WO2022038886A1 - 耐食性部材 - Google Patents
耐食性部材 Download PDFInfo
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- WO2022038886A1 WO2022038886A1 PCT/JP2021/023403 JP2021023403W WO2022038886A1 WO 2022038886 A1 WO2022038886 A1 WO 2022038886A1 JP 2021023403 W JP2021023403 W JP 2021023403W WO 2022038886 A1 WO2022038886 A1 WO 2022038886A1
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- Prior art keywords
- corrosion
- resistant
- film
- resistant film
- base material
- Prior art date
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- 238000005260 corrosion Methods 0.000 title claims abstract description 193
- 230000007797 corrosion Effects 0.000 title claims abstract description 193
- -1 aluminum hydroxyfluoride Chemical compound 0.000 claims abstract description 47
- 239000000463 material Substances 0.000 claims abstract description 45
- 239000011248 coating agent Substances 0.000 claims abstract description 35
- 238000000576 coating method Methods 0.000 claims abstract description 35
- 239000000126 substance Substances 0.000 claims abstract description 15
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 28
- 238000002441 X-ray diffraction Methods 0.000 claims description 22
- 239000011777 magnesium Substances 0.000 claims description 11
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 10
- 229910052749 magnesium Inorganic materials 0.000 claims description 10
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 7
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 6
- 239000010408 film Substances 0.000 description 112
- 239000007789 gas Substances 0.000 description 50
- 238000010438 heat treatment Methods 0.000 description 38
- 239000002243 precursor Substances 0.000 description 22
- 238000011282 treatment Methods 0.000 description 21
- 239000011737 fluorine Substances 0.000 description 20
- 229910052731 fluorine Inorganic materials 0.000 description 20
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 19
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
- 229910001873 dinitrogen Inorganic materials 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 7
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 5
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- LGPPATCNSOSOQH-UHFFFAOYSA-N 1,1,2,3,4,4-hexafluorobuta-1,3-diene Chemical compound FC(F)=C(F)C(F)=C(F)F LGPPATCNSOSOQH-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- MXRIRQGCELJRSN-UHFFFAOYSA-N O.O.O.[Al] Chemical compound O.O.O.[Al] MXRIRQGCELJRSN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002447 crystallographic data Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000001652 electrophoretic deposition Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Images
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/08—Anti-corrosive paints
- C09D5/082—Anti-corrosive paints characterised by the anti-corrosive pigment
- C09D5/084—Inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/002—Priming paints
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/73—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
- C23C22/74—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process for obtaining burned-in conversion coatings
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/82—After-treatment
Definitions
- the present invention relates to a corrosion resistant member.
- Patent Document 1 discloses a member such as a shower head having an aluminum surface coated with a corrosion-resistant film made of at least one of aluminum fluoride and magnesium fluoride.
- Patent Document 2 discloses a film-forming material containing aluminum oxyfluoride, and the film film produced by this film-forming material is directed against plasma using a halogen-based gas such as a fluorine-based gas. It is described as having high corrosion resistance.
- Patent Document 3 discloses a corrosion-resistant member in which an aluminum portion exposed on the surface of a composite containing aluminum is covered with fluoride. It is described that this fluoride has a main crystal phase composed of aluminum hydroxide fluoride presumed to be Al 2 F 3 (OH) 3 and has high corrosion resistance to halogen-based corrosive gas. Has been done.
- An object of the present invention is to provide a corrosion-resistant member whose corrosion-resistant film does not easily peel off from a substrate even if it receives a heat history.
- one aspect of the present invention is as follows [1] to [5].
- a base material made of aluminum or an aluminum alloy and a corrosion-resistant coating formed on the surface of the base material are provided.
- the corrosion-resistant coating contains aluminum hydroxide fluoride AlF 3-x (OH) x whose space group belongs to R-3c, and the x in the chemical formula is 0.05 or more and 1.00 or less. ..
- the corrosion-resistant film does not easily peel off from the base material even if it receives a heat history.
