WO2021238975A1 - 发光器件、显示面板以及显示装置 - Google Patents
发光器件、显示面板以及显示装置 Download PDFInfo
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- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/654—Aromatic compounds comprising a hetero atom comprising only nitrogen as heteroatom
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- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
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- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
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- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/12—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising dopants
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- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
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- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
Definitions
- the present invention relates to the field of display technology, in particular to a light-emitting device, a display panel and a display device.
- OLED Organic Light-Emitting Diode, organic light-emitting diode
- OLED display panels have the advantages of ultra-thin, high brightness, large viewing angle, low power consumption, fast response, high screen color saturation, bendable folding, narrow bezel, high luminous efficiency, and wide temperature adaptation range.
- the application in display devices has become the current mainstream development trend.
- a light emitting device includes: a first electrode and a second electrode arranged in a stack, and a light-emitting layer arranged between the first electrode and the second electrode, the light-emitting layer comprising a thermally activated delayed fluorescence TADF material;
- the TADF material includes a donor, an acceptor, and a linking group connected between the donor and the acceptor;
- the donor includes: a basic unit of the donor, and a substituent connected to the basic unit of the donor, so Each atom in the basic unit of the donor is located in the first plane;
- the acceptor includes: the basic unit of the acceptor, and a substituent connected to the basic unit of the acceptor, and each atom in the basic unit of the acceptor Located in the second plane;
- the linking group includes: a connected basic unit, and a substituent connected to the connected basic unit, and each atom in the connected basic unit is located in the third plane;
- the donor is selected from one of the structures shown in the following formula (I):
- the receptor is selected from one of the structures represented by the following formula (II):
- the linking group is selected from substituted or unsubstituted divalent aryl, substituted or unsubstituted divalent heteroaryl, substituted or unsubstituted divalent fused aryl, and substituted or unsubstituted divalent fused heteroaryl Any one of the groups; Y is selected from single bond, substituted or unsubstituted divalent alkyl, substituted or unsubstituted divalent aryl, substituted or unsubstituted divalent heteroaryl, substituted or unsubstituted divalent A combination of one or more of a fused aryl group and a substituted or unsubstituted divalent fused heteroaryl group; R1 and R2 are each independently a substituted or unsubstituted alkyl, aryl, heteroaryl, or fused aromatic group M and n are each a positive integer from 0 to 3; X1, X2 and X3 are each independently selected from any one of C(R) and N, and
- the value range of the included angle ⁇ 1 between the first plane and the third plane is: 50° ⁇ 1 ⁇ 80°.
- the value range of the included angle ⁇ 2 between the second plane and the third plane is: 0° ⁇ 2 ⁇ 80°.
- the energy level difference between singlet excitons and triplet excitons in the TADF material is less than 0.2 eV.
- the donor is selected from any one of the structures shown in Formula 1 to Formula 4:
- the receptor is selected from any one of the structures shown in Formula 5 to Formula 8:
- the linking group is selected from any one of the structures shown in Formula 9 to Formula 12:
- the TADF material has a structure shown in any one of Compound 1 to Compound 4:
- the light-emitting layer includes a host material and a guest material; the host material includes the TADF material, and the guest material is selected from any one of the structures shown in Formula 13 to Formula 15:
- the mass proportion of the guest material in the light-emitting layer is 1%-10%.
- the difference between the triplet exciton energy of the host material and the triplet exciton energy of the guest material satisfies: ⁇ E ⁇ 0.65 eV.
- the light-emitting device further includes: at least one of an electron injection layer, an electron transport layer, an electron blocking layer, a hole blocking layer, a hole transport layer, and a hole injection layer.
