WO2022138882A1 - 透明導電フィルム積層体 - Google Patents
透明導電フィルム積層体 Download PDFInfo
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- WO2022138882A1 WO2022138882A1 PCT/JP2021/048067 JP2021048067W WO2022138882A1 WO 2022138882 A1 WO2022138882 A1 WO 2022138882A1 JP 2021048067 W JP2021048067 W JP 2021048067W WO 2022138882 A1 WO2022138882 A1 WO 2022138882A1
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- Prior art keywords
- resin
- transparent conductive
- conductive film
- protective film
- mass
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Definitions
- the present invention relates to a transparent conductive film laminate. More specifically, the present invention relates to a transparent conductive film laminate suitable for three-dimensional processing (three-dimensional molding).
- Transparent conductive films include liquid crystal displays (LCDs), plasma display panels (PDPs), organic electroluminescence displays, transparent electrodes for solar cells (PV) and touch panels (TP), antistatic (ESD) films and electromagnetic shielding (EMI). It is used in various fields such as films.
- LCDs liquid crystal displays
- PDPs plasma display panels
- TP touch panels
- ESD antistatic films
- EMI electromagnetic shielding
- the transparent conductive film containing metal nanowires has excellent conductivity, optical properties, and flexibility, can be formed by a wet process, has a low manufacturing cost, and requires a high temperature at the time of forming a film. Therefore, it is suitable as an ITO alternative transparent conductive film.
- a transparent conductive film containing silver nanowires and having high conductivity, optical properties, and flexibility is known (see Patent Document 1).
- the transparent conductive film containing silver nanowires has a problem that it lacks environmental resistance because it has a large surface area per silver mass and easily reacts with various compounds. Therefore, various chemicals and cleaning liquids used in the process are used.
- the nanostructures are liable to corrode and their conductivity is likely to decrease due to the effects of oxygen and moisture in the air exposed by long-term storage. Further, especially in applications such as electronic materials, a physical cleaning process using a brush or the like is often used in order to prevent the adhesion or mixing of fine particle impurities, dust, dust, etc. on the surface of the substrate. The problem is that the surface is also damaged by the process.
- Patent Document 2 provides a transparent conductive film provided with a protective film capable of imparting high environmental resistance to the transparent conductive film while maintaining electrical contact with the transparent conductive film containing conductive fibers.
- the film and its manufacturing method are disclosed.
- Patent Document 1 a transparent base sheet and a conductive ink are used on one surface of the base sheet so that the elongation rate of the dry coating film is 10% or less and the visible light transmittance is 90% or more. It is a laminated body including at least a main electrode layer having a plurality of main electrode regions formed by the above-mentioned, and the laminated body is a molded product including a three-dimensional curved surface by drawing processing at the time of heat softening. A capacitive touch panel having a curved touch surface is disclosed.
- Patent Document 1 in the method for manufacturing a three-dimensional curved touch panel disclosed in Patent Document 1, first, a plurality of pieces formed on the surface of a transparent base material sheet using a conductive ink containing an organic conductive material. A main electrode layer having a main electrode region is provided. Next, an auxiliary electrode layer having an auxiliary electrode region is provided on the main electrode layer at a portion that becomes a peripheral edge portion in the three-dimensional curved surface by drawing. Then, the laminated body composed of these three layers is formed into a three-dimensional curved surface by drawing in a state of being heated and softened, and cooled or allowed to cool to obtain a curved surface-shaped molded product.
- metal nanofibers are used for the main electrode region where the elongation is small during drawing, and carbon nanotubes or PEDOT are used for the auxiliary electrode region where the elongation is large. Is used.
- Patent Document 2 as a laminate capable of thermoforming, a laminate in which (A) a thermoforming film containing polycarbonate as a main component, (B) an adhesive layer, and (C) a transparent conductive layer are laminated in this order is described. It has been disclosed.
- a transparent conductive film formed on a base material and at least one main surface of the base material and containing a binder resin and a conductive fiber, and formed on the transparent conductive film.
- a transparent conductive substrate having a protective film, characterized in that the thermal decomposition start temperature of the binder resin is 210 ° C. or higher, and the protective film is a thermosetting film of a thermosetting resin.
- the conductive ink layer (conductive layer) formed from the conductive ink containing the organic conductive material such as carbon nanotube or PEDOT used in the manufacturing method of Patent Document 1 has the resistance value of the organic material itself in the first place. Since it is as high as 50 ⁇ / ⁇ or more and the conductive layer is stretched at the time of deformation, the resistance value tends to be further increased, which is problematic from an industrial point of view.
- the metal layer made of metal has a resistance value of 1 ⁇ / ⁇ or less even in a mesh shape with an aperture ratio of 90% or more, which is lower than that of an organic conductive material and has excellent conductivity characteristics.
- Patent Document 2 discloses that (C) the transparent conductive layer is composed of a conductive paste or a metal mesh layer, but (C) providing a protective film on the transparent conductive layer, heat.
- the composition of the protective film suitable for molding is not disclosed.
- Patent Document 3 discloses a transparent conductive film provided with a protective film, but it is not intended to give a three-dimensional shape (three-dimensional shape), and to give a three-dimensional shape (three-dimensional shape). The configuration of a suitable protective film is not disclosed.
- the present inventor has a resin material containing a transparent base material made of a transparent thermoplastic resin film and a thermoplastic resin having a small increase in resistance value due to stretching as main components.
- a transparent conductive film laminate comprising a transparent conductive film using a silver nanowire having excellent flexibility as a conductive member and a protective film containing a thermoplastic resin as a main component is suitable for three-dimensional molding. ..
- the present invention includes the following embodiments.
- a transparent substrate made of a transparent thermoplastic resin film, a transparent conductive film formed on at least one main surface of the transparent substrate and containing a binder resin and a metal nanowire, and the transparent conductive film.
- a transparent conductive film laminate containing at least one of a cellulosic resin and 94% by mass or more of the resin component constituting the protective film is derived from a thermoplastic resin.
- the resin component constituting the protective film is derived from polyurethane containing a carboxy group and an epoxy resin having two or more epoxy groups in one molecule, and two or more epoxy groups in the one molecule.
- the content of the epoxy resin contained is more than 0% by mass and 6% by mass or less in the resin component, and two or more epoxys in the one molecule with respect to the carboxy group (COOH) of the polyurethane containing the carboxy group.
- a three-dimensional molded body having good conductivity and transparency even after three-dimensional molding can be obtained, which is suitable for molding a curved surface-shaped molded product such as a touch panel having a curved surface shape.
- embodiments for carrying out the present invention (hereinafter referred to as embodiments) will be described.
- the transparent conductive film laminate according to the embodiment is a transparent substrate made of a transparent thermoplastic resin film and a transparent substrate formed on at least one main surface of the transparent substrate and containing a binder resin and a metal nanowire. It has a conductive film and a protective film containing a resin component formed on the transparent conductive film, and the binder resin contains 70 mol of poly-N-vinylacetamide and N-vinylacetamide (NVA) as a monomer unit. It is characterized in that it contains at least one of a copolymer containing% or more and a cellulosic resin, and 94% by mass or more of the resin component constituting the protective film is derived from the thermoplastic resin.
- transparent means that the total light transmittance is 75% or more.
- the transparent substrate may be colored, but it is preferable that the total light transmittance (transparency to visible light) is high, and the total light transmittance is preferably 80% or more.
- the transparent substrate that can be used is a thermoplastic resin film, and examples of the thermoplastic resin film include polyester (polyester terephthalate [PET], polyethylene naphthalate [PEN], etc.), polycarbonate, and acrylic resin (polymethylmethacrylate [PMMA]. Etc.), resin films such as cycloolefin polymers can be mentioned.
- the resin film is preferably an amorphous thermoplastic resin film having good moldability for three-dimensional molding.
- amorphous polycarbonate and cycloolefin polymer are preferable, and polycarbonate is more preferable.
- Polycarbonates contain carbonic acid ester bonds in the molecular backbone- [OR-OCO] -units (where R is an aliphatic group, an aromatic group, or both an aliphatic group and an aromatic group, and more directly. It is not particularly limited as long as it contains a chain structure or a branched structure).
- cycloolefin polymers examples include norbornene hydride ring-opening metathesis polymerized cycloolefin polymers (ZEONOR (registered trademark, manufactured by Nippon Zeon Co., Ltd.), ZEONEX (registered trademark, manufactured by Nippon Zeon Co., Ltd.), ARTON (registered trademark, JSR stock). (Company), etc.), norbornene / ethylene-added copolymer cycloolefin polymer (APEL (registered trademark, manufactured by Mitsui Kagaku Co., Ltd.), TOPAS (registered trademark, manufactured by Polyplastics Co., Ltd.)) can be used.
- ZEONOR registered trademark, manufactured by Nippon Zeon Co., Ltd.
- ZEONEX registered trademark, manufactured by Nippon Zeon Co., Ltd.
- ARTON registered trademark, JSR stock
- APEL registered trademark, manufactured by Mitsui Kagaku Co., Ltd.
- TOPAS registered
- the polycarbonate Iupilon (registered trademark, manufactured by Mitsubishi Gas Chemical Company, Inc.) or Panlite (registered trademark, manufactured by Teijin Limited) can be used.
- Tg glass transition temperature
- those having a glass transition temperature (Tg) of 90 to 170 ° C. are preferable because they can withstand heating in the manufacturing process of the lead-out wiring and the connector portion, and those having a glass transition temperature (Tg) of 125 to 160 ° C. are more preferable.
- the thickness is preferably 10 to 500 ⁇ m, more preferably 25 to 250 ⁇ m, still more preferably 40 to 150 ⁇ m.
- Metal nanowires are used as the conductive member constituting the transparent conductive film. Metal nanowires have lower extensibility than carbon nanotubes, but are flexible materials, and are preferable to carbon nanotubes from the viewpoint of transparency. Further, if a conductive ink combined with a specific binder resin (poly-N-vinylacetamide (PNVA (registered trademark)) described later) is used, wiring formation that does not cause problems such as disconnection even if a distortion of 15% is applied. Is confirmed in advance. However, poly-N-vinylacetamide (PNVA (registered trademark) has hygroscopicity, and the sheet resistance value of the transparent conductive film becomes unstable due to the influence thereof.
- PNVA poly-N-vinylacetamide
- the nanowire is a metal having a diameter on the order of nanometers and is a conductive material having a wire-like shape. In one embodiment, it is porous (mixed) with or in place of the metal nanowire.
- a metal nanotube which is a conductive material having a non-porous tubular shape may be used. In the present specification, both “wire-like” and “tube-like” are linear, but the former is the center. Is not hollow, the latter is hollow in the center, and their properties may be flexible or rigid. In the present specification, the former is referred to as "metal nanowire in a narrow sense".
- metal nanotube in a narrow sense is called “metal nanotube in a narrow sense”
- metal nanowire includes both a metal nanowire in a narrow sense and a metal nanotube in a narrow sense.
- the metal nanowire in the narrow sense and the metal nanotube in the narrow sense may be used alone. , May be mixed and used.
- the transparent conductive film has a structure in which the metal nanowires are formed on the transparent substrate so as to have intersections, and light can be transmitted through the openings in which the metal nanowires are not formed. It is preferable that the metal nanowires form a nanostructured network having intersections, and it is more preferable to form a nanostructured network in which at least a part of the intersections is fused. It can be confirmed from the analysis of the electron diffraction pattern of the transmission electron microscope (TEM) that the intersections of the metal nanowires are fused. Specifically, it can be confirmed by analyzing the electron diffraction pattern at the intersection of the metal nanowires and confirming that the crystal structure has changed (recrystallization occurs).