- the corrosion-resistant member according to the present embodiment includes a base material 10 made of aluminum (Al) or an aluminum alloy, and a corrosion-resistant coating 20 formed on the surface of the base material 10.
- the corrosion-resistant coating 20 contains aluminum hydroxide fluoride AlF 3-x (OH) x whose space group belongs to R-3c, and x in the chemical formula is 0.05 or more and 1.00 or less.
- the corrosion-resistant coating 20 may be composed of aluminum hydroxide fluoride AlF 3-x (OH) x , or may be a mixture of aluminum hydroxide fluoride AlF 3-x (OH) x and other materials. It may be configured.
- the corrosion-resistant member according to the present embodiment includes corrosive gas such as halogen gas (for example, fluorine gas (F 2 ), chlorine gas (Cl 2 )) used as a cleaning gas in the semiconductor manufacturing process, plasma thereof, and semiconductor. It has excellent corrosion resistance to oxygen gas (O 2 ) used as a process gas in the manufacturing process and its plasma, and even if it receives a thermal history in these gases and its plasma, the corrosion resistant film 20 is formed from the base material 10. Is hard to peel off.
- halogen gas for example, fluorine gas (F 2 ), chlorine gas (Cl 2 )
- the corrosion-resistant member according to the present embodiment also has an effect that the generation of particles derived from the peeling of the corrosion-resistant coating 20 is suppressed because the corrosion-resistant coating 20 is difficult to peel off from the base material 10 even if it receives a heat history. ing.
- Such a corrosion-resistant member according to the present embodiment is suitable as a member that requires corrosion resistance and heat resistance, and is, for example, a member constituting a semiconductor manufacturing apparatus (particularly, a film forming apparatus using a chemical vapor deposition method). Suitable. As a specific example, it is suitable as a susceptor, a shower head, or a chamber body of a film forming apparatus for forming a thin film on a wafer. If the corrosion-resistant member according to the present embodiment is used as a member constituting the semiconductor manufacturing apparatus, the generation of particles is suppressed, so that the semiconductor can be manufactured with a high yield.
- X in the chemical formula can be measured by X-ray photoelectron spectroscopy (XPS).
- the measuring device include a scanning X-ray photoelectron spectroscopy analyzer Quantera II (registered trademark) manufactured by ULVAC FI Co., Ltd.
- Quantera II registered trademark
- Al monochrome 100 ⁇ m, 25 W, 15 kV may be used, and the analysis area may be 100 ⁇ m 2 .
- the electron / ion neutralization gun may be turned on and the photoelectron extraction angle may be set to 45 °.
- argon (Ar) ion sputtering In X-ray photoelectron spectroscopy, surface etching and analysis by argon (Ar) ion sputtering are alternately performed to obtain a depth profile of the corrosion-resistant coating 20. Argon ion sputtering at this time is carried out under the condition that the acceleration voltage is 2 kV and silicon dioxide (SiO 2 ) is surface-etched by 9.1 nm / min. The surface etching amount of the corrosion-resistant coating 20 is calculated based on this value.
- the value obtained by X-ray photoelectron spectroscopy is quantified by the relative sensitivity coefficient method.
- the space group of aluminum hydroxide fluoride AlF 3-x (OH) x can be measured by analyzing the corrosion resistant coating 20 by the oblique incident method of X-ray diffraction.
- the measuring device include an X-ray diffractometer X'Pert PRO MPD manufactured by PANalytical.
- a Cu anode can be used as the target, a collimator CCD can be used as the detector, and a parallel beam can be used as the optical system.
- the tube voltage is 45 kV
- the tube current is 40 mA
- the scan range is 10 to 40 °
- the scan step The size may be 0.05 °
- the scan speed may be 0.5 ° / min
- PDF Powder Diffraction File
- x in the chemical formula needs to be 0.05 or more and 1.00 or less, it is preferably 0.10 or more and 0.70 or less, and 0.15 or more and 0.50 or less. More preferred. Then, even if the heat history is received, the effect that the corrosion-resistant film 20 is difficult to peel off from the base material 10 becomes higher.
