WO2022074977A1 - 再生装置、ガス処理装置、再生方法及びガス処理方法 - Google Patents
再生装置、ガス処理装置、再生方法及びガス処理方法 Download PDFInfo
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- WO2022074977A1 WO2022074977A1 PCT/JP2021/032365 JP2021032365W WO2022074977A1 WO 2022074977 A1 WO2022074977 A1 WO 2022074977A1 JP 2021032365 W JP2021032365 W JP 2021032365W WO 2022074977 A1 WO2022074977 A1 WO 2022074977A1
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- treatment liquid
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- liquid
- acidic compound
- container
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- 238000011069 regeneration method Methods 0.000 title claims abstract description 103
- 230000008929 regeneration Effects 0.000 title claims abstract description 90
- 238000000034 method Methods 0.000 title claims description 16
- 239000007788 liquid Substances 0.000 claims abstract description 302
- 150000007513 acids Chemical class 0.000 claims abstract description 102
- 238000010438 heat treatment Methods 0.000 claims abstract description 59
- 230000001172 regenerating effect Effects 0.000 claims abstract description 25
- 238000010521 absorption reaction Methods 0.000 claims description 50
- 238000012546 transfer Methods 0.000 claims description 32
- 238000012545 processing Methods 0.000 claims description 22
- 238000010992 reflux Methods 0.000 claims description 9
- 230000000717 retained effect Effects 0.000 claims description 2
- 238000005192 partition Methods 0.000 abstract description 6
- 238000007599 discharging Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 71
- 239000012071 phase Substances 0.000 description 45
- 239000007791 liquid phase Substances 0.000 description 44
- 239000003507 refrigerant Substances 0.000 description 22
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- 150000001412 amines Chemical class 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000006096 absorbing agent Substances 0.000 description 9
- 238000005191 phase separation Methods 0.000 description 8
- 230000003068 static effect Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- -1 CO 2 Chemical class 0.000 description 7
- 238000000926 separation method Methods 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 230000005484 gravity Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 150000003141 primary amines Chemical class 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 description 1
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 description 1
- GTEXIOINCJRBIO-UHFFFAOYSA-N 2-[2-(dimethylamino)ethoxy]-n,n-dimethylethanamine Chemical compound CN(C)CCOCCN(C)C GTEXIOINCJRBIO-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 208000018459 dissociative disease Diseases 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- DWFKOMDBEKIATP-UHFFFAOYSA-N n'-[2-[2-(dimethylamino)ethyl-methylamino]ethyl]-n,n,n'-trimethylethane-1,2-diamine Chemical compound CN(C)CCN(C)CCN(C)CCN(C)C DWFKOMDBEKIATP-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1425—Regeneration of liquid absorbents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1456—Removing acid components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/1456—Removing acid components
- B01D53/1475—Removing carbon dioxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/62—Carbon oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/96—Regeneration, reactivation or recycling of reactants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
- B01D2252/20—Organic absorbents
- B01D2252/204—Amines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2252/00—Absorbents, i.e. solvents and liquid materials for gas absorption
- B01D2252/50—Combinations of absorbents
- B01D2252/504—Mixtures of two or more absorbents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/50—Carbon oxides
- B01D2257/504—Carbon dioxide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
Definitions
- the present invention relates to a regenerating device, a gas processing device, a regenerating method and a gas processing method.
- Non-Patent Document 1 a first phase portion (for example, an amine phase) having a high content of an acidic compound and a second phase portion (for example, an amine phase) having a low content of an acidic compound (for example). It is known to use a treatment liquid that separates the liquid phase from the ether phase).
- the gas treatment apparatus described in Non-Patent Document 2 below includes an absorber that absorbs an acidic compound in a gas to be treated into a treatment liquid, a regenerator that desorbs an acidic compound from the treatment liquid by heating, and a regenerator that regenerates from the absorber. It is equipped with a circulation path for introducing the treatment liquid into the vessel and returning the treatment liquid from the regenerator to the absorber. In this device, the processing liquid phase-separated in the absorber is supplied to the regenerator without being separated into two liquids, the first phase portion and the second phase portion.
- the promotion of regeneration of the treatment liquid by increasing the contact area between the first phase portion (for example, the amine phase) and the second phase portion (for example, the ether phase) is explained as follows by the extraction action of the regenerated amine by the second phase portion.
- a large amount of acidic compound is present in the first phase portion.
- the acidic compound is CO 2 and the treatment liquid is a primary amine, the acidic compound is present in the first phase portion in the form of RNH 3 + + RNHCOO ⁇ .
- the regenerated amine (RNH 2 ) and CO 2 are dissociated by a reaction such as RNH 3 + + RNHCOO ⁇ ⁇ 2RNH 2 + CO 2 , and regeneration of the treatment liquid is achieved.
- the regenerated amine is extracted into the second phase portion.
- the dissociation reaction in the first phase portion tends to proceed to the right in the above reaction formula, and CO 2 is easily dissipated. Since the extraction action of the regenerated amine by the second phase portion proceeds at the liquid-liquid interface between the first phase portion and the second phase portion, CO 2 is released by increasing the contact area thereof. Is promoted.
- Non-Patent Document 2 the phase-separated treatment liquid is supplied to the regenerator without being separated into two liquids to increase the contact interface between the first phase portion and the second phase portion and promote the emission of the acidic compound. be able to.
- the treated liquid after regeneration is refluxed from the regenerator to the absorber, the treated liquid in the phase-separated state before regeneration may be mixed, and there is room for improvement in this respect.
- Hiroshi Machida et al. "Development of phase separation solvent for CO2 capture by aqueous (amine + ether) solution", General of Chemistry, Elsevier, US (US) , 2017, Vol. 113, p. 64-70 Hiroshi Machida et al. , "Low temperature swing process for CO2 absorption-desorption processing phase separation solvent", International Journal of Green Elsevier, Elsevier, Rice, Elsevier. , 2018, Vol. 75, p. 1-7
- An object of the present invention is a regeneration device and a regeneration method capable of promoting the emission of an acidic compound and selectively extracting a treatment liquid after regeneration, a gas treatment device provided with the regeneration device, and the regeneration method. Is to provide a gas treatment method to be carried out.
