WO2021217544A1 - 一种永磁体的稳磁方法、稳磁永磁体及永磁电机 - Google Patents

一种永磁体的稳磁方法、稳磁永磁体及永磁电机 Download PDF

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WO2021217544A1
WO2021217544A1 PCT/CN2020/087971 CN2020087971W WO2021217544A1 WO 2021217544 A1 WO2021217544 A1 WO 2021217544A1 CN 2020087971 W CN2020087971 W CN 2020087971W WO 2021217544 A1 WO2021217544 A1 WO 2021217544A1
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permanent magnet
rare earth
film
heavy rare
magnetic
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PCT/CN2020/087971
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English (en)
French (fr)
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赖彬
王子京
景遐明
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华为技术有限公司
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Priority to PCT/CN2020/087971 priority Critical patent/WO2021217544A1/zh
Priority to CN202080004861.0A priority patent/CN112714802A/zh
Priority to EP20922465.8A priority patent/EP3933859B1/en
Publication of WO2021217544A1 publication Critical patent/WO2021217544A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • C23C10/30—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes using a layer of powder or paste on the surface
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
    • H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
    • H01F1/047—Alloys characterised by their composition
    • H01F1/053—Alloys characterised by their composition containing rare earth metals
    • H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
    • H01F1/057—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B
    • H01F1/0571—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes
    • H01F1/0575—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together
    • H01F1/0577—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes pressed, sintered or bonded together sintered
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
    • H01F41/0293—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets diffusion of rare earth elements, e.g. Tb, Dy or Ho, into permanent magnets
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/16—Electroplating with layers of varying thickness

Definitions

  • This application relates to the field of permanent magnet materials, in particular to a method for stabilizing permanent magnets, a permanent magnet stabilizing magnets, and a permanent magnet motor.
  • NdFeB permanent magnet materials are widely used in new energy vehicles, wind power generation, energy-saving appliances, smart manufacturing and other fields due to their excellent magnetic properties, and promote the development of global energy-saving, environmental protection, low-carbon and other green concepts of economy.
  • New developments and applications have put forward higher requirements for permanent magnet materials, especially for new energy vehicles, whose drive motors require both permanent magnet materials to have high remanence and maximum energy product, as well as high coercivity.
  • This kind of automotive permanent magnets contain high content of heavy rare earth (HRE) elements such as dysprosium Dy and terbium Tb, and the price is relatively high, so that the cost of permanent magnet materials accounts for more than 30% of the permanent magnet motor.
  • HRE heavy rare earth
  • the conventional heavy rare earth element diffusion process is to form a thin film of heavy rare earth elements such as Dy or Tb or a compound film rich in Dy or Tb on the surface of the neodymium iron boron substrate by physical or chemical methods.
  • the high temperature heat treatment makes the heavy rare earth elements such as Dy or Tb diffuse from the surface of the NdFeB base material along the grain boundary to the inside of the NdFeB base material, so that the overall coercivity of the NdFeB permanent magnet is enhanced.
  • This method requires a large amount of heavy rare earth elements due to the large coating area.
  • the embodiments of the present application provide a method for stabilizing permanent magnets, a permanent magnet stabilizing permanent magnets, and a permanent magnet motor, which can use less heavy rare earth (HRE) elements to increase the coercivity of the permanent magnet as a whole.
  • HRE heavy rare earth
  • the first aspect of the present application provides a method for stabilizing the magnetism of a permanent magnet, including: providing a permanent magnet substrate.
  • the permanent magnet substrate includes a plurality of faces and a magnetization direction.
  • the magnetization direction is perpendicular; provide a magnetic stabilizing material, which contains heavy rare earth elements; process the magnetic stabilizing material on the first side to form a first side film; the first side film is distributed along the first direction Have different film thicknesses, or, the first surface of the film has different concentrations of heavy rare earth elements in the distribution along the first direction, the first direction is a direction perpendicular to the magnetization direction; the pair is formed on the first surface
  • the permanent magnetic substrate after the film is subjected to the diffusion treatment of heavy rare earth elements.
  • the permanent magnet base material may be a base material made of neodymium iron boron material
  • the magnetic stabilizing material may be a simple metal or an alloy, and may also contain a slurry of a compound of heavy rare earth elements mixed with an organic solvent ,
  • the heavy rare earth elements can include elements such as dysprosium Dy or terbium Tb.
  • the permanent magnet substrate will have a magnetization direction, the first surface is perpendicular to the magnetization direction, take the permanent magnet substrate with a rectangular parallelepiped structure as an example, the magnetization direction is generally the direction of height, and the first surface is usually the upper or lower surface of the rectangular parallelepiped. .
  • the magnetization direction is also the height direction, and the first side is usually the upper surface or the lower surface of the round cake column.
  • the first direction is a direction perpendicular to the magnetization.
  • a direction perpendicular to the magnetization direction may be the length direction or the width direction of the rectangular parallelepiped.
  • physical sputtering methods can be used, such as: bombarding heavy rare earth elements with a target to form a thin film on the first surface of the permanent magnetic substrate, or chemical coating The slurry is applied on the first side.
  • the diffusion treatment process can be placed in a vacuum furnace and heat treated at a temperature of 900 degrees Celsius for 16 hours. After the diffusion treatment, heat treatment can be performed at a temperature of 450 degrees Celsius for 8 hours.
  • the specific temperature value and time length are not limited to the 900 degrees for 16 hours and 450 degrees for 8 hours listed here, and other values can be used as long as the diffusion treatment of heavy rare earth elements can be completed. It can be seen from the first aspect that during the process of permanent magnet stabilization, the film on the first side has a different film thickness or a different concentration of heavy rare earth elements on the first side. In this way, after the film diffuses, the magnetic stabilization permanent magnet is obtained.
  • the heavy rare earth elements are dispersed in different concentrations along the direction perpendicular to the magnetization direction.
  • the first aspect meets the differentiated anti-demagnetization requirements of the magnetic stabilized permanent magnet at different positions, only the thin film is formed on the first surface also saves the amount of heavy rare earth elements used, and reduces the cost of the magnetic stabilized permanent magnet
  • the thickness of the film on the first surface or the concentration of heavy rare earth elements it is possible to realize on-demand customization of the magnetically stable permanent magnet.
  • the film thickness of the film on the first surface first decreases and then increases.
  • the concentration of heavy rare earth elements in the film on the first surface is usually the same, and the film thickness of the film on the first surface is different, along the first direction, from one end of the first surface to the other end of the film thickness Decrease first and then rise, it can be a proportional decrease and then a gradient rise, or it can be a continuous decrease and then rise.
  • the inflection point from lowering to rising is usually the midline of the first surface. It can be understood that the film thickness decreases gradually from one end of the first surface to the midline. From the midline to the other end, the film thickness increases gradually.
  • the coercive force corresponds to the concentration of heavy rare earth elements, and it will be large on both sides and small in the middle, which can just meet the requirement of large anti-demagnetization at the edge of the permanent magnet and low requirement of the center anti-demagnetization.
  • the concentration of the heavy rare earth element in the film on the first surface is first reduced and then increased.
  • the film thickness of the film on the first side may be the same, but the concentration of heavy rare earth elements in the different regions of the film on the first side is not all the same.
  • the increase can be a proportional decrease and then a gradient increase, or a continuous decrease and then increase.
  • the inflection point from decreasing to rising is usually the midline of the first surface. It can be understood that from one end of the first surface to the midline, the concentration of heavy rare earth elements shows a gradient downward trend. From the midline to the other end, the concentration of heavy rare earth elements is The trend of rising gradient.
  • the coercive force corresponds to the concentration of heavy rare earth elements, and it will be large on both sides and small in the middle, which can just meet the requirement of large anti-demagnetization at the edge of the permanent magnet and low requirement of the center anti-demagnetization.
  • the film on the first surface is divided into multiple film regions according to the film thickness or the concentration of heavy rare earth elements, wherein the film thicknesses of the multiple film regions are different, or , The concentration of heavy rare earth elements in multiple film regions is different.
  • the film on the first surface may include multiple film regions, and these film regions may be continuous or discontinuous.
  • the film thickness of different film regions is different, or the weight of different film regions is different.
  • the concentration of rare earth elements is not the same. In this possible implementation manner, the change of the film thickness or the change of the concentration of heavy rare earth elements can be easily controlled by means of the film area.
  • the thickness of the middle part of the film on the first surface is lower than the two end areas, or the concentration of heavy rare earth elements in the middle part is lower than the two end areas.
  • the multiple surfaces further include a second surface, the second surface is perpendicular to the magnetization direction, and the second surface and the first surface are respectively located on opposite sides of the permanent magnetic substrate.
  • the magnetic stabilization method further includes: processing the magnetic stabilizing material on the second side to form a second side film, the second side film has a different film thickness in the distribution along the first direction, or the second side film is The distribution in the first direction has different concentrations of heavy rare earth elements, and the heavy rare earth element diffusion treatment is performed on the permanent magnet substrate after the thin film is formed on the second surface.
  • the first surface and the second surface perpendicular to the magnetization direction are opposite surfaces, and these two surfaces are located on opposite sides of the permanent magnetic substrate.
  • the first surface and the second surface are usually two surfaces. Parallel faces that are parallel to each other.
  • the first surface and the second surface are usually the upper surface and the lower surface of the rectangular parallelepiped.
  • the first side and the second side are usually the upper surface and the lower surface of the round cake column.
  • the process of forming the film on the second surface and the diffusion treatment can be understood with reference to the process of forming the film on the first surface and the film diffusion treatment on the first surface in the first aspect described above. It can be seen from this possible implementation that a thin film is formed on both the first surface and the second surface, so that the inside of the magnetically stable permanent magnet obtained by the permanent magnet substrate with a larger thickness can contain heavy rare earth elements.
  • processing the magnetic stabilizing material on the second surface to form a thin film on the second surface includes: placing the magnetic stabilizing material on the first surface. After the first side film is formed, the permanent magnetic substrate is turned over 180° to the second side, and then processed on the second side to form the second side film.
  • the thickness change or concentration change of the film on the second surface along the first direction is the same as the thickness change or concentration change of the film on the first surface along the first direction. Consistent or identical.
  • the film thickness of the film on the second side is consistent with the film thickness of the film on the first side in the first direction.
  • the change location, change trend, or change range are corresponding.
  • the film thickness of the film on the first surface at position 1 is greater than the film thickness at position 2
  • the film thickness of the film on the second surface at the position corresponding to position 1 is greater than that on the second surface. 2
  • the same thickness change means that the change position, change trend, or change amplitude of the film thickness on the first surface and the second surface are the same.
  • the concentration of the heavy rare earth element in the film on the second surface is consistent with the concentration of the heavy rare earth element in the film on the first surface along the first direction.
  • the change position, change trend or change amplitude of the film is consistent, and it can also be understood as corresponding.
  • the concentration of heavy rare earth elements in the first surface of the film at position 1 is greater than the film thickness at position 2, then the second surface
  • the concentration of the heavy rare earth element at the position corresponding to position 1 on the second surface of the film is greater than the concentration at the position corresponding to position 2 on the second surface.
  • the same concentration change means that the change position, change trend, or change range of the concentration of the heavy rare earth element on the first surface and the second surface are the same.
  • the thickness change or concentration change of the film on the first surface and the second surface is the same or the same, so that the concentration of the heavy rare earth element in the obtained magnetically stable permanent magnet is basically symmetrical along the center line of the length direction.
  • the distribution is conducive to improving the coercive force of the overall magnetic stabilizing permanent magnet.
  • the distance between the first surface and the second surface is H, and the H ⁇ 10 mm.
  • the height of the magnetization direction H is more conducive to the diffusion of heavy rare earth elements to the center of the permanent magnetic substrate when the film is diffused.