- the material of the electron injection layer is lithium fluoride LiF, Ytterbium Yb, or the structure shown in Formula 16:
- the material of the electron transport layer is a structure shown in any one of formulas 17 to 20:
- the material of the electron blocking layer is a structure shown in any one of formulas 21 to 22:
- the material of the hole blocking layer is a structure shown in any one of formula 18 to formula 20;
- the material of the hole transport layer is a structure shown in any one of formulas 23 to 25:
- the material of the hole injection layer is a structure shown in any one of formula 26 to formula 27:
- a display panel which includes a base substrate and the light emitting device according to any one of the above provided on the base substrate.
- a display device including the display panel as described above.
- FIG. 1 is a structural diagram of a display panel according to some embodiments
- FIG. 2 is a cross-sectional view of a display panel according to some embodiments.
- Fig. 3 is a structural diagram of a light emitting device according to some embodiments.
- Fig. 4 is a schematic diagram of light emission of a light emitting device according to some embodiments.
- FIG. 5 is a schematic diagram of the angles between D and L and L and A in a TADF material according to some embodiments
- HOMO highest occupied orbital
- LUMO lowest unoccupied orbital
- FIG. 7 is a distribution diagram of the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 2 provided according to some embodiments;
- FIG. 8 is a distribution diagram of the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 3 according to some embodiments;
- FIG. 9 is a distribution diagram of the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 4 provided according to some embodiments;
- Fig. 10 is another structural diagram of a light emitting device according to some embodiments.
- Fig. 11 is another structural diagram of a light emitting device according to some embodiments.
- first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of these features.
- plural means two or more.
- the expressions “coupled” and “connected” and their extensions may be used.
- the term “connected” may be used when describing some embodiments to indicate that two or more components are in direct physical or electrical contact with each other.
- the term “coupled” may be used when describing some embodiments to indicate that two or more components have direct physical or electrical contact.
- the term “coupled” or “communicatively coupled” may also mean that two or more components are not in direct contact with each other, but still cooperate or interact with each other.
- the embodiments disclosed herein are not necessarily limited to the content of this document.
- At least one of A, B, and C has the same meaning as “at least one of A, B, or C", and both include the following combinations of A, B, and C: only A, only B, only C, A and B The combination of A and C, the combination of B and C, and the combination of A, B and C.
- a and/or B includes the following three combinations: A only, B only, and the combination of A and B.
- the term “if” is optionally interpreted to mean “when” or “when” or “in response to determination” or “in response to detection.”
- the phrase “if it is determined" or “if [the stated condition or event] is detected” is optionally interpreted to mean “when determining" or “in response to determining" Or “when [stated condition or event] is detected” or “in response to detecting [stated condition or event]”.
- the exemplary embodiments are described herein with reference to cross-sectional views and/or plan views as idealized exemplary drawings.
- the thickness of layers and regions are exaggerated for clarity. Therefore, variations in the shape with respect to the drawings due to, for example, manufacturing technology and/or tolerances can be envisaged. Therefore, the exemplary embodiments should not be construed as being limited to the shapes of the regions shown herein, but include shape deviations due to, for example, manufacturing.
- the etched area shown as a rectangle will generally have curved features. Therefore, the areas shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shape of the area of the device, and are not intended to limit the scope of the exemplary embodiments.
- a display device may be a TV, a mobile phone, a computer, a notebook computer, a tablet computer, a personal digital assistant (PDA), a vehicle-mounted computer, etc., which is not limited in the present disclosure.
- the display device may include a display panel, a circuit board, a display driver integrated circuit (Integrated Circuit, IC for short), and other electronic accessories.
- the above-mentioned display device may be an OLED display device, in this case, the display panel is an OLED display panel.
- OLED is increasingly used in the field of high-performance display due to its self-luminous, fast response, wide viewing angle, and the ability to be fabricated on a flexible substrate.
- the display panel 1 when looking directly at the display surface of the display panel 1, it can be found that the display panel 1 has a display area AA (Active Area, AA) and a peripheral area BB located on at least one side of the display area AA.
- the area BB surrounding the display area AA is taken as an example for illustration, and the present disclosure is not limited to this.
- the display panel 1 includes a plurality of sub-pixels P located in the AA area.