- the regenerating apparatus is an apparatus for regenerating the treated liquid by releasing the acidic compound by heating the treatment liquid in a phase-separated state by absorbing the acidic compound.
- This regenerating device includes a container for accommodating the treatment liquid and a first wall portion for partitioning the space inside the container into a first space and a second space.
- the first space is a heating region in which a heating unit for receiving the treatment liquid supplied from the outside of the container and heating the treatment liquid is arranged, and the treatment for releasing the acidic compound by heating by the heating unit. It includes a stationary region that receives the liquid from the heated region.
- the second space is a space in which the treatment liquid that has released the acidic compound can be discharged to the outside of the container.
- the first wall portion is formed with an opening for allowing the treatment liquid in the stationary region to flow into the second space.
- the gas treatment device includes an absorption device that causes the treatment liquid to absorb an acidic compound contained in the treatment gas by bringing the gas to be treated into contact with the treatment liquid, and a regeneration device. It is equipped with.
- the treatment liquid phase-separated by absorption of the acidic compound is supplied to the first space in the container, and the treatment liquid supplied to the first space is heated.
- the acidic compound is released from the treatment liquid, and the treatment liquid that has released the acidic compound is allowed to stand in the first space, and then the wall portion that separates the first space and the second space.
- the treatment liquid is allowed to flow from the first space into the second space through the opening formed in the first space.
- the acid compound is absorbed by the treatment liquid by bringing the gas to be treated containing the acidic compound into contact with the treatment liquid in the absorption device, and the treatment liquid is phase-separated.
- the phase-separated treatment liquid is sent from the absorption device to the regeneration device, the regeneration method is carried out in the regeneration device, and the treatment liquid that has released the acidic compound is extracted from the regeneration device and absorbed. Includes recirculation to the device.
- the gas treatment device 1 is a device that separates an acidic compound contained in the gas to be treated by contacting the gas to be treated, for example, a gas containing CO 2 with the treatment liquid L1.
- the processing liquid L1 used in the gas processing apparatus 1 will be described in detail.
- the treatment liquid L1 is a liquid capable of reversibly absorbing and releasing an acidic compound such as CO 2 , and changes from a single phase state to a two-phase separated state by absorption of the acidic compound, and at the same time, the acidic compound. Release returns from a two-phase separation state to a single-phase state.
- the treatment liquid L1 is an alkaline absorption liquid containing, for example, water, an amine compound, and an organic solvent. As an example, it is desirable that the amine compound is 30 wt%, the organic solvent is 60 wt%, and the water is 10 wt%.
- amine compound examples include primary amines such as 2-aminoethanol (MEA) and 2- (2-aminoethoxy) ethanol (AEE), such as 2- (methylamino) ethanol (MAE) and 2- (ethyl). Secondary amines such as amino) ethanol (EAE), 2- (butylamino) ethanol (BAE), or, for example, triethanolamine (TEA), N-methyldiethanolamine (MDEA), tetramethylethylenediamine (TEMED), pentamethyl Examples thereof include tertiary amines such as diethylenetriamine (PMDETA), hexamethyltriethylenetetramine, and bis (2-dimethylaminoethyl) ether.
- primary amines such as 2-aminoethanol (MEA) and 2- (2-aminoethoxy) ethanol (AEE), such as 2- (methylamino) ethanol (MAE) and 2- (ethyl).
- Secondary amines such as amino) ethanol (EAE), 2-
- organic solvent examples include 1-butanol, 1-pentanol, octanol, diethylene glycol diethyl ether (DEGDEE), diethylene glycol dimethyl ether (DEGDME) and the like, and a plurality of these may be mixed and used. ..
- Non-Patent Document 1 when the combination of the amine compound and the organic compound is appropriately selected, the absorption liquid separates two phases into a phase having a high content of the acidic compound and a phase having a low content of the acidic compound by absorption of the acidic compound. Will be.
- the gas treatment device 1 mainly includes an absorption device 10, a regeneration device 20, a circulation path 30, a heat exchanger 40, and a heat pump 60.
- the acidic compound for example, CO 2
- the absorption of the acidic compound in the absorption device 10 is an exothermic reaction.
- the absorption device 10 includes a gas supply path 11 for supplying a gas to be treated, a gas discharge path 12 for discharging the treated gas, and a treatment liquid L1 for absorbing CO 2 .
- a first flow path 31 for sending the CO 2 to the absorption device 10 and a second flow path 32 for returning the treated liquid L1 after regeneration that has released CO 2 from the regeneration device 20 to the absorption device 10 are connected.
- the circulation path 30 is composed of the first flow path 31 and the second flow path 32.
- the gas supply path 11 is connected to the bottom of the absorption device 10, and the gas discharge path 12 is connected to the top of the absorption device 10.
- the portion of the first flow path 31 on the upstream end side branches into two flow paths (first branch path 31A, second branch path 31B), and each branch path 31A, 31B is connected to the bottom of the absorption device 10. Has been done. Further, liquid feeding pumps 53 and 33 are installed in the branch paths 31A and 31B.
- the downstream end of the second flow path 32 is connected to the upper part of the absorption device 10.
- a liquid feed pump 51 is also installed in the second flow path 32.
- the regeneration device 20 is a device that regenerates the treatment liquid L1 by releasing the acidic compound from the treatment liquid L1 by heating the treatment liquid L1 in a phase-separated state due to absorption of the acidic compound.
- the release of the acidic compound from the treatment liquid L1 is an endothermic reaction.