- the aluminum fluoride hydroxide AlF 3-x (OH) x contained in the corrosion resistant coating 20 has a half width of the peak of the maximum intensity obtained by analysis by the X-ray diffraction method having a half width of 0.60 ° or less. It is preferably 0.50 ° or less, and more preferably 0.50 ° or less. By doing so, the effect that the corrosion-resistant film 20 is difficult to peel off from the base material 10 even if it receives a heat history under various gas atmospheres becomes higher.
- the half width of aluminum hydroxide fluoride AlF 3-x (OH) x can be measured by analyzing the corrosion-resistant film 20 by the oblique incident method of X-ray diffraction, as in the case of the space group.
- the measuring device as in the case of the space group, for example, an X-ray diffractometer X'Pert PRO MPD manufactured by PANalytical Co., Ltd. can be mentioned.
- the above half-value width can be obtained by obtaining the half-value width of the peak of the maximum intensity appearing at 24-26 ° of the peak profile obtained by X-ray diffraction. It should be noted that this peak is attributed to the plane whose Miller index is (012).
- the thickness of the corrosion-resistant coating 20 is preferably 0.1 ⁇ m or more and 50 ⁇ m or less, and more preferably 0.2 ⁇ m or more and 10 ⁇ m or less. Then, the corrosion resistance of the corrosion-resistant member according to the present embodiment becomes higher.
- the method for measuring the thickness of the corrosion-resistant coating 20 is not particularly limited, and examples thereof include a transmission electron microscope (TEM), a scanning transmission electron microscope (STEM), and a scanning electron microscope (SEM).
- the base material 10 is preferably made of an aluminum alloy containing magnesium (Mg), and is made of an aluminum alloy containing 0.5% by mass or more of magnesium. It is more preferable that the material is composed of an aluminum alloy containing 0.7% by mass or more and 10% by mass or less of magnesium.
- an intermediate layer (not shown in FIG. 1) made of magnesium fluoride (MgF 2 ) is arranged between the base material 10 and the corrosion-resistant coating 20.
- MgF 2 magnesium fluoride
- the thickness of the intermediate layer is preferably 0.1 ⁇ m or more and 3.0 ⁇ m or less, and more preferably 0.2 ⁇ m or more and 1.0 ⁇ m or less. Then, even if the heat history is received, the effect that the corrosion-resistant film 20 is difficult to peel off from the base material 10 is further enhanced.
- the method for measuring the thickness of the intermediate layer is the same as that for the thickness of the corrosion-resistant coating 20.
- the method for producing the corrosion-resistant member according to the present embodiment is not particularly limited, but as an example, hydroxylation is performed via a coating film of a precursor of aluminum hydroxide fluoride AlF 3-x (OH) x .
- a method of forming a film of aluminum fluoride AlF 3-x (OH) x can be mentioned. According to this method, it becomes easy to uniformly form the corrosion-resistant film 20.
- a precursor coating of aluminum hydroxide fluoride AlF 3-x (OH) x is formed on the surface of the base material 10 made of aluminum or an aluminum alloy. Then, by heat-treating the coating film of this precursor in a fluorine-containing gas, the precursor is changed to aluminum hydroxide fluoride AlF 3-x (OH) x , and aluminum fluoride hydroxide AlF 3-x (OH).
- This is a method of forming a corrosion-resistant coating film 20 composed of x on the surface of the base material 10. Examples of the method for forming the precursor film on the surface of the base material 10 include chemical treatment, anodizing, electrophoretic deposition, and thin-film deposition.
- AlF 3-x (OH) x aluminum oxide (Al 2 O 3 ), aluminum hydroxide (Al (OH) 3 ), aluminum hydroxide (Al O (OH)), Examples thereof include aluminum hydroxide (AlF (OH) 2 , etc.), aluminum oxyfluoride (AlOF), and aluminum fluoride (AlF 3 ).