- Each sub-pixel P includes a pixel circuit 200 and a light emitting device 100 electrically connected to the pixel circuit 200.
- the pixel circuit 200 drives the light emitting device 100 to emit light.
- the light-emitting devices in the plurality of sub-pixels P can emit at least three primary colors of light, such as red (Red, R), green (Green, G), and blue (Blue, B) light.
- the present disclosure is described by taking a plurality of sub-pixels P arranged in a matrix form as an example.
- the sub-pixels P arranged in a row along the horizontal direction X are called sub-pixels in the same row
- the sub-pixels P arranged in a row along the vertical direction Y are sub-pixels in the same column.
- the pixel circuits 200 located in the same row are electrically connected to the same emission control signal line (Emission, EM for short), and are also electrically connected to the same gate signal line (GL for short).
- the pixel circuits 200 located in the same column are electrically connected to the same data signal line (DL for short).
- the peripheral area BB includes a gate driving circuit 10 and a data driving circuit 20.
- the gate driving circuit 10 supplies the pixel circuit 200 with strobe signals such as progressive scanning through the above-mentioned plurality of GLs. Under the gating of the strobe signal, the data signal provided by the data driving circuit 20 can be input to the strobed pixel circuit 200 through the above-mentioned multiple DLs.
- the gate driving circuit 10 also provides a light-emitting signal to the pixel circuit 200 in the AA area through a plurality of EM lines.
- the pixel circuit 200 drives the light-emitting device 100 electrically connected to it to emit light under the combined action of the above-mentioned strobe signal, light-emitting signal, and strobe signal.
- the respective film layers of the transistors constituting the gate driving circuit 10 and the transistors in the pixel circuit 200 can be made by the same patterning process. In this way, when the pixel circuit 200 is fabricated on the same base substrate, the gate drive circuit 10 is integrated on the base substrate, eliminating the need for driver IC binding process, reducing costs, and achieving a narrow frame and low cost. Power consumption design.
- a typical patterning process refers to the application of a mask once, by including: coating photoresist on the surface of the film, exposing the photoresist, developing after exposure, etching the area exposed by the photoresist in the film to form a specific pattern and The process of removing the photoresist to form the desired pattern.
- FIG. 2 only uses the structure corresponding to one sub-pixel P in FIG. 1 as an example for explanation.
- the display panel 1 includes a base substrate 300 and a light emitting device 100 provided on the base substrate 300.
- the base substrate 300 may have a single-layer structure or a stacked-layer structure.
- the base substrate 300 includes a blank substrate 310 and a pixel circuit 200 disposed on the blank substrate 310.
- the pixel circuit 200 includes at least one thin film transistor 320 (TFT for short) and at least one capacitor (not shown in FIG. 2), and each thin film transistor 320 may adopt a top-gate or bottom-gate structure.
- FIG. 2 is an example with a top gate structure of a thin film transistor 320 as an example.
- the thin film transistor 320 includes an active layer AL, a gate insulating layer GI, and a gate metal layer sequentially disposed on a blank substrate 310.
- GM forming gate 321), interlayer dielectric layer ILD, source and drain metal layer SD (forming source 322 and drain 323).
- the gate 321 receives the strobe signal transmitted by the GL, and inputs the data signal from the DL to the source 322 or the drain 323 of the thin film transistor 320 under the strobe of the strobe signal.
- the active layer AL may be composed of amorphous silicon, single crystal silicon, polycrystalline silicon, or oxide semiconductor.
- the blank substrate 310 may be a flexible blank substrate or a rigid blank substrate.
- the material of the blank substrate 310 may be polyethylene terephthalate (PET), polyethylene naphthalate two formic acid glycol ester (PEN) or polyimide (PI), etc.
- PET polyethylene terephthalate
- PEN polyethylene naphthalate two formic acid glycol ester
- PI polyimide
- the material of the blank substrate 310 may be glass or a polymethyl methacrylate (PMMA) substrate or the like.