- the regeneration device 20 when the treatment liquid L1 is heated, not only the acidic compound is released but also a part of the water contained in the treatment liquid L1 evaporates.
- the reproduction device 20 is connected to the downstream end of the first flow path 31 and the upstream end of the second flow path 32.
- the first flow path 31 is connected to the bottom of the regenerating device 20, and introduces the processing liquid L1 derived from the absorbing device 10 into the regenerating device 20.
- the second flow path 32 is also connected to the bottom of the regenerating device 20, and the second flow path 32 leads the processing liquid L1 from the regenerating device 20.
- a supply path 21 is connected to the reproduction device 20.
- the supply path 21 sends the acidic compound (for example, CO 2 ) obtained in the regeneration device 20 to the supply destination.
- the supply path 21 is provided with a condenser 22 for cooling a mixed gas of an acidic compound gas and water vapor. When the mixed gas is cooled, the water vapor condenses, so that the water vapor can be separated from the gas of the acidic compound. The separated steam is returned to the regeneration device 20 through the return passage 24.
- the condenser 22 a heat exchanger using inexpensive cooling water such as river water can be used.
- the internal configuration of the reproduction device 20 will be described in detail later.
- the heat exchanger 40 is connected to the first flow path 31 and the second flow path 32, and heat is exchanged between the processing liquid L1 flowing through the first flow path 31 and the processing liquid L1 flowing through the second flow path 32.
- the heat exchanger 40 is composed of, for example, a plate heat exchanger or the like, but may be configured by a microchannel heat exchanger capable of heat exchange between fluids having a relatively small temperature difference. This improves energy efficiency.
- the heat pump 60 is a heat transport means for transporting the reaction heat generated in the absorption device 10 to the regeneration device 20.
- the heat pump 60 includes a closed loop-shaped circulation flow path 65 in which a refrigerant is sealed, and a compressor 62, an evaporator 61, an expansion mechanism 64, and a condenser 63 provided in the circulation flow path 65, respectively. And.
- the evaporator 61 includes a heat transfer tube and is arranged in the absorber 10. In the absorption device 10, an exothermic reaction occurs in which the treatment liquid L1 absorbs CO 2 . This heat of reaction is given to the liquid refrigerant flowing in the evaporator 61. The liquid refrigerant flowing in the evaporator 61 is heated by this heat and evaporates.
- the gaseous refrigerant is compressed by the compressor 62 and then flows into the condenser 63.
- the condenser 63 includes a heat transfer tube and is arranged in the regeneration device 20. In the regenerator 20, an endothermic reaction in which CO 2 is released from the treatment liquid L1 is occurring.
- the gaseous refrigerant flowing in the condenser 63 is condensed by the cold heat generated by this endothermic reaction.
- the processing liquid L1 is heated by the condenser 63. That is, the condenser 63 functions as a heating unit for heating the treatment liquid L1.
- the condensed liquid refrigerant is expanded by the expansion mechanism 64, depressurized, and flows into the evaporator 61. In this way, the reaction heat of the absorption device 10 is transferred to the regeneration device 20 by the circulation of the refrigerant.
- the absorption device 10 includes a container 13 which is a horizontally long tank, a first wall portion 18, a second wall portion 19, a gas supply unit 17, and a treatment liquid supply unit 14.
- a tube plate 15 for fixing the heat transfer tube of the evaporator 61 is provided in the container 13.
- This heat transfer tube has a horizontally long U-shape, and both ends thereof are fixed to the tube plate 15.
- the space inside the container 13 is partitioned by the tube plate 15 into an entry / exit space S8 for entering and exiting the refrigerant of the heat pump 60 and a storage space S9 for storing the treatment liquid L1.
- the heat transfer tube of the evaporator 61 is arranged in the storage space S9.
- the container 13 As described above, by using a horizontally placed tank (for example, a kettle type) as the container 13, even when the heat transfer tube of the evaporator 61 is to be made longer in order to increase the heat transfer area, the side of the container 13 is used. It becomes possible to cope with it by increasing the size.
- the container 13 When the container 13 is vertically long, it may be difficult to expand the heat transfer area by a certain amount or more due to height restrictions or the like, but when a horizontally long tank is used, there is no such restriction. Therefore, it is possible to freely set the heat transfer area and secure the required heat transfer area.
- the entrance / exit space S8 is divided into an entrance space S1 and an exit space S2 by a partition plate 16.
- the liquid refrigerant that has flowed into the inlet space S1 from the circulation flow path 65 flows into the heat transfer tube of the evaporator 61 from the opening on one end side, and flows from one end toward the other end. At this time, the liquid refrigerant receives the heat of the endothermic reaction of the acidic compound and evaporates. After that, the gaseous refrigerant passes through the outlet space S2 and flows out to the circulation flow path 65.
- the first wall portion 18 is erected in the container 13 with respect to the bottom of the container 13 and partitions the first space S3 and the second space S4 of the storage space S9 from each other. As shown in FIG. 2, the evaporator 61, the gas supply unit 17, and the treatment liquid supply unit 14 are arranged in the first space S3, respectively.
- an opening G1 through which the liquid can flow is formed in the central portion of the first wall portion 18 or below the central portion in the height direction, specifically, in the lowermost portion.
- the second wall portion 19 is erected with respect to the bottom of the container 13 on the side opposite to the evaporator 61 with respect to the first wall portion 18, and the second space S4 and the third space S5 of the storage space S9 are provided. Separate from each other.
- the second wall portion 19 is located on the side opposite to the pipe plate 15 when viewed from the first wall portion 18, and is provided with a space (second space S4) between the second wall portion 19 and the first wall portion 18.
- the second wall portion 19 is substantially parallel to the first wall portion 18, and its upper end is located below the upper end of the first wall portion 18 (bottom side of the container 13).
- a first outlet 25 is provided at a portion of the bottom of the container 13 facing the second space S4, and a second outlet 26 is provided at a portion of the bottom facing the third space S5. There is.
