WO2022168275A1 - ボンディング装置及びボンディング方法 - Google Patents
ボンディング装置及びボンディング方法 Download PDFInfo
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- WO2022168275A1 WO2022168275A1 PCT/JP2021/004389 JP2021004389W WO2022168275A1 WO 2022168275 A1 WO2022168275 A1 WO 2022168275A1 JP 2021004389 W JP2021004389 W JP 2021004389W WO 2022168275 A1 WO2022168275 A1 WO 2022168275A1
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- 238000000034 method Methods 0.000 title claims description 29
- 238000004364 calculation method Methods 0.000 claims abstract description 17
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000006073 displacement reaction Methods 0.000 claims description 18
- 239000000758 substrate Substances 0.000 description 21
- 230000007246 mechanism Effects 0.000 description 13
- 238000012545 processing Methods 0.000 description 12
- 238000012937 correction Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 230000032683 aging Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
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- 238000004904 shortening Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
Definitions
- the present invention relates to a bonding apparatus and bonding method.
- a first chip position calculation is performed in which an image of the top surface of a reference chip and an image of the bottom surface of a correction chip are acquired by a two-view camera, and each position of each chip is calculated.
- the reference chip is moved to a position where the separation distance between the chips is a predetermined offset amount based on the process and the amount of deviation between the chips calculated from each position of each chip, the correction chip is moved to the suction stage.
- This mounting method suppresses displacement of the mounting position of the chip over time by calculating the amount of change (correction amount) for a predetermined offset distance.
- Patent Document 1 it is necessary to perform a plurality of steps in order to calculate the amount of change in the offset distance, so it takes time to calculate the amount of change in the offset distance. .
- the present invention has been made in view of such circumstances, and one of its objects is to provide a bonding apparatus and a bonding method capable of shortening the processing time for calculating the amount of change in the offset distance.
- a bonding apparatus includes a movable bonding head unit, a first camera installed with an optical system directed to one side, and a bonding apparatus arranged with an offset distance from the first camera.
- the offset distance is determined based on the predetermined distance, the position of the reference mark detected by the first camera, and the position of the chip detected by the second camera. and a calculation unit that calculates the amount of change.
- the bonding head moves such that the reference mark is placed within the field of view of the first camera and the chip held by the bonding tool is placed within the field of view of the second camera. Then, the amount of change in the offset distance is calculated based on the predetermined distance, the position of the reference mark detected by the first camera, and the position of the chip detected by the second camera. This makes it possible to calculate the amount of change in the offset distance while simultaneously detecting the position of the reference mark and the position of the chip held by the bonding tool. Therefore, the processing time for calculating the amount of change in the offset distance can be shortened as compared with the conventional bonding apparatus that sequentially performs reference mark detection and chip detection in different steps.
- the calculator detects the position of the reference mark based on the first image captured by the first camera, and detects the position of the chip based on the second image captured by the second camera. You may
- the calculator may measure the displacement amount of the reference mark with respect to the first camera based on the first image, and measure the displacement amount of the chip with respect to the second camera based on the second image.
- the above-described bonding apparatus may further include a movement controller that controls movement of the bonding head, and that determines the amount of movement of the bonding head based on the calculated amount of change in the offset distance. good.
- the second camera and the reference member may be integrated.
- the predetermined distance may be set based on the offset distance.
- a bonding method is a movable bonding head unit, a first camera installed with an optical system facing one side, and an offset distance from the first camera.
- a bonding head holding a bonding tool, a second camera installed with an optical system facing the other side so that the bonding head can be photographed, and a reference mark on the other side surface, and a reference member fixed at a position spaced a predetermined distance from two cameras, wherein the first camera detects the position of the reference mark and the second camera performs bonding detecting the position of the chip held by the tool; calculating the amount of change in the offset distance based on the predetermined distance, the detected position of the reference mark, and the detected position of the chip; including.
- the bonding head moves such that the reference mark is placed within the field of view of the first camera and the chip held by the bonding tool is placed within the field of view of the second camera. Then, the amount of change in the offset distance is calculated based on the predetermined distance, the position of the reference mark detected by the first camera, and the position of the chip detected by the second camera. This makes it possible to calculate the amount of change in the offset distance while simultaneously detecting the position of the reference mark and the position of the chip held by the bonding tool. Therefore, the processing time for calculating the amount of change in the offset distance can be shortened compared to the conventional bonding apparatus that sequentially performs the reference mark detection and the chip detection in different steps.
