WO2022199026A1 - 一种光栅结构抗菌表面的检测方法 - Google Patents

一种光栅结构抗菌表面的检测方法 Download PDF

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WO2022199026A1
WO2022199026A1 PCT/CN2021/127586 CN2021127586W WO2022199026A1 WO 2022199026 A1 WO2022199026 A1 WO 2022199026A1 CN 2021127586 W CN2021127586 W CN 2021127586W WO 2022199026 A1 WO2022199026 A1 WO 2022199026A1
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grating structure
alloy
antibacterial
reflection characteristic
antibacterial surface
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French (fr)
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王成勇
杜策之
张涛
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Guangdong University of Technology
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Guangdong University of Technology
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Definitions

  • the invention relates to the technical field of medical devices, in particular to a method for detecting an antibacterial surface of a grating structure.
  • the purpose of the present invention is to avoid the deficiencies in the prior art and provide a method for detecting the antibacterial surface of the grating structure, which can quickly and conveniently detect whether the antibacterial surface of the grating structure is defective or contaminated.
  • a method for detecting an antibacterial surface of a grating structure comprising the following steps:
  • S2 obtaining a grating structure antibacterial surface known to have an incomplete grating structure, the surface being the first surface; and obtaining a known contaminated grating structure antibacterial surface having a complete grating structure, the surface being the second surface; using ultraviolet spectroscopy The photometer is used to characterize the reflection characteristics of the first surface and the reflection characteristics of the second surface under the condition of the incident wavelength of 200-800 nm, respectively, to obtain the first reflection characteristic diagram of the first surface and the second reflection characteristic diagram of the second surface;
  • S4 Compare the reflection characteristic map to be compared prepared in S3 with the first reflection characteristic map prepared by S2 separately. When the reflectivity of the reflection characteristic map to be compared is lower than the reflectivity of the first reflection characteristic map, then the reflectivity of the reflection characteristic map to be compared is lower than that of the first reflection characteristic map.
  • the obtained antibacterial surface of the grating structure is the surface of the complete grating structure, otherwise it is the surface of the incomplete grating structure with defects; When the reflectivity of the reflection characteristic map is lower than the reflectivity of the second reflection characteristic map, the antibacterial surface of the grating structure prepared by S1 is not contaminated, otherwise it is contaminated.
  • the S1 includes the following steps:
  • the roughness of the polished alloy surface is Ra ⁇ 0.1 ⁇ m.
  • diamond polishing abrasive grains with a particle size of 0.25-0.5 ⁇ m are used, and then the surface of the alloy is polished under the conditions of a linear velocity of 1.5-5 m/s and a pressure of 0.3-2.3 MPa, and the polishing time is 30 minutes.
  • the alloy surface after being polished by ultrafast laser is irradiated one or more times.
  • the wavelength of the ultrafast laser is 200-1200nm
  • the pulse width is ⁇ 10ps
  • the frequency is 1-100kHz
  • the power is 0.1 ⁇ 50W
  • scanning speed is 10 ⁇ 2000mm/s.
  • the cleaning time of ethanol is 5-20 minutes
  • the cleaning time of deionized water is 5-20 minutes.
  • the second surface is observed by a scanning electron microscope to select and obtain a second surface with a complete grating structure.
  • alloys are amorphous alloys, stainless steel alloys and titanium alloys.
  • the excited plasmon when the light is injected into the antibacterial surface of the complete non-polluting grating structure, the excited plasmon can increase the light absorption rate of the incident light at the metal-dielectric interface, forming a local field effect, and thus different polarization states.
  • the reflection characteristics of light of different wavelengths at different incident angles on the grating surface will be different, resulting in a low filter reflectivity for light.
  • the reflection characteristic will be affected, and the light reflectivity will be larger.
  • the present invention judges the quality of the antibacterial surface of the grating structure to be detected by comparing the emissivity of the antibacterial surface of the grating structure detected.
