WO2021219030A1 - 一种用于超分辨光刻精密掩模的智能校正装置控制系统 - Google Patents

一种用于超分辨光刻精密掩模的智能校正装置控制系统 Download PDF

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WO2021219030A1
WO2021219030A1 PCT/CN2021/090688 CN2021090688W WO2021219030A1 WO 2021219030 A1 WO2021219030 A1 WO 2021219030A1 CN 2021090688 W CN2021090688 W CN 2021090688W WO 2021219030 A1 WO2021219030 A1 WO 2021219030A1
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Prior art keywords
mask
control
sub
sixteen
image
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PCT/CN2021/090688
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English (en)
French (fr)
Inventor
罗先刚
高平
蒲明博
马晓亮
李雄
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中国科学院光电技术研究所
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Priority to JP2022565880A priority Critical patent/JP7431475B2/ja
Priority to US17/997,189 priority patent/US11714358B2/en
Priority to EP21796326.3A priority patent/EP4134750A4/en
Publication of WO2021219030A1 publication Critical patent/WO2021219030A1/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
    • G05B19/05—Programmable logic controllers, e.g. simulating logic interconnections of signals according to ladder diagrams or function charts
    • G05B19/056—Programming the PLC
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70—SSIS architectures; Circuits associated therewith
    • H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/10—Plc systems
    • G05B2219/13—Plc programming
    • G05B2219/13004—Programming the plc
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/695—Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects

Definitions

  • the present disclosure relates to the technical field of lithography machines, and in particular to a control system of an intelligent correction device for super-resolution lithography precision masks.
  • the image processing and acquisition methods in the current control system mostly use USB serial port transmission or Ethernet port transmission.
  • the transmission speed of these transmission methods is relatively slow, and the subsequent processing efficiency through the control system will be reduced, and all image processing tasks are controlled by the host computer.
  • the completion of the system will greatly increase the workload of the host computer, which will slow down the processing speed of the entire system and reduce the alignment efficiency.
  • a control system with higher control accuracy is also currently needed, through which the alignment and mask correction can be completed accurately, quickly and stably.
  • the present invention provides a control system of an intelligent correction device for super-resolution lithography precision masks to solve at least part of the above-mentioned problems.
  • an intelligent correction device control system for super-resolution lithography precision masks including: a sixteen-channel pneumatic fine-tuning mask deformation control sub-system, which is used to deform the mask , And detect the force value of the mask deformation, compare the force value of the mask deformation with the output force setting value, and generate a first control feedback amount to adjust the force that deforms the mask, So as to control the deformation of the mask; the alignment subsystem is used to collect the image of the mask and the substrate, and adjust the position between the mask and the substrate according to the image, so that all The mask is aligned with the substrate.
  • the sixteen-channel pneumatic fine-tuning mask deformation control sub-system includes a PLC controller sub-system
  • the PLC controller sub-system includes: a PID controller, an analog input expansion module, and an analog output expansion Module, digital input expansion module, and digital output expansion module;
  • the analog input expansion module is used for A/D conversion of the collected analog electrical signal of the force value;
  • the digital input expansion module is used The digital signal obtained by the A/D conversion is input to the PID controller;
  • the PID controller is used to compare the digital signal obtained by the A/D conversion with the output force setting value, and generate the first A control feedback quantity;
  • the digital output expansion module is used to output the digital signal of the first control feedback quantity to the analog output expansion module;
  • the analog output expansion module is used to feed the first control feedback D/A conversion is performed on the digital signal of the quantity, and the converted analog electric signal of the first control feedback quantity is output to form a closed-loop feedback of the deformation of the mask.
  • the sixteen-way pneumatic fine-tuning mask deformation control sub-system further includes a pneumatic output control sub-system
  • the pneumatic output control sub-system includes: sixteen-way air cylinders and sixteen-way electrical proportional valves;
  • the sixteen-way cylinder is used to output the force that causes the mask to deform;
  • the sixteen-way electric proportional valve is used to control the strength of the output force of the sixteen-way cylinder according to the first control feedback amount.
  • the sixteen-way pneumatic fine-tuning mask deformation control sub-system further includes a mask force detection and feedback sub-system
  • the mask force detection and feedback sub-system includes: a sixteen-way force sensor.
  • the pressure sensor is used to collect the air pressure in the connecting air pipe of the sixteen-way air cylinder.
  • the PLC controller subsystem is also used to compare the air pressure with a preset air pressure value and generate a second control feedback amount; the sixteen-channel pneumatic fine-tuning mask deformation control subsystem It also includes a reversing solenoid valve, which is used to control the direction of the output force of the sixteen cylinders according to the second control feedback amount; the PLC controller subsystem is connected to the solenoid valve through an intermediate relay.
  • the alignment subsystem includes: eight-channel image acquisition CCD camera, each of the CCD cameras is equipped with a telecentric lens for acquiring the image; two image acquisition cards, each of the The image capture card is used to receive and transmit the images collected by the four CCD cameras; the image processor is used to preprocess the images, and transfer the preprocessed images to the central control system to make The central control system judges whether the mask and the substrate are aligned according to the image, and generates a control instruction for aligning the mask and the substrate; an image acquisition and adjustment motor control sub-system is used according to The control instruction adjusts the position of the substrate so that the substrate and the mask are aligned; an eight-way illumination sub-system is used to provide illumination for the telecentric lens connected to each CCD camera.
  • the system further includes: an upper computer with a built-in central control system; the upper computer is used to issue program instructions to the PLC controller subsystem according to actual mask deformation control requirements, The program instructions are used to generate the first control feedback quantity, and adjust the sixteen-way pneumatic fine-tuning mask deformation control sub-system to adjust and control the deformation of the mask; the host computer is also used to, according to the image, It is determined whether the mask and the substrate are aligned, and a control command for aligning the mask and the substrate is generated.
  • the host computer and the sixteen-channel pneumatic fine-tuning mask deformation control sub-system are connected and communicated through an industrial Ethernet bus, and the host computer and the alignment sub-system are connected through an industrial Ethernet bus,
  • the PCIe bus or the RS232 serial communication bus is connected and communicated, and the image acquisition card is connected and communicated with the host computer through the PCIe X4 interface.
  • the alignment sub-system further includes: a compact linear displacement stage for adjusting the position of the CCD camera; a multi-channel motion controller for controlling the command issued by the central control system, The compact linear displacement stage is moved to adjust the position.
  • an intelligent correction device control system for super-resolution lithography precision masks which is characterized in that it includes sixteen pneumatic fine-tuning mask deformation control sub-systems and alignment sub-systems.
  • the six-channel pneumatic fine-tuning mask deformation control system includes a mask force detection feedback system, an air pressure output control system, and a PID controller system implemented by PLC.
  • the alignment system includes an eight-channel image acquisition CCD and an image acquisition card.
  • Image processor and eight-channel lighting sub-system the image data collected by the image acquisition CCD is transmitted to the high-performance upper computer through the image acquisition card, the upper computer preprocesses the relevant images through the image processor, and then feeds back to the central control system ,
  • the eight-channel illumination sub-system is connected to the phase modulator through a signal generator to generate an excitation signal, so that the light emitted by the helium-neon laser is modulated and connected to the CCD via the relevant optical path and optical fiber transmission channel
  • the telecentric lens provides illumination.
  • control bus of the system adopts a standard control bus
  • the sixteen-channel pneumatic fine-tuning mask deformation control subsystem adopts an industrial Ethernet bus based on the TCP/IP protocol or a customizable industrial Ethernet bus.
  • the sixteen-channel pneumatic fine-tuning mask deformation control sub-system further includes a PLC control sub-system and an analog input and output expansion module, a PLC internal PID controller, a mask force detection feedback sub-system, and air pressure Output control subsystem.
  • the alignment subsystem adopts an industrial Ethernet bus based on TCP/IP protocol or a customizable industrial Ethernet bus, or adopts a PCIe bus based on PCIe X4 or a customizable PCIe bus; Or adopt the RS232 serial communication bus based on USRT or the self-definable RS232 serial communication bus.
  • the alignment subsystem includes a multi-channel image acquisition subsystem, an image transmission subsystem, an image processing subsystem, an image acquisition and adjustment motor control subsystem, and an eight-channel lighting subsystem.