- the processing time for calculating the amount of change in the offset distance can be shortened.
- FIG. 1 is a side view showing a schematic configuration of a bonding apparatus according to one embodiment.
- 2 is a side view showing the positional relationship between the bonding tool and the top camera shown in FIG. 1.
- FIG. 3 is a side view showing an example of the positional relationship between the bottom camera and the reference member shown in FIG. 1.
- FIG. 4 is a side view showing another example of the positional relationship between the bottom camera 28 and the reference member shown in FIG.
- FIG. 5 is a conceptual diagram showing the arrangement of the bonding head section, bottom camera, and reference member of the bonding apparatus according to one embodiment.
- FIG. 6 is a schematic diagram showing a first image taken by the top camera shown in FIG. 7 is a schematic diagram showing a second image captured by the bottom camera shown in FIG. 5.
- FIG. FIG. 8 is a flow chart for explaining a bonding method in one embodiment.
- FIG. 1 is a side view showing a schematic configuration of a bonding apparatus 100 according to one embodiment.
- FIG. 2 is a side view showing the positional relationship between the bonding tool 22 and top camera 24 shown in FIG. 3 is a side view showing an example of the positional relationship between the bottom camera 28 and the reference member 30 shown in FIG. 1.
- FIG. 4 is a side view showing another example of the positional relationship between the bottom camera 28 and the reference member 30 shown in FIG. 1.
- the bonding apparatus 100 includes a wafer holding section 12, a handling unit 14, a bonding head section 20, an XY table 26, a bottom camera 28, a reference member 30, a bonding stage section 40, and a bonding control unit 60 .
- the direction parallel to the surface to be bonded is defined as the XY-axis direction
- the direction perpendicular to the surface to be bonded is defined as the Z-axis direction.
- the bonding apparatus 100 is a semiconductor manufacturing apparatus for bonding the chip 72 (also called "die") of the wafer 70 to the substrate 80.
- the chip 72 has a front surface with an integrated circuit pattern and a back surface opposite to the front surface.
- the bonding apparatus 100 described below aligns the chip 72 with the mounting portion of the substrate 80 and bonds the chip 72 to the substrate 80 so that the rear surface of the chip 72 faces the substrate 80 .
- Such a bonding apparatus 100 is called a die bonding apparatus.
- the wafer holder 12 is configured to hold a wafer 70 transferred by a wafer transfer tool (not shown) or the like.
- Wafer 70 includes a plurality of chips 72 that are diced into a grid and cut into small pieces.
- the wafer holder 12 holds the plurality of chips 72 by, for example, vacuum-sucking the wafer 70 or attaching the wafer 70 to a film.
- Each chip 72 of the wafer 70 held by the wafer holding part 12 is bonded to the substrate 80 .
- the chip 72 is picked up from the wafer 70 by the handling unit 14, for example, and the reverse side of the handling unit 14, which is to be connected to the substrate, faces upward.
- the inverted chip 72 is transferred to the bonding tool 22 .
- the handling unit 14 includes a stepping motor 15, a rotating shaft 16, an arm 17, a base 18, and a pickup tool 19.
- the stepping motor 15 is a reversing drive mechanism that rotates the rotary shaft 32 to reverse the base 18 and the hip-up nozzle 19 .
- the arm 17 has one end attached to the rotating shaft 16, extends obliquely downward in the Z-axis direction from the rotating shaft 16, and has the other end attached to the upper surface 18a of the base 18 in the Z-axis direction.
- the base 18 is a plate-like member fixed to the tip of the arm 17 with a bolt or the like.
- a pick-up tool 19 is attached to the lower surface 18b of the base 18 in the Z-axis direction.
- the pick-up tool 19 is movable in the Z-axis direction by a Z-axis driving mechanism (not shown).
- the handling unit 14 shown in FIG. 1 shows a state in which the pickup tool 19 faces downward, that is, the upper surface 18a of the base 18 faces upward in the Z-axis direction.
- the handling unit 14 is moved above the wafer holder 12, and the chips 72 are pushed up through the film from below the wafer holder 12, and the pickup tool 14 picks up the chips 72 on the film from above. , chips 72 are picked up by the pick-up tool 14 of the handling unit 14 .