- the coating of the precursor may be composed of one of these compounds, or may be composed of two or more of them. Further, these compounds may be anhydrous, hydrated, crystalline, or amorphous.
- the thickness of the formed precursor coating film is 0.1 ⁇ m or more and 50 ⁇ m or less
- the thickness of the corrosion-resistant coating film 20 can be 0.1 ⁇ m or more and 50 ⁇ m or less.
- the type of fluorine-containing gas used when heat-treating the film of the precursor is not particularly limited as long as it is a gas of a compound containing fluorine, but fluorine gas, hydrogen fluoride (HF) gas, and three-fluorine gas.
- Nitrogen (NF 3 ) gas Carbon tetrafluoride (CF 4 ) gas, Trifluoromethane gas (CHF 3 ), Hexafluoroethane (C 2 F 6 ) gas, Hexafluorobutadiene gas (C 4 F 6 )
- a gas consisting of at least one kind is preferable.
- a mixed gas of a fluorine-containing gas and an inert gas such as nitrogen gas (N 2 ) or argon gas may be used when the film of the precursor is heat-treated.
- the treatment temperature during the heat treatment is preferably 220 ° C. or higher and 475 ° C. or lower, more preferably 250 ° C. or higher and 460 ° C. or lower, and further preferably 280 ° C. or higher and 450 ° C. or lower.
- the heat treatment treatment time is preferably 2 hours or more and 240 hours or less, more preferably 3 hours or more and 150 hours or less, and further preferably 5 hours or more and 100 hours or less.
- x of aluminum hydroxide fluoride AlF 3-x (OH) x whose space group belongs to R-3c is 1.00. It tends to be as follows. Further, if the treatment temperature at the time of heat treatment is 475 ° C. or lower and the treatment time is 240 hours or less, x of aluminum hydroxide fluoride AlF 3-x (OH) x whose space group belongs to R-3c is 0. It tends to be 0.05 or more.
- the half-value width of the peak (that is, the peak of the (012) plane) tends to be 0.60 ° or less.
- the thickness of the intermediate layer made of magnesium fluoride tends to be 0.1 ⁇ m or higher.
- the thickness of the intermediate layer made of magnesium fluoride tends to be 3.0 ⁇ m or less.
- Example 1 A corrosion-resistant film was formed on the surface of a base material made of an aluminum alloy A5052 (JIS standard) containing 2.55% by mass of magnesium and having dimensions of 20 mm in width, 30 mm in length and 2 mm in thickness. First, the base material was subjected to the following pretreatment.
- A5052 JIS standard
- Escreen AL-13 (manufactured by Sasaki Chemicals Co., Ltd.) is dissolved in 1 L of water and the temperature is set to 50 ° C. as a degreasing solution. Was washed with.
- 500 g of Escreen AL-5000 (manufactured by Sasaki Chemicals Co., Ltd.) heated to 70 ° C. was used as an etching solution, and the degreased substrate was immersed in this etching solution for 1 minute for etching. It was washed with pure water.
- 200 g of Smut Clean (manufactured by Raiki Co., Ltd.) was dissolved in 400 g of water and the temperature was set to 25 ° C.
- the etched substrate was immersed in this smut remover for 30 seconds to remove the smut. And washed with pure water. Then, the substrate from which the smut was removed was vacuum-dried to complete the pretreatment.
- the pretreated base material is immersed in a Teflon (registered trademark) container containing 1.0 g of aluminum fluoride powder (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) and 99.0 g of ultrapure water, and Teflon is used.
- the container was covered, and the Teflon container was placed in a SUS container (autoclave reactor) and covered. By heating at 200 ° C. for 10 hours using this autoclave reactor, the surface of the pretreated substrate was coated with a film of a precursor of aluminum hydroxide fluoride AlF 3-x (OH) x .