  • the content of heavy rare earth elements in the permanent magnetic substrate is zero.
  • the permanent magnet substrate may be a zero rare earth substrate, that is, the permanent magnet substrate does not contain heavy rare earth elements, which can reduce the cost of the permanent magnet substrate.
  • the magnetic stabilizing material is a simple metal material, and the simple metal material includes at least one of dysprosium Dy element or terbium Tb element.
  • the magnetic stabilizing material is an alloy
  • the alloy includes at least one of dysprosium Dy element or terbium Tb element, and at least one of the following elements: copper Cu, cobalt Co, aluminum Al , Calcium Ga, Niobium Nb, Titanium Ti, Vanadium V, Molybdenum Mo and Silicon Si.
  • the magnetic stabilizing material is a slurry, and the slurry includes at least one of a compound containing dysprosium element or a compound containing terbium element, and an organic solvent;
  • the compound containing dysprosium element includes fluorinated At least one of dysprosium, dysprosium oxide, or dysprosium hydride;
  • the compound containing terbium element includes at least one of terbium fluoride, terbium oxide, or terbium hydride, and the organic solvent includes at least one of an alcohol solvent, a ketone solvent, or an ester solvent.
  • the alloy composition of the permanent magnetic substrate includes rare earth metal RE, iron Fe, boron B or transition metal M, where RE is at least one of the following elements: neodymium Nd , Praseodymium Pr, dysprosium Dy, lanthanum La, cerium Ce, yttrium Y, holmium Ho, terbium Tb or gadolinium Gd; M is at least one of the following elements: cobalt Co, copper Cu, niobium Nb, calcium Ga, aluminum Al, Zinc Zn, nickel Ni, silicon Si, zirconium Zr, molybdenum Mo, vanadium V or titanium Ti.
  • RE is at least one of the following elements: neodymium Nd , Praseodymium Pr, dysprosium Dy, lanthanum La, cerium Ce, yttrium Y, holmium Ho, terbium Tb or gadolinium Gd
  • M is at least one of the following elements: cobalt Co,
  • the second aspect of the present application provides a magnetic stabilized permanent magnet.
  • the magnetic stabilized permanent magnet includes a magnetization direction.
  • the magnetic stabilized permanent magnet contains heavy rare earth elements. There are different densities in the direction perpendicular to the magnetization direction.
  • the permanent magnet can be applied to fields such as new energy vehicles, wind power generation, energy-saving home appliances, and smart manufacturing.
  • the permanent magnet can be a neodymium iron boron permanent magnet.
  • the permanent magnet has a magnetization direction.
  • the first surface and the second surface perpendicular to the magnetization direction are opposite surfaces.
  • the first surface and the second surface are usually two parallel to each other. noodle.
  • the magnetization direction is generally a height direction
  • the first surface and the second surface are generally the upper surface and the lower surface of the rectangular parallelepiped.
  • the magnetization direction is also the height direction, and the first and second sides are usually the upper and lower surfaces of the round cake cylinder.
  • the heavy rare earth elements may include elements such as dysprosium Dy or terbium Tb.
  • the heavy rare earth elements have different concentration distributions along the direction perpendicular to the magnetization direction. The different element concentrations can meet the differentiated anti-demagnetization requirements of different positions of the permanent magnet.
  • the concentration of the heavy rare earth element in the direction perpendicular to the magnetization direction of the magnetization permanent magnet, the concentration of the heavy rare earth element first decreases and then increases. It can also be understood that on any parallel plane, along the first direction, from one end of the parallel plane to the other end, the concentration of the heavy rare earth element first decreases and then increases.
  • the first direction is a direction perpendicular to the magnetization direction on the parallel plane. .
  • the first direction is a direction perpendicular to the magnetization.
  • a direction perpendicular to the magnetization direction may be the length direction or the width direction of the rectangular parallelepiped.
  • the concentration of heavy rare earth elements can be decreased and then increased in an equal proportion, or can be continuously decreased and then increased.
  • the inflection point from lowering to rising is usually the midline of the parallel planes, which can be understood as starting from one end of the parallel plane to the midline, the concentration of heavy rare earth elements shows a gradient downward trend, from the midline to the other end, the concentration of heavy rare earth elements shows a gradient rise the trend of.
  • the concentration of heavy rare earth elements on the parallel plane will be large on both sides and small in the middle, and the coercive force will correspond to the concentration of heavy rare earth elements, and it will also be large on both sides and small in the middle. Larger, less demand for center anti-demagnetization.
  • the concentration of heavy rare earth elements in the middle part of the magnetization permanent magnet is lower than that in the two ends.
  • the heavy rare earth element includes at least one of dysprosium Dy element or terbium Tb element.
  • the heavy rare earth element includes at least one of Dy element or terbium Tb element, and at least one of the following elements: copper Cu, cobalt Co, aluminum Al, calcium Ga, niobium Nb , Titanium Ti, Vanadium V, Molybdenum Mo or Silicon Si.
  • the magnetization permanent magnet has a first surface and a second surface perpendicular to the magnetization direction, and the first surface and the second surface are respectively located on opposite sides of the magnetization permanent magnet ,
  • the distance between the first surface and the second surface is H, H ⁇ 10mm.
  • the height H of the magnetization direction is less than or equal to 10 mm, which is more conducive to the diffusion of heavy rare earth elements to the center of the permanent magnetic substrate when the film is diffused.
  • H H ⁇ 5 mm.
  • the height of the magnetization direction is less than or equal to 5 mm, which is conducive to saving heavy rare earth elements.
  • a third aspect of the present application provides a permanent magnet motor, including: a rotor and a stator; wherein the rotor includes a rotor iron core, and a magnetic stabilizing permanent magnet inserted into a slot of the rotor iron core, and the magnetic stabilizing permanent magnet is the second aspect or the first aspect described above.
  • FIG. 1 is a schematic diagram of an embodiment of a method for stabilizing a permanent magnet provided by an embodiment of the present application
  • FIG. 2 is a schematic diagram of a structure of a permanent magnetic substrate provided by an embodiment of the present application.
  • FIG. 3 is a schematic diagram of an example of a method for stabilizing a permanent magnet provided by an embodiment of the present application
  • FIG. 4 is a schematic diagram of another example of the permanent magnet magnetization stabilization method provided by the embodiment of the present application.
  • FIG. 5 is a schematic diagram of another example of a method for stabilizing a permanent magnet provided by an embodiment of the present application.
  • FIG. 6 is a schematic diagram of another example of a permanent magnet magnetic stabilization method provided by an embodiment of the present application.
  • FIG. 7 is a schematic diagram of another example of a method for stabilizing a permanent magnet provided by an embodiment of the present application.
  • FIG. 8 is a schematic diagram of a concentration distribution of a magnetically stabilized permanent magnet provided by an embodiment of the present application.
  • FIG. 9 is a schematic diagram of a comparison between the design of coercivity and the test result provided by the embodiment of the present application.
  • FIG. 10 is another schematic diagram of comparison between the design of coercivity and the test result provided by the embodiment of the present application.
  • the embodiments of the present application provide a method for stabilizing permanent magnets, a permanent magnet stabilizing permanent magnets, and a permanent magnet motor, which can use less heavy rare earth (HRE) elements to increase the coercivity of the permanent magnet as a whole.
  • HRE heavy rare earth
  • Permanent magnets are widely used in fields such as new energy vehicles, wind power generation, energy-saving home appliances, and smart manufacturing.
  • a permanent magnet motor in a new energy vehicle needs to include a permanent magnet.
  • the method for stabilizing the permanent magnet, the permanent magnet and the permanent magnet motor provided in the embodiments of the present application will be introduced below.
  • FIG. 1 is a schematic diagram of an embodiment of a method for stabilizing a permanent magnet provided by an embodiment of the application.
  • an embodiment of the permanent magnet magnetic stabilization method provided by the present application includes:
  • the permanent magnetic substrate includes a plurality of surfaces and a magnetization direction, the plurality of surfaces includes a first surface and a second surface, the first surface and the second surface are opposite surfaces perpendicular to the magnetization direction, that is, the first surface and the second surface
  • the two sides are respectively located on opposite sides of the permanent magnetic base material.
  • the permanent magnet substrate is described by taking a neodymium iron boron substrate as an example, and it can also be other substrates similar to neodymium iron boron materials.
  • the neodymium iron boron substrate can be prepared by a sintering process, the average crystal grain size can be 1-10 microns ( ⁇ m), and its coercivity is usually ⁇ 1410 (kA/m) kA/m.
  • Coercive force is an index used to evaluate the quality of permanent magnets. Coercive force refers to that after the magnetic material is saturated and magnetized, when the external magnetic field returns to zero, the magnetic induction intensity B does not return to zero, only in the original magnetization. Only by adding a certain magnitude of magnetic field to the opposite direction of the field can the magnetic induction intensity return to zero. This magnetic field is called coercive magnetic field, also called coercive force.
  • the neodymium iron boron substrate can be processed into a block substrate, and the processed block substrate can be alkali washed, acid washed, rinsed with deionized water and dried.
  • Magnetic substrate The permanent magnetic substrate of the embodiment of the present application can be understood with reference to the structure shown in FIG. 2. As shown in FIG. In combination with the rectangular parallelepiped permanent magnetic substrate shown in Figure 2, the height (H) from the bottom to the top can be used as the magnetization direction 10 of the permanent magnetic substrate, and the upper and lower surfaces perpendicular to the height can be used as the first One side 20 and second side 30.
  • the content of heavy rare earth elements in the permanent magnetic substrate is zero.
  • This kind of substrate can also be called a zero rare earth substrate, that is, the permanent magnetic substrate does not contain heavy rare earth elements, which can reduce the cost of the permanent magnetic substrate.
  • the magnetic stabilizing material contains heavy rare earth (HRE) elements.
  • the magnetic stabilizing material can be a simple metal, an alloy, or a slurry of a compound containing a heavy rare earth element mixed with an organic solvent.
  • the magnetic stabilizing material is a metal element, and the metal element includes at least one of dysprosium Dy element or terbium Tb element.
  • the magnetic stabilizing material is an alloy, which includes at least one of dysprosium Dy element or terbium Tb element, and at least one of the following elements: copper Cu, cobalt Co, aluminum Al, calcium Ga, niobium Nb, titanium Ti, vanadium V, molybdenum Mo or silicon Si.
  • the magnetic stabilizing material is a slurry, and the slurry includes at least one of a compound containing dysprosium element or a compound containing terbium element, and an organic solvent.
  • the compound containing dysprosium element includes at least one of dysprosium fluoride, dysprosium oxide, or dysprosium hydride;
  • the compound containing terbium element includes at least one of terbium fluoride, terbium oxide or terbium hydride, and organic solvents include alcohol solvents and ketone solvents Or at least one of ester solvents.
  • the method of preparing a slurry containing terbium element may be: mixing raw materials for preparation such as terbium fluoride powder, ethyl acetate and solvent glue, and then stirring, so that a slurry containing terbium element can be obtained.
  • the average particle size of the terbium fluoride powder can be 5 microns (um)
  • the weight of ethyl acetate can be several times the weight of the terbium fluoride powder, for example: 3 times
  • the concentration of the solvent glue can be 10wt%, where wt % Means percentage by weight.
  • the method of preparing a slurry containing dysprosium element can be: mixing raw materials for preparation such as dysprosium fluoride, ethyl acetate and solvent glue, and then stirring, so that a slurry containing dysprosium element can be obtained.
  • the average particle size of the dysprosium fluoride powder can be 5 microns
  • the weight of ethyl acetate can be 3.5 times the weight of the terbium fluoride powder
  • the concentration of the solvent glue can be 11 wt%.