- TEM transmission electron microscope
- metal nanowires As a method for manufacturing metal nanowires, a known manufacturing method can be used. For example, silver nanowires can be synthesized by reducing silver nitrate in the presence of polyvinylpyrrolidone using the Poly-ol method (see Chem. Matter., 2002, 14, 4736). Gold nanowires can also be similarly synthesized by reducing gold chloride hydrate in the presence of polyvinylpyrrolidone (see J. Am. Chem. Soc., 2007, 129, 1733). The techniques for large-scale synthesis and purification of silver nanowires and gold nanowires are described in detail in International Publication No. 2008/073143 and International Publication No. 2008/046058.
- Gold nanotubes having a porous structure can be synthesized by reducing a gold chloride solution using silver nanowires as a template.
- the silver nanowires used in the template dissolve in the solution by redox reaction with chloroauric acid, resulting in the formation of gold nanotubes having a porous structure (J. Am. Chem. Soc., 2004, 126, 3892-). See 3901).
- the average diameter of the metal nanowires is preferably 1 to 500 nm, more preferably 5 to 200 nm, still more preferably 5 to 100 nm, and particularly preferably 10 to 50 nm.
- the average length of the major axis of the metal nanowire is preferably 1 to 100 ⁇ m, more preferably 1 to 80 ⁇ m, still more preferably 2 to 70 ⁇ m, and particularly preferably 5 to 50 ⁇ m.
- the average diameter and the average length of the major axis satisfy the above range, and the average aspect ratio is preferably larger than 5, more preferably 10 or more, and further preferably 100 or more. It is preferably 200 or more, and particularly preferably 200 or more.
- the aspect ratio is a value obtained by a / b when the average diameter of the metal nanowire is approximated to b and the average length of the major axis is approximated to a.
- a and b are measured using a scanning electron microscope (SEM) and an optical microscope.
- b average diameter is a measured value obtained by measuring the dimensions of 100 arbitrarily selected silver nanowires using a field emission scanning electron microscope JSM-7000F (manufactured by Nippon Denshi Co., Ltd.). Is determined as the arithmetic mean value of.
- the shape measurement laser microscope VK-X200 manufactured by KEYENCE CORPORATION was used to calculate a (average length), and the dimensions of 100 silver nanowires selected arbitrarily were measured, and the measured values obtained were measured. Determined as an arithmetic mean value.
- the material of the metal nanowire for example, at least one selected from the group consisting of gold, silver, platinum, copper, nickel, iron, cobalt, zinc, ruthenium, rhodium, palladium, cadmium, osmium, and iridium, and these metals are used. Examples include combined alloys.
- the transparent conductive film contains metal nanowires and a binder resin.
- a binder resin generally, a binder resin having transparency and excellent processability can be used.
- a binder resin that is soluble in alcohol, water, or a mixed solvent of alcohol and water is used from the viewpoint of compatibility with the manufacturing solvent (polypoly). It is preferable to do so.
- the binder resin comprises at least one of a poly-N-vinylacetamide (PNVA®), an N-vinylacetamide copolymer, and a cellulosic resin.
- binder resin only one of poly-N-vinylacetamide (PNVA (registered trademark)), N-vinylacetamide copolymer, or cellulosic resin may be used, or a plurality of these may be used in combination. May be good.
- cellulosic resin only one kind described later may be used, but a plurality of kinds may be used in combination. Considering that it is preferable to use a binder resin having high heat resistance from the viewpoint of post-processing, poly-N-vinylacetamide (PNVA (registered trademark)) is more preferable.
- Poly-N-vinylacetamide is a homopolymer of N-vinylacetamide (NVA).
- N-vinylacetamide copolymer a copolymer containing 70 mol% or more of N-vinylacetamide (NVA) as a monomer unit can be used.
- the monomer copolymerizable with NVA include N-vinylformamide, N-vinylpyrrolidone, acrylic acid, methacrylic acid, sodium acrylate, sodium methacrylate, acrylamide, and acrylonitrile.
- the monomer unit derived from N-vinylacetamide is preferably contained in the polymer in an amount of 70 mol% or more, more preferably 80 mol% or more, and more preferably 90 mol% or more. It is even more preferable.
- the weight average molecular weight of such a polymer is preferably 30,000 to 4 million, more preferably 100,000 to 3 million, and even more preferably 300,000 to 1.5 million.
- the absolute molecular weight of the poly-N-vinylacetamide and the N-vinylacetamide copolymer is measured by the following method.
- the binder resin was dissolved in the following eluent and allowed to stand for 20 hours.
- the concentration of the binder resin in this solution is 0.05% by mass.
- the cellulosic resin is a linear polymer containing an ether group and consisting of a 6-membered ether ring covalently bonded by a so-called glycosidic bond.
- Cellulose itself does not dissolve in water, alcohol, or a mixed solvent of alcohol and water, but some modified cellulose derivatives dissolve in water, alcohol, or a mixed solvent of alcohol and water.
- the cellulosic resin is not particularly limited as long as it is soluble in water, alcohol, or a mixed solvent of alcohol and water, but cellulose ether can be used.
- Examples of the cellulose ether include alkyl cellulose (for example, C1-4 alkyl cellulose such as methyl cellulose and ethyl cellulose), hydroxyalkyl cellulose (for example, hydroxy C1-4 alkyl cellulose such as hydroxymethyl cellulose, hydroxyethyl cellulose and hydroxypropyl cellulose) and hydroxy. Included are alkylalkyl celluloses (eg, hydroxy C2-4alkyl C1-4 alkyl celluloses such as hydroxypropylmethyl cellulose), carboxyalkyl celluloses (eg, carboxymethyl celluloses), and alkyl-carboxyalkyl celluloses (eg, methylcarboxymethyl celluloses). These can be used alone or in combination of two or more.
- alkyl cellulose for example, C1-4 alkyl cellulose such as methyl cellulose and ethyl cellulose
- hydroxyalkyl cellulose for example, hydroxy C1-4 alkyl cellulose such as hydroxymethyl cellulose, hydroxyeth
- the weight average molecular weight of the cellulosic resin is preferably 100,000 to 200,000.
- the weight average molecular weight of the cellulosic resin is a value in terms of polyethylene oxide measured by gel permeation chromatography (hereinafter referred to as GPC).
- the transparent conductive film can be formed by applying a conductive ink containing the metal nanowire, a binder resin and a solvent on at least one main surface of the transparent substrate by printing or the like and drying and removing the solvent.
- the solvent is not particularly limited as long as it is a solvent in which the metal nanowires are well dispersed and the binder resin is dissolved but the transparent substrate is not dissolved.
- Alcohol is a saturated monohydric alcohol (methanol, ethanol, normal propanol and isopropanol) having 1 to 3 carbon atoms represented by C n H 2n + 1 OH (n is an integer of 1 to 3) [hereinafter, simply "carbon atom". It is expressed as "saturated monohydric alcohol having a number of 1 to 3". ] Is preferably contained, and more preferably 40% by mass or more of the saturated monohydric alcohol having 1 to 3 carbon atoms is contained in the total alcohol. It is advantageous in the process to use a saturated monohydric alcohol having 1 to 3 carbon atoms because the solvent can be easily dried. As the alcohol, an alcohol other than the saturated monohydric alcohol having 1 to 3 carbon atoms can be used in combination.
- Examples of alcohols other than saturated monohydric alcohols having 1 to 3 carbon atoms that can be used in combination include ethylene glycol, propylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and propylene glycol monoethyl ether. Can be mentioned.
- the total alcohol content in the mixed solvent is preferably 5 to 90% by mass. If the content of alcohol in the mixed solvent is less than 5% by mass or more than 90% by mass, a striped pattern (coating spot) may occur when coating.
- the conductive ink can be produced by stirring and mixing the binder resin, the metal nanowires and the solvent with a rotating revolution stirrer or the like.
- the content of the binder resin contained in the conductive ink is preferably in the range of 0.01 to 1.0% by mass.
- the content of the metal nanowires contained in the conductive ink is preferably in the range of 0.01 to 1.0% by mass.
- the content of the solvent contained in the conductive ink is preferably in the range of 98.0 to 99.98% by mass.
- Printing of conductive ink can be performed by a bar coating method, a spin coating method, a spray coating method, a gravure method, a slit coating method, or the like.
- the shape of the printed film or pattern formed by printing is not particularly limited, but the shape of the pattern of the wiring or electrode formed on the transparent substrate, or the film covering the entire surface or a part of the transparent substrate.
- the shape of (solid pattern) can be mentioned.
- the formed pattern becomes conductive by heating to dry the solvent.
- the dry thickness of the transparent conductive film varies depending on the diameter of the metal nanowire used, the desired sheet resistance value, and the like, but is preferably 10 to 300 nm, more preferably 30 to 200 nm.
- the dry thickness of the transparent conductive film is 10 nm or more, the number of intersections of the metal nanowires increases, so that good conductivity can be obtained.
- the dry thickness of the transparent conductive film is 300 nm or less, light is easily transmitted and reflection by the metal nanowires is suppressed, so that good optical characteristics can be obtained.
- the conductive pattern may be appropriately irradiated with light.
- the protective film that protects the transparent conductive film is preferably formed from the cured film of the curable resin composition from the viewpoint of mechanically protecting the transparent conductive film.
- the cured film is not excellent in molding processability, it is not preferable as a protective film used for three-dimensional molding.
- the transparent conductive film laminate is usually used in combination with another member, that is, a form mechanically protected by another member. Become. In that case, the transparent conductive film laminate itself does not require high mechanical strength. Therefore, the protective film containing the resin component constituting the transparent conductive film laminate of one embodiment contains a thermoplastic resin having excellent molding processability as a main component.
- the protective film is formed by applying a resin composition in which a resin is dissolved in a solvent onto a transparent conductive film. Therefore, it is said that 94% by mass or more of the resin component constituting the protective film is derived from the thermoplastic resin, that 94% by mass or more of the resin component contained in the resin composition used for forming the protective film is the thermoplastic resin. It means that there is.
- the applicable resin composition examples include ethyl cellulose and a resin composition containing polyurethane having a carboxy group.
- the polyurethane containing a carboxy group preferably has a weight average molecular weight of 1,000 to 100,000, more preferably 3,000 to 85,000, and preferably 5,000 to 70,000. Is more preferable, and 10,000 to 65,000 is particularly preferable.
- the weight average molecular weight of polyurethane containing a carboxy group is a polystyrene-equivalent value measured by GPC. If the weight average molecular weight of the polyurethane containing a carboxy group is less than 1,000, the elongation, flexibility and strength of the coating film may be impaired, and if it exceeds 100,000, the polyurethane is dissolved in a solvent. In addition to having low properties, the viscosity becomes too high even when dissolved, which may increase restrictions on use.
- the measurement conditions of GPC regarding the weight average molecular weight of polyurethane containing a carboxy group are as follows.
- Device name HPLC unit HSS-2000 manufactured by JASCO Corporation
- Detector RI-2031Plus manufactured by JASCO Corporation Temperature: 40.0 ° C
- Sample amount Sample loop 100 ⁇ L
- Sample concentration Approximately 0.1% by mass
- the acid value of the polyurethane containing a carboxy group is preferably 10 to 140 mg-KOH / g, more preferably 15 to 130 mg-KOH / g.
- the acid value of the polyurethane containing a carboxy group is 10 mg-KOH / g or more, the solvent resistance of the protective film is good, and the curability of the resin composition when a small amount of the curing component is used in combination is also good.
