WO2022113445A1 - ロボットシステム及びスリップ判定方法 - Google Patents
ロボットシステム及びスリップ判定方法 Download PDFInfo
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- WO2022113445A1 WO2022113445A1 PCT/JP2021/030882 JP2021030882W WO2022113445A1 WO 2022113445 A1 WO2022113445 A1 WO 2022113445A1 JP 2021030882 W JP2021030882 W JP 2021030882W WO 2022113445 A1 WO2022113445 A1 WO 2022113445A1
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- 238000000034 method Methods 0.000 title claims description 12
- 238000001514 detection method Methods 0.000 claims description 32
- 238000012546 transfer Methods 0.000 claims description 28
- 230000001133 acceleration Effects 0.000 claims description 12
- 230000032258 transport Effects 0.000 abstract description 8
- 235000012431 wafers Nutrition 0.000 description 111
- 238000012545 processing Methods 0.000 description 10
- 230000003028 elevating effect Effects 0.000 description 9
- 230000006870 function Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 5
- 230000006399 behavior Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000012636 effector Substances 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000010801 machine learning Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
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- 239000002699 waste material Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
- H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/41—Servomotor, servo controller till figures
- G05B2219/41136—Compensation of position for slip of ac motor
Definitions
- the present disclosure relates to the detection of slips that occur between the wafer and the holding portion of the robot when the wafer is conveyed by the robot.
- Patent Document 1 discloses this type of system.
- Patent Document 1 discloses a system for processing a substrate (wafer).
- the system comprises a transport unit for transporting the substrate.
- a position detection sensor is provided at a position between the transfer source position and the transfer destination position of the substrate (wafer) by the transfer unit.
- the position during transport is detected by the position detection sensor. Based on the detected position of the substrate, the transfer destination position set at the start of transfer of the substrate is corrected.
- Patent Document 1 requires a special position detection sensor, which causes the configuration to be complicated and the cost to increase. Further, in the configuration of Patent Document 1, although the displacement of the wafer can be detected at the time when the wafer passes through the position detection sensor, the occurrence of the displacement (slip) of the wafer cannot be detected immediately.
- the present disclosure has been made in view of the above circumstances, and the purpose is to immediately determine the occurrence of slip between the wafer and the holding portion of the robot without the need for a separately provided detection device.
- the purpose is to provide a robot system that can be used.
- a robot system having the following configuration. That is, this robot system includes a robot and a control unit.
- the robot has one or more joints driven by an electric motor and can hold the wafer by a holding portion.
- the control unit gives a command to the robot to control it.
- the control unit determines whether or not a slip has occurred between the holding unit and the wafer based on the information related to the electric motor. At least one of the determination and the estimation of the slip amount of the wafer with respect to the holding portion is performed.
- a robot system having the following configuration. That is, this robot includes a control unit and a position deviation detecting device.
- the robot has one or more joints driven by an electric motor and can hold the wafer by a holding portion.
- the control unit gives a command to the robot to control it.
- the misalignment detecting device can detect the misalignment of the wafer.
- the control unit sets a transfer route for the wafer based on a determination result of whether or not a slip has occurred between the wafer and the holding unit during the transfer of the wafer, or based on the amount of slip. The first route that does not pass through the misalignment detection device and the second route that passes through the misalignment detection device are switched.
- this slip determination method determines the occurrence of slip between the wafer and the holding unit in a robot system including a robot and a control unit.
- the robot has one or more joints driven by an electric motor and can hold the wafer by a holding portion.
- the control unit gives a command to the robot to control it.
- This slip determination method includes a first step and a second step. In the first step, when the wafer is held and conveyed by the holding portion, information about the electric motor is acquired. In the second step, it is determined whether or not the slip has occurred based on the information.
- the perspective view which shows the structure of the robot system which concerns on one Embodiment of this disclosure.
- FIG. 1 is a perspective view showing a configuration of a robot system 100 according to an embodiment of the present disclosure.
- FIG. 2 is a perspective view showing the configuration of the robot 1 in detail.