- the display panel 1 further includes a pixel defining layer 500 disposed on the side of the thin film transistor 320 away from the blank substrate 310.
- the pixel defining layer 500 includes a plurality of opening areas, and barrier walls arranged around each opening area.
- One light emitting device 100 is disposed in an opening area, and the first electrode 110 and the light emitting layer 120 of adjacent light emitting devices 100 are separated by a barrier of the pixel defining layer 500.
- the display panel 1 further includes an encapsulation layer 400.
- the encapsulation layer 400 can prevent water vapor and oxygen from invading the multiple light emitting devices 100.
- the packaging layer 400 may be a packaging film or a packaging substrate.
- the encapsulation layer 400 may include a layer of encapsulation film, or may include a multilayer encapsulation film arranged in a stack.
- the encapsulation layer 400 includes three layers of encapsulation films stacked in sequence, the material of the encapsulation film in the middle layer is an organic material, and the material of the encapsulation film on both sides is an inorganic material.
- the organic material may be PMMA, and the inorganic material may be one or more of silicon nitride (SiNx), silicon oxide (SiOx), and silicon oxynitride (SiOxNy).
- some embodiments of the present disclosure provide a light emitting device 100 which includes a first electrode 110, a light emitting layer 120 and a second electrode 130 which are sequentially disposed on a base substrate 300.
- the first electrode 110 may be an anode (for providing holes), and the second electrode 130 may be a cathode (for providing electrons).
- the first electrode 110 may be a cathode, and the second electrode 130 may be an anode.
- the following embodiments all take the first electrode 110 as the anode and the second electrode 130 as the cathode as examples for illustration.
- the holes generated by the first electrode 110 and the electrons generated by the second electrode 130 move to move to the light-emitting layer 120.
- holes and electrons meet in the light-emitting layer 120, they combine to generate excitons, and the excitons are de-excited to generate light.
- the first electrode 110 may be formed of a metal with high reflectivity
- the second electrode 130 may be formed of a transparent conductive film.
- the light emitted by the light-emitting functional layer 120 is reflected by the first electrode 110 and emitted to the outside through the second electrode 130, thereby forming a top-emission type light-emitting device.
- the first electrode 110 is formed of a transparent conductive film
- the second electrode 130 is formed of a metal with high reflectivity, which may form a bottom emission type light emitting device.
- a double-sided light emitting type light emitting device may be formed.
- the material of the transparent conductive film may be, for example, ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide, indium zinc oxide), or IGZO (Indium Gallium Zinc Oxide, indium gallium zinc oxide).
- the metal with high reflectance may be Ag, for example.
- the light-emitting layer 120 includes a thermally activated delayed fluorescence (TADF) material. Delayed fluorescence, also known as delayed fluorescence, is derived from the radiation transition of the S1 state regenerated from the excited triplet state T1 (as shown in Figure 4). Depending on the light-emitting mechanism, delayed fluorescence can include P-type delayed fluorescence and E-type delayed fluorescence.
- TADF thermally activated delayed fluorescence
- the energy level difference between singlet excitons (or singlet excitons) and triplet excitons (or triplet excitons) is relatively large. It is about 0.5eV ⁇ 1eV.
- the triplet excitons and singlet excitons have close energies, and the triplet excitons can cross to the singlet excitons through the thermal activation reverse system.
- thermally activated delayed fluorescence TADF
- the material that can emit thermally activated delayed fluorescence is TADF material.
- the TADF material When the TADF material is directly used as the fluorescent light-emitting material, compared with the fluorescent light-emitting material of non-TADF material, the energy of the triplet excitons can be fully utilized and the luminous efficiency can be improved. Compared with the noble metal complexes used as luminescent materials in the related art, the cost can be reduced and noble metal pollution can be reduced.
- the light-emitting layer 120 includes a host (Host) material and a guest (Dopant) material.