- the substrate whose surface was covered with the precursor film was heated to 400 ° C. in a mixed gas atmosphere of 20% by volume of fluorine gas and 80% by volume of nitrogen gas, and heat-treated for 10 hours.
- the precursor was changed to aluminum hydroxide fluoride AlF 3-x (OH) x to form a corrosion resistant film.
- magnesium contained in the base material diffuses to the surface of the base material, so that a film (intermediate layer) composed of magnesium fluoride is formed between the corrosion-resistant film and the base material.
- a corrosion-resistant member having a corrosion-resistant film on the surface of the base material was obtained.
- x of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion-resistant film was 0.84.
- the space group of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion-resistant film is R-3c, which is the peak of the maximum intensity.
- the half width was 0.44 °.
- a heating test was performed on the obtained corrosion-resistant member of Example 1 to evaluate the state of peeling of the corrosion-resistant film.
- the condition of the heating test is that the temperature is raised to 350 ° C. in 1 hour in a nitrogen gas atmosphere, the temperature is maintained at 350 ° C. for 300 minutes, and then the process is cooled to room temperature in 1 hour, and this is performed for 10 cycles. Is.
- the corrosion-resistant film of the corrosion-resistant member was observed with a scanning electron microscope, and the degree of peeling of the corrosion-resistant film was evaluated.
- the results are shown in Table 1.
- Table 1 if the area of the peeled portion of the corrosion-resistant film is less than 1% of the total area of the corrosion-resistant film, A, if it is 1% or more and less than 5%, B, 5% or more and 30%. If it is less than, it is indicated by C, and if it is 30% or more, it is indicated by D.
- Example 1 a corrosion test was performed on the obtained corrosion-resistant member of Example 1 to evaluate the state of peeling of the corrosion-resistant film.
- one cycle is a process of continuously heat-treating one corrosion-resistant member in the order of chlorine gas atmosphere, fluorine gas atmosphere, and oxygen gas atmosphere, and this is performed for 5 cycles.
- Each of the above gas atmospheres is a mixed gas atmosphere of 20% by volume of chlorine gas, fluorine gas, or oxygen gas and 80% by volume of nitrogen gas.
- the heat treatment temperature is 250 ° C. and the time is 300 min.
- Example 2 Except for the fact that the heat treatment conditions for heating the substrate whose surface is covered with the precursor film in a mixed gas atmosphere of 20% by volume of fluorine gas and 80% by volume of nitrogen gas were set to a temperature of 400 ° C. and a treatment time of 20 hours. , The corrosion resistant member was manufactured in the same manner as in Example 1.
- Example 3 Except for the fact that the heat treatment conditions for heating the substrate whose surface was covered with the precursor film in a mixed gas atmosphere of 20% by volume of fluorine gas and 80% by volume of nitrogen gas were set to a temperature of 430 ° C. and a treatment time of 20 hours. , The corrosion resistant member was manufactured in the same manner as in Example 1.
- Example 4 Except for the fact that the heat treatment conditions for heating the substrate whose surface was covered with the precursor film in a mixed gas atmosphere of 20% by volume of fluorine gas and 80% by volume of nitrogen gas were set to a temperature of 400 ° C. and a treatment time of 12 hours. , The corrosion resistant member was manufactured in the same manner as in Example 1.
- Example 5 Except for the fact that the heat treatment conditions for heating the substrate whose surface is covered with the precursor film in a mixed gas atmosphere of 20% by volume of fluorine gas and 80% by volume of nitrogen gas were set to a temperature of 400 ° C. and a treatment time of 15 hours. , The corrosion resistant member was manufactured in the same manner as in Example 1.
- Example 6 Example 1 except that a base material made of pure aluminum (JIS standard: A1080) containing no magnesium was used instead of the base material made of the aluminum alloy A5052 containing 2.55% by mass of magnesium.
- the corrosion resistant member was manufactured in the same manner as above.
- x of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion-resistant film was 1.61.