- One end of the first branch road 31A is connected to the first outlet 25, and one end of the second branch road 31B is connected to the second outlet 26.
- the gas supply unit 17 is a nozzle for supplying a gas to be treated containing an acidic compound into the container 13 (first space S3), and is arranged at the bottom of the container 13. More specifically, the gas supply unit 17 is located below the heat transfer tube of the evaporator 61 and is arranged with the gas outlet facing upward. In the present embodiment, a plurality of gas supply units 17 are arranged at intervals along the bottom of the container 13, and the downstream end of the gas supply path 11 is branched and connected to each gas supply unit 17.
- the gas outlet of the gas supply unit 17 is located below the liquid level of the treatment liquid L1.
- the gas after the ejection becomes bubbles and floats in the treatment liquid L1, and the treatment liquid L1 is agitated by the action.
- heat transfer from the treatment liquid L1 to the refrigerant of the heat pump 60 (the refrigerant flowing in the heat transfer tube of the evaporator 61) is promoted, and the gas-liquid contact between the gas to be treated and the treatment liquid L1 is improved to improve the acidic compound. It can also promote the absorption of gas. It is also possible to direct the gas outlet toward the heat transfer tube side of the evaporator 61, in which case the heat transfer from the treatment liquid L1 to the refrigerant is further promoted.
- the treatment liquid supply unit 14 is for supplying the treatment liquid L1 refluxed from the regeneration device 20 (FIG. 1) into the container 13 (first space S3).
- the downstream end of the second flow path 32 is connected to the treatment liquid supply unit 14.
- the treatment liquid supply unit 14 extends in the lateral direction, and a plurality of liquid supply ports are provided at intervals in the lateral direction.
- the treatment liquid supply unit 14 is arranged above the heat transfer tube of the evaporator 61 (above the liquid level of the treatment liquid L1) with the liquid supply port facing downward.
- the liquid supply port of the treatment liquid supply unit 14 is open directly above the first space S3, but may be open in the first space S3.
- the regenerating device 20 includes a container 35 which is a horizontally long tank, a first wall portion 39, and a processing liquid supply unit 38.
- the container 35 accommodates the processing liquid L1 sent from the absorption device 10 (FIG. 2).
- the reason why the container 35 is a horizontal tank (for example, a kettle type) in the present embodiment is the heat transfer area that contributes to the heat exchange between the treatment liquid L1 and the refrigerant of the heat pump 60, as in the case of the absorption device 10. This is because the degree of freedom of setting of is taken into consideration.
- the first wall portion 39 is erected in the container 35 with respect to the bottom of the container 35, and divides the space in the container 35 into the first space S12 and the second space S13.
- the heating region R1 in which the treatment liquid L1 is supplied and the heating unit (condensor 63) for heating the treatment liquid L1 is arranged, and the treatment liquid L1 in which the acidic compound is released by heating are temporarily provided.
- the heating region R1 is a first receiving region that receives the treatment liquid L1 supplied from the outside of the container 35 to the first space S12.
- the static region R2 is a second receiving region that receives at least the treatment liquid L1 after the release of the acidic compound from the heat region R1 among the treatment liquid L1 in the heating region R1.
- the second space S13 is a space for discharging the treatment liquid L1 after releasing the acidic compound, and is provided with an outlet 42 for the treatment liquid L1.
- a tube plate 36 for fixing the heat transfer tube of the condenser 63 is provided in the container 35.
- the heat transfer tube is for flowing a refrigerant (heating medium) that exchanges heat with the treatment liquid L1, has a horizontally long U-shape, and both ends thereof are fixed to the tube plate 36.
- the pipe plate 36 partitions the entrance / exit space S10 for the refrigerant of the heat pump 60 to enter / exit with respect to the first space S12.
- the heating region R1 is a region of the first space S12 where the heat transfer tube of the condenser 63 is arranged, and the static region R2 is a region adjacent to the heating region R1 and the heat transfer tube of the first space S12 is located.
- a region that is not arranged a region between the U-shaped bottom portion of the heat transfer tube and the first wall portion 39).
- the entrance / exit space S10 is divided into an entrance space S6 and an exit space S7 by a partition plate 37.
- the gaseous refrigerant that has flowed into the inlet space S6 from the circulation flow path 65 flows into the heat transfer tube of the condenser 63 from the opening on one end side, and flows from one end toward the other end.
- the treatment liquid L1 receives heat from the refrigerant
- the acidic compound is released from the treatment liquid L1 and the refrigerant is condensed.
- the liquid refrigerant passes through the outlet space S7 and flows out to the circulation flow path 65.
- the treatment liquid supply unit 38 is a nozzle that supplies the treatment liquid L1 before regeneration sent from the absorption device 10 to the heating region R1, and is connected to the downstream end of the first flow path 31.
- the treatment liquid supply unit 38 in the present embodiment is arranged on the bottom side of the container 35. More specifically, the treatment liquid supply unit 38 extends along the bottom surface of the container 35 below the condenser 63, and a plurality of supply ports (nozzle ejection ports) are provided at intervals from each other. .. Each supply port faces the upper side (condenser 63 side), and the processing liquid L1 is supplied from the supply port toward the heat transfer tube of the condenser 63.
- the first wall portion 39 is formed with an opening 39A for allowing the treatment liquid L1 in the stationary region R2 to flow into the second space S13.
- the opening 39A is a container rather than the central portion in the height direction of the first wall portion 39 or the central portion thereof so that at least a part thereof overlaps with the heat transfer tube of the condenser 63 in the height direction. It is formed on the bottom side portion of 35.
- the gas to be treated containing the acidic compound comes into contact with the treatment liquid L1.
- the acidic compound is absorbed by the treatment liquid L1 and the treatment liquid L1 undergoes phase separation.
- the gas to be processed is supplied from the gas supply unit 17 to the first space S3.