- the rotating shaft 32 is rotated by the stepping motor 15 and the base 18 and the hip-up nozzle 19 are reversed, the bottom surface 18b of the base 18 faces upward in the Z direction, and the pickup nozzle 19 also faces upward. Thereby, the handling unit 14 can reverse the picked up chip 72 .
- the bonding head section 20 is configured to suck the inverted chip 72 picked up from the wafer holding section 12 and transport it to the bonding position of the substrate 80 to bond the chip 72 to the substrate 80 .
- the bonding head section 20 holds a bonding tool 22 and a top camera 24 .
- a bonding tool 22 is attached to the bonding head 20 via a Z-axis drive mechanism 21
- a top camera 24 is attached at a position away from the bonding tool 22 .
- the bonding head section 20 is movable in the X-axis direction and the Y-axis direction by the XY table 26, thereby moving the bonding tool 22 and the top camera 24 in at least one of the X-axis direction and the Y-axis direction.
- the bonding apparatus 100 is not limited to having one bonding head portion 20 .
- the bonding apparatus 100 may have multiple bonding head units 20 . In this case, by providing a plurality of bonding head portions, bonding can be performed on a plurality of substrates in parallel.
- the bonding tool 22 is, for example, a collet that holds the chip 72 by suction.
- a collet has a rectangular parallelepiped shape or a truncated cone shape and is configured to contact and hold the outer edge of the chip 72 from the surface side of the chip 72 on which the integrated circuit pattern is formed.
- the collet, which is the bonding tool 22 has a central axis parallel to the Z-axis direction, and can be moved in the Z-axis direction, the X-axis direction, and the Y-axis direction by the Z-axis drive mechanism 21 and the XY table 26, respectively. It has become.
- the bonding tool 22 is attached to the bonding head portion 20 via a ⁇ -axis drive mechanism and a tilt drive mechanism (not shown), and is movable around the Z-axis and in a tilt direction (inclination direction) by these drive mechanisms.
- the top camera 24 is configured to acquire image information of the reference member 30 fixed to the bottom camera 28 .
- the top camera 24 is, for example, a digital camera that includes an optical system such as a lens, and an imaging device such as a CCD (Charge Coupled Device) image sensor or a CMOS (Complementary Metal Oxide Semiconductor) image sensor.
- the top camera 24 is arranged with its optical system directed to one side, ie, the Z-axis negative direction side in FIG. 1, and has an optical axis directed downward in the vertical direction.
- the bonding tool 22 is arranged with an offset distance ODd from the top camera 24 in the bonding head section 20 . More specifically, the bonding tool 22 and the top camera 24 are arranged such that the center axis CA1 of the bonding tool 22 in the Y-axis direction and the optical axis OA1 of the top camera 24 are separated by an offset distance ODd. .
- the distance between the bonding tool and the top camera may change due to temperature changes and aging. If the offset distance changes from the offset distance ODd, which is a predetermined reference distance, an error corresponding to the amount of change will occur, resulting in, for example, a decrease in the accuracy of the bonding position to the substrate.
- a method such as adding a process for obtaining the amount of change in the offset distance before the bonding process is adopted.
- a method such as adding a process for obtaining the amount of change in the offset distance before the bonding process is adopted.
- such a method involves the addition of a new step, so there is a risk that it will take a long time to obtain the amount of change in the offset distance.
- the bottom camera 28 is configured to acquire image information of the bonding tool 22.
- the bottom camera 28, like the top camera 24, is a digital camera including, for example, an optical system and an imaging device.
- the bottom camera 28 is arranged with its optical system facing the other side, ie, the positive direction of the Z axis in FIG. 1, and has an optical axis pointing upward in the vertical direction.
- the bottom camera 28 is arranged to face the bonding tool 22 and the top camera 24 so that the bottom surface (tip surface) of the bonding tool 22 can be photographed.
- the bottom camera 28 is installed at a position where the bottom surface of the bonding tool 22 around the bonding stage section 40 can be imaged.
- the reference member 30 is a reference member when calculating the amount of change in the offset distance ODd between the bonding tool 22 and the top camera 24 . Calculation of the amount of change in the offset distance ODd will be described later.
