EP4134750A4 - Intelligent correction device control system for super-resolution photolithography precision mask - Google Patents
Intelligent correction device control system for super-resolution photolithography precision mask Download PDFInfo
- Publication number
- EP4134750A4 EP4134750A4 EP21796326.3A EP21796326A EP4134750A4 EP 4134750 A4 EP4134750 A4 EP 4134750A4 EP 21796326 A EP21796326 A EP 21796326A EP 4134750 A4 EP4134750 A4 EP 4134750A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- super
- control system
- device control
- correction device
- precision mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000206 photolithography Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/05—Programmable logic controllers, e.g. simulating logic interconnections of signals according to ladder diagrams or function charts
- G05B19/056—Programming the PLC
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/71—Charge-coupled device [CCD] sensors; Charge-transfer registers specially adapted for CCD sensors
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/10—Plc systems
- G05B2219/13—Plc programming
- G05B2219/13004—Programming the plc
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/695—Control of camera direction for changing a field of view, e.g. pan, tilt or based on tracking of objects
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Quality & Reliability (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Theoretical Computer Science (AREA)
- Automation & Control Theory (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010355155.2A CN111580359B (en) | 2020-04-29 | 2020-04-29 | Intelligent correction device control system for super-resolution lithography precision mask |
PCT/CN2021/090688 WO2021219030A1 (en) | 2020-04-29 | 2021-04-28 | Intelligent correction device control system for super-resolution photolithography precision mask |
Publications (2)
Publication Number | Publication Date |
---|---|
EP4134750A1 EP4134750A1 (en) | 2023-02-15 |
EP4134750A4 true EP4134750A4 (en) | 2023-09-20 |
Family
ID=72112442
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP21796326.3A Pending EP4134750A4 (en) | 2020-04-29 | 2021-04-28 | Intelligent correction device control system for super-resolution photolithography precision mask |
Country Status (5)
Country | Link |
---|---|
US (1) | US11714358B2 (en) |
EP (1) | EP4134750A4 (en) |
JP (1) | JP7431475B2 (en) |
CN (1) | CN111580359B (en) |
WO (1) | WO2021219030A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111580359B (en) * | 2020-04-29 | 2021-06-18 | 中国科学院光电技术研究所 | Intelligent correction device control system for super-resolution lithography precision mask |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1111473A2 (en) * | 1999-12-23 | 2001-06-27 | Asm Lithography B.V. | Lithographic apparatus with vacuum chamber and interferometric alignment system |
JP2001221279A (en) * | 2000-02-09 | 2001-08-17 | Canon Inc | Active vibration damping device |
US20030053057A1 (en) * | 2001-09-03 | 2003-03-20 | Canon Kabushiki Kaisha | Position detection method and apparatus, and exposure method and apparatus |
US20050162762A1 (en) * | 2004-01-26 | 2005-07-28 | Nikon Corporation | Adaptive-optics actuator arrays and methods for using such arrays |
EP2003680A1 (en) * | 2006-02-21 | 2008-12-17 | Nikon Corporation | Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
CN104635427A (en) * | 2013-11-14 | 2015-05-20 | 上海微电子装备有限公司 | Mask shaping apparatus used for lithography equipment and mask shaping method |
US20150316852A1 (en) * | 2014-05-02 | 2015-11-05 | Canon Kabushiki Kaisha | Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4737824A (en) * | 1984-10-16 | 1988-04-12 | Canon Kabushiki Kaisha | Surface shape controlling device |
US6549271B2 (en) * | 1997-01-28 | 2003-04-15 | Nikon Corporation | Exposure apparatus and method |
US6261728B1 (en) * | 1998-10-19 | 2001-07-17 | Vanguard International Semiconductor Corporation | Mask image scanning exposure method |