  • the film on the first side is distributed along the first direction on the first side, and the film thicknesses in different regions are not all the same, that is, the film on the first side has different film thicknesses along the first direction on the first side 20; or, The concentrations of heavy rare earth elements in different regions of the film on one side are not all the same, that is, the concentration of heavy rare earth elements on the first side of the film on the first side 20 is different in the first direction; wherein, the first direction is the first side. A direction perpendicular to the magnetization direction 10 on 20.
  • the first side film has different film thicknesses on the first side 20, which can be understood by referring to the schematic diagram of the permanent magnetic substrate after the first side film is formed as shown in FIG. 3.
  • the first direction 40 may be a direction from one end of the length L1 to the other end on the first surface 20.
  • the first direction 40 is not limited to the first surface 20, as long as it is the same direction as this direction, it can be called the first direction.
  • the first side film has different film thicknesses on the first side 20, which can be as shown in FIG. 3. On the first side 20, along the length direction, from one end to the other, the film thickness first decreases and then increases.
  • the change process can be a gradient change, that is, from one end to the other, the film thickness first decreases and then increases.
  • the areas between the films of different thicknesses shown in Figure 3 are adjacent. In fact, the areas can also be spaced apart. The slight intervals between the areas are compared when the first-side film is formed. It is easy to operate, and it can also save magnetic stabilizing materials. Films of different thicknesses on the first side of the film can also be referred to as a film area, and the film area is divided according to the film thickness.
  • the film on the first side as shown in FIG. 3 may also be continuous.
  • the specific implementation manner can be understood by referring to another schematic diagram of the permanent magnetic substrate after the first-side thin film is formed as shown in FIG. 4. As shown in FIG. 4, the first side film on the first side 20 is along the length direction L of the first side 20, the film thickness on both sides is the largest, and the film thickness in the middle position is the smallest.
  • the film on the first side has different concentrations of heavy rare earth elements on the first side.
  • FIG. 5 is a schematic diagram of the permanent magnetic substrate after the film on the first side is formed. As shown in Figure 5, the film thickness on the first side film is the same, but the first side film has a different concentration of heavy rare earth elements.
  • the film on the first side as shown in FIG. 5 is continuous.
  • the thin films with different concentrations of heavy rare earth elements on the first surface of the thin film may also be referred to as a thin film area, and the thin film area is divided according to the concentration of heavy rare earth elements.
  • the number of areas on the first surface in FIGS. 3 to 5 is only an example, in fact, the number of areas on the first surface can be determined according to requirements.
  • the first surface is processed to form the first surface film.
  • Physical sputtering methods can be used, such as: bombarding heavy rare earth elements with a target to form a film on the first surface of the permanent magnet substrate, or by chemical coating Method, the slurry is coated on the first side. It is also possible to form a thin film on the first surface by methods such as electroplating and electrodeposition.
  • the diffusion treatment process can be placed in a vacuum furnace and heat treated at a temperature of 900 degrees Celsius for 16 hours. After the diffusion treatment, the heat treatment can be performed at a temperature of 450 degrees Celsius for 8 hours.
  • the specific temperature value and time length are not limited to the 900 degrees for 16 hours and 450 degrees for 8 hours listed here, and other values can be used as long as the diffusion treatment of heavy rare earth elements can be completed.
  • the film on the first side has a different film thickness or a different concentration of heavy rare earth elements on the first side.
  • the rare earth elements are dispersed in different concentrations along the direction perpendicular to the magnetization direction.
  • the first aspect meets the differentiated anti-demagnetization requirements of the magnetic stabilized permanent magnet at different positions, only the thin film is formed on the first surface also saves the amount of heavy rare earth elements used, and reduces the cost of the magnetic stabilized permanent magnet In addition, by controlling the thickness of the film on the first surface or the concentration of heavy rare earth elements, it is possible to realize on-demand customization of the magnetically stable permanent magnet.
  • the magnetic stabilized permanent magnet obtained by forming only the first side thin film on the first side and performing diffusion treatment usually has a small thickness.
  • the following solutions can also be used to stabilize the magnetic field.
  • step 104 is no longer performed, but the permanent magnetic substrate is turned over 180° to the second surface, and then step 105 and step 106 in FIG. 1 are performed.
  • the magnetic stabilizing material is processed on the second surface to form a film on the second surface.
  • the second-side film has a different film thickness in the distribution along the first direction, or the first-side film has a different concentration of heavy rare earth elements in the distribution along the first direction.
  • the thickness change or concentration change of the second-side film in the distribution along the first direction is consistent with or the same as the thickness change or concentration change of the first-side film in the distribution along the first direction.
  • the film thickness of the film on the second side is consistent with the film thickness of the film on the first side in the first direction. This refers to the position, trend, or amplitude of the change in the film thickness at the opposite position of the first side and the second side.
  • the film thickness of the film on the first surface at position 1 is greater than the film thickness at position 2
  • the film thickness of the film on the second surface at the position corresponding to position 1 is greater than that of the second film.
  • the same thickness change means that the change position, change trend, or change amplitude of the film thickness on the first surface and the second surface are the same.
  • the concentration of the heavy rare earth element in the film on the second surface is consistent with the concentration of the heavy rare earth element in the film on the first surface along the first direction. This refers to the concentration of the heavy rare earth element in the opposite position of the first surface and the second surface
  • the change position, change trend or change amplitude of the film is consistent, and it can also be understood as corresponding.
  • the concentration of heavy rare earth elements in the first surface of the film at position 1 is greater than the film thickness at position 2, then the second surface
  • the concentration of the heavy rare earth element at the position corresponding to position 1 on the second surface of the film is greater than the concentration at the position corresponding to position 2 on the second surface.
  • the same concentration change means that the change position, change trend, or change range of the concentration of the heavy rare earth element on the first surface and the second surface are the same.
  • the thickness changes on the first surface and the second surface are consistent.
  • the thickness of the film on the first surface and the second surface is symmetrical with respect to the permanent magnetic substrate, as shown in Figure 6, from the second surface. From both sides to the middle of the length direction of the surface 30, the film thickness decreases gradually, and the gradient change trend, change position and change amplitude of the film on the second surface are basically the same as the gradient change trend, change position and amplitude of the film on the first surface.
  • the film thickness of the film on the second surface is consistent with the film thickness of the film on the first surface in the first direction, which means that the film thickness at the opposite position of the first surface and the second surface is substantially the same.
  • the film thickness of the film area 0-2 mm from the left end on the first surface is 200 microns
  • the film thickness of the film area 0-2 mm from the left end on the second surface is also basically 200 microns.
  • the uniform thickness change means that the change position, change trend, or change amplitude of the concentration of the heavy rare earth element at the opposite position of the first surface and the second surface are basically the same.
  • FIG. 7 is a schematic diagram of the permanent magnetic substrate after the second-side film is formed. As shown in Figure 7, the thickness of the second-side film is the same, but the second-side film has a different concentration of heavy rare earth elements. In addition, the concentration of the heavy rare earth element in each region of the film on the second surface is substantially the same as the concentration of the heavy rare earth element in each region of the film on the first surface.
  • the concentration of heavy rare earth elements in the film area 0-2 mm from the left end on the first surface is 0.75wt%, (wt% represents weight percentage), then the weight of the film area 0-2 mm from the left end on the second surface is 0.75wt%
  • the concentration of rare earth elements is 0.75 wt%.
  • the second surface is processed to form the second surface film.
  • Physical sputtering methods can be used, such as: bombarding heavy rare earth elements with the target material to form a film on the second surface of the permanent magnet substrate, or by chemical coating In the method, the slurry is coated on the first side and dried, and then coated on the second side. It is also possible to form a thin film on the second surface by methods such as electroplating and electrodeposition.
  • the process of diffusion processing can be understood by referring to the corresponding content in step 104 above.
  • the thickness of the film corresponds to the concentration of heavy rare earth elements in the permanent magnet stabilized magnet after diffusion.
  • the concentration of the heavy rare earth element is large, and the concentration of the heavy rare earth element in the corresponding position in the magnetic stabilized permanent magnet corresponding to the region with a small film thickness after diffusion is small.
  • the region where the concentration of heavy rare earth elements is high before diffusion corresponds to the high concentration of heavy rare earth elements in the corresponding position in the magnetically stable permanent magnet corresponding to this region after diffusion.
  • the area where the concentration of the heavy rare earth element is small before the diffusion corresponds to the low concentration of the heavy rare earth element in the corresponding position in the magnetic stabilized permanent magnet corresponding to the area after the diffusion.
  • the concentration of the heavy rare earth element in the magnetically stabilized permanent magnet can be understood with reference to FIG. 8.
  • any one of the magnetically stable permanent magnets is parallel to the first surface 20 and the second surface 30, along the direction of the length L1, from one end of the permanent magnet to the other end (also called From the left to the right), the concentration of heavy rare earth elements also changes according to the trend of first gradient decline and then gradient rise, which is consistent with the arrangement trend of film thickness in the process of magnetic stabilization, or in the first and second sides of the film
  • the change trend of the concentration of heavy rare earth elements is the same.
  • the film on the first surface and the film on the second surface have different film thicknesses or different concentrations of heavy rare earth elements on different regions.
  • the magnetic stabilization permanent magnet is obtained Among them, the concentration of heavy rare earth elements in different regions corresponds to the thickness of the film or the concentration of heavy rare earth elements on the first and second surfaces.
  • this application satisfies the differentiated anti-demagnetization requirements of different positions of the magnetic stabilized permanent magnet, because it is not necessary to form a thin film containing heavy rare earth elements on all sides, and it also saves the amount of heavy rare earth elements used. , Reducing the cost of magnetically stable permanent magnets.
  • magnetically stable permanent magnets with different concentration distributions can be obtained, thereby realizing magnetically stable permanent magnets. On-demand customization of magnets.
  • the different film thicknesses or different concentrations of heavy rare earth elements in the examples of this application may include different or not exactly the same; not exactly the same means that the thickness of the film on some areas may be the same
  • the film thickness on the symmetrical area can be the same.
  • it can also be on the first surface 20 along the The concentration of heavy rare earth elements in the symmetrical area at both ends of the length direction of L1 is the same.
  • the film thickness of the film on the first surface first decreases and then rises.
  • the concentration of heavy rare earth elements in the film on the first side is usually the same, and the film thickness in different regions is first reduced and then increased, which can be a proportionally lower gradient and then a gradient rise, or it can be continuously reduced and then increased.
  • the inflection point from lowering to rising is usually the midline of the first surface. It can be understood that the film thickness decreases gradually from one end of the first surface to the midline. From the midline to the other end, the film thickness increases gradually.
  • the concentration of heavy rare earth elements on any parallel surface parallel to the first surface and the second surface in the magnetically stable permanent magnet will be on both sides Large and small in the middle, the coercivity corresponds to the concentration of heavy rare earth elements, and it will also be large on both sides and small in the middle, which can just meet the manufacturing requirements of high coercivity in the edge area of the permanent magnet and low coercivity in the center area.
  • the concentration of the heavy rare earth element in the film on the first surface first decreases and then increases.
  • the film thickness of the film on the first side can be the same, but different regions of the film on the first side have different concentrations of heavy rare earth elements.
  • concentration of heavy rare earth elements in different regions of the film on the first side decreases first and then increases.
  • the proportional gradient decreases and then the gradient increases, or it can be continuously decreased and then increased.
  • the inflection point from decreasing to rising is usually the midline of the first surface. It can be understood that from one end of the first surface to the midline, the concentration of heavy rare earth elements shows a gradient downward trend. From the midline to the other end, the concentration of heavy rare earth elements is The trend of rising gradient.