- TADF material as the guest material
- the host material can include 4,4',4”-tris(carbazol-9-yl)triphenylamine (TCTA), N,N'-dimethylquinacridone (DMQA), three One of aniline (TPA) and coumarin derivatives (mEMCB).
- TCTA 4,4',4”-tris(carbazol-9-yl)triphenylamine
- DMQA N,N'-dimethylquinacridone
- TPA three One of aniline
- mEMCB coumarin derivatives
- the light-emitting layer 120 includes a host (Host) material and a guest (Dopant) material.
- TADF material is used as the host material, and the guest material can be selected from the structure shown in any of the following formulas 13-15.
- TADF is used as the host material. Compared with the non-TADF material used as the host material in the related art, it can also transfer energy to the guest material more effectively.
- the TADF material includes a donor (Donor, D), an acceptor (Accept, A), and a linker (L) connected between D and A.
- the TADF material may have DLA structure.
- the donor includes the basic unit of the donor and the substituent connected to the basic unit of the donor. Each atom in the basic unit of the donor is located in the first plane M1.
- the donor is selected from one of the structures shown in the following formula (I), and the dashed line connected to N is a link to L (linking group).
- Y is selected from one or more of a single bond, a substituted or unsubstituted divalent alkyl group, a substituted or unsubstituted divalent aryl group, and a substituted or unsubstituted divalent heteroaryl group
- R1 and R2 are each independently any one of a substituted or unsubstituted alkyl group, an aryl group, a heteroaryl group, a fused aryl group, and a fused heteroaryl group.
- m and n are positive integers from 0 to 3, respectively.
- the formula (I) is a carbazolyl group, as shown in the following formula 1.
- the divalent alkyl group may be -CH2- or -CH2-CH2-, as shown in the following formula 2, which shows the case where the divalent alkyl group is -CH2-.
- Y can be a phenylene group, as shown in the following formula 3
- Y can be a pyridylene group, as shown in the following formula 4 .
- the acceptor includes the basic unit of the acceptor and the substituents attached to the basic unit of the acceptor. Each atom in the basic unit of the acceptor is located in the second plane M2.
- the receptor is selected from one of the structures represented by the following formula (II):
- X1, X2 and X3 are independently selected from any one of C(R) and N, and at least one is N.
- R, R3, and R4 are the same or different, and R3, R4, and R are each independently hydrogen, cyano, aryl, heteroaryl, fused aryl, and fused heteroaryl.
- the linking group includes a connected basic unit and a substituent connected to the connected basic unit, and each atom in the connected basic unit is located in the third plane M3 (as shown in FIG. 5).
- the linking group is selected from substituted or unsubstituted divalent aryl groups, substituted or unsubstituted divalent heteroaryl groups, substituted or unsubstituted divalent fused aryl groups, and substituted or unsubstituted divalent fused heteroaryl groups Of any kind.
- linking group L is selected from any of the structures shown in Formula 9 to Formula 12:
- the TADF material when the TADF material is selected from the above structural formula, it is found through experiments that: the first plane M1, the second plane M2, and the third plane M3 in the above structural formula meet a certain angle relationship, and by comparing the above Structural formula orbital simulation found that the TADF material has a small overlap between the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO), and the singlet excitons and triplet excitons of the TADF material obtained from this The energy difference ⁇ EST is small, so that the triplet excitons can cross to the singlet excitons under thermal excitation, which improves the exciton utilization rate and luminous efficiency.
- HOMO highest occupied orbital
- LUMO lowest unoccupied orbital
- the mass ratio of the guest material in the light-emitting layer 120 is 1%-10 %.
- the mass ratio of the guest material in the light-emitting layer 120 is 1%-10 %.
- the ratio of the mass of the TADF material to the mass of the guest material can be 80:20 to 99:1, which can also be improved Luminous efficiency.
- the difference between the triplet exciton energy of the host material and the triplet exciton energy of the guest material satisfies: ⁇ E ⁇ 0.65 eV.