  • control system includes: a high-performance industrial computer, which is used for the operation of the entire control system and high-speed operation of image processing.
  • the PLC control subsystem includes: a PLC controller for providing sixteen PID controllers to complete the output force closed-loop control algorithm; an analog input expansion module for the force sensor analog input conversion , Complete feedback force D/A conversion, also used to input air pressure detection, complete D/A conversion; analog output expansion module, used for electrical proportional valve control signal output, complete A/D conversion; digital output expansion module, use The cylinder output commutation control to complete the cylinder push-out and retraction control. The process is completed by controlling the intermediate relay to activate the corresponding reversing solenoid valve; the digital input expansion module is used to receive the sensor signal.
  • the multi-channel image acquisition subsystem includes: an eight-channel image acquisition CCD for image acquisition; and a telecentric lens for use with the CCD.
  • the image transmission sub-system includes: an image acquisition card, a single image acquisition card is used for four-channel CCD acquisition data transmission; the image acquisition card includes a trigger, which is used for receiving external trigger conditions;
  • the system program is used for the entire image capture card work application; the PHY transceiver is used to process the data received from the Ethernet interface and transfer it to the PCIe interface after being processed by the system program; four DDR RAMs are used to provide internal program operation memory.
  • the image processing sub-system includes: an image processor, the graphics processor adopts NVIDIA's RTX 2080 SUPER graphics processing card, which is used to integrate the data collected by the image capture card and simply preprocessed Processing, and finally transfer the processed image data to the central control system.
  • NVIDIA's RTX 2080 SUPER graphics processing card which is used to integrate the data collected by the image capture card and simply preprocessed Processing, and finally transfer the processed image data to the central control system.
  • the image acquisition and adjustment motor control sub-system includes: a compact linear stage for CCD position adjustment; and a multi-channel motion controller for cooperating with the motion control of the compact linear stage.
  • the eight-channel illumination subsystem includes: a helium-neon laser for generating light with a wavelength of 633 nm; a focusing lens for focusing the collimated light into the optical cable; a collimating lens for focusing the optical cable
  • the output light becomes collimated;
  • the optical cable is used for optical signal transmission;
  • the adapter is used for the connection of the fiber end and the telecentric objective lens;
  • the phase modulator is used for the modulation of the relevant output optical signal;
  • the signal generator is used for generating the phase The excitation signal of the modulator.
  • the desired precision mask deformation control can be achieved, which is simpler than the existing implementation method steps, and the control system is realized It is also more economical, and the control system uses PCIe channels for image signal transmission.
  • the response speed of the entire control system is also faster, which improves the alignment efficiency, and can also achieve faster and more accurate mask deformation control and alignment.
  • the sixteen-channel pneumatic fine-tuning mask deformation control sub-system of the control system uses high-precision force sensors and electric proportional valves to detect and control, ensuring the precision adjustment of the mask deformation control.
  • the model deformation control sub-system adopts PID control algorithm to realize the closed-loop debugging of output force.
  • the closed-loop system realizes short control time, fast response, stable system operation, actual test output force control error ⁇ 0.03N, and high control accuracy.
  • the alignment sub-system of the control system realizes the positioning control of the X, Y, and Z axes through a high-precision motor, which can complete image acquisition and alignment more efficiently, and provide imaging support for higher engraving accuracy.
  • FIG. 1 schematically shows a schematic diagram of a single-channel pneumatic fine-tuning mask deformation control structure of a sixteen-channel pneumatic fine-tuning mask deformation control sub-system provided by an embodiment of the present disclosure
  • FIG. 2 schematically shows a schematic structural diagram of a single-channel PID control loop of a sixteen-channel pneumatic fine-tuning mask deformation control subsystem provided by an embodiment of the present disclosure
  • FIG. 3 schematically shows a schematic diagram of a control system of an intelligent correction device for super-resolution lithography precision masks provided by an embodiment of the present disclosure
  • FIG. 4 schematically shows a block diagram of the internal structure and channel structure of the frame grabber provided by the embodiment of the present disclosure
  • 100-central control system 101-control bus; 102-upper computer; 103-image processor; 104-image acquisition card; 105-motor controller; 106-phase modulator; 107-PLC controller; 110/112- PCIe transmission channel; 120/122-Ethernet transmission channel; 130/132-serial communication bus channel; 140/143-optical transmission channel; 150/154-digital and analog transmission channel; 200-alignment system; 300 -Eight-channel lighting sub-system; 400-sixteen-channel pneumatic fine-tuning mask deformation control sub-system.
  • the present disclosure provides an intelligent correction device control system for super-resolution lithography precision masks, including: a sixteen-channel pneumatic fine-tuning mask deformation control sub-system 400 and an alignment sub-system 200.
  • the sixteen-way pneumatic fine-tuning mask deformation control subsystem 400 is used to deform the mask, detect the force value of the mask deformation, compare the force value of the mask deformation with the set value of the output force, and generate the first
  • the amount of feedback is controlled to adjust the force that deforms the mask, thereby controlling the amount of deformation of the mask.
  • the alignment subsystem 200 is used to collect images of the mask and the substrate, and adjust the position between the mask and the substrate according to the images to align the mask and the substrate.
  • the sixteen-channel pneumatic fine-tuning mask deformation control sub-system 400 includes a PLC controller sub-system 107.
  • the PLC controller sub-system 107 includes: a PID controller, an analog input extension module, an analog output extension module, and a digital output Input expansion module and digital output expansion module.
  • FIG. 1 schematically shows a schematic diagram of a single-channel pneumatic fine-tuning mask deformation control structure of a sixteen-channel pneumatic fine-tuning mask deformation control sub-system provided by an embodiment of the present disclosure.
  • the analog input expansion module is used to A/D convert the collected analog electrical signal of the force value; the digital input expansion module is used to input the digital signal obtained from the A/D conversion to the PID Controller; PID controller is used to compare the digital signal obtained by A/D conversion with the output force setting value, and generate the first control feedback quantity; the digital output expansion module is used to control the digital signal of the first control feedback quantity Output to the analog output expansion module; the analog output expansion module is used to D/A conversion the digital signal of the first control feedback quantity, and output the converted analog electrical signal of the first control feedback quantity to form a mask The closed-loop feedback of the deformation.
  • the sixteen-way pneumatic fine-tuning mask deformation control sub-system 400 also includes a mask force detection and feedback sub-system, which specifically includes a sixteen-way force sensor for collecting the deformation force value of the mask, and The analog electrical signal of the collected force value is transmitted to the PID controller through the analog input expansion module.
  • the mask force detection and feedback subsystem also includes a pressure sensor for collecting the air pressure in the connecting air pipe of the sixteen-way air cylinder.
  • FIG. 2 schematically shows a schematic structural diagram of a single-channel PID control loop of a sixteen-channel pneumatic fine-tuning mask deformation control sub-system 400 provided by an embodiment of the present disclosure.
  • the PLC controller subsystem 107 provides sixteen PID controllers for completing mask deformation control.
  • the PID controller function equation is:
  • y is the output value of PID algorithm and the output value after calculation in the system.
  • Kp is the proportional gain
  • S is the Laplace operator
  • b is the proportional action weight
  • w is the set value
  • x is the process value, that is, the force detected by the force sensor
  • c is the differential action weight
  • TI is the differential action Time
  • TD is the derivative action time.
  • the sixteen-way pneumatic fine-tuning mask deformation control sub-system 400 also includes a pneumatic output control sub-system, including: sixteen-way air cylinders and sixteen-way electrical proportional valves.
  • the sixteen-way air cylinder is connected with the sixteen-way electric proportional valve to output the force that causes the mask to deform;
  • the sixteen-way electric proportional valve is connected with the analog output expansion module, and is used to control the ten according to the first control feedback quantity.
  • the strength of the output force of the six cylinders so as to realize the feedback control of the mask deformation.
  • the PLC controller subsystem 107 is also used to compare the air pressure in the connected trachea collected by the pressure sensor with the preset air pressure value, and generate a second control feedback value; sixteen pneumatic fine-tuning masks
  • the deformation control sub-system 400 also includes a reversing solenoid valve, which is used to control the direction of the output force of the sixteen cylinders according to the second control feedback amount; the PLC controller sub-system 107 is connected to the solenoid valve through an intermediate relay. In this way, the feedback control of the air pressure in the cylinder is realized, and the accuracy of the mask deformation control is further improved.
