters include, but are not limited to, electron beam intensity, magnitude of electron beam acceleration energy, electron beam size, electron beam shape, electron beam emission time, and electron beam emittance. is mentioned. If the parameters of the electron beams B that irradiate the irradiation region R are not all the same, any of the parameters exemplified above may be made different. For example, the intensity of an electron beam in a certain order is changed from the intensity of an electron beam in another order, or the acceleration energy of an electron beam in a certain order is changed from the acceleration energy of an electron beam in another order, etc. , the same kind of parameter can be used to change strength and the like. Alternatively, different types of parameters may be set, such as changing the size and shape of only the electron beam B in a certain order.
- the intensity of the electron beam in a certain order is 1 and the magnitude of the acceleration energy of the electron beam is 1
- the intensity of the electron beam in the other order is 1.5
- the magnitude of the acceleration energy of the electron beam is It may be set to 1.5.
- the fact that the electron beam B is not emitted (for example, the photocathode 3 is not irradiated with the excitation light L) may be used as one of the parameters.
- control unit 5 A control example based on the parameters set by the control unit 5 will be described with reference to FIG. Note that the following description is an example of control. Other controls may be used within the scope of the technical ideas disclosed in the present application. Also, in order to avoid complication of the drawing, some descriptions of the circuits and components from the control unit 5 may be omitted.
- the intensity of the electron beam means the magnitude of the amount of electrons (current value) contained in the electron beam B to be irradiated.
- the intensity of the electron beam B depends on the amount of excitation light L applied to the photocathode 3 . Therefore, when the intensity of the electron beam B is set as a parameter, the controller 5 may control the amount of the excitation light L applied to the photocathode 3 so that the intensity of the electron beam B is set. In the example shown in FIG. 1, the controller 5 controls the amount of light emitted from the light source 2 .
- a light quantity adjusting device 51 such as a liquid crystal shutter may be provided between the light source 2 and the photocathode 3 to keep the light quantity of the light source 2 constant and control the light quantity reaching the photocathode 3 by controlling the liquid crystal shutter. good.
- the magnitude of the acceleration energy of the electron beam B can be controlled by changing the electric field strength between the cathode 3 and the anode 4.
- the acceleration energy increases as the voltage difference between the cathode 3 and the anode 4 increases. Therefore, when the magnitude of the acceleration energy of the electron beam B is set as a parameter, the controller 5 may control the voltage of the power supply 6 so that the magnitude of the acceleration energy of the electron beam B is set.
- the size of the electron beam B can be controlled by changing the size of the excitation light L with which the photocathode 3 is irradiated. As the size of the excitation light L increases, the size of the electron beam B also increases. Therefore, when the size of the electron beam B is set as a parameter, the controller 5 may control the excitation light size adjustment device 52 such as a lens or liquid crystal shutter so that the size of the electron beam B is set. Alternatively or optionally, an electron beam size adjusting device 53 such as an electromagnetic lens or an aperture is provided on the optical axis of the emitted electron beam B, and the controller 5 controls the electron beam size adjusting device 53. good too. Further alternatively or optionally, an intermediate electrode 54 may be formed between cathode 3 and anode 4 .
- the control unit 5 (1) adjusts the potential difference between the cathode 3, the intermediate electrode 54, and the anode 4 by controlling the power supply 6, or (2) controls the movement of the intermediate electrode 54, thereby By adjusting the relative positional relationship between the electrode 54 and the anode 4, the focal position of the electron beam B when reaching the counterpart device E is adjusted, in other words, the electron beam B when reaching the target region R is adjusted. You can control the size.
- the configuration of the intermediate electrode 54, the control method, and the principle of controlling the focal position are described in detail in Japanese Patent No. 6466020. The disclosures in Japanese Patent No. 6466020 are incorporated herein by reference.
- the shape of the electron beam B can be controlled by providing an electron beam shape adjusting device 55 such as an electromagnetic lens or an aperture on the optical axis of the emitted electron beam B. Therefore, when the shape of the electron beam B is set as a parameter, the controller 5 may control the electron beam shape adjuster 55 so that the shape of the electron beam B is set.
- an electron beam shape adjusting device 55 such as an electromagnetic lens or an aperture on the optical axis of the emitted electron beam B. Therefore, when the shape of the electron beam B is set as a parameter, the controller 5 may control the electron beam shape adjuster 55 so that the shape of the electron beam B is set.
- the emission time of the electron beam B can be controlled by the emission time of the excitation light L emitted by the light source 2. Therefore, when the emission time of the electron beam B is set as a parameter, the control unit 5 may perform ON-OFF control of the light source 2 so as to achieve the set emission time of the electron beam B.
- a shutter may be provided between the light source 2 and the photocathode 3, and the controller 5 may control the shutter to control the emission time of the electron beam B.
- the emittance of the electron beam B can be controlled by the wavelength of the excitation light L emitted by the light source 2. Therefore, when the emittance of the electron beam B is set as a parameter, the controller 5 may control the wavelength of the excitation light L so that the set emittance of the electron beam B is obtained.
