WO2021200268A1 - Curable composition, cured product, and electronic component - Google Patents

Curable composition, cured product, and electronic component Download PDF

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Publication number
WO2021200268A1
WO2021200268A1 PCT/JP2021/011346 JP2021011346W WO2021200268A1 WO 2021200268 A1 WO2021200268 A1 WO 2021200268A1 JP 2021011346 W JP2021011346 W JP 2021011346W WO 2021200268 A1 WO2021200268 A1 WO 2021200268A1
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curable composition
group
compound
meth
manufactured
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PCT/JP2021/011346
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French (fr)
Japanese (ja)
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悠斗 小田桐
伊藤 秀之
一善 米田
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太陽インキ製造株式会社
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Priority to KR1020227030300A priority Critical patent/KR20220161281A/en
Priority to JP2022511920A priority patent/JPWO2021200268A1/ja
Priority to CN202180024605.2A priority patent/CN115362184A/en
Publication of WO2021200268A1 publication Critical patent/WO2021200268A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477Six-membered rings
    • C08K5/3492Triazines
    • C08K5/34922Melamine; Derivatives thereof

Definitions

  • the present invention relates to a curable composition, a cured product thereof, and an electronic component containing the cured product, and more particularly to a curable composition suitable for an insulating material for a printed wiring board, and an electronic component containing the cured product and the cured product.
  • the ⁇ -allyloxymethylacryloyl group-containing ester (hereinafter, also referred to as AMA ester) polymerizes while being cyclized to form a main chain skeleton having a 5-membered ring ether structure having methylene groups arranged on both sides as a repeating unit.
  • the cured product having this polymer has the characteristics of being excellent in heat-decomposability, adhesion to a resin substrate, and tough mechanical properties.
  • Patent Document 1 discloses a curable composition containing this AMA ester. Specifically, Patent Document 1 discloses a curable composition comprising a predetermined AMA ester, a bifunctional or higher photopolymerizable monomer, and a radical polymerization agent. This curable composition has excellent curability and is useful as an insulating material for an inkjet type printed wiring board.
  • a curable composition to be applied on a circuit board As an insulating material for a printed wiring board, a curable composition to be applied on a circuit board is known, and such a curable composition is adjusted to various viscosities according to a coating method.
  • a curable composition for a printed wiring board is required to have strong adhesion to a conductor circuit, low warpage, and flexibility, and Patent Document 1 does not disclose these characteristics at all. No.
  • the present inventors sufficiently have the characteristics of adhesion, low warpage, and flexibility required for the cured product described in Patent Document 1 to be used as an insulating material for a printed wiring board. I found that there wasn't.
  • an object of the present invention is a curable composition having an AMA ester, which has adhesion to a conductor circuit of the cured product, low warpage, and flexibility, the cured product thereof, and the curing thereof.
  • the purpose is to provide electronic components including things.
  • the object of the present invention is (A) Equation (1) (In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). It may have a substituent in the hydrocarbon group))
  • R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). It may have a substituent in the hydrocarbon group)
  • the polymerizable monomer represented by (B) A compound selected from the group consisting of melamine and its derivatives, and (C) Photopolymerization initiator and (D) Thermosetting component and It has been found that this is achieved with a curable composition containing.
  • the curable composition of the present invention has a vis
  • the curable composition of the present invention preferably contains a compound having two or more (E) (meth) acryloyl groups, and a compound having two or more (E) (meth) acryloyl groups is (E1). ) It is more preferable to contain a compound having an aromatic ring and having two or more (meth) acryloyl groups.
  • the (D) thermosetting component contains a latent thermosetting component, and it is further preferable that the latent thermosetting component is a blocked isocyanate compound.
  • the curable composition of the present invention further contains (F) a phosphorus-based flame retardant.
  • the curable composition of the present invention further contains a (G) ion scavenger.
  • the above object of the present invention can also be achieved by a cured product obtained from the curable composition of the present invention and an electronic component having the cured product.
  • the obtained cured product has high adhesion to a conductor circuit, low warpage, and flexibility. Further, the cured product obtained from the curable resin composition of the present invention and the electronic component having the cured product also have high adhesion, low warpage and flexibility to the conductor circuit of the cured product. It becomes.
  • the curable composition of the present invention is (A) Equation (1) (In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). It may have a substituent in the hydrocarbon group)) (Hereinafter, also referred to as the polymerizable monomer of the formula (A) (1)) represented by (B) A compound selected from the group consisting of melamine and its derivatives, and (C) Photopolymerization initiator and (D) Thermosetting component and Have.
  • the polymerizable monomer of the formula (A) (1) contained in the curable composition of the present invention can suppress the warp of the cured product after exposure, particularly on a flexible printed wiring board having flexibility.
  • the entire flexible printed wiring board becomes cylindrical, which causes a problem that the curable composition cannot be applied at an appropriate position when recoating.
  • the flexible printed wiring board is warped, there arises a problem that the flexible printed wiring board comes into contact with the inkjet head. Then, there is also a problem that the warp becomes larger at the time of heat curing.
  • the curable composition of the present invention contains the polymerizable monomer of the formula (A) (1), it is possible to suppress the warp of the cured product after exposure and further suppress the warp after heat curing. ..
  • the polymerizable monomer of the formula (A) (1) contained in the curable composition of the present invention is, for example, the following formula a): (In the formula a), R 1 is the same as R 1 in the formula (1), as represented by X ⁇ denotes the initiating radical or a growing radical), since the polymerization reaction while cyclization proceeds, It is considered that a main chain skeleton having a 5-membered ring ether structure having methylene groups arranged on both sides as a repeating unit is formed.
  • Examples of the hydrocarbon group having 1 to 4 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group and a vinyl group.
  • Examples thereof include an allyl group, a metalyl group, a crotyl group, a cyclopropyl group, a cyclobutyl group, a methoxymethyl group, a methoxyethyl group, an ethoxymethyl group, an ethoxyethyl group and a vinyloxyethyl group.
  • substituents examples include a chain unsaturated hydrocarbon group such as a vinyl group, an allyl group, a metallicyl group and a crotyl group; an alkoxy group such as a methoxy group, an ethoxy group and a methoxyethoxy group; a methylthio group and an ethylthio group.
  • Alkylthio group acyl group such as acetyl group and propionyl group; acyloxy group such as acetyloxy group and propionyloxy group; alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbonyl group; alkylthio such as methylthiocarbonyl group and ethylthiocarbonyl group Examples thereof include a carbonyl group; a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a ureido group; an amide group; a cyano group; and a trimethylsilyl group.
  • R 1 is derived from the viewpoints of industrial ease of making the polymerizable monomer of the formula (A) (1) and reducing the viscosity of the polymerizable monomer of the formula (A) (1) to reduce the viscosity of the curable composition.
  • Oxyethyl groups are more preferred.
  • Examples of the polymerizable monomer of the formula (A) (1) include methyl ⁇ -allyloxymethylacrylate, ethyl ⁇ -allyloxymethylacrylate, n-propyl ⁇ -allyloxymethylacrylate, and ⁇ -allyloxymethyl.
  • the polymerizable monomer of the formula (A) (1) can be adjusted according to the methods described in, for example, JP-A-2014-040585, JP-A-2011-137123, and the like.
  • the blending amount of the polymerizable monomer of the formula (A) (1) is preferably 1 part by mass or more and 80 parts by mass or less, and more preferably 5 parts by mass or more and 60 parts by mass with respect to 100 parts by mass of the curable composition of the present invention. Parts or less, particularly preferably 5 parts by mass or more and 50 parts by mass or less.
  • the curable composition of the present invention contains a compound selected from the group consisting of (B) melamine and its derivatives. Melamine and its derivatives are used to further improve properties such as heat resistance, in addition to improving the adhesion of the cured product to the conductor circuit.
  • Compounds selected from the group consisting of melamine and derivatives thereof include, for example, guanamines such as acetguanamine and benzoguanamine; melamine; ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2, Examples thereof include triazine derivatives such as 4-diamino-6-xylyl-S-triazine, and melamine is preferable.
  • (B) The compound selected from the group consisting of melamine and its derivatives can be used alone or in combination of two or more.
  • the blending amount thereof is 100% by mass based on the total amount of the (D) thermocurable components described later. If so, it is preferably 0.1% by mass or more and 20% by mass or less, more preferably 0.5% by mass or more and 20% by mass or less, and particularly preferably 1% by mass or more and 15% by mass or less.
  • thermosetting By setting the compounding amount of the compound selected from the group consisting of (B) melamine and its derivatives to 0.1% by mass or more and 20% by mass or less when the total amount of (D) thermosetting components is 100% by mass. , Good thermosetting can be realized while improving the storage stability of the curable composition.
  • any compound that generates radicals by light, a laser, an electron beam, or the like and initiates a radical polymerization reaction can be used.
  • the (C) photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, Acetophenones such as 2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2- Aminoacetophenones such as dimethylamino-1- (4-morpholinophenyl) -butane-1-one, N, N-dimethyl
  • the above (C) photopolymerization initiator can be used alone or in combination of two or more.
  • light such as tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, and triethanolamine Initiating aids can be used.
  • a titanocene compound of Omnirad 784 or the like manufactured by IGM Resins BV, which absorbs in the visible light region, can also be added to the (C) photopolymerization initiator in order to promote the photoreaction.
  • the components to be added to the photopolymerization initiator are not limited to these, and may be those that absorb light in the ultraviolet light or visible light region and radically polymerize an ethylenically unsaturated group such as a (meth) acryloyl group.
  • an ethylenically unsaturated group such as a (meth) acryloyl group.
  • it is not limited to the photopolymerization initiator and the photoinitiator aid, and can be used alone or in combination of two or more. Twice
  • C Commercially available photopolymerization initiators include, for example, Omnirad 907, Omnirad 127, Omnirad 379EG (all manufactured by IGM Resins BV) and the like.
  • the photopolymerization initiator (C) may be a compound that initiates a cationic polymerization reaction.
  • Examples of such (C) photopolymerization initiators include diphenyliodonium tetrafluoroboroate, triphenylsulfonium hexafluoroantimonate, 2,4,6-triphenylthiopyrilium hexafluorophosphate, and commercially available products ( ADEKA's Optoma-SP-170 and SP-152, San-Apro's CPI-100P, CPI-101A, CPI-200K, CPI-210S and other sulfonium salt-based photocationic polymerization initiators, and BASF's Irgacure ( Registered trademark) 261 and the like.
  • the blending amount of the (C) photopolymerization initiator is preferably 0.2 to 25 parts by mass, and more preferably 0.5 to 20 parts by mass with respect to 100 parts by mass of the curable composition of the present invention.
  • the curable composition of the present invention contains (D) a thermosetting component.
  • the thermosetting component (D) is different from the polymerizable monomer of the formula (A) (1), and by containing the (D) thermosetting component, in addition to improving the adhesion of the cured film to the conductor circuit, , Functionality such as heat resistance, plating resistance, flexibility, solvent resistance, and flame retardancy can be further improved.
  • thermosetting component for example, a known compound such as a blocked isocyanate compound, an epoxy compound, or an oxetane compound can be used.
  • a latent thermosetting component in which the functional group in the structure is protected by a protecting group can be preferably used.
  • a latent thermosetting component By using such a latent thermosetting component, it is possible to suppress an unintended reaction in the curable composition under unforeseen conditions and enhance the storage stability of the curable composition.
  • such a curable composition is also excellent in inkjet printability at 50 ° C., and when cured, it can be easily deprotected by heating or the like, and a latent thermosetting component can be activated.
  • the potential means a property that does not show activity at room temperature or a little heating condition, but is activated by heating at a high temperature of 80 ° C. or higher and shows thermosetting property.
  • Such a latent thermosetting component is preferably a blocked isocyanate compound.
  • the blocked isocyanate compound is preferably a compound having a plurality of blocked isocyanate groups in one molecule.
  • a blocked isocyanate group is a group in which an isocyanate group is protected by a reaction with a blocking agent and temporarily inactivated, and when heated to a predetermined temperature, the blocking agent is dissociated to generate an isocyanate group. do.
  • polyisocyanate compound having a plurality of isocyanate groups for example, aromatic polyisocyanate, aliphatic polyisocyanate or alicyclic polyisocyanate is used.
  • aromatic polyisocyanate examples include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like.
  • aromatic polyisocyanate examples include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like.
  • examples thereof include m-xylylene diisocyanate and 2,4-tolylen dimer.
  • aliphatic polyisocyanate examples include tetramethylene diisocyanate, hexamethylene diisocyanate, methylene diisocyanate, trimethylhexamethylene diisocyanate, 4,4-methylene bis (cyclohexyl isocyanate) and isophorone diisocyanate.
  • a specific example of the alicyclic polyisocyanate is bicycloheptane triisocyanate.
  • the adduct form, the burette form, the isocyanurate form, and the like of the isocyanate compounds mentioned above can be mentioned.
  • isocyanate blocking agent examples include phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol; lactam blocking agents such as ⁇ -caprolactam, ⁇ -palerolactam, ⁇ -butyrolactam and ⁇ -propiolactam; Active oxime blocking agents such as ethyl acetoacetate and acetylacetone; methanol, ethanol, propanol, butanol, amyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, benzyl Alcohol-based blocking agents such as ether, methyl glycolate, butyl glycolate, diacetone alcohol, methyl lactate and ethyl lactate; oxime-based blocking agents such as formaldehyde oxime, acetoaldoxime, acetoxi
  • Mercaptan-based blocking agents such as butyl mercaptan, hexyl mercaptan, t-butyl mercaptan, thiophenol, methyl thiophenol, ethyl thiophenol; acid amide-based blocking agents such as acetate amide and benzamide; imides such as succinate imide and maleate imide.
  • System blocking agents amine blocking agents such as xylidine, aniline, butylamine, dibutylamine; imidazole blocking agents such as imidazole and 2-ethylimidazole; imine blocking agents such as methyleneimine and propyleneimine; pyrazoles such as dimethylpyrazole Blocking agents and the like can be mentioned.
  • the blocked isocyanate compound may be commercially available, for example, Duranate TPA-B80E, 17B-60PX, E402-B80T (all manufactured by Asahi Kasei Co., Ltd.), TrixeneBI7982: Blocked isocyanate (hexamethylene isocyanate (HDM) trimer, Blocking agents: dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
  • Duranate TPA-B80E, 17B-60PX, E402-B80T all manufactured by Asahi Kasei Co., Ltd.
  • TrixeneBI7982 Blocked isocyanate (hexamethylene isocyanate (HDM) trimer
  • Blocking agents dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
  • the latent thermosetting component may be a reaction product obtained by reacting an amine compound such as imidazole or dicyandiamide with a hydroxyl group-containing compound, a cyclic ether group-containing compound, a carboxyl group-containing compound, or the like.
  • the blending amount of the thermosetting component (D) is preferably 1 part by mass or more and 30 parts by mass or less, and more preferably 5 parts by mass or more and 25 parts by mass or less per 100 parts by mass of the curable composition of the present invention. (D) When the blending amount of the thermosetting component is 1 part by mass or more and 30 parts by mass or less per 100 parts by mass of the curable composition of the present invention, the storage stability of the curable composition of the present invention is maintained. , Functionality such as heat resistance and plating resistance of the cured film can be further improved.
  • the curable composition of the present invention preferably contains a compound having two or more (E) (meth) acryloyl groups.
  • E) A compound having two or more (meth) acryloyl groups is a component that is cured by a photopolymerization reaction and is added to form a cured product.
  • the compound having two or more (E) (meth) acryloyl groups is different from the polymerizable monomer of the formula (A) (1).
  • the (meth) acryloyl group is a general term for an acryloyl group and a meta-acryloyl group.
  • the compound having two or more acryloyl groups contains a compound having (E1) an aromatic ring and two or more (meth) acryloyl groups.
  • Examples of the compound having (E1) aromatic ring and two or more (meth) acryloyl groups include (meth) acrylate of polyhydric phenol and its alkylene oxide adduct.
  • polyhydric phenol examples include bisphenol A, bisphenol AP, bisphenol B, bisphenol BP, bisphenol E, bisphenol F, bisphenol M, bisphenol P, bisphenol PH, bisphenol Z and other bisphenols, and biphenol.
  • alkylene oxide examples include ethylene oxide, propylene oxide, and butylene oxide.
  • the number of alkylene oxides added is preferably 6 or less.
  • (E1) Commercially available compounds having an aromatic ring and having two or more (meth) acryloyl groups include ABE-300 (manufactured by Shin-Nakamura Chemical Co., Ltd.), BPE-80N (manufactured by Shin-Nakamura Chemical Co., Ltd.), and the like.
  • BPE-100 (manufactured by Shin-Nakamura Chemical Co., Ltd.), A-BPE-4 (manufactured by Shin-Nakamura Chemical Co., Ltd.), BPE-4 (manufactured by Dai-ichi Kogyo Pharmaceutical Co., Ltd.), BPE-10 (manufactured by Dai-ichi Kogyo Pharmaceutical Co., Ltd.) ), BPE-200 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), EBECRYL 150 (manufactured by Daicel Ornex Co., Ltd.) and the like.
  • the compound having two or more (E) (meth) acryloyl groups is a compound having two low-viscosity (meth) acryloyl groups from the viewpoint of obtaining good curability while lowering the viscosity of the curable composition. Is preferably included.
  • the low viscosity means that the viscosity at 50 ° C. is 50 mPa ⁇ s or less, and particularly the viscosity at 50 ° C. is 20 mPa ⁇ s or less.