  • the PLC controller sub-system 107 communicates with the host computer through industrial Ethernet, and the PLC controller sub-system 107 controls the opening and closing of the solenoid valve through the intermediate relay to realize the ejection and retraction of the cylinder.
  • the voltage-type analog output signal controls the electric proportional valve to realize the control of the output air pressure, thereby achieving the effect of controlling the output of the cylinder force, so as to realize the control of the mask force and the control of the mask deformation.
  • the cylinder output force voltage analog signal detected by the force sensor is combined with the PID controller inside the PLC controller subsystem 107 to achieve a closed-loop control effect.
  • the alignment subsystem 200 includes: an eight-channel image acquisition CCD camera, two image acquisition cards 104, an image processor 103, an image acquisition and adjustment motor control subsystem 105, and an eight-channel illumination subsystem 300.
  • eight-channel image acquisition CCD cameras each CCD camera is equipped with a telecentric lens, used to collect images; two image acquisition cards 104, each image acquisition card is used to receive and transmit the images collected by the four-channel CCD camera;
  • the image processor 103 is used to preprocess the image, and transfer the preprocessed image to the central control system, so that the central control system judges whether the mask and the substrate are aligned according to the image, and generates the alignment of the mask and the substrate
  • the control instructions of the image acquisition and adjustment motor control system 105 which is used to adjust the position of the substrate according to the control instructions, so that the substrate and the mask are aligned; the eight-way lighting system 300, is used to provide illumination for the telecentric lens connected to each CCD camera .
  • the alignment subsystem 200 also includes: a compact linear stage for adjusting the position of the CCD camera; a multi-channel motion controller for adjusting the position of the compact linear stage according to the control instructions issued by the central control system.
  • the system provided by the embodiment of the present disclosure also includes: an upper computer 102 with a built-in central control system; the upper computer 102 is used to issue program instructions to the PLC controller subsystem 107 according to actual mask deformation control requirements, and the program instructions are used for Generate the first control feedback quantity, and adjust the sixteen-channel pneumatic fine-tuning mask deformation control sub-system to adjust the deformation of the control mask; the host computer 102 is also used to determine whether the mask and the substrate are Align and generate adjustment instructions for aligning the mask and the substrate, and control the mechanical structure used to adjust the position of the substrate to align the substrate and the mask.
  • the upper computer 102 and the sixteen-channel pneumatic fine-tuning mask deformation control sub-system 400 are connected and communicated through the industrial Ethernet bus.
  • the upper computer 102 and the alignment sub-system 200 are connected and communicated through the industrial Ethernet bus, PCIe bus or RS232 serial communication bus.
  • the frame grabber 104 communicates with the host computer 102 through the PCIe X4 interface.
  • the upper computer 102 control simultaneously realizes the mask deformation and the feedback control of the alignment system. The steps are simple, the cost is economical, the reaction speed is high, and the alignment efficiency and the deformation control accuracy are improved.
  • Another aspect of the present disclosure provides an intelligent correction device control system for super-resolution lithography precision masks, including sixteen-channel pneumatic fine-tuning mask deformation control sub-system 400 and alignment sub-system 200, sixteen-channel pneumatic fine-tuning
  • the mask deformation control sub-system 400 includes a mask force detection feedback sub-system, an air pressure output control sub-system, a PID controller sub-system implemented by PLC, and the alignment sub-system 200 includes eight-channel image acquisition CCD, image acquisition card 104, and image processing.
  • the image data collected by the image capture CCD is transmitted to the high-performance host computer 102 through the image capture card 104.
  • the host computer 102 preprocesses the relevant images through the image processor 103, and then feeds them back to the central control system.
  • the system provides image support for the alignment procedure.
  • the eight-channel illumination sub-system 300 is connected to the phase modulator 106 through a signal generator to generate an excitation signal, so that the light emitted by the helium-neon laser is modulated by the relevant optical path and optical fiber transmission channel as a CCD
  • the connected telecentric lens provides illumination.
  • FIG. 3 schematically shows a schematic diagram of a control system of an intelligent correction device for super-resolution lithography precision masks provided by an embodiment of the present disclosure.
  • an intelligent correction device control system for super-resolution lithography precision masks includes: a central control system 100, a control bus 101, a host computer 102, an image processor 103, and an image
  • the image processor 103 is connected to the outside through the PCIe transmission channel 110, and the image acquisition card 104 is connected to the outside through the Ethernet transmission channel 120;
  • the motor controller 105 is connected to the outside through a serial communication bus channel 130;
  • the phase modulator 106 is connected to the outside through an optical fiber transmission channel 140;
  • the PLC controller subsystem 107 is connected to the outside through a digital and analog control channel 150.
  • the host computer 102 of the control system is a high-performance industrial computer used for the operation of the entire control system and high-speed operation of image processing.
  • the control bus 101 of the system adopts a standard control bus.
  • the alignment system 200 includes a multi-channel image acquisition system, an image transmission system, an image processing system, an image acquisition and adjustment motor control system 105, and an eight-channel lighting system 300.
  • the multi-channel image acquisition subsystem includes: 8-channel image acquisition CCD for image acquisition, and telecentric lens for use with CCD.
  • the image transmission subsystem includes: an image acquisition card 104, a single image acquisition card 104 is used for the transmission of four-channel CCD acquisition data; the image acquisition card 104 includes a trigger, which is used for external trigger condition reception; the internal system program of the acquisition card is used for the entire Image capture card 104 working application; PHY transceiver, used to process the data received from the Ethernet interface through the system program and then transmit it to the PCIe interface; four DDR RAMs, used to provide internal program operation memory.
  • the image processing sub-system includes: image processor 103, which uses NVIDIA’s RTX 2080 SUPER graphics processing card, used for comprehensive processing of the data collected by the image capture card 104 and simple pre-processing, and finally the processed The image data is transmitted to the central control system.
  • the image acquisition and adjustment motor control sub-system 105 includes: a compact linear stage for CCD position adjustment, and a multi-channel motion controller for cooperating with the motion control of the compact linear stage.
  • the alignment subsystem 200 can adopt a TCP/IP protocol or a customizable industrial Ethernet bus, a PCIe X4 or customizable PCIe bus, and a USRT-based or customizable RS232 serial communication bus.
  • the alignment subsystem 200 is connected to the image processor 103 through the image processor 103 PCIe transmission channel 112, and the alignment subsystem 200 is connected to the image capture card 104 through eight CCD Ethernet transmission channels 122, so
  • the alignment subsystem 200 is connected to the motor controller 105 through the eight-way motor controller serial communication channel 132;
  • the illumination subsystem 300 is connected to the phase modulator 106 through the helium-neon-laser phase modulation illumination subsystem 300 optical fiber transmission channel 143 Connection;
  • the sixteen-way independent fine-tuning control subsystem 400 is connected to the PLC controller subsystem 107 through the force sensor, electrical proportional valve analog quantity transmission channel 154.
  • the central control system 100 collects the image results processed by the image processor 103 through the PCIe transmission channel 110 through the central control program, processes the images according to actual needs, and judges the alignment based on the processed images. And the corresponding operation.
  • the central control system 100 controls the motor through the serial communication bus channel 130 to fine-tune the displacement according to actual needs, so as to meet the working requirements.
  • the central control system 100 communicates with the PLC controller sub-system 107 through TCP/IP-based industrial Ethernet, and sends control instructions to the PLC controller sub-system 107 according to the actual mask deformation control requirements, and subsequent related operations are performed by the PLC controller
  • the sub-system 107 completes the control of the lower computer.
  • FIG. 4 schematically shows a block diagram of the internal structure and channel structure of the frame grabber 104 provided by an embodiment of the present disclosure.
  • the FPGA chip XC3S4000-4FGG900C of XILINX Company is integrated in the image acquisition card 104, and X4PCI is used.
  • the second-generation interface provides a total of 2GB/s bandwidth for data transmission between the image capture card 104 and the host computer 102.