  • the concentration of the heavy rare earth element on the second side and the concentration of the heavy rare earth element on the first side have basically the same changing trend, and the position and amplitude of the change are also basically the same. .
  • the concentration of heavy rare earth elements on any parallel surface parallel to the first surface and the second surface in the magnetically stable permanent magnet will be on both sides Large and small in the middle, the coercive force corresponds to the concentration of heavy rare earth elements, and it will also be large on both sides and small in the middle, which can just meet the manufacturing requirements of high coercivity in the edge area of the magnetic stable permanent magnet and low coercivity in the center area.
  • This solution can be understood by referring to the corresponding content of the above-mentioned FIG. 5 and FIG. 7.
  • the distance between the first surface and the second surface is H, H ⁇ 10 mm, preferably, H ⁇ 5 mm. Limiting the height of the magnetization direction within a certain range can facilitate the diffusion of heavy rare earth elements to the center of the permanent magnetic substrate.
  • the thickness of the film corresponds to the concentration of the heavy rare earth element in the magnetically stabilized permanent magnet after diffusion. That is to say, the area with a large thickness of the film will correspond to the concentration of the heavy rare earth element in the corresponding position in the magnetically stabilized permanent magnet after diffusion. The concentration is high, and the area with a small film thickness will have a low concentration of heavy rare earth elements in the corresponding position in the magnetically stable permanent magnet after diffusion.
  • the relationship between the thickness of the film and the concentration of heavy rare earth elements in the permanent magnet after diffusion can be understood through the following two sets of experiments.
  • the heavy rare earth element is the Tb element.
  • the slurry containing the Tb element is coated with thin films of different thicknesses in different areas in the manner shown in FIG. 6 by using a chemical coating method.
  • thin films of different thicknesses are formed on the first surface and the second surface.
  • the average particle size of the terbium fluoride powder in the slurry can be 5 microns
  • the weight of ethyl acetate can be 3 times the weight of the terbium fluoride powder
  • the concentration of the solvent glue can be 10 wt%.
  • a parallel surface parallel to the first surface and the second surface can be cut, and the parallel surface can have a certain thickness, for example, 0.5 mm.
  • measure the weight percentage (wt%) of the Tb element at the seven sampling points according to the position indicated by the data in the first column, and the data in the third column in Table 1 will be obtained.
  • the sampling point at 11.75mm is located at the midline of the parallel plane.
  • the sampling point is located in the middle two areas, the three sampling points of 1mm, 2mm and 5mm.
  • the points are located in the first three areas to the left of the center line.
  • the three sampling points of 18.5mm, 21.5mm and 22.5mm are respectively located in the last three areas on the right side of the midline.
  • the film thickness on the first and second surfaces decreases first and then increases.
  • the concentration in the magnet also decreases first and then increases.
  • the film thickness in the L1 direction basically decreases first and then increases gradually, and the concentration of Tb element in the magnetically stabilized permanent magnet also basically decreases first and then increases gradually.
  • the magnetic stabilizing permanent magnet can be customized according to the demand for coercivity.
  • the customized demand for coercivity can be represented by line 1
  • the result of the experimental measurement of the coercive force of the magnetically stabilized permanent magnet actually obtained by the above-mentioned magnetic stabilization method can be represented by line 2.
  • the experimental test results of the magnetic stabilized permanent magnet obtained by the above-mentioned magnetic stabilized method basically meet the customization requirements.
  • the permanent magnet base material can be subjected to the above-mentioned magnetization stabilization process according to customized requirements, so as to obtain magnetism stabilization permanent magnets that meet the customized requirements.
  • Table 1 and Figure 9 above reflect the experimental data of the Tb element.
  • the following second set of experiments introduces the experimental data of dysprosium (Dy) element through Table 2 and Figure 10.
  • the heavy rare earth element is the Dy element.
  • the slurry containing the Dy element is coated with thin films of different thicknesses on different areas in the manner shown in FIG. 6 by a chemical coating method. Thus, thin films of different thicknesses are formed on the first and second surfaces.
  • the average particle size of the dysprosium fluoride powder in the slurry can be 5 microns, the weight of ethyl acetate can be 3.5 times the weight of the dysprosium fluoride powder, and the concentration of the solvent glue can be 11 wt%.
  • a parallel surface parallel to the first surface and the second surface can be cut, and the parallel surface can have a certain thickness, for example, 0.5 mm.
  • measure the weight percentage (wt%) of the Dy element at the seven sampling points according to the position indicated by the data in the first column, and the data in the third column in Table 2 will be obtained.
  • the sampling point at 11.75mm is located at the midline of the parallel plane.
  • the sampling point is located in the middle two areas, the three sampling points of 1mm, 2mm, and 5mm.
  • the points are located in the first three areas to the left of the center line.
  • the three sampling points of 18.5mm, 21.5mm and 22.5mm are respectively located in the last three areas on the right side of the midline.
  • the film thickness on the first and second surfaces decreases first and then increases.
  • the concentration in the magnet also decreases first and then increases.
  • the thickness of the film in the L1 direction basically decreases first and then increases gradually from left to right, and the concentration of Dy element in the magnetically stabilized permanent magnet also basically decreases first and then increases gradually.
  • the change trend of the concentration of the Dy element in the magnetic stabilized permanent magnet also reflects the change trend of the coercivity of the magnetic stabilized permanent magnet. Therefore, the magnetic stabilized permanent magnet can be customized according to the demand for coercivity. As shown in Figure 10, the customized demand for coercivity can be represented by line 3, and the result of the experimental measurement of the change trend of the coercive force of the magnetic stabilized permanent magnet actually obtained by the above-mentioned magnetic stabilization method can be represented by line 4. It can be seen that the experimental test results of the magnetic stabilized permanent magnet obtained by the above-mentioned magnetic stabilized method basically meet the customization requirements. In this way, the permanent magnet base material can be subjected to the above-mentioned magnetization stabilization process according to customized requirements, so as to obtain magnetism stabilization permanent magnets that meet the customized requirements.
  • the embodiments of the present application also provide a magnetic stable permanent magnet, the magnetic stable permanent magnet has a magnetization direction, the magnetic stable permanent magnet contains heavy rare earth elements, and the heavy rare earth elements are dispersed in the magnetic stable permanent magnet, and There are different densities along the direction perpendicular to the magnetization direction.
  • the magnetization permanent magnet may include a plurality of surfaces, including a first surface and a second surface, and the first surface and the second surface are opposite surfaces perpendicular to the magnetization direction. Any one parallel surface parallel to the second surface has different concentrations of heavy rare earth elements.
  • the concentration of the heavy rare earth element first decreases and then increases. It can also be understood that, on any parallel plane, along the first direction, from one end of the parallel plane to the other end, the concentration of heavy rare earth elements first decreases and then rises.
  • the first direction is the one perpendicular to the magnetization direction on the parallel plane. direction.
  • the concentration of heavy rare earth elements in the central part of the magnetically stabilized permanent magnet is lower than the surroundings.
  • the heavy rare earth element includes at least one of dysprosium Dy element or terbium Tb element.
  • the heavy rare earth element includes at least one of Dy element or terbium Tb element, and at least one of the following elements: copper Cu, cobalt Co, aluminum Al, calcium Ga, niobium Nb, titanium Ti, vanadium V, molybdenum Mo or silicon Si.
  • the distance between the first surface and the second surface is H, H ⁇ 10 mm, preferably, H ⁇ 5 mm. Limiting the height of the magnetization direction within a certain range can facilitate the diffusion of heavy rare earth elements to the center of the substrate.
  • the magnetic stabilization permanent magnet may be a magnetic stabilization permanent magnet obtained by the above-mentioned permanent magnet stabilization method.
  • the structure and characteristics of the magnetic stabilization permanent magnet can be understood with reference to the experimental data in Fig. 8 and Table 1 and Table 2 in the above embodiment. , I won’t repeat it here.
  • the embodiment of the present application also provides a permanent magnet motor, the permanent magnet motor includes: a rotor and a stator; the rotor includes a rotor core, and a magnetic stabilizing permanent magnet inserted into a slot of the rotor core, and the magnetic stabilizing permanent magnet adopts the above A permanent magnet with corresponding magnetic stabilization characteristics prepared by a magnetic stabilization method.
  • a continuous or discontinuous film is formed along a single direction (for example, the length direction or the width direction of the rectangular parallelepiped substrate) on the surface perpendicular to the magnetization direction.
  • a continuous heavy rare-earth concentration distribution will be formed in the section of the magnetization direction to realize the enhancement of the coercive force gradient and meet the application requirements.
  • the embodiments of the present application can use zero heavy rare earth element base materials for diffusion, so that the coercivity of the magnet edge and the magnet center are simultaneously It achieves different degrees of enhancement effects, and can also meet the differentiated anti-demagnetization requirements of different positions of the magnet while reducing the cost of the permanent magnet substrate.
  • the film thickness or the concentration of heavy rare earth elements on the surface of the permanent magnet substrate can be precisely designed according to the coercive force requirements of the motor for the different positions of each permanent magnet section of the rotor, and the design is achieved after thermal diffusion treatment.
  • the required heavy rare earth concentration distribution and coercive force distribution can maximize the use of the magnetic properties of permanent magnet materials.