- the bottom camera 28 is provided and fixed on a fixed member or reference member.
- the reference member 30 is fixed at a position spaced apart from the bottom camera 28 by a predetermined distance PD. More specifically, a support member 31 provided on a fixed member or reference member is fixed at a position away from the bottom camera 28 in the Y-axis direction. The reference member 30 is supported by this support member 31 .
- the bottom camera 28 and the reference member 30 are arranged such that the optical axis OA2 of the bottom camera 28 and the center axis CA2 of the reference member 30 in the Y-axis direction are separated by a predetermined distance PD.
- the predetermined distance PD between the bottom camera 28 and the reference member 30 is different from the offset distance described above, and is affected by changes in temperature, aging, etc. or their influence is so small that it can be ignored. Therefore, the predetermined distance PD can be regarded as unchanged (invariant).
- the reference member 30 has a reference mark 32 on the bonding head 20 side surface (upper surface in FIG. 3). It is arranged at such a height that it becomes
- the shape of the reference mark 32 is not particularly limited as long as the position and orientation within the field of view of the top camera 24 can be recognized. Therefore, the reference mark 32 may be, for example, a rectangular mark composed of a rectangular block, or a cross-shaped mark composed of a cross-shaped groove (hole) formed in the rectangular block.
- FIG. 3 shows an example in which the bottom camera 28 and the reference member 30 are separate members
- the present invention is not limited to this.
- the support member 31 extends from the bottom camera 28 along the Y-axis direction, and may be a member that connects the bottom camera 28 and the reference member 30 .
- the bottom camera 28 and the reference member 30 are integrally constructed as one member. Thereby, the reference member 30 can be easily fixed at a position separated from the bottom camera 28 by the predetermined distance PD.
- the predetermined distance PD between the bottom camera 28 and the reference member 30 is preferably set based on the offset distance ODd described above.
- the predetermined distance PD between the bottom camera 28 and the reference member 30 is set based on the offset distance ODd described above, so that the predetermined distance PD is set to the same value as the offset distance ODd, for example.
- the bonding stage section 40 is a stage for bonding the chip 72 to the mounting section of the substrate 80 .
- the bonding stage section 40 is provided with a moving mechanism (not shown) for moving the substrate 80 in at least one of the X-axis direction and the Y-axis direction, a heater (not shown) for heating the substrate 80, and the like. These are controlled by the bonding controller 60 .
- the bonding control unit 60 is configured to control the bonding apparatus 100 as a whole. More specifically, the bonding control section 60 is configured to control processes necessary for bonding by the bonding apparatus 100 . Specifically, the bonding control section 60 includes controlling the bonding processing by the bonding head section 20, the exchange processing of the wafer 70 held by the wafer holding section 12, the transfer processing of the chip 72 and the substrate 80, and the like. . The bonding control unit 60 is connected to each component of the bonding apparatus 100 so as to be able to transmit and receive signals to the extent necessary for these processes, and controls the operation of each component.
- the bonding control unit 60 is a computer device including, for example, a microprocessor (not shown) such as a CPU (Central Processing Unit), and a memory (not shown) such as a ROM (Read Only Memory) and a RAM (Random Access Memory). be.
- the memory stores in advance a bonding program for performing processing necessary for bonding and other necessary information.
- the bonding control unit 60 has, for example, a program for causing a computer to execute each process, and is configured to be able to execute each process related to the bonding method described later.
- the bonding control unit 60 also includes a calculation unit 61 and a movement control unit 62 as functional blocks.
- the calculation unit 61 moves the bonding head unit so that the reference mark 32 is placed within the field of view of the top camera 24 and the chip 72 held by the bonding tool 22 is placed within the field of view of the bottom camera 28. Sometimes, it is configured to calculate the amount of change in the offset distance. Although the details will be described later, the calculator 61 calculates the amount of change in the offset distance from the predetermined distance PD, the position of the reference mark 32 detected by the top camera 24, and the position of the tip 72 detected by the bottom camera 28. is configured to be calculated based on As a result, the amount of change in the offset distance can be calculated while simultaneously detecting the position of the reference mark 32 and the position of the chip 72 held by the bonding tool 22 . Therefore, the processing time for calculating the amount of change in the offset distance can be shortened compared to a conventional bonding apparatus that sequentially detects the reference mark 32 and the chip 72 in different steps.
