WO2022123023A1 - Black plated substrate - Google Patents
Black plated substrate Download PDFInfo
- Publication number
- WO2022123023A1 WO2022123023A1 PCT/EP2021/085219 EP2021085219W WO2022123023A1 WO 2022123023 A1 WO2022123023 A1 WO 2022123023A1 EP 2021085219 W EP2021085219 W EP 2021085219W WO 2022123023 A1 WO2022123023 A1 WO 2022123023A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chromium
- black
- layer
- plating layer
- less
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 141
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 177
- 239000011651 chromium Substances 0.000 claims abstract description 166
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 166
- 238000007747 plating Methods 0.000 claims abstract description 137
- 238000006243 chemical reaction Methods 0.000 claims abstract description 78
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 13
- 229910052759 nickel Inorganic materials 0.000 claims description 13
- 229920003023 plastic Polymers 0.000 claims description 11
- 239000004033 plastic Substances 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 7
- VQWFNAGFNGABOH-UHFFFAOYSA-K chromium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Cr+3] VQWFNAGFNGABOH-UHFFFAOYSA-K 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 239000002245 particle Substances 0.000 description 12
- 238000009713 electroplating Methods 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 8
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 7
- 125000004429 atom Chemical group 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 6
- 229910000423 chromium oxide Inorganic materials 0.000 description 6
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 5
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 230000008447 perception Effects 0.000 description 5
- FFEARJCKVFRZRR-BYPYZUCNSA-N L-methionine Chemical compound CSCC[C@H](N)C(O)=O FFEARJCKVFRZRR-BYPYZUCNSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000004952 Polyamide Substances 0.000 description 4
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229930182817 methionine Natural products 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- -1 polypropylene Polymers 0.000 description 3
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 3
- 229940116357 potassium thiocyanate Drugs 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N thiocyanic acid Chemical compound SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229920008285 Poly(ether ketone) PEK Polymers 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003666 anti-fingerprint Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910001430 chromium ion Inorganic materials 0.000 description 1
- DSHWASKZZBZKOE-UHFFFAOYSA-K chromium(3+);hydroxide;sulfate Chemical compound [OH-].[Cr+3].[O-]S([O-])(=O)=O DSHWASKZZBZKOE-UHFFFAOYSA-K 0.000 description 1
- 229910000151 chromium(III) phosphate Inorganic materials 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 229910000356 chromium(III) sulfate Inorganic materials 0.000 description 1
- 235000015217 chromium(III) sulphate Nutrition 0.000 description 1
- 239000011696 chromium(III) sulphate Substances 0.000 description 1
- IKZBVTPSNGOVRJ-UHFFFAOYSA-K chromium(iii) phosphate Chemical compound [Cr+3].[O-]P([O-])([O-])=O IKZBVTPSNGOVRJ-UHFFFAOYSA-K 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910001429 cobalt ion Inorganic materials 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000004573 interface analysis Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N iron (II) ion Substances [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/08—Rinsing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/08—Deposition of black chromium, e.g. hexavalent chromium, CrVI
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Definitions
- a nickel or nickel alloy plating layer preferably an electroless nickel alloy plating layer
- the chromium plating layer is black. This black is preferably optically perceived as a deep dark black. Most preferably, the entire black plated substrate is perceived in this manner. Most preferred is a black plated substrate of the present invention, wherein the black chromium plating layer is obtained from a trivalent chromium electroplating bath. This means that the source of the chromium in the black chromium plating layer is chromium in its trivalent state and not from hexavalent chromium.
- the black chromium plating layer excluding the conversion layer, preferably has a higher thickness than the depth (or thickness) of the conversion layer.
- the black chromium plating layer, excluding the conversion layer is at least twice the thickness of the conversion layer, preferably at least 3 times, more preferably at least 4 to 5 times, even more preferably at least 6 to 7 times, most preferably at least 8 to 9 times, even most preferably at least 10 times.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18/256,691 US20240011178A1 (en) | 2020-12-11 | 2021-12-10 | Black plated substrate |
| JP2023535571A JP2023553966A (ja) | 2020-12-11 | 2021-12-10 | 黒色めっき基板 |
| CN202180088357.8A CN116635576A (zh) | 2020-12-11 | 2021-12-10 | 镀黑衬底 |
| EP21834800.1A EP4259855A1 (en) | 2020-12-11 | 2021-12-10 | Black plated substrate |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP20213572 | 2020-12-11 | ||