- the acid value of the polyurethane containing a carboxy group is 140 mg-KOH / g or less, the solubility of the polyurethane resin in the solvent is good, and it is easy to adjust the viscosity of the resin composition to a desired viscosity.
- the acid value of polyurethane containing a carboxy group is a value measured by the following method.
- Acid value (mg-KOH / g) [B ⁇ f ⁇ 5.611] / S B: Amount of 0.1N potassium hydroxide-ethanol solution used (mL) f: Factor S of 0.1N potassium hydroxide-ethanol solution: Sample collection amount (g)
- the polyurethane containing a carboxy group is a polyurethane synthesized by using (a1) a polyisocyanate compound, (a2) a polyol compound, and (a3) a dihydroxy compound having a carboxy group as a monomer. From the viewpoint of light resistance and weather resistance, it is desirable that (a1), (a2), and (a3) do not contain a functional group having a conjugation such as an aromatic compound.
- each monomer will be described in more detail.
- polyisocyanate compound (a1) As the polyisocyanate compound, a diisocyanate having two isocyanato groups per molecule is usually used.
- the polyisocyanate compound include aliphatic polyisocyanates and alicyclic polyisocyanates, which can be used alone or in combination of two or more.
- a small amount of polyisocyanate having 3 or more isocyanato groups can also be used as long as the polyurethane containing a carboxy group does not gel.
- Examples of the aliphatic polyisocyanate include 1,3-trimethylethylene diisocyanate, 1,4-tetramethylene diisocyanate, 1,6-hexamethylene diisocyanate, 1,9-nonamethylene diisocyanate, and 1,10-decamethylene diisocyanate. , 2,4-trimethylhexamethylene diisocyanate, 2,4,4-trimethylhexamethylene diisocyanate, lysine diisocyanate, 2,2'-diethyletherdiisocyanate, and dimerate diisocyanate.
- Examples of the alicyclic polyisocyanate include 1,4-cyclohexanediisocyanate, 1,3-bis (isocyanatomethyl) cyclohexane, 1,4-bis (isocyanatomethyl) cyclohexane, and 3-isocyanatomethyl-3,5. , 5-trimethylcyclohexyl isocyanate (IPDI, isophorone diisocyanate), bis- (4-isocyanatocyclohexyl) methane (hydrogenated MDI), hydrogenated (1,3- or 1,4-) xylylene diisocyanate, norbornan diisocyanate. Will be.
- A1 By using an alicyclic compound having 6 to 30 carbon atoms other than carbon atoms in the isocyanato group (-NCO group) as the polyisocyanate compound, the reliability at high temperature and high humidity is high. A protective film suitable for a member of an electronic device component can be obtained.
- 1,4-cyclohexanediisocyanate, isophorone diisocyanate, bis- (4-isocyanatocyclohexyl) methane, 1,3-bis (isocyanatomethyl) cyclohexane, 1,4-bis ( Isocyanatomethyl) cyclohexane is preferred.
- the content thereof is preferably 50 mol% or less with respect to the total amount (100 mol%) of the (a1) polyisocyanate compound. It is preferably 30 mol% or less, more preferably 10 mol% or less.
- the number average molecular weight is usually 250 to 50,000. Yes, preferably 400 to 10,000, more preferably 500 to 5,000.
- the number average molecular weight of the polyol compound is a polystyrene-equivalent value measured by GPC under the above-mentioned conditions.
- the polyol compound examples include polycarbonate polyols, polyether polyols, polyester polyols, polylactone polyols, hydrogenated polysilicone at both ends, and C18 (18 carbon atoms) unsaturated fatty acids made from vegetable fats and oils. And a polyol compound having 18 to 72 carbon atoms obtained by hydrogenating a polyvalent carboxylic acid derived from the polymer and converting the carboxylic acid into a hydroxyl group. From the viewpoint of the balance between the water resistance of the protective film, the insulation reliability, and the adhesion to the substrate, the polyol compound (a2) is preferably a polycarbonate polyol.
- the polycarbonate polyol can be obtained by reacting a diol having 3 to 18 carbon atoms with a carbonic acid ester or phosgene, and is represented by, for example, the following structural formula (1).
- R 3 is a residue obtained by removing the hydroxyl group from the corresponding diol (HO-R 3 -OH) and is an alkylene group having 3 to 18 carbon atoms, and n 3 is a positive integer, preferably a positive integer. Is 2 to 50.
- the polycarbonate polyol represented by the formula (1) is 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, or 3-methyl-1.
- 5-Pentanediol, 1,8-octanediol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanedimethanol, 1,9-nonanediol, 2-methyl-1,8-octanediol, 1,10 -It can be produced by using decamethylene glycol, 1,2-tetradecanediol or the like as a raw material.
- the polycarbonate polyol may be a polycarbonate polyol (copolymerized polycarbonate polyol) having a plurality of types of alkanediyl groups in its skeleton.
- the use of a copolymerized polycarbonate polyol is often advantageous from the viewpoint of preventing crystallization of polyurethane containing a carboxy group.
- the (a2) polyol compound a diol having a molecular weight of 300 or less, which is usually used as a diol component when synthesizing polyester or polycarbonate, can also be used.
- low molecular weight diols examples include ethylene glycol, 1,2-propanediol, 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, and 1, , 5-Pentane Glycol, 1,6-Hexanediol, 3-Methyl-1,5-Pentanediol, 1,8-octanediol, 1,3-Cyclohexanedimethanol, 1,4-Cyclohexanedimethanol, 1,9 -Nonandiol, 2-methyl-1,8-octanediol, 1,10-decamethylene glycol, 1,2-tetradecanediol, 2,4-diethyl-1,5-pentanediol, butylethylpropanediol, 1, Examples thereof include 3-cyclohexanedimethanol, diethylene glycol
- (A3) Dihydroxy compound containing a carboxy group (a3)
- the dihydroxy compound containing a carboxy group has two molecular weights selected from a hydroxy group or a hydroxyalkyl group having 1 or 2 carbon atoms. It is preferable that the carboxylic acid is 200 or less or an aminocarboxylic acid in that the cross-linking point can be controlled.
- Examples of the dihydroxy compound containing a carboxy group include 2,2-dimethyrole propionic acid, 2,2-dimethylolbutanoic acid, N, N-bishydroxyethylglycine, and N, N-bishydroxy.
- Ethylalanine is mentioned, and among these, 2,2-dimethylolpropionic acid and 2,2-dimethylolbutanoic acid are preferable because of their high solubility in a solvent.
- A3 The dihydroxy compound containing a carboxy group can be used alone or in combination of two or more.
- Polyurethane containing a carboxy group can be synthesized only from the above three components ((a1), (a2) and (a3)). Further, it can also be synthesized by reacting (a4) a monohydroxy compound and / or (a5) a monoisocyanate compound. From the viewpoint of light resistance, the (a4) monohydroxy compound and the (a5) monoisocyanate compound are preferably compounds that do not contain an aromatic ring or a carbon-carbon double bond in the molecule.
- the polyurethane containing a carboxy group is a polyisocyanate compound (a1) and a polyol compound (a2) described above using an appropriate organic solvent in the presence or absence of a known urethanization catalyst such as dibutyltin dilaurylate.
- a3 can be synthesized by reacting a dihydroxy compound having a carboxy group. It is advantageous to react the polyurethane containing a carboxy group without a catalyst because it is not necessary to consider the mixing of tin and the like in the end.
- the organic solvent is not particularly limited as long as it has low reactivity with the isocyanate compound.
- the organic solvent does not contain a basic functional group such as an amine, and a solvent having a boiling point of 50 ° C. or higher, preferably 80 ° C. or higher, more preferably 100 ° C. or higher is preferable.
- a solvent having a boiling point of 50 ° C. or higher, preferably 80 ° C. or higher, more preferably 100 ° C. or higher is preferable.
- examples of such a solvent include toluene, xylene, ethylbenzene, nitrobenzene, cyclohexane, isophorone, diethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, and the like.
- Examples thereof include n-butyl, isoamyl acetate, ethyl lactate, acetone, methyl ethyl ketone, cyclohexanone, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, ⁇ -butyrolactone, and dimethylsulfoxide.
- the organic solvents are propylene glycol monomethyl ether acetate and propylene glycol mono. It is preferably ethyl ether acetate, dipropylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, ⁇ -butyrolactone, or a combination thereof.
- the order of feeding the raw materials is not particularly limited, but usually, (a2) the polyol compound and (a3) the dihydroxy compound having a carboxy group are first placed in a reaction vessel, dissolved or dispersed in a solvent, and then 20 to 150 ° C. , More preferably at 60-120 ° C., the (a1) polyisocyanate compound is added dropwise and then reacted at 30-160 ° C., more preferably 50-130 ° C.
- the molar ratio of raw materials charged is adjusted according to the molecular weight and acid value of the target polyurethane.
- the molar ratio of (a1) isocyanato group of polyisocyanate compound: ((a2) hydroxyl group of polyol compound + hydroxyl group of dihydroxy compound having (a3) carboxy group) is preferably 0.5 to 1.5. 1, preferably 0.8 to 1.2: 1, more preferably 0.95 to 1.05: 1.
- (A2) Hydroxyl group of polyol compound The molar ratio of the hydroxyl group of the dihydroxy compound having (a3) carboxy group is preferably 1: 0.1 to 30, more preferably 1: 0.3 to 10.
- thermoplastic resin 94% by mass or more of the resin component constituting the protective film is derived from the thermoplastic resin. 6% by mass or less of the resin component constituting the protective film may be derived from the curable resin (compound).
- the amount of the curable resin (compound) of the resin component in the resin composition is in the range of 6% by mass or less, the function as a protective film is improved without causing a significant decrease in the three-dimensional moldability. Can be done.
- Suitable curable resins (compounds) that can be used in combination with thermoplastic resins include epoxy resins (compounds) having two or more epoxy groups in one molecule.
- the thermoplastic resin and the thermosetting resin may react with each other.
- the thermoplastic resin and the thermosetting resin may react with each other.
- the carboxy group of the polyurethane and the epoxy group of the epoxy resin react with each other to form a polyurethane-epoxy resin composite. May be formed.
- "94% by mass or more of the resin component constituting the protective film is derived from the thermoplastic resin” means that the thermoplastic resin used for forming the protective film, for example, polyurethane containing a carboxy group, protects the protective film.
- the thermoplastic resin used to form the protective film for example, an epoxy resin having two or more epoxy groups in one molecule, which corresponds to 94% by mass or more of the resin component of the film, has 6 mass of the resin component of the protective film. It means that it corresponds to% or less.
- the resin component forming the protective film is derived from polyurethane containing a carboxy group and an epoxy resin having two or more epoxy groups in one molecule, the epoxy resin having two or more epoxy groups in one molecule It means that the content is more than 0% by mass and 6% by mass or less in the above resin components.
- Examples of the epoxy resin (compound) having two or more epoxy groups in one molecule include a bisphenol A type epoxy compound, a hydrogenated bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a novolak type epoxy resin, and a phenol novolak type.
- Epoxy resin cresol novolak type epoxy resin, N-glycidyl type epoxy resin, bisphenol A novolak type epoxy resin, chelate type epoxy resin, glioxal type epoxy resin, amino group containing epoxy resin, rubber modified epoxy resin, dicyclopentadienphenolic type
- examples thereof include an epoxy resin, a silicone-modified epoxy resin, an ⁇ -caprolactone-modified epoxy resin, an aliphatic epoxy resin containing a glycidyl group, and an alicyclic epoxy resin containing a glycidyl group.