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Abstract

一种稳磁永磁体，可以应用于新能源汽车、风力发电、节能家电、智能制造等领域。该稳磁永磁体包括一个磁化方向（10），该稳磁永磁体中包含重稀土元素，重稀土元素分散在稳磁永磁体中，且在沿着与磁化方向垂直的方向（40）上具有不同浓度。该稳磁永磁体在做稳磁处理时只需要在永磁基材的第一面（20）上形成不同厚度的薄膜或者不同重稀土元素的浓度的薄膜，就可以得到满足不同位置差异化的抗退磁需求的稳磁永磁体，而且还节省了重稀土元素的使用量。

Description

一种永磁体的稳磁方法、稳磁永磁体及永磁电机 技术领域
本申请涉及永磁材料领域，具体涉及一种永磁体的稳磁方法、稳磁永磁体及永磁电机。
背景技术
钕铁硼永磁材料以其优异的磁性能被广泛应用于新能源汽车、风力发电、节能家电、智能制造等领域，促进了全球节能、环保、低碳等绿色理念经济的发展。新的发展及应用对永磁材料提出了更高的要求，特别是新能源汽车，其驱动电机既要求永磁材料有着高的剩磁和最大磁能积，还要求具备高的矫顽力。这种车用永磁体因为含有高含量的镝Dy、铽Tb等重稀土(heavy rare earth，HRE)元素，价格较高，使永磁材料成本在永磁电机中占比达30％以上。
为降低重稀土元素的使用量，近十年来，重稀土扩散技术取得突破，并获得广泛应用。常规的重稀土元素扩散工艺为通过物理或化学的方法，在钕铁硼基材表面形成一层厚度均匀的Dy或Tb等重稀土元素的薄膜或富含Dy或Tb元素的化合物薄膜，然后经过高温热处理，使得Dy或Tb等重稀土元素从钕铁硼基材表面沿晶界扩散至钕铁硼基材的内部，使得钕铁硼永磁体的整体矫顽力得到增强。这种方法由于涂覆面积较大，导致需要耗费大量的重稀土元素。
发明内容
本申请实施例提供一种永磁体的稳磁方法、稳磁永磁体及永磁电机，可以使用较少的重稀土(heavy rare earth，HRE)元素来提高永磁体整体的矫顽力。
本申请第一方面提供一种永磁体的稳磁方法，包括：提供永磁基材，该永磁基材包括多个面和一个磁化方向，多个面中包括第一面，第一面与磁化方向垂直；提供稳磁材料，该稳磁材料中包含重稀土元素；将稳磁材料在第一面上进行处理，形成第一面薄膜；该第一面薄膜在沿第一方向的分布上具有不同的薄膜厚度，或者，该第一面薄膜在沿第一方向的分布上具有不同的重稀土元素的浓度，该第一方向为与磁化方向相垂直的一个方向；对在第一面形成薄膜后的永磁基材，进行重稀土元素的扩散处理。
该第一方面中，永磁基材可以是以钕铁硼材料制作的基材，稳磁材料可以是金属单质，也可以是合金，还可以包含重稀土元素的化合物与有机溶剂混合后的浆液，重稀土元素可以包括镝Dy或铽Tb等元素。永磁基材会有一个磁化方向，第一面与该磁化方向垂直，以长方体结构的永磁基材为例，磁化方向一般是高度的方向，第一面通常是长方体的上表面或下表面。以圆饼柱体结构的永磁基材为例，磁化方向也是高度的方向，第一面通常是圆饼柱体的上表面或下表面。第一方向是与磁化方面垂直的一个方向，以长方体结构的永磁基材为例，与磁化方向垂直的一个方向可以是长方体的长度方向或宽度方向。在第一面上进行处理形成薄膜，可以采用物理溅射方法，如：通过靶材轰击重稀土元素在永磁基材的在第一面上形成薄膜，也可以通过化学涂覆的方法，将浆液在第一面上进行涂覆。还可以通过电镀、电沉积等方法在第一面上形成薄膜。扩散处理的过程，可以是放入真空炉中，在900摄氏度的温度下进行16小时的热处理。扩散处理后还可以在450摄氏度的温度下进行8 小时的热处理。当然，具体的温度值和时间长度不限于这里列举的900度16小时，450度8小时，还可以是其他数值，只要能完成重稀土元素的扩散处理即可。由该第一方面可知，在永磁体稳磁过程中，第一面薄膜在第一面上具有不同的薄膜厚度或者具有不同的重稀土元素的浓度，这样，薄膜扩散后得到稳磁永磁体中重稀土元素分散在沿着与磁化方向垂直的方向上具有不同浓度。这样该第一方面在满足了稳磁永磁体不同位置差异化的抗退磁需求的前提下，只在第一面上形成薄膜还节省了重稀土元素的使用量，降低了稳磁永磁体的成本，另外，通过对第一面上薄膜厚度或者重稀土元素的浓度的控制，可以实现稳磁永磁体的按需定制。
在第一方面一种可能的实现方式中，在第一面上，沿着第一方向，从第一面的一端到另一端，第一面薄膜的薄膜厚度先降低再增加。
该种可能的实现方式中，第一面薄膜的重稀土元素的浓度通常是相同的，第一面薄膜的薄膜厚度不同，沿着第一方向，从第一面的一端到另一端的薄膜厚度先降低再上升，可以是等比例的梯度降低再梯度上升，也可以是连续的降低再上升。从降低到上升的拐点通常是第一面的中线，可以理解为从第一面的一端开始到中线，薄膜厚度呈梯度下降的趋势，从中线到另一端，薄膜厚度呈梯度上升的趋势。矫顽力与重稀土元素的浓度相对应，也会是两边大中间小，正好可以满足稳磁永磁体边沿抗退磁的需求大，中心抗退磁的需求小的需求。
在第一方面一种可能的实现方式中，在第一面上，沿着第一方向，从第一面的一端到另一端，第一面薄膜的重稀土元素的浓度先降低再增加。
该种可能的实现方式中，第一面薄膜的薄膜厚度可以是相同的，但第一面薄膜的不同区域的重稀土元素的浓度不全相同，第一面薄膜的重稀土元素的浓度先降低再上升，可以是等比例的梯度降低再梯度上升，也可以是连续的降低再上升。从降低到上升的拐点通常是第一面的中线，可以理解为从第一面的一端开始到中线，重稀土元素的浓度呈梯度下降的趋势，从中线到另一端，重稀土元素的浓度呈梯度上升的趋势。矫顽力与重稀土元素的浓度相对应，也会是两边大中间小，正好可以满足稳磁永磁体边沿抗退磁的需求大，中心抗退磁的需求小的需求。
在第一方面一种可能的实现方式中，在第一面上，第一面薄膜按照薄膜厚度或重稀土元素的浓度分为多个薄膜区域，其中，多个薄膜区域的薄膜厚度不同，或者，多个薄膜区域的重稀土元素的浓度不同。
该种可能的实现方式中，第一面上的薄膜可以包括多个薄膜区域，这些薄膜区域可以是连续的也可以是不连续的，不同薄膜区域的薄膜厚度不相同，或者不同薄膜区域的重稀土元素的浓度不相同。该种可能的实现方式中，通过薄膜区域的方式可以便于控制薄膜厚度的变化，或者重稀土元素的浓度的变化。
在第一方面一种可能的实现方式中，沿着第一方向上，第一面薄膜中间部位的厚度低于两端区域，或者，中间部位的重稀土元素的浓度低于两端区域。
在第一方面一种可能的实现方式中，多个面中还包括第二面，第二面与磁化方向垂直，且第二面与第一面分别位于永磁基材相对的两侧，该稳磁方法还包括：将稳磁材料在第二 面上进行处理，形成第二面薄膜，第二面薄膜在沿第一方向的分布上具有不同的薄膜厚度，或者，第二面薄膜在沿第一方向的分布上具有不同的重稀土元素的浓度，对在第二面形成薄膜后的永磁基材，进行重稀土元素的扩散处理。
该种可能的实现方式中，与该磁化方向垂直的第一面和第二面是相对面，这两个面位于永磁基材相对的两侧，第一面和第二面通常也是两个相互平行的平行面。以长方体结构的永磁基材为例，第一面和第二面通常是长方体的上表面和下表面。以圆饼柱体结构的永磁基材为例，第一面和第二面通常是圆饼柱体的上表面和下表面。在第二面上形成薄膜和扩散处理的过程可以参阅上述第一方面中在第一面上形成薄膜以及第一面薄膜扩散处理的过程进行理解。由该种可能的实现方式可知，在第一面和第二面上都形成薄膜，可以使得通过厚度较大的永磁基材得到的稳磁永磁体的内部都能包含重稀土元素。
在第一方面一种可能的实现方式中，上述步骤：将所述稳磁材料在所述第二面上进行处理，形成第二面薄膜包括：在将所述稳磁材料在所述第一面上进行处理，形成第一面薄膜之后，将所述永磁基材翻转180°翻至所述第二面，再在所述第二面上进行处理，形成所述第二面薄膜。
在第一方面一种可能的实现方式中，第二面薄膜在沿第一方向的分布上的厚度变化或浓度变化，与第一面薄膜在沿第一方向的分布上的厚度变化或浓度变化一致或相同。
该种可能的实现方式中，第二面薄膜的薄膜厚度与第一面薄膜的薄膜厚度在沿第一方向上的厚度变化一致指的是第一面和第二面相对的位置的薄膜厚度的变化位置、变化趋势或者变化幅度是相应的。比如，第一面薄膜在第一面位置1的薄膜厚度大于在位置2的薄膜厚度，则第二面薄膜在第二面上与位置1对应的位置处的薄膜厚度大于第二面上与位置2对应的位置处的薄膜厚度。厚度变化相同指的是第一面和第二面上薄膜厚度的变化位置、变化趋势或者变化幅度都相同。第二面薄膜的重稀土元素的浓度与第一面薄膜的重稀土元素的浓度在沿第一方向上的浓度变化一致指的是第一面和第二面相对的位置的重稀土元素的浓度的变化位置、变化趋势或者变化幅度是一致的，也可以理解为相应的，比如，第一面薄膜在第一面位置1的重稀土元素的浓度大于在位置2的薄膜厚度，则第二面薄膜在第二面上与位置1对应的位置处的重稀土元素的浓度大于第二面上与位置2对应的位置处的浓度。浓度变化相同指的是第一面和第二面上重稀土元素的浓度的变化位置、变化趋势或者变化幅度都相同。由该种可能的实现方式可知，第一面和第二面上薄膜的厚度变化或者浓度变化一致或相同可以使得到的稳磁永磁体中重稀土元素的浓度沿着长度方向的中线基本呈对称分布，有利于提升稳磁永磁体整体的矫顽力。
在第一方面一种可能的实现方式中，第一面和第二面的距离为H，所述H≤10毫米。
磁化方向的高度H≤10毫米，更有利于在薄膜扩散时重稀土元素扩散到永磁基材的中心。
在第一方面一种可能的实现方式中，永磁基材中重稀土元素的含量为零。
该种可能的实现方式中，该永磁基材可以是零稀土基材，也就是该永磁基材中不包含重稀土元素，这样可以降低永磁基材的成本。
在第一方面一种可能的实现方式中，稳磁材料为金属单质，金属单质中包括镝Dy元素 或铽Tb元素中的至少一种。
在第一方面一种可能的实现方式中，稳磁材料为合金，合金中包括镝Dy元素或铽Tb元素中的至少一种，以及以下元素的至少一种：铜Cu、钴Co、铝Al、钙Ga、铌Nb、钛Ti、钒V、钼Mo和硅Si。
在第一方面一种可能的实现方式中，稳磁材料为浆液，浆液中包括含镝元素的化合物或含铽元素的化合物中的至少一种，以及有机溶剂；含镝元素的化合物包括氟化镝、氧化镝或氢化镝中的至少一种；含铽元素的化合物包括氟化铽、氧化铽或氢化铽中的至少一种，有机溶剂包括醇溶剂、酮溶剂或酯溶剂中的至少一个。
在第一方面一种可能的实现方式中，所述永磁基材的合金成分包括稀土金属RE、铁Fe、硼B或过渡金属M，其中，RE为以下元素中的至少一种：钕Nd、镨Pr、镝Dy、镧La、铈Ce、钇Y、钬Ho、铽Tb或钆Gd；M为以下元素中的至少一种：钴Co、铜Cu、铌Nb、钙Ga、铝Al、锌Zn、镍Ni、硅Si、锆Zr、钼Mo、钒V或钛Ti。