- the bubble-shaped gas to be treated and the treatment liquid L1 come into contact with each other, and the acidic compound in the gas to be treated is absorbed by the treatment liquid L1.
- the acidic compound is CO 2 and the treatment liquid L1 contains a primary amine
- an endothermic reaction of CO 2 occurs according to the reaction formula such as 2RNH 2 + CO 2 ⁇ RNH 3 + + RNHCOO ⁇ . ..
- the gas to be treated contains other gas components such as nitrogen in addition to the acidic compound such as CO 2 , even if the absorption of the acidic compound progresses, the treatment liquid L1 is stirred by the bubble-like gas to be treated. The effect is maintained.
- the treatment liquid L1 has a first liquid phase portion (for example, an amine phase) having a high content of the acidic compound and a second liquid phase portion (for example, an ether phase) having a low content of the acidic compound in the first space S3.
- a first liquid phase portion for example, an amine phase
- a second liquid phase portion for example, an ether phase
- the specific gravity decreases in the order of the first liquid phase portion and the second liquid phase portion.
- the second liquid phase portion having a small specific gravity overflows from the upper end of the first wall portion 18 and flows into the second space S4, and the first liquid phase portion having a large specific gravity passes through the opening G1 of the first wall portion 18. It flows into the second space S4. Further, the second liquid phase portion overflows from the upper end of the second wall portion 19 and flows into the third space S5.
- the first liquid phase portion and the second liquid phase portion of the treatment liquid L1 can be separated in the container 13. Then, the first liquid phase portion flows out from the first outlet 25 to the first branch passage 31A, and the second liquid phase portion flows out from the second outlet 26 to the second branch passage 31B. As a result, the volume flow rate ratio of both liquid phase portions in the processing liquid L1 sent to the regeneration device 20 can be maintained constant.
- the phase-separated treatment liquid L1 is sent from the absorption device 10 to the regeneration device 20.
- the first liquid phase portion and the second liquid phase portion are fed to the regenerating device 20 by the liquid feeding pumps 53 and 33.
- both liquid phase portions are mixed in the middle of the first flow path 31 (the confluence of the first branch path 31A and the second branch path 31B), and flow into the regeneration device 20 in a two-phase state.
- the treatment liquid L1 before regeneration is heated by heat exchange with the treatment liquid L1 after regeneration in the heat exchanger 40 before flowing into the regeneration device 20.
- the treatment liquid L1 is heated in the regeneration device 20, and the treatment liquid L1 that has released the acidic compound by heating is withdrawn from the regeneration device 20 and refluxed to the absorption device 10.
- the regeneration method according to the present embodiment described below is implemented.
- the treatment liquid L1 phase-separated by absorption of the acidic compound is supplied from the first flow path 31 to the first space S12 in the container 35.
- the treatment liquid L1 in a two-phase state is ejected from the nozzle ejection port of the treatment liquid supply unit 38 to the heating region R1.
- the treatment liquid L1 supplied to the heating region R1 is heated via heat exchange with the refrigerant flowing in the condenser 63 to release the acidic compound from the treatment liquid L1.
- the treatment liquid L1 that has released the acidic compound is mainly located between the first liquid phase portion (for example, an amine phase) and the second liquid phase portion (for example, an ether phase).
- the treatment liquid L1 is agitated by the released bubbles of the acidic compound and the jet of the treatment liquid L1, whereas in the static region R2, stirring is unlikely to occur.
- the treatment liquid L1 that has released the acidic compound accumulates in the static region R2 without being affected by stirring.
- the height position of the treated liquid L1 after regeneration is stabilized, so that the treated liquid L1 that has released the acidic compound is settled at a position that substantially coincides with the height position of the opening 39A.
- the treated liquid L1 after regeneration flows into the second space S13 from the static region R2 of the first space S12 through the opening 39A.
- the regenerated treatment liquid L1 flows out of the regenerating device 20 from the outlet 42 and is returned to the absorbing device 10 via the second flow path 32.
- the acidic compound can be released by heating the treatment liquid L1 in the phase-separated state in the regeneration device 20, and the treatment liquid L1 can be regenerated.
- the treatment liquid L1 is stirred and mixed by the gaseous acidic compound (for example, CO 2 ) released from the treatment liquid L1, so that the first liquid phase portion (for example, the amine phase) and the second liquid phase portion are mixed.
- the contact interface with (for example, the ether phase) is increased, and the emission of the acidic compound can be promoted.
- the regenerated treatment liquid L1 that has released the acidic compound can be accumulated in the static region R2 and then flowed into the second space S13 through the opening 39A of the first wall portion 39.
- the treated liquid L1 after regeneration can be easily separated from the treatment liquid L1 before regeneration, and the treated liquid L1 after regeneration can be selectively extracted from the regeneration device 20.
- the reproduction device 20A according to the second embodiment will be described with reference to FIG.
- the regenerating device 20A according to the second embodiment basically has the same configuration as the regenerating device 20 according to the first embodiment and has the same effect, but the position of the processing liquid supply unit 38 is different. There is. Hereinafter, only the differences from the first embodiment will be described.
- the treatment liquid supply unit 38 is arranged on the ceiling side of the container 35. Specifically, the treatment liquid supply unit 38 is located above the liquid level of the treatment liquid L1 and is arranged in the container 35 with the nozzle ejection port facing downward (the heat transfer tube side of the condenser 63). Has been done.
- the treatment liquid L1 can be stirred and mixed by the action when the jet flow of the treatment liquid L1 hits the liquid surface.
- the reproduction device 20B according to the third embodiment will be described with reference to FIG.
- the regenerating device 20B according to the third embodiment basically has the same configuration as the regenerating device 20A according to the second embodiment and has the same effect, but includes the second wall portion 43 and the return path 44. It differs from the second embodiment in that it is provided. Hereinafter, only the differences from the second embodiment will be described.