- FIG. 3 is a block diagram showing a partial configuration of the robot system 100.
- FIG. 4 is a graph showing the current values of the electric motors that drive each part of the robot 1.
- FIG. 5 is a graph showing the position deviations of the electric motors that drive each part of the robot 1.
- the robot system 100 shown in FIG. 1 is a system that allows the robot 1 to perform work in a work space such as a clean room.
- the robot system 100 is applied to the semiconductor processing system (not shown). In the semiconductor processing system, various predetermined processes are applied to the wafer 2 to be the substrate to be processed. The robot system 100 is used to transfer the wafer 2 between various devices and the like included in the semiconductor processing system.
- the robot system 100 includes a robot 1, a control device (control unit) 5, and a position deviation detection device 8.
- the robot 1 functions as a wafer transfer robot that conveys the wafer 2 stored in the storage device 6.
- the robot 1 is realized by a SCARA type horizontal articulated robot.
- SCARA is an abbreviation for Selective Company Associate Robot Arm.
- the robot 1 includes a hand (holding unit) 10, a manipulator 11, and a posture detecting unit 12.
- the hand 10 is a kind of end effector, and is generally formed in a V shape or a U shape in a plan view.
- the hand 10 is supported by the tip of the manipulator 11 (specifically, the second link 16 described later).
- the hand 10 rotates about the fourth axis c4 extending in the vertical direction with respect to the second link 16.
- the manipulator 11 mainly includes a base 13, an elevating shaft 14, and a plurality of links (here, first link 15 and second link 16).
- the base 13 is fixed to the ground (for example, the floor of a clean room).
- the base 13 functions as a base member that supports the elevating shaft 14.
- the elevating shaft 14 moves in the vertical direction with respect to the base 13. By this raising and lowering, the heights of the first link 15, the second link 16, and the hand 10 can be changed.
- the elevating shaft 14 rotates about the first shaft c1 extending in the vertical direction with respect to the base 13. Thereby, the posture of the first link 15 (or the second link and the hand 10) supported by the elevating shaft 14 can be changed in the horizontal plane.
- the first link 15 is supported on the upper part of the elevating shaft 14.
- the first link 15 rotates about the second axis c2 extending in the vertical direction with respect to the elevating shaft 14. As a result, the posture of the first link 15 can be changed in the horizontal plane.
- the second link 16 is supported by the tip of the first link 15.
- the second link 16 rotates about the third axis c3 extending in the vertical direction with respect to the first link 15. As a result, the posture of the second link 16 can be changed in the horizontal plane.
- the robot 1 of the present embodiment is provided with an actuator that individually rotates each part (elevating shaft 14, first link 15, second link 16, and hand 10) provided around each shaft.
- This actuator is configured as the electric motor 3 shown in FIG.
- Each electric motor 3 is electrically connected to the control device 5 via a drive device such as a driver (not shown).
- the control device 5 outputs a control command (command rotation position) or the like to the driver to control the rotation of the electric motor 3.
- the posture detection unit 12 includes a plurality of rotation sensors 12a.
- the rotation sensor 12a is composed of, for example, an encoder. Each rotation sensor 12a detects the rotation position of the electric motor 3 that drives the hand 10, the elevating shaft 14, the first link 15, and the second link 16. Each rotation sensor 12a is electrically connected to the control device 5, and transmits the detected rotation position to the control device 5.
- the control device 5 is configured as a known computer equipped with a CPU, ROM, RAM, an auxiliary storage device, and the like.
- the auxiliary storage device is configured as, for example, an HDD, an SSD, or the like.
- the auxiliary storage device stores a robot control program or the like for controlling the robot 1.
- This robot control program includes a slip determination program for realizing each step of the slip determination method of the present disclosure.
- the control device 5 outputs a control command such as a command rotation position to each electric motor 3 for driving each part of the robot 1 and controls the robot 1 in accordance with a predetermined operation program or a movement command input from the user. Move the hand 10 to a predetermined command position.