本申请第二方面提供一种稳磁永磁体，稳磁永磁体包括具有一个磁化方向，该稳磁永磁体中包含重稀土元素，重稀土元素分散在稳磁永磁体中，且在沿着与磁化方向垂直的方向上具有不同浓度。
该第二方面中，该永磁体可以应用于新能源汽车、风力发电、节能家电、智能制造等领域。该永磁体可以是钕铁硼永磁体，永磁体会有一个磁化方向，与该磁化方向垂直的第一面和第二面是相对面，第一面和第二面通常也是两个相互平行的面。以长方体结构的永磁体为例，磁化方向一般是高度的方向，第一面和第二面通常是长方体的上表面和下表面。以圆饼柱体结构的永磁体为例，磁化方向也是高度的方向，第一面和第二面通常是圆饼柱体的上表面和下表面。重稀土元素可以包括镝Dy或铽Tb等元素。在稳磁永磁体中，重稀土元素沿着与磁化方向垂直的方向上具有不同浓度分布，也可以理解为在与第一面和第二面平行的任意一个平行面中，不同区域的重稀土元素的浓度不全相同可以满足永磁体不同位置差异化的抗退磁需求。
在第二方面一种可能的实现方式中，稳磁永磁体在沿着与磁化方向垂直的方向上，重稀土元素的浓度先降低再升高。也可以理解为在任意一个平行面上，沿着第一方向，从平行面的一端到另一端，重稀土元素的浓度先降低再增加，第一方向为平行面上与磁化方向垂直的一个方向。
该种可能的实现方式中，第一方向是以磁化方面垂直的一个方向，以长方体结构的永磁基材为例，与磁化方向垂直的一个方向可以是长方体的长度方向或宽度方向。重稀土元素的浓度先降低再上升可以是等比例的梯度降低再梯度上升，也可以是连续的降低再上升。从降低到上升的拐点通常是平行面的中线，可以理解为从平行面的一端开始到中线，重稀土元素的浓度呈梯度下降的趋势，从中线到另一端，重稀土元素的浓度呈梯度上升的趋势。这样该平行面上重稀土元素的浓度就会是两边大中间小，矫顽力与重稀土元素的浓度相对应，也会是两边大中间小，正好可以满足稳磁永磁体边沿抗退磁的需求大，中心抗退磁的需求小的需求。
在第二方面一种可能的实现方式中，在沿着与所述磁化方向垂直的方向上，稳磁永磁 体在中间部位的重稀土元素的浓度低于两端区域。
在第二方面一种可能的实现方式中，重稀土元素包括镝Dy元素或铽Tb元素中的至少一种。
在第二方面一种可能的实现方式中，重稀土元素包括Dy元素或铽Tb元素中的至少一种，以及以下元素的至少一种：铜Cu、钴Co、铝Al、钙Ga、铌Nb、钛Ti、钒V、钼Mo或硅Si。
在第二方面一种可能的实现方式中，稳磁永磁体具有与磁化方向垂直的第一面和第二面，且第一面和第二面分别位于所述稳磁永磁体相对的两侧，第一面和第二面的距离为H，H≤10毫米。
该种可能的实现方式中，磁化方向的高度H≤10毫米，更有利于在薄膜扩散时重稀土元素扩散到永磁基材的中心。
在第二方面一种可能的实现方式中，H≤5毫米。
该种可能的实现方式中，磁化方向的高度≤5毫米，有利于节省重稀土元素。
本申请第三方面提供一种永磁电机，包括：转子和定子；其中，转子包括转子铁芯，和插入转子铁芯插槽的稳磁永磁体，稳磁永磁体为上述第二方面或第二方面任一可能的实现方式所描述的稳磁永磁体。
附图说明
图1是本申请实施例提供的永磁体的稳磁方法的一实施例示意图；
图2是本申请实施例提供的永磁基材的一结构示意图；
图3是本申请实施例提供的永磁体的稳磁方法的一示例示意图；
图4是本申请实施例提供的永磁体的稳磁方法的另一示例示意图；
图5是本申请实施例提供的永磁体的稳磁方法的另一示例示意图；
图6是本申请实施例提供的永磁体的稳磁方法的另一示例示意图；
图7是本申请实施例提供的永磁体的稳磁方法的另一示例示意图；
图8是本申请实施例提供的稳磁永磁体的一浓度分布示意图；
图9是本申请实施例提供的矫顽力的设计与测试结果的一比对示意图；
图10是本申请实施例提供的矫顽力的设计与测试结果的另一比对示意图。
具体实施方式
本申请实施例提供一种永磁体的稳磁方法、稳磁永磁体及永磁电机，可以使用较少的重稀土(heavy rare earth，HRE)元素来提高永磁体整体的矫顽力。以下分别进行详细说明。
本申请的说明书和权利要求书及上述附图中，术语“第一”、“第二”等是用于区别类似的对象，而不必用于描述特定的顺序或先后次序。应该理解这样使用的数据在适当情况下可以互换，以便这里描述的实施例能够以除了在这里图示或描述的内容以外的顺序实施。
永磁体在新能源汽车、风力发电、节能家电、智能制造等领域有着广泛应用。如新能源汽车中的永磁电机就需要包含永磁体，下面对本申请实施例提供的永磁体的稳磁方法、稳磁永磁体以及永磁电机进行介绍。
图1为本申请实施例提供的永磁体的稳磁方法的一实施例示意图。
如图1所示，本申请提供的永磁体的稳磁方法的一实施例包括：
101、提供永磁基材。
该永磁基材包括多个面和一个磁化方向，多个面中包括第一面和第二面，第一面和第二面是与磁化方向垂直的相对面，即，第一面和第二面分别位于永磁基材相对的两侧。
该永磁基材以钕铁硼基材为例进行说明，也可以是其他类似于钕铁硼材料的基材。
该钕铁硼基材可以是通过烧结工艺制备的，平均晶粒尺寸可以为1～10微米(μm)，通常其矫顽力≥1410(千安/米)kA/m。矫顽力(coercive force)是用来评价永磁体质量的一个指标，矫顽力是指磁性材料在饱和磁化后，当外磁场退回到零时其磁感应强度B并不退到零，只有在原磁化场相反方向加上一定大小的磁场才能使磁感应强度退回到零，该磁场称为矫顽磁场，又称矫顽力。
烧结工艺后，可以将钕铁硼基材加工成块状基材，对加工完成的块状基材进行碱洗、酸洗、去离子水冲洗后并干燥，可以作为本申请实施例中的永磁基材。本申请实施例的永磁基材可以参阅图2所示的结构进行理解，如图2所示，该长方体形状的永磁基材的长度为L1，宽度为L2，高度为H。结合图2所示的长方体形状的永磁基材，其中，高度(H)从下向上的方向可以作为该永磁基材的磁化方向10，与高度垂直的上表面和下表面可以分别作为第一面20和第二面30。
可选地，该永磁基材中重稀土元素的含量为零。这种基材也可以称为零稀土基材，也就是该永磁基材中不包含重稀土元素，这样可以降低永磁基材的成本。
102、提供稳磁材料。
该稳磁材料中包含重稀土(heavy rare earth，HRE)元素。
该稳磁材料可以是金属单质，也可以是合金，还可以是包含重稀土元素的化合物与有机溶剂混合后的浆液。
稳磁材料为金属单质，该金属单质中包括镝Dy元素或铽Tb元素中的至少一种。
稳磁材料为合金，该合金中包括镝Dy元素或铽Tb元素中的至少一种，以及以下元素的至少一种：铜Cu、钴Co、铝Al、钙Ga、铌Nb、钛Ti、钒V、钼Mo或硅Si。
稳磁材料为浆液，该浆液中包括含镝元素的化合物或含铽元素的化合物中的至少一种，以及有机溶剂。含镝元素的化合物包括氟化镝、氧化镝或氢化镝中的至少一种；含铽元素的化合物包括氟化铽、氧化铽或氢化铽中的至少一种，有机溶剂包括醇溶剂、酮溶剂或酯溶剂中的至少一个。
制作包含铽元素的浆液的方法可以是：将制作用的原料例如氟化铽粉末、乙酸乙酯和溶剂胶进行混合，然后再搅拌，这样就可以得到包含铽元素的浆液。其中，氟化铽粉末的平均粒度可以为5微米(um)，乙酸乙酯的重量可以是氟化铽粉末重量的几倍，例如：3倍，溶剂胶的浓度可以为10wt％，其中，wt％表示重量百分率。当然，此处只是举例，几种原料的重量和浓度也可以是其他数值。
制作包含镝元素的浆液的方法可以是：将制作用的原料例如氟化镝、乙酸乙酯和溶剂胶进行混合，然后再搅拌，这样就可以得到包含镝元素的浆液。其中，氟化镝粉末的平均粒度可以为5微米，乙酸乙酯的重量可以是氟化铽粉末重量的3.5倍，溶剂胶的浓度可以 为11wt％。当然，此处只是举例，几种原料的重量和浓度也可以是其他数值。
103、将稳磁材料在第一面上进行处理，形成第一面薄膜。
其中，第一面薄膜在第一面沿第一方向的分布，不同区域的薄膜厚度不全相同，即，第一面薄膜在第一面20沿第一方向上具有不同的薄膜厚度；或者，第一面薄膜的不同区域的重稀土元素的浓度不全相同，即，第一面薄膜在第一面20沿第一方向上分布有不同的重稀土元素的浓度；其中，第一方向为第一面20上与磁化方向10相垂直的一个方向。
第一面薄膜在第一面20上具有不同的薄膜厚度，可以参阅图3所示的形成第一面薄膜后的永磁基材的示意图进行理解。如图3所示，第一方向40可以是第一面20上从长度L1的一端到另一端的方向。当然，第一方向40不限制在第一面20上，只要是与该方向相同的方向都可以称为第一方向。第一面薄膜在第一面20上具有不同的薄膜厚度，可以是如图3所示的，在第一面20上，沿长度方向，从一端到另一端，薄膜厚度先降低再增加，该变化过程可以是呈梯度变化的，也就是说，从一端到另一端，薄膜厚度先梯度降低再梯度增加。图3中所示出的不同厚度的薄膜之间的各区域是临接的，实际上，各区域之间也可以是间隔开的，各区域之间略有间隔在形成第一面薄膜时比较容易操作，而且也可以节省稳磁材料。第一面薄膜上不同厚度的薄膜也可以各自称为一个薄膜区域，该薄膜区域是按照薄膜厚度划分的。
另外，如图3所示的第一面薄膜也可以是连续的。具体实现方式，可以参阅图4所示的形成第一面薄膜后的永磁基材的另一示意图进行理解。如图4所示，第一面20上的第一面薄膜，沿着第一面20的长度方向L，两侧的薄膜厚度最大、中间位置的薄膜厚度最小。
第一面薄膜在第一面上具有不同的重稀土元素的浓度，可以参阅图5，图5为形成第一面薄膜后的永磁基材的示意图。如图5所示，第一面薄膜上的薄膜厚度是相同的，但该第一面薄膜具有不同的重稀土元素的浓度。
另外，如图5所示的第一面薄膜是连续的。可选地，第一面薄膜上不同重稀土元素的浓度的薄膜也可以各自称为一个薄膜区域，该薄膜区域是按照重稀土元素的浓度划分的。
需要说明是，上述图3至图5中第一面上的区域数量只是举例，实际上，可以根据需求确定第一面上区域的数量。
在第一面上进行处理形成第一面薄膜，可以采用物理溅射方法，如：通过靶材轰击重稀土元素在永磁基材的在第一面上形成薄膜，也可以通过化学涂覆的方法，将浆液在第一面上涂覆。还可以通过电镀、电沉积等方法在第一面上形成薄膜。
104、对在第一面形成薄膜后的永磁基材，进行重稀土元素的扩散处理。
扩散处理的过程，可以是放入真空炉中，在900摄氏度的温度下进行16小时的热处理。扩散处理后，还可以在450摄氏度的温度下进行8小时的热处理。当然，具体的温度值和时间长度不限于这里列举的900度16小时，450度8小时，还可以是其他数值，只要能完成重稀土元素的扩散处理即可。