  • Examples of the compound having two low-viscosity (meth) acryloyl groups include a bifunctional (meth) acryloyl group-containing monomer which is an ester of alkylene glycol and (meth) acrylic acid.
  • the alkylene glycol may be a monoalkylene glycol or one having a repeating structure of two or more alkylene glycols.
  • Examples of the monoalkylene glycol include linear or branched alkylene diols having 3 to 16 carbon atoms, preferably 6 to 9 carbon atoms.
  • Examples of those having a repeating structure of two or more alkylene glycols include diethylene glycol, dipropylene glycol, dibutylene glycol, triethylene glycol, tripropylene glycol, and tributylene glycol.
  • examples of the compound having two low-viscosity (meth) acryloyl groups include diethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, dibutylene glycol di (meth) acrylate, and triethylene glycol di.
  • the compound having two or more (E) (meth) acryloyl groups contains a compound having three or more (meth) acryloyl groups.
  • Examples of the compound having three or more (meth) acryloyl groups include trimethylolpropane triacrylate, trimethylolmethane triacrylate, ethylene oxide-modified trimethylolpropane triacrylate, propylene oxide-modified trimethylolpropane triacrylate, and epichlorohydrin-modified trimethylolpropane triacrylate.
  • Acrylate pentaerythritol tetraacrylate, tetramethylolmethanetetraacrylate, ethyleneoxide-modified phosphoric acid triacrylate, propylene oxide-modified phosphoric acid triacrylate, epichlorohydrin-modified glycerol triacrylate, dipentaerythritol hexaacrylate, ditrimethylolpropane tetraacrylate, or these.
  • Examples thereof include polyfunctional acrylates typified by silsesquioxane-modified products, metaacrylate monomers corresponding thereto, and ⁇ caprolactone-modified trimethyloloxyethyl isocyanurate.
  • the compound having three or more (meth) acryloyl groups may be a multi-branched oligomer or polymer.
  • the compound having two or more (meth) acryloyl groups is preferably 10 parts by mass or more and 90 parts by mass or less, and preferably 10 parts by mass or more and 80 parts by mass or less per 100 parts by mass of the curable composition of the present invention. It is particularly preferably 15 parts by mass or more and 75 parts by mass or less.
  • the curable composition of the present invention preferably contains a known and commonly used (F) phosphorus-based flame retardant for the purpose of improving the flame retardancy of the obtained cured product.
  • Examples of the phosphorus-based flame retardant include a phosphoric acid ester and a condensed phosphoric acid ester, a phosphorus-containing compound having a phenolic hydroxyl group, a phosphazene compound, a phosphinic acid metal salt, and the following general formula (2).
  • R 2 , R 3 and R 4 each independently represent a substituent other than a halogen atom).
  • R 2 and R 3 are preferably hydrogen atoms or alkyl groups having 1 or more and 4 or less carbon atoms, and R 4 may be substituted with hydrogen atoms or cyano groups.
  • a good alkyl group having 1 or more and 4 or less carbon atoms, a 2,5-dihydroxyphenyl group, or a 3,5-di-t-butyl-4-hydroxyphenyl group is preferable, but is limited thereto. It's not a thing.
  • the phosphorus-containing compound having a phenolic hydroxyl group, in the general formula (2), R 4 may be mentioned those wherein a phenyl group substituted with a hydroxyl group.
  • Commercially available products include HCA-HQ manufactured by Sanko Co., Ltd.
  • Examples of the phosphinic acid metal salt include the following structural formula (3).
  • R 1 and R 2 represent an alkyl group having 1 to 6 carbon atoms or an aryl group having 12 or less carbon atoms, respectively.
  • phosphinic acid constituting the phosphinic acid metal salt examples include phosphinic acid, dimethylphosphinic acid, ethylmethylphosphinic acid, diethylphosphinic acid, methyl-n-propylphosphinic acid, methanedi (methylphosphinic acid), benzene-1, Examples thereof include 4- (dimethylphosphinic acid), methylphenylphosphinic acid, phenylphosphinic acid, diphenylphosphinic acid and mixtures thereof.
  • Exolit OP 1240, 1240, 1312, 1400, 930, 945TP, and OP-935 examples of commercially available products.
  • the phosphazene compound is preferably a compound having a phenoxy group and a phosphazene structure substituted with any one of a cyano group (-CN), a hydroxyl group (-OH) and a methyl group.
  • a cyano group -CN
  • a hydroxyl group -OH
  • a methyl group a compound having a phenoxy group substituted with any one of a cyano group (-CN), a hydroxyl group (-OH) and a methyl group.
  • a cyano group a cyano group
  • -OH hydroxyl group
  • only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with and thus substituted with one cyano group (-CN). It is a structure having two hexaphenoxycyclotriphosphazene structures as a whole.
  • the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure are both substituted with one cyano group (-CN), and the phenoxy group thus substituted.
  • -CN cyano group
  • only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one hydroxyl group (-OH) and thus thus. It is a structure having three substituted phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
  • the cyclic phosphazene compound has the following structure: or or It has one of the above structures.
  • Examples of commercially available products of preferable phosphazene compounds include FP-300B, FP-300, and SPH-100 (all manufactured by Fushimi Pharmaceutical Co., Ltd.).
  • phosphorus-based flame retardant One type of phosphorus-based flame retardant may be used alone, or two or more types may be used in combination.
  • the blending amount is preferably 1 part by mass or more and 50 parts by mass or less, more preferably 5 parts by mass, with respect to 100 parts by mass of the curable composition of the present invention. It is 40 parts by mass or less.
  • the blending amount of the phosphorus-based flame retardant (F) is preferably 0.1 to 10%, more preferably 1 to 5%, as the phosphorus content in the curable composition of the present invention.
  • flame retardancy can be effectively imparted while maintaining heat resistance and low warpage.
  • boric acid metal salts such as flame retardants (zinc borate compound (2ZnO ⁇ 3B 2 O 3 ⁇ 3.5H 2 O).
  • the curable composition of the present invention preferably contains a known and commonly used (G) ion scavenger in order to improve insulation reliability such as ion migration resistance.
  • an inorganic cation trapping agent that traps cations by ion exchange an inorganic anion trapping agent that traps anions by ion exchange, and both cations and anions by ion exchange are used.
  • examples thereof include an inorganic amphoteric trapping agent, and an inorganic amphoteric trapping agent is preferable.
  • the (G) ion scavenger contains at least one component selected from the group consisting of zirconium, aluminum, zinc, magnesium, and bismuth.
  • two or more oxidative hydrates or hydroxides of these components are preferable, and two or more oxidative hydrates or hydroxides selected from the group consisting of zirconium, magnesium and aluminum are more preferable.
  • hydrotalcite which is a three-component oxidative hydrate of magnesium, aluminum and zirconium, bismuth, and a two-component oxidative hydrate of zirconium and a hydroxide containing magnesium and aluminum, is preferable.
  • the ion scavenger may be used alone or in combination of two or more.
  • Hydrotalcite is represented by the following formula (1).
  • one in which a part of Mg is replaced with another divalent metal ion can also be preferably used.
  • Zn is particularly preferable.
  • hydrotalsite are not particularly limited, but for example, Mg 4.5 Al 2 (OH) 13 CO 3 ⁇ nH 2 O, Mg 5 Al 1.5 (OH) 12.5 CO 3 ⁇ nH 2 O, Mg 6 Al 2 (OH) 16 CO 3 ⁇ nH 2 O, Mg 4.2 Al 2 (OH) 12.4 CO 3 ⁇ nH 2 O, Mg 4.3 Al 2 (OH) 12.6 CO 3 ⁇ NH 2 O, Mg 2.5 Zn 2 Al 2 (OH) 13 CO 3 ⁇ nH 2 O, Mg 4.2 Al 2 (OH) 12.4 CO 3 ⁇ nH 2 O, Mg 4.2 Al 2 ( OH) 12.4 CO 3 ⁇ nH 2 O, Mg 4 Al 2 (OH) 12 CO 3 ⁇ nH 2 O, etc. 5), and among them, Mg 4.3 Al 2 (OH) 12.6 CO 3 ⁇ nH 2 O is preferable.
  • a / b is preferably 1.5 or more and 5 or less, more preferably 1.7 or more and 3 or less, and 1.8 or more and 2.5. The following is more preferable.
  • the average particle size of the (G) ion scavenger is usually 5 ⁇ m or less, preferably 1 ⁇ m or less.
  • the lower limit of the average particle size is not particularly limited, but is preferably 0.01 ⁇ m or more, more preferably 0.1 ⁇ m or more, and further preferably 0.3 ⁇ m or more.
  • the average particle size of the ion scavenger can be measured by the dynamic light scattering method. Specifically, it can be measured by creating a particle size distribution of the ion scavenger on a volume basis with a dynamic light scattering type particle size distribution measuring device and using the median diameter (D50) as the average particle size.
  • a dynamic light scattering type particle size distribution measuring device As the measurement sample, an ion scavenger dispersed in water by ultrasonic waves can be preferably used.
  • the dynamic light scattering type particle size distribution measuring device Nanotrac Wave II UT151 or the like manufactured by Microtrac Bell can be used.
  • ion scavenger As the ion scavenger (G), a commercially available product may be used, for example, IXEPLAS-A1, IXEPLAS-A2, IXEPLAS-A3, IXEPLAS-B1 manufactured by Toagosei Co., Ltd., DHT-4A, DHT manufactured by Kyowa Chemical Industry Co., Ltd., etc. -4A-2, DHT-4C and the like can be mentioned.
  • the blending amount thereof is preferably 0.01 parts by mass or more and 10 parts by mass or less, more preferably 10 parts by mass or less, based on 100 parts by mass of the curable composition of the present invention. It is 0.02 parts by mass or more and 5 parts by mass or less, and more preferably 0.03 parts by mass or more and 3 parts by mass or less.
  • the blending amount of the ion scavenger is within the above numerical range, insulation reliability and adhesion after high temperature and high humidity can be improved without lowering flexibility, low warpage, and flame retardancy.
  • the curable composition of the present invention preferably contains a compound having a (meth) acryloyl group and a hydroxyl group.
  • a compound having a (meth) acryloyl group and a hydroxyl group By containing a compound having a (meth) acryloyl group and a hydroxyl group, the adhesion between the obtained cured film and the conductor and the substrate is improved.
  • Examples of the compound having a (meth) acryloyl group and a hydroxyl group include 2-hydroxy-3-acryloyloxypropyl (meth) acrylate, 2-hydroxy-3-phenoxyethyl (meth) acrylate, and 1,4-cyclohexanedimethanol mono.
  • Aronix M-5700 (trade name manufactured by Toagosei Co., Ltd.), 4HBA, 2HEA, CHDMMA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.), BHEA, HPA, HEMA, HPMA (above, manufactured by Nippon Catalyst Co., Ltd.).
  • Product name light ester HO, light ester HOP, light ester HOA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.) and the like.
  • the compound having a (meth) acryloyl group and a hydroxyl group can be used alone or in combination of two or more.
  • 2-hydroxy-3-acryloyloxypropyl acrylate 2-hydroxy-3-phenoxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 1,4-cyclohexanedimethanol Monoacrylate is preferably used.
  • a compound having one (meth) acryloyl group is preferably used.
  • the blending amount of the compound having a (meth) acryloyl group and a hydroxyl group is preferably 1 to 15 parts by mass, more preferably 1 to 10 parts by mass, and particularly, per 100 parts by mass of the curable composition of the present invention. It is preferably 2 to 8 parts by mass.
  • Additives such as antioxidants, antifoaming / leveling agents, thixotropy-imparting agents / thickening agents, coupling agents, dispersants, polymerization retarders, and colorants are added to the curable composition of the present invention, if necessary. It can be contained.
  • a solvent may be used for adjusting the viscosity of the curable composition of the present invention, it is preferable that the amount added is small in order to prevent a decrease in film thickness after curing. Further, it is more preferable that the solvent for adjusting the viscosity is not contained.
  • the curable composition of the present invention is preferably applied to printing by an inkjet method.
  • the viscosity is such that it can be ejected by an inkjet printer.
  • the viscosity of the curable composition of the present invention is preferably 50 mPa ⁇ s or less at 50 ° C., more preferably 20 mPa ⁇ s or less at 50 ° C., and 15 mPa ⁇ s or less at 50 ° C. Is particularly preferable.
  • the viscosity is 50 ° C., 100 rpm, 30 seconds value according to the viscosity measurement method using a 10-cone-plate type rotational viscometer of JIS Z8803: 2011, and the cone plate type viscosity using 1 ° 34'x R24 as the cone rotor. It is a value measured by a meter (TVE-33H, manufactured by Toki Sangyo Co., Ltd.).
  • the curable composition of the present invention can directly print a pattern on a substrate or the like for a printed wiring board by an inkjet printing method.
  • the curable composition of the present invention does not undergo a polymerization reaction at room temperature, it can be stably stored as a one-component curable composition.
  • the viscosity of the curable composition of the present invention is 50 mPa ⁇ s or less at 50 ° C., it can be supplied as ink to an inkjet printer and can be used for printing on a substrate.
  • the cured product obtained by the curable composition of the present invention is, for example, photocuring the composition layer immediately after printing by irradiating the composition layer with an active energy ray of 50 mJ / cm 2 to 1000 mJ / cm 2. Obtained at.
  • the activation energy ray irradiation is performed by irradiation with active energy rays such as ultraviolet rays, electron beams, and chemical rays, preferably by ultraviolet irradiation.
  • Ultraviolet irradiation in an inkjet printer can be performed by, for example, attaching a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED to the side surface of the print head, and scanning by moving the print head or the substrate. In this case, printing and ultraviolet irradiation can be performed almost at the same time.
  • a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED
  • the cured product after photocuring is thermally cured by using a known heating means, for example, a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace.
  • a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace.
  • the cured product obtained by the curable composition of the present invention is also excellent in flexibility, and is therefore particularly suitable as a solder resist for a flexible printed wiring board.
  • Examples of the substrate of the flexible printed wiring board include a film made of glass polyimide, polyimide, polyethylene terephthalate, liquid crystal polymer, polycarbonate, and the like.
  • soldering may be performed by hand soldering, flow soldering, reflow soldering, or the like. For example, in the case of reflow soldering, preheating at 100 ° C. to 140 ° C. for 1 to 4 hours is required. After that, it is subjected to a reflow process of heating and melting the solder by repeating heating at 240 to 280 ° C. for about 5 to 20 seconds a plurality of times (for example, 2 to 4 times). The part is completed.
  • the electronic component means a component used in an electronic circuit, and includes active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes, as well as passive components such as resistors, capacitors, inductors, and connectors.
  • active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes
  • passive components such as resistors, capacitors, inductors, and connectors.
  • the curable composition of the present invention can be easily reduced in viscosity, has excellent coatability, and has little warpage after photocuring. Further, it is flexible even after curing, and is excellent in adhesion to a substrate, flame retardancy, solder heat resistance, plating resistance, and solvent resistance, so that it can be applied to various applications, and there is no particular limitation on the application target. For example, it can be used for manufacturing etching resists, solder resists, marking inks, etc. for printed wiring boards using an inkjet method, and is preferably used as a solder resist for flexible printed wiring boards, which require high heat resistance and flexibility. be able to.
  • It can also be used as a material for UV molded products, a material for stereolithography, and a material for 3D inkjet.
  • curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3 Each component was blended at the ratio (unit: parts by mass) shown in Table 1 below, and this was stirred with a dissolver. Then, dispersion was carried out with zirconia beads using a bead mill for 2 hours to obtain a curable composition of the present invention (Examples 1 to 8) and a curable composition of Comparative Examples (Comparative Examples 1 to 3).
  • a conical type K-8 manufactured by Buhra was used and kneaded under the conditions of a rotation speed of 1200 rpm, a discharge rate of 20%, a bead particle size of 0.65 mm, and a filling rate of 88%.
  • the values were set at 50 ° C., 100 rpm, and 30 seconds, and the value was set to 1 ° 34'x R24 as a cone rotor. It was measured with a cone plate type viscometer (TVE-33H, manufactured by Toki Sangyo Co., Ltd.) using the above, and evaluated according to the following criteria.
  • curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Each curable composition obtained was treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.). It was applied on the copper surface of M (registered trademark) M (manufactured by Nittetsu Chemical & Materials Co., Ltd.) with a coating thickness of 20 ⁇ m. The surface of the cured film was visually observed and evaluated according to the following criteria.
  • each sample was allowed to stand on a horizontal work table for 30 minutes with the cured film surface as the upper surface, and the heights of the four edges of the sample raised from the work table were measured with a ruler, and the average value of the heights of the four ends was measured. Asked. The same test was performed three times for each sample, and the average value of the three tests was calculated and evaluated according to the following criteria.
  • the average value of the total heights of the four ends is 5 mm or less ⁇ : The average value of the total heights of the four ends exceeds 5 mm and less than 10 mm ⁇ : The average value of the total heights of the four ends is 10 mm or more
  • the test piece 1 is mounted on the apparatus, the test piece 1 is vertically attached to the clamp 2 with the load F (0.5 kgf) applied, and the bending angle ⁇ is set. Bending was performed at 135 degrees and a speed of 175 cpm, and the number of reciprocating bends (times) until breaking was measured.
  • the evaluation criteria are as follows.
  • No peeling was observed in the cured film even when the film was immersed twice for 5 seconds and a peel test was performed with cellophane tape (registered trademark).
  • Even if the film was immersed once for 5 seconds and the peel test was performed with cellophane tape (registered trademark), no peeling was observed in the cured film.
  • X When the film is immersed for 5 seconds ⁇ 1 time, the cured film swells and peels off.