- a known wavelength tunable filter may be provided between the light source 2 and the photocathode 3, and the controller 5 may control the wavelength tunable filter.
- the electron gun 1A according to the first embodiment emits a pulsed electron beam B to the counterpart device E. Therefore, the electron beam deflector 10 of the counterpart apparatus E should sequentially deflect the incident pulsed electron beam B from D1-1 to Dm-n as shown in FIG. Therefore, the electron gun 1A according to the first embodiment has the effect of being able to be set so that the electron beam B having the desired parameters can be applied to the desired portion of the irradiation target using only the constituent members of the electron gun 1A.
- control unit 5 (Modified example of control unit 5)
- the control unit 5 described above sets the number of times the electron beam B is emitted, and sets parameters for each electron beam B to be emitted. That is, it is an example in which the electron beam B emitted by the electron gun 1A to the counterpart device E is assumed to be a pulsed electron beam B.
- the electron beam B emitted by the electron gun 1A to the counterpart device E may be a continuous electron beam B.
- the electron beam B incident on the counterpart device E is linearly scanned from D1-1 to Dm-n by the electron beam deflection device .
- the electron beam B necessary for scanning the irradiation region R injection time can be calculated.
- the time in D1-1 of the irradiation region R shown in FIG. 2 is defined as t 1 and the time in Dm-n is defined as t mn , continuous electrons emitted from the electron gun 1A in time series (t 1 to t mn )
- the electron beam B is planarly developed in the irradiation region R, and it can be understood which portion of the irradiation region R the electron beam B emitted at which time is irradiated.
- the control unit 5 sets the emission time for emitting the electron beam B, and sets the parameters of the emitted electron beam B in association with the emission time.
- the electron beam B incident on the counterpart device E is continuously deflected from the position D1-1 shown in FIG. 2 toward the position Dm-n. Therefore, among the parameters that can be set by the control unit 5 of the first embodiment, parameters (electron beam intensity, electron beam acceleration energy magnitude, electron beam size, electron beam shape and electron beam emittance) can be set.
- the control unit 5 according to the modification may perform control based on parameters set in the same manner as the control unit 5 according to the first embodiment, except for the parameters related to the electron beam emission time. Therefore, the electron gun 1A having the control unit 5 according to the modification can be set so that the electron beam having the desired parameters can be applied to the desired location of the irradiation target only with the constituent members of the electron gun 1A. Play.
- FIG. 4 is an enlarged view of the photocathode 3 portion of the electron gun 1B according to the second embodiment.
- the electron gun 1B according to the second embodiment is such that two or more different locations on the photocathode 3 are irradiated with the excitation light L from the light source so that two or more electron beams B are extracted from the photocathode 3.
- other points are the same as those of the first embodiment. Therefore, in the second embodiment, the points different from the first embodiment will be mainly described, and repetitive descriptions of items already described in the first embodiment will be omitted. Therefore, it is needless to say that the items already explained in the first embodiment can be adopted in the second embodiment even if they are not explicitly explained in the second embodiment. It goes without saying that the matters already explained in the preceding embodiments can also be adopted, although overlapping descriptions will be similarly omitted for the third and fourth embodiments to be described later.
- a plurality of light sources 2 may be provided, although illustration is omitted.
- the photocathode 3 may be irradiated with the excitation light L split into two or more by using an excitation light splitting device such as a splitter or a spatial phase modulator from a single light source 2 .
- the electron gun 1B according to the second embodiment can irradiate a plurality of electron beams B onto an irradiation target. Therefore, in addition to the effects of the electron gun 1A according to the first embodiment, the following effects are obtained. (1) Throughput can be improved when the irradiation target is irradiated with a plurality of electron beams B so as not to overlap. (2) When the target is irradiated with a plurality of electron beams B so as to overlap each other, the detection sensitivity of the counterpart apparatus E is improved, and the processing efficiency is improved.
- FIG. 5 is a diagram schematically showing an electron gun 1C according to the third embodiment and a counterpart device E equipped with the electron gun 1C.
- the electron gun 1C according to the third embodiment differs from the electron gun 1A according to the first embodiment and the electron gun 1A according to the second embodiment in that the control unit 5 can refer to information from the counterpart device E to set parameters. Unlike the electron gun 1B, other points are the same as those of the first and second embodiments.
- the electron gun 1C according to the third embodiment includes an information display device 6 for referring to information from the counterpart device E.
- the counterpart apparatus E has a detector 7 for detecting a signal obtained by irradiating the sample S with the electron beam B.
- FIG. Signals detected by the detector 7 can be displayed on the information display device 6 after processing.
- the control section 5 can set the parameters based on the information displayed on the information display device 6 .
- the image of the captured sample S can be displayed on the information display device 6 . Then, within the displayed image, a location desired to be enlarged or a location desired to change the intensity of the electron beam B to increase the contrast is indicated by a pointer or the like.