重稀土元素的扩散后可以得到稳磁永磁体。
本申请实施例中，在永磁体稳磁过程中，第一面薄膜在第一面上具有不同的薄膜厚度或者具有不同的重稀土元素的浓度，这样，薄膜扩散后得到稳磁永磁体中重稀土元素分散 在沿着与磁化方向垂直的方向上具有不同浓度。这样该第一方面在满足了稳磁永磁体不同位置差异化的抗退磁需求的前提下，只在第一面上形成薄膜还节省了重稀土元素的使用量，降低了稳磁永磁体的成本，另外，通过对第一面上薄膜厚度或者重稀土元素的浓度的控制，可以实现稳磁永磁体的按需定制。
只在第一面上形成第一面薄膜进行扩散处理后得到的稳磁永磁体通常厚度较小，针对一些厚度较大的永磁基材，还可以通过如下方案进行稳磁。
在上述步骤103之后，不再执行步骤104，而是将永磁基材翻转180°翻至第二面，然后执行图1中的步骤105以及步骤106。
105、将稳磁材料在第二面上进行处理，形成第二面薄膜。
第二面薄膜在沿第一方向的分布上具有不同的薄膜厚度，或者，第一面薄膜在沿所述第一方向的分布上具有不同的重稀土元素的浓度。
可选地，第二面薄膜在沿第一方向的分布上的厚度变化或浓度变化，与第一面薄膜在沿第一方向的分布上的厚度变化或浓度变化一致或相同。
第二面薄膜的薄膜厚度与第一面薄膜的薄膜厚度在沿第一方向上的厚度变化一致指的是第一面和第二面相对的位置的薄膜厚度的变化位置、变化趋势或者变化幅度是相应的，比如，第一面薄膜在第一面位置1的薄膜厚度大于在位置2的薄膜厚度，则第二面薄膜在第二面上与位置1对应的位置处的薄膜厚度大于第二面上与位置2对应的位置处的薄膜厚度。厚度变化相同指的是第一面和第二面上薄膜厚度的变化位置、变化趋势或者变化幅度都相同。第二面薄膜的重稀土元素的浓度与第一面薄膜的重稀土元素的浓度在沿第一方向上的浓度变化一致指的是第一面和第二面相对的位置的重稀土元素的浓度的变化位置、变化趋势或者变化幅度是一致的，也可以理解为相应的，比如，第一面薄膜在第一面位置1的重稀土元素的浓度大于在位置2的薄膜厚度，则第二面薄膜在第二面上与位置1对应的位置处的重稀土元素的浓度大于第二面上与位置2对应的位置处的浓度。浓度变化相同指的是第一面和第二面上重稀土元素的浓度的变化位置、变化趋势或者变化幅度都相同。
在具体实现时，在第一面和第二面上，厚度变化一致可以是第一面和第二面上的薄膜厚度相对于永磁基材是对称的，如图6所示，从第二面30的长度方向的两侧到中间，薄膜厚度呈梯度下降，第二面薄膜的梯度变化趋势、变化位置以及变化幅度与第一面薄膜的梯度变化趋势、变化位置以及幅度都基本一致。第二面薄膜的薄膜厚度与第一面薄膜的薄膜厚度在沿第一方向上的分布一致指的是第一面和第二面相对的位置的薄膜厚度基本相同。例如：第一面上距离左端0-2毫米的薄膜区域的薄膜厚度是200微米，那么第二面上距离左端0-2毫米的薄膜区域的薄膜厚度也基本是200微米。
在第一面和第二面上，厚度变化一致指的是第一面和第二面相对的位置的重稀土元素的浓度的变化位置、变化趋势或者变化幅度基本相同。可以参阅图7，图7为形成第二面薄膜后的永磁基材的示意图。如图7所示，第二面薄膜的厚度是相同的，但该第二面薄膜具有不同的重稀土元素的浓度。并且，该第二面薄膜中各区域的重稀土元素的浓度与第一面薄膜中各区域的重稀土元素的浓度基本一致。例如：第一面上距离左端0-2毫米的薄膜区域的重稀土元素的浓度是0.75wt％，(wt％表示重量百分率)，那么第二面上距离左端0-2 毫米的薄膜区域的重稀土元素的浓度是0.75wt％。
在第二面上进行处理形成第二面薄膜，可以采用物理溅射方法，如：通过靶材轰击重稀土元素在永磁基材的在第二面上形成薄膜，也可以通过化学涂覆的方法，将浆液在第一面上涂覆干燥后，再在第二面涂覆。还可以通过电镀、电沉积等方法在第二面上形成薄膜。
106、对在第一面和第二面形成薄膜后的永磁基材，进行重稀土元素的扩散处理。
该步骤106之后也会得到稳磁永磁体。
扩散处理的过程可以参阅上述步骤104中的相应内容进行理解。
本申请实施例中，薄膜厚度与扩散后的稳磁永磁体中的重稀土元素的浓度是相对应的，也就是说，薄膜厚度大的区域在扩散后所对应的稳磁永磁体中相应位置的重稀土元素的浓度就大，薄膜厚度小的区域在扩散后所对应的稳磁永磁体中相应位置的重稀土元素的浓度就小。同样道理，在第一面和第二面上，扩散前重稀土元素的浓度大的区域，对应扩散后该区域所对应的稳磁永磁体中相应位置的重稀土元素的浓度也大，反之，扩散前重稀土元素的浓度小的区域，对应扩散后该区域所对应的稳磁永磁体中相应位置的重稀土元素的浓度也小。以类似于图6所示的两侧薄膜厚，然后薄膜厚度梯度降低的情况为例，或者以类似于图7所示的第一面和第二面的薄膜中两侧重稀土元素的浓度大，然后重稀土元素的浓度梯度降低的情况为例，扩散后，该稳磁永磁体中重稀土元素的浓度可以参阅图8进行理解。如图8所示，该稳磁永磁体中任何一个与第一面20和第二面30平行的平行面中，沿着长度L1的方向，从永磁体的一端到另一端(也可以称为从左侧到右侧)，重稀土元素的浓度也按照先梯度下降再梯度上升的趋势变化，与稳磁过程中，薄膜厚度的排布趋势一致，或者第一面和第二面的薄膜中的重稀土元素的浓度的变化趋势一致。
本申请实施例中，在永磁体稳磁过程中，第一面薄膜和第二面薄膜上，不同区域上具有不同的薄膜厚度或不同的重稀土元素的浓度，薄膜扩散后得到稳磁永磁体中，不同区域的重稀土元素的浓度，与第一面和第二面上的薄膜厚度或重稀土元素的浓度相对应，稳磁永磁体的矫顽力与稳磁永磁体中的重稀土元素的浓度相对应，这样本申请在满足了稳磁永磁体不同位置差异化的抗退磁需求的前提下，因为不需要所有面都形成包含重稀土元素的薄膜，还节省了重稀土元素的使用量，降低了稳磁永磁体的成本，另外，通过对第一面和第二面上薄膜厚度或者重稀土元素的浓度的控制，可以得到不同浓度分布的稳磁永磁体，从而实现了稳磁永磁体的按需定制。
需要说明的是，本申请实施例中不同的薄膜厚度或不同的重稀土元素的浓度，可以包括各不相同，也可以包括不完全相同；不完全相同表示，有的区域上的薄膜厚度可以相同，例如：上述图3中，在第一面20上，沿着L1长度方向的两端，相对称区域上的薄膜厚度可以相同，同理，也可以是，在第一面20上，沿着L1长度方向的两端相对称区域上的重稀土元素的浓度相同。
可选地，在第一面上，沿着第一方向，从第一面的一端到另一端，第一面薄膜的薄膜厚度先降低再上升。
第一面薄膜的重稀土元素的浓度通常是相同的，不同区域的薄膜厚度先降低再上升，可以是等比例的梯度降低再梯度上升，也可以是连续的降低再上升。从降低到上升的拐点 通常是第一面的中线，可以理解为从第一面的一端开始到中线，薄膜厚度呈梯度下降的趋势，从中线到另一端，薄膜厚度呈梯度上升的趋势。当第一面上形成第二面薄膜时，第二面上的薄膜厚度与第一面上的薄膜厚度在变化趋势上基本相同，变化的位置以及变化的幅度也基本相同。这样，在第一面薄膜和第二面薄膜扩散成为稳磁永磁体后，该稳磁永磁体内与第一面和第二面平行的任何一个平行面上重稀土元素的浓度就会是两边大中间小，矫顽力与重稀土元素的浓度相对应，也会是两边大中间小，正好可以满足稳磁永磁体边沿区域矫顽力高、中心区域矫顽力低的制造需求。该方案可以参阅上述图3、图4和图6的所对应的内容进行理解。
可选地，在第一面上，沿着第一方向，从第一面的一端到另一端，第一面薄膜的重稀土元素的浓度先降低再上升。
第一面薄膜的薄膜厚度可以是相同的，但第一面薄膜的不同区域具有不同的重稀土元素的浓度，第一面薄膜的不同区域的重稀土元素的浓度先降低再上升，可以是等比例的梯度降低再梯度上升，也可以是连续的降低再上升。从降低到上升的拐点通常是第一面的中线，可以理解为从第一面的一端开始到中线，重稀土元素的浓度呈梯度下降的趋势，从中线到另一端，重稀土元素的浓度呈梯度上升的趋势。当第一面上形成第二面薄膜时，第二面上的重稀土元素的浓度与第一面上的重稀土元素的浓度在变化趋势上基本相同，变化的位置以及变化的幅度也基本相同。这样，在第一面薄膜和第二面薄膜扩散成为稳磁永磁体后，该稳磁永磁体内与第一面和第二面平行的任何一个平行面上重稀土元素的浓度就会是两边大中间小，矫顽力与重稀土元素的浓度相对应，也会是两边大中间小，正好可以满足稳磁永磁体边沿区域矫顽力高、中心区域矫顽力低的制造需求。该方案可以参阅上述图5和图7所对应的内容进行理解。
可选地，第一面和第二面的距离为H，H≤10毫米，较好的，H≤5毫米。将磁化方向的高度限定在一定范围内，可以有利于重稀土元素扩散到永磁基材的中心。
薄膜厚度与扩散后的稳磁永磁体中的重稀土元素的浓度是相对应的，也就是说，薄膜厚度大的区域，在扩散后所对应的稳磁永磁体中相应位置的重稀土元素的浓度就高，薄膜厚度小的区域，在扩散后所对应的稳磁永磁体中相应位置的重稀土元素的浓度就低。薄膜厚度与扩散后的稳磁永磁体中的重稀土元素的浓度的关系，可以通过以下两组实验进行理解。
第一组实验：
重稀土元素是Tb元素，在上述对永磁基材稳磁过程中，采用化学涂覆的方法将包含Tb元素的浆液按照例如图6所示的方式，在不同区域涂覆不同厚度的薄膜，从而在第一面和第二面上形成不同厚度的薄膜，在执行Tb元素的扩散处理前，先记录如下表1中的第一列和第二列的两列数据。然后进行Tb元素的扩散处理，从而得到如图8所示的稳磁永磁体。其中，浆液中氟化铽粉末的平均粒度可以为5微米，乙酸乙酯的重量可以是氟化铽粉末重量的3倍，溶剂胶的浓度可以为10wt％。
需要说明的是，在该实验场景中，稳磁永磁体的尺寸为L1＝23.5mm，L2＝28.7mm，H＝3.2mm。在得到稳磁永磁体之后，可以切取一个与第一面和第二面平行的平行面，该平行面可 以有一定厚度，例如：0.5mm。在切换平行面后，按照第一列的数据所指示的位置测量七个采样点的Tb元素的重量百分率(wt％)，会得到表1中第三列的数据。
表1：Tb元素的实验数据
Figure PCTCN2020087971-appb-000001
表1中的七个采样点中，11.75mm处的采样点位于平行面的中线位置，相对于图8中的八个区域该采样点位于中间两个区域，1mm、2mm和5mm这三个采样点分别位于中线左侧的前三个区域。18.5mm、21.5mm和22.5mm这三个采样点分别位于中线右侧的后三个区域。
由表1中的第二列数据可以看出，从长度(L1)的左端开始，第一面和第二面上的薄膜厚度先减小后增大，在扩散后，Tb元素在稳磁永磁体中的浓度也是先减小后增大。薄膜厚度在L1方向从左到右基本呈先梯度下降再梯度上升的趋势，Tb元素在稳磁永磁体中的浓度也基本呈先梯度下降再梯度上升的趋势。