| EP20213575.2 | 2020-12-11 | ||
| EP20213572.9 | 2020-12-11 | ||
| EP20213575 | 2020-12-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2022123023A1 true WO2022123023A1 (en) | 2022-06-16 |
Family
ID=79165022
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2021/085219 WO2022123023A1 (en) | 2020-12-11 | 2021-12-10 | Black plated substrate |
| PCT/EP2021/085213 WO2022123019A1 (en) | 2020-12-11 | 2021-12-10 | Method for electrodepositing a dark chromium layer on a substrate and substrate having at least one side fully covered with a dark chromium layer |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2021/085213 WO2022123019A1 (en) | 2020-12-11 | 2021-12-10 | Method for electrodepositing a dark chromium layer on a substrate and substrate having at least one side fully covered with a dark chromium layer |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20240011178A1 (zh) |
| EP (2) | EP4259854A1 (zh) |
| JP (3) | JP7467758B2 (zh) |
| CN (1) | CN115803479A (zh) |
| TW (1) | TW202231930A (zh) |
| WO (2) | WO2022123023A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117488300B (zh) * | 2024-01-02 | 2024-03-29 | 仪征亚新科双环活塞环有限公司 | 一种具有硬质镀层的活塞环及其制备方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012150198A2 (en) * | 2011-05-03 | 2012-11-08 | Atotech Deutschland Gmbh | Electroplating bath and method for producing dark chromium layers |
| EP3299497A1 (en) * | 2016-09-27 | 2018-03-28 | ATOTECH Deutschland GmbH | Method for treatment of a chromium surface |
| WO2019142487A1 (ja) * | 2018-01-19 | 2019-07-25 | 豊田合成株式会社 | めっき構造体の製造方法 |
| US20200094526A1 (en) | 2018-09-26 | 2020-03-26 | Toyoda Gosei Co., Ltd. | Black plated resin part and method for producing the same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8273235B2 (en) * | 2010-11-05 | 2012-09-25 | Roshan V Chapaneri | Dark colored chromium based electrodeposits |
| CN105264122B (zh) * | 2013-01-10 | 2018-11-02 | 科文特亚股份有限公司 | 保持三价铬电镀浴电镀效率的仪器和方法 |
| JP6973242B2 (ja) * | 2018-03-30 | 2021-11-24 | 豊田合成株式会社 | 電気めっき浴、めっき製品の製造方法、及びめっき製品 |
| JP7030739B2 (ja) * | 2019-03-28 | 2022-03-07 | 豊田合成株式会社 | 黒色めっき樹脂部品及びその製造方法 |
-
2021
- 2021-12-10 JP JP2023501840A patent/JP7467758B2/ja active Active
- 2021-12-10 TW TW110146220A patent/TW202231930A/zh unknown
- 2021-12-10 WO PCT/EP2021/085219 patent/WO2022123023A1/en active Application Filing
- 2021-12-10 EP EP21834798.7A patent/EP4259854A1/en active Pending
- 2021-12-10 EP EP21834800.1A patent/EP4259855A1/en active Pending
- 2021-12-10 JP JP2023535571A patent/JP2023553966A/ja active Pending
- 2021-12-10 US US18/256,691 patent/US20240011178A1/en active Pending
- 2021-12-10 WO PCT/EP2021/085213 patent/WO2022123019A1/en unknown
- 2021-12-10 CN CN202180048786.2A patent/CN115803479A/zh active Pending
- 2021-12-10 US US18/000,221 patent/US20230193496A1/en active Pending
-
2023
- 2023-02-20 JP JP2023000502U patent/JP3242417U/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012150198A2 (en) * | 2011-05-03 | 2012-11-08 | Atotech Deutschland Gmbh | Electroplating bath and method for producing dark chromium layers |
| EP3299497A1 (en) * | 2016-09-27 | 2018-03-28 | ATOTECH Deutschland GmbH | Method for treatment of a chromium surface |
| WO2019142487A1 (ja) * | 2018-01-19 | 2019-07-25 | 豊田合成株式会社 | めっき構造体の製造方法 |
| US20200094526A1 (en) | 2018-09-26 | 2020-03-26 | Toyoda Gosei Co., Ltd. | Black plated resin part and method for producing the same |
Non-Patent Citations (1)
| Title |
|---|
| B. R. STROHMEIER, SURFACE AND INTERFACE ANALYSIS, vol. 15, 1990, pages 51 - 56 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20230193496A1 (en) | 2023-06-22 |
| TW202231930A (zh) | 2022-08-16 |
| WO2022123019A1 (en) | 2022-06-16 |
| JP7467758B2 (ja) | 2024-04-15 |
| JP3242417U (ja) | 2023-06-15 |
| US20240011178A1 (en) | 2024-01-11 |
| CN115803479A (zh) | 2023-03-14 |
| JP2023553966A (ja) | 2023-12-26 |
| EP4259854A1 (en) | 2023-10-18 |
| EP4259855A1 (en) | 2023-10-18 |
| JP2023531317A (ja) | 2023-07-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11248300B2 (en) | Chrome-plated part and manufacturing method of the same | |
| US10081312B2 (en) | Black plated resin part and method for manufacturing the same | |
| WO2009028182A2 (en) | Chrome-plated part and manufacturing method of the same | |
| US11198944B2 (en) | Black plated resin part and method for producing the same | |
| WO2022123023A1 (en) | Black plated substrate | |
| JP7030739B2 (ja) | 黒色めっき樹脂部品及びその製造方法 | |
| CN117480280A (zh) | 用于调节电镀铬层的明度l*的方法 | |
| JP6823030B2 (ja) | 黒色めっき樹脂部品 | |
| CN116635576A (zh) | 镀黑衬底 | |
| JP3242416U (ja) | 黒色クロム層を備えた基板 | |
| JP7227338B2 (ja) | 黒色めっき樹脂部品の黄味がかり抑制方法 | |
| JP7015403B2 (ja) | 黒色めっき樹脂部品 | |
| KR20020000855A (ko) | 마그네슘 합금에 양극산화피막을 형성한 후 그 위에동도금층 및 니켈도금층을 전해도금으로 형성하는 방법 | |
| WO2022258680A1 (en) | Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 21834800 Country of ref document: EP Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2023535571 Country of ref document: JP Ref document number: 18256691 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 202180088357.8 Country of ref document: CN |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| ENP | Entry into the national phase |
Ref document number: 2021834800 Country of ref document: EP Effective date: 20230711 |