- the movement control section 62 is configured to control movement of the bonding head section 20 . More specifically, the movement control section 62 is configured to determine the amount of movement of the bonding head section 20 based on the calculated amount of change in the offset distance. As a result, the bonding head section 20 can be moved by a movement amount corrected in consideration of the calculated amount of change in the offset distance. Therefore, the accuracy of the bonding position of the chip 72 held by the bonding tool 22 can be improved.
- FIG. 1 shows some of the functional blocks necessary for bonding in this embodiment. Therefore, the bonding control unit 60 may have functional blocks other than those shown in FIG.
- FIG. 5 is a conceptual diagram showing the arrangement of the bonding head section 20, the bottom camera 28, and the reference member 30 of the bonding apparatus 100 according to one embodiment.
- FIG. 6 is a schematic diagram showing the first image g1 captured by the top camera 24 shown in FIG.
- FIG. 7 is a schematic diagram showing the second image g2 captured by the bottom camera 28 shown in FIG.
- the center axis CA2 of the reference member 30 in the Y-axis direction coincides with the bonding tool 22 directly above the bottom camera 28, that is, the optical axis OA2 of the bottom camera 28 and the center axis CA1 of the bonding tool 22 in the Y-axis direction. are aligned with each other, the bonding head portion 20 is moved.
- the offset distance changes due to heat, aging, etc.
- the bonding control unit 60 drives the top camera 24 to photograph the reference member 30 within the field of view. Then, the first image g1 is acquired, and the bottom camera 28 is driven to photograph the chip 72 held by the bonding tool 22 within the field of view, thereby acquiring the second image g2.
- the bonding control unit 60 captures the first image in a state where the amount of deviation ⁇ mk does not occur, detects the position of the reference mark 32, and stores the position of the reference mark 32 in the first image in advance. back. Then, the calculation unit 61 can measure the shift amount ⁇ mk of the reference mark 32 with respect to the top camera 24 by analyzing the first image g1 based on the stored position of the reference mark 32 .
- the bonding control unit 60 captures the second image in a state where the deviation amount ⁇ bh does not occur, detects the position of the chip 72 held by the bonding tool 22, and detects the position of the chip 72 in the second image. be memorized in advance. Then, the calculator 61 can measure the shift amount ⁇ bh of the chip 72 with respect to the bottom camera 28 by analyzing the second image g2 based on the stored position of the chip 72 .
- the calculation unit 61 calculates the displacement amount ⁇ mk of the reference member 30 with respect to the top camera 24 measured based on the predetermined distance PD and the first image g1, and the deviation amount ⁇ mk with respect to the bottom camera 28 measured based on the second image g2. Based on the shift amount ⁇ bh of the tip 72, the change amount ⁇ od of the offset distance is calculated.
- the position of the reference mark 32 is detected based on the first image g1 captured by the top camera 24, and the chip held by the bonding tool 22 is detected based on the second image g2 captured by the bottom camera 28.
- the positions of the reference mark 32 and the tip 72 can be easily detected.
- the amount of change ⁇ od in the offset distance can be easily calculated.
- the movement control unit 62 determines the amount of movement of the bonding head unit 20 based on the calculated change amount ⁇ od of the offset distance. More specifically, the movement control section 62 determines the actual amount of movement of the bonding head section 20 so that the movement distance including the change amount ⁇ od of the offset distance is equal to the original movement amount of the bonding head section 20. . For example, when the change amount ⁇ od of the offset distance is a positive value, the movement control unit 62 determines the movement amount of the bonding head unit 20 to be a value obtained by subtracting the change amount ⁇ od from the original movement amount. On the other hand, if the offset distance change amount ⁇ od is a negative value, the movement control unit 62 determines the movement amount of the bonding head unit 20 to be a value obtained by adding the change amount ⁇ od to the original movement amount.
- the calculation unit 61 measures the displacement amount of the reference mark 32 and the displacement amount of the tip 72 along the X-axis direction in addition to the Y-axis direction, and calculates the amount of change in the offset distance along the X-axis direction.
- the calculator 61 measures the amount of deviation (angle of deviation) of the reference mark 32 and the amount of deviation (angle of deviation) of the tip 72, and calculates the offset distance with respect to the Z-axis.