- the second wall portion 43 is erected in the container 35 with respect to the bottom of the container 35, and partitions the second space S13 and the third space S14 in the space inside the container 35.
- the second wall portion 43 is substantially parallel to the first wall portion 39, and is located on the side opposite to the pipe plate 36 when viewed from the first wall portion 39. That is, the second wall portion 43 is located on the side opposite to the heating portion (condensor 63) with respect to the first wall portion 39.
- the second wall portion 43 includes an upper end that allows liquid to overflow from the second space S13 to the third space S14, and the upper end is located below the upper end of the first wall portion 39 (bottom side of the container 35).
- the reflux path 44 is a path for refluxing the liquid from the third space S14 to the first space S12.
- the upstream end is connected to a portion of the bottom of the container 35 facing the third space S14, and the downstream end is a portion (or a portion) of the first flow path 31 near the downstream end. It is connected to a portion downstream of the heat exchanger 40).
- a liquid feed pump 45 is installed in the return passage 44.
- the second liquid phase portion such as the ether phase flows into the second space S13 through the opening 39A
- the second liquid phase portion is introduced from the upper end of the second wall portion 43 to the third space S14.
- the ratio of each liquid phase portion in the treatment liquid L1 before regeneration for example, of the ether phase and the amine phase. It is possible to suppress fluctuations in the ratio).
- the treatment liquid supply unit 38 may be arranged on the bottom side of the container 35 as shown in FIG.
- the reproduction device 20C according to the fourth embodiment basically has the same configuration as the reproduction device 20B according to the third embodiment and has the same effect, but the position of the opening 39A in the first wall portion 39. Is different from the third embodiment. Hereinafter, only the differences from the third embodiment will be described.
- the opening 39A in the fourth embodiment is formed at the lowermost portion of the first wall portion 39 in the height direction. Even in this case, the regenerated treatment liquid L1 can flow from the first space S12 to the second space S13 through the opening 39A.
- each liquid phase portion for example, an ether phase and an amine phase
- the liquid phase portion having a larger specific gravity for example, an amine phase
- the regenerated treatment liquid L1 can flow into the second space S13 through the opening 39A formed at the lowermost portion.
- the treatment liquid supply unit 38 may be arranged on the bottom side of the container 35 as shown in FIG. Further, the second wall portion 43, the return passage 44, and the liquid feed pump 45 may be omitted.
- the embodiment is not limited to the absorption device 10 provided with the container 13 which is a horizontal tank, and for example, as shown in FIG. 7, the absorption device 10A provided with the tower-shaped container 71 is used. May be good.
- the gas supply path 11 is connected to the lower part of the container 71, and the gas discharge path 12 is connected to the top of the container 71.
- each branch path (first branch path 31A, second branch path 31B) of the first flow path 31 is connected to the bottom of the container 71, and the second flow path 32 is connected to the upper part of the container 71.
- a second wall portion 19 is erected on the bottom surface of the container 71, and is divided into a second space S4 and a third space S5 by the second wall portion 19. Further, a cover member 19A that covers the third space S5 from above is provided. Since the treatment liquid L1 supplied from the second flow path 32 flows down in the container 71, the treatment liquid L1 that absorbs the acidic compound and flows down to the bottom of the column is stored in the second space S4. After that, the first liquid phase portion having a small specific gravity overflows from the upper end of the second wall portion 19 into the third space S5, so that the first liquid phase portion and the second liquid phase portion are separated. Then, each liquid phase portion is extracted from the absorption device 10A by the first branch path 31A and the second branch path 31B, and the flow rate of each is adjusted and sent to the regeneration device 20.
- the separation tank 72 of the treatment liquid L1 is arranged under the container 71, and the separation tank 72 is connected to the bottom of the container 71 via the recovery path 73. May be good.
- a second wall portion 19 may be erected from the bottom in the separation tank 72, and the space inside the bottom portion may be divided into a second space S4 and a third space S5 by the second wall portion 19. ..
- the treatment liquid L1 that has absorbed the acidic compound and has flowed into the separation tank 72 is stored in the second space S4 of the separation tank 72, and the first liquid phase portion (upper phase portion) of the treatment liquid L1 is the first.
- the third space S5 overflows from the upper end of the second wall portion 19. Then, each liquid phase portion is taken out from the separation tank 72 by the first branch passage 31A and the second branch passage 31B, the flow rate of each is adjusted, and the liquid phase portion is sent to the regeneration device 20.
- the first wall portion 39 of the reproduction device may include a pair of wall members (first wall member 81, second wall member 82), and in this case, the openings 39A are both. It is formed by the gaps between the wall members.
- first wall member 81 is erected with respect to the bottom of the container 35
- the second wall member 82 is separated from the bottom of the container 35
- the rear side of the first wall member 81 (with the condenser 63). It is arranged on the opposite side), and the upper end portion of the first wall member 81 and the lower end portion of the second wall member 82 partially overlap each other in the height direction.
- FIG. 9 the first wall member 81, second wall member 82
- FIG. 10 shows that the positions of the first wall member 81 and the second wall member 82 are interchanged in the front and back in FIG. That is, in FIG. 10, the first wall member 81 is erected with respect to the bottom of the container 35, the second wall member 82 is separated from the bottom of the container 35, and the front side (first wall) of the first wall member 81 is separated. It is arranged closer to the condenser 63 than the member 81), and the upper end portion of the first wall member 81 and the lower end portion of the second wall member 82 partially overlap each other in the height direction.
- FIG. 11 shows that both wall members are arranged in FIG. 9 so that the ends do not overlap each other.
- FIG. 12 shows that both wall members are arranged in FIG. 10 so that the ends do not overlap each other.
- the opening 39A is formed in the central portion of the first wall portion 39 in the height direction or the portion on the bottom side of the container 35 with respect to the central portion is exemplified, but the present invention is not limited thereto.
- the present invention is not limited thereto.