- the control unit 5 sets the number of times the electron beam B is emitted and sets parameters for each electron beam B to be emitted, or sets the emission time of the electron beam B and sets the parameters of the electron beam B to be emitted. Can be set in relation to time.
- the information display device 6 include known devices such as liquid crystal displays, CRT displays, organic EL displays, and LED displays.
- the electron gun 1C according to the third embodiment can set the parameters of the electron beam B to be emitted after referring to the information from the counterpart apparatus E, the electron gun 1 according to the first and second embodiments can In addition to the effect obtained, there is an effect that the parameters can be set in more detail.
- FIG. 6 is a diagram schematically showing an electron gun 1D according to the fourth embodiment and a counterpart device E equipped with the electron gun 1D.
- the electron gun 1D according to the fourth embodiment is different from the electron guns 1A to 1C according to the first to third embodiments in that the controller 5 also controls the constituent members of the counterpart device E. are the same as those of the electron guns 1A to 1C according to the first to third embodiments.
- the controller 5 of the electron gun 1D sets the parameters of the electron beam B emitted from the electron gun 1D and controls the constituent members of the electron gun 1D based on the settings. , the components of the counterpart device E are also controlled in association with . Therefore, in the control example based on the parameters set by the control unit 5, for example, the following control can be performed. (1) If the partner device E has an electron beam size adjusting device such as an electromagnetic lens or an aperture, the control unit 5 controls the size of the electron beam B when controlling the size of the electron beam B. may control the electron beam size adjustment device. (2) If the partner device E has an electron beam shape adjusting device such as an electromagnetic lens or an aperture, the control unit 5 controls the shape of the electron beam B when controlling the shape of the electron beam B.
- the controller 5 may control the electron beam shaper. (3) If the partner device E has a mechanical shutter, the controller 5 controls the mechanical shutter of the partner device E as necessary when controlling the emission time of the electron beam B. may (4) If the partner device E has an energy filter, the controller 5 may control the energy filter of the partner device E as necessary when controlling the emittance of the electron beam B. . (5) When a continuous electron beam B is emitted under the control of the electron guns 1A to 1C, the deflection speed of the electron beam B follows the setting of the device E on the other party. Therefore, unlike the pulsed electron beam B, parameters relating to the emission time of the electron beam B cannot be set.
- the control unit 5 controls the electron beam deflection device 10 in association with the emission time, by controlling the deflection speed of the electron beam deflection device 10, the irradiation time of the electron beam B on the same part of the irradiation region R is You can control the length of If the controller 5 controls the deflection speed of the electron beam deflection device 10, the deflection speed of the electron beam deflection device 10 may be taken into account when setting the emission time of the electron beam B.
- FIG. (6) As shown in FIG. 2, the electron beam deflection device 10 of the counterpart device E generally scans the incident electron beam B linearly.
- control unit 5 controls the electron beam deflection device 10 in association with the order of the electron beams B to be emitted or the emission time of the electron beams B to be emitted, line feed is performed at a desired point in one line, or the irradiation area is changed.
- An electron beam B having desired parameters can be applied to R at a desired location in a desired order.
- the electron gun 1D according to the fourth embodiment can also control the constituent members of the counterpart device E, in addition to the effects of the electron guns 1A to 1C according to the first to third embodiments, the control of set parameters The effect is that the number of method options increases.
- the electron beam application apparatus E equipped with the electron guns 1 (1A to 1D) includes known apparatuses equipped with electron guns.
- free electron laser accelerator electron microscope, electron beam holography device, electron beam drawing device, electron beam diffraction device, electron beam inspection device, electron beam metal additive manufacturing device, electron beam lithography device, electron beam processing device, electron beam curing devices, electron beam sterilizers, electron beam sterilizers, plasma generators, atomic element generators, spin-polarized electron beam generators, cathodoluminescence devices, reverse photoelectron spectroscopy devices, and the like.
- An electron beam application apparatus equipped with the electron gun 1 disclosed in the present application has, for example, the following effects.
- the unevenness of the sample becomes clearer, and structures that could not be observed conventionally can be seen.
- a strong electron beam B is irradiated to a place where the signal is weak, and a weak electron beam B is irradiated to a place where the signal is too strong. Signals that deviate from can be accommodated within the range.
- an electron beam metal additive manufacturing apparatus (3D printer) there are cases where it is desired to heat the base portion for laminating metal.
- Embodiments of the electron beam injection method are the electron gun 1 according to the first to fourth embodiments or the electron guns according to the first to fourth embodiments. It is carried out using an electron beam application device equipped with a gun 1 .
- the photocathode 3 is irradiated with the excitation light L from the light source 2, and the electrons that can be emitted, which are generated by the photocathode 3 in response to the reception of the excitation light L, are emitted between the photocathode 3 and the anode 4. and an electron beam injection step to form an electron beam B which is extracted by an electric field formed between.