  • the image capture card 104 receives image information transmitted from the CCD Ethernet interface through four Ethernet ports.
  • the control system described in this example of the invention uses a total of eight CCDs, so two image capture cards 104 are used to realize image transmission.
  • the image capture card 104 is connected to the central control system 100 through the PCIe X4 interface, and the image processor 103 performs related image processing.
  • the upper computer 102 uses the dual-channel Zhiqiang E52620V3 as the processor, and is configured with 32GB RAM and 256G SSD to ensure the high-speed operation of the system.
  • the frame grabber 104 integrates system programs and control programs. After the image information received by ports 1-4 is initially processed by the system program, the PHY transceiver transmits the data to the host computer 102 through the PCIe X4 interface. The frame grabber 104 is also integrated 4 DDR RAMs for program operation.
  • the image processor 103 is an RTX 2080 SUPER high-performance graphics card, and the data received by the image capture card 104 is transmitted to the image processor 103 through the PCIe transmission channel 110, and then the image processor 103 processes and transmits the data To the central control system 100.
  • the image capture card 104 uses the XILINX XC3S4000-4FGG900C FPGA chip as a processor, and a single image capture card 104 can capture image data transmitted by four Ethernet transmission channels 122. This time, two image acquisition cards 104 are used to collect eight channels of CCD image data.
  • the motor controller 105 adjusts the position of the CCD image collection by controlling the movement positions of the eight compact linear stages and cooperating with the manual stage.
  • the signal generator After the red light with a wavelength of 633nm produced by the helium-neon laser is collimated and focused, the signal generator generates an excitation signal, which is modulated by the phase modulator 106, and finally the light is output to the telecentric lens through the optical fiber transmission channel 140.
  • the lens is connected to the CCD to provide illumination for the CCD.
  • the present invention uses a total of eight CCDs to observe eight points on the four sides of the mask.
  • the sixteen-channel pneumatic fine-tuning mask deformation control sub-system 400 also includes a PLC control sub-system 107 and an analog input and output expansion module, an internal PLC PID controller, a mask force detection and feedback sub-system, and an air pressure output control sub-system. system.
  • the PID controller provided by the PLC controller subsystem 107 is used to complete the closed-loop control of the output force of the cylinder. Through the actual PID debugging of the equipment installed on the site, the output force of the cylinder, that is, the force of the mask, needs to be adjusted later.
  • the internal PID controller regulates the force detected by the force sensor and the air pressure output of the electric proportional valve to achieve the control purpose.
  • the power supply system of the PLC controller sub-system 107 is provided by a DC24 power supply, and it also supplies power for electric proportional valves, force sensors, pressure sensors, solenoid valves, etc.
  • the PLC controller sub-system 107 additionally extends the analog output module, which is used to output the voltage signal controlled by the electric proportional valve.
  • the analog input module is used to realize the conversion of the analog voltage signal input by the force sensor and the pressure sensor, and the digital output module, It is used to control other buttons, switches and intermediate relays, and the digital input module is used to connect digital feedback signals, including the limit switch of the cylinder piston.
  • the PID controller provided by the PLC controller subsystem 107 is used to complete the closed-loop control of the output force of the cylinder. Through the actual PID debugging of the equipment installed on the site, the output force of the cylinder, that is, the force of the mask, needs to be adjusted later.