  • Polyimide 50 ⁇ m was applied onto a circuit pattern substrate.
  • a cured film having a thickness of 20 ⁇ m was formed according to the above “(2) Conditions for forming a cured film”.
  • the obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of nickel 5 ⁇ m and gold 0.03 ⁇ m, and the surface condition of the cured film was observed.
  • the evaluation criteria are as follows.
  • Examples 1 to 8 according to the present invention have adhesion, low warpage, and flexibility between the cured film (cured product) and the conductor circuit. Further, the flame retardancy could be improved by containing a compound having (E1) an aromatic ring and having two or more (meth) acryloyl groups, or by containing a phosphorus-based flame retardant. (See Examples 1 to 8). Further, by adding an ion scavenger, the adhesion between the cured film (cured product) and the conductor circuit was further improved (see Examples 6 and 7).

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Abstract

[Problem] To provide: a curable composition that includes an AMA ester and produces cured products that are flexible, have low warpage, and adhere to conductor circuits; a cured product of the curable composition; and an electronic component that includes the cured product. [Solution] A curable composition that contains (A) a polymerizable monomer that is represented by formula (1) (in which R1 is a straight-chain, branched, or cyclic C1–4 hydrocarbon group that may include an ether linkage (and may also include a substituent)), (B) a compound selected from the group that consists of melamine and derivatives thereof, (C) a photopolymerization initiator, and (D) a thermosetting component. Cured products of the curable composition are flexible, have low warpage, and have high adhesion to conductor circuits.

Description

硬化性組成物、硬化物および電子部品Curable compositions, cured products and electronic components
 本発明は、硬化性組成物、その硬化物および硬化物を含む電子部品に関し、特に、プリント配線板用絶縁材料に適した硬化性組成物、その硬化物および硬化物を含む電子部品に関する。 The present invention relates to a curable composition, a cured product thereof, and an electronic component containing the cured product, and more particularly to a curable composition suitable for an insulating material for a printed wiring board, and an electronic component containing the cured product and the cured product.
 α-アリルオキシメチルアクリロイル基含有エステル(以下、AMAエステルともいう)は、環化しながら重合し、両隣にメチレン基を配した5員環エーテル構造を繰り返し単位として有する主鎖骨格を形成することから、この重合物を有する硬化物は耐熱分解性、樹脂基材に対する密着性、強靭な機械的性質に優れるという特性を有する。 The α-allyloxymethylacryloyl group-containing ester (hereinafter, also referred to as AMA ester) polymerizes while being cyclized to form a main chain skeleton having a 5-membered ring ether structure having methylene groups arranged on both sides as a repeating unit. The cured product having this polymer has the characteristics of being excellent in heat-decomposability, adhesion to a resin substrate, and tough mechanical properties.
 特許文献1は、このAMAエステルを含む硬化性組成物を開示する。具体的には、特許文献1は、所定のAMAエステルと、二官能以上の光重合性モノマーと、ラジカル重合剤と、を有する硬化性組成物を開示する。この硬化性組成物は硬化性に優れ、インクジェット方式のプリント配線板用絶縁材料として有用である。 Patent Document 1 discloses a curable composition containing this AMA ester. Specifically, Patent Document 1 discloses a curable composition comprising a predetermined AMA ester, a bifunctional or higher photopolymerizable monomer, and a radical polymerization agent. This curable composition has excellent curability and is useful as an insulating material for an inkjet type printed wiring board.
特開2014-040585号公報Japanese Unexamined Patent Publication No. 2014-040585
 プリント配線板用絶縁材料としては、回路基板上に塗布する硬化性組成物が知られており、このような硬化性組成物は、塗布方式に応じて様々な粘度に調整される。
 しかし、プリント配線板用途の硬化性組成物には、導体回路との強固な密着性や、低反り性、柔軟性が要求されるところ、特許文献1にはこれらの特性については全く開示されていない。
As an insulating material for a printed wiring board, a curable composition to be applied on a circuit board is known, and such a curable composition is adjusted to various viscosities according to a coating method.
However, a curable composition for a printed wiring board is required to have strong adhesion to a conductor circuit, low warpage, and flexibility, and Patent Document 1 does not disclose these characteristics at all. No.
 本発明者らは、特許文献1に記載の硬化物が、プリント配線板用絶縁材料に用いるために必要な導体回路との密着性、低反り性、柔軟性という特性を、十分に有していないことを見出した。 The present inventors sufficiently have the characteristics of adhesion, low warpage, and flexibility required for the cured product described in Patent Document 1 to be used as an insulating material for a printed wiring board. I found that there wasn't.
 前記課題に鑑みた本発明の目的は、AMAエステルを有する硬化性組成物において、硬化物の導体回路との密着性、低反り性及び柔軟性を兼ね備える硬化性組成物、その硬化物およびこの硬化物を含む電子部品を提供することにある。 In view of the above problems, an object of the present invention is a curable composition having an AMA ester, which has adhesion to a conductor circuit of the cured product, low warpage, and flexibility, the cured product thereof, and the curing thereof. The purpose is to provide electronic components including things.
 本発明者らは、上記目的達成に向け鋭意検討を行った。その結果、α-アリルオキシメチルアクリル酸エステル化合物及び光重合開始剤に加えて、メラミンおよびその誘導体からなる群から選択される化合物と熱硬化成分とを硬化性組成物中に配合させることで、得られた硬化物の導体回路に対する高い密着性、低反り性および柔軟性を実現できることを見出し、本発明を完成するに至った。 The present inventors have made diligent studies to achieve the above object. As a result, in addition to the α-allyloxymethylacrylic acid ester compound and the photopolymerization initiator, a compound selected from the group consisting of melamine and its derivatives and a thermosetting component are blended into the curable composition. We have found that high adhesion, low warpage and flexibility to the conductor circuit of the obtained cured product can be realized, and have completed the present invention.
 すなわち、本発明の前記目的は、
 (A)式(1)
Figure JPOXMLDOC01-appb-C000002
(式(1)中、Rは、直鎖状、分岐鎖状および環状のいずれでもよく、エーテル結合を含んでいてもよい炭素数1個以上4個以下の炭化水素基を示す(但し、前記炭化水素基中に置換基を有していてもよい))
で表される重合性モノマーと、
 (B)メラミンおよびその誘導体からなる群から選択される化合物と、
 (C)光重合開始剤と、
 (D)熱硬化成分と、
を含有する硬化性組成物により達成されることが見出された。
 ここで、本発明の硬化性組成物が、50℃において50mPa・s以下の粘度を有することが好ましい。
That is, the object of the present invention is
(A) Equation (1)
Figure JPOXMLDOC01-appb-C000002
(In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). It may have a substituent in the hydrocarbon group))
With the polymerizable monomer represented by
(B) A compound selected from the group consisting of melamine and its derivatives, and
(C) Photopolymerization initiator and
(D) Thermosetting component and
It has been found that this is achieved with a curable composition containing.
Here, it is preferable that the curable composition of the present invention has a viscosity of 50 mPa · s or less at 50 ° C.
 また、本発明の硬化性組成物が、(E)(メタ)アクリロイル基を2個以上有する化合物を含有することが好ましく、(E)(メタ)アクリロイル基を2個以上有する化合物が、(E1)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含むことがさらに好ましい。 Further, the curable composition of the present invention preferably contains a compound having two or more (E) (meth) acryloyl groups, and a compound having two or more (E) (meth) acryloyl groups is (E1). ) It is more preferable to contain a compound having an aromatic ring and having two or more (meth) acryloyl groups.
 さらに、(D)熱硬化成分が潜在性熱硬化成分を含むことが好ましく、潜在性熱硬化成分がブロックイソシアネート化合物であることがさらに好ましい。 Further, it is preferable that the (D) thermosetting component contains a latent thermosetting component, and it is further preferable that the latent thermosetting component is a blocked isocyanate compound.
 そのうえ、本発明の硬化性組成物が、(F)リン系難燃剤をさらに含むことが好ましい。 Moreover, it is preferable that the curable composition of the present invention further contains (F) a phosphorus-based flame retardant.
 また、本発明の硬化性組成物が、(G)イオン捕捉剤をさらに含むことが好ましい。 Further, it is preferable that the curable composition of the present invention further contains a (G) ion scavenger.
 さらに、本発明の前記目的は、本発明の硬化性組成物より得られる硬化物、およびこの硬化物を有する電子部品によっても達成することができる。 Furthermore, the above object of the present invention can also be achieved by a cured product obtained from the curable composition of the present invention and an electronic component having the cured product.
 本発明の硬化性組成物によれば、得られた硬化物は導体回路との高い密着性、低反り性及び柔軟性を兼ね備えたものとなる。また、本発明の硬化性樹脂組成物より得られる硬化物、この硬化物を有する電子部品についても、それぞれ同様に硬化物の導体回路との高い密着性、低反り性及び柔軟性を兼ね備えたものとなる。 According to the curable composition of the present invention, the obtained cured product has high adhesion to a conductor circuit, low warpage, and flexibility. Further, the cured product obtained from the curable resin composition of the present invention and the electronic component having the cured product also have high adhesion, low warpage and flexibility to the conductor circuit of the cured product. It becomes.
硬化性組成物より得られる硬化膜に対して行ったMIT試験の説明図である。It is explanatory drawing of the MIT test performed on the cured film obtained from the curable composition.
 <硬化性組成物>
 本発明の硬化性組成物は、
 (A)式(1)
Figure JPOXMLDOC01-appb-C000003
(式(1)中、Rは、直鎖状、分岐鎖状および環状のいずれでもよく、エーテル結合を含んでいてもよい炭素数1個以上4個以下の炭化水素基を示す(但し、前記炭化水素基中に置換基を有していてもよい))
で表される重合性モノマー(以下、(A)式(1)の重合性モノマーともいう)と、
 (B)メラミンおよびその誘導体からなる群から選択される化合物と、
 (C)光重合開始剤と、
 (D)熱硬化成分と、
を有する。
<Curable composition>
The curable composition of the present invention is
(A) Equation (1)
Figure JPOXMLDOC01-appb-C000003
(In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). It may have a substituent in the hydrocarbon group))
(Hereinafter, also referred to as the polymerizable monomer of the formula (A) (1)) represented by
(B) A compound selected from the group consisting of melamine and its derivatives, and
(C) Photopolymerization initiator and
(D) Thermosetting component and
Have.
 [(A)式(1)の重合性モノマー]
 本発明の硬化性組成物に含まれる(A)式(1)の重合性モノマーは、特に柔軟性を有するフレキシブルプリント配線板上において、露光後の硬化物の反りを抑えることができる。硬化物の反りが大きくなると、フレキシブルプリント配線板全体が筒状となってしまい、重ね塗りする際に適切な位置に硬化性組成物を塗布することができないという問題が生じてしまう。また、インクジェット印刷用途の場合ではフレキシブルプリント配線板が反るとインクジェットヘッドと接触してしまうという問題が生じてしまう。そして、熱硬化時にさらに反りが大きくなるという問題もあった。しかしながら、本発明の硬化性組成物においては、(A)式(1)の重合性モノマーを含有するため、露光後の硬化物の反りを抑え、さらには熱硬化後の反りも抑えることができる。
 本発明の硬化性組成物に含まれる(A)式(1)の重合性モノマーは、例えば、以下の式a):
Figure JPOXMLDOC01-appb-I000004
 (式a)中、Rは式(1)中のRと同じであり、X・は開始ラジカルまたは生長ラジカルを示す)で表されるように、環化しながら重合反応が進行するので、両隣にメチレン基を配した5員環エーテル構造を繰り返し単位とする主鎖骨格を形成すると考えられる。
[Polymerizable monomer of formula (A) (1)]
The polymerizable monomer of the formula (A) (1) contained in the curable composition of the present invention can suppress the warp of the cured product after exposure, particularly on a flexible printed wiring board having flexibility. When the warp of the cured product becomes large, the entire flexible printed wiring board becomes cylindrical, which causes a problem that the curable composition cannot be applied at an appropriate position when recoating. Further, in the case of an inkjet printing application, if the flexible printed wiring board is warped, there arises a problem that the flexible printed wiring board comes into contact with the inkjet head. Then, there is also a problem that the warp becomes larger at the time of heat curing. However, since the curable composition of the present invention contains the polymerizable monomer of the formula (A) (1), it is possible to suppress the warp of the cured product after exposure and further suppress the warp after heat curing. ..
The polymerizable monomer of the formula (A) (1) contained in the curable composition of the present invention is, for example, the following formula a):
Figure JPOXMLDOC01-appb-I000004
(In the formula a), R 1 is the same as R 1 in the formula (1), as represented by X · denotes the initiating radical or a growing radical), since the polymerization reaction while cyclization proceeds, It is considered that a main chain skeleton having a 5-membered ring ether structure having methylene groups arranged on both sides as a repeating unit is formed.
 前記炭素数1個以上4個以下の炭化水素基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、ビニル基、アリル基、メタリル基、クロチル基、シクロプロピル基、シクロブチル基、メトキシメチル基、メトキシエチル基、エトキシメチル基、エトキシエチル基、ビニルオキシエチル基などが挙げられる。 Examples of the hydrocarbon group having 1 to 4 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, a tert-butyl group and a vinyl group. Examples thereof include an allyl group, a metalyl group, a crotyl group, a cyclopropyl group, a cyclobutyl group, a methoxymethyl group, a methoxyethyl group, an ethoxymethyl group, an ethoxyethyl group and a vinyloxyethyl group.
 前記置換基としては、例えば、ビニル基、アリル基、メタリル基、クロチル基、などの鎖状不飽和炭化水素基;メトキシ基、エトキシ基、メトキシエトキシ基などのアルコキシ基;メチルチオ基、エチルチオ基などのアルキルチオ基;アセチル基、プロピオニル基などのアシル基;アセチルオキシ基、プロピオニルオキシ基などのアシルオキシ基;メトキシカルボニル基、エトキシカルボニル基などのアルコキシカルボニル基;メチルチオカルボニル基、エチルチオカルボニル基などのアルキルチオカルボニル基;フッ素原子、塩素原子、臭素原子、ヨウ素原子などのハロゲン原子;ウレイド基;アミド基;シアノ基;トリメチルシリル基などが挙げられる。 Examples of the substituent include a chain unsaturated hydrocarbon group such as a vinyl group, an allyl group, a metallicyl group and a crotyl group; an alkoxy group such as a methoxy group, an ethoxy group and a methoxyethoxy group; a methylthio group and an ethylthio group. Alkylthio group; acyl group such as acetyl group and propionyl group; acyloxy group such as acetyloxy group and propionyloxy group; alkoxycarbonyl group such as methoxycarbonyl group and ethoxycarbonyl group; alkylthio such as methylthiocarbonyl group and ethylthiocarbonyl group Examples thereof include a carbonyl group; a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom; a ureido group; an amide group; a cyano group; and a trimethylsilyl group.
 Rは、(A)式(1)の重合性モノマーの工業的な作りやすさと、(A)式(1)の重合性モノマーを低粘度化し、硬化性組成物の粘度を低下させる観点から、炭素数1個以上4個以下の鎖状飽和炭化水素基、炭素数1個以上4個以下の鎖状不飽和炭化水素基および炭素数1個以上4個以下のエーテル結合を有する炭化水素基が好ましく、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基、アリル基、メタリル基、クロチル基、メトキシエチル基、エトキシエチル基およびビニルオキシエチル基がより好ましい。 R 1 is derived from the viewpoints of industrial ease of making the polymerizable monomer of the formula (A) (1) and reducing the viscosity of the polymerizable monomer of the formula (A) (1) to reduce the viscosity of the curable composition. , A chain saturated hydrocarbon group having 1 to 4 carbon atoms, a chain unsaturated hydrocarbon group having 1 to 4 carbon atoms, and a hydrocarbon group having an ether bond having 1 to 4 carbon atoms. Is preferable, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, allyl group, metallicyl group, crotyl group, methoxyethyl group, ethoxyethyl group and vinyl. Oxyethyl groups are more preferred.
 (A)式(1)の重合性モノマーとしては、例えば、α-アリルオキシメチルアクリル酸メチル、α-アリルオキシメチルアクリル酸エチル、α-アリルオキシメチルアクリル酸n-プロピル、α-アリルオキシメチルアクリル酸イソプロピル、α-アリルオキシメチルアクリル酸n-ブチル、α-アリルオキシメチルアクリル酸sec-ブチル、α-アリルオキシメチルアクリル酸tert-ブチル、α-アリルオキシメチルアクリル酸ビニル、α-アリルオキシメチルアクリル酸アリル、α-アリルオキシメチルアクリル酸メタリル、α-アリルオキシメチルアクリル酸クロチル、α-アリルオキシメチルアクリル酸メトキシメチル、α-アリルオキシメチルアクリル酸メトキシエチル、α-アリルオキシメチルアクリル酸メトキシプロピル、α-アリルオキシメチルアクリル酸メトキシブチル、α-アリルオキシメチルアクリル酸エトキシメチル、α-アリルオキシメチルアクリル酸エトキシエチル、α-アリルオキシメチルアクリル酸ビニルオキシエチルなどが挙げられる。これらは、それぞれ単独で用いてもよく、2種類以上を併用してもよい。 Examples of the polymerizable monomer of the formula (A) (1) include methyl α-allyloxymethylacrylate, ethyl α-allyloxymethylacrylate, n-propyl α-allyloxymethylacrylate, and α-allyloxymethyl. Isopropyl acrylate, n-butyl α-allyloxymethylacrylate, sec-butyl α-allyloxymethylacrylate, tert-butyl α-allyloxymethylacrylate, vinyl α-allyloxymethylacrylate, α-allyloxy Allyl Methylacrylate, Metalyl α-allyloxymethylacrylate, Crotyl α-allyloxymethylacrylate, methoxymethyl α-allyloxymethylacrylate, methoxyethyl α-allyloxymethylacrylate, α-allyloxymethylacrylate Examples thereof include methoxypropyl, methoxybutyl α-allyloxymethylacrylate, ethoxymethyl α-allyloxymethylacrylate, ethoxyethyl α-allyloxymethylacrylate, and vinyloxyethyl α-allyloxymethylacrylate. These may be used alone or in combination of two or more.