  • the present invention utilizes the optical properties of the antibacterial surface of the grating structure under the condition of an incident wavelength of 200-800 nm of the ultraviolet spectrophotometer, and compares the reflectivity of the antibacterial surface of the grating structure to be detected with the antibacterial surface of the grating structure known to have an incomplete grating structure and the reflectivity of the antibacterial surface of the grating structure with a known contaminated grating structure, so as to judge the degree of defects and pollution of the antibacterial surface of the grating structure to be tested.
  • the present invention can quickly detect whether the antibacterial surface of the grating structure after processing has an incomplete structure by detecting the change of the reflectivity of the antibacterial surface of the grating structure, or quickly detect whether the antibacterial surface of the grating structure with a complete grating structure is affected before use. Pollution greatly improves the safety of medical devices, and overcomes the problems that traditional methods cannot quickly detect the antibacterial surface structure and contamination degree of grating structures.
  • Fig. 1 is a morphological comparison of the antibacterial surface of the amorphous alloy grating structure, the antibacterial surface of the stainless steel grating structure and the antibacterial surface of the titanium alloy grating structure;
  • FIG. 2 is a comparison chart of the reflectivity of the antibacterial surface of the amorphous alloy grating structure with the incomplete grating structure and the antibacterial surface of the amorphous alloy grating structure with the complete grating structure;
  • FIG. 3 is a comparison chart of the reflectivity of the antibacterial surface of the amorphous alloy grating structure with a complete grating structure after being contaminated and the antibacterial surface of the amorphous alloy grating structure with a complete grating structure before being contaminated.
  • This embodiment discloses a method for detecting an antibacterial surface of an amorphous alloy grating structure, which includes the following steps:
  • S1 preparing an antibacterial surface of an amorphous alloy grating structure, the step includes:
  • S11 Use 0.5 ⁇ m grain size diamond to polish the abrasive grains, and then polish the amorphous alloy surface at a linear speed of 1.5m/s and a pressure of 0.3MPa.
  • the polishing time is 30min.
  • the roughness of the polished amorphous alloy surface is Ra. ⁇ 0.1 ⁇ m;
  • S12 The amorphous alloy surface polished by S11 is irradiated by ultrafast laser single or multiple times, wherein the wavelength of the ultrafast laser is 200nm, the pulse width is 100fs, the frequency is 1kHz, the power is 0.1W, and the scanning speed is 10mm /s, the surface of the amorphous alloy grating structure is obtained;
  • S13 firstly use absolute ethanol to ultrasonically clean the surface of the amorphous alloy grating structure obtained in S12, and then use deionized water to clean the surface of the amorphous alloy grating structure, wherein the cleaning time of ethanol is 5 minutes, and the cleaning time of deionized water is 5 minutes. is 5min, and the antibacterial surface of the amorphous alloy grating structure is obtained.
  • S4 Compare the reflection characteristic map to be compared prepared in S3 with the first reflection characteristic map prepared by S2 separately.
  • the reflectivity of the reflection characteristic map to be compared is lower than the reflectivity of the first reflection characteristic map, then the reflectivity of the reflection characteristic map to be compared is lower than that of the first reflection characteristic map.
  • the obtained antibacterial surface of the amorphous alloy grating structure is the surface of the complete grating structure, otherwise it is the surface of the grating structure with defects; the reflection characteristic map to be compared prepared by S3 and the second reflection characteristic map prepared by S2 are compared separately.
  • the reflectivity of the comparative reflection characteristic map is lower than that of the second reflection characteristic map, the antibacterial surface of the amorphous alloy grating structure prepared by S1 is not contaminated, otherwise it is contaminated.
  • This embodiment discloses a method for detecting an antibacterial surface of an amorphous alloy grating structure, which includes the following steps:
  • S1 preparing an antibacterial surface of an amorphous alloy grating structure, the step includes:
  • S11 Use 0.25 ⁇ m grain size diamond polishing abrasive grains, and then polish the amorphous alloy surface at a linear speed of 5m/s and a pressure of 2.3MPa.