  • the internal PID controller regulates the force detected by the force sensor and the air pressure output of the electric proportional valve to achieve the control purpose.
  • the power supply system of the PLC controller sub-system 107 is provided by a DC24 power supply, and it also supplies power for electric proportional valves, force sensors, pressure sensors, solenoid valves, etc.
  • the PLC of the PLC controller subsystem 107 uses Siemens S7-1200 CPU 1215C DC/DC/DC as the controller, the CPU working memory (integrated): 100kB, load memory (integrated): 4MB, retention memory (integrated) 10kB, integrated Digital I/O: 14 inputs/10 outputs, integrated analog I/O: 2 inputs/2 outputs, process image area: 1024 bytes input/1024 bytes output.
  • the length of the basic data type of S7-1200 PLC reaches 32 bits.
  • S7-1200 PLC supports two types of pointers, Pointer and Any, which makes S7-1200 flexible in programming. Boolean execution speed, 0.08 ⁇ s/instruction, moving word variable execution speed, 1.7 ⁇ s/instruction, floating point calculation execution speed, 2.3 ⁇ s/instruction.
  • the sixteen-channel pneumatic fine-tuning mask deformation control subsystem 400 adopts the industrial Ethernet bus based on TCP/IP protocol or customizable.
  • the eight-channel illumination sub-system 300 includes: a helium-neon laser for generating light with a wavelength of 633 nm, a focusing mirror for focusing the collimated light into the optical cable, and a collimating lens for turning the output light of the optical cable into collimated light ,
  • Optical cable used for optical signal transmission, adapter used for the connection of the fiber end and telecentric objective lens, phase modulator 106, used for the modulation of the relevant output optical signal, signal generator, used to generate the excitation signal of the phase modulator 106 .

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Abstract

本公开提供了一种用于超分辨光刻精密掩模的智能校正装置控制系统，包括：十六路气动微调掩模形变控制分系统，用于使掩模产生形变，并检测掩模形变的受力值，将掩模形变的受力值与输出力设定值比较，生成第一控制反馈量，以调整使掩模产生形变的力，从而控制掩模的形变量，对准分系统，用于采集掩模和基片的图像，根据图像，调整掩模和基片之间的位置，使掩模和基片对准。通过该控制系统对各分系统的联合控制，可实现期望的精密掩模形变控制，较于现有的实现方法步骤更加简便，控制系统的实现也更加的经济，该控制系统采用了PCIe通道及独立显卡对对准图像信号进行传输及处理，提高了分系统效率，使得系统可以更快更准确的实现掩模形变控制及对准。

Description

一种用于超分辨光刻精密掩模的智能校正装置控制系统
本公开要求于2020年04月29日提交的、申请号为202010355155.2的中国专利申请的优先权，其全部内容通过引用结合在本公开中。
技术领域
本公开涉及光刻机技术领域，尤其涉及一种用于超分辨光刻精密掩模的智能校正装置控制系统。
背景技术
随着半导体集成电路技术的快速发展，光刻机作为半导体技术的核心设备，对光刻机控制系统的设计与开发要求都变得越来越高。
当前的控制系统中图像处理采集方式多采用USB串口传输或以太网口传输，这些传输方式的传输速度比较慢，后续通过控制系统处理的效率将会降低，并且所有的图像处理工作由上位机控制系统完成，这样极大的加重了上位机的工作负担，将会导致整个系统的处理速度变慢，降低对准效率。针对该问题，当前也需要更高控制精度的控制系统，通过此控制系统能够准确、快速、稳定的完成对准及掩模校正。
发明内容
(一)要解决的技术问题
鉴于上述问题，本发明提供了一种用于超分辨光刻精密掩模的智能校正装置控制系统，以解决至少部分上述问题。
(二)技术方案
为了解决上述问题，本公开一方面提供了一种用于超分辨光刻精密掩模的智能校正装置控制系统，包括：十六路气动微调掩模形变控制分系统，用于使掩模产生形变，并检测所述掩模形变的受力值，将所述掩模形变的受力值与输出力设定值比较，生成第一控制反馈量，以调整使 所述掩模产生形变的力，从而控制所述掩模的形变量；对准分系统，用于采集所述掩模和基片的图像，根据所述图像，调整所述掩模和所述基片之间的位置，使所述掩模和所述基片对准。
根据本公开的实施例，所述十六路气动微调掩模形变控制分系统包括PLC控制器分系统，所述PLC控制器分系统包括：PID控制器、模拟量输入扩展模块、模拟量输出扩展模块、数字量输入扩展模块和数字量输出扩展模块；所述模拟量输入扩展模块用于将采集的所述受力值的模拟量电信号进行A/D转换；所述数字量输入扩展模块用于将A/D转换得到的数字量信号输入至PID控制器；所述PID控制器用于将A/D转换得到的所述数字量信号与所述输出力设定值比较，并生成所述第一控制反馈量；所述数字量输出扩展模块用于将所述第一控制反馈量的数字量信号输出至模拟量输出扩展模块；所述模拟量输出扩展模块用于将所述第一控制反馈量的数字量信号进行D/A转换，将转换得到的所述第一控制反馈量的模拟电信号输出，形成对所述掩模的形变的闭环反馈。
根据本公开的实施例，所述十六路气动微调掩模形变控制分系统还包括气压输出控制分系统，所述气压输出控制分系统包括：十六路气缸、十六路电气比例阀；所述十六路气缸，用于输出使所述掩模产生形变的力；十六路电气比例阀，用于根据所述第一控制反馈量控制所述十六路气缸输出力的强度。
根据本公开的实施例，所述十六路气动微调掩模形变控制分系统还包括掩模受力检测反馈分系统，所述掩模受力检测反馈分系统包括：十六路力传感器，用于采集掩模形变受力值；压力传感器，用于采集所述十六路气缸的连接气管内的气压。
根据本公开的实施例，所述PLC控制器分系统还用于将所述气压与预设气压值进行比较，并生成第二控制反馈量；所述十六路气动微调掩模形变控制分系统还包括换向电磁阀，用于根据所述第二控制反馈量控制所述十六路气缸输出力的方向；所述PLC控制器分系统通过中间继电器与所述电磁阀连接。
根据本公开的实施例，所述对准分系统包括：八路图像采集CCD相机，各所述CCD相机均配有远心镜头，用于采集所述图像；两块图像采集卡，每块所述图像采集卡分别用于四路所述CCD相机所采集图像的接收和传输；图像处理器，用于对所述图像进行预处理，并将预处理后的所述图像传递至中控系统，使所述中控系统根据所述图像判断所述掩模和所述基板是否对准，并生成使所述掩模和所述基板对准的调控指令；图像采集调节电机控制分系统，用于根据所述调控指令调整所述基板的位置，使所述基板和所述掩模对准；八路照明分系统，用于为各所述CCD相机连接的远心镜头提供照明。
根据本公开的实施例，所述系统还包括：上位机，内置有中控系统；所述上位机用于根据实际的掩模形变控制需求，向所述PLC控制器分系统下发程序指令，所述程序指令用于生成所述第一控制反馈量，并调控十六路气动微调掩模形变控制分系统调整控所述掩模的形变量；所述上位机还用于根据所述图像，判断所述掩模和所述基板是否对准，并生成使所述掩模和所述基板对准的调控指令。
根据本公开的实施例，所述上位机与所述十六路气动微调掩模形变控制分系统通过工业以太网总线连接通信，所述上位机与所述对准分系统通过工业以太网总线、PCIe总线或RS232串口通信总线连接通信，所述图像采集卡通过PCIe X4接口与所述上位机连接通信。
根据本公开的实施例，所述对准分系统还包括：紧凑型线性位移台，用于调整所述CCD相机的位置；多通道运动控制器，用于根据中控系统下发的控制指令，使所述紧凑型线性位移台运动调整位置。