- the control unit 5 of the electron gun 1 (1) sets the number of times the electron beam B is emitted and sets parameters for each electron beam B to be emitted, or (2) sets the emission time of the electron beam B, Parameters of the emitted electron beam B can be set in relation to the emission time. Then, in the electron beam emission step, the control unit 5 controls the constituent members of the electron gun 1 and optionally the constituent members of the counterpart device E so that the emitted electron beam B becomes the set parameters.
- the controller 5 (1) sets the number of times the electron beam B is emitted and sets parameters for each electron beam to be emitted, the parameters are, for example, the intensity of the electron beam, the magnitude of the acceleration energy of the electron beam, At least one selected from the size of the electron beam, the shape of the electron beam, the emission time of the electron beam, and the emittance of the electron beam can be included.
- the control unit 5 may perform control so that all electron beam parameters are the same, or at least one parameter is selected from other parameters. may be controlled differently.
- control unit 5 may control only the constituent members of the electron gun 1 side, or may also control the constituent members of the counterpart device E, as described in the embodiment of the electron gun 1 .
- a specific example of the control has already been described in the embodiment of the electron gun 1, so a detailed description will be omitted.
- the control unit 5 sets the emission time of the electron beam B and sets the parameters of the emitted electron beam B in association with the emission time
- the parameters are, for example, the intensity of the electron beam and the acceleration of the electron beam. At least one selected from energy magnitude, electron beam size, electron beam shape, and electron beam emittance can be included.
- the control unit 5 may set the emission time for emitting the electron beam B, and may control so that the parameters of the emitted electron beam B are the same, or may include the emission time for the electron beam B with different parameters. can be controlled to
- Example 1 [Production of Electron Gun 1]
- a laser light source iBeamSmart manufactured by Toptica
- the photocathode 3 is described by Daiki SATO et al. 2016 Jpn. J. Appl. Phys.
- An InGaN photocathode was fabricated by a known method described in 55 05FH05.
- the EA treatment of the photocathode surface was performed by a known method.
- the controller 5 has created a program so that it can set the number of times the electron beam B is emitted, and can set electron beam parameters for each electron beam B to be emitted.
- Example 2 [Fabrication of Electron Beam Apparatus (SEM)]
- the electron gun part of the commercially available SEM was replaced with the fabricated electron gun 1.
- the specifications of the commercially available SEM used a cold field emission electron source (CFE) as the electron gun, and included a deflection coil as the electron beam deflector 10 .
- the acceleration voltage of the electron beam is 30 kv at maximum, and observation is possible at a maximum of 1,000,000 times.
- Example 3 A sample having an uneven pattern formed on a part of the surface was prepared and set in the SEM. Taking into consideration the measurement magnification, the size of the electron beam B, the irradiation area, etc., the controller 5 sets the number of times the electron beam B is emitted. In addition, the intensity of the electron beam B (the intensity of the electron beam B is zero (no irradiation of the excitation light L), or a constant intensity) is used as a parameter, and the part where the intensity of the electron beam B is zero is , parameters were set in consideration of the order of the number of injections so that the PeS logo was formed on the sample.
- FIG. 7A shows the imaging result.
- the sample could be imaged in the area irradiated with the electron beam B, and the area with unevenness and the area without unevenness could also be clearly imaged.
- the portion where the intensity of the electron beam B was zero was black because the sample could not be photographed.
- the black PeS logo was confirmed, it was confirmed that the electron beam B having the desired parameters could be irradiated to the desired location of the sample by the constituent members on the electron gun 1 side.
- Example 4 Next, based on the photographing result shown in FIG. 7A displayed on the information display device, the photographing region (irradiation region) is set so that the portion having the uneven pattern can be photographed enlarged. It was set.
- the parameters of the electron beam B were set so that the PeS logo could be formed. The parameters were set while considering the order of the number of injections.
- FIG. 7B shows the imaging result. As shown in FIG. 7B, the part irradiated with the electron beam B could be photographed as an enlarged concave-convex part of the sample, and the part where the intensity of the electron beam B was zero had a substantially semicircular shape. In the example shown in FIG.
- the electron beam having the desired electron beam parameters can be irradiated to the desired portion of the irradiation target by the electron gun-side components. can be set to Therefore, it is useful for those dealing with electron guns.