  • the polishing time is 30min.
  • S12 The amorphous alloy surface polished by S11 is irradiated by ultrafast laser single or multiple times, wherein the wavelength of the ultrafast laser is 1200nm, the pulse width is 300fs, the frequency is 100kHz, the power is 50W, and the scanning speed is 2000mm/ s, the surface of the amorphous alloy grating structure is obtained;
  • S13 firstly use absolute ethanol to ultrasonically clean the surface of the amorphous alloy grating structure obtained in S12, and then use deionized water to clean the surface of the amorphous alloy grating structure, wherein the cleaning time of ethanol is 20min, and the cleaning time of deionized water is 20 minutes. is 20min, the antibacterial surface of amorphous alloy grating structure is obtained.
  • S4 Compare the reflection characteristic map to be compared prepared in S3 with the first reflection characteristic map prepared by S2 separately.
  • the reflectivity of the reflection characteristic map to be compared is lower than the reflectivity of the first reflection characteristic map, then the reflectivity of the reflection characteristic map to be compared is lower than that of the first reflection characteristic map.
  • the obtained antibacterial surface of the amorphous alloy grating structure is the surface of the complete grating structure, otherwise it is the surface of the grating structure with defects; the reflection characteristic map to be compared prepared by S3 and the second reflection characteristic map prepared by S2 are compared separately.
  • the reflectivity of the comparative reflection characteristic map is lower than that of the second reflection characteristic map, the antibacterial surface of the amorphous alloy grating structure prepared by S1 is not contaminated, otherwise it is contaminated.
  • This embodiment discloses a method for detecting an antibacterial surface of an amorphous alloy grating structure, which includes the following steps:
  • S1 preparing an antibacterial surface of an amorphous alloy grating structure, the step includes:
  • S11 Use 0.3 ⁇ m grain size diamond to polish the abrasive grains, and then polish the amorphous alloy surface at a linear speed of 2.5m/s and a pressure of 0.9MPa.
  • the polishing time is 30min.
  • the roughness of the polished amorphous alloy surface is Ra. ⁇ 0.1 ⁇ m;
  • S12 The amorphous alloy surface polished by S11 is irradiated one or more times by an ultrafast laser, wherein the wavelength of the ultrafast laser is 800nm, the pulse width is 500fs, the frequency is 50kHz, the power is 1W, and the scanning speed is 100mm/ s, the surface of the amorphous alloy grating structure is obtained;
  • S13 First, use absolute ethanol to ultrasonically clean the surface of the amorphous alloy grating structure prepared in S12, and then use deionized water to clean the surface of the amorphous alloy grating structure.
  • the cleaning time of ethanol is 10 minutes, and the cleaning time of deionized water is 10 minutes. After 10 min, the antibacterial surface of the amorphous alloy grating structure was obtained.
  • S4 Compare the reflection characteristic map to be compared prepared in S3 with the first reflection characteristic map prepared by S2 separately.
  • the reflectivity of the reflection characteristic map to be compared is lower than the reflectivity of the first reflection characteristic map, then the reflectivity of the reflection characteristic map to be compared is lower than that of the first reflection characteristic map.
  • the obtained antibacterial surface of the amorphous alloy grating structure is the surface of the complete grating structure, otherwise it is the surface of the grating structure with defects; the reflection characteristic map to be compared prepared by S3 and the second reflection characteristic map prepared by S2 are compared separately.
  • the reflectivity of the comparative reflection characteristic map is lower than that of the second reflection characteristic map, the antibacterial surface of the amorphous alloy grating structure prepared by S1 is not contaminated, otherwise it is contaminated.
  • Embodiment 1 The difference between this embodiment and Embodiment 1 is that the alloy used is a stainless steel alloy, and other preparation steps and detection methods are the same as those of Embodiment 1, which will not be repeated here.
  • Embodiment 1 The difference between this embodiment and Embodiment 1 is that the alloy used is a titanium alloy, and other preparation steps and detection methods are the same as those of Embodiment 1, which will not be repeated here.