- the position deviation detecting device 8 is composed of, for example, a pre-aligner (wafer aligner). As shown in FIG. 1, the position deviation detection device 8 includes a rotary table 81 and a line sensor 82.
- the rotary table 81 can rotate the wafer 2 by an electric motor or the like (not shown).
- the rotary table 81 rotates with the wafer 2 placed on it.
- the rotary table 81 is formed, for example, in a columnar shape.
- the line sensor 82 is composed of, for example, a transmissive sensor having a light emitting part and a light receiving part.
- the light projecting unit and the light receiving unit are arranged so as to face each other and at a predetermined interval in the vertical direction.
- the line sensor 82 projects the detection light through the light projecting units arranged in the radial direction of the rotary table 81, and receives the detection light through the light receiving unit provided below the light projecting unit.
- the detection light may be, for example, a laser beam.
- the line sensor 82 is electrically connected to, for example, the control device 5.
- the line sensor 82 transmits the detection result of the light receiving unit to the control device 5.
- the change in the detection result of the light receiving portion when the rotary table 81 is rotated corresponds to the shape of the outer edge of the wafer 2. From the shape of the outer edge, it is possible to detect the positional deviation of the center of the wafer 2 from the rotation center of the rotary table 81. Therefore, in the position shift detection device 8, the position shift detection reference position is the rotation center of the rotary table 81.
- the control device 5 acquires the actual position deviation amount of the wafer 2 based on the detection result of the light receiving unit.
- the determination of slip occurrence by the robot system 100 of the present embodiment can be performed at an arbitrary timing in the process in which the robot 1 conveys the wafer 2 by the hand 10. That is, the transfer of the wafer 2 by the robot 1 can be considered as a series of operations from taking out the wafer 2 at a certain place with the hand 10 to placing the wafer 2 at another place. The presence or absence of slip can be determined at any timing from the start to the end of a series of operations.
- the surface of the wafer 2 may have adhesiveness.
- the wafer 2 may show a behavior of trying to stay in place as if it were attached to the storage device 6.
- slip occurs between the wafer 2 and the hand 10, and the position of the wafer 2 with respect to the hand 10 shifts.
- the current flowing through each of the electric motors 3 for driving each part of the robot 1, the position of the electric motor 3, the position deviation, and the electric motor are used in the operation of the robot 1.
- Information on the speed and acceleration, speed deviation, acceleration deviation, etc. of No. 3 is monitored.
- the position, speed and acceleration with respect to the electric motor 3 mean the rotational position, rotational speed and rotational acceleration unless otherwise specified.
- the current value of each electric motor 3 is measured by, for example, a current sensor provided in the motor drive circuit shown in the figure.
- the position of the electric motor 3 can be obtained, for example, based on the measured value of the rotation sensor 12a described above.
- the speed and acceleration of the electric motor 3 can be obtained, for example, by time-differentiating the measured values of the rotation sensor 12a.
- the position deviation, velocity deviation, and acceleration deviation can be obtained by calculating the difference between the above-mentioned position, velocity, and acceleration and the target position, target speed, and target acceleration.
- the control device 5 determines whether or not the wafer 2 is slipped based on the current value of the electric motor 3 and the like. judge.
- FIGS. 4 and 5 graphs are shown in which each value is on the vertical axis and the time is on the horizontal axis. 4 and 5 show data for a predetermined period (for example, a few seconds) when the wafer 2 is taken out.
- the graphs of FIGS. 4 and 5 are examples, and various waveforms can be considered depending on the situation.
- the upper side of FIG. 4 is a graph showing the current value of the electric motor 3 when slip does not occur.
- the lower side of FIG. 4 is a graph showing the current value of the electric motor 3 when slip occurs.
- the current values of at least some of the electric motors 3 for driving each part of the robot 1 change depending on the presence or absence of slip. You can see that. For example, in the current waveform flowing through the electric motor 3 that drives the joint of the second axis c2, a plurality of positive or negative spike portions are generated regardless of the presence or absence of slip, but when slip occurs, The peaks of some spikes are clearly larger.