本公开另一方面提供了一种用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于：包括十六路气动微调掩模形变控制分系统和对准分系统，所述十六路气动微调掩模形变控制分系统包括掩模受力检测反馈分系统，气压输出控制分系统，PLC实现的PID控制器分系统，所述对准分系统包括八路图像采集CCD、图像采集卡、图像处理器及八路照明分系统，所述图像采集CCD采集的图像数据通过图像采集卡与高性能上位机进行传输，上位机通过图像处理器对相关图像进行预处理， 然后反馈至中控系统，为对准程序提供图像支持，所述八路照明分系统通过信号发生器连接位相调制器，产生激励信号，从而使得氦-氖激光器发出的光通过调制后经相关光路及光纤传输通道为CCD连接的远心镜头提供照明。
根据本公开的实施例，所述系统的控制总线采用标准控制总线；
所述十六路气动微调掩模形变控制分系统采用基于TCP/IP协议的工业以太网总线或采用可自定义的工业以太网总线。
根据本公开的实施例，所述十六路气动微调掩模形变控制分系统还包括PLC控制分系统及模拟量输入输出扩展模块、PLC内部PID控制器、掩模受力检测反馈分系统和气压输出控制分系统。
根据本公开的实施例，所述对准分系统采用基于TCP/IP协议的工业以太网总线或可自定义的工业以太网总线，或者采用基于PCIe X4的PCIe总线或可自定义的PCIe总线；或者采用基于USRT的RS232串口通信总线或可自定义的RS232串口通信总线。
根据本公开的实施例，所述对准分系统包括多通道图像采集分系统、图像传输分系统、图像处理分系统、图像采集调节电机控制分系统和八路照明分系统。
根据本公开的实施例，所述控制系统包括：高性能工控机，用于整个控制系统运行及图像处理高速运算。
根据本公开的实施例，所述PLC控制分系统包括：PLC控制器，用于提供十六路PID控制器，完成输出力闭环控制算法；模拟量输入扩展模块，用于力传感器模拟量输入转换，完成反馈力D/A转换，还用于输入气压检测，完成D/A转换；模拟量输出扩展模块，用于电气比例阀控制信号输出，完成A/D转换；数字量输出扩展模块，用于气缸输出换向控制，完成气缸推出及缩回控制，该过程通过控制中间继电器启动相应换向电磁阀完成；数字量输入扩展模块，用于传感信号接收。
根据本公开的实施例，所述多通道图像采集分系统包括：八路图像采集CCD，用于图像采集；远心镜头，用于配合CCD使用。
根据本公开的实施例，所述图像传输分系统包括：图像采集卡，单块图像采集卡用于四通道CCD采集数据传输；图像采集卡包括触发器，用于外部触发条件接收；采集卡内部系统程序，用于整个图像采集卡工作应用；PHY收发器，用于将从以太网接口接收的数据通过系统程序处理后传送至PCIe接口；四个DDR RAM，用于内部程序运行内存提供。
根据本公开的实施例，所述图像处理分系统包括：图像处理器，该图形处理器采用NVIDIA公司的RTX 2080 SUPER图形处理显卡，用于将图像采集卡采集及简单预处理后的数据进行综合处理，最终将处理后的图像数据传输至中控系统。
根据本公开的实施例，所述图像采集调节电机控制分系统包括：紧凑型线性位移台，用于CCD位置调整；多通道运动控制器，用于配合紧凑型线性位移台运动控制。
根据本公开的实施例，所述八路照明分系统包括：氦-氖激光器，用于产生波长为633nm的光；聚焦镜，把准直光聚焦到光缆里；准直镜，用于把光缆的输出光变成准直；光缆，用于光信号传输；适配器，用于光纤端头和远心物镜的连接；位相调制器，用于相关输出光信号的调制；信号发生器，用于产生位相调制器的激励信号。
(三)有益效果
通过本公开实施例提供的一种用于超分辨光刻精密掩模的智能校正装置控制系统，可实现期望的精密掩模形变控制，较于现有的实现方法步骤更加简便，控制系统的实现也更加的经济，并且所述控制系统采用了PCIe通道进行图像信号传输，整个控制系统的反应速度也更快，提高了对准效率，也能更快更准确的实现掩模形变控制及对准。所述控制系统的十六路气动微调掩模形变控制分系统通过高精度力传感器及电气比例阀进行检测和控制，保证了掩膜掩模形变控制的精度调节，其中，十六路气动微调掩模形变控制分系统采用PID控制算法实现输出力的闭环调试，该闭环系统实现调控时间短，响应快速，系统运行稳定，实际测试输出力控制误差±0.03N，控制精度高。所述控制系统的对准 分系统通过高精度电机实现X，Y，Z轴的定位控制，可更高效的完成图像采集及对准，为较高套刻精度提供成像支持。
附图说明
图1示意性示出了本公开实施例提供的一种十六路气动微调掩模形变控制分系统的单路气动微调掩模形变控制结构的示意图；
图2示意性示出了本公开实施例提供的一种十六路气动微调掩模形变控制分系统的单路PID控制环路的结构示意图；
图3示意性示出了本公开实施例提供的一种用于超分辨光刻精密掩模的智能校正装置控制系统的示意图；
图4示意性示出了本公开实施例提供的图像采集卡的内部结构及通道的结构框图；
附图标记说明：
100-中控系统；101-控制总线；102-上位机；103-图像处理器；104-图像采集卡；105-电机控制器；106-位相调制器；107-PLC控制器；110/112-PCIe传输通道；120/122-以太网传输通道；130/132-串口通信总线通道；140/143-光纤传输通道；150/154-数字量及模拟量传输通道；200-对准分系统；300-八路照明分系统；400-十六路气动微调掩模形变控制分系统。
具体实施方式
以下，将参照附图来描述本发明的实施例。但是应该理解，这些描述只是示例性的，而并非要限制本发明的范围。在下面的详细描述中，为便于解释，阐述了许多具体的细节以提供对本发明实施例的全面理解。然而，明显地，一个或多个实施例在没有这些具体细节的情况下也可以被实施。此外，在以下说明中，省略了对公知结构和技术的描述，以避免不必要地混淆本发明的概念。
在此使用的术语仅仅是为了描述具体实施例，而并非意在限制本发明。在此使用的术语“包括”、“包含”等表明了所述特征、步骤、操作和/或部件的存在，但是并不排除存在或添加一个或多个其他特征、步骤、操作或部件。
本公开提供了一种用于超分辨光刻精密掩模的智能校正装置控制系统，包括：十六路气动微调掩模形变控制分系统400和对准分系统200。
十六路气动微调掩模形变控制分系统400，用于使掩模产生形变，并检测掩模形变的受力值，将掩模形变的受力值与输出力设定值比较，生成第一控制反馈量，以调整使掩模产生形变的力，从而控制掩模的形变量。
对准分系统200，用于采集掩模和基片的图像，根据图像，调整掩模和基片之间的位置，使掩模和基片对准。
具体的，十六路气动微调掩模形变控制分系统400包括PLC控制器分系统107，该PLC控制器分系统107包括：PID控制器、模拟量输入扩展模块、模拟量输出扩展模块、数字量输入扩展模块和数字量输出扩展模块。
图1示意性示出了本公开实施例提供的一种十六路气动微调掩模形变控制分系统的单路气动微调掩模形变控制结构的示意图。
如图1所示，模拟量输入扩展模块用于将采集的受力值的模拟量电信号进行A/D转换；数字量输入扩展模块用于将A/D转换得到的数字量信号输入至PID控制器；PID控制器用于将A/D转换得到的数字量信号与输出力设定值比较，并生成第一控制反馈量；数字量输出扩展模块用于将第一控制反馈量的数字量信号输出至模拟量输出扩展模块；模拟量输出扩展模块用于将第一控制反馈量的数字量信号进行D/A转换，将转换得到的第一控制反馈量的模拟电信号输出，形成对掩模的形变的闭环反馈。
在本公开实施例中，十六路气动微调掩模形变控制分系统400还包括掩模受力检测反馈分系统，具体包括：十六路力传感器，用于采集掩模形变受力值，并通过模拟量输入扩展模块将采集到的受力值的模拟量 电信号传输给PID控制器。掩模受力检测反馈分系统还包括压力传感器，用于采集所述十六路气缸的连接气管内的气压。
图2示意性示出了本公开实施例提供的一种十六路气动微调掩模形变控制分系统400的单路PID控制环路的结构示意图。
如图2所示，所述PLC控制器分系统107提供十六路PID控制器，用于完成掩模形变控制。该PID控制器函数方程为：
Figure PCTCN2021090688-appb-000001
其中，y为PID算法的输出值，及系统中运算后的输出值。Kp为比例增益，S为拉普拉斯运算符，b为比例作用权重，w即设定值，x为过程值，即力传感器检测到的作用力，c为微分作用权重，TI为微分作用时间，TD为微分作用时间。
在本公开实施例中，十六路气动微调掩模形变控制分系统400还包括气压输出控制分系统，包括：十六路气缸和十六路电气比例阀。其中，十六路气缸与十六路电气比例阀连接，用于输出使掩模产生形变的力；十六路电气比例阀与模拟量输出扩展模块连接，用于根据第一控制反馈量控制十六路气缸输出力的强度，从而实现对掩模形变的反馈控制。
此外，如图1所示，PLC控制器分系统107还用于将压力传感器采集的连接气管内的气压与预设气压值进行比较，并生成第二控制反馈量；十六路气动微调掩模形变控制分系统400还包括换向电磁阀，其用于根据第二控制反馈量控制十六路气缸输出力的方向；PLC控制器分系统107通过中间继电器与电磁阀连接。如此，实现了对气缸内气压的反馈控制，进一步提升了对掩模形变控制的精度。
如图1和图2所示，PLC控制器分系统107通过工业以太网与上位机实现通信，PLC控制器分系统107通过中间继电器控制电磁阀的通断实现气缸的推出及缩回，而通过电压型模拟量输出信号控制电气比例阀从而实现对输出气压的控制，以此达到控制气缸作用力输出的作用，从而实现对掩模作用力的控制并实现对掩模形变的控制。而通过力传感器检测的气缸输出力电压型模拟量信号，结合PLC控制器分系统107内部的PID控制器，达到闭环控制效果。
在本公开实施例中，对准分系统200包括：八路图像采集CCD相机、两块图像采集卡104、图像处理器103、图像采集调节电机控制分系统105和八路照明分系统300。其中，八路图像采集CCD相机，各CCD相机均配有远心镜头，用于采集图像；两块图像采集卡104，每块图像采集卡分别用于四路CCD相机所采集图像的接收和传输；图像处理器103，用于对图像进行预处理，并将预处理后的图像传递至中控系统，使中控系统根据图像判断掩模和基板是否对准，并生成使掩模和基板对准的调控指令；图像采集调节电机控制分系统105，用于根据调控指令调整基板的位置，使基板和掩模对准；八路照明分系统300，用于为各CCD相机连接的远心镜头提供照明。