- the amount of change in inclination (change angle) may be calculated.
- the first image g1 and the second image g2 are not limited to being obtained by temporarily stopping the bonding head section 20 at the position shown in FIG.
- the bonding control unit 60 may acquire the first image g1 and the second image g2 when the movement control unit 62 moves the bonding head unit 20 to the position shown in FIG.
- FIG. 8 is a flow chart for explaining a bonding method in one embodiment.
- the bonding method in this embodiment can be performed using the bonding apparatus 100 described above.
- the bonding control unit 60 executes the bonding process S100 shown in FIG. That is, first, the movement control unit 62 moves the bonding head unit 20 to place the bonding tool 22 at a position right above the handling unit 14 in which the picked up chip 72 is inverted (S101). At this position, the bonding control unit 60 drives the Z-axis drive mechanism 21 to lower the bonding tool 22, and the tip of the bonding tool 22 sucks and holds the chip 72 (S102). After sucking and holding the chip 72 in step S102, the bonding control unit 60 drives the Z-axis drive mechanism 21 to raise the bonding tool 22 to a prescribed height.
- the movement control section 62 moves the bonding head section 20 so that the reference member 30 is placed within the field of view of the top camera 24 and the chip 72 held by the bonding tool 22 is within the field of view of the bottom camera 28. Place them (S103).
- the bonding control unit 60 uses the top camera 24 to photograph the reference mark 32 of the reference member 30 within the field of view, acquires the first image g1, and uses the bottom camera 28 to photograph the reference mark 32 within the field of view.
- a second image g2 is obtained by photographing the chip 72 held by the bonding tool 22 (S104).
- the first image g1 and the second image g2 acquired in step S104 are stored in a memory or the like.
- the bonding control unit 60 drives the Z-axis drive mechanism 21 to move the bonding tool 22 holding the chip 72 within the depth of field of the bottom camera 28. You can lower it with . In this case, since the bonding tool 22 holding the chip 72 is photographed in a lowered state, the displacement amount of the chip 72 caused by the movement in the Z-axis direction by the Z-axis drive mechanism 21 is measured when measuring the displacement amount described later. can include
- the bonding control unit 60 may determine the quality of the chip 72 based on the second image g2. As a result of the image analysis of the second image g2, if it can be determined that the chip 72 has a defect such as a crack, the bonding control unit 60 stops bonding the chip 72 in question.
- the calculator 61 detects the position of the reference mark 32 on the reference member 30 based on the first image g1 acquired in step S104, and calculates the position of the bonding tool 22 based on the second image g2 acquired in step S105. is detected (S105).
- the calculation unit 61 measures the shift amount ⁇ mk of the reference mark 32 with respect to the top camera 24 based on the position of the reference mark 32 detected in step S106, and based on the position of the tip 72 detected in step S107. , the amount of deviation ⁇ bh of the chip 72 with respect to the bottom camera 28 is measured (S106).
- the displacement amount ⁇ mk of the reference mark 32 and the displacement amount ⁇ bh of the tip 72 measured in step S106 are stored in a memory or the like.
- the calculation unit 61 calculates the amount of change ⁇ od in the offset distance from the above-described formula (1) based on the predetermined distance PD, the amount of displacement ⁇ mk of the reference mark, and the amount of displacement ⁇ bh of the tip 72 ( S107).
- the movement control section 62 moves the bonding head section 20 to place the bonding tool 22 at a position directly above the mounting section of the substrate 80 (S108). At this time, the movement control unit 62 considers the amount of change ⁇ od in the offset distance calculated in step S107, and adjusts the amount of movement of the bonding head unit 20 so that the bonding tool 22 is directly above the mounting portion of the substrate 80. decide.
- the bonding control unit 60 lowers the bonding tool 22 to the vicinity of the substrate 80, and bonds the chip 72 to the mounting portion of the substrate 80 (S109).
- the process returns to step S101 and the next chip 72 is bonded.
- cycle time the time required for one cycle (hereinafter referred to as "cycle time") of 383 chips in a conventional bonding apparatus as a sample. was measured to be approximately 24.7 seconds.
- time required for the processing for obtaining the amount of change in the offset distance was measured using 63 chips as samples in the conventional bonding apparatus, it was about 15.1 seconds. This time corresponds to 61% or more of the cycle time.