  • Morphology characterization The antibacterial surface of the amorphous alloy grating structure prepared in Example 1, the antibacterial surface of the stainless steel grating structure prepared in Example 4, and the antibacterial surface of the titanium alloy grating structure prepared in Example 5 were characterized by electron microscope scanning. As shown in FIG. 1, the present invention can prepare the antibacterial surface of amorphous alloy grating structure, antibacterial surface of stainless steel grating structure and antibacterial surface of titanium alloy grating structure with grating structure. all the same.
  • Reflectivity verification Select the surface with a complete grating structure in the antibacterial surface of the amorphous alloy grating structure prepared in Example 1 by scanning electron microscopy while ensuring that the surface is not polluted, and then use an ultraviolet spectrophotometer at 200 ⁇ The reflection characteristics of the surface were characterized under the incident light wavelength of 800 nm, and then the obtained reflection characteristics were compared with the reflection characteristics of the antibacterial surface of the amorphous alloy grating structure with an incomplete grating structure. The reflectivity comparison of the antibacterial surface of the crystalline alloy grating structure and the antibacterial surface of the amorphous alloy grating structure with a complete grating structure ( Figure 2).

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Abstract

一种光栅结构抗菌表面的检测方法，通过光栅结构抗菌表面在紫外分光光度计200～800nm入射波长条件下的光学特性，比较待检测光栅结构抗菌表面的反射率与已知具有不完整光栅结构的光栅结构抗菌表面的反射率和已知受污染的具有完整光栅结构的光栅结构抗菌表面的反射率，从而判断待检测光栅结构抗菌表面的瑕疵度和污染度。

Description