- the control device 5 acquires and monitors the current flowing through the electric motor 3 via the above-mentioned current sensor (first step). When the current value that increases momentarily is excessive as shown in FIG. 4B, the control device 5 determines that slip has occurred in the removal of the wafer 2 (second step).
- Whether or not the current value is excessive can be determined simply by comparing with a predetermined current threshold value.
- the slip can be determined by comparing the waveforms. Specifically, the reference waveform when slip does not occur is appropriately stored, and the obtained current waveform is compared with the reference waveform. The control device 5 calculates the degree of deviation of the graph shape, and if the degree of deviation exceeds the threshold value, it is determined that slip has occurred.
- the reference waveform for example, the waveform in the upper graph of FIG. 4 can be adopted.
- the current flowing through the electric motor 3 is determined by the target value of the operation of the electric motor 3 and the measured value of the operation. Therefore, if the occurrence of slip can be detected by the current, it is considered that the occurrence of slip can be similarly detected by the behavior of the position deviation, the speed deviation, and the acceleration deviation of the electric motor 3.
- FIG. 5 shows an example of the deviation of the rotation position.
- the upper side of FIG. 5 is a graph showing the deviation of the rotation position when slip does not occur.
- the lower side of FIG. 5 is a graph showing the deviation of the rotation position when slip occurs.
- control device 5 of the present embodiment extracts only a limited period of time when the wafer 2 is likely to slip from the waveforms such as the current value at the time of taking out the wafer, and determines the presence or absence of slip. Therefore, it is possible to suppress erroneous determination regarding slip.
- control device 5 determines the slip of the wafer 2 by software based on the current value of the electric motor 3 and the like. Therefore, since a special device such as a sensor is not required, the configuration can be simplified. Moreover, since it is not necessary to modify the hardware, it is easy to apply it to an existing robot system.
- the control device 5 determines whether or not slip occurs as described above. When it is determined that slip has not occurred, the control device 5 operates the robot 1 so as to directly convey the wafer 2 from the storage device 6 to the processing device (not shown) (first route R1). When it is determined that slip has occurred, the control device 5 once conveys the wafer 2 from the storage device 6 to the position deviation detection device 8, and the robot transfers the wafer 2 from the position deviation detection device 8 to the processing device (not shown). 1 is operated (second route R2). In FIG. 1, the first route R1 and the second route R2 are conceptually shown by arrows.
- the position of the wafer 2 will shift with respect to the hand 10.
- the robot 1 conveys the wafer 2 to the position misalignment detection device 8 according to the second route R2
- a misalignment occurs between the center of the placed wafer 2 and the rotation center of the rotary table 81 according to the above misalignment. ..
- the magnitude and direction of this deviation are detected by the positional deviation detecting device 8.
- the robot 1 takes out the wafer 2 of the rotary table 81 by the hand 10 at a position where the acquired deviation can be offset, and transfers the wafer 2 to the processing device at the transfer destination.
- the slip of the wafer 2 can be corrected and the wafer 2 can be correctly conveyed to the processing apparatus without any misalignment.
- the control device 5 since the slip of the wafer 2 is detected by monitoring the current value of the electric motor 3, the slip can be detected in almost real time. Therefore, immediately after the wafer 2 is taken out from the storage device 6 (for example, the state shown in FIG. 1), the control device 5 is in a state of completing the determination of whether or not slip has occurred. When the control device 5 determines that slip has occurred, the control device 5 can switch the transfer route of the wafer 2 on the spot so as to transfer the wafer to the misalignment detecting device 8.
- the transport tact time will be significantly increased.
- the second route R2 is adopted only when the slip of the wafer 2 is detected, it is possible to prevent waste of detecting the deviation even though there is no deviation.
- the increase in the transport tact time is substantially zero in the case of the first route R1. As described above, the robot system 100 of the present embodiment can efficiently convey the wafer 2 while dealing with the slips that occur irregularly.
- the robot system 100 of the present embodiment includes a robot 1 and a control device 5.