- the bonding apparatus 100 and the bonding method of the present embodiment the chip 72 and the reference mark 32 can be detected, and the change amount ⁇ od of the offset distance can be calculated. Approximately 15.1 seconds, which was required for processing to obtain the amount of change in , can be reduced to zero or substantially zero. Therefore, the bonding apparatus 100 and the bonding method of this embodiment can shorten the cycle time to 39% or less compared to the conventional bonding apparatus.
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Abstract
Description
Δod=PD-Δbh+Δmk …(1)
14…ハンドリングユニット
15…ステッピングモータ
16…回転軸
17…アーム
18…ベース
19…ピックアップツール
20…ボンディングヘッド部
21…Z軸駆動機構
22…ボンディングツール
24…トップカメラ
26…XYテーブル
28…ボトムカメラ
30…リファレンス部材
31…支持部材
32…リファレンスマーク
40…ボンディングステージ部
60…ボンディング制御部
61…算出部
62…移動制御部
70…ウェハ
72…チップ
80…基板
100…ボンディング装置
CA1…中心軸
CA2…中心軸
g1…第1画像
g2…第2画像
OA1…光軸
OA2…光軸
ODd…オフセット距離
ODr…オフセット距離
PD…所定の距離
S100…ボンディング処理
Δbh…ずれ量
Δmk…ずれ量
Δod…変化量
Claims (7)
- 移動可能なボンディングヘッド部であって、光学系を一方側に向けて設置された第1カメラと、前記第1カメラとオフセット距離を空けて配置されたボンディングツールとを保持するボンディングヘッド部と、
前記ボンディングヘッド部が撮影可能になるように、光学系を他方側に向けて設置された第2カメラと、
前記他方側の面にリファレンスマークを有し、前記第2カメラに対して所定の距離を空けた位置に固定されたリファレンス部材と、
前記リファレンスマークが前記第1カメラの視野内に配置され、かつ、前記ボンディングツールに保持されたチップが前記第2カメラの視野内に配置されるように、前記ボンディングヘッド部が移動したときに、前記所定の距離と、前記第1カメラによって検出された前記リファレンスマークの位置と、前記第2カメラによって検出された前記チップの位置とに基づいて、前記オフセット距離の変化量を算出する算出部と、を備える、
ボンディング装置。 - 前記算出部は、前記第1カメラによって撮影された第1画像に基づいて前記リファレンスマークの位置を検出するとともに、前記第2カメラによって撮影された第2画像に基づいて前記チップの位置を検出する、
請求項1に記載のボンディング装置。 - 前記算出部は、前記第1画像に基づいて前記第1カメラに対する前記リファレンスマークのずれ量を測定するとともに、前記第2画像に基づいて前記第2カメラに対する前記チップのずれ量を測定する、
請求項2に記載のボンディング装置。 - 前記ボンディングヘッド部の移動を制御する移動制御部であって、前記算出されたオフセット距離の変化量に基づいて、前記ボンディングヘッド部の移動量を決定する移動制御部をさらに備える、
請求項1から3のいずれか一項に記載のボンディング装置。 - 前記第2カメラと前記リファレンス部材とは、一体である、
請求項1から4のいずれか一項に記載のボンディング装置。 - 前記所定の距離は、前記オフセット距離に基づいて設定される、
請求項1から5のいずれか一項に記載のボンディング装置。 - 移動可能なボンディングヘッド部であって、光学系を一方側に向けて設置された第1カメラと、前記第1カメラとオフセット距離を空けて配置されたボンディングツールとを保持するボンディングヘッド部と、前記ボンディングヘッド部が撮影可能になるように、光学系を他方側に向けて設置された第2カメラと、前記他方側の面にリファレンスマークを有し、前記第2カメラに対して所定の距離を空けた位置に固定されたリファレンス部材と、を備えたボンディング装置のボンディング方法であって、
前記第1カメラによって前記リファレンスマークの位置を検出するとともに、前記第2カメラによって前記ボンディングツールに保持されたチップの位置を検出するステップと、
前記所定の距離と、前記検出されたリファレンスマークの位置と、前記検出されたチップの位置とに基づいて、前記オフセット距離の変化量を算出するステップと、を含む、
ボンディング方法。
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