一种光栅结构抗菌表面的检测方法 技术领域
本发明涉及医疗器械技术领域，尤其是涉及一种光栅结构抗菌表面的检测方法。
背景技术
手术过程中难以避免的细菌污染，临床治疗过程中器械污染是导致感染的主要原因之一。对于植入手术来说，术后通常会发生植入体附近组织感染，重者会导致植入手术失败。目前，采用具有抗菌功能的医疗器械能有效降低临床治疗过程中的感染风险。其中，多项研究表明，在合金表面加工出亚微米尺度光栅结构可有效降低材料表面的细菌粘附率。
然而，当光栅结构抗菌表面出现结构瑕疵时，其在使用过程中仍容易粘附细菌，而现有技术仅是通过扫描电镜放大观察，众所周知扫描电镜操作复杂且设备昂贵，因此光栅结构抗菌表面并不便于快速检测出来，导致无法确保光栅结构抗菌表面的使用安全性。或是，光栅结构抗菌表面使用前是否受到污染，其也无法快速地检测出来，同样无法确保使用的安全性，造成了手术风险。
发明内容
本发明的目的在于避免现有技术中的不足之处而提供一种光栅结构抗菌表面的检测方法，该方法能快速方便地检测出光栅结构抗菌表面的是否有缺陷或是否受污染。
本发明的目的通过以下技术方案实现：
提供一种光栅结构抗菌表面的检测方法，包括以下步骤，
S1：预处理合金表面，制得光栅结构抗菌表面；
S2：获取已知具有不完整光栅结构的光栅结构抗菌表面，该表面为第一表面；和获取已知受污染的具有完整光栅结构的光栅结构抗菌表面，该表面为第二表面；采用紫外分光光度计在200～800nm的入射波长条件下分别表征第一表面的反射特性和第二表面的反射特性，制得第一表面的第一反射特性图和第二表面的第二反射特性图；
S3：采用紫外分光光度计在200～800nm的入射波长条件下，表征S1制得的光栅结构抗菌表面的反射特性，制得待比较反射特性图；
S4：将S3制得的待比较反射特性图与S2制得的第一反射特性图单独对比，当待比较反射特性图的反射率均低于第一反射特性图的反射率时，则S1制得的光栅结构抗菌表面为完整光栅结构表面，反之则是有缺陷的不完整光栅结构表面；将S3制得的待比较反射特性图与S2制得的第二反射特性图单独对比，当待比较反射特性图的反射率均低于第 二反射特性图的反射率时，则S1制得的光栅结构抗菌表面没有受污染，反之则受污染。
进一步地，所述S1包括以下步骤：
S11：对合金表面进行抛光；
S12：采用激光辐射S11抛光后的合金表面，制得合金光栅结构表面；
S13：先采用无水乙醇超声清洗S12制得的合金光栅结构表面，然后采用去离子水对合金光栅结构表面进行清洗，制得光栅结构抗菌表面。
进一步地，所述S11中，抛光后的合金表面的粗糙度Ra<0.1μm。
进一步地，采用0.25～0.5μm粒度的金刚石抛光磨粒，然后在1.5～5m/s线速度，0.3～2.3MPa压强条件下对合金表面进行抛光，抛光时间是30min。
进一步地，所述S12中，采用超快激光单次或多次辐射抛光后的合金表面，所述超快激光的波长为200～1200nm，脉宽是<10ps，频率是1～100kHz，功率是0.1～50W，扫描速度是10～2000mm/s。
进一步地，所述S13中，乙醇的清洗时间是5～20min，去离子水的清洗时间是5～20min。
进一步地，所述S2中，所述第二表面通过扫描电子显微镜观察从而选择并获得具有完整光栅结构的第二表面。
进一步地，所述合金是非晶合金、不锈钢合金和钛合金。
上述方案的原理：利用了光射入完整无污染光栅结构抗菌表面时，激发的等离子体激元可使入射光在金属-电介质界面附件光吸收率增加，形成局域场效应，因而不同偏振态、不同波长的光在光栅表面不同入射角度的反射特性会产生差异，形成对光的过滤反射率较低，而当光栅结构抗菌表面出现瑕疵或者光栅结构抗菌表面存在污染物粘附时，其光反射特性会受到影响，进而表现为光反射率较大，本发明正是通过比较所检测到的光栅结构抗菌表面发射率来判断待检测光栅结构抗菌表面的质量。
本发明的一种光栅结构抗菌表面的检测方法的有益效果：