- the robot 1 has one or more joints driven by an electric motor 3 and can hold the wafer 2 by the hand 10.
- the control device 5 gives a command to the robot 1 to control it.
- the control device 5 determines whether or not a slip has occurred between the hand 10 and the wafer 2 based on the current value of the electric motor 3 and the like. To judge.
- control device 5 determines the occurrence of slip based on the current value of the electric motor 3 acquired in a predetermined period when the hand 10 takes out the wafer 2.
- the occurrence of slip is determined based only on the information during the period when slip is likely to occur, so that it is possible to prevent erroneous determination.
- the information for determining the presence or absence of slip includes at least one of the current value, the position deviation, the speed deviation, and the acceleration deviation of the electric motor 3.
- the robot system 100 of the present embodiment includes a positional deviation detecting device 8 capable of detecting the positional deviation of the wafer 2.
- the control device 5 determines that slip has not occurred, controls the robot 1 so as to transport the wafer 2 on the first route R1 that does not pass through the positional deviation detecting device 8.
- the control device 5 determines that slip has occurred, controls the robot 1 so as to convey the wafer 2 by the second route R2 via the positional deviation detecting device 8.
- the wafer 2 can be efficiently conveyed while correcting the position of the wafer 2 in response to the occurrence of slip.
- control device 5 determines whether or not slip has occurred during the transfer of the wafer as described above. If it is determined that no slip has occurred, the transfer route of the wafer 2 is set to the first route R1. If it is determined that slip has occurred, the transfer route of the wafer 2 is set to the second route R2.
- the determination as to whether or not slip has occurred can be performed based on the current value of the electric motor 3.
- the slip may be calculated based on the result of analyzing the image of the wafer 2 in the middle of transportation taken by the camera shown in the figure.
- the image analysis can be performed by the control device 5 or by a computer other than the control device 5.
- the switching of the transfer route of the wafer 2 may be performed based on the slip amount instead of determining whether or not slip has occurred.
- the slip amount can be obtained by analyzing the image taken by the camera.
- the control device 5 determines whether or not the transfer route of the wafer 2 needs to be switched by comparing the calculated slip amount with a preset threshold value.
- the slip amount is equal to or less than the threshold value
- the positional deviation of the wafer 2 with respect to the hand 10 is within the allowable range, so that the wafer 2 is conveyed by the first route R1 as originally planned.
- the transfer route of the wafer 2 is changed to the second route R2.
- an optical sensor (not shown) provided on the device side can be used instead of the camera.
- This optical sensor is arranged at an appropriate position in the transfer path of the wafer 2.
- the optical sensor detects the conveyed wafer 2 at a timing different from the usual timing. This makes it possible to determine whether or not slip has occurred.
- a line sensor capable of detecting the outer edge of the wafer 2 being conveyed can also be used. In this case, the slip amount of the wafer 2 can be acquired.
- the robot 1 is not limited to the slip when the wafer 2 is taken out from the transfer source, and the slip when the wafer 2 is placed on the transfer destination can be detected. If slip is detected when the wafer 2 is placed at the destination, the control device 5 takes out the wafer 2 placed at the destination again, transports the wafer 2 to the misalignment detecting device 8, corrects the misalignment, and then transports the wafer 2 again. It is preferable to control it so that it is placed first.
- the control device 5 may determine the presence or absence of slip from not only one of the current value, position deviation, etc. of the electric motor 3, but also a plurality of combinations.
- the wafer 2 is conveyed by the hand 10, in most cases, each of the plurality of joints is driven by the electric motor 3. Therefore, it is conceivable to determine the presence or absence of slip by combining information such as current values in the plurality of electric motors 3.
- the control device 5 determines whether or not slip has occurred.
- the waveforms such as the current value will differ depending on whether the slip of the wafer 2 is, for example, 1 mm or 10 mm. Therefore, there is room for quantitatively determining the slip size by monitoring the current value and the like. It is also possible to have the learning model estimate the slip size from the waveform by machine learning the relationship between the waveform such as the current value and the size of the slip that has occurred.