 (A)式(1)の重合性モノマーは、例えば、特開2014-040585号公報、特開2011-137123号公報等に記載された方法に準じて調整することができる。 The polymerizable monomer of the formula (A) (1) can be adjusted according to the methods described in, for example, JP-A-2014-040585, JP-A-2011-137123, and the like.
 (A)式(1)の重合性モノマーの配合量は、本発明の硬化性組成物100質量部に対して、好ましくは1質量部以上80質量部以下、より好ましくは5質量部以上60質量部以下、特に好ましくは5質量部以上50質量部以下である。 The blending amount of the polymerizable monomer of the formula (A) (1) is preferably 1 part by mass or more and 80 parts by mass or less, and more preferably 5 parts by mass or more and 60 parts by mass with respect to 100 parts by mass of the curable composition of the present invention. Parts or less, particularly preferably 5 parts by mass or more and 50 parts by mass or less.
 [(B)メラミンおよびその誘導体からなる群から選択される化合物]
 本発明の硬化性組成物は、(B)メラミンおよびその誘導体からなる群から選択される化合物を含む。メラミンおよびその誘導体は、硬化物の導体回路との密着性の向上に加えて、耐熱性等の特性をより一層向上させるために使用される。
[Compound selected from the group consisting of (B) melamine and its derivatives]
The curable composition of the present invention contains a compound selected from the group consisting of (B) melamine and its derivatives. Melamine and its derivatives are used to further improve properties such as heat resistance, in addition to improving the adhesion of the cured product to the conductor circuit.
 (B)メラミンおよびその誘導体からなる群から選択される化合物としては、例えば、アセトグアナミン、ベンゾグアナミン等のグアナミン類;メラミン;エチルジアミノ-S-トリアジン、2,4-ジアミノ-S-トリアジン、2,4-ジアミノ-6-キシリル-S-トリアジン等のトリアジン誘導体類が挙げることができ、中でもメラミンであることが好ましい。 (B) Compounds selected from the group consisting of melamine and derivatives thereof include, for example, guanamines such as acetguanamine and benzoguanamine; melamine; ethyldiamino-S-triazine, 2,4-diamino-S-triazine, 2, Examples thereof include triazine derivatives such as 4-diamino-6-xylyl-S-triazine, and melamine is preferable.
 (B)メラミンおよびその誘導体からなる群から選択される化合物は、1種を単独または2種以上混合して用いることができる。(B)メラミンおよびその誘導体からなる群から選択される化合物が本発明の硬化性組成物に配合される場合、その配合量は、後述する(D)熱硬化成分の合計量を100質量%とした場合、好ましくは0.1質量%以上20質量%以下であり、より好ましくは0.5質量%以上20質量%以下、特に好ましくは1質量%以上15質量%以下である。 (B) The compound selected from the group consisting of melamine and its derivatives can be used alone or in combination of two or more. When a compound selected from the group consisting of (B) melamine and a derivative thereof is blended in the curable composition of the present invention, the blending amount thereof is 100% by mass based on the total amount of the (D) thermocurable components described later. If so, it is preferably 0.1% by mass or more and 20% by mass or less, more preferably 0.5% by mass or more and 20% by mass or less, and particularly preferably 1% by mass or more and 15% by mass or less.
 (B)メラミンおよびその誘導体からなる群から選択される化合物の配合量を(D)熱硬化成分の合計量を100質量%とした場合に0.1質量%以上20質量%以下とすることで、硬化性組成物の保存安定性を高めつつ良好な熱硬化を実現することができる。 By setting the compounding amount of the compound selected from the group consisting of (B) melamine and its derivatives to 0.1% by mass or more and 20% by mass or less when the total amount of (D) thermosetting components is 100% by mass. , Good thermosetting can be realized while improving the storage stability of the curable composition.
 [(C)光重合開始剤]
 (C)光重合開始剤としては、光、レーザー、電子線等によりラジカルを発生し、ラジカル重合反応を開始する化合物であれば全て用いることができる。当該(C)光重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインとベンゾインアルキルエーテル類;アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、2,2-ジエトキシ-2-フェニルアセトフェノン、1,1-ジクロロアセトフェノン等のアセトフェノン類;2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン、N,N-ジメチルアミノアセトフェノン等のアミノアセトフェノン類;2-メチルアントラキノン、2-エチルアントラキノン、2-t-ブチルアントラキノン、1-クロロアントラキノン等のアントラキノン類;2,4-ジメチルチオキサントン、2,4-ジエチルチオキサントン、2-クロロチオキサントン、2,4-ジイソプロピルチオキサントン等のチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタール等のケタール類;2,4,5-トリアリールイミダゾール二量体;リボフラビンテトラブチレート;2-メルカプトベンゾイミダゾール、2-メルカプトベンゾオキサゾール、2-メルカプトベンゾチアゾール等のチオール化合物;2,4,6-トリス-s-トリアジン、2,2,2-トリブロモエタノール、トリブロモメチルフェニルスルホン等の有機ハロゲン化合物;ベンゾフェノン、4,4’-ビスジエチルアミノベンゾフェノン等のベンゾフェノン類またはキサントン類;2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド等のアシルホスフィン類;1,2-オクタンジオン,1-[4-(フェニルチオ)-,2-(O-ベンゾイルオキシム)]、エタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(O-アセチルオキシム)等のオキシムエステル類などが挙げられる。
[(C) Photopolymerization Initiator]
As the photopolymerization initiator, any compound that generates radicals by light, a laser, an electron beam, or the like and initiates a radical polymerization reaction can be used. Examples of the (C) photopolymerization initiator include benzoin and benzoin alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2, Acetophenones such as 2-diethoxy-2-phenylacetophenone and 1,1-dichloroacetophenone; 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2- Aminoacetophenones such as dimethylamino-1- (4-morpholinophenyl) -butane-1-one, N, N-dimethylaminoacetophenone; 2-methylanthraquinone, 2-ethylanthraquinone, 2-t-butylanthraquinone, 1- Anthraquinones such as chloroanthraquinone; thioxanthones such as 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylthioxanthone; ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal; 2 , 4,5-Triarylimidazole dimer; riboflavin tetrabutyrate; thiol compounds such as 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole; 2,4,6-tris-s-triazine , 2,2,2-Tribromoethanol, organic halogen compounds such as tribromomethylphenylsulfone; benzophenones such as benzophenone, 4,4'-bisdiethylaminobenzophenone or xanthones; 2,4,6-trimethylbenzoyldiphenylphosphine Acylphosphines such as oxides; 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)], etanone, 1- [9-ethyl-6- (2-methylbenzoyl)] ) -9H-Carbazole-3-yl]-, 1- (O-acetyloxime) and other oxime esters can be mentioned.
 上記(C)光重合開始剤は、1種単独で、または2種以上を混合して使用することができる。また、これらに加え、N,N-ジメチルアミノ安息香酸エチルエステル、N,N-ジメチルアミノ安息香酸イソアミルエステル、ペンチル-4-ジメチルアミノベンゾエート、トリエチルアミン、トリエタノールアミン等の三級アミン類などの光開始助剤を使用することができる。また、可視光領域に吸収のあるOmnirad 784等(IGM Resins B.V.社製)のチタノセン化合物等も、光反応を促進するために(C)光重合開始剤に添加することもできる。尚、光重合開始剤に添加する成分はこれらに限られるものではなく、紫外光もしくは可視光領域で光を吸収し、(メタ)アクリロイル基等のエチレン性不飽和基をラジカル重合させるものであれば、光重合開始剤、光開始助剤に限らず、単独であるいは複数併用して使用できる。  The above (C) photopolymerization initiator can be used alone or in combination of two or more. In addition to these, light such as tertiary amines such as N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylaminobenzoate, triethylamine, and triethanolamine Initiating aids can be used. Further, a titanocene compound of Omnirad 784 or the like (manufactured by IGM Resins BV), which absorbs in the visible light region, can also be added to the (C) photopolymerization initiator in order to promote the photoreaction. The components to be added to the photopolymerization initiator are not limited to these, and may be those that absorb light in the ultraviolet light or visible light region and radically polymerize an ethylenically unsaturated group such as a (meth) acryloyl group. For example, it is not limited to the photopolymerization initiator and the photoinitiator aid, and can be used alone or in combination of two or more. Twice
 (C)光重合開始剤で市販されているものの製品名としては、例えば、Omnirad 907、Omnirad 127、Omnirad 379EG(何れもIGM Resins B.V.社製)等が挙げられる。 (C) Commercially available photopolymerization initiators include, for example, Omnirad 907, Omnirad 127, Omnirad 379EG (all manufactured by IGM Resins BV) and the like.
 なお、(C)光重合開始剤は、カチオン重合反応を開始する化合物であってもよい。このような(C)光重合開始剤としては、例えば、ジフェニルヨードニウムテトラフルオロボロエート、トリフェニルスルホニウムヘキサフルオロアンチモネート、2,4,6-トリフェニルチオピリリウムヘキサフルオロホスフェート、市販品として、(株)ADEKA製オプトマ-SP-170やSP-152、サンアプロ社製CPI-100P、CPI-101A、CPI-200K、CPI-210S等のスルホニウム塩系光カチオン重合開始剤や、BASF社製イルガキュアー(登録商標)261等があげられる。 The photopolymerization initiator (C) may be a compound that initiates a cationic polymerization reaction. Examples of such (C) photopolymerization initiators include diphenyliodonium tetrafluoroboroate, triphenylsulfonium hexafluoroantimonate, 2,4,6-triphenylthiopyrilium hexafluorophosphate, and commercially available products ( ADEKA's Optoma-SP-170 and SP-152, San-Apro's CPI-100P, CPI-101A, CPI-200K, CPI-210S and other sulfonium salt-based photocationic polymerization initiators, and BASF's Irgacure ( Registered trademark) 261 and the like.
 (C)光重合開始剤の配合量は、本発明の硬化性組成物100質量部に対して好ましくは0.2~25質量部であり、より好ましくは0.5~20質量部である。 The blending amount of the (C) photopolymerization initiator is preferably 0.2 to 25 parts by mass, and more preferably 0.5 to 20 parts by mass with respect to 100 parts by mass of the curable composition of the present invention.
 [(D)熱硬化成分]
 また、本発明の硬化性組成物は、(D)熱硬化成分を含む。(D)熱硬化成分は、(A)式(1)の重合性モノマーと異なるものであり、(D)熱硬化成分を含むことで、硬化膜の導体回路との密着性の向上に加えて、耐熱性、めっき耐性、柔軟性、耐溶剤性、難燃性などの機能性をさらに向上させることができる。
[(D) Thermosetting component]
In addition, the curable composition of the present invention contains (D) a thermosetting component. The thermosetting component (D) is different from the polymerizable monomer of the formula (A) (1), and by containing the (D) thermosetting component, in addition to improving the adhesion of the cured film to the conductor circuit, , Functionality such as heat resistance, plating resistance, flexibility, solvent resistance, and flame retardancy can be further improved.
 (D)熱硬化成分としては、例えば、ブロックイソシアネート化合物、エポキシ化合物、オキセタン化合物等の公知の化合物を用いることができる。 As the (D) thermosetting component, for example, a known compound such as a blocked isocyanate compound, an epoxy compound, or an oxetane compound can be used.
 その中でも本発明においては特に、構造中の官能基が保護基により保護された潜在性の熱硬化成分を好ましく用いることができる。そのような潜在性の熱硬化成分を用いることによって、不慮の条件による硬化性組成物内の意図しない反応を抑制して、硬化性組成物の保存安定性を高めることができる。また、かかる硬化性組成物は50℃でのインクジェット印刷性にも優れ、硬化する際には加熱等によって容易に脱保護することが可能であり、潜在性の熱硬化成分を活性化することができる。本発明において、潜在性とは、常温や少々の加温条件では活性を示さないが、80℃以上の高温での加熱により活性化して熱硬化性を示す性質を意味するものとする。 Among them, in the present invention, a latent thermosetting component in which the functional group in the structure is protected by a protecting group can be preferably used. By using such a latent thermosetting component, it is possible to suppress an unintended reaction in the curable composition under unforeseen conditions and enhance the storage stability of the curable composition. In addition, such a curable composition is also excellent in inkjet printability at 50 ° C., and when cured, it can be easily deprotected by heating or the like, and a latent thermosetting component can be activated. can. In the present invention, the potential means a property that does not show activity at room temperature or a little heating condition, but is activated by heating at a high temperature of 80 ° C. or higher and shows thermosetting property.
 このような潜在性の熱硬化成分は、ブロックイソシアネート化合物であることが好ましい。ブロックイソシアネート化合物は、1分子内に好ましくは複数のブロック化イソシアネート基を有する化合物である。ブロック化イソシアネート基とは、イソシアネート基がブロック剤との反応により保護されて一時的に不活性化された基であり、所定温度に加熱されたときにそのブロック剤が解離してイソシアネート基が生成する。 Such a latent thermosetting component is preferably a blocked isocyanate compound. The blocked isocyanate compound is preferably a compound having a plurality of blocked isocyanate groups in one molecule. A blocked isocyanate group is a group in which an isocyanate group is protected by a reaction with a blocking agent and temporarily inactivated, and when heated to a predetermined temperature, the blocking agent is dissociated to generate an isocyanate group. do.
 複数のイソシアネート基を有するポリイソシアネート化合物としては、例えば、芳香族ポリイソシアネート、脂肪族ポリイソシアネートまたは脂環式ポリイソシアネートが用いられる。 As the polyisocyanate compound having a plurality of isocyanate groups, for example, aromatic polyisocyanate, aliphatic polyisocyanate or alicyclic polyisocyanate is used.
 芳香族ポリイソシアネートの具体例としては、例えば、4,4’-ジフェニルメタンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、ナフタレン-1,5-ジイソシアネート、o-キシリレンジイソシアネート、m-キシリレンジイソシアネートおよび2,4-トリレンダイマー等が挙げられる。 Specific examples of the aromatic polyisocyanate include 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, naphthalene-1,5-diisocyanate, o-xylylene diisocyanate, and the like. Examples thereof include m-xylylene diisocyanate and 2,4-tolylen dimer.
 脂肪族ポリイソシアネートの具体例としては、テトラメチレンジイソシアネート、ヘキサメチレンジイソシアネート、メチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネート、4,4-メチレンビス(シクロヘキシルイソシアネート)およびイソホロンジイソシアネート等が挙げられる。 Specific examples of the aliphatic polyisocyanate include tetramethylene diisocyanate, hexamethylene diisocyanate, methylene diisocyanate, trimethylhexamethylene diisocyanate, 4,4-methylene bis (cyclohexyl isocyanate) and isophorone diisocyanate.
 脂環式ポリイソシアネートの具体例としてはビシクロヘプタントリイソシアネートが挙げられる。並びに先に挙げられたイソシアネート化合物のアダクト体、ビューレット体およびイソシアヌレート体等が挙げられる。 A specific example of the alicyclic polyisocyanate is bicycloheptane triisocyanate. In addition, the adduct form, the burette form, the isocyanurate form, and the like of the isocyanate compounds mentioned above can be mentioned.
 イソシアネートブロック剤としては、例えば、フェノール、クレゾール、キシレノール、クロロフェノールおよびエチルフェノール等のフェノール系ブロック剤;ε-カプロラクタム、δ-パレロラクタム、γ-ブチロラクタムおよびβ-プロピオラクタム等のラクタム系ブロック剤;アセト酢酸エチルおよびアセチルアセトン等の活性メチレン系ブロック剤;メタノール、エタノール、プロパノール、ブタノール、アミルアルコール、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、ベンジルエーテル、グリコール酸メチル、グリコール酸ブチル、ジアセトンアルコール、乳酸メチルおよび乳酸エチル等のアルコール系ブロック剤;ホルムアルデヒドキシム、アセトアルドキシム、アセトキシム、メチルエチルケトキシム、ジアセチルモノオキシム、シクロヘキサンオキシム等のオキシム系ブロック剤;ブチルメルカプタン、ヘキシルメルカプタン、t-ブチルメルカプタン、チオフェノール、メチルチオフェノール、エチルチオフェノール等のメルカプタン系ブロック剤;酢酸アミド、ベンズアミド等の酸アミド系ブロック剤;コハク酸イミドおよびマレイン酸イミド等のイミド系ブロック剤;キシリジン、アニリン、ブチルアミン、ジブチルアミン等のアミン系ブロック剤;イミダゾール、2-エチルイミダゾール等のイミダゾール系ブロック剤;メチレンイミンおよびプロピレンイミン等のイミン系ブロック剤;ジメチルピラゾール等のピラゾール系ブロック剤等が挙げられる。 Examples of the isocyanate blocking agent include phenolic blocking agents such as phenol, cresol, xylenol, chlorophenol and ethylphenol; lactam blocking agents such as ε-caprolactam, δ-palerolactam, γ-butyrolactam and β-propiolactam; Active oxime blocking agents such as ethyl acetoacetate and acetylacetone; methanol, ethanol, propanol, butanol, amyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, benzyl Alcohol-based blocking agents such as ether, methyl glycolate, butyl glycolate, diacetone alcohol, methyl lactate and ethyl lactate; oxime-based blocking agents such as formaldehyde oxime, acetoaldoxime, acetoxime, methyl ethyl ketoxim, diacetyl monooxime and cyclohexane oxime. Mercaptan-based blocking agents such as butyl mercaptan, hexyl mercaptan, t-butyl mercaptan, thiophenol, methyl thiophenol, ethyl thiophenol; acid amide-based blocking agents such as acetate amide and benzamide; imides such as succinate imide and maleate imide. System blocking agents; amine blocking agents such as xylidine, aniline, butylamine, dibutylamine; imidazole blocking agents such as imidazole and 2-ethylimidazole; imine blocking agents such as methyleneimine and propyleneimine; pyrazoles such as dimethylpyrazole Blocking agents and the like can be mentioned.