(1)本发明利用光栅结构抗菌表面在紫外分光光度计200～800nm入射波长条件下的光学特性，通过比较待检测光栅结构抗菌表面的反射率与已知具有不完整光栅结构的光栅结构抗菌表面的反射率和已知受污染的具有完整光栅结构的光栅结构抗菌表面的反射率，从而判断待检测光栅结构抗菌表面的瑕疵度和污染度。
(2)本发明通过检测光栅结构抗菌表面的反射率变化，能够快速地检测加工后的光栅结构抗菌表面是否具有不完整结构，或者快速检测具有完整光栅结构的光栅结构抗菌表面在使用前是否受污染，大大提升医疗器械安全性，克服了传统方法无法快速检测光 栅结构抗菌表面结构性和污染度的问题。
附图说明
利用附图对发明作进一步说明，但附图中的实施例不构成对本发明的任何限制，对于本领域的普通技术人员，在不付出创造性劳动的前提下，还可以根据以下附图获得其它的附图。
图1是非晶合金光栅结构抗菌表面、不锈钢光栅结构抗菌表面和钛合金光栅结构抗菌表面的形貌对比图；
图2是具有不完整光栅结构的非晶合金光栅结构抗菌表面与具有完整光栅结构的非晶合金光栅结构抗菌表面的反射率对比图；
图3是受污染后的具有完整光栅结构的非晶合金光栅结构抗菌表面与受污染前的具有完整光栅结构的非晶合金光栅结构抗菌表面的反射率对比图。
具体实施方式
结合以下实施例和附图对本发明作进一步描述。
实施例1
本实施例公开非晶合金光栅结构抗菌表面的检测方法，包括以下步骤，
S1：制备非晶合金光栅结构抗菌表面，该步骤包括：
S11：采用0.5μm粒度的金刚石抛光磨粒，然后在1.5m/s线速度，0.3MPa压强条件下对非晶合金表面进行抛光，抛光时间是30min，抛光后的非晶合金表面的粗糙度Ra<0.1μm；
S12：采用超快激光单次或多次辐射S11抛光后的非晶合金表面，其中所述超快激光的波长为200nm，脉宽是100fs，频率是1kHz，功率是0.1W，扫描速度是10mm/s，制得非晶合金光栅结构表面；
S13：先采用无水乙醇超声清洗S12制得的非晶合金光栅结构表面，然后采用去离子水对非晶合金光栅结构表面进行清洗，其中，乙醇的清洗时间是5min，去离子水的清洗时间是5min，制得非晶合金光栅结构抗菌表面。
S2：获取已知具有不完整光栅结构的非晶合金光栅结构抗菌表面，该表面为第一表面；和获取已知受污染的具有完整光栅结构的非晶合金光栅结构抗菌表面，该表面为第二表面；采用紫外分光光度计在200～800nm的入射波长条件下分别表征第一表面的反射特性和第二表面的反射特性，制得第一表面的第一反射特性图和第二表面的第二反射特性图；
S3：采用紫外分光光度计在200～800nm的入射波长条件下，表征S1制得的非晶合 金光栅结构抗菌表面的反射特性，制得待比较反射特性图；
S4：将S3制得的待比较反射特性图与S2制得的第一反射特性图单独对比，当待比较反射特性图的反射率均低于第一反射特性图的反射率时，则S1制得的非晶合金光栅结构抗菌表面为完整光栅结构表面，反之则是有缺陷的光栅结构表面；将S3制得的待比较反射特性图与S2制得的第二反射特性图单独对比，当待比较反射特性图的反射率均低于第二反射特性图的反射率时，则S1制得的非晶合金光栅结构抗菌表面没有受污染，反之则受污染。
实施例2
本实施例公开非晶合金光栅结构抗菌表面的检测方法，包括以下步骤，
S1：制备非晶合金光栅结构抗菌表面，该步骤包括：
S11：采用0.25μm粒度的金刚石抛光磨粒，然后在5m/s线速度，2.3MPa压强条件下对非晶合金表面进行抛光，抛光时间是30min，抛光后的非晶合金表面的粗糙度Ra<0.1μm；
S12：采用超快激光单次或多次辐射S11抛光后的非晶合金表面，其中所述超快激光的波长为1200nm，脉宽是300fs，频率是100kHz，功率是50W，扫描速度是2000mm/s，制得非晶合金光栅结构表面；
S13：先采用无水乙醇超声清洗S12制得的非晶合金光栅结构表面，然后采用去离子水对非晶合金光栅结构表面进行清洗，其中，乙醇的清洗时间是20min，去离子水的清洗时间是20min，制得非晶合金光栅结构抗菌表面。