- the energy of the triplet excitons can be confined in the guest material, so that the guest material can emit light better.
- the triplet exciton energy of the host material and guest material can be measured at a temperature of 77K.
- Figure 5 is a schematic diagram of the angles between D and L and L and A in a TADF material provided by some embodiments.
- D is taken from the structure of Formula 1
- A is taken from the structure of Formula 7
- L is taken from ⁇ 9 Structure.
- the value range of the included angle ⁇ 1 between the first plane M1 and the third plane M3 is: 50° ⁇ 1 ⁇ 80°.
- the angle ⁇ 1 between the planes M3 is limited to the above range. It is found through experiments that the degree of overlap between the highest occupied orbit (HOMO) and the lowest unoccupied orbit (LUMO) of the TADF material can be further reduced, thereby reducing the singlet excitation
- the energy level difference ⁇ EST between the singlet and triplet excitons can be used to obtain TADF materials with a smaller energy level difference between singlet and triplet excitons.
- the value range of the included angle ⁇ 2 between the second plane M2 and the third plane M3 is: 0° ⁇ 2 ⁇ 80°, and the value range of the second plane M2 is 0° ⁇ 2 ⁇ 80°.
- the angle ⁇ 2 between M2 and the third plane M3 is limited to the above range. It is found through experiments that it can also further reduce the overlap between the highest occupied orbit (HOMO) and the lowest unoccupied orbit (LUMO) of the TADF material. Energy level difference ⁇ EST between singlet excitons and triplet excitons.
- the embodiment of the present disclosure does not limit the manner of obtaining ⁇ 1 and ⁇ 2.
- molecular dynamics simulation and DFT simulation can be used to obtain the information of the first plane M1, the second plane M2, and the third plane M3, and the angle ⁇ 1 between the first plane M1 and the third plane M3 can be obtained, The angle ⁇ 2 between the second plane M2 and the third plane M3.
- the energy level difference ⁇ EST between the singlet excitons and the triplet excitons in the TADF material is less than 0.2 eV.
- the TADF material can be any one of compound 1 to compound 4:
- the spatial configuration of compound 1 is shown in the following formula (i)
- the spatial configuration of compound 2 is shown in the following formula (ii)
- the spatial configuration of compound 3 is shown in the following formula (iii)
- the spatial configuration of compound 4 The model is shown in the following formula (iv).
- the angle ⁇ 1 between D and L in compound 1 is 71.8°
- the angle ⁇ 2 between A and L is 0.3°
- the energy level difference between singlet excitons and triplet excitons ⁇ EST is only It is 0.138eV.
- the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 1 only slightly overlap.
- the triplet excitons in compound 1 easily return to the singlet state through reverse intersystem crossing, and then transition to the ground state through radiation to emit light, so that the external quantum efficiency (EQE) of the light-emitting device 100 is increased to 6.8%.
- the angle ⁇ 1 between D and L in compound 2 is 76.4°
- the angle ⁇ 2 between A and L is 0.6°
- the energy level difference ⁇ EST between singlet and triplet excitons is only 0.112 eV.
- the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 2 only slightly overlap. It can be seen that the triplet excitons in compound 2 easily return to the singlet state through reverse intersystem crossing, and then transition to the ground state through radiation to emit light, so that the external quantum efficiency EQE of the light-emitting device 100 is increased to 12.3%.
- the angle ⁇ 1 between D and L is 78.4°
- the angle ⁇ 2 between A and L is 0.7°
- the energy level difference ⁇ EST between singlet and triplet excitons is only 0.094 eV.
- the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 3 only slightly overlap. It can be seen that the triplet excitons in compound 3 easily return to the singlet state through the reverse intersystem crossing, and then transition to the ground state through radiation to emit light, so that the external quantum efficiency EQE of the light-emitting device 100 is increased to 28.3%.