- Electron gun 2... Light source, 3... Photocathode (cathode) 4... Anode, 5... Control part, 6... Information display device, 7... Detector, 10... Electron beam deflection apparatus, 51... Light quantity Adjustment device 52 Excitation light size adjustment device 53 Electron beam size adjustment device 54 Intermediate electrode 55 Electron beam shape adjustment device B Electron beam CB Vacuum chamber L Excitation light R Irradiation region,
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Abstract
Description
前記光源からの受光に応じて、放出可能な電子を生成するフォトカソードと、
前記フォトカソードとの間で電界を形成することができ、形成した電界により前記放出可能な電子を引き出し、電子ビームを形成するアノードと、
制御部と、
を含む電子銃であって、
前記制御部は、
前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定する、
または、
前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定する、
電子銃。
(2)前記制御部が、前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状、電子ビームの射出時間および電子ビームのエミッタンスから選択される少なくとも1つを含む、
上記(1)に記載の電子銃。
(3)前記射出回数は2以上であり、
前記制御部は、設定された回数の電子ビームを射出する際に、少なくとも1つの電子ビームパラメータが、その他の電子ビームパラメータから選択される一つと異なるように制御する、
上記(2)に記載の電子銃。
(4)前記制御部が、前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状および電子ビームのエミッタンスから選択される1つを少なくとも含む、
上記(1)に記載の電子銃。
(5)前記制御部は、設定された前記射出時間で電子ビームを射出する際に、前記電子ビームパラメータが異なる電子ビームを射出する時間を含むように制御する、
上記(4)に記載の電子銃。
(6)前記フォトカソードから2以上の電子ビームが引き出されるように、前記フォトカソードの異なる2以上の場所に光源からの励起光が照射される、
上記(1)~(5)の何れか一つに記載の電子銃。
(7)上記(1)~(6)のいずれか一つに記載の電子銃を含む電子線適用装置であって、
電子線適用装置は、
自由電子レーザー加速器、
電子顕微鏡、
電子線ホログラフィー装置、
電子線描画装置、
電子線回折装置、
電子線検査装置、
電子線金属積層造形装置、
電子線リソグラフィー装置、
電子線加工装置、
電子線硬化装置、
電子線滅菌装置、
電子線殺菌装置、
プラズマ発生装置、
原子状元素発生装置、
スピン偏極電子線発生装置、
カソードルミネッセンス装置、または、
逆光電子分光装置
である、
電子線適用装置。
(8)電子ビームの射出方法であって、
電子ビームは、
光源と、
前記光源からの受光に応じて、放出可能な電子を生成するフォトカソードと、
前記フォトカソードとの間で電界を形成することができ、形成した電界により前記放出可能な電子を引き出し、電子ビームを形成するアノードと、
制御部と、
を含む電子銃から射出され、
前記制御部は、
前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定する、
または、
前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定することができ、
射出方法は、
前記光源からの励起光を前記フォトカソードへ照射し、励起光の受光に応じて前記フォトカソードで生成した放出可能な電子を、前記フォトカソードと前記アノードとの間に形成した電界により引き出して電子ビームを形成する電子ビーム射出ステップを含み、
前記制御部は、
電子ビーム射出ステップにおいて、射出する電子ビームが設定した電子ビームパラメータとなるように制御する、
射出方法。
(9)前記制御部が、前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状、電子ビームの射出時間および電子ビームのエミッタンスから選択される少なくとも1つを含む、
上記(8)に記載の射出方法。
(10)前記射出回数は2以上であり、
前記制御部は、設定された回数の電子ビームを射出する際に、少なくとも1つの電子ビームパラメータが、その他の電子ビームパラメータから選択される一つと異なるように制御する、
上記(9)に記載の射出方法。
(11)前記制御部が、前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状および電子ビームのエミッタンスから選択される1つを少なくとも含む、
上記(8)に記載の射出方法。
(12)前記制御部は、設定された前記射出時間で電子ビームを射出する際に、前記電子ビームパラメータが異なる電子ビームを射出する時間を含むように制御する、
上記(11)に記載の射出方法。