Tb元素在稳磁永磁体中的浓度的变化趋势，也反映着该稳磁永磁体的矫顽力的变化趋势，因此，可以根据对矫顽力的需求来定制稳磁永磁体。如图9所示，对矫顽力的定制需求可以通过线1来表示，实际通过上述稳磁方法得到的稳磁永磁体的矫顽力的变化趋势实验测得的结果可以通过线2来表示，可见，通过上述稳磁方法得到的稳磁永磁体的实验测试结果基本符合了定制需求。这样就可以根据定制化的需求对永磁基材进行上述稳磁的过程，以得到符合定制需求的稳磁永磁体。
以上表1和图9反映的是Tb元素的实验数据。下面第二组实验通过表2和图10介绍镝(Dy)元素的实验数据。
第二组实验：
重稀土元素是Dy元素，在上述对永磁基材稳磁过程中，采用化学涂覆的方法将包含Dy元素的浆液按照例如图6所示的方式，在不同区域涂覆不同厚度的薄膜，从而在第一面和第二面上形成不同厚度的薄膜，在执行Dy元素的扩散处理前，先记录如下表2中的第一列和第二列的两列数据。然后进行Dy元素的扩散处理，从而得到如图8所示的稳磁永磁体。其中，浆液中氟化镝粉末的平均粒度可以为5微米，乙酸乙酯的重量可以是氟化镝粉末重量的3.5倍，溶剂胶的浓度可以为11wt％。
需要说明的是，在该实验场景中，稳磁永磁体的尺寸为L1＝23.5mm，L2＝28.7mm，H＝3.2mm。在得到稳磁永磁体之后，可以切取一个与第一面和第二面平行的平行面，该平行面可以有一定厚度，例如：0.5mm。在切换平行面后，按照第一列的数据所指示的位置测量七个 采样点的Dy元素的重量百分率(wt％)，会得到表2中第三列的数据。
表2：Dy元素的实验数据
Figure PCTCN2020087971-appb-000002
表2中的七个采样点中，11.75mm处的采样点位于平行面的中线位置，相对于图8中的八个区域该采样点位于中间两个区域，1mm、2mm和5mm这三个采样点分别位于中线左侧的前三个区域。18.5mm、21.5mm和22.5mm这三个采样点分别位于中线右侧的后三个区域。
由表2中的第二列数据可以看出，从长度(L1)的左端开始，第一面和第二面上的薄膜厚度先减小后增大，在扩散后，Dy元素在稳磁永磁体中的浓度也是先减小后增大。薄膜厚度在L1方向从左到右基本呈先梯度下降再梯度上升的趋势，Dy元素在稳磁永磁体中的浓度也基本呈先梯度下降再梯度上升的趋势。
Dy元素稳磁永磁体中的浓度的变化趋势，也反映着该稳磁永磁体的矫顽力的变化趋势，因此，可以根据对矫顽力的需求来定制稳磁永磁体。如图10所示，对矫顽力的定制需求可以通过线3来表示，实际通过上述稳磁方法得到的稳磁永磁体的矫顽力的变化趋势实验测得的结果可以通过线4来表示，可见，通过上述稳磁方法得到的稳磁永磁体的实验测试结果基本符合了定制需求。这样就可以根据定制化的需求对永磁基材进行上述稳磁的过程，以得到符合定制需求的稳磁永磁体。
本申请实施例还提供了一种稳磁永磁体，该稳磁永磁体具有一个磁化方向，稳磁永磁体中包含重稀土元素，所述重稀土元素分散在所述稳磁永磁体中，且在沿着与所述磁化方向垂直的方向上具有不同浓度。
该稳磁永磁体可以包括多个面，多个面中包括第一面和第二面，第一面和第二面是与磁化方向垂直的相对面，通常该稳磁永磁体中，与第一面和所述第二面平行的任何一个平行面上，具有不同的重稀土元素的浓度。
可选地，稳磁永磁体在沿着与所述磁化方向垂直的方向上，重稀土元素的浓度先降低再增加。也可以理解为，在任何一个平行面上，沿着第一方向，从平行面的一端到另一端，重稀土元素的浓度先降低再上升，第一方向为平行面上与磁化方向垂直的一个方向。
可选地，稳磁永磁体在中间部位的重稀土元素的浓度低于周围。
可选地，重稀土元素包括镝Dy元素或铽Tb元素中的至少一种。
可选地，重稀土元素包括Dy元素或铽Tb元素中的至少一种，以及以下元素的至少一种：铜Cu、钴Co、铝Al、钙Ga、铌Nb、钛Ti、钒V、钼Mo或硅Si。
可选地，第一面和第二面的距离为H，H≤10毫米，较好的，H≤5毫米。将磁化方向的高度限定在一定范围内，可以有利于重稀土元素扩散到基材的中心。
该稳磁永磁体可以是采用上述永磁体的稳磁方法得到的稳磁永磁体，该稳磁永磁体的结构以及特性可以参阅上述实施例中图8以及表1、表2的实验数据进行理解，此处不再赘述。
本申请实施例还提供了一种永磁电机，该永磁电机包括：转子和定子；转子包括转子铁芯，和插入转子铁芯插槽的稳磁永磁体，该稳磁永磁体为采用上述稳磁方法所制备得到的具有相应稳磁特性的永磁体。
由以上的描述可知，本申请实施例中，在垂直于磁化方向的表面内沿单个方向(例如：长方体基材的长度方向或宽度方向)形成连续或非连续分布的薄膜，扩散后在垂直于磁化方向的截面内就会形成连续的重稀土浓度分布，实现矫顽力梯度增强，满足应用需求。
另外，因为稳磁永磁体的价格与永磁基材的重稀土元素的含量直接相关，本申请实施例可采用零重稀土元素的基材进行扩散，使磁体边沿及磁体中心的矫顽力同时实现不同程度的增强效果，在降低永磁基材的成本的情况下，也可以满足磁体不同位置差异化的抗退磁要求。
再者，本申请实施例中，可以根据电机对转子每个永磁体段不同位置矫顽力要求，精确设计永磁基材表面的薄膜厚度或重稀土元素的浓度，经过热扩散处理后达到设计要求的重稀土浓度分布及矫顽力分布，最大化的利用永磁材料的磁性能。
以上对本申请实施例所提供的永磁体的稳磁方法、稳磁永磁体及永磁电机进行了详细介绍，本文中应用了具体个例对本申请的原理及实施方式进行了阐述，以上实施例的说明只是用于帮助理解本申请的方法及其核心思想；同时，对于本领域的一般技术人员，依据本申请的思想，在具体实施方式及应用范围上均会有改变之处，综上所述，本说明书内容不应理解为对本申请的限制。

Claims (19)

  1. 一种永磁体的稳磁方法，其特征在于，包括：
    提供永磁基材，所述永磁基材包括多个面和一个磁化方向，所述多个面中包括第一面，所述第一面与所述磁化方向垂直；
    提供稳磁材料，所述稳磁材料中包含重稀土元素；
    将所述稳磁材料在所述第一面上进行处理，形成第一面薄膜；所述第一面薄膜在沿第一方向的分布上具有不同的薄膜厚度，或者，所述第一面薄膜在沿第一方向的分布上具有不同的重稀土元素的浓度，所述第一方向为与所述磁化方向相垂直的一个方向；对在所述第一面形成薄膜后的所述永磁基材，进行重稀土元素的扩散处理。
  2. 根据权利要求1所述的稳磁方法，其特征在于，在所述第一面上，沿着所述第一方向，从所述第一面的一端到另一端，所述第一面薄膜的薄膜厚度先降低再增加。
  3. 根据权利要求1所述的稳磁方法，其特征在于，在所述第一面上，沿着所述第一方向，从所述第一面的一端到另一端，所述第一面薄膜的重稀土元素的浓度先降低再增加。
  4. 根据权利要求1-3任一项所述的稳磁方法，其特征在于，在所述第一面上，所述第一面薄膜按照薄膜厚度或重稀土元素的浓度分为多个薄膜区域，其中，所述多个薄膜区域的薄膜厚度不同，或者，所述多个薄膜区域的重稀土元素的浓度不同。
  5. 根据权利要求1-4任一项所述的稳磁方法，其特征在于，沿着所述第一方向上，所述第一面薄膜中间部位的厚度低于两端区域，或者，中间部位的重稀土元素的浓度低于两端区域。
  6. 根据权利要求1-5任一项所述的稳磁方法，其特征在于，所述多个面中还包括第二面，所述第二面与所述磁化方向垂直，且所述第二面与所述第一面分别位于所述永磁基材相对的两侧，所述稳磁方法还包括：
    将所述稳磁材料在所述第二面上进行处理，形成第二面薄膜，所述第二面薄膜在沿所述第一方向的分布上具有不同的薄膜厚度，或者，所述第二面薄膜在沿所述第一方向的分布上具有不同的重稀土元素的浓度，
    对在所述第二面形成薄膜后的所述永磁基材，进行重稀土元素的扩散处理。
  7. 根据权利要求6所述的稳磁方法，其特征在于，所述第二面薄膜在沿所述第一方向的分布上的厚度变化或浓度变化，与第一面薄膜在沿所述第一方向的分布上的厚度变化或浓度变化一致或相同。
  8. 根据权利要求6或7所述的稳磁方法，其特征在于，所述第一面和所述第二面的距离为H，所述H≤10毫米。
  9. 根据权利要求1-8任一项所述的稳磁方法，其特征在于，所述永磁基材中重稀土元素的含量为零。
  10. 根据权利要求1-9任一项所述的稳磁方法，其特征在于，所述稳磁材料为金属单质，所述金属单质中包括镝Dy元素或铽Tb元素中的至少一种。
  11. 根据权利要求1-9任一项所述的稳磁方法，其特征在于，所述稳磁材料为合金，所述合金中包括镝Dy元素或铽Tb元素中的至少一种，以及以下元素的至少一种：铜Cu、钴Co、 铝Al、钙Ga、铌Nb、钛Ti、钒V、钼Mo或硅Si。
  12. 根据权利要求1-8任一项所述的稳磁方法，其特征在于，所述稳磁材料为浆液，所述浆液中包括含镝元素的化合物或含铽元素的化合物中的至少一种，以及有机溶剂；
    所述含镝元素的化合物包括氟化镝、氧化镝或氢化镝中的至少一种；
    所述含铽元素的化合物包括氟化铽、氧化铽或氢化铽中的至少一种。
  13. 一种稳磁永磁体，其特征在于，所述稳磁永磁体具有一个磁化方向，所述稳磁永磁体中包含重稀土元素，其中，所述重稀土元素分散在所述稳磁永磁体中，且在沿着与所述磁化方向垂直的方向上具有不同浓度。
  14. 根据权利要求13所述的稳磁永磁体，其特征在于，所述稳磁永磁体在沿着与所述磁化方向垂直的方向上，所述重稀土元素的浓度先降低再升高。
  15. 根据权利要求13或14所述的稳磁永磁体，其特征在于，在沿着与所述磁化方向垂直的方向上，所述稳磁永磁体在中间部位的重稀土元素的浓度低于两端区域。
  16. 根据权利要求13-15任一项所述的稳磁永磁体，其特征在于，所述重稀土元素包括镝Dy元素或铽Tb元素中的至少一种。
  17. 根据权利要求13-15任一项所述的稳磁永磁体，其特征在于，所述重稀土元素包括Dy元素或铽Tb元素中的至少一种，以及以下元素的至少一种：铜Cu、钴Co、铝Al、钙Ga、铌Nb、钛Ti、钒V、钼Mo或硅Si。
  18. 根据权利要求13-17任一项所述的稳磁永磁体，其特征在于，所述稳磁永磁体具有与所述磁化方向垂直的第一面和第二面，且所述第一面和所述第二面分别位于所述稳磁永磁体相对的两侧，所述第一面和所述第二面的距离为H，所述H≤10毫米。
  19. 一种永磁电机，其特征在于，包括：转子和定子；其中，
    所述转子包括转子铁芯，和插入所述转子铁芯插槽的稳磁永磁体，所述稳磁永磁体为权利要求13-18任一项所述的稳磁永磁体。
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