EP4134750A4 - Intelligent correction device control system for super-resolution photolithography precision mask - Google Patents

Intelligent correction device control system for super-resolution photolithography precision mask Download PDF

Info

Publication number
EP4134750A4
EP4134750A4 EP21796326.3A EP21796326A EP4134750A4 EP 4134750 A4 EP4134750 A4 EP 4134750A4 EP 21796326 A EP21796326 A EP 21796326A EP 4134750 A4 EP4134750 A4 EP 4134750A4
Authority
EP
European Patent Office
Prior art keywords
super
control system
device control
correction device
precision mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21796326.3A
Other languages
German (de)
French (fr)
Other versions
EP4134750A1 (en
Inventor
Xiangang Luo
Ping Gao
Mingbo PU
Xiaoliang Ma
Xiong LI
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institute of Optics and Electronics of CAS
Original Assignee
Institute of Optics and Electronics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Optics and Electronics of CAS filed Critical Institute of Optics and Electronics of CAS
Publication of EP4134750A1 publication Critical patent/EP4134750A1/en
Publication of EP4134750A4 publication Critical patent/EP4134750A4/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
    • G05B19/05—Programmable logic controllers, e.g. simulating logic interconnections of signals according to ladder diagrams or function charts
    • G05B19/056—Programming the PLC
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70—SSIS architectures; Circuits associated therewith
    • H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/10—Plc systems
    • G05B2219/13—Plc programming
    • G05B2219/13004—Programming the plc
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/695—Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
EP21796326.3A 2020-04-29 2021-04-28 Intelligent correction device control system for super-resolution photolithography precision mask Pending EP4134750A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202010355155.2A CN111580359B (en) 2020-04-29 2020-04-29 Intelligent correction device control system for super-resolution lithography precision mask
PCT/CN2021/090688 WO2021219030A1 (en) 2020-04-29 2021-04-28 Intelligent correction device control system for super-resolution photolithography precision mask

Publications (2)

Publication Number Publication Date
EP4134750A1 EP4134750A1 (en) 2023-02-15
EP4134750A4 true EP4134750A4 (en) 2023-09-20

Family

ID=72112442

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21796326.3A Pending EP4134750A4 (en) 2020-04-29 2021-04-28 Intelligent correction device control system for super-resolution photolithography precision mask

Country Status (5)

Country Link
US (1) US11714358B2 (en)
EP (1) EP4134750A4 (en)
JP (1) JP7431475B2 (en)
CN (1) CN111580359B (en)
WO (1) WO2021219030A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111580359B (en) * 2020-04-29 2021-06-18 中国科学院光电技术研究所 Intelligent correction device control system for super-resolution lithography precision mask

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1111473A2 (en) * 1999-12-23 2001-06-27 Asm Lithography B.V. Lithographic apparatus with vacuum chamber and interferometric alignment system
JP2001221279A (en) * 2000-02-09 2001-08-17 Canon Inc Active vibration damping device
US20030053057A1 (en) * 2001-09-03 2003-03-20 Canon Kabushiki Kaisha Position detection method and apparatus, and exposure method and apparatus
US20050162762A1 (en) * 2004-01-26 2005-07-28 Nikon Corporation Adaptive-optics actuator arrays and methods for using such arrays
EP2003680A1 (en) * 2006-02-21 2008-12-17 Nikon Corporation Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method
CN104635427A (en) * 2013-11-14 2015-05-20 上海微电子装备有限公司 Mask shaping apparatus used for lithography equipment and mask shaping method
US20150316852A1 (en) * 2014-05-02 2015-11-05 Canon Kabushiki Kaisha Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737824A (en) * 1984-10-16 1988-04-12 Canon Kabushiki Kaisha Surface shape controlling device
US6549271B2 (en) * 1997-01-28 2003-04-15 Nikon Corporation Exposure apparatus and method
US6261728B1 (en) * 1998-10-19 2001-07-17 Vanguard International Semiconductor Corporation Mask image scanning exposure method
JP4671473B2 (en) * 2000-07-14 2011-04-20 ルネサスエレクトロニクス株式会社 Mask data correction apparatus, method for manufacturing transfer mask, and method for manufacturing apparatus having pattern structure
US7019816B2 (en) * 2003-12-17 2006-03-28 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2007103657A (en) 2005-10-04 2007-04-19 Canon Inc Optical element retaining device, exposure device and device manufacturing method
JP4714033B2 (en) 2006-02-03 2011-06-29 株式会社オーク製作所 Mask holding mechanism
CN101446777B (en) * 2008-12-30 2011-03-16 中国科学院光电技术研究所 Super-resolution i-line photoetching device
US8792078B2 (en) * 2009-04-27 2014-07-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method and pellicle mounting apparatus for reducing pellicle induced distortion
CN104570592B (en) 2013-10-11 2019-04-30 上海微电子装备（集团）股份有限公司 A kind of big mask apparatus for shaping and method
JP6025178B2 (en) * 2013-11-11 2016-11-16 信越化学工業株式会社 Pellicle pasting method and pasting apparatus used in this method
JP2017059717A (en) 2015-09-17 2017-03-23 株式会社東芝 Template, imprint device and control method
CN106933024B (en) 2015-12-30 2020-05-01 上海微电子装备（集团）股份有限公司 Photoetching system capable of detecting mask curvature and detection method
CN107329374B (en) * 2016-04-29 2019-06-25 上海微电子装备（集团）股份有限公司 Mask bending compensation device, detection compensation system and compensation method
CN107817653B (en) * 2017-12-12 2019-10-08 中国科学院光电技术研究所 Super-resolution photoetching device based on flexible material
CN108089409B (en) * 2017-12-15 2019-10-08 中国科学院光电技术研究所 Large-area super-resolution photoetching device
CN111580359B (en) 2020-04-29 2021-06-18 中国科学院光电技术研究所 Intelligent correction device control system for super-resolution lithography precision mask

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1111473A2 (en) * 1999-12-23 2001-06-27 Asm Lithography B.V. Lithographic apparatus with vacuum chamber and interferometric alignment system
JP2001221279A (en) * 2000-02-09 2001-08-17 Canon Inc Active vibration damping device
US20030053057A1 (en) * 2001-09-03 2003-03-20 Canon Kabushiki Kaisha Position detection method and apparatus, and exposure method and apparatus
US20050162762A1 (en) * 2004-01-26 2005-07-28 Nikon Corporation Adaptive-optics actuator arrays and methods for using such arrays
EP2003680A1 (en) * 2006-02-21 2008-12-17 Nikon Corporation Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method
CN104635427A (en) * 2013-11-14 2015-05-20 上海微电子装备有限公司 Mask shaping apparatus used for lithography equipment and mask shaping method
US20150316852A1 (en) * 2014-05-02 2015-11-05 Canon Kabushiki Kaisha Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2021219030A1 *

Also Published As

Publication number Publication date
EP4134750A1 (en) 2023-02-15
CN111580359A (en) 2020-08-25
JP7431475B2 (en) 2024-02-15
CN111580359B (en) 2021-06-18
WO2021219030A1 (en) 2021-11-04
JP2023515713A (en) 2023-04-13
US20230126995A1 (en) 2023-04-27
US11714358B2 (en) 2023-08-01

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