 ブロックイソシアネート化合物は市販のものであってもよく、例えば、デュラネートTPA-B80E、17B-60PX、E402-B80T(いずれも旭化成社製)、TrixeneBI7982:ブロックイソシアネート(ヘキサメチレンイソシアネート(HDM)三量体、ブロック剤:ジメチルピラゾール(DMP)、Baxenden Chemicals社製)等が挙げられる。 The blocked isocyanate compound may be commercially available, for example, Duranate TPA-B80E, 17B-60PX, E402-B80T (all manufactured by Asahi Kasei Co., Ltd.), TrixeneBI7982: Blocked isocyanate (hexamethylene isocyanate (HDM) trimer, Blocking agents: dimethylpyrazole (DMP), Baxenden Chemicals) and the like.
 なお、潜在性の熱硬化成分としては、イミダゾールやジシアンジアミドなどのアミン化合物と、水酸基含有化合物、環状エーテル基含有化合物やカルボキシル基含有化合物等とを反応させた反応物でもよい。 The latent thermosetting component may be a reaction product obtained by reacting an amine compound such as imidazole or dicyandiamide with a hydroxyl group-containing compound, a cyclic ether group-containing compound, a carboxyl group-containing compound, or the like.
 (D)熱硬化成分の配合量は、本発明の硬化性組成物100質量部あたり好ましくは1質量部以上30質量部以下であり、より好ましくは5質量部以上25質量部以下である。(D)熱硬化成分の配合量が、本発明の硬化性組成物100質量部あたり1質量部以上30質量部以下であることで、本発明の硬化性組成物の保存安定性を保持しつつ、硬化膜の耐熱性、めっき耐性などの機能性をさらに向上させることができる。 The blending amount of the thermosetting component (D) is preferably 1 part by mass or more and 30 parts by mass or less, and more preferably 5 parts by mass or more and 25 parts by mass or less per 100 parts by mass of the curable composition of the present invention. (D) When the blending amount of the thermosetting component is 1 part by mass or more and 30 parts by mass or less per 100 parts by mass of the curable composition of the present invention, the storage stability of the curable composition of the present invention is maintained. , Functionality such as heat resistance and plating resistance of the cured film can be further improved.
 [(E)(メタ)アクリロイル基を2個以上有する化合物]
 本発明の硬化性組成物は、(E)(メタ)アクリロイル基を2個以上有する化合物を含有することが好ましい。(E)(メタ)アクリロイル基を2個以上有する化合物は、光重合反応により硬化され、硬化物を形成するために配合される成分である。なお、(E)(メタ)アクリロイル基を2個以上有する化合物は、(A)式(1)の重合性モノマーと異なるものである。
[(E) (Meta) compound having two or more acryloyl groups]
The curable composition of the present invention preferably contains a compound having two or more (E) (meth) acryloyl groups. (E) A compound having two or more (meth) acryloyl groups is a component that is cured by a photopolymerization reaction and is added to form a cured product. The compound having two or more (E) (meth) acryloyl groups is different from the polymerizable monomer of the formula (A) (1).
 (メタ)アクリロイル基を2個以上有することで、光重合反応による良好な硬化性を得ることができる。ここで、(メタ)アクリロイル基とは、アクリロイル基及びメタアクリロイル基を総称する用語である。 By having two or more (meth) acryloyl groups, good curability by a photopolymerization reaction can be obtained. Here, the (meth) acryloyl group is a general term for an acryloyl group and a meta-acryloyl group.
 また、熱履歴後、すなわち、はんだ処理後においても硬化膜(硬化物)の良好な導体回路への密着性および膜硬度等のソルダーレジストとしての機能性を付与するため、(E)(メタ)アクリロイル基を2個以上有する化合物が、(E1)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含むことがさらに好ましい。 Further, in order to impart functionality as a solder resist such as good adhesion of the cured film (cured product) to the conductor circuit and film hardness even after the thermal history, that is, after the soldering treatment, (E) (meth). It is more preferable that the compound having two or more acryloyl groups contains a compound having (E1) an aromatic ring and two or more (meth) acryloyl groups.
 (E1)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物は、例えば、多価フェノールの(メタ)アクリレートや、そのアルキレンオキサイド付加物が挙げられる。 Examples of the compound having (E1) aromatic ring and two or more (meth) acryloyl groups include (meth) acrylate of polyhydric phenol and its alkylene oxide adduct.
 多価フェノールとしては、ビスフェノールA、ビスフェノールAP、ビスフェノールB、ビスフェノールBP、ビスフェノールE、ビスフェノールF、ビスフェノールM、ビスフェノールP、ビスフェノールPH、ビスフェノールZなどのビスフェノール類、ビフェノールなどが挙げられる。 Examples of the polyhydric phenol include bisphenol A, bisphenol AP, bisphenol B, bisphenol BP, bisphenol E, bisphenol F, bisphenol M, bisphenol P, bisphenol PH, bisphenol Z and other bisphenols, and biphenol.
 アルキレンオキサイドとしては、例えば、エチレンオキサイド、プロピレンオキサイド、ブチレンオキサイドが挙げられる。アルキレンオキサイドの付加数は6以下であることが好ましい。 Examples of the alkylene oxide include ethylene oxide, propylene oxide, and butylene oxide. The number of alkylene oxides added is preferably 6 or less.
 (E1)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物の市販品としては、ABE-300(新中村化学工業社製)、BPE―80N(新中村化学工業社製)、BPE―100(新中村化学工業社製)、A-BPE-4(新中村化学工業社製)、BPE-4(第一工業製薬株式会社製)、BPE-10(第一工業製薬株式会社製)、BPE―200(新中村化学工業社製)、EBECRYL 150(ダイセル・オルネクス株式会社製)などが挙げられる。 (E1) Commercially available compounds having an aromatic ring and having two or more (meth) acryloyl groups include ABE-300 (manufactured by Shin-Nakamura Chemical Co., Ltd.), BPE-80N (manufactured by Shin-Nakamura Chemical Co., Ltd.), and the like. BPE-100 (manufactured by Shin-Nakamura Chemical Co., Ltd.), A-BPE-4 (manufactured by Shin-Nakamura Chemical Co., Ltd.), BPE-4 (manufactured by Dai-ichi Kogyo Pharmaceutical Co., Ltd.), BPE-10 (manufactured by Dai-ichi Kogyo Pharmaceutical Co., Ltd.) ), BPE-200 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), EBECRYL 150 (manufactured by Daicel Ornex Co., Ltd.) and the like.
 さらに、(E)(メタ)アクリロイル基を2個以上有する化合物は、硬化性組成物の粘度を低下させつつ良好な硬化性を得る観点から、低粘度の(メタ)アクリロイル基を2個有する化合物を含むことが好ましい。ここで、(E)(メタ)アクリロイル基を2個以上有する化合物において、低粘度とは、50℃における粘度が50mPa・s以下、特に50℃における粘度が20mPa・s以下であることをいう。 Further, the compound having two or more (E) (meth) acryloyl groups is a compound having two low-viscosity (meth) acryloyl groups from the viewpoint of obtaining good curability while lowering the viscosity of the curable composition. Is preferably included. Here, in the compound having two or more (E) (meth) acryloyl groups, the low viscosity means that the viscosity at 50 ° C. is 50 mPa · s or less, and particularly the viscosity at 50 ° C. is 20 mPa · s or less.
 低粘度の(メタ)アクリロイル基を2個有する化合物としては、アルキレングリコールと(メタ)アクリル酸とのエステルである二官能(メタ)アクリロイル基含有モノマーが挙げられる。 Examples of the compound having two low-viscosity (meth) acryloyl groups include a bifunctional (meth) acryloyl group-containing monomer which is an ester of alkylene glycol and (meth) acrylic acid.
 アルキレングリコールは、モノアルキレングリコールでも、2以上のアルキレングリコールの繰り返し構造を有するものであってもよい。モノアルキレングリコールとしては、炭素数3~16個、好ましくは炭素数6~9個の直鎖又は分岐鎖のアルキレンジオールが挙げられる。 The alkylene glycol may be a monoalkylene glycol or one having a repeating structure of two or more alkylene glycols. Examples of the monoalkylene glycol include linear or branched alkylene diols having 3 to 16 carbon atoms, preferably 6 to 9 carbon atoms.
 2以上のアルキレングリコールの繰り返し構造を有するものとしては、ジエチレングリコール、ジプロピレングリコール、ジブチレングリコール、トリエチレングリコール、トリプロピレングリコール、トリブチレングリコールなどが挙げられる。 Examples of those having a repeating structure of two or more alkylene glycols include diethylene glycol, dipropylene glycol, dibutylene glycol, triethylene glycol, tripropylene glycol, and tributylene glycol.
 具体的には、低粘度の(メタ)アクリロイル基を2個有する化合物としては、ジエチレングリコールジ(メタ)アクリレート、ジプロピレングリコールジ(メタ)アクリレート、ジブチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、トリブチレングリコールジ(メタ)アクリレート、1,3-ブチレングリコールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、1,9-ノナンジオールアクリレート、1,10-デカンジオールジアクリレート、1,16-ヘキサデカンジオールジアクリレートなどが挙げられる。 Specifically, examples of the compound having two low-viscosity (meth) acryloyl groups include diethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, dibutylene glycol di (meth) acrylate, and triethylene glycol di. (Meta) acrylate, tripropylene glycol di (meth) acrylate, tributylene glycol di (meth) acrylate, 1,3-butylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6 -Hexanediol di (meth) acrylate, 1,9-nonanediol acrylate, 1,10-decanediol diacrylate, 1,16-hexadecanediol diacrylate and the like can be mentioned.
 低粘度の(メタ)アクリロイル基を2個有する化合物の市販品としては、2G(新中村化学工業社製)、3G(新中村化学工業社製)、DPGDA(ダイセルオルネクス社製)、T0948(東京化成工業株式会社製)、T2389(東京化成工業株式会社製)、ビスコート#310HP(大阪有機化学工業株式会社製)、PE-200(第一工業製薬株式会社製)、PE-300(第一工業製薬株式会社製)、HDDA(ダイセルオルネクス社製)、L-C9A(第一工業製薬株式会社製)、A-NOD-N(新中村化学工業社製)、B1065(東京化成工業株式会社製)、1,9-NDA(第一工業製薬社製)などが挙げられる。 Commercially available products of compounds having two low-viscosity (meth) acryloyl groups include 2G (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 3G (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), DPGDA (manufactured by Daicel Ornex), and T0948 ( Tokyo Chemical Industry Co., Ltd., T2389 (Tokyo Chemical Industry Co., Ltd.), Viscoat # 310HP (Osaka Organic Chemical Industry Co., Ltd.), PE-200 (Daiichi Kogyo Seiyaku Co., Ltd.), PE-300 (Daiichi) Industrial Pharmaceutical Co., Ltd.), HDDA (Dycel Ornex Co., Ltd.), LC9A (Daiichi Kogyo Pharmaceutical Co., Ltd.), A-NOD-N (Shin-Nakamura Chemical Industry Co., Ltd.), B1065 (Tokyo Chemical Industry Co., Ltd.) (Manufactured by), 1,9-NDA (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.) and the like.
 また、光重合反応による硬化性をさらに向上させるため、(E)(メタ)アクリロイル基を2個以上有する化合物が、(メタ)アクリロイル基を3個以上有する化合物を含むことが好ましい。 Further, in order to further improve the curability by the photopolymerization reaction, it is preferable that the compound having two or more (E) (meth) acryloyl groups contains a compound having three or more (meth) acryloyl groups.
 (メタ)アクリロイル基を3個以上有する化合物としては、トリメチロールプロパントリアクリレート、トリメチロールメタントリアクリレート、エチレンオキサイド変性トリメチロールプロパントリアクリレート、プロピレンオキサイド変性トリメチロールプロパントリアクリレート、エピクロルヒドリン変性トリメチロールプロパントリアクリレート、ペンタエリスリトールテトラアクリレート、テトラメチロールメタンテトラアクリレート、エチレンオキサイド変性リン酸トリアクリレート、プロピレンオキサイド変性リン酸トリアクリレート、エピクロルヒドリン変性グリセロールトリアクリレート、ジペンタエリスリトールヘキサアクリレート、ジトリメチロールプロパンテトラアクリレート、あるいはこれらのシルセスキオキサン変性物等に代表される多官能アクリレート、あるいはこれらに対応するメタアクリレートモノマー、εカプロラクトン変性トリスアクリロキシエチルイソシアヌレートが挙げられる。 Examples of the compound having three or more (meth) acryloyl groups include trimethylolpropane triacrylate, trimethylolmethane triacrylate, ethylene oxide-modified trimethylolpropane triacrylate, propylene oxide-modified trimethylolpropane triacrylate, and epichlorohydrin-modified trimethylolpropane triacrylate. Acrylate, pentaerythritol tetraacrylate, tetramethylolmethanetetraacrylate, ethyleneoxide-modified phosphoric acid triacrylate, propylene oxide-modified phosphoric acid triacrylate, epichlorohydrin-modified glycerol triacrylate, dipentaerythritol hexaacrylate, ditrimethylolpropane tetraacrylate, or these. Examples thereof include polyfunctional acrylates typified by silsesquioxane-modified products, metaacrylate monomers corresponding thereto, and εcaprolactone-modified trimethyloloxyethyl isocyanurate.
 なお、(メタ)アクリロイル基を3個以上有する化合物は、多分岐状のオリゴマー又はポリマーであってもよい。 The compound having three or more (meth) acryloyl groups may be a multi-branched oligomer or polymer.
 (E)(メタ)アクリロイル基を2個以上有する化合物は、本発明の硬化性組成物100質量部あたり好ましくは10質量部以上90質量部以下であり、好ましくは10質量部以上80質量部以下であり、特に好ましくは15質量部以上75質量部以下である。 The compound having two or more (meth) acryloyl groups is preferably 10 parts by mass or more and 90 parts by mass or less, and preferably 10 parts by mass or more and 80 parts by mass or less per 100 parts by mass of the curable composition of the present invention. It is particularly preferably 15 parts by mass or more and 75 parts by mass or less.
 (E)(メタ)アクリロイル基を2個以上有する化合物が、本発明の硬化性組成物100質量部あたり10質量部以上の場合、相溶性が向上し、均一に分散し、良好な塗膜特性が得られ、90質量部以下であることで、耐熱性向上の効果が得られる。 (E) When the compound having two or more (meth) acryloyl groups is 10 parts by mass or more per 100 parts by mass of the curable composition of the present invention, the compatibility is improved, the compound is uniformly dispersed, and good coating film characteristics are obtained. Is obtained, and when it is 90 parts by mass or less, the effect of improving heat resistance can be obtained.
 [(F)リン系難燃剤]
 本発明の硬化性組成物は、得られる硬化物の難燃性向上を目的として、公知慣用の(F)リン系難燃剤を含むことが好ましい。
[(F) Phosphorus flame retardant]
The curable composition of the present invention preferably contains a known and commonly used (F) phosphorus-based flame retardant for the purpose of improving the flame retardancy of the obtained cured product.
 (F)リン系難燃剤としては、例えば、リン酸エステルおよび縮合リン酸エステル、フェノール性水酸基を有するリン含有化合物、ホスファゼン化合物、ホスフィン酸金属塩、および下記一般式(2)
Figure JPOXMLDOC01-appb-C000005
 (式(2)中、R、RおよびRは、それぞれ独立に、ハロゲン原子以外の置換基を示す。)で表される化合物が挙げられる。
Examples of the phosphorus-based flame retardant include a phosphoric acid ester and a condensed phosphoric acid ester, a phosphorus-containing compound having a phenolic hydroxyl group, a phosphazene compound, a phosphinic acid metal salt, and the following general formula (2).
Figure JPOXMLDOC01-appb-C000005
(In the formula (2), R 2 , R 3 and R 4 each independently represent a substituent other than a halogen atom).
 上記一般式(2)中、R、Rは水素原子または炭素原子数1個以上4個以下のアルキル基であることが好ましく、Rは、水素原子、シアノ基で置換されていてもよい炭素原子数1個以上4個以下のアルキル基、2,5-ジヒドロキシフェニル基、または3,5-ジ-t-ブチル-4-ヒドロキシフェニル基であることが好ましいが、これに限定されるものではない。 In the above general formula (2), R 2 and R 3 are preferably hydrogen atoms or alkyl groups having 1 or more and 4 or less carbon atoms, and R 4 may be substituted with hydrogen atoms or cyano groups. A good alkyl group having 1 or more and 4 or less carbon atoms, a 2,5-dihydroxyphenyl group, or a 3,5-di-t-butyl-4-hydroxyphenyl group is preferable, but is limited thereto. It's not a thing.