- the control device 5 determines whether or not slip has occurred based on the information regarding the electric motor.
- the control device 5 may estimate the slip amount of the wafer 2 with respect to the hand 10 based on the information about the electric motor.
- the slip amount can be calculated based on, for example, a period in which the value related to information such as the current value is continuously excessive, and the operation amount of the robot 1 in the period.
- the control device 5 may determine the presence or absence of slip occurrence based on the result of comparing the obtained slip amount with a predetermined threshold value.
- the misalignment detection device 8 can be omitted.
- the functions of the elements disclosed herein include general purpose processors, dedicated processors, integrated circuits, ASICs (Application Specific Integrated Circuits), conventional circuits, and / or, which are configured or programmed to perform the disclosed functions. It can be performed using a circuit or processing circuit that includes a combination thereof.
- a processor is considered a processing circuit or circuit because it includes transistors and other circuits.
- a circuit, unit, or means is hardware that performs the listed functions, or hardware that is programmed to perform the listed functions.
- the hardware may be the hardware disclosed herein, or it may be other known hardware that is programmed or configured to perform the listed functions. If the hardware is a processor considered to be a type of circuit, the circuit, means, or unit is a combination of hardware and software, and the software is used to configure the hardware and / or processor.
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Abstract
Description
Claims (6)
- 電動モータによって駆動される1以上の関節を有し、保持部によってウエハを保持可能なロボットと、
前記ロボットに指令を与えて制御する制御部と、
を備え、
前記ロボットが前記ウエハを前記保持部で保持して搬送する場合に、前記制御部は、前記電動モータに関する情報に基づいて、前記保持部と前記ウエハとの間にスリップが発生したか否かの判定、及び、前記保持部に対する前記ウエハのスリップ量の推定のうち、少なくとも何れかを行うことを特徴とするロボットシステム。 - 請求項1に記載のロボットシステムであって、
前記制御部は、前記保持部が前記ウエハを取り出すときにおける所定期間に取得された前記電動モータに関連する情報に基づいて、前記スリップの発生を判定することを特徴とするロボットシステム。 - 請求項1に記載のロボットシステムであって、
前記情報は、前記電動モータの電流値、位置偏差、速度偏差、及び加速度偏差のうち少なくとも何れか1つを含むことを特徴とするロボットシステム。 - 請求項1に記載のロボットシステムであって、
前記ウエハの位置ズレを検出可能な位置ズレ検出装置を備え、
前記制御部は、
前記スリップが生じなかったと判定した場合は、前記ウエハを、前記位置ズレ検出装置を経由しない第1ルートで搬送するように前記ロボットを制御し、
前記スリップが生じたと判定した場合は、前記ウエハを、前記位置ズレ検出装置を経由する第2ルートで搬送するように前記ロボットを制御することを特徴とするロボットシステム。 - 電動モータによって駆動される1以上の関節を有し、保持部によってウエハを保持可能なロボットと、
前記ロボットに指令を与えて制御する制御部と、
前記ウエハの位置ズレを検出可能な位置ズレ検出装置と、
を備え、
前記制御部は、前記ウエハの搬送中に、前記保持部と前記ウエハとの間にスリップが発生したか否かの判定結果に基づいて、又はスリップ量に基づいて、前記ウエハの搬送ルートを、前記位置ズレ検出装置を経由しない第1ルートと、前記位置ズレ検出装置を経由する第2ルートと、の間で切り換えることを特徴とするロボットシステム。 - 電動モータによって駆動される1以上の関節を有し、保持部によってウエハを保持可能なロボットと、
前記ロボットに指令を与えて制御する制御部と、
を備えるロボットシステムにおける、前記ウエハと前記保持部との間にスリップが発生したか否かを判定するスリップ判定方法であって、
前記保持部でウエハを保持して搬送する場合に、前記電動モータに関する情報を取得する第1工程と、
前記情報に基づいて、前記スリップが発生しているか否かを判定する第2工程と、
を含むことを特徴とするスリップ判定方法。
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