- Epoxy compounds having three or more epoxy groups in one molecule can be used more preferably.
- examples of such epoxy compounds include EHPE (registered trademark) 3150 (manufactured by DIC CORPORATION), jER (registered trademark) 604 (manufactured by Mitsubishi Chemical Industries, Ltd.), and EPICLON (registered trademark) EXA-4700 (manufactured by DIC Corporation).
- EPICLON registered trademark
- HP-7200 manufactured by DIC Corporation
- pentaerythritol tetraglycidyl ether pentaerythritol triglycidyl ether
- TEPIC registered trademark
- -S manufactured by Nissan Chemical Industries, Ltd.
- the mixing ratio of the epoxy resin (compound) and the polyurethane containing the carboxy group is the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group. It is preferably more than 0 and 0.02 or less.
- a curing accelerator can be further added to the resin composition.
- the curing accelerator include phosphine-based compounds such as triphenylphosphine and tributylphosphine (manufactured by Hokuko Kagaku Kogyo Co., Ltd.), Curesol (registered trademark) (imidazole-based epoxy resin curing agent: manufactured by Shikoku Kasei Co., Ltd.), 2.
- the amount of the curing accelerator used is preferably 20 to 80 parts by mass, more preferably 30 to 70 parts by mass, and further preferably 40 to 60 parts by mass with respect to 100 parts by mass of the epoxy resin (compound).
- the curing accelerator shall be contained in a resin component that is not a thermoplastic resin.
- a curing aid may be used in combination.
- the curing aid include polyfunctional thiol compounds and oxetane compounds.
- the polyfunctional thiol compound include pentaerythritol tetrakis (3-mercaptopropionate), tris-[(3-mercaptopropionyloxy) -ethyl] -isocyanurate, and trimethylolpropane tris (3-mercaptopropionate).
- Karenz registered trademark
- MT series manufactured by Showa Denko KK.
- oxetane compound examples include Aron Oxetane (registered trademark) series (manufactured by Toagosei Co., Ltd.), ETERNCOLL (registered trademark) OXBP and OXMA (manufactured by Ube Kosan Co., Ltd.).
- the amount of the curing aid used is preferably 0 with respect to 100 parts by mass of the epoxy resin (compound) because the added effect can be obtained and the handling property can be maintained by avoiding an excessive increase in the curing rate. .1 to 10 parts by mass, more preferably 0.5 to 6 parts by mass.
- the curing aid is also contained in a resin component that is not a thermoplastic resin.
- the resin composition preferably contains 95.0% by mass or more and 99.9% by mass or less of the solvent, more preferably 96% by mass or more and 99.7% by mass or less, and 97% by mass or more and 99.5% by mass or less. It is more preferable to include the following.
- the solvent a transparent conductive film or a solvent that does not attack the transparent substrate can be used.
- the solvent used for the synthesis of the polyurethane containing a carboxy group can be used as it is, or another solvent can be used to adjust the solubility or printability of the binder resin. When another solvent is used, the solvent used for the synthesis of the polyurethane containing a carboxy group may be distilled off before and after the addition of the new solvent, and the solvent may be replaced.
- the boiling point of the solvent is preferably 80 ° C to 300 ° C, more preferably 80 ° C to 250 ° C.
- the boiling point of the solvent is less than 80 ° C, it is easy to dry during printing, and when the boiling point of the solvent is higher than 300 ° C, uneven coating is likely to occur. It will not be suitable for production.
- polyurethane synthesis such as propylene glycol monomethyl ether acetate (boiling point 146 ° C.), ⁇ -butyrolactone (boiling point 204 ° C.), diethylene glycol monoethyl ether acetate (boiling point 218 ° C.), tripropylene glycol dimethyl ether (boiling point 243 ° C.), etc.
- Solvents used for; ether-based solvents such as propylene glycol dimethyl ether (boiling point 97 ° C.), diethylene glycol dimethyl ether (boiling point 162 ° C.); isopropyl alcohol (boiling point 82 ° C.), t-butyl alcohol (boiling point 82 ° C.), 1-hexanol ( 157 ° C.), propylene glycol monomethyl ether (120 ° C.), diethylene glycol monomethyl ether (194 ° C.), diethylene glycol monoethyl ether (196 ° C.), diethylene glycol monobutyl ether (230 ° C.), triethylene glycol (276 ° C.) ), A solvent containing a hydroxyl group such as ethyl lactate (boiling point 154 ° C.); a ketone solvent such as methyl ethyl ketone (boiling point 80 ° C.); or an este
- solvents can be used alone or in admixture of two or more.
- a solvent having a boiling point of more than 100 ° C. or a solvent having a boiling point of 100 ° C. or lower from the viewpoint of drying property of the ink.
- a solvent that invades the transparent conductive film or the transparent substrate by itself can be applied as long as it has a composition that does not invade the transparent conductive film or the transparent substrate as a mixed solvent with other solvents.
- the resin composition is a mixture of polyurethane containing a carboxy group, an epoxy compound, if necessary, a curing accelerator and / or a curing aid, and the content of the solvent in the resin composition is 95. It can be produced by blending a solvent so as to be 0% by mass or more and 99.9% by mass or less, and stirring so that these components become uniform.
- the solid content concentration in the resin composition varies depending on the desired film thickness and printing method, but is preferably 0.1 to 10% by mass, more preferably 0.5% by mass to 5% by mass.
- the film thickness does not become excessively thick when the resin composition is applied onto the transparent conductive film, and the film is electrically connected to the transparent conductive film. It is possible to maintain a state in which contact can be made, and it is possible to impart weather resistance and light resistance to the protective film.
- the resin composition is applied onto the transparent conductive film by printing such as a bar coat printing method, a gravure printing method, an inkjet method, and a slit coat method, and the solvent is dried and removed.
- a protective film is usually more than 100 nm and 1 ⁇ m or less.
- the thickness of the protective film is preferably more than 100 nm and 500 nm or less, more preferably more than 100 nm and 200 nm or less, further preferably more than 100 nm and 150 nm or less, and particularly preferably more than 100 nm and 120 nm or less. If the thickness of the protective film exceeds 1 ⁇ m, it becomes difficult to obtain continuity between the wiring and the transparent conductive film in the subsequent process.
- the transparent conductive film laminate obtained by sequentially forming a transparent conductive film (for example, a silver nanowire layer) and a protective film on a transparent substrate is excellent in three-dimensional processability.
- the three-dimensional processing method for the transparent conductive film laminate include various known methods such as vacuum forming, blow molding, free blow molding, pressure air forming, vacuum pressure air forming, and hot press forming. Any of these methods can be used.
- stress is applied to the three-dimensionally processed transparent conductive film laminate, which causes distortion. Along with this strain, the transparent conductive film laminate is stretched.
- the transparent conductive film laminate having low three-dimensional processability breakage of the transparent conductive film constituting the transparent conductive film laminate or a remarkable increase in sheet resistance value is usually observed with low stress (low draw ratio).
- the transparent conductive film laminate having good three-dimensional workability the transparent conductive film does not break up to high stress (high draw ratio), or the increase in sheet resistance value is small. Therefore, the three-dimensional processability of the transparent conductive film laminate can be evaluated by performing a tensile test on the transparent conductive film laminate and measuring the change in the sheet resistance value.
- the sheet resistance value (R) after the strain of 15% is applied to the sheet resistance value (R 0 ) before the strain is applied.
- the ratio (R / R 0 ) is as good as 25 or less. This is because by using a protective film in which 94% by mass or more of the resin component is a thermoplastic resin, cracks are unlikely to occur in the protective film even if strain is applied, and cracks in the protective film propagate to the transparent conductive film. It is considered that this is because it is possible to avoid impairing the conductivity. From the viewpoint of three-dimensional processability, it is preferable that the protective film does not contain a curing component (epoxy compound, curing accelerator, etc.).
- a curing component epoxy compound, curing accelerator, etc.
- the transparent conductive film laminate according to another embodiment further includes an embodiment as a molding laminate (molding transparent conductive film laminate) laminated with a base material (front plate) containing a thermoplastic resin.
- a base material (front plate) containing a thermoplastic resin is laminated on the above-mentioned transparent conductive film laminate in order to protect, decorate, and maintain the shape of the transparent conductive film laminate.
- the type of the thermoplastic resin constituting the base material is not particularly limited as long as it is transparent, but is limited to polycarbonate (PC) resin, acrylic resin, polyethylene terephthalate (PET), triacetyl cellulose (TAC), polyethylene naphthalate (PEN), and heat.
- thermoplastic polyimide PI
- COP cycloolefin polymer
- COC cycloolefin copolymer
- polyether sulfone polyether sulfone
- cellophane Various resins such as thermoplastic polyimide (PI), cycloolefin polymer (COP), cycloolefin copolymer (COC), polyether sulfone, and cellophane are used.
- the thermoplastic resin of the base material preferably contains at least a polycarbonate resin among these options.
- the thickness of the base material (front plate) is preferably in the range of 0.5 to 3.0 mm, more preferably in the range of 0.6 to 2.5 mm, and in the range of 0.8 to 2.0 mm. Is more preferable. If it is in the range of 0.5 to 3.0 mm, it can be shaped without any problem, and the shape after shaping can be maintained.
- the type of polycarbonate resin contained in the base material includes a carbonic acid ester bond in the molecular main chain- [OR-OCO] -unit (R is an aliphatic group, an aromatic group, or an aliphatic group and an aromatic group. It is not particularly limited as long as it contains both of the groups, and further has a linear structure or a branched structure), but a polycarbonate having a bisphenol skeleton is preferable, and a polycarbonate having a bisphenol A skeleton or a bisphenol C skeleton is preferable. Is particularly preferable.
- As the polycarbonate resin a mixture of bisphenol A and bisphenol C or a copolymer may be used.
- the hardness of the base material can be improved.
- the viscosity average molecular weight of the polycarbonate resin is preferably 15,000 to 40,000, more preferably 20,000 to 35,000, and even more preferably 22,500 to 25,000. It is preferable to use the same polycarbonate used as the transparent base material constituting the above-mentioned transparent conductive film laminate.
- the acrylic resin contained in the base material is not particularly limited, but is, for example, a copolymer of various (meth) acrylic acid esters represented by methyl methacrylate (MMA) (PMMA or the like), or MMA and another 1.
- MMA methyl methacrylate
- examples thereof include a copolymer of more than one kind of monomer, and a mixture of a plurality of kinds of these resins.
- (meth) acrylates containing a cyclic alkyl structure having excellent low birefringence, low hygroscopicity, and heat resistance are preferable.
- the acrylic resin as described above include Acrypet (registered trademark, manufactured by Mitsubishi Chemical Corporation), Delpet (registered trademark, manufactured by Asahi Kasei Corporation), and Parapet (registered trademark, manufactured by Kuraray Corporation). Not limited to.
- the base material may contain an additive as a component other than the thermoplastic resin.
- an additive as a component other than the thermoplastic resin.
- heat stabilizers, antioxidants, flame retardants, flame retardants, ultraviolet absorbers, mold release agents and colorants can be mentioned, and one or more of them can be used from the group consisting of these.
- an antistatic agent, a fluorescent whitening agent, an anti-fog agent, a fluidity improving agent, a plasticizer, a dispersant, an antibacterial agent and the like may be added to the substrate.
- the base material preferably contains 80% by mass or more of a thermoplastic resin, more preferably 90% by mass or more, and further preferably 95% by mass or more. Further, among the thermoplastic resins of the base material, the polycarbonate resin is preferably contained in an amount of 80% by mass or more, more preferably 90% by mass or more, still more preferably 95% by mass or more.