JP4671473B2 (en) * | 2000-07-14 | 2011-04-20 | ルネサスエレクトロニクス株式会社 | Mask data correction apparatus, method for manufacturing transfer mask, and method for manufacturing apparatus having pattern structure |
US7019816B2 (en) * | 2003-12-17 | 2006-03-28 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2007103657A (en) | 2005-10-04 | 2007-04-19 | Canon Inc | Optical element retaining device, exposure device and device manufacturing method |
JP4714033B2 (en) | 2006-02-03 | 2011-06-29 | 株式会社オーク製作所 | Mask holding mechanism |
CN101446777B (en) * | 2008-12-30 | 2011-03-16 | 中国科学院光电技术研究所 | Super-resolution i-line photoetching device |
US8792078B2 (en) * | 2009-04-27 | 2014-07-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and pellicle mounting apparatus for reducing pellicle induced distortion |
CN104570592B (en) | 2013-10-11 | 2019-04-30 | 上海微电子装备(集团)股份有限公司 | A kind of big mask apparatus for shaping and method |
JP6025178B2 (en) * | 2013-11-11 | 2016-11-16 | 信越化学工業株式会社 | Pellicle pasting method and pasting apparatus used in this method |
JP2017059717A (en) | 2015-09-17 | 2017-03-23 | 株式会社東芝 | Template, imprint device and control method |
CN106933024B (en) | 2015-12-30 | 2020-05-01 | 上海微电子装备(集团)股份有限公司 | Photoetching system capable of detecting mask curvature and detection method |
CN107329374B (en) * | 2016-04-29 | 2019-06-25 | 上海微电子装备(集团)股份有限公司 | Mask bending compensation device, detection compensation system and compensation method |
CN107817653B (en) * | 2017-12-12 | 2019-10-08 | 中国科学院光电技术研究所 | Super-resolution photoetching device based on flexible material |
CN108089409B (en) * | 2017-12-15 | 2019-10-08 | 中国科学院光电技术研究所 | Large-area super-resolution photoetching device |
CN111580359B (en) | 2020-04-29 | 2021-06-18 | 中国科学院光电技术研究所 | Intelligent correction device control system for super-resolution lithography precision mask |
-
2020
- 2020-04-29 CN CN202010355155.2A patent/CN111580359B/en active Active
-
2021
- 2021-04-28 EP EP21796326.3A patent/EP4134750A4/en active Pending
- 2021-04-28 WO PCT/CN2021/090688 patent/WO2021219030A1/en unknown
- 2021-04-28 JP JP2022565880A patent/JP7431475B2/en active Active
- 2021-04-28 US US17/997,189 patent/US11714358B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1111473A2 (en) * | 1999-12-23 | 2001-06-27 | Asm Lithography B.V. | Lithographic apparatus with vacuum chamber and interferometric alignment system |
JP2001221279A (en) * | 2000-02-09 | 2001-08-17 | Canon Inc | Active vibration damping device |
US20030053057A1 (en) * | 2001-09-03 | 2003-03-20 | Canon Kabushiki Kaisha | Position detection method and apparatus, and exposure method and apparatus |
US20050162762A1 (en) * | 2004-01-26 | 2005-07-28 | Nikon Corporation | Adaptive-optics actuator arrays and methods for using such arrays |
EP2003680A1 (en) * | 2006-02-21 | 2008-12-17 | Nikon Corporation | Pattern forming apparatus, pattern forming method, mobile object driving system, mobile body driving method, exposure apparatus, exposure method and device manufacturing method |
CN104635427A (en) * | 2013-11-14 | 2015-05-20 | 上海微电子装备有限公司 | Mask shaping apparatus used for lithography equipment and mask shaping method |
US20150316852A1 (en) * | 2014-05-02 | 2015-11-05 | Canon Kabushiki Kaisha | Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article |
Non-Patent Citations (1)
Title |
---|
See also references of WO2021219030A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP4134750A1 (en) | 2023-02-15 |
CN111580359A (en) | 2020-08-25 |
JP7431475B2 (en) | 2024-02-15 |
CN111580359B (en) | 2021-06-18 |
WO2021219030A1 (en) | 2021-11-04 |
JP2023515713A (en) | 2023-04-13 |
US20230126995A1 (en) | 2023-04-27 |
US11714358B2 (en) | 2023-08-01 |
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17P | Request for examination filed |
Effective date: 20221108 |
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AK | Designated contracting states |
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DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20230821 |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: G03F 7/00 20060101ALI20230814BHEP Ipc: G03F 7/20 20060101ALI20230814BHEP Ipc: G03F 9/00 20060101AFI20230814BHEP |