- the opening 39A is formed in a portion of the first wall portion 39 on the upper end side (opposite to the bottom portion of the container 35) of the central portion C1 or the central portion C1 in the height direction. good.
- the regenerated treatment liquid L1 is located on the upper end side of the first wall portion 39 depending on the composition of the treatment liquid L1 and the position of the liquid level, the regenerated treatment liquid L1 is used in the second space S13. Can be made to flow into.
- the heat pump 60 may be omitted.
- a heating unit instead of the condenser 63 of the heat pump 60, a heating unit that heats the processing liquid L1 extracted from the regeneration device 20 to the outside by an arbitrary heat source such as electricity, steam, or a burner may be used. ..
- the regenerating apparatus is an apparatus for regenerating the treated liquid by releasing the acidic compound by heating the treatment liquid in a phase-separated state by absorbing the acidic compound.
- This regenerating device includes a container for accommodating the treatment liquid and a first wall portion for partitioning the space inside the container into a first space and a second space.
- the first space is a heating region in which a heating unit for receiving the treatment liquid supplied from the outside of the container and heating the treatment liquid is arranged, and the treatment for releasing the acidic compound by heating by the heating unit. It includes a stationary region that receives the liquid from the heated region.
- the second space is a space in which the treatment liquid that has released the acidic compound can be discharged.
- the first wall portion is formed with an opening for allowing the treatment liquid in the stationary region to flow into the second space.
- the acidic compound can be released by heating the treatment liquid in the phase-separated state, and the treatment liquid can be regenerated.
- the treatment liquid is stirred and mixed by the acidic compound released from the treatment liquid in the heated region, so that the contact interface between the first liquid phase portion and the second liquid phase portion of the treatment liquid increases. ..
- the release of the acidic compound from the treatment liquid is promoted, so that the removal of the acidic compound from the gas to be treated is achieved.
- the treated liquid after regeneration that has released the acidic compound can be temporarily received in the static region and then flowed into the second space through the opening of the first wall portion. As a result, the treated liquid after regeneration can be easily separated from the treated liquid before regeneration, and the treated liquid after regeneration can be selectively extracted from the treated liquid before regeneration.
- the first wall portion may be erected with respect to the bottom portion of the container.
- the opening may be formed in a central portion in the height direction of the first wall portion or a portion on the bottom side of the central portion.
- the opening may be formed at the lowermost portion of the first wall portion in the height direction.
- each liquid phase of the treatment liquid before regeneration is present in many cases, but when the supply amount of the treatment liquid to the container is extremely small, it is clear 2 in the first space.
- the liquid-liquid interface of the phase may not be formed. According to the above configuration, even in such a case, the treated liquid after regeneration can be easily flowed into the second space.
- the first wall portion may be erected with respect to the bottom portion of the container.
- the opening may be formed in a central portion in the height direction of the first wall portion or a portion on the upper end side of the central portion.
- the treated liquid after regeneration is located at the central portion in the height direction of the first wall portion or on the upper end side of the central portion in the height direction of the first wall portion depending on the composition of the treated liquid and the liquid level height. Can be easily flowed into the second space.
- the regenerating device may further include a processing liquid supply unit that supplies the processing liquid to the heating region.
- the treatment liquid supply unit may be arranged on the bottom side or the ceiling side of the container.
- the treatment liquid stored in the container can be effectively stirred and mixed.
- the treatment liquid supply unit is arranged on the bottom side of the container, the treatment liquid is supplied from the inside of the treatment liquid collected in the container, so that the treatment liquid is agitated by the flow action at this time. Be mixed. This makes it possible to increase the contact interface between the first liquid phase portion and the second liquid phase portion.
- the treatment liquid supply unit is arranged on the ceiling side of the container, the treatment liquid can be stirred and mixed by the action of supplying the treatment liquid toward the liquid surface of the treatment liquid.
- the heating unit may include a heat transfer tube arranged in the heating region while flowing a heating medium that exchanges heat with the treatment liquid.
- the treatment liquid supply unit may be provided with a supply port for supplying the treatment liquid toward the heat transfer tube.
- the regenerating device may further include a second wall portion that separates the second space from the third space in the space inside the container.
- the second wall portion may be erected with respect to the bottom portion of the container and may include an upper end that allows liquid to overflow from the second space to the third space.
- the regenerating device may further include a reflux path for refluxing the liquid from the third space to the first space.
- the gas treatment device includes an absorption device that causes the treatment liquid to absorb an acidic compound contained in the treatment gas by bringing the gas to be treated into contact with the treatment liquid, and a regeneration device. It is equipped with.
- the treatment liquid phase-separated by absorption of the acidic compound is supplied to the first space in the container, and the treatment liquid supplied to the first space is heated. Thereby, the acidic compound is released from the treatment liquid, and the treatment liquid having released the acidic compound is temporarily retained in the first space, and then the first space and the second space are separated. It includes flowing the treatment liquid from the first space into the second space through an opening formed in the wall portion.
- the treated liquid is stirred and mixed with the acidic compound released from the treatment liquid by heating to increase the contact interface between the first liquid phase portion and the second liquid phase portion, thereby dissipating the acidic compound. Can be promoted. Further, by allowing the treatment liquid that has released the acidic compound to stand in the first space and then flowing it from the first space to the second space through the opening of the wall portion, the treatment liquid after regeneration can be easily separated from the treatment liquid before regeneration. It becomes possible to selectively extract the treated liquid after separation and regeneration.
- the acid compound is absorbed by the treatment liquid by bringing the gas to be treated containing the acidic compound into contact with the treatment liquid in the absorption device, and the treatment liquid is phase-separated.
- the phase-separated treatment liquid is sent from the absorption device to the regeneration device, the regeneration method is carried out in the regeneration device, and the treatment liquid that has released the acidic compound is extracted from the regeneration device and absorbed. Includes recirculation to the device.