- thermoplastic resin is further hard coated.
- a hard-coated substrate can be obtained by a method of curing by.
- a method in which a hard coat composition containing a photopolymerizable compound is applied to a substrate, dried, and then cured by ultraviolet rays is preferable.
- the hard coat is preferably provided on the surface of the base material opposite to the adhesive layer described later.
- the photopolymerizable compound any compound having a functional group having photopolymerizability can be used, but a compound containing a urethane (meth) acrylate component is preferable.
- the urethane (meth) acrylate contains a polymer of a resin material containing a polyol, an isocyanate, and a urethane (meth) acrylate derived from the (meth) acrylate, and the (meth) acrylate. That is, it is preferably a mixture of urethane (meth) acrylate obtained by dehydration condensation reaction of three components of polyol, isocyanate, and (meth) acrylate, and (meth) acrylate.
- additives to the hard coat composition in order to improve the physical characteristics.
- the additive include a fluorine-based additive or a silicone-based additive capable of imparting antifouling property and slipperiness, and an inorganic particle component for improving scratch resistance.
- thermoplastic resin a base material having a treatment layer different from the hard coat layer, for example, an anti-glare layer or an antifouling / fingerprint mark treatment layer for the thermoplastic resin.
- the transparent conductive film laminate and the base material are laminated via an adhesive layer.
- the adhesive layer any one that can bond the transparent conductive film laminate and the base material can be used.
- the adhesive layer can be easily obtained by applying an adhesive to the surface of the base material and drying it. It is also possible to use a commercially available optical transparent adhesive sheet (OCA) or an optical transparent adhesive resin (OCR) for bonding.
- OCA optical transparent adhesive sheet
- OCR optical transparent adhesive resin
- OCA is for bonding adherends under atmospheric pressure or vacuum, and materials such as acrylic and silicone are used.
- materials such as acrylic and silicone are used.
- LUCIACS registered trademark, manufactured by Nitto Denko Corporation
- Clearfit registered trademark, manufactured by Mitsubishi Chemical Corporation
- HSV manufactured by Sekisui Chemical Co., Ltd.
- OCR is an adhesive resin for adhering adherends, and materials such as acrylic and silicone are commercially available.
- Silver nanowire 1 Polyvinylpyrrolidone K-90 (manufactured by Nippon Shokubai Co., Ltd.) (0.98 g), AgNO 3 (1.04 g) and FeCl 3 (0.8 mg) were dissolved in ethylene glycol (250 ml) and heated at 150 ° C. for 1 hour. Reacted.
- the average length of the obtained silver nanowires 1 is calculated by measuring the dimensions (length) of 100 silver nanowires arbitrarily selected using a shape measurement laser microscope VK-X200 (manufactured by KEYENCE CORPORATION). It was calculated as an average value. Further, as the methanol, ethylene glycol, AgNO 3 and FeCl 3 , reagents manufactured by Wako Pure Chemical Industries, Ltd. were used.
- ⁇ Printing of silver nanowire ink coating> Using the silver nanowire ink 1 prepared in Preparation Example 1, a PC film (UPILON (registered trademark) FS-2000H glass manufactured by Mitsubishi Gas Chemical Co., Ltd.) was used by a bar coat printing machine (AFA-Standard manufactured by Cortec Co., Ltd.). A transparent conductive film (silver nanowire ink coating film) was printed as a solid pattern of A4 size on a main surface having a transition temperature of 130 ° C. (catalog value) and a thickness of 100 ⁇ m) with a wet film thickness of 20 ⁇ m.
- UPILON registered trademark
- a transparent conductive film silver nanowire ink coating film
- the sheet resistance is an arithmetic mean value of 30 points of sheet resistance measured near the center of each area of the transparent conductive film (solid pattern) divided into areas of 3 cm square.
- the sheet resistance of the transparent conductive film using the silver nanowire ink 1 was 50 ⁇ / ⁇ .
- the sheet resistance was measured using a non-contact resistance measuring device (EC-80P manufactured by Napson Corporation).
- the thickness of the transparent conductive film was 80 nm as a result of measurement using a film thickness measuring system F20-UV (manufactured by Filmometrics Co., Ltd.) based on the optical interferometry. The measurement points were changed, and the average value measured at three points was used as the film thickness. A spectrum from 450 nm to 800 nm was used for the analysis. According to this measurement system, the film thickness (Tc) of the silver nanowire layer formed on the transparent substrate can be directly measured.
- F20-UV manufactured by Filmometrics Co., Ltd.
- the temperature of the reaction solution was lowered to 70 ° C., and 23.5 g of Death Module (registered trademark) -W (bis- (4-isocyanate cyclohexyl) methane), manufactured by Sumika Cobestrourethane Co., Ltd. was added as a polyisocyanate by a dropping funnel. It was dropped over 30 minutes. After completion of the dropping, the temperature was raised to 100 ° C., the reaction was carried out at 100 ° C. for 15 hours, and after confirming by IR that the isocyanate was almost eliminated, 0.5 g of isobutanol was added, and the reaction was further carried out at 100 ° C. for 6 hours. gone.
- the weight average molecular weight determined by the GPC of the obtained carboxy group-containing polyurethane was 33,500, and the acid value of the resin solution was 39.4 mgKOH / g.
- Etocell registered trademark
- STD100 cps ethyl cellulose manufactured by Dow Chemical (US)
- Protective film ink 3 1.8 g of polyurethane solution containing carboxy group (solid content concentration 42.4% by mass) obtained in the above synthesis example 1, 0.1 g of pentaerythritol tetraglycidyl ether (manufactured by Showa Denko KK) as epoxy compound 1, cured.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group in the protective film ink 3 is 1.0.
- Protective film ink 4 The epoxy compound 1 blended in the protective film ink 3 was changed to 0.2 g of epoxy compound 2 (EPICLON (registered trademark) 850 (bisphenol A type liquid epoxy resin manufactured by DIC Corporation)), and the curing accelerator was changed to 0.1 g.
- a protective film ink 4 was obtained by preparing the same as the protective film ink 3 except for the above.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group in the protective film ink 4 is 1.0.
- the protective film ink 3 was prepared in the same manner as the protective film ink 3 except that the amount of the blended epoxy compound 1 was changed to 0.07 g to obtain the protective film ink 5.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group of the protective film ink 5 is 0.7.
- the non-volatile content (solid content) concentration (total amount of polyurethane, epoxy compound, and curing accelerator containing carboxy group) of the protective film ink 5 calculated from the mass before and after solvent drying was 3% by mass.
- the protective film ink 3 was prepared in the same manner as the protective film ink 3 except that the amount of the blended epoxy compound 1 was changed to 0.2 g to obtain the protective film ink 6.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group of the protective film ink 6 is 2.0.
- the non-volatile content (solid content) concentration (total amount of polyurethane, epoxy compound, and curing accelerator containing carboxy group) of the protective film ink 6 calculated from the mass before and after solvent drying was 3% by mass.
- the protective film ink 4 was prepared in the same manner as the protective film ink 4 except that the amount of the blended epoxy compound 2 was changed to 0.13 g to obtain the protective film ink 7.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group of the protective film ink 7 is 0.7.
- the non-volatile content (solid content) concentration (total amount of polyurethane, epoxy compound, and curing accelerator containing carboxy group) of the protective film ink 7 calculated from the mass before and after solvent drying was 3% by mass.
- the protective film ink 3 was prepared in the same manner as the protective film ink 3 except that the amount of the blended epoxy compound 1 was changed to 0.05 g to obtain the protective film ink 8.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group of the protective film ink 8 is 0.5.
- the non-volatile content (solid content) concentration (total amount of polyurethane, epoxy compound, and curing accelerator containing carboxy group) of the protective film ink 8 calculated from the mass before and after solvent drying was 3% by mass.
- the protective film ink 3 was prepared in the same manner as the protective film ink 3 except that the amount of the blended epoxy compound 1 was changed to 0.01 g to obtain the protective film ink 9.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group of the protective film ink 9 is 0.1.
- the non-volatile content (solid content) concentration (total amount of polyurethane, epoxy compound, and curing accelerator containing carboxy group) of the protective film ink 9 calculated from the mass before and after solvent drying was 3% by mass.
- the protective film ink 3 was prepared in the same manner as the protective film ink 3 except that the amount of the blended epoxy compound 1 was changed to 0.002 g to obtain the protective film ink 10.
- the molar ratio (Ep / COOH) of the epoxy group (Ep) of the epoxy resin to the carboxy group (COOH) of the polyurethane containing the carboxy group of the protective film ink 10 is 0.02.
- the non-volatile content (solid content) concentration (total amount of polyurethane, epoxy compound, and curing accelerator containing carboxy group) of the protective film ink 10 calculated from the mass before and after solvent drying was 3% by mass.
- Example 1 Using the silver nanowire ink 1 obtained in Preparation Example 1, the transparent conductive film (silver nanowire ink coating film) printed on the main surface of the PC film was printed on the transparent conductive film using the bar coat printing machine described above.
- the protective film ink 1 was applied onto the main surface with a wet film thickness of about 7 ⁇ m, and a transparent conductive film with a protective film (silver nanowire ink coating film with a protective film) was printed as an A4 size solid pattern.
- the solvent was dried at 80 ° C. for 1 minute to obtain a transparent conductive film laminate according to Example 1. The sheet resistance of the obtained transparent conductive film laminate was measured.
- the sheet resistance in this case is an arithmetic mean value of 30 points of sheet resistance measured near the center of each area of the transparent conductive film laminate (solid pattern) divided into areas of 3 cm square.
- the sheet resistance of the transparent conductive film laminate using the protective film ink 1 was 50 ⁇ / ⁇ .
- the sheet resistance was measured using the above-mentioned non-contact resistance measuring device.
- the thickness of the protective film was 90 nm as a result of measurement using a film thickness measuring system F20-UV (manufactured by Filmometry Co., Ltd.) based on the optical interferometry as in the case of the film thickness of the silver nanowire layer described above. In this case, the measurement points were changed, and the average value measured at three points was used as the film thickness.
- the total film thickness (Tc + Tp) of the film thickness (Tc) of the silver nanowire layer formed on the transparent substrate and the film thickness (Tp) of the protective film formed on the film can be directly measured. Therefore, the film thickness (Tp) of the protective film can be obtained by subtracting the film thickness (Tc) of the silver nanowire layer previously measured from this measured value.
- Examples 2 and 3 and Comparative Examples 1 to 8 In the same manner as in Example 1, a silver nanowire ink coating film and a protective film were formed with the combinations shown in Table 1 to obtain each transparent conductive film laminate. In Comparative Example 8, it was confirmed in advance that wiring can be formed without causing problems such as disconnection even when a strain of 15% is applied.
- a silver nanowire ink coating film is applied to a transparent substrate that does not form a protective film. It is a two-layer structure provided with only ink.
- ⁇ Tensile characteristics> For the tensile test, a test piece obtained by cutting each transparent conductive film laminate obtained in the above Examples and Comparative Examples into strips having a width of 30 mm and a length of 160 mm was used. Marked lines were marked in advance at intervals of 10 mm between the chucks, divided into 10 points, and the sheet resistance values of each were measured and set as R0 . Then, the above test piece was set in a precision universal tester (Autograph AG-X manufactured by Shimadzu Corporation). The distance between the chucks at the time of setting was 100 mm, and an arbitrary strain was applied at a test speed of 50 mm / min and a test set temperature of 155 ° C.