对准分系统200还包括：紧凑型线性位移台，用于调整CCD相机的位置；多通道运动控制器，用于根据中控系统下发的控制指令，使紧凑型线性位移台运动调整位置。
本公开实施例提供的系统还包括：上位机102，内置有中控系统；上位机102用于根据实际的掩模形变控制需求，向PLC控制器分系统107下发程序指令，程序指令用于生成第一控制反馈量，并调控十六路气动微调掩模形变控制分系统的十六路气缸，以调整控掩模的形变量；上位机102还用于根据图像，判断掩模和基板是否对准，并生成使掩模和基板对准的调控指令，并控制用于调节基板位置的机械结构，使基板和掩模对准。上位机102与十六路气动微调掩模形变控制分系统400通过工业以太网总线连接通信，上位机102与对准分系统200通过工业以太网总线、PCIe总线或RS232串口通信总线连接通信，其中，图像采集卡104通过PCIe X4接口与上位机102连接通信。该上位机102控制同时实现了掩模形变和对准系统的反馈控制，步骤简洁，成本经济，反应速度块，提高了对准效率和形变控制精度。
本公开另一方面提供了一种用于超分辨光刻精密掩模的智能校正装置控制系统，包括十六路气动微调掩模形变控制分系统400和对准分系统200，十六路气动微调掩模形变控制分系统400包括掩模受力检测反馈分系统，气压输出控制分系统，PLC实现的PID控制器分系统，对 准分系统200包括八路图像采集CCD、图像采集卡104、图像处理器103及八路照明分系统300，图像采集CCD采集的图像数据通过图像采集卡104与高性能上位机102进行传输，上位机102通过图像处理器103对相关图像进行预处理，然后反馈至中控系统，为对准程序提供图像支持，八路照明分系统300通过信号发生器连接位相调制器106，产生激励信号，从而使得氦-氖激光器发出的光通过调制后经相关光路及光纤传输通道为CCD连接的远心镜头提供照明。
图3示意性示出了本公开实施例提供的一种用于超分辨光刻精密掩模的智能校正装置控制系统的示意图。
如图3所示，本公开实施例提供的一种用于超分辨光刻精密掩模的智能校正装置控制系统包括：中控系统100、控制总线101、上位机102、图像处理器103、图像采集卡104、电机控制器105、位相调制器106、PLC控制器分系统107；所述图像处理器103通过PCIe传输通道110与外部连接，图像采集卡104通过以太网传输通道120与外部连接；电机控制器105通过串口通信总线通道130与外部连接；位相调制器106通过光纤传输通道140与外部连接；PLC控制器分系统107通过数字量及模拟量控制通道150与外部连接。
控制系统的上位机102为高性能工控机，用于整个控制系统运行及图像处理高速运算。该系统的控制总线101采用标准控制总线。
对准分系统200包括多通道图像采集分系统，图像传输分系统，图像处理分系统，图像采集调节电机控制分系统105，八路照明分系统300。多通道图像采集分系统包括：八路图像采集CCD，用于图像采集，远心镜头，用于配合CCD使用。图像传输分系统包括：图像采集卡104，单块图像采集卡104用于四通道CCD采集数据传输；图像采集卡104包括触发器，用于外部触发条件接收；采集卡内部系统程序，用于整个图像采集卡104工作应用；PHY收发器，用于将从以太网接口接收的数据通过系统程序处理后传送至PCIe接口；四个DDR RAM，用于内部程序运行内存提供。图像处理分系统包括：图像处理器103，该图形处理器采用NVIDIA公司的RTX 2080 SUPER图形处理显卡，用于将图像采集 卡104采集及简单预处理后的数据进行综合处理，最终将处理后的图像数据传输至中控系统。图像采集调节电机控制分系统105包括：紧凑型线性位移台，用于CCD位置调整，多通道运动控制器，用于配合紧凑型线性位移台运动控制。
对准分系统200可采用基于TCP/IP协议或可自定义的工业以太网总线、基于PCIe X4或可自定义的PCIe总线、采用基于USRT或可自定义的RS232串口通信总线。具体的，所述对准分系统200通过图像处理器103PCIe传输通道112与图像处理器103进行连接，所述对准分系统200通过八路CCD以太网传输通道122与图像采集卡104进行连接，所述对准分系统200通过八路电机控制器串口通信通道132与电机控制器105进行连接；所述照明分系统300通过氦氖-激光位相调制照明分系统300光纤传输通道143与位相调制器106进行连接；所述十六路独立微调控制分系统400通过力传感器、电气比例阀模拟量传输通道154与PLC控制器分系统107进行连接。
在本公开实施例中，中控系统100通过中控程序通过PCIe传输通道110采集图像处理器103处理后的图像结果，根据实际的需求对图像进行处理，结合处理后的图像对对准进行判断及相应操作。中控系统100通过串口通信总线通道130控制电机根据实际需求进行位移微调，从而达到工作要求。中控系统100通过基于TCP/IP的工业以太网与PLC控制器分系统107进行通信，根据实际的掩模形变控制需求对PLC控制器分系统107下发控制指令，后续相关操作由PLC控制器分系统107完成下位机控制。
图4示意性示出了本公开实施例提供的图像采集卡104的内部结构及通道的结构框图。
如图4所示，在本公开实施例中，图像采集卡104内集成XILINX公司的FPGA芯片XC3S4000-4FGG900C，采用X4PCI
Figure PCTCN2021090688-appb-000002
二代接口，总共提供2GB/s带宽实现图像采集卡104与上位机102之间的数据传输。该图像采集卡104通过四个以太网端口接收来自CCD以太网接口传输的图像信息，本次发明实例所述控制系统共使用八个CCD，故采用 两块图像采集卡104实现图像传输。图像采集卡104通过PCIe X4接口与中控系统100进行连接，通过图像处理器103进行相关图像处理。为使系统高速运行，减少指令发送延迟等，本次上位机102采用双路志强E52620V3作为处理器，并配置32GB RAM以及256G SSD，保证系统高速运行。图像采集卡104内部集成系统程序及控制程序，端口1-4接收的图像信息经过系统程序的初步处理后，PHY收发器将数据通过PCIe X4接口传输至上位机102，图像采集卡104内部还集成4个DDR RAM，提供程序运行。
在本公开实施例中，图像处理器103为RTX 2080 SUPER高性能显卡，图像采集卡104接收到的数据通过PCIe传输通道110传输至图像处理器103，进而图像处理器103对数据进行处理，传送至中控系统100。而图像采集卡104采用XILINX XC3S4000-4FGG900C FPGA芯片作为处理器，单块图像采集卡104可以采集四个以太网传输通道122传输的图像数据。此次共使用两块图像采集卡104进行八个通道的CCD图像数据采集。
电机控制器105通过控制八个紧凑型线性位移台的运动位置及配合手动位移台来调整CCD图像采集的位置。
氦-氖激光器产生的波长为633nm红光经过准直、聚焦后，信号发生器产生激励信号，位相调制器106对其进行调制，最后将光通过光纤传输通道140输出至远心镜头，远心镜头连接CCD，为CCD提供照明，本发明共使用八个CCD对掩模四边的八个点进行观测。
更具体地，十六路气动微调掩模形变控制分系统400还包括PLC控制分系统107及模拟量输入输出扩展模块，PLC内部PID控制器，掩模受力检测反馈分系统，气压输出控制分系统。
PLC控制器分系统107提供的PID控制器用于完成气缸输出力的闭环控制，通过对现场安装后的设备进行PID实际调试，后续需要对气缸输出力，即掩模受力情况进行调整时，通过内部PID控制器对力传感器检测的受力情况及电气比例阀气压的输出情况进行调控，达到控制目的。 PLC控制器分系统107的供电系统由DC24电源提供，同时还为电气比例阀、力传感器、压力传感器、电磁阀等供电。
PLC控制器分系统107另外扩展模拟量输出模块，用于输出电气比例阀控制的电压信号，模拟量输入模块，用于实现力传感器及压力传感器输入的模拟量电压信号转换，数字量输出模块，用于对其他按钮、开关及中间继电器控制，数字量输入模块用于数字反馈信号的接入，包括气缸活塞推出限位开关等。PLC控制器分系统107提供的PID控制器用于完成气缸输出力的闭环控制，通过对现场安装后的设备进行PID实际调试，后续需要对气缸输出力，即掩模受力情况进行调整时，通过内部PID控制器对力传感器检测的受力情况及电气比例阀气压的输出情况进行调控，达到控制目的。PLC控制器分系统107的供电系统由DC24电源提供，同时还为电气比例阀、力传感器、压力传感器、电磁阀等供电。
PLC控制器分系统107的PLC采用西门子S7-1200 CPU 1215C DC/DC/DC作为控制器，该CPU工作内存(集成)：100kB，装载内存(集成)：4MB，保持内存(集成)10kB，集成数字量I/O：14输入/10输出，集成模拟量I/O：2输入/2输出，过程映像区：1024字节输入/1024字节输出。S7-1200 PLC的基本数据类型长度达到32位，S7-1200 PLC支待Pointer、Any两种类型指针，使得S7-1200在编程时具有一定的灵活性。布尔执行速度，0.08μs/指令，移动字变量执行速度，1.7μs/指令，浮点数运算执行速度，2.3μs/指令。
十六路气动微调掩模形变控制分系统400采用基于TCP/IP协议或可自定义的工业以太网总线。
所述八路照明分系统300包括：氦-氖激光器，用于产生波长为633nm的光，聚焦镜，把准直光聚焦到光缆里，准直镜，用于把光缆的输出光变成准直，光缆，用于光信号传输，适配器用于光纤端头和远心物镜的连接，位相调制器106，用于相关输出光信号的调制，信号发生器，用于产生位相调制器106的激励信号。