 上記一般式(2)で表される化合物の市販品としては、HCA、SANKO-220、M-ESTER、HCA-HQ(いずれも三光社の商品名)等がある。 Commercially available products of the compound represented by the above general formula (2) include HCA, SANKO-220, M-ESTER, HCA-HQ (all are trade names of Sanko Co., Ltd.) and the like.
 フェノール性水酸基を有するリン含有化合物としては、上記一般式(2)中、Rが、水酸基で置換されたフェニル基であるものが挙げられる。市販品としては、三光社製HCA-HQ等がある。 The phosphorus-containing compound having a phenolic hydroxyl group, in the general formula (2), R 4 may be mentioned those wherein a phenyl group substituted with a hydroxyl group. Commercially available products include HCA-HQ manufactured by Sanko Co., Ltd.
 ホスフィン酸金属塩としては、例えば、下記構造式(3)
Figure JPOXMLDOC01-appb-C000006
 (式(3)中、
 R、Rは、それぞれ、炭素原子数1~6のアルキル基又は炭素原子数12以下のアリール基を表し、
 Mは、カルシウム、アルミニウム又は亜鉛を表し、Mがアルミニウムを表す場合にはm=3であり、それ以外の金属を表す場合にはm=2である)
で表される構造を有するものが好ましい。
Examples of the phosphinic acid metal salt include the following structural formula (3).
Figure JPOXMLDOC01-appb-C000006
(In equation (3),
R 1 and R 2 represent an alkyl group having 1 to 6 carbon atoms or an aryl group having 12 or less carbon atoms, respectively.
M represents calcium, aluminum or zinc, m = 3 when M represents aluminum, and m = 2 when M represents other metals)
Those having a structure represented by are preferable.
 より好ましくは、式(3)中、Mがアルミニウムを表す構造を有する化合物である。 More preferably, it is a compound having a structure in which M represents aluminum in the formula (3).
 ホスフィン酸金属塩を用いることにより、硬化膜の柔軟性を損なわず難燃性を向上させることができる。 By using a metal phosphinic acid salt, flame retardancy can be improved without impairing the flexibility of the cured film.
 ホスフィン酸金属塩を構成するホスフィン酸の具体例としては、ホスフィン酸、ジメチルホスフィン酸、エチルメチルホスフィン酸、ジエチルホスフィン酸、メチル-n-プロピルホスフィン酸、メタンジ(メチルホスフィン酸)、ベンゼン-1,4-(ジメチルホスフィン酸)、メチルフェニルホスフィン酸、フェニルホスフィン酸、ジフェニルホスフィン酸およびこれらの混合物が挙げられる。 Specific examples of the phosphinic acid constituting the phosphinic acid metal salt include phosphinic acid, dimethylphosphinic acid, ethylmethylphosphinic acid, diethylphosphinic acid, methyl-n-propylphosphinic acid, methanedi (methylphosphinic acid), benzene-1, Examples thereof include 4- (dimethylphosphinic acid), methylphenylphosphinic acid, phenylphosphinic acid, diphenylphosphinic acid and mixtures thereof.
 市販品としては、例えば、Exolit OP 1240、1240、1312、1400、930、945TP、OP-935を挙げることができる。 Examples of commercially available products include Exolit OP 1240, 1240, 1312, 1400, 930, 945TP, and OP-935.
 ホスファゼン化合物は、シアノ基(-CN)、水酸基(-OH)およびメチル基のいずれか1種により置換されているフェノキシ基とホスファゼン構造を有する化合物であることが好ましい。特に、基本骨格としてヘキサフェノキシシクロトリホスファゼン構造を有し、当該構造中の6個のフェノキシ基のうち、少なくとも2個がシアノ基(-CN)または水酸基(-OH)により置換されていることが好ましい。 The phosphazene compound is preferably a compound having a phenoxy group and a phosphazene structure substituted with any one of a cyano group (-CN), a hydroxyl group (-OH) and a methyl group. In particular, it has a hexaphenoxycyclotriphosphazene structure as a basic skeleton, and at least two of the six phenoxy groups in the structure are substituted with a cyano group (-CN) or a hydroxyl group (-OH). preferable.
 好ましい態様としては、ヘキサフェノキシシクロトリホスファゼン構造中のリン原子に結合する2個のフェノキシ基のうちのいずれか一方のみが1個のシアノ基(-CN)により置換され、且つこのように置換されたフェノキシ基を、ヘキサフェノキシシクロトリホスファゼン構造全体として2個有する構造である。 In a preferred embodiment, only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with and thus substituted with one cyano group (-CN). It is a structure having two hexaphenoxycyclotriphosphazene structures as a whole.
 また別の好ましい態様としては、ヘキサフェノキシシクロトリホスファゼン構造中のリン原子に結合する2個のフェノキシ基がいずれも1個シアノ基(-CN)により置換され、且つこのように置換されたフェノキシ基を、ヘキサフェノキシシクロトリホスファゼン構造全体として6個全て有する構造である。 In yet another preferred embodiment, the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure are both substituted with one cyano group (-CN), and the phenoxy group thus substituted. Is a structure having all six hexaphenoxycyclotriphosphazene structures as a whole.
 また別の好ましい態様としては、ヘキサフェノキシシクロトリホスファゼン構造中のリン原子に結合する2個のフェノキシ基のうちのいずれか一方のみが1個の水酸基(-OH)により置換され、且つこのように置換されたフェノキシ基を、ヘキサフェノキシシクロトリホスファゼン構造全体として3個有する構造である。 In yet another preferred embodiment, only one of the two phenoxy groups attached to the phosphorus atom in the hexaphenoxycyclotriphosphazene structure is substituted with one hydroxyl group (-OH) and thus thus. It is a structure having three substituted phenoxy groups as a whole hexaphenoxycyclotriphosphazene structure.
 より好ましくは、環状ホスファゼン化合物は、下記構造:
Figure JPOXMLDOC01-appb-C000007
 または
Figure JPOXMLDOC01-appb-C000008
 または
Figure JPOXMLDOC01-appb-C000009
 のうちいずれかの構造を有するものである。
More preferably, the cyclic phosphazene compound has the following structure:
Figure JPOXMLDOC01-appb-C000007
or
Figure JPOXMLDOC01-appb-C000008
or
Figure JPOXMLDOC01-appb-C000009
It has one of the above structures.
 好ましいホスファゼン化合物の市販品としては、例えば、FP-300B、FP-300、SPH-100(いずれも伏見製薬社製)を挙げることができる。 Examples of commercially available products of preferable phosphazene compounds include FP-300B, FP-300, and SPH-100 (all manufactured by Fushimi Pharmaceutical Co., Ltd.).
 (F)リン系難燃剤は、1種を単独で用いてもよく、2種以上を併用してもよい。(F)リン系難燃剤が配合される場合、その配合量は、本発明の硬化性組成物100質量部に対して1質量部以上50質量部以下であることが好ましく、より好ましくは5質量部以上40質量部以下である。特に、(F)リン系難燃剤の配合量は、本発明の硬化性組成物中のリン含有率として0.1~10%であることが好ましく、より好ましくは1~5%である。(F)リン系難燃剤が上記範囲内で配合される場合、耐熱性、低反り性を保ったまま難燃性を効果的に付与することができる。なお、本発明の硬化性組成物においては、難燃剤としてFirebrake ZB等のホウ酸金属塩(ホウ酸亜鉛化合物(2ZnO・3B・3.5HO)を用いてもよい。 (F) One type of phosphorus-based flame retardant may be used alone, or two or more types may be used in combination. When the phosphorus-based flame retardant (F) is blended, the blending amount is preferably 1 part by mass or more and 50 parts by mass or less, more preferably 5 parts by mass, with respect to 100 parts by mass of the curable composition of the present invention. It is 40 parts by mass or less. In particular, the blending amount of the phosphorus-based flame retardant (F) is preferably 0.1 to 10%, more preferably 1 to 5%, as the phosphorus content in the curable composition of the present invention. When the phosphorus-based flame retardant (F) is blended within the above range, flame retardancy can be effectively imparted while maintaining heat resistance and low warpage. In the curable composition of the present invention, may be used boric acid metal salts Firebrake ZB such as flame retardants (zinc borate compound (2ZnO · 3B 2 O 3 · 3.5H 2 O).
 [(G)イオン捕捉剤]
 本発明の硬化性組成物は、イオンマイグレーション耐性などの絶縁信頼性を向上させるために、公知慣用の(G)イオン捕捉剤を含むことが好ましい。
[(G) Ion scavenger]
The curable composition of the present invention preferably contains a known and commonly used (G) ion scavenger in order to improve insulation reliability such as ion migration resistance.
 (G)イオン捕捉剤としては、イオン交換により陽イオンを捕捉する無機陽イオン捕捉剤、イオン交換により陰イオンを捕捉する無機陰イオン捕捉剤、およびイオン交換により陽イオンと陰イオンとの両方を捕捉する無機両イオン捕捉剤が挙げられ、無機両イオン捕捉剤が好ましい。 (G) As the ion trapping agent, an inorganic cation trapping agent that traps cations by ion exchange, an inorganic anion trapping agent that traps anions by ion exchange, and both cations and anions by ion exchange are used. Examples thereof include an inorganic amphoteric trapping agent, and an inorganic amphoteric trapping agent is preferable.
 (G)イオン捕捉剤は、ジルコニウム、アルミニウム、亜鉛、マグネシウム、およびビスマスからなる群より選ばれる少なくとも1種の成分を含むものである。特に、これらの成分の2種以上の酸化水和物または水酸化物が好ましく、ジルコニウム、マグネシウムおよびアルミニウムからなる群より選ばれる2種以上の酸化水和物又は水酸化物がより好ましい。中でも、マグネシウム、アルミニウムおよびジルコニウムの3成分系酸化水和物、ビスマス、およびジルコニウムの2成分系酸化水和物およびマグネシウムおよびアルミニウムを含む水酸化物であるハイドロタルサイトが好ましい。イオン捕捉剤は、1種単独で用いてもよく、2種以上を組み合わせて用いてもよい。 The (G) ion scavenger contains at least one component selected from the group consisting of zirconium, aluminum, zinc, magnesium, and bismuth. In particular, two or more oxidative hydrates or hydroxides of these components are preferable, and two or more oxidative hydrates or hydroxides selected from the group consisting of zirconium, magnesium and aluminum are more preferable. Of these, hydrotalcite, which is a three-component oxidative hydrate of magnesium, aluminum and zirconium, bismuth, and a two-component oxidative hydrate of zirconium and a hydroxide containing magnesium and aluminum, is preferable. The ion scavenger may be used alone or in combination of two or more.
 ハイドロタルサイトは下記式(1)で表わされる。 Hydrotalcite is represented by the following formula (1).
 MgAl(OH)(CO・nHO ・・・(1)
 (式(1)中、a、b、c、およびdは正数であり、2a+3b-c-2d=0を満たす。また、nは水和の数を示し、0または正数であり、好ましくは1~5である。)
Mg a Al b (OH) c (CO 3 ) d · nH 2 O ・ ・ ・ (1)
(In the formula (1), a, b, c, and d are positive numbers and satisfy 2a + 3b-c-2d = 0. Further, n indicates the number of hydration, which is 0 or a positive number, which is preferable. Is 1 to 5.)
 式(1)中、Mgの一部を他の2価金属イオンに置換したものも同様に好ましく用いることができる。他の2価金属イオンの中で特に好ましいものはZnである。 In the formula (1), one in which a part of Mg is replaced with another divalent metal ion can also be preferably used. Among other divalent metal ions, Zn is particularly preferable.
 ハイドロタルサイトの具体例としては、特に限定されないが、例えば、Mg4.5Al(OH)13CO・nHO、MgAl1.5(OH)12.5CO・nHO、MgAl(OH)16CO・nHO、Mg4.2Al(OH)12.4CO・nHO、Mg4.3Al(OH)12.6CO・nHO、Mg2.5ZnAl(OH)13CO・nHO、Mg4.2Al(OH)12.4CO・nHO、Mg4.2Al(OH)12.4CO・nHO、MgAl(OH)12CO・nHO等(以上、nは水和の数を示し、0または正数であり、好ましくは1~5である。)が挙げられ、中でも、Mg4.3Al(OH)12.6CO・nHOが好ましい。 Specific examples of the hydrotalsite are not particularly limited, but for example, Mg 4.5 Al 2 (OH) 13 CO 3 · nH 2 O, Mg 5 Al 1.5 (OH) 12.5 CO 3 · nH 2 O, Mg 6 Al 2 (OH) 16 CO 3 · nH 2 O, Mg 4.2 Al 2 (OH) 12.4 CO 3 · nH 2 O, Mg 4.3 Al 2 (OH) 12.6 CO 3・ NH 2 O, Mg 2.5 Zn 2 Al 2 (OH) 13 CO 3・ nH 2 O, Mg 4.2 Al 2 (OH) 12.4 CO 3・ nH 2 O, Mg 4.2 Al 2 ( OH) 12.4 CO 3 · nH 2 O, Mg 4 Al 2 (OH) 12 CO 3 · nH 2 O, etc. 5), and among them, Mg 4.3 Al 2 (OH) 12.6 CO 3 · nH 2 O is preferable.
 式(1)で表されるハイドロタルサイトとしては、a/bが1.5以上5以下であることが好ましく、1.7以上3以下であることがより好ましく、1.8以上2.5以下であることがさらに好ましい。 As the hydrotalcite represented by the formula (1), a / b is preferably 1.5 or more and 5 or less, more preferably 1.7 or more and 3 or less, and 1.8 or more and 2.5. The following is more preferable.
 (G)イオン捕捉剤の平均粒子径は、通常5μm以下、好ましくは1μm以下である。該平均粒子径の下限は、特に限定されないが、好ましくは0.01μm以上、より好ましくは0.1μm以上、さらに好ましくは0.3μm以上である。 The average particle size of the (G) ion scavenger is usually 5 μm or less, preferably 1 μm or less. The lower limit of the average particle size is not particularly limited, but is preferably 0.01 μm or more, more preferably 0.1 μm or more, and further preferably 0.3 μm or more.
 なお、イオン捕捉剤の平均粒子径は、動的光散乱法により測定することができる。具体的には動的光散乱式粒度分布測定装置により、イオン捕捉剤の粒度分布を体積基準で作成し、そのメディアン径(D50)を平均粒子径とすることで測定することができる。測定サンプルは、イオン捕捉剤を超音波により水中に分散させたものを好ましく使用することができる。動的光散乱式粒度分布測定装置としては、マイクロトラック・ベル社製のNanotrac Wave II UT151等を使用することができる。 The average particle size of the ion scavenger can be measured by the dynamic light scattering method. Specifically, it can be measured by creating a particle size distribution of the ion scavenger on a volume basis with a dynamic light scattering type particle size distribution measuring device and using the median diameter (D50) as the average particle size. As the measurement sample, an ion scavenger dispersed in water by ultrasonic waves can be preferably used. As the dynamic light scattering type particle size distribution measuring device, Nanotrac Wave II UT151 or the like manufactured by Microtrac Bell can be used.
 (G)イオン捕捉剤は市販品を用いてもよく、例えば、東亞合成株式会社製IXEPLAS-A1、IXEPLAS-A2、IXEPLAS-A3、IXEPLAS-B1等、協和化学工業株式会社製DHT-4A、DHT-4A-2、DHT-4C等が挙げられる。 As the ion scavenger (G), a commercially available product may be used, for example, IXEPLAS-A1, IXEPLAS-A2, IXEPLAS-A3, IXEPLAS-B1 manufactured by Toagosei Co., Ltd., DHT-4A, DHT manufactured by Kyowa Chemical Industry Co., Ltd., etc. -4A-2, DHT-4C and the like can be mentioned.
 (G)イオン捕捉剤が配合される場合は、その配合量は、本発明の硬化性組成物100質量部に対して、好ましくは0.01質量部以上10質量部以下であり、より好ましくは0.02質量部以上5質量部以下であり、さらに好ましくは0.03質量部以上3質量部以下である。イオン捕捉剤の配合量が上記数値範囲内であれば、柔軟性、低反り性、難燃性を低下させることなく絶縁信頼性および高温高湿後密着性を向上させることができる。 When the (G) ion scavenger is blended, the blending amount thereof is preferably 0.01 parts by mass or more and 10 parts by mass or less, more preferably 10 parts by mass or less, based on 100 parts by mass of the curable composition of the present invention. It is 0.02 parts by mass or more and 5 parts by mass or less, and more preferably 0.03 parts by mass or more and 3 parts by mass or less. When the blending amount of the ion scavenger is within the above numerical range, insulation reliability and adhesion after high temperature and high humidity can be improved without lowering flexibility, low warpage, and flame retardancy.
 [(メタ)アクリロイル基と水酸基とを有する化合物((E)(メタ)アクリロイル基を2個以上有する化合物を除く)]
 さらに、本発明の硬化性組成物は、(メタ)アクリロイル基と水酸基とを有する化合物を含むことが好ましい。(メタ)アクリロイル基と水酸基とを有する化合物を含むことで、得られた硬化膜と導体および基板との密着性が向上する。
[Compounds having (meth) acryloyl group and hydroxyl group (excluding compounds having two or more (meth) acryloyl groups)]
Further, the curable composition of the present invention preferably contains a compound having a (meth) acryloyl group and a hydroxyl group. By containing a compound having a (meth) acryloyl group and a hydroxyl group, the adhesion between the obtained cured film and the conductor and the substrate is improved.