- thermoplastic resin content (% by mass) of the protective film in Table 2 is the protective film ink composition (nonvolatile content (solid content)) used in each Example and Comparative Example [polyurethane and epoxy containing a carboxy group. It was calculated from the ratio (% by mass) of [polyurethane or etcell (registered trademark) containing a carboxy group] to [total amount of compound and curing accelerator].
- Examples 1 and 2 which do not contain a curing component (epoxy compound, curing accelerator) as a resin component constituting the protective film and Example 3 which contains a curing component (epoxy compound, curing accelerator) of 6% by mass or less.
- the transparent conductive film laminate can measure the contact resistance, and it can be seen that it can be applied as an electrode for an electronic device.
- Comparative Examples 1 to 1 in which the amount of the curing component (epoxy compound, curing accelerator) blended in the protective film exceeds 6% by mass (the amount of polyurethane containing a carboxy group which is a thermoplastic resin is less than 94% by mass). In No.
- Example 4 By adhering the front plate to the protective film side of the transparent conductive film laminate obtained in Example 1 via OCA, a laminate for molding between the transparent conductive film laminate and the front plate was manufactured.
- OCA CS9864UAS (thickness 100 ⁇ m) manufactured by Nitto Denko Corporation was used.
- As the front plate FS-2000H (thickness 0.5 mm) manufactured by Mitsubishi Gas Chemical Company was used. Specifically, after cutting OCA having separators on both sides to a predetermined size, one separator is peeled off, and one adhesive surface is reciprocated once on the surface of the front plate using a hand roller (2 kg roller).
- a film laminate was prepared and used as a test piece. (Bating conditions) Surface pressure: 0.4 MPa Vacuum degree: 30 Pa Pasting time: 2 seconds Next, the test piece was put into an autoclave and autoclaved for 15 minutes under the conditions of a temperature of 50 ° C. and a pressure of 0.5 MPa. Further, the test piece was allowed to stand in an environment of 23 ° C. and 50% RH for 1 hour, and then used for the test.
- Example 5 Using the silver nanowire ink 2 instead of the silver nanowire ink 1 and using the transparent conductive film laminate obtained by manufacturing in the same manner as in Example 1, the transparent conductive film laminate and the front plate are used in the same manner as in Example 4. A laminate was produced.
- Comparative Example 9 A laminate of the transparent conductive film laminate and the front plate was produced in the same manner as in Example 4 except that the transparent conductive film laminate according to Comparative Example 8 was used.
- Comparative Example 10 Using silver nanowire ink 2 instead of silver nanowire ink 1 and using the transparent conductive film laminate obtained by manufacturing in the same manner as in Comparative Example 8, the transparent conductive film laminate and the front plate were used in the same manner as in Comparative Example 9. The laminated body of was produced.
- ⁇ Tensile characteristics> For the tensile test, a test piece obtained by cutting each of the transparent conductive film laminates for molding obtained in the above Examples and Comparative Examples into strips having a width of 30 mm and a length of 160 mm was used. Marked lines were marked in advance at intervals of 10 mm between the chucks, divided into 10 points, and the sheet resistance values of each were measured and set as R0 . Then, the above test piece was set in a precision universal tester (Autograph AG-X manufactured by Shimadzu Corporation). The distance between the chucks at the time of setting was 100 mm, and an arbitrary strain was applied at a test speed of 50 mm / min and a test temperature of 155 ° C.
- ⁇ Environmental resistance> The change in resistance value after 500 hours was calculated in a high-temperature and high-humidity device in which the transparent conductive film laminates for molding obtained in each of the above Examples and Comparative Examples were kept at 85 ° C. and 85% RH, and described below. Judgment was made according to the judgment. The results are shown in Table 3. ⁇ : The resistance value change is 10% or less. ⁇ : The change in resistance value exceeds 10% and is 20% or less. ⁇ : The change in resistance value exceeds 20%.
- Example 4 By comparing Example 4 and Example 1, the sheet resistance value and optics of the transparent conductive film laminate for molding in which the transparent conductive film laminate and the base material are bonded are almost the same as those of the transparent conductive film laminate alone. It is suggested that properties, tensile properties, and environmental resistance can be obtained. From the comparison between Example 4 and Example 5, Example 5 using etocell is superior to Example 4 using PNVA as the binder resin of the transparent conductive film, but the optical characteristics are slightly lower. It has become. It can be inferred that the reason why Etocell is superior in tensile properties as the binder resin for the transparent conductive film is that the glass transition temperature of Etocell is lower than the glass transition temperature of PNVA, so that it is more easily deformed under the test conditions. .. The effect of bonding by OCA on the sheet resistance value and optical characteristics was insignificant.
- Examples 4 and 5 and Comparative Examples 9 and 10 The difference in configuration between Examples 4 and 5 and Comparative Examples 9 and 10 is the presence or absence of a protective film for the transparent conductive film laminate.
- a protective film for the transparent conductive film laminate In Comparative Examples 9 and 10 using the transparent conductive film laminate having no protective layer, the deterioration of the environmental resistance was remarkable as compared with Examples 4 and 5 using the transparent conductive film laminate having the protective film.
- rice field Since a water-soluble binder resin is used for the transparent conductive film, it is presumed that the binder resin easily absorbs moisture unless a protective film is formed, and the change in resistance value becomes large.
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Abstract
Description