- the angle ⁇ 1 between D and L is 78°
- the angle ⁇ 2 between A and L is 79.2°
- the energy level difference ⁇ EST between singlet and triplet excitons is only 0.002 eV.
- the highest occupied orbital (HOMO) and the lowest unoccupied orbital (LUMO) in compound 4 only slightly overlap. It can be seen that the triplet excitons in compound 4 easily return to the singlet state through reverse intersystem crossing, and then transition to the ground state through radiation to emit light, so that the external quantum efficiency EQE of the light-emitting device 100 is increased to 16.4%.
- the angle ⁇ 1 between D and L lies in the range of 50° ⁇ 1 ⁇ 80°
- the angle ⁇ 2 between A and L Within the range of 0° ⁇ 2 ⁇ 80°, the energy level difference ⁇ EST between singlet excitons and triplet excitons are both less than 0.2eV, making the highest occupied orbital (HOMO) and lowest unoccupied orbital (LUMO) The degree of overlap is small, and even separation is achieved.
- the triplet exciton is easy to return to the singlet state through the reverse intersystem, and then through the radiation transition to the ground state to emit light, thereby greatly improving the external quantum efficiency EQE of the light-emitting device 100 (the external quantum efficiency of the light-emitting device in the related art EQE is 5%).
- the light-emitting device 100 may also include a hole injection layer 127 (HIL), a hole transporting layer 126 (HTL), and an electron blocking layer 123 ( At least one of Electron Barrier Layer (EBL), Hole Barrier Layer 125 (Hole Barrier Layer, HBL), electron transport layer 122 (electron transporting layer, ETL), and electron injection layer 121 (electron injection layer, EIL).
- HIL hole injection layer
- HTL hole transporting layer
- EIL electron blocking layer
- the light emitting device 100 includes all the above layers, on the first electrode 110 as the anode, a hole injection layer 127, a hole transport layer 126, an electron blocking layer 123, a light emitting layer 120, a hole blocking layer 125, The electron transport layer 122 and the electron injection layer 121.
- the embodiment of the present disclosure does not specifically limit the constituent materials of the electron injection layer 121, and only needs to satisfy the material and thickness of the electron injection layer 121 that can reduce the electron injection barrier.
- the material of the electron injection layer 121 may be LiF (lithium fluoride), Yb (ytterbium), or LIQ as shown in Equation 16 below.
- the embodiment of the present disclosure does not specifically limit the constituent materials of the electron transport layer 122, and it only needs to satisfy that the material constituting the electron transport layer 122 can improve the transportability of electrons.
- the material of the electron transport layer 122 may be a structure shown in any one of the following formulas 17 to 20:
- the embodiments of the present disclosure do not specifically limit the constituent materials of the electron blocking layer 123, and only need to satisfy the material constituting the electron blocking layer 123 that can block the transport of electrons.
- the material of the electron blocking layer 123 may be a structure shown in any of the following formulas 21 to 22:
- the embodiment of the present disclosure does not specifically limit the constituent materials of the hole blocking layer 125, and only needs to satisfy the material that constitutes the hole blocking layer 125 to block the transport of holes.
- the material of the hole blocking layer 125 may be a structure shown in any of the following formulas 28 to 30:
- the embodiment of the present disclosure does not specifically limit the constituent materials of the hole transport layer 126, and only needs to satisfy that the material constituting the hole transport layer 126 can improve the transport properties of holes.
- the material of the hole transport layer 126 may be a structure shown in any of the following formulas 23 to 25:
- the embodiment of the present disclosure does not specifically limit the constituent materials of the hole injection layer 127, and only needs to satisfy that the material constituting the hole injection layer 127 can reduce the injection barrier of holes.
- the material of the hole injection layer 127 may be MoO3 (molybdenum trioxide), or a structure shown in any of the following formulas 26 to 27:
- the thickness range of each layer in the light emitting device 100 is different.