S2：获取已知具有不完整光栅结构的非晶合金光栅结构抗菌表面，该表面为第一表面；和获取已知受污染的具有完整光栅结构的非晶合金光栅结构抗菌表面，该表面为第二表面；采用紫外分光光度计在200～800nm的入射波长条件下分别表征第一表面的反射特性和第二表面的反射特性，制得第一表面的第一反射特性图和第二表面的第二反射特性图；
S3：采用紫外分光光度计在200～800nm的入射波长条件下，表征S1制得的非晶合金光栅结构抗菌表面的反射特性，制得待比较反射特性图；
S4：将S3制得的待比较反射特性图与S2制得的第一反射特性图单独对比，当待比较反射特性图的反射率均低于第一反射特性图的反射率时，则S1制得的非晶合金光栅结构抗菌表面为完整光栅结构表面，反之则是有缺陷的光栅结构表面；将S3制得的待比较反射特性图与S2制得的第二反射特性图单独对比，当待比较反射特性图的反射率均低于 第二反射特性图的反射率时，则S1制得的非晶合金光栅结构抗菌表面没有受污染，反之则受污染。
实施例3
本实施例公开非晶合金光栅结构抗菌表面的检测方法，包括以下步骤，
S1：制备非晶合金光栅结构抗菌表面，该步骤包括：
S11：采用0.3μm粒度的金刚石抛光磨粒，然后在2.5m/s线速度，0.9MPa压强条件下对非晶合金表面进行抛光，抛光时间是30min，抛光后的非晶合金表面的粗糙度Ra<0.1μm；
S12：采用超快激光单次或多次辐射S11抛光后的非晶合金表面，其中所述超快激光的波长为800nm，脉宽是500fs，频率是50kHz，功率是1W，扫描速度是100mm/s，制得非晶合金光栅结构表面；
S13：先采用无水乙醇超声清洗S12制得的非晶合金光栅结构表面，然后采用去离子水对非晶合金光栅结构表面进行清洗，其中，乙醇的清洗时间是10min，去离子水的清洗时间是10min，制得非晶合金光栅结构抗菌表面。
S2：获取已知具有不完整光栅结构的非晶合金光栅结构抗菌表面，该表面为第一表面；和获取已知受污染的具有完整光栅结构的非晶合金光栅结构抗菌表面，该表面为第二表面；采用紫外分光光度计在200～800nm的入射波长条件下分别表征第一表面的反射特性和第二表面的反射特性，制得第一表面的第一反射特性图和第二表面的第二反射特性图；
S3：采用紫外分光光度计在200～800nm的入射波长条件下，表征S1制得的非晶合金光栅结构抗菌表面的反射特性，制得待比较反射特性图；
S4：将S3制得的待比较反射特性图与S2制得的第一反射特性图单独对比，当待比较反射特性图的反射率均低于第一反射特性图的反射率时，则S1制得的非晶合金光栅结构抗菌表面为完整光栅结构表面，反之则是有缺陷的光栅结构表面；将S3制得的待比较反射特性图与S2制得的第二反射特性图单独对比，当待比较反射特性图的反射率均低于第二反射特性图的反射率时，则S1制得的非晶合金光栅结构抗菌表面没有受污染，反之则受污染。
实施例4
本实施例与实施例1的不同之处在于，所用的合金是不锈钢合金，其他制备步骤和检测方法均匀实施例1相同，此处不再赘述。
实施例5
本实施例与实施例1的不同之处在于，所用的合金是钛合金，其他制备步骤和检测方法均匀实施例1相同，此处不再赘述。
性能测试
形貌表征：分别对实施例1制得的非晶合金光栅结构抗菌表面与实施例4制得的不锈钢光栅结构抗菌表面和实施例5制得的钛合金光栅结构抗菌表面进行电镜扫描表征，由图1所示，本发明能制备出具有光栅结构的非晶合金光栅结构抗菌表面、不锈钢光栅结构抗菌表面和钛合金光栅结构抗菌表面，其中，由于合金材质不同，所制备出的光栅结构也不尽相同。
反射率验证：通过扫描电镜选择出实施例1制得的非晶合金光栅结构抗菌表面中具有完整光栅结构的表面同时确保该表面不受污染，然后将该表面通过使用紫外分光光度计在200～800nm入射光波长下表征该表面的反射特性，接着将所得的反射特性与具有不完整光栅结构的非晶合金光栅结构抗菌表面的反射特性比较，得到图2所示的具有不完整光栅结构的非晶合金光栅结构抗菌表面与具有完整光栅结构的非晶合金光栅结构抗菌表面的反射率对比图(图2)。同时，将上述表征实施例1的非晶合金光栅结构抗菌表面的反射特性图与受污染的具有完整光栅结构的非晶合金光栅结构抗菌表面的反射特性比较，得到图3所示的受污染后的具有完整光栅结构的非晶合金光栅结构抗菌表面与受污染前的具有完整光栅结构的非晶合金光栅结构抗菌表面的反射率对比图(图3)。