上記透明基材は着色していてもよいが、全光線透過率(可視光に対する透明性)は高い方が好ましく、全光線透過率が80%以上であることが好ましい。使用できる透明基材は熱可塑性樹脂フィルムであり、熱可塑性樹脂フィルムとしては、例えば、ポリエステル(ポリエチレンテレフタレート[PET]、ポリエチレンナフタレート[PEN]等)、ポリカーボネート、アクリル樹脂(ポリメチルメタクリレート[PMMA]等)、シクロオレフィンポリマー等の樹脂フィルムが挙げられる。樹脂フィルムは、3次元成形する上では良好な成形性を有する非晶性の熱可塑性樹脂フィルムであることが好ましい。そのため、前記樹脂フィルムの中でも非晶性であるポリカーボネート、及びシクロオレフィンポリマーが好ましく、ポリカーボネートがより好ましい。ポリカーボネートは、分子主鎖中に炭酸エステル結合を含む-[O-R-OCO]-単位(Rが脂肪族基、芳香族基、又は脂肪族基と芳香族基の双方を含むもの、さらに直鎖構造あるいは分岐構造を持つもの)を含むものであれば、特に限定されない。シクロオレフィンポリマーとしては、ノルボルネンの水素化開環メタセシス重合型シクロオレフィンポリマー(ZEONOR(登録商標、日本ゼオン株式会社製)、ZEONEX(登録商標、日本ゼオン株式会社製)、ARTON(登録商標、JSR株式会社製)等)やノルボルネン/エチレン付加共重合型シクロオレフィンポリマー(APEL(登録商標、三井化学株式会社製)、TOPAS(登録商標、ポリプラスチックス株式会社製))を用いることができる。ポリカーボネートとしては、具体的には、ユーピロン(登録商標、三菱ガス化学株式会社製)、又はパンライト(登録商標、帝人株式会社製)を用いることができる。これらの中でもガラス転移温度(Tg)が90~170℃のものが引き出し配線やコネクタ部分などの製造工程における加熱に耐えうるため好ましく、125~160℃のものがより好ましい。厚みは10~500μmであることが好ましく、25~250μmであることがより好ましく、40~150μmがさらに好ましい。
透明導電膜を構成する導電部材としては、金属ナノワイヤを使用する。金属ナノワイヤは、カーボンナノチューブより伸び性が低いが、柔軟性を有する材料であり、透明性の観点ではカーボンナノチューブより好ましい。また、特定のバインダー樹脂(後述するポリ-N-ビニルアセトアミド(PNVA(登録商標)))と組み合わせた導電性インクを用いれば、15%の歪みを加えても断線等の不具合が発生しない配線形成が可能であることを事前に確認している。しかしながら、ポリ-N-ビニルアセトアミド(PNVA(登録商標)は吸湿性があり、その影響により透明導電膜のシート抵抗値が不安定になるため、その表面を覆う保護膜を設ける必要がある。金属ナノワイヤは、径がナノメーターオーダーのサイズである金属であり、ワイヤ状の形状を有する導電性材料である。一実施形態では、金属ナノワイヤとともに(混合して)、又は金属ナノワイヤに代えて、ポーラス又はノンポーラスのチューブ状の形状を有する導電性材料である金属ナノチューブを使用してもよい。本明細書において、「ワイヤ状」と「チューブ状」はいずれも線状であるが、前者は中央が中空ではないもの、後者は中央が中空であるものを意味し、それらの性状は、柔軟であってもよく、剛直であってもよい。本明細書において、前者を「狭義の金属ナノワイヤ」、後者を「狭義の金属ナノチューブ」と呼び、「金属ナノワイヤ」は狭義の金属ナノワイヤと狭義の金属ナノチューブの両方を包含する。狭義の金属ナノワイヤ及び狭義の金属ナノチューブは、それぞれ単独で用いてもよく、混合して用いてもよい。
下記溶離液にバインダー樹脂を溶解させ、20時間静置した。この溶液におけるバインダー樹脂の濃度は0.05質量%である。
GPC:昭和電工株式会社製Shodex(登録商標)SYSTEM21
カラム:東ソー株式会社製TSKgel(登録商標)G6000PW
カラム温度:40℃
溶離液:0.1mol/L NaH2PO4水溶液+0.1mol/L Na2HPO4水溶液
流速 :0.64mL/min
試料注入量:100μL
MALS検出器:ワイアットテクノロジーコーポレーション、DAWN(登録商標) DSP
レーザー波長:633nm
多角度フィット法:Berry法
一般的に、透明導電膜を保護する保護膜は、透明導電膜を機械的に保護する観点からは硬化性樹脂組成物の硬化膜より形成することが好ましい。しかし、硬化膜は成形加工性に優れないため、、3次元成形に用いられる保護膜としては好ましくない。最終的な適用形態にもよるが、例えばタッチパネルに適用する場合には、透明導電フィルム積層体は通常他の部材と貼り合わせて使用される、すなわち他の部材により機械的に保護された形態となる。その場合、透明導電フィルム積層体自体には高い機械的強度は必要とされない。そのため、一実施形態の透明導電フィルム積層体を構成する樹脂成分を含む保護膜は、成形加工性に優れる熱可塑性樹脂を主成分とする。換言すると、保護膜を構成する樹脂成分の94質量%以上が熱可塑性樹脂に由来する。後述するように、保護膜は樹脂を溶媒に溶解した樹脂組成物を透明導電膜の上に塗布することにより形成される。そのため、保護膜を構成する樹脂成分の94質量%以上が熱可塑性樹脂に由来するとは、保護膜を形成するために用いる樹脂組成物中に含まれる樹脂成分の94質量%以上が熱可塑性樹脂であることを意味する。透明導電膜のバインダー樹脂及び透明基材を侵すことがなく、かつ透明導電膜上に良好に塗布することが可能な溶媒に樹脂成分を溶解し、透明導電膜上に膜形成が可能な樹脂組成物を用いる必要がある。適用できる樹脂組成物としては、例えば、エチルセルロースやカルボキシ基を有するポリウレタンを含む樹脂組成物が挙げられる。エチルセルロースを含む樹脂組成物としては、例えばエトセル(登録商標)STD-100(ダウ・ケミカル(米)社製 エチルセルロース 重量平均分子量:180,000、分子量分布(Mw/Mn)=3.0[カタログ値])が挙げられる。カルボキシ基を含有するポリウレタンは、その重量平均分子量が1,000~100,000であることが好ましく、3,000~85,000であることがより好ましく、5,000~70,000であることが更に好ましく、10,000~65,000であることが特に好ましい。本明細書において、カルボキシ基を含有するポリウレタンの重量平均分子量は、GPCで測定したポリスチレン換算の値である。カルボキシ基を含有するポリウレタンの重量平均分子量が1,000未満であると、塗膜の伸度、可撓性、並びに強度が損なわれる場合があり、100,000を超えると溶媒へのポリウレタンの溶解性が低くなる上に、溶解しても粘度が高くなりすぎるために、使用面で制約が大きくなる場合がある。
装置名:日本分光株式会社製HPLCユニット HSS-2000
カラム:ShodexカラムLF-804
移動相:テトラヒドロフラン
流速 :1.0mL/min
検出器:日本分光株式会社製 RI-2031Plus
温度 :40.0℃
試料量:サンプルル-プ 100μL
試料濃度:約0.1質量%
酸価(mg-KOH/g)=〔B×f×5.611〕/S
B:0.1N水酸化カリウム-エタノール溶液の使用量(mL)
f:0.1N水酸化カリウム-エタノール溶液のファクター
S:試料の採取量(g)
(a1)ポリイソシアネート化合物としては、通常、1分子当たりのイソシアナト基が2個であるジイソシアネートが用いられる。ポリイソシアネート化合物としては、例えば、脂肪族ポリイソシアネート、脂環式ポリイソシアネートが挙げられ、これらを単独で又は2種以上を組み合わせて用いることができる。カルボキシ基を含有するポリウレタンがゲル化をしない範囲で、イソシアナト基を3個以上有するポリイソシアネートも少量使用することができる。
(a2)ポリオール化合物(ただし、(a2)ポリオール化合物には、後述する(a3)カルボキシ基を有するジヒドロキシ化合物は含まれない。)の数平均分子量は通常250~50,000であり、好ましくは400~10,000、より好ましくは500~5,000である。ポリオール化合物の数平均分子量は前述した条件でGPCにより測定したポリスチレン換算の値である。
(a3)カルボキシ基を含有するジヒドロキシ化合物としては、ヒドロキシ基、又は炭素原子数が1若しくは2のヒドロキシアルキル基から選択されるいずれかを2つ有する、分子量が200以下のカルボン酸又はアミノカルボン酸であることが架橋点を制御できる点で好ましい。(a3)カルボキシ基を含有するジヒドロキシ化合物としては、例えば、2,2-ジメチロ-ルプロピオン酸、2,2-ジメチロ-ルブタン酸、N,N-ビスヒドロキシエチルグリシン、及びN,N-ビスヒドロキシエチルアラニンが挙げられ、これらの中でも、溶媒への溶解性が高いことから、2,2-ジメチロ-ルプロピオン酸、及び2,2-ジメチロ-ルブタン酸が好ましい。(a3)カルボキシ基を含有するジヒドロキシ化合物は、単独で又は2種以上を組み合わせて用いることができる。
銀ナノワイヤ1
ポリビニルピロリドンK-90(株式会社日本触媒製)(0.98g)、AgNO3(1.04g)及びFeCl3(0.8mg)を、エチレングリコール(250ml)に溶解し、150℃で1時間加熱反応した。得られた銀ナノワイヤ粗分散液を水/エタノール=20/80[質量比]混合溶媒2000mlに分散させ、卓上小型試験機(日本ガイシ株式会社製、セラミック膜フィルター セフィルト使用、膜面積0.24m2、孔径2.0μm、寸法Φ30mm×250mm、ろ過差圧0.01MPa)に流し入れ、循環流速12L/min、分散液温度25℃にてクロスフロー濾過を実施し不純物を除去し、銀ナノワイヤ1(平均直径:26nm、平均長さ:20μm)を得た。得られた銀ナノワイヤ1の平均径は、電界放出形走査電子顕微鏡JSM-7000F(日本電子株式会社製)を用いて任意に選択した100本の銀ナノワイヤ寸法(径)を測定し、その算術平均値として求めた。また、得られた銀ナノワイヤ1の平均長は、形状測定レーザマイクロスコープVK-X200(キーエンス株式会社製)を用いて任意に選択した100本の銀ナノワイヤ寸法(長さ)を測定し、その算術平均値として求めた。また、上記メタノール、エチレングリコール、AgNO3、FeCl3は富士フイルム和光純薬株式会社製試薬を用いた。
調製例1(銀ナノワイヤインク1)
上記ポリオール法で合成した銀ナノワイヤ1の水/エタノール混合溶媒の分散液11g(銀ナノワイヤ濃度0.62質量%、水/エタノール=20/80[質量比])、水1.1g、メタノール6.0g(富士フィルム和光純薬株式会社製)、エタノール7.2g(富士フィルム和光純薬株式会社製)、プロピレングリコールモノメチルエーテル(PGME、富士フィルム和光純薬株式会社製)12.8g、プロピレングリコール1.2g(PG、旭硝子株式会社製)、PNVA(登録商標)水溶液(昭和電工株式会社製、固形分濃度10質量%、絶対分子量90万)0.7gを混合し、ミックスローターVMR-5R(アズワン株式会社製)で1時間、室温、大気雰囲気下で撹拌(回転速度100rpm)して銀ナノワイヤインク1を40g作製した。
銀ナノワイヤインク1において配合したPNVA(登録商標)水溶液(昭和電工株式会社製、固形分濃度10質量%、絶対分子量90万)0.7gをエトセル(登録商標)STD100cps(ダウ・ケミカル(米)社製 エチルセルロース、重量平均分子量:180,000、分子量分布(Mw/Mn)=3.0[カタログ値])を用いて調製した溶液(固形分濃度10質量%、エタノール溶液)0.7gに変更した以外は調製例1同様に調製し、銀ナノワイヤインク2を得た。エタノールは、富士フイルム和光純薬株式会社製試薬を用いた。
上記調製例1で調製した、銀ナノワイヤインク1を用いて、バーコート印刷機(コーテック株式会社社製AFA-Standard)により、PCフィルム(三菱ガス化学株式会社製 ユーピロン(登録商標)FS-2000H ガラス転移温度:130℃(カタログ値)、100μm厚)の主面上に、ウェット膜厚20μmにて塗工し、A4サイズのベタパターンとして透明導電膜(銀ナノワイヤインク塗膜)を印刷した。楠本化成株式会社製恒温器ETAC HS350を用い、80℃、1分の条件で溶媒乾燥を行った後、得られた透明導電膜のシート抵抗を測定した。シート抵抗は、透明導電膜(ベタパターン)を3cm角毎のエリアに区切り、各々のエリアの中央付近を測定した30点のシート抵抗の算術平均値である。銀ナノワイヤインク1を用いた透明導電膜のシート抵抗は、いずれも50Ω/□であった。なお、シート抵抗は非接触式抵抗測定器(ナプソン株式会社製 EC-80P)を用いて測定した。また、透明導電膜の厚みは、光干渉法に基づく膜厚測定システムF20-UV(フィルメトリクス株式会社製)を用いて測定した結果、80nmであった。測定箇所を変え、3点測定した平均値を膜厚として用いた。解析には450nmから800nmのスペクトルを用いた。この測定システムによると、透明基材上に形成された銀ナノワイヤ層の膜厚(Tc)が直接測定できる。
カルボキシ基を含有するポリウレタンの合成例
合成例1
攪拌装置、温度計、コンデンサー(還流冷却器)を備えた2L三口フラスコに、ポリオール化合物としてC-1015N(株式会社クラレ製、ポリカーボネートジオール、原料ジオールモル比:1,9-ノナンジオール:2-メチル-1,8-オクタンジオール=15:85、分子量964)16.7g、カルボキシ基を含有するジヒドロキシ化合物として2,2-ジメチロールブタン酸(湖州長盛化工有限公司社製)10.8g、及び溶媒としてプロピレングリコールモノメチルエーテルアセテート(富士フイルム和光純薬株式会社製)62.6gを仕込み、90℃で前記2,2-ジメチロールブタン酸を溶解させた。
上記合成例1で得られたカルボキシ基を含有するポリウレタン溶液(固形分濃度42.4質量%)7.1g、溶媒として1-ヘキサノール(C6OH)と酢酸エチル(EA)(C6OH:EA=50:50(質量比))の混合物92.9gを加え、均一になるようにシンキー社製の自転・公転真空ミキサーあわとり練太郎(登録商標)ARV-310を用いて、1200rpmで20分間撹拌し、保護膜インク1を得た。溶媒乾燥前後の質量より算出した保護膜インク1の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタンの量)は3質量%であった。
保護膜インク1において配合したカルボキシ基を含有するポリウレタン溶液をエトセル(登録商標)STD100cps(ダウ・ケミカル(米)社製 エチルセルロース)溶液(固形分濃度10質量%エタノール溶液)30.0gに変更し、溶媒として1-ヘキサノール(C6OH)と酢酸エチル(EA)(C6OH:EA=50:50(質量比))の混合物70.0gを加えた以外は保護膜インク1と同様に調製し、保護膜インク2を得た。溶媒乾燥前後の質量より算出した保護膜インク2の不揮発分(固形分)濃度(エトセル(登録商標)の量)は3質量%であった。