本领域技术人员可以理解，本发明的各个实施例和/或权利要求中记载的特征可以进行多种组合或/或结合，即使这样的组合或结合没有明确 记载于本发明中。特别地，在不脱离本发明精神和教导的情况下，本发明的各个实施例和/或权利要求中记载的特征可以进行多种组合和/或结合。所有这些组合和/或结合均落入本发明的范围。
尽管已经参照本发明的特定示例性实施例示出并描述了本发明，但是本领域技术人员应该理解，在不背离所附权利要求及其等同物限定的本发明的精神和范围的情况下，可以对本发明进行形式和细节上的多种改变。因此，本发明的范围不应该限于上述实施例，而是应该不仅由所附权利要求来进行确定，还由所附权利要求的等同物来进行限定。

Claims (21)

  1. 一种用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，包括：
    十六路气动微调掩模形变控制分系统，用于使掩模产生形变，并检测所述掩模形变的受力值，将所述掩模形变的受力值与输出力设定值比较，生成第一控制反馈量，以调整使所述掩模产生形变的力，从而控制所述掩模的形变量；
    对准分系统，用于采集所述掩模和基片的图像，根据所述图像调整所述掩模和所述基片之间的位置，使所述掩模和所述基片对准。
  2. 根据权利要求1所述的系统，其特征在于，所述十六路气动微调掩模形变控制分系统包括PLC控制器分系统，所述PLC控制器分系统包括：
    PID控制器、模拟量输入扩展模块、模拟量输出扩展模块、数字量输入扩展模块和数字量输出扩展模块；
    所述模拟量输入扩展模块用于将采集的所述受力值的模拟量电信号进行A/D转换；
    所述数字量输入扩展模块用于将A/D转换得到的数字量信号输入至PID控制器；
    所述PID控制器用于将A/D转换得到的数字量信号与所述输出力设定值比较，并生成所述第一控制反馈量；
    所述数字量输出扩展模块用于将所述第一控制反馈量的数字量信号输出至模拟量输出扩展模块；
    所述模拟量输出扩展模块用于将所述第一控制反馈量的数字量信号进行D/A转换，将转换得到的所述第一控制反馈量的模拟电信号输出，形成对所述掩模的形变的闭环反馈。
  3. 根据权利要求2所述的系统，其特征在于，所述十六路气动微调掩模形变控制分系统还包括气压输出控制分系统，所述气压输出控制分系统包括：
    十六路气缸，用于输出使所述掩模产生形变的力；
    十六路电气比例阀，用于根据所述第一控制反馈量控制所述十六路气缸输出力的强度。
  4. 根据权利要求3所述的系统，其特征在于，所述十六路气动微调掩模形变控制分系统还包括掩模受力检测反馈分系统，所述掩模受力检测反馈分系统包括：
    十六路力传感器，用于采集掩模形变的受力值；
    压力传感器，用于采集所述十六路气缸的连接气管内的气压。
  5. 根据权利要求4所述的系统，其特征在于，
    所述PLC控制器分系统还用于将所述气压与预设气压值进行比较，并生成第二控制反馈量；
    所述十六路气动微调掩模形变控制分系统还包括换向电磁阀，所述换向电磁阀用于根据所述第二控制反馈量控制所述十六路气缸输出力的方向；
    所述PLC控制器分系统通过中间继电器与所述换向电磁阀连接。
  6. 根据权利要求2所述的系统，其特征在于，所述对准分系统包括：
    八路图像采集CCD相机，各所述CCD相机均配有远心镜头，用于采集所述图像；
    两块图像采集卡，每块所述图像采集卡分别用于四路所述CCD相机所采集图像的接收和传输；
    图像处理器，用于对所述图像进行预处理，并将预处理后的所述图像传递至中控系统，使所述中控系统根据所述图像判断所述掩模和所述基板是否对准，并生成使所述掩模和所述基板对准的调控指令；
    图像采集调节电机控制分系统，用于根据所述调控指令调整所述基板的位置，使所述基板和所述掩模对准；
    八路照明分系统，用于为各所述CCD相机连接的远心镜头提供照明。
  7. 根据权利要求6所述的系统，其特征在于，所述系统还包括：
    上位机，内置有中控系统；
    所述上位机用于根据实际的掩模形变控制需求，向所述PLC控制器分系统下发程序指令，所述程序指令用于生成所述第一控制反馈量，并调控所述十六路气动微调掩模形变控制分系统调整所述掩模的形变量；
    所述上位机还用于根据所述图像，判断所述掩模和所述基板是否对准，并生成使所述掩模和所述基板对准的调控指令。
  8. 根据权利要求7所述的系统，其特征在于，所述上位机与所述十六路气动微调掩模形变控制分系统通过工业以太网总线连接通信，所述上位机与所述对准分系统通过工业以太网总线、PCIe总线或RS232串口通信总线连接通信，所述图像采集卡通过PCIe X4接口与所述上位机连接通信。
  9. 根据权利要求7所述的系统，其特征在于，所述对准分系统还包括：
    紧凑型线性位移台，用于调整所述CCD相机的位置；
    多通道运动控制器，用于根据中控系统下发的控制指令，使所述紧凑型线性位移台运动调整位置。
  10. 一种用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于：包括十六路气动微调掩模形变控制分系统和对准分系统，所述十六路气动微调掩模形变控制分系统包括掩模受力检测反馈分系统，气压输出控制分系统，PLC实现的PID控制器分系统，所述对准分系统包括八路图像采集CCD、图像采集卡、图像处理器及八路照明分系统，所述图像采集CCD采集的图像数据通过图像采集卡与高性能上位机进行传输，上位机通过图像处理器对相关图像进行预处理，然后反馈至中控系统，为对准程序提供图像支持，所述八路照明分系统通过信号发生器连接位相调制器，产生激励信号，从而使得氦-氖激光器发出的光通过调制后经相关光路及光纤传输通道为CCD连接的远心镜头提供照明。
  11. 根据权利要求10所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述系统的控制总线采用标准控制总线； 所述十六路气动微调掩模形变控制分系统采用基于TCP/IP协议的工业以太网总线或采用可自定义的工业以太网总线。
  12. 根据权利要求10所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述十六路气动微调掩模形变控制分系统还包括PLC控制分系统及模拟量输入输出扩展模块、PLC内部PID控制器、掩模受力检测反馈分系统和气压输出控制分系统。
  13. 根据权利要求10所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述对准分系统采用基于TCP/IP协议的工业以太网总线或可自定义的工业以太网总线，或者采用基于PCIe X4的PCIe总线或可自定义的PCIe总线，或者采用基于USRT的RS232串口通信总线或可自定义的RS232串口通信总线。
  14. 根据权利要求10所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述对准分系统包括多通道图像采集分系统、图像传输分系统、图像处理分系统、图像采集调节电机控制分系统和八路照明分系统。
  15. 根据权利要求10所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述控制系统包括：高性能工控机，用于整个控制系统运行及图像处理高速运算。
  16. 根据权利要求12所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述PLC控制分系统包括：PLC控制器，用于提供十六路PID控制器，完成输出力闭环控制算法；模拟量输入扩展模块，用于力传感器模拟量输入转换，完成反馈力D/A转换，还用于输入气压检测，完成D/A转换；模拟量输出扩展模块，用于电气比例阀控制信号输出，完成A/D转换；数字量输出扩展模块，用于气缸输出换向控制，完成气缸推出及缩回控制，该过程通过控制中间继电器启动相应换向电磁阀完成；数字量输入扩展模块，用于传感信号接收。
  17. 根据权利要求14所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述多通道图像采集分系统包括：八路图像采集CCD，用于图像采集；远心镜头，用于配合CCD使用。
  18. 根据权利要求14所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述图像传输分系统包括：图像采集卡，单块图像采集卡用于四通道CCD采集数据传输；图像采集卡包括触发器，用于外部触发条件接收；采集卡内部系统程序，用于整个图像采集卡工作应用；PHY收发器，用于将从以太网接口接收的数据通过系统程序处理后传送至PCIe接口；四个DDR RAM，用于内部程序运行内存提供。
  19. 根据权利要求14所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述图像处理分系统包括：图像处理器，该图形处理器采用NVIDIA公司的RTX 2080 SUPER图形处理显卡，用于将图像采集卡采集及简单预处理后的数据进行综合处理，最终将处理后的图像数据传输至中控系统。
  20. 根据权利要求14所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述图像采集调节电机控制分系统包括：紧凑型线性位移台，用于CCD位置调整；多通道运动控制器，用于配合所述紧凑型线性位移台运动控制。
  21. 根据权利要求14所述的用于超分辨光刻精密掩模的智能校正装置控制系统，其特征在于，所述八路照明分系统包括：氦-氖激光器，用于产生波长为633nm的光；聚焦镜，把准直光聚焦到光缆里；准直镜，用于把光缆的输出光变成准直；光缆，用于光信号传输；适配器，用于光纤端头和远心物镜的连接；位相调制器，用于相关输出光信号的调制；信号发生器，用于产生位相调制器的激励信号。
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