 (メタ)アクリロイル基と水酸基とを有する化合物としては、2-ヒドロキシ-3-アクリロイルオキシプロピル(メタ)アクリレート、2-ヒドロキシ-3-フェノキシエチル(メタ)アクリレート、1,4-シクロヘキサンジメタノールモノ(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールモノヒドロキシペンタ(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート等が挙げられる。市販品としてはアロニックスM-5700(東亞合成社製の商品名)、4HBA、2HEA、CHDMMA(以上、共栄社化学社製の商品名)、BHEA、HPA、HEMA、HPMA(以上、日本触媒社製の商品名)、ライトエステルHO、ライトエステルHOP、ライトエステルHOA(以上、共栄社化学社製の商品名)等がある。(メタ)アクリロイル基と水酸基とを有する化合物は1種類または複数種類を組み合わせて用いることができる。 Examples of the compound having a (meth) acryloyl group and a hydroxyl group include 2-hydroxy-3-acryloyloxypropyl (meth) acrylate, 2-hydroxy-3-phenoxyethyl (meth) acrylate, and 1,4-cyclohexanedimethanol mono. Meta) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol monohydroxypenta (meth) acrylate, Examples thereof include 2-hydroxypropyl (meth) acrylate. Commercially available products include Aronix M-5700 (trade name manufactured by Toagosei Co., Ltd.), 4HBA, 2HEA, CHDMMA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.), BHEA, HPA, HEMA, HPMA (above, manufactured by Nippon Catalyst Co., Ltd.). Product name), light ester HO, light ester HOP, light ester HOA (above, product name manufactured by Kyoeisha Chemical Co., Ltd.) and the like. The compound having a (meth) acryloyl group and a hydroxyl group can be used alone or in combination of two or more.
 このうち、特に2-ヒドロキシ-3-アクリロイルオキシプロピルアクリレート、2-ヒドロキシ-3-フェノキシエチルアクリレート、2-ヒドロキシエチルアクリレート、2-ヒドロキシプロピルアクリレート、4-ヒドロキシブチルアクリレート、1,4-シクロヘキサンジメタノールモノアクリレートが好ましく用いられる。また、粘度調整の容易さの観点から、(メタ)アクリロイル基が1個である化合物が好ましく用いられる。 Of these, especially 2-hydroxy-3-acryloyloxypropyl acrylate, 2-hydroxy-3-phenoxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 1,4-cyclohexanedimethanol Monoacrylate is preferably used. Further, from the viewpoint of ease of viscosity adjustment, a compound having one (meth) acryloyl group is preferably used.
 (メタ)アクリロイル基と水酸基とを有する化合物の配合量は、本発明の硬化性組成物100質量部あたり、好ましくは1~15質量部であり、より好ましくは1~10質量部であり、特に好ましくは2~8質量部である。 The blending amount of the compound having a (meth) acryloyl group and a hydroxyl group is preferably 1 to 15 parts by mass, more preferably 1 to 10 parts by mass, and particularly, per 100 parts by mass of the curable composition of the present invention. It is preferably 2 to 8 parts by mass.
 本発明の硬化性組成物には、必要に応じて酸化防止剤、消泡・レベリング剤、チクソトロピー付与剤・増粘剤、カップリング剤、分散剤、重合遅延剤、着色剤等の添加剤を含有させることができる。 Additives such as antioxidants, antifoaming / leveling agents, thixotropy-imparting agents / thickening agents, coupling agents, dispersants, polymerization retarders, and colorants are added to the curable composition of the present invention, if necessary. It can be contained.
 更に、本発明の硬化性組成物には、粘度調整のため溶剤を用いてもよいが、硬化後の膜厚低下を防ぐために、添加量は少ないことが好ましい。また、粘度調整のための溶剤は含まないことがより好ましい。 Further, although a solvent may be used for adjusting the viscosity of the curable composition of the present invention, it is preferable that the amount added is small in order to prevent a decrease in film thickness after curing. Further, it is more preferable that the solvent for adjusting the viscosity is not contained.
 本発明の硬化性組成物は、好ましくはインクジェット法による印刷に適用される。インクジェット法による印刷に適用可能とするためには、インクジェットプリンターにより噴射可能な粘度であることが好ましい。 The curable composition of the present invention is preferably applied to printing by an inkjet method. In order to make it applicable to printing by the inkjet method, it is preferable that the viscosity is such that it can be ejected by an inkjet printer.
 また、本発明の硬化性組成物の粘度は、50℃で50mPa・s以下であることが好ましく、50℃で20mPa・s以下であることがより好ましく、50℃で15mPa・s以下であることが特に好ましい。粘度は、JIS Z8803:2011の10 円すい-平板形回転粘度計による粘度測定方法に準じ、50℃、100rpm、30秒値とし、コーン・ロータとして1°34’×R24を用いたコーンプレート型粘度計(TVE-33H、東機産業社製)にて測定した値である。 The viscosity of the curable composition of the present invention is preferably 50 mPa · s or less at 50 ° C., more preferably 20 mPa · s or less at 50 ° C., and 15 mPa · s or less at 50 ° C. Is particularly preferable. The viscosity is 50 ° C., 100 rpm, 30 seconds value according to the viscosity measurement method using a 10-cone-plate type rotational viscometer of JIS Z8803: 2011, and the cone plate type viscosity using 1 ° 34'x R24 as the cone rotor. It is a value measured by a meter (TVE-33H, manufactured by Toki Sangyo Co., Ltd.).
 従って、本発明の硬化性組成物によりプリント配線板用の基板等に、インクジェット印刷法により直接パターンを印刷することができる。 Therefore, the curable composition of the present invention can directly print a pattern on a substrate or the like for a printed wiring board by an inkjet printing method.
 さらに、本発明の硬化性組成物は、常温では重合反応が生じないため、一液型の硬化性組成物として安定に保存可能である。 Furthermore, since the curable composition of the present invention does not undergo a polymerization reaction at room temperature, it can be stably stored as a one-component curable composition.
 本発明の硬化性組成物の粘度を50℃で50mPa・s以下とした場合には、インクジェットプリンターにインクとして供給することができ、基板上への印刷に使用することができる。 When the viscosity of the curable composition of the present invention is 50 mPa · s or less at 50 ° C., it can be supplied as ink to an inkjet printer and can be used for printing on a substrate.
 <硬化性組成物により得られる硬化物>
本発明の硬化性組成物により得られる硬化物は、例えば、上記印刷直後の組成物層に50mJ/cm~1000mJ/cmの活性エネルギー線を照射することにより組成物層を光硬化させることで得られる。活性エネルギー線照射は、紫外線、電子線、化学線等の活性エネルギー線の照射により、好ましくは紫外線照射により行われる。
<Curing product obtained by curable composition>
The cured product obtained by the curable composition of the present invention is, for example, photocuring the composition layer immediately after printing by irradiating the composition layer with an active energy ray of 50 mJ / cm 2 to 1000 mJ / cm 2. Obtained at. The activation energy ray irradiation is performed by irradiation with active energy rays such as ultraviolet rays, electron beams, and chemical rays, preferably by ultraviolet irradiation.
 インクジェットプリンターにおける紫外線照射は、例えばプリントヘッドの側面に高圧水銀灯、メタルハライドランプ、紫外線LEDなどの光源を取り付け、プリントヘッドもしくは基板を動かすことによる走査を行うことにより行うことができる。この場合は、印刷と、紫外線照射とをほぼ同時に行なえる。 Ultraviolet irradiation in an inkjet printer can be performed by, for example, attaching a light source such as a high-pressure mercury lamp, a metal halide lamp, or an ultraviolet LED to the side surface of the print head, and scanning by moving the print head or the substrate. In this case, printing and ultraviolet irradiation can be performed almost at the same time.
 光硬化後の硬化物は、公知の加熱手段、例えば、熱風炉、電気炉、赤外線誘導加熱炉等の加熱炉を用いることにより熱硬化する。加熱条件としては、130℃~170℃にて5分~90分加熱することが好ましい。 The cured product after photocuring is thermally cured by using a known heating means, for example, a heating furnace such as a hot air furnace, an electric furnace, or an infrared induction heating furnace. As the heating conditions, it is preferable to heat at 130 ° C. to 170 ° C. for 5 minutes to 90 minutes.
 本発明の硬化性組成物により得られた硬化物は、柔軟性にも優れるため、特にフレキシブルプリント配線板に対するソルダーレジストとしても好適である。 The cured product obtained by the curable composition of the present invention is also excellent in flexibility, and is therefore particularly suitable as a solder resist for a flexible printed wiring board.
 フレキシブルプリント配線板の基板としては、例えば、ガラスポリイミド、ポリイミド、ポリエチレンテレフタレート、液晶ポリマー、ポリカーボネートなどからなるフィルム等が挙げられる。 Examples of the substrate of the flexible printed wiring board include a film made of glass polyimide, polyimide, polyethylene terephthalate, liquid crystal polymer, polycarbonate, and the like.
 <硬化性組成物の硬化物を有する電子部品>
 このように基板上にパターン印刷した硬化性組成物からなる硬化膜がソルダーレジストとして用いられる場合、部品の実装のためのはんだ付け工程で加熱される。はんだ付けは、手はんだ付け、フローはんだ付け、リフローはんだ付け等のいずれで行われてもよいが、例えば、リフローはんだ付けの場合には、100℃~140℃で1~4時間の予熱と、その後、240~280℃で5~20秒程度の加熱を複数回(例えば、2~4回)繰り返してはんだを加熱・溶融させるリフロー工程に供され、冷却後、必要により部品が実装された電子部品が完成する。
<Electronic components with a cured product of a curable composition>
When a cured film made of a curable composition with a pattern printed on a substrate in this way is used as a solder resist, it is heated in a soldering step for mounting components. Soldering may be performed by hand soldering, flow soldering, reflow soldering, or the like. For example, in the case of reflow soldering, preheating at 100 ° C. to 140 ° C. for 1 to 4 hours is required. After that, it is subjected to a reflow process of heating and melting the solder by repeating heating at 240 to 280 ° C. for about 5 to 20 seconds a plurality of times (for example, 2 to 4 times). The part is completed.
 なお、本発明において電子部品とは、電子回路に使用する部品を意味し、プリント配線板、トランジスタ、発光ダイオード、レーザーダイオード等の能動部品の他抵抗、コンデンサ、インダクタ、コネクタ等の受動部品も含まれ、本発明の硬化性組成物の硬化物がこれらの絶縁性硬化膜として、本発明の効果を奏するものである。 In the present invention, the electronic component means a component used in an electronic circuit, and includes active components such as printed wiring boards, transistors, light emitting diodes, and laser diodes, as well as passive components such as resistors, capacitors, inductors, and connectors. The cured product of the curable composition of the present invention exerts the effect of the present invention as these insulating cured films.
 本発明の硬化性組成物は、低粘度化が容易で、塗布性に優れ、光硬化後の反りも少ない。さらに、硬化後にも柔軟であり、基板への密着性、難燃性、はんだ耐熱性、めっき耐性、耐溶剤性に優れることから種々の用途に適用可能であり、適用対象に特に制限はない。例えば、インクジェット法を用いたプリント配線板のエッチングレジスト、ソルダーレジスト、マーキングインキの作製等の用いることができ、中でも高い耐熱性および柔軟性が要求されるフレキシブルプリント配線板のソルダーレジストとして好適に用いることができる。 The curable composition of the present invention can be easily reduced in viscosity, has excellent coatability, and has little warpage after photocuring. Further, it is flexible even after curing, and is excellent in adhesion to a substrate, flame retardancy, solder heat resistance, plating resistance, and solvent resistance, so that it can be applied to various applications, and there is no particular limitation on the application target. For example, it can be used for manufacturing etching resists, solder resists, marking inks, etc. for printed wiring boards using an inkjet method, and is preferably used as a solder resist for flexible printed wiring boards, which require high heat resistance and flexibility. be able to.
 また、UV成形品材料、光造形用材料、3Dインクジェット用材料などの用途にも利用可能である。 It can also be used as a material for UV molded products, a material for stereolithography, and a material for 3D inkjet.
 なお、本発明は上記の実施の形態の構成および実施例に限定されるものではなく、発明の要旨の範囲内で種々変形が可能である。 The present invention is not limited to the configuration and examples of the above-described embodiment, and various modifications can be made within the scope of the gist of the invention.
 以下、実施例を示して本発明について具体的に説明するが、本発明はこれらの実施例のみに限定されるものではない。なお、以下において特に断りのない限り、「部」は質量部を意味するものとする。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to these Examples. In the following, unless otherwise specified, "parts" shall mean parts by mass.
 <1.実施例1~8および比較例1~3の硬化性組成物の調製>
 下記表1に示す割合(単位:質量部)で各成分を配合し、これをディゾルバーで攪拌した。その後、ビーズミルを用いてジルコニアビーズにて分散を2時間行い、本発明の硬化性組成物(実施例1~8)および比較例の硬化性組成物(比較例1~3)を得た。ビーズミルとしては、コニカル型K-8(ビューラ社製)を使用し、回転数1200rpm、吐出量20%、ビーズ粒径0.65mm、充填率88%の条件にて混練した。
<1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3>
Each component was blended at the ratio (unit: parts by mass) shown in Table 1 below, and this was stirred with a dissolver. Then, dispersion was carried out with zirconia beads using a bead mill for 2 hours to obtain a curable composition of the present invention (Examples 1 to 8) and a curable composition of Comparative Examples (Comparative Examples 1 to 3). As a bead mill, a conical type K-8 (manufactured by Buhra) was used and kneaded under the conditions of a rotation speed of 1200 rpm, a discharge rate of 20%, a bead particle size of 0.65 mm, and a filling rate of 88%.
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
*1:α-(アリルオキシメチル)アクリル酸メチル(FX-AOMA:日本触媒社製)
*2:トリメチロールプロパントリアクリレート(A-TMPT:新中村化学工業社製)
*3:1,9-ノナンジオールジアクリレート(1,9-NDA:第一工業製薬社製)
*4:ジプロピレングリコールジアクリレート(DPGDA:東洋ケミカルズ社製)
*5:エトキシ化ビスフェノールAジアクリレート(A-BPE-10:新中村化学工業社製)
*6:4-ヒドロキシブチルアクリレート(4HBA:共栄社化学社製)
*7:3官能ブロックイソシアネート(BI7982:Baxenden chemmical社製)
*8:メラミン(日産化学社製)
*9:2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノン(Omnirad 379:IGM Resins社製)
*10:ホスファゼン化合物(リン含有率12.5%)(FP-300B:(株)伏見製薬所製)
*11:ホスフィン酸金属塩(リン含有率23%)(OP935:クラリアントケミカルズ社製)
*12:フェノール性水酸基を持つリン含有化合物(リン含有率9.6%)(HCA-HQ:三光社製)
*13:Mg系化合物、Al系化合物およびZr系化合物を含有するイオン捕捉剤(IXEPLAS-A1:東亞合成社製)
*14:フタロシアニン系青色顔料(Pigment Blue15:3)
*15:アントラキノン系黄色顔料(Pigment Yellow147)
* 1: Methyl α- (allyloxymethyl) acrylate (FX-AOMA: manufactured by Nippon Shokubai Co., Ltd.)
* 2: Trimethylolpropane triacrylate (A-TMPT: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
* 3: 1,9-Nonanediol diacrylate (1,9-NDA: manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.)
* 4: Dipropylene glycol diacrylate (DPGDA: manufactured by Toyo Chemicals Co., Ltd.)
* 5: Ethoxylated bisphenol A diacrylate (A-BPE-10: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
* 6: 4-Hydroxybutyl acrylate (4HBA: manufactured by Kyoeisha Chemical Co., Ltd.)
* 7: Trifunctional blocked isocyanate (BI7982: manufactured by Baxenden chemmical)
* 8: Melamine (manufactured by Nissan Chemical Industries, Ltd.)
* 9: 2- (Dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone (Omnirad 379: manufactured by IGM Resins)
* 10: Phosphazene compound (phosphorus content 12.5%) (FP-300B: manufactured by Fushimi Pharmaceutical Co., Ltd.)
* 11: Metallic phosphinic acid salt (phosphorus content 23%) (OP935: manufactured by Clariant Chemicals)
* 12: Phosphorus-containing compound having a phenolic hydroxyl group (phosphorus content 9.6%) (HCA-HQ: manufactured by Sanko Co., Ltd.)
* 13: Ion scavenger containing Mg-based compound, Al-based compound and Zr-based compound (IXEPLAS-A1: manufactured by Toagosei Co., Ltd.)
* 14: Phthalocyanine-based blue pigment (Pigment Blue 15: 3)
* 15: Anthraquinone-based yellow pigment (Pigment Yellow147)
 <2.評価>
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>で得られた各硬化性組成物について以下のように粘度を評価した。また、以下に示すように試験用試料を作成し、塗布性、露光後反り性、柔軟性(MIT試験)、はんだ耐熱性、耐溶剤性、無電解金めっき耐性、難燃性および高温高湿後密着性の評価を行った。その結果を表2に示す。
<2. Evaluation >
Above <1. The viscosities of each of the curable compositions obtained in Examples 1 to 8 and Comparative Examples 1 to 3> were evaluated as follows. In addition, prepare a test sample as shown below, and prepare a test sample, and applyability, warpage after exposure, flexibility (MIT test), solder heat resistance, solvent resistance, electroless gold plating resistance, flame retardancy and high temperature and humidity. Post-adhesion was evaluated. The results are shown in Table 2.
 (1)粘度
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>で得られた各硬化性組成物について、50℃、100rpm、30秒値とし、コーン・ロータとして1°34’×R24を用いたコーンプレート型粘度計(TVE-33H、東機産業社製)にて測定し、以下の基準で評価した。
(1) Viscosity <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> For each curable composition obtained, the values were set at 50 ° C., 100 rpm, and 30 seconds, and the value was set to 1 ° 34'x R24 as a cone rotor. It was measured with a cone plate type viscometer (TVE-33H, manufactured by Toki Sangyo Co., Ltd.) using the above, and evaluated according to the following criteria.