上記合成例1で得られたカルボキシ基を含有するポリウレタン溶液(固形分濃度42.4質量%)1.8g、エポキシ化合物1としてペンタエリスリトールテトラグリシジルエーテル(昭和電工株式会社製)0.1g、硬化促進剤としてU-CAT5003(第4級ホスホニウムブロマイド)(サンアプロ株式会社製)0.05g、溶媒として1-ヘキサノール(C6OH)と酢酸エチル(EA)(C6OH:EA=50:50(質量比))の混合物28.0gを加え、均一になるように株式会社シンキー製の自転・公転真空ミキサーあわとり練太郎(登録商標)ARV-310を用いて、1200rpmで20分間撹拌し、保護膜インク3を得た。溶媒乾燥前後の質量より算出した保護膜インク3の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。保護膜インク3中のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は1.0である。
保護膜インク3において配合したエポキシ化合物1をエポキシ化合物2(EPICLON(登録商標)850(DIC株式会社製 ビスフェノールA型液状エポキシ樹脂))0.2gに、硬化促進剤を0.1gに、それぞれ変更した以外は保護膜インク3と同様に調製し、保護膜インク4を得た。溶媒乾燥前後の質量より算出した保護膜インク4の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。保護膜インク4中のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は1.0である。
保護膜インク3において、配合したエポキシ化合物1の量を0.07gに変更した以外は保護膜インク3と同様に調製し、保護膜インク5を得た。保護膜インク5のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は0.7である。溶媒乾燥前後の質量より算出した保護膜インク5の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。
保護膜インク3において、配合したエポキシ化合物1の量を0.2gに変更した以外は保護膜インク3と同様に調製し、保護膜インク6を得た。保護膜インク6のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は2.0である。溶媒乾燥前後の質量より算出した保護膜インク6の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。
保護膜インク4において、配合したエポキシ化合物2の量を0.13gに変更した以外は保護膜インク4と同様に調製し、保護膜インク7を得た。保護膜インク7のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は0.7である。溶媒乾燥前後の質量より算出した保護膜インク7の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。
保護膜インク3において、配合したエポキシ化合物1の量を0.05gに変更した以外は保護膜インク3と同様に調製し、保護膜インク8を得た。保護膜インク8のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は0.5である。溶媒乾燥前後の質量より算出した保護膜インク8の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。
保護膜インク3において、配合したエポキシ化合物1の量を0.01gに変更した以外は保護膜インク3と同様に調製し、保護膜インク9を得た。保護膜インク9のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は0.1である。溶媒乾燥前後の質量より算出した保護膜インク9の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。
保護膜インク3において、配合したエポキシ化合物1の量を0.002gに変更した以外は保護膜インク3と同様に調製し、保護膜インク10を得た。保護膜インク10のカルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)は0.02である。溶媒乾燥前後の質量より算出した保護膜インク10の不揮発分(固形分)濃度(カルボキシ基を含有するポリウレタン、エポキシ化合物、硬化促進剤の総量)は3質量%であった。
実施例1
上記調製例1により得られた銀ナノワイヤインク1を用いて、PCフィルムの主面上に印刷した透明導電膜(銀ナノワイヤインク塗膜)に、前述のバーコート印刷機を用いて透明導電膜の主面上に、ウェット膜厚約7μmにて保護膜インク1を塗工し、A4サイズのベタパターンとして保護膜つき透明導電膜(保護膜つき銀ナノワイヤインク塗膜)を印刷した。前述の恒温器を用い、80℃、1分間の条件で溶媒乾燥を行って、実施例1にかかる透明導電フィルム積層体とした。得られた透明導電フィルム積層体のシート抵抗を測定した。この場合のシート抵抗は、透明導電フィルム積層体(ベタパターン)を3cm角毎のエリアに区切り、各々のエリアの中央付近を測定した30点のシート抵抗の算術平均値である。保護膜インク1を用いた透明導電フィルム積層体のシート抵抗は、いずれも50Ω/□であった。なお、シート抵抗は前述の非接触式抵抗測定器を用いて測定した。また、保護膜の厚みは、前述の銀ナノワイヤ層の膜厚同様光干渉法に基づく膜厚測定システムF20-UV(フィルメトリクス株式会社製)を用いて測定した結果、90nmであった。この場合、測定箇所を変え、3点測定した平均値を膜厚とした。解析には450nmから800nmのスペクトルを用いた。この測定システムによると、透明基材上に形成された銀ナノワイヤ層の膜厚(Tc)とその上に形成された保護膜の膜厚(Tp)との総膜厚(Tc+Tp)が直接測定できるので、この測定値から先に測定した銀ナノワイヤ層の膜厚(Tc)を差し引くことにより保護膜の膜厚(Tp)が得られる。
実施例1と同様にして、表1に示した組合せで銀ナノワイヤインク塗膜、保護膜を製膜して、それぞれの透明導電フィルム積層体とした。なお、比較例8は、15%の歪みを加えても断線等の不具合が発生しない配線形成が可能であることを事前に確認した、保護膜を製膜しない透明基材に銀ナノワイヤインク塗膜のみを設けた2層構成である。
<シート抵抗値>
非接触式抵抗測定器(ナプソン株式会社製 EC-80P、プローブタイプHigh:10~1000Ω/□、S-High:1000~3000Ω/□)を用いて上記各実施例、比較例で得られた各透明導電フィルム積層体のシート抵抗値を測定し、下記判定に従い判定した。結果を表2に示す。
○:各箇所のシート抵抗値の平均値が50±5Ω/□であり、σが10以下である。
△:各箇所のシート抵抗値の平均値が50±5Ω/□であり、σが30以下である。
×:各箇所のシート抵抗値の平均値が50±5Ω/□でない。
上記各実施例、比較例で得られた各透明導電フィルム積層体をHaze meter NDH 2000(日本電色社製)で測定し、下記判定に従い、判定した。結果を表2に示す。
○:Hazeが1.0以下かつ、全光線透過率が88%以上かつ、b*が1.4以下であるもの。
△:上記に2項目が該当するもの。
×:上記に1項目が該当する、もしくは該当するものがないもの。
引張試験は上記各実施例、比較例で得られた各透明導電フィルム積層体を幅30mm、長さ160mmの短冊状に裁断した試験片を用いた。事前にチャック間に相当する部位に10mm間隔で標線を付け、10か所に区切り、それぞれのシート抵抗値を測定し、これをR0とした。その後、上記試験片を精密万能試験器(島津製作所製オートグラフAG-X)にセットした。セット時のチャック間距離は100mmであり、試験速度50mm/min、試験設定温度155℃で任意のひずみを与えた。試験後に10か所のシート抵抗値を再度測定し、これをRとした。この値からR/R0を算出し、下記判定に従い、判定した。結果を表2に示す。
○:15%歪み時のR/R0の平均値が10以下であるもの。
△:15%歪み時のR/R0の平均値が10以上であるもの。
×:上記に該当しないもの。
上記各実施例、比較例で得られた各透明導電フィルム積層体を85℃、85%に保った高温高湿器内にて、500時間経過後の抵抗値変化を算出し、下記判定に従い、判定した。結果を表2に示す。
○:抵抗値変化が10%以下であるもの。
△:抵抗値変化が10%を超え20%以下であるもの。
×:抵抗値変化が20%を超えたもの。
実施例4
実施例1で得られた透明導電フィルム積層体の保護膜側に、OCAを介して前面板を貼合することで透明導電フィルム積層体と前面板との成形用積層体を製造した。OCAとしては日東電工株式会社製CS9864UAS(厚み100μm)を使用した。前面板としては三菱ガス化学製FS-2000H(厚み0.5mm)を使用した。具体的には、両面にセパレータを具えたOCAを所定の大きさに裁断後、一方のセパレータを剥離して、一方の粘着面を前面板の表面にハンドローラー(2kgローラー)を用いて1往復の条件で貼り付けた。次に、他方のセパレータを剥離して、他方の粘着面を透明導電フィルム積層体の保護膜側に下記条件で貼り付けて、透明導電フィルム積層体と前面板との積層体(成形用透明導電フィルム積層体)を作製し、試験片とした。
(貼り合わせ条件)
面圧:0.4MPa
真空度:30Pa
貼り付け時間:2秒
次に、上記試験片をオートクレーブに投入し、温度50℃、圧力0.5MPaの条件で15分間、オートクレーブ処理した。さらに、上記試験片は、23℃、50%RHの環境下に1時間静置した後、試験に使用した。
銀ナノワイヤインク1の代わりに銀ナノワイヤインク2を使用し、実施例1同様に製造して得られた透明導電フィルム積層体を用いて、実施例4同様に透明導電フィルム積層体と前面板との積層体を作製した。
比較例8にかかる透明導電フィルム積層体を用いた以外は実施例4と同様に透明導電フィルム積層体と前面板との積層体を作製した。
銀ナノワイヤインク1の代わりに銀ナノワイヤインク2を使用し、比較例8同様に製造して得られた透明導電フィルム積層体を用いて、比較例9と同様に透明導電フィルム積層体と前面板との積層体を作製した。
<シート抵抗値>
非接触式抵抗測定器(ナプソン株式会社製 EC-80P、プローブタイプHigh:10~1000Ω/□、S-High:1000~3000Ω/□)を用いて上記各実施例、比較例で得られた各成形用透明導電フィルム積層体のシート抵抗値を透明基材側(前面板を貼合した面とは反対側の面)から測定し、下記判定に従い判定した。結果を表3に示す。
○:各箇所のシート抵抗値の平均値が50±5Ω/□であり、σが10以下である。
△:各箇所のシート抵抗値の平均値が50±5Ω/□であり、σが30以下である。
×:各箇所のシート抵抗値の平均値が50±5Ω/□でない。
上記各実施例、比較例で得られた各成形用透明導電フィルム積層体をHaze meter NDH 2000(日本電色社製)で測定し、下記判定に従い、判定した。結果を表2に示す。
○:Hazeが1.0以下かつ、全光線透過率が88%以上かつ、b*が1.4以下であるもの。
△:上記に2項目が該当するもの。
×:上記に1項目が該当する、もしくは該当するものがないもの。
引張試験は上記各実施例、比較例で得られた各成形用透明導電フィルム積層体を幅30mm、長さ160mmの短冊状に裁断した試験片を用いた。事前にチャック間に相当する部位に10mm間隔で標線を付け、10か所に区切り、それぞれのシート抵抗値を測定し、これをR0とした。その後、上記試験片を精密万能試験器(島津製作所製オートグラフAG-X)にセットした。セット時のチャック間距離は100mmであり、試験速度50mm/min、試験温度155℃で任意のひずみを与えた。試験後に10か所のシート抵抗値を再度測定し、これをRとした。この値からR/R0を算出し、下記判定に従い、判定した。結果を表2に示す。
○:15%歪み時のR/R0の平均値が10以下であるもの。
△:15%歪み時のR/R0の平均値が10以上であるもの。
×:上記に該当しないもの。
上記各実施例、比較例で得られた各成形用透明導電フィルム積層体を85℃、85%RHに保った高温高湿器内にて、500時間経過後の抵抗値変化を算出し、下記判定に従い、判定した。結果を表3に示す。
○:抵抗値変化が10%以下であるもの。
△:抵抗値変化が10%を超え20%以下であるもの。
×:抵抗値変化が20%を超えたもの。
Claims (8)
- 透明な熱可塑性樹脂フィルムよりなる透明基材と、
前記透明基材の少なくとも一方の主面上に形成され、バインダー樹脂及び金属ナノワイヤを含んで構成された透明導電膜と、
前記透明導電膜上に形成された樹脂成分を含む保護膜と、
を有し、前記バインダー樹脂が、ポリ-N-ビニルアセトアミド、N-ビニルアセトアミド(NVA)をモノマー単位として70モル%以上含む共重合体、及びセルロース系樹脂の少なくとも一種を含み、かつ前記保護膜を構成する樹脂成分の94質量%以上が熱可塑性樹脂に由来することを特徴とする透明導電フィルム積層体。 - 前記バインダー樹脂が、ポリ-N-ビニルアセトアミド、及びN-ビニルアセトアミド(NVA)をモノマー単位として70モル%以上含む共重合体の少なくとも一方である請求項1に記載の透明導電フィルム積層体。
- 前記透明な熱可塑性樹脂フィルムがポリカーボネートフィルムである請求項1又は2に記載の透明導電フィルム積層体。
- 前記バインダー樹脂がポリ-N-ビニルアセトアミドである請求項1から3のいずれか一項に記載の透明導電フィルム積層体。
- 前記保護膜を構成する樹脂成分が、カルボキシ基を含有するポリウレタン又はエチルセルロースを含む熱可塑性樹脂に由来する請求項1から4のいずれか一項に記載の透明導電フィルム積層体。
- 前記保護膜を構成する樹脂成分が、カルボキシ基を含有するポリウレタンと一分子中に2個以上のエポキシ基を有するエポキシ樹脂に由来し、前記一分子中に2個以上のエポキシ基を有するエポキシ樹脂の含有量が、前記樹脂成分中、0質量%超、6質量%以下であり、前記カルボキシ基を含有するポリウレタンが有するカルボキシ基(COOH)に対する前記一分子中に2個以上のエポキシ基を有するエポキシ樹脂が有するエポキシ基(Ep)のモル比(Ep/COOH)が0超、0.02以下である、請求項5に記載の透明導電フィルム積層体。
- 前記金属ナノワイヤが銀ナノワイヤである請求項1から6のいずれか一項に記載の透明導電フィルム積層体。
- 請求項1から7のいずれか一項に記載の透明導電フィルム積層体と、ポリカーボネートを主成分とする樹脂フィルムとの成形用透明導電フィルム積層体。
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