図1~図3を参照して、第1の実施形態に係る電子銃1Aについて説明する。図1は、第1の実施形態に係る電子銃1A、および、電子銃1Aを搭載した相手側装置Eを模式的に示す図である。図2は、電子銃1Aの制御部5の概略を示す図である。図3は、制御部5が設定した電子ビームパラメータを制御する概略を示す図である。
(1)照射領域Rのサイズ、照射領域Rにおける電子ビームBのスポットサイズ、相手側装置Eが有する電子ビーム偏向装置10の制御スピード等に基づき、照射領域Rを照射する際に必要な電子ビームBの射出回数を演算できること、
(2)射出回数が設定できれば、射出する電子ビームB毎にパラメータを設定することで、電子銃1A側の設定により、照射領域Rの所望の箇所に所望のパラメータを有する電子ビームBを照射できること、
を新たに見出した。本出願における開示は、当該新たな知見に基づくものである。
(a)電子銃1Aが射出したパルス状の電子ビームBを、最初のライン(L1)の左端(D1-1)から右端に向けて偏向しながら照射する。
(b)L1の右端のスポット(D1-n)に電子ビームBを照射後、2番目のライン(L2)の左端に電子ビームBの照射位置を偏向し、上記(a)と同様に左端から右端に向けて電子ビームBを偏向しながら照射する。
(c)照射領域Rの最後のスポット(Dm-n)に電子ビームBを照射するまで、上記(b)を繰り返す。
上記した制御部5は、電子ビームBの射出回数を設定し、射出する電子ビームB毎にパラメータを設定する例を示している。つまり、電子銃1Aが相手側装置Eに射出する電子ビームBが、パルス状の電子ビームBを想定した例である。代替的に、電子銃1Aが相手側装置Eに射出する電子ビームBが、連続的な電子ビームBであってもよい。図2に示すように、相手側装置Eに入射した電子ビームBは、電子ビーム偏向装置10によりD1-1からDm-nまでライン状に走査される。したがって、照射領域Rのサイズ、照射領域Rにおける電子ビームBのスポットサイズ、相手側装置Eが有する電子ビーム偏向装置10の制御スピード等に基づき、照射領域Rを走査するために必要な電子ビームBの射出時間を演算できる。
図1~図4を参照して、第2の実施形態に係る電子銃1Bについて説明する。図4は、第2の実施形態に係る電子銃1Bのフォトカソード3部分を拡大した図である。
(1)複数の電子ビームBを重複しないように照射対象に照射する場合は、スループットが向上できる。
(2)複数の電子ビームBを重複するように照射対象に照射する場合は、相手側装置Eの検出感度が向上し、また、加工効率が向上する。
(3)複数の電子ビームBを重複するように照射対象に照射する場合は、照射対象に対して所望の作用を与えるpumpビーム(照射時間と電荷量)照射後、時間をおいて次のビーム(probeビーム)を照射対象に照射できる。
(4)また、複数の電子ビームBを重複するように照射対象に照射する場合は、照射対象の荷電補償(charge compensation)の目的にも使用できる。
図5を参照して、第3の実施形態に係る電子銃1Cについて説明する。図5は、第3の実施形態に係る電子銃1C、および、電子銃1Cを搭載した相手側装置Eを模式的に示す図である。
図6を参照して、第4の実施形態に係る電子銃1Dについて説明する。図6は、第4の実施形態に係る電子銃1D、および、電子銃1Dを搭載した相手側装置Eを模式的に示す図である。
(1)相手側装置Eが電磁レンズやアパーチャ等の電子ビームサイズ調整装置を有している場合、制御部5は、電子ビームBのサイズを制御する際に、必要に応じて相手側装置Eの電子ビームサイズ調整装置を制御してもよい。
(2)相手側装置Eが電磁レンズやアパーチャ等の電子ビーム形状調整装置を有している場合、制御部5は、電子ビームBの形状を制御する際に、必要に応じて相手側装置Eの電子ビーム形状調整装置を制御してもよい。
(3)相手側装置Eが機械的シャッターを有している場合、制御部5は、電子ビームBの射出時間を制御する際に、必要に応じて相手側装置Eの機械的シャッターを制御してもよい。
(4)相手側装置Eがエネルギーフィルタを有している場合、制御部5は、電子ビームBのエミッタンスを制御する際に、必要に応じて相手側装置Eのエネルギーフィルタを制御してもよい。
(5)電子銃1A~1C側の制御により連続的な電子ビームBを射出する場合、電子ビームBの偏向速度は相手側装置Eの設定に従う。したがって、パルス状の電子ビームBと異なり電子ビームBの射出時間に関するパラメータは設定できない。そのため、照射領域Rの同じ箇所に電子ビームBを照射する時間の長短は制御できない。一方、制御部5が射出時間に関連付けて電子ビーム偏向装置10を制御する場合は、電子ビーム偏向装置10の偏向速度を制御することで、照射領域Rの同じ箇所に電子ビームBを照射する時間の長短を制御できる。なお、制御部5が電子ビーム偏向装置10の偏向速度を制御する場合は、電子ビームBの射出時間を設定する際に電子ビーム偏向装置10の偏向速度を考慮して演算すればよい。
(6)図2に示すとおり、相手側装置Eが有する電子ビーム偏向装置10は、一般的に、入射した電子ビームBをライン状に走査する。一方、制御部5が射出する電子ビームBの順番または射出する電子ビームBの射出時間に関連付けて電子ビーム偏向装置10を制御する場合は、一つのラインの所望の箇所で改行、あるいは、照射領域Rに対して所望の場所に所望の順番で所望のパラメータを有する電子ビームBを照射できる。
電子銃1(1A~1D)を搭載する電子線適用装置Eは、電子銃を搭載する公知の装置が挙げられる。例えば、自由電子レーザー加速器、電子顕微鏡、電子線ホログラフィー装置、電子線描画装置、電子線回折装置、電子線検査装置、電子線金属積層造形装置、電子線リソグラフィー装置、電子線加工装置、電子線硬化装置、電子線滅菌装置、電子線殺菌装置、プラズマ発生装置、原子状元素発生装置、スピン偏極電子線発生装置、カソードルミネッセンス装置、逆光電子分光装置等が挙げられる。
(1)電子線適用装置の種類を問わず、搭載した電子銃1側の構成部材のみで射出する電子ビームBのパラメータを設定できる。したがって、電子線適用装置の利便性が向上する。