 ◎:10mPa・s以下
 ○:10mPa・s超20mPa・s以下
 ×:20mPa・s超
⊚: 10 mPa · s or less ○: 10 mPa · s more than 20 mPa · s or less ×: 20 mPa · s more than
 (2)硬化膜の形成条件
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>で得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて塗布した。アレイはKM1024iSHE(コニカミノルタ社製、塗布液滴量6pL、ノズル数1024個、ヘッド温度50℃)を使用した。光硬化はSGHUV-UN-L042-B(マイクロクラフト社製、LED光源、波長365nm)を光源として使用し、300mJ/cmで行った。その後、加熱装置は熱風循環式乾燥炉DF610(ヤマト科学株式会社製)を使用し、150℃60分で本硬化を行った。
(2) Conditions for forming a cured film <1. Each curable composition obtained in Preparation of Curable Compositions of Examples 1 to 8 and Comparative Examples 1 to 3> was applied using an inkjet printing apparatus CPS6151 (manufactured by Microcraft). As the array, KM1024iSHE (manufactured by Konica Minolta, coating droplet amount 6 pL, number of nozzles 1024, head temperature 50 ° C.) was used. Photocuring was performed at 300 mJ / cm 2 using SGHUV-UN-L042-B (manufactured by Microcraft, LED light source, wavelength 365 nm) as a light source. After that, a hot air circulation type drying furnace DF610 (manufactured by Yamato Kagaku Co., Ltd.) was used as a heating device, and the main curing was performed at 150 ° C. for 60 minutes.
 (3)塗布性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布厚20μmで塗布した。硬化膜表面を目視で観察し、以下の基準で評価を行った。
(3) Applyability <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Each curable composition obtained was treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.). It was applied on the copper surface of M (registered trademark) M (manufactured by Nittetsu Chemical & Materials Co., Ltd.) with a coating thickness of 20 μm. The surface of the cured film was visually observed and evaluated according to the following criteria.
 ○:均一に塗布ができており、表面が滑らかなもの
 △:全面塗布はできているが、ヘッド操作方向に対してスジが発生しているもの
 ×:硬化膜の一部に抜けが発生しているもの
◯: Uniform coating and smooth surface Δ: Full coating but streaks in the head operation direction ×: Part of the cured film is missing What is
 (4)露光後反り性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用い、光硬化条件800mJ/cmにて、硫酸処理済のカプトン(登録商標)200H(東レ・デュポン社製)に対し片面塗布を行った。得られた露光後硬化膜の積層体を、5cmx5cm(縦×横)に切り出してサンプル(膜厚:15μm)とした。各サンプルを、露光後硬化膜面を上面として30分間水平な作業台上に静置し、作業台から上昇したサンプルの四端の高さを定規で測定し、四端の高さの平均値を求めた。同様の試験をサンプルごとに3回行い、3回の試験の平均値を求め、以下の基準で評価した。
(4) Warpage after exposure <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Each curable composition obtained was subjected to a photocuring condition of 800 mJ / cm 2 using an inkjet printing device CPS6151 (manufactured by Microcraft). Then, one-sided coating was applied to Sulfuric acid-treated Kapton (registered trademark) 200H (manufactured by Toray DuPont). The obtained laminated body of the cured film after exposure was cut into 5 cm x 5 cm (length x width) to prepare a sample (film thickness: 15 μm). After exposure, each sample was allowed to stand on a horizontal work table for 30 minutes with the cured film surface as the upper surface, and the heights of the four edges of the sample raised from the work table were measured with a ruler, and the average value of the heights of the four ends was measured. Asked. The same test was performed three times for each sample, and the average value of the three tests was calculated and evaluated according to the following criteria.
 ◎:四端の合計高さの平均値が5mm以下
 ○:四端の合計高さの平均値が5mm超過10mm未満
 ×:四端の合計高さの平均値が10mm以上
⊚: The average value of the total heights of the four ends is 5 mm or less ○: The average value of the total heights of the four ends exceeds 5 mm and less than 10 mm ×: The average value of the total heights of the four ends is 10 mm or more
 (5)柔軟性(MIT試験)
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をマイクロクラフト社製CP56151にて、硫酸処理済の銅厚12μmで回路パターンが形成されているポリイミド25μmの基板上に塗布した。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた硬化膜に対し、JIS P8115に基づくMIT試験(R=0.38mm)を実施し、屈曲性を評価した。
(5) Flexibility (MIT test)
Above <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> was used to form a circuit pattern of each curable composition obtained by CP56151 manufactured by Microcraft Co., Ltd. with a sulfuric acid-treated copper thickness of 12 μm. It was applied onto a substrate having a polyimide of 25 μm. Then, a cured film having a thickness of 20 μm was formed according to the above “(2) Conditions for forming a cured film”. The obtained cured film was subjected to a MIT test (R = 0.38 mm) based on JIS P8115 to evaluate its flexibility.
 具体的には、図1に示すように、試験片1を装置に装着し、荷重F(0.5kgf)を負荷した状態で、クランプ2に試験片1を垂直に取り付けて、折り曲げ角度αが135度、速度が175cpmにて折り曲げを行い、破断するまでの往復折り曲げ回数(回)を測定した。なお、試験環境は25℃で、曲率半径はR=0.38mmとした。評価基準は以下の通りである。 Specifically, as shown in FIG. 1, the test piece 1 is mounted on the apparatus, the test piece 1 is vertically attached to the clamp 2 with the load F (0.5 kgf) applied, and the bending angle α is set. Bending was performed at 135 degrees and a speed of 175 cpm, and the number of reciprocating bends (times) until breaking was measured. The test environment was 25 ° C., and the radius of curvature was R = 0.38 mm. The evaluation criteria are as follows.
 ◎:150回以上
 ○:100~149回
 △:50~99回
 ×:49回以下
⊚: 150 times or more ○: 100 to 149 times Δ: 50 to 99 times ×: 49 times or less
 (6)はんだ耐熱性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて、光硬化条件800mJ/cmにて、硫酸処理済の銅厚12μm、ポリイミド50μmの回路パターン基板上に塗布を行った。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた評価基板に対してロジン系フラックスを塗布し、予め260℃に設定したはんだ槽に5秒間浸漬を1回もしくは2回行い、変性アルコールでフラックスを洗浄した後、クロスカットテープピール試験を行い、硬化膜の膨れ・剥がれについて評価した。判定基準は以下のとおりである。
(6) Solder heat resistance <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Using an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.), each curable composition was subjected to photocuring conditions of 800 mJ / cm 2 The coating was applied on a circuit pattern substrate having a copper thickness of 12 μm and a polyimide of 50 μm treated with sulfuric acid. Then, a cured film having a thickness of 20 μm was formed according to the above “(2) Conditions for forming a cured film”. A rosin-based flux is applied to the obtained evaluation substrate, immersed in a solder bath set at 260 ° C. in advance for 5 seconds once or twice, the flux is washed with a modified alcohol, and then a cross-cut tape peel test is performed. This was performed and the swelling and peeling of the cured film were evaluated. The judgment criteria are as follows.
 ◎:5秒×2回浸漬を行い、セロテープ(登録商標)でピール試験を行っても硬化膜に剥がれが認められない。
 ○:5秒×1回浸漬を行い、セロテープ(登録商標)でピール試験を行っても硬化膜に剥がれが認められない。
 ×:5秒×1回浸漬を行うと硬化膜に膨れ、剥がれがある。
⊚: No peeling was observed in the cured film even when the film was immersed twice for 5 seconds and a peel test was performed with cellophane tape (registered trademark).
◯: Even if the film was immersed once for 5 seconds and the peel test was performed with cellophane tape (registered trademark), no peeling was observed in the cured film.
X: When the film is immersed for 5 seconds × 1 time, the cured film swells and peels off.
 (7)耐溶剤性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて、光硬化条件800mJ/cmにて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布を行い、熱風循環式乾燥炉にて150℃、60分加熱して厚さ20μmの硬化膜を得た。硬化膜を、プロピレングリコールモノメチルアセテートに30分間浸漬した後の硬化膜状態を評価した。評価基準は以下の通りである。
(7) Solvent resistance <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Using an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.), each curable composition was subjected to photocuring conditions of 800 mJ / cm 2 On the copper surface of Espanex (registered trademark) M (manufactured by Nittetsu Chemical & Materials Co., Ltd.) that has been treated with sulfuric acid, heat it in a hot air circulation type drying oven at 150 ° C. for 60 minutes to a thickness of 20 μm. A cured film was obtained. The state of the cured film after being immersed in propylene glycol monomethyl acetate for 30 minutes was evaluated. The evaluation criteria are as follows.
 ○:全く変化が認められないもの
 △:ほんの僅か変化しているもの
 ×:顕著に変化しているもの
◯: No change is observed △: Slightly changed ×: Significant change
 (8)無電解金めっき耐性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて、硫酸処理済の銅厚12μm、ポリイミド50μmの回路パターン基板上に塗布を行った。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。得られた評価基板に対し市販の無電解ニッケルめっき浴及び無電解金めっき浴を用いて、ニッケル5μm、金0.03μmの条件で金めっきを行い、硬化膜表面状態の観察を行った。評価基準は以下の通りである。
(8) Electroless gold plating resistance <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Sulfuric acid-treated copper thickness of 12 μm using an inkjet printing device CPS6151 (manufactured by Microcraft). , Polyimide 50 μm was applied onto a circuit pattern substrate. Then, a cured film having a thickness of 20 μm was formed according to the above “(2) Conditions for forming a cured film”. The obtained evaluation substrate was gold-plated using a commercially available electroless nickel plating bath and an electroless gold plating bath under the conditions of nickel 5 μm and gold 0.03 μm, and the surface condition of the cured film was observed. The evaluation criteria are as follows.
 ○:全く変化が認められないもの
 ×:顕著に白化若しくは曇りが生じたもの
◯: No change was observed ×: Significant whitening or cloudiness occurred
 (9)難燃性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて、FR-4(0.8mmt)基板上に両面塗布を行った。その後、その後、上記「(2)硬化膜の形成条件」に従い、硬化膜を形成した(各面の塗膜厚さは20μmである)。得られた硬化膜についてUL94規格に準拠した薄材垂直燃焼試験を行った。評価基準は以下の通りである。
(9) Flame retardancy <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Using an inkjet printing apparatus CPS6151 (manufactured by Microcraft), FR-4 (0.8 mmt) was used to prepare each curable composition. ) Double-sided coating was applied on the substrate. Then, after that, a cured film was formed according to the above "(2) Conditions for forming a cured film" (the coating film thickness on each surface is 20 μm). The obtained cured film was subjected to a thin lumber vertical combustion test conforming to the UL94 standard. The evaluation criteria are as follows.
 ◎:V-0合格し、各サンプルの燃焼時間が3秒未満のもの
 ○:V-0合格し、各サンプルの燃焼時間が3秒超7秒未満のもの
 V-0:V-0合格し、各サンプルの燃焼時間が7秒超10秒以内のもの
 Not:V-0不合格
⊚: Passed V-0 and burned time of each sample less than 3 seconds ○: Passed V-0 and burned time of each sample more than 3 seconds and less than 7 seconds V-0: Passed V-0 , Burning time of each sample is more than 7 seconds and less than 10 seconds Not: V-0 failed
 (10)高温高湿後密着性
 上記<1.実施例1~8および比較例1~3の硬化性組成物の調製>によって得られた各硬化性組成物をインクジェット印刷装置CPS6151(マイクロクラフト社製)を用いて、硫酸処理済のエスパネックス(登録商標)M(日鉄ケミカル&マテリアル社製)の銅表面上に塗布を行った。その後、上記「(2)硬化膜の形成条件」に従い、厚さ20μmの硬化膜を形成した。次いで、得られた硬化膜に対し、温度85℃、湿度85%の条件下で500時間曝した後、室温条件に24時間放置した後、作製した各試験基板を用いてクロスカットテープピール試験を実施し、碁盤目の残存数が100個のうち何個あるかを数えて、以下の基準に基づき評価した。
(10) Adhesion after high temperature and high humidity <1. Preparation of curable compositions of Examples 1 to 8 and Comparative Examples 1 to 3> Each curable composition obtained was treated with sulfuric acid using an inkjet printing device CPS6151 (manufactured by Microcraft Co., Ltd.). It was applied on the copper surface of registered trademark) M (manufactured by Nittetsu Chemical & Materials Co., Ltd.). Then, a cured film having a thickness of 20 μm was formed according to the above “(2) Conditions for forming a cured film”. Next, the obtained cured film was exposed to the obtained cured film under the conditions of a temperature of 85 ° C. and a humidity of 85% for 500 hours, left at room temperature for 24 hours, and then subjected to a cross-cut tape peel test using each of the prepared test substrates. This was carried out, and the number of remaining grids was counted out of 100 and evaluated based on the following criteria.
 ◎:100個
 ○:80個以上99個以下
 ×:79個以下
⊚: 100 ◯: 80 or more and 99 or less ×: 79 or less
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
 表2に示すように、本発明に係る実施例1~8は、硬化膜(硬化物)と導体回路との密着性、低反り性、柔軟性を兼ね備えていた。また、(E1)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含ませたり、リン系難燃剤を含ませたりするこことで、難燃性を向上させることができた(実施例1~8参照)。さらに、イオン捕捉剤を含ませることで、硬化膜(硬化物)と導体回路との密着性がさらに向上した(実施例6、7参照)。 As shown in Table 2, Examples 1 to 8 according to the present invention have adhesion, low warpage, and flexibility between the cured film (cured product) and the conductor circuit. Further, the flame retardancy could be improved by containing a compound having (E1) an aromatic ring and having two or more (meth) acryloyl groups, or by containing a phosphorus-based flame retardant. (See Examples 1 to 8). Further, by adding an ion scavenger, the adhesion between the cured film (cured product) and the conductor circuit was further improved (see Examples 6 and 7).

Claims (10)

  1.  (A)式(1)
    Figure JPOXMLDOC01-appb-C000001
     (式(1)中、Rは、直鎖状、分岐鎖状および環状のいずれでもよく、エーテル結合を含んでいてもよい炭素数1個以上4個以下の炭化水素基を示す(但し、前記炭化水素基中に置換基を有していてもよい))
    で表される重合性モノマーと、
     (B)メラミンおよびその誘導体からなる群から選択される化合物と、
     (C)光重合開始剤と、
     (D)熱硬化成分と、
    を含有することを特徴とする硬化性組成物。
    (A) Equation (1)
    Figure JPOXMLDOC01-appb-C000001
    (In the formula (1), R 1 may be linear, branched or cyclic, and represents a hydrocarbon group having 1 or more and 4 or less carbon atoms which may contain an ether bond (provided that the hydrocarbon group has 1 or more and 4 or less carbon atoms). It may have a substituent in the hydrocarbon group))
    With the polymerizable monomer represented by
    (B) A compound selected from the group consisting of melamine and its derivatives, and
    (C) Photopolymerization initiator and
    (D) Thermosetting component and
    A curable composition comprising.
  2.  50℃において50mPa・s以下の粘度を有することを特徴とする請求項1に記載の硬化性組成物。 The curable composition according to claim 1, which has a viscosity of 50 mPa · s or less at 50 ° C.
  3.  (E)(メタ)アクリロイル基を2個以上有する化合物を含有することを特徴とする請求項1または2に記載の硬化性組成物。 (E) The curable composition according to claim 1 or 2, which contains a compound having two or more (meth) acryloyl groups.
  4.  (E)(メタ)アクリロイル基を2個以上有する化合物が、(E1)芳香環を有し、(メタ)アクリロイル基を2個以上有する化合物を含むことを特徴とする請求項3に記載の硬化性組成物。 (E) The curing according to claim 3, wherein the compound having two or more (meth) acryloyl groups includes a compound having (E1) an aromatic ring and two or more (meth) acryloyl groups. Sex composition.
  5.  (D)熱硬化成分が潜在性熱硬化成分を含むことを特徴とする請求項1~4の何れか1項に記載の硬化性組成物。 (D) The curable composition according to any one of claims 1 to 4, wherein the thermosetting component contains a latent thermosetting component.
  6.  前記潜在性熱硬化成分がブロックイソシアネート化合物であることを特徴とする請求項5に記載の硬化性組成物。 The curable composition according to claim 5, wherein the latent thermosetting component is a blocked isocyanate compound.
  7.  (F)リン系難燃剤をさらに含むことを特徴とする請求項1~6の何れか1項に記載の硬化性組成物。 (F) The curable composition according to any one of claims 1 to 6, further comprising a phosphorus-based flame retardant.
  8.  (G)イオン捕捉剤をさらに含むことを特徴とする請求項1~7の何れか1項に記載の硬化性組成物。 (G) The curable composition according to any one of claims 1 to 7, further comprising an ion scavenger.
  9.  請求項1~8の何れか一項に記載の硬化性組成物より得られる硬化物。 A cured product obtained from the curable composition according to any one of claims 1 to 8.
  10.  請求項9に記載の硬化物を有する電子部品。 An electronic component having the cured product according to claim 9.
PCT/JP2021/011346 2020-03-31 2021-03-19 Curable composition, cured product, and electronic component WO2021200268A1 (en)

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JP2013091789A (en) * 2012-10-10 2013-05-16 Nippon Shokubai Co Ltd Curable composition for forming peelable resist
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