- the space group of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion-resistant film is Fd-3m, which is the peak of the maximum intensity. It was difficult to determine the half-price range.
- the X-ray diffraction pattern at this time is shown in FIG.
- a heating test was performed on the obtained corrosion-resistant member of Comparative Example 2 to evaluate the state of peeling of the corrosion-resistant film.
- a corrosion test was conducted to evaluate the state of cracks in the corrosion-resistant film. The results are shown in Table 1.
- Example 4 A corrosion-resistant member was produced in the same manner as in Example 1 except that the base material whose surface was covered with the precursor film was not heat-treated. As a result of analyzing the corrosion-resistant film by X-ray photoelectron spectroscopy, x of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion-resistant film was 2.19. Further, as a result of analyzing the corrosion-resistant film by the oblique incident method of X-ray diffraction, the aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion-resistant film was amorphous. A heating test was performed on the obtained corrosion-resistant member of Comparative Example 4, and the state of peeling of the corrosion-resistant film was evaluated. In addition, a corrosion test was conducted to evaluate the state of cracks in the corrosion-resistant film. The results are shown in Table 1.
- the corrosion-resistant members of Examples 1 to 6 hardly peeled off or cracked the corrosion-resistant film even when subjected to heat history in a nitrogen gas atmosphere and a corrosive gas atmosphere.
- the corrosion-resistant members of Comparative Examples 1 to 4 were subjected to heat history in a nitrogen gas atmosphere and a corrosive gas atmosphere, so that the corrosion-resistant film was peeled off and cracked.
- the space group of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion resistant film belongs to R-3c and x in the chemical formula is 0.05 or more, it is a group at the time of elevating temperature. It is considered that the corrosion-resistant coating has sufficient strength against the stress generated by the thermal expansion or contraction of the material.
- the space group of aluminum hydroxide fluoride AlF 3-x (OH) x constituting the corrosion resistant film belongs to R-3c and x in the chemical formula is 1.00 or less, the atmosphere is chlorine gas. Even if heat treatment is performed under the atmosphere of fluorine gas or oxygen gas, the composition of aluminum fluoride AlF 3-x (OH) x constituting the corrosion resistant film does not change easily, so the corrosion resistant film due to the temperature rise and fall. It is considered that volume expansion and contraction of aluminum are unlikely to occur. As a result, it is considered that cracks in the corrosion-resistant film are unlikely to occur.