(2)電子顕微鏡の場合、試料がチャージアップすることがある。撮影したい場所とは別の場所に、電子ビームBの強さ、電子ビームBの大きさ等のパラメータを設定した電子ビームを照射することで、試料のチャージアップを解消できる。
(3)電子顕微鏡の場合、電子ビームBの加速エネルギーを大きくすることで試料の深い位置まで電子が到達する。また、電子ビームBの強さ等を制御することで試料の凹凸等がより鮮明になり、従来観察できなかった構造が見えるようになる。
(4)電子顕微鏡の場合、信号が弱い場所には強い電子ビームBを照射し、信号が強すぎる場所には弱い電子ビームBを照射することで、従来の電子ビームBでは検出器の検出範囲から外れてしまう信号を、当該範囲に収めることができる。
(5)電子線金属積層造形装置(3Dプリンタ)の場合、金属を積層する土台部分を温めたい場合がある。温めたい場所のみ、電子ビームBを強くする、電子ビームBの射出時間を長くする、電子ビームBのサイズを大きくする、等の制御ができる。
(6)電子線検査装置の場合、検査を必要とする場所を選択することにより、あるいは、検査の条件設定等を行うことにより、効率的に検査を行うことができ、検査のスループットを向上させることができる。
電子ビームの射出方法(以下、「射出方法」と記載することがある。)の実施形態は、第1~第4の実施形態に係る電子銃1または第1~第4の実施形態に係る電子銃1を搭載した電子線適用装置を用いて行われる。
制御部5が、(1)電子ビームBの射出回数を設定し、射出する電子ビーム毎にパラメータを設定する場合、パラメータは、例えば、電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状、電子ビームの射出時間および電子ビームのエミッタンスから選択される少なくとも1つを含むことができる。制御部5は、設定された回数の電子ビームを射出する際に、全ての電子ビームのパラメータが同じとなるように制御してもよいし、少なくとも1つのパラメータがその他のパラメータから選択される一つと異なるように制御してもよい。また、制御部5は、電子銃1の実施形態で説明のとおり、電子銃1側の構成部材のみ制御してもよいし、相手側装置Eの構成部材も制御してもよい。制御の具体例は電子銃1の実施形態で説明済みであることから、詳細な記載は省略する。
制御部5が、(2)電子ビームBの射出時間を設定し、射出する電子ビームBのパラメータを射出時間に関連付けて設定する場合、パラメータは、例えば、電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状および電子ビームのエミッタンスから選択される少なくとも1つを含むことができる。制御部5は、電子ビームBを射出する射出時間を設定し、射出する電子ビームBのパラメータが同じとなるように制御してもよいし、パラメータが異なる電子ビームBを射出する時間を含むように制御してもよい。
[電子銃1の作製]
光源2には、レーザー光源(Toptica製iBeamSmart)を用いた。フォトカソード3は、Daiki SATO et al. 2016 Jpn. J. Appl. Phys. 55 05FH05に記載された公知の方法で、InGaNフォトカソードを作製した。フォトカソード表面のEA処理は、公知の方法により行った。制御部5は、電子ビームBの射出回数を設定し、射出する電子ビームB毎に電子ビームパラメータを設定できるようにプログラムを作成した。
[電子線適用装置(SEM)の作製]
市販SEMの電子銃部分を、作製した電子銃1で置き換えた。なお、市販SEMの仕様は、電子銃がコールド型電界放出電子源(CFE)を用いており、電子ビーム偏向装置10として偏向コイルを備えていた。電子ビームの加速電圧は最大で30kv、最大で100万倍での観察が可能である。
<実施例3>
表面の一部に凹凸模様を形成したサンプルを準備し、SEMにセットした。測定倍率、電子ビームBのサイズ、照射領域等を考慮し、制御部5で電子ビームBの射出回数を設定した。なお、パラメータには電子ビームBの強さ(電子ビームBの強さがゼロ(励起光Lの照射無し)、または、一定の強さ)を用い、電子ビームBの強さがゼロの部分が、サンプル上でPeSのロゴとなるように、射出回数の順番を考慮しながらパラメータの設定を行った。次に、設定したパラメータとなるように電子銃1の構成部材を制御しながら、電子ビームBをサンプルに照射し撮影を行った。図7Aに撮影結果を示す。図7Aに示すとおり、電子ビームBを照射した部分はサンプルの撮影ができ、凹凸形成部分と凹凸非形成部分も明確に撮影できた。また、電子ビームBの強さがゼロの部分はサンプルの撮影ができないことから黒色となった。図7Aに示す通り、黒色のPeSのロゴが確認できたことから、電子銃1側の構成部材により、サンプルの所望の場所に所望のパラメータを有する電子ビームBを照射できることを確認した。なお、実施例3に示すような照射領域Rの一部に電子ビームBを照射しないパラメータを設定した場合、同じ強さの電子ビームBを照射し続ける場合と比較してフォトカソード3の劣化を防止でき、フォトカソード3を長寿命化できるという効果も奏する。
次に、情報表示装置に表示された図7Aの撮影結果に基づき、凹凸模様を有する部分の拡大撮影ができるように撮影領域(照射領域)を設定し、制御部5で電子ビームBの射出回数を設定した。なお、実施例3ではPeSのロゴが形成できるように電子ビームBのパラメータを設定したが、実施例4では電子ビームBの強さがゼロとなる照射領域が略半円形状となるように、射出回数の順番を考慮しながらパラメータの設定を行った。図7Bに撮影結果を示す。図7Bに示すとおり、電子ビームBを照射した部分はサンプルの拡大した凹凸形成部分の撮影ができ、電子ビームBの強さがゼロの部分は略半円形状となった。図7Bに示す例では、パラメータは電子ビームBの強さ変化の2種類のみであるが、サンプルの所望の場所に所望のパラメータを有する電子ビームBを照射できた。したがって、相手側装置Eの情報を参照することで、より詳細にパラメータを設定できることを確認した。