- the thickness of the electron injection layer 121 may be in the range of 1 to 3 nm
- the thickness of the electron transport layer 122 may be in the range of 20 to 35 nm
- the thickness of the electron blocking layer 123 may be in the range of 10 to 80 nm
- the thickness of the light-emitting layer 120 may be in the range 20-40 nm
- the thickness of the hole blocking layer 125 may be 5-10 nm
- the thickness of the hole transport layer 126 may be 1000-1300 nm
- the thickness of the hole injection layer 127 may be 5-60 nm.
- the thickness of each layer changes within the above thickness range, the color of the emitted light will change within the same color system.
- the light emitted by the light-emitting functional layer 120 is red light
- the thickness of the electron transport layer 122 is 30 nm
- the thickness of the sub-transport layer 122 is changed from 30 nm to 25 nm
- the light emitted by the light-emitting functional layer 120 may change The change from red to light red; correspondingly, if the thickness of the electron transport layer 122 changes from 30 nm to 33 nm, the light emitted by the light-emitting function layer 120 may change from red to deep red.
- the aforementioned OLED light emitting device 100 further includes a capping layer (CPL) 128.
- CPL capping layer
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Abstract
Description
Claims (15)
- 一种发光器件,包括:层叠设置的第一电极和第二电极,以及,设置于所述第一电极和所述第二电极之间的发光层,所述发光层包括热活化延迟荧光TADF材料;所述TADF材料包括给体、受体以及连接在给体和受体之间的连接基团;所述给体包括:给体基本单元,以及连接在所述给体基本单元上的取代基,所述给体基本单元中的各原子位于第一平面内;所述受体包括:受体基本单元,以及连接在所述受体基本单元上的取代基,所述受体基本单元中的各原子位于第二平面内;所述连接基团包括:连接的基本单元,以及连接在所述连接的基本单元上的取代基,所述连接的基本单元中的各原子位于第三平面内;其中,所述给体选自如下式(I)所示的结构中的一种:所述受体选自如下式(II)所示的结构中的一种:所述连接基团选自取代或未取代的二价芳基、取代或未取代的二价杂芳基、取代或未取代的二价稠芳基,以及取代或未取代的二价稠杂芳基中的任一种;Y选自单键、取代或未取代的二价烷基、取代或未取代的二价芳基、取代或未取代的二价杂芳基、取代或未取代的二价稠芳基和取代或未取代的二价稠杂芳基中的一种或多种的组合;R1和R2各自独立地为取代或未取代的烷基、芳基、杂芳基、稠芳基以及稠杂芳基的任一种;m和n分别为0~3中的正整数;X1,X2和X3分别独立地选自C(R)和N中的任一种,且至少一个为N;R3、R4和R各自独立地为氢、氰基、芳基、杂芳基、稠芳基以及稠杂芳基中的任一种;所述式(I)和式(II)中的虚线是与所述连接基团连接的连接键。
- 根据权利要求1所述的发光器件,其中,所述第一平面与所述第三平面之间的夹角θ1的取值范围为:50°≤θ1≤80°。
- 根据权利要求1或2所述的发光器件,其中,所述第二平面与所述第三平面之间的夹角θ2的取值范围为:0°≤θ2≤80°。
- 根据权利要求1-3任一项所述的发光器件,其中,所述TADF材料中单重态激子与三重态激子之间的能级差小于0.2eV。
- 根据权利要求9所述的发光器件,其中,所述客体材料在所述发光层中的质量占比为1%~10%。
- 根据权利要求10所述的发光层,其特征在于,所述主体材料的三重态激子能量与所述客体材料的三重态激子能量之差满足:ΔE≥0.65eV。
- 根据权利要求1-11所述的发光器件,其中,所述发光器件还包括:电子注入层、电子传输层、电子阻挡层、空穴阻挡层、空穴传输层以及空穴注入层中的至少一层。
- 一种显示面板,包括衬底基板以及设置在所述衬底基板上的如权利要求1-13任一项所述的发光器件。
- 一种显示装置,包括如权利要求14所述的显示面板。
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