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Abstract
Description
特許文献1には、フッ化アルミニウム及びフッ化マグネシウムの少なくとも一方からなる耐食性被膜で被覆されたアルミニウム表面を有するシャワーヘッド等の部材が開示されている。
特許文献3には、アルミニウムを含有してなる複合体の表面に露出したアルミニウム部分がフッ化物で覆われた耐食性部材が開示されている。このフッ化物は、Al2F3(OH)3と推定される水酸化フッ化アルミニウムからなる主結晶相を有しており、ハロゲン系腐食性ガスに対して高い耐腐食性を有することが記載されている。
本発明は、熱履歴を受けても耐食性被膜が基材から剥離しにくい耐食性部材を提供することを課題とする。
[1] アルミニウム又はアルミニウム合金で構成される基材と、前記基材の表面に形成された耐食性被膜と、を備え、
前記耐食性被膜は、空間群がR-3cに帰属される水酸化フッ化アルミニウムAlF3-x(OH)xを含有し、前記化学式中のxが0.05以上1.00以下である耐食性部材。
[3] 前記化学式中のxが0.15以上0.50以下である[1]に記載の耐食性部材。
[5] 前記基材が、マグネシウムを含有するアルミニウム合金で構成されており、前記基材と前記耐食性被膜の間にフッ化マグネシウムで構成された中間層が配されている[1]~[4]のいずれか一項に記載の耐食性部材。
また、本実施形態に係る耐食性部材は、熱履歴を受けても耐食性被膜20が基材10から剥離しにくいため、耐食性被膜20の剥離に由来するパーティクルの発生が抑制されるという効果も有している。
X線回折によって得られたピークプロファイルから、PDFデータベース(=粉末X線データベース(International Centre for Diffraction Data;ICDD)のPowder Diffraction File(PDF))を参考にして、空間群の種類を決定する。
上記の半値幅は、X線回折によって得られたピークプロファイルの24~26°に出現する最大強度のピークの半値幅を求めることによって得ることができる。なお、このピークは、ミラー指数が(012)の面に帰属される。
基材10の表面上に前駆体の被膜を形成する方法としては、化学処理、陽極酸化、電気泳動堆積法、蒸着法等の方法が挙げられる。
形成した前駆体の被膜の厚さを0.1μm以上50μm以下とすれば、耐食性被膜20の厚さを0.1μm以上50μm以下とすることができる。
また、熱処理時の処理温度が475℃以下で且つ処理時間が240時間以下であれば、空間群がR-3cに帰属される水酸化フッ化アルミニウムAlF3-x(OH)xのxが0.05以上となりやすい。
さらに、熱処理時の処理温度が300℃以上で且つ処理時間が3時間以上であれば、フッ化マグネシウムで構成された中間層の厚さが0.1μm以上となりやすい。
さらに、熱処理時の処理温度が475℃以下で且つ処理時間が150時間以下であれば、フッ化マグネシウムで構成された中間層の厚さが3.0μm以下となりやすい。
〔実施例1〕
マグネシウムを2.55質量%含有するアルミニウム合金A5052(JIS規格)で構成され、寸法が幅20mm、長さ30mm、厚さ2mmである基材の表面に、耐食性被膜を形成した。まず、基材に対して下記のような前処理を施した。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度400℃、処理時間20時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた実施例2の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度430℃、処理時間20時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた実施例3の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度400℃、処理時間12時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた実施例4の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度400℃、処理時間15時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた実施例5の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
マグネシウムを2.55質量%含有するアルミニウム合金A5052で構成された基材に代えて、マグネシウムを含有しない純アルミニウム(JIS規格:A1080)で構成された基材を用いた点以外は、実施例1と同様にして耐食性部材を製造した。
得られた実施例6の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度400℃、処理時間1時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた比較例1の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度200℃、処理時間20時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた比較例2の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材をフッ素ガス20体積%、窒素ガス80体積%の混合ガス雰囲気中で加熱する熱処理の条件を、温度480℃、処理時間300時間とした点以外は、実施例1と同様にして耐食性部材を製造した。
得られた比較例3の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
表面が前駆体の被膜で覆われた基材に熱処理を施さなかった点以外は、実施例1と同様にして耐食性部材を製造した。
X線光電子分光法により耐食性被膜を分析した結果、耐食性被膜を構成する水酸化フッ化アルミニウムAlF3-x(OH)xのxは2.19であった。また、X線回折の斜入射法により耐食性被膜を分析した結果、耐食性被膜を構成する水酸化フッ化アルミニウムAlF3-x(OH)xは、アモルファスであった。
得られた比較例4の耐食性部材に対して加熱試験を行い、耐食性被膜の剥離の状態を評価した。また、腐食試験を行い、耐食性被膜のクラックの状態を評価した。結果を表1に示す。