- a regeneration device and a regeneration method that promote the emission of the acidic compound and enable the selective extraction of the treatment liquid after regeneration, a gas treatment device equipped with the regeneration device, and the regeneration. It is possible to provide a gas treatment method in which the method is carried out.
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Abstract
Description
<ガス処理装置>
まず、第1実施形態に係るガス処理装置1を、図1に基づいて説明する。ガス処理装置1は、例えばCO2含有ガス等の被処理ガスと処理液L1とを接触させることにより、当該被処理ガスに含まれる酸性化合物を分離する装置である。はじめに、ガス処理装置1で用いられる処理液L1について詳細に説明する。
次に、吸収装置10の構成を、図2に基づいてより詳細に説明する。なお、以下では、便宜上、上下は鉛直方向を意味し、横は水平方向を意味する。図2に示すように、吸収装置10は、横長のタンクである容器13と、第1壁部18と、第2壁部19と、ガス供給部17と、処理液供給部14とを含む。
次に、再生装置20の構成を、図3に基づいて詳細に説明する。図3に示すように、再生装置20は、横長のタンクである容器35と、第1壁部39と、処理液供給部38とを備える。
次に、本実施形態に係るガス処理方法及び再生方法を説明する。本方法では、以下のプロセスにより、被処理ガスに含まれる酸性化合物(例えばCO2)を処理液L1に吸収させると共に、加熱によって当該処理液L1から酸性化合物を放出させる。
第2実施形態に係る再生装置20Aについて、図4に基づいて説明する。第2実施形態に係る再生装置20Aは、基本的に第1実施形態に係る再生装置20と同様の構成を備え且つ同様の効果を奏するものであるが、処理液供給部38の位置が異なっている。以下、第1実施形態と異なる点についてのみ説明する。
第3実施形態に係る再生装置20Bについて、図5に基づいて説明する。第3実施形態に係る再生装置20Bは、基本的に第2実施形態に係る再生装置20Aと同様の構成を備え且つ同様の効果を奏するものであるが、第2壁部43及び還流路44を備える点で第2実施形態と異なっている。以下、第2実施形態と異なる点についてのみ説明する。
次に、第4実施形態に係る再生装置20Cについて、図6に基づいて説明する。第4実施形態に係る再生装置20Cは、基本的に第3実施形態に係る再生装置20Bと同様の構成を備え且つ同様の効果を奏するものであるが、第1壁部39における開口39Aの位置が第3実施形態と異なっている。以下、第3実施形態と異なる点についてのみ説明する。
Claims (11)
- 酸性化合物の吸収により相分離した状態の処理液を加熱することにより、前記酸性化合物を放出させて前記処理液を再生する再生装置であって、
前記処理液を収容する容器と、
前記容器内の空間を第1空間と第2空間とに仕切る第1壁部と、を備え、
前記第1空間は、前記容器の外部から供給された前記処理液を受け入れると共に前記処理液を加熱する加熱部が配置された加熱領域と、前記加熱部による加熱によって前記酸性化合物を放出した前記処理液を前記加熱領域から受け入れる静置領域とを含み、
前記第2空間は、前記酸性化合物を放出した前記処理液を前記容器外に排出可能な空間であり、
前記第1壁部には、前記静置領域にある前記処理液を前記第2空間に流入させる開口が形成されている、再生装置。 - 前記第1壁部は、前記容器の底部に対して立設されており、
前記開口は、前記第1壁部のうち高さ方向の中央部又は前記中央部よりも前記底部側の部位に形成されている、請求項1に記載の再生装置。 - 前記開口は、前記第1壁部のうち前記高さ方向の最下部に形成されている、請求項2に記載の再生装置。
- 前記第1壁部は、前記容器の底部に対して立設されており、
前記開口は、前記第1壁部のうち高さ方向の中央部又は前記中央部よりも上端側の部位に形成されている、請求項1に記載の再生装置。 - 前記処理液を前記加熱領域に供給する処理液供給部をさらに備え、
前記処理液供給部は、前記容器の底部側又は天井部側に配置されている、請求項1に記載の再生装置。 - 前記加熱部は、前記処理液と熱交換する加熱用媒体が流れると共に前記加熱領域に配置された伝熱管を含み、
前記処理液供給部には、前記伝熱管に向かって前記処理液を供給する供給口が設けられている、請求項5に記載の再生装置。 - 前記容器内の空間において前記第2空間と第3空間とを仕切る第2壁部をさらに備え、
前記第2壁部は、前記容器の底部に対して立設されると共に、前記第2空間から前記第3空間に液を溢れさせる上端を含む、請求項1に記載の再生装置。 - 前記第3空間から前記第1空間に液を還流させるための還流路をさらに備えた、請求項7に記載の再生装置。
- 被処理ガスを処理液に接触させることにより、前記被処理ガスに含まれる酸性化合物を前記処理液に吸収させる吸収装置と、
請求項1~8のいずれか1項に記載の再生装置と、を備えた、ガス処理装置。 - 酸性化合物の吸収により相分離した処理液を、容器内の第1空間に供給することと、
前記第1空間に供給された前記処理液を加熱することにより、前記処理液から前記酸性化合物を放出させることと、
前記酸性化合物を放出した前記処理液を前記第1空間において一時的に滞留させた後、前記第1空間と第2空間とを仕切る壁部に形成された開口を通じて、前記処理液を前記第1空間から前記第2空間に流入させることと、を含む、再生方法。 - 吸収装置において酸性化合物を含む被処理ガスを処理液に接触させることにより、前記酸性化合物を前記処理液に吸収させて前記処理液を相分離させることと、
相分離した前記処理液を前記吸収装置から再生装置に送ることと、
前記再生装置において請求項10に記載の再生方法を実施し、酸性化合物を放出した前記処理液を前記再生装置から抜き出して前記吸収装置に還流することと、を含む、ガス処理方法。
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