Claims (12)
- 光源と、
前記光源からの受光に応じて、放出可能な電子を生成するフォトカソードと、
前記フォトカソードとの間で電界を形成することができ、形成した電界により前記放出可能な電子を引き出し、電子ビームを形成するアノードと、
制御部と、
を含む電子銃であって、
前記制御部は、
前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定する、
または、
前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定する、
電子銃。 - 前記制御部が、前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状、電子ビームの射出時間および電子ビームのエミッタンスから選択される少なくとも1つを含む、
請求項1に記載の電子銃。 - 前記射出回数は2以上であり、
前記制御部は、設定された回数の電子ビームを射出する際に、少なくとも1つの電子ビームパラメータが、その他の電子ビームパラメータから選択される一つと異なるように制御する、
請求項2に記載の電子銃。 - 前記制御部が、前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状および電子ビームのエミッタンスから選択される1つを少なくとも含む、
請求項1に記載の電子銃。 - 前記制御部は、設定された前記射出時間で電子ビームを射出する際に、前記電子ビームパラメータが異なる電子ビームを射出する時間を含むように制御する、
請求項4に記載の電子銃。 - 前記フォトカソードから2以上の電子ビームが引き出されるように、前記フォトカソードの異なる2以上の場所に光源からの励起光が照射される、
請求項1~5の何れか一項に記載の電子銃。 - 請求項1~6のいずれか一項に記載の電子銃を含む電子線適用装置であって、
電子線適用装置は、
自由電子レーザー加速器、
電子顕微鏡、
電子線ホログラフィー装置、
電子線描画装置、
電子線回折装置、
電子線検査装置、
電子線金属積層造形装置、
電子線リソグラフィー装置、
電子線加工装置、
電子線硬化装置、
電子線滅菌装置、
電子線殺菌装置、
プラズマ発生装置、
原子状元素発生装置、
スピン偏極電子線発生装置、
カソードルミネッセンス装置、または、
逆光電子分光装置
である、
電子線適用装置。 - 電子ビームの射出方法であって、
電子ビームは、
光源と、
前記光源からの受光に応じて、放出可能な電子を生成するフォトカソードと、
前記フォトカソードとの間で電界を形成することができ、形成した電界により前記放出可能な電子を引き出し、電子ビームを形成するアノードと、
制御部と、
を含む電子銃から射出され、
前記制御部は、
前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定する、
または、
前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定することができ、
射出方法は、
前記光源からの励起光を前記フォトカソードへ照射し、励起光の受光に応じて前記フォトカソードで生成した放出可能な電子を、前記フォトカソードと前記アノードとの間に形成した電界により引き出して電子ビームを形成する電子ビーム射出ステップを含み、
前記制御部は、
電子ビーム射出ステップにおいて、射出する電子ビームが設定した電子ビームパラメータとなるように制御する、
射出方法。 - 前記制御部が、前記電子ビームの射出回数を設定し、射出する電子ビーム毎に電子ビームパラメータを設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状、電子ビームの射出時間および電子ビームのエミッタンスから選択される少なくとも1つを含む、
請求項8に記載の射出方法。 - 前記射出回数は2以上であり、
前記制御部は、設定された回数の電子ビームを射出する際に、少なくとも1つの電子ビームパラメータが、その他の電子ビームパラメータから選択される一つと異なるように制御する、
請求項9に記載の射出方法。 - 前記制御部が、前記電子ビームの射出時間を設定し、射出する電子ビームの電子ビームパラメータを前記射出時間に関連付けて設定するものであり、
前記電子ビームパラメータが、
電子ビームの強さ、電子ビームの加速エネルギーの大きさ、電子ビームのサイズ、電子ビームの形状および電子ビームのエミッタンスから選択される1つを少なくとも含む、
請求項8に記載の射出方法。 - 前記制御部は、設定された前記射出時間で電子ビームを射出する際に、前記電子ビームパラメータが異なる電子ビームを射出する時間を含むように制御する、
請求項11に記載の射出方法。
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Also Published As
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KR20230154973A (ko) | 2023-11-09 |
JP6968473B1 (ja) | 2021-11-17 |
EP4310883A1 (en) | 2024-01-24 |
TW202247229A (zh) | 2022-12-01 |
JP2022181343A (ja) | 2022-12-08 |
CN117121151A (zh) | 2023-11-24 |
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