耐食性被膜を構成する水酸化フッ化アルミニウムAlF3-x(OH)xの空間群がR-3cに帰属され、且つ、前記化学式中のxが0.05以上であれば、昇降温時の基材の熱膨張又は熱収縮によって生じる応力に対し、耐食性被膜が十分な強度を有するものと考えられる。
20・・・耐食性被膜
Claims (5)
- アルミニウム又はアルミニウム合金で構成される基材と、前記基材の表面に形成された耐食性被膜と、を備え、
前記耐食性被膜は、空間群がR-3cに帰属される水酸化フッ化アルミニウムAlF3-x(OH)xを含有し、前記化学式中のxが0.05以上1.00以下である耐食性部材。 - 前記化学式中のxが0.10以上0.70以下である請求項1に記載の耐食性部材。
- 前記化学式中のxが0.15以上0.50以下である請求項1に記載の耐食性部材。
- 前記水酸化フッ化アルミニウムをX線回折法により分析して得られた最大強度のピークの半値幅が0.50°以下である請求項1~3のいずれか一項に記載の耐食性部材。
- 前記基材が、マグネシウムを含有するアルミニウム合金で構成されており、前記基材と前記耐食性被膜の間にフッ化マグネシウムで構成された中間層が配されている請求項1~4のいずれか一項に記載の耐食性部材。
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JP (1) | JPWO2022038886A1 (ja) |
KR (1) | KR20230007495A (ja) |
CN (1) | CN115698383A (ja) |
TW (1) | TWI783565B (ja) |
WO (1) | WO2022038886A1 (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11193478A (ja) * | 1997-10-31 | 1999-07-21 | Suzuki Motor Corp | 表面処理方法、摺動部材及びピストン |
JP2000212769A (ja) * | 1999-01-26 | 2000-08-02 | Ngk Insulators Ltd | 耐食性部材及びその製造方法 |
JP2011231404A (ja) * | 2011-04-27 | 2011-11-17 | Toyo Seikan Kaisha Ltd | 表面処理金属板及びその表面処理方法、並びに樹脂被覆金属板、缶及び缶蓋 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW400919U (en) | 1996-03-12 | 2000-08-01 | Toyoda Automatic Loom Works | Variable volume capacity typed compressor |
JP2004011026A (ja) * | 1997-10-31 | 2004-01-15 | Suzuki Motor Corp | アルミニウム又はアルミニウム合金の表面処理方法 |
WO2002087814A1 (en) * | 2001-05-02 | 2002-11-07 | Norsk Hydro Asa | A process of making a shaped product |
US6632325B2 (en) * | 2002-02-07 | 2003-10-14 | Applied Materials, Inc. | Article for use in a semiconductor processing chamber and method of fabricating same |
KR100533368B1 (ko) | 2004-01-06 | 2005-12-06 | 이동익 | 플랜지 결합방법 |
-
2021
- 2021-06-21 CN CN202180043515.8A patent/CN115698383A/zh active Pending
- 2021-06-21 JP JP2022543300A patent/JPWO2022038886A1/ja active Pending
- 2021-06-21 WO PCT/JP2021/023403 patent/WO2022038886A1/ja unknown
- 2021-06-21 KR KR1020227042869A patent/KR20230007495A/ko unknown
- 2021-06-21 EP EP21858036.3A patent/EP4202079A4/en active Pending
- 2021-06-21 US US18/011,372 patent/US20230235183A1/en active Pending
- 2021-07-08 TW TW110125089A patent/TWI783565B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11193478A (ja) * | 1997-10-31 | 1999-07-21 | Suzuki Motor Corp | 表面処理方法、摺動部材及びピストン |
JP2000212769A (ja) * | 1999-01-26 | 2000-08-02 | Ngk Insulators Ltd | 耐食性部材及びその製造方法 |
JP2011231404A (ja) * | 2011-04-27 | 2011-11-17 | Toyo Seikan Kaisha Ltd | 表面処理金属板及びその表面処理方法、並びに樹脂被覆金属板、缶及び缶蓋 |
Non-Patent Citations (1)
Title |
---|
See also references of EP4202079A4 * |
Also Published As
Publication number | Publication date |
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TWI783565B (zh) | 2022-11-11 |
KR20230007495A (ko) | 2023-01-12 |
TW202217021A (zh) | 2022-05-01 |
JPWO2022038886A1 (ja) | 2022-02-24 |
EP4202079A4 (en) | 2024-01-10 |
CN115698383A (zh) | 2023-02-03 |
US20230235183A1 (en) | 2023-07-27 |
EP4202079A1 (en) | 2023-06-28 |
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