由图1和图2可见，具有完整结构的非晶合金光栅结构抗菌表面的反射率均低于光栅结构不完整或受污染后的非晶合金光栅结构抗菌表面的反射率，因此，通过紫外分光光度计来比较反射率能快速地检测出非晶合金光栅结构抗菌表面的完整度以及受污染度，极大提高了非晶合金光栅结构医疗器械的使用安全性。
最后应当说明的是，以上实施例仅用以说明本发明的技术方案，而非对本发明保护范围的限制，尽管参照较佳实施例对本发明作了详细地说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或者等同替换，而不脱离本发明技术方案的实质和范围最后应当说明的是，以上实施例仅用以说明本发明的技术方案，而非对本发明保护范围的限制，尽管参照较佳实施例对本发明作了详细地说明，本领域的普通技术人员应当理解，可以对本发明的技术方案进行修改或者等同替换，而不脱离本发明技术方案的实质和范围。

Claims (8)

  1. 一种光栅结构抗菌表面的检测方法，其特征在于：包括以下步骤，
    S1：预处理合金表面，制得光栅结构抗菌表面；
    S2：获取已知具有不完整光栅结构的光栅结构抗菌表面，该表面为第一表面；和获取已知受污染的具有完整光栅结构的光栅结构抗菌表面，该表面为第二表面；采用紫外分光光度计在200～800nm的入射波长条件下分别表征第一表面的反射特性和第二表面的反射特性，制得第一表面的第一反射特性图和第二表面的第二反射特性图；
    S3：采用紫外分光光度计在200～800nm的入射波长条件下，表征S1制得的光栅结构抗菌表面的反射特性，制得待比较反射特性图；
    S4：将S3制得的待比较反射特性图与S2制得的第一反射特性图单独对比，当待比较反射特性图的反射率均低于第一反射特性图的反射率时，则S1制得的光栅结构抗菌表面为完整光栅结构表面，反之则是有缺陷的不完整光栅结构表面；将S3制得的待比较反射特性图与S2制得的第二反射特性图单独对比，当待比较反射特性图的反射率均低于第二反射特性图的反射率时，则S1制得的光栅结构抗菌表面没有受污染，反之则受污染。
  2. 根据权利要求1所述的合金的光栅抗菌表面的制造方法，其特征在于：所述S1包括以下步骤：
    S11：对合金表面进行抛光；
    S12：采用激光辐射S11抛光后的合金表面，制得合金光栅结构表面；
    S13：先采用无水乙醇超声清洗S12制得的合金光栅结构表面，然后采用去离子水对合金光栅结构表面进行清洗，制得光栅结构抗菌表面。
  3. 根据权利要求2所述的合金的光栅抗菌表面的制造方法，其特征在于：所述S11中，抛光后的合金表面的粗糙度Ra<0.1μm。
  4. 根据权利要求3所述的合金的光栅抗菌表面的制造方法，其特征在于：采用0.25～0.5μm粒度的金刚石抛光磨粒，然后在1.5～5m/s线速度，0.3～2.3MPa压强条件下对合金表面进行抛光，抛光时间是30min。
  5. 根据权利要求2所述的合金的光栅抗菌表面的制造方法，其特征在于：所述S12中，采用超快激光单次或多次辐射抛光后的合金表面，所述超快激光的波长为200～1200nm，脉宽是<10ps，频率是1～100kHz，功率是0.1～50W，扫描速度是10～2000mm/s。
  6. 根据权利要求2所述的合金的光栅抗菌表面的制造方法，其特征在于：所述S13中，乙醇的清洗时间是5～20min，去离子水的清洗时间是5～20min。
  7. 根据权利要求1所述的合金的光栅抗菌表面的制造方法，其特征在于：所述S2中，所述第二表面通过扫描电子显微镜观察从而选择并获得具有完整光栅结构的第二表面。
  8. 根据权利要求1所述的合金的光栅抗菌表面的制造方法，其特征在于：所述合金是非晶合金、不锈